經濟部智慧財產局w工消费合作社印製 4^906 五、發明說明（l ) 【發明的背景】 本發明涉及對液晶顯示裝置（以下將液晶飆示器裝置 簡記為「LCD」）等使用的基板進行處理劑塗敷的旋轉革 及塗敷裝置和塗敷方法》 以前，在LCD制造工序中，為了在用於LCD玻璃基板 等被處理基板上塗敷抗蝕樹脂液等處理劑，採用了在基板 高速旋轉狀態時，向基板的中心滴下處理劑的旋轉塗敷方 式的旋轉型塗敷裝置。 第12圖是典型的旋轉型塗敷裝置的平面圖，第13圖是 同一塗敷裝置的垂直斷面圖》如第12圈和第13圈所示，在 以前的旋轉型塗敷裝置上，圓板狀的旋轉卡盤201在LCD 用玻璃基板G(以下「LCD用玻璃基板」簡稱為「基板」） 下面的中央部將基板吸附固定。該基板和旋轉卡盤201被 收納進作為容器的旋轉革CP内，然後，將蓋202蓋在旋轉 罩CP的上部》 利用這個旋轉型塗敷裝置，在基板G上塗敷處理劑的 時候，蓋的升降機構203的升降臂204將旋轉罩CP的蓋202 抬起’使旋轉罩上部開放，基板G在旋轉狀態下，溶制滴 下，表面全部被浸潤，而後處理劑從抗蝕樹脂液噴嘴205 滴在基板G的中心附近，在離心力的作用下，處理劑擴散 到基板G的整個表面。而後，蓋202降下，將旋轉罩密閉 ’基板G高速旋轉，多餘的溶剤和處理劑在離心力的作用 下被甩掉’在基板G的表面形成處理劑薄膜。 旋轉罩内的内罩（圖中省略）和蓋202的下、面設置的内 本紙張尺度適用中國國家標準<CNS)A4規格（210 X 297公；St > 4 {請先閲讀背面之/ρϋ項h寫本Ϊ "裝·！！！訂，！ 線^1 經濟部智慧財產局員工消費合作枝印¾ A7 —__B7___ .五、發明說明（2 ) 蓋（囷中省略）與旋轉卡盤201、基板G—起旋轉，因此，雖 然矩形基板G旋轉，但旋轉革CP和上蓋在密閉空間内不會 形成棄亂氣流。 因此，如第13圓所示’在旋轉罩CP和上蓋形成的密 閉空間内被固定的基板G，旋轉時，僅受到從表面中心向 外緣方向的離心力作用》另一方面，由於在旋轉罩CP的 周圍設置了圖中未表示的開口，此開口和供給旋轉型塗敷 裝置本效200的負壓相連接，形成從旋轉革CP内側向外側 流動的氣流。因此，高速旋轉的基板G在離心力的作用下 ’大部分被甩掉飛出的溶劑和處理劑同氣流一起從旋轉革 CP内側流向外側，從旋轉革CP的外側排出 【發明概要】 可是旋轉罩CP的底面和基板G的下表面間留有間隙。 這個間隙是為了防止基板G下表面被溶劑和處理劑污染而 設置的’為防止下表面被污染，必須保持一定尺寸以上的 間隙。如果這個間隙過大，氣流進入這個間陈，溶劑和處 理剤會附著於基板G下表面。如果處理劑附著於基板G下 表面，將使在基板G上形成的塗膜厚度在後績處理工序中 發生變化，使產品成品率降低，進而使制造成本上升，因 此，有必要維持適當大小的間隙。 但是，由於基板G是很薄的玻璃板，旋轉卡盤201支 撐的僅是中央部分，因此產生撓度，越靠近基板G的外周 緣’和旋轉罩CP底面的間隙越小，維持一定的這個間隙 是非常困難的問題特別是對畫面大型化的要求增強的現 本紙張尺度適用中困國家標準<CNS>A4規格（210 X 297公a ) — — — — — — — — — — — — — —— — — — — I— ·11111111 (請先《讀背面之注$項再填寫本頁> j ^ 6 9 Q R _B7 五、發明說明（3 ) 今’對更大型的基板G需求增加，因此有必要盡早解決這 個問題。 本發明就是為解決這個問題。即，本發明能夠使基板 和旋轉革底面保持一定的間隙，防止基板表面形成的塗膜 膜厚產生不良現象，本發明以提供這樣的旋轉罩：塗敷裝 置和塗敷方法為目的。 為解決上述問題，申請專利範圍第1項記述的旋轉罩 具有設置了和旋轉卡盤外周緣相鄰接開口部的中空圓盤狀 的底面部；具有從上述底面部的外周緣向回轉轴方向延長 設置的側面部；具有在上述底面部和固定在上述旋轉卡盤 上的基板之間保持一定間陈的裝置。 申請專利範圍第2項記述的旋轉革即申請專利範圍第1 項記述的旋轉罩，以上述間陈為0.2〜0.5mm為特點。 申請專利範团第3項記述的旋轉罩具有設置了和旋轉 卡盤的外周緣相鄰接開口部的中空®盤狀底面部：從上述 底面外周緣向回轉轴方向延伸設置的側面部；從上述底面 部有一定高度的突出部的，在固定於上述旋轉卡盤上的被 處理基板的外周緣部相對應的上述底面部的位置配置的支撐銷。 經濟部智慧財產局員工消費合作社印製 申請專利範团第4項記述的旋轉革既是申請專利範圍第3 項記述的旋轉罩，其特定為上述支撐銷的高度為0.2〜0.5mm。 申請專利範圍第5項記述的塗敷裝置具有固定被處理 基板的旋轉卡盤；設置了和上述旋轉卡盤外周緣相鄰接開 口部的中空圓盤狀底面部；從上述底面部的外周緣向回轉 轴方向延伸設置的側面部；在上述底面部和固定在上述旋 本紙張尺度適用中因國家標準<CNS〉A4规格（210 * 297公釐〉 6 經濟部智慧財產局貝工消費合作狂印-¾ Α7 __Β7____五、發明說明（4 ) 轉卡盤上的被處理基板間保持一定間陈的裝置的回轉罩；向上 述被處理基板上供給處理劑的裝置；開閉上述旋轉罩的裝置。 申請專利範圍第6項記述的塗敷裝置即申請專利範圍 第5項記述的塗敷裝置，具有上述間隙為0.2〜0.5mm的特點》 申請專利範圍第7項記述的塗敷裝置具有固定被處理 基板的旋轉卡盤：在上述旋轉卡盤的外周緣部位置設置有 開口部的中空囿盤狀底面部：從上述底面部的外周緣向回 轉轴方向延伸設置的側面部；從上述底面部突出一定高度 突出部的在相對固定於上述旋轉卡盤的被處理基板的外周 緣部的上述底面部的位置配置支撐銷的回轉革；具有向上 述被處理基板上供給處理劑的裝置；開閉上述旋轉罩的裝置。 申請專利範圍第8項記述的塗敷裝置即申請專利範圍第7項 記述的塗敷裝置，具有上述支樓销高0.2〜0.5mm的特點。 申請專利範圍第1或2項記述的旋轉革由於具備在上述 底面部和固定於上述旋轉卡盤的被處理基板間保持一定間 隙的裝置，可經常保持旋轉革底面和被處理基板間間陈一 定，能夠防止被處理基板下側由於黏附處理劑造成膜厚不良。 申請專利範園第3或4項記述的旋轉卡盤，在固定於旋 轉卡盤上的被處理基板的外周緣部相對的上述底面部的位 置’由於設置了與上述底面部有確定高度的突出部的支擇 銷，因此’可經常保持旋轉革底面和被處理基板間間陈一 定，防止被處理基板下側由於黏附處理劑造成膜厚不良。 申請專利範圜第5或6項記述的塗敷裝置，由於具備在 上述底面部和被固定於旋轉卡盤上的被處理基板間保持— 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公31) _ ------- - - — I— · I I I ----·1111111· <請先閲讀背面之沒意事項再填寫本萸) A7 4 2 6 ^ π ^_B7 五、發明說明（5 ) 定間隙的裝置，可經常保持旋轉罩底面和被處理基板間間 隙一定，防止被處理基板下側由於黏附處理劑造成膜厚不良。 申請專利範圍第7或8項記述的塗敷裝置，由於在固定 於上述旋轉卡盤的被處理基板的外周緣相對的上述底面部 的位置，設置了從底面部具有一定高度的突出部的支撐銷 ，因此可經常保持旋轉革底面和被處理基板間間隙一定， 防止被處理基板下側由於黏附處理劑造成膜厚不良。 【發明的實施方式】 以下，通過圈示對本發明的實施方式作詳細說明： (第一實施方式） 第1圖是與本發明實施方式相關的一塗敷•顯像裝置 的斜視圊，第2圊為其平面圈》 在塗敷•顯像裝置1的_端設有基板箱平台C/S"在塗 敷•顯像裝置1的另一端，設置了與曝光裝置EXP之間傳 遞LCD用玻璃基板G(以下將「LCD用玻璃基板」簡記為「 基板」）的接口單元I/F。 在這個基板箱平台C/S上設置了可存放多枚LCD用基 板等基板G的基板箱2,例如放置4個基板箱2。在基板箱 平台C/S的基板箱2的正面處，設置了搬運作為被處理基板 的基板G及調整、固定基板G位置的主搬送機械手3，以及 與主搬送機械手3之間傳送基板G的輔助搬送機械手4。 在接口單元I/F處，為了和曝光裝置EXP間傳送基板G ，設有輔助搬送機械手5。並且在接口單元I/F處，為了與 主搬送機械手3之間傳送基板G，設置了擴充平台部6及基 衣紙張又度適用中囷囡家標準<CNS)A4蜆格（210*297公* ) <請先閲讀背面之注$ ο! --線 經濟部智慧时產局員工消f合作社印製 8 C-- 經濟部智慧財產局員工消費合作.杜印製 A7 B7 五、發明說明（6 ) 板G處於待機狀態用的緩衝單元7。 主搬送機械手3可以在塗敷•顯像裝置1的中央部長邊 方向移動，三台主搬送機械手3串聯佈置，在各主搬送機 械手3的搬運通道兩側分別設有第1處理單元群A，第2處 理單元群B，及第3處理單元群C。在第1處理單元群A和第 2處理單元群B之間，設有暫時存放基板G同時兼冷卻裝置 的冷卻單元C0L2，同樣，在第2處理單元群B和第3處理 Q 單元群C之間設有存放並冷卻基板G的冷卻處理單元C0L5 在第1處理單元群A，基板箱平台C/S的旁邊，並列設 置了兩台清洗基板G的清洗處理單元SCR。另外，隔著主 搬送機械手3的搬運通道，在清洗處理單元SCR的對面， 相鄰設有上下兩層佈置的熱處理單元HP1、HP1 ;和上下 兩層佈置的紫外線處理單元UV及冷卻單元C0L1 » 在第2處理單元群B，設有進行抗蝕樹脂液塗敷處理 及邊緣除淨處理的塗敷處理單元CT/ER。另外，隔著主搬 送機械手3的搬運通道，塗敷處理單元CT/RT的對面，設 有相鄰的上下2層佈置的對基板G進行疏水性處理的黏著 性處理單元AD及冷卻處理單元C0L3 ;上下兩層佈置的熱 處理單元HP2及冷卻單元C0L3 ;和上下兩層佈置的2組加 熱處理單元HP2'HP2。當加熱處理單元HP和冷卻處理單 元COL按上下兩層佈置時，採用熱處理單元HP在上，冷 卻處理單元COL在下的佈置方式，可以避免相互間的熱干 棱。從而實現更加准確的溫度控制》 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 9 ------------裝！----訂---------線 ί請先閲讀背面之注意事項再填寫本頁) A7 B7 經濟部智慧財產局貝工消費合作社印製 五、發明說明（7 ) 在主搬送機械手3上分別設置有X轴驅動機構、Y轴駆 動機構及以Z軸為中心旋轉的旋轉驅動機構。主搬送機械 手3沿著塗敷•顯像裝置1的中央通道行走，並在各處理單 元之間傳送基板G。主搬送機械手3將處理前的基板G送入 各處理單元内，並將處理後的基板G從各處理單元運出。 該實施方式的塗敷•顯像裝置集各種處理裝置於一體 ，從而實現了節省空間，提高處理效率的目的。 下面，就基板G在該塗敷•顯像裝置1中的處理礪序 加以說明。第3圖是表示本實施方式的塗敷•顯像裝置1的 處理順序的流程圈。 在如上述搆成的塗敷•顯像裝置1中，利用困中未表 示的裝載/卸載機L/UL，將水平存放若干枚基板G的基板 箱2載運至基板箱平台C/S上，並固定。（步驟1) 而後，啟動此塗敷顯像裝置1，首先利用輔助搬送機 械手4及主搬送機械手3將基板箱2内的基板G運入紫外線 處理單元UV内，進行紫外線照射處理。經紫外線照射處 理後的基板G由主搬送機械手3從紫外線處理單元UV搬運 到冷卻單元C0L1内，在此進行冷卻達到指定溫度》(步驟 2) 完成冷卻後的基板G，由主搬送機械手3運進清洗處 理單元SCR内，進行清洗處理（步驟3) 而後，基板G經熱處理單元HP1加熱處理（脫水處理） 後，送入冷卻單元C0L2進行冷卻（步驟4) 基板G經主搬送機械手3從冷卻單元COL2運入疏水性 閲 讀 背 面 之 注 項 η I 1 I I I I I訂 本纸張尺度適用中固困家標準（CNS)A4規格（210 X 297公釐） 10 € 經濟部智慧財產局員工消費合作社印製 _B7_ 五、發明說明（8 ) 處理單元AD，進行疏水性處理。通過該工序提高抗蝕樹 脂液的黏著性。而後，通過主搬送機械手3，基板G被運 送至冷卻單元COL進行冷卻（步驟5) 然後，主搬送機械手3將其搬入塗敷處理單元CT/ER 進行抗蝕樹脂液塗敷，隨後進行邊緣除淨處理。（步驟6) 而後，基板G被主搬送機械手3運送至加熱處理單元 HP2,進行前期烘烤處理》又通過主搬送機械手3將其運 至冷卻單元C0L4進行冷卻後（步驟7)，經主搬送機械手3 、擴充平台部6及接口單元I/F(步驟8)運送基板G到曝光裝 置EXP，按確定的圖形曝光。 之後，被曝光的基板G再次經接口單元I/F運進裝置1 中，運進標號打印器TL，在此被添寫上標號》(步驟9) 而後，主搬送機械手3將其運到顯像處理單元DEV進 行顯像處理（步驟10)。 隨後，經主搬送機械手3運送至加熱處理單元HP3， 進行後期烘烤處理。之後，基板G經主搬送機械手3進入 冷卻單元COL5進行冷卻（步驟11)。 完成冷卻後的基板G，順序經由處理單元群B的主搬 送機械手3、冷卻單元COL2、處理單元群A的主搬送機械 手3及輔助搬送機械手4進行運送，再次被收納進基板箱平 台C/S上指定基板箱2中（步驟12) » 下面，對和本實施方式相關的塗敷處理單元（CT/ER) 加以說明。 第4圖、第5囷、第6圊分別為與本實施方式相關的塗 本紙張尺度適用中國國家標準（CNS)A4规格（210 X 297公釐） 11 A7 42^9〇6 五、發明說明（9 ) 敷處理單元(CT/ER)的平面圓、垂直斷面圖和斜視圖》 如第4圊所示，在此塗敷處理單元（CT/ER)内，相鄰佈 置有作為抗蝕樹脂液塗敷裝置的塗敷罩20和邊緣除淨器60 〇 其中，塗敷革20為向經過清洗等前期階段處理的基板 G表面塗敷抗蝕樹脂液等處理劑的裝置，邊緣除淨器60是 對在塗敷革20内表面形成抗蝕樹脂膜的基板G，對其不需 要塗敷抗蝕樹脂液的外周緣部和背面的抗蝕樹脂膜進行洗 淨清除的裝置《在塗敷罩20和邊緣除淨器60之間設置了搬 運裝置，在搬運裝置的軌道61上，裝有可在61上移動的搬 運機械手62,用於完成塗敷罩20和邊緣除淨器60之間基板 G的搬運工作。 下面，對塗敷罩20周邊情況加以說明《 第7圈表示的是本實施方式中塗敷罩20的蓋22在打開 狀態時的平面圖》覃内佈置有旋轉卡盤23，在旋轉卡盤23 的真空吸附作用下，基板G處於固定保持狀態，在驅動馬 達25的回轉驅動力作用下旋轉。 經濟部智慧財產局員工消費合作杜印製 驅動馬達25通過由皮帶和皮帶輪構成的驅動機構26向 回轉轴27傳遞回轉驅動力，回轉轴27通過升降軀動裝置28 的驅動，可沿升降導槽32在ffi中的上下方向移動》 如第5明所示，在塗敷抗蝕樹脂液時，旋轉卡盤23下 降至低於旋轉罩CP上端的位置。另一方面，基板G從旋轉 罩20搬出、搬入時，即旋轉卡盤23和主搬送機械手4之間 傳遞基板G時，升降驅動裝置28將回轉轴27和旋轉卡盤23 12 本纸張尺度適用中困因家標準（CNS)A4規格（210 X 297公釐> 經濟部智慧財產局MT工消f合作社印製 A7 ____B7 ____ 五、發明說明（10 ) 向上方抬起’旋轉卡盤23變換至高出旋轉罩CP上端的位 置。 向基板G喷塗抗蝕樹脂液的抗蝕樹脂液喷嘴57，通過 抗蝕樹脂液喷嘴掃描臂55’被固定安裝在旋轉機構56上， 以支點56a為中心，可以在水平方向旋轉，進出塗敷革本 體21的中心附近。 在抗蝕樹脂液喷嘴57上安裝有抗蝕樹脂液管（圖中省 略）’從圓中未表示的抗蝕樹脂液供給機構，通過抗蝕樹 脂液管向喷嘴57供給抗蝕樹脂液。 在塗敷革20中，設有對基板G進行塗敷處理時，可蓋 在塗敷罩本體21上部開口部的蓋22,這個蓋22由挾持部41 挾持。 如第4圖和第5圖所示，挾持部41由從前端挾持蓋22的 兩根機械臂4 la、41a，和在這兩根機械臂41a、41 a之間設 置並連接這兩根機械臂41a、4 la的連接部41b、41b組成。 挾持部41的根部，即挾持蓋一側的相反側，伸入蓋升 降器42内，通過後述的蓋升降器内配置的蓋升降機構，沿 上下方向移動蓋22。 蓋升降器42佈置在除淨器60的相反方向。 如第4囷所示，蓋升降機構42的正面，即面向塗敷革 本體21—側，在垂直方向設置了相互平行延伸溝槽42a、42a ，通過此溝槽42a、42a，挾持部41的根部從蓋升降器42的 正面延伸進蓋升降器42的内部。 如第4圃、第6圖所示，在挾持部41根部，設置了在挾 本纸張尺度適用中國國家標準（CNS>A4規格（210 * 297公釐） 13 — — — — — — — — I— «—— — — Ill klll — 11— — <請先Μ讀背面之注意事項再填寫本I> Α7 m____ 五、發明說明（11 ) 持部41的兩根機械臂41a、41a各自的外側，沿圊中上下方 向延伸的直線狀突起件41c、41c ’突起件41c、41c可以各 自沿圖中的上下方向，配置在蓋升降器42側面的外殼42、 42的内側面的導軌43、43移動。這樣，挾持部41可以沿導 軌43、43在垂直方向上下移動· 如第5圖所示，為了使挾持部41在垂直方向上下移動 ，在挾持部41的下側配置了氣缸44 »這個氣缸44穿過底板 24，氣缸44下部近一半伸出底板24的下側》 導桿45從此氣缸44上部進出，此導桿45上部固定於挾 持部41上。另一面，導禪45下部固定在氣缸44中的在氣壓 作用下上下移動的活塞上》(圖中省略） 下面，就本實施方式中的旋轉罩CP加以說明。 第8圖是和本實施方式相關的旋轉革CP安裝部位放大 的垂直斷面®，第9圈是和本實施方式相關的旋轉革CP的 底部表面附近的放大垂直斷面圖。 如第8圓所示，本實施方式的旋轉罩CP底部配有若干 個支撐銪70、70…。 經濟部智慧时產局MK工消費合作钍印製 這些支撐銷70、70…配置在吸附固定於旋轉卡盤23上 的基板G外周緣的下側，用於從下方支撐基板G外周緣由 於重力向下產生的彆曲。 如第7圖所示，這些支撐銷70、70…配置在被吸附固 定於旋轉卡盤23上的基板G外周緣，更准確地說是在其四 角和各邊中點附近的8點位置上，所有支撐銷沿吸附固定 在旋轉卡盤23上的基板G的外周蝝内側配置，並形成一個 14 本·紙張尺度適用中國國家標準（CNS>A4規格（210 X 297公釐〉 五、發明說明（12) A7 B7___ 矩形。 如第9圖所示，支撐銷70頂部的直徑比下面胴體部分 要大，垂直斷面呈大寫字母「T」字形，其頂部從旋轉革 CP底面穿出。吸附在旋轉卡盤23上的基板(5外周緣的下表 面正好和支撐銷70、70…的頂部表面相接觸，起到托持作 用。 因此，頂部高度等於h的支撐銷70可以維持吸附在旋 轉卡盤23上基板G的下表面和旋轉革CP上表面間的間陳》 如第9圖所示’其頂部高度h最好等於旋轉卡盤23上表 面和旋轉革CP底部上表面的高差h。由於基板G的中心附 近和外周緣附近均保持了相等的至旋轉箪CP底部上面h的 距離，因此可使基板G保持水平，並使基板g的下表面和 旋轉革CP底部上表面之間保持一定的間隔。 這些支撐銷70頂部的高度h，是不使含有處理劑、溶 劑等氣流流入基板G下表面和旋轉革CP内側底面之間的距 離，同時’也是不使處理劑、溶劑等黏連在基板G下表面 和旋轉罩CP的内側底面之間的距離。 這些支撐銷70頂部高度h具醴的值，即設計事項是由 旋轉罩CP的形狀、基板的尺寸、厚度、材質、旋轉速度 、塗敷溫度等塗敷條件決定的值，不能一概而論。 但是，如果單獨舉例，例如本實施方式中的旋轉革CP 上的支撐銷70頂部的高度h值最好在0.2〜0.5mm範圍内。 在此，頂部高度h的上限值定為0.5mm，是由於如果 超過這個值，會產生抗蝕樹脂液附著在背面的問題。 未紙張尺度適用中國困家標準（CNS)A4規格（210 X 297公釐） ------------1 ·1111111 ^ ------I - (請先闓讀背面之注意事項再填寫本頁> 經濟部智慧財產局貝工消费合作.社印焚 15 五 426s 06 A7 B7 發明說明（I3 另一方面’頂部高度h的下限值定為0.2mm，是因為 如果低於該值，當旋轉罩使用樹脂材料時，安裝時容易產 生破損’或基板G和旋轉革CP相碰等一系列問題》 下面參照下述觀察評價結果表，對上述情況加以說明 表一 1Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 4 ^ 906 V. Description of the Invention (l) [Background of the Invention] The present invention relates to the use of liquid crystal display devices (hereinafter referred to as "LCD") Rotary leather for applying a treatment agent to a substrate, a coating device, and a coating method "Previously, in the LCD manufacturing process, in order to apply a treatment agent such as a resist resin solution to a substrate to be processed, such as an LCD glass substrate, When the substrate is rotating at a high speed, a spin coating system of a spin coating method in which a processing agent is dropped onto the center of the substrate. Figure 12 is a plan view of a typical rotary coating device, and Figure 13 is a vertical cross-sectional view of the same coating device. As shown in circles 12 and 13, on the conventional rotary coating device, The plate-shaped spin chuck 201 sucks and fixes a substrate at a center portion below a glass substrate G for LCD (hereinafter referred to as "glass substrate for LCD"). The substrate and the spin chuck 201 are accommodated in a rotary leather CP as a container, and then a cover 202 is placed on the upper part of the spin cover CP. With this rotary coating device, when a treatment agent is applied to the substrate G, the cover The lifting arm 204 of the lifting mechanism 203 lifts the cover 202 of the rotating cover CP to open the upper part of the rotating cover, and the substrate G is melted and dripped in the rotating state, the surface is completely wetted, and the post-processing agent is removed from the resist resin nozzle 205 The drops are near the center of the substrate G, and the treatment agent diffuses to the entire surface of the substrate G under the effect of centrifugal force. Then, the cover 202 is lowered, and the rotary cover is closed. The substrate G is rotated at a high speed, and the excess solvent and the processing agent are removed by the centrifugal force. A processing agent film is formed on the surface of the substrate G. The inner cover (not shown in the figure) inside the rotating cover and the inner paper size set on the bottom and face of the cover 202 are applicable to the Chinese National Standard < CNS) A4 size (210 X 297 male; St > 4 {Please read the back / ρϋ Item h script Ϊ " Equipped !!!!! Order ,! Line ^ 1 Consumption cooperation of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ¾ A7 —__ B7___. V. Description of the invention (2) Cover (omitted in 囷) and rotating card The disk 201 and the substrate G rotate together. Therefore, although the rectangular substrate G rotates, the rotating leather CP and the upper cover do not form a discarded airflow in the closed space. Therefore, as shown in the 13th circle, 'the rotation cover CP and the upper cover are formed. The substrate G fixed in the enclosed space is only subjected to centrifugal force from the center of the surface to the outer edge during rotation. On the other hand, since an opening (not shown) is provided around the rotation cover CP, this opening and supply The rotary coating device is connected to the negative pressure of this effect 200 to form an air flow flowing from the inside of the rotating leather CP to the outside. Therefore, the substrate G that rotates at a high speed is' mostly thrown off by the flying solvent and processed by the centrifugal force. Agent rotates with airflow The inside of the leather CP flows to the outside and is discharged from the outside of the rotating leather CP. [Summary of the Invention] However, a gap is left between the bottom surface of the rotating cover CP and the lower surface of the substrate G. This gap is to prevent the lower surface of the substrate G from being contaminated by solvents and processing agents. In order to prevent the lower surface from being contaminated, a gap of a certain size or more must be maintained. If the gap is too large, the airflow enters this space, and the solvent and processing dust will adhere to the lower surface of the substrate G. If the treatment agent is attached to the lower surface of the substrate G The thickness of the coating film formed on the substrate G will be changed in the post-processing process, which will reduce the product yield and further increase the manufacturing cost. Therefore, it is necessary to maintain a gap of an appropriate size. However, because the substrate G is very The thin glass plate supports only the central part of the spin chuck 201, so deflection occurs. The closer to the outer periphery of the substrate G and the bottom surface of the spin cover CP, the more difficult it is to maintain a certain gap, especially The current paper standard with enhanced requirements for larger screens applies the national standard < CNS > A4 specification (210 X 297 malea) — — — — — — — — — — — — — — — — — — I— · 11111111 (Please read the note on the back of the page before filling in this page> j ^ 6 9 QR _B7 V. Description of the invention (3 ) Today, the demand for larger substrates G is increasing, so it is necessary to solve this problem as soon as possible. The present invention is to solve this problem. That is, the present invention can maintain a certain gap between the substrate and the bottom surface of the rotating leather, and prevent the coating on the substrate surface from forming. The present invention aims to provide such a rotary cover: a coating device and a coating method. The rotary cover described in the first item of the scope of patent application has an outer periphery provided with a rotary chuck in order to solve the above-mentioned problems. A hollow disk-shaped bottom surface portion adjacent to the opening portion; a side surface portion extending from the outer peripheral edge of the bottom surface portion in the direction of the rotation axis; having a space between the bottom surface portion and a substrate fixed to the spin chuck Certainly Chen's installation. The rotary leather described in the second patent application scope, that is, the rotary cover described in the first patent application scope, is characterized by the above-mentioned interval of 0.2 to 0.5 mm. The rotating hood described in item 3 of the patent application group has a hollow® disc-shaped bottom surface portion provided with an opening adjacent to the outer peripheral edge of the spin chuck: a side portion extending from the outer peripheral edge of the bottom surface in the direction of the rotation axis; If the bottom surface portion has a protrusion having a certain height, a support pin is disposed at a position of the bottom surface portion corresponding to an outer peripheral edge portion of a substrate to be processed fixed to the spin chuck. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The rotating leather described in item 4 of the Patent Application Group is a rotating cover described in item 3 of the scope of patent application, and the height of the support pin is 0.2 ~ 0.5mm. The coating device described in claim 5 includes a rotary chuck for fixing a substrate to be processed; a hollow disk-shaped bottom surface portion adjacent to an opening portion adjacent to an outer peripheral edge of the rotary chuck; and an outer peripheral edge from the bottom surface portion. The side part extending in the direction of the rotation axis; the above-mentioned bottom part and fixed to the above-mentioned scroll paper are applicable due to the national standard < CNS> A4 specification (210 * 297 mm> 6) Intellectual Property Bureau of the Ministry of Economic Affairs狂 印 -¾ Α7 __Β7 ____ V. Description of the invention (4) Rotary hood of a device that maintains a certain period of time between the substrates on the turntable; a device for supplying a treatment agent to the substrate to be processed; The coating device described in item 6 of the scope of patent application is the coating device described in item 5 of the scope of patent application, and has the characteristics of the aforementioned gap of 0.2 to 0.5 mm. Spin chuck of substrate to be processed: a hollow pan-shaped bottom surface provided with an opening at an outer peripheral edge portion of the spin chuck: turning from the outer peripheral edge of the bottom surface A side portion extending in a direction; a revolving leather in which a supporting pin is disposed at a position of the bottom surface portion which is relatively fixed to an outer peripheral edge portion of a substrate to be processed of the spin chuck protruding from the bottom surface portion by a certain height; A device for supplying a processing agent on a processing substrate; a device for opening and closing the rotary cover. The coating device described in item 8 of the patent application scope is the coating device described in item 7 of the patent scope, and has the above-mentioned pin height of 0.2 to 0.5 mm. The rotary leather described in item 1 or 2 of the patent application scope is provided with a device for maintaining a certain gap between the bottom surface and the substrate to be processed fixed to the rotary chuck, so that the bottom surface of the rotary leather and the substrate to be processed can always be maintained. If the time is fixed, it is possible to prevent the film thickness failure caused by the adhesion of the treatment agent on the lower side of the substrate to be processed. The spin chuck described in the patent application park item 3 or 4 is located on the outer periphery of the substrate to be processed fixed to the spin chuck The position of the above-mentioned bottom surface portion is opposed to the position of the bottom surface portion. Maintain a certain interval between the bottom surface of the rotating leather and the substrate to be treated to prevent poor film thickness due to the adhesion of the treatment agent on the underside of the substrate. Because the coating device described in item 5 or 6 of the patent application is provided on the bottom surface and Retained between the processed substrates fixed on the spin chuck — This paper size applies to China National Standard (CNS) A4 (210 X 297 male 31) _ -------------I-- · III- -· 1111111 · < Please read the unintentional items on the back before filling in this note) A7 4 2 6 ^ π ^ _B7 V. Description of the invention (5) The device with a fixed gap can often keep the bottom surface of the rotating cover and the substrate to be processed The gap is constant to prevent the film thickness failure caused by the adhesion treatment agent under the substrate to be processed. The coating device described in the seventh or eighth aspect of the patent application has a support provided with a protrusion having a certain height from the bottom surface at the position of the bottom surface opposite to the bottom surface of the processed substrate fixed to the spin chuck. The pin can always keep a constant gap between the bottom surface of the rotating leather and the substrate to be processed, and prevent the film thickness from being poor due to the adhesion of the processing agent on the lower side of the substrate. [Embodiment of the Invention] Hereinafter, the embodiment of the present invention will be described in detail by circle: (First Embodiment) FIG. 1 is a squint view of a coating and developing device according to an embodiment of the present invention, and FIG.圊 It's flat circle "A substrate box platform C / S is provided at the _ end of the coating and developing device 1" On the other end of the coating and developing device 1, a glass for LCD is transferred between the coating and developing device EXP and the exposure device EXP Interface unit I / F of the substrate G (hereinafter, the "glass substrate for LCD" is abbreviated as "substrate"). The substrate box platform C / S is provided with a substrate box 2 capable of storing a plurality of substrates G such as LCD substrates. For example, four substrate boxes 2 are placed. On the front surface of the substrate box 2 of the substrate box platform C / S, a main transfer robot 3 for transferring the substrate G as a substrate to be processed, adjusting and fixing the position of the substrate G, and transferring the substrate to and from the main transfer robot 3 are provided. G's auxiliary transport robot 4. At the interface unit I / F, an auxiliary transfer robot 5 is provided for transferring the substrate G to and from the exposure device EXP. In addition, at the interface unit I / F, in order to transfer the substrate G to and from the main transfer robot 3, the expansion platform 6 and the base paper are set to apply the Zhongjia standard < CNS) A4 grid again (210 * 297 males *) < Please read the note on the back of the page. $ Ο!-Printed by the staff of the Ministry of Economic Affairs and the Intellectual Property Bureau of the Ministry of Economic Cooperation, printed by the cooperative 8 C-the consumer cooperation of the staff of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by A7 B7 V. Description of the invention (6) The buffer unit 7 for the board G in a standby state. The main transfer robot 3 can be moved in the direction of the center of the coating and developing device 1. The three main transfer robots 3 are arranged in series, and the first processing units are provided on both sides of the transfer channel of each main transfer robot 3. Group A, second processing unit group B, and third processing unit group C. Between the first processing unit group A and the second processing unit group B, a cooling unit C0L2 that temporarily stores the substrate G and serves as a cooling device is provided. Similarly, between the second processing unit group B and the third processing Q unit group C, There is a cooling processing unit C0L5 that stores and cools the substrate G between the first processing unit group A and the substrate box platform C / S. Two cleaning processing units SCR for cleaning the substrate G are arranged in parallel. In addition, the heat treatment unit HP1 and HP1 arranged on the upper and lower floors are arranged adjacent to the cleaning processing unit SCR across the conveying path of the main transfer robot 3; and the ultraviolet processing unit UV and the cooling unit C0L1 arranged on the upper and lower floors are adjacent to each other. »The second processing unit group B is provided with a coating processing unit CT / ER that performs a resist resin liquid coating process and an edge cleaning process. In addition, across the conveying path of the main transfer robot 3, opposite to the coating processing unit CT / RT, there are an adhering processing unit AD and a cooling processing unit for performing a hydrophobic treatment on the substrate G, which are arranged in two adjacent upper and lower layers. C0L3; heat treatment unit HP2 and cooling unit C0L3 arranged on the upper and lower floors; and two groups of heat treatment units HP2'HP2 arranged on the upper and lower floors. When the heat treatment unit HP and the cooling treatment unit COL are arranged in two layers, the heat treatment unit HP is placed on the upper side and the cooling treatment unit COL is placed on the lower side, so as to avoid mutual thermal dry edges. Therefore, more accurate temperature control is achieved. ”This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 9 ------------ install! ---- Order --------- line, please read the notes on the back before filling out this page) A7 B7 Printed by the Shellfish Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (7) In the main The transport robot 3 is provided with an X-axis drive mechanism, a Y-axis swing mechanism, and a rotation drive mechanism that rotates around the Z-axis. The main transfer robot 3 travels along the center passage of the coating and developing apparatus 1 and transfers the substrate G between the processing units. The main transfer robot 3 sends the substrate G before processing into each processing unit, and carries out the processed substrate G from each processing unit. The coating and developing device of this embodiment integrates various processing devices into one body, thereby achieving the goals of saving space and improving processing efficiency. Next, the processing procedure of the substrate G in the coating and developing device 1 will be described. Fig. 3 is a flowchart showing a processing procedure of the coating / developing device 1 according to the present embodiment. In the coating / developing device 1 configured as described above, a substrate box 2 in which a plurality of substrates G are horizontally stored is carried on a substrate box platform C / S by a loader / unloader L / UL (not shown). And fixed. (Step 1) Then, the coating and developing device 1 is activated. First, the auxiliary transfer robot 4 and the main transfer robot 3 are used to carry the substrate G in the substrate box 2 into the ultraviolet processing unit UV to perform ultraviolet irradiation treatment. The substrate G processed by the ultraviolet irradiation is transferred from the ultraviolet processing unit UV to the cooling unit C0L1 by the main transfer robot 3, and is cooled down to the specified temperature here (step 2) After the substrate G is cooled, the main transfer robot 3 into the cleaning processing unit SCR for cleaning processing (step 3), and then the substrate G is heated (dehydrated) by the heat treatment unit HP1, and then sent to the cooling unit C0L2 for cooling (step 4). The substrate G is passed through the main transfer robot 3 Shipped from the cooling unit COL2 into the hydrophobic reading Note η I 1 IIIII The paper size applies to the CNS A4 specification (210 X 297 mm) 10 € Consumption by employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the cooperative _B7_ 5. Description of the invention (8) The processing unit AD performs hydrophobic treatment. This step improves the adhesion of the resist resin. Then, the substrate G is transferred to the cooling unit COL for cooling by the main transfer robot 3 (step 5). Then, the main transfer robot 3 transfers the substrate G to the coating processing unit CT / ER to apply the resist resin solution, and then Edge cleaning. (Step 6) Then, the substrate G is transported to the heating processing unit HP2 by the main transfer robot 3 for pre-baking processing. Then, the substrate G is transported to the cooling unit C0L4 by the main transfer robot 3 for cooling (step 7). The main transfer robot 3, the expansion platform section 6, and the interface unit I / F (step 8) transport the substrate G to the exposure device EXP, and expose it according to the determined pattern. After that, the exposed substrate G is transported into the device 1 again through the interface unit I / F, and is transported into the label printer TL, where the label "" is added (step 9), and then the main transfer robot 3 transports it to The development processing unit DEV performs development processing (step 10). Subsequently, it is transported to the heat processing unit HP3 via the main transfer robot 3 for post-baking processing. Thereafter, the substrate G enters the cooling unit COL5 via the main transfer robot 3 and is cooled (step 11). After cooling, the substrate G is sequentially transported through the main transfer robot 3 of the processing unit group B, the cooling unit COL2, and the main transfer robot 3 and the auxiliary transfer robot 4 of the processing unit group A, and is again stored in the substrate box platform. Designating Substrate Box 2 on C / S (Step 12) »Next, the coating processing unit (CT / ER) related to this embodiment will be described. Figure 4, Figure 5 and Figure 6 are the sizes of the coated paper related to this embodiment, applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 11 A7 42 ^ 9〇6 Description of the invention (9) Plane circle, vertical cross-sectional view, and oblique view of the coating processing unit (CT / ER) "As shown in Figure 4), the coating processing unit (CT / ER) is adjacently arranged as a resist The coating cover 20 and the edge cleaner 60 of the resin liquid coating device. The coating leather 20 is a device for applying a treatment agent such as a resist resin liquid to the surface of the substrate G that has been processed at a preliminary stage such as cleaning. The device 60 is a device for cleaning and removing the resist resin film on the substrate G on which the resist resin film is formed on the inner surface of the coated leather 20, and on the outer peripheral portion and the back surface where the resist resin solution does not need to be applied. A conveying device is provided between the application cover 20 and the edge cleaner 60. On the rail 61 of the conveying device, a conveying robot 62 that is movable on the 61 is provided to complete the application cover 20 and the edge cleaner 60. Transfer work between substrates G. Next, the surroundings of the coating hood 20 will be described. "The seventh circle shows a plan view of the cover 22 of the coating hood 20 in the opened state in this embodiment." The spin chuck 23 is arranged inside the The substrate G is held in a fixed state under the action of vacuum suction, and is rotated by the rotation driving force of the drive motor 25. The consumer property cooperation of the Intellectual Property Bureau of the Ministry of Economic Affairs Du printed drive motor 25 transmits the rotary driving force to the rotary shaft 27 through a drive mechanism 26 composed of a belt and a pulley. The rotary shaft 27 is driven by the lifting body 28 and can move along the lifting guide groove. 32 Moving up and down in ffi "As shown in Fig. 5, when the resist resin liquid is applied, the spin chuck 23 is lowered to a position lower than the upper end of the spin cover CP. On the other hand, when the substrate G is carried out from the spin cover 20, that is, when the substrate G is transferred between the spin chuck 23 and the main transfer robot 4, the elevating drive device 28 moves the rotary shaft 27 and the spin chuck 23 12 sheets The standard applies to the Standard for Affordable Homework (CNS) A4 (210 X 297 mm) & printed by the Ministry of Economic Affairs and Intellectual Property Bureau, MT Industrial Consumers Cooperatives, printed A7 ____B7 ____ 5. Description of the invention (10) Lift up the 'rotary chuck 23 is changed to a position higher than the upper end of the rotation cover CP. A resist resin nozzle 57 for spraying a resist resin on the substrate G is fixedly mounted on the rotation mechanism 56 by the resist resin nozzle scanning arm 55 ', and the fulcrum 56a is used. As the center, it can be rotated in the horizontal direction to enter and exit near the center of the coated leather body 21. A resist resin liquid pipe (omitted from the figure) is mounted on the resist resin nozzle 57. A resist resin liquid not shown in the circle The supply mechanism supplies the resist resin liquid to the nozzle 57 through the resist resin liquid pipe. The coating leather 20 is provided with a cover 22 that can cover the upper opening portion of the coating cover body 21 when coating the substrate G. This cover 22 is held by the holding portion 41. As shown in FIGS. 4 and 5, the holding portion 41 includes two robot arms 41 a and 41 a that hold the cover 22 from the front end, and the two robot arms are provided and connected between the two robot arms 41 a and 41 a. 41a and 41a are composed of connecting portions 41b and 41b. The root of the holding portion 41, that is, the side opposite to the side of the holding cover, projects into the cover lifter 42 and passes the cover lifting mechanism arranged in the cover lifter to be described later along the top and bottom. The cover 22 is moved in the direction. The cover lifter 42 is disposed in the opposite direction of the cleaner 60. As shown in FIG. 4 (a), the front surface of the cover lifter mechanism 42, that is, the side facing the coated leather body 21, is arranged parallel to each other in the vertical direction. The grooves 42a and 42a are extended, and through the grooves 42a and 42a, the root of the holding portion 41 extends from the front surface of the cover lifter 42 into the inside of the cover lifter 42. As shown in FIG. 4 and FIG. 41 roots, set in accordance with the Chinese paper standard (CNS > A4 specification (210 * 297 mm)) in the paper size 13 — — — — — — — — I — «—— — — Ill klll — 11 — — < Please read the notes on the back before filling in this I > Α7 m____ 5. Description of the invention ( 11) The linear projections 41c and 41c extending in the up and down direction of the outer sides of the two robot arms 41a and 41a of the holding portion 41 can be arranged in the up and down direction of the cover, respectively. The guide rails 43 and 43 on the inner side of the housing 42 and 42 on the side of the device 42 are moved. In this way, the holding portion 41 can be moved up and down in the vertical direction along the guide rails 43 and 43. As shown in FIG. 5, in order to make the holding portion 41 in the vertical direction Moving up and down, the air cylinder 44 is arranged below the holding part 41. »This air cylinder 44 passes through the bottom plate 24, and the lower half of the air cylinder 44 protrudes from the lower side of the bottom plate 24.> The guide rod 45 enters and exits from the upper portion of the air cylinder 44 and the upper portion of the guide rod 45. It is fixed to the holding part 41. On the other hand, the lower part of the guide 45 is fixed to a piston that moves up and down under the action of air pressure in the cylinder 44 (omitted in the figure). Next, the rotation cover CP in this embodiment will be described. Fig. 8 is an enlarged vertical cross-section view ® of the rotary leather CP mounting portion according to the present embodiment, and circle 9 is an enlarged vertical cross-sectional view near the bottom surface of the rotary leather CP according to the present embodiment. As indicated by the eighth circle, a plurality of support cymbals 70, 70,... MK industrial and consumer cooperation of the Ministry of Economic Affairs, the Ministry of Economic Affairs, and the production of these supporting pins 70, 70, etc. are arranged on the lower side of the outer periphery of the substrate G that is fixed to the spin chuck 23 to support the outer periphery of the substrate G from below due to gravity A different song produced downwards. As shown in FIG. 7, these support pins 70, 70... Are arranged on the outer periphery of the substrate G which is sucked and fixed on the spin chuck 23, more precisely, at 8 points near its four corners and the midpoint of each side. All the supporting pins are arranged along the inside of the outer periphery of the substrate G which is fixed and fixed on the spin chuck 23, and form a 14 paper. The paper size applies the Chinese national standard (CNS > A4 specification (210 X 297 mm). V. Invention Explanation (12) A7 B7___ Rectangle. As shown in Figure 9, the diameter of the top of the support pin 70 is larger than the lower carcass, and the vertical section is a capital "T" shape. The top of the support pin 70 penetrates from the bottom surface of the rotating leather CP. The substrate on the spin chuck 23 (the lower surface of the 5 outer periphery is in contact with the top surfaces of the support pins 70, 70 ...), so it plays a supporting role. Therefore, the support pin 70 with the top height equal to h can maintain the adsorption on the rotation The interval between the lower surface of the substrate G on the chuck 23 and the upper surface of the rotating leather CP is shown in FIG. 9 'The top height h is preferably equal to the height difference between the upper surface of the rotating chuck 23 and the bottom upper surface of the rotating leather CP. h. Since the center and periphery of the substrate G An equal distance from the top of the bottom of the rotating 箪 CP is maintained in the vicinity, so that the substrate G can be kept horizontal, and a certain distance can be maintained between the lower surface of the substrate g and the upper surface of the bottom of the rotating leather CP. Top of these support pins 70 The height h is the distance between the lower surface of the substrate G and the bottom surface of the inner surface of the rotating leather CP, which does not allow the air containing the treatment agent and the solvent to flow into the bottom surface of the rotary leather CP. The distance between the inner and bottom surfaces of the CP. The height h of the top of these support pins 70 has a value, that is, the design matters are the coating conditions such as the shape of the spin cover CP, the size, thickness, material, rotation speed, and coating temperature of the cover. The determined values cannot be generalized. However, if a separate example is used, for example, the height h of the top of the support pin 70 on the rotary leather CP in this embodiment is preferably in the range of 0.2 to 0.5 mm. Here, the height of the top height h The limit value is set to 0.5mm, because if it exceeds this value, the problem that the resist resin liquid adheres to the back will occur. For the paper size, China Standard (CNS) A4 (210 X 297) ) ------------ 1 · 1111111 ^ ------ I-(Please read the precautions on the back before filling out this page>> Intellectual Property Bureau, Ministry of Economic Affairs, Shellfish Consumer Cooperation. She Yini 15 May 426s 06 A7 B7 Description of the invention (I3 On the other hand, the lower limit of the top height h is set to 0.2mm, because if it is lower than this value, when the resin material is used for the rotating cover, it is easy to be damaged during installation. "Or a series of problems such as the collision of the substrate G and the rotating leather CP" The following is a description of the above results with reference to the table of observation and evaluation results Table 1 1
間隔(閟陈)單位mm 流向背面的氣流 因和革接觸而產生的污染 4 NG 無 2 NG 無 1 有少量 無 0.6 有少量 無 0.5 無 無 0.2 無 無 0.1 無 NG (請先wtl背面之注$項再本頁) 訂： 經濟#智慧財產局具工消费合作社印製 如果頂部高度h的下限在0.2mm以下時，會產生和軍 的接觸污染，如果頂部高度h的上限在0.5mm以上時，雖 然沒有和箪的接觸污染，但是塗敦液會隨氣流流向基板背 面》 因此’支樓销70頂部的高度h的值最好在0.2〜0.5mm 範圍以内。 當安放基板G時，按上述方法設計的本實施方式中的 旋轉箪CP，設置了支撐在對應基板G下表®外周緣位置的 支撐銷70、70·"，由於該支撐銷的頂部具有上述的適當高 度，基板G和旋轉罩CP底面之間可形成適當距離h的間隙 。因此，基板G能夠在塗敷革20内保持基本水平狀態，基 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 16Interval (閟 陈) Unit mm Contamination caused by airflow to the back due to contact with leather 4 NG No 2 NG No 1 With a small amount No 0.6 With a small amount 0.5 No No 0.2 No No 0.1 No NG (Please note on the back of wtl $ Item is printed on this page) Order: Printed by Economic # 智 财产 局 局 工 工 合作 合 社 If the lower limit of the top height h is below 0.2mm, contact pollution with the army will occur. If the upper limit of the top height h is above 0.5mm, Although there is no contamination by contact with thorium, the coating liquid will flow to the back of the substrate with the air flow. Therefore, the value of the height h of the top of the branch pin 70 is preferably within the range of 0.2 to 0.5 mm. When the substrate G is placed, the rotating 箪 CP in this embodiment, which is designed as described above, is provided with support pins 70, 70, " supported on the outer peripheral position of the corresponding bottom surface of the substrate G. Since the top of the support pin has At the above-mentioned appropriate height, a gap of an appropriate distance h can be formed between the substrate G and the bottom surface of the rotation cover CP. Therefore, the substrate G can be maintained in a substantially horizontal state within the coated leather 20, and the basic paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 16
C -線 A7 B7 經濟部智慧財產局貝工消费合作钍印« 五、發明說明（14 ) 板G的下表面和旋轉革CP底面之間保持非接觸狀態。從而 防止了溶劑或抗蝕樹脂液進入基板G的下表面和旋轉革CP 底面形成的空間内，及溶劑和抗蝕樹脂液的液滴黏連在基 板G的下表面和旋轉罩CP底面之間。 另外，由於這個間隙選擇了適當的距離h，防止了含 有溶劑和抗蝕樹脂液等的氣流進入此間隙。所以防止了基 板G的下表面因附著抗蝕樹脂液而引起的膜厚不良因素。 下面，對上述構成的LCD用玻璃基板的塗敷·顯像裝 置的動作順序給以說明。 當存放有基板G的基板箱2被放置於本實施方式的塗 敷•顯像裝置的基板箱平台C/S上後，投入電源，啟動塗 敷•顯像裝置，於是輔助搬送機械手5取出基板箱2中收納 的基板G，轉遞給主搬送機械手4。接過基板G的主搬送機 械手4在軌道上移動，經過刷洗、高壓喷射清洗單元SCR 、加熱單元HP、黏著性處理單元AD、冷卻單元COL等， 在塗敷抗蝕樹脂液工序前的處理單元内，進行必要的處理 。一連串必要處理完成後，主搬送機械手4將基板G從處 理單元内取出，沿執道移動，送入塗敷處理單元（CT/ER) 的塗敷罩20内。 塗敷革20對應主搬送機械手4的動作，抬起蓋22,敞 開塗敷罩本體21的上部運載基板G的主搬送機械手4由 開放的塗敷箪本體21的上部和抬起的蓋22之間進入，將基 板G轉遞到露出於塗敷罩本體21上部的旋轉卡盤23上面。 接過基板G的旋轉卡盤23在位於表面中心處開口部29的負 本紙張尺度適用中®國家標準（CNS)A4規格（210 * 297公釐> 17 — — — —1 — — — — — — —— —— — — — — I—^PJ*— — — — — 11— {請先閱讀背面之}i意事項再填寫本霣) ^ 9 0 6 A7 _ B7 經濟部智慧財產局員工消费合作社印製 五、發明說明（15) 壓作用下’將基板G吸附固定。保持這種狀態的旋轉卡盤 23沿垂直方向下降，將基板G收進塗敷革本體21中》 如第8圊所示，當旋轉卡盤23下降至最低位置時，旋 轉卡盤23的上部處於比旋轉罩Cp底面稍微高出的狀態。 此時旋轉卡盤23上表面和旋轉箪CP底面的高度差為h， 如第9圊所示。 另外，如第7圈所示，旋轉罩CP的底面配有若干個支 撐銷70 ' 70“·。當旋轉卡盤23下降至最低位置時，這些支 撐銷70、70…支撐在吸附於旋轉卡盤23上基板G的外周緣 位置’並沿外周緣形成長方形。並且，這些支撐銷70、70 …如第8圏、第9圊所示，其頂部直徑比胴體部分大，具有 厚度h的頂部在旋轉罩CP底面的上方。 因此，基板G的中心附近由旋轉卡盤23托持並保持由 旋轉罩CP底面向上的h高度，基板G的外周緣附近由支撐 銷70、70·“支撐並保持由旋轉革CP底面向上的h高度，從 而保証整個基板G維持水平狀態並保持從旋轉革CP底面向 上的h高度。按照上述動作，基板G便被安放固定在如第8 圖、第9圈所示狀態的塗敷罩20内。 將基板G安放固定在塗敷箪20内後，旋轉機構56開始 動作，抗蝕樹脂液喷嘴掃描臂55移動，將抗蝕樹脂液喷嘴 57移動至固定在旋轉卡盤23上的基板G近乎中心的位置。 為滴下溶劑，在抗蝕樹脂液喷嘴57上並列設置了稀釋 劑喷嘴（圊中省略）。稀釋劑喷嘴在抗蝕樹脂液滴下之前將 溶射滴落在基板G表面，溪潤（預濕潤）基板G，其目的是 本紙張尺度適用中困团家標準（CNS)A4規格（210 X 297公« ) 18 (請先Mtt背面之注意寧項再本頁) .¾.. 訂·· -線C-line A7 B7 Seal of the co-consumer of the Intellectual Property Department of the Intellectual Property Bureau of the Ministry of Economic Affairs «V. Description of the invention (14) The bottom surface of the plate G and the bottom surface of the rotating leather CP are kept in a non-contact state. Thus, the solvent or the resist resin liquid is prevented from entering the space formed by the lower surface of the substrate G and the bottom surface of the rotary leather CP, and the droplets of the solvent and the resist resin liquid are stuck between the lower surface of the substrate G and the bottom surface of the rotary cover CP. . In addition, since an appropriate distance h is selected for this gap, an airflow containing a solvent, a resist resin liquid, etc. is prevented from entering the gap. Therefore, the film thickness failure caused by the adhesion of the resist resin liquid to the lower surface of the substrate G is prevented. The operation sequence of the coating / developing device for the LCD glass substrate having the above-mentioned configuration will be described below. After the substrate box 2 in which the substrate G is stored is placed on the substrate box platform C / S of the coating / developing device of this embodiment, the power is turned on to start the coating / developing device, and the auxiliary transfer robot 5 is then taken out. The substrate G stored in the substrate box 2 is transferred to the main transfer robot 4. The main transfer robot 4 that has received the substrate G moves on the track, and passes through the brushing, the high-pressure jet cleaning unit SCR, the heating unit HP, the adhesive processing unit AD, the cooling unit COL, and the like, and the processing before the step of applying the resist resin solution. In the unit, perform necessary processing. After a series of necessary processing is completed, the main transfer robot 4 removes the substrate G from the processing unit, moves along the lane, and feeds it into the coating cover 20 of the coating processing unit (CT / ER). The coating leather 20 lifts the cover 22 in response to the movement of the main transfer robot 4, and the main transfer robot 4 carrying the substrate G on the upper part of the coating cover body 21 is opened. The upper part of the open coating body 21 and the lifted cover are opened. It enters between 22, and transfers the board | substrate G to the upper surface of the spin chuck 23 exposed to the upper part of the coating cover main body 21. The negative chuck paper 23 of the spin chuck 23 that has received the substrate G is located at the center of the surface. The national paper (CNS) A4 specification (210 * 297 mm > 17) — — — — 1 — — — — — — —— —— — — — — I— ^ PJ * — — — — — 11 — {Please read the notice on the back} and then fill out this 霣) ^ 9 0 6 A7 _ B7 Staff of Intellectual Property Office, Ministry of Economic Affairs Printed by the consumer cooperative V. Description of the invention (15) The substrate G is adsorbed and fixed under pressure. The spin chuck 23 maintained in this state is lowered vertically, and the substrate G is accommodated in the coated leather body 21. As shown in FIG. 8 (a), when the spin chuck 23 is lowered to the lowest position, the upper part of the spin chuck 23 is lowered. It is slightly higher than the bottom surface of the rotating cover Cp. At this time, the height difference between the top surface of the spin chuck 23 and the bottom surface of the spin 箪 CP is h, as shown in Fig. 9 圊. In addition, as shown in the seventh circle, the bottom surface of the spin cover CP is provided with a plurality of support pins 70 '70 ". When the spin chuck 23 is lowered to the lowest position, these support pins 70, 70, ... are supported on the spin card. The outer peripheral position of the substrate G on the disc 23 is formed into a rectangle along the outer peripheral edge. Moreover, as shown in Figs. 8 and 9, these support pins 70, 70 have a top diameter larger than that of the carcass, and have a top having a thickness h. It is above the bottom surface of the rotating cover CP. Therefore, the center of the substrate G is supported and held by the rotating chuck 23 at the height h from the bottom surface of the rotating cover CP, and the outer periphery of the substrate G is supported and supported by the support pins 70, 70 · " The height h from the bottom surface of the rotating leather CP is maintained upward, so that the entire substrate G is maintained in a horizontal state and the height h from the bottom surface of the rotating leather CP is maintained upward. According to the above operation, the substrate G is placed and fixed in the coating cover 20 in a state shown in Figs. 8 and 9. After the substrate G is placed and fixed in the coating roller 20, the rotation mechanism 56 starts to operate, the resist resin nozzle scanning arm 55 moves, and the resist resin nozzle 57 is moved to the substrate G fixed on the spin chuck 23 near the center. s position. In order to drip the solvent, a thinner nozzle (omitted in 圊) is provided in parallel on the resist resin nozzle 57. The thinner nozzle drops the solvent spray on the surface of the substrate G before the dripping of the resist resin liquid, and the substrate is wetted (pre-wetted). The purpose is to apply the standard CNS A4 (210 X 297) «) 18 (please pay attention to Ning Xiang on the back of Mtt first, then this page).
C A7 B7 經濟部智慧財產局"K工消费合作，社印製 五、發明說明（16 ) 為了促進將要滴落下的抗蝕樹脂液的擴散溶劑滴在回轉 的基板G上擴散濕潤後，一定量的抗蝕樹脂液由抗蝕樹脂 液喷嘴57滴下。在抗蝕樹脂液滴下時，最好暫時停止基板 G的轉動。如果在基板G旋轉時滴下抗蝕樹脂液，由於基 板上留有上述溶劑，會使抗蝕樹脂液飛散的範圍擴大。因 而停止基板G的轉動，能夠抑制霧狀抗蝕樹脂液等的飛減 現象，從而提高基板G的成品率•並且也能夠抑制抗蝕樹 脂液向基板G背面方向流動。 而後，使蓋22下降並蓋住塗敷革本體21的上部，封閉 塗敷罩本體21。 而後，旋轉卡盤23和旋轉罩CP在指定時間内高速旋 轉，剛剛滴下的抗蝕樹脂液擴散到整個基板G表面，同時 多餘的抗蝕樹脂液被甩掉，基板G上形成很薄的抗蝕樹脂 薄膜。 當旋轉卡盤23高速旋轉時，在離心力的作用下，溶劑 和抗蝕樹脂液等飛濺起來，在由蓋22和旋轉罩CP組成的 塗敷罩20的内部空間内形成飄浮著溶劑蒸汽、溶劑液滴及 抗蝕樹脂液的懸浮小顆粒等。此外，由於長方形基板G的 旋轉，在塗敷罩20的内部空間產生有氣流》 此時，本實施方式中的旋轉罩CP的底面對應固定基 板G外周緣的位置，設置有支撐銷70、70···，由於這些支 撐銷70、70…頂部的高度，保持了基板G外周緣與旋轉革 底面的高度h。基板G和停止於最低位置、上表面高出旋 轉革CP h高度的旋轉卡盤23相接觸，形成基板G和旋轉罩 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 19 — — — — — — — — — — —— — ·1111111 ·11111111 <請先鬩讀背面之注f項再填寫本I) 經濟部智慧財產局員工消费合作社印製 4269〇q Α7 Β7 _五、發明說明（17 ) CP底面間距h的間陈。 這個間距h對於流入旋轉氣流距離過小，而對於溶劑 或抗蝕樹脂液附著在基板G下表面和旋轉罩CP底面距離又 過大β 因此，阻止了由於基板G旋轉而產生的氣流進入基板 G下表面和旋轉革CP底面組成的空間内，而造成的抗蝕樹 脂液附著在基板G下表面，以及防止了由於基板G和旋轉 罩CP底面組成的空間内溶劑或抗蝕樹脂液滴之間的結合 ，造成抗蝕樹脂液附著於基板G下表面。 此時基板G下表面的干燥狀態處於既使將基板G固定 於旋轉卡盤23或邊緣除淨器60上，其接觸部分也不會殘存 拷貝痕跡* 如果採用本實施方式的塗敷處理裝置，當基板G固定 在塗敷罩20内時，對應基板G下表面外周緣部位置設置了 支撐銷70 ' 70…，由於這些支撐銷的頂部具備上述適當高 度h，使基板G和旋轉革CP底面間形成正確距離h的間隙》 因此使得基板G在塗敷革内保持基本水平，基板G下表面 與旋轉革CP底面保持非接觸狀態。其效果，防止了溶劑 和抗蝕樹脂液進入基板G下表面和旋轉革CP底面之間，也 防止了基板G和旋轉罩CP底面之間的溶劑、抗蝕樹脂液液 滴的黏連結合。 另外，由於選擇了恰當間隙寬度h，防止了含有溶劑 和抗蝕樹脂液的氣流進入這個間隙。其效果防止了由於抗 蝕樹脂液附著在基板G下表面引起的膜厚不良現象。 (請先《讀背面之注意事項再 .裝___ 本頁) 訂_ · •線C A7 B7 Intellectual Property Bureau of the Ministry of Economic Affairs " K-Industrial Cooperation Co., Ltd. Printed by the V. Invention Description (16) In order to promote the diffusion of the solvent of the resist resin to be dripped, the solvent must be diffused and wet on the rotating substrate G. An amount of the resist resin liquid was dropped from the resist resin liquid nozzle 57. When the resist liquid drops, it is preferable to stop the rotation of the substrate G temporarily. If the resist resin solution is dripped while the substrate G is rotating, the above-mentioned solvent remains on the substrate, and the range in which the resist resin solution is scattered will be enlarged. Therefore, stopping the rotation of the substrate G can suppress the flying-off phenomenon of the mist-like resist resin solution, thereby improving the yield of the substrate G • It is also possible to suppress the flow of the resist resin liquid to the back surface of the substrate G. Then, the cover 22 is lowered to cover the upper part of the coating leather body 21, and the coating cover body 21 is closed. Then, the spin chuck 23 and the spin cover CP rotate at a high speed within a specified time, and the resist resin liquid just dropped diffuses to the entire surface of the substrate G, and at the same time, the excess resist resin liquid is thrown away, and a thin resist is formed on the substrate G. Etching resin film. When the spin chuck 23 rotates at a high speed, under the action of centrifugal force, the solvent and the resist resin liquid splash, and the solvent vapor and the solvent float in the inner space of the coating cover 20 composed of the cover 22 and the rotating cover CP. Liquid droplets and small suspended particles of resist resin solution. In addition, air flow is generated in the inner space of the coating cover 20 due to the rotation of the rectangular substrate G. At this time, the bottom surface of the rotation cover CP in this embodiment corresponds to the position of the outer peripheral edge of the fixed substrate G, and support pins 70 and 70 are provided. The height h of the top of these support pins 70, 70 ... keeps the height h of the outer peripheral edge of the substrate G and the bottom surface of the rotating leather. The base plate G is in contact with the spin chuck 23 which is stopped at the lowest position and the upper surface is higher than the height of the rotary leather CP h to form the base plate G and the spin cover. The paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm). 19 — — — — — — — — — — — — · 1111111 · 11111111 < Please read the note f on the back before filling out this I) Printed by the Intellectual Property Bureau Staff Consumer Cooperative of the Ministry of Economic Affairs 4269〇 Α7 Β7 _ V. Description of the invention (17) The interval between CP bottom surface distance h. This distance h is too small for the inflowing rotating airflow, and too large for the solvent or resist resin solution to adhere to the lower surface of the substrate G and the bottom surface of the rotating cover CP. Therefore, the airflow generated by the rotation of the substrate G is prevented from entering the lower surface of the substrate G. In the space composed of the bottom surface of the rotating leather CP, the resist resin liquid adheres to the lower surface of the substrate G, and the bonding between the solvent or the resist resin droplets in the space composed of the substrate G and the bottom surface of the rotation cover CP is prevented. , Causing the resist resin liquid to adhere to the lower surface of the substrate G. At this time, the dry state of the lower surface of the substrate G is such that even if the substrate G is fixed on the spin chuck 23 or the edge cleaner 60, no copy marks remain on the contact portion thereof. * If the coating processing apparatus of this embodiment is used, When the substrate G is fixed in the coating cover 20, support pins 70 '70 ... are provided at positions corresponding to the outer peripheral edge portion of the lower surface of the substrate G. Since the tops of these support pins are provided with the above-mentioned appropriate height h, the bottom surface of the substrate G and the rotating leather CP A gap of the correct distance h is formed between them. Therefore, the substrate G is kept substantially horizontal in the coated leather, and the lower surface of the substrate G and the bottom surface of the rotating leather CP are kept in a non-contact state. This prevents the solvent and the resist resin liquid from entering between the lower surface of the substrate G and the bottom surface of the rotary leather CP, and also prevents the solvent and the resist resin liquid droplets from adhering and bonding between the substrate G and the bottom surface of the rotary cover CP. In addition, since an appropriate gap width h is selected, an airflow containing a solvent and a resist resin liquid is prevented from entering this gap. This effect prevents a film thickness failure caused by the adhesion of the corrosion-resistant resin liquid to the lower surface of the substrate G. (Please read the “Precautions on the back side. Install ___ page”) Order _ · • Line
C 本纸張尺度適用中國國家標準（CNS)A4规格（210 X 297公蜚） 20 經濟部智慧財產局員工消费合作社印製 A7 _B7_ 五、發明說明（18 ) 下面，對本發明的其它實施方式進行說明》 第10(a)圖為支撐銷支撐在固定的基板G外周緣的位置 佈置圖"根据該佈置圖，佈置於基板G4角的支撐銷70a， 距基板G邊緣圖中的橫向距離為XI，例如70mm ± 10mm， 縱向距離為Y1，例如70mm±10mm的位置。支撑銷70b距 基板G邊緣圖中橫向為X2，例如25mm± 10mm的位置。他 們之間的距離關系是按X12X2設定佈置的》這是由於基 板G旋轉時，離基板中心最遠的位置，即基板G的4角塗敷 液容易集中，與其它佈置位置相比，流向基板G背面的影 響要大。 進_步，由於支撐銷70a比其它點佈置的位置更靠近 基板G的中心，如第10(b)圖所示，基板G的撓曲量大於其 它佈置點*這個撓曲董由上述表一1所知，所定間隔Ga設 定在0.2〜0.5mm範圍内β 因此，可以防止含有溶劑和抗蝕樹脂液等的氣流進入 這個間隙。其效果防止了由於抗蝕樹脂液黏附在基板G下 表面而引起的膜厚不良現象的發生》再有，由於其它點和 4角的支撐銷間隔不同，可以防止空氣流向基板四角背面 ，進一步防止因抗蝕樹脂液附著在基板G下表面而引起的 膜厚不良現象的發生。 下面對另一本發明的其它實施方式進行說明。 第11(a)圖為支撐在固定的基板G外周緣位置代替支撐 銷的土堤狀例如由材質為特氟隆制成的支撐部170的設置 圖。如第11(b)圖所示，由於設置的基板G背面的支撐部170 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公a ) 21 -----------. I ! I I I 訂.--- <請先Μ讀背面之注意事項再填寫本頁) 4 2 6 9 〇 6 a? _Β7 _ 五、發明說明（19 ) ’抑制了塗敷液向支撐部170内侧的基板背面的侵入。 另外，作為支撐部Π0的其它實施方式，如第n(c)圈 所示，支撐部170與基板G的接觸方式為線接觸，接觸部 形狀為銳角的物艘•採用這樣的方式，能夠進一步防止拷 貝現象的產生。 另外，本發明不僅限於本實施方式。 例如，在上述實施方式中，是以對LCD用玻璃基板塗 敷抗蝕樹脂液的塗數裝置為例進行說明的，毫無疑問，在 對半導體晶《基板塗敷抗蝕樹脂液的塗敷裝置上同樣也適 用。 如上所述，本發明由於採用了保持上述旋轉革底面和 固定在上述旋轉卡盤上的被處理基板之間具有_定間隙距 離的裝置，使旋轉革底面和被處理基板之間始终保持一定 間隙，從而防止附著在被處理基板下面的處理劑引起的塗 膜膜厚的不良現象· 經濟部暫慧財產局員工消費合作社印製 本發明，由於在上述旋轉罩底面設置了對應於固定在 上述旋轉卡盤上的被處理基板外周緣處的支撐銷，該支撐 銷從旋轉罩底部向上具有一定高度，因此，可始终保持旋 轉罩底面和被處理基板之間的一定間隙，防止被處理基板 下側面由於附著處理劑而引起的塗膜膜厚不良現象。 本發明由於採用了保持上述旋轉罩底面和固定在上述 旋轉卡盤上的被處理基板之間具有一定間陈距離的裝置’ 使旋轉革底面和被處理基板之間始终保持一定Μ陈，從而 防止由於處理劑附著在被處理基板下面而引起的塗膜的膜 22 本紙張尺度適用中國國家棵準（CNS)A4癥格（210297公釐） A7 B7 五、發明說明（20) 厚不良現象。 本發明，由於在上述旋轉箪底面設置了對應於固定在 上述旋轉卡盤上的被處理基板外周緣處的支撐鏑’該支撐 銷從旋轉革底部向上具有一定高度，因此，可始終保持旋 轉罩底面和被處理基板之間的一定間隙，防止被處理基板 下側面由於附著處理劑而引起的塗膜膜厚不良現象* 【圓式說明】 第1圊是本發明實施方式中的LCD用玻璃基板的塗敷•顯 像裝置的斜視圖。 第2圖是本發明實施方式中的LCD用玻璃基板的塗敷•顯 像裝置的平面圖 第3圓是本發明實施方式中的塗敷·顯像裝置的處理工序 順序的流程圖 第4圖是本發明實施方式中的塗数處理單元的平面困 第5圖是本發明實施方式中的塗敷處理單元的垂直斷面圓 第6圖是本發明實施方式中的塗敷處理單元的斜視围 第7圖是本發明實施方式中的塗敷處理單元的部分平面放 大圖 第8圖是本發明實施方式中的塗敷處理單元的垂直斷面的 部分放大圖 第9圖是本發明實施方式中的塗敷處理單元的部分平面放 大圖 第10(a)圖是本發明其它實施方式中的支撐銷佈置圓。 第10(b)圖是第10(a)圖的支撐銷的部分斷面圖。 本紙張尺度適用中國0家棵單<CNS)A4规格（210 * 297公釐） -------------裝 i I (請先Η讀背面之注$項再填寫本頁) 訂- --線 經濟部智ft財產局具工消费合作社印製 23 1 4 2 6 y。〇 a? _ B7 五、發明說明（21 ) 第11 (a)囷是本發明其它實施方式中的支推部斜視圖。 笫11(b)圈是第11(a)圈的支撐部的部分斷面围。 第11 (c)圖是第11 (b)圖的其它實施方式的支撐部的部分斷 面圊。 第12圖是原有塗敷處理單元的部分平面放大囷。 第13圈是原有塗敷單元的垂直斷面田。 【符號說明】 20···塗敷罩 21…塗敷箪本體 22…蓋 23…旋轉卡盤 CP···旋轉革 G…基板 70…支撐銷 V if I I ϋ n «1 n « I (請先閲讀背面之注意事項再填寫本頁)C This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 gong) 20 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _B7_ V. Description of the Invention (18) Next, other embodiments of the present invention will be carried out. Explanation "Figure 10 (a) is the layout of the position where the support pins are supported on the outer periphery of the fixed substrate G. According to this layout, the support pin 70a arranged at the corner of the substrate G4 is at a lateral distance from the edge of the substrate G as XI, for example, 70mm ± 10mm, and longitudinal distance Y1, for example, 70mm ± 10mm. The distance between the support pin 70b and the edge of the substrate G is X2, for example, at a position of 25 mm ± 10 mm. The distance relationship between them is arranged according to the X12X2 setting. This is because when the substrate G rotates, the position farthest from the center of the substrate, that is, the 4 corners of the substrate G are easy to concentrate. Compared with other positions, the coating liquid flows to the substrate. The influence of G's back is greater. Further, since the support pin 70a is arranged closer to the center of the substrate G than the other points, as shown in FIG. 10 (b), the amount of deflection of the substrate G is greater than that of the other points. It is known that the predetermined interval Ga is set in the range of 0.2 to 0.5 mm β. Therefore, it is possible to prevent an air flow containing a solvent, a resist resin liquid, and the like from entering this gap. This effect prevents the occurrence of poor film thickness caused by the adhesion of the resist resin liquid to the lower surface of the substrate G. Furthermore, because the distance between the support pins at other points and the four corners is different, air can be prevented from flowing to the back of the four corners of the substrate, further preventing A film thickness failure caused by the adhesion of the resist resin liquid to the lower surface of the substrate G occurs. Next, another embodiment of the present invention will be described. Fig. 11 (a) is a view showing the arrangement of a supporting portion 170 made of Teflon, for example, made of Teflon, which is supported in place of a supporting pin at a fixed outer periphery of the substrate G. As shown in Figure 11 (b), as the support part 170 on the back of the substrate G is installed, the paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 male a) 21 ---------- -. I! III Order. --- < Please read the notes on the back before filling in this page) 4 2 6 9 〇6 a? _Β7 _ V. Description of the invention (19) 'Suppression of the coating liquid to support Intrusion of the back surface of the substrate inside the portion 170. In addition, as another embodiment of the support portion Π0, as shown in the n (c) th circle, the contact manner between the support portion 170 and the substrate G is linear contact, and the shape of the contact portion is an acute angle. Using this method, it is possible to further Prevent copying. The present invention is not limited to this embodiment. For example, in the above-mentioned embodiment, a coating device for applying a resist resin solution to an LCD glass substrate is described as an example. There is no doubt that the application of the resist resin solution to a semiconductor substrate The same applies on the device. As described above, the present invention adopts a device that maintains a fixed gap distance between the bottom surface of the rotary leather and the substrate to be processed fixed on the rotary chuck, so that a certain gap is always maintained between the bottom surface of the rotary leather and the substrate to be processed. In order to prevent the phenomenon of coating film thickness caused by the processing agent adhering to the substrate to be processed, the present invention is printed by the Consumer Cooperative of the Ministry of Economic Affairs, the temporary wisdom property bureau, because the bottom surface of the rotation cover is provided corresponding to the rotation fixed. A support pin at the outer periphery of the substrate to be processed on the chuck. The support pin has a certain height from the bottom of the rotating cover, so a certain gap between the bottom surface of the rotating cover and the substrate to be processed can be maintained at all times to prevent the lower side of the substrate to be processed. Bad film thickness due to adhesion of treatment agent. In the present invention, a device for maintaining a certain distance between the bottom surface of the rotary cover and the substrate to be processed fixed on the rotary chuck is used to keep a certain distance between the bottom surface of the rotary leather and the substrate to be processed, thereby preventing The film of the coating film caused by the attachment of the treatment agent under the substrate to be treated. 22 This paper size is applicable to the Chinese national standard (CNS) A4 syndrome (210297 mm) A7 B7 V. Description of the invention (20) Thickness defect. According to the present invention, since a support corresponding to the outer peripheral edge of the substrate to be processed fixed to the rotary chuck is provided on the bottom surface of the rotary chuck, the support pin has a certain height from the bottom of the rotary leather, so the rotary cover can be maintained at all times. A certain gap between the bottom surface and the substrate to be processed to prevent poor coating film thickness caused by the adhesion of the treatment agent on the lower side of the substrate to be treated * [Circular Description] The first 圊 is the glass substrate for LCD in the embodiment of the present invention An oblique view of the coating and developing device. FIG. 2 is a plan view of a coating / developing device for a glass substrate for an LCD according to an embodiment of the present invention. FIG. 3 is a flowchart of a processing procedure sequence of the coating / developing device according to an embodiment of the present invention. Plane 5 of the coating processing unit in the embodiment of the present invention. FIG. 5 is a vertical cross-sectional circle of the coating processing unit in the embodiment of the present invention. FIG. 6 is a perspective view of the coating processing unit in the embodiment of the present invention. FIG. 7 is an enlarged partial plan view of a coating processing unit according to an embodiment of the present invention. FIG. 8 is a partially enlarged view of a vertical section of the coating processing unit according to an embodiment of the present invention. FIG. 9 is an embodiment of the present invention. FIG. 10 (a) is an enlarged partial plan view of a coating processing unit, and a support pin arrangement circle in another embodiment of the present invention is shown. Fig. 10 (b) is a partial sectional view of the support pin of Fig. 10 (a). This paper size applies to China's 0 tree orders < CNS) A4 specification (210 * 297 mm) ------------- install i I (please read the note $ on the back before filling (This page) Order-Printed by the Ministry of Economic Affairs, the Intellectual Property Agency, and the Industrial Consumption Cooperative, 23 1 4 2 6 y. 〇 a? _ B7 V. Description of the invention (21) The 11th (a) (i) is an oblique view of a thrust part in another embodiment of the present invention. The 笫 11 (b) circle is a partial cross-section of the support portion of the 11th (a) circle. Fig. 11 (c) is a partial cross section 圊 of a support portion according to another embodiment of Fig. 11 (b). Fig. 12 is an enlarged partial plan view of a conventional coating processing unit. Circle 13 is a vertical section of the original coating unit. [Symbol description] 20 ... Coating cover 21 ... Coating body 22 ... Cover 23 ... Rotating chuck CP ... Rotating leather G ... Substrate 70 ... Support pin V if II ϋ n «1 n« I (Please (Read the notes on the back before filling out this page)
It 訂---------線 Γ. 經濟部智慧財產局負工消费合作社印製 24 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）It Order --------- Line Γ. Printed by the Consumers' Cooperatives, Bureau of Intellectual Property, Ministry of Economic Affairs 24 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)