518425 A7 _'丨!，，1 1 _B7五、發明説明（| ) 經濟部中央標準局員工消費合作社印製 發明背景： 本發明係關於光學光石版印刷元件以及毛胚以及特別 冬關於光學微光石版印刷晶體透鏡元件以及光學元件毛胚 以像用光石版印刷系統中，該系統使用波長低於2〇〇nm真空 紫外線(VUV)，優先地低於193nm，優先地低於175nm，更優先 地低於164nm，例如使用波長在I57nm區域之蒸空紫外線投 射光石版印刷系統。 使用光線波長低於200nm真空紫外線之投射光學光石 $印刷系統具有達成較小外形尺寸之優點。該系統使用波 長低於157nm波長區域之真空紫外線波長，其具有製造出改 善較小外形尺寸集體線路之潛力。目前由製造集體線路之 半導體業界所使用之光學光石版印刷系統持續地朝向更低 光線波長例如為一般248nm發展，但是商業使用低於2〇〇nm 真空紫外線波長例如為193nm以及157nm由於在這些蒸空紫 外線準分子雷射區域中受到該真空紫外線波長傳送通過光 學材料特性影響而受到阻礙。可利用光學材料以及其在該 短波長光石版印刷波長下之光學特性已阻礙低於卩⑼⑽波 長；^業化地使用於光學光石版印刷系統。使用氟化物例如 ，氟化鈣晶體作為光學光石版印刷中光學透鏡毛胚以及光 學透鏡元件由於受到氟化物晶體光學材料之雙折射性阻礙 以及產生負面影響，晶體雙折射性對透射其中之光石版印 刷光線具有影響。聽傭2_m波狀157nm區域例如製 造集體線路之轉體業界所個F2準分子雷射之發射頻譜 蒸空紫外線頻窗之真空紫外線光石版印刷之優點，存在光 本紙張尺度適用中) A4規格（2lGx297_j----- Ψ —、—— (請先閲讀背面之注意事項再填寫本頁) 訂 518425 五、發明説明（2 經濟部中央標準局員工消費合作社印製 學光石版印概化晶體透鏡元相及具有最小雙折射性光 學元件毛胚之需求。 Nikon公司之歐洲EP1001314A2專利申請案說明投射照 射之耐久性光學系統，為了良好耐久性其使用氟化妈晶體 防止高度照射光石版印刷能量密度例如ArF準分子光石版 印刷雷射造成損壞。Nicon公司之美國細61174號專利說 明利用低於300nm波長紫外線雷射之光石版印刷影像聚焦 光學系統，其使用低納濃度敦化詞晶體影像聚焦光學元件 。該系統使用就化约晶體透鏡元件，其具有均勻的結晶指 向如圖4所示。先前技術無法解決使用敦化物晶體元件於 操作於光石版印刷光束之問題。 本發明克服先前技術存在之問題以及提供有益的光石 版印刷元件，其具有有益的光學特性以及光石版印刷特性， 包含最小雙折射性以及其毛胚能夠使用來改善利用蒸空紫 外绛波長光石版印刷製造集體線路。 …工” 發明大要： 本發明貫施例包含雙折射性最小氟化舞蒸空紫外線光 石版印刷透鏡。透鏡優先地包含單一氟化鈣晶體。氟化鈣 透鏡具有光學中心軸由氟化鈣透鏡週邊所包圍，透鏡具有 不同的結晶指向，其傾斜於光學中心軸指向以及朝向週邊。 本發明另外一個實施例包含氟化物晶體光學透鏡。氟 化物晶體光學透鏡包含單一氟化物晶體，其具有第一光學 透鏡表面以及相對於第一透鏡表面之第二光學透鏡表面。 氟化物晶體具有漸增濃度之晶體錯位缺陷，其由第一光學518425 A7 _ '丨! ,, 1 1 _B7 V. Description of the Invention (|) Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Background of the Invention: The present invention relates to optical light lithographic printing elements and hair embryos and special winter about optical low light stone In the lithographic printing system of crystal lens elements and optical elements for photolithography, the system uses vacuum ultraviolet (VUV) wavelengths below 200 nm, preferably below 193 nm, preferably below 175 nm, and more preferably Below 164nm, for example, a vaporized UV projection light lithography system with a wavelength in the I57nm region is used. The use of a projection optical light stone with a wavelength of less than 200nm vacuum ultraviolet light $ The printing system has the advantage of achieving a smaller size. This system uses vacuum ultraviolet wavelengths in the wavelength region below 157nm, which has the potential to improve collective circuits with smaller form factors. Optical lithographic printing systems currently used by the semiconductor industry that manufacture collective circuits continue to develop towards lower light wavelengths such as generally 248 nm, but commercial use of vacuum ultraviolet wavelengths below 200 nm such as 193 nm and 157 nm The vacuum ultraviolet wavelength transmission in the empty ultraviolet excimer laser region is hindered by the influence of optical material characteristics. Available optical materials and their optical characteristics at the short-wavelength lithographic printing wavelength have been hindered below the chirp wavelength; they are used industrially in optical lithographic printing systems. Use of fluoride, for example, calcium fluoride crystals as optical lens blanks and optical lens elements in optical lithography. Because the birefringence of the optical material of the fluoride crystal is hindered and has a negative effect, the crystal birefringence has an effect on the light lithography transmitted through it. Printing light has an effect. Listen to the commission 2_m wavy 157nm area, such as the F2 excimer laser emission spectrum of the collective industry manufacturing vacuum line vacuum vacuum ultraviolet lithography printing advantages, there are advantages in light paper size application) 2lGx297_j ----- Ψ —, —— (Please read the precautions on the back before filling out this page) Order 518425 V. Description of the invention (2 Printed photolithography lithography crystal lens for generalized crystal lenses Elementary phase and the requirement of the blank with the smallest birefringence optical element. Nikon's European EP1001314A2 patent application describes a durable optical system for projection irradiation. For good durability, it uses fluorinated mother crystals to prevent highly irradiated light lithographic printing energy density. For example, ArF excimer light lithography lasers cause damage. Nicon's U.S. Patent No. 61174 describes the use of UV laser laser light lithography light focusing optical systems with wavelengths below 300 nm, which uses low nano-density crystals to focus optical elements. The system uses a crystalline lens element with uniform crystal orientation as shown in Figure 4. The prior art cannot solve the problem of using a crystalline crystal element to operate a light lithographic printing beam. The present invention overcomes the problems of the prior art and provides a beneficial light lithographic printing element, which has beneficial optical characteristics and light lithographic printing characteristics. Contains the minimum birefringence and its hair embryo can be used to improve the collective production of lithographic printing using evacuated UV 绛 wavelength light lithography. The invention is summarized as follows: The embodiments of the present invention include fluorinated dance evacuated UV light stone with minimum birefringence. Printed lens. The lens preferentially contains a single calcium fluoride crystal. The calcium fluoride lens has an optical central axis surrounded by the periphery of the calcium fluoride lens, and the lens has different crystal orientations, which are oriented at the optical central axis and face the periphery. Another embodiment of the invention includes a fluoride crystal optical lens. The fluoride crystal optical lens includes a single fluoride crystal having a first optical lens surface and a second optical lens surface opposite to the first lens surface. The fluoride crystal has a gradual increase Concentration of crystal dislocation defect, which is caused by the first light
--i---— (請先閲讀背面之注意事項再填寫本頁) 訂 518425 A7 B7 五、發明説明（3) 透鏡表面至第二光學透鏡表面地增加。 本發明另外一個實施例包含氟化鈣晶體光學元件以操 作透射波長λ <200nm。氟化鈣晶體光學元件包含氟化鈣晶 體，其具有第一光學透鏡表面以及第二光學透鏡表面以操 作波長λ之光線。氟化鈣晶體之結晶錯位缺陷濃度由第二 光學透鏡表面至第一光學透鏡表面增加。第一光學表面具 有第一表面次構造表面長度每單位面積在1〇s50cm/cm2範 圍内。第二表面次構造表面長度每單位面積 本發明一項實施例包含氟化物晶體透鏡毛胚，其由中 心軸通過較大尺寸D表面之氟化物晶體所構成。中心軸以 及較大尺寸D表面由毛胚週邊所包圍著。中心軸對準以及 與氟化物晶體結晶方向一致。氟化物晶體透鏡毛胚在結晶 指向具有變化，其中心軸擴張以及偏離中心轴以及朝向毛 胚週邊。 經濟部中央標準局員工消費合作社印製 本發明另外一項實施例包含雙折射性最小氟化物晶體 光石版印刷毛胚。毛胚由氟化鈣晶體所構成，其193nm内部 透射度>99%/cm以及折射率均勻性為lppm。氟化鈣晶體具 有一組多個非平行結晶指向以及毛胚具有中心軸，其與氟 化鈣晶體指向一致。毛胚具有結晶週邊以及結晶指向具有 變化，其中中心軸與已知非平行結晶指向間之角度偏差在 中心軸與週邊之間具有相對位置，其與中心軸之距離具有 相關性。優先地角度偏差隨著與中心軸距離增加而增加。 “本發明另外一個實施例包含氟化物晶體光學元件毛胚 。光學元件毛胚氟化物晶體所構成，其具有直徑，第一直徑 本紙張又度適用中國iiif7c—NS) M規格（—a97公酱） 518425 A7 ----- —_B7 五、發明説明（命） 平面表面，第二直徑平面表面，以及由第—與第二表面界定 ^之晶體厚度。毛胚透鏡結晶錯位缺陷濃度由第二表面至 表面地增加。第二表面具有第二表面次構造表面長度 每單位面積為SS以及第-表面具有第—表面次構造表面長 度每單位面積為FS，其中FS>SS。 、 附圖簡單說明： 第一圖（圖1)顯示出本發明光石版印刷系統心里過程 之實施例。 /第-圖至第二圖11(圖2-2H)顯示出本發明光石版印刷 系統/處理過程實施例之斷面圖。 /第二圖至第三圖(；(圖3一3G)顯示出本發明光石版印刷 系統/處理過程實施例之斷面圖。 —第四囷,、、、員示出具有均勻的結晶指向之氣化物晶體透鏡 7G件之斷面圖，其光線通過透鏡外侧猶，其具有並不平行 於<111〉之光線路徑。 第五圖至第五圖A(圖5—⑷顯示出本發明實施例之斷 面圖。 、 第六圖（圖6)顯示出本發明包含<U1>結晶指向之氣化 鈣晶體結晶指向，小圓圈表示Ca。 經濟部中央標準局員工消費合作社印製 第七圖（圖7)顯示出本發明實施例之斷面圖，其包含漸 增晶體錯位缺陷濃度。 第八圖（圖8)顯示出本發明實施例之斷面圖，其包含漸 增晶體錯位缺陷濃度。 第九圖至第九圖A(圖9-9A)顯示出本發明實施例之斷 本紙浪又度適用中國國家標準（CNS ) A4規格（210X297公釐） 518425 A7 __— —_____B7五、發明説明（f ) 6 經濟部中央標準局員工消費合作社印製 面圖。 第十圖（圖10)顯示出本發明實施例之斷面圖。 第十一圖（圖11)為氟化鈣晶體表面之光學顯微圖。 第十二圖（圖12)為氟化鈣晶體表面之光學顯微圖。 第十三圖（圖13)顯示出本發明實施例。 附圖元件數字符號說明： 透鏡50, 50’ ；真空紫外線微光石版印刷系統/處理過 私51;氟化物晶體52, 52’ ；光學中心轴54;透鏡週邊56; 結晶指向57, 58;光學中心軸指向60;彎曲光學表面62, 64, 66;平面性光學表面68;光線路徑72;晶體路徑74;透 鏡76;氟化物晶體78;透鏡表面80;透鏡表面80, 82;漸 增濃度方向84;晶體錯位缺陷86;透鏡毛胚1〇〇;氟化物 晶體102;中心軸1〇4;表面1〇6;毛胚週邊1〇8;結晶指向 110;光學中心軸111;結晶指向112;表面113，114;指向 變化158。 詳細說明： 本發明包含雙折射性最小之氟化物晶體蒸空紫外線光 石版印刷透鏡，其由氟化物晶體所構成。如圖丨，2及3所示， 氟化物晶體蒸空紫外線光石版印刷透鏡使用於蒸空紫外線 微光石版印刷系統/處理過程51，其優先地使用蒸空紫外線 光線波長<200nm。氟化物晶體透鏡元件使用於微光石版印 刷系統中，其包含構成照明系統之光學元件，優先地包含光 源(優先地為準分子雷射），以及投射系統。 氟化物晶體光石版印刷透鏡5〇由氟化物晶體52所構成 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公着） -------.----- (請先閲讀背面之注意事項再填寫本頁)--i ---- (Please read the precautions on the back before filling this page) Order 518425 A7 B7 V. Description of the invention (3) The surface of the lens increases to the surface of the second optical lens. Another embodiment of the present invention includes a calcium fluoride crystal optical element to operate at a transmission wavelength λ < 200 nm. The calcium fluoride crystal optical element includes a calcium fluoride crystal having a first optical lens surface and a second optical lens surface to operate light of a wavelength λ. The crystal dislocation defect concentration of the calcium fluoride crystal increases from the surface of the second optical lens to the surface of the first optical lens. The first optical surface has a first surface substructure surface length per unit area in the range of 10s50cm / cm2. Second surface substructure surface length per unit area An embodiment of the present invention includes a fluoride crystal lens hair embryo, which is composed of a fluoride crystal with a central axis passing through a larger-sized D surface. The central axis and the larger D surface are surrounded by the periphery of the embryo. The central axis is aligned and aligned with the crystal orientation of the fluoride crystal. The fluoride crystal lens hair embryo has a change in crystal orientation, and its central axis expands and deviates from the central axis and toward the periphery of the hair embryo. Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Another embodiment of the present invention includes a birefringence minimal fluoride crystal light lithographic printing wool embryo. The hair embryo was composed of a calcium fluoride crystal, and had an internal transmittance of 193 nm > 99% / cm and a refractive index uniformity of 1 ppm. The calcium fluoride crystal has a set of multiple non-parallel crystal orientations and the hair embryo has a central axis, which is consistent with the calcium fluoride crystal orientation. The hair embryo has a crystal periphery and the crystal orientation changes. The angular deviation between the central axis and the known non-parallel crystal orientation has a relative position between the central axis and the periphery, and the distance from the central axis is correlated. The angular deviation preferentially increases as the distance from the central axis increases. "Another embodiment of the present invention includes a fluoride crystal optical element hair embryo. The optical element hair embryo is made of fluoride crystal and has a diameter. The first diameter of this paper is also applicable to China IIIF7C-NS) M specification (-a97 公 酱) 518425 A7 ----- —_B7 V. Description of the invention (Life) Planar surface, second diameter plane surface, and the crystal thickness defined by the first and second surfaces ^. The concentration of the hairpin lens crystal dislocation defect is determined by the second Surface to surface increase. The second surface has a second surface substructure surface length per unit area and the first surface has a first surface substructure surface length per unit area, where FS> SS. Brief description of the drawings : The first figure (Figure 1) shows an embodiment of the process of the light lithographic printing system of the present invention. / The first figure to the second figure (Figure 2-2H) shows the embodiment of the light lithographic printing system / processing process of the present invention. Sectional views. / Second to third drawings (; (Figs. 3 to 3G) show sectional views of the embodiment of the light lithographic printing system / processing process of the present invention.-The fourth, ,,, and other members are shown.) Has uniform crystalline fingers A cross-sectional view of the 7G element of the gas crystal lens, whose light passes through the outside of the lens and has a light path that is not parallel to < 111>. Fifth to fifth figures A (Figure 5-⑷ shows the present invention The sectional view of the example. The sixth figure (Figure 6) shows that the present invention contains the crystal orientation of <U1> crystallized calcium crystals, and the small circle indicates Ca. Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Figure 7 (Figure 7) shows a cross-sectional view of an embodiment of the present invention, which contains increasing crystal dislocation defect concentration. Figure 8 (Figure 8) shows a cross-sectional view of an embodiment of the present invention, which contains increasing crystal dislocations. Defect concentration. The ninth to ninth graphs A (Figures 9-9A) show that the broken paper of the embodiment of the present invention is also applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 518425 A7 __— —_____ B7 Explanation of the invention (f) 6 The printed surface of the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs. The tenth figure (Figure 10) shows the sectional view of the embodiment of the present invention. The eleventh figure (Figure 11) is calcium fluoride Optical micrograph of crystal surface. Figure 12 (Figure 12) is An optical micrograph of the surface of a calcium crystal. The thirteenth figure (Figure 13) shows an embodiment of the present invention. Description of the numerical symbols of the elements of the drawings: lens 50, 50 '; vacuum ultraviolet microlithography lithography system / processing private 51 Fluoride crystals 52, 52 '; Optical central axis 54; Lens perimeter 56; Crystals point 57, 58; Optical central axis 60; Curved optical surfaces 62, 64, 66; Flat optical surfaces 68; Ray path 72; Crystals Path 74; lens 76; fluoride crystal 78; lens surface 80; lens surface 80, 82; increasing concentration direction 84; crystal dislocation defect 86; lens hair embryo 100; fluoride crystal 102; central axis 104; Surface 106; hair embryo perimeter 108; crystal orientation 110; optical central axis 111; crystal orientation 112; surfaces 113, 114; orientation change 158. Detailed description: The present invention includes a fluoride crystal with minimal birefringence, a vaporized ultraviolet light lithography lens, which is composed of a fluoride crystal. As shown in Figures 丨, 2 and 3, the fluoride crystal vaporized ultraviolet light lithographic printing lens is used in the vaporized ultraviolet low light lithographic printing system / process 51, which preferentially uses the vaporized ultraviolet light wavelength <200 nm. Fluoride crystal lens elements are used in low-gloss lithographic printing systems, which include the optical elements that make up the lighting system, preferably a light source (preferably an excimer laser), and a projection system. Fluoride crystal light lithographic printing lens 50. Fluoride crystal 52. This paper size applies Chinese National Standard (CNS) A4 specification (210X297). -------.----- (Please read first (Notes on the back then fill out this page)
、1T f 518425 A7 五'發明説明（^) ，優先地鱗-晶體。如圖5卿，氟化物晶體光學透鏡训 f有光學中心軸54,其由氟化物晶體透鏡週邊56包圍著。 氟化物透鏡晶指向具有—些變化，其偏離光學中心轴 指向朝向週邊56。如圖5a所示，結晶指向57偏離光學中心 軸指向60以及擴張朝向週邊56。 與結晶指向變化作比較，圖4之透鏡50,由具有均勻的 結曰d曰向之氟化物晶體52’所構成，其在整個晶體中為平行 的以及朝向中心軸，氟化物晶體52,具有最小均勻濃度之最. 小錯位缺陷。^ 優先地透鏡50由氟化鈣晶體52所構成。優先地氟化鈣 晶體内部透射度>99%/cm。圖6顯示出氟化辑晶體具有氣化 鈣結晶指向57。結晶指向垂直於相對氟化鈣指向平面。 優先地氟化物晶體光石版印刷透鏡5〇具有第一彎曲光 學表面62以及第二彎曲光學表面64以操作光石版印刷光線 ，優先地光石版印刷光線^<20〇11111。在另外一個優先地氟 化物晶體光石版印刷透鏡5〇具有彎曲光學表面66以及平面 性光學表面68。 經濟部中央標準局員工消費合作社印製 優先地結晶指向58變化在2至15度範圍内，優先地在3 至12度，以及最優先地在5至1〇度。如圖5a所示，結晶指向 變化偏離光學中心軸54指向60以及朝向透鏡週邊56。優先 地結晶指向<9由中心軸漸增，使得θκβκβκθγ05<06< 0 7··· < 0 n。 優先地氟化物晶體光石版印刷透鏡5〇具有非平行光線 路徑72以及氟化物晶體52具有非平行晶體路徑74對準於透 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） 518425 A7 ---__ B7 五、發明説明（q) 鏡先線路奶、。結μ向晶聽簡解於光線路徑72, 透鏡50設計作為操作該路徑。優先地透鏡5〇以及晶 體路徑74伽來會聚或發散纟親觸成 。 /發日収進—步包錢化物晶敎學透賴，其由單 -氟化物晶體所構成。氟化物晶购具有第—光學透鏡表 面80以及分離而補之第二光學透鏡表面。氟化物晶體^ 具有漸增濃度84之晶體錯位缺_，其由第二光學透鏡表 面80漸增。如圖7-8所示，晶體錯位缺陷濃度為遞增濃度如 箭頭84所示，錯位缺陷86濃度優先地由第二表面似至第一 表面80地增加。在優先地實施财，第—光學透鏡表面為 背曲透鏡表面，第二光學透絲面為彎曲透絲面。在另 外-個實施例巾，第-光學透鏡表面解㈣光學表面。 在另外-個實施例中，第二光學透鏡表面為平坦的光學表 面。優先地透鏡76具有光學中心軸54對準於局部方向。 在優先實施财，單-氟化物㈣78為氟倾，額3nm内 部透射度>99%/cm。 經濟部中央標準局員工消費合作社印製 ---、---— (請先聞讀背面之注意事項再填寫本頁) 本發明更進一步包含氟化鈣晶體光學元件以操作透射 波長A<200nm。小於200nm波長光學元件76由氟化飼晶體 78所構成。氟化鈣晶體具有第一光學表面8〇以及第二光學 表面82以操作λ波長。氟化鈣晶體之錯位缺陷86濃度84由 第二光學表面至第一光學表面遞增。第一光學表面次構造 表面長度每單位面積在10至5〇cm/cm2範圍内。第二光學表 面次構造表面長度每單位面積<l〇cm/cm2。元件76具有較 大尺寸D。優先地D大於100mm，更優先地-150mm，更優先地 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 518425 Α7 Β7 五、發明説明（？） 經濟部中央標準局員工消費合作社印製 -250mm，更優先地-250mm，以及最優先地2300mm。優先 實施例中第一光學透鏡表面為彎曲透鏡表面。優先實施例 中第二光學透鏡表面為彎曲透鏡表面。優先實施例中λ中 央波長約為193nm以及氟化鈣晶體I93nm内部透射度>99%/cm 。在另外一個實施例中λ位於157nm以及氟化約晶體⑽卿 内部透射度>99%/cm。優先地光學元件76氟化鈣晶體之結 晶指向變化將由光學中心軸擴張以及偏離。優先地該變化 至少為二度以及更優先地為5度。 本發明更進一步包含氟化物晶體透鏡毛胚。氟化物晶 體透鏡毛胚100由氟化物晶體102所構成。氟化物晶體102 具有中心軸104通過較大尺寸D表面106。中心軸104以及表 面106由毛胚週邊1〇8包圍著。中心軸1〇4對準以及與結晶 指向110—致。氟化物晶體毛胚1〇〇在結晶指向112具有變 化158,其由中心軸1〇4擴張以及偏離以及朝向毛胚1〇8。優 先地氟化鈣透鏡毛胚1〇〇結晶指向11〇為氟化鈣指向。優先 地氟化鈣晶體102之193nm内部透射度>99Vcm。優先地氟 化鈣透鏡毛胚100之較大尺寸D為gl〇〇mm，更優先地-15〇 mm，更優先地-250mm，更優先地-250mm，以及最優先地2 300mm。優先地結晶指向112變化158在2至15度範圍内，更 優先地在3至12度範圍内，以及最優先地在5至1〇度範圍内。 氟化鈣晶體透鏡毛胚偏離中心軸104變化158至少為3度，優 先地—5度。如圖9a所示，形成為光學元件透鏡76, 50之毛 胚100(例如為毛胚内侧虛線所示）優先地具有相對於氟化 物晶體表面106之第二表面114,其晶體錯位缺陷86濃度由 (請先閱讀背面之注意事項再填寫本頁) 訂, 1T f 518425 A7 V'invention note (^), preferentially scale-crystal. As shown in Fig. 5, the fluoride crystal optical lens has an optical central axis 54 surrounded by a periphery 56 of the fluoride crystal lens. The fluoride lens has some changes in crystal orientation, which are offset from the optical center axis and directed toward the periphery 56. As shown in Fig. 5a, the crystal orientation 57 is offset from the optical center axis by 60 and expanded toward the periphery 56. In comparison with the change in crystal orientation, the lens 50 of FIG. 4 is composed of a fluoride crystal 52 ′ having a uniform junction d and d, which is parallel and oriented toward the central axis throughout the crystal. The fluoride crystal 52 has The smallest uniform concentration. The smallest dislocation defect. ^ The lens 50 is preferably composed of a calcium fluoride crystal 52. The internal transmittance of the calcium fluoride crystal is preferably 99% / cm. Figure 6 shows that the fluoride crystal has vaporized calcium crystal orientation 57. The crystal orientation is perpendicular to the relative calcium fluoride orientation plane. The fluoride crystal light lithographic lens 50 preferably has a first curved optical surface 62 and a second curved optical surface 64 to manipulate the light lithographic printing light, and preferably the light lithographic printing light ^ < 2001111. The fluoride crystal light lithographic lens 50 preferably has a curved optical surface 66 and a planar optical surface 68 in another priority. Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. Priority crystallization points to a change of 58 in the range of 2 to 15 degrees, preferably 3 to 12 degrees, and most preferably 5 to 10 degrees. As shown in Fig. 5a, the crystal orientation changes from the optical central axis 54 to 60 and to the lens periphery 56. Preferentially, the crystal orientation < 9 gradually increases from the central axis, so that θκβκβκθγ05 < 06 < 0 7 ·· < 0 n. Fluoride crystal light lithographic printing lens 50 has non-parallel light path 72 and fluoride crystal 52 has non-parallel crystal path 74. Aligned to the size of this paper. Applicable to China National Standard (CNS) A4 specification (210 × 297 mm) 518425 A7 ---__ B7 V. Description of the invention (q) Mirror first line milk. The μ-direction crystal is briefly explained by the light path 72, and the lens 50 is designed to operate this path. The lens 50 and the crystal path 74 are preferentially converged or divergent. / Receipt from the date of delivery-The chemistry of crystals is well understood, which consists of mono-fluoride crystals. The fluoride crystal purchase has a first optical lens surface 80 and a second optical lens surface separated and supplemented. The fluoride crystal has a crystal dislocation with an increasing concentration of 84, which is gradually increased by the second optical lens surface 80. As shown in Fig. 7-8, the concentration of the dislocation defect is an increasing concentration as shown by arrow 84, and the concentration of the dislocation defect 86 increases preferentially from the second surface to the first surface 80. In prior implementation, the first optical lens surface is the curved lens surface, and the second optical transmission surface is the curved transmission surface. In another embodiment, the first optical lens surface decomposes the optical surface. In another embodiment, the second optical lens surface is a flat optical surface. The lens 76 preferably has an optical central axis 54 aligned in a local direction. In the priority implementation, the mono-fluoride rhenium 78 is fluorine, and the internal transmittance at 3nm is greater than 99% / cm. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs ---, ----- (Please read the precautions on the back before filling out this page) The present invention further includes a calcium fluoride crystal optical element to operate the transmission wavelength A < 200nm . The optical element 76 having a wavelength of less than 200 nm is composed of a fluorinated feed crystal 78. The calcium fluoride crystal has a first optical surface 80 and a second optical surface 82 to operate at a lambda wavelength. The dislocation defect 86 concentration 84 of the calcium fluoride crystal increases from the second optical surface to the first optical surface. The first optical surface substructure has a surface length in the range of 10 to 50 cm / cm2 per unit area. The second optical surface substructure has a surface length < 10 cm / cm2 per unit area. Element 76 has a larger dimension D. Priority D is greater than 100mm, more preferentially -150mm, and more preferably this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 518425 Α7 B7 5. Description of the invention (?) Employees' Cooperatives, Central Bureau of Standards, Ministry of Economic Affairs Printed -250mm, more preferentially -250mm, and most preferentially 2300mm. In a preferred embodiment, the first optical lens surface is a curved lens surface. In the preferred embodiment, the surface of the second optical lens is a curved lens surface. In the preferred embodiment, the central wavelength of λ is about 193 nm and the internal transmittance of the calcium fluoride crystal at I93 nm is> 99% / cm. In another embodiment, λ is located at 157 nm and the internal transmittance of the crystal is about 99% / cm. Preferably, the crystal orientation change of the calcium fluoride crystal of the optical element 76 will be expanded and deviated from the optical central axis. The change is preferably at least two degrees and more preferably 5 degrees. The invention further includes a fluoride crystal lens hair embryo. The fluoride lens lens blank 100 is composed of a fluoride crystal 102. The fluoride crystal 102 has a central axis 104 through a larger-sized D surface 106. The central axis 104 and the surface 106 are surrounded by the periphery of the hair embryo 108. The central axis 104 is aligned and aligned with the crystal 110. The fluoride crystal hair embryo 100 has a change 158 in the crystal orientation 112, which expands and deviates from the central axis 104 and faces the hair embryo 108. The 100% crystal orientation of the calcium fluoride lens hair embryos is preferentially 110% of the calcium fluoride lens orientation. The 193 nm internal transmittance of the calcium fluoride crystal 102 is preferably 99 Vcm. The larger dimension D of the calcium fluoride lens blank 100 is preferably glOOmm, more preferably -15mm, more preferably -250mm, more preferably -250mm, and most preferably 2300mm. The crystal orientation 112 changes 158 preferentially in the range of 2 to 15 degrees, more preferably in the range of 3 to 12 degrees, and most preferably in the range of 5 to 10 degrees. Calcium fluoride lens lens embryos vary 158 from the central axis 104 by at least 3 degrees, preferably -5 degrees. As shown in FIG. 9a, the hair embryo 100 (shown as a dashed line inside the hair embryo) formed as an optical element lens 76, 50 preferentially has a second surface 114 with respect to the fluoride crystal surface 106, with a crystal dislocation defect 86 concentration. Order by (Please read the notes on the back before filling this page)
本紙張尺度適用中國國家標準（CNS ) A4規格（210Χ297公釐） (I 518425 A7 B7 1〇 經濟部中央標率局員工消費合作社印製 五、發明説明（（| ) 第二表面114至表面106遞增。優先地如圖l〇所示光學透鏡 毛胚100具有第二表面，其具有第二表面次結構邊界長度每 單位面積為SS以及表面積106具有較大尺寸表面次結構邊 界長度每單位面積為FS，其中FS>SS。優先地第二表面次結 構邊界長度每單位面積SS <10cm/cm2,以及更優先地FS在10 至50cm/cm2範圍内。圖11-12顯示出被酸蝕刻之氟化鈣光學 透鏡毛胚表面次結構邊界。這些顯微圖為利用〇. 1N硝酸進 行钱刻15分鐘後氟化|弓表面。圖12利用定量光學顯微鏡分 析以量測次結構邊界特性，其包含次結構邊界長度每單位面 積。在圖12中氟化鈣光學毛胚表面具有次結構邊界長度每 單位面積為15cm/cm2以及次結構平均尺寸直徑約為丨· 8_。 本發明更進一步包含雙折射性最小氟化物晶體光石版 印刷透鏡毛胚。光學元件毛胚由氟化鈣晶體所構成，其193 nm内部透射度>99%/cm。如圖13所示，氟化鈣毛胚1〇〇具有 一組多個非平行結晶指向。毛胚1〇〇具有光學中心軸1〇4， 其與局部氟化物晶體指向一致。毛胚在結晶指向具有變化 158,其中在已知位置處中心軸1〇4與非平行結晶指向間之 角度偏差0與已知位置與中心軸1 〇4間之相對距離產生相 關，在已知位置處中心軸104與週邊1〇8間具有相對距離。 如圖13, 9以及9a所示，毛胚100優先地具有錯位缺陷肋之第 一表面106以及第二表面114,該錯位缺陷由第二表面114至 第一表面106遞增。優先地，第一以及第二表面垂直於中心 軸，毛胚100形狀優先地為適當尺寸圓柱形碟狀物毛胚，該 毛胚為將形成以及成形光學元件之預製件。優先地毛胚1〇(? 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公董） (之 -------i----------訂------· (請先閲讀背面之注意事項再填寫本頁) 518425 A7 _______五、發明説明（10 ) 具有第一表面106以及第二表面Π3,其中第二表面114之第 一表面次結構邊界長度每單位面積（以SS表示）<1 〇cm/cm2 以及第一表面106之第二表面次結構邊界長度每單位面積( 以FS表示）^10cm/cm2。優先地第一表面次結構邊界長度 每單位面積在10至5〇cm/cm2範圍内。 本發明更進一步包含氟化物晶體光學元件毛胚。毛胚 優先地由單一氟化物晶體所構成，最優先地由氟化鈣晶體 所構成。光學元件毛胚1〇〇具有直徑為D，第一直徑平面表 面106,第二直徑平面表面114,第一及第二表面間之晶體厚 度TH。毛胚100具有晶體錯位缺陷洲之濃度料，其由第二表 面114至第一表面1〇6遞增，以及第二表面114具有第二表面 次結構邊界長度每單位面積為％以及第一表面1〇6具有第 一表面次結構邊界長度每單位面積為⑺，其中FS>SS。優先 地SS小於lOcm/cm2。優先地FS在10至50cm/cm2範圍内。 熟知此技術者能夠對本發明作出各種變化及改變，但 是其並不會脫離本發明之精神與範圍。因而，下列申請專 利範圍將含蓋本發明各種變化及改變。 經濟部中央標隼局員工消費合作社印製This paper size is in accordance with Chinese National Standard (CNS) A4 (210 × 297 mm) (I 518425 A7 B7 10) Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention ((|) Second surface 114 to surface 106 Incrementally, as shown in FIG. 10, the optical lens blank 100 has a second surface having a second surface substructure boundary length per unit area SS and a surface area 106 having a larger size surface substructure boundary length per unit area is FS, where FS > SS. Preferentially the length of the second surface substructure boundary length per unit area SS < 10cm / cm2, and more preferably FS in the range of 10 to 50cm / cm2. Figure 11-12 shows the acid etched Calcium fluoride optical lens surface substructure boundary. These micrographs are fluorinated | bow surface after 15 minutes of engraving with 0.1N