TWI295145B

TWI295145B - Organic electro-luminescence device and manufacturing method thereof

Info

Publication number: TWI295145B
Application number: TW94127284A
Authority: TW
Inventors: pei yu Liu; Huai An Li; Yu Cheng Lo; Jiun Ming Wang
Original assignee: Chunghwa Picture Tubes Ltd
Priority date: 2005-08-11
Filing date: 2005-08-11
Publication date: 2008-03-21
Also published as: TW200708180A

Description

1295 l^iSwf.doc/y 九、發明說明：【發明所屬之技術領域】本發明是有關於一種發光元件及其製作方法，且特別是有關於一種有機電致發光元件及其製作方法。【先前技術】由於半導體元件以及顯示裝置的飛躍性進步，多媒體社會因而急速躍進。就顯示器而言，平面面板顯示器(FW Panel Display)因具有高晝質、較佳空間利用效率、較低消1295 l^iSwf.doc/y IX. Description of the Invention: [Technical Field] The present invention relates to a light-emitting element and a method of fabricating the same, and more particularly to an organic electroluminescent element and a method of fabricating the same. [Prior Art] Due to the dramatic advancement of semiconductor components and display devices, the multimedia society has rapidly advanced. As far as the display is concerned, the FW Panel Display has high enamel quality, better space utilization efficiency, and lower consumption.

耗功率以及無輻射等優越特性，因此取代傳統顯示裝置而逐漸成為市場之主流。平面面板顯示器包括液晶顯示器（Liquid Crystal Display，LCD )、有機電致發光顯示器（〇rganic ^eCtrOlUminescenceDisplay ’ 〇ELDisplay)以及電漿顯示益面板（Plasma Display Pane卜PDP)等等。其中，有機Power consumption and no radiation and other superior characteristics have gradually become the mainstream of the market in place of traditional display devices. The flat panel display includes a liquid crystal display (LCD), an organic electroluminescence display (〇rganic ^eCtrOlUminescenceDisplay ’ 〇ELDisplay), and a plasma display panel (Plasma Display Pane PDP). Among them, organic

