TWI370912B - Optical system and method for the production of microstructured components by microlithography - Google Patents

Optical system and method for the production of microstructured components by microlithography

Info

Publication number
TWI370912B
TWI370912B TW093135909A TW93135909A TWI370912B TW I370912 B TWI370912 B TW I370912B TW 093135909 A TW093135909 A TW 093135909A TW 93135909 A TW93135909 A TW 93135909A TW I370912 B TWI370912 B TW I370912B
Authority
TW
Taiwan
Prior art keywords
microlithography
production
optical system
microstructured components
microstructured
Prior art date
Application number
TW093135909A
Other languages
English (en)
Other versions
TW200519416A (en
Inventor
Drahmer Daniel
Ulrich Wilhelm
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW200519416A publication Critical patent/TW200519416A/zh
Application granted granted Critical
Publication of TWI370912B publication Critical patent/TWI370912B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
TW093135909A 2003-11-28 2004-11-22 Optical system and method for the production of microstructured components by microlithography TWI370912B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10355725A DE10355725A1 (de) 2003-11-28 2003-11-28 Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile

Publications (2)

Publication Number Publication Date
TW200519416A TW200519416A (en) 2005-06-16
TWI370912B true TWI370912B (en) 2012-08-21

Family

ID=34625360

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093135909A TWI370912B (en) 2003-11-28 2004-11-22 Optical system and method for the production of microstructured components by microlithography

Country Status (4)

Country Link
US (2) US7317508B2 (zh)
DE (1) DE10355725A1 (zh)
TW (1) TWI370912B (zh)
WO (1) WO2005054954A2 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
KR20080043835A (ko) 2005-09-14 2008-05-19 칼 짜이스 에스엠테 아게 마이크로리소그래피용 노광 시스템의 광학 시스템
DE102005060517A1 (de) * 2005-12-12 2007-06-21 Carl Zeiss Smt Ag Belastungsfester Prismenpolarisator
WO2007096250A1 (de) 2006-02-21 2007-08-30 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
DE102006008357A1 (de) * 2006-02-21 2007-08-30 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
KR101379096B1 (ko) 2006-06-16 2014-03-28 칼 짜이스 에스엠티 게엠베하 마이크로 리소그라피 투사 노광 장치의 투사 대물렌즈
US8023104B2 (en) 2007-01-22 2011-09-20 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus
DE102010036073A1 (de) 2010-09-01 2012-03-01 Carl Zeiss Microlmaging Gmbh Lichtmikroskop und optisches Modul
DE102012212852A1 (de) 2012-07-23 2013-09-05 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012213553A1 (de) * 2012-08-01 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012216532A1 (de) 2012-09-17 2013-09-12 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012218125A1 (de) 2012-10-04 2013-11-07 Carl Zeiss Smt Gmbh Axikonsystem, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102018218496A1 (de) 2018-10-29 2018-12-13 Carl Zeiss Smt Gmbh Verfahren zum Manipulieren der Systemretardierung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage
CN109387951B (zh) * 2018-12-07 2023-09-22 中国工程物理研究院激光聚变研究中心 一种单口径电光开关的装校工艺

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5986733A (en) * 1993-04-30 1999-11-16 Rockwell International Corporation Negative optical compensator tilted in respect to liquid crystal cell for liquid crystal display
WO2002093209A2 (de) 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
US6775063B2 (en) 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
US6785051B2 (en) * 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
JP2003161882A (ja) 2001-11-29 2003-06-06 Nikon Corp 投影光学系、露光装置および露光方法
US7075721B2 (en) * 2002-03-06 2006-07-11 Corning Incorporated Compensator for radially symmetric birefringence

Also Published As

Publication number Publication date
TW200519416A (en) 2005-06-16
DE10355725A1 (de) 2005-06-30
US20080088816A1 (en) 2008-04-17
US20050146798A1 (en) 2005-07-07
WO2005054954A3 (en) 2005-11-24
WO2005054954A2 (en) 2005-06-16
US7483121B2 (en) 2009-01-27
US7317508B2 (en) 2008-01-08

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