TWI385831B - - Google Patents

Info

Publication number
TWI385831B
TWI385831B TW98109726A TW98109726A TWI385831B TW I385831 B TWI385831 B TW I385831B TW 98109726 A TW98109726 A TW 98109726A TW 98109726 A TW98109726 A TW 98109726A TW I385831 B TWI385831 B TW I385831B
Authority
TW
Taiwan
Application number
TW98109726A
Other languages
Chinese (zh)
Other versions
TW201036203A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW98109726A priority Critical patent/TW201036203A/en
Publication of TW201036203A publication Critical patent/TW201036203A/en
Application granted granted Critical
Publication of TWI385831B publication Critical patent/TWI385831B/zh

Links

TW98109726A 2009-03-25 2009-03-25 GaN-series LED containing Mg-doped layer TW201036203A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW98109726A TW201036203A (en) 2009-03-25 2009-03-25 GaN-series LED containing Mg-doped layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW98109726A TW201036203A (en) 2009-03-25 2009-03-25 GaN-series LED containing Mg-doped layer

Publications (2)

Publication Number Publication Date
TW201036203A TW201036203A (en) 2010-10-01
TWI385831B true TWI385831B (en) 2013-02-11

Family

ID=44856146

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98109726A TW201036203A (en) 2009-03-25 2009-03-25 GaN-series LED containing Mg-doped layer

Country Status (1)

Country Link
TW (1) TW201036203A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200620423A (en) * 2004-08-24 2006-06-16 Toshiba Kk Semiconductor substrate and semiconductor device manufactured by epitaxial growth on the semiconductor substrate
TW200701579A (en) * 2005-04-01 2007-01-01 Sharp Kk Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200620423A (en) * 2004-08-24 2006-06-16 Toshiba Kk Semiconductor substrate and semiconductor device manufactured by epitaxial growth on the semiconductor substrate
TW200701579A (en) * 2005-04-01 2007-01-01 Sharp Kk Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method

Also Published As

Publication number Publication date
TW201036203A (en) 2010-10-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees