TWD210155S - A vessel for plasma processing device - Google Patents
A vessel for plasma processing device Download PDFInfo
- Publication number
- TWD210155S TWD210155S TW109300766D01F TW109300766D01F TWD210155S TW D210155 S TWD210155 S TW D210155S TW 109300766D01 F TW109300766D01 F TW 109300766D01F TW 109300766D01 F TW109300766D01 F TW 109300766D01F TW D210155 S TWD210155 S TW D210155S
- Authority
- TW
- Taiwan
- Prior art keywords
- processing device
- plasma processing
- vessel
- design
- container
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
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Abstract
【物品用途】;本設計係關於一種等離子體處理裝置用容器之設計,特別是有關於一種用於等離子體處理半導體製造基板裝置中的容器。;【設計說明】;無。[Use of article]; This design is about a container for a plasma processing device, especially a container used in a plasma processing device for semiconductor manufacturing substrates. ;[Design description];None.
Description
本設計係關於一種等離子體處理裝置用容器之設計,特別是有關於一種用於等離子體處理半導體製造基板裝置中的容器。This design is related to the design of a container used in a plasma processing device, especially a container used in a plasma processing semiconductor manufacturing substrate device.
無。no.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR30-2019-0039751 | 2019-08-20 | ||
KR20190039751 | 2019-08-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD210155S true TWD210155S (en) | 2021-03-01 |
Family
ID=88966491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109300766D01F TWD210155S (en) | 2019-08-20 | 2020-02-19 | A vessel for plasma processing device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWD210155S (en) |
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2020
- 2020-02-19 TW TW109300766D01F patent/TWD210155S/en unknown
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