TW202100185A - Fluid sterilization device - Google Patents
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- TW202100185A TW202100185A TW109104266A TW109104266A TW202100185A TW 202100185 A TW202100185 A TW 202100185A TW 109104266 A TW109104266 A TW 109104266A TW 109104266 A TW109104266 A TW 109104266A TW 202100185 A TW202100185 A TW 202100185A
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- 239000012530 fluid Substances 0.000 title claims abstract description 114
- 230000001954 sterilising effect Effects 0.000 title claims abstract description 63
- 238000004659 sterilization and disinfection Methods 0.000 title claims abstract description 63
- 238000012545 processing Methods 0.000 claims abstract description 30
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- 238000004148 unit process Methods 0.000 abstract 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L9/00—Disinfection, sterilisation or deodorisation of air
- A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
- A61L9/18—Radiation
- A61L9/20—Ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
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- Toxicology (AREA)
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Abstract
Description
本發明的實施方式是有關於一種流體殺菌裝置。The embodiment of the present invention relates to a fluid sterilization device.
已知如下的流體殺菌裝置,其通過將光源的發光元件所發出的紫外線,例如朝向水、氣體等流體所流動的流路照射,來對流體進行殺菌。此種流體殺菌裝置中,存在安裝有發出紫外線的發光二極體(Light Emitting Diode,LED)來作為光源的基板的裝置。 [現有技術文獻]There is known a fluid sterilization device that sterilizes fluid by irradiating ultraviolet rays emitted from a light-emitting element of a light source, for example, toward a flow path through which fluid such as water and gas flows. In such a fluid sterilization device, there is a device in which a light emitting diode (Light Emitting Diode, LED) that emits ultraviolet rays is mounted as a substrate of a light source. [Prior Art Literature]
[專利文獻] [專利文獻1] 日本專利特開2017-051290號公報 [專利文獻2] 日本專利特開2018-069166號公報[Patent Literature] [Patent Document 1] Japanese Patent Application Publication No. 2017-051290 [Patent Document 2] Japanese Patent Application Publication No. 2018-069166
[發明所要解決的問題] 但,當對在流路中流動的流體照射LED所發出的紫外線,對流體進行殺菌的情況下,為了獲得更高的殺菌效果,理想為提高LED的輸出,提高紫外線對流體的照射效率。但是,僅通過提高對LED的供給電力,或增加LED的安裝數量,具有由發熱引起的溫度限制的LED通過隨著發光的發熱而發光效率下降,因此難以提高紫外線的照射效率。[The problem to be solved by the invention] However, when the fluid flowing in the flow path is irradiated with ultraviolet rays emitted by the LED to sterilize the fluid, in order to obtain a higher sterilization effect, it is desirable to increase the output of the LED and increase the efficiency of ultraviolet radiation to the fluid. However, only by increasing the power supply to the LEDs or increasing the number of LEDs installed, LEDs with temperature restrictions due to heat generation decrease their luminous efficiency along with the heat generated by the light, and it is therefore difficult to increase the efficiency of ultraviolet radiation.
另外,光源隨著點燈時間的經過而發光效率下降,因此流體殺菌裝置中,必須將光源等組件定期更換。然而,現有的流體殺菌裝置中,更換組件時需要繁瑣的作業。In addition, the luminous efficiency of the light source decreases as the lighting time elapses. Therefore, in the fluid sterilization device, it is necessary to periodically replace the light source and other components. However, in the conventional fluid sterilization device, cumbersome work is required when replacing components.
本發明所要解決的問題為提供一種流體殺菌裝置,其不僅能夠抑制光源的溫度上升,而且能夠容易更換組件。 [解決問題的技術手段]The problem to be solved by the present invention is to provide a fluid sterilization device that not only can suppress the temperature rise of the light source, but also can easily replace the components. [Technical means to solve the problem]
實施方式的流體殺菌裝置包括處理部、光源部、蓋構件、及流路構件。處理部對流體進行處理。光源部包括朝向處理部照射紫外線的光源、以及支撐光源的支撐構件。蓋構件配置於光源部的前表面側,保護光源不受流體的影響。流路構件包括將蓋構件加以保持的保持部、以及使處理部與外部連通的流體流路。流體流路的至少一部分位於光源部的側方,光源部與流路構件熱性接觸。流路構件包括裝配部,其以能拆裝的方式裝配光源部。 [發明的效果]The fluid sterilization device of the embodiment includes a processing unit, a light source unit, a cover member, and a flow path member. The processing part processes the fluid. The light source part includes a light source that irradiates ultraviolet rays toward the treatment part, and a support member that supports the light source. The cover member is arranged on the front surface side of the light source part to protect the light source from the influence of the fluid. The flow path member includes a holding portion that holds the cover member, and a fluid flow path that communicates the processing portion with the outside. At least a part of the fluid flow path is located on the side of the light source part, and the light source part is in thermal contact with the flow path member. The flow path member includes an assembly part that assembles the light source part in a removable manner. [Effects of the invention]
依據本發明,不僅能夠抑制光源的溫度上升,而且容易更換組件。According to the present invention, not only can the temperature rise of the light source be suppressed, but also the components can be easily replaced.
以下所說明的實施方式的流體殺菌裝置1包括:處理部20、光源部40、蓋構件50、及流路構件30。處理部20對流體進行處理。光源部40包括朝向處理部20照射紫外線的光源42、以及支撐光源42的支撐構件41。蓋構件50配置於光源部40的前表面側,保護光源42不受流體影響。流路構件30包括將蓋構件50加以保持的保持部、以及使處理部20與外部連通的流體流路。流體流路的至少一部分位於光源部40的側方,光源部40與流路構件30熱性接觸。流路構件30包括能拆裝地裝配光源部40的裝配部。The fluid sterilization device 1 of the embodiment described below includes a
另外,以下所示的實施方式的流路構件30在光源部40的背面側延伸存在,光源部40從蓋構件50的側面側裝配於流路構件30。In addition, the
此外,以下所說明的實施方式的支撐構件41具有使與流體不同的加熱介質流通的介質流路412。In addition, the
另外,以下所說明的實施方式的流路構件30在光源部40的側方具有流體流路的開口。In addition, the
以下,參照圖式,對實施方式的流體殺菌裝置進行說明。此外,以下的各實施方式表示一例,並不限定發明。另外,以下所示的各實施方式能夠在不矛盾的範圍內適當組合。另外,各實施方式的說明中,對同一構成賦予同一符號,省略後述的說明。Hereinafter, the fluid sterilization device of the embodiment will be described with reference to the drawings. In addition, each of the following embodiments shows an example and does not limit the invention. In addition, each embodiment shown below can be combined suitably within the range which does not contradict. In addition, in the description of each embodiment, the same reference numerals are given to the same components, and the following description is omitted.
(第一實施方式) 圖1是表示第一實施方式的流體殺菌裝置的應用例的示意圖。圖2是表示第一實施方式的流體殺菌裝置的剖面圖。(First Embodiment) Fig. 1 is a schematic diagram showing an application example of the fluid sterilization device of the first embodiment. Fig. 2 is a cross-sectional view showing the fluid sterilization device of the first embodiment.
此外,為了使說明容易理解,圖2中圖示出三維的正交坐標系,其包含將鉛垂向上設為正方向、且將鉛垂向下設為負方向的Z軸。所述正交坐標系在後述說明所使用的其他圖式中也示出。In addition, in order to make the description easy to understand, the diagram in FIG. 2 shows a three-dimensional orthogonal coordinate system including the Z axis with the vertical upward as the positive direction and the vertical downward as the negative direction. The orthogonal coordinate system is also shown in other drawings used in the following description.
(流體殺菌裝置的構成)
如圖1所示,第一實施方式的流體殺菌裝置1不僅與供給流體的供給箱2連結,而且與將經紫外線照射的流體回收的回收箱7連結。如圖1及圖2所示,流體殺菌裝置1的上游側經由上游側流路構件4而與供給箱2連結。在上游側流路構件4,設置有從供給箱2向流體殺菌裝置1輸送流體的泵3。另外,流體殺菌裝置1的下游側經由下游側流路構件5而與回收箱7連結。在下游側流路構件5,設置有流量調整機構6,所述流量調整機構6調整從流體殺菌裝置1向回收箱7輸送的流體的流量。(Constitution of fluid sterilization device)
As shown in FIG. 1, the fluid sterilization device 1 of the first embodiment is connected not only to the
流體殺菌裝置1例如在飲用水供給裝置中,用於對供給箱2內的水進行殺菌處理。本實施方式中,作為流體,例如應用於自來水等液體,但也可應用於氣體。The fluid sterilization device 1 is used, for example, in a drinking water supply device to sterilize water in the
如圖2所示,流體殺菌裝置1包括處理部20、收納構件23、光源部40、蓋構件50、連接構件10、及流路構件30。As shown in FIG. 2, the fluid sterilization device 1 includes a
處理部20包括:管狀構件21,在內部具有使流體流通的流路24;以及反射板22,配置於管狀構件21的外表面21a。處理部20對在流路24中流動的流體進行處理。The
管狀構件21例如為石英管(quartz tube),使紫外線透過。管狀構件21為兩端開口的筒狀的構件。反射板22是將從光源部40向流路24內照射的紫外線反射至流路24內的反射面的一例,例如使用高亮度鋁板。管狀構件21的一端支撐、固定於連接構件10,另一端支撐、固定於流路構件30。The
此外,反射板22並不限定於高亮度鋁板,只要是以高效率來反射紫外線的構件,則可以是任意構件。另外,也可代替反射板22,而在管狀構件21的外表面21a形成反射膜。反射膜是使用例如二氧化矽膜。此外,反射膜並不限定於二氧化矽膜,也可以是鋁蒸鍍膜。另外,管狀構件21並不限定於石英管,也可以是聚四氟乙烯(polytetrafluoroethylene,PTFE)等氟樹脂。另外,反射板22也可形成於管狀構件21的內表面,來代替形成於管狀構件21的外表面21a。進而,處理部20可包含反射板22與反射膜這兩者,也可不包含反射板22或反射膜。In addition, the
收納構件23收納處理部20。收納構件23例如是利用不鏽鋼(SUS)等金屬材料,形成為將處理部20收納於內部的圓筒狀,還發揮將處理部20的外周覆蓋來加以保護的蓋構件的功能。在收納構件23的兩端部形成有凸緣(flange),且一端緊固於連接構件10,另一端緊固於流路構件30。The
光源部40對處理部20的流路24照射紫外線。另外,光源部40包括光源42、基板43、及支撐構件41。The
光源42是發出紫外線的發光元件,安裝於基板43上。光源42例如為LED。光源42是由未圖示的電源來供給電力而發光。光源42是與處理部20相向而配置,對處理部20照射紫外線。另外,作為光源42,考慮到壽命及輸出,優選為在波長280[nm]附近具有峰值波長的光源,只要是例如260[nm]~280[nm]的起到殺菌作用的波長範圍即可,並不限定於紫外線的波長。即,光源42並不限定於LED,也可以是雷射二極體(laser diode,LD)等發出既定的波長範圍的紫外線的其他半導體元件。The
基板43是以金屬材料作為母材來形成。在基板43上,雖未圖示,但經由絕緣層而形成有所需的導電圖案(佈線圖案),且在導電圖案上設置有光源42。此外,基板43的母材並不限定於金屬材料,例如也可以使用氧化鋁等陶瓷。基板43是固定於支撐構件41而受到支撐。The
支撐構件41通過將安裝有光源42的基板43固定於既定的位置,來支撐光源42。此處,光源42由於隨著點燈時間的經過而發光效率下降,故而必須定期更換。因此,流體殺菌裝置1為了容易更換光源部40,而將支撐光源42的支撐構件41構成為能夠容易拆裝。這方面的詳情如後述。The supporting
蓋構件50例如是由石英玻璃(quartz glass)所形成的紫外線透過構件,配置於光源部40的前表面即Z軸負方向側。蓋構件50固定於流路構件30,在與光源部40的支撐構件41之間所包圍的空間的內部被氣密地封閉,保護光源42不受流體影響。蓋構件50使光源42所發出的紫外線透過,對在處理部20的流路24內流動的流體照射紫外線。The
在蓋構件50的前表面,形成作為連接流路的流路39,所述流路39在與後述第一凸緣301之間將流路24與後述流路33連接。此外,蓋構件50只要是對深紫外區域的光具有透過性,且劣化少,則並無特別限定,例如可以是具有紫外線透過性的氟樹脂。另外,蓋構件50可在流路24側的表面形成預防流體中包含的微量成分的附著的防汙膜,也可為了提高來自光源42的光的透過率而在光源部40側的表面設置抗反射膜。On the front surface of the
連接構件10形成為圓筒狀,將上游側流路構件4與處理部20的流路24連結。連接構件10是經由例如未圖示的O型環來支撐管狀構件21的一端部。在連接構件10的外周部,固定著收納構件23的一端部。此外,在上游側流路構件4與處理部20的流路24之間,也可設置整流板11,所述整流板11使從上游側流路構件4流入的流體的流動整齊。The connecting
流路構件30是將第一凸緣301與第二凸緣302,經由未圖示的緊固構件來緊固為一體而構成。第一凸緣301配置於處理部20側,第二凸緣302配置在與處理部20相反的一側。The
在流路構件30,形成流體流路,所述流體流路使處理部20的流路24與外部的下游側流路構件5連通。此處,使用圖2~圖5,對流路構件30所具有的流體流路的一例進行說明。In the
圖3是圖2的A-A剖面圖。圖4是圖2的B-B剖面圖。圖5是圖2的C-C剖面圖。Fig. 3 is a sectional view taken along the line A-A in Fig. 2. Fig. 4 is a B-B sectional view of Fig. 2. Fig. 5 is a cross-sectional view taken along line C-C in Fig. 2.
