TWI238811B

TWI238811B - Method and apparatus for treating waste water

Info

Publication number: TWI238811B
Application number: TW092116723A
Authority: TW
Inventors: Junji Okamura; Masatsugu Kitaura; Kazunori Yoshino
Original assignee: Nippon Catalytic Chem Ind
Priority date: 2002-07-03
Filing date: 2003-06-17
Publication date: 2005-09-01
Also published as: TW200412333A; KR20040004062A; CN1468807A

Abstract

Various methods for treating materials containing waste water have been known. An aim of the invention provides methods and apparatuses for treating waste water containing TMAH, ammonia, and hydrogen peroxide, etc. by a series of treating process and decomposing process. The method treating waste water containing TMAH, ammonia, and hydrogen peroxide, etc. comprises a hydrogen peroxide-decomposing step for decomposing H2O2 (hydrogen peroxide-decomposing section 51), an ammonia-stripping step for stripping ammonia from said waste water decomposed of H2O2 (stripping tower 26), a concentration step for concentrating the waste water after stripping ammonia and obtaining concentration including TMAH (concentration section 56), a gasification step for gasifying said concentration (gasifying machine 76), and a decomposing step for decomposing gas obtained from said gasification step and said stripping ammonia by catalysts.

Description

1238811 五、發明說明（1) [發明所屬之技術領域] 本發明是有關於同時處理含有可氣化之有機化合，水，與含有可夂化合物以及過氧化氫之廢水等2 2水之方法以及處理裝置’或處理含有可氣化之有機化人 ;、可放散之化合物以及過氧化氫之廢水的方法以及處；表置。 [先前技術] 估-I ^政化合物之代表例舉例如氨，其處理方法為首先 ^從廢水中放散，將該氨氣接觸於觸媒上而氧化，分 ί = 2與水(例如特開平"89897號公報）。該處理次％為觸媒處理法。的，處：法其他已知例如有生物處理法為含氨廢水的ϊ Γΐΐ 處理法係藉由微生物的作用將廢水中、虱刀解為，、.、害的氮氣與水。且該生物處理法處理效率 =為了得到充分的處理能力必須擴大裝置規模，且由於產生剩：污泥，因此會有污泥處理的問題。由於 =面，以氣體放散廢水中實質沒有放散，可以廢 =出體化之方法氣化之有機化合物包含在廢： = 這樣的有機化合物可舉例如氫氧化四炫二二ρ ^=虱氧化四燒基銨之有機化合物之廢水的處理 / ° 70部法、微生物處理法、超臨界水之分解處理法0 上述k卻法係為以高溫使廢水燃燒而氧化廢水中所含 1238811 五、發明說明（2) 之，，化合物之氧化分解處理方法。該場合，前述氯氧化 :说基銨之分子中具有氮素之有機化合物（含氮有機化合 H通常產生氧化氮(N°x)。該叫需要變換成更無害之 :二的處理設備，目此該燒卻法有設備大型，建設費用高等缺點。又上述微生物處理法為藉由微生物的作用將含氮有機化合物等的有機物公經或&宝 h 、、成物刀解為無。的氮氣、水、二氧化碳氣體 j二人上述相同處理效率低，處理設備必須很大，且必須考慮剩餘污泥的處理。使用上述起界水之分解處理法，為利用超臨界狀態 ::2 A學之特性的方法。水成為超臨界狀態時必須技制在咼溫·高壓狀態τ，因此處理裝置的耐埶性，耐壓性相關之需求嚴格，又必須有用以得到高壓的高壓幫浦·高壓壓縮機等的機器設備成本增加。 ^於氫氧化四烧基錢等的淨化處理問^，本發明人為述問題，提出將上述氫氧化四烷基銨等的含氮有 # π处Μ + μ ^ ^要後處之氮氣、二軋化碳等無害氣體月b排出的廢水處理方法（日本專利編號：特願 20 0 0- 1 1 4086 號）。方本處：m的過氧化氫的方法，已知有以觸媒處理的方法：觸媒，使用活性炭、自金、鈀、釕、铑、銘、錳、 :有二：：ί分之金屬化合物，分解處理為水與氧氣。又有=使酵素對過氧化氫作用而分解處理的提案。含有氰與過氧彳卜_ 9 # ^ 化H2種之廢水的處理方法，又揭露有1238811 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a method for simultaneously treating 2 2 water such as gasifiable organic compounds, water, and waste water containing tritium compounds and hydrogen peroxide, and Treatment device 'or method and place for treating wastewater containing gasifiable organic compounds, dispersible compounds and hydrogen peroxide; surface treatment. [Prior art] A representative example of an estimated compound is, for example, ammonia. The treatment method is to first release it from waste water, contact the ammonia gas with the catalyst to oxidize it, and divide it into 2 (for example, kaiping) " 89897). This treatment time% is the catalyst treatment method. Other methods are known, for example, the biological treatment method is the ϊ Γΐΐ treatment method of ammonia-containing wastewater. The treatment method is to use the action of microorganisms to decompose lice and knives into harmful nitrogen and water. Moreover, the biological treatment method treatment efficiency = In order to obtain a sufficient treatment capacity, the scale of the apparatus must be enlarged, and since a surplus is generated: sludge, there is a problem of sludge treatment. Due to the fact that the gas is not released in the wastewater by gas release, the organic compounds that are vaporized can be included in the waste: = such organic compounds can be, for example, tetrahydroxide hydroxide ^ = Treatment of waste water containing organic compounds of ammonium ammonium / ° 70-part method, microbial treatment method, supercritical water decomposition treatment method 0 The above-mentioned k-based method is to oxidize 1236811 contained in wastewater by burning the wastewater at high temperature. V. Description of the invention (2) The method of oxidative decomposition of compounds. In this case, the aforementioned chlorine oxidation: organic compounds with nitrogen in the molecule of ammonium (nitrogen-containing organic compound H usually produces nitrogen oxide (N ° x). The name needs to be converted into more harmless: two processing equipment, the purpose This burning method has the disadvantages of large equipment, high construction costs, etc. Also, the above-mentioned microbial treatment method is to resolve organic compounds such as nitrogen-containing organic compounds or & Nitrogen, water, and carbon dioxide gas have the same treatment efficiency as above, the treatment equipment must be large, and the treatment of excess sludge must be considered. To use the above-mentioned decomposing treatment method of boundary water, use the supercritical state: 2: 2 A science When the water becomes supercritical, it must be controlled in the high temperature and high pressure state τ. Therefore, the requirements on the pressure resistance and pressure resistance of the processing device are strict, and it must be useful to obtain high pressure high pressure pumps. The cost of equipment such as compressors increases. ^ In the case of purification treatment of tetrakismonium hydroxide, etc., the inventors proposed that the nitrogen-containing tetraalkylammonium hydroxide and the like have # π M + μ ^ ^ Wastewater treatment method for the discharge of innocuous gases such as nitrogen and rolled carbon in the following months (Japanese Patent No .: Japanese Patent No. 20 0-0 1 1 4086). Square: Peroxide of m The method of hydrogen is known to be treated with a catalyst: the catalyst uses activated carbon, self-gold, palladium, ruthenium, rhodium, rhodium, manganese, and two kinds of metal compounds: decomposed and treated into water and oxygen There is also a proposal to decompose and treat enzymes on hydrogen peroxide. A method for treating wastewater containing cyanide and peroxygenase _ 9 # ^ chemical H2, and also disclosed

第6頁 1238811Page 6 1238811

五、發明說明（3) 使氨揮發而從廢水中理方法（特開除首先以觸媒分解處理過氧化氣後，去，再以觸媒分解該揮發之氨的處 2 0 0 0 - 5 1 8 7 1 號公報）。 $ 地發明所欲解決之問題：士上述目$已揭疼有針對各種廢水中所含之處理對象物質的各種處理方法，但在半導體裝置製造工廠和各種化學工廠排出各種廢水，依照被處理廢水的種類需設置有各種的處理裝置，必須有廣大的設備場地，會有設備成本 =操作成本高的問題。又如上述雖揭露有含有氨與過氧化氫2種之廢水的處理方法，但並未揭露含有氫氧化四烷基銨等的有機化合物與氨與過氧化氫任一者之廢水的處理，該等處理對象物質係分別各自處理，如上述之處理設備大型化，會有設備成本增高的問題。且對於含有氫氧化四烷基銨等的有機化合物與氨的廢水’本發明人提出並已申請該等同時處理上述處理對象物質兩者而簡化處理裝置，設備成本低廉化的廢水處理方法以及處理裝置（日本專利申請編號：特願2 〇〇丨—2 7 3丨6號，特願2002-27383號）。又對於含有氫氧化四烷基銨等的有機化合物與氨等可放散化合物2種的廢水，本發明人提出並已申請同時處理上述廢水而簡化處理裝置，設備成本低廉化的廢水處理方法以及處理裝置（日本專利申請編號：特願200 1 -4540 0 號）。於是本發明之目的為，提供對於含有有機化合物與氨V. Description of the invention (3) Method for volatile ammonia and removing it from waste water (except for the removal of the peroxide gas firstly by catalytic decomposition, and then the catalytic decomposition of the volatilized ammonia. 2 0 0 0-5 1 8 7 Bulletin 1). Problems to be solved by the invention of the invention: The above-mentioned item $ has revealed various treatment methods for the treatment target substances contained in various wastewaters, but various wastewaters are discharged at semiconductor device manufacturing plants and various chemical plants, and according to the treated wastewater Various types of processing devices need to be installed, and there must be a large equipment field. There will be a problem that the equipment cost = high operating cost. As mentioned above, although the treatment method of wastewater containing two kinds of ammonia and hydrogen peroxide is disclosed, the treatment of wastewater containing organic compounds such as tetraalkylammonium hydroxide and ammonia and hydrogen peroxide is not disclosed. Each of the processing target materials is processed separately. As the above-mentioned processing equipment becomes large, there is a problem that the equipment cost increases. For wastewater containing organic compounds such as tetraalkylammonium hydroxide and ammonia ', the present inventor has proposed and has applied for the simultaneous treatment of both of the above-mentioned treatment target substances to simplify the processing device, and the method and treatment of wastewater with low equipment cost Device (Japanese Patent Application No .: 2000- 2-7 3 丨 6, JP 2002-27383). For wastewater containing organic compounds such as tetraalkylammonium hydroxide and flammable compounds such as ammonia, the inventors have proposed and applied for the simultaneous treatment of the above wastewater to simplify the treatment device, and a method and a wastewater treatment method with reduced equipment costs. Device (Japanese Patent Application No .: Japanese Patent Application No. 200 1 -4540 0). It is therefore an object of the present invention to provide

2〇14-57〇9-PF(Nl);Tcshiau.ptd 第7頁 1238811 五、發明說明⑷ '" 同時含有過氧化氫之廢水，亦可藉由一連串的處理步驟，分解處理该等3種處理對象物質，能達到裝置簡化，成本低廉化之處理方法以及處理裝置，又因為同時處理不同種類的廢水，方面即使廢水含有過氧化氫，亦可提供同時處理該等不同種類的廢水，而能提供裝置簡化，成本低廉化之廢水的處理方法以及處理裝置。 [發明說明] 解決課題的方法：本第1 ^明之廢水的處理方法，為同時處理2種廢水的方法，^I、述廢水之一者為含有可氣化之有機化合物的廢水 [A ]> ’則述廢水之另一者為含有可放散之化合物以及過氧化氫之廢水[B]，該方法主要具有氣體化前述廢水[A]之氣化步驟，分^前述廢水[B]中的過氧化氣之過氧化氮分解 ^收义、^尽水LB]中的别述可放散化合物之放散步體）與，前述放散步驟所i t體（以下稱為⑷氣體化軋以觸媒分解處理之分解斤牛=t體（以下稱為[B]纟散氣體）再者上述「放气=驟（以下稱為氣體分解步驟）。稱為溶解揮發成分^伴」卩/\將液體中溶解之揮發成分（以下隨之氣體是不含有上體而放出之操作，用於上述伴體與溶液接觸而進行^二解揮發成分之氣體，藉由使該氣 (stripping)。藉由如政如。此操作稱為汽提散氣體與揮發成分減小、散操作分成含有揮發成分之放夕之液體。又上述「氣體化」是藉由2〇14-57〇9-PF (Nl); Tcshiau.ptd Page 7 1238811 V. Description of the invention &" Wastewater containing hydrogen peroxide can also be decomposed and treated by a series of processing steps. This kind of treatment target material can achieve simplified device and low cost treatment method and treatment device, and because different types of wastewater are treated at the same time, even if the wastewater contains hydrogen peroxide, it can provide simultaneous treatment of these different types of wastewater, and It is possible to provide a wastewater treatment method and a treatment device with simplified equipment and low cost. [Explanation of the Problem] The method for solving the problem: The method for treating waste water of the first ^ Ming is a method for treating two kinds of waste water at the same time, and one of the waste water is a waste water containing a gasifiable organic compound [A] > 'The other one of the wastewater is a wastewater [B] containing dispersible compounds and hydrogen peroxide, and the method mainly has a gasification step of gasifying the aforementioned wastewater [A], and dividing the aforementioned wastewater [B] Decomposition of Nitrogen Peroxide in Peroxide Gas ^ Included, ^ Releasing Compounds that Disperse Compounds in [Water] LB] and the body (hereinafter referred to as rhenium gasification rolling and catalyst decomposition treatment) Decomposition jinniu = t body (hereinafter referred to as [B] disperse gas) In addition, the above-mentioned "outgassing = step (hereinafter referred to as gas decomposition step). It is called dissolving volatile components ^ companion" 卩 / \ dissolving in the liquid Volatile component (hereinafter, the gas is released without containing the upper body. It is used for the above-mentioned companion to contact with the solution to degas the volatile component. The gas is stripped.) This operation is called the stripping gas and volatile component reduction and dispersion operation Put into a liquid containing volatile components of the evening. And above "gas", that by

2014-5709-PF(Nl)；Tcshiau.ptd 第8頁 ^38811 五、發明說明（5) 加熱和減壓等手段施予 — 為氣體狀態之操作，认使夜體的實質全量蒸發而成氣化。如此「放散」體之成分亦實質全量蒸發Ϊ 成為揮發成分減少之用I體從液體放出揮發成分而是使液體實質全量蒸發^氣相對於此，「氣體化」 .本第1發明之廢水的處理豆方之操」乍\ 乳化氫分解步驟，玫+ 去’前述氣體化步驟，過本第1發明夕η，士…·/’、可個別進行（以下該場合稱為 I前述合物之 ° #者步2014-5709-PF (Nl); Tcshiau.ptd Page 8 ^ 38811 V. Description of the invention (5) Application by heating and decompression-operation in the state of gas, it is recognized that the substantial amount of the night body is evaporated into gas Into. In this way, the components of the "releasing" body also evaporate substantially in full amount. The body becomes a volatile component with reduced volatile components. The body emits volatile components from the liquid and evaporates substantially the entire amount of the liquid. ^ Gas phase For this, "gasification". The operation of processing the bean formula "Zhu \ Emulsification hydrogen decomposition step, rose + go to the aforementioned gasification step, after the first invention, η, ... ... /, can be carried out individually (hereinafter referred to as I of the aforementioned compound ° # 者步

U A 氧化氫述放散 t水放散 k (例 S消耗 '•散I 〇第9頁 2〇14-57〇9.PF(Nl)；Tcshiau.ptd 1238811U A Hydrogen oxide, release t, release water k (e.g. S consumption '• I I 〇 page 9 2014-57〇9.PF (Nl); Tcshiau.ptd 1238811

五、發明說明（6) 貫現如上述本第1發明之1的虛如下。即以之1的處理方法的處理裝置舉例化之有機化合物的廢水[A] ’前述廢水之另：二主^包「及過氧化氣之廢水[B]，該裝置从今、+、 L刀解1 敌散刖述廢水「B 1中的别述可放散化合物之放散部，與藉由觸媒分= 氣體化部而得之氣體（[A]氣體氣^处刖述軋體( [B]放散氣體）的分解部（以下稱為氣體分。 f本第丨發明之丨的處理裝置，可在前述放散部更上流解部，或者亦可以比前述過氧化氫 =解。卩更上流側汉置别述放散部，較佳是設置前述過虱为解部於上流側的場合，這樣的型態，舉例具 ^ 3:[b]於前述過氧化氫分解部時，從該過氧化氫分解別出，❿導入前述放散部之管線。如前述般，為了促解虱專^放散添加之鹼的量，因為過氧化氫多存在於廢水 =，較佳是比放散部之處理前先進行過氧化氫分解部之處、設置放散部於上流側的型態’最好具備將前述廢水 [B]導入前述放散部的管線’與從該放散部導出，並導入於前述過氧化氫分解部之管線。上述過氧化氮分解步驟（過氧化氫分解部）之過氧化畫的分解手法，舉例如使用各種觸媒的手法、利用光氧化$ 手法、使用增加與廢水動的接觸之填充材的手法。、V. Description of the invention (6) The virtual reality as described in the first of the first invention is as follows. That is, the waste water of organic compounds exemplified by the treatment device of the treatment method 1 [A] 'Another of the foregoing waste water: two main ^ package "and waste water of peroxide gas [B], the device from now on, +, L knife Solution 1 The enemy disperse the descriptive waste water "The dispersing part of other dispersible compounds in B 1 and the gas ([A] Gas gas ^ where the rolling body ([B] ] Dissolving gas (hereinafter referred to as gas fraction). F The processing device of the present invention may be further upstream of the dispersing unit, or may be higher than the aforementioned hydrogen peroxide = dissolving. In the case of a separate release part, it is preferable to set the aforementioned lice as the solution part on the upstream side. Such a type is, for example, ^ 3: [b] When the hydrogen peroxide decomposition part is used, the hydrogen peroxide is removed from the hydrogen peroxide. Decompose and separate it, and then introduce it into the pipeline of the above-mentioned release part. As mentioned above, in order to promote the release of the lice, the amount of added alkali is specifically because hydrogen peroxide exists in wastewater =, preferably before the treatment of the release part. Where the hydrogen peroxide is decomposed, the type in which the diffusing section is provided on the upstream side is preferably provided with the waste water [B] The pipeline 'introduced into the release section' and the line derived from the release section and introduced into the hydrogen peroxide decomposition section. The decomposition method of the peroxide picture in the nitrogen peroxide decomposition step (hydrogen peroxide decomposition section), For example, a method using various catalysts, a method using photo-oxidation, and a method using a filler to increase contact with waste water.

2014-5709-PF(N1);Tcshiau.ptd 1238811 五、發明說明（7) 使用於該過氧化氫分解以白金、纪、釕、姥、敍ί 觸某舉例有活性炭、或二氧化矽、矽—氧化叙的哮/ 、鐵、銅、鎳等，氧化鋁、用這樣的觸媒而分解處理^生/體擔持之擔持觸媒等，使又利用上述： = 化氨為氧素(〇2)與水(⑽。光，藉由該光照射廢水[Β]中法的/氣體化是^廢水⑻照射水[Β]中所含之「可放散」過乳化虱接受光氧化。廢過氧化氫與氨同時如下述化^」為=(a_onia)的場合， 2ΝΗ3 + 3Η2 02 ,2 + 6Η2〇...πΤ"( ”刀解。從上述式（1)可看出重化氫=1 : 3。例如半導體妒制上被分解為氨：過氧過氧化氫與氨幾乎多半是1衣造曲工廠排出之廢水，因為化處理，過氧化氣的全部愈=濃度’因此利用上述光氧使用上述填充材的手^巧—部份被分解。接觸而促進過氧化氫的分错由填充材與廢水[B ]動的舉例為網狀物、粒狀物等，被分解為水與氧素。填充材觸面積大的形狀者。填充材Λ佳為與前述鹼添加廢液之接屬、塑膠、陶瓷等各種材料的材質可利用不鏽鋼等的金 (Rasching ring)、波爾環、、上述填充物具體例如拉西環你環、金屬製、合成樹酯&等、矩鞍型填料、IMTP、階式迷等的規則填充物。、不規則填充物、S u 1 z e r填料如此經過過氧化氫分解步水[B ]以放散步驟得到氨等化八（過虱化虱分解部）後的廢氨等氣體），另一方面以氣辨，物放散之[B]放散氣體（含 _匕步驟氣體化廢水[A ]而得 2014-5709-PF(Nl);Tcshiau.ptd 第11 1238811 五、發明說明（8) [A ]氣體化氣體，集合該等而在上述氣體分解步驟以觸媒進行處理。 / 藉由這樣的處理，比起個別處理各種廢水的場合處理設備能夠簡化，又能降低操作成本。口又如前述本第1發明之廢水處理方法，前述過氧化氫分解步驟與前述放散步驟同時進行，藉此而得之氣體與在前述氣體化步驟而得之氣體亦可同時施加前述分解步驟， (本第1發明之2)。換言之，係為同時處理2種廢水的方法，其中前述廢水之一者為含有可氣化之有機化合物的廢，[A^，前述廢水之另一者為含有可放散之化合物以及過氧化氫之廢水[B]，該方法亦可包括氣體化前述廢水以]之 =二驟中，：解，述廢水⑻中的過氧化氫同時放散前述廢，[B]中的珂述可放散化合物之分解.放散步驟，步：所得之氣體（以下稱為[A]氣體化氣體)與，前 =刀解.放散步驟所得之氣體（以下理之分解步驟(以下稱為氣體分= 置舉ΐ如二〜之2的處理方法的本發明之處理裝水之一者為人^為時處理2種廢水的處理裝置，前述廢水之另一者氣化之有機化合物的廢水[Α] ’前述廢 [Β]，該裝置主3要^放散之化合物以及過氧化氫之廢水解前述廢水以廢水[Α]之氣體化部，分述可放散化合物之解氧化散前述廢水[β]中的前述氣體化部而得之:「放政’與藉由觸媒分解處理前于之軋體（[Α]氣體化氣體）與前述分解·放 m 2014-5709-PF(Nl)；Tcshi au.ptd 第12頁 1238811 五、發明說明（9) 散部^氣體（[B]放散上述分解·妨血h 、礼篮y刀解部）。手法舉例有使用；2驟(分解.放散部)的過氧化氫分解充材等。用與廢水動的接觸大且能分解過氧化；使用上述填充材的手法，係使廢水[B ]與接角萄以及藉由填充材的過氧化氮分解能一、充材動的 1 ’而被分解為水與氧素。填充材二化氫的料、1請、階式；你hl二:ng、波爾環、矩鞍型填製填充材。在本以硌衣日、至屬衣1zer填充材等的金屬表具兄何在本苐1發明之2，因為以過氣仆寄沾八初，散用氣體導入同時進行氨等的放散除：：j 散氣體之壓力損失以及防止液體的液泛⑴00dingm 二的述之形狀。該等材質較佳為鐵，、主钔#主如:銹鋼製，鎳以及其合金；_以及磷脫月銅，磷青銅，鋁青銅，洋白等的鋼合金等。 $者’具有過氧化氫分解活性之上述填充材，以網狀、壤狀、管狀或蜂窩狀的形狀之各種金屬製者填充於處理塔皆可達成本第！發明之2的效果。該等金屬製填充材的材夤較佳為與上述的場合相同，鐵；sus 3〇4，sus 316等的不錢鋼製’鎳以及其合金；銅以及磷脫青銅、磷青銅、鋁青銅、洋白等的銅合金等。用性炭或白金、鈀、釕、铑等的貴金屬元素；鈷、錳、又，具有過氧化氫分解活性之上述填充材，亦適合使般用於過氧化氫之分解的觸媒。可舉例如，活从療、鐵、銅 > \ AA -Sfe. /v fir?—2014-5709-PF (N1); Tcshiau.ptd 1238811 V. Description of the invention (7) Used in the decomposition of hydrogen peroxide to platinum, Krypton, ruthenium, osmium, and selenium. Examples of contact with activated carbon, or silicon dioxide, silicon -Oxidation of hydrogen, iron, copper, nickel, etc., alumina, decomposition catalysts that use such catalysts, and support catalysts that support the body / body, etc., so as to use the above again: 〇2) and water (⑽. Light, irradiate the wastewater [B] with this light / gasification is ^ waste water ⑻ irradiate the water [B] contained in the "dispersible" superemulsified lice to receive photooxidation. Waste When hydrogen peroxide and ammonia are changed as follows at the same time: ^ "= (a_onia), 2NΗ3 + 3Η2 02, 2 + 6Η2 0 ... πΤ " () knife solution. From the above formula (1), we can see that the hydrogenated hydrogen = 1: 3. For example, semiconductors are decomposed into ammonia: hydrogen peroxide and ammonia are mostly waste water discharged from the Koji factory, because of the chemical treatment, the more the peroxide gas becomes the concentration, so the above is used. Photo-oxygen uses the above-mentioned filling materials by hand—partially decomposed. The contact promotes the separation of hydrogen peroxide. The filling material and wastewater [B] are exemplified as a mesh. Substances, granules, etc. are decomposed into water and oxygen. Those with a large contact area with the filling material. The filling material Λ is preferably used as an additive to the aforementioned alkali-added waste liquid, and the materials of various materials such as plastics and ceramics can use stainless steel. The regular fillers such as Rasching ring, Bohr ring, and the above-mentioned fillers include, for example, Raschig rings, metal, synthetic resin & etc., saddle type fillers, IMTP, step fans and the like. , Irregular fillings, Su 1 zer fillers so that hydrogen peroxide decomposes the water [B] to disperse the ammonia and other waste gases (e.g., waste ammonia and other gases after the decomposition) [B] Dispersing gas by gas identification, release of gas (including _ dagger step gasification wastewater [A] to obtain 2014-5709-PF (Nl); Tcshiau.ptd No. 11 1238811 V. Description of the invention (8) [A] gas The gas is collected and processed by the catalyst in the above gas decomposition step. / With this treatment, the treatment equipment can be simplified and the operating cost can be reduced compared to the case of individually treating various wastewaters. 1 The wastewater treatment method of the invention, the aforementioned hydrogen peroxide content The step is performed simultaneously with the aforementioned release step, and the gas obtained by the above step and the gas obtained in the aforementioned gasification step can also be subjected to the aforementioned decomposition step at the same time (invention 2 of the first invention). In other words, it is to treat two kinds of wastewater at the same time. Method, wherein one of the aforementioned wastewater is a waste containing a gasifiable organic compound, [A ^, the other of the aforementioned wastewater is a waste water containing a dispersible compound and hydrogen peroxide [B], the method may also be Including gasification of the aforementioned waste water, in the following two steps: solution, the hydrogen peroxide in the waste water ⑻ simultaneously releases the foregoing waste, the decomposition of the compounds in [B] can be released. The release step, step: the obtained gas (Hereinafter referred to as [A] gasified gas) and the gas obtained in the front = knife solution. Release step (the following decomposition step (hereafter referred to as the gas fraction = the treatment method of the 2nd ~ 2nd) of the present invention One of the water treatment devices is a human treatment device that treats two kinds of waste water at the same time. The other waste water is a gasified organic compound waste water [Α] 'The above waste [B], the main device of the device 3 is to be released. Compounds and hydrogen peroxide wastewater before decomposition The waste water is obtained from the gasification part of the waste water [A] by decomposing and oxidizing the dissolvable compounds to dissolve and dissolve the aforementioned gasification part in the aforementioned waste water [β]: ([A] gasified gas) and the aforementioned decomposition and release m 2014-5709-PF (Nl); Tcshi au.ptd Page 12 1238811 V. Description of the invention (9) Dispersion part ^ gas ([B] releases the above decomposition · May blood h, gift basket y knife solution). Examples of methods include use; 2 steps (decomposition. Release section) of hydrogen peroxide decomposition filling materials. The contact with waste water is large and can decompose peroxidation. The method of using the above-mentioned filling material is to make the waste water [B] and the vineyards and the decomposition energy of nitrogen peroxide through the filling material. Decomposes into water and oxygen. Filling material Dihydrogen, 1, please, step; your hl two: ng, Boer ring, rectangular saddle type filling material. In the present invention, the metal watch accessories such as the clothing 1zer filling material are the 2nd invention of this invention, because the air is sent to the first eight days, the introduction of the scattered gas and the ammonia and the like are released at the same time: j The pressure loss of the diffused gas and the shape of the liquid to prevent the flooding of the liquid. These materials are preferably iron, and main materials such as: rust steel, nickel and its alloys; and steel alloys such as phosphorous copper, phosphor bronze, aluminum bronze, and white. The above-mentioned filling material with hydrogen peroxide decomposition activity can be filled in the processing tower with various metal products of mesh, soil, tube, or honeycomb shape to reach the cost! Effect of Invention 2 The materials of these metal fillers are preferably the same as those described above. Iron; sus 304, sus 316, and other precious steels made of nickel and alloys thereof; copper and phosphorous bronze, phosphor bronze, and aluminum bronze , White copper, etc. Noble metal elements such as carbon, platinum, palladium, ruthenium, and rhodium; cobalt, manganese, and the above-mentioned fillers having hydrogen peroxide decomposition activity are also suitable as catalysts generally used for the decomposition of hydrogen peroxide. For example, live from therapy, iron, copper > \ AA -Sfe. / V fir? —

2014-5709-PF(Nl)；Tcshiau.ptd 第13頁 1238811 五、發明說明（10) 鎳等等的皁金屬元素令欽、氧化石夕—氧化紹 2氧化銘、二氧化石夕、二氧化矽等的惰性單，夕搞& 匕釔、虱化鐵、二氧化鈽、碳化分的擔持量“持二】觸媒活性Μ ^ 〇·〇卜10克/公升。類而有所不同，一般為在本第1發明之2，阳或體導入同時進行_I & t馮以過氧化氫的分解與放散用氣之屢力損失汽提)，若考慮放散氣體體的形狀較佳為網狀、^ ，前述惰性擔持〗觸媒型填充材的：分為官狀=狀=狀:有又；少ϊ種選自氧化錯、鐵以月#&性厌」或含有至 1種擇自自金、銀 '、乳匕物為第1成分’與至少金屬以及/或氧化物之觸媒」、了、以及鐘所組成之群組的之金解活性之上述填充材，可使用在上述狀或ΐ窩狀），VI，製的構造體中（網狀、粒狀、管性者。i述全屬3势错述金屬製填充材中還添加有觸媒活 SUS 316#/；Λ 造體的材料可舉例如鐵（SUS 304、2014-5709-PF (Nl); Tcshiau.ptd Page 13 1238811 V. Description of the invention (10) Soap metal elements such as nickel, etc. The inert form of silicon, etc., & yttrium, iron oxide, plutonium dioxide, carbonization support "hold two" catalyst activity M ^ 〇 · 〇b 10 g / liter. It varies by class. In general, in the second invention of the first invention, the introduction of the anode or the body is carried out at the same time. _I & t is based on the repeated loss of hydrogen peroxide for the decomposition and release of gas for stripping.) If the shape of the released gas is considered better, It is net-shaped, ^, and the aforementioned inert support catalyst-type filling material: divided into official shape = shape = shape: yes and again; the lesser species is selected from the group consisting of oxidized oxide, iron and moon # & 1 type of said filling material selected from the group consisting of gold, silver ', milk dagger as the first component' and at least a metal and / or oxide catalyst ", and a bell, It can be used in the above-mentioned or pit-like structures), VI, and structures (reticulated, granular, and tube-like. All of the above-mentioned three-dimensional staggered metal fillers are added. There live catalyst SUS 316 # /; Λ material may be made for example such as iron body (SUS 304,

Mb dlb#的不銹鋼），榼並璘青銅、銘青銅」白=ί:ϊ ;銅以及麟脫青銅、其構造體具有過氧化氫分解活性丄在成等氺加觸構造體中以藥液處理和燒成分的種類而有所不同，一般為〇.〇1〜1〇夺克里力：為視擔持再者，本第1發明之2，處理塔内的上述填充材層較佳第14頁 2014-5709-PF(Nl);Tcshiau.ptd 1238811 五、發明說明（11) 是由主要具備具有1層以上的過氧化氫分解觸媒能的層（以下稱為過氧化氫分解觸媒層），與1層以上的具有氨放散能的層（以下稱為氨放散填充材層），該等層積層而構成者。過氧化氫分解觸媒層與氨放散填充材層可分離設置亦可不分離設置’或父互積層而設置。對於廢水的液體流向可以在上流側設置過氧化氫分解觸媒層，在其後流側設置氨放散填充材層，亦可在相反的上流側設置氨放散填充材層，而在其後流側設置過氧化氫分解觸媒層。依照廢水的 pH等的特性決定適當的設置順序。過氧化氫分解觸媒層以及氨放散填充材層，可設置各自1層，或2層，或以上的複數層，在不脫離本第丨發明之2 之主曰的範圍内可為各種型態。例如，亦可在過氧化氫分解觸媒層之2層或2層以上，與氨放散填充材層之2層或2層以上，過氧化氫分解觸媒層位於氨放散填充材層的上方而相互设置，從處理塔6的底部供給放散用氣體。上述氨放散填充材層亦可配置在過氧化氫分解觸媒層的上方。再者，上述型態的氨放散填充材層可採用迪克森填充材（Dixon packing)、拉西環（Rasching ring)、波爾環、矩鞍型填料、㈣、階式迷你環、金屬冑、合成樹醋、料！等一般塑膠製’鐵夫龍製，磁製或金屬製的填充材而形成。分解.放散步驟（分解.放散部），放散氨等的可放^化合物而得到[Β]放散氣體（含氨等氣體）。另方面以亂化步驟氣體化廢水[A ]而得[Α ]氣體化氣Mb dlb # of stainless steel), 榼 and 白 bronze, Ming bronze "white = ϊ: ϊ; copper and lindro bronze, the structure of which has hydrogen peroxide decomposition activity, treated with chemical solution in the isothermal contact structure It is different from the type of the burning component, but it is generally from 0.001 to 10. Crylic force: depending on the support, the second aspect of the first invention of the present invention is preferably the fourteenth filling material layer in the processing tower. Page 2014-5709-PF (Nl); Tcshiau.ptd 1238811 V. Description of the invention (11) is a layer mainly provided with hydrogen peroxide decomposition catalyst layer having more than one layer (hereinafter referred to as hydrogen peroxide decomposition catalyst layer) ), And one or more layers having an ammonia releasing energy (hereinafter referred to as an ammonia releasing filling material layer), and these layers are laminated and constituted. The hydrogen peroxide decomposition catalyst layer and the ammonia release filling material layer may be provided separately, or may be provided without separation 'or a parent interlayer. For the liquid flow direction of wastewater, a hydrogen peroxide decomposition catalyst layer can be provided on the upstream side, an ammonia release filler material layer can be provided on the downstream side, or an ammonia release filler material layer can be provided on the opposite upstream side, and the downstream side A hydrogen peroxide decomposition catalyst layer is provided. Determine the proper setting sequence according to the characteristics of the pH of the wastewater. The hydrogen peroxide decomposition catalyst layer and the ammonia release filling material layer can be provided with one layer, two layers, or a plurality of layers, respectively, and various types can be used without departing from the scope of the second invention. . For example, two or more layers of the hydrogen peroxide decomposition catalyst layer and two or more layers of the ammonia release filler material layer may be provided above the ammonia release filler material layer. They are mutually arranged, and a gas for emission is supplied from the bottom of the processing tower 6. The ammonia-releasing filler layer may be disposed above the hydrogen peroxide decomposition catalyst layer. In addition, the above-mentioned type of ammonia release filling material layer may use Dixon packing, Rasching ring, Boer ring, saddle type packing, ㈣, step mini ring, metal 胄, Synthetic tree vinegar, ingredients! It is formed by filling materials made of general plastic 'Teflon, magnetic or metal. Decomposition and release step (decomposition. Release part), release the bleachable compounds such as ammonia and get [B] release gas (containing ammonia and other gases). On the other hand, [A] is obtained by gasifying wastewater [A] in a scrambling step.

2014-5709-PF(Nl);Tcshiau.ptd 第15頁 1238811 五、發明說明（12) " " ------ 體，將該氣體與上述[B]放散氣體結合，以觸婢在上述氟體分解步驟進行處理。司姝在上江措此處理，比在分別處理各廢水的場合，處理設備此夠間化，且能減低操作成本，特別是過氧化分解與氨的放散以1步驟進行，裝置能夠大幅簡化。上处合中a又置具有過氧化氫分解活性的填充材層，從該，理塔的底部供給空氣，氣氣或水蒸氣等的氣體，由處理塔的上方部（例如塔頂部）通入上述廢水，若同時進行過氧化氫的分解與氨的放散，上述填充材的過氧化氫分解活11、、隹，很回，能以向分解率穩定地分解過氧化氫，但是因為亦能充分進行氨的放散處理，因此如上述以丨步驟進行過氧化氫的分解與氨的放散之本第丨發明之2為更佳。上述可氣化之有機化合物，可舉例如沸點8 〇〇它以下的有機化合物，更適合本發明之處理為沸點丨〇〇它以上， 6 0 0 C以。下的含氮有機化合物。更適合者為沸點丨〇〇它以上，350 °C以下的含氮有機化合物。在上述之中適合本發明之處理舉例為氫氧化四烷基銨，特舉代表例氫氧化四烷基銨（以下稱為TMAH)。廢水[A ]中所含之上述可氣化之有機化合物，若可溶於水的物質則並不特別限制其種類，但具體言之，上述丁河人^之外，可舉例如氫氧化四烷基銨和胆碱（(：^〇111^)、等的第4級烷基銨鹽、或尿素、肼、吡啶、哌啶、吡嗪、吡唑、吡唑啉、2 -吡咯烷g同、N _乙烯吡咯烷酮、單乙醇2014-5709-PF (Nl); Tcshiau.ptd Page 15 1238811 V. Description of the invention (12) " " ------ body, the gas is combined with the above [B] release gas to touch The treatment is performed in the above-mentioned fluorine decomposition step. This process was carried out in Shangjiang by the company. Compared with the case where each wastewater is treated separately, the treatment equipment can be separated and the operating cost can be reduced. In particular, the peroxidative decomposition and ammonia release can be performed in one step, which can greatly simplify the equipment. During the closing process, a filling material layer having a hydrogen peroxide decomposition activity is provided. From this, a gas such as air, gas, or water vapor is supplied from the bottom of the tower, and is passed in from the upper part of the processing tower (for example, the top of the tower). If the above-mentioned wastewater is decomposed with hydrogen peroxide and ammonia is released at the same time, the hydrogen peroxide decomposition activity of the above-mentioned filler material is very low, and hydrogen peroxide can be decomposed stably at the decomposition rate, but it is also sufficient Since the ammonia release treatment is performed, it is more preferable to perform the decomposition of hydrogen peroxide and the ammonia release according to the second step of the second invention as described above. The above-mentioned gasifiable organic compound may be, for example, an organic compound having a boiling point of 800 ° C or less, and is more suitable for the treatment of the present invention with a boiling point of ≧ 00 ° C and 600 ° C. Nitrogenous organic compounds. More suitable are nitrogen-containing organic compounds with a boiling point above ○ ○ and below 350 ° C. An example of a treatment suitable for the present invention among the above is tetraalkylammonium hydroxide, and a representative example is tetraalkylammonium hydroxide (hereinafter referred to as TMAH). The above-mentioned gasifiable organic compounds contained in the wastewater [A] are not particularly limited if they are water-soluble substances, but specifically, in addition to the above-mentioned Dinghe people ^, for example, tetrahydroxide Alkyl ammonium and choline ((: ^ 〇111 ^), etc. of level 4 alkyl ammonium salts, or urea, hydrazine, pyridine, piperidine, pyrazine, pyrazole, pyrazoline, 2-pyrrolidine g Same, N _ vinyl pyrrolidone, monoethanol

第16頁 2014-5709-PF(Nl);Tcshiau.ptd 1238811 五、發明說明（13) 胺、二乙醇胺等的醇胺類、乙二醇、丙二醇 ;，蟻酸、醋酸、丙烯酸等的有機酸類，醋酸銨；醇 #的以熱分解分解氣化之有機酸銨鹽等。蟻酸鉸本發明之處理對象之上述廢水 :匕合可溶於水的物質，且伴隨空氣等的氣> 亂，或/、兩者在廢水中放散物質，其種類沒有特=凑 :體言之’上述氨之外，可舉例如乙醯亞醯胺㈣、：制’ :1或曱醇：乙醇、卜丙醇、2-丙醇等的醇類，甲^氧口夫烯醛等的醛類，2-丙_、2_ 丁酮等的酮類、N，N—二甲|乙胺（hydraZine)、N，N，-二甲基聯胺等的聯胺類，;Z基聯胺，二甲胺…胺、三甲胺、三乙胺等的胺類t烁乙胺等的亞胺類，乙烯腈、丙烯腈等的腈類。乙埽亞在本第1發明之處理方法，較佳是在前述之前’設置濃縮前述廢水[A 1之嚿缩牛驟兮:-化乂驟救田Y恭土、人4 =尽水LA」之濃細步驟。該濃縮步驟可抓用蒸^法、Q凍凍結法、膜分離法等—般習知的方，由以上述濃縮步驟濃縮廢水[A]，可減低在後續井 :ί 31「t Γ &體化必須之熱量。*以上述濃縮步驟預先浪紬廢水[A]，可氣體化裝置（氣體化部）至少化該濃縮之TMAH等程度的大小，因此可以比較小·、、、型完孔體，又氣體化裝置（氣體化部）的消耗能量亦比未濃縮液=體化的場合要少。加上因為往分解步驟的氣體量降低，分解步驟的裝置（分解部）變小而完成。藉此處理裝置整體能變的非常小型（compact)。且分解步驟（分解部）的觸媒反應器必須昇溫至既定溫度所需的熱量亦大幅降低。因此從操作Page 16 2014-5709-PF (Nl); Tcshiau.ptd 1238811 V. Description of the invention (13) Alcohol amines such as amines, diethanolamine, ethylene glycol, propylene glycol; organic acids such as formic acid, acetic acid, acrylic acid, etc. Ammonium acetate; ammonium salt of alcohol # which is decomposed and vaporized by thermal decomposition. Formic acid hinge The above-mentioned waste water to be treated by the present invention: a substance that is soluble in water and accompanied by air and other gases > disorder, or / or both release substances in the waste water, the type is not special In addition to the above-mentioned ammonia, for example, acetamidinium sulfonium chloride can be used: 1 or alcohols: alcohols such as ethanol, propanol, 2-propanol, and methoxyhuffenal. Aldehydes, ketones such as 2-propanone, 2-butanone, N, N-dimethyl | ethylamine (hydraZine), hydrazines such as N, N, -dimethylhydrazine, and Z-based hydrazine Dimethylamine ... amines such as amines, trimethylamine, and triethylamine; t-ethylamine and other imines; and nitriles such as vinyl nitrile and acrylonitrile. In the treatment method of this invention, it is preferable to set up the aforementioned waste water prior to the above-mentioned [A 1 of the cow shrinking cows suddenly:-Hua Yixu rescue field Y Gongtu, person 4 = exhaust water LA " The thick steps. This concentration step can use steaming method, Q freeze-freezing method, membrane separation method, etc.-generally known methods. By concentrating wastewater [A] by the above concentration step, the subsequent wells can be reduced: ί 31 「t Γ & The amount of heat necessary for the physical conversion. * The waste water [A] is preliminarily sprayed in the above concentration step, and the gasification device (gasification unit) can reduce the size of the concentrated TMAH at least, so it can be relatively small. In addition, the energy consumption of the gasification device (gasification section) is less than that in the case where the unconcentrated liquid = the body is vaporized. In addition, because the amount of gas to the decomposition step is reduced, the device (decomposition section) of the decomposition step becomes smaller and is completed. As a result, the entire processing device can be made very compact. In addition, the catalyst reactor in the decomposition step (decomposition section) must be heated to a predetermined temperature, and the amount of heat required is also greatly reduced.

2014-5709-PF(Nl);Tcshiau.ptd 第 17 頁 1238811 五、發明說明（14) 成本以及初期投資兩方面來說，係為非常經濟效益的處理方法，和裝置。本第2發明之廢水的處理方法，係為淨化處理含有可氣化有機化合物，可放散化合物，以及過氧化氫之廢水 [C ]的方法，該方法主要具有分解前述廢水[c ]中的過氧化氫之過氧化氫分解步驊，放散前述廢水[C]中的前述可放散化合物之放散步驟，氣體化前述廢水[c ]中可氣化之有機化合物的氣化步驟，將前述氣化步驟所得之氣體與前述放散步驟所得之氣體以觸媒分解處理之分解步驟（氣體分解步驟）。前述氣化步驟，過氧化氫分解步驟，放散步驟亦可分別進行（以下該場合稱為本第2發明之1 )，或者如後述亦可分解過氧化氫同時進行可放散化合物的放散（為了更容易瞭解，該場合的處理步驟如後述稱為「分解·放散步驟」）（以下該發明的場合稱為本第2發明之2 )。本第2發明之1的廢水的處理方法，還包括濃縮前述廢水[C ]中的前述可氣化之有機化合物的濃縮步驟，前述氣化步驟較佳是氣體化該濃縮步驟而得之濃縮液。於是①可以在前述濃縮步驟以及前述放散步驟前先進行前述過氧化氫分解步驟，或者②在前述過氧化氫分解步驟以及前述放散步驟之前先進行前述濃縮步驟，或③亦可以在前述濃縮步驟以及前述過氧化氫分解步驟之前先進行前述放散^ α 驟’較佳是在前述濃縮步驟以及前述放散步驟之前先^行前述過氧化氫分解步驟的場合①。如前述，放散蠢巧人 %寻的場合，為了使放散更良好而添加鹼，廢水中存在過氣化^2014-5709-PF (Nl); Tcshiau.ptd Page 17 1238811 V. Description of the invention (14) The cost and initial investment are both very economical treatment methods and devices. The wastewater treatment method of the second invention is a method for purifying and treating wastewater [C] containing gasifiable organic compounds, dispersible compounds, and hydrogen peroxide. The method mainly includes decomposing the wastewater in the aforementioned wastewater [c]. Hydrogen peroxide decomposition step of hydrogen peroxide, release step of the aforementioned dispersible compound in the aforementioned wastewater [C], gasification of the vaporizable organic compound in the aforementioned wastewater [c], and gasification step A decomposition step (gas decomposition step) in which the obtained gas and the gas obtained in the aforementioned dispersing step are subjected to catalytic decomposition treatment. The aforementioned gasification step, hydrogen peroxide decomposition step, and release step may be performed separately (hereinafter referred to as 1 of the second invention in this case), or as described later, hydrogen peroxide may be decomposed and the releaseable compound may be released (for more It is easy to understand that the processing steps in this case are referred to as "decomposition and release steps" as described later) (hereinafter, the case of this invention is referred to as the second invention 2). The method for treating wastewater of the second invention 1 further includes a concentration step of concentrating the gasifiable organic compound in the wastewater [C]. The gasification step is preferably a concentrated liquid obtained by gasifying the concentration step. . So ① the hydrogen peroxide decomposition step may be performed before the concentration step and the release step, or ② the concentration step may be performed before the hydrogen peroxide decomposition step and the release step, or ③ may also be performed before the concentration step and It is preferable that the aforementioned release step ^ α step 'before the aforementioned hydrogen peroxide decomposition step is performed before the aforementioned concentration step and the aforementioned release step ①. As mentioned above, in the field where the stupid people are looking for, in order to make the dispersion better, alkali is added, and there is over-gasification in the wastewater ^

1238811 五、發明說明（15) f ’驗添加量必須增加，因此為了降低鹼的消耗量，較佳疋f放政步驟别先進行過氧化氫分解步驟。又在前述過氧化^分解步驟以及前述放散步驟之前先進行前述濃縮步驟的，合②’濃縮TMAH等後的濃縮水含有若干過氧化氫，加上還有/過氧化氣之濃縮液的高溫的氣體化步驟，過氧化七為強f化劑會有導致裝置的腐蝕的可能性。藉此該②的 % 口在氣~體化步驟的裝置必須使用高價的耐腐蝕性材料 (例如T 1等）。因此從降低裝置成本的觀點，較佳是在濃縮步驟前先進行過氧化氫分解步驟。 ^ ^ ，刚述濃縮步驟以及前述放散步驟之前先進行前述過乳匕虱^解步驟的場合①，舉例有以下2個較佳型態，1 中-型態為’首先將廢水[c]施予過氧化氫分解步驟，對 =”氫分Ϊ後之液相施予前述放散步驟，㈣對放散 4 ’文目轭予則述濃縮步驟，對該濃縮步驟製得之濃$ y 施予前述氣體化步驟，接著對該氣體化；= ，放散：驟得之氣體施予前述分解步驟(①_r)。另—型別將廢水[C]施予過氧化氫分解㈣，對該過氧化施予濃縮步驟(例如進行加熱濃縮），接著 Γ辰=之前述可放散化合物施加凝縮之凝縮ί者 f對忒减縮步驟而得之凝縮水施加前述放散步驟， ”：：步驟得之濃縮液施予前述氣體化步驟，接著：斜之氣體與前述放散步驟得之氣體施予二: 實現如上述本第2發明之1的處理方法的本發明之處理第19頁 2014-5709-PF(Nl);Tcshiau.ptd l2388ll 五、發明說明（16) _ 较蓄少、過’係為含有可氣化有機化合物，可放散 ^孔化氫之廢水[c]的處理物以及述廢水「C Ί中的w3在置王要包括分解前水[C ]中的乂卞可访a虱的過氧化氫分解部，放散前述廢 [c] J前述；：：f化合物之放散部’氣體化前述廢水解從該氣體：部排之出之機，合一物的氣體化部’11由觸媒分部(氣體分解部）。A體丽述放散部放散之氣體的分解 [C]中本的古處;1裝置，車交佳具有濃縮前述廢水是氣體化r V,:丄化合物的濃縮部，前述氣體化部 3化攸“縮部排出之前述濃縮液。於是，丨述》辰縮部以及前述放散部〇在解部，或者亦可⑺户义述過氧化氫分部承L ^者亦了②在則述過氧化氫分解部以及前诚访與更上側設置前述濃縮部， ^ ^ 月 ^氧化氫分解部更上流側設== = = 化氫分解:迷放散部更上流側設置前述過氧氧刀解。卩的％合①，在上述①的場合，舉例乳1238811 V. Description of the invention (15) The amount of f ′ must be increased. Therefore, in order to reduce the consumption of alkali, it is better to carry out the hydrogen peroxide decomposition step before the 放 f administration step. If the concentration step is performed before the peroxidation decomposition step and the release step described above, the concentrated water after condensing TMAH and the like contains some hydrogen peroxide, plus the high temperature of In the gasification step, the peroxidation is a strong chemical agent, which may cause the corrosion of the device. Therefore, the device of the %% mouth in the gas-to-body step must use expensive corrosion-resistant materials (such as T 1 etc.). Therefore, from the viewpoint of reducing the cost of the apparatus, it is preferable to perform a hydrogen peroxide decomposition step before the concentration step. ^ ^ In the case where the concentration step and the dissolution step are performed before the above-mentioned milking lice ^ solution step is performed ①, for example, there are the following two preferred types, 1 medium-type is' first the wastewater [c] application The hydrogen peroxide decomposition step is given, and the liquid phase after hydrogen depletion is given to the aforementioned dispersing step, and the 4 ′ text yoke is given to the concentration step, and the concentrated $ y obtained in the concentration step is given to the foregoing The gasification step, followed by the gasification; =, release: the gas obtained is applied to the aforementioned decomposition step (①_r). Another type is to treat the wastewater [C] with hydrogen peroxide to decompose plutonium, and apply the peroxidation. Concentration step (for example, heating and concentration), followed by the condensation of the above-mentioned dispersible compound, which is condensed, and the condensate obtained from the reduction step is subjected to the foregoing dispersing step, "": the concentrated solution obtained in the step is applied The aforesaid gasification step, then: the oblique gas and the gas obtained in the aforesaid dispersing step are administered to two: the treatment of the present invention which realizes the above-mentioned treatment method of the second invention of the first page 19-2014-5709-PF (Nl); Tcshiau.ptd l2388ll V. Description of the invention (16) _ less storage The system is a treatment product containing waste gas [c] which contains gasifiable organic compounds and can disperse pore hydrogen, and the waste water "C3" in W3 should include the waste water in the water [C] before decomposition. Visit the hydrogen peroxide decomposition section of a tick to release the waste [c] J the foregoing; ::: The compound's release section 'gasifies the aforementioned waste water to decompose from the gas: section, the gasification section of the unity '11 by the Catalyst Division (Gas Decomposition Section). Decomposition of the gas released by the A body Lishu release section [C] Nakamoto's ancient place; 1 device, Che Jiao Jia has concentrated the aforementioned wastewater is gasified r V ,: The condensing part of the amidine compound is the condensate discharged from the condensing part of the gasification part. Therefore, the "Chen Shun" section and the aforementioned release section 〇 in the solution section, or you can also describe the hydrogen peroxide branch to accept L ^ ② also described in the hydrogen peroxide decomposition section and the former visit and more The above-mentioned concentration section is set on the upper side, and the hydrogen oxide decomposition section is set on the upstream side == = = hydrogenation decomposition: the diffuser section is set on the upstream side with the above-mentioned peroxidation knife solution. %% of ① ①, in the case of ① above, an example is milk

::佳裝置。其中之一’首先導入廢水[C]於過氧八J :’將該過氧化氫分解後之液相導前述放散部刀解:: 佳装置. One of them ’first introduces waste water [C] into peroxo-8 J:’ and the liquid phase after decomposing the hydrogen peroxide is conducted to the aforementioned dispersing section.

，，液相導入前述濃縮部，將從該濃縮部；S 該氣體化不得之氣體與前述放散；=1 體V入則述分解部，即具備導入廢水[c]於過乱邛，官線，從該過氧化氯分解導出液相並導入1^解白勺=線’從該放散後導出液相並導入前述遭縮部^ =部一種’首先導入廢水[C]於過氧化氫分解部， γ 对5¾過氣The liquid phase is introduced into the above-mentioned concentrating section, and the condensing section will be released from the condensing section; S, the gas that cannot be gasified will be released from the foregoing; = 1 body V will enter the decomposing section, that is, it will have the introduction of wastewater [c] The liquid phase is derived from the decomposition of the chlorine peroxide and introduced into the solution. The line is derived from the release of the liquid phase and is introduced into the aforesaid constricted section. The first step is to introduce wastewater [C] into the hydrogen peroxide decomposition section. , Γ over 5¾

1238811 五、發明說明（17) 化氫分解後之液相導入前述放散部，將該放散後之液相導入前述濃縮部，將從該濃縮部排出之氣相導入凝縮部（凝縮部是凝縮可放散化合物的凝縮的部份），將該凝縮水導入放散部，將前述濃縮部得之濃縮液導入氣體化部，將該氣體化部得之氣體與前述放散部得之氣體導入前述分解Λ 部，即具備導入廢水[C ]於過氧化氫分解部的管線，從該過氧化氫分解導出液相並導入前述濃縮部的管線，從該濃縮部導出氣相導入凝縮部之管線，從該凝縮部導出液相並導入前述放散部的管線。1238811 V. Description of the invention (17) The liquid phase after the decomposition of hydrogen hydride is introduced into the above-mentioned dispersing section, the released liquid phase is introduced into the aforementioned concentrating section, and the gas phase discharged from the concentrating section is introduced into the condensing section (the condensing section is a The condensed part of the compound is released), the condensed water is introduced into the dispersing section, the concentrated liquid obtained from the concentrating section is introduced into the gasifying section, and the gas obtained from the gasifying section and the gas from the dispersing section are introduced into the decomposition section Λ That is, there is a pipeline for introducing wastewater [C] into a hydrogen peroxide decomposition unit, a pipeline from which the hydrogen peroxide is decomposed to introduce a liquid phase and introduced into the above-mentioned concentration section, a pipeline from which the gas phase is introduced into a condensation section, and from this condensation The liquid phase is led out to the pipeline of the above-mentioned discharge portion.

本第2發明之1的上述過氧化氫分解步驟（過氧化氫分解部）的過氧化氫之分解手法，與上述本第1發明之1相同，可舉例如使用各種觸媒的方法，利用光氧化的方法，使用與廢水動的接觸大的填充材的方法。從如上述經過過氧化氫分解步驟（過氧化氫分解部）含廢水[C]，抽出濃縮之ΤΜΑΗ等（有機化合物）與濃縮之氨體，藉由觸媒將該等進行分解處理。藉由這樣的處理可C 有效處理ΤΜΑΗ等的有機化合物與氨以及過氧化氫為冬 (Ν2)、-一乳化石厌氣體（C02)、水（Η2〇)。 …：5The method for decomposing hydrogen peroxide in the hydrogen peroxide decomposition step (hydrogen peroxide decomposition section) of the first invention of the second invention is the same as that of the first invention of the first invention, and for example, a method using various catalysts and using light The oxidation method is a method using a filler which is in large contact with wastewater. From the waste water [C] which has undergone the hydrogen peroxide decomposition step (hydrogen peroxide decomposition section) as described above, the concentrated TMAY and the like (organic compounds) and the concentrated ammonia are extracted, and these are decomposed by a catalyst. With such a treatment, organic compounds such as TMAI, ammonia, and hydrogen peroxide can be effectively treated as winter (N2), -an emulsified rock anaerobic gas (C02), and water (Q2O). …: 5

藉由將ΤΜΑΗ等以及含有氨的廢水全體氣化，再以分解處理該氣體，該觸媒分解處理需要非常大型的裝置，加上觸媒反應為必須昇溫至反應適溫需要非常多的埶旦，若依照本第2發明之1 ,處理裝置非常小型，且觸媒^ I写昇溫至既定溫度所必須的熱量大幅降低。因此從操作以及初期投資兩方面來說，係為非常經濟效益的處理方By gasifying TIMA and the like and ammonia-containing wastewater as a whole, and then decomposing and treating the gas, the catalyst decomposition process requires a very large-scale device. In addition, the catalyst reaction requires a very large amount of water to increase the temperature to the reaction temperature. According to the first invention of the second invention, the processing device is very small, and the amount of heat necessary for the catalyst to increase to a predetermined temperature is greatly reduced. Therefore, it is a very economical processor in terms of operation and initial investment.

2014-5709-PF(Nl);Tcshiau.ptd 第21頁 1238811 五、發明說明（18) 法。前述氣體化步驟得之氣體與料個別分解步驟進行，因此卜、十、#儿j Μ ^ Α辦、e人口此上述虱化步驟得之氣體與上述含 < 5進行分解步驟是有效率的，能達成裝置的簡單化。〔如如上述在前述有機化合物為TMAH的場合，較佳是分離之TMAH與氨再次混合於分解步驟分解，即對』的刀氣體與氨氣體混合施加觸媒分解，效率優良，可以達成裝置的簡單化。又本第2發明亦可為如前述之分解過氧化氫同時放散 <放散化合物（本第2發日月之2)，本第2發日月之2的廢水處理方法，係為淨化處理含有可氣化有機化合物，可放散化合物丄以及過氧化氫之廢水[C]的方法，該方法主要具有分解刖述廢水[c ]中的過氧化氫同時放散前述可放散化合物之分解·放散步驟，氣體化前述分解·放散後之廢水的氣化步驟’將前述氣化步驟所得之氣體與，前述分解·放散步驟所彳于之氣體以觸媒分解處理之分解步驟（氣體分解步驟）。實現如上述本第2發明之2的處理方法的本發明之處理裝置’係為含有可氣化有機化合物，可放散化合物，以及過氧化氣之廢水[C ]的處理裝置，該裝置主要包括分解前述廢水[C ]中的過氧化氫同時放散前述可放散化合物之分解·放散部，氣體化從前述分解·放散部排出之分解·放散後之廢水的氣體化部，藉由觸媒分解從該氣體化部排出之氣體與前述分解·放散部放散之氣體的分解部（氣體分2014-5709-PF (Nl); Tcshiau.ptd Page 21 1238811 V. Description of Invention (18). The gas and material obtained in the foregoing gasification step are individually decomposed. Therefore, it is efficient to perform the decomposition step with the gas contained in the above-mentioned lice formation step and the above-mentioned < 5. , Can simplify the device. [As described above, in the case where the aforementioned organic compound is TMAH, it is preferable that the separated TMAH and ammonia are mixed again in the decomposition step to decompose, that is, the catalyst gas is mixed with the knife gas and ammonia gas to decompose, the efficiency is excellent, and the device can be achieved. simplify. The second invention can also be a method for treating waste water which decomposes hydrogen peroxide simultaneously and releases < release compounds (the second issue of the second issue of the second month), and the second issue of the second issue of the second release of the sun and the moon for purification treatment. A method for gasifying organic compounds, releasing compounds 丄 and waste water [C] of hydrogen peroxide. The method mainly includes the steps of decomposing and releasing the above-mentioned releaseable compounds while decomposing hydrogen peroxide in the waste water [c], Gasification step of gasifying the waste water after the decomposition and release described above is a decomposition step (gas decomposition step) in which the gas obtained in the gasification step and the gas in the decomposition and release step are treated with a catalyst. The treatment device of the present invention for realizing the above-mentioned treatment method of the 2nd invention 2 is a treatment device for wastewater [C] containing vaporizable organic compounds, dispersible compounds, and peroxide gas, and the device mainly includes decomposition The hydrogen peroxide in the waste water [C] simultaneously releases the decomposition / discharge portion of the dispersible compound, and the gasification portion of the decomposed / discharged waste gas discharged from the decomposition / release portion is gasified, and is decomposed from the catalyst by the catalyst decomposition. Decomposition unit (gas component) of the gas discharged from the gasification unit and the gas released from the decomposition / release unit

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五、發明說明（19) 解部）。本第2發明之2的處理裝置，較 [C]中的前述可氣化有機化合物的濃縮部，’辰前述廢水是氣體化從該濃縮部排出之前述濃縮液。對於上乳體化部處理裝置，舉例為具備濃縮從前述分解·放，方法的解二放散後的廢水而得含有機化合物濃縮“濃二出之：述氣體化部係為氣體化從該濃縮部排出之前述濃二;匕則5. Description of the invention (19) Solution section). The treatment apparatus of the second aspect of the present invention 2 is characterized in that the waste water is the concentrated liquid discharged from the concentrated portion by vaporization, as compared with the concentrated portion of the vaporizable organic compound in [C]. For the upper emulsion processing unit, for example, it is provided with a method for concentrating organic compound-containing compounds by concentrating the waste water after decomposing and releasing the above-mentioned decomposition and release methods. The aforementioned thick two discharged by the Ministry;

本第3發明之廢水的處理方法，係為淨化處理：夜者。氣化有機化合物，可放散化合物，以及加熱前述廢3二而濃縮之加熱濃縮步驟，凝縮從該加熱濃縮部揮^ L J 散化合物以及過氧化氫的凝縮步驟，分解該凝縮^二氧化虱同時放散可放散化合物之分解.放散步驟， = 從前述加熱濃縮部排出之含有機化合物之濃縮液痛= :二义氣化步驟所排出之氣體與前述分解，放散步；所付^乳體以觸媒分解處理之分解步驟（氣體分解步驟）。The method for treating wastewater according to the third invention is a purification treatment: a night person. Vaporizing organic compounds, releasing compounds, and heating and concentrating the step of heating the waste 32 and condensing, condensing from the heating and concentrating part ^ LJ, a step of condensing the compound and hydrogen peroxide, decomposing the condensing ^ dioxide lice and releasing at the same time The decomposition of the compound can be released. The release step, = the concentrated liquid containing organic compounds discharged from the heating and concentrating part is painful: the gas discharged from the two-sense gasification step decomposes with the foregoing, and is taken for a walk; Decomposition step of decomposition process (gas decomposition step).

貫現如上述本第3發明的處理方法的本發明之處理裝置’，為含有可氣化有機化合物，可放散化合物，以及過氧化氫之廢水[C]的處理裝置，該裝置主要包括加熱前述廢水[C 而濃縮之加熱濃縮部，凝縮從該加熱濃縮部揮發之可放散化合物以及過氧化氫的凝縮部，分解該凝縮水中的f f化氫同時放散可放散化合物之分解·放散部，氣體，從則j加熱濃縮部排出之含有機化合物之濃縮液的氣化部丄將，述氣化步驟所排出之氣體與前述分解·放散步驟所得之氣體以觸媒分解處理之分解部（氣體分解部）。The treatment device 'according to the present invention embodying the above-mentioned treatment method according to the third invention is a treatment device for wastewater [C] containing vaporizable organic compounds, dispersible compounds, and hydrogen peroxide, and the device mainly includes heating the aforementioned Wastewater [C] The heating and concentrating part concentrated, condensing the decomposable compound and hydrogen peroxide condensing part volatilized from the heating and concentrating part, decomposing the hydrogenated hydrogen in the condensed water while releasing the decomposing and releasing part of the decomposable compound, gas, The gasification section of the concentrated liquid containing organic compounds discharged from the heating and concentration section is a decomposition section (gas decomposition section) for treating the gas discharged from the gasification step and the gas obtained from the aforementioned decomposition and release steps by catalytic decomposition. ).

1238811 五、發明說明（20) 上述分解·放散步驟（分解·放散部）之過氧化氫分解之分解手法，與上述本第1發明相同，可舉例如使用各種觸媒的方法，利用光氧化的方法，使用與廢水動的接觸大的填充材的方法。如上述，從廢水抽出濃縮之TMAH等（可氣化之有機化合物）與濃縮之氨（可放散化合物）氣體，藉由觸媒將該等進行分解處理。藉由這樣的處理可以有效處理TMAH等的有機化合物與氨以及過氧化氫為氮氣（N2 )、二氧化碳氣體 (C02)、水（H20) 〇根據本第2發明之2以及本第3發明，與前述本第2發明之1同樣地，與全體氣體化TMAH等以及含氨廢水而以觸媒分解處理場合不同，處理裝置變的非常小型（c〇mpact) i、因此從操作成本以及初期投資兩方面來效益的處理方法。 m n係為非常經濟月豆兴耵述分解步驟進行，但以上述氣體體W合而進行分解步驟是 & =如如上述在前述有機為氨的場合，較佳是一姐步驟分解，即對TMAH的某分解，其效率優良，可再者前述氣體化步驟得之氣之放散的含氨氣體可以個別分解化步驟得之氣體與上述Λ #装有效率的，可達到裝置二2 化合物為TMAH ’上述可放散化合旦分離之TMM與氨再次混合於分分解氣體減氣體以❿施加觸以達成裝置的簡單化。 ^有機化合物，與上述本从下的有機化合物，特別1238811 V. Description of the invention (20) The decomposition method of the decomposition and release step (decomposition and release section) for the decomposition of hydrogen peroxide is the same as the above-mentioned first invention. For example, various catalysts can be used. Method: A method using a filler which is in large contact with wastewater. As described above, the concentrated TMAH and other gases (gasizable organic compounds) and the concentrated ammonia (gas-releasable compounds) gas are extracted from the wastewater, and these are decomposed by a catalyst. With this treatment, organic compounds such as TMAH, ammonia, and hydrogen peroxide can be effectively treated as nitrogen (N2), carbon dioxide gas (C02), and water (H20). According to the second invention of the second invention and the third invention, and Similarly to the first aspect of the second invention, unlike the case where the entire gasification of TMAH, etc., and ammonia-containing wastewater are treated by catalytic decomposition, the treatment device becomes very compact (i.e., the operation cost and the initial investment are two). Aspects to the benefit of the treatment method. mn is a very economical decomposition step described above, but the decomposition step with the above gas is combined with & = As mentioned above, in the case of the aforementioned organic is ammonia, it is preferably a step decomposition, that is, A certain decomposition of TMAH has excellent efficiency. Furthermore, the ammonia-containing gas released by the gas obtained in the aforementioned gasification step can be separately decomposed into the gas obtained in the above step and the above Λ # is equipped with efficiency, and the device can be reached. 2 The compound is TMAH 'The TMM and ammonia separated by the above-mentioned dispersible chemical compound are again mixed with the decomposed gas and the reduced gas to apply a touch to simplify the device. ^ Organic compounds, and the above organic compounds, especially

2014-5709-PF(Nl)；Tcshiau.ptd 第24頁2014-5709-PF (Nl); Tcshiau.ptd Page 24

且本第2、3之發明上述可第1發明同i地舉例如彿點80(TC 1238811 五、發明說明（21) 是沸點1 0 0 °C以上，6 0 0 °C以下的含氮有機化合物適合於本發明之處理，更適合者為沸點1 〇〇 °c以上，3 5 〇 t以下的含氮有機化合物。與本第1發明同樣地適合本第2、3之發明3 的處理舉例如氫氧化四烷基銨，特別舉氫氧化四曱基銨代表例。 ~ 本第2、3發明之上述可放散化合物，與上述本第1發明同樣地，是可溶於水的物質，且伴隨空氣等的氣體或^ 氣，或其兩者在廢水中放散物質可舉例如氨為代表例。…、在本第卜3發明上述氣體分解步驟（氣體分解部）使In addition, the inventions of the second and third inventions may be the same as the first invention. For example, Buddha point 80 (TC 1238811 V. Description of the invention (21) is a nitrogen-containing organic compound having a boiling point of 100 ° C or higher and 60 ° C or lower. The compound is suitable for the treatment of the present invention, and more suitable is a nitrogen-containing organic compound having a boiling point of 100 ° C or more and 3 500t or less. The same treatment as the first invention is applicable to the treatment examples of the invention 3 of the 2nd and 3rd. Examples are tetraalkylammonium hydroxide, and tetramethylammonium hydroxide is a representative example. ~ The above-mentioned dispersible compounds of the second and third inventions are water-soluble substances similar to the first invention described above, and A representative example of a gas or gas accompanied by air or the like, or both of them is released in waste water. For example, in the gas decomposition step (gas decomposition section) described in the third invention of the present invention,

St;可同時分解上述可氣化有機化合物與上述可放的觸媒皆可，例如白金m、釕、銀和銅、猛、鎳、鈷、鉻、飾、鐵等的遷移金為活性成分或使用複數個氧化物基材金夕虱化鋁、二氧化鈦、氧化鍅、擔持之觸㉝，其他舉例有含有複數 f h化物擔體）鎳：鈷、銅、鐵等為活性成分之觸媒：1述，、鋇、錳、持該等鑭的觸媒。 ’、冲述氧化物基材擔上述可氣化有機化合物炎与k 散化合物為氨的場合q吏用的‘：化四烷基銨’上述可放及/或二氧化鈦.二氧化石夕=如有包含二氧化鈦以種擇自Μ、鶴、翻、是化物為第一成分，至少一第二成分’至少一種擇自白金、、且2之群組的金屬氧化物之鉻、以及銅組成之群組的金：：釔、釕、鍺、錳、特別較佳為Ti〇2 ,si〇2_v—=媒虱化物之第三成分者。 2〇14-5709.PF(Nl)；Tcshl iau.ptd 第25頁 1238811 五、發明說明（22) 本第卜3發明之上述氣體化步驟（氣體化 (1) :喷霧廢水於加熱之空間而全體實質疋列0 (2) 藉由直接加熱廢水使其蒸發而氣體化二步驟广f 的氣體化手法，具體是在常壓loot以上审让述上’再更佳為50(TC以上噴霧廢水於加熱的由加熱空間到向溫，在該空間内噴霧 /措St; It can decompose the above gasifiable organic compound and the above-mentioned release catalyst at the same time. For example, platinum, m, ruthenium, silver and copper, fibrous, nickel, cobalt, chromium, decoration, iron, etc. A plurality of oxide substrates, such as aluminum oxide, titanium dioxide, thorium oxide, and supported catalysts. Other examples include catalysts containing multiple fh compounds. Nickel: cobalt, copper, iron, etc. as active ingredients. Catalysts: 1 ,, Barium, manganese, catalysts holding these lanthanum. 'Such as the oxide substrate supporting the above-mentioned gasifiable organic compound inflammation and the k-disperse compound when ammonia is used:': Tetraalkylammonium 'can release and / or titanium dioxide. There is a group consisting of titanium dioxide, which is selected from the group consisting of M, Cr, Hf, and bismuth as the first component, and at least one second component, which is at least one metal oxide selected from the group consisting of platinum and chromium, and copper. Group of gold: yttrium, ruthenium, germanium, manganese, particularly preferably Ti〇2, SiO2_v— = the third component of mites. 〇14-5709.PF (Nl); Tcshl iau.ptd Page 25 1238811 V. Description of the invention (22) The above gasification step (Gasification (1): spraying wastewater in a heated space of this invention) And the whole substantial queue 0 (2) The gasification method of two steps and f is gasified by directly heating the waste water to evaporate it, specifically, the above description is' more preferably 50 (TC or more spray) Wastewater is heated / heated from heated space to sprayed in the space.

機化合物氣體化。又，包含=二廢J :氨造的光…咖所含，在13(rc的程度被分解為三甲基胺與甲醇同本/^3之發明的處理裝置，為（1) (，散步驟得之氣體或分解.放散部得之氣體)於二專H 氣體化部，於是將從翕Μ化尤沾寻氨等的混合氣體導入上述分= = 解Λ體等以及部排出之ΤΜΑΗ分解氣體等的氙俨φ劳二，攸虱體化述投入上述分解：:;ί“體中混合含氨等氣體，將上驟之二之發明的處理方法，用於前述氣體化步戈八解放埒^里，較佳使用加熱或不加熱前述放散步驟或分解·放散步驟得之氣體。 7外〜ΐ I U ί當前述氣體化步驟之氣體化，較佳使用 [2] ^ t , ^ ^ 田則迷氣體化步驟之氣體化，較佳第26頁 2014-5709-PF(Nl);Tcshiau.ptd 1238811 五、發明說明（23) 使用經過前述加熱步驟得之氣體的熱量。前述放散步驟和前述分解·放散步驟之放散的手法，舉例有（1 )藉由加熱廢水使其放散的方法’和（2 )導入含氧氣體（例如空氣）以及/或蒸氣於放散裝置，使上述含氧氣體和蒸氣中伴隨氨等的可放散化合物排出之方法，但經過上述（1 )之放散方法得之放散氣體，和上述（2)之放散方法使用蒸氣而放散的場合而得之放散氣體，任一者皆為比較高溫。上述（2 )的放散方法使用空氣放散的場合，因為導入比較高溫的空氣（例如1 〇 0〜2 0 0 °C )於放散裝置的放散效率較焉’因此一般是加熱導入的空氣。因此任一場合經過放散步驟和分解·放散步驟而得之放散氣體是比較高溫的。使用上述[1 ]之放散氣體的熱量的方法，利用如上述高溫放散氣體的熱量於前述氣體化步驟，藉此可達到熱的有效利用’能降低用以氣體化的能量成本。如上述[2 ]較佳具備加熱放散氣體的加熱步驟，其理由是因為以上述觸媒分解處理時，導入分解步驟（分^告之氣體的溫度必須升溫至既定溫度（例如2 5 〇〜3 5 0。(：）。^ 是利用該加熱步驟，加熱放散氣體到上述觸媒處理要、於溫度以上，若如上述利用高溫之放散氣體的熱量於&求之體化步驟（即若採用加熱上述[2]之放散氣體而使用，，氣之熱量的方法），將不需要用於氣體化步驟的加執^亥氣體達到裝置的簡化，效率化。 …、為’可實現該[2 ]之方法的裝置，舉例為在本發 ^ 艾剐述處Organic compounds gasify. In addition, the two = waste J: ammonia-made light ... coffee contains, is decomposed to trimethylamine and methanol at the same degree of 13 (rc), the processing device of the invention of (1) (, powder The gas obtained in the step or decomposition. The gas obtained in the dispersing section) is introduced into the H gasification section of the secondary school, so the mixed gas from the MH, especially ammonia, etc. is introduced into the above points = = solution, etc., and the TDA discharged from the section is decomposed. Xenon, 俨, and other gases, such as gas, and the above-mentioned decomposition of the lice body :: "Mix the gas containing ammonia and other gases in the body, and use the treatment method of the second step of the invention to liberate the aforementioned gasification steps. In 埒 ^, it is preferable to use the gas obtained by heating or not heating the aforementioned release step or decomposition and release step. 7 Outer ~ ΐ IU ί When the aforementioned gasification step is gasified, it is preferable to use [2] ^ t, ^ ^ Then the gasification of the gasification step is preferred, page 26 2014-5709-PF (Nl); Tcshiau.ptd 1238811 V. Description of the invention (23) The heat of the gas obtained through the foregoing heating step is used. The method of release in the decomposition and release step includes, for example, (1) Method and (2) a method of introducing an oxygen-containing gas (such as air) and / or vapor into a dispersing device to discharge the above-mentioned oxygen-containing gas and vapor with a dispersible compound accompanied by ammonia and the like, but after the above-mentioned method of dispersing (1) Either the obtained diffusing gas or the diffusing gas obtained in the above (2) diffusing method using steam is relatively high temperature. The diffusing method in (2) above uses air diffusing because the introduction is relatively high temperature The diffusing efficiency of the air (for example, 100 ~ 200 ° C) in the diffusing device is relatively low. Therefore, it is generally heated air. Therefore, the diffusing gas obtained through the diffusing step and the decomposition and diffusing step in any occasion is compared. High temperature. The method of using [1] to radiate the heat of the gas, using the high temperature to radiate the heat of the gas in the aforementioned gasification step, thereby achieving the effective use of heat, which can reduce the energy cost for gasification. The above-mentioned [2] is preferably provided with a heating step for heating and releasing the gas. The reason is that when the above-mentioned catalyst decomposition process is used, a decomposition step (a report of gas) is introduced. The temperature must be raised to a predetermined temperature (for example, 25.0 ~ 3 50. (:). ^ This heating step is used to heat the release gas to the above catalyst treatment temperature, and above the temperature, if the high temperature release gas is used as described above The heat in the & seeking physical step (that is, if the method of heating the gas released in [2] above is used, the heat of the gas) will not require the addition of the gas used in the gasification step. Simplified and efficient.…, Is a device that can implement the method of [2], for example, in this post

1238811 五、發明說明（24) 理裝置，設置加熱前述放散佈前述放散氣體的加熱部。該加熱部可使用電加熱器述燃燒爐的燃料當然可使用燈但因為半導體裝置製造工廠洗廢液和廢溶劑，若有效利用上能量減低的觀點來說是較佳的本第卜3發明的處理方法體化的熱量，較佳是直接加熱驟）排出之處理後氣體的熱量放散步驟而得之氣體的加熱而體的加熱使用僅處理氣體的熱換使來自上述僅處理氣體之放如上述，導入比較高溫的時，從該分解步驟（分解部）排高溫。因此上述本發明，利用量於前述氣體化步驟，藉此能以上述氣體化之能量成本。實現如此處理方法的較佳述處理裝置，設置將前述分解氣體化部的循環管線。更佳為體經由加熱部送回至前述氣體氣體化的熱量不足的場合，較本發明之處理方法，較佳和前述分解·放散部而得之和燃燒爐等周知的方法。上油、LPG、或都市氣體等，淨步驟等排出含有異丙醇之述為上述燃燒爐的燃料，從〇 •用於前述氣體化步驟之氣前述分解步驟（氣體分解步 |或前述放散步驟和分解· 使用。且上述「藉由放散氣量」的範例，舉例為以熱交散氣體的熱量轉移。氣體於分解步驟（分解部）出之處理後氣體亦變的比較如此高溫度處理後氣體的熱達成熱的有效利用，降低用裝置，舉例如在本發明之前部排出之氣體，送回至前述設置將前述分解部排出之氣化部的循環管線，上述用以佳是補上該加熱部。是加上無害化處理經過前述1238811 V. Description of the invention (24) A processing device is provided with a heating section for heating the aforementioned diffused gas. This heating unit can use electric heaters. The fuel in the burner can be used. Of course, because the semiconductor device manufacturing plant washes waste liquid and waste solvents, it is preferable from the viewpoint of reducing the energy. The heat of the processing method is preferably direct heating. The heating of the gas obtained from the heat-dissipating step of the exhausted processed gas is performed. The heating of the body uses the heat exchange of the processing gas only so that the discharge of the processing gas only is as described above. When a relatively high temperature is introduced, the high temperature is discharged from the decomposition step (decomposition part). Therefore, the present invention described above utilizes the amount in the aforementioned gasification step, whereby the energy cost of the above gasification can be achieved. A preferable processing apparatus for realizing such a processing method is provided with a circulation line for decomposing and decomposing the gasification section. More preferably, when the body returns to the aforementioned gas via the heating section and the heat of gasification is insufficient, it is more preferable to use a known method such as a combustion furnace and the above-mentioned decomposition / discharge section than the treatment method of the present invention. Lubricate, LPG, or city gas, etc., and discharge isopropanol-containing fuel as described above in the clean step. From the gas used in the aforementioned gasification step, the aforementioned decomposition step (gas decomposition step | or the aforementioned release step). And decomposition and use. And the above example of "by dissipating gas volume" is the heat transfer of the gas that is dissipated by heat. The gas after the treatment in the decomposition step (decomposition section) also becomes so high-temperature treated gas. The heat can be used effectively to reduce heat. For example, the gas discharged from the front part of the present invention is returned to the circulation line provided with the gasification part that discharges the decomposition part. The above is preferably used to supplement the heating.部。 Yes plus harmless treatment after the aforementioned

2014-5709-PF(Nl);Tcshiau.ptd 第28頁 1238811 五、發明說明（25) 放散步驟和前述分解·放散步驟而得之放散後的廢水。因為放散後的廢水含有各種有害成分的場合，較佳附上如上述無害化處理。上述無害化處理，舉例如無觸媒濕式氧化處理步驟和觸媒處理步驟，生物處理步驟，藉此能達到無害化。胃 b [實施方式] 實施型態以下’參考繪示範例之圖示具體說明有關本發明之廢水的處理方法以及處理裝置，但本發明不限定於圖示之範例、、亦可在前後述之主旨適當範圍内加以變更而實施，且上述任一者皆包含於本發明之技術範圍内。〈實施型態1 > 第1圖係顯不本第1發明之實施例丨的廢水的處理裝水連接有連接於則連接水連接有連接於出管52 51，填槽11是暫時儲存上述廢水[A ]的水槽，在該水槽工丄，水導入官1 2、廢水排出管j 3。該廢水排出管丨3是 =縮器14，從該濃縮器14導出之濃縮液排出管15，於軋化器（氣體化部）1 6。 =1為暫時儲存上述廢水[B]的管22、廢水排出管23。該廢水排出管23是過匕氫分解部5卜該過氧化氫分解部“是連接排充ίίϋΡΗ調整槽24。在上迷過氧化氫分解部充有以白金為氧化鋁之單體的擔持觸媒。2014-5709-PF (Nl); Tcshiau.ptd Page 28 1238811 V. Description of the invention (25) The release wastewater and the aforementioned decomposition and release steps are the wastewater after release. When the discharged wastewater contains various harmful components, it is preferable to add a detoxification treatment as described above. The harmless treatment mentioned above includes, for example, a catalyst-free wet oxidation treatment step, a catalyst treatment step, and a biological treatment step, whereby harmlessness can be achieved. Stomach b [Embodiment] The following implementation examples are described below with reference to the illustrations of the exemplary examples of the wastewater treatment method and treatment device of the present invention. However, the present invention is not limited to the illustrated examples, and may be described before and after. The subject matter is modified and implemented within an appropriate range, and any of the above is included in the technical scope of the present invention. <Implementation Mode 1> Figure 1 shows the waste water treatment in the first embodiment of the first invention. The water is connected to the connection, then the connection is connected to the outlet pipe 52 51. The tank 11 is temporarily stored. A water tank for waste water [A], in which the water is introduced into the tank 1 2. The waste water discharge pipe j 3. The waste water discharge pipe 3 is a shrinker 14, and the concentrated liquid discharge pipe 15 led out from the concentrator 14 is supplied to a rolling mill (gasification section) 16. = 1 is the pipe 22 and the waste water discharge pipe 23 for temporarily storing the above-mentioned wastewater [B]. The waste water discharge pipe 23 is a hydrogen peroxide decomposing unit, and the hydrogen peroxide decomposing unit is connected to a discharge tank 24. The hydrogen peroxide decomposing unit is filled with a platinum-alumina-supported monomer. catalyst.

1238811 五、發明說明（26) 在上述pH調整槽24，經由鹼用幫浦28a亦連接來自鹼槽（鹼液儲存槽）27之鹼供給管線28。從上述一調整槽以導出之廢水投入管線25是經由投入幫浦25a連接於散部）2 6。1238811 V. Description of the invention (26) The above-mentioned pH adjustment tank 24 is also connected to the alkali supply line 28 from the alkali tank (alkali solution storage tank) 27 via the alkali pump 28a. The waste water input line 25 leading from the above-mentioned adjustment tank is connected to the bulk part via the input pump 25a) 2 6.

^在放政丨合2 6之下方部分，連接有導入蒸氣之蒸氣導入，線32三以及導入加熱空氣之空氣導入管線”。在上述空氣導入管線33安裝有空氣風扇33a。在上述空氣導入管線 3 3疋、、、工由加熱态3 4導入來自外部的空氣。在放散塔2 6之上方部分連接有排出内部之氣體的氣體排出管線29，在一方放散f 26之底部部分連接有排出放散塔26内之液體的液體排出管線3 1。在該液體排出管線3丨設置有幫浦3丨a。導入排出液於下一步驟。上述氣體排出管線2 9是經由加熱器3 5連接於上述氣體化器1 6。且上述氣體排出管線2 9上連接有空氣供給管線 7 1 ’視需要可導入含氧氣體（例如空氣）。來自氣體化器】6 之氣體排出管線1 7是連接於觸媒反應器（氣體分解部）丨8，從該觸媒反應器丨8裝有處理後氣體排出管線丨9。在上述觸媒反應為、1 8填充有例如包括二氧化鈦以及/或二氧化鈦· 二氧化石夕之氧化物為第一成分，至少一種擇自釩、鎢、^ In the lower part of the policy, the steam introduction steam introduction line, line 32 and the air introduction line to introduce heated air are connected. The air introduction line 33 is installed with an air fan 33a. The air introduction line is 3 3 疋 ,,, and the air are introduced from the heated state 3 4. A gas exhaust line 29 for exhausting the internal gas is connected to the upper part of the emission tower 26, and an exhaust emission is connected to the bottom part of one emission f 26. The liquid discharge line 31 for the liquid in the column 26. The liquid discharge line 3 is provided with a pump 3a. The discharge liquid is introduced in the next step. The gas discharge line 29 is connected to the above via a heater 35. Gasifier 1 6. And the above-mentioned gas exhaust line 29 is connected to an air supply line 7 1 'If necessary, an oxygen-containing gas (such as air) can be introduced. The gas exhaust line 17 from the gasifier] 6 is connected to the contact A catalyst reactor (gas decomposition section) 8 is provided with a treated gas exhaust line 8 from the catalyst reactor 8. The catalyst reaction described above is filled with, for example, titanium dioxide and / Xi stone titania sol of oxide is the first component, at least one selected from a vanadium, tungsten,

鉬、是以及鐵組成之群組的金屬氧化物之第二成分，至少一種擇自白金、鈀、記、釕、铑、錳、鉻、以及銅組成之群組的金屬或其氧化物之第三成分者為觸媒。接著說明使用該實施例1之處理裝置的廢水處理方法0Molybdenum, the second component of the group of metal oxides and iron, at least one selected from the group of metals or oxides of the group of platinum, palladium, platinum, ruthenium, rhodium, manganese, chromium, and copper The three components are catalysts. Next, a wastewater treatment method using the treatment apparatus of the first embodiment will be described.

2014-5709-PF(Nl);Tcshiau.ptd 第30頁 12388112014-5709-PF (Nl); Tcshiau.ptd Page 30 1238811

上述廢水[A ]是舉例如來自半導體裝置製造過程排的顯像廢水，該廢水含有TMAH之有機化合物◊上述廢水 [B]是舉例如半導體晶圓洗淨廢水，該廢水含有氨以及氧化氫。 I先從水槽21導入上述廢水[B]於過氧化氫分解部 51，糟由分解廢水[B]中的過氧化氫為水（Η")與氧（而除去過氧化氫（過氧化氫分解步驟）。The wastewater [A] is, for example, a developing wastewater discharged from a semiconductor device manufacturing process, and the wastewater contains organic compounds of TMAH. The wastewater [B] is, for example, a semiconductor wafer cleaning wastewater, and the wastewater contains ammonia and hydrogen oxide. I first introduce the above-mentioned wastewater [B] from the water tank 21 into the hydrogen peroxide decomposition unit 51, and decompose the hydrogen peroxide in the wastewater [B] into water (Η ") and oxygen (to remove hydrogen peroxide (hydrogen peroxide decomposition) step).

接著將該過氧化氫分解後之廢水[B](以下稱為除H 〇，水[BD導入pH調整槽24，並加入鹼。藉此廢水為鹼在接著放散塔26中的氨放散率變的優良。上錢若在水卜液中=驗性者為佳，例如氫氧化納、氫氧化钾、氣氧七鎂、虱氧化#5等等。添加於廢水之驗的4，只要可使氨龙散的量皆可，較佳為使廢水的⑽為？以上的必須為7〜13的詈。蛉的旦土、廿★ ^ρπ 放二m 滿廢水之ρΗ為7的場合，氨的廢水的财13以上的話，添加之起里過多，導致成本增加。廢二2添i口上述驗之除ηλ廢水[b](以下稱為驗添加塔26。此時從空氣導入管線33加熱的竺軋歹-口 20 0㈡以及/或從蒸氣導入管線32導入i氣，Next, the waste water [B] (hereinafter referred to as H0 removal, water [BD] after decomposing the hydrogen peroxide is introduced into the pH adjustment tank 24, and alkali is added. As a result, the waste water is alkali and the ammonia release rate in the subsequent release tower 26 is changed. Excellent. If the money is in water, it is better to test it, such as sodium hydroxide, potassium hydroxide, magnesium oxide, lice oxidation # 5, etc. 4 added to the wastewater test, as long as it can be The amount of ammonia dragon powder can be any amount, preferably the ⑽ of the waste water is? The above must be 〜 of 7 to 13. 蛉蛉旦土, 廿 ★ ^ ρπ When the full ρΗ of the waste water is 7, the ammonia If the amount of waste water is 13 or more, it will be too much to add, which will increase the cost. Waste 2 2 Add the above-mentioned inspection to remove ηλ wastewater [b] (hereinafter referred to as the inspection addition tower 26. At this time, the heating from the air introduction line 33 Zhu rolling 歹 -port 200 ㈡ and / or introducing i gas from the steam introduction line 32,

添加廢水[B]含有之氨的含氨氣體從 ^ S、、友2 9排出。如此從上述鹼添加廢水[B ]將氨在氣相側放散分離（放散步驟）。放散塔26之操作條件較佳為 2〇kPa(氣壓計)以下，放散使用之氣體可如以力The ammonia-containing gas containing the ammonia added in the wastewater [B] is discharged from ^ S, and You 29. In this way, ammonia is released and separated on the gas phase side from the alkali-added wastewater [B] (release step). The operating conditions of the diffusing tower 26 are preferably below 20 kPa (barometer), and the gas used for the diffusing can be as powerful as

1238811 五、發明說明（28) 即，使用空氣和氮素氣體等進行放散的場合，操作條件較佳為溫度5〜50 Ό，壓力20kPa(氣壓計）以下，使用蒸氣進行放散的場合，操作條件較佳為溫度5 0〜1 2 0 °C，壓力 2 0 k P a (氣壓計）以下。又放散使用之氣體的投入量，以空氣和氮素氣體進行放散的場合，對廢水投入量較佳為 1 0 0〜1 0 0 0 0倍的容量比，更佳為i 0 0 0〜5 〇 0 0倍。以蒸氣進行放散的場合，對廢水投入量較佳為〇 · 〇 5〜1 〇倍的重量比，更佳為0 · 1〜5倍。在放散塔2 6之廢水的空間速度（s v )，在以空氣和氮素氣體等進行放散的場合較佳為丨〜6 〇 h-i，更佳為5〜40 Ir1，又以水蒸氣進行放散的場合，較佳為丨〜1〇〇 h—1，更佳為20〜90 h-1。又在上述放散塔26除氨之廢水（以下稱為除氨廢水），從液體排出管線31排出。且過氧化氫和氨以外的成分含有廢水[B ]的場合，可以適當固體觸媒之處理等分解上述成分。接著將從上述氣體排出管線2 9排出之含氨氣體（放散步驟製得之氣體），以加熱器35加熱至2〇〇〜6〇〇。〇(較佳^ 5 0 0 t：以上），導入氣體化器j 6。 ”、' 、另一方面從水槽11導入廢水[A ]於濃縮器1 4。從例如半導體裝置製造過程排出之顯像廢水是含有2〇〇〇ppm之 TMAH，這樣的低濃度時，在接著的氣體化器丨6之氣體化耗熱量過大而變的沒有效率。因此如上述亦可預先在器1 4濃縮至既定的濃度。或者以濃縮製得幾乎不含：物的水（該水排出管線未圖示）。上述水亦有效再利用為工1238811 V. Description of the invention (28) That is, when using air and nitrogen gas for release, the operating conditions are preferably 5 ~ 50 ° C, pressure below 20kPa (barometer), and use of steam for release. Operating conditions The temperature is preferably 50 to 120 ° C, and the pressure is 20 kPa (barometer) or less. When the amount of gas used for the release is released, when air and nitrogen gas are used for the release, the volume of waste water is preferably 100 to 100 times the capacity ratio, and more preferably i 0 0 to 5 〇 0 0 times. When the steam is used for dispersing, the amount of wastewater to be input is preferably a weight ratio of 5 to 10 times, more preferably 0 to 1 to 5 times. At the space velocity (sv) of the waste water in the dispersion tower 26, it is preferably 丨 ~ 6 〇hi, more preferably 5 ~ 40 Ir1 in the case of air and nitrogen gas dispersion, etc. For occasions, it is preferably 丨 ~ 100h-1, and more preferably 20 ~ 90h-1. The ammonia-removing wastewater (hereinafter referred to as ammonia-removing wastewater) is discharged from the liquid discharge line 31. When components other than hydrogen peroxide and ammonia contain wastewater [B], the above components can be decomposed by appropriate solid catalyst treatment or the like. Next, the ammonia-containing gas (the gas obtained in the dispersing step) discharged from the above-mentioned gas discharge line 29 is heated by the heater 35 to 2000 to 600. 〇 (preferably ^ 5 0 0 t: above), the gasifier j 6 is introduced. "", "On the other hand, the wastewater [A] is introduced from the water tank 11 into the concentrator 14 4. The imaging wastewater discharged from the semiconductor device manufacturing process, for example, contains TMAH containing 2000 ppm. At such a low concentration, The gasification of the gasifier 6 is too inefficient and therefore inefficient. Therefore, it can also be concentrated in advance in the device 14 to a predetermined concentration as described above. Or it can be concentrated to produce water that is almost free of: (the water is discharged The pipeline is not shown). The above water is also effectively reused for industrial purposes

1238811 五、發明說明（29) 廠用水。接著將該濃縮亦喷霧至上述氣體化器丨6内，藉由上述加熱之含氨氣體的熱量，上述濃縮液被氣體化（氣化步驟）。且TMAH被暴露於1 30 °C以上被分解為甲醇與三甲基胺 (以下稱為丁MA)並氣化。土女接著，導入來自該氣體化器16的氣體（含有氨、甲醇、三曱基胺氣體）於觸媒反應器1 8，並藉由反應器丨8内的觸媒的作用分解處理成為&、C〇2、10等的無害氣體（分解步驟），從排出管線1 9排出。且從氣體化器1 6排出之氣體中所含之氨、曱醇、三甲基胺係藉由下述反應式在觸媒反應器丨8中氧化分解為氮素 (N2)、二氧化碳（C02)、水（H20)。 ’、 NH3 + 3 / 402 -1/2N2 +3/2H20 CH30H + 3/202 -C02 +2H20 (CH3)3N + 2 1 /402 ->1/2N2 +9/2H20 + 3C02 當該氧化分解，必須用以接觸分解管線2 9排出之氨、甲醇、三甲基胺的全部必要的氧量不滿的場合，亦可在管線2 9中的氣體（含有氨、甲醇、三甲基胺氣體）追加從管線 7 1之含有空氣等的氣體必要量，導入觸媒反應器1 8。。導入觸媒反應器1 8之氣體的溫度，較佳為1 〇〇〜4 〇〇 C，未滿1 〇〇它觸媒之氧化效率不充足，會有上述氨等殘 f之疑慮，另一方面超過4〇〇 t的場合氨等的氧化過度，容易生成氧化氮（N〇x)，會有必須後處理NOx之麻煩。更佳為2 5 0 C以上，3 5 〇它以下。又在觸媒反應器丨8較佳係以觸1238811 V. Description of invention (29) Plant water. This concentration is then sprayed into the gasifier 6 described above, and the concentrated liquid is gasified by the heat of the heated ammonia-containing gas (gasification step). In addition, TMAH is decomposed into methanol and trimethylamine (hereinafter referred to as D-MA) when exposed to temperatures above 1 30 ° C, and is vaporized. The soil girl then introduced the gas (containing ammonia, methanol, and trimethylamine gas) from the gasifier 16 into the catalyst reactor 18, and was decomposed into & by the action of the catalyst in the reactor 8 ;, C02, 10 and other harmless gases (decomposition step) are discharged from the discharge line 19. In addition, the ammonia, methanol, and trimethylamine contained in the gas discharged from the gasifier 16 are oxidized and decomposed into nitrogen (N2) and carbon dioxide (C02) in the catalyst reactor 8 according to the following reaction formula. ), Water (H20). ', NH3 + 3/402 -1 / 2N2 + 3 / 2H20 CH30H + 3/202 -C02 + 2H20 (CH3) 3N + 2 1/402-> 1 / 2N2 + 9 / 2H20 + 3C02 When the oxidation decomposes, If it is necessary to contact all the necessary oxygen content of ammonia, methanol, and trimethylamine discharged from the decomposition line 29, the gas (containing ammonia, methanol, and trimethylamine gas) in the line 29 can be added. A necessary amount of a gas containing air or the like from the line 71 is introduced into the catalyst reactor 18. . The temperature of the gas introduced into the catalyst reactor 18 is preferably 1000 to 4000C, and the oxidation efficiency of the catalyst is less than 1000, and the above-mentioned residual residues such as ammonia are suspected. When it exceeds 400 t, ammonia and the like are excessively oxidized, and nitrogen oxide (NOx) is easily generated, and there is a problem that NOx must be post-treated. More preferably, it is above 250 ° C, and below 350 ° C. In the catalyst reactor, it is better to

第33頁 2014-5709-PF(Nl)；Tcshiau.ptd 1238811 "ΐ、發明說明（30) ~ ' ' 媒的空間速度（SV)為5 0 0 ~ 5 0 0 0 h-1(更佳為1〇〇〇〜1〇〇〇〇 hi ^給上述被處理氣體，未滿500 π必須為反應器18大小者，超過5 0 0 0 0 Ρ的場合會有分解效率顯著降低的疑慮。你、..又較佳是除去未被上述氣體化器1 6氣化之固形物質而僅導入氣體成分於反應器18。即應處理之廢水中，在含氮 =機化合物、碳化氫類之外’含有金屬元素(例如⑴和在氣化步驟未被分解之難分解性有機化合物（橡膠 :熱硬化性樹脂等）。這樣的物質因為在氣化步驟未被氣氣化步驟移動至觸媒氧化步驟之前，較佳是從廢氣 ^離除去。該等難氣化成分’成為觸媒的被毒物質，而 f為接觸氧化步驟之反應效率降低的原因。被毒物質的除 =摆車:佳藉由前處理劑除去’前處理劑較佳是使用至少一種,氧化銘、二氧化石夕、二氧化鈦、以及氧化錯。該等一般疋使用顆粒狀，其形狀沒有特別限制。如此能同時處理廢水[A]與廢水[B]2種廢水。〈實施型態2 > -署ΓΛ係顯示本第1發明之1的實施型態2之廢水的處理。為了避免重複說明’與第1圖相同構造部刀給予同一符號。本實施型態2之處理裝置，利用你總汾c 士之益宝化岛〜细曰产觸媒反應器18排出德進行氣體化器16之氣體化，從處理 =線19ί歧之循環管線36，藉由送風機心經排出：，接到氣體化器1 6。又從放散塔26導出之氣體出s線29疋連接到來自氣體化器16之氣體排出管線p。Page 33 2014-5709-PF (Nl); Tcshiau.ptd 1238811 " ΐ, description of the invention (30) ~ '' The space velocity (SV) of the medium is 5 0 0 ~ 5 0 0 0 h-1 (better For the above-mentioned gas to be treated, the number below 500 π must be the size of the reactor 18, and if it exceeds 50,000 P, there will be a doubt that the decomposition efficiency will be significantly reduced. You It is also preferable to remove the solid material that has not been gasified by the gasifier 16 above, and only introduce the gas component into the reactor 18. That is, in the wastewater to be treated, except nitrogen = organic compounds and hydrocarbons 'Contains metal elements (such as thorium and hardly decomposable organic compounds (rubber: thermosetting resin, etc.) that have not been decomposed in the gasification step. Such substances are moved to the catalyst oxidation because they are not gasified in the gasification step. Before the step, it is preferably removed from the exhaust gas. The difficult-to-gasify components' become the poisoned substance of the catalyst, and f is the reason for the reduction of the reaction efficiency of the contact oxidation step. The removal of the poisoned substance = swing car: good Removal by the pre-treatment agent. It is preferable to use at least one kind of pre-treatment agent, Titanium oxide and oxidized oxide. These are generally used in the form of granules, and their shape is not particularly limited. In this way, two types of wastewater [A] and wastewater [B] can be treated at the same time. <Implementation Mode 2>-Department ΓΛ system display The waste water treatment of the second embodiment of the first invention of the first embodiment. In order to avoid repetitive descriptions, the same symbols are given to the same structural parts as in Fig. 1. The treatment device of the second embodiment of the present invention utilizes the benefits of your general manager. Baohua Island ~ The catalyst reactor 18 produced by the company is discharged for gasification of the gasifier 16, from the circulation line 36 of the processing line 19, and discharged through the core of the blower: it is connected to the gasifier 16. The gas outlet s line 29 ′ from the diffusing tower 26 is connected to a gas discharge line p from the gasifier 16.

12388111238811

且本實施型態2省略上述濃縮器14，來自水槽u之廢水送出ί線3 8連接到直接氣化器1 6。其他的構造鱼上试每:,In addition, in the second embodiment, the above-mentioned concentrator 14 is omitted, and the waste water delivery line 3 8 from the water tank u is connected to the direct gasifier 16. Try every other construct fish :,

At , /、丄地貝施型恕1相同。與上述實施型態1相同地從廢水[B ]分解過氧化氯而除去（過氧化氫分解步驟），從該除札〇2廢水中使氨放散，而得到含氨氣體（放散步驟）。另一方面廢水[A]被贺霧至氣體化裔16中而被氣化（氣體化步驟），此時來自以排出管線1 9分歧之循環管線3 6的無害化氣體，以加熱器3 7加熱至氣體化必須的溫度，例如 2〇〇〜600 °C，導入上述氣體化器16而利用於氣體化。從上述排出管線1 9排出之無害化氣體的溫度是適合觸媒的反應溫度，例如1 〇〇〜4 0 〇 °C左右的高温，藉由利用此熱量，可抑制在加熱器3 7的加熱量’其熱效率優良。接著將來自氣體化器16排出之氣體與上述含氨氣體合流，導入觸媒反應器1 8 ’藉由與上述貫施型恶1同樣地觸媒的作用，分解處理而達到I、C〇2、H20等的無害化，而從排出管線1 9排出（分解步驟）° 如此能同時處理廢水[A]與廢水[B]2種廢水。〈實施型態3 > 第3圖係顯系本第1發明之1的貫施型悲3之廢水的處理裝置的模式圖。為了避免重複說明’與第1圖相同構造部分給予同一符號。在本實施裂態3 ’從觸媒反應器1 8導出之處理後氣體排出管線39分歧為2個’其中一分歧管線41連接至氣體化At, /, 丄贝 bebe Shi type, the same. The chlorine peroxide is decomposed and removed from the wastewater [B] in the same manner as in the above-mentioned embodiment 1. (Hydrogen peroxide decomposition step), and ammonia is released from this deodorized wastewater to obtain an ammonia-containing gas (release step). On the other hand, the waste water [A] is condensed into the gasification source 16 and is gasified (gasification step). At this time, the harmless gas from the circulation line 3 6 branched by the discharge line 19 and the heater 3 7 It is heated to a temperature necessary for gasification, for example, 2000 to 600 ° C, and is introduced into the gasifier 16 for gasification. The temperature of the harmless gas discharged from the above-mentioned discharge line 19 is a reaction temperature suitable for the catalyst, for example, a high temperature of about 1000 to 400 ° C. By using this heat, heating in the heater 37 can be suppressed. The amount 'is excellent in thermal efficiency. Next, the gas discharged from the gasifier 16 is merged with the above-mentioned ammonia-containing gas, and is introduced into the catalyst reactor 1 8 ′. The catalyst acts in the same manner as the above-mentioned continuous application type 1 and is decomposed to reach I and C 2. , H20, etc., and discharged from the discharge line 19 (decomposition step) ° This can treat two kinds of wastewater [A] and wastewater [B] at the same time. <Implementation Mode 3> Fig. 3 is a schematic diagram showing a waste water treatment apparatus for the continuous application type 3 of the first invention 1 of the present invention. In order to avoid repetitive description, the same reference numerals are given to the same structural parts as in FIG. In the present cracked state 3 ', the processed gas exhaust line 39 derived from the catalyst reactor 18 is divided into two', and one of the branch lines 41 is connected to the gasification.

2014-5709-PF(Nl);Tcshiau.ptd 1238811 五、發明說明（32) 用熱交換器4 3 ’另一分歧管線4 2則連接到空氣加熱用熱交換器4 4。上述氣體化用熱交換器43上連接有從放散塔26導出之氣體排出管線45，可藉由熱交換加熱器體排出管線45内的含氨氣體。氣體用熱交換器43還具備加熱機構，能加熱廢水[A ]到氣體化必須的溫度（2 〇〇〜6 〇〇它）。經過該氣體化用熱又換為4 3之氣體排出管線4 5連接到氣體化器丨6，利用於廢水[A ]的氣體化。入办，面上述空氣加熱用熱交換器44，連接有用以導入空氣於放散塔26的* *A nn ^2014-5709-PF (Nl); Tcshiau.ptd 1238811 V. Description of the invention (32) Heat exchanger 4 3 ’Another branch line 4 2 is connected to a heat exchanger 44 for air heating. The gasification heat exchanger 43 is connected to a gas exhaust line 45 leading from the diffusing tower 26, and an ammonia-containing gas in the line 45 can be exhausted through the heat exchange heater body. The gas heat exchanger 43 is also provided with a heating mechanism capable of heating the waste water [A] to a temperature necessary for gasification (200 to 600). After the gasification heat is changed to 43, a gas discharge line 45 is connected to the gasifier 6 and used for the gasification of the wastewater [A]. It is connected to the above-mentioned air-heating heat exchanger 44 and is connected to the ** A nn ^ which is used to introduce air to the diffusing tower 26.

空氣導入管線33内的：,導入官線可藉由熱交換加靜備加熱機構，可適♦ ^氣。又空氣加熱用熱交換器44上具熱之空氣係以空氣^ 。以該空氣加熱用熱交換器44加散。 ' ’線導入放散塔26’被用於氨放熱交換後的叙室^ 線48中合流放出^ &氣體經過排出管線46、47在合流管 ,、、、人氣中。如上述因為從觸口高溫，因此使用上述、反應器18排出之無害化氣體是比較能達到熱的有效利用L熱父換器43、44回收，利用該熱量，在本實施型態3，In the air introduction line 33, the introduction into the official line can be supplemented by heat exchange and a static heating mechanism, which can be used for air. The hot air on the air heating heat exchanger 44 is air ^. The air heating heat exchanger 44 disperses it. The line introduction and discharge tower 26 'is used in the ammonia chamber after the exothermic heat exchange. ^ Line 48 merges and releases ^ & The gas passes through the discharge lines 46, 47 in the merge pipe, ..., and is popular. As described above, because of the high temperature from the contact port, the use of the harmless gas discharged from the reactor 18 described above is relatively effective in achieving heat. The L heat parent converters 43 and 44 are used to recover this heat. In this embodiment,

水[B]2種廢水。^埶―與上述相同能同時處理廢水[A]與廢〈實施型態4> …、攻率優良。第4圖係顯示本第裝置的模式圖。為了、發明之2的實施型態4之廢水的處理 • 避免重複說明，與第1圖相同構造部Water [B] 2 kinds of wastewater. ^ 埶-same as the above can treat wastewater [A] and waste at the same time <Implementation mode 4> ..., excellent attack rate. Fig. 4 is a schematic diagram showing the present device. In order to treat the waste water of the fourth embodiment of the invention, the second embodiment is described.

第36頁 1238811Page 1238811

分給予同一符號。斑笛】連岡接暫時儲存廢水[β]的水槽2 1的廢水排出管線23，二1圖不同’是直接連接在抑調整槽24。從該ρΗ調整槽 V之廢水投入官線25，是藉由投入幫浦25a連接到分解·放散塔（分解·放散塔）8 6。酋f分解·放散塔86的下方部 <分，連接導入蒸氣的蒸氣 V入官線32，以及導入加熱空氣之空氣導入管線33。在分解三放散塔86的上方部份連接有排出内部之氣體的氣體排出官線29，另一方面悶解·放散塔86的底部份則連接有排出分解·放散塔86内之液體的液體排出管線31。又在上述分解·放散塔86中，填充有迪克森填充材（Dix〇n packing)、IMTP、階式迷你環、金屬製、橡膠填充材等具有過氧化氫分解能的金屬製填充材。接著說明使用該實施型態4之實施裝置的廢水處理方法。與上述同樣地，廢水[A]中含有TMAH有機化合物，廢水[B]中含有氨以及過氧化氫。Points are given the same symbol. Bandi】 Liangang is connected to the waste water discharge line 23 of the water tank 21 for temporarily storing the waste water [β]. The difference from the figure 1 is directly connected to the suppression tank 24. The waste water input line 25 from the ρΗ adjustment tank V is connected to a decomposing / releasing tower (decomposing / releasing tower) 8 6 through an input pump 25a. The lower part of the decomposing / discharging tower 86 is < minutes, and is connected to a steam introduction line 32 for introducing steam, and an air introduction line 33 for introducing heated air. A gas discharge official line 29 for exhausting the internal gas is connected to the upper part of the decomposition three release tower 86, and a liquid that discharges the liquid in the decomposition / release tower 86 is connected to the bottom part of the decompression / release tower 86.排线 31。 The exhaust line 31. The decomposition / discharge tower 86 is filled with a metal packing material having hydrogen peroxide decomposition energy, such as Dixon packing, IMTP, step mini-ring, metal, rubber packing, and the like. Next, a wastewater treatment method using the implementation device of the fourth embodiment will be described. Similarly to the above, the wastewater [A] contains TMAH organic compounds, and the wastewater [B] contains ammonia and hydrogen peroxide.

首先從水槽21導入上述廢水[b]於pH調整槽24，加入驗。如此藉由使廢水呈鹼性，接著在分解·放散塔86的氨放散效率以及過氧化氫分解效率變得優異。且上述鹼在水性液中呈鹼性者皆可，舉例如與上述實施型態1等相同者。添加於廢水之鹼的量與上述實施型態1相同，能夠使氨放散的量的話即可，較佳為使廢水的p Η為7以上的量，更佳為pH呈7〜13所需的量。First, the above-mentioned waste water [b] is introduced from the water tank 21 into the pH adjustment tank 24 and added to the test. By making the wastewater alkaline in this way, the ammonia release efficiency and hydrogen peroxide decomposition efficiency in the decomposition / release tower 86 are excellent. The alkali may be alkaline in the aqueous solution. For example, the alkali may be the same as that in the first embodiment. The amount of alkali added to the wastewater is the same as that of the above-mentioned embodiment 1, and the amount of ammonia can be released. The p Η of the wastewater is preferably 7 or more, and more preferably the pH is 7 to 13. the amount.

1238811 五、發明說明（34) 「R Ί ，者將上述添加鹼的廢水[B ](以下稱為添加鹼之廢水 =入於分解·放散塔86中。此時從空氣導入管線33導的空氣（例如1〇〇〜2〇〇。〇，以及/或蒸氣導入管線” 軋，亡述添加鹼之廢水[B]中含有的氨藉由上述空孔#成為含氨氣體而從氣體排出管線2 9排出。如此氨從上，添加鹼之廢水[B ]的氣相側放散分離。在該分解·放散 =、’以上述過氧化氫分解觸媒將廢水[β ]中的過氧化氫分 :為水與氧素，而除去廢水[B]中的過氧化氫（分解·放散步驟）。分解.放散塔86的操作條件，較佳為溫度 :，壓力20kPa(氣壓計）^與上述實施型態！同樣地，能藉 ^用於放散之氣體分類如以τ。，使肖$氣和氣素氣體4進行放散的場合，較佳操作條件為溫度5〜5〇它， 2〇kPa(氣壓計）以下，使用蒸氣進行放散的場合，較佳操作條件為溫度80〜12(KC，20kPa(氣壓計）。放散使用之氣體的投入量’在以空氣和氮素氣體等進行放散的場合，對廢水投入量之容量比較佳為100~ 1 0 0 0 ()伴，更佳為 1 0 0 0〜5 0 0 0倍。在以蒸氣進行放散的場^，對廢水投入量之容量比較佳為〇· 05〜10倍，更佳為〇· u俨。在分解放散塔86之廢水的空間速度(SV) ’在以空氣;口氮素氣體等進行分解.放散的場合，較佳為卜60 γ，更佳為5 4〇 p 在以蒸氣進行分解.放散的場合，較佳為卜丨〇〇，更佳為 20 〜90 h-1。 # m氣以及氧除去之廢水 12388111238811 V. Description of the invention (34) "R Ί", the above-mentioned alkali-added wastewater [B] (hereinafter referred to as alkali-added wastewater = into the decomposition and release tower 86. At this time, the air guided from the air introduction line 33 (For example, 100 ~ 200. 0, and / or the steam introduction line, the ammonia contained in the alkali-added wastewater [B] is discharged from the gas through the void # to the ammonia-containing gas, and is discharged from the gas line 2. 9 is discharged. In this way, ammonia is released and separated from the gas phase side of the wastewater [B] to which alkali is added. At this decomposition and release =, 'the hydrogen peroxide in the wastewater [β] is separated by the above hydrogen peroxide decomposition catalyst: For water and oxygen, remove hydrogen peroxide in the wastewater [B] (decomposition and release steps). The operating conditions of the decomposition and release tower 86 are preferably temperature: 20 kPa (barometer) ^ and the above embodiment In the same way, the gas that can be used for the release can be classified as τ. When the Xiao gas and the gaseous gas 4 are released, the preferred operating conditions are a temperature of 5 to 50 ° C and a pressure of 20 kPa (barometer ) Below, when using steam to dissipate, the preferred operating conditions are 80 ~ 12 (KC, 20kPa (gas) The amount of the input gas used for the release is' 100 ~ 1 0 0 0 (), and more preferably 1 0 0 0 for the volume of waste water input when the air and nitrogen gas are used for the release. ~ 500 times. In the field where the steam is released ^, the capacity of the input volume of wastewater is preferably 0.05 ~ 10 times, and more preferably 〇 · u. The space velocity of the wastewater in the separation liberation tower 86 (SV) 'In the case of decomposition by air, nitrogen gas, etc., it is preferably Bu 60 γ, more preferably 5 40p. In the case of decomposition by steam, it is preferably Bu 丨〇〇, more preferably 20 to 90 h-1. # M gas and oxygen to remove wastewater 1238811

(以下稱為除去過氧取出。在廢水.氣之廢水）是從液體排出管線31 合，最好是以適去固3/結過氧化氯和氨以外的成分的場接著從上述媒施加處理而分解為上述成分。放散步驟得之氣r)排出管線2 9排出之含氨氣體(分解. 為500t以上^道以加熱器35加熱至200〜60(rc(較佳 i izfd 3 5 Γ水槽1 1導入廢水[A ]於濃縮器1 4中。且與度低二合恶在同接樣著地，m H等的可氣化有機化合物的濃至，接者的軋體化器16的氣體化之消耗熱量不縮得到幾乎沒：3 f在濃縮氣1 4濃縮至既定濃度。藉由濃、 ’又有機物的水，能再利用上述水為工廠用水〇 r麯人貫施型態1同樣地’將來自該氣體化器16 ，狀體（3。風，甲醇，三甲基胺氣體）導入觸媒反應㈣，措由反應器1 8内的觸媒作用分解處理而成為N2、⑶2、Η 0等的無$氣體（分解步驟），從排出管線丨9排出。 2 由過？化氫的分解產生之氧素，在不滿從管線⑼排出之氨/甲醇，三甲基胺全部接觸分解所必須的量的場合’ f，在上述官線2 9中的氣體追加需要量之來自管線7 1 的含氧氣體（例如空氣）而導入觸媒反應器丨8中為佳。導入觸媒反應器18之氣體的溫度，與上述實施型態i(Hereinafter referred to as "peroxide removal. Wastewater and gaseous wastewater") are combined from the liquid discharge line 31. It is best to apply the treatment from the above medium in a field suitable for solidification / condensation of components other than chlorine peroxide and ammonia. And decomposed into the above components. The gas obtained in the release step r) The ammonia-containing gas discharged from the discharge line 2 9 (decomposed. It is 500t or more, and heated to 200 ~ 60 (rc (preferably i izfd 3 5 Γ water tank 1 1) into the wastewater [A ] In the concentrator 14 and the same degree of low dioxin is the same as the ground, m H and other gasifiable organic compounds are concentrated, the heat consumption of the gasification of the rolling mill 16 is not There is almost no shrinkage: 3 f is concentrated to a predetermined concentration in the concentrated gas. 1 With concentrated and 'organic water', the above water can be reused as factory water. Vaporizer 16, the body (3. wind, methanol, trimethylamine gas) is introduced into the catalyst reaction plutonium, which is decomposed by the catalyst action in the reactor 18 to become N2, CD2, Η0, etc. The gas (decomposition step) is discharged from the discharge line 丨 9. 2 The amount of oxygen that is produced by the decomposition of hydrogen peroxide is not satisfied with the amount of ammonia / methanol discharged from the line 接触, which is necessary for decomposition. In the case of 'f', an additional required amount of gas in the above-mentioned official line 2 9 comes from the oxygen-containing gas (for example, air) in the line 7 1 and It is preferable to introduce it into the catalyst reactor 丨 8. The temperature of the gas introduced into the catalyst reactor 18 is the same as the above-mentioned embodiment i.

2014-5709-PF(Nl);Tcshiau.ptd 第39頁 1238811 五、發明說明（36) --- 等的場合相同，較佳為丨〇〇〜4 〇〇。如此能同時處理廢水[A ]與廢水[B ] 2種廢水。〈實施型態5 > 第5圖係顯示本第丨發明之2的實施型態5之廢水的處理裝置的模式圖。為了避免重複說明，與第1、4圖相同$、告部分給予同一符號。 & 本貫施型怨5的處理裝置，與上述實施型態2同樣地，利用從觸媒反應器18排出之無害氣體的熱量，進行氣體化器1 6的氣體化，從處理後氣體排出管線丨9分歧之循環管線 36，藉由送風機36a經過加熱器37連接到氣體化器】//又從分解·放散塔86導出之氣體排出管線29，是連接到氣體化器1 6的氣體排出管線1 7。在本實施型態5省略上述濃縮器14，來自水槽1 1之廢水送出管線38連接到直接^ 器1 6。其他構造與上述實施型態4相同。與上述實施型態1同樣地，進行廢水[B]的―調整，入於分解·放散塔86中而從廢水[B]中分解除去過氧化同時使氨放散，得到含氨氣體（分解·放散步驟）。另一方面廢水[A]被噴霧至氣體化器16内而被氣化（氣體，步驟），Λ時來自排出管線19分歧之循環管線36之無害氣體’。藉由加熱器37加熱至氣體化必要的溫度，例如 200〜600 °C，再導入上述氣+ 礼體化為1 6中利用於氣體化。從上述排出管線1 9排出知無害翕髀的、、w洛& 口孔體的溫度為適合觸媒的反應，度，例如100〜\oo°c程度的高溫’因此藉由利用該熱量，可抑制加熱器3 7的加熱量少，且熱效率優良。2014-5709-PF (Nl); Tcshiau.ptd Page 39 1238811 V. Description of the invention (36) --- The same applies to other occasions, preferably 丨〇〇～ 4 〇〇 In this way, two kinds of wastewater [A] and wastewater [B] can be treated at the same time. <Embodiment Mode 5> Fig. 5 is a schematic diagram showing a wastewater treatment device according to Embodiment 5 of Embodiment 2 of the present invention. In order to avoid repetitive descriptions, the same symbols are given to the $ and suffixes as in Figures 1 and 4. & The processing apparatus of the present embodiment 5 is the same as the embodiment 2 described above, and uses the heat of the harmless gas discharged from the catalyst reactor 18 to gasify the gasifier 16 and discharge the gas from the treated gas. Line 丨 9 branch circulation line 36 is connected to the gasifier via the heater 37 through the blower 36a] // The gas exhaust line 29 derived from the decomposition and release tower 86 is a gas exhaust connected to the gasifier 16 Pipeline 1 7. In the fifth embodiment, the above-mentioned concentrator 14 is omitted, and the waste water delivery line 38 from the water tank 11 is connected to the direct condenser 16. The other structures are the same as those of the fourth embodiment. In the same manner as in the first embodiment, the wastewater [B] is adjusted, and it enters the decomposition and release tower 86 to decompose and remove the peroxidation from the wastewater [B] and release ammonia to obtain ammonia-containing gas (decomposition and release). step). On the other hand, the waste water [A] is sprayed into the gasifier 16 to be gasified (gas, step), and harmless gas from the circulation line 36 branched from the discharge line 19 at time Λ. The heater 37 is used to heat the gas to a temperature necessary for gasification, for example, 200 to 600 ° C, and then the gas + 16 is used for gasification. From the above-mentioned discharge line 19, the temperature of the ventilated orifice is known to be suitable for the reaction of the catalyst. The degree is, for example, a high temperature of about 100 to \ oo ° c. Therefore, by using this heat, It is possible to suppress a small amount of heating by the heaters 37 and to have excellent thermal efficiency.

1238811 五、發明說明（37) 接著使從氣體化器1 6排出之氣體’與上述含氨氣體合流，導入於觸媒反應器1 8，藉由與上述實施型態1同樣地觸媒的作用分解處理成為N2、C02、H20等的無害氣體（分解步驟），從排出管線1 9排出（氣體分解步驟）° 如此能同時處理廢水[A ]與廢水[B ] 2種廢水。〈實施型態6 > 第6圖係顯示本第1發明之2的實施型態6之廢水的處理裝置的模式圖。為了避免重複說明，與第1、4圖相同構造部分給予同一符號。在本實施型態6，與上述實施型態3同樣地，從觸媒反應器1 8導出之處理後氣體排出管線3 9分歧為2個，其中一分歧管線41連接至氣體化用熱交換器43，另一分歧管線42 則連接到空氣加熱用熱交換器44。上述氣體化用熱交換器43上連接有從分解·放散塔86 導出之氣體排出管線4 5，可藉由熱交換加熱氣體排出管線 4 5内的含氨氣體。與上述實施型態3同樣地，氣體用熱交換器4 3還具備加熱機構，能加熱廢水[A ]到氣體化必須的溫度（2 0 0〜6 0 0 °C )。經過該氣體化用熱交換器4 3之氣體排出管線4 5連接到氣體化器1 6，利用於廢水[A ]的氣體化。另一方面上述空氣加熱用熱交換器44，連接有用以導入空氣於分解·放散塔8 6的空氣導入管線3 3，可藉由熱交換加熱空氣導入管線33内的空氣。又空氣加熱用熱交換器44上具備加熱機構，可適當加熱。以該空氣加熱用熱交換器44 加熱之空氣係以空氣導入管線33導入分解·放散塔86，被1238811 V. Description of the invention (37) Next, the gas' from the gasifier 16 is merged with the above-mentioned ammonia-containing gas, and introduced into the catalyst reactor 18, so that the catalyst acts in the same manner as in the first embodiment. Decomposition treatment becomes harmless gas (decomposition step) such as N2, C02, H20, etc., and is discharged from the discharge line 19 (gas decomposition step) ° In this way, two kinds of wastewater, wastewater [A] and wastewater [B], can be treated at the same time. <Embodiment Mode 6> Fig. 6 is a schematic diagram showing a waste water treatment apparatus according to Embodiment 6 of the first invention 2. In order to avoid repetitive description, the same components as those in Figs. 1 and 4 are given the same symbols. In the sixth embodiment, in the same manner as the third embodiment, the processed gas discharge line 39, which is derived from the catalyst reactor 18, is divided into two, and one of the branch lines 41 is connected to a heat exchanger for gasification. 43, the other branch line 42 is connected to the air heating heat exchanger 44. The gasification heat exchanger 43 is connected to a gas exhaust line 45 led from the decomposition and release tower 86, and the ammonia-containing gas in the gas exhaust line 45 can be heated by heat exchange. Similar to the above-mentioned embodiment 3, the gas heat exchanger 43 is further provided with a heating mechanism, which can heat the wastewater [A] to a temperature necessary for gasification (2 00 to 6 0 ° C). The gas discharge line 45 passing through the gasification heat exchanger 43 is connected to the gasifier 16 and used for gasification of the wastewater [A]. On the other hand, the air-heating heat exchanger 44 is connected to an air introduction line 33 for introducing air to the decomposition / dissipation tower 86, and the air in the air introduction line 33 can be heated by heat exchange. The air-heating heat exchanger 44 is provided with a heating mechanism and can be appropriately heated. The air heated by the air heating heat exchanger 44 is introduced into the decomposition / discharge tower 86 through an air introduction line 33,

2014-5709-PF(Nl);Tcshiau.ptd 1238811 五、發明說明（38) 用於氨放散。熱父換後的無害化氣體經過排出管線4 6，4 7在合流管線48中合流放出於大氣中。如上述因為從觸媒反應器1 8排出之無害化氣體是比較高溫，因此使用上述熱交換器43、44回收，利用該熱量，能達到熱的有效利用。在本實施型態6，與上述相同能同時處理廢水[A ]與廢水[B ] 2種廢水。且熱效率優良。〈實施型態7> 第7圖係顯示本第2發明之1的實施型態7之廢水的處理裝置的模式圖。在過氧化氫分解部51，連接有導入含有^—與氨以及過氧化氫之廢水[C ]的廢水導入管線5 3。且該過氧化氫分解部5 1 ’填充有例如二氧化矽-氧化鋁擔體擔持白金的擔持觸媒。 ° 從過氧化氫分解部51導出之導出管線54連接於氨放散塔^放散部）26之上方部份，在氨放散塔26内構成經過上述過氧化氫分解部5 1之廢水降低流入的構造。在氨放散塔2 6 之上方部份設置有排出内部氣體的氣體排出管線2 9。在氨放散塔2 6的下方部份，設置有供給空氣或蒸氣的供給管線 5 5，又氨放散塔2 6的底部份設置有排出放散塔2 β内之液體的液體排出管線3 1。該液體排出管線3 1是連接至濃縮部一 56，從該濃縮部56導出之濃縮液導出管線57則連接^ ^體化器（氣體化部）7 6。上述濃縮部5 6亦連接有排出濃縮^生2014-5709-PF (Nl); Tcshiau.ptd 1238811 V. Description of the invention (38) Used for ammonia release. The harmless gas exchanged by the heat father passes through the exhaust lines 46, 47, and merges in the merge line 48 to be released from the atmosphere. As described above, since the harmless gas discharged from the catalyst reactor 18 is relatively high temperature, the heat exchangers 43 and 44 are used to recover the heat, and the heat can be effectively used. In the sixth aspect of the present embodiment, the two types of wastewater [A] and wastewater [B] can be treated simultaneously as described above. And excellent thermal efficiency. <Embodiment Mode 7> Fig. 7 is a schematic diagram showing a wastewater treatment apparatus according to Embodiment Mode 7 of the second invention. The hydrogen peroxide decomposing unit 51 is connected to a wastewater introduction line 53 for introducing wastewater [C] containing ammonia and ammonia and hydrogen peroxide. The hydrogen peroxide decomposing portion 5 1 'is filled with a platinum-supporting catalyst such as a silica-alumina support. ° The outlet line 54 leading from the hydrogen peroxide decomposition section 51 is connected to the upper part of the ammonia release tower ^ release section) 26, and the ammonia discharge tower 26 constitutes a structure for reducing the inflow of wastewater passing through the hydrogen peroxide decomposition section 51. . A gas exhaust line 29 for exhausting the internal gas is provided above the ammonia release tower 26. A supply line 55 for supplying air or steam is provided below the ammonia release tower 26, and a liquid discharge line 31 for discharging the liquid in the release tower 2 β is provided at the bottom of the ammonia release tower 26. The liquid discharge line 31 is connected to a concentrating section 56 and a concentrated liquid deriving line 57 led from the concentrating section 56 is connected to a sparger (gasification section) 76. The above-mentioned concentration section 5 6 is also connected with a discharge concentration

12388111238811

五、發明說明（39) 之蒸餾水的排出管線58，亦連接有用以加熱上述濃縮部％之蒸氣導入管線5 9。在上述氣體化器76上，亦連接有來自上述氨放散塔“ 之氣體排出管線29，還有連接燃料供給管線6〇，能加熱氣體化氣76而氣化上述濃縮液。在氣體排出管線29則連接有空氣導入管線6 1，能供給適當空氣於放散的含氨氣體而稀來自上述氣體化氣76之氣體排出管線17是連接到觸媒反應器（氣體分解部）1 8，且設置有從觸媒反應器丨8排出處理後氣體等的處理完成氣體排出管線丨9。在該觸媒反應器1 8填充有觸媒。該觸媒舉例為與前述實施型態1同樣的觸媒。接著說明該實施型態7之處理裝置的動作。 ^ 將含有TMAH、氨以及過氧化氫之廢水[C]從廢水導入管線5 3導入至過氧化氫分解部5丨。在該過氧化氫分解部5】藉由觸媒的作用，廢水中的過氧化氫被分解為水（H2〇)與氧素（〇2)而被除去（過氧化氫分解步驟）。、接著將在過氧化氫分解部51分解過氧化氫之廢水（以下稱為除1〇2廢水），以導出管線54導入於氨放散塔26中。此時從供給管線55導入空氣或蒸氣，以上述空氣^伴隨上述除1〇2廢水中含有的氨成為含氨氣體，從氣體排出管線 2 9排出。如此從上述廢水中在氣相側放散分離氨（放散步驟）。若氨放散塔2 6為5〜1 2 0 °C，可良好進行氨的放散。接著將氨放散後的廢水（以下稱為除關3廢水）從氨放散V. Description of the invention (39) The distilled water discharge line 58 is also connected to the steam introduction line 59 which is used to heat the above-mentioned concentrated portion. The gasifier 76 is also connected to a gas discharge line 29 from the ammonia release tower and a fuel supply line 60 to heat the gasified gas 76 to vaporize the concentrated liquid. At the gas discharge line 29 An air introduction line 61 is connected, and a gas exhaust line 17 capable of supplying appropriate air to the released ammonia-containing gas and dilute from the gasified gas 76 is connected to the catalyst reactor (gas decomposition section) 18, and is provided with Process-completed gas exhaust lines, such as processed gas, are discharged from the catalyst reactors 8. The catalyst reactors 18 are filled with catalysts. The catalysts are exemplified by the same catalysts as in the first embodiment. Next, the operation of the treatment device of the embodiment 7 will be described. ^ The wastewater [C] containing TMAH, ammonia, and hydrogen peroxide is introduced from the wastewater introduction line 53 to the hydrogen peroxide decomposition unit 5. This hydrogen peroxide is decomposed. Part 5] Hydrogen peroxide in wastewater is decomposed into water (H2O) and oxygen (O2) and removed by the action of a catalyst (hydrogen peroxide decomposition step). Next, hydrogen peroxide is decomposed. Part 51 of the decomposition of hydrogen peroxide Water (hereinafter referred to as wastewater for removing 102) is introduced into the ammonia release tower 26 through a derivation line 54. At this time, air or steam is introduced from the supply line 55, and the above-mentioned air is accompanied by the ammonia contained in the wastewater for removing 102 It becomes an ammonia-containing gas and is discharged from the gas exhaust line 29. In this way, ammonia is released and separated on the gas phase side from the above-mentioned wastewater (discharge step). If the ammonia release tower 26 is 5 to 120 ° C, the ammonia can be well conducted. The ammonia-released waste water (hereinafter referred to as the wastewater except for Guan 3) is released from ammonia.

第43頁 1238811Page 12 1238811

塔26之液體排出管線31放出，導入從例如蒸氣導人管線59導人蒸氣而加°该濃縮部使水從上述除廢水中蒸發（從排出管線错此幻，得到TMH的濃縮液（濃縮步驟）。該基發的蒸水，因此可冷卻凝縮再利用作為工廠用水、。為瘵餡以適當空氣稀釋來自上述氣體排出氣體(從空氣導入管線混合空氣)並導入氣體化以= 從燃料供給管線61供給燃料藉由燃料燃燒爐產生2〇〇〜6〇〇 =熱風’從濃縮液導出管線57喷霧上述⑽“的濃縮液到乳體化益76内，氣體化上述^^濃縮液（氣體化步驟）。藉由暴路TMAH在130 C以上分解為曱醇與三甲基胺，而氣化。且氣體化氣76的加熱手段不限於上述燃料燃燒爐，亦可使用電子加熱器。接著將從上述氣體化氣7 6排出之氣體（含氨，甲醇，二曱基胺的氣體）導入觸媒反應器1 8，藉由觸媒反應器1 8 内的觸媒的作用分解處理，成為N2、C02、H20而從排出管線 1 9排出（分解步驟）。且在觸媒反應器丨8中溫度為丨〇〇〜4 〇〇 °C為較佳（更佳為2 5 0〜3 5 0 °C )，未滿1 〇〇 °c觸媒的氧化效率不充分’會有上述氨等殘留的疑慮，另一方面超過4〇〇 °c 的場合上述氨等的氧化過度，容易產生氧化氮，因此必須有NOx後處理的問題。又在觸媒反應器1 8較佳係以觸媒的空間速度（SV)為5 0 0〜50 0 0 h-K更佳為1 0 0 0〜1 0 0 0 0 h-〇供給上述被處理氣體，未滿5 0 0 lr1必須為反應器1 8大小者，超過 5 0 0 0 0 h-1的場合會有分解效率顯著降低的疑慮。又較佳是The liquid discharge line 31 of the column 26 is discharged, and the vapor is introduced from, for example, the steam introduction line 59 to introduce the steam. The concentrating section evaporates water from the above-mentioned removal of waste water (from the discharge line, a concentrated solution of TMH is obtained (concentration step) ). The steamed water of this base can be cooled and condensed and reused as factory water. For the filling, dilute the exhaust gas from the above gas (mixed air from the air introduction line) with appropriate air and introduce gasification to = from the fuel supply line 61 Supplying fuel through the fuel combustion furnace to generate 2000 ~ 600 = Hot air 'from the concentrated liquid export line 57 sprays the above-mentioned concentrated liquid into the emulsion chemical 76, and gasifies the above-mentioned concentrated liquid (gas Step of gasification). By breaking the TMAH above 130 C into methanol and trimethylamine, gasification is performed. And the heating method of the gasified gas 76 is not limited to the above-mentioned fuel combustion furnace, and an electronic heater can also be used. The gas (ammonia, methanol, and difluorenylamine-containing gas) discharged from the gasified gas 76 is introduced into the catalyst reactor 18, and is decomposed and processed by the catalyst in the catalyst reactor 18 to become N2, C02 And H20, and is discharged from the discharge line 19 (decomposition step). And in the catalyst reactor, the temperature is preferably 〇〇〇〜4 〇 ° C。 (More preferably, 2 50 ~ 3 50 ° C ), The oxidation efficiency of the catalyst is less than 100 ° c, and the above-mentioned ammonia and other residues may be suspected. On the other hand, when it exceeds 400 ° c, the ammonia and the like are excessively oxidized, and nitrogen oxides are easily generated. There must be the problem of post-treatment of NOx. In the catalyst reactor 18, the space velocity (SV) of the catalyst is preferably 5 0 0 to 50 0 0 hK, and more preferably 1 0 0 0 to 1 0 0 0 0 h-〇 supply the above-mentioned gas to be processed, less than 5,000 lr1 must be the size of the reactor 18, and if it exceeds 50,000 h-1, there will be a doubt that the decomposition efficiency will be significantly reduced.

2014-5709-PF(Nl);Tcshiau.ptd 第44頁 1238811 五、發明說明（41) 除去未被上述氣體化器7 6氣化之固形物質而僅導入氣體成分於分解部1 8。如此可同時處理含有TMAH與氨以及過氧化氫之廢液為無害的N2、C 02、10等的無害氣體。在將含有TMAH與氨以及過氧化氫之廢液氣化而以觸媒處理的場合，必須有如前述大型的裝置，且需要過大的熱量，但若如上述分解過氧化氫而除去後一旦分離TMAH與氨，濃縮TMAH後之後氣化，之後上述分離之氨同時以觸媒處理的話’處理裝置小，且需要的熱量亦降低。〈實施型態8 > * 第8圖係顯示本第2發明之1的實施型態8之廢水的處理裝置的模式圖。為了避免重複說明，與第7圖相同構造部分給予同一符號。輸送含有TMAH與氨以及過氧化氫之廢水[c]的廢水導入管線53是連接在過氧化氫分解部51，從該過氧化氫分解部5 1導出之導出官線6 2是連接到加熱濃縮部6 3。該加熱濃縮部63上連接有蒸氣供給管線70，可藉由其供給的蒸氣加熱。從加熱濃縮部63連接有氣體排出管線64與液體排出管線65，該液體排出管線65是連接到氣體化氣（氣體化部）6 6。又上述氣體排出管線6 4是連接到凝縮部6 7，且來自該凝縮部67導出管線68連接到氨放散塔（放散部）26。在氨放散塔26的下方部份，設置有空氣或蒸氣的供給管線 55 ’又氨放散塔26的底部份設置有排出放散塔26内之液體 (處理後的水）的液體排出管線69。來自氨放散塔26之氣體2014-5709-PF (Nl); Tcshiau.ptd Page 44 1238811 V. Description of the invention (41) Remove the solid matter that has not been gasified by the gasifier 7 6 and only introduce gas components into the decomposition section 18. In this way, the waste liquid containing TMAH, ammonia, and hydrogen peroxide can be treated simultaneously as harmless gases such as N2, C02, and 10. When the waste liquid containing TMAH, ammonia, and hydrogen peroxide is gasified and treated with a catalyst, a large-scale device as described above is required, and excessive heat is required. However, once the hydrogen peroxide is decomposed and removed as described above, the TMAH is separated once it is removed. With ammonia, TMAH is concentrated and then gasified. If the separated ammonia is treated with a catalyst at the same time, the processing device is small and the required heat is reduced. <Embodiment Mode 8 > * Fig. 8 is a schematic diagram showing a wastewater treatment apparatus according to Embodiment 8 of the second invention. In order to avoid repetitive description, the same components as those in FIG. 7 are given the same symbols. A wastewater introduction line 53 for transporting wastewater [c] containing TMAH, ammonia, and hydrogen peroxide is connected to the hydrogen peroxide decomposition section 51, and a lead-out line 6 2 derived from the hydrogen peroxide decomposition section 51 is connected to heating and concentration Department 6 3. The heating and condensing portion 63 is connected to a steam supply line 70, and can be heated by the steam supplied therefrom. A gas discharge line 64 and a liquid discharge line 65 are connected from the heating and concentration section 63, and the liquid discharge line 65 is connected to a gasification gas (gasification section) 66. The above-mentioned gas discharge line 64 is connected to the condensation part 67, and the outlet line 68 from the condensation part 67 is connected to the ammonia release tower (release part) 26. A supply line 55 'for air or steam is provided below the ammonia release tower 26, and a liquid discharge line 69 for discharging the liquid (treated water) in the release tower 26 is provided at the bottom of the ammonia release tower 26. Gas from ammonia release tower 26

2014-5709-PF(Nl);Tcshiau.ptd2014-5709-PF (Nl); Tcshiau.ptd

1238811 五、發明說明（42) ---- 排出管線29是連接到上述氣體化器66。該氣體化器⑽上還連接有燃料供給管線6 〇。來自氣體化器6 6之排出營線丨7與上述貫施π型態7同樣地，連接於觸媒反應器（氣體分解 4)18 還。又置有來自觸媒反應器1 8的排出處理後氧妒之排出管線19。 & 接著說明本實施型態8之裝置的動作。首先將含有氨· TMAH ·過氧化氫之廢水從廢水導入管線5 1導入’藉由例如觸媒的作用分解廢水中的過氧化氫為水（Ηβ)與氧素（ο。而被除去（過氧化氫分解步驟）。接著將该除1 〇2廢水導入加熱濃縮部6 3，在該加熱濃縮部6 3中加熱廢水，而浪縮TMAH(加熱濃縮步驟）。在該加熱濃縮部63 蒸發從氣體排出管線64排出的氣體，主要為水蒸氣與氨，接著在凝縮部67將該等凝縮（凝縮步驟），以導出管線68將該凝集水導入於氨放散塔26中。在氨放散塔26以空氣或蒸氣放散凝集水中的氨（放散步驟），該放散的含氨氣體從氣體排出管線2 9排出，導入於氣體化器6 6中。另一方面上述加熱濃縮部63得之TMAH濃縮液，亦導入於上述氣體化器66中。該氣體化器66氣體化TMAH濃縮液 (氣體化步驟），上述含氨氣體同時從排出管線1 7排出而導入於觸媒反應器1 8。該導入氣體為藉由氨與TMAH的分解產生的TMA以及甲醇，以觸媒反應器1 8之固體觸媒的作用將該等同時分解淨化，從排出管線1 9排出N2、C02、H20 (分解步驟）。如此可有效處理含有TMAH與氨以及過氧化氫之廢液為1238811 V. Description of the invention (42) ---- The discharge line 29 is connected to the gasifier 66 described above. This gasifier 6 is also connected to a fuel supply line 60. The exhaust gas line 7 from the gasifier 6 6 is connected to the catalyst reactor (gas decomposition 4) 18 as in the above-mentioned implementation of the π-type 7. A discharge line 19 for oxygen jealousy after the discharge treatment from the catalyst reactor 18 is also provided. & Next, the operation of the device according to the eighth embodiment will be described. First, waste water containing ammonia, TMAH, and hydrogen peroxide is introduced from the waste water introduction line 51 to 'decompose hydrogen peroxide in the waste water into water (Ηβ) and oxygen (ο. Decomposition step of hydrogen oxide). Then, the effluent for removing 102 is introduced into the heating and concentration section 63, and the waste water is heated in the heating and concentration section 63, and TMAH (heating and concentration step) is condensed. In this heating and concentration section 63, evaporation evaporates from The gas discharged from the gas discharge line 64 is mainly water vapor and ammonia, and then these are condensed (condensation step) in the condensation section 67 to lead the condensed water into the ammonia release tower 26 through the derivation line 68. In the ammonia release tower 26 The ammonia in the condensed water is released by air or steam (discharge step), and the released ammonia-containing gas is discharged from the gas discharge line 29 and introduced into the gasifier 6 6. On the other hand, the TMAH concentrated liquid obtained by the heating and concentration section 63 described above It is also introduced into the gasifier 66. This gasifier 66 gasifies the TMAH concentrated liquid (gasification step), and the ammonia-containing gas is simultaneously discharged from the exhaust line 17 and introduced into the catalyst reactor 18. This introduction Gas is The TMA and methanol produced by the decomposition of ammonia and TMAH are simultaneously decomposed and purified by the solid catalyst of the catalyst reactor 18, and N2, C02, and H20 are discharged from the discharge line 19 (decomposition step). Effectively treat waste liquid containing TMAH, ammonia and hydrogen peroxide as

2014-5709-PF(Nl)；Tcshiau.ptd 第46頁 1238811 五、發明說明（43) 無害的n2、co2、H20等的無害氣體。〈實施型態9 > 第9圖係顯示本第2發明之2的實施型態9之廢水的處理裝置的模式圖。為了避免重複說明，與第7圖相同構造部分給予同一符號。在分解·放散塔86，填充有迪克森填充材（Dixon packing)、IMTP、階式迷你環、金屬製、橡膠填充材等具有過氧化氫分解能的金屬製填充材，導入含有TMAH與氨以及過氧化氫之廢水[C ]的廢水導入管線5 3是連接在分解· 放散塔（分解·放散部）8 6的内注入上述廢水的構造。在置有排出内部之氣體的氣體 8 6的下方部份設置有供給空分解·放散塔86的底部份設液體的液體排出管線31。在自上述分解·放散塔86之氣施型態9之處理裝置的動作，上方部份，在分解·放散塔8 6 分解·放散塔8 6的上方部份設排出管線29。在分解·放散塔氣或蒸氣的供給管線5 5，又在置有排出分解·放散塔86内之上述氣體化器76上亦連接有來體排出管線29。接著說明本實2014-5709-PF (Nl); Tcshiau.ptd Page 46 1238811 V. Description of the invention (43) Harmless gas such as n2, co2, H20, etc. <Embodiment Mode 9> Fig. 9 is a schematic diagram showing a wastewater treatment device according to Embodiment 9 of the second invention. In order to avoid repetitive description, the same components as those in FIG. 7 are given the same symbols. The decomposition / discharge tower 86 is filled with metal packing materials such as Dixon packing, IMTP, step mini-rings, metal, rubber packing materials, etc., which have the ability to decompose hydrogen peroxide, and contains TMAH, ammonia, and The wastewater introduction line 53 of the hydrogen oxide wastewater [C] has a structure connected to a decomposition / discharge tower (decomposition / discharge unit) 8 6 and injecting the above-mentioned wastewater. A liquid discharge line 31 for supplying a liquid to the bottom portion of the air decomposition / discharge tower 86 is provided below the gas 8 6 where the internal gas is discharged. A discharge line 29 is provided above the operation of the processing device of the gas application mode 9 from the decomposition / discharge tower 86 above the decomposition / release tower 86 and the decomposition / release tower 86. An incoming gas exhaust line 29 is also connected to the supply line 55 of the decomposition / discharge column gas or vapor, and the gasifier 76 in which the exhaust decomposition / discharge column 86 is disposed. Next, explain this reality

將含有TMAHWill contain TMAH

或蒸氣，“上述空氣等伴隨上：：給官線55導入空氣體，從氣體排出管線29排* :中含有的氨成為含Or steam, "The above-mentioned air and the like are accompanied by :: introducing air into the official line 55, and exhausting from the gas exhaust line 29 *: the ammonia contained in the

的填充材的作，分解廢水中 f由^解·放散塔8C (〇2)而除去。如此從上述廢水中二，化—氫為水（¾0)與I 側放散分離氨（分解.放散牛々過氧化氫同時在氣 v驟）。若分解.放散塔86為As a filling material, f in the decomposed waste water is removed by the decomposition and release tower 8C (〇2). In this way, from the above-mentioned waste water, the hydrogenation is turned into water (¾0) and the ammonia is released and separated from the I side (decomposition and release of burdock hydrogen peroxide at the same time in the gas v). If decomposed, the release tower 86 is

1238811 五、發明說明（44) 5 1 2 0 C + ’可良好進行氨的放散以及過氧化氫的分解。接著將該過氧化氫分解/氨放散後的廢水（以下稱為除過虱化氫、.氨之廢水）從分解.放散塔86之液體排出管線放出，導入濃縮部5 6。在該濃縮部從例如蒸氣導入管線 Y導^蒸氣而加熱到5〜l2(rc，藉此使水從上述除過氧化虱.氨之廢水中蒸發（從排出管線58排出該水蒗氣），得到 TMAH的濃縮液（濃縮步驟）。該蒸發的水為蒸餾水，因此可冷卻凝縮再利用作為工廠用水。1238811 V. Description of the invention (44) 5 1 2 0 C + ′ can well release ammonia and decompose hydrogen peroxide. Then, the waste water after the decomposition and release of hydrogen peroxide (hereinafter referred to as hydrogen peroxide and ammonia waste water) is discharged from the liquid discharge line of the decomposition and release tower 86 and introduced into the concentration section 56. In the concentrating part, for example, steam is introduced from the steam introduction line Y to be heated to 5 to 12 (rc, thereby evaporating water from the above-mentioned peroxidase and ammonia removal wastewater (the water radon is discharged from the discharge line 58), A TMAH concentrated solution is obtained (concentration step). The evaporated water is distilled water, so it can be cooled and condensed and reused as factory water.

^與上述實施型態7同樣地，以適當空氣稀釋來自上述排出管線2 9的上述含氨氣體（從空氣導入管線6丨混合空，）並導入氣體化氣76中同時從燃料供給管線6〇供給燃，藉由燃料燃燒爐產生20 〇〜6〇〇的熱風，從濃縮液導出、官線57喷霧上述TMAH的濃縮液到氣體化器76内，氣體化上 f TMAH濃縮液（氣體化步驟）。藉由暴£TMAH在13〇 t以上 1解為曱醇與三甲基胺，而氣化。且氣體化氣76的加熱手段不限於上述燃料燃燒爐，亦可使用電子加熱器。^ Similar to the above-mentioned embodiment 7, the above-mentioned ammonia-containing gas (mixed with air from the air introduction line 6 丨) from the above-mentioned discharge line 29 is diluted with appropriate air and introduced into the gasification gas 76 from the fuel supply line 6 at the same time. The fuel is supplied, and a hot air of 200 to 600 is generated by the fuel combustion furnace. The hot liquid is led out from the concentrated liquid, and the TMAH concentrated liquid is sprayed into the gasifier 76 on the line 57 to gasify the TMAH concentrated liquid (gasification). step). When the TMAH is broken down to more than 13 t, it is decomposed into methanol and trimethylamine and gasified. In addition, the heating means of the gasification gas 76 is not limited to the above-mentioned fuel combustion furnace, and an electronic heater may be used.

接著與上述實施型態7同樣地，將從上述氣體化氣76 =出之氣體（含氨，甲醇，三甲基胺的氣體）導入觸媒反應器1 8 ’藉由觸媒反應器（氣體分解部）丨8内的觸媒的作用^ 解處理，成為\、C〇2、而從排出管線19排出（分解步驟）。且與上述同樣地，在觸媒反應器1 8中溫度為1 〇〇〜4 〇〇 °c為較佳（更佳為250〜35(rc)。又在觸媒反應器18較佳係以觸媒的空間速度（SV)為5 0 0〜50 0 0 (更佳為1〇〇〇〜1〇〇〇〇 h—1)供給上述被處理氣體。又較佳是除去未被上述氣體化Then, as in the above-mentioned embodiment 7, the gas (ammonia, methanol, and trimethylamine-containing gas) emitted from the gasified gas 76 = is introduced into the catalyst reactor 1 8 ′ through the catalyst reactor (gas Decomposition section) The role of the catalyst in 8 is decomposed, and it becomes \, C02, and is discharged from the discharge line 19 (decomposition step). In the same manner as described above, the temperature in the catalyst reactor 18 is preferably 1000 to 400 ° C (more preferably 250 to 35 (rc). The catalyst reactor 18 is also preferably The catalyst has a space velocity (SV) of 50,000 to 50,000 (more preferably 10,000 to 10,000 h-1), and it is preferable to remove the gas that has not been gasified as described above.

2014-5709-PF(Nl)；Tcshiau.ptd 第48頁 1238811 五、發明說明（45) """— 器7 6氣化之固形物質而僅導入氣體成分於分解部丨8。如此可同時處理含有TMAH與氨以及過氧化氫之廢液為無害的N2、C〇2、等的無害氣體。且在將含有TMAH與氨以及過氧化氫之廢液氣化而以觸媒處理的場合，必須有如前述大型的裝置，且需要過大的熱量，但若如上述分解過氧化氫而除去後一旦分離TMAH與氨，濃縮TMAH後之後氣化，之後上述分離之氨同時以觸媒處理的話’處理裝置小，且需要的熱量亦降低。〈實施型態1 0 >2014-5709-PF (Nl); Tcshiau.ptd Page 48 1238811 V. Description of the Invention (45) " " "-Device 7 6 gasification of solid substances, and only gas components are introduced into the decomposition section 丨 8. In this way, the waste liquid containing TMAH, ammonia, and hydrogen peroxide can be treated simultaneously as harmless gases such as N2, C02, and the like. And when the waste liquid containing TMAH, ammonia, and hydrogen peroxide is gasified and treated with a catalyst, a large-scale device as described above must be used, and excessive heat is required. However, once the hydrogen peroxide is decomposed and removed as described above, it is once separated. TMAH and ammonia. After TMAH is concentrated, it is gasified, and then the separated ammonia is treated with a catalyst at the same time. The processing device is small and the required heat is reduced. <Implementation mode 1 0 >

第1 0圖係顯示本第3發明之實施型態1 〇之處理裝置的模式圖。為了避免重複說明，與第9圖相同構造部分給予同一符號。Fig. 10 is a schematic diagram showing a processing device according to a tenth embodiment of the third invention. In order to avoid repetitive description, the same components as those in FIG. 9 are given the same symbols.

輸送含有TMAH與氨以及過氧化氫之廢水[c]的廢水導入管線5 3是連接在加熱濃縮部6 3。在該加熱濃縮部6 3上連接有蒸氣供給管線70，可藉由其供給的蒸氣加熱。從加熱濃縮部63連接有氣體排出管線64與液體排出管線65，該液體排出管線6 5是連接到氣體化氣（氣體化部）6 6。又上述氣體排出管線6 4是連接到凝縮部6 7，且來自該凝縮部6 7導出管線68連接到分解·放散塔（分解·放散部）86。在分解· 放散塔86的下方部份，設置有空氣或蒸氣的供給管線55，又分解·放散塔86的底部份設置有排出分解·放散塔86内之液體（處理完成水）的液體排出管線69。來自分解·放散塔8 6之氣體排出管線2 9是連接到上述氣體化器6 6。該氣體化器6 6上還連接有燃料供給管線6 〇。來自氣體化器6 6之A wastewater introduction line 53 for transporting wastewater [c] containing TMAH, ammonia, and hydrogen peroxide is connected to the heating and concentration section 63. A steam supply line 70 is connected to the heating and concentrating section 63, and can be heated by the steam supplied therefrom. A gas discharge line 64 and a liquid discharge line 65 are connected from the heating and concentration section 63, and the liquid discharge line 65 is connected to a gasification gas (gasification section) 66. The gas exhaust line 64 is connected to the condensing section 67, and the outlet line 68 from the condensing section 64 is connected to a decomposition / release tower (decomposition / release section) 86. A supply line 55 for air or steam is provided below the decomposition / distribution tower 86, and a liquid discharging the liquid (processed water) in the decomposition / dissolution tower 86 is provided at the bottom of the decomposition / distribution tower 86. Line 69. The gas discharge line 29 from the decomposition / discharge column 86 is connected to the gasifier 66. The gasifier 66 is also connected to a fuel supply line 60. From gasifier 6 of 6

2014-5709-PF(Nl)；Tcshiau.ptd 第49頁 1238811 五、發明說明（46) 排出管線1 7與上述實施型態9同樣地，連接於觸媒反應器 (氣體分解部）1 8，還設置有來自觸媒反應器1 8的排出處理後氣體之排出管線丨9。接著說明本實施型態1 0之裝置的動作。首先將含有氨· TMAH ·過氧化氫之廢水[C]導入加熱濃縮部6 3 ’在該加熱濃縮部6 3中加熱廢水，而濃縮 \MAH (加熱濃縮步驟）。在該加熱濃縮部6 3蒸發從氣體排出 =線64排出的氣體，主要為水蒸氣與氨以及過氧化氫，接著在凝縮部6 7將該等凝縮（凝縮步驟），以導出管線6 8將該，集水導入於分解·放散塔86中。在分解·放散塔86以空氣^蒸氣放散凝集水中的氨（分解·放散步驟），該放散的含氨氣體從氣體排出管線2 9排出，導入於氣體化器6 6中。又，上述分解·放散塔8 6，藉由觸媒作用將廢水中的過氧化氫分解為叱、C02、h2〇而從廢水中除去。另:方面上述加熱濃縮部63得之TMAH濃縮液，亦導入於±述氣體化器66中。該氣體化器66氣體化TMAH濃縮液 (氣體化步驟）’上述含氨氣體同時從排出管線1 7排出而導入於觸媒反應器18。該導入氣體為藉由氨與TMAH的分解產生的TMA以及甲醇’以觸媒反應器丨8之固體觸媒的作用將忒等同時分解淨化，從排出管線1 9排出比、4 〇 (分解步驟）。、如此可有效處理含有TMAH與氨以及過氧化氫之廢液 [C ]為無害的N?、C02、H2 0等的無害氣體。再者若根據本第2、3之發明的處理方法以及處理裝2014-5709-PF (Nl); Tcshiau.ptd Page 49 1238811 V. Description of the invention (46) The discharge line 17 is connected to the catalyst reactor (gas decomposition unit) 1 8 in the same manner as the above-mentioned embodiment 9. An exhaust line 9 for exhausting the processed gas from the catalyst reactor 18 is also provided. Next, the operation of the device of the tenth embodiment will be described. First, the waste water [C] containing ammonia, TMAH, and hydrogen peroxide is introduced into the heating and concentration section 6 3 ′, and the waste water is heated in the heating and concentration section 63 to concentrate and MAH (heating and concentration step). In the heating and concentration section 63, the gas discharged from the gas discharge = line 64 is mainly steam and ammonia and hydrogen peroxide, and then the condensation is performed in the condensation section 67 (condensation step) to lead the pipeline 6 8 to Then, the collected water is introduced into the decomposition / discharge tower 86. In the decomposition / discharge tower 86, ammonia in the condensed water is released with air ^ vapor (decomposition / discharge step), and the released ammonia-containing gas is discharged from the gas discharge line 29 and introduced into the gasifier 66. In addition, the above-mentioned decomposition / discharge column 86 is decomposed into tritium, C02, and h20 by the catalyst to remove it from the wastewater. On the other hand, the TMAH concentrated liquid obtained by the heating and concentration section 63 described above is also introduced into the gasifier 66 described above. This vaporizer 66 vaporizes the TMAH concentrated liquid (gasification step) 'The above-mentioned ammonia-containing gas is simultaneously discharged from the discharge line 17 and is introduced into the catalyst reactor 18. The introduced gas is TMA and methanol produced by the decomposition of ammonia and TMAH. Simultaneously decompose and purify the tritium and the like with the solid catalyst of the catalytic reactor. The discharge ratio is 19 from the discharge line, and 4 〇 (decomposition step ). In this way, the waste liquid containing TMAH and ammonia and hydrogen peroxide can be effectively treated. [C] is harmless gas such as N ?, C02, H2 0, etc. Furthermore, if the processing method and processing device according to the inventions of the second and third aspects are

1238811 五、發明說明（47) 置，不僅可以淨化處理含有TMAH盥〜' ，亦可淨化處理上述TMAH以外的^及過氧化氫之廢液化合物與含有氨，過氧化氫之廢水，虱化之高沸點有機有2-吡咯烷酮等的含氮有機化^物盥—列如亦可淨化處理含水，亦可處理含有氨以外之可放散;二：過氧化氬之廢在上述實施型態過氧化氫分：物：廢水。解.放散塔86)填充有觸媒，但不限刀解.放散部（分備光照射機構的過氧化氫分解部或八、，亦可為藉由具導入之廢水進行光照射而以光氧化：解過f散,’藉由對在上述實施型態1〜3、7、8，亦/。乳匕氫的構造。解部5丨連接排出管線，而排出在過氧°在上八述過氧化氫分氧素氣體與無害氣體。風刀解部51生成之實施例1 以下顯示以上述實施型態丨的處理的範例。處理對象的廢水[A]組成為含有=仃=處理 ^ ：250 0fflg；^MA^ 500 0mg/L的水。 g L〃、過虱化氫：氧化槽21導人該廢水[B]於過氧化氫分解部5U過二Ti二又在過氧化氫分解部51填充有咖的 Pt/Ti〇2(母1公升Ti〇2擔體擔持18的以）作為觸氧化氫分解步驟廢水[B]中的過氧化氫被分解，、得廢水。且除1〇2廢水中的!!^濃度維2mg/L以下。 /、2 2 接著在pH調整槽24添加鹼（NaOH)於上述除1〇2廢水[B] 中而成為pH 11·5，以8〇〇L/hr在放散塔26之頂^曼入該驗 2014-5709-PF(Nl);Tcshiau.ptd 第51頁 1238811 五、發明說明（48) 添力口廢：[B:。此時由放散塔26之以85〇m3/ 給高溫空氣（1 5 0 °C )。接著尬兮^ ^ ,、，攸…l 4 考攸该放散塔26之下部排出除氨旁7。亚勒^月欠塔2 6之上部排出之含氨氣體導入於加熱器35，加熱歼溫至5 0 0。(：後’導入氣體化器16。另一方面將廢水[A]導入濃縮器14提高到大約6%濃度，以40L/hr喷霧該濃縮液到上述氣體化器16内而實質全部氣體化。在該氣化步驟TMAH被分解為甲基氨與甲醇而氣化0 將攸違氣化器1 6排出之含氨、三曱基胺、甲醇氣體導入觸媒反應态1 8。且觸媒反應器1 8的觸媒入口溫度為3 3 〇 °C。又反應器1 8中填充有後述之觸媒2 5 〇 L。以下為從反應器1 8 (排出管線1 9)排出之淨化完成氣體的分析結果。三曱基胺：0.2ppm以下曱醇：0.2ppm以下氨·· 1 ppm以下氧化氮·· 14ppm 二氧化碳：260 Oppm 一氧化碳：2ppm以下過氧化氫：1 ppm以下填充於反應器1 8之上述觸媒，是如以下調製。即1 〇質量％的氨水70 0公升中加入20質量％的矽膠35. 5kg，攪拌混合後，邊攪拌邊緩慢滴入硫酸欽溶於硫酸水溶液3 0 0公升 (125g · Ti02 /公升，0· 55kg · H2S04 /公升）。製得的凝膠成1238811 V. Description of the invention (47) The device can not only purify and treat TMAH-containing toilets, but also purify and treat waste liquid compounds other than TMAH and hydrogen peroxide and waste water containing ammonia and hydrogen peroxide. Nitrogen-containing organic compounds such as 2-pyrrolidone with high boiling point can be purified and treated with water, and can also be dissipated other than ammonia; Second, the waste of argon peroxide in the above-mentioned embodiment type hydrogen peroxide Points: Material: Wastewater. Solution. Discharge tower 86) is filled with catalyst, but it is not limited to the solution of the knife. Release unit (Hydrogen peroxide decomposition unit for preparing the light irradiation mechanism or eight or eight, also can be used for light irradiation through the introduced wastewater to light Oxidation: dissolve f and disperse, 'By the structure of the above-mentioned embodiment 1 ~ 3, 7, 8, and / or the structure of milk hydrogen, the decomposing part 5 丨 connects the exhaust line, and the exhaust is discharged in peroxy °° The hydrogen peroxide oxygen gas and harmless gas are described. Example 1 generated by the air knife decomposing unit 51 The following shows an example of the treatment in the above-mentioned implementation mode. The wastewater [A] to be treated is composed of = 仃 = treatment ^ : 250 0fflg; ^ MA ^ 500 0mg / L of water. G L〃, hydrogen peroxide: Oxidation tank 21 leads the wastewater [B] 5U hydrogen peroxide in the hydrogen peroxide decomposition unit and Ti2 in hydrogen peroxide. The portion 51 filled with coffee is Pt / Ti〇2 (the mother 1 liter Ti02 support 18) as the hydrogen peroxide in the hydrogen peroxide decomposition step wastewater [B] is decomposed to obtain wastewater. The concentration in the 1002 wastewater is 2 mg / L or less. /, 2 2 Next, add alkali (NaOH) to the pH adjusting tank 24 to the above-mentioned wastewater 10 [B] to be pH 11.5. 8〇 L / hr is on the top of the bleed tower 26. ^ Into the test 2014-5709-PF (Nl); Tcshiau.ptd Page 51 1238811 V. Description of the invention (48) Tim Likou waste: [B :. At this time by the bleed The tower 26 is 850m3 / for high temperature air (150 ° C). Then embarrassed ^ ^ ,,, ......... 4 The lower part of the tower 26 is discharged to remove ammonia beside 7. Yale ^ The ammonia-containing gas discharged from the upper part of the tower 2 6 is introduced into the heater 35 and heated to a temperature of 500. (: After 'introduced into the gasifier 16. On the other hand, the wastewater [A] is introduced into the concentrator 14 and raised to about 6 % Concentration, spray the concentrated liquid into the gasifier 16 at 40 L / hr, and substantially all gasify. In this gasification step, TMAH is decomposed into methyl ammonia and methanol and gasified. The discharged ammonia-containing, trimethylamine, and methanol gases are introduced into the catalyst reaction state 18. The catalyst inlet temperature of the catalyst reactor 18 is 33.0 ° C. The reactor 18 is filled with the later described Catalyst 2 5 〇L. The following is the analysis result of the purified gas discharged from the reactor 18 (exhaust line 19). Trimethylamine: 0.2 ppm or less Alcohol: 0.2 ppm or less · · 1 ppm or less oxidation nitrogen 14ppm carbon dioxide: 260 Oppm carbon monoxide: 2 ppm or less hydrogen peroxide: 1 ppm or less The above catalyst filled in the reactor 18 is prepared as follows. That is, 10 mass% of ammonia in 70 0 liters is added with 20 mass% of Silicone rubber 35.5 kg, after mixing, slowly drop into 300 liters of sulfuric acid solution dissolved in sulfuric acid (125g · Ti02 / liter, 0.55 · H2S04 / liter) while stirring. The gel obtained is

2014-5709-PF(Nl);Tcshiau.ptd 第52頁 1238811 五、發明說明（49) 热，過濾水洗後，以150乾燥1〇小時，接著以5〇〇燒成 6小日守。所製得之粉體組成為Ti〇2 : Si〇2=4 :丨（莫耳比），bET 比表面積為2 0 0m2/g。在該粉末2〇kg中含有釩酸銨2· 〇〇kg以 =間鎢酸銨〇· 77kg中加入15%單甲醇胺水溶液121^，加入 ;廣又粕為成形助劑，以混練機混練之後，以押出成形機成形為8 0mm角，洞開口 2· 8mm，厚度〇· 5mm，長度45 0mm的蜂窩狀以8 0 C將其乾燥，接著在4 5 〇 °c的空氣雾圍下燒成5小時 4蜂窩成形體的組成為T i - S i複合氧化物：2014-5709-PF (Nl); Tcshiau.ptd Page 52 1238811 V. Description of the invention (49) Heat, filter and wash with water, dry at 150 for 10 hours, and then fire at 500 for 6 hours. The composition of the obtained powder was Ti〇2: Si〇2 = 4: 丨 (molar ratio), and the specific surface area of bET was 200 m2 / g. 20 kg of this powder contains ammonium vanadate 2. 00 kg = ammonium metatungstate 0.77 kg 15% monomethanolamine aqueous solution 121 ^ is added and added; Cantonese meal is used as a forming aid and kneaded by a kneading machine After that, it was formed into an 80 mm angle by an extruder, with a hole opening of 2.8 mm, a thickness of 0.5 mm, and a length of 450 mm. The honeycomb was dried at 80 C, and then fired under an air mist at 450 ° C. The composition of 5 hours 4 honeycomb formed body is T i-S i composite oxide:

K〇5 :W〇3 = 90:7:3(重量比）。將該成形體浸潰於硝酸鈀水溶液中，以1 5 0 C將其乾燥3小時後，接著在4 5 〇的空氣雾圍下燒成3小時。所得之觸媒的組成*Ti—Si複合氧化物： V2〇5 : W03 : Pd = 89· 1 : 6· 9 : 3 : 1 (重量比），BET 比表面積為 120m2/g，細孔容積為〇.45cc/g。實施例2 以下顯示以上述實施例7的處理裝置，處理方法進行廢水[C]的處理之範例。處理對象的廢水組成為氨： 2 5 0 0mg/L，TMAH : 30 0 0mg/L 過氧化氫：5 0 0 0mg/L。首先導入該廢水於過氧化氫分解部5丨而分解廢水中的過氧化氫，得到除比〇2廢水。且除h2〇2廢水中的仏％濃度為 2mg/L以下。又再過氧化氫分解部51填充有5〇I^々ptTi〇2(每 T i 〇2擔體1公升擔持1 g的p t)作為觸媒。接著以80 0L/hr在氨放散塔26之頂部投入上述除h2〇2賡水。此時由放散塔26之下部以850L/hr的速度供給高溫空氣（15 0L/hr)。接著將從該放散塔26之不部排出之含^"K〇5: W〇3 = 90: 7: 3 (weight ratio). This compact was immersed in an aqueous solution of palladium nitrate, dried at 150 ° C for 3 hours, and then fired in an air mist of 450 ° for 3 hours. The composition of the obtained catalyst * Ti-Si composite oxide: V205: W03: Pd = 89 · 1: 6 · 9: 3: 1 (weight ratio), the BET specific surface area is 120m2 / g, and the pore volume is 〇.45cc / g. Embodiment 2 The following shows an example of the treatment of wastewater [C] using the treatment device and method of the above-mentioned Embodiment 7. The composition of the wastewater to be treated is ammonia: 250 mg / L, TMAH: 300 mg / L, hydrogen peroxide: 500 mg / L. This waste water is first introduced into the hydrogen peroxide decomposition unit 5 to decompose hydrogen peroxide in the waste water to obtain a removal ratio waste water. In addition, the concentration of 仏% in waste water other than h202 was less than 2 mg / L. Furthermore, the hydrogen peroxide decomposition section 51 is filled with 50 々々 pt Ti 〇2 (1 liter per liter of the T i 〇2 support 1 pt) as a catalyst. Then, the above-mentioned removal of H202 water was introduced at the top of the ammonia release tower 26 at 80 L / hr. At this time, high-temperature air (150 L / hr) was supplied from the lower part of the diffusing tower 26 at a speed of 850 L / hr. Then, the content discharged from the part of the diffusing tower 26 ^ "

2014-5709-PF(Nl);Tcshiau.ptd 第53頁 1238811 五、發明說明（50) -- 廢水在濃縮部56濃縮至TMAH濃度6%。另一方面導入由放散塔26之上部排出之含氨氣體於氣化器76，又供給燃料至氣化器76而昇溫至5〇〇。〇，以 4jL/hr將上述濃縮部56濃縮之TMAH濃縮液喷霧至上述氣化為76内而貫質全部氣體化。在該氣化步驟^—被分解為甲基氨與甲醇而氣化。將從該氣化器7 6排出之含氨、三甲基胺、甲醇氣體導 ^觸媒反應器1 8。且觸媒反應器1 8的觸媒入口溫度為3 3 〇 C。又在觸媒反應器1 8填充同樣調整為與上述實施例1之觸媒2 5 0L。 ^ 以下為從觸媒反應器1 8排出之淨化完成氣體的分析結果。2014-5709-PF (Nl); Tcshiau.ptd Page 53 1238811 V. Description of the invention (50)-The wastewater is concentrated in the concentration section 56 to a TMAH concentration of 6%. On the other hand, the ammonia-containing gas discharged from the upper portion of the diffusing tower 26 is introduced into the gasifier 76, and fuel is supplied to the gasifier 76 to raise the temperature to 500. ○, spray the TMAH concentrated solution concentrated in the concentration section 56 at 4 jL / hr into the above-mentioned gasification to 76, and the entire mass is gasified. In this gasification step, it is decomposed into methylamine and methanol and gasified. The ammonia, trimethylamine, and methanol-containing gas discharged from the gasifier 76 is conducted to the catalyst reactor 18. And the catalyst inlet temperature of the catalyst reactor 18 is 3 3 0 C. The catalyst reactor 18 was filled in the same manner as in the catalyst 2 500L of the first embodiment. ^ The following is the analysis result of the purified gas discharged from the catalyst reactor 18.

三甲基胺：0· 2ppm以下甲醇：0.2ppm以下氨：1 ppm以下氧化氮：14ppm 一氧化碳：2600ppm 一氧化碳：2pp以下過氧化氫：1 ppm以下實施例3 以下顯示使用上述實施型態4之處理裝置進行排水處理的範例。處理對象之廢水組成與上述實施例1相同，廢水[A]為包含3〇〇〇mg TMAH的水，廢水[B]為含有25〇〇mg與 5000 mg過氧化氫的水。且分解·放散塔86填充有〇6L迪克Trimethylamine: 0.2 ppm or less Methanol: 0.2 ppm or less Ammonia: 1 ppm or less Nitric oxide: 14 ppm Carbon monoxide: 2600 ppm Carbon monoxide: 2 pp or less Hydrogen peroxide: 1 ppm or less Example 3 The following shows the treatment using the above-mentioned embodiment 4 An example of a device performing drainage treatment. The composition of the wastewater to be treated is the same as that of the above Example 1. The wastewater [A] is water containing 3,000 mg of TMAH, and the wastewater [B] is water containing 25,000 mg and 5000 mg of hydrogen peroxide. The decomposition and release tower 86 is filled with 〇6L Dick

au.ptd 2014-5709-PF(Nl)；Tcshi 第54頁 1238811 五、發明說明（51) 森填充材(材質：SUS 316)。首先從水槽21導入廢水[B]於PH調整槽24中，在上述廢水[B]中添加氫氧化鈉（Na〇H)成為pH i l 5。以2L/hr將该氫氧化鈉添加廢水[B ]由分解·放散塔§ 6之頂部投入。此時以lkg/hr的速度從蒸氣供給管32供給回收之蒸氣於分解·放散塔86的底部。且在該分解·放散塔86廢水[B]中的過氧化氫被分解同時氨被放散。上述除果氧化氫·氨廢水中的過氧化氫為8mg/L，氨濃度（作為氮原子）&7mg/L : 又從分解·放散塔86之上部排出之含氨氣體中混合從空氣供給官7 1之觸媒反應用氣體而稀釋，接著導入於加熱哭 35，加熱升溫至50(TC後，導入氣化器16中。、…口口另一方面廢水[A ]導入於濃縮器1 4而提升至大約6%濃度，以0.1 L/hr將該濃縮液喷霧至上述氣化器16内而實質全部氣體化。在該氣化步驟TMAH被分解為甲基氨與/醇而氣化。將從該氣化器1 6排出之含氨、三甲基胺、甲醇氣體導入觸媒反應器1 8。且觸媒反應器1 8的觸媒入口溫度為^ 〇 °C。又在觸媒反應器1 8填充同樣調整為與上述f =例i 觸媒0. 6L。貝也歹'之au.ptd 2014-5709-PF (Nl); Tcshi Page 54 1238811 V. Description of the invention (51) Mori filler (material: SUS 316). First, waste water [B] is introduced from the water tank 21 into the pH adjusting tank 24, and sodium hydroxide (NaOH) is added to the waste water [B] to make pH i l 5. The sodium hydroxide-added wastewater [B] was charged at 2 L / hr from the top of the decomposition / discharge column §6. At this time, the recovered steam was supplied from the steam supply pipe 32 at a rate of 1 kg / hr to the bottom of the decomposition / discharge tower 86. Further, hydrogen peroxide in the wastewater [B] of the decomposition / discharge tower 86 is decomposed and ammonia is released. The hydrogen peroxide in the above-mentioned dehydrogenated hydrogen / ammonia wastewater is 8 mg / L, the ammonia concentration (as a nitrogen atom) & 7 mg / L: the ammonia-containing gas discharged from the upper part of the decomposition and release tower 86 is mixed and supplied from the air The catalyst reaction of Guan 71 was diluted with gas, and then introduced into heating cry 35, and heated to 50 ° C, and then introduced into gasifier 16. The waste water [A] was introduced into concentrator 1 4. The concentration was raised to about 6%, and the concentrated liquid was sprayed into the gasifier 16 at 0.1 L / hr to substantially vaporize the gas. In this gasification step, TMAH is decomposed into methyl ammonia and alcohol. The ammonia, trimethylamine, and methanol-containing gases discharged from the gasifier 16 are introduced into the catalyst reactor 18, and the catalyst inlet temperature of the catalyst reactor 18 is ^ 0 ° C. The catalyst reactor 18 was filled in the same way as the f = Example i catalyst 0.6L.

以下為從反應器1 8 (排出管1 9 )排出之淨化* 士斤碰^ i析結果。三甲基胺：0· 2ppm以下曱醇：0.2ppm以下氨：1 ppm以下The following is the purification result from the reactor 18 (the discharge pipe 19). Trimethylamine: 0.2 ppm or less Methanol: 0.2 ppm or less Ammonia: 1 ppm or less

2014-5709-PF(Nl);Tcshiau.ptd 第55頁 1238811 五、發明說明（52) 氧化氮：15ppm 二氧化碳：2 6 0 0ppm 一氧化碳：2ppm以下過氧化氫：1 ppm以下實施例4 以下顯示以上述實施型態9之處理裝置，處理方法進行廢水[C ]的處理的範例。處理對象的廢水組成與實施例2 相同，氨：2500mg/L ，TMAH :3000mg/L ，過氧化氮： 5 0 0 0mg/L。且在分解·放散塔86中填充有〇· 1L的過氧化氫分解觸媒（P t / T i 02 - Z r 02 (每1公升T i 02 - Z r 02擔體擔持〇 · 5 g的 Pt)與 1.6L 的（MacMahon)型填充材（材質：SUS 3 04 )。以2 L / h r將上述廢水[C ]由分解·放散塔8 6之頂部投入。此時來自蒸氣供給管55送入的蒸氣由分解·放散塔86 的底部以lkg/h3的速度供給。接著從該分解·放散塔86的下部排出之含有TMAH廢水在濃縮部56濃縮到TMAH濃度為 6% ° 另一方面從分解·放散塔86的上部排出之含氨氣體中混入來自空氣供給管7 1的觸媒反應用空氣而稀釋，接著導入於氣體化器7 6中，又供給燃料於氣體化器7 6中而昇溫到 5 0 0 °C，將在上述濃縮部56濃縮之^―濃縮液以〇.lL/hr喷務到上述氣體化器7 6内而實質全體氣體化。在該氣體化步驟TMAH被熱分解為三甲基胺與甲醇而被氣化。從該氣體化器7 6排出的含氨、三曱基胺、甲醇氣體導入於觸媒反應器1 8中。且觸媒反應器丨8的觸媒入口溫度為2014-5709-PF (Nl); Tcshiau.ptd Page 55 1238811 V. Description of the invention (52) Nitrogen oxide: 15ppm Carbon dioxide: 2 60 0ppm Carbon monoxide: 2ppm or less Hydrogen peroxide: 1 ppm or less Example 4 The following shows The example of the treatment device and method of the implementation mode 9 described above for the treatment of wastewater [C]. The composition of the wastewater to be treated was the same as in Example 2. Ammonia: 2500 mg / L, TMAH: 3000 mg / L, and nitrogen peroxide: 500 mg / L. The decomposition / discharge tower 86 is filled with 0.1 L of hydrogen peroxide decomposition catalyst (P t / T i 02-Z r 02 (0.5 g per 1 liter T i 02-Z r 02 carrier). Pt) and 1.6 L (MacMahon) type filler (Material: SUS 3 04). The above-mentioned wastewater [C] was introduced from the top of the decomposition / discharge tower 86 at 2 L / hr. At this time from the steam supply pipe 55 The fed vapor is supplied at a rate of 1 kg / h3 from the bottom of the decomposition / distribution tower 86. The TMAH-containing wastewater discharged from the lower part of the decomposition / distribution tower 86 is concentrated in the concentration section 56 to a TMAH concentration of 6% ° The ammonia-containing gas discharged from the upper part of the decomposition / discharge tower 86 is mixed with the catalyst reaction air from the air supply pipe 71 to be diluted, and then introduced into the gasifier 76 and supplied with fuel to the gasifier 76. On the other hand, when the temperature was raised to 500 ° C, the concentrated solution concentrated in the concentration section 56 was sprayed into the gasifier 76 at 0.1 L / hr to substantially vaporize the whole. In this gasification step TMAH is It is thermally decomposed into trimethylamine and methanol and is gasified. The ammonia-containing, trimethylamine, and methanol gases discharged from the gasifier 76 are conducted. Catalyst in the reactor 18. The reactor and catalyst inlet temperature of the catalyst 8 is Shu

2014-5709-PF(Nl);Tcshiau.ptd2014-5709-PF (Nl); Tcshiau.ptd

第56頁 1238811 五、發明說明（53) 3 3 〇 °C。又在觸媒反應器1 8，填充與上述實施例1同樣地調製的觸媒0. 6L。從觸媒反應器1 8排出的淨化完成氣體的分析結果如下。Page 56 1238811 V. Description of the invention (53) 3 3 ° C. 6L。 The catalyst reactor 18 is filled with a catalyst prepared in the same manner as in Example 1 0.6L. The analysis results of the purified completion gas discharged from the catalyst reactor 18 are as follows.

三甲基胺：0.2ppm以下曱醇：0.2ppm以下氨：1 p p m以下氧化氮：15ppm 一氧化碳· 2600ppm 一氧化碳：2ppm以下過氧化氫：lppm以下發明效果：根據本發明之廢水的處理方法，處理裝置，對同時含有可氣化有機化合物（TMAH等）與可放散化合物（氨等）與過氧化氫的廢水，藉由一連串的處理步驟，能分解處理該等 3種處理對象物質，或同時處理不同之2種廢水，即使其中二廢水含有過氧化氫與可放散化合物（氨等），另一廢水則含有可氣化有機化合物（ΤΜΑίί等），亦能同時處理該等不同Trimethylamine: 0.2 ppm or less Alcohol: 0.2 ppm or less Ammonia: 1 ppm or less Nitrogen oxide: 15 ppm Carbon monoxide · 2600 ppm Carbon monoxide: 2 ppm or less Hydrogen peroxide: 1 ppm or less Inventive effect: The method and device for treating wastewater according to the present invention For wastewater containing both gasifiable organic compounds (TMAH, etc.) and dispersible compounds (ammonia, etc.) and hydrogen peroxide, a series of processing steps can be used to decompose and treat these three kinds of treatment target substances, or treat different substances at the same time. The two types of wastewater, even if two of them contain hydrogen peroxide and dispersible compounds (ammonia, etc.), and the other of them contain gasifiable organic compounds (TMAίί, etc.), they can simultaneously treat these differences

種類的廢水。因此能達成裝置的簡單化，設備成本和操作成本的降低。Kind of wastewater. Therefore, simplification of the device, reduction of equipment cost and operation cost can be achieved.

1238811 圖式簡單說明第1圖係顯示本第1發明之1之實施型態1的廢水的處理裝置。第2圖係顯示本第1發明之1之實施型態2的廢水的處理裝置。第3圖係顯示本第1發明之1之實施型態3的廢水的處理裝置。第4圖係顯示本第1發明之2之實施型態4的廢水的處理裝置。第5圖係顯示本第1發明之2之實施型態5的廢水的處理裝置。第6圖係顯示本第1發明之2之實施型態6的廢水的處理裝置。第7圖係顯示本第2發明之1之實施型態7的廢水的處理裝置。第8圖係顯示本第2發明之1之實施型態8的廢水的處理裝置。第9圖係顯示本第2發明之2之實施型態9的廢水的處理裝置。第1 0圖係顯示本第3發明之實施型態1 0之廢水的處理裝置的模式圖。符號說明： 1 3，2 3〜廢水排出管線 1 5〜濃縮液排出管線； 11，2 1〜水槽； 14〜濃縮器；1238811 Brief description of the drawings Fig. 1 is a diagram showing a waste water treatment apparatus according to a first embodiment of the first invention. Fig. 2 shows a wastewater treatment apparatus according to a second embodiment of the first invention. Fig. 3 shows a wastewater treatment apparatus according to a third embodiment of the first invention. Fig. 4 shows a waste water treatment apparatus according to a fourth embodiment of the first invention; Fig. 5 shows a wastewater treatment apparatus according to a fifth embodiment of the first invention; Fig. 6 shows a wastewater treatment apparatus according to a sixth embodiment of the first invention; Fig. 7 shows a wastewater treatment apparatus according to a seventh embodiment of the second invention. Fig. 8 shows a waste water treatment apparatus according to an eighth embodiment of the second invention. Fig. 9 shows a wastewater treatment apparatus according to a ninth embodiment of the second invention. Fig. 10 is a schematic diagram showing a waste water treatment apparatus of a type 10 according to the third embodiment of the present invention. Explanation of symbols: 1 3, 2 3 ~ wastewater discharge line 1 5 ~ concentrated liquid discharge line; 11, 2 1 ~ water tank; 14 ~ concentrator;

2014-5709-PF(Nl);Tcshiau.ptd 第58頁； 1 8〜觸媒反應器； 2 5〜廢水投入管線； 2 6〜放散塔； 2 8〜鹼供給管線； ; 3 1〜液排出管線； 3 3〜空氣導入管線； 34，35，37〜加熱器； 3 6 a〜送風機； 4 1，4 2〜分歧管線； 4 6，4 7，5 2〜排出管線； 5 1〜過氧化氫分解部； ; 5 5〜供給管線； 5 7〜濃縮液導出管線； 59〜蒸氣導入管線； 6 1〜空氣導入管線； 64〜氣體排出管線； 6 7〜凝縮部； 8 6〜分解·放散部；管線；出管線； u供給配管）。 1238811 圖式簡單說明 1 6，6 6，7 6〜氣體化器 2 4〜p Η調整槽； 25a ， 28a ， 31a〜幫浦； 2 7〜驗槽； 29，45〜氣體排出管線 3 2〜蒸氣導入管線； 33a〜空氣風扇； 3 6〜循環管線； 3 8〜廢水送出管線； 43，44〜熱交換器； 48〜合流管線； 54，62，68〜導出管線 5 6〜濃縮部； 5 8〜排出管線； 6 0〜燃料供給管線； 6 3〜加熱濃縮部； 6 5，6 9〜液排出管線； 7 0〜蒸氣供給管線； 1 2，2 2，5 3〜廢水導入 1 9，3 9〜處理後氣體排 7 1〜空氣供給管線（空|2014-5709-PF (Nl); Tcshiau.ptd page 58; 1 8 ~ catalyst reactor; 2 5 ~ wastewater input line; 2 6 ~ discharge tower; 2 8 ~ alkali supply line; 3 1 ~ liquid discharge Pipeline; 3 3 ~ air introduction line; 34, 35, 37 ~ heater; 3 6 a ~ blower; 4 1, 4 2 ~ branch line; 4 6, 4 7, 5 2 ~ discharge line; 5 1 ~ peroxidation 5 5 ~ supply line; 5 7 ~ concentrated liquid outlet line; 59 ~ steam introduction line; 6 1 ~ air introduction line; 64 ~ gas exhaust line; 6 7 ~ condensation part; 8 6 ~ decomposition · release Department; pipeline; outlet pipeline; u supply piping). 1238811 Brief description of the drawings 1 6, 6 6, 7 6 ~ Gasifier 2 4 ~ p ΗAdjustment tank; 25a, 28a, 31a ~ pump; 2 7 ~ inspection tank; 29,45 ~ gas exhaust line 3 2 ~ Steam introduction line; 33a ~ air fan; 36 ~ circulation line; 38 ~ wastewater sending line; 43,44 ~ heat exchanger; 48 ~ combination line; 54,62,68 ~ outlet line 5 6 ~ concentration section; 5 8 ~ discharge line; 60 ~ fuel supply line; 6 3 ~ heating and concentration section; 6, 5, 6 ~ liquid discharge line; 70 ~ steam supply line; 1 2, 2 2, 5 3 ~ wastewater introduction 1 9, 3 9 ~ Processed gas exhaust 7 1 ~ Air supply line (empty |

2014-5709-PF(Nl);Tcshiau.ptd 第59頁2014-5709-PF (Nl); Tcshiau.ptd Page 59

Claims

蠢(更變懸 6723 六、申請專利範圍修正^本 1. 一前述廢水前述廢水廢水[B ] 將前分解將前驟；以及將前體以觸媒 2 ·如在前述氣 3.如在進行前並將過氧 4 ·如同時進行驟而得之分解步驟 5 ·如在前述氣 6.— 合物，可處理方法種尾水之處理方法，其為同時處理2種水的方法，中之一者為含有可氣化之有機化合物的廢水[A ]，之另一者為含有可放散之化合物以及過氧化氫之 ;該方法包括：述廢水[A ]氣體化之氣化步驟；前述廢水[B ]中的過氧化氫之過氧化氫分解步驟；述廢水[B ]中前述可放散之化合物放散的放散步述氣化步驟而得之氣體與前述放散步驟而得之氣分解處理之分解步驟。申請專利範圍第1項所述之廢水之處理方法，其中化步驟之前設有濃縮前述廢水[A ]之濃縮步驟。申請專利範圍第1項所述之廢水之處理方法，其中述放散步驟之前先進行前述過氧化氫分解步驟，化氫分解後的液相附加到前述放散步驟。申請專利範圍第1項所述之廢水之處理方法，其中前述過氧化氫分解步驟與前述放散步驟，該等步氣體與前述氣化步驟而得之氣體同時附加於前述〇申請專利範圍第4項所述之廢水之處理方法，其中化步驟之前設有濃縮前述廢水[A ]之濃縮步驟。種廢水之處理方法，為處理含有可氣化之有機化放散之化合物，以及過氧化氫之廢水[C ]的廢水之，該方法包括：Stupid (more variable 6723) VI. Amendment of the scope of patent application ^ This 1. The aforementioned wastewater The aforementioned wastewater wastewater [B] will be decomposed before the first step; and the precursor will be used as a catalyst 2 · as in the aforementioned gas 3. as in progress Before and after peroxy 4 · If the decomposition step 5 obtained at the same time is performed simultaneously · As in the aforementioned gas 6.- compound, the treatment method can be a tail water treatment method, which is a method for simultaneously treating 2 kinds of water, of which One is a wastewater [A] containing a gasifiable organic compound, and the other is a wastewater containing a dispersible compound and hydrogen peroxide; the method includes: a gasification step for the gasification of the wastewater [A]; the aforementioned wastewater [B] Decomposition step of hydrogen peroxide in hydrogen peroxide; Decomposition of the above-mentioned dispersible compound in the wastewater [B]; release of the gas obtained in the gasification step and decomposition of the gas obtained in the foregoing step; Step 1. The method for treating wastewater described in item 1 of the scope of patent application, wherein a concentration step for concentrating the aforementioned wastewater [A] is provided before the chemical step. The method for treating wastewater described in item 1 of the scope of patent application, where the walk is described The hydrogen peroxide decomposition step is performed before, and the liquid phase after the hydrogen hydride decomposition is added to the foregoing release step. The method for treating waste water according to item 1 of the scope of the patent application, wherein the hydrogen peroxide decomposition step and the foregoing release step, the The iso-step gas and the gas obtained from the aforementioned gasification step are simultaneously added to the wastewater treatment method described in item 4 of the aforementioned patent application scope, wherein a concentration step for concentrating the aforementioned wastewater [A] is provided before the chemical step. The treatment method is for treating wastewater containing gasifiable organically released compounds, and hydrogen peroxide wastewater [C]. The method includes:

2226-5709Xl-PFl.ptc 第60頁 2005. 03. 25. 061 1238811 幸虢 92116723 月___a 修正六、申請專利範圍分解前述廢水[C]中的過氧化氫之過氧化氫分解步驟；將前述廢水[C ]中前迷可放散之化合物放散的放散步驟；之將前述廢水[C ]中的前述可氣化之有機化合物氣體化氣化步驟；以及將W述氣化步驟而得之氣體與前述放散步驟而得之氣體以觸媒分解處理之分解步驟。〃括 7·如申請專利範圍第6項所述之廢水之處理方法，還包濃縮前述廢水[C ]中前述可氣化之有機化合物的濃縮步其中在進行前述過氧化氫分解步驟，前述放散步驟與縮步驟之f附有將前述過氧化氫分解後之液相的前步驟’接著將該放散後之液相前述濃縮步驟，以誃驟而得之濃縮之前述氣化步驟。 ^ 如申明專利範圍第6項所述之廢水之處理方法，還包縮前述廢水[C]中前述可氣化之彳機化合物的濃縮步 t ^進行前述過氧化氫分解步驟，前述放散過氧化氫分解後之液相的前述放射步驟1 1彳之液相前述濃縮步驟，以該濃縮步驟而别述氣化步驟。 α心種廢水之處理方法，為處理含有可氣化之有機化 2226-5709X1-PFl.ptc 第61頁 20〇5. 03. 25. 062 12388H ^^ --92116723 、申凊專利範圍一物’可放散之化合物處理方法，該方法包括曰修正以及過氧化氫之廢水[C ]的廢水之 /致’該方法包括·· ^ 分解前述廢水[c]中的過氧化氮’同時將前述廢水[C] 中前述可放散之化合物放散之分解.放散步驟；將該分解·放散後之廢水氣體化之氣化步驟；以及 ^ 將前述氣化步驟而得之氣體與前述分解·放散步驟而得之氣體以觸媒分解處理之分解夕驟。 1 〇 ·如申請專利範圍第9項所述之廢水之處理方法，勹 ϊΐί”分解.放散步驟之廢水濃縮而得含有機化合i =物之k縮步驟，其中該步物前述氣化步驟而氣化。于辰細液附加於 11. 一種廢水之處理方法，為處理含合物’可放散之化合物，以孔化之有機化處理方法，該方法包^及過乳化虱之廢水[C]的廢水之 t熱前述廢水[c]而濃縮之加熱濃縮步驟. ，縮以該加熱濃縮步驟揮發之可放散虱化虱之凝縮步驟；物以及過分解該凝縮水中的過惫 Θ ^ 放散之分解·放散步驟； R時將可放散之化合物，以則述加熱濃縮步驟而得之含化之氣化步驟；以及 σ物濃縮液氣 :前述氣化步驟而得之氣體與前分解處理之分解步驟。 < 乳體以觸媒 1 2 ·如申請專利範圍第】！！ i 72226-5709Xl-PFl.ptc Page 60 2005. 03. 25. 061 1238811 Fortunately 92116723 month ___a Amendment VI. Patent application scope: Decomposition step of hydrogen peroxide in the aforementioned wastewater [C]; A step of releasing a compound that can be released in the waste water [C]; a step of gasifying and gasifying the aforementioned gasifiable organic compound in the aforementioned waste water [C]; and a gas obtained from the gasification step described above and The decomposition step in which the gas obtained in the foregoing release step is treated with a catalyst. 〃 Including 7. The method for treating wastewater as described in item 6 of the scope of the patent application, further comprising a concentration step of concentrating the aforementioned gasifiable organic compounds in the aforementioned wastewater [C], wherein the aforementioned hydrogen peroxide decomposition step is performed, and the aforementioned release Step f and step f are accompanied by a previous step of decomposing the liquid phase after the hydrogen peroxide, followed by the aforementioned concentration step of the released liquid phase, and the concentrated gasification step obtained by the step. ^ The method for treating wastewater described in item 6 of the declared patent scope, further comprising the step of condensing the aforementioned gasifiable hydrating compound in the wastewater [C] t ^ performing the aforementioned hydrogen peroxide decomposition step and the aforementioned release peroxidation The aforementioned radiation step of the liquid phase after hydrogen decomposition 11 is the liquid phase of the aforementioned concentration step, and the concentration step is referred to as the gasification step. The treatment method of α-type seed waste water is to treat gasified organic compounds containing 2226-5709X1-PFl.ptc, page 61, 2050. 03. 25. 062 12388H ^^ --92116723, patent application scope one thing ' A method for treating a dispersible compound, the method comprising: amending and / or causing the wastewater of the hydrogen peroxide wastewater [C], and the method includes: ... ^ decomposing the nitrogen peroxide in the aforementioned wastewater [c] and simultaneously converting the aforementioned wastewater [ C] Decomposition and release of the aforementioned compound which can be released. The release step; a gasification step of gasifying the decomposed and released wastewater; and ^ obtained by decomposing and releasing the gas obtained from the aforementioned gasification step and the aforementioned decomposition and release step. The decomposition step of the gas is treated by a catalyst. 1 0. The method for treating waste water as described in item 9 of the scope of the patent application, the "decomposition. Dispersing step of the waste water is concentrated to obtain a k-shrinking step containing organic compounds i = matter, wherein the step of the aforementioned gasification step and Gasification. Yu Chen fine liquid is added to 11. A method for treating wastewater, which is a method for treating organic compounds containing pores that can be dissipated by pores, and this method includes the wastewater of superemulsified lice [C] The condensing step of heating the aforementioned waste water [c] and condensing the condensing step of the waste water [c], condensing the condensing step of the heat-concentrating step and releasing the lice and lice; · Dispersion step; the compound that can be dissipated in R is the gasification step containing heating obtained from the heating and concentration step; and σ-concentrated liquid gas: the gas obtained from the aforementioned gasification step and the decomposition step of the previous decomposition treatment &Lt; Catalyst for milk body 1 2 · If the scope of patent application is the highest]! I 7

2226-5709Xl-PFl.ptc 第62頁第1〜11項中任-項所述之廢水之 2005· 03· 25. 〇63 1238811 案號 921167W 六、申請專利範圍修正理方法，其中在w述氣化步驟之氣化的熱量，是直接使前述分解步驟排出之處理後氣體的熱量，或經由前述放散步驟或則述分解·放散步驟而得之氣體的加熱而使用。 13·、一種廢水之處理裝置，係為同時處理2種廢水的裝置，前述廢水之一者為含有可氣化之有機化合物之廢水 [Α]，前述廢水之另一者為含有可放散之化合物以及過氧化氫之廢水[Β ]，或為處理含有可氣化之有機化合物，可放散之化合物=及過氧化氫之廢水[c]的裝置，該裝置包括：月氣化則述廢水[A ]或前述廢水[c ]之氣化部；分解前述廢水[B]或前述廢水[c]中之過氧化化氫分解部；將前述廢水[B]或前述廢水[c]中之於放散前述可放散化合物之放散部，月刖述軋化部而得之氣體，與前述放散部而得之$ 以觸媒分解處理之分解部。乳 1 4·如申請專利範圍第丨3項所述之廢水之處理裳置，還包括導入别述廢水[B ]於前述過氧化氫分解部之管、線· 從該過氧化氫分解部導出並導入前述放散部之'其線。 1 5·如申請專利範圍第1 3項所述之廢水之處理裝€置&，其具有濃縮前述廢水[C ]中之前述可氣化之有機化合^之農^ 部；其中前述氣化部是氣化從該濃縮部排出之t^ 巧j j農缩液；還包括導入前述廢水前述過氧化氫分解部之技 · .% 吕線，從遠過氧化氫分解部導出液相，並導入前述放散部之管線，與從放散部導出液相並導入前述濃縮部之总1。 \ g線02226-5709Xl-PFl.ptc on page 62 of any of the items 1 to 11 in 2005- 03. 25. 〇63 1238811 Case No. 921167W Sixth, the patent application scope amendment method, where the gas is described in w The heat of vaporization in the gasification step is the heat of the treated gas discharged directly from the decomposition step, or the heating of the gas obtained through the aforementioned dispersion step or the decomposition and release step. 13. A kind of wastewater treatment device, which is a device that treats two types of wastewater at the same time. One of the aforementioned wastewater is a wastewater containing a gasifiable organic compound [A], and the other one is a compound containing a dispersible compound. And hydrogen peroxide wastewater [B], or a device for treating wastewater containing gasifiable organic compounds, which can be released = and hydrogen peroxide [c], which includes: monthly gasification wastewater [A] ] Or the gasification part of the aforementioned wastewater [c]; decomposing the aforementioned wastewater [B] or the hydrogen peroxide decomposition unit in the aforementioned wastewater [c]; and releasing the aforementioned [[B]] or the aforementioned wastewater [c] into the aforementioned The dispersing part of the dispersible compound, the gas obtained from the rolling part described above, and the decomposing part of the dispersing part treated with catalyst as described above. Milk 1 4 · The treatment of wastewater as described in item 丨 3 of the scope of the patent application, and also includes the introduction of other types of wastewater [B] into the tubes and lines of the hydrogen peroxide decomposition section · Derived from the hydrogen peroxide decomposition section And introduce the line of the aforementioned diffusing section. 15 · The wastewater treatment device & as described in Item 13 of the scope of the patent application, which has the Ministry of Agriculture ^ for concentrating the aforementioned gasifiable organic compound ^ in the aforementioned wastewater [C]; wherein the aforementioned gasification The unit is a gasification ^^ jj agricultural shrinkage discharged from the concentrating unit; it also includes the technology of introducing the aforementioned waste water and the aforementioned hydrogen peroxide decomposition unit....% Line, leading the liquid phase from the hydrogen peroxide decomposition unit and introducing The total number of pipelines in the diffusing section and the liquid phase led out from the diffusing section and introduced into the concentrating section. \ g line 0

2226-5709Xl-PFl*Ptc 第63頁 2005. 03. 25. 064 1238811 Mm 921 六、申請專利範圍 1 6 ·如申請專具有濃縮前述廢水[c]中 J：；所述之廢水之處理裝置， 7凝縮前述可放：化之合=疑V 疋齓化從前述濃縮部排出之其中别述氣化部廢水導入前述過氧化氫分解部之=並具備有將前述部導出液相而導入前述濃縮部之二f，:::亥：氧化氫分解相而導入前述凝縮部之管線，盥二I 該濃縮部導出氣入前述放散部之管線。、、〃、攸〇 /邊縮部導出液相而導 17.—種廢水之處理裝置置，前述廢水之一者為人古^ /糸為门時處理2種廢水的裝 [A] ’前述廢水之另一者3有二〜化之有機化合物之廢水氫之廢水[B]，或為處ίί:有可放散之化合物以及過氧化夕介人札、為處含有可氣化之有機化合物，可放4 二a :及過氧化氫之廢水[C]的裝置，該裝置包括：月埒if ί廢水[β]或前述廢水[C]中之過氧化氫同時放月丈則述可放散化合物之分解·放散部；軋化前述廢水[A ]或前述分解·放散部所排出的分解· 放散後的廢水之氣化部；以及 — 則述氣化部而得之氣體，與前述分解·放散部而得之氣體同時以觸媒分解處理之分解部。 ....... Η — m ^ 7J rrr - ^ ^ ^ /久月人 Ί 夂 < 服得含有機化合物濃縮液之濃縮部；其中前述氣化部是體化從该濃縮部排出之前述濃縮浪。 1 9 · 一種廢水的處理裝置，係為處理含有可氣化之肩 1 8 ·如申請專利範圍第丨7項所述之廢水之處理·裝置，其具備》農縮從前述分解·放散部排出之分解·放散後之廢水你7谱始、、六^W都；其中箭沭翕>fl·划專1 2226-5709Xl.PFl.ptc 第64頁 2005. 03. 25. 065 12388112226-5709Xl-PFl * Ptc Page 63 2005. 03. 25. 064 1238811 Mm 921 VI. Application for patent scope 1 6 · If the application has a special treatment device for concentrating the aforementioned wastewater [c] in J :; 7 Condensing the above-mentioned release: Chemical combination = Suspected V, which is discharged from the above-mentioned concentration section, among which the wastewater from the gasification section is introduced into the above-mentioned hydrogen peroxide decomposition section = and is provided with the above-mentioned section being led out of the liquid phase and introduced into the above-mentioned concentration The second part f, ::: Hai: the hydrogen oxide decomposes the phase and is introduced into the pipeline of the aforementioned condensation part, and the second part I is the concentrated part which leads the gas into the pipeline of the aforementioned release part. 、, 〃, 攸〇 / The shrinkage part leads to the liquid phase to guide 17.-A kind of waste water treatment device is set up, one of the aforementioned waste water is Rengu ^ / 糸 is the door when the two kinds of waste water treatment equipment [A] 'The aforementioned The other 3 of the waste water is a waste water of hydrogenation of organic compounds [B], or a wastewater treatment: there are compounds that can be released and peroxides, which contain vaporizable organic compounds, A device capable of discharging 4a: and hydrogen peroxide wastewater [C], the device includes: moon 埒 if ί wastewater [β] or the hydrogen peroxide in the aforementioned wastewater [C] while simultaneously releasing the chemical compounds which can be released The decomposition and release section; the gasification section for rolling the aforementioned wastewater [A] or the decomposed and released wastewater discharged from the aforementioned decomposition and release section; and-the gas obtained from the vaporization section and the aforementioned decomposition and release The decomposed part of the gas obtained by the catalyst is treated with the catalyst at the same time. ....... Η — m ^ 7J rrr-^ ^ ^ / JiuyuerenΊ lt < Concentrated part containing a concentrated liquid containing organic compounds; wherein the aforementioned gasification part is a body that is discharged from the concentrated part The aforementioned concentrated waves. 1 9 · A waste water treatment device for the treatment of wastewater containing vaporizable shoulders. The decomposition and release of the waste water after you start 7 spectrum, 6 ^ W; among them, arrow 沭翕 > fl · planning 1 2226-5709Xl.PFl.ptc page 64 2005. 03. 25. 065 1238811

包：放散之化合物以及過氧化氫之廢水[c]的裝置，加熱前述廢水而濃縮之加凝縮從該加埶濃缩邱捃双…丨氫之凝縮部； ρ揮發之可放散化合物以及過氧化水中的過氧化氯同時放散可放散之化合物之分解·放散部；氣體化從前述加熱濃液之氣化部；與、、、σ卜出之含有機化合物之濃縮將前述氣化部；^ > 氣體以觸媒分解處理與前述分解.放散部放散之〜< 分解部。Package: Device for releasing compound and waste water of hydrogen peroxide [c], heating and condensing the above-mentioned waste water and condensing from the addition and concentrating Qiu Shuang ... The condensation part of hydrogen; v The chlorine peroxide in water simultaneously releases the decomposition and release part of the compound that can be released; the vaporization part that vaporizes the aforementioned heated concentrated liquid; and the concentration of the organic compound containing the organic compound from the sigma, sigma, and sigma; The gas is decomposed by the catalyst and the aforementioned decomposition. The release part is released ~ < Decomposition part.

2226-5709X1-PFl.ptc 2005· 〇3. 25. 066 第65頁2226-5709X1-PFl.ptc 2005 · 〇3. 25. 066 p. 65