TWI406000B - Coated lens and method thereof - Google Patents

Abstract

The present invention relates to a method for coating lenses. The method includes following steps: providing a plate having a first surface and a second surface opposite to the first surface; coating an optical layer on the first surface of the plate; etching the plate along the second surface for time after time to form optical imaging regions of coated lenses; cutting the plate to form a plurality of coated lenses. In addition, a corresponding coated lens is also provided. The coated lens includes a plate. The plate includes a first side and a second side opposite to the first side. An optical layer is formed on the first side of the plate. An optical imaging region of the coated lens is formed by etching the plate along the second side.

Description

鍍膜鏡片及其製作方法 Coated lens and manufacturing method thereof

本發明涉及一種鍍膜鏡片，以及一種製作該鍍膜鏡片之方法。 The present invention relates to a coated lens and a method of making the coated lens.

光學鏡片作為相機模組，如數碼相機、鏡頭模組中之成像元件，於攝像領域發揮著不可或缺之作用。 Optical lenses, as camera modules, such as imaging components in digital cameras and lens modules, play an indispensable role in the field of imaging.

目前，製作光學鏡片通常採用射出成型法進行批量生產，即使用射出成型機加熱塑膠，使得塑膠熔融後注射進複數(也即多個)模仁所形成之模腔中，經冷卻後即可一次成型出複數光學鏡片。具體請參閱Yang等人於2006 IEEE系統、機械與自動化國際會議(International Conference on Mechatronics and Automation)上發表之題為Fabrication of Diffractive Optical Lens for Beam splitting Using LIGA Process之論文。 At present, the production of optical lenses is usually carried out by mass injection molding, that is, using an injection molding machine to heat the plastic, so that the plastic is melted and injected into a cavity formed by a plurality of (ie, a plurality of) mold cores, and once cooled, it can be once A plurality of optical lenses are formed. For details, please refer to the paper entitled "Fabrication of Diffractive Optical Lens for Beam splitting Using LIGA Process" published by Yang et al. at the International Conference on Mechatronics and Automation.

利用上述射出成型法製造光學鏡片具有較高之生產率，且可一次性批量製造出複數光學鏡片。惟，隨著攝像技術之發展，該方法越來越難以滿足人們對高精密攝像器材之要求。且採用射出成型法來製造光學鏡片，其所配置之模仁只能用以生產某一型號大小之光學鏡片，當需要生產其他型號大小之光學鏡片時，相關之生產設備，如模仁等需要被更換。 The optical lens produced by the above injection molding method has high productivity, and the plurality of optical lenses can be mass-produced at one time. However, with the development of camera technology, this method is increasingly difficult to meet the requirements of high-precision camera equipment. And the injection molding method is used to manufacture the optical lens, and the configured mold core can only be used to produce optical lenses of a certain size. When it is required to produce other types of optical lenses, related production equipment, such as molds, etc. Was replaced.

另，對於批量生產出來之光學鏡片，其需再經過後續處理才能應用於攝像器件中，如藉由物理或化學方法，於光學鏡片表面鍍上單一或多層膜層，以利用入射、反射及透射光於薄膜層介面產生之干涉作用實現聚焦、准直、濾光、反射及折射等效果。 In addition, for mass-produced optical lenses, they need to be processed later to be applied to the imaging device. For example, physical or chemical methods are applied to the surface of the optical lens by applying a single or multiple layers to take advantage of incidence, reflection and transmission. The interference generated by the interface of the thin film layer achieves effects such as focusing, collimation, filtering, reflection, and refraction.

惟，於對光學鏡片進行鍍膜時，先前技術需要採用夾具對光學鏡片之邊緣進行夾持，這使得光學鏡片上鄰近於被夾持之區域難以鍍上膜層，這樣就造成了膜層分佈不均勻之現象，並導致光學鏡片無法發揮應有之光學成像作用。 However, in the coating of optical lenses, the prior art requires the use of a clamp to clamp the edges of the optical lens, which makes it difficult to apply a film layer on the optical lens adjacent to the clamped region, thus resulting in a film layer distribution. Uniformity and the inability of the optical lens to perform its proper optical imaging.

