TW202345654A - Optical film assessment method - Google Patents
Optical film assessment method Download PDFInfo
- Publication number
- TW202345654A TW202345654A TW112108735A TW112108735A TW202345654A TW 202345654 A TW202345654 A TW 202345654A TW 112108735 A TW112108735 A TW 112108735A TW 112108735 A TW112108735 A TW 112108735A TW 202345654 A TW202345654 A TW 202345654A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- optical film
- evaluation method
- optical
- liquid crystal
- Prior art date
Links
- 239000012788 optical film Substances 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 100
- 238000005259 measurement Methods 0.000 claims abstract description 50
- 230000003287 optical effect Effects 0.000 claims abstract description 32
- 238000011156 evaluation Methods 0.000 claims description 25
- 238000002834 transmittance Methods 0.000 claims description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 44
- 150000001875 compounds Chemical class 0.000 description 33
- 239000010410 layer Substances 0.000 description 22
- 239000010408 film Substances 0.000 description 20
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 238000011282 treatment Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 239000012790 adhesive layer Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 229920005668 polycarbonate resin Polymers 0.000 description 8
- 239000004431 polycarbonate resin Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 239000000178 monomer Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- KLDXJTOLSGUMSJ-JGWLITMVSA-N Isosorbide Chemical compound O[C@@H]1CO[C@@H]2[C@@H](O)CO[C@@H]21 KLDXJTOLSGUMSJ-JGWLITMVSA-N 0.000 description 5
- 229920000106 Liquid crystal polymer Polymers 0.000 description 5
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 5
- 229960002479 isosorbide Drugs 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000002335 surface treatment layer Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- -1 alicyclic diol Chemical class 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- XQKKWWCELHKGKB-UHFFFAOYSA-L calcium acetate monohydrate Chemical compound O.[Ca+2].CC([O-])=O.CC([O-])=O XQKKWWCELHKGKB-UHFFFAOYSA-L 0.000 description 1
- 229940067460 calcium acetate monohydrate Drugs 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- GROIHDHFSBIQKH-UHFFFAOYSA-N phenyl 3-[9-[[9-(3-oxo-3-phenoxypropyl)fluoren-9-yl]methyl]fluoren-9-yl]propanoate Chemical compound C=1C=CC=CC=1OC(=O)CCC1(C2=CC=CC=C2C2=CC=CC=C21)CC1(C2=CC=CC=C2C2=CC=CC=C21)CCC(=O)OC1=CC=CC=C1 GROIHDHFSBIQKH-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940042596 viscoat Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/02—Viewing or reading apparatus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Polarising Elements (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
本發明涉及光學薄膜之評估方法。The present invention relates to methods for evaluating optical films.
以液晶顯示裝置及電致發光(EL)顯示裝置(例如有機EL顯示裝置)為代表之影像顯示裝置急速普及。影像顯示裝置中，為了實現影像顯示、提高影像顯示之性能，一般係使用相位差構件、偏光構件等光學構件(例如參照專利文獻1)。Image display devices represented by liquid crystal display devices and electroluminescence (EL) display devices (such as organic EL display devices) are rapidly gaining popularity. In image display devices, in order to realize image display and improve image display performance, optical members such as phase difference members and polarizing members are generally used (for example, see Patent Document 1).
近年來，持續開發影像顯示裝置之新用途。例如，開始將用以實現Virtual Reality(VR)之附顯示器之護目鏡(VR護目鏡)產品化。隨著影像顯示裝置之用途的擴展，而對包含上述光學構件之光學薄膜期望具有因應用途之形狀。 先前技術文獻 專利文獻 In recent years, new uses for image display devices have been continuously developed. For example, we began to commercialize goggles with a display (VR goggles) for realizing Virtual Reality (VR). As the uses of image display devices expand, optical films including the above-mentioned optical components are expected to have shapes corresponding to the uses. Prior technical literature patent documents
專利文獻1：日本專利特開2021-103286號公報Patent Document 1: Japanese Patent Application Publication No. 2021-103286
發明欲解決之課題 然而，有時會因形狀而難以正確掌握光學薄膜之光學軸。 The problem to be solved by the invention However, it is sometimes difficult to accurately grasp the optical axis of the optical film due to its shape.
有鑑於上述，本發明主要目的在於正確評估光學薄膜之光學軸。In view of the above, the main purpose of the present invention is to correctly evaluate the optical axis of the optical film.
用以解決課題之手段 1.本發明實施形態之評估方法，係光學薄膜之評估方法；該評估方法包含下述步驟：於基板上配置前述光學薄膜，該基板係於外周具有直線部者；以前述基板之前述直線部作為基準，測定前述光學薄膜之光學軸；及根據前述基板與前述光學薄膜之位置關係來校正前述測定結果。 2.在如上述1之評估方法中，於上述基板之外周亦可形成有沿第一方向延伸之第一直線部與沿第二方向延伸之第二直線部，且上述基板具有前述第一直線部與前述第二直線部相交之角部。 3.在如上述1或2之評估方法中，上述基板亦可在光學上為各向同性。 4.在如上述1至3中任一項之評估方法中，上述基板之全光線透射率亦可為85%以上。 5.在如上述1至4中任一項之評估方法中，上述基板之霧度亦可為5%以下。 6.在如上述1至5中任一項之評估方法中，上述光學薄膜於外周亦可不具有直線部。 7.在如上述1至6中任一項之評估方法中，上述光學薄膜亦可具有用以對前述基板定位之定位部。 means to solve problems 1. The evaluation method of the embodiment of the present invention is an evaluation method of an optical film; the evaluation method includes the following steps: arranging the above-mentioned optical film on a substrate having a straight line portion on the outer periphery; As a reference, the optical axis of the optical film is measured; and the measurement result is corrected based on the positional relationship between the substrate and the optical film. 2. In the evaluation method as in 1 above, a first straight portion extending in the first direction and a second straight portion extending in the second direction may also be formed on the outer periphery of the above-mentioned substrate, and the above-mentioned substrate has the aforementioned first straight portion and The corner portion where the aforementioned second straight line portion intersects. 3. In the evaluation method described in 1 or 2 above, the substrate may be optically isotropic. 4. In the evaluation method according to any one of 1 to 3 above, the total light transmittance of the above-mentioned substrate can also be above 85%. 5. In the evaluation method according to any one of 1 to 4 above, the haze of the substrate may be 5% or less. 6. In the evaluation method according to any one of 1 to 5 above, the optical film does not need to have a straight portion on the outer periphery. 7. In the evaluation method according to any one of 1 to 6 above, the optical film may have a positioning portion for positioning the substrate.
8.本發明另一實施形態之測定裝置，係測定光學薄膜之光學軸的測定裝置； 該測定裝置具備： 基板，其係於外周具有直線部，且供配置前述光學薄膜者； 試樣保持部，其具有供載置前述基板之載置面、及相對於前述載置面為直立之限制面； 測定部，其可測定前述光學薄膜之光學軸；且 該測定裝置係在前述基板之前述直線部對接於前述限制面之狀態下進行前述測定。 9.本發明又另一實施形態之基板係用於測定光學薄膜之光學軸且供配置前述光學薄膜者，且該基板於外周具有直線部。 8. A measuring device according to another embodiment of the present invention is a measuring device for measuring the optical axis of an optical film; The measuring device has: A substrate having a straight portion on the outer periphery and for arranging the aforementioned optical film; The sample holding part has a placement surface for placing the aforementioned substrate, and a restriction surface that is upright relative to the aforementioned placement surface; A measuring part capable of measuring the optical axis of the aforementioned optical film; and This measurement device performs the measurement in a state where the linear portion of the substrate is in contact with the restriction surface. 9. A substrate according to yet another embodiment of the present invention is used for measuring the optical axis of an optical film and for arranging the aforementioned optical film, and the substrate has a straight portion on the outer periphery.
發明效果 根據本發明實施形態之評估方法，可正確評估光學薄膜之光學軸。 Invention effect According to the evaluation method according to the embodiment of the present invention, the optical axis of the optical film can be accurately evaluated.
