TWI256907B - Ultra-violet cleaner and application method for thereof - Google Patents

Ultra-violet cleaner and application method for thereof

Info

Publication number
TWI256907B
TWI256907B TW093139970A TW93139970A TWI256907B TW I256907 B TWI256907 B TW I256907B TW 093139970 A TW093139970 A TW 093139970A TW 93139970 A TW93139970 A TW 93139970A TW I256907 B TWI256907 B TW I256907B
Authority
TW
Taiwan
Prior art keywords
ultra
violet
cleaner
application method
gas
Prior art date
Application number
TW093139970A
Other languages
Chinese (zh)
Other versions
TW200526334A (en
Inventor
Koji Hosotani
Hiromi Sakamoto
Original Assignee
Gs Yuasa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gs Yuasa Corp filed Critical Gs Yuasa Corp
Publication of TW200526334A publication Critical patent/TW200526334A/en
Application granted granted Critical
Publication of TWI256907B publication Critical patent/TWI256907B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An ultra-violet cleaner, characterized by using a ultra-violet radiation from UV lamp to irradiate the transported article. And the ultra-violet cleaner comprises a gas channel to let the gas blow onto the irradiated surface of the article by a gas diffuser.
TW093139970A 2003-12-26 2004-12-22 Ultra-violet cleaner and application method for thereof TWI256907B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003435401A JP4337547B2 (en) 2003-12-26 2003-12-26 Ultraviolet light cleaning device and ultraviolet lamp for ultraviolet light cleaning device

Publications (2)

Publication Number Publication Date
TW200526334A TW200526334A (en) 2005-08-16
TWI256907B true TWI256907B (en) 2006-06-21

Family

ID=34736634

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093139970A TWI256907B (en) 2003-12-26 2004-12-22 Ultra-violet cleaner and application method for thereof

Country Status (5)

Country Link
JP (1) JP4337547B2 (en)
KR (2) KR20060040569A (en)
CN (2) CN101602055A (en)
TW (1) TWI256907B (en)
WO (1) WO2005064663A1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5019156B2 (en) * 2006-08-21 2012-09-05 ウシオ電機株式会社 Excimer lamp device
JP4917993B2 (en) * 2007-08-09 2012-04-18 ハリソン東芝ライティング株式会社 UV irradiation equipment
JP5146808B2 (en) * 2007-10-05 2013-02-20 ウシオ電機株式会社 UV irradiation equipment
JP5195111B2 (en) * 2008-07-17 2013-05-08 ウシオ電機株式会社 Excimer lamp device
TWI466735B (en) * 2008-09-18 2015-01-01 Gs Yuasa Int Ltd Ultraviolet irradiation apparatus
JP5077173B2 (en) * 2008-09-27 2012-11-21 株式会社Ｇｓユアサ UV irradiation treatment equipment
JP5083184B2 (en) * 2008-11-26 2012-11-28 ウシオ電機株式会社 Excimer lamp device
JP5093176B2 (en) * 2009-03-31 2012-12-05 ウシオ電機株式会社 Excimer lamp device
JP5586316B2 (en) * 2010-05-06 2014-09-10 信越化学工業株式会社 UV ozone cleaning device
CN102436138B (en) * 2011-07-12 2014-04-02 上海华力微电子有限公司 Ultraviolet mask plate dry cleaning equipment
CN102861739A (en) * 2012-08-06 2013-01-09 华为终端有限公司 Method for cleaning screen of electronic equipment and electronic equipment
US9340451B2 (en) 2013-02-28 2016-05-17 Corning Incorporated Machining of fusion-drawn glass laminate structures containing a photomachinable layer
CN103464424B (en) * 2013-08-28 2015-12-02 西安耀北光电科技有限公司 Ultra-violet radiation ozone light cleaning machine
JP6242163B2 (en) * 2013-11-06 2017-12-06 株式会社ディスコ Tape expansion unit
JP6420777B2 (en) * 2014-02-14 2018-11-07 株式会社トクヤマ Apparatus for producing cleaned polycrystalline silicon lump crushed material, and method for producing cleaned polycrystalline silicon lump crushed material using the manufacturing apparatus
WO2016060076A1 (en) 2014-10-14 2016-04-21 株式会社トクヤマ Polycrystalline silicon fragment, method for manufacturing polycrystalline silicon fragment, and polycrystalline silicon block fracture device
JP6545964B2 (en) * 2015-01-26 2019-07-17 株式会社オーク製作所 Excimer lamp device
TWI736670B (en) 2016-09-21 2021-08-21 日商東京威力科創股份有限公司 Substrate processing method and substrate processing device
CN108361561A (en) * 2017-01-26 2018-08-03 深圳市优固科技有限公司 Ultraviolet leds light supply apparatus
DE102017108076A1 (en) * 2017-04-13 2018-10-18 Ist Metz Gmbh Device for surface treatment of objects
CN108212950B (en) * 2018-01-04 2021-01-26 京东方科技集团股份有限公司 Extreme ultraviolet light cleaning equipment and substrate cleaning method
KR102173011B1 (en) 2018-08-06 2020-11-02 조승범 Heat exchanger
CN109894432B (en) * 2019-03-22 2020-01-14 浙江晶鲸科技有限公司 Dry-type non-contact cleaning device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5580421A (en) * 1994-06-14 1996-12-03 Fsi International Apparatus for surface conditioning
JP4218192B2 (en) * 1999-08-05 2009-02-04 株式会社日立ハイテクノロジーズ Substrate processing apparatus and processing method
JP2001300451A (en) * 2000-04-25 2001-10-30 Hoya Schott Kk Ultraviolet irradiation device

Also Published As

Publication number Publication date
TW200526334A (en) 2005-08-16
JP2005197291A (en) 2005-07-21
JP4337547B2 (en) 2009-09-30
CN100521097C (en) 2009-07-29
CN101602055A (en) 2009-12-16
WO2005064663A1 (en) 2005-07-14
KR20080030072A (en) 2008-04-03
KR20060040569A (en) 2006-05-10
CN1788339A (en) 2006-06-14

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