TWI263691B - Sputtering target and method for producing the same - Google Patents

Sputtering target and method for producing the same

Info

Publication number
TWI263691B
TWI263691B TW92104304A TW92104304A TWI263691B TW I263691 B TWI263691 B TW I263691B TW 92104304 A TW92104304 A TW 92104304A TW 92104304 A TW92104304 A TW 92104304A TW I263691 B TWI263691 B TW I263691B
Authority
TW
Taiwan
Prior art keywords
sputtering target
sintered body
sputtering
oxide
producing
Prior art date
Application number
TW92104304A
Other languages
English (en)
Other versions
TW200303931A (en
Inventor
Masanori Kogo
Toshio Inao
Masahito Uchida
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Publication of TW200303931A publication Critical patent/TW200303931A/zh
Application granted granted Critical
Publication of TWI263691B publication Critical patent/TWI263691B/zh

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Ceramic Products (AREA)
TW92104304A 2002-02-28 2003-02-27 Sputtering target and method for producing the same TWI263691B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002054738 2002-02-28

Publications (2)

Publication Number Publication Date
TW200303931A TW200303931A (en) 2003-09-16
TWI263691B true TWI263691B (en) 2006-10-11

Family

ID=27784598

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92104304A TWI263691B (en) 2002-02-28 2003-02-27 Sputtering target and method for producing the same

Country Status (2)

Country Link
CN (1) CN1441082A (zh)
TW (1) TWI263691B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5651095B2 (ja) * 2010-11-16 2015-01-07 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット
JP2013047361A (ja) * 2011-08-29 2013-03-07 Mitsubishi Materials Corp スパッタリングターゲット及びその製造方法並びに該ターゲットを用いた薄膜、該薄膜を備える薄膜シート、積層シート
CN108655403B (zh) * 2018-06-25 2020-08-28 河南科技大学 一种电子材料用高纯钽靶材的制备方法
JP2020041217A (ja) * 2018-09-07 2020-03-19 三菱マテリアル株式会社 光学機能膜、スパッタリングターゲット、及び、スパッタリングターゲットの製造方法

Also Published As

Publication number Publication date
TW200303931A (en) 2003-09-16
CN1441082A (zh) 2003-09-10

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