電致發光顯示n為具有自發光性（Emissive)元件的點陣式顯示器’ I由於有機電致發光齡器具有無視角限制、低製造成本、高應答速度(約為液晶的百倍以上）、省電、工作溫度範圍大、重量輕且可隨硬體設備薄型化等優點， =合多媒體時侧示器㈣性要求，因此有機電致發光元 ^有極大的發展潛力，可望成為下—世代的新穎平不态。失考：= 為習知一種有機電致發光元件的剖面圖。請 ^圖！，有機電致發光元件配置於紐1〇〇 ±，其中圖。的阻隔層120具有多數個開口 122,而陽極層(an〇de 5 doc/y 1295 UL·. layer)l 10位於開口 122内，發光層i3〇位於開口 122内的 1%極層110上’且陰極層（c—ode iayer)i4〇配置於發光層 130上。在製作有機電致發光元件的過程中，通常會使用喷墨法將發光材料填入開口 122中以形成發光層13〇。然而，由於陽極層110以及阻隔層12〇的材質不同，所以陽極層110的表面與阻隔層12〇的側壁對於發光材料有不同的吸附性，會使所形成之發光層130的膜厚不均勻，而形成如圖2A所示之牛角現象(lipheight)。更甚者，若有多餘的發2材料殘留在阻隔層120上，更容易造成如圖2B所不之跨牆現象，亦即位於阻隔層12〇兩側的發光材料跨越阻隔層120，而混合在一起。 ^上述之問題皆會導致有機電致發光顯示器的製程良率下降，並使其顯示品質低落。因此，如何克服陽極層11〇 j及阻隔層120之不同材質介面，以形成均勻之發光層，實為提昇有機電致發光顯示器之製程良率與顯示品質二重要關鍵。 ' 【發明内容】一一有鑑於此，本發明的目的就是在提供一種有機電致發光讀的製作方法，以形成膜厚均勻之發光層，進而提升製程良率與顯示品質。本發明的再一目的是提供一種有機電致發光元件，其具有膜厚均勻之發光層，因此可提供較佳之顯示品質，並具有較高之製程良率。、基於上述或其他目的，本發明提出一種有機電致發光 I29SUL·. doc/y 讀的製作料，此心切法包括下狀步驟··首先提供 -基板’織於基板上形成—第_電極層，之後於基板上形成-阻隔層，且阻隔層具有多個用以暴露出第一電極層的開口，再於開口内之阻隔層的側壁以及第一電極層上形成-導電層，之後於開口_導電層上形成—發光層，最後於發光層上形成一第二電極層。在本發明之-較佳實施例中，形成第一電極層的步驟例如疋献基板上形成—電極材料層，然後微影與餘刻製程將電極材料層圖案化，以形成第—電極層。日、在本發明之一較佳實施例中，形成阻隔層的步驟例如二於基板上形成一阻隔材料層，並且對阻隔材料層進行曝光與顯影的步驟將阻隔材料層圖案化，以形成阻隔層，其中阻隔層的材質例如是感光材料。 ^在本發明之一較佳實施例中，形成導電層的步驟例如疋先於基板上形成一導電材料層，並且對電極材料層進行微影與蝕刻製程將導電材料層圖案化，以形成導電層。在本發明之一較佳實施例中，形成發光層的方法例如是喷墨法。本發明再提出一種有機電致發光元件，此元件包括、一基板、一第一電極層、一阻隔層、一導電層、一發光層以及一第二電極層，其中第一電極層配置於基板上，而阻隔層配置於基板上，且阻隔層具有多個用以暴露出第一電極層的開口。此外，導電層配置於開口内之圖案化阻隔層的側壁以及第一電極層上，而發光層配置於開口内的導電 1295 li4i5wfd〇c/y 層上，且第二電極層是配置於發光層上。在本發明之一較佳實施例中，基板例如是透明基板，且此透明基板之材質例如是玻璃。在本發明之一較佳實施例中，基板例如是主動元件陣列基板，且此主動元件陣列基板例如是薄膜電晶體陣列基板0Electroluminescence display n is a dot matrix display with self-luminous (Emissive) elements. I Because the organic electroluminescence device has no viewing angle limitation, low manufacturing cost, high response speed (about 100 times or more of liquid crystal), and power saving. The operating temperature range is large, the weight is light, and it can be thinned with the hardware equipment. In the case of multimedia, the side display device (4) requires the organic electroluminescence element to have great development potential, and it is expected to become the next generation. Innovative and flat. Missing test: = is a cross-sectional view of a conventional organic electroluminescent device. Please ^ map! The organic electroluminescent element is arranged in New Zealand, where the figure is shown. The barrier layer 120 has a plurality of openings 122, and an anode layer (an〇de 5 doc/y 1295 UL·. layer) 10 is located in the opening 122, and the light-emitting layer i3 is located on the 1% pole layer 110 in the opening 122. And a cathode layer (c-ode iayer) i4 is disposed on the light-emitting layer 130. In the process of fabricating an organic electroluminescent device, an illuminating material is usually filled into the opening 122 by an ink jet method to form a light-emitting layer 13A. However, since the materials of the anode layer 110 and the barrier layer 12 are different, the surface of the anode layer 110 and the sidewall of the barrier layer 12 have different adsorptivity to the luminescent material, and the film thickness of the formed luminescent layer 130 is not uniform. And a lipheight phenomenon as shown in FIG. 2A is formed. What is more, if there is excess hair 2 material remaining on the barrier layer 120, it is more likely to cause a cross-wall phenomenon as shown in FIG. 2B, that is, the luminescent material located on both sides of the barrier layer 12 跨越 spans the barrier layer 120, and is mixed. Together. ^ All of the above problems will cause the process yield of the organic electroluminescent display to decrease and the display quality to be low. Therefore, how to overcome the different material interfaces of the anode layer 11〇 and the barrier layer 120 to form a uniform light-emitting layer is the key to improving the process yield and display quality of the organic electroluminescent display. SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a method for fabricating an organic electro-optic read to form a light-emitting layer having a uniform film thickness, thereby improving process yield and display quality. A further object of the present invention is to provide an organic electroluminescent device having a light-emitting layer having a uniform film thickness, thereby providing better display quality and having a higher process yield. Based on the above or other objects, the present invention provides a preparation material for organic electroluminescence I29SUL·.doc/y reading, which includes a lower step. First, a substrate is formed on the substrate to form a _electrode layer. Forming a barrier layer on the substrate, and the barrier layer has a plurality of openings for exposing the first electrode layer, and then forming a conductive layer on the sidewalls of the barrier layer in the opening and the first electrode layer, and then opening the opening Forming a light-emitting layer on the conductive layer, and finally forming a second electrode layer on the light-emitting layer. In a preferred embodiment of the invention, the step of forming the first electrode layer, for example, forming a layer of electrode material on the substrate, and then patterning the layer of electrode material by the lithography and the etch process to form the first electrode layer. In a preferred embodiment of the present invention, the step of forming a barrier layer is, for example, forming a barrier material layer on the substrate, and the step of exposing and developing the barrier material layer patterns the barrier material layer to form a barrier layer. The layer, wherein the material of the barrier layer is, for example, a photosensitive material. In a preferred embodiment of the present invention, the step of forming a conductive layer is performed, for example, by forming a conductive material layer on the substrate, and performing a lithography and etching process on the electrode material layer to pattern the conductive material layer to form a conductive layer. Floor. In a preferred embodiment of the invention, the method of forming the luminescent layer is, for example, an ink jet method. The present invention further provides an organic electroluminescent device, the device comprising: a substrate, a first electrode layer, a barrier layer, a conductive layer, a light emitting layer and a second electrode layer, wherein the first electrode layer is disposed on the substrate And the barrier layer is disposed on the substrate, and the barrier layer has a plurality of openings for exposing the first electrode layer. In addition, the conductive layer is disposed on the sidewall of the patterned barrier layer and the first electrode layer in the opening, and the light emitting layer is disposed on the conductive layer 1295 li4i5wfd〇c/y layer in the opening, and the second electrode layer is disposed on the light emitting layer on. In a preferred embodiment of the invention, the substrate is, for example, a transparent substrate, and the material of the transparent substrate is, for example, glass. In a preferred embodiment of the present invention, the substrate is, for example, an active device array substrate, and the active device array substrate is, for example, a thin film transistor array substrate.

