TW283208B - Spherical mirror grazing incidence x-ray optics - Google Patents
Spherical mirror grazing incidence x-ray opticsInfo
- Publication number
- TW283208B TW283208B TW084111516A TW84111516A TW283208B TW 283208 B TW283208 B TW 283208B TW 084111516 A TW084111516 A TW 084111516A TW 84111516 A TW84111516 A TW 84111516A TW 283208 B TW283208 B TW 283208B
- Authority
- TW
- Taiwan
- Prior art keywords
- dimension
- grazing incidence
- spherical mirror
- mirrors
- spherical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US24109894A | 1994-05-11 | 1994-05-11 | |
PCT/US1995/006322 WO1995031815A1 (en) | 1994-05-11 | 1995-05-11 | Spherical mirror grazing incidence x-ray optics |
Publications (1)
Publication Number | Publication Date |
---|---|
TW283208B true TW283208B (en) | 1996-08-11 |
Family
ID=22909231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084111516A TW283208B (en) | 1994-05-11 | 1995-11-01 | Spherical mirror grazing incidence x-ray optics |
Country Status (9)
Country | Link |
---|---|
US (1) | US5604782A (zh) |
EP (1) | EP0708970B1 (zh) |
JP (1) | JPH09500453A (zh) |
AT (1) | ATE169769T1 (zh) |
AU (1) | AU2641495A (zh) |
CA (1) | CA2166806A1 (zh) |
DE (1) | DE69504004T2 (zh) |
TW (1) | TW283208B (zh) |
WO (1) | WO1995031815A1 (zh) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2792205B2 (ja) * | 1990-06-14 | 1998-09-03 | 住友化学工業株式会社 | 熱可塑性樹脂組成物 |
AU6762198A (en) | 1997-03-18 | 1998-10-12 | Focused X-Rays Llc | Medical uses of focused and imaged x-rays |
US6049588A (en) * | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
US6125295A (en) * | 1997-08-27 | 2000-09-26 | Cash, Jr.; Webster C. | Pharmaceutically enhanced low-energy radiosurgery |
US6108397A (en) * | 1997-11-24 | 2000-08-22 | Focused X-Rays, Llc | Collimator for x-ray proximity lithography |
US6014423A (en) * | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
US6041099A (en) * | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
JP3734366B2 (ja) * | 1998-03-20 | 2006-01-11 | 株式会社リガク | X線分析装置 |
US6069934A (en) * | 1998-04-07 | 2000-05-30 | Osmic, Inc. | X-ray diffractometer with adjustable image distance |
US6332017B1 (en) | 1999-01-25 | 2001-12-18 | Vanderbilt University | System and method for producing pulsed monochromatic X-rays |
US6195410B1 (en) * | 1999-01-26 | 2001-02-27 | Focused X-Rays, Llc | X-ray interferometer |
US6185276B1 (en) | 1999-02-02 | 2001-02-06 | Thermal Corp. | Collimated beam x-ray tube |
US6389100B1 (en) | 1999-04-09 | 2002-05-14 | Osmic, Inc. | X-ray lens system |
US6327335B1 (en) | 1999-04-13 | 2001-12-04 | Vanderbilt University | Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam |
US6705736B1 (en) | 2001-12-03 | 2004-03-16 | David E. Pressler | Light-collection device |
DE10160472B4 (de) | 2001-12-08 | 2004-06-03 | Bruker Axs Gmbh | Röntgen-optisches System und Verfahren zur Abbildung einer Strahlungsquelle |
JP4220170B2 (ja) * | 2002-03-22 | 2009-02-04 | 浜松ホトニクス株式会社 | X線像拡大装置 |
US6949748B2 (en) * | 2002-04-16 | 2005-09-27 | The Regents Of The University Of California | Biomedical nuclear and X-ray imager using high-energy grazing incidence mirrors |
US7070327B2 (en) * | 2002-05-01 | 2006-07-04 | Siemens Medical Solutions Usa, Inc. | Focused radiation visualization |
US6968035B2 (en) * | 2002-05-01 | 2005-11-22 | Siemens Medical Solutions Usa, Inc. | System to present focused radiation treatment area |
US6782073B2 (en) | 2002-05-01 | 2004-08-24 | Siemens Medical Solutions Usa, Inc. | Planning system for convergent radiation treatment |
US6853704B2 (en) | 2002-09-23 | 2005-02-08 | Siemens Medical Solutions Usa, Inc. | System providing multiple focused radiation beams |
US7134786B2 (en) * | 2003-04-10 | 2006-11-14 | Ge Medical Systems Global Technology | Examination table providing x-ray densitometry |
DE602004012562T2 (de) * | 2003-06-13 | 2009-04-16 | Osmic, Inc., Auburn Hills | Strahlaufbereitungssystem |
US7280634B2 (en) * | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
US20050131270A1 (en) | 2003-12-12 | 2005-06-16 | Siemens Medical Solutions Usa, Inc. | Radiation treatment system utilizing therapeutic agent and associated identifier |
US20060039533A1 (en) | 2003-12-12 | 2006-02-23 | Weil Michael D | Management system for combination treatment |
US7481544B2 (en) | 2004-03-05 | 2009-01-27 | Optical Research Associates | Grazing incidence relays |
US7486984B2 (en) * | 2004-05-19 | 2009-02-03 | Mxisystems, Inc. | System and method for monochromatic x-ray beam therapy |
US7021778B1 (en) * | 2004-09-24 | 2006-04-04 | General Dynamics Advanced Information Systems, Inc. | Compact-depth spiral telescope and method of making and using the same |