針對膜層分佈不均勻之問題，傳統之解決方式係增大光學鏡片之尺寸，以使膜層分佈不均之區域儘量局限於光學有效區域外，惟，於要求小型化鏡片之今天，需要尋求其他之解決方式。 In view of the problem of uneven distribution of the film layer, the conventional solution is to increase the size of the optical lens, so that the area where the film layer is unevenly distributed is limited to the optical effective area as much as possible. However, in order to reduce the size of the lens, it is necessary to seek Other solutions.

有鑒於此，有必要提供一種鍍膜鏡片之製作方法，其可根據光學鏡片之尺寸需要來製作光學鏡片，並可對光學鏡片進行鍍膜以獲得具較均勻膜層厚度之鍍膜鏡片。同樣地，有必要提供一種相對應之鍍膜鏡片。 In view of the above, it is necessary to provide a method for fabricating a coated lens which can be made into an optical lens according to the size of the optical lens, and can be coated on the optical lens to obtain a coated lens having a relatively uniform film thickness. Similarly, it is necessary to provide a corresponding coated lens.

一種鍍膜鏡片之製作方法，其包括以下步驟：提供一基底，該基底包括相對之一第一表面及一第二表面；對該基底之第一表面進行光學鍍膜；沿該基底之第二表面對該基底進行多次蝕刻，以形成鍍膜鏡片之光學成像區域；切割該基底以得到複數鍍膜鏡片。 A method of fabricating a coated lens, comprising the steps of: providing a substrate comprising a first surface and a second surface; optically coating the first surface of the substrate; The substrate is etched multiple times to form an optical imaging area of the coated lens; the substrate is diced to obtain a plurality of coated lenses.

一種鍍膜鏡片，其包括一基底，該基底包括相對之一第一側及一第二側，該第一側上形成一光學膜層，該基底由第二側向內蝕刻 形成鍍膜鏡片之光學成像區域。 A coated lens comprising a substrate, the substrate comprising a first side and a second side, the first side forming an optical film layer, the substrate being etched by the second side An optical imaging area of the coated lens is formed.

相對於先前技術，該鍍膜鏡片及其製作方法，其首先於基底之第一表面上進行光學鍍膜，然後沿該基底之第二表面對該基底進行多次蝕刻，再切割該基底，從而最終得到複數鍍膜鏡片，其優點在於：一方面，可根據光學鏡片之尺寸需要來製作光學鏡片，從而減免了由於生產不同尺寸光學鏡片所需要之更換設備之成本；另一方面，可一次性對基底進行鍍膜，從而無須於光學鏡片製作完成後對每一光學鏡片單獨進行鍍膜，既提高了製作鍍膜鏡片之效率，又提高了製成後鍍膜鏡片之良品率。 Compared with the prior art, the coated lens and the manufacturing method thereof are first optically coated on the first surface of the substrate, and then the substrate is etched multiple times along the second surface of the substrate, and then the substrate is cut, thereby finally obtaining The advantage of a plurality of coated lenses is that, on the one hand, the optical lenses can be made according to the size requirements of the optical lenses, thereby reducing the cost of replacing the devices required for producing different sizes of optical lenses; on the other hand, the substrate can be made at one time. The coating eliminates the need to separately coat each optical lens after the optical lens is completed, which not only improves the efficiency of the coated lens, but also improves the yield of the coated lens.

20‧‧‧基底 20‧‧‧Base

40‧‧‧鍍膜鏡片 40‧‧‧coated lenses

200‧‧‧第一表面 200‧‧‧ first surface

202‧‧‧第二表面 202‧‧‧ second surface

210‧‧‧光學膜層 210‧‧‧Optical film layer

220‧‧‧第一光阻區 220‧‧‧First photoresist zone

230‧‧‧第一蝕刻層 230‧‧‧First etching layer

240‧‧‧第二光阻區 240‧‧‧second photoresist zone

250‧‧‧第二蝕刻層 250‧‧‧Second etching layer

260‧‧‧第三光阻區 260‧‧‧ Third photoresist zone

270‧‧‧第三蝕刻層 270‧‧‧ third etching layer

300‧‧‧光學成像區域 300‧‧‧Optical imaging area

2020‧‧‧第一光阻層 2020‧‧‧First photoresist layer

2300、2500‧‧‧表面 2300, 2500‧‧‧ surface

圖1係本發明實施例提供之鍍膜鏡片製作方法之流程圖。 FIG. 1 is a flow chart of a method for fabricating a coated lens according to an embodiment of the present invention.

圖2至圖11係本發明實施例提供之鍍膜鏡片製作方法之過程示意圖。 FIG. 2 to FIG. 11 are schematic diagrams showing processes of a method for fabricating a coated lens according to an embodiment of the present invention.

圖12採用本發明實施例提供之鍍膜鏡片製作方法製作所得之紅外截止濾光片之結構示意圖。 FIG. 12 is a schematic structural view of an infrared cut filter obtained by using the coated lens manufacturing method provided by the embodiment of the present invention.

下面將結合圖式，以對本發明作進一步之詳細說明。 The invention will be further described in detail below with reference to the drawings.

請參閱圖1，為本發明實施例提供之鍍膜鏡片製作方法之流程圖。該鍍膜鏡片之製作方法包括以下步驟：提供一基底，該基底包括相對之一第一表面及一第二表面；對該基底之第一表面進行光學鍍膜；沿該基底之第二表面對該基底進行多次蝕刻，以形成鍍膜鏡片之光學成像區域；切割該基底以得到複數鍍膜鏡片。 Please refer to FIG. 1 , which is a flowchart of a method for fabricating a coated lens according to an embodiment of the present invention. The method for fabricating the coated lens comprises the steps of: providing a substrate comprising a first surface and a second surface; optically coating the first surface of the substrate; and the substrate along the second surface of the substrate Multiple etchings are performed to form an optical imaging area of the coated lens; the substrate is cut to obtain a plurality of coated lenses.

請參閱圖2至圖11，為本發明實施例提供之鍍膜鏡片製作方法之過程示意圖，其用以製作一具有紅外截止膜之鏡片。 Please refer to FIG. 2 to FIG. 11 , which are schematic diagrams of processes for fabricating a coated lens according to an embodiment of the present invention for fabricating a lens having an infrared cut-off film.

如圖2所示，首先提供一具有一定厚度之基底20，包括相對之一第一表面200及一第二表面202。該基底20之材料可為玻璃，其具體厚度根據鍍膜鏡片光學設計時所需之厚度來決定。當然，該基底20之材料亦可為塑膠，例如：聚甲基丙烯酸甲酯(PMMA)，聚碳酸脂(Poly Carbonate,PC)等。 As shown in FIG. 2, a substrate 20 having a certain thickness is provided, including a first surface 200 and a second surface 202. The material of the substrate 20 may be glass, and the specific thickness thereof is determined according to the thickness required for optical design of the coated lens. Of course, the material of the substrate 20 may also be a plastic, such as polymethyl methacrylate (PMMA), polycarbonate (Poly Carbonate, PC) or the like.

將基底20放置於蒸鍍機(圖未示)中，利用吸嘴由第二表面202吸取基底20，開啟蒸鍍機即可於基底20之第一表面200上鍍上光學膜層210，如紅外截止濾光膜(IR Cut Filter Coating)。不限於本實施例，該光學膜層210亦可為其他類型之膜層。當然，本發明還可採用其他鍍膜方法，如濺鍍(Sputtering)法來對基底20之第一表面200進行鍍膜。 The substrate 20 is placed in a vapor deposition machine (not shown), and the substrate 20 is sucked from the second surface 202 by the nozzle. The vapor deposition machine is turned on to apply the optical film layer 210 on the first surface 200 of the substrate 20, such as IR Cut Filter Coating. Not limited to this embodiment, the optical film layer 210 may also be other types of film layers. Of course, the present invention may also employ other coating methods, such as sputtering, to coat the first surface 200 of the substrate 20.

如圖3所示，接著，將基底20由蒸鍍機中取出，並於基底20之第二表面202上塗佈上一第一光阻層2020。然後，對該第一光阻層2020進行曝光顯影。如圖4所示，該第一光阻層2020經曝光顯影後成為複數彼此分離，且形狀為圓周形之第一光阻區220(圖4示出三個，具體數量根據所要製作之紅外截止濾光片之數量來設定)。此時，即可使用處理液，如HF腐蝕液(氫氟酸)將未被第一光阻區220遮擋之區域腐蝕去除，以形成複數對應於第一光阻區220之第一蝕刻層230，如圖5所示。 As shown in FIG. 3, the substrate 20 is then removed from the vapor deposition apparatus and a first photoresist layer 2020 is applied over the second surface 202 of the substrate 20. Then, the first photoresist layer 2020 is subjected to exposure development. As shown in FIG. 4, the first photoresist layer 2020 is exposed to a plurality of first photoresist regions 220 which are separated from each other and have a circular shape (FIG. 4 shows three, and the specific number is determined according to the infrared cutoff to be produced. The number of filters is set). At this time, the treatment layer, such as HF etching solution (hydrofluoric acid), can be used to etch away the region not blocked by the first photoresist region 220 to form a plurality of first etching layers 230 corresponding to the first photoresist region 220. As shown in Figure 5.

進一步地，如圖6所示，於被蝕刻掉之表面2300上再塗佈上一第 二光阻層(未標示)。該第二光阻層經曝光顯影後成為複數彼此分離，且形狀為圓環形之第二光阻區240。該複數第二光阻區240分別環繞該複數第一蝕刻層230。可理解，當使用處理液將該表面2300上未被第一、第二光阻區220、240遮擋之區域腐蝕去除時，可形成複數圓周形之第二蝕刻層250，如圖7所示，該複數第二蝕刻層250分別位於複數第一蝕刻層230之下方，並與該複數第一蝕刻層230呈階梯狀層疊。 Further, as shown in FIG. 6, the second surface is etched on the etched surface 2300. Two photoresist layers (not shown). After the exposure and development, the second photoresist layer becomes a plurality of second photoresist regions 240 separated from each other and having a circular shape. The plurality of second photoresist regions 240 surround the plurality of first etch layers 230, respectively. It can be understood that when the surface of the surface 2300 that is not blocked by the first and second photoresist regions 220, 240 is etched away using the processing liquid, a plurality of second etching layers 250 can be formed, as shown in FIG. The plurality of second etch layers 250 are respectively located below the plurality of first etch layers 230 and are stacked in a stepped manner with the plurality of first etch layers 230.

當第二蝕刻層250形成之後，相類似地，於被蝕刻掉之表面2500上再塗佈一第三光阻層(未標示)，以經曝光顯影後形成複數圓環形之第三光阻區260，且該第三光阻區260分別環繞該複數第二蝕刻層250，如圖8所示。進一步地，當使用處理液將該表面2500上未被第一、第二、第三光阻區220、240、260遮擋之區域腐蝕去除時，可形成複數圓周形之第三蝕刻層270，如圖9所示。 After the second etch layer 250 is formed, similarly, a third photoresist layer (not labeled) is coated on the etched surface 2500 to form a plurality of circular third photoresists after exposure and development. A region 260, and the third photoresist region 260 surrounds the plurality of second etch layers 250, respectively, as shown in FIG. Further, when the surface of the surface 2500 that is not blocked by the first, second, and third photoresist regions 220, 240, 260 is etched away using the processing liquid, a plurality of third etching layers 270 may be formed, such as Figure 9 shows.

以上蝕刻步驟可被多次實施，以形成如圖10所示之基底20，該基底20具有複數蝕刻層(包括上述第一、第二、第三蝕刻層230、250、270)，且該複數蝕刻層成階梯狀相互重疊於一起。可理解，該每一蝕刻層均為圓周形，且當後蝕刻所形成之蝕刻層較先蝕刻所形成之蝕刻層之半徑呈正弦波形逐漸增大時(如圖10所示，第三蝕刻層270之半徑大於第二蝕刻層250之半徑，而第二蝕刻層250之半徑大於第一蝕刻層230之半徑)，該複數蝕刻層可近似形成一球面，亦即該複數蝕刻層形成對應於各紅外截止濾光片之光學成像區域300。 The above etching step may be performed a plurality of times to form the substrate 20 as shown in FIG. 10, the substrate 20 having a plurality of etching layers (including the first, second, and third etching layers 230, 250, 270), and the plural The etched layers are stacked one on another in a stepped manner. It can be understood that each of the etching layers is circumferential, and when the etching layer formed by the post etching is gradually increased in sinusoidal waveform by the etching of the etching layer formed by the first etching (as shown in FIG. 10, the third etching layer) The radius of 270 is greater than the radius of the second etch layer 250, and the radius of the second etch layer 250 is greater than the radius of the first etch layer 230. The plurality of etch layers may form a spherical surface, that is, the complex etch layer is formed corresponding to each Optical imaging area 300 of the infrared cut filter.

本領域技術人員還可理解，為使該複數蝕刻層所形成之球面較為 平滑，每個蝕刻層之厚度應盡可能製作得較小。 Those skilled in the art can also understand that in order to make the spherical surface formed by the complex etching layer Smooth, the thickness of each etch layer should be made as small as possible.

當蝕刻所形成之複數蝕刻層之總厚度滿足光學成像要求時，即可採用光阻去除液將製作該複數蝕刻層時所塗佈之複數光阻層(包括上述第一、第二、第三光阻區220、240、260)一次溶解掉，從而得到包括複數紅外截止濾光片結構之鍍膜基底20，如圖11所示。 When the total thickness of the plurality of etch layers formed by the etching satisfies the requirements of optical imaging, the photoresist layer may be used to form the plurality of photoresist layers (including the first, second, and third layers described above) when the plurality of etch layers are formed. The photoresist regions 220, 240, 260) are once dissolved, thereby obtaining a coated substrate 20 comprising a plurality of infrared cut filter structures, as shown in FIG.

接著，可使用晶圓切割機(圖未示)對該鍍膜基底20進行切割，得到如圖12所示之紅外截止濾光片40。該晶圓切割機可為石英晶圓切割機、矽晶圓切割機或者紫外鐳射晶圓切割機。 Next, the coated substrate 20 can be cut using a wafer dicing machine (not shown) to obtain an infrared cut filter 40 as shown in FIG. The wafer cutting machine can be a quartz wafer cutting machine, a silicon wafer cutting machine or an ultraviolet laser wafer cutting machine.

如圖12所示，該紅外截止濾光片40包括一基底20，一光學膜層210及一光學成像區域300，其中，該光學膜層210形成於該基底20之第一表面200上，該光學成像區域300由複數蝕刻層(包括第一、第二、第三蝕刻層230、250、270)所組成。 As shown in FIG. 12, the infrared cut filter 40 includes a substrate 20, an optical film layer 210 and an optical imaging region 300, wherein the optical film layer 210 is formed on the first surface 200 of the substrate 20. Optical imaging region 300 is comprised of a plurality of etch layers (including first, second, and third etch layers 230, 250, 270).