m 在本發明之一較佳實施例中，第一電極層的材質例如是透明導電材料，而此透明導電材料例如是銦錫氧化物 (indium tin oxide，ITO)或銦鋅氧化物(indium zinc oxide IZO)。，在本發明之一較佳實施例中，導電層的材質例如是透 j導電材料，而此透明導電材料例如是銦鍚氧化物或銦鋅在本發明之一較佳實施例中，發光層的材質分子有機發光材料。回發朵本發明之有機電致發光元件及其製作方法係在形成層之前，於有機電致發光元件的第一電極層上以及位弁二口内之阻隔層的側壁上先形成導電層。如此，由於有^形成在導電層上，亦即同—物質介面上，因此可i 製作=之膜厚。所以，藉由本發明有機電致發光元件及其 "方法可有效提升製程良率以及顯示品質。易憧為讓本發日仅上述和其他目的、特徵和優點能更明顯明如下了文特舉較佳實施例’並配合所附圖式，作詳細說 8 129514iSwf.d〇c/y * 【實施方式】圖3A〜31依序繪示為本發明一較佳實施例之有機電致發光元件的製作流程圖。如圖3A所示，首先提供一基板2〇〇。在一較佳實施例中，此基板200例如是一透明的玻璃基板，用以製作被動式有械電致發光顯示元件。在另一較佳實施例中，基板 200上更例如可形成有多個主動元件，其例如是薄膜電晶體陣列(thin film transistor array)，用以製作主動式有機電 • 致發光顯不兀件。然後於基板2〇0上利用例如物理氣相沈積法(physical vapor depositi〇n，pVD)或化學氣相沈積法 (chemical vapor deposition，CVD)形成一電極材料層 210。然後，如圖3B所示，對此電極材料層進行圖案化的步驟，以形成電極層212。其中，電極層212在欲製成的有機發光電致元件中例如是作為陽極。在一較佳實施例中，對電極材料層210進行圖案化的方法例如是微影製程與蝕刻製程。此外，電極層212例如是由透明導電材料 _ 所‘成，而此透明導電材料例如是銦錫氧化物或是銦鋅氧化物。之後如圖3C所示，於基板2〇〇上利用例如化學氣相沈積法以形成一阻隔材料層220，且阻隔材料層220會將電極層212覆蓋住，此阻隔材料層220的材質例如是感光材料。然後如圖3D以及圖3E所示，對阻隔材料層22〇進行曝光與顯影的步驟，以將阻隔材料層22〇圖案化形成阻隔 9 1295 ’ 層222,其中阻隔層222 少部份之電極層212。板20〇上利用例如物理氣相 L二氣目沈積法先形成—導電材料層23G，並且進行一圖案化的步驟。在-較佳實施例中，將¥電材料層230 _化的方法例如是微影與㈣製程0In a preferred embodiment of the present invention, the material of the first electrode layer is, for example, a transparent conductive material, and the transparent conductive material is, for example, indium tin oxide (ITO) or indium zinc oxide (indium zinc). Oxide IZO). In a preferred embodiment of the present invention, the material of the conductive layer is, for example, a transparent conductive material, and the transparent conductive material is, for example, indium antimony oxide or indium zinc. In a preferred embodiment of the present invention, the light emitting layer Material molecular organic luminescent material. The organic electroluminescent device of the present invention is produced and formed by forming a conductive layer on the first electrode layer of the organic electroluminescent device and on the sidewall of the barrier layer in the two openings before forming the layer. In this way, since the film is formed on the conductive layer, that is, on the same material interface, the film thickness can be made. Therefore, the organic electroluminescent device of the present invention and the method thereof can effectively improve the process yield and display quality. The above and other objects, features and advantages of the present invention will become more apparent from the following detailed description of the preferred embodiments of the present invention, and in conjunction with the accompanying drawings, 8 129514iSwf.d〇c/y* 3A to 31 are a flow chart showing the fabrication of an organic electroluminescent device according to a preferred embodiment of the present invention. As shown in FIG. 3A, a substrate 2 is first provided. In a preferred embodiment, the substrate 200 is, for example, a transparent glass substrate for making a passive electromechanical display element. In another preferred embodiment, the substrate 200 can be further formed with, for example, a plurality of active elements, such as a thin film transistor array, for making an active organic electroluminescence display. . Then, an electrode material layer 210 is formed on the substrate 2? by, for example, physical vapor deposition (pVD) or chemical vapor deposition (CVD). Then, as shown in Fig. 3B, the electrode material layer is patterned to form the electrode layer 212. Among them, the electrode layer 212 is, for example, an anode in the organic light-emitting element to be formed. In a preferred embodiment, the method of patterning the electrode material layer 210 is, for example, a lithography process and an etching process. Further, the electrode layer 212 is made of, for example, a transparent conductive material, and the transparent conductive material is, for example, indium tin oxide or indium zinc oxide. Then, as shown in FIG. 3C, a barrier material layer 220 is formed on the substrate 2 by, for example, chemical vapor deposition, and the barrier material layer 220 covers the electrode layer 212. The material of the barrier material layer 220 is, for example, Photosensitive material. Then, as shown in FIG. 3D and FIG. 3E, the barrier material layer 22 is exposed and developed to pattern the barrier material layer 22 to form a barrier 9 1295 'layer 222, wherein the barrier layer 222 has a small portion of the electrode layer. 212. On the plate 20, a conductive material layer 23G is first formed by, for example, physical vapor phase L gas deposition, and a patterning step is performed. In the preferred embodiment, the method of chemically oxidizing the layer 230 is, for example, lithography and (4) process 0

$如圖30所示’導電材料層23q圖案化後形成導電層且導電層232位於開口 224 _且隔層222側 f以f電極層212上，並暴露阻隔層222的頂面。值得注思的疋^此$電層232的材質例如是與電極層2丨2相同，為銦錫氧化物或銦辞氧化物等透明導電材料。，然後如圖3H所示，在開口 224所暴露的導電層加上形成叙光層240。在本實施例中，於導電層232上形成發光層240的方法例如是喷墨(inkjet)法，且發光層24〇的材質例如是高分子有機發光材料（ρ〇1—αAs shown in Fig. 30, the conductive material layer 23q is patterned to form a conductive layer and the conductive layer 232 is located on the opening 224 _ and the spacer 222 side f is on the f electrode layer 212, and the top surface of the barrier layer 222 is exposed. It is worth mentioning that the material of the electric layer 232 is, for example, the same as the electrode layer 2丨2, and is a transparent conductive material such as indium tin oxide or indium oxide. Then, as shown in FIG. 3H, a light-reducing layer 240 is formed on the conductive layer exposed by the opening 224. In the present embodiment, the method of forming the light-emitting layer 240 on the conductive layer 232 is, for example, an inkjet method, and the material of the light-emitting layer 24 is, for example, a polymer organic light-emitting material (ρ〇1-α).

具有多個開口 224,用以暴露出至然傻如圖3F所示There are a plurality of openings 224 for exposing it to the point of being as shown in Figure 3F.

Electro-Luminescent Material)。當然，在其他實施例中，本發明亦可利用蒸鍍法或其他適合的方式，形成材質為小分子有機發光材料(Sm^Electro-Luminescent Material). Of course, in other embodiments, the present invention can also be formed into a small molecule organic light-emitting material by using an evaporation method or other suitable method (Sm^).

Molecule Electro-Luminescent Material)的發光層 240。最後如圖31所示，於發光層240上利用例如物理氣相沈積法或化學氣相沈積法形成一電極層25〇，以完成有機電致發光元件的製作。其中，電極層250在有機電致發光元件中例如是作為陰極，且此電極層250的材質例如是銦 1295 doc/y 錫氧化物或是銦鋅氧化物等透明導電材料。請同時參考圖2A、圖2B以及圖31，值得注意的是，本發明之錢f致發光元件的製作方法是在將料層24〇形成於開口 224内之前’先在電極層212上以及阻隔層222 的側土幵^材質例如是銦錫氧化物或銦辞氧化物的導 3 232。形成此導電層232的主要目的在於使發光材料月匕=成在同-材質介面（即導電層232)上，以得到膜層厚Light-emitting layer 240 of Molecule Electro-Luminescent Material. Finally, as shown in Fig. 31, an electrode layer 25 is formed on the light-emitting layer 240 by, for example, physical vapor deposition or chemical vapor deposition to complete the fabrication of the organic electroluminescent device. The electrode layer 250 is, for example, a cathode in the organic electroluminescence device, and the material of the electrode layer 250 is, for example, a transparent conductive material such as indium 1295 doc/y tin oxide or indium zinc oxide. Referring to FIG. 2A, FIG. 2B and FIG. 31 at the same time, it is noted that the method of fabricating the light-emitting element of the present invention is performed on the electrode layer 212 and before the formation of the layer 24 is formed in the opening 224. The material of the layer 222 is, for example, a lead 3 232 of indium tin oxide or indium oxide. The main purpose of forming the conductive layer 232 is to make the luminescent material 匕成 = on the same material interface (ie, the conductive layer 232) to obtain the film thickness