US7440546B2 (en) * | 2006-12-06 | 2008-10-21 | Uchicago Argonne, Llc | Method of making and structure of multilayer laue lens for focusing hard x-rays |
EP1953537A1 (de) * | 2007-01-30 | 2008-08-06 | KEMMER, Josef, Dr. | Vorrichtung zur Erfassung und/oder Leitung von Röntgenstrahlung unter Verwendung einer Röntgenoptik |
US7706503B2 (en) | 2007-11-20 | 2010-04-27 | Rigaku Innovative Technologies, Inc. | X-ray optic with varying focal points |
US8249220B2 (en) * | 2009-10-14 | 2012-08-21 | Rigaku Innovative Technologies, Inc. | Multiconfiguration X-ray optical system |
US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
US9449781B2 (en) | 2013-12-05 | 2016-09-20 | Sigray, Inc. | X-ray illuminators with high flux and high flux density |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
US9448190B2 (en) | 2014-06-06 | 2016-09-20 | Sigray, Inc. | High brightness X-ray absorption spectroscopy system |
US9570265B1 (en) | 2013-12-05 | 2017-02-14 | Sigray, Inc. | X-ray fluorescence system with high flux and high flux density |
US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
DE102013223935A1 (de) * | 2013-11-22 | 2015-05-28 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die EUV-Belichtungslithographie |
US9823203B2 (en) | 2014-02-28 | 2017-11-21 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
US9594036B2 (en) | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
NL2016370A (en) * | 2015-04-03 | 2016-10-10 | Asml Netherlands Bv | Reflective optical element. |
US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
CN104865050B (zh) * | 2015-05-13 | 2017-05-31 | 北京控制工程研究所 | 基于x射线光学仿真的掠入射光学***聚焦性能分析方法 |
US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
WO2018175570A1 (en) | 2017-03-22 | 2018-09-27 | Sigray, Inc. | Method of performing x-ray spectroscopy and x-ray absorption spectrometer system |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
US10845491B2 (en) * | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
GB2591630B (en) | 2018-07-26 | 2023-05-24 | Sigray Inc | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
DE112019004433T5 (de) | 2018-09-04 | 2021-05-20 | Sigray, Inc. | System und verfahren für röntgenstrahlfluoreszenz mit filterung |
WO2020051221A2 (en) | 2018-09-07 | 2020-03-12 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
WO2021162947A1 (en) | 2020-02-10 | 2021-08-19 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles |
WO2022092060A1 (ja) * | 2020-11-02 | 2022-05-05 | 国立大学法人大阪大学 | X線光学装置 |
CN112635095B (zh) * | 2020-12-09 | 2022-07-19 | 中国科学院上海应用物理研究所 | 一种动态压弯调节装置及动态稳定微米聚焦*** |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2557662A (en) * | 1948-11-29 | 1951-06-19 | Research Corp | Short-wave electromagnetic radiation catoptrics |
US2941078A (en) * | 1954-02-16 | 1960-06-14 | Centre Nat Rech Scient | Anastigmatic catoptric device |
JPS595218A (ja) * | 1982-07-01 | 1984-01-12 | Takahashi Seisakusho:Kk | 放物面反射鏡のコマ収差を補正した大口径反射屈折式天体望遠鏡 |
US4810077A (en) * | 1986-02-13 | 1989-03-07 | Spectra-Tech, Inc. | Grazing angle microscope |
FR2630832B1 (fr) * | 1988-04-29 | 1995-06-02 | Thomson Csf | Systeme de miroirs pour le guidage d'une onde electromagnetique |
US5031199A (en) * | 1990-06-05 | 1991-07-09 | Wisconsin Alumni Research Foundation | X-ray lithography beamline method and apparatus |
US5528364A (en) * | 1994-07-19 | 1996-06-18 | The Regents, University Of California | High resolution EUV monochromator/spectrometer |
-
1995
- 1995-05-11 JP JP7529906A patent/JPH09500453A/ja active Pending
- 1995-05-11 AU AU26414/95A patent/AU2641495A/en not_active Abandoned
- 1995-05-11 DE DE69504004T patent/DE69504004T2/de not_active Expired - Fee Related
- 1995-05-11 EP EP95921299A patent/EP0708970B1/en not_active Expired - Lifetime
- 1995-05-11 WO PCT/US1995/006322 patent/WO1995031815A1/en active IP Right Grant
- 1995-05-11 CA CA002166806A patent/CA2166806A1/en not_active Abandoned
- 1995-05-11 AT AT95921299T patent/ATE169769T1/de not_active IP Right Cessation
- 1995-08-11 US US08/514,134 patent/US5604782A/en not_active Expired - Fee Related
- 1995-11-01 TW TW084111516A patent/TW283208B/zh active
Also Published As
Publication number | Publication date |
---|---|
AU2641495A (en) | 1995-12-05 |
WO1995031815A1 (en) | 1995-11-23 |
DE69504004D1 (de) | 1998-09-17 |
EP0708970B1 (en) | 1998-08-12 |
US5604782A (en) | 1997-02-18 |
DE69504004T2 (de) | 1999-05-27 |
CA2166806A1 (en) | 1995-11-23 |
EP0708970A1 (en) | 1996-05-01 |
JPH09500453A (ja) | 1997-01-14 |
ATE169769T1 (de) | 1998-08-15 |
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