TWI370912B - Optical system and method for the production of microstructured components by microlithography - Google Patents
Optical system and method for the production of microstructured components by microlithographyInfo
- Publication number
- TWI370912B TWI370912B TW093135909A TW93135909A TWI370912B TW I370912 B TWI370912 B TW I370912B TW 093135909 A TW093135909 A TW 093135909A TW 93135909 A TW93135909 A TW 93135909A TW I370912 B TWI370912 B TW I370912B
- Authority
- TW
- Taiwan
- Prior art keywords
- microlithography
- production
- optical system
- microstructured components
- microstructured
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000001393 microlithography Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10355725A DE10355725A1 (de) | 2003-11-28 | 2003-11-28 | Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200519416A TW200519416A (en) | 2005-06-16 |
TWI370912B true TWI370912B (en) | 2012-08-21 |
Family
ID=34625360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093135909A TWI370912B (en) | 2003-11-28 | 2004-11-22 | Optical system and method for the production of microstructured components by microlithography |
Country Status (4)
Country | Link |
---|---|
US (2) | US7317508B2 (zh) |
DE (1) | DE10355725A1 (zh) |
TW (1) | TWI370912B (zh) |
WO (1) | WO2005054954A2 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7239450B2 (en) | 2004-11-22 | 2007-07-03 | Carl Zeiss Smt Ag | Method of determining lens materials for a projection exposure apparatus |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
KR20080043835A (ko) | 2005-09-14 | 2008-05-19 | 칼 짜이스 에스엠테 아게 | 마이크로리소그래피용 노광 시스템의 광학 시스템 |
DE102005060517A1 (de) * | 2005-12-12 | 2007-06-21 | Carl Zeiss Smt Ag | Belastungsfester Prismenpolarisator |
WO2007096250A1 (de) | 2006-02-21 | 2007-08-30 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage |
DE102006008357A1 (de) * | 2006-02-21 | 2007-08-30 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
KR101379096B1 (ko) | 2006-06-16 | 2014-03-28 | 칼 짜이스 에스엠티 게엠베하 | 마이크로 리소그라피 투사 노광 장치의 투사 대물렌즈 |
US8023104B2 (en) | 2007-01-22 | 2011-09-20 | Carl Zeiss Smt Gmbh | Microlithographic projection exposure apparatus |
DE102010036073A1 (de) | 2010-09-01 | 2012-03-01 | Carl Zeiss Microlmaging Gmbh | Lichtmikroskop und optisches Modul |
DE102012212852A1 (de) | 2012-07-23 | 2013-09-05 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
DE102012213553A1 (de) * | 2012-08-01 | 2013-08-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
DE102012216532A1 (de) | 2012-09-17 | 2013-09-12 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
DE102012218125A1 (de) | 2012-10-04 | 2013-11-07 | Carl Zeiss Smt Gmbh | Axikonsystem, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
DE102018218496A1 (de) | 2018-10-29 | 2018-12-13 | Carl Zeiss Smt Gmbh | Verfahren zum Manipulieren der Systemretardierung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage |
CN109387951B (zh) * | 2018-12-07 | 2023-09-22 | 中国工程物理研究院激光聚变研究中心 | 一种单口径电光开关的装校工艺 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5986733A (en) * | 1993-04-30 | 1999-11-16 | Rockwell International Corporation | Negative optical compensator tilted in respect to liquid crystal cell for liquid crystal display |
WO2002093209A2 (de) | 2001-05-15 | 2002-11-21 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
US6683710B2 (en) | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
US6831731B2 (en) * | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
US6785051B2 (en) * | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
JP2003161882A (ja) | 2001-11-29 | 2003-06-06 | Nikon Corp | 投影光学系、露光装置および露光方法 |
US7075721B2 (en) * | 2002-03-06 | 2006-07-11 | Corning Incorporated | Compensator for radially symmetric birefringence |
-
2003
- 2003-11-28 DE DE10355725A patent/DE10355725A1/de not_active Withdrawn
-
2004
- 2004-11-22 TW TW093135909A patent/TWI370912B/zh active
- 2004-11-23 WO PCT/EP2004/013259 patent/WO2005054954A2/en active Application Filing
- 2004-11-24 US US10/997,455 patent/US7317508B2/en not_active Expired - Fee Related
-
2007
- 2007-12-04 US US11/949,981 patent/US7483121B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW200519416A (en) | 2005-06-16 |
DE10355725A1 (de) | 2005-06-30 |
US20080088816A1 (en) | 2008-04-17 |
US20050146798A1 (en) | 2005-07-07 |
WO2005054954A3 (en) | 2005-11-24 |
WO2005054954A2 (en) | 2005-06-16 |
US7483121B2 (en) | 2009-01-27 |
US7317508B2 (en) | 2008-01-08 |
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