TWI350315B - - Google Patents
Info
- Publication number
- TWI350315B TWI350315B TW093111666A TW93111666A TWI350315B TW I350315 B TWI350315 B TW I350315B TW 093111666 A TW093111666 A TW 093111666A TW 93111666 A TW93111666 A TW 93111666A TW I350315 B TWI350315 B TW I350315B
- Authority
- TW
- Taiwan
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0094—Reactive sputtering in transition mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10324556.1A DE10324556B4 (en) | 2003-05-30 | 2003-05-30 | Sputtering method and use of the method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200506081A TW200506081A (en) | 2005-02-16 |
TWI350315B true TWI350315B (en) | 2011-10-11 |
Family
ID=33441493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093111666A TW200506081A (en) | 2003-05-30 | 2004-04-27 | Cathode sputtering method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4541762B2 (en) |
DE (1) | DE10324556B4 (en) |
TW (1) | TW200506081A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8936702B2 (en) * | 2006-03-07 | 2015-01-20 | Micron Technology, Inc. | System and method for sputtering a tensile silicon nitride film |
ITRM20110308A1 (en) * | 2011-06-15 | 2012-12-16 | Gia E Lo Sviluppo Economico Sostenibile Enea | SELECTIVE SOLAR ABSORBER BASED ON CERMET MATERIALS OF THE DOUBLE NITRURE TYPE, AND ITS MANUFACTURING PROCEDURE |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0673528A (en) * | 1990-12-28 | 1994-03-15 | Mitsubishi Materials Corp | Coloring device and coloring method for metallic articles |
JPH09271652A (en) * | 1996-04-03 | 1997-10-21 | Nippon Sanso Kk | Mixed gas supply apparatus |
JPH10212578A (en) * | 1997-01-31 | 1998-08-11 | Sony Corp | Film forming device |
JP2001192821A (en) * | 2000-01-07 | 2001-07-17 | Nippon Sheet Glass Co Ltd | Method for depositing film on substrate, and article obtained by the method |
JP2003093896A (en) * | 2001-07-19 | 2003-04-02 | Toto Ltd | Method for forming photocatalyst titanium oxide film |
-
2003
- 2003-05-30 DE DE10324556.1A patent/DE10324556B4/en not_active Expired - Lifetime
-
2004
- 2004-04-27 TW TW093111666A patent/TW200506081A/en not_active IP Right Cessation
- 2004-05-28 JP JP2004160072A patent/JP4541762B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4541762B2 (en) | 2010-09-08 |
DE10324556B4 (en) | 2015-02-05 |
JP2004360073A (en) | 2004-12-24 |
TW200506081A (en) | 2005-02-16 |
DE10324556A1 (en) | 2004-12-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |