TW538257B - Microlithography projection objective - Google Patents

Microlithography projection objective Download PDF

Info

Publication number
TW538257B
TW538257B TW090118732A TW90118732A TW538257B TW 538257 B TW538257 B TW 538257B TW 090118732 A TW090118732 A TW 090118732A TW 90118732 A TW90118732 A TW 90118732A TW 538257 B TW538257 B TW 538257B
Authority
TW
Taiwan
Prior art keywords
mirror
mirrors
patent application
item
projection objective
Prior art date
Application number
TW090118732A
Other languages
English (en)
Chinese (zh)
Inventor
Hans-Jurgen Mann
Udo Dinger
Michael Muhlbeyer
Original Assignee
Zeiss Stiftung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10037870A external-priority patent/DE10037870A1/de
Application filed by Zeiss Stiftung filed Critical Zeiss Stiftung
Application granted granted Critical
Publication of TW538257B publication Critical patent/TW538257B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW090118732A 2000-08-01 2001-08-01 Microlithography projection objective TW538257B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10037870A DE10037870A1 (de) 2000-08-01 2000-08-01 6-Spiegel-Mikrolithographie-Projektionsobjektiv
EP01116916A EP1178356B1 (de) 2000-08-01 2001-07-11 6-Spiegel-Mikrolithographie-Projektionsobjektiv

Publications (1)

Publication Number Publication Date
TW538257B true TW538257B (en) 2003-06-21

Family

ID=26006601

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090118732A TW538257B (en) 2000-08-01 2001-08-01 Microlithography projection objective

Country Status (3)

Country Link
JP (1) JP2002107630A (ko)
KR (1) KR100787525B1 (ko)
TW (1) TW538257B (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3938040B2 (ja) 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法
JP2004252358A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系及び露光装置
KR101052386B1 (ko) * 2003-09-27 2011-07-28 칼 짜이스 에스엠테 게엠베하 영점 교차 온도 근처에서 열팽창 계수의 온도에 따라, 상이한 기울기 부호를 갖는 재료로 구성된 미러들을 구비한 초단파 자외선 투영 광학계
JP2005172988A (ja) * 2003-12-09 2005-06-30 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2005189247A (ja) 2003-12-24 2005-07-14 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
WO2006094729A2 (en) 2005-03-08 2006-09-14 Carl Zeiss Smt Ag Microlithography projection system with an accessible diaphragm or aperture stop
CN101171547A (zh) * 2005-05-03 2008-04-30 卡尔·蔡司Smt股份公司 使用偏振光的微光刻曝光装置及具有凹面主镜和凹面辅镜的微光刻投射***
EP1886190B1 (en) 2005-06-02 2012-10-03 Carl Zeiss SMT GmbH Microlithography projection objective
KR101592136B1 (ko) 2007-10-26 2016-02-04 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
JP5096530B2 (ja) * 2010-07-26 2012-12-12 カール・ツァイス・エスエムティー・ゲーエムベーハー ゼロ転移温度周辺の熱膨張係数に応じて温度の上昇に対する傾きの符号が異なる材料で構成されたミラーを備えたｅｕｖ投影レンズ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5686728A (en) * 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements

Also Published As

Publication number Publication date
JP2002107630A (ja) 2002-04-10
KR20020011340A (ko) 2002-02-08
KR100787525B1 (ko) 2007-12-21

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees