TWI385831B - - Google Patents
Info
- Publication number
- TWI385831B TWI385831B TW98109726A TW98109726A TWI385831B TW I385831 B TWI385831 B TW I385831B TW 98109726 A TW98109726 A TW 98109726A TW 98109726 A TW98109726 A TW 98109726A TW I385831 B TWI385831 B TW I385831B
- Authority
- TW
- Taiwan
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98109726A TW201036203A (en) | 2009-03-25 | 2009-03-25 | GaN-series LED containing Mg-doped layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98109726A TW201036203A (en) | 2009-03-25 | 2009-03-25 | GaN-series LED containing Mg-doped layer |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201036203A TW201036203A (en) | 2010-10-01 |
TWI385831B true TWI385831B (en) | 2013-02-11 |
Family
ID=44856146
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98109726A TW201036203A (en) | 2009-03-25 | 2009-03-25 | GaN-series LED containing Mg-doped layer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201036203A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200620423A (en) * | 2004-08-24 | 2006-06-16 | Toshiba Kk | Semiconductor substrate and semiconductor device manufactured by epitaxial growth on the semiconductor substrate |
TW200701579A (en) * | 2005-04-01 | 2007-01-01 | Sharp Kk | Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method |
-
2009
- 2009-03-25 TW TW98109726A patent/TW201036203A/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200620423A (en) * | 2004-08-24 | 2006-06-16 | Toshiba Kk | Semiconductor substrate and semiconductor device manufactured by epitaxial growth on the semiconductor substrate |
TW200701579A (en) * | 2005-04-01 | 2007-01-01 | Sharp Kk | Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method |
Also Published As
Publication number | Publication date |
---|---|
TW201036203A (en) | 2010-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |