FR2396319A1 - Systeme optique achromatique a grossissement unite - Google Patents
Systeme optique achromatique a grossissement uniteInfo
- Publication number
- FR2396319A1 FR2396319A1 FR7816353A FR7816353A FR2396319A1 FR 2396319 A1 FR2396319 A1 FR 2396319A1 FR 7816353 A FR7816353 A FR 7816353A FR 7816353 A FR7816353 A FR 7816353A FR 2396319 A1 FR2396319 A1 FR 2396319A1
- Authority
- FR
- France
- Prior art keywords
- refractive element
- optical system
- optical
- achromatic optical
- achromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
L'invention concerne les systèmes optiques achromatiques. Le système optique achromatique à grossissement unité comporte une surface réfléchissante concave 26 définissant un axe optique 28, un premier élément réfringent 34 placé entre le foyer 30 et le centre de courbure 32 de la surface 26, un deuxième élément réfringent 42 placé entre la surface 26 et le foyer 30 et un élément optique 50 présentant des surfaces optiques planes, sa surface arrière 52 étant très proche du centre de courbure 32. L'élément réfringent 34 corrige l'aberration chromatique longitudinale des rayons principaux et l'élément réfringent 42 corrige l'aberration chromatique longitudinale résiduelle des rayons marginaux. Applicable notamment dans les systèmes de fabrication de micro-circuits.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/811,754 US4171871A (en) | 1977-06-30 | 1977-06-30 | Achromatic unit magnification optical system |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2396319A1 true FR2396319A1 (fr) | 1979-01-26 |
FR2396319B1 FR2396319B1 (fr) | 1982-09-17 |
Family
ID=25207478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7816353A Granted FR2396319A1 (fr) | 1977-06-30 | 1978-05-25 | Systeme optique achromatique a grossissement unite |
Country Status (6)
Country | Link |
---|---|
US (1) | US4171871A (fr) |
JP (1) | JPS6055807B2 (fr) |
CA (1) | CA1095760A (fr) |
DE (1) | DE2828530C2 (fr) |
FR (1) | FR2396319A1 (fr) |
GB (1) | GB1559666A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0354148A2 (fr) * | 1981-05-15 | 1990-02-07 | General Signal Corporation | Appareil de projection d'une série d'images sur les éléments d'un substrat semi-conducteur |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4302079A (en) * | 1980-04-10 | 1981-11-24 | Bell Telephone Laboratories, Incorporated | Photolithographic projection apparatus using light in the far ultraviolet |
GB2148017B (en) * | 1981-05-15 | 1986-04-09 | Gen Signal Corp | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4425037A (en) | 1981-05-15 | 1984-01-10 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4391494A (en) * | 1981-05-15 | 1983-07-05 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4444492A (en) * | 1982-05-15 | 1984-04-24 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4779966A (en) * | 1984-12-21 | 1988-10-25 | The Perkin-Elmer Corporation | Single mirror projection optical system |
US4585337A (en) * | 1985-01-14 | 1986-04-29 | Phillips Edward H | Step-and-repeat alignment and exposure system |
US4742376A (en) * | 1985-01-14 | 1988-05-03 | Phillips Edward H | Step-and-repeat alignment and exposure system |
US4669866A (en) * | 1985-01-28 | 1987-06-02 | Phillips Edward H | Step-and-repeat alignment and exposure system and method therefore |
JPS61255342A (ja) | 1985-05-09 | 1986-11-13 | Fuji Photo Film Co Ltd | ハロゲン化銀カラ−写真感光材料 |
GB8612609D0 (en) * | 1986-05-23 | 1986-07-02 | Wynne C G | Optical imaging systems |
US4896952A (en) * | 1988-04-22 | 1990-01-30 | International Business Machines Corporation | Thin film beamsplitter optical element for use in an image-forming lens system |
US4964705A (en) * | 1988-11-07 | 1990-10-23 | General Signal Corporation | Unit magnification optical system |
US5040882A (en) * | 1988-11-07 | 1991-08-20 | General Signal Corporation | Unit magnification optical system with improved reflective reticle |
US5031977A (en) * | 1989-12-27 | 1991-07-16 | General Signal Corporation | Deep ultraviolet (UV) lens for use in a photolighography system |
US5241423A (en) * | 1990-07-11 | 1993-08-31 | International Business Machines Corporation | High resolution reduction catadioptric relay lens |
US5159172A (en) * | 1990-08-07 | 1992-10-27 | International Business Machines Corporation | Optical projection system |
US5298939A (en) * | 1991-11-04 | 1994-03-29 | Swanson Paul A | Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
JP3747958B2 (ja) * | 1995-04-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
US6157497A (en) * | 1993-06-30 | 2000-12-05 | Nikon Corporation | Exposure apparatus |
JP3724517B2 (ja) * | 1995-01-18 | 2005-12-07 | 株式会社ニコン | 露光装置 |
US5559629A (en) * | 1994-08-19 | 1996-09-24 | Tamarack Scientific Co., Inc. | Unit magnification projection system and method |
JPH08179217A (ja) * | 1994-08-19 | 1996-07-12 | Tamarack Scient Co Inc | ダイソンレンズ系 |
US5557469A (en) * | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
JPH08211294A (ja) * | 1995-02-02 | 1996-08-20 | Nikon Corp | 投影露光装置 |
US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
JP2949328B2 (ja) * | 1995-11-06 | 1999-09-13 | 株式会社日立製作所 | 光露光方法 |
US5883703A (en) * | 1996-02-08 | 1999-03-16 | Megapanel Corporation | Methods and apparatus for detecting and compensating for focus errors in a photolithography tool |
JP4235778B2 (ja) * | 1998-05-21 | 2009-03-11 | 株式会社ニコン | 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法 |
DE19906874C1 (de) * | 1999-02-18 | 2001-01-11 | Zeiss Carl Jena Gmbh | Relaisoptik für ein Ablenksystem sowie ein Ablenksystem |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2004514943A (ja) * | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | 157nmリソグラフィ用の反射屈折投影系 |
US6956976B2 (en) * | 2002-01-04 | 2005-10-18 | Warner Bros. Enterianment Inc. | Reduction of differential resolution of separations |
US6947607B2 (en) * | 2002-01-04 | 2005-09-20 | Warner Bros. Entertainment Inc. | Reduction of differential resolution of separations |
US7563695B2 (en) * | 2002-03-27 | 2009-07-21 | Gsi Group Corporation | Method and system for high-speed precise laser trimming and scan lens for use therein |
US6879383B2 (en) * | 2002-12-27 | 2005-04-12 | Ultratech, Inc. | Large-field unit-magnification projection system |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR20160085375A (ko) | 2004-05-17 | 2016-07-15 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
US7148953B2 (en) * | 2004-11-01 | 2006-12-12 | Ultratech, Inc. | Apochromatic unit-magnification projection optical system |
US20060238732A1 (en) * | 2005-04-21 | 2006-10-26 | Mercado Romeo I | High-NA unit-magnification projection optical system having a beamsplitter |
FR2885234B1 (fr) * | 2005-04-29 | 2008-07-11 | Sagem | Systeme optique pour un dispositif de photolithographie |
WO2006117378A1 (fr) * | 2005-04-29 | 2006-11-09 | Sagem Defense Securite | Systeme optique pour un dispositif de lithographie |
DE102005061834B4 (de) * | 2005-12-23 | 2007-11-08 | Ioss Intelligente Optische Sensoren & Systeme Gmbh | Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche |
US7576349B2 (en) | 2005-12-23 | 2009-08-18 | Carestream Health, Inc. | Radiation image readout apparatus |
TWI504963B (zh) * | 2006-01-30 | 2015-10-21 | Electro Scient Ind Inc | 消色差掃描透鏡 |
CN100388056C (zh) * | 2006-06-02 | 2008-05-14 | 上海微电子装备有限公司 | 一种投影物镜光学*** |
EP1959289A1 (fr) * | 2007-02-13 | 2008-08-20 | Carl Zeiss SMT AG | Objectif de projection d'agrandissement d'unité |
US8493670B2 (en) | 2010-09-10 | 2013-07-23 | Coherent, Inc. | Large-field unit-magnification catadioptric projection system |
US8659823B2 (en) | 2011-04-22 | 2014-02-25 | Coherent, Inc. | Unit-magnification catadioptric and catoptric projection optical systems |
US9436103B2 (en) * | 2014-05-19 | 2016-09-06 | Ultratech, Inc. | Wynne-Dyson projection lens with reduced susceptibility to UV damage |
CN107179600B (zh) * | 2017-07-04 | 2019-09-27 | 北京理工大学 | 一种非制冷红外折反射全景镜头 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2742807A (en) * | 1954-03-24 | 1956-04-24 | Gardner Denver Co | Multiple nut setter |
FR1558619A (fr) * | 1967-02-01 | 1969-02-28 | ||
DE1957628A1 (de) * | 1968-11-15 | 1970-09-03 | Nat Res Dev | Optische Einrichtung mit einem Konkavspiegel und mit einem Korrekturteil |
SU396662A1 (fr) * | 1971-10-18 | 1973-08-29 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2742817A (en) * | 1953-05-29 | 1956-04-24 | Eastman Kodak Co | Unit magnification catadioptric lens system |
AT314859B (de) * | 1971-08-24 | 1974-04-25 | Zeiss Carl | Spiegellinsen-Objektiv für eine Abbildung mit gemeinsamer Objekt- und Bild-Seite |
GB1443271A (en) * | 1974-01-02 | 1976-07-21 | Rank Organisation Ltd | Reflex lens systems |
JPS6019484B2 (ja) * | 1975-11-07 | 1985-05-16 | キヤノン株式会社 | 複写用レンズ |
-
1977
- 1977-06-30 US US05/811,754 patent/US4171871A/en not_active Expired - Lifetime
-
1978
- 1978-04-05 GB GB13305/78A patent/GB1559666A/en not_active Expired
- 1978-04-21 CA CA301,709A patent/CA1095760A/fr not_active Expired
- 1978-05-25 JP JP53061793A patent/JPS6055807B2/ja not_active Expired
- 1978-05-25 FR FR7816353A patent/FR2396319A1/fr active Granted
- 1978-06-29 DE DE2828530A patent/DE2828530C2/de not_active Expired
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2742807A (en) * | 1954-03-24 | 1956-04-24 | Gardner Denver Co | Multiple nut setter |
FR1558619A (fr) * | 1967-02-01 | 1969-02-28 | ||
DE1957628A1 (de) * | 1968-11-15 | 1970-09-03 | Nat Res Dev | Optische Einrichtung mit einem Konkavspiegel und mit einem Korrekturteil |
SU396662A1 (fr) * | 1971-10-18 | 1973-08-29 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0354148A2 (fr) * | 1981-05-15 | 1990-02-07 | General Signal Corporation | Appareil de projection d'une série d'images sur les éléments d'un substrat semi-conducteur |
EP0354148A3 (fr) * | 1981-05-15 | 1990-06-20 | General Signal Corporation | Appareil de projection d'une série d'images sur les éléments d'un substrat semi-conducteur |
Also Published As
Publication number | Publication date |
---|---|
DE2828530A1 (de) | 1979-01-11 |
US4171871A (en) | 1979-10-23 |
JPS5413329A (en) | 1979-01-31 |
JPS6055807B2 (ja) | 1985-12-06 |
FR2396319B1 (fr) | 1982-09-17 |
CA1095760A (fr) | 1981-02-17 |
DE2828530C2 (de) | 1985-02-28 |
GB1559666A (en) | 1980-01-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |