1258060 五、發明說明（1) 【發明所屬之技術領域』 本發明係關於一種導光板模仁製程 礒衫蝕刻技術之導光板模仁製程。 種採用光 【先前技術】 #由於液晶顯示器中的液晶本身不具發井々料， 提供面光源模組以實現顯示功能。 寸，需為其 t先刖技術之面光源模組包括光源及導光板，井 對導光板之入光面設置， 板先源係4目 :輪方向’將線光源或點光源轉換成面光 =束之 ^底面分佈複數網點，用以破壞光束於 =導光 之全反射條件，且使其散射接古山先板内4傳輪 性，淮％担日^ K /、欢射以槌问蜍先板出射光束之&」 贫、面光源模1 且之整體性㊣。該網點之形i句 :可不同設計以適應不同之面光源模組如， 了β又计為方形、圓形、六角形或菱形等。 如綱 設計Ll ί光？度係面光源模組之重要性能，上述網點 ::原模組需額外設置二稜鏡板以起集光作用先面 板』均光作用。稜鏡板係表面具有V型槽的微結構之V:反 3 ’且二棱鏡板之V型槽之排列方向彼此垂 丄月 二=源發出的光束，提昇導光板出光面内的出光&忒 ;二鏡板之成本較高，使得該結之面 ^由 組裝過程禧雜。卜卜，I m 、 偉組成本向且 之出光輝ί因業界發展出多種結構^善導光板 -種先前技術之面光源模組可參閱第一圖，該面光源1258060 V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a light guide plate mold process for a light guide plate mold process. Adopting light [Prior Art] #Because the liquid crystal in the liquid crystal display itself does not have a well-drilling material, the surface light source module is provided to realize the display function. Inch, the surface light source module that needs to be the first technology includes a light source and a light guide plate, and the well is placed on the light incident surface of the light guide plate, and the front plate source is 4 mesh: the wheel direction is used to convert the line light source or the point light source into a surface light. = The bottom of the bundle is distributed with a plurality of dots to destroy the total reflection condition of the beam at the light guide, and the scattering is transmitted to the 4th wheel of the Gushan first plate. The Huai% bears the day ^ K /, the shot is 槌The front panel exits the beam &" lean, surface source mode 1 and its integrity is positive. The shape of the dot i sentence: can be designed differently to adapt to different surface light source modules, such as β, and counted as square, round, hexagonal or diamond. Such as design Ll ί light? The important performance of the system of the surface light source module, the above-mentioned network points: the original module needs to be additionally set up with the second board to function as the light collecting function. The surface of the raft plate has the V-shaped groove microstructure V: the reverse 3 ' and the V-shaped groove of the prism plate aligns with each other. The light beam emitted from the source enhances the light output in the light-emitting surface of the light guide plate. The cost of the two mirror plates is high, so that the surface of the junction is noisy by the assembly process. Bu Bu, I m, Wei make up the brilliance of the 355. Because the industry has developed a variety of structures ^ good light guide plate - a prior art surface light source module can refer to the first picture, the surface light source
第5頁 1258060 五、發明說明（2) 模組1 0 0包括燈管11 〇、部份圍繞燈管丨丨〇之燈罩1丨1及導光 板1 2 0、設置於導光板1 2 0底面一側之反射板1 5 0、設置於 導光板1 2 0出光面一側之棱鏡板1 3 〇及擴散板1 4 0。該導光 板1 2 0之底面分佈複數網點1 2 1，該網點1 2 1可為方形、橢 圓形、矩形或半圓形等微結構，以破壞光線於導光板1 2 〇 内部的全反射條件，且調節導光板丨2 〇的出光均勻度。該 導光板120之出光面設置v型槽丨22以取代稜鏡板功能，使 得該面光源模組1〇〇僅需採用一片稜鏡板丨3〇，從而節省一 片稜鏡板的成本’並簡化面光源模組1 〇 〇之組裝過程。 先則技術製造該導光板出光面V型槽的方式有機械加 工法，採用精密刀具加工母模，電鑄翻模後以射出或熱 方式成型導光板。惟，該方法具有缺陷：其加工精产不 高，常常由於機械誤差或刀具磨損而造成不良品，^締 力二過=經：由於一條"型槽精度不夠而影響τ 個V光板杈仁的精細度。 一種製造導光板模仁表面微結構的方法可參閱中 明專利申請公開第1 372 1 6 1 A號。