nitric acid. Figure 12 uses quantitative optical microscope analysis to measure the characteristics of the substructure boundary. Including the substructure boundary length per unit area. In Figure 12, the surface of the calcium fluoride optical hair embryo has a substructure boundary length per unit area of 15cm / cm2 and the average diameter of the substructure is about 丨 · 8_. The present invention further includes a birefringence minimum fluoride crystal light lithographic printing lens hair embryo. The optical element hair embryo is composed of a calcium fluoride crystal, and its internal transmission at 193 nm > 99% / cm. As shown in FIG. 13, The calcium fluoride hair embryo 100 has a set of multiple non-parallel crystal orientations. The hair embryo 100 has an optical central axis 104 which is consistent with the local fluoride crystal orientation. The hair embryo has a change in crystal orientation 158, of which The angular deviation between the central axis 104 and the non-parallel crystal orientation at a known position is related to the relative distance between the known position and the central axis 104. At the known position, the central axis 104 and the surrounding 108 are related. There is a relative distance between them. As shown in FIGS. 13, 9 and 9a, the hair embryo 100 preferentially has a first surface 106 and a second surface 114 of dislocation defect ribs, the dislocation defects increasing from the second surface 114 to the first surface 106. Preferentially, the first and second surfaces are perpendicular to the central axis, and the shape of the blank 100 is preferentially a cylindrical dish blank of an appropriate size, which is a preform that will form and shape the optical element. Preferred blank 1 〇 (? This paper is applicable National Standard (CNS) A4 Specification (210X297 Public Director) (of ------- i ---------- order ------ · (Please read the notes on the back before filling (This page) 518425 A7 _______ V. Description of the invention (10) It has a first surface 106 and a second surface Π3, wherein the first surface of the second surface 114 has a substructure boundary length per unit area (indicated by SS) < 1 〇 cm / cm2 and the second surface substructure boundary length of the first surface 106 per unit area (expressed as FS) ^ 10cm / cm2. The first surface substructure boundary length is preferably in the range of 10 to 50 cm / cm2 per unit area. The invention further includes a hair crystal of a fluoride crystal optical element. The hair embryo is preferably composed of a single fluoride crystal and most preferably a calcium fluoride crystal. The optical element blank 100 has a diameter D, a first diameter plane surface 106, a second diameter plane surface 114, and a crystal thickness TH between the first and second surfaces. The hair embryo 100 has a concentration material of crystal dislocation defect continuum, which increases from the second surface 114 to the first surface 106, and the second surface 114 has the second surface substructure boundary length per unit area and the first surface 1 〇6 has a first surface substructure boundary length per unit area, where FS > SS. Preferably, SS is less than 10 cm / cm2. Preferably, the FS is in the range of 10 to 50 cm / cm2. Those skilled in the art can make various changes and modifications to the present invention, but it will not depart from the spirit and scope of the present invention. Therefore, the scope of the following patent applications will cover various changes and modifications of the present invention. Printed by the Staff Consumer Cooperative of the Central Bureau of Standards, Ministry of Economic Affairs
--：---- (請先閲讀背面之注意事項再填寫本頁} 訂 #1. (i-: ---- (Please read the notes on the back before filling this page} Order # 1. (I