TWI300795B - Curable resin composition for die coating and process for producing color filter - Google Patents

Curable resin composition for die coating and process for producing color filter Download PDF

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Publication number
TWI300795B
TWI300795B TW091136634A TW91136634A TWI300795B TW I300795 B TWI300795 B TW I300795B TW 091136634 A TW091136634 A TW 091136634A TW 91136634 A TW91136634 A TW 91136634A TW I300795 B TWI300795 B TW I300795B
Authority
TW
Taiwan
Prior art keywords
component
solvent
resin composition
curable resin
solvent component
Prior art date
Application number
TW091136634A
Other languages
English (en)
Chinese (zh)
Other versions
TW200305617A (en
Inventor
Sako Naoki
Fujiwara Eisuke
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001252439A external-priority patent/JP4108303B2/ja
Priority claimed from JP2002118927A external-priority patent/JP2003138223A/ja
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200305617A publication Critical patent/TW200305617A/zh
Application granted granted Critical
Publication of TWI300795B publication Critical patent/TWI300795B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
TW091136634A 2001-08-21 2002-12-18 Curable resin composition for die coating and process for producing color filter TWI300795B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001249832 2001-08-21
JP2001252439A JP4108303B2 (ja) 2001-08-23 2001-08-23 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP2002118927A JP2003138223A (ja) 2001-08-21 2002-04-22 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置

Publications (2)

Publication Number Publication Date
TW200305617A TW200305617A (en) 2003-11-01
TWI300795B true TWI300795B (en) 2008-09-11

Family

ID=29267342

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091136634A TWI300795B (en) 2001-08-21 2002-12-18 Curable resin composition for die coating and process for producing color filter

Country Status (3)

Country Link
KR (1) KR100699731B1 (ko)
CN (1) CN1293151C (ko)
TW (1) TWI300795B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
CN1906524B (zh) * 2004-12-15 2012-12-26 三菱化学株式会社 液晶板用树脂组合物和使用其的滤色片以及液晶板
WO2006118094A1 (ja) * 2005-04-27 2006-11-09 Mitsubishi Chemical Corporation 硬化性組成物、硬化物及びこれを用いた液晶表示装置
JP4904869B2 (ja) * 2006-03-22 2012-03-28 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
TWI400303B (zh) * 2006-10-18 2013-07-01 Jsr Corp 顏料經分散組成物，噴墨系統彩色濾光器用樹脂組成物，彩色濾光器和液晶顯示器
JP4748323B2 (ja) * 2007-03-01 2011-08-17 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP2013242551A (ja) * 2012-04-25 2013-12-05 Sumitomo Chemical Co Ltd 感光性樹脂組成物
KR101548157B1 (ko) 2012-08-29 2015-08-28 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101486570B1 (ko) 2014-01-17 2015-01-26 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
US9760011B1 (en) * 2016-03-07 2017-09-12 Rohm And Haas Electronic Materials Llc Pattern trimming compositions and methods
KR20180124013A (ko) * 2016-03-25 2018-11-20 도레이 카부시키가이샤 착색 수지 조성물, 컬러 필터 기판, 및 액정 표시 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5039594A (en) * 1985-10-28 1991-08-13 Hoechst Celanese Corporation Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP3940523B2 (ja) * 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法

Also Published As

Publication number Publication date
TW200305617A (en) 2003-11-01
CN1293151C (zh) 2007-01-03
KR100699731B1 (ko) 2007-03-27
CN1453313A (zh) 2003-11-05
KR20030084568A (ko) 2003-11-01

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