惟，該方法僅僅 务 表面成形圓弧形凸點或凹入，盔法 杲仁 :槽:口由純用傳統光罩多；曝 二= ^則會由於多次採用光罩產生對準誤差，料產^精 製程i d楗供一種精度馬、製程簡單之導光板模仁 【發明内容】Page 5 1258060 V. Description of the Invention (2) The module 100 includes a lamp 11 〇, a lamp cover 1丨1 and a light guide plate 1 2 0 around the lamp tube, and is disposed on the bottom surface of the light guide plate 120 The reflection plate 150 on one side, the prism plate 1 3 设置 and the diffusion plate 1 400 disposed on the light-emitting surface side of the light guide plate 120. The bottom surface of the light guide plate 120 is distributed with a plurality of dots 1 2 1 , and the dot 1 2 1 may be a square, elliptical, rectangular or semi-circular microstructure to destroy the total reflection condition of the light inside the light guide plate 1 2 〇 And adjust the light uniformity of the light guide plate 丨2 〇. The light-emitting surface of the light guide plate 120 is provided with a v-shaped groove 22 to replace the function of the see-saw plate, so that the surface light source module 1〇〇 only needs to adopt a single plate 丨3〇, thereby saving the cost of a raft plate and simplifying the surface light source. Module 1 assembly process. Firstly, the method of manufacturing the V-groove of the light-emitting surface of the light guide plate is mechanically processed, and the master mold is processed by a precision cutter, and the light guide plate is formed by injection or heat after electroforming. However, this method has its drawbacks: its processing yield is not high, and often it is caused by mechanical errors or tool wear, and it is often caused by defective mechanical products or tools. The fineness. A method of manufacturing the surface microstructure of a light guide plate mold can be referred to in Japanese Patent Application Laid-Open No. 1 372 1 6 1 A. However, the method only forms a circular arc-shaped bump or a concave surface, and the helmet method: the groove: the mouth is purely used by a conventional mask; the exposure of the second = ^ may cause alignment errors due to the multiple use of the mask. Material production ^ refining process id 楗 for a precision horse, simple process of light guide plate mold [invention content]
1258060 五、發明說明（3) 板模ίΪΞ,目的在於提供-種精度高、製程簡單之導光 本毛明導光板模仁製程包括步驟：於基 :基罩對光阻層曝光、顯影形成光阻圖案、姓1258060 V. INSTRUCTIONS (3) The board model is designed to provide a high-precision, simple process guide light. The method of the light guide plate mold includes the steps of: base: the base cover exposes the photoresist layer and develops light. Resistance pattern, last name
本發明進一步改進為Μ · y > 士 槽或U型槽。 纟於·杈仁之表面經蝕刻形成U 其中，所形成V型槽的角度為85度至115度。 ί ΐ: = if形成模仁的步驟係採二刻方式。 式。刻基板形成模仁的步驟係採用電漿姓刻方 其中，曝光所用光源係黃光或uv光。 其中’曝光係採用電子束進行。 膜 其中’於基板塗佈光阻層的步驟 — 在薄膜上塗佈光阻材料的步驟。 ：土》成薄 其中，該光阻層係採用旋轉式 塗式或擠壓式塗佈於基板。 站式、滾间式、喷 其中，該光阻層可採用正光阻材 與先前技術相比，本發明由於對;=料。 階光罩’可—次曝光顯影得到所需光】：:N·採用灰 提昇產品尺寸與形狀的精確度， ：；产4型槽’ 程、節省工時。另，採用乾姓刻方式；且簡化製 阻圖案有效轉移至基板以形成模仁，】m:可以將光 率及精度均有提昇。 /、衣以間早，產品良 第7頁 1258060 五、發明說明（4) ___ 【實施方式】 以下i素驟併參閱第二圖至第八圖，本發明導光板模仁包括 於基板塗佈光阻層 光阻直接於基板20 0表面塗佈光阻層210， 九阻材枓之塗佈方式可為旋轉式、 式或擠壓式等，該光阻声2丨0K同式、贺义 制，是正光阻材 # 再於溥膜表面塗佈光阻層。 採用灰階光罩對光阻層曝光 来罝二參？