用以實施發明之形態 以下參照圖式針對本發明實施形態進行說明，惟本發明不受該等實施形態所限。為了更明確說明圖式，相較於實施形態，有將各部分之寬度、厚度、形狀等示意顯示之情形，但僅為一例，非用以限定解釋本發明。又，關於圖式，有時會對相同或同等之要素賦予相同符號，並省略重複說明。 Form used to implement the invention Embodiments of the present invention will be described below with reference to the drawings, but the present invention is not limited to these embodiments. In order to explain the drawings more clearly, the width, thickness, shape, etc. of each part may be schematically shown compared to the embodiment. However, this is only an example and is not intended to limit the interpretation of the present invention. In addition, regarding the drawings, the same or equivalent elements may be assigned the same symbols, and repeated explanations may be omitted.
(用語及符號之定義) 本說明書中之用語及符號之定義如下。 (1)折射率(nx、ny、nz) 「nx」為面內折射率達最大之方向(亦即慢軸方向)的折射率，「ny」為在面內與慢軸正交之方向(亦即快軸方向)的折射率，而「nz」為厚度方向的折射率。 (2)面內相位差(Re) 「Re(λ)」係在23℃下以波長λnm之光測定之面內相位差。例如，「Re(550)」係在23℃下以波長550nm之光測定之面內相位差。Re(λ)可於令層(薄膜)之厚度為d(nm)時，藉由式：Re(λ)=(nx-ny)×d求出。 (3)厚度方向之相位差(Rth) 「Rth(λ)」係在23℃下以波長λnm之光測定之厚度方向之相位差。例如，「Rth(550)」係在23℃下以波長550nm之光測定之厚度方向之相位差。Rth(λ)可於令層(薄膜)厚度為d(nm)時，藉由式：Rth(λ)=(nx-nz)×d求出。 (4)Nz係數 Nz係數可藉由Nz=Rth/Re求出。 (5)角度 本說明書中提及角度時，該角度包含相對於基準方向往順時針方向及逆時針方向兩方向。因此，例如「45°」係指±45°。 (Definition of terms and symbols) The definitions of terms and symbols in this manual are as follows. (1)Refractive index (nx, ny, nz) "nx" is the refractive index in the direction where the in-plane refractive index reaches the maximum (that is, the slow axis direction), "ny" is the refractive index in the direction that is orthogonal to the slow axis in the plane (that is, the fast axis direction), and " nz" is the refractive index in the thickness direction. (2) In-plane phase difference (Re) "Re(λ)" is the in-plane phase difference measured with light of wavelength λnm at 23°C. For example, "Re(550)" is the in-plane phase difference measured using light with a wavelength of 550 nm at 23°C. Re(λ) can be calculated by the formula: Re(λ)=(nx-ny)×d when the thickness of the layer (thin film) is d(nm). (3) Phase difference in thickness direction (Rth) "Rth(λ)" is the phase difference in the thickness direction measured with light of wavelength λnm at 23°C. For example, "Rth(550)" is the phase difference in the thickness direction measured at 23°C using light with a wavelength of 550 nm. Rth(λ) can be calculated by the formula: Rth(λ)=(nx-nz)×d when the layer (film) thickness is d(nm). (4)Nz coefficient The Nz coefficient can be found by Nz=Rth/Re. (5)Angle When an angle is mentioned in this specification, the angle includes both clockwise and counterclockwise directions relative to the reference direction. So, for example, "45°" means ±45°.
本發明實施形態之光學薄膜之光學軸之評估方法包含下述步驟：使光學薄膜配置於基板上而準備測定基板，該基板係於外周具有直線部者；以基板之直線部作為基準，測定光學薄膜之光學軸；及根據基板與光學薄膜之位置關係來校正測定結果。The method for evaluating the optical axis of an optical film according to an embodiment of the present invention includes the following steps: disposing the optical film on a substrate to prepare a measurement substrate, which substrate has a straight portion on the outer periphery; using the straight portion of the substrate as a reference, measuring the optical axis The optical axis of the film; and correcting the measurement results based on the positional relationship between the substrate and the optical film.
作為評估對象之光學薄膜可具有光學軸。具體上，光學薄膜至少包含相位差構件，且可具有慢軸及快軸。相位差構件可具有任意適當之面內相位差Re(550)。相位差構件之面內相位差Re(550)例如為100nm~300nm。例如，當相位差構件可作為所謂的λ/4構件發揮功能時，其面內相位差Re(550)例如為100nm~190nm，可為110nm~180nm，可為130nm~160nm，亦可為135nm~155nm。The optical film to be evaluated may have an optical axis. Specifically, the optical film includes at least a retardation member, and may have a slow axis and a fast axis. The phase difference member may have any suitable in-plane phase difference Re(550). The in-plane phase difference Re(550) of the phase difference member is, for example, 100 nm to 300 nm. For example, when the phase difference member functions as a so-called λ/4 member, its in-plane phase difference Re(550) may be, for example, 100 nm to 190 nm, 110 nm to 180 nm, 130 nm to 160 nm, or 135 nm~ 155nm.
上述相位差構件代表上可為樹脂薄膜之延伸薄膜或液晶化合物之定向固化層。The above-mentioned retardation member can be representatively a stretched film of a resin film or a directionally solidified layer of a liquid crystal compound.
上述樹脂薄膜所含之樹脂可列舉：聚碳酸酯系樹脂、聚酯碳酸酯系樹脂、聚酯系樹脂、聚乙烯縮醛系樹脂、聚芳酯系樹脂、環狀烯烴系樹脂、纖維素系樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚苯乙烯系樹脂、丙烯酸系樹脂等。該等樹脂可單獨使用，亦可組合來使用。組合方法可舉例如摻合、共聚。相位差構件展現逆色散波長特性時，可適宜使用含聚碳酸酯系樹脂或聚酯碳酸酯系樹脂(以下有時僅稱為聚碳酸酯系樹脂)之樹脂薄膜。Examples of the resin contained in the above-mentioned resin film include polycarbonate resin, polyester carbonate resin, polyester resin, polyvinyl acetal resin, polyarylate resin, cyclic olefin resin, and cellulose resin. Resin, polyvinyl alcohol resin, polyamide resin, polyimide resin, polyether resin, polystyrene resin, acrylic resin, etc. These resins can be used individually or in combination. Examples of the combination method include blending and copolymerization. When the retardation member exhibits reverse dispersion wavelength characteristics, a resin film containing polycarbonate resin or polyestercarbonate resin (hereinafter sometimes referred to simply as polycarbonate resin) can be suitably used.
上述聚碳酸酯系樹脂可使用任意適當之聚碳酸酯系樹脂。例如，聚碳酸酯系樹脂包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元及源自選自於由脂環式二醇、脂環式二甲醇、二、三或聚乙二醇、以及伸烷基二醇或螺甘油所構成群組中之至少1種二羥基化合物之結構單元。聚碳酸酯系樹脂宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元、源自脂環式二甲醇之結構單元以及/或是源自二、三或聚乙二醇之結構單元；更宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元及源自二、三或聚乙二醇之結構單元。聚碳酸酯系樹脂亦可視需求包含有源自其他二羥基化合物之結構單元。此外，可適宜用於相位差構件之聚碳酸酯系樹脂及相位差構件之形成方法的詳細內容，例如記載於日本專利特開2014-10291號公報、日本專利特開2014-26266號公報、日本專利特開2015-212816號公報、日本專利特開2015-212817號公報、日本專利特開2015-212818號公報中，本說明書即援用該等公報之記載作為參考。Any appropriate polycarbonate resin can be used as the polycarbonate resin. For example, the polycarbonate resin includes a structural unit derived from a fluorine-based dihydroxy compound, a structural unit derived from an isosorbide-based dihydroxy compound, and a structural unit derived from an alicyclic diol, an alicyclic dimethanol, The structural unit of at least one dihydroxy compound in the group consisting of di, tri or polyethylene glycol, and alkylene glycol or spiroglycerol. The polycarbonate resin preferably contains structural units derived from fluorine-based dihydroxy compounds, structural units derived from isosorbide-based dihydroxy compounds, structural units derived from alicyclic dimethanol, and/or derived from di- or tri-hydroxy compounds. Or structural units of polyethylene glycol; more preferably, it includes structural units derived from fluorine dihydroxy compounds, structural units derived from isosorbide dihydroxy compounds, and structural units derived from di, tri or polyethylene glycol. The polycarbonate resin may also contain structural units derived from other dihydroxy compounds as required. In addition, details of a polycarbonate-based resin suitably used for the retardation member and a method of forming the retardation member are described in, for example, Japanese Patent Application Laid-Open No. 2014-10291, Japanese Patent Application Laid-Open No. 2014-26266, and Japanese Patent Application Laid-Open No. 2014-26266 The descriptions in Japanese Patent Application Publication No. 2015-212816, Japanese Patent Application Publication No. 2015-212817, and Japanese Patent Application Publication No. 212818 are used as references in this specification.
以樹脂薄膜之延伸薄膜構成之相位差構件的厚度例如為10µm~100µm，宜為10µm~70µm，較宜為20µm~60µm。The thickness of the retardation member composed of a stretched film of a resin film is, for example, 10µm to 100µm, preferably 10µm to 70µm, more preferably 20µm to 60µm.
上述液晶化合物之定向固化層係液晶化合物在層內於預定方向定向且其定向狀態經固定之層。此外，「定向固化層」之概念包含如後述使液晶單體硬化而得之定向硬化層。以相位差構件來說，代表上係棒狀液晶化合物沿相位差構件之慢軸方向排列之狀態下定向(沿面定向)。棒狀液晶化合物可舉例如液晶聚合物及液晶單體。液晶化合物宜可聚合。液晶化合物若可聚合，便可使液晶化合物於定向後進行聚合，藉此固定液晶化合物的定向狀態。The orientation-solidified layer of the above-mentioned liquid crystal compound is a layer in which the liquid crystal compound is oriented in a predetermined direction within the layer and its orientation state is fixed. In addition, the concept of "directionally hardened layer" includes a directionally hardened layer obtained by hardening a liquid crystal monomer as described later. In the case of a retardation member, it means that the rod-shaped liquid crystal compounds are aligned along the slow axis direction of the retardation member (along the surface). Examples of rod-shaped liquid crystal compounds include liquid crystal polymers and liquid crystal monomers. The liquid crystal compound is preferably polymerizable. If the liquid crystal compound is polymerizable, the liquid crystal compound can be polymerized after alignment, thereby fixing the alignment state of the liquid crystal compound.
上述液晶化合物之定向固化層(液晶定向固化層)可藉由下述方式來形成：對預定基材之表面施行定向處理，並於該表面塗敷含液晶化合物的塗敷液，使該液晶化合物於對應上述定向處理之方向定向，並固定該定向狀態。定向處理可採用任意適當之定向處理。具體上可舉機械性定向處理、物理性定向處理、化學性定向處理。機械性定向處理的具體例可舉磨擦處理、延伸處理。物理性定向處理的具體例可舉磁場定向處理、電場定向處理。化學性定向處理的具體例可舉斜向蒸鍍法、光定向處理。各種定向處理的處理條件可按目的採用任意適當之條件。The directionally solidified layer of the above-mentioned liquid crystal compound (liquid crystal directionally solidified layer) can be formed by subjecting the surface of a predetermined base material to an orientation treatment, and applying a coating liquid containing a liquid crystal compound to the surface, so that the liquid crystal compound Orient in the direction corresponding to the above orientation processing, and fix the orientation state. The directional treatment may employ any suitable directional treatment. Specifically, mechanical orientation treatment, physical orientation treatment, and chemical orientation treatment can be cited. Specific examples of mechanical orientation treatment include friction treatment and stretching treatment. Specific examples of physical orientation processing include magnetic field orientation processing and electric field orientation processing. Specific examples of chemical orientation treatment include oblique evaporation and photo-orientation treatment. The processing conditions for various targeted treatments can be any appropriate conditions depending on the purpose.
液晶化合物的定向可因應液晶化合物的種類在可展現液晶相之溫度下進行處理來進行。藉由進行所述溫度處理，液晶化合物會變為液晶狀態，而該液晶化合物會因應基材表面之定向處理方向而定向。The orientation of the liquid crystal compound can be carried out by treating the liquid crystal compound at a temperature that can exhibit a liquid crystal phase according to the type of the liquid crystal compound. By performing the temperature treatment, the liquid crystal compound will change into a liquid crystal state, and the liquid crystal compound will be oriented according to the direction of the orientation treatment on the surface of the substrate.
在一實施形態中，定向狀態之固定係藉由冷卻依上述方式定向之液晶化合物來進行。當液晶化合物為聚合性或交聯性時，定向狀態之固定係藉由對依上述方式定向之液晶化合物施行聚合處理或交聯處理來進行。In one embodiment, the alignment state is fixed by cooling the liquid crystal compound aligned in the above manner. When the liquid crystal compound is polymerizable or cross-linked, the alignment state is fixed by subjecting the liquid crystal compound oriented in the above manner to polymerization treatment or cross-linking treatment.
上述液晶化合物可使用任意適當之液晶聚合物及/或液晶單體。液晶聚合物及液晶單體各自可單獨使用，亦可組合。液晶化合物之具體例及液晶定向固化層之製作方法記載於例如日本專利特開2006-163343號公報、日本專利特開2006-178389號公報、國際公開第2018/123551號公報中。本說明書即援用該等公報之記載作為參考。Any appropriate liquid crystal polymer and/or liquid crystal monomer may be used as the above liquid crystal compound. The liquid crystal polymer and the liquid crystal monomer can each be used alone or in combination. Specific examples of the liquid crystal compound and methods of producing the liquid crystal alignment solidified layer are described in, for example, Japanese Patent Laid-Open No. 2006-163343, Japanese Patent Laid-Open No. 2006-178389, and International Publication No. 2018/123551. This manual refers to the records in these publications as a reference.
以液晶定向固化層構成之相位差構件的厚度例如為1µm~10µm，宜為1µm~8µm，較宜為1µm~6µm，更宜為1µm~4µm。The thickness of the phase difference member composed of the liquid crystal orientation solidified layer is, for example, 1µm~10µm, preferably 1µm~8µm, more preferably 1µm~6µm, and more preferably 1µm~4µm.
圖1係從上方觀看本發明一實施形態之測定基板的圖。測定基板6具有基板4、與配置於基板4上之光學薄膜2。基板4具有預定厚度(例如0.5mm~10mm)，且彼此相對向之兩主面為水平。基板4於外周具有俯視直線部。基板4於外周具有沿第一方向延伸之第一直線部4a與沿第二方向延伸之第二直線部4b。而且，基板4具有第一直線部4a與第二直線部4b相交之角部4c。基板4係第一方向與第二方向大致正交，且其俯視形狀呈大致矩形，惟基板之俯視形狀只要於外周之至少一部分形成有直線部，則無特別限定。例如，最長直線部分的長度相對於外周全長的比率大於0.1。FIG. 1 is a view from above of a measurement substrate according to an embodiment of the present invention. The
上述測定基板所用之基板宜在光學上為各向同性。藉由使用在光學上為各向同性之基板，可抑制對於光學薄膜之光學軸之評估所造成的影響。本說明書中，「在光學上為各向同性」意指面內相位差Re(590)為0nm~10nm。上述測定基板所用之基板之面內相位差Re(590)較宜為1nm以下，更宜為0.1nm以下，尤宜為0.05nm以下，最宜為0.01nm以下。上述測定基板所用之基板之厚度方向的相位差Rth(590)宜為-10nm~+10nm。The substrate used for the above-mentioned measurement substrate is preferably optically isotropic. By using an optically isotropic substrate, the influence on the evaluation of the optical axis of the optical film can be suppressed. In this specification, "optically isotropic" means that the in-plane phase difference Re (590) is 0 nm to 10 nm. The in-plane phase difference Re (590) of the substrate used for the above-mentioned measurement substrate is preferably 1 nm or less, more preferably 0.1 nm or less, especially 0.05 nm or less, most preferably 0.01 nm or less. The phase difference Rth (590) in the thickness direction of the substrate used for the above-mentioned measurement substrate is preferably -10nm~+10nm.
基板之全光線透射率宜為85%以上，較宜為88%以上，更宜為90%以上。基板之霧度宜為5%以下，較宜為3%以下，更宜為1%以下。藉由使用所述基板，可抑制對於光學薄膜之光學軸之評估所造成的影響。基板宜使用譬如玻璃基板。The total light transmittance of the substrate should be above 85%, more preferably above 88%, and more preferably above 90%. The haze of the substrate is preferably below 5%, more preferably below 3%, and more preferably below 1%. By using the substrate, the influence on the evaluation of the optical axis of the optical film can be suppressed. The substrate is preferably a glass substrate, for example.
光學薄膜2於外周不具有直線部。本說明書中，「於外周不具有直線部」係指最長直線部分的長度相對於外周全長的比率為0.1以下。於圖式例中，光學薄膜係做成大致橢圓形，但不限定於此，例如亦可為大致圓形。The
雖未圖示，但光學薄膜2亦可透過任意適當之層而配置於基板4上。例如，光學薄膜2宜透過接著劑層、黏著劑層等之接著層而固著於基板4上。Although not shown, the
光學薄膜之光學軸的測定係使用上述測定基板來進行。光學軸之測定裝置可使用任意適當之裝置。光學軸之測定裝置可舉例如王子計測器股份公司製之KOBRA-WPR。The optical axis of the optical film is measured using the above-mentioned measurement substrate. The measuring device of the optical axis may use any suitable device. An example of an optical axis measuring device is KOBRA-WPR manufactured by Oji Instruments Co., Ltd.
代表上，於測定光學軸時，係將上述測定基板載置於測定裝置之治具上。圖2A係從上方觀看於測定裝置之治具上載置有圖1所示測定基板之狀態之一例的圖，圖2B係從橫向觀看於測定裝置之治具上載置有圖1所示測定基板之狀態之一例的圖。測定裝置之試樣保持治具8具有以水平面構成之載置面8a、與相對於載置面8a為直立之限制面8b。測定基板6(基板4)係以第一直線部4a對接於試樣保持治具8之限制面8b之狀態載置於載置面8a上。基板4具有包含第一直線部4a之端面41，且端面41對接於限制面8b。相較於不使用基板4之情況，藉由使用基板4來評估光學薄膜2之光學軸，可大幅提升評估精度。將形成角部4c之第一直線部4a對接於限制面8b，可更提升評估精度。此外，雖未圖示，但於試樣保持治具8除了設有限制面8b以外，亦可還設有用以將試樣保持治具8安裝於測定裝置之基準部等。Typically, when measuring the optical axis, the above-mentioned measurement substrate is placed on the jig of the measurement device. FIG. 2A is a view of an example of the state where the measurement substrate shown in FIG. 1 is placed on the fixture of the measurement device, viewed from above, and FIG. 2B is a view of the measurement substrate shown in FIG. 1 placed on the fixture of the measurement device, viewed from the side. A diagram of an example of a state. The
根據基板與光學薄膜之位置關係來校正使用有測定基板之光學薄膜之光學軸的測定結果。基板與光學薄膜之位置關係例如可使用影像測定機進行座標化(數值化)。影像測定機可舉例如Nikon公司製之NEXIV系列。The measurement results of the optical axis of the optical film using the measurement substrate are corrected based on the positional relationship between the substrate and the optical film. The positional relationship between the substrate and the optical film can be coordinated (digitized) using an image measuring machine, for example. Examples of the image measuring machine include the NEXIV series manufactured by Nikon Corporation.
基板與光學薄膜之位置關係例如可藉由基板之直線部與連結光學薄膜之任意地點或任意2點之線的距離、角度來決定。光學薄膜2具有定位部2a、2a，其等係用以對基板4之第一直線部4a定位光學薄膜2之位置。在圖式例中，定位部2a係做成在俯視下外周被局部切除之切口部，惟不受此限。定位部例如可為在俯視下外周局部突出之突出部，亦可為設於光學薄膜之面內的記號。The positional relationship between the substrate and the optical film can be determined, for example, by the distance or angle between a straight line portion of the substrate and a line connecting any point or two points of the optical film. The
上述光學薄膜除了包含相位差構件以外，還可包含其他構件。其他構件之具體例可舉偏光構件等光學構件。上述光學薄膜可用於任意適當之影像顯示裝置。上述光學薄膜例如可用於VR護目鏡。The optical film may include other members in addition to the retardation member. Specific examples of other members include optical members such as polarizing members. The above optical film can be used in any suitable image display device. The above-mentioned optical film can be used in VR goggles, for example.
圖3係示意圖，顯示VR護目鏡之顯示系統之一例的概略構成，且圖3示意圖示出顯示系統之各構成要素的配置及形狀等。顯示系統10具備有：顯示元件12、反射型偏光構件14、第一透鏡部16、半反射鏡18、第1λ/4構件20、第2λ/4構件22及第二透鏡部24。反射型偏光構件14係配置於顯示元件12之顯示面12a側即前方，其可反射從顯示元件12射出之光。第一透鏡部16係配置於顯示元件12與反射型偏光構件14之間的光路上，半反射鏡18係配置於顯示元件12與第一透鏡部16之間。第1λ/4構件20係配置於顯示元件12與半反射鏡18之間的光路上，第2λ/4構件22係配置於半反射鏡18與反射型偏光構件14之間的光路上。FIG. 3 is a schematic diagram showing the schematic structure of an example of a display system of VR goggles, and FIG. 3 is a schematic diagram showing the arrangement and shape of each component of the display system. The
顯示元件12例如為液晶顯示器或有機EL顯示器，且具有用以顯示影像之顯示面12a。要從顯示面12a射出之光例如會通過顯示元件12可包含之偏光構件後射出，成為第1直線偏光。The
第1λ/4構件20可將入射第1λ/4構件20之第1直線偏光轉換成第1圓偏光。第1λ/4構件20亦可設於顯示元件12上而成一體。The first λ/4
半反射鏡18係使從顯示元件12射出之光透射，並使被反射型偏光構件14反射之光朝反射型偏光構件14反射。半反射鏡18係設於第一透鏡部16上而成一體。The
第2λ/4構件22可使在反射型偏光構件14及半反射鏡18反射之光透射反射型偏光構件14。第2λ/4構件22亦可設於第一透鏡部16上而成一體。The second λ/4
從第1λ/4構件20射出之第1圓偏光會通過半反射鏡18及第一透鏡部16，藉由第2λ/4構件22轉換成第2直線偏光。從第2λ/4構件22射出之第2直線偏光不會透射反射型偏光構件14而朝半反射鏡18反射。此時，入射反射型偏光構件14之第2直線偏光的偏光方向係與反射型偏光構件14之反射軸同方向。因此，入射反射型偏光構件14之第2直線偏光會被反射型偏光構件14反射。The first circularly polarized light emitted from the first λ/4
被反射型偏光構件14反射之第2直線偏光藉由第2λ/4構件22轉換成第2圓偏光，而從第2λ/4構件22射出之第2圓偏光係通過第一透鏡部16而被半反射鏡18反射。被半反射鏡18反射之第2圓偏光會通過第一透鏡部16，藉由第2λ/4構件22轉換成第3直線偏光。第3直線偏光會透射反射型偏光構件14。此時，入射反射型偏光構件14之第3直線偏光的偏光方向係與反射型偏光構件14之透射軸同方向。因此，入射反射型偏光構件14之第3直線偏光會透射反射型偏光構件14。The second linearly polarized light reflected by the reflective polarizing
透射反射型偏光構件14之光會通過第二透鏡部24入射使用者之眼睛26。The light from the
顯示元件12所含之偏光構件之吸收軸與反射型偏光構件14之反射軸可配置成互相大致平行，亦可配置成大致正交。顯示元件12所含之偏光構件之吸收軸與第1λ/4構件20之慢軸構成的角度例如為40°~50°，可為42°~48°，亦可為約45°。顯示元件12所含之偏光構件之吸收軸與第2λ/4構件22之慢軸構成的角度例如為40°~50°，可為42°~48°，亦可為約45°。The absorption axis of the polarizing member included in the
第1λ/4構件20之面內相位差Re(550)例如為100nm~190nm，可為110nm~180nm，可為130nm~160nm，亦可為135nm~155nm。第1λ/4構件20宜展現相位差值隨測定光之波長而變大的逆色散波長特性。第1λ/4構件20之Re(450)/Re(550)例如為0.75以上且小於1，亦可為0.8以上且0.95以下。The in-plane phase difference Re(550) of the first λ/4
第2λ/4構件22之面內相位差Re(550)例如為100nm~190nm，可為110nm~180nm，可為130nm~160nm，亦可為135nm~155nm。第2λ/4構件22宜展現相位差值隨測定光之波長而變大的逆色散波長特性。第2λ/4構件22之Re(450)/Re(550)例如為0.75以上且小於1，亦可為0.8以上且0.95以下。The in-plane phase difference Re(550) of the second λ/4
雖未圖示，但顯示系統10亦可具備有配置於反射型偏光構件14之前方的吸收型偏光構件。反射型偏光構件之反射軸與吸收型偏光構件之吸收軸可配置成互相大致平行。Although not shown, the
上述光學薄膜例如可包含上述顯示系統可具備之構件。具體上，光學薄膜可包含λ/4構件等相位差構件。又，光學薄膜可包含反射型偏光構件、吸收型偏光構件等偏光構件。並且，光學薄膜可包含保護構件、用以將相鄰之構件一體化之接著層等其他構件。光學薄膜之厚度會依例如所包含之構件的種類、數量而不同，但厚度例如為50µm~400µm。可應用於上述顯示系統之光學薄膜可具有對應第一透鏡部或第二透鏡部之形狀的形狀。例如，可設計成大致圓形、大致橢圓形等之於外周不具有直線部的形狀。此時，光學薄膜可設於第一透鏡部或第二透鏡部上而成一體。The optical film may include, for example, components that may be included in the display system. Specifically, the optical film may include a retardation member such as a λ/4 member. In addition, the optical film may include polarizing members such as reflective polarizing members and absorptive polarizing members. In addition, the optical film may include other components such as a protective member and an adhesive layer for integrating adjacent components. The thickness of the optical film will vary depending on the type and number of components included, but the thickness is, for example, 50µm~400µm. The optical film applicable to the above display system may have a shape corresponding to the shape of the first lens part or the second lens part. For example, it may be designed into a shape such as a substantially circular shape, a substantially elliptical shape, or the like, which does not have a straight portion on the outer periphery. At this time, the optical film can be provided on the first lens part or the second lens part to be integrated.
圖4係顯示光學薄膜之詳細內容之一例的示意剖面圖。光學薄膜2包含：第2λ/4構件22，其可相當於上述相位差構件；另一相位差構件28，其配置於第2λ/4構件22之一側；及保護構件30，其配置於第2λ/4構件22之另一側。FIG. 4 is a schematic cross-sectional view showing an example of details of the optical film. The
第2λ/4構件22宜為折射率特性展現nx＞ny≧nz之關係。在此「ny=nz」不只ny與nz完全相同之情況，還包含實質上相同之情況。因此，在不損及本發明效果之範圍下可有成為ny＜nz之情形。第2λ/4構件之Nz係數宜為0.9~3，較宜為0.9~2.5，更宜為0.9~1.5，尤宜為0.9~1.3。It is preferable that the refractive index characteristic of the second λ/4
另一相位差構件28例如可使用折射率特性可展現nz＞nx=ny之關係的構件(所謂正C板)。正C板之厚度方向的相位差Rth(550)宜為-50nm~-300nm，較宜為-70nm~-250nm，更宜為-90nm~-200nm，尤宜為-100nm~-180nm。在此，「nx=ny」不僅包含nx與ny嚴格上相等之情況，還包含nx與ny實質上相等之情況。正C板之面內相位差Re(550)例如小於10nm。The other
正C板可以任意適當之材料形成，而正C板宜由含固定成垂面定向之液晶材料的薄膜構成。可使垂面定向的液晶材料(液晶化合物)可為液晶單體，亦可為液晶聚合物。所述液晶化合物及正C板之形成方法的具體例可舉日本專利特開2002-333642號公報之段落[0020]~[0028]中記載之液晶化合物及該相位差層之形成方法。此時，正C板之厚度宜為0.5µm~5µm。The positive C plate can be formed of any suitable material, and the positive C plate is preferably composed of a film containing a liquid crystal material fixed in a vertical orientation. The liquid crystal material (liquid crystal compound) capable of vertical alignment can be a liquid crystal monomer or a liquid crystal polymer. Specific examples of the method of forming the liquid crystal compound and the positive C plate include the method of forming the liquid crystal compound and the retardation layer described in paragraphs [0020] to [0028] of Japanese Patent Application Laid-Open No. 2002-333642. At this time, the thickness of the positive C plate should be 0.5µm~5µm.
保護構件30代表上包含基材。基材可以任意適當之薄膜構成。成為構成基材之薄膜之主成分的材料，可舉例如：三醋酸纖維素(TAC)等之纖維素系樹脂、聚酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降𦯉烯系等之環烯烴系、聚烯烴系、(甲基)丙烯酸系及乙酸酯系等之樹脂。基材之厚度宜為5µm~80µm，較宜為10µm~40µm，更宜為15µm~35µm。The protective member 30 typically includes a substrate. The base material can be composed of any suitable film. Examples of materials that serve as the main component of the film constituting the base material include cellulose-based resins such as triacetylcellulose (TAC), polyester-based, polyvinyl alcohol-based, polycarbonate-based, polyamide-based, and polyester-based resins. Resins of imine series, polyether series, polystyrene series, polystyrene series, polynorphenyl series, cycloolefin series, polyolefin series, (meth)acrylic series and acetate series, etc. The thickness of the substrate should be 5µm~80µm, more preferably 10µm~40µm, more preferably 15µm~35µm.
保護構件30宜具有基材，再加上亦可具有形成於基材上之表面處理層。具有表面處理層之保護構件可配置成其基材位於第2λ/4構件22側。表面處理層可具有任意適當之功能。表面處理層例如宜具有抗反射功能。表面處理層之厚度宜為1µm~20µm，較宜為2µm~15µm，更宜為3µm~10µm。The protective member 30 preferably has a base material, and may also have a surface treatment layer formed on the base material. The protective member having the surface treatment layer may be arranged so that its base material is located on the 2nd λ/4
雖未圖示，但光學薄膜2所含之各構件宜透過接著層而一體化。又，光學薄膜2亦可藉由未圖示之接著層(例如黏著劑層)設於上述顯示系統之第一透鏡部上而成一體。具體而言，光學薄膜2亦可於另一相位差構件28表面設置接著層，藉由該接著層貼合於第一透鏡部上。接著層可以接著劑形成，亦可以黏著劑形成。接著層之厚度例如為0.05µm~30µm，宜為3µm~20µm，更宜為5µm~15µm。Although not shown in the figure, each member included in the
實施例 以下，藉由實施例來具體說明本發明，惟本發明不受該等實施例所限。此外，厚度、相位差值、透射率及霧度係藉由下述測定方法測定之值。 ＜厚度＞ 1µm以下的厚度係使用掃描型電子顯微鏡(日本電子公司製，產品名「JSM-7100F」)進行測定。大於1μm的厚度係使用數位測微器(Anritsu公司製，產品名「KC-351C」)進行測定。 ＜相位差值＞ 使用王子計測器股份公司製之KOBRA-WPR進行測定。測定波長設為450nm、550nm及590nm，測定溫度設為23℃。 ＜全光線透射率＞ 使用日本電色公司製之MDH-4000，根據JIS K 7361進行測定。 ＜霧度＞ 依循JIS 7136使用霧度計(村上色彩科學研究所公司製，產品名「HN-150」)進行測定。 Example Hereinafter, the present invention will be specifically described through examples, but the present invention is not limited by these examples. In addition, thickness, phase difference value, transmittance and haze are values measured by the following measurement methods. ＜Thickness＞ The thickness of 1 µm or less is measured using a scanning electron microscope (manufactured by JEOL Ltd., product name "JSM-7100F"). The thickness of more than 1 μm is measured using a digital micrometer (manufactured by Anritsu Co., Ltd., product name "KC-351C"). ＜Phase difference＞ Measurement was performed using KOBRA-WPR manufactured by Oji Instruments Co., Ltd. The measurement wavelengths were set to 450 nm, 550 nm, and 590 nm, and the measurement temperature was set to 23°C. ＜Total light transmittance＞ Measurement was performed in accordance with JIS K 7361 using MDH-4000 manufactured by Nippon Denshoku Co., Ltd. ＜Haze＞ The measurement was performed using a haze meter (manufactured by Murakami Color Science Laboratory Co., Ltd., product name "HN-150") in accordance with JIS 7136.
[實施例1] 準備厚度1.3mm且65mm×165mm尺寸之玻璃基板。該玻璃基板之面內相位差Re(590)為0nm，全光線透射率為92.26%，霧度為0.16%。 [Example 1] Prepare a glass substrate with a thickness of 1.3mm and a size of 65mm×165mm. The in-plane phase difference Re (590) of the glass substrate is 0 nm, the total light transmittance is 92.26%, and the haze is 0.16%.
(λ/4構件之製作) 使用由2台具備有攪拌葉片及控制成100℃之回流冷卻器的直立式反應器構成之批次聚合裝置進行聚合。饋入雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷29.60質量份(0.046mol)、異山梨醇(ISB)29.21質量份(0.200mol)、螺甘油(SPG)42.28質量份(0.139mol)、碳酸二苯酯(DPC)63.77質量份(0.298mol)及作為觸媒的乙酸鈣一水合物1.19×10 -2質量份(6.78×10 -5mol)。將反應器內進行減壓氮取代後，以熱介質加溫，並於內溫達100℃之時間點開始攪拌。於升溫開始40分鐘後使內溫達到220℃，在以維持該溫度之方式進行控制的同時開始減壓，在達到220℃後以90分鐘使其成為13.3kPa。將隨聚合反應副生成之酚蒸氣導入100℃之回流冷卻器，使酚蒸氣中所含些許量之單體成分返回反應器，並將未凝聚之酚蒸氣導入45℃的凝聚器中回收。將氮導入第1反應器暫時使其回復到大氣壓後，將第1反應器內之經寡聚化的反應液移至第2反應器。接著，開始進行第2反應器內的升溫及減壓，並以50分鐘使內溫成為240℃、壓力成為0.2kPa。然後，進行聚合直到達到預定之攪拌功率。在達到預定功率之時間點將氮導入反應器中使壓力回復，並將所生成之聚酯碳酸酯系樹脂擠出至水中，裁切束狀物而獲得丸粒。 (Preparation of λ/4 member) Polymerization was performed using a batch polymerization apparatus consisting of two vertical reactors equipped with stirring blades and a reflux cooler controlled to 100°C. Feed in 29.60 parts by mass (0.046 mol) of bis[9-(2-phenoxycarbonylethyl)fluoren-9-yl]methane, 29.21 parts by mass (0.200 mol) of isosorbide (ISB), and spiroglycerol (SPG) 42.28 parts by mass (0.139 mol), 63.77 parts by mass (0.298 mol) of diphenyl carbonate (DPC) and 1.19×10 -2 parts by mass (6.78×10 -5 mol) of calcium acetate monohydrate as a catalyst. After the reactor was replaced with nitrogen under reduced pressure, it was heated with a heat medium, and stirring was started when the internal temperature reached 100°C. The internal temperature was brought to 220°C 40 minutes after the start of the temperature rise, and the pressure was reduced while controlling to maintain the temperature. After reaching 220°C, it was brought to 13.3 kPa in 90 minutes. The phenol vapor generated by the polymerization reaction is introduced into a reflux cooler at 100°C, so that a small amount of monomer components contained in the phenol vapor is returned to the reactor, and the uncondensed phenol vapor is introduced into a condenser at 45°C for recovery. After introducing nitrogen into the first reactor and temporarily returning it to atmospheric pressure, the oligomerized reaction liquid in the first reactor is moved to the second reactor. Next, the temperature increase and pressure reduction in the second reactor were started, and the internal temperature was adjusted to 240° C. and the pressure to 0.2 kPa over 50 minutes. Then, polymerization is performed until a predetermined stirring power is reached. At the time point when the predetermined power is reached, nitrogen is introduced into the reactor to restore the pressure, the generated polyester carbonate resin is extruded into water, and the bundles are cut to obtain pellets.
將所得聚酯碳酸酯系樹脂(丸粒)在80℃下真空乾燥5小時後，使用具備單軸擠製機(東芝機械公司製，缸筒設定溫度：250℃)、T型模(寬200mm，設定溫度：250℃)、冷卻輥(設定溫度：120~130℃)及捲取機之薄膜製膜裝置，製作出厚度135μm之長條狀樹脂薄膜。將所得長條狀樹脂薄膜以延伸溫度143℃、延伸倍率2.8倍往寬度方向延伸，而獲得厚度47μm之延伸薄膜。所得延伸薄膜之Re(590)為145nm，Re(450)/Re(550)為0.86，Nz係數為1.12。又，延伸薄膜之全光線透射率為96.81%，霧度為0.48%。The obtained polyester carbonate resin (pellets) was vacuum-dried at 80°C for 5 hours, and then used a single-screw extruder (manufactured by Toshiba Machine Co., Ltd., cylinder set temperature: 250°C) and a T-die (width 200mm). , set temperature: 250℃), cooling roller (set temperature: 120~130℃) and film forming device of the winding machine to produce a long resin film with a thickness of 135μm. The obtained long resin film was stretched in the width direction at a stretching temperature of 143°C and a stretching ratio of 2.8 times to obtain a stretched film with a thickness of 47 μm. The Re(590) of the obtained stretched film was 145 nm, Re(450)/Re(550) was 0.86, and the Nz coefficient was 1.12. In addition, the total light transmittance of the stretched film is 96.81%, and the haze is 0.48%.
(正C板之形成) 將下述化學式(1)(式中之數字65及35表示單體單元之莫耳%，權宜上以嵌段聚合物表示：重量平均分子量5000)所示之側鏈型液晶聚合物20重量份、展現向列型液晶相之聚合性液晶(BASF公司製：商品名PaliocolorLC242)80重量份及光聚合引發劑(Ciba Specialty Chemicals公司製：商品名IRGACURE 907)5重量份溶解於環戊酮200重量份中，而調製出液晶塗敷液。接著，利用棒塗機將該塗敷液塗敷於已施行垂直定向處理之PET基材後，以80℃加熱乾燥4分鐘，藉此使液晶定向。對該液晶層照射紫外線使液晶層硬化，藉此於基材上形成厚度為4µm且Rth(550)為-100nm之正C板。 [化學式1] (Formation of positive C plate) The side chain represented by the following chemical formula (1) (numbers 65 and 35 in the formula represent mol% of monomer units, expediently expressed as a block polymer: weight average molecular weight 5000) 20 parts by weight of a liquid crystal polymer, 80 parts by weight of a polymerizable liquid crystal exhibiting a nematic liquid crystal phase (manufactured by BASF: trade name PaliocolorLC242), and 5 parts by weight of a photopolymerization initiator (manufactured by Ciba Specialty Chemicals: trade name IRGACURE 907) It was dissolved in 200 parts by weight of cyclopentanone to prepare a liquid crystal coating liquid. Next, the coating liquid was applied to the vertically oriented PET substrate using a bar coater, and then heated and dried at 80° C. for 4 minutes to orient the liquid crystal. The liquid crystal layer was irradiated with ultraviolet rays to harden the liquid crystal layer, thereby forming a positive C plate with a thickness of 4 μm and an Rth (550) of -100 nm on the base material. [Chemical formula 1]
(保護構件之製作) 將下述所示之抗反射層形成材料塗佈於具有內酯環結構之丙烯酸薄膜並以80℃加熱1分鐘，再以高壓水銀燈對加熱後之塗佈層照射累積光量300mJ/cm 2之紫外線使塗佈層硬化，而獲得形成有厚度0.1µm之抗反射層的丙烯酸薄膜(厚度44µm)。 (Preparation of protective member) The anti-reflective layer forming material shown below is coated on an acrylic film with a lactone ring structure and heated at 80°C for 1 minute, and then the heated coating layer is irradiated with a high-pressure mercury lamp to accumulate light. Ultraviolet light of 300mJ/ cm2 hardens the coating layer, and an acrylic film (thickness 44µm) with an anti-reflective layer of 0.1µm is obtained.
(抗反射層形成材料)
混合以新戊四醇三丙烯酸酯為主成分之多官能丙烯酸酯(大阪有機化學工業股份公司製，商品名「Viscoat #300」，固體成分100重量%)100重量份、中空奈米二氧化矽粒子(日揮觸媒化成工業股份公司製，商品名「THRULYA 5320」，固體成分20重量%，重量平均粒徑75nm)150重量份、實心奈米二氧化矽粒子(日產化學工業股份公司製，商品名「MEK-2140Z-AC」，固體成分30重量%，重量平均粒徑10nm)50重量份、含氟元素之添加劑(信越化學工業股份公司製，商品名「KY-1203」，固體成分20重量%)12重量份及光聚合引發劑(BASF公司製，商品名「OMNIRAD907」，固體成分100重量%)3重量份。於該混合物中，添加以60：25：15重量比混合TBA(三級丁醇)、MIBK(甲基異丁基酮)及PMA(丙二醇單甲基醚乙酸酯)而成之混合溶劑作為稀釋溶劑，使整體之固體成分成為4重量%，並攪拌而調製出抗反射層形成用塗敷液。
(Anti-reflection layer forming material)
Mix 100 parts by weight of polyfunctional acrylate containing neopentyl erythritol triacrylate as the main component (manufactured by Osaka Organic Chemical Industry Co., Ltd., trade name "Viscoat #300", solid content 100% by weight), and hollow nanosilica Particles (manufactured by Nissan Chemical Industry Co., Ltd., trade name "THRULYA 5320",
(光學薄膜) 透過紫外線硬化型接著劑(硬化後之厚度1µm)將下述之上述正C板貼合於上述λ/4構件(延伸薄膜)上。接著，透過上述厚度5µm之黏著劑層將上述保護構件貼合於λ/4構件上，而獲得積層體。 從所得積層體衝壓出32片如圖1所示之橢圓形光學薄膜。此外，係以預先掌握之λ/4構件之慢軸方向相對於所得光學薄膜之短邊方向成為45°之方向的方式進行衝壓。 (optical film) The above-mentioned positive C plate described below is bonded to the above-mentioned λ/4 member (stretched film) through an ultraviolet curable adhesive (thickness after curing: 1µm). Next, the above-mentioned protective member was bonded to the λ/4 member through the above-mentioned adhesive layer with a thickness of 5 μm to obtain a laminate. From the obtained laminated body, 32 pieces of elliptical optical films as shown in Fig. 1 were punched out. In addition, stamping is performed so that the slow axis direction of the λ/4 member, which has been determined in advance, becomes a direction of 45° with respect to the short side direction of the obtained optical film.
(軸角度之測定) 將所得光學薄膜配置於上述玻璃基板上而獲得測定基板。具體上，係透過厚度12µm之黏著劑層將光學薄膜貼合於玻璃基板上而獲得測定基板。 將所得測定基板載置於相位差測定裝置(王子計測器股份公司製，產品名「KOBRA-WPR」)之試樣保持治具上。具體上係如圖2所示，將測定基板之直線部對接於試樣保持治具之限制面。然後，在測定波長590nm、測定溫度為23℃±2℃及測定濕度60%±2%之條件下，測定光學薄膜之慢軸方向。具體上，係測定光學薄膜之慢軸方向相對於試樣保持治具之限制面所構成之軸角度。 (Measurement of axis angle) The obtained optical film was placed on the above-mentioned glass substrate to obtain a measurement substrate. Specifically, an optical film is bonded to a glass substrate through an adhesive layer with a thickness of 12µm to obtain a measurement substrate. The obtained measurement substrate was placed on the sample holding jig of a phase difference measurement device (manufactured by Oji Instruments Co., Ltd., product name: "KOBRA-WPR"). Specifically, as shown in Figure 2, the linear portion of the measurement substrate is docked with the limiting surface of the sample holding fixture. Then, measure the slow axis direction of the optical film under the conditions of a measurement wavelength of 590 nm, a measurement temperature of 23°C ± 2°C, and a measurement humidity of 60% ± 2%. Specifically, the axis angle formed by the slow axis direction of the optical film relative to the limiting surface of the sample holding fixture is measured.
(校正) 校正上述測定所得之軸角度，並評估光學薄膜之慢軸。具體上，係將測定基板中光學薄膜相對於玻璃基板之上邊的位置座標化，並算出貼合之偏移，再以所算出之偏移校正上述測定所得之軸角度。玻璃基板與光學薄膜位置之座標化係使用影像測定機(Nikon公司製，「NEXIV VMZ-R6555」)來進行。 (Correction) The axis angle obtained by the above measurement is corrected, and the slow axis of the optical film is evaluated. Specifically, the position of the optical film in the measurement substrate relative to the upper edge of the glass substrate is coordinateized, the offset of the lamination is calculated, and the calculated offset is used to correct the axis angle obtained by the above measurement. The coordinate positioning of the glass substrate and the optical film was performed using an image measuring machine ("NEXIV VMZ-R6555" manufactured by Nikon Corporation).
[比較例1] 除了以下方面以外，依與實施例1相同方式評估光學薄膜之慢軸。 ・於軸角度之測定中，不使用玻璃基板而將光學薄膜直接載置於試樣保持治具上。具體上，係以橢圓形光學薄膜之短邊方向與試樣保持治具之限制面正交之方式對接。 ・不進行軸角度之校正。 [Comparative example 1] The slow axis of the optical film was evaluated in the same manner as in Example 1 except for the following points. ・In the measurement of the axis angle, the optical film is placed directly on the sample holding jig without using a glass substrate. Specifically, the short side direction of the elliptical optical film is orthogonal to the limiting surface of the sample holding fixture. ・The axis angle is not corrected.
將實施例1之評估結果及比較例1之測定結果的標準差(參差程度)列示於以下。比較例1中，在將光學薄膜載置於夾具上時容易產生偏移，而可謂測定值不一致。另一方面，實施例1中，由於使用玻璃基板而不易產生上述偏移且有進行校正，因此評估值之參差極低。The standard deviation (degree of variation) of the evaluation results of Example 1 and the measurement results of Comparative Example 1 are shown below. In Comparative Example 1, when the optical film was placed on the jig, it was easy to shift, and it could be said that the measured values were inconsistent. On the other hand, in Example 1, since the above-mentioned deviation is less likely to occur due to the use of a glass substrate and correction is performed, the variation in evaluation values is extremely low.
[表1] [Table 1]
本發明不受上述實施形態所限，可進行各種變形。例如，可以實質上與上述實施形態所示構成相同之構成、可發揮相同作用效果之構成或可達成相同目的之構成作取代。The present invention is not limited to the above-described embodiment, and various modifications are possible. For example, it may be replaced by a structure that is substantially the same as that shown in the above-mentioned embodiment, a structure that can produce the same effects, or a structure that can achieve the same purpose.
產業上之可利用性 本發明實施形態之評估方法可適宜用於評估光學薄膜之光學軸。 industrial availability The evaluation method according to the embodiment of the present invention can be suitably used to evaluate the optical axis of an optical film.
2:光學薄膜
2a:定位部
4:基板
41:端面
4a:第一直線部
4b:第二直線部
4c:角部
6:測定基板
8:試樣保持治具
8a:載置面
8b:限制面
10:顯示系統
12:顯示元件
12a:顯示面
14:反射型偏光構件
16:第一透鏡部
18:半反射鏡
20:第1λ/4構件
22:第2λ/4構件
24:第二透鏡部
26:使用者之眼睛
28:另一相位差構件
30:保護構件
2:
圖1係從上方觀看本發明一實施形態之測定基板的圖。 圖2A係從上方觀看於測定裝置之治具上載置有圖1所示測定基板之狀態之一例的圖。 圖2B係從橫向觀看於測定裝置之治具上載置有圖1所示測定基板之狀態之一例的圖。 圖3係示意圖，顯示VR護目鏡之顯示系統之一例的概略構成。 圖4係顯示光學薄膜之詳細內容之一例的示意剖面圖。 FIG. 1 is a view from above of a measurement substrate according to an embodiment of the present invention. FIG. 2A is a view from above of an example of a state in which the measurement substrate shown in FIG. 1 is placed on a jig of the measurement device. FIG. 2B is a side view of an example of a state in which the measurement substrate shown in FIG. 1 is placed on a jig of the measurement device. FIG. 3 is a schematic diagram showing the schematic structure of an example of a display system of VR goggles. FIG. 4 is a schematic cross-sectional view showing an example of details of the optical film.
2:光學薄膜 2: Optical film
2a:定位部 2a: Positioning Department
4:基板 4:Substrate
4a:第一直線部 4a: First Line Department
4b:第二直線部 4b: Second linear part
4c:角部 4c: Corner
6:測定基板 6: Measure the substrate
Claims (9)
Applications Claiming Priority (28)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022039285 | 2022-03-14 | ||
| JP2022-039286 | 2022-03-14 | ||
| JP2022-039285 | 2022-03-14 | ||
| JP2022039286 | 2022-03-14 | ||
| JP2022077657A JP2023134317A (en) | 2022-03-14 | 2022-05-10 | Display system, display method, display body, and display body production method |
| JP2022077633A JP7516456B2 (en) | 2022-05-10 | Display method | |
| JP2022-077677 | 2022-05-10 | ||
| JP2022-077634 | 2022-05-10 | ||
| JP2022077631A JP2023134316A (en) | 2022-03-14 | 2022-05-10 | Lens part, laminated body, display body, display body production method, and display method |
| JP2022077659A JP2023166841A (en) | 2022-05-10 | 2022-05-10 | Display system, display method, display body, and method for manufacturing display body |
| JP2022077658A JP2023166840A (en) | 2022-05-10 | 2022-05-10 | Display system, display method, display body, and method for manufacturing display body |
| JP2022077634A JP7516457B2 (en) | 2022-05-10 | Lens portion, laminate, display, manufacturing method of display, and display method | |
| JP2022-077633 | 2022-05-10 | ||
| JP2022-077658 | 2022-05-10 | ||
| JP2022077676A JP2023166851A (en) | 2022-05-10 | 2022-05-10 | Lens portion, laminate, display body, method for manufacturing display body, and display method |
| JP2022077678A JP2023166853A (en) | 2022-05-10 | 2022-05-10 | Lens portion, laminate, display body, method for manufacturing display body, and display method |
| JP2022-077676 | 2022-05-10 | ||
| JP2022-077657 | 2022-05-10 | ||
| JP2022077677A JP2023166852A (en) | 2022-05-10 | 2022-05-10 | Lens portion, laminate, display body, method for manufacturing display body, and display method |
| JP2022-077659 | 2022-05-10 | ||
| JP2022-077632 | 2022-05-10 | ||
| JP2022-077678 | 2022-05-10 | ||
| JP2022077632A JP7516455B2 (en) | 2022-05-10 | Lens portion, laminate, display, manufacturing method of display, and display method | |
| JP2022077679A JP7516458B2 (en) | 2022-05-10 | Lens portion, laminate, display, manufacturing method of display, and display method | |
| JP2022-077679 | 2022-05-10 | ||
| JP2022-077631 | 2022-05-10 | ||
| JP2022179699A JP2024068977A (en) | 2022-11-09 | 2022-11-09 | Optical film evaluation method |
| JP2022-179699 | 2022-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202345654A true TW202345654A (en) | 2023-11-16 |
Family
ID=88023206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112108735A TW202345654A (en) | 2022-03-14 | 2023-03-09 | Optical film assessment method |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TW202345654A (en) |
| WO (1) | WO2023176585A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0518858A (en) * | 1991-07-12 | 1993-01-26 | Casio Comput Co Ltd | Method for measuring optical characteristic of membrane |
| JP4568064B2 (en) * | 2004-09-28 | 2010-10-27 | 株式会社 日立ディスプレイズ | Optical anisotropic axis measuring device |
| JP2010139345A (en) * | 2008-12-11 | 2010-06-24 | Tokyo Institute Of Technology | Birefringence measurement apparatus |
| JP5292265B2 (en) * | 2009-12-01 | 2013-09-18 | 富士フイルム株式会社 | Manufacturing method of optical film |
| JP3228809U (en) * | 2020-09-02 | 2020-11-12 | 住友化学株式会社 | Inspection equipment |
-
2023
- 2023-03-07 WO PCT/JP2023/008533 patent/WO2023176585A1/en unknown
- 2023-03-09 TW TW112108735A patent/TW202345654A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023176585A1 (en) | 2023-09-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW202337703A (en) | Optical laminate, lens part, and display method | |
| TW202345654A (en) | Optical film assessment method | |
| TW202146224A (en) | Antireflection layer-equipped circular polarizing plate and image display device using antireflection layer-equipped circular polarizing plate | |
| JP2024068977A (en) | Optical film evaluation method | |
| WO2023176692A1 (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176627A1 (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176625A1 (en) | Lens part, display body, and display method | |
| WO2023176624A1 (en) | Lens part, display body, and display method | |
| WO2023176691A1 (en) | Display system, display method, display body, and method for manufacturing display body | |
| TW202345431A (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176626A1 (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176630A1 (en) | Optical laminate, lens unit, and display method | |
| TW202401085A (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176629A1 (en) | Optical laminate, lens portion, and display method | |
| WO2023176693A1 (en) | Display system, display method, display body, and method for manufacturing display body | |
| WO2023176363A1 (en) | Display system, display method, display body, and display body manufacturing method | |
| JP2024095146A (en) | Optical laminate, lens portion and display method | |
| JP2024095144A (en) | Lens portion, display body and display method | |
| JP2024095150A (en) | Optical laminate, lens portion and display method | |
| TW202346915A (en) | Lens part, laminate, display body, and manufacturing method and display method for display body | |
| TW202344873A (en) | Lens part, laminate, display body, and manufacturing method and display method for display body | |
| JP2024095145A (en) | Lens portion, display body and display method | |
| TW202415988A (en) | Optical laminate with excellent optical compensation performance in a layered direction and in an oblique direction | |
| TW202403393A (en) | Lens part, laminate, display body, and manufacturing method and display method for display body | |
| JP2023166840A (en) | Display system, display method, display body, and method for manufacturing display body |