TW495835B - Peripheral exposure device - Google Patents

Abstract

The subject of the present invention is to improve the efficiency of a peripheral exposure device. Light source units 14A and 14B are movable in ±X direction in the diagram along a support member 12. While a beam is emitted from the light source units 14A and 14B, the support member 12 is traveled in ±Y direction in the diagram, so that a photoresist in the periphery of a glass board G is exposed. A distance between the light source units 14A and 14B is controlled to be a specified value or more. Masks 16A and 16B are driven in the ±X direction in the diagram, and when there is a part in an area subject to the peripheral exposure that requires no irradiation, the masks 16A and 16B cover the glass board G partly to shield the light.

Description

495835 五、發明說明（1) "" --- 本發明係有關一種周邊曝光裝置，特別是一種合適的 周邊曝光裝置，可適用於製作LCD (液晶顯示裝置）、pDp (電漿顯示面板）專用破璃板的過程中，以將光線照射在 欲曝光之電路圖樣區域以外的基板周邊所塗上的 '光阻^ — 上 ° 一〜 習知技術： 在製造液 (lithograph) 系統的投影曝 統投影至基板 述過程設定出 的區域，亦即 非圖樣區照射 餘劑而定。亦 殘留在基板上 塗佈光阻劑時 厚。一般來說 留下來的光阻 易剝落。其正 片（顆粒）的 导作為曝光對 外，即使沒有 處理時，若在 板時的其中 序中，會使 遮罩所形成 齊塗佈面上 的部分，亦 °在平版印 動作視在基 &飿劑上未 ’使用旋覆 # &的膜厚 邊部值為非 種性質，亦 #時會在後 山丄 w去。此種 的生產效裘 ^發生，在 # &殘留光 晶顯示面 ，在此程 光裝置。 上的光阻 曝光圖樣 非圖樣區 光線。此 即5正片 。特別是 ’在周邊 ’基板周 劑具有一 片抗敍劑 形式飛散 象之基板 剝落的情 基板周邊 一個程序的平版印刷 周到内部裝有投影光學 的圖樣被該投影光學系 。在該基板上，藉由上 即圖樣區，和未被曝光 刷程序中，必須在上述 板上所塗佈的正片型抗 曝光的部分會在顯像後 法（spincoat)在基板上 度會比基板中央部位還 圖樣區，未被除去而舜 即，膜厚度越厚，越容 製作過程中剝落，以碎 顆粒係使液晶顯示面 低落的主要原因。此^ 基板上實施cvc等的後 阻劑，在圖樣區所形成 五、發明說明（2) 的薄膜厚度也會不均勻 因 ， jh 一 6η. λα 線以使之感；且：後圖j區的光阻劑照射光 劑。已經有各式各樣像這樣-=2需要的抗# 描以將光線照射在基板非圖出:聚集光線來掃 本說明書中將光線照射乂板二=二1被提出來。以下將 邊曝光裝置」。 h 土板上弈圖樣區的裝置稱為「周 隨著在基板上所形成 置上開始使用較短的读 圖樣的精細化5在投影曝光裝 的感光波長頻帶亦：i Ur塗佈於基板上的光阻劑 裝置π中用於周邊曝光 了提供生彦；劑ΐ對應的周邊曝光袭置光源，為 理由是，當給予和度的燈，超高塵水銀燈等。 光源，只要很短的曝光日;；：：劑：0寺’若使用光量大的 之聚光光線掃描時的速声':。即’可提高光源射出-射在非圖樣區i逮度，错此，可在短時間内將光線照 欲A = 5 :: 2 ί :周知為了要將聚光光線照射在基板上 右人曝先的邰位，須使用光纖於光 出。在使用光纖的周邊瞧朵狀署卜扣^致先攸先源射 事先固定，由此光源；伸=^纖；= 水銀燈等光源 基板上曝光出想要感先—，然後可在495835 V. Description of the invention (1) " " --- The present invention relates to a peripheral exposure device, especially a suitable peripheral exposure device, which can be applied to the production of LCD (liquid crystal display device), pDp (plasma display panel) ） In the process of special glass breaking plate, the photoresist ^ coated on the periphery of the substrate outside the circuit pattern area to be exposed is exposed to light. 上 ～ Known technology: Projection in the lithograph system The exposure is projected to the area set in the process of the substrate, that is, the non-pattern area is irradiated with the remaining agent. It also remains thick on the substrate when the photoresist is applied. Generally, the remaining photoresist is easy to peel off. The guide of the positive film (grain) is exposed to the outside. Even if it is not processed, if it is in the order of the plate, the part of the coated surface formed by the mask will be seen in the lithographic action. On the tincture, the film thickness of the spin-coated # & This kind of production effect occurs at # & residual light crystal display surface, and in this process the light device. Photoresist on top Exposure pattern Non-pattern area Light. This is 5 positives. In particular, the "peripheral" substrate agent has a piece of anti-scattering agent in the form of an image. The substrate is peeled off. The periphery of the substrate is a program of lithography. The pattern of projection optics is thoughtfully contained by the projection optics. On this substrate, with the pattern area above and in the unexposed brushing procedure, the positive-type anti-exposure portion that must be coated on the above-mentioned plate will be more than the degree of spin coating on the substrate. The central part of the substrate also has a pattern area. That is, the thicker the film thickness, the more it peels off during the production process, and the main reason for the liquid crystal display surface to fall due to the broken particle system. This ^ substrate is implemented with a post-resistor such as cvc, which is formed in the pattern area. 5. The thickness of the film of the invention description (2) will also be non-uniform due to the jh 6η. Λα line to make it feel; Photoresist irradiates the photoresist. There are already various kinds of anti- # traces like-= 2 needed to illuminate the light on the substrate: the light is collected to sweep. In this description, the light is irradiated on the plate 2 = 2 1 is proposed. The following is the side exposure device. " h The device of the game pattern area on the soil plate is called "Zhou began to use a short reading pattern to refine the formation on the substrate. 5 The photosensitive wavelength band of the projection exposure device is also: i Ur coated on the substrate The photoresist device π is used for peripheral exposure to provide Shengyan; the corresponding peripheral exposure of the agent is to attack the light source, for the reason, when giving a mild lamp, ultra-high dust mercury lamp, etc. The light source requires only a short exposure Day ;; :: Agent: 0 Temple 'If you use a large amount of concentrated light to scan the speed of sound' :. That is, 'can improve the light source emission-shot in the non-pattern area, the wrong, in a short time Inside the light shines A = 5 :: 2 ί: It is well-known that in order to illuminate the spotlight on the substrate, the right side is exposed to the front, you must use an optical fiber to light out. Look at the flower-shaped bureau buckle on the periphery of the optical fiber ^ 致 先 You first source radiation is fixed in advance, so the light source; extension = ^ fiber; = mercury lamp and other light source substrates are exposed first, and then you can

495835 I五、發明說明（3) I 發明欲解決之 然而，在 時，出現了以 需要在基板的 I因為使用光纖 \而產生的消耗 |為该消耗的主 |短，在光纖上 丨，是南效率·，必 g * |成的光纖。此 |有增加光纖劣 |而言，有可能 (solarizatio 此外，在 板周圍的矩形 「田」等形狀 等’帶有複雜 一個使周邊曝 再者，將 的記號或基板 會流失掉重要 使光線的照射 位暫時中斷， 動作。在使光 課題： 要求提高上述周邊曝光裝置之生產效率的同 下所說明之問題。換言之，為了提高效座， 感光面上儘可能導入更多的光，且不能忽略 所造成的消耗。若是由於光纖充填率的關係 ’則光在光域中行進k所發生的衰減現象^ 要原因。特別是，隨著使用光線的波長變 的吸收增加，消耗也跟著增加。因此，為了 需增加光源的光量，使高價的石英玻璃所製 外，在反覆移動光纖先端部的過程中，也會 化而導致光量傳送消耗的情形。就光纖劣化 是光纖受到折損或產生逆轉現象 η)等等。 ' 基板上形成的周邊曝光圖樣，不僅有圍繞基 圖樣，還有如曰文漢字中r曰」、「目」、 的圖樣，或是組合以上形狀所形成的圖樣 化的傾向。此種形成複雜圖樣的必要性亦是 光裝置效矣低下的原因。 進行周邊曝光的部位中有些地方會留下對齊 識另;1編號斗。有關此部份，在最後曝光時， 的資料因此，在周邊曝光的程序中，為了 在這些將被曝光的對齊記號和識別編號等部 =須控制掃描程序中光射出部停止及開始的 了出邛彳T止動作的時候，由於加速和減速需 I 4 495835 五、發明說明（4) 要一些時間，所以會有使周邊曝光裝置效率低下的情況。 本發明的目的在提高周邊曝光裝置的效率。 解決課題之手段： 本發明係一種周邊 集光光學系統的照明單 樣區和不曝光圖樣的非 上述照明罝元所射出的 在移動中支持複數個照 光基板和支持單元沿第 移動；第二驅動部，其 部位並驅使各個照明單 (圖1中沿X軸的方向） 驅動部，使複數個照明 上述目的。 驅動控制郭將複數 既定的距離範圍以上。 驅動控制部可在使 中其中一部份照明單元 樣區時，使其餘的照明 照明單（如圖1的14A ) 本發明亦為一種周 及集光光學系統的照明 圖樣區和不曝光圖樣的 曝、光裝置，具有複數個含有光源及 元，其感光基板上有曝光圖樣的圖 圖樣區，該感光基板的非圖樣區以 光來曝光，包括：支持單元，其可 明單元；第一驅動部，其可驅使感 一方向（圖1中沿Y軸的方向）相對 可定位各個照明單元在約略中央的 元沿不同於第一方向的第二方向 移動；及驅動控制部，其控制第二 單元不致互相干涉。藉此，來達成 個相鄰照明單元之間的距離控制在 用複數個照明單元（如圖1的1 4 A ) 所射出的光來曝光感光基板的非圖 單元（如圖1的14B)不會和上述的 元產生干涉的情況。495835 I V. Description of the invention (3) I want to solve the invention However, at that time, there was a need for I on the substrate because of the use of the fiber \ because it is the main consumption | short, on the fiber, is South efficiency, will be g * | into the fiber. In this case, it is possible to increase the quality of the optical fiber. In addition, it is possible (solarizatio) In addition, the shape of the rectangular "field" around the board is complicated. The irradiation position is temporarily interrupted and operated. In the light problem: the problems described below are required to improve the production efficiency of the peripheral exposure device described above. In other words, in order to improve the effect seat, as much light as possible is introduced on the photosensitive surface, and it cannot be ignored. Consumption caused. If it is due to the relationship between the filling rate of the optical fiber, then the attenuation phenomenon of light traveling in the optical domain k is the main reason. In particular, as the absorption of the wavelength of the light used increases, the consumption also increases. Therefore In order to increase the amount of light from the light source, the high-priced quartz glass will be used to repeatedly move the tip of the optical fiber, which will also cause the transmission of the amount of light. In terms of optical fiber degradation, the optical fiber is damaged or reversed. Η )and many more. The peripheral exposure patterns formed on the substrate are not only around the base pattern, but also patterns such as "r", "mesh," in Chinese characters, or patterns formed by combining the above shapes. The necessity for such a complicated pattern is also the cause of the inefficiency of the optical device. Some parts of the area where the peripheral exposure is performed will be left with alignment; another number bucket. The data about this part at the time of the final exposure. Therefore, in the process of peripheral exposure, in order to align the marks and identification numbers that will be exposed, etc., it is necessary to control the stop and start of the light emitting part in the scanning process.邛 彳 T stop motion, because acceleration and deceleration require I 4 495835 V. Description of the invention (4) It takes some time, so the peripheral exposure device may be inefficient. An object of the present invention is to improve the efficiency of a peripheral exposure device. Means for solving the problem: The present invention is a single illumination area of a peripheral light-collecting optical system and a non-exposure pattern of a non-exposed illumination unit, which supports a plurality of illumination substrates and a support unit to move along a first movement; a second drive The driving unit drives the lighting unit (the direction along the X axis in FIG. 1), and drives a plurality of lighting units for the above purpose. Drive control Guo will be more than a predetermined distance range. The drive control unit can make the remaining lighting units (such as 14A in FIG. 1) when making part of the lighting unit sample area. The present invention is also an illumination pattern area and non-exposure pattern of the surrounding and collecting optical system. The exposure and light device has a plurality of pattern areas containing light sources and elements, and a photosensitive substrate has an exposure pattern area on the photosensitive substrate. The non-pattern area of the photosensitive substrate is exposed by light, and includes: a support unit, which can illuminate the unit; a first drive A driving unit, which can drive a sense direction (direction along the Y axis in FIG. 1) relative to each of the lighting units that can be positioned at a substantially central element in a second direction different from the first direction; and a drive control unit, which controls the second The units do not interfere with each other. In this way, the distance between adjacent lighting units is controlled. Non-photographed units (such as 14B in FIG. 1) that expose light from a plurality of lighting units (such as 1 4 A in FIG. 1) on a photosensitive substrate are not used. Will interfere with the above elements.

邊曝光裝置，具有複數個含有光源 單元，其感光基板上有曝光圖樣的 非圖樣區，該感光基板的非圖樣區 2177-3574-P.ptd 第7頁 495835 五、發明說明（5) -- 以上述照明單元所射出的光來曝光，包括：光量檢測裝 置，其可檢測發射自上述各個照明單元的光強度；及移動 速度測定裝置，其在上述各個照明單元和感光基板相對移 動以曝光感光基板上之非圖樣區時5根據以上述光量檢劍 裝置所檢測之照明單元中最低的光強度來設定各個照明罝 元知感光基板的相對移動速彦。 本發明又是一種周邊曝光裝置，具有複數個含有光源 及集光光學系統的照明單元，其感光基板上有曝光圖樣/的 圖樣區和不曝光圖樣的非圖樣區，該感光基板的非=πThe side exposure device has a plurality of non-pattern areas containing a light source unit, and a photosensitive substrate has a non-pattern area of an exposure pattern. The non-pattern area of the photosensitive substrate 2177-3574-P.ptd page 7 495835 V. Description of the invention (5)- The exposure by the light emitted by the lighting unit includes: a light amount detecting device that can detect the intensity of light emitted from each of the lighting units; and a movement speed measuring device that relatively moves the lighting unit and the photosensitive substrate to expose the light. When the non-pattern area on the substrate 5 is set, the relative movement speed of each light-sensitive substrate is set according to the lowest light intensity among the lighting units detected by the light quantity detecting device described above. The invention is also a peripheral exposure device, which has a plurality of illumination units containing a light source and a light collecting optical system. The photosensitive substrate has an exposure pattern / pattern area and a non-exposure pattern non-pattern area.

以上述照明單元所射出的光來曝光，包括：光束大小ς: 裝置，其可各自獨立變更上述複數個照明裝置所射出^ = 束大小。 進一 面約略垂 明單元之 的改變可 進一 面垂直相 上述複數 轉驅動部 此外 有光源及 圖樣的圖 圖樣區以 步具有旋 直相交的 間的距離 和上述旋 步具有旋 交的旋轉 個照明裝 旋轉驅動 ，本發明 集光光學 樣區和不 上述照明 轉驅動部， 旋轉軸旋轉: 隨著感光基 轉驅動部旋 轉驅動部， 轴旋轉感光 置所射出之 感光基板同 又為一種周 系統的照明 曝光圖樣的 單元之光射 其可繞著和 感光基板， 板上非圖樣 轉驅動感光 其可繞著和 基板，而且 光束大小的 時進行。 邊曝光裝置 單元，其感 非圖樣區’ 出部所射出 感光基板之感3 而且，複數個用 區的排列而進辛 基板同時進行。 感光基板之感# ’各自獨立變】 動作可和上述:¾ ’具有複數個^ 先基板上有曝5 邊感光基板的与 的光來曝光，^Exposure to the light emitted by the above-mentioned lighting unit includes: a beam size ς: device, which can independently change the beam size emitted by the plurality of lighting devices ^ = beam size. On the other hand, it is almost clear that the change of the unit can be perpendicular to the above. The above-mentioned plural rotation driving unit has a light source and a pattern. The pattern area has a distance between the rotation and straight intersects and a rotation lighting device with the rotations. Rotary drive, the light collection optical sample area of the present invention and the above-mentioned illumination rotation drive unit, the rotation axis rotates: As the photosensitive base rotation drive unit rotates the drive unit, the photosensitive substrate emitted by the axis rotation photosensitive unit is also a kind of peripheral system illumination. The light of the unit that exposes the pattern can be rotated around the photosensitive substrate, and the non-pattern rotation drive on the board can be photosensitive and it can be rotated around the photosensitive substrate, and the beam size is performed. In the side exposure device unit, the sense of the photosensitive substrate emitted from the non-patterned area '3 is sensed by the photosensitive substrate. Moreover, the arrangement of a plurality of use areas is performed simultaneously on the substrate. Photosensitive substrate of the feeling # ’each independently change] The action can be the same as the above: ¾’ has a plurality of ^ First, the substrate is exposed to light with and exposed to 5 sides of the photosensitive substrate, ^

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五、發明說明 括：遮光裝置，設置於複數個照明單元和感光基板間相對 移動的路徑附近，其用來防止光射出部所射出的光照射在 感光基板上不想被照射到的部位。 | 在此情況下，上述遮光裝置被設置成可和感光基板相V. Description of the invention Including: a light-shielding device is provided near a path of relative movement between a plurality of lighting units and a photosensitive substrate, and is used to prevent the light emitted by the light emitting portion from irradiating a portion of the photosensitive substrate that is not to be irradiated. | In this case, the above-mentioned light shielding device is arranged to be compatible with the photosensitive substrate

!對移動，並可針對需要來設定照明單元和感光基板之間的 |相對位置。 1 最佳實施型態之詳細敘述： 圖1為平面圖，說明本發明實施型態之周邊曝光裝置 的概略結構。又，圖2為剖靣圖，顯示由圖1所示方向π所| 看到的樣子。在圖1中，取紙面上的左右方向為X軸，上下0 方向為Υ軸，和紙面直交的方向為Ζ轴，在以下說明中，稱| 呼沿著這些方向的座標軸為X方向方向、Ζ方向。此 | 外’根據需要稱呼座標值增加的方向為正X方向、正γ方向j 和正Z方向。在其他的圖中和圖1 一致，亦以相同的方式來! For movement, the relative position between the lighting unit and the photosensitive substrate can be set as needed. 1 Detailed description of the best implementation mode: Fig. 1 is a plan view illustrating a schematic configuration of a peripheral exposure apparatus according to an embodiment of the present invention. FIG. 2 is a cross-sectional view showing what is seen from the direction π shown in FIG. 1. In Figure 1, the left-right direction on the paper surface is the X axis, the up and down 0 direction is the Υ axis, and the direction orthogonal to the paper surface is the Z axis. In the following description, the coordinate axes along these directions are referred to as the X direction, Z direction. In addition, the directions of increasing coordinate values are called positive X direction, positive γ direction j, and positive Z direction. In other figures, it is the same as that in Figure 1, and it is the same way.

表示座標軸。 I -主要掃描方向驅動機構- iRepresents the coordinate axis. I-Main scanning direction driving mechanism-i

在底盤2上面的四個角落上固定有四根支柱6A、、 I 6C及6D。導執8A沿著Y方向裝置固定於支柱6A及6C的上 I 端’導軌8B沿著Y方向裝置固定於支柱6B及61)的上端。 | 支持兀件12沿著Y方向裝置固定於導執8A及8B之間。 在導軌8A及8B的内部，沿著γ方向内建有各自由主要掃描I·. 馬達30A、30B (未顯示於圖}中，請參閱圖7 )旋轉驅動龄1 螺旋傳送機構（未圖示）。藉由正轉、逆轉主要掃描馬達丨·Four pillars 6A, I 6C and 6D are fixed to the four corners above the chassis 2. The guide 8A is fixed to the upper ends of the pillars 6A and 6C along the Y direction. The guide rail 8B is fixed to the upper ends of the pillars 6B and 61) along the Y direction. The support element 12 is fixed between the guides 8A and 8B along the Y direction. Inside the guide rails 8A and 8B, along the γ direction, there are built-in main scanning motors 30A, 30B (not shown in the figure), please refer to FIG. 7. ). By forward and reverse the main scanning motor 丨 ·

2177-3574-P.ptd 第9頁2177-3574-P.ptd Page 9

495835 五、發明說明（7) 30A及30B，可使支持元件12沿著± γ方向（在以下的誤明 中，圖1的± Y方向稱為「主要掃插方向」）移動。 -次要掃描方向驅動機構- 兩光源單元14A及14B受到支持元件12的支持而可在土 X方向移動。又，在支持元件12的内部，沿著χ方向内建有 各自由次要掃描馬達32Α、32Β (未顯示於圖i中請參閱〜 圖7 )旋轉驅動的兩個螺旋傳送機構（未圖示）。藉由分 別獨立正轉 '逆轉這些次要掃描馬達32A &32b，可^/^ 源單元14A及14B，使之各自獨立沿著± χ方向（在以下的。 說明中，圖1的± X方向稱為「次要掃描方向」）移動。 -遮光單元- 在支柱6A及6C的侧面和支柱6B及6D的側面分別有樑 9^ : 9B沿著Y方向裝置固定於其上。在樑9A上固定有遮a光 單元11A ’在樑9B上固定有遮光單元。 以下將說明有關遮光單元1 1 A的構造。遮光單元11 a具 有基部10A/移動元件13A、遮罩16A。移動元件UA可藉/由 未圖不的氣壓式作動器相對於基部1 Ο A沿± X方向移動。藉 由上述構造’氣壓式作動器沿次要掃描方向驅動遮罩 16A，可從光源單元14a、i4g射出之光束導引至曝光對象 物的狀態切換至遮罩的狀態。遮光單元UB具有和遮光單 7G11 A相同的構造。氣壓式作動器沿次要掃描方向驅動遮 罩16B，可從光源單元14A、14B射出之光束導引至曝光對 象物的狀態切換至遮罩的狀態。 以下說明上述遮光單元分別固定於樑9 A、9 b上的情495835 V. Description of the invention (7) 30A and 30B can move the supporting element 12 in the ± γ direction (in the following misunderstanding, the ± Y direction in Fig. 1 is called the "main scanning direction"). -Second scanning direction driving mechanism- The two light source units 14A and 14B are supported by the support element 12 and are movable in the X direction. In addition, inside the support element 12, two screw conveying mechanisms (not shown) that are each driven by the secondary scanning motors 32A and 32B (not shown in Fig. I, see ~ Fig. 7) are rotationally built in the χ direction. ). By independently reversing these secondary scanning motors 32A & 32b independently, the source units 14A and 14B can be made independent in the ± χ direction (in the following. In the description, ± X in FIG. 1 The direction is called the "secondary scanning direction"). -Light-shielding unit- There are beams 9 ^ on the sides of the pillars 6A and 6C and the sides of the pillars 6B and 6D, respectively: 9B is fixed to it along the Y direction. A light shielding unit 11A 'is fixed to the beam 9A, and a light shielding unit is fixed to the beam 9B. The structure of the light shielding unit 1 1 A will be described below. The light shielding unit 11a includes a base 10A / moving element 13A and a cover 16A. The moving element UA can be moved by a pneumatic actuator (not shown) in the ± X direction relative to the base 10 A. With the above-mentioned structure, the pneumatic actuator drives the mask 16A in the secondary scanning direction, and the state where the light beams emitted from the light source units 14a and i4g are guided to the exposure target can be switched to the mask state. The light shielding unit UB has the same structure as the light shielding unit 7G11 A. The pneumatic actuator drives the mask 16B in the secondary scanning direction, and can switch the state where the light beams emitted from the light source units 14A and 14B to the exposed object are switched to the mask state. The case where the above-mentioned light shielding units are respectively fixed to the beams 9 A and 9 b will be described below.

第10頁 495835Page 10 495835

况。該遮先早兀所設置的位w 祈这锊的择、、兄 7 /立丄一及數目不僅限於本實施型態 所王現的情況，可任意決定。卜 11 A . 1 1 R X ^ ^ m ^ 夕1 ，此稷數個遮光單元 11A、11B不僅僅固定在樑971 ' 9β ^ 動。遮光置元m、11Β可移動，藓：::：沿著樑9-4二9，移 配方遮罩基板G上周邊曝光區域中广广的設置’ ~裉據 X甲的任何部位。 此外，遮光單元m、UB的移 14A、i4B的移動速度要快5藉此；5源：： 數個部位進行遮罩。以下胲今 b源早兀亦'^在和〜 周邊曝先日寸，令遮光單元U4、] 田、 从 ^ ^ t “β在取初欲遮罩的部位待 機，當遮光單元11Α、11Β通過光泝罝-他也 、尤源早兀14A、14B後，使遮 ，1一6:、16B退開，再使遮光單元⑴、11β移動，超過光源 早元A、14B。然後，使之停在欲遮罩的部位，使用遮罩 1+6A」6Β覆蓋曝光區PA上下一個欲遮罩的部位。在待機 日^ ’母一個光源早元亦可在複數個部位進行遮罩。此外， 當光源早元1 4A、1 4Β到達遮光單元11 a、11 Β時，遮光單元 1 1 A、11 B開始以等速使光源單元1 4 A、1 4 B移動，然後遮光 單元11A、1ΐβ在既定位置停止動作，藉此，可進行比遮罩 16Α、16β的遮光寬度區域更廣的遮罩。此外，以下將說明 以氣壓式作動器驅動遮罩1 6 A、1 6 Β的範例，亦可使甩可控 制位置的馬達等。 -光量感測器- 光量感測器48係一種用來測量光源單元14A、14B所射 出光束之光量的感測器。藉由此種光量感測器48，在進行 周邊曝光程序之前，可依次測量光源單元丨4 A、1 4B所射出 麵condition. The number of bits set by the cover early is to pray about this choice, the number of brothers 7 and the number of members, and the number is not limited to the situation of the present embodiment, and can be arbitrarily determined. Bu 11 A. 1 1 R X ^ ^ m ^ Xi 1, the plurality of shading units 11A, 11B are not only fixed to the beam 971 '9β ^. The light-shielding units m and 11B can be moved, and the moss :::: is moved along the beam 9-4 to 9 in a wide setting in the peripheral exposure area on the formula mask substrate G '~ according to any part of X Jia. In addition, the movement speeds of the shading units m and UB 14A and i4B should be faster than that of 5; 5 sources: masking at several locations. In the following, the source of this early morning is also exposed to the surrounding area, so that the shading unit U4,] Tian, and ^ ^ t "β stands by at the place where the mask is to be initially masked. Retrospective-He also, after Yu Yuanzao 14A, 14B, make the cover, 1-6 :, 16B back, and then move the shading unit ⑴, 11β, exceeding the light source early element A, 14B. Then, stop it For the part to be masked, use mask 1 + 6A ″ 6B to cover the next part to be masked in the exposure area PA. On the standby day ^ ', one light source can be used for masking at multiple locations. In addition, when the light source early elements 1 4A, 1 4B reach the light shielding units 11 a, 11 B, the light shielding units 1 1 A, 11 B start to move the light source units 1 4 A, 1 4 B at a constant speed, and then the light shielding units 11A, 11 1ΐβ stops the operation at a predetermined position, thereby making it possible to perform a wider mask than the masking width regions of the masks 16A and 16β. In addition, an example in which the masks 16 A and 16 B are driven by a pneumatic actuator will be described below, and a motor with a controllable position may be thrown. -Light amount sensor-The light amount sensor 48 is a sensor for measuring the light amount of the light beams emitted from the light source units 14A, 14B. With such a light amount sensor 48, before the peripheral exposure process is performed, the emission surfaces of the light source units 4A and 1 4B can be sequentially measured.

第11頁 2177-3574-P.ptd 五、發明說明（9) 二束的光嚴。此外，在光源單元1 4 A、1 4 B的弁蠄、隹〜 射的：可Ϊ置丰透鏡之類的裝置來監控在此半透鏡：ΪΪ 14Α、ΗΒ ί Ζ 說明使罔光量感測器48來侧量光源罝元 i4B所射岀光束之光量的理由。 ；^ 一平板支持器- 支_ t ί2所不1載置作為曝光對象物之玻璃基板e的平柘 ▽為猎由固定於底盤2之平板支持器支持部5而受到支a 個而繞著Z軸而轉動。在平板支持器4的上面設有複數 此=(4a °此複數個突起4a的高度幾乎相同。此外5在這 ^突起4a的上面，透過未顯示於圖中的管道開了和負壓源 =連，的孔，將作為曝光對象物的玻璃基板G放置在平板 支持器4上後，再吸附' 固定住。在圖4中顯示的範例為設 =8個》突起4a，在設置時，隨著基板g的新舊程度、大小及 尽度寻而決定出；不至於使基板G彎曲導致不良影響的數目 及位置。 -光源單元一 « 圖3概略說明了光源單元1 4A ' 1 4B的内部構造，顯示 的斷面包含了光源單元14A、14B沿著平行Z軸方向延伸的 光軸。此外，光源單元1 4A、1 4B具有相同的構造，所以在 圖3中，有關光源單元1 4B的構成元件附上括弧，僅說明有 關光源單元1 4 A的構造。 在光源單元1 4 A的内部，超高壓水鈒燈4 Ο A被固定於反 射鏡62A的内部。在反射鏡62A的下方固定有中間透鏡66A 和投影透鏡6 5 A，從超高壓水銀燈4 Ο A射出的光束被反射鏡Page 11 2177-3574-P.ptd V. Description of the invention (9) Two beams of light. In addition, in the light source units 1 4 A, 1 4 B, 弁 蠄 and 隹 are irradiated: a device such as a lenticular lens can be installed to monitor the half lens: Α 14Α, ίΒ ί 说明 Describes the amount of light sensor The reason for measuring the amount of light emitted by the chirped light beam i4B from the light source unit i4B. ; ^ A flat support-support _ t 2 flats on which the glass substrate e, which is the object of exposure, is placed ▽ ▽ is supported by a flat support holding part 5 fixed to the chassis 2 and surrounded by a The Z axis rotates. A plurality of this is provided on the plate holder 4 = (4a ° The height of the plurality of protrusions 4a is almost the same. In addition, 5 is on the ^ protrusion 4a, opened through a pipe not shown in the figure and a negative pressure source = The glass substrate G, which is the object of exposure, is placed on the plate holder 4 and then adsorbed and fixed. The example shown in Fig. 4 is set = 8 "protrusions 4a. The number and position of the substrate G will be determined based on the new and old degree, size, and extent of the substrate g. The number and position of the substrate G will not be adversely affected. -Light source unit «Fig. 3 schematically illustrates the interior of the light source unit 1 4A '1 4B Structure, the section shown includes the optical axis of the light source units 14A, 14B extending along the parallel Z-axis direction. In addition, the light source units 14A, 14B have the same structure, so in FIG. 3, the light source units 14B The constituent elements are enclosed with brackets, and only the structure of the light source unit 1 4 A is explained. Inside the light source unit 1 4 A, the ultra-high pressure water lamp 40 A is fixed inside the reflector 62A. It is fixed below the reflector 62A There is an intermediate lens 66A and a projection lens 6 5 A. 4 Ο A pressure mercury lamp emitted light beam reflected by the mirror

2177-3574-P.ptd 第12頁 495835 五、發明說明（ίο) 62A收集後，通過中間透鏡66A '投影透鏡65A導入玻璃基 板G感光面亦即塗佈光阻劑的那一面： 藉由快門作動器，沿著XY平面被驅動之快門63A可將 超高壓水銀燈40A射出的光被導入中間透鏡66A之入射面的 狀態切換成遮罩狀態。一般來說，從燈開始亮到超高壓水 銀燈所發岀的光安定之前，需要數十分鐘的準備時間。因 此’在周邊曝光裝置開始作周後，若需要暫時停止來自超 南壓水銀燈燈40A的光線照射，熄滅超高壓水銀燈4〇a時務 必使用快門6 3 A遮光。 由遮窗作動器36A所驅動的遮窗64A不但將照射於玻璃 基板G上的光束調整成矩形3還具有調節次要掃描方向光 束振幅（大小）的功能。遮窗64A被配置在投影透鏡65A的 射出面和玻璃基板G上光阻劑塗佈面之間，儘可能接近光 阻劑塗佈面。關於投影透鏡65A，遮窗64A亦可配置於和°光 阻劑塗佈面共同作用的位置（圖3中記號c所示之位置\ -裝載器- 以下將參照圖4、圖5說明裝載器7〇，其可内建於周 曝光裝置内，亦可不内建於周邊曝光裝置内，在此當成設 ，於周邊曝光裝置之外（附近）的情況來作說明。另外' 在圖4及圖5中，僅圖示周邊曝光裝置的底盤2 '平板多拄 器4及平板支持，器支持部5，其他構成元件在圖示中省略、。 „„裝載益70係用來於周邊曝光裝置和其他裝置如塗料 :璃卜:V曝/裝置等之間運送作為曝光對象物的 ••土板G。乜外，在設置於地板等的基部75上設有定標2177-3574-P.ptd Page 12 495835 V. Description of the invention (62) After collecting 62A, it is introduced into the photosensitive surface of the glass substrate G through the intermediate lens 66A 'projection lens 65A, that is, the side where the photoresist is applied: by the shutter The shutter 63A, which is driven along the XY plane, can switch the state where the light emitted from the ultra-high pressure mercury lamp 40A is guided to the incident surface of the intermediate lens 66A to the mask state. Generally, it takes tens of minutes to prepare for the light from the start of the lamp to stabilize the light emitted by the ultra-high pressure mercury lamp. Therefore, after the peripheral exposure device starts to work, if it is necessary to temporarily stop the light from the super-south pressure mercury lamp 40A, when the ultra-high pressure mercury lamp 40a is turned off, it is necessary to use a shutter 6 3A to block light. The shutter 64A driven by the shutter actuator 36A not only adjusts the light beam irradiated on the glass substrate G to a rectangular shape 3, but also has a function of adjusting the amplitude (size) of the light beam in the secondary scanning direction. The shutter 64A is disposed between the exit surface of the projection lens 65A and the photoresist coating surface on the glass substrate G, and is as close as possible to the photoresist coating surface. Regarding the projection lens 65A, the shielding window 64A may also be disposed at a position that interacts with the photoresist coating surface (position indicated by the symbol c in FIG. 3 \-loader-the loader will be described below with reference to FIGS. 4 and 5). 70. It can be built in the peripheral exposure device or not in the peripheral exposure device. It is assumed here that it is set outside (near) the peripheral exposure device. In addition, 'In Figure 4 and Figure In the figure 5, only the chassis 2 of the peripheral exposure device and the tablet support 4 and the tablet support 5 are shown. The other components are omitted in the illustration. „„ Loading 70 is used for peripheral exposure devices and • Other equipment such as paint: glass: V exposure / equipment, etc. • • Soil plate G, which is the object of exposure, is provided with a calibration on the base 75 provided on the floor, etc.

2^7-3574.p.ptd 苐13頁 495835 五、發明說明（11) 機械手臂72。機械手臂72具有可於XY平面之方向移動、於 ±冗方向移動及可繞z軸旋轉的自由度。在此機械手臂72的 先端固定有门自行的搬送架73。玻璃基板G在受到搬送架 了 3之腕部7 3 a支持的狀態下被搬送。 接下來請參閱圖4及圖5，以下將說明當玻璃基板g載 置於平板支持器4時裝載器70的動作。如上所述5平板支 持器4上設有複數個突起4a。裝載器7〇的機械手臂72及基 板G不和突起4a衝突的情況下，僅於突起4a上方的空間内 以腕部73a支持玻璃基板g來搬送之。而且，當玻璃基板G 一到達平板支持器4上的既定位置，裝載器7〇沿傷z方向移 2，使玻璃基板G下降。在此過程中，玻璃基板6和複數個 犬起4a接觸，然後玻璃基板G被真空 載器W械手臂72沿負¥方向移；=邊 動作。 佼所逑，開始周邊曝光裝置的 -控制電路- 圖6為方塊圖，說明一抑毛|雷々 電路俜用來栌制上、f冃、嘉處二丄電概略構造，此控制 电硲係用來控制上述周邊曝光裝置的 負責整合控制周邊曝光裝置的動作=在控制。戸100 有主要掃描馬娜及30B、= J控制部⑽上連接 作動器34A及34B、遮窗作動器_及^运划及聊、快門 40A及40B。在控制部1〇〇上堆一本喳、超鬲壓水銀燈 閥46A、46B及50、光量感測〜器4二于y I磁式方向切換 在控制邬100上連接有電腦主機 =如動器52。另外， 機0 0 °控制電路含有周邊曝 495835 五、發明說明（12) 光裝置且各自組裝於複數個裝置上，此電腦主機2 〇〇係用 來進行和控制電路的通信以整合控制整個製造程序。控制 部1 〇 0將作為曝光對象物的玻璃基板G載置於平板支持器之 後二便將曝光上述玻璃基板G的製造程序' 給予玻璃基板G 面的劑里專控制參數（配方）從電腦主機2 0 0輸入， 然後開始控制如後所說明的曝光動作。 —周邊曝光裝置的動作— ^有關以上構造之周邊曝光裝置的動作，將配合圖i至 圖6 "兒明之。另外5在以下的動作說明中，超高壓水銀燈 40A及j〇B在亮燈之後需經過一段時間才會呈安定狀態，在 悲下才可進行周邊曝光的動作。當配方從電腦主機 . 别入之_後’控制部1 〇 〇開始控制周邊曝光的動作。 「首^谠明在具有矩形外形的玻璃基板ς四周曝光出 伙⑹丄it，的\況。玻璃基板G被載置到平板支持器4後5 控制σ卩1 〇 〇控制雷磁4 ， h Μ π β i一 Υ。磁式方向τ刀換閥5 0，使開於複數個突起 4a的孔和未圖示的鱼网 、 w, N rx, ^ _ τ 的負反/原k通。猎此，玻璃基板G被吸 附固疋於平板支持器4上c 達32f,二°〇轉控動制主描馬達30Α、30β、次要掃描馬 光數的先至 j :。 方，以測量由各光源單元射出之 輸入的配以少的光量值和從電腦主機2〇〇 « ^ ^ ^14A "14B ^ -如此所求侍的移動速度進行周邊曝光時，從最多光 4958352 ^ 7-3574.p.ptd 苐 page 13 495835 V. Description of the invention (11) Robot arm 72. The robot arm 72 has the degrees of freedom of being movable in the direction of the XY plane, moving in the ± redundant direction, and being rotatable about the z-axis. A door self-propelled carrier 73 is fixed to the tip of the robot arm 72. The glass substrate G is transported while being supported by the wrist portion 7 3 a of the transport frame 3. Next, referring to Figs. 4 and 5, the operation of the loader 70 when the glass substrate g is placed on the plate holder 4 will be described below. As described above, the flat plate holder 4 is provided with a plurality of protrusions 4a. When the robot arm 72 and the base plate G of the loader 70 do not collide with the protrusions 4a, they are transported by supporting the glass substrate g with the wrist portion 73a only in the space above the protrusions 4a. Furthermore, as soon as the glass substrate G reaches a predetermined position on the flat plate holder 4, the loader 70 is moved 2 in the direction of the injury z, and the glass substrate G is lowered. In this process, the glass substrate 6 is in contact with the plurality of dogs 4a, and then the glass substrate G is moved in the negative ¥ direction by the vacuum arm W arm 72; = side action. The control circuit that starts the peripheral exposure device-Figure 6 is a block diagram illustrating the rough structure of the lightning suppression circuit, which is used to make the upper, f, and Jiaji two electric circuits. This control circuit is Responsible for controlling the above-mentioned peripheral exposure device is responsible for the integrated control of the operation of the peripheral exposure device = in control.戸 100 has main scanning mana and 30B, = J control unit ⑽ connected to actuators 34A and 34B, window actuators _ and ^ operation and chat, shutters 40A and 40B. On the control unit 100, a stack of ultra-high pressure mercury lamp valves 46A, 46B, and 50, a light sensor, and a magnetic sensor are used to switch the magnetic direction. A computer host is connected to the control unit 100. 52. In addition, the 0 ° control circuit of the machine contains peripheral exposures 495835. V. Description of the invention (12) Optical devices are each assembled on a plurality of devices. The host computer 2000 is used to communicate with the control circuit to integrate and control the entire manufacturing. program. The control unit 100 places the glass substrate G as the object of exposure on a flat plate holder, and then exposes the manufacturing process of the above-mentioned glass substrate G. The control parameters (formulations) are given to the agent on the surface of the glass substrate G from the host computer. Input 2 0 0, and then start controlling the exposure operation as described later. —The operation of the peripheral exposure device— ^ The operation of the peripheral exposure device with the above structure will be shown in FIGS. I to 6 " Er. Ming. In addition, in the following operation description, it will take some time for the ultra-high-pressure mercury lamps 40A and jOB to turn into a stable state after being turned on, and the peripheral exposure operation can be performed only in a sad state. When the recipe is taken from the host computer, the control unit 100 starts to control the action of peripheral exposure. "First, 谠 谠 is exposed around the glass substrate with a rectangular shape. The glass substrate G is placed on the plate holder 4 after 5 control σ 卩 〇 00 controls the magnetic field 4, h Μ π β i Υ. The magnetic direction τ knife change valve 50, so that the holes opened in the plurality of protrusions 4a and the fishnet, not shown, negative, negative / original k pass of w, N rx, ^ τ. Hunting Therefore, the glass substrate G is adsorbed and fixed on the plate holder 4 to 32f, and the main control motors 30A, 30β, and the first scanning number of the secondary scanning light number are controlled by the two-degree rotation. The input from each light source unit is matched with a small amount of light and from the host computer 2000 ^ ^ ^ ^ 14A " 14B ^-When performing peripheral exposure at the requested moving speed, the maximum light is 495835

控制部100控制快門作動器3以、34B以關閉快門63A及 ，，使來自光源單元i4A 'i4B的光束呈現無法射出的狀 ^接者控制邰1 0 〇控制主要掃描馬達3 0 A、3 0 B及次要-滞“馬達32A、32B ’驅動光源單元14A、i4B沿主要掃描方j 向f次要掃描方向且定位。亦即，使光源單元ΐ4Α及i4B的i 光束射出位置和周邊曝光開始位置一致。接著，控制部 1 0 0根據攸電腦主機2 〇 〇輸入的配方來控制遮窗作動器 36A、36B，配合非圖樣區的寬度來調整由光源單元、 ！ 1 4 B所射出的光束寬度。 | 然，，右在玻璃基板G的周邊部位燒入對齊記號或識i 別編號等，必須避劳此都付嚴伞 丄 + | 來埏尤此斗位曝先。在此種情況下，從電腦 主機t〇o輸人的配方中含有顯示不需要進行周邊曝光之部 位的貧料。控制部1〇〇根據此資料控制電磁式方向切換閥_ 46A、46B以驅使遮罩16A沿負χ方向，遮置i6B沿正χ方向移p 動。藉此，遮光單元11A、11B切換至如圖}所示的狀態，[_ 遮罩16A、16B覆蓋玻璃基板G上曝光區以的一部份。藉The control unit 100 controls the shutter actuators 3 and 34B to close the shutter 63A and make the light beams from the light source units i4A and i4B appear incapable of being emitted. Control by the controller 邰 1 0 〇 control the main scanning motors 3 0 A, 3 0 B and secondary-lag "motors 32A, 32B 'drive the light source units 14A, i4B along the main scanning direction j to f the secondary scanning direction and position. That is, the i-beam emission position of the light source units ΐ4A and i4B and peripheral exposure start The positions are the same. Next, the control unit 100 controls the shutter actuators 36A and 36B according to the recipe input by the host computer 2000, and adjusts the light beam emitted by the light source unit, 1 4 B according to the width of the non-pattern area. Width. Of course, the right side burns in the alignment mark or identification number on the glass substrate G. You must avoid it and pay a strict umbrella 丄 + | to give priority to this position. In this case , The formula input from the host computer t〇o contains lean material showing the parts that do not need peripheral exposure. Based on this information, the control unit 100 controls the electromagnetic directional switching valves _ 46A and 46B to drive the mask 16A along the negative side. χ direction, covering i6B along the positive χ square P shifting movement. Accordingly, the light shielding unit 11A, 11B is switched to the state shown in FIG} [_ mask 16A, 16B cover the upper part of the glass substrate G to the exposed areas. By

495835 五、發明說明（14) 此，可對從光源單元14A、！4B射出並設入塗佈於玻璃基板 G上之光阻劑的光束進行部分的遮光，遮置住基板g上不想 曝光的部分。 一 控制部1〇0控制快門作動器34Α、34β以啟動快門63A、 巧之呈現光束從光源單元14Α、14Β射出的狀態，接 二二^主要知描馬達3〇Α、3()δ以使光源罝元14Α、14Β沿主 Ζ=行掃描。光源單元14Α及148在受到支持元件 又二Λ、大態下以近乎固定的速度掃描玻璃基板C，的上 、息退=成玻璃基板G兩邊（圖1中沿著Y方向的兩邊）的周 ί二時，由於使用遮光單元11A、UB，遮光的部分 制ί 士、i。如此，错由本發明之周邊曝光裝置，即使在 有不想曝光的部分存在’也可在光源單元14A、 習知H知描到停止掃描期間以近乎固定的速度來掃描。 單亓的γ ί為，在不想曝光部位的先端部位暫時停止光源 不相痕Γ田並關閉快門63Α、63Β，然後重新啟動掃描，在 端部位再次暫時停止掃描，#著再次ί 後再〜人啟動掃描。和習知之方式相比，上述之 光裝置的效率。 了門内-成周邊曝尤，亚“周邊曝 .^ ^所述，隨著玻璃基板G上兩相對邊周邊爆光的$ 丄λ部 門作動器34A、3卿 知止先束從光源單元14A、14B射出。 繞平部::控制行程作動器52以使平板支持器4 '" 疋轉軸旋轉90度。同時，根據從電腦主機495835 V. Description of the invention (14) Therefore, the slave light source unit 14A,! The light beam emitted from 4B and set into the photoresist applied on the glass substrate G is partially shielded from light, and the portion of the substrate g that does not want to be exposed is shielded. A control unit 100 controls the shutter actuators 34A and 34β to activate the shutter 63A, and presents a state in which the light beam is emitted from the light source units 14A and 14B. The motors 30A and 3 () δ are mainly described so that The light source units 14A, 14B scan along the main Z = line. The light source units 14A and 148 scan the glass substrate C at a nearly constant speed in a large state under the support element, and the upper and lower sides of the light source unit = the periphery of the glass substrate G (two sides along the Y direction in FIG. 1). At 2:00, due to the use of the light-shielding units 11A and UB, the light-shielding part is made of 士 and i. In this way, the peripheral exposure device of the present invention can scan at a nearly constant speed during the scanning stop period in the light source unit 14A and the conventional camera even if there is a portion that is not intended to be exposed. The single γ ί is to temporarily stop the light source at the apex of the part that you do not want to expose, and temporarily close the shutter 63Α, 63Β, then restart the scan, and temporarily stop scanning again at the end, # 着 再 ί and then ~ scanning. Compared with the conventional method, the efficiency of the optical device described above. The inside of the door-into the surrounding exposure, Asia's "peripheral exposure." ^ ^ As described, as the two opposite sides of the glass substrate G explode around the $ 丄 λ department actuators 34A, 3 Qing Zhizhi first beam from the light source units 14A, 14B Shooting. Rounding section :: Controls the stroke actuator 52 to rotate the flat support 4 '" 疋 rotation axis 90 degrees. At the same time, according to the slave computer host

495835 五、發明說明（15) 200輸入的配方，控制部100控制次要掃描馬達、3? 遮窗作動器36A、36B，以變更光源覃元i4A、UB的光輛 距離並同時變更光束的大小。如此，#由旋轉羊栢“主二 4、變更光源單元14A、14B的光軸間距離且同時變更光''束y 的大小，可提尚周邊曝光裝置的效率。此外，在旋轉亚 i支持器4的同時，可以僅變更光源罝元⑷、ια間的止蚪 間距離或僅變更光束的大小u —· ' 如上所述，持續旋轉平板支持器4、變更光源留亓 14A、14B的光軸間距離並變更光束大小，控制部^可控 制主要掃描馬達30Α、30Β以使光源單元14Α、14β的光束射 出部移動至下一個周邊曝光的起始位置。然後，以從電腦 主機200輸入的配方為根據，若判斷出下一個周邊曝光範 圍内含有需要遮光的區域，控制刼丨〇 〇將維持遮罝1 6 A、 16B覆蓋玻璃基板G上曝光區PA之—部份的狀態'反之，若 判斷出無需要遮光的區域，控制部i 〇 〇則控制電磁式方向 切換閥46A、46B，使遮罩16A、16B從玻璃基板G上的周邊 曝光範圍退出。接著’控制部1 〇 〇控制快門作動器3 4 a及 34B以啟動快門63A、63B，在呈現光束從光源單元HA ' 14B射出的狀態後，控制主要掃描馬達3〇Α、3〇β，以使光 源早元1 4 A、1 4 B沿主要掃插方向掃描。 藉由控制部1 0 0所進行的控制動作，完成玻璃基板G四 周「口」字形的周邊曝光。若周邊曝光的圖樣為「目」字 形、「日」字形或「田」字形或者為複合以上字形所形成 的形狀，控制部1 0 0則反覆進行如上所述之周邊曝光的動495835 V. Description of the invention (15) 200 input recipes, the control part 100 controls the secondary scanning motor, 3? Window shutter actuators 36A, 36B to change the light source distance of the light source Qin Yuan i4A, UB and change the size of the beam at the same time . In this way, # by rotating sheep cedar "Main two 4, change the distance between the optical axes of the light source units 14A, 14B and change the size of the light" beam y at the same time, can improve the efficiency of the peripheral exposure device. In addition, support in the rotating sub-i At the same time, you can only change the distance between the light source units, ια, or only the beam size u — 'As described above, the tablet holder 4 is continuously rotated, and the light sources 14A and 14B are changed. The distance between the axes and the beam size are changed. The control unit ^ can control the main scanning motors 30A and 30B to move the beam emitting portions of the light source units 14A and 14β to the starting position of the next peripheral exposure. Then, the input from the host computer 200 is The formula is based on that if it is judged that the next peripheral exposure range contains the area that needs to be shielded, the control 刼 〇〇〇 will maintain the coverage of 16 A, 16B covering the exposed area PA on the glass substrate G-part of the state 'conversely, If it is determined that there is no area that needs to be shielded, the control unit 〇〇 controls the electromagnetic directional switching valves 46A and 46B to withdraw the masks 16A and 16B from the peripheral exposure range on the glass substrate G. Then, the 'control unit 1 〇 The shutter actuators 3 4 a and 34B are controlled to activate the shutters 63A and 63B. After the light beams are emitted from the light source unit HA ′ 14B, the main scanning motors 3〇A and 30β are controlled so that the light source is early 4 A , 1 4 B scans along the main scanning direction. By the control action performed by the control unit 100, the "peripheral" -shaped peripheral exposure around the glass substrate G is completed. If the pattern of peripheral exposure is "mesh", "Japanese" or "field", or a shape formed by compound or more, the control unit 100 repeatedly performs the above-mentioned peripheral exposure operation.

2177-3574-P.ptd 第18頁 495835 五、發明說明（16) Ϊ二時二f周邊曝光的圖樣為偶數個，控制部_會往 先源旦疋14A、i4B雙方同時進行播入 的圖樣為奇數個，例如「日」全，的$ =曝光 的=圖樣將使用光源單元14Α、“Β中任一光源i元爽造 <田，控制部100控制次要掃描馬達32α、32β。此時，，- 即未：到Ξ ΐ部100的控制’剩下的那-個光源單元，亦 、:2 :周込曝光動作的光源覃元在移動時不會 光源單元互相工涉。在上述實施型態的說^ 的數Γ二ί關設置兩個光源單元的範例，其實光源單元 數目仿：：ί3個以上。在此種情況下5周邊曝光的圖樣 的光：”：元的數目分配後’剩餘的圖樣可使用—部份 的=早原來曝光。然後，受到控制部100的㈣，π 光動作的光源單元在移動時不會和進行 動作的光源單元互相干涉。 、九 &在此將配合圖7說明本發明之周邊曝光裝置的實施型 恶中兩個進行‘「目」字形曝光的範例及一個進行「日一 形曝光的範例。 」 ，圖7(a)顯示的範例中，「目」字形圖樣中的兩個圖 樣二有較寬的間隔，圖7(b)顯示的範例為，在進行圖7(技） 所示圖樣的周邊曝光時控制部丨〇 〇所進 驟。如圖7⑻的步_所示，兩飼沿著基献長先邊二的制圖㈣ ，單元14卜腦曝光，接著使平板支持；4旋°鰊:， 度。在平板支持器4旋轉期間’光源單元14A、14B沿次要 掃描方向移動以調節間隔。然後，如步驟B所示，兩個2177-3574-P.ptd Page 18 495835 V. Description of the invention (16) The pattern of the peripheral exposure at 2:22 f is an even number, and the control department will send the images broadcasted by both the 14A and i4B at the same time. For an odd number, for example, "day", $ = exposed = patterns will use any of the light source units 14A, "B", and the control section 100 controls the secondary scanning motors 32α, 32β. This At that time,-that is, not yet: the control of the ΐ 100 部 100 'the remaining one light source unit, that is, 2: 2: the light source of Zhou Xun's exposure action Qin Yuan will not work with the light source units when moving. In the above The number of implementation examples is two examples, where two light source units are set. In fact, the number of light source units is like: 3 or more. In this case, the light of the pattern of 5 peripheral exposures: ": the number of yuan allocated After 'remaining pattern can be used-part = early original exposure. Then, the light source unit that is operated by the π light does not interfere with the light source unit that is operating when being moved by the control unit 100. Nine & Here, two examples of performing "" mesh "-shaped exposures and one example of" daily-one-shaped exposures "in the embodiment of the peripheral exposure device of the present invention will be described with reference to FIG. 7 (a). ) In the example shown, the two patterns in the "mesh" glyph pattern have a wide gap. The example shown in Fig. 7 (b) is the control section when performing peripheral exposure of the pattern shown in Fig. 7 (Technology) 丨〇〇 progress. As shown in step _ in Fig. 7, the two feeds are drawn along the basis of the long and first two drawing ㈣, the unit 14 is exposed, and then the plate is supported; 4 turns ° 鰊:, degrees. During the rotation of the plate holder 4, the light source units 14A, 14B are moved in the secondary scanning direction to adjust the interval. Then, as shown in step B, two

I 作0 > 光源 的圖 的那 行掃 由於 卜P未 丨邊曝 |中， 的數 數目 的光 行周 動作 態中 形曝 樣具 所示 驟。 受光 i度° 掃描 此8^>’右周邊暖 罝元m、UB雔方為 ，控制部100會使 Λ Μ β雙方同眵進行 樣為奇數個，例如Γ ρ ^ 右周邊曝光I made 0 > the scan of the light source diagram because of the number of light exposures, and the number of light lines in the motion state of the central exposure sample tool shown in the steps. Received light i degree ° Scanning This 8 ^ > 'right peripheral warming unit m, UB is square, and the control unit 100 will make both Λ Μ β perform at the same time as an odd number, such as Γ ρ ^ right peripheral exposure

個圖樣Μ用/予形的圖樣，最後餘留下來 保I便用先源早元1 4A、1 4B中徉一卑、、塔-- I =’控制部1 〇〇控制次要掃描馬達32A、3’2b。此^寺木，進 =舍控制部100的控制，剩下的那一個光 =邊曝光動作的光源覃元在移動時不會二二 祝明了有關設置兩個弁源留 心的成月 〇 ^ ^ ·· ^ 依#、、搭留-从把〇 U况广’周邊曝光的圖樣 、^源早兀的數目分配後，剩餘的圖樣可使用一 源單原來曝光。然後，受到控制部1〇〇的控制， 3光動作的光源單元在移動時不會和進行周邊❹ 的光源單元互相干涉。 ° 在此將配合圖7說明本發明之周邊曝光裝置的實施型 兩個進行「目」字形曝光的範例及一個進 光的範例。 」子 在圖7(a)顯示的範例中，「目」字形圖樣中的兩個圖 有較寬的間隔，圖7(b)顯示的範例為，在進行圖7(a) 圖樣的周邊曝光時控制部100所進行的曝光控制步) 如圖7(b)的步驟A所示，兩個沿著基板G長邊的圖樣接 源單元14A、14B的曝光，接著使平板支持器4旋轉9〇" 在平板支持器4旋轉期間，光源單元1 4A、丨4B沿次要 方向移動以調節間隔。然後，如步驟B所示，兩個沿 495835 五、發明說明（17) ----I used a pattern / pre-shaped pattern, and I left the last one to ensure I will use the first source of early yuan 1 4A, 1 4B, and the tower-I = 'control section 1 00 to control the secondary scanning motor 32A , 3'2b. This ^ temple wood, enter = the control of the house control unit 100, the remaining light = the light source for the side exposure action, Qin Yuan will not move when he moves. · ^ According to # ,, take and leave-After allocating the number of patterns exposed to the surroundings of 〇U 况 广 ', the number of ^ source early exposures is allocated, and the remaining patterns can be exposed using one source sheet. Then, under the control of the control unit 100, the light source unit that operates in three lights does not interfere with the light source unit that performs peripheral chirp when moving. ° An embodiment of the peripheral exposure device of the present invention will be described with reference to FIG. 7. Two examples of performing “mesh” -shaped exposure and one example of light entering. In the example shown in Figure 7 (a), the two figures in the "mesh" glyph pattern have a wide interval. The example shown in Figure 7 (b) is when the peripheral exposure of the figure in Figure 7 (a) is performed. Step of exposure control performed by the time control unit 100) As shown in step A of FIG. 7 (b), the two patterns along the long side of the substrate G are exposed by the source units 14A and 14B, and then the tablet holder 4 is rotated 9 〇 " During the rotation of the plate holder 4, the light source units 1 4A, 4B are moved in the secondary direction to adjust the interval. Then, as shown in step B, the two along 495835 V. Description of the invention (17) ----

著基板G短邊的圖樣接受曝光。此時，光源單元ΐ4Α、ΐ4β 和玻璃基板G之間的相對移動方向為和步中相對移動方 向相反的方向。完成步驟B中的曝光動作之後光源單元 1 4 A、ί 4B被驅使向次要掃描方向移動以縮 間的間隔。然後，如步驟C所示，娜元二:二之 ^沿者和线β中相對移動方向相反的方向和基板G相對移 動’進行剩餘兩個圖樣的曝光。 在圖7(c)顯示的範例中，「目」字形圖樣中的兩個 圖樣具有較窄的間隔，圖7(d)顯示的範例為，在進行圖 I 申 7 (c )所示圖樣的周邊曝光時控制部1 〇 〇所進行的曝光控制 步驟。在此所謂的「較窄」，是指即使受到光源單元、 yA、14B大小的限制等而使光源單元UA、14β最靠近的狀 態下，圖樣的間隔要比從各光源單元所射出之各個光 高度要窄。The pattern on the short side of the substrate G is exposed. At this time, the relative movement directions between the light source units ΐ4A, ΐ4β and the glass substrate G are opposite to the direction of the relative movement in the step. After the exposure action in step B is completed, the light source units 1 4A, 4B are driven to move in the secondary scanning direction at reduced intervals. Then, as shown in step C, the direction of the relative movement in the opposite direction of the line N and the second line β and the relative movement of the substrate G and the relative movement of the substrate G are performed to expose the remaining two patterns. In the example shown in Fig. 7 (c), the two patterns in the "mesh" glyph pattern have a narrower interval. The example shown in Fig. 7 (d) is that when the pattern shown in Fig. 7 (c) is performed Exposure control steps performed by the control unit 100 during peripheral exposure. The "narrower" here means that even when the light source units UA, 14β are closest to each other due to the size limitation of the light source unit, yA, 14B, etc., the interval between the patterns is longer than each light emitted from each light source unit. Be narrow in height.

I ◊ 一如= 7(d)的步驟p所示，兩個沿著基板長邊的圖樣接 受光源單元UA、ι4Β的曝光，然後使平板支持器4旋轉9〇 度。在平板支持器4旋轉期間，光源單元14Α、14β沿次要 掃描方向移動以調節間隔。然後，如步驟〇所示，在4個和 基板G短邊之_延長方向平行的圖樣中，最左邊的圖樣和左 邊數，來第三個圖樣接受曝光。此時，光源單元14Α、14Β .玻螭基板G之間的相對移動方向為和步驟ρ中相對移動方 向相反的方向。完成步驟Q中的曝光動作之後，光源單元 A ^ 4 B，驅使向次要掃描方向移動。然後，如步驟r所 示光源單元1 4 A、1 4 B被驅使沿著和步驟q中相對移動方I ◊ As shown in step p of = 7 (d), the two patterns along the long side of the substrate are exposed to the light source units UA, ι4B, and then the plate holder 4 is rotated by 90 degrees. During the rotation of the plate holder 4, the light source units 14A, 14β are moved in the secondary scanning direction to adjust the interval. Then, as shown in step 0, among the four patterns parallel to the extension direction of the short side of the substrate G, the leftmost pattern and the number of left edges are exposed to the third pattern. At this time, the relative movement direction between the light source units 14A, 14B. And the glass substrates G is a direction opposite to the relative movement direction in step ρ. After the exposure operation in step Q is completed, the light source unit A ^ 4B is driven to move in the secondary scanning direction. Then, as shown in step r, the light source units 1 4 A, 1 4 B are driven along the direction of relative movement in step q

2177-3574-P.ptd 第20頁 九、發明說明（⑻ 相反的方向知美纟r ★ 光。 •土板1對移動，進行剩餘兩個圖樣的曝 外、肉 „ ·〜·，仃之方向的圖樣時，曝光方式卑& 内內内肉相對的’在圖7⑷所示的範例中2外、 方向移動時，奸制邻i00奋/呆個光源単兀沿萼炎二々 源單元之間心離::在既 制光源單元1U、=持2定的距離以…此 ，一個光源單元工作的情況下使另外〜彳（2 ...... Ί“來 内、内…亦即，當某個光源單元沿夕先方 ί πη合你”丄_ ^ ^ ^ a、％二欠 ^ *「〜丨月儿 Γ 1尤刀7 Γ — 的 备。糟田上述的方式來移動光源單元，相鄰^、、 邻又互相干涉。此外，在曝光的圖樣上即使有摩弋磙袅 ΪΙ’也可以進行曝％。特別是本實施型態之周^奴寿 :用光源和集光光學系統一體成型之光源單：碜曝先： 抑Λ、和集光光學系統的大小，故進而容 ，哏令 的情況下進行曝光 在圖7 (e)顯示的範例中，曝光圖樣中具有 :元所射出光束的高度限制。但，藉由如上所欠：了 二，即使隹圖樣中有較窄的間隔，也:之％ 的愔、ΠΓ治t ^丄 *隻祕、A 2 _ 的 支持器4旋轉期間，光源單元1 4A、1 4B沿次要轉。食 圖樣，圖7 ( f )顯示的範例為，在進行圖7 (e)所广 邊曝光時控制部1 〇〇所進行的曝光控制步驟。如^ _後=汚 步驟X所示，兩個沿著基板G長邊的圖樣接受光、^7(f)、月 1 4A、1 4B的曝光，接著使平板支持器4旋謗90泠、、粵弋 % 495835 五、發明說明（19) ^ " -- 争 動以調節間㉟。然後，如步驟γ所示，兩個沿著基板G短邊 的圖樣接冗曝光。此時，光源單元1 4A、1 4B和玻璃基板G 之間2相對移動方向為和步驟χ中相對移動方向相反的方 向。完成步驟Υ中的曝光動作之後，只有光源單元ΐ4β被驅 使向次要掃描方向移動。然後，如步驟Ζ所示，光源單元 14Α、14Β被驅使沿著和步驟γ中相對移動方向相反的方向 和基板G相對移動，對剩餘的圖樣進行曝光。此外，在步 驟Ζ中，光源UA的快門63Α呈現關閉的狀態。以上說明了 有關對剩餘圖樣進行曝光時使用光源單元1 4Β的範例，當 然，、在此也可以使用光源單元1 4Α。又，對「日」字形圖 樣或以此為基礎的圖樣反覆進行曝光時，可交互 單元HA、14Β或以固定的次數交替使兩光源 ，、'、 14Β。 ， 、如以上所說明的，本發明實施型態之周邊曝光裝置可 =對任何曝光圖樣進行高效率的曝光。特別是，由超高壓 尸=燈40A、40Β所射出的光可在不使用光 J基板G上，，所以可防止光纖充填纽專致的低光二公 邊：先敎3效率。而1，由於不會發生光纖劣化等 "、，以可提高周邊曝光裝置的信賴度，此外，由於伴 用上述方式驅動複數個光源單元，提高了可形^ 之周邊曝光圖樣的自由度。 攸上t成 之前曾說明過的一個範例為，為了檢測光源單元 ::A，、=所射土光束之光量，在底盤2上設置光量感測器 ，、貫上亦$分別於光源單元HA、14B内内建光量感剥2177-3574-P.ptd Page 20 Nine, Description of the invention (⑻ Opposite direction is known 纟 r ★ light. • One pair of soil plates is moved to expose the remaining two patterns. In the pattern shown, the exposure mode is humiliating & the inside and the inside are opposite. In the example shown in Figure 7 (b), when moving in the direction of 2 and the outside, the control unit i00 / stays a light source along the source unit of the two inflammation units. Centering distance :: In the case of a built-in light source unit of 1U, = a fixed distance of 2 is used in this case, when a light source unit is operated, another ~ 彳 (2 ...... Ί "comes within, within ..." When a certain light source unit goes forward π πη 合 你 ”丄 _ ^ ^ ^ a,% two owed ^ *" ~ 丨 month child Γ 1 especially knife 7 Γ — is prepared. The above-mentioned way to move the light source unit Neighbors, and neighbors interfere with each other. In addition, even if there is Capricorn on the exposed pattern, it can be exposed%. Especially in this embodiment of the week ^ Nushou: using light sources and light collection optics System integrated light source list: 成型 exposure first: ΛΛ, and the size of the light collection optical system, so it is more convenient, the exposure under the circumstances of the order In the example shown in Fig. 7 (e), the exposure pattern has: the height limit of the beam emitted by the element. However, due to the above owing: two, even if there is a narrow interval in the 隹 pattern, it is:% of 愔, ΠΓ 治 t ^ 丄 * 只, A 2 _ during the rotation of the holder 4, the light source units 14A, 1 4B along the secondary rotation. Food pattern, the example shown in Figure 7 (f) is shown in Figure 7 ( e) Exposure control steps performed by the controller 100 during the wide-side exposure. As shown in ^ _post = stain step X, two patterns along the long side of the substrate G receive light, ^ 7 (f), month Exposure of 1 4A, 1 4B, then make the plate holder 4 90 °, 、% 495835, 5. Description of the invention (19) ^ "-fight to adjust the interval. Then, as shown in step γ , Two patterns along the short side of the substrate G are exposed successively. At this time, the relative movement direction between the light source units 14A, 14B and the glass substrate G is the opposite direction to the relative movement direction in step χ. Complete step Υ After the exposure operation in the middle, only the light source unit ΐ4β is driven to move in the secondary scanning direction. Then, as shown in step Z, the light source unit 14A 14B is driven to move relative to the substrate G in a direction opposite to the direction of the relative movement in step γ to expose the remaining pattern. In addition, in step Z, the shutter 63A of the light source UA is closed. An example of using the light source unit 1 4B for the remaining pattern exposure. Of course, the light source unit 1 4A can also be used here. In addition, when repeatedly exposing the "Japanese" pattern or the pattern based on this, the interactive unit HA can be used. , 14B or alternately using two light sources at a fixed number of times, ', 14B. As explained above, the peripheral exposure device of the embodiment of the present invention can perform high-efficiency exposure on any exposure pattern. In particular, the light emitted by the ultra-high voltage lamps 40A and 40B can be used on the non-use light J substrate G, so it can prevent the optical fiber from filling the special low-light two sides: the first efficiency is 3. And 1, because there is no degradation of the optical fiber, etc., the reliability of the peripheral exposure device can be improved. In addition, by driving a plurality of light source units in the above manner, the degree of freedom of the peripheral exposure pattern can be increased. An example that was explained earlier is that in order to detect the light amount of the light source unit :: A ,, = the light amount of the emitted earth beam, a light amount sensor is installed on the chassis 2, and the light source unit is separated from the light source unit HA. , 14B built-in stripping

2177-3574-P.ptd 第22頁 495835 五、發明說明（20) 器。而且，周邊曝光裝置所具有的光源單元數不限於兩 個，可有3個以上。 用來驅使複數個光源單元沿主要掃描方向及次要掃描 方向移動的不僅可使用以上所說明之傳送螺旋機構，亦可 j使用線性馬達、皮帶傳動機構等其他作動器或機構。此 j外，如以下配合圖8所說明的，挎來驅使光源單元沿次要 掃描方向移動的機構亦可當作旋轉機構來使兩。2177-3574-P.ptd Page 22 495835 V. Description of the invention (20). The number of light source units in the peripheral exposure device is not limited to two, but may be three or more. Not only the transmission screw mechanism described above, but also other actuators or mechanisms such as linear motors and belt transmission mechanisms can be used to drive the plurality of light source units to move in the main scanning direction and the secondary scanning direction. In addition, as explained below with reference to FIG. 8, the mechanism for driving the light source unit to move in the secondary scanning direction can also be used as a rotation mechanism to make two.

圖8顯示本發明實施型態之周邊曝光裝置中光源單元 之次要掃描方向驅動機構的其他範例。圖8僅顯示一部份 的周邊曝光裝置，其他部分和圖1相同。在圖8中，和圖i |中所示周邊曝光裝置相同的構成元件附上相同的符號並省 略其說明。光源單元1 4A ' 1 4B在驅動元件1 2上透過旋韓臂 、134B受到支持。在旋轉臂]·34Α的旋轉中心軸上，安 波有次要掃描馬達1 3 2 Α及編碼器1 3 3 Α。同樣，在旋轉臂 !34β的旋轉中心軸上，安裝有次要掃描馬達132B及編碼器 133B。這些次要掃描馬達132A、1328及編碼器Π3Α、13& 皆連接控制部1 〇 〇。 3 A错由控制部100控制次要掃描馬達132A、132B，驅使 臂134A、134B各自搖動。光源單元14Α、14β@定於旋FIG. 8 shows another example of the driving mechanism of the secondary scanning direction of the light source unit in the peripheral exposure apparatus according to the embodiment of the present invention. FIG. 8 shows only a part of the peripheral exposure device, and other parts are the same as those of FIG. 1. In FIG. 8, the same constituent elements as those of the peripheral exposure device shown in FIG. I | are assigned the same symbols and their explanations are omitted. The light source unit 1 4A '1 4B is supported on the driving element 12 through a rotary arm 134B. On the axis of rotation of the rotating arm] · 34Α, Amp has a secondary scanning motor 1 3 2 A and an encoder 1 3 3 A. Similarly, a secondary scanning motor 132B and an encoder 133B are mounted on the rotation central axis of the rotary arm! 34β. These secondary scanning motors 132A and 1328 and the encoders 3A and 13 are connected to the control unit 100. In the case of 3 A error, the control section 100 controls the secondary scanning motors 132A and 132B to drive the arms 134A and 134B to swing. Light source unit 14A, 14β @ 定 于 旋

”4A、134B的先端，光源單元UA、Ηβ根據旋轉臂 #1 q/l Λ MU的角度位置來決定次要掃描方向的位置。旋轉 測。二134B的角度位置分別為編碼器133Α、133Β來檢 i 部100根據編碼器133Α、ΐ33β所輸入的角度位置 Μ來控制次要掃描馬達U2A、13歸決定光源置元At the leading end of 4A and 134B, the light source units UA and Ηβ determine the position of the secondary scanning direction according to the angular position of the rotating arm # 1 q / l Λ MU. Rotation measurement. The angular positions of the two 134B are encoders 133A and 133B, respectively. The inspection unit 100 controls the secondary scanning motors U2A and 13 according to the angular position M input by the encoders 133A and ΐ33β to determine the light source setting unit.

外5835 五、發明說明（21) "^^ ' " ------- 14A、次要掃描方向的位置。此外，在此所說 餘 例中，，自64A、64B隨著旋轉臂ι34Α、ΐ34β ; 形成的開：形狀（光東的斷面形狀）相對於主要掃描ί': =。it Γ整此傾斜，可使光源單元1 4 A、1 _旋雄 臂1 3 4 A、1 3 4 B相互旌μ。山 ^ ^ 動器36Α(36Β)的一；^者，使遮窗64Α(64Β)及遮窗作 外，亦可分別在兩臂轉臂=:13… 使光源單元14Α午行每取代上述之旋轉機構， 情況下，不會受到平行以：行，部的支持。在此 14Β在次要掃描方向上H☆的角度位置亦即光源單元14Α、 .pa ^ ^ . ^ y 的位置的影響，遮窗64A、64B所形 成開：：角度位置可針對主要掃描方向維持固定。 描方向移動的範例，知J :驅t 光源單元沿主要掃 ^ {一除此之外亦可驅使基板G沿主要搢 二方向移動:此外’還可驅使複數個光源及基板G雙方一 =私動，使複數個光源單元和基板G產生相對移動。在此 月况下’圖1中所示之遮光單元ΗΑ及11 β亦可為可和平板 支持态4以一體之方式來移動的構造。 發明功效： \ 如以上所說明的，本發明可發會以下之功效。 ! U)根據申請專利範圍第1至3項的發明，其可定位複$ 、明^元於感光基板約略中央的部位，在驅使各個照 、早元沿著第二方向移動時，這些照明單元不會互相干 /歩/因此這些照明單元不會發生相互衝突等不良情形，可外 5835 5. Description of the invention (21) " ^^ '" ------- 14A, the position of the secondary scanning direction. In addition, in the rest of the examples mentioned here, from 64A, 64B with the rotating arms ι34A, ΐ34β; the opening: the shape (the shape of the section of Guangdong) is relative to the main scan ί ': =. It Γ adjusts this inclination, so that the light source units 1 4 A, 1 _ rotator arms 1 3 4 A, 1 3 4 B can communicate with each other μ. Mountain ^ ^ One of the actuator 36A (36B); ^, the window 64A (64B) and the window can be made as an alternative, and the arms can also be turned on the two arms =: 13 ... each time the light source unit 14A replaces the above Rotating mechanism, in the case, will not be supported by parallel to: row, ministry. Here, the angular position of H ☆ in the secondary scanning direction of 14B, that is, the position of the light source units 14A, .pa ^ ^. ^ Y, is formed by the openings 64A, 64B: the angular position can be maintained for the primary scanning direction fixed. An example of moving in the drawing direction is to know J: the light source unit is driven along the main scan ^ {a) In addition, the substrate G can be driven to move in the main second direction: In addition, 'the light source and the substrate G can be driven by both sides = private The movement causes the plurality of light source units and the substrate G to move relatively. In this month's state, the shading units ΗA and 11 β shown in FIG. 1 may also have a structure that can be moved integrally with the flat support 4. Efficacy of the invention: As explained above, the present invention can realize the following effects. U) According to the inventions in claims 1 to 3 of the scope of application for patents, it can locate the position where the $ and Ming yuan are located at approximately the center of the photosensitive substrate. When driving each photo and early yuan to move in the second direction, these lighting units Does not interfere with each other / so / so these lighting units will not cause adverse situations such as conflict, but

第24頁 五、發明說明（22) - 率:邊曝光裳置順利地作用，並提高周邊曝光裝置的效 自卜v、，夂：！申請專利範圍第4項的發明，其可檢測發射 基i ^盤# t Γ單元的光強度，在使各個照明單元和感光 根據光二二二亚對感无基板上之非圖樣區進行曝光時，會 照明單元中最低的光強度來設 複數㈣明單。兄^ 除去光1 士不幻兀具有散亂的情況，在 柄ί ί 仍可以充足的光量進行曝光。此外，X兩晷 根據各個照明單元的光量； ‘面要 而 < 一起碓荇虛& ~ 復i订好戌次的周邊曝光動作 散亂的t主ί = 所以即使各個照明單元的光量中具有 3) Ϊ播：可防止周邊曝光裝置的效率低下。 (3 )根據申請專利範圍第5項的 變更複數個照明裝置所射出的光束χ ’：可各自獨立 複數個具有不同寬度的囷樣進行曝夫’，、二精，二可同時對 裝置的效率。 ‘ 』。I可提尚周邊曝光 (4 )根據申請專利範圍第δ 照明單元間距離的動作可4 #絲扪a明，其變更複數個 P] B 士、# ^ ‘ 和方疋轉驅動部旋轉_裔7 7=¾氺I it; ㈣進仃，错此可縮短複數個持續 ^動感先基板 間間:提高周邊曝光裳置的效^光動作間的時 )裉據申清專利範圍第7項的發 照明單元所射出之光束大小的動作可' ’其變更複數個 動感光基板同時進行，蕤卜 μ _ ‘疋轉驅動部旋轉驅 動作間的時間間隔：心=何數個崎行之曝光; 疋可棱南周邊曝光裝釁的放卓。Page 24 V. Description of the invention (22)-Rate: The side-exposure dress works smoothly and improves the effectiveness of the peripheral exposure device. The invention claimed in item 4 of the scope of patent application can detect the light intensity of the emission unit i ^ disk # t Γ unit, and when each lighting unit and the light are exposed to the non-pattern area on the non-sensing substrate according to the light 222 , The lowest light intensity in the lighting unit will be used to set the complex bill. Brother ^ Except for light 1, there is no clue that there is clutter, and there is still a sufficient amount of light for exposure at the handle. In addition, X and X are based on the amount of light of each lighting unit; 'Side to be < 碓 荇 碓 荇 virtual & 3) Broadcasting: Prevents inefficiency of peripheral exposure devices. (3) According to the change in item 5 of the scope of the patent application, the light beams emitted by a plurality of lighting devices χ ': each can independently expose a plurality of samples with different widths', two fine, two can simultaneously simultaneously . ‘’. I can mention the peripheral exposure (4) according to the scope of the patent application, the distance between the lighting units can be adjusted to 4 # 丝 扪 a 明, which changes a plurality of P] B 士, # ^ ', and Fang Zhuan drive unit rotation 7 7 = ¾ 氺 I it; if you enter it wrong, you can shorten the number of continuous ^ dynamic first substrate space: to improve the effect of peripheral exposure settings ^ time of light action) according to the 7th patent application The action of the size of the light beam emitted by the light emitting unit can be changed '' the plurality of moving photosensitive substrates are performed at the same time, and the time interval between the rotation driving operation of the rotation driving unit: heart = what is the number of exposures; I can expose the provocative Fangzhuo around the south edge.

2177-3574-P.ptd 第25頁 丨五、 發明說明（23) (6\根據申請專利範圍第 ^ 一 固照明單元和感光基板間相對、的發明，其設置於複數 止光射出部所射出的光照射 動的路徑附近，其用來防 部位，藉此，如使在作為暖、u ^光基板上不想被照射到的 行曝光的部分，可不使照明象的非圖樣區中含有不進 即5在周邊曝光動作中，不㉟=暫時停止並進行掃描。亦 =到曝光而使正在掃描中的二文，了避免不想曝光的部分 單元内的快門。如此，由於^明單元暫時停止並啟動照明 照明罝元的動作（加速或減^周邊曝光動作中不需要停止 致率。 ^ 可提高周邊曝光裝置的 (7)根據申請專利範圍 需要而被設置在照明單元和的發明，遮光裝置針對 進行類型和一台周邊曝光裝=間的位置上，藉此，可 思不目異之基板的周邊曝光。 圖式簡單說明： 的概略結構。面圖’况明本發明實施型態之周邊曝光裝置 的概5說明本發明實施型態之周邊曝光裝置 面圖，概略表示發光單元的構造範例。 間4VV垃實施型態中在周邊曝光裝置和其他裝置之 『曰1衣載器〜接曝光對象物的趺況。 置上認^兄子月。曝光對象物經由裝載器被放置在周邊曝光裝2177-3574-P.ptd Page 25 丨 Fifth, the description of the invention (23) (6 \ According to the scope of the patent application ^ The invention between the solid light unit and the photosensitive substrate is opposite, and it is set in the multiple light-shielding emitting section and emitted Near the path where the light is irradiated, it is used to prevent the part. Therefore, if the part that is not intended to be irradiated on the warm and light substrate is exposed, the non-patterned area of the illuminated image may not be included. That is, in the peripheral exposure action, do not ㉟ = temporarily stop and scan. Also = to the exposure and make scanning in the second sentence, to avoid the shutter in some units that do not want to be exposed. In this way, since the ^ Ming unit is temporarily stopped and The act of starting the lighting unit (acceleration or reduction) It is not necessary to stop the rate during peripheral exposure. ^ The invention that can increase the peripheral exposure device (7) is installed in the lighting unit and according to the scope of the patent application. Perform the type and position of a peripheral exposure device, so that the peripheral exposure of the substrate can be thought of unexpectedly. The drawings briefly explain: the outline of the structure. The plan view 'explains the type of implementation of the present invention. Outline 5 of the peripheral exposure device is a plan view of the peripheral exposure device according to the embodiment of the present invention, and schematically shows an example of the structure of the light-emitting unit. In the 4VV implementation mode, the peripheral exposure device and other devices are referred to as "1 garment carrier ~ connected." The condition of the exposure object. Set the name of the child. The exposure object is placed on the peripheral exposure device via the loader.

2177-3574-P.ptd 修正日雙正 f丄月 曰 Μ號89】沾咖 五、發明說明（24) 圖6為方塊圖，概略# L-- 裝置的控制電路。 、不本黍明實施型態之周邊曝光 圖7(a)為「目」字形 的曝光型態。 °樣中的兩個圖樣具有較寬間隔2177-3574-P.ptd Modified Japanese double positive f 丄 月 said M # 89] Zhanka V. Description of the invention (24) Figure 6 is a block diagram, outline # L-the control circuit of the device. Peripheral exposure of the implementation type not shown in Fig. 7 (a) is the exposure pattern of the "mesh" shape. ° The two patterns in the sample have a wide interval

圖7 ( b )為在進行圖γ ( V 所進行的曝光控制步驟。a所不圖樣的周邊曝光時控制部 的曝2型態: 」子形圖樣中的兩個圖樣具有較窄間隔 圖7(d)為在進行圖7(c) 所進行的曝光控制步驟。 y、67 π的周邊曝光時控制部 」字形圖樣的曝光型態。 所進行的曝光控制步驟。斤不圖樣的周邊曝光時控制部 圖8示範發光單元如 符號說明： T描機構的其他範例。 2底盤 5平板支持器支持部 9A，9B 樑 1 2支持元件 1 6A，16B 遮罩 32A，32B次要掃描馬達 40A，40B超高壓水銀燈 48光量感測器 7 0裝載器 2 0 0電腦主機 2177-3574-pfl.ptc 4平板支持器 8A，8B導執 1 1 A，11B遮光單元 14A，14B發光單元 30A，30B主要掃描馬達 36A,36B遮窗作動写 46A，46B電磁式方向切換閥 5 2行程作動器 1 0 0控制部 第27頁Fig. 7 (b) is the exposure control steps performed in Fig. Γ (V. The exposure mode of the control part when the peripheral exposure of the pattern not shown in a is: "The two patterns in the sub-pattern pattern have a narrow interval. Figure 7 (d) is the exposure control step performed in FIG. 7 (c). The exposure pattern of the “glyph pattern” of the control section at the time of peripheral exposure of y, 67 π. The exposure control step performed. At the time of peripheral exposure of the pattern The control unit in Figure 8 demonstrates the lighting unit as a symbol description: Other examples of the T-drawing mechanism. 2 Chassis 5 Flat plate support 9A, 9B Beam 1 2 Support elements 1 6A, 16B Mask 32A, 32B Secondary scanning motors 40A, 40B Ultra-high pressure mercury lamp 48 light quantity sensor 7 0 loader 2 0 0 computer host 2177-3574-pfl.ptc 4 tablet support 8A, 8B guide 1 1 A, 11B shading unit 14A, 14B light unit 30A, 30B main scanning Motors 36A, 36B actuate the shutter 46A, 46B electromagnetic directional switching valve 5 2 stroke actuator 1 0 0 control page 27

Claims (1)

六、申請專利範圍 " 一^----------- 學系1統： = 光；具有複數個含有光源及嫩 不曝光圖樣的非ί樣區光圖樣的圖樣區和 ΒΒ - - ^ b 7 遠感光基板的非圖樣區以上述照 明早70所射出的光來曝光， 工"―、、 其特徵4於包括： ·= f ^…’其可在移動*支持複數個照明罝元； 第 二动邰’其可驅使感光基板一 向相對移動丨 · ° '° ^ 万 第一驅動部，其可定位各個照明 位並驅使各個昭明簞亓、儿 μ ^ Ύ 心· U…、月早兀沿不同於第一方向的第二方向移 動，及 | —驅動控制部，其控制第二驅動部，使複數個照明單元 个致互相干涉。 2. 如申請專利範圍第1項之周邊曝光裝置，其中，驅 動控制部將複數個才目_肖明單元之間的⑮離控制在既定的 距離範圍以上。 3. 如申請專利範圍第}項之周邊曝光裝置，其中，驅 動控制部可在使罔複數個照明單元中其中一部份照明單元 所射出的光來曝光感光基板的非圖樣區眭，使盆 單元不會和上述的照明單元產生干涉的情況。八餘… 4. 一種周邊曝光裴置，具有複數個含有光源及集光光儀 學系統的照明單=其感光基板上有曝光圖樣的圖樣區和 太曝光圖樣的該感光基板的非圖樣 -Sixth, the scope of patent application " a ^ ------------- Department of the first system: = light; has a plurality of non-L pattern areas containing light sources and tender non-exposure patterns light pattern area and Β --^ b 7 The non-patterned area of the far-sensitive substrate is exposed with the light emitted by the above-mentioned illumination 70, and its features include the following: · = f ^… 'It can be moved * Supports multiple Illumination unit; the second movement is that it can drive the photosensitive substrate to move relative to each other. °°°° The first drive unit can position each illumination position and drive each Zhaoming 箪 亓, er μ ^ Ύ heart U ... , Yuezaowu moves in a second direction different from the first direction, and the drive control section controls the second drive section to cause the plurality of lighting units to interfere with each other. 2. For the peripheral exposure device according to item 1 of the scope of patent application, wherein the drive control unit controls the separation between the plurality of talents_Xiao Ming units above a predetermined distance range. 3. For example, the peripheral exposure device of the scope of application for a patent, wherein the drive control section can expose the non-patterned area of the photosensitive substrate to the light emitted by a part of the plurality of illumination units to expose the non-pattern area of the photosensitive substrate. The unit does not interfere with the lighting unit described above. More than eight ... 4. A peripheral exposure device with a plurality of illumination sheets containing a light source and a concentrator system = the photosensitive substrate has a pattern area with an exposure pattern and a non-pattern of the photosensitive substrate with a too-exposed pattern- 明覃元所射史的光來曝光， _ 2177-3574-P.ptd 第28頁 495835 六、申請專利範圍 其特徵在於包括： 光量檢測裝置，其可檢測發射自上述各個照明輩元的 光強度；及 移動速度測定裝置，其在上述各個照明單元和感光基 f相對移動以曝光感光基板上之非圖樣區時，根據上述光 ^檢測裝置所檢測之照明單元中最低的光強度來設定各個 …、月單元和感光基板的相對移動速度° 與/ 5· 一種周邊曝光裝置，具有複數個含有光源及集光光 學系統的照明單元，其感光基板上有曝光圖樣的圖樣區和 不曝光圖樣的非圖樣區’該感光基板的非圖樣區以上述昭 明單元所射出的光來曝光， …、 其特徵在於包括： 明F ί 5 Γ小楚更裝置’其月各自獨立變更上述複數個照 明凌置所射出的光束大小。 置，V;曱5寻：範f第1: 2、3、4或5項之周邊曝光裝 之感光面約略垂直相交的旋轉，可繞者和感先基板 數個照明單元之間的距離隨著感=感光基板，而且，複 而進行的改變可和上述旋棘興動板上非圖樣區的排列 進行。 ’°•知轉驅動感光基板同時 一半如申請專利範圍第5項之周、# Η 一f具有旋轉驅動部，苴可妗邊曝光裝置，其中，進 相父的旋轉軸旋 ς 凡，σ感光基板之感光面垂直 月义置所射出之光束大各自獨立k更上述複 <馬作可和上述旋轉驅動Ming Qin Yuan's historical light exposure, _ 2177-3574-P.ptd page 28 495835 6. The scope of the patent application is characterized by including: a light amount detection device that can detect the light intensity emitted from each of the above lighting generations And a moving speed measuring device, which sets each of the lighting units and the photosensitive base f relative to expose a non-patterned area on the photosensitive substrate according to the lowest light intensity among the lighting units detected by the light detection device ... The relative moving speed of the moon unit and the photosensitive substrate ° and / 5 · A peripheral exposure device having a plurality of lighting units containing a light source and a light collecting optical system, the photosensitive substrate has a pattern area of an exposure pattern and a non-exposed pattern Pattern area 'The non-pattern area of the photosensitive substrate is exposed with the light emitted by the above-mentioned Zhaoming unit, ..., and is characterized by including: Ming F ί 5 Γ Xiao Chugeng', each of which independently changes the aforementioned plurality of illumination units The size of the emitted beam. Set, V; 曱 5 seek: Fan f item 1: The rotation of the photosensitive surface of the peripheral exposure device of item 2, 2, 3, 4 or 5 approximately perpendicularly intersects, and the distance between the light unit and the several lighting units of the sensor substrate varies with Touching = photosensitive substrate, and repeated changes can be made with the arrangement of non-patterned areas on the spinner spinner plate. '° • Know the rotation of the photosensitive substrate at the same time as half of the week of the scope of the patent application, # Η a f has a rotation drive section, which can be equipped with an exposure device, where the rotation axis of the father is rotated, where σ is sensitive The light beams emitted by the light-sensitive surface of the substrate are perpendicular to each other. The above-mentioned complex < Ma Zuoke and the above-mentioned rotation drive 2177-3574-P.ptd 第29員; 495835 六、申請專利範圍 部旋轉驅動感光基板同時進行。 8. —種周邊曝光裝置，具有複數個含有光源及集光光 學系統的照明輩元，其感光基板上有曝光圖樣的圖樣區和 I. 不曝光圖樣的非圖樣區，該感光基板的非圖樣區以上述照 P 明簟元之光射出部所射岀的光來曝光， I、 其特徵在於包括： 遮光裝置，設置於複數個照明單元和感光基板間相對 ‘ 移動的路徑近，其用來防止光射出部所射出的光照射在 I 感光基板上不想被照射到的部位。 I 9. 如申請專利範圍第8項之周邊曝光裝置，其中，上 丨 述遮光裝置被設置成可和感光基板相對移動，並可針對需 t 要來設定照明單元和感光基板之間的相對位置。2177-3574-P.ptd 29th member; 495835 6. Scope of application for patents The rotation of the photosensitive substrate is performed simultaneously. 8. A peripheral exposure device having a plurality of illumination generations including a light source and a light collecting optical system, and a photosensitive substrate has a pattern area of an exposure pattern and I. A non-pattern area of an unexposed pattern, a non-pattern of the photosensitive substrate The area is exposed by the light emitted by the light emitting part of the above-mentioned light source. I. It is characterized by comprising: a light-shielding device, which is arranged near a relatively 'moving path' between a plurality of lighting units and a photosensitive substrate, and is used for Prevent the light emitted from the light emitting part from irradiating the part on the I photosensitive substrate that is not intended to be irradiated. I 9. If the peripheral exposure device according to item 8 of the scope of patent application, wherein the above-mentioned light shielding device is set to be relatively movable with the photosensitive substrate, and the relative position between the lighting unit and the photosensitive substrate can be set according to needs . 2177-3574-P.ptd 第30頁2177-3574-P.ptd Page 30