本發明實施例該鍍膜鏡片及其製作方法，其首先於基底20之第一表面200上進行光學鍍膜，然後沿該基底20之第二表面202對該基底20進行多次光蝕刻，再切割該基底20，從而最終得到複數鍍膜鏡片40，其優點在於：一方面，可根據光學鏡片之尺寸需要來製作光學鏡片，從而減免了由於生產不同尺寸光學鏡片所需要之更換設備之成本；另一方面，可一次性對基底20進行鍍膜，從而無須於光學鏡片製作完成後對每一光學鏡片單獨進行鍍膜，既提高了製作鍍膜鏡片40之效率，又提高了製成後鍍膜鏡片40之良品率。 The coated lens and the manufacturing method thereof are firstly optically coated on the first surface 200 of the substrate 20, and then the substrate 20 is photoetched multiple times along the second surface 202 of the substrate 20, and then the substrate is cut. The substrate 20, thereby finally obtaining the plurality of coated lenses 40, has the advantages that, on the one hand, the optical lenses can be made according to the size requirements of the optical lenses, thereby reducing the cost of replacing the devices required for producing different sizes of optical lenses; The substrate 20 can be coated at one time, so that each optical lens is not separately coated after the optical lens is completed, which not only improves the efficiency of the coated lens 40, but also improves the yield of the coated lens 40.

綜上所述，本發明確已符合發明專利之要件，遂依法提出專利申請。惟，以上所述者僅為本發明之較佳實施方式，自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士爰依本發明之精神所作之等效修飾或變化，皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

Claims (7)

一種鍍膜鏡片之製作方法，其包括以下步驟：提供一基底，該基底包括相對之一第一表面及一第二表面；對該基底之第一表面進行光學鍍膜；採用光蝕刻技術沿該基底之第二表面對該基底進行多次蝕刻，以形成鍍膜鏡片之光學成像區域，每次蝕刻包括以下步驟：沿該基底之該第二表面塗佈光阻層；對該光阻層進行曝光顯影；及利用處理液將該基底之該第二表面上將未被光阻層遮擋之區域腐蝕去除；以及切割該基底以得到複數鍍膜鏡片。 A method of fabricating a coated lens, comprising the steps of: providing a substrate comprising a first surface and a second surface; optically coating the first surface of the substrate; and etching the substrate along the substrate by photolithography The second surface is etched multiple times to form an optical imaging region of the coated lens, and each etching includes the steps of: coating a photoresist layer along the second surface of the substrate; and exposing and developing the photoresist layer; And etching, by using the treatment liquid, the region on the second surface of the substrate that is not blocked by the photoresist layer; and cutting the substrate to obtain a plurality of coated lenses. 如申請專利範圍第1項所述之鍍膜鏡片之製作方法，其中，該基底之材料為玻璃。 The method for producing a coated lens according to claim 1, wherein the material of the substrate is glass. 如申請專利範圍第1項所述之鍍膜鏡片之製作方法，其中，對該基底之該第一表面進行光學鍍膜採用蒸鍍或濺鍍之方法。 The method for producing a coated lens according to claim 1, wherein the first surface of the substrate is subjected to vapor deposition or sputtering by optical coating. 如申請專利範圍第1項所述之鍍膜鏡片之製作方法，其中，切割該基底時使用晶圓切割機進行作業。 The method for producing a coated lens according to claim 1, wherein the substrate is cut using a wafer cutter. 如申請專利範圍第1項所述之鍍膜鏡片之製作方法，其中，將該基底之該第二表面上未顯影被光阻層遮擋之區域腐蝕去除使用之處理液為氫氟酸。 The method for producing a coated lens according to claim 1, wherein the treatment liquid for etching and removing the region on the second surface of the substrate that is not developed by the photoresist layer is hydrofluoric acid. 如申請專利範圍第1項所述之鍍膜鏡片之製作方法，其中，對該基底之該第一表面進行光學鍍膜時鍍上紅外截止膜。 The method for producing a coated lens according to claim 1, wherein the first surface of the substrate is optically plated with an infrared cut film. 一種鍍膜鏡片，其包括：一基底，該基底包括相對之一第一側及 一第二側，該第一側上形成一光學膜層，該基底由該第二側向內蝕刻形成鍍膜鏡片之光學成像區域，該光學成像區域由階梯狀相互重疊於一起至複數蝕刻層組成。 A coated lens comprising: a substrate comprising a first side opposite to a second side, an optical film layer is formed on the first side, and the substrate is etched inwardly from the second side to form an optical imaging region of the coated lens, wherein the optical imaging region is overlapped with each other to form a plurality of etching layers .