TW280951B - Solar cell having a thin film silicon multilayer structure - Google Patents
Solar cell having a thin film silicon multilayer structure Download PDFInfo
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- TW280951B TW280951B TW084104368A TW84104368A TW280951B TW 280951 B TW280951 B TW 280951B TW 084104368 A TW084104368 A TW 084104368A TW 84104368 A TW84104368 A TW 84104368A TW 280951 B TW280951 B TW 280951B
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 17
- 239000010703 silicon Substances 0.000 title claims abstract description 16
- 239000010409 thin film Substances 0.000 title claims abstract description 14
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 32
- 229910021419 crystalline silicon Inorganic materials 0.000 claims abstract description 13
- 239000004020 conductor Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 7
- 238000009792 diffusion process Methods 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 238000005984 hydrogenation reaction Methods 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 240000007817 Olea europaea Species 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
- H01L31/076—Multiple junction or tandem solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0465—PV modules composed of a plurality of thin film solar cells deposited on the same substrate comprising particular structures for the electrical interconnection of adjacent PV cells in the module
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
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- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
280951 A7 B7 經濟部中央標準局貞工消費合作社印聚 五、發明説明( / ) 1 1 本 發 明 偽 關 於 一 太 陽 電 池 • 包 含 實 質 上 至 少 三 傾 薄 膜 1 1 矽 之 平 行 層 • 相 互 堆 « » 及 至 少 二 傭 導 體 » 其 提 供 至 少 1 1 二 m 上 述 矽 層 給 霄 接 觸 點 * 上 述 導 黼 於 一 方 向 延 伸 > ^—S 請 1 先 1 並 在 實 霣 上 與 上 述 矽 層 橫 切 〇 閱 讀 1 上 述 型 態 之 太 陽 電 池 已 於 W0 93/ 1 2543 中發表 * 它 説 背 1 I 之 明 了 一 種 薄 膜 矽 由 熔 化 金 羼 或 其 他 已 知 技 術 中 的 溶 液 中 意 1 事 1 沈 成 澱 於 支 持 玻 璃 上 層 〇 逭 些 技 術 暗 示 了 結 晶 矽 薄 膜 之 形 項 再 填 1 〇 寫 本 已 知 太 m 池 的 缺 點 是 t 為 了提供足夠大之鼷租以Ml· 頁 1 I 收 光 線 • 它 的 厚 度 相 當 大 〇 此 外 形 成 已 知 太 陽 霣 池 之 1 1 矽 層 的 材 料 機 械 力 量 十 分 弱 » 使 得 需 要 額 外 之 建 造 和 設 1 1 計 9 伴 随 而 來 的 是 額 外 費 用 增 加 〇 1 訂 本 發 明 之 巨 的 傜 提 供 上 述 類 型 的 太 隈 霣 池 » 但 克 服 了 1 已 知 薄 膜 矽 太 陽 電 池 的 上 述 及 其 他 缺 點 〇 1 I 本 百 的 由 上 述 型 態 之 太 陽 電 池 達 成 9 其 中 薄 膜 層 包 含 1 I 了 非 結 晶 態 矽 (a -Si ) 〇 1 1 本 發 明 之 太 陽 電 池 包 括 許 多 較 前 人 發 明 之 結 晶 矽 太 陽 β 霣 池 佳 之 優 黏 9 因 為 它 以 薄 膜 tt 费 製 * 使 得 其 他 事 物 1 1 在 低 材 料 消 耗 率 下 有 一 宽 廣 範 國 9 在 低 溫 下 進 行 $ 在 沈 1 1 澱 遇 程 中 有 P * η摻雜及合金控制, 在不同種類及形狀的 1 I 廉 價 底 質 上 沈 澱 » 整合 製造簡單及低價大置生産 〇 1 1 據 本 發 明 • 一 非 結 晶 態 矽 薄 膜 太 陽 霣 池 之 厚 度 t % 一 1 1 大 小 序 列 攀 較 一 有 相 同 動 力 效 率 « 但 使 用 結 晶 矽 之 已 知 1 I 裝 置 之 厚 度 小 〇 此 外 » 本 3 發 明 之 太 m 電 池 的 機 械 力 較 已 1 1 1 1 1 1 本紙張尺度適用中國國家標準(C:NS ) A4規格(210X 297公釐) A 7 B7 五、發明説明(> ) 知太陽霣池的機械力強。 據本發明中一太陽電池之實例,薄膜層傺由P型非結 晶態矽(P-Si),原非結晶態矽(i-Si)及η型非結晶態矽 所提供,以公式(I)所給之顒序: p-Si,(i-Si,n-Si,i-Si,p-Si)x =, i-Si,n-SI (I) 其中x是數字0或一自然數,最好是〇 上述導 饈之一提供毎個上述P-Si靥給一霣接觸點,而S —傭上 述導饉刖提供每傾上述n-Si靥給一霣接觸點。 如果X不等於0, 此實例的架構由多重***平行層所組 成於是大大提升了由光之口趿收衍生之載體的收集力。 如果適當S擇各層接合處的空間,所有衍生載龌的收集 力會趨於一致。 在另一實例中,各a-Si層之厚度較上述各層的載鼸擴 散長度少。 在此實例中,在層間注入載醱將肋於層間電流共用, 正如同n-Si及p-Si之多重插人層提供了接觸點間霣流傳 導的平行通路,於是降低了霣阻損失。 經濟部中央標準局員工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) 為了更加強接觴點間平行通路的傳導力,會提供定量 的P型結晶矽於一 P-Si靥中,且/或提供定量之η型結 晶矽於n-S i餍中。 P型且/或η型結晶矽之量曾如_好用以提供包含微 結晶矽之有限次元的小匾域那麽少,或如提供相對非結 晶態矽之結晶矽的中介層那麽多。 較佳的是,在根據本發明之一太皤電池中,a-Si與氫 -4 - 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) 經濟部中央標準局員工消費合作社印袋 280951 A7 B7 五、發明説明($ ) 化合。(與氫化的之a-Si以下表示為a-Si:H)。加入簠&-Si中 ,例如在%下相對Si為1的濃度,曾造成SiH-鍵之形成, 於是替代了不活潑a-Si中不連結的鐽。於是,a-Si的光 譜反應較許多其他太隈霄池材料佳,其中多數輿少數的 載體生命被發現至少有l〇ns。於是,一多層a-Si太隈霉 池與前人發明之太陽霄池有較高的效率,而沒有額外 的光閛。 此外,a-Si可與鍺(Ge),硪(C)及上述材料之混合等 蘧出之材料摻雜。 a-Si層可為本霣的,或與霉力或光學上活躍的雜質摻 雜,且加以選擇使霉池對太陽光譜之反應成為最好。 據此發明之一太陽電池實例,包含了例如用於薄膜矽 靥之底質及上靥,和相對地一覆蓋的頂層或底層。底質 或上層及頂層或底層相對地會以自身已知的方法提供, 因此至少底質或上層.或相對地頂層或底靥是透明的, 或因此相對地底質及頂層或上層及底層皆是透明的。 藉由製造一 η型匯流排給一與一用於相鄰罨池之p型 匯流抹凹槽之霉池,在金鼷化過程中有2傾匾域可以連 結。逭提供了相鄰a-Si電池之自動連纗相互連結,消除 相互連結,繼而焊接除了輸出鉛的部分。二相鄰凹槽可 能際上重叠,形成一較宽凹槽,有相對摻雜的邊壁。在 此例中,將凹槽再次自動充滿金屬可提供串聯連結。 現在本發明將參考所附圖示來說明: 圖1顯示根據本發明之a-Si:H多層太陽霉池之第一實 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ---------------IT------f — (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(4·〉 例的槪要切面部分, 圖2顯示根據本發明之a-Si:H多靥太陽霄池之第二實 例的概要切面部分。 園1顯示多重太陽®池1.包含原氳化非結晶態矽(i_ Si)之***平行層2,3,4,為氫化非結晶η型矽(n-Si)之 靥5,6所包圍之上述各層2,3,4,及氫化非結晶態P型 矽(P-Si)之層7,8。對於層2 -凹槽面之横切已形成,它 的壁10,12及9.11已被摻雜,以形成相對的非結晶態 π - Si 15和非結晶態P-Si。在凹漕中•金颺接觸點13, 14己由 相對輿非結晶態n - Si 15及P-S 16之直接接觸所提 供。由本質靥2-3之偶發光線衍生之載體向n-Si層5,6或 P-Si層7,8相對地擴散,其取決於倍號,且藉由相對的 層5-8間金臑接觸點13,14傅送,該金靥接觸點因此可提 供一光電流給一相連罨路(未顯示)。太陽電池1已以重 覆型態在層的方向延伸,如此用以提供一多重太陽電池 於單一底質(未顯示)上•此太限霣池之接觸點為串聯。 太陽笛池/可以重覆四値連鑛相互交叠之非結晶態矽層 之順序,在輿各層横切之方向輕易地延伸。 圈2顯示根據本發明之另一多重太陽電池21之簧施例 。此電池21大致上有與圖1中顯示的太陽霣池1相同的 結構。相對應的部分已用相對應的參考符號標示。圖2 顯示的太陽電池21之結構的優點是於輸送相對應橄晶矽 25,26小層之非結晶態!1-5丨與9-5丨層5,6及7,8之電流中 形成.於是大大地減少了逭些層的電阻。更進一步的減 少電池21之電阻已藉相對地摻入撤晶η型矽35及p型矽 36於凹槽壁10,12及9,11中來達成。 本紙張尺度適用中國國家標準(C:NS ) Α4規格(210Χ297公釐) (請先閱讀背面之注意事項再填寫本頁)280951 A7 B7 Zhengong Consumer Cooperative, Central Bureau of Standards, Ministry of Economic Affairs, Printed and Printed V. Description of Invention (/) 1 1 The present invention is about a solar cell • Contains at least three tilted thin films 1 1 Parallel layers of silicon • Mutual stacking «» and At least two conductors »It provides at least 1 1 2 m above the silicon layer to the contact point of the sky * The above guide wire extends in one direction > ^ —S Please 1 first 1 and cross the above silicon layer on the real eye. Read 1 The above type of solar cell has been published in W0 93/1 2543 * It says that 1 I knows that a thin film silicon is formed by melting gold knives or other known technologies in solution. 1 event 1 is deposited on the upper layer of the supporting glass. The technology implies that the shape of the crystalline silicon thin film is filled with another 10. The shortcomings of the known m-pool are t in order to provide The large enough rent is Ml. Page 1 I Collect the light • Its thickness is quite large. In addition, the material of the silicon layer forming the known solar pond 1 1 The mechanical strength of the silicon layer is very weak »making additional construction and designing 1 1 count 9 accompanied Here comes the additional cost. 〇1 The giant giant of the present invention provides the above-mentioned type Taikyu Pond »but overcomes the above-mentioned and other shortcomings of 1 known thin-film silicon solar cells. The solar cell achieves 9 where the thin film layer contains 1 I of amorphous silicon (a-Si). 〇1 1 The solar cell of the present invention includes many more crystalline silicon solar β 霣 池 佳 优优 粘 9 invented because of its thin film tt fee system * makes other things 1 1 have a wide range of countries at low material consumption rate 9 at low temperature $ in Shen 1 1 P * η doping and alloy control during the deposition process, in different types And shape of 1 I precipitation on cheap substrate »Integrated manufacturing is simple and low-cost large-scale production 〇1 1 According to the present invention • The thickness of an amorphous silicon thin film solar pond t% 1 1 1 The size sequence has the same power Efficiency «But the thickness of the known 1 I device using crystalline silicon is small. In addition» The mechanical force of the 3 invention of the Tai-m battery is better than 1 1 1 1 1 1 This paper size is applicable to the Chinese National Standard (C: NS) A4 specification (210X 297mm) A 7 B7 V. Description of the invention (>) It is known that the solar power is strong. According to an example of a solar cell in the present invention, the thin-film layer is provided by P-type amorphous silicon (P-Si), original amorphous silicon (i-Si) and n-type amorphous silicon, using the formula (I ) The given sequence: p-Si, (i-Si, n-Si, i-Si, p-Si) x =, i-Si, n-SI (I) where x is the number 0 or a natural number Preferably, one of the guides provides each of the P-Si alloys to a contact point, and the S-servant guide provides the n-Si alloys per tilt to a contact point. If X is not equal to 0, the architecture of this example is composed of multiple interleaved parallel layers, which greatly enhances the collection power of the vector derived from the mouth of light. If the space at the junction of each layer is properly selected, the collection forces of all derived loads will tend to be the same. In another example, the thickness of each a-Si layer is less than the diffusion length of the above-mentioned layers. In this example, implanting a carrier between the layers will share the current between the layers. Just as multiple intervening layers with n-Si and p-Si provide parallel paths for the conduction of contact current between contacts, it reduces the resistance loss. Printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling in this page) In order to further enhance the conductivity of the parallel path between the connection points, a quantitative amount of P-type crystalline silicon in a P-Si alloy , And / or provide quantitative n-type crystalline silicon in nSi. The amount of p-type and / or n-type crystalline silicon used to be as small as the number of small plaque domains used to provide finite dimensions of microcrystalline silicon, or as many interposers as crystalline silicon that provides relatively non-crystalline silicon. Preferably, in one of the batteries according to the present invention, a-Si and hydrogen-4-this paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs Bag 280951 A7 B7 V. Description of the invention ($) Compound. (The a-Si with hydrogenation is hereinafter expressed as a-Si: H). Adding 簠 & -Si, for example, the concentration of Si relative to 1 at%, has caused the formation of SiH-bonds, thus replacing the unconnected ions in the inactive a-Si. Therefore, the spectral response of a-Si is better than that of many other Okuma materials, and most of the carrier life is found to have at least 10ns. Therefore, a multi-layer a-Si Okuma mold pond and the solar pond invented by predecessors have a higher efficiency, and there is no extra light. In addition, a-Si can be doped with materials such as germanium (Ge), He (C), and mixtures of these materials. The a-Si layer can be native or mixed with moldy or optically active impurities, and is selected so that the response of the mold pool to the solar spectrum becomes the best. An example of a solar cell according to this invention includes, for example, a substrate and an upper substrate for thin film silicon, and a relatively covered top or bottom layer. The bottom layer or top layer and top layer or bottom layer will be provided in a relatively known way, so at least the bottom layer or top layer. Or the top layer or bottom layer is transparent, or therefore the bottom layer and top layer or top layer and bottom layer are both transparent. By fabricating an n-type bus bar to a mold pool with a p-type bus bar groove for the adjacent pool, there are 2 tilted plaque fields that can be connected during the process of metallization. We provide automatic interconnection of adjacent a-Si batteries to eliminate interconnection, and then solder the part except the output lead. Two adjacent grooves may overlap, forming a wider groove with relatively doped side walls. In this example, automatically filling the groove with metal again provides a series connection. The present invention will now be explained with reference to the attached drawings: Figure 1 shows the first real paper size of the a-Si: H multi-layer solar mold pool according to the present invention is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm)- ------------- IT ------ f — (Please read the precautions on the back before filling in this page) A7 B7 printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economy V. Inventions Description (4 ·> Example of the main cut surface section, Figure 2 shows the outline cut section of the second example of the a-Si: H multi-solar solar pond according to the present invention. Park 1 shows the multiple solar® pool 1. Contains the original 氲 化The parallel layers 2, 3, 4 of amorphous silicon (i_Si) are inserted into the above layers 2, 3, 4, and hydrogenated amorphous, surrounded by the hydrogenated amorphous n-type silicon (n-Si) 5,6 State P-type silicon (P-Si) layers 7, 8. For layer 2-the cross section of the groove surface has been formed, and its walls 10, 12 and 9.11 have been doped to form the relative amorphous state π- Si 15 and non-crystalline P-Si. In the recess, Jinyang contact points 13, 14 have been provided by direct contact with non-crystalline n-Si 15 and PS 16. Relative to the incidental nature of 2-3 Light-derived carrier to n-Si layer 5 , 6 or P-Si layers 7, 8 are relatively diffused, depending on the fold number, and are sent by the gold contact points 13, 14 between the opposite layers 5-8, the gold contact point can thus provide a light The current is given to a connected path (not shown). The solar cell 1 has been extended in the direction of the layer in a repeating pattern, so as to provide a multiple solar cell on a single substrate (not shown). This is too limited. The contact points are connected in series. The solar flute / can repeat the sequence of the non-crystalline silicon layers that overlap with each other, and extend easily in the cross direction of each layer. Circle 2 shows another multiple according to the invention A spring embodiment of a solar cell 21. This battery 21 has roughly the same structure as the solar cell 1 shown in FIG. 1. The corresponding parts have been marked with corresponding reference symbols. The structure of the solar cell 21 shown in FIG. 2 The advantage is that the non-crystalline state corresponding to the 25,26 small layers of olive silicon is transported! 1-5 丨 and 9-5 丨 layers 5,6 and 7,8 are formed in the current. So greatly reduce these layers The resistance of the battery 21 has been further reduced by relatively doping n-type silicon 35 and p-type silicon 36 into the groove walls 10, 12 It is reached by 9 and 11. This paper scale is applicable to the Chinese National Standard (C: NS) Α4 specification (210Χ297mm) (please read the precautions on the back before filling this page)
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1000264A NL1000264C2 (en) | 1995-05-01 | 1995-05-01 | Solar cell with multilayer structure of thin films of silicon. |
Publications (1)
Publication Number | Publication Date |
---|---|
TW280951B true TW280951B (en) | 1996-07-11 |
Family
ID=19760958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084104368A TW280951B (en) | 1995-05-01 | 1995-05-02 | Solar cell having a thin film silicon multilayer structure |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0826242A1 (en) |
AU (1) | AU5409496A (en) |
NL (1) | NL1000264C2 (en) |
TW (1) | TW280951B (en) |
WO (1) | WO1996035235A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010026289B4 (en) * | 2010-07-06 | 2014-10-30 | Sameday Media Gmbh | Solar cell and process |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES8302365A1 (en) * | 1980-09-09 | 1982-12-16 | Energy Conversion Devices Inc | Stacked photoresponsive cells of amorphous semiconductors |
JPS61104678A (en) * | 1984-10-29 | 1986-05-22 | Mitsubishi Electric Corp | Amorphous solar cell |
JP3037461B2 (en) * | 1991-05-07 | 2000-04-24 | キヤノン株式会社 | Photovoltaic element |
WO1993012543A1 (en) * | 1991-12-09 | 1993-06-24 | Unisearch Limited | Buried contact, interconnected thin film and bulk photovoltaic cells |
AUPM483494A0 (en) * | 1994-03-31 | 1994-04-28 | Pacific Solar Pty Limited | Multiple layer thin film solar cells |
-
1995
- 1995-05-01 NL NL1000264A patent/NL1000264C2/en not_active IP Right Cessation
- 1995-05-02 TW TW084104368A patent/TW280951B/en active
-
1996
- 1996-04-23 EP EP96911113A patent/EP0826242A1/en not_active Withdrawn
- 1996-04-23 WO PCT/NL1996/000177 patent/WO1996035235A1/en not_active Application Discontinuation
- 1996-04-23 AU AU54094/96A patent/AU5409496A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP0826242A1 (en) | 1998-03-04 |
WO1996035235A1 (en) | 1996-11-07 |
AU5409496A (en) | 1996-11-21 |
NL1000264C2 (en) | 1996-11-04 |
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