^又為均勻的發光層24G。如此—來，將可有效避免習知、仓口圖2A所不之牛角現象或是如圖2B所示之跨踏現象，、_而提升使用本發明之有機電致發光元件的製程良率與顯不品質。此外明之有機電致發光元件的製作方法亦可以 ^其他需要於兩個不同材質介面上形成膜層的製程門而5 ’在製作彩色濾、光片時，可在形成具有多個 :H陣之後’先在黑矩_㈣與其所暴露之基板 =成—層光阻層或其他適用之材料層。之後，便可在此籲 :層上形成膜厚較為均勻的彩色濾光層，㈣提升彩色濾光片的製程良率。 θ上所述’本發明之有機電致發光元件及其製作方法 =有機電致發航件中的電極層頂面以及阻隔層的側壁導％㉟卩改善習知技術中由於兩種不同材質介面所 ==度不均勻的現象’進而提升顯示器的顯示品雖然本發明已以較佳實施例揭露如上，然其並非用以 11 1295 L45^£doc/y 限定本發明，任何熟習此技藝者，在不脫離本發明之和範圍内，當可作些許之更動與潤飾，因此本發= 範圍當視後附之申請專利範圍所界定者為準。乐濩【圖式簡單說明】 ’ ^繪示為習知一種有機電致發圖2A〜2B繪示為習知面圖。面圖。财機钱發光元件的剖^ Again a uniform luminescent layer 24G. In this way, the process yield of the organic electroluminescent device using the present invention can be effectively avoided by the conventional phenomenon, the horn phenomenon not shown in Fig. 2A or the straddle phenomenon as shown in Fig. 2B. No quality. In addition, the method for fabricating the organic electroluminescent device can also be used for other process gates that need to form a film layer on two different material interfaces, and 5' can be formed after forming a color filter or a light sheet. 'First in the black moment _ (four) and its exposed substrate = into a layer of photoresist layer or other suitable material layer. After that, it can be called to form a color filter layer with a relatively uniform film thickness on the layer, and (4) to improve the process yield of the color filter. The organic electroluminescent device of the present invention and the method for fabricating the same according to the above θ = the top surface of the electrode layer in the organic electrospinning device and the side wall of the barrier layer are improved by two different material interfaces in the prior art. The phenomenon of the degree of non-uniformity is further improved by the present invention. The scope of the present invention is defined by the scope of the appended claims.乐濩 [Simple description of the drawing] ′ ^ is shown as a conventional organic electroluminescence. Figs. 2A to 2B are diagrams showing a conventional surface. Surface map. Section of the light-emitting component

圖3A〜31繪不為本發明光元件的製作流程圖。【主要元件符號說明】較佳實施例之有機電致發 100、 200 ·基板 110 ：陽極層 120、 222 :阻隔層 122、 224 :開口 130、 240 :發光層 140 ：陰極層 210 ：電極材料層 212 ：第一電極層 220 ：阻隔材料層 230 ：導電材料層 232 ：導電層 250 ：第二電極層 123A to 31 are flowcharts showing the fabrication of the optical component of the present invention. [Description of Main Element Symbols] Organic Electroluminescence of Preferred Embodiments 100, 200. Substrate 110: Anode Layers 120, 222: Barrier Layers 122, 224: Openings 130, 240: Light Emitting Layer 140: Cathode Layer 210: Electrode Material Layer 212 : first electrode layer 220 : barrier material layer 230 : conductive material layer 232 : conductive layer 250 : second electrode layer 12

Claims

X295 ll^lSwf-d〇c/y 十、申請專利範圍： ι·一種有機電致發光元件的製作方法，包括：提供一基板；於该基板上形成一第一電極層；於該基板上形成-阻隔層，且該阻隔層口，用以暴露出該第-電極層；，夕数個開於該些開Π内之該阻隔層的㈣以及上形成一導電層；電極層X295 ll^lSwf-d〇c/y X. Patent application scope: ι. A method for fabricating an organic electroluminescence device, comprising: providing a substrate; forming a first electrode layer on the substrate; forming on the substrate a barrier layer, and the barrier layer is configured to expose the first electrode layer; and a plurality of conductive layers are formed on the barrier layer of the opening layer and the conductive layer is formed thereon;