Λ圖，於基板200及光阻層210上方設置灰階 先罩220，採用更光或υν光對其進行曝光，亦可採用電子 „光。灰階光罩220係以對高能光束敏感的玻璃 (igh Energy Beam Sentive Glass， HEBS-giass)穿造 而成。此種高能光束敏感玻璃的材質是一種銀鹼鹵化物 (Silver-AlkatHalide)複合結晶，其化學式可表示為 (AgX)m(MX)n。该灰階光罩220曝光一次可以產生兩百階的 钱刻深度。 <1 顯影形成光阻圖案 請參閱第四圖’採用浸泡式、單片噴灑式或單片喷灑 靜置式等方法對光阻層210進行顯影，形成所需之光阻圖 案2 11。該光阻圖案2 11由複數V型結構組成。而 蝕刻基板形成模仁The invention is further improved to Μ · y > slot or U-groove. The surface of the crucible is formed by etching to form U. The angle of the V-groove formed is 85 to 115 degrees. ί ΐ: = If the steps to form the mold are taken in two steps. formula. The step of forming the mold to form the mold is to use the plasma surname. The light source used for the exposure is yellow or uv light. Where the 'exposure is carried out using an electron beam. Film A step of applying a photoresist layer to a substrate - a step of coating a photoresist on the film. : Soil is thin. The photoresist layer is applied to the substrate by spin coating or extrusion. Station type, roll-to-roll type, spray, wherein the photoresist layer can be used as a positive photoresist material, compared with the prior art, the present invention is due to; The grading mask can be used to achieve the desired light by the exposure of the lens::N·Using ash to improve the accuracy of the size and shape of the product, :; 4 type groove can be produced, saving man-hours. In addition, the dry name pattern is used; and the simplified resist pattern is effectively transferred to the substrate to form the mold, m: the light rate and precision can be improved. /, clothing early, product good page 7 1258060 five, invention description (4) ___ [embodiment] The following i and then refer to the second to eighth figures, the light guide plate mold of the present invention is included in the substrate coating The photoresist of the photoresist layer is directly coated on the surface of the substrate 20 0 to apply the photoresist layer 210, and the coating method of the nine-resistance material may be a rotary type, a squeeze type, or the like, and the photoresist sound is 2 丨 0K, and the same The system is a positive photoresist material. The photoresist layer is coated on the surface of the tantalum film. Using a gray-scale reticle to expose the photoresist layer In the figure, a gray-scale hood 220 is disposed above the substrate 200 and the photoresist layer 210, and is exposed by light or υν, or an electron „光. The gray-scale reticle 220 is used to be sensitive to high-energy beams. (igh Energy Beam Sentive Glass, HEBS-giass). This high-energy beam-sensitive glass is made of a silver-alkalide halide (Silver-AlkatHalide) composite crystal, and its chemical formula can be expressed as (AgX)m(MX). n. The gray scale mask 220 can be exposed once to produce a depth of two hundred steps. <1 Develop a photoresist pattern. Please refer to the fourth figure 'with immersion, single-piece spray or single-piece spray static, etc. The photoresist layer 210 is developed to form a desired photoresist pattern 2 11. The photoresist pattern 2 11 is composed of a plurality of V-type structures, and the substrate is etched to form a mold.
第8頁 1258060 五、發明說明（5) 請參閱第五圖，採用可同時钱刻光阻圖案211與基板 20 0之乾蝕刻方式進打蝕刻，將光阻圖案21}轉移至基板 200形成模仁201，該模仁201表面具有複數v型槽2〇2。該 乾蝕刻方式可為電漿蝕刻’以氣體作為主要的蝕刻媒介， 藉由電漿能量來驅動反應。*具有非等向㈣及對姓刻材 料無選擇性等優點。 ί —併參閱第六圖至第八圖，首先於模仁2〇1表面植 附金屬塗層以形成晶種層230作為隔離層。該晶種層23〇以 濺鍍、蒸鍍或喷鍍等方式將金屬植附於模仁2〇1及乂型样 202表面’該金屬可以是鎳、銅或銀。再於晶種層23〇‘表 =以電阻方式成形母模240。將母模24〇與模仁2〇1脫離， 去除晶種層23G，母模24G的表面具有與 相對應之圖案。 4 ® I僧 母模240可以射出或熱壓等先前習知方式成型 導光板出光面之V型槽。惟，太於 __ 型槽等圖案。 & I發明亦可以極為方便形成υ 出專=述帷本發明確已符合發明專利要件，爱依法提 月 以上所述者僅為本發明之較佳實施方 式，舉凡熟悉本案技藝之人士，.俨价士求&仏貝&方 « 之等效修飾或變化，皆，包“在η案發明精神所作 白應包含於以下之申請專利範圍内。Page 8 1258060 V. Description of the Invention (5) Referring to the fifth figure, etching can be performed by dry etching of the photoresist pattern 211 and the substrate 20, and the photoresist pattern 21} is transferred to the substrate 200 to form a mold. Ren 201, the surface of the mold 201 has a plurality of v-grooves 2〇2. The dry etch can be plasma etched with gas as the primary etchant to drive the reaction by plasma energy. * It has the advantages of non-isotropic (four) and no selectivity for surname materials. — - Referring to Figures 6 through 8, first, a metal coating is implanted on the surface of the mold core 2 to form a seed layer 230 as a separator. The seed layer 23 is implanted with metal on the surface of the mold 2 and the stencil 202 by sputtering, vapor deposition or sputtering. The metal may be nickel, copper or silver. Further to the seed layer 23 〇 'Table = the master mold 240 is formed by resistance. The master mold 24 is separated from the mold core 2〇1, and the seed layer 23G is removed, and the surface of the mother mold 24G has a pattern corresponding thereto. The 4 ® I 母 master mold 240 can be formed by a conventionally known method such as injection or hot pressing to form a V-groove of the light-emitting surface of the light guide plate. However, it is too much like the pattern of the __ type groove. & I invention can also be extremely convenient to form 专 专 = 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷 帷Equivalent modification or change of the price of the & 士 & 仏 & &&; « « « « 。 。 。 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效 等效
第9頁 1258060 圖式簡單說明 第一圖係先前技術面光源模組之剖視圖。 第二圖係本發明導光板模仁製程中於基板塗佈光阻層之示 意圖。 第三圖係本發明導光板模仁製程中採用灰階光罩對光阻層 曝光之示意圖。 第四圖係本發明導光板模仁製程中顯影形成光阻圖案之示 意圖。 第五圖係本發明導光板模仁製程中蝕刻基板形成模仁之 示意圖。 第六圖係本發明導光板模仁製程中於模仁表面植附晶種 層之示意圖。 第七圖係本發明導光板模仁製程中電鑄形成母模之示意 圖。 第八圖係本發明導光板模仁製程中母模之示意圖。 【元件符號說明】Page 9 1258060 Brief Description of the Drawings The first figure is a cross-sectional view of a prior art surface light source module. The second figure is a schematic view of coating a photoresist layer on a substrate in the process of the light guide plate mold of the present invention. The third figure is a schematic diagram of the exposure of the photoresist layer by using a gray scale mask in the process of the light guide plate mold of the present invention. The fourth figure is intended to develop a photoresist pattern in the process of the light guide plate mold of the present invention. The fifth figure is a schematic view of etching a substrate to form a mold core in the process of the light guide plate mold of the present invention. The sixth figure is a schematic diagram of the seed layer deposited on the surface of the mold core in the process of the light guide plate mold of the present invention. The seventh figure is a schematic view of electroforming a master mold in the process of the light guide plate mold of the present invention. The eighth figure is a schematic view of the master mold in the process of the light guide plate mold of the present invention. [Component Symbol Description]
基板 200 光阻層 210 灰階光罩 220 光阻圖案 211 模仁 201 V型槽 202 晶種層 230 母模 240 第10頁Substrate 200 Photoresist layer 210 Gray scale mask 220 Photoresist pattern 211 Mould 201 V-groove 202 Seed layer 230 Master mold 240 Page 10