於該些開口内的該導電層上形成一發光層. 於該些發光層上形成一第二電極層。θ，及製作利範圍第1項所述之有機電致發光元件的、方法，/、中形成該第一電極層的步驟包括·· 於6亥基板上形成一電極材料層；以及圖案化該電極材料層，以形成該第一電極層。 m f作=申ϊί利範圍第2項所述之有機電致‘光元件的與餘刻製程案化該電極材料層的方法包括進行微影制从4·如申請專利翻第1項所述之有機電致發光元件的衣作方法，其中形成該阻隔層的步驟包括·· 於該基板上形成一阻隔材料層；以及圖案化該阻隔材料層，以形成該阻隔層。 5·如申明專利範圍第4項所述之有機電致發光元件的 I作方法，其中該阻隔層的材質包括感光材料，而圖案化該阻隔材料層的方法包括對絲隔材料層進行曝光與顯 13 1295 l^^f.doc/y 6. 如申請專利範圍第1項所製作方法，其中形成該導電層的步驟包括7 件的於該基板上形成一導電材料層；以及圖案化該導電材料層，以形成該導電声。 7. 如申5青專利範圍第6項所诚夕古地& 製作方法，1巾醜有機電致發光元件的與蝕刻製程。勺方法包括進行微影 8·如申請專利範圍第1項所沭製光層的方法包括=㈣ y•種有機電致發光元件，包括：一基板；一第一電極層，配置於該基板上；一阻隔層，配置於該基板上，且嗲開口，用以暴露出該第-電極層；如隔層具有多數個 m 一導電層，配置於該些開口内壁以及該第一電極層上； Μ圖案化阻隔層的側一發光層，配置於該些開口内的該導一第二電極層，配置於該發光層上。曰上，以及件 10.如申請專利範圍第9項所其中該基板為透明基板。機電致發光元件 14 1295 l4iSwf.d〇c/y * 件其中该基板為主動元件陣列基板。 u·如申請專利範圍第12項所件’其中該基板為薄膜電日日0體_基板。發光元件Λ4中如利範㈣9項料之有機電致發光元八中5亥弟一電極層的材質包括透明導電材料。侔1：5，二申請專利範圍第14項所述之有機電致發光元 :、、中該弟-電極層的材質包括銦錫氧化物或銦鋅氧化物0Forming a light-emitting layer on the conductive layer in the openings. A second electrode layer is formed on the light-emitting layers. θ, and the method of fabricating the organic electroluminescent device according to item 1, wherein the step of forming the first electrode layer comprises: forming an electrode material layer on the substrate; and patterning the An electrode material layer to form the first electrode layer. The method of mf is as follows: A method of coating an organic electroluminescent device, wherein the step of forming the barrier layer comprises: forming a barrier material layer on the substrate; and patterning the barrier material layer to form the barrier layer. 5. The method of claim 1, wherein the material of the barrier layer comprises a photosensitive material, and the method of patterning the barrier material layer comprises exposing the layer of the barrier material. The method of claim 1, wherein the step of forming the conductive layer comprises forming a conductive material layer on the substrate; and patterning the conductive A layer of material to form the conductive sound. 7. For example, in the sixth paragraph of the application of the 5th patent, the method of making the eclipse of the organic electroluminescent device and the etching process. The method of the spoon includes performing the lithography. The method of the optical layer as claimed in claim 1 includes: (4) y• an organic electroluminescent device comprising: a substrate; a first electrode layer disposed on the substrate a barrier layer disposed on the substrate, and an opening for exposing the first electrode layer; and the spacer has a plurality of m conductive layers disposed on the inner wall of the opening and the first electrode layer; The side-emitting layer of the patterned barrier layer, the second conductive layer disposed in the openings, disposed on the light-emitting layer. In the case of the above, the substrate is a transparent substrate as in the ninth application. Electroluminescent device 14 1295 l4iSwf.d〇c/y * wherein the substrate is an active device array substrate. u. As claimed in item 12 of the patent application, wherein the substrate is a thin film electric day-day substrate. In the illuminating element Λ4, the organic electroluminescent element such as Lifan (4) 9 item material is made of a transparent conductive material.侔1:5, the organic electroluminescent element according to item 14 of the patent application scope: the material of the middle-electrode layer comprises indium tin oxide or indium zinc oxide.

16·如申請專利範圍第9項所述之有機電致發光元件，其中$亥導電層的材質包括透明導電材料。 17·如申請專利範圍第16項所述之有機電致發光元件’其中该導電層的材質包括銦錫氧化物或銦鋅氧化物。 18·如申請專利範圍第9項所述之有機電致發光元件，其中該發光層的材質包括高分子有機發光材料。The organic electroluminescent device according to claim 9, wherein the material of the conductive layer comprises a transparent conductive material. The organic electroluminescent device of claim 16, wherein the material of the conductive layer comprises indium tin oxide or indium zinc oxide. The organic electroluminescent device according to claim 9, wherein the material of the light-emitting layer comprises a polymer organic light-emitting material.

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