如圖2、圖3所示,第二凸緣302從Z軸方向看為圓形狀,在其中央部分具有在Z軸方向貫通的貫通口35。貫通口35中,在前表面側、即Z軸負方向側,保持、固定有蓋構件50。即,貫通口35是將蓋構件50加以保持的保持部的一例。另外,在位於蓋構件50的背面側、即Z軸正方向側的貫通口35,以能拆裝的方式裝配有光源部40。As shown in FIGS. 2 and 3, the
另外,如圖3、圖5所示,在第二凸緣302形成有:流路33,環狀地包圍貫通口35的周圍且在Z軸方向延伸;以及流路34,從裝配光源部40的貫通口35的側方起在徑向(此處為Y軸方向)延伸。在流路34,連接有下游側流路構件5,流路33經由流路34而與流體殺菌裝置1的外部連通。In addition, as shown in FIGS. 3 and 5, the
另一方面,如圖2、圖4所示,第一凸緣301從Z軸方向看為圓形狀,且在其中央部分包括:流路31,在Z軸方向貫通,使流路39與處理部20的流路24連通;以及多個流路32,從流路31朝向第一凸緣301的外周側而以放射狀延伸。On the other hand, as shown in FIGS. 2 and 4, the
流路構件30通過將第一凸緣301及第二凸緣302緊固,而將圖4所示的各流路32的以放射狀延伸的前端部分、與位置對應的圖3所示的流路33分別連通。由此,從上游側流路構件4供給至實施方式的流體殺菌裝置1的內部的流體是經由整流板11→流路24→流路31→流路39→流路32→流路33→流路34,而流出至下游側流路構件5的流路。流入至流路構件30的流體當通過流路33時,奪取裝配於貫通口35的光源部40所發出的熱,並且向下游側流路構件5流出。The
即,在流路24中,通過照射光源42所發出的紫外線而經殺菌的流體是通過管狀構件21的流路24,流向光源42的發光面側,經由貫通第一凸緣301的流路31而流入至沿著光源42的發光面的流路39,經蓋構件50折返而在流路構件30內通過流路32、流路33,從而向光源部40的側方流出。由此,包括光源42的光源部40不使用其他冷卻單元,而是使用在位於裝配於貫通口35的光源部40的側方的流路33中通過的流體,來間接但有效率地冷卻。另外,通過不使用其他冷卻單元,而使用通過流路33的流體來進行光源42的冷卻,例如能夠在不使用散熱片(radiating fin)等其他冷卻構件的情況下,抑制流體殺菌裝置1的溫度上升。That is, in the
此外,流路構件30能夠包含例如SUS。另外,也可代替SUS,而由導熱率良好的銅或鋁來構成流路構件30。此外,所述實施方式中,流路構件30包括第一凸緣301及第二凸緣302,可包括三個以上的構件,另外,也可包括一個構件。In addition, the
另外,裝配於貫通口35且支撐光源42的支撐構件41優選為由例如銅或SUS等具有既定以上的導熱率的導熱構件來設置。光源42發出的熱經由支撐構件41而傳遞至在流路構件30內流動的流體,能夠利用流體,將光源42更有效率地冷卻。In addition, the
此外,安裝於基板43上的光源42的個數並不限定於圖3所示的個數或大小,也可視需要來變更。另外,流路32的個數並不限定於圖4所示的個數,也可視需要來變更。進而,流路33的形狀並不限定於圖3所示的環狀,例如也可與圖4所示的流路32對應,沿著同心圓狀而隔開間隔來設置多個。In addition, the number of
(光源部的拆裝)
其次,對裝配於流路構件30的光源部40的拆裝進行說明。圖6是表示第一實施方式的裝配部的示意圖。圖7是表示第一實施方式的光源部的裝配方式的剖面示意圖。此外,圖6、圖7及後述的圖8~圖10中,將形成於流路構件30的各流路的圖示省略。(Disassembly and assembly of the light source unit)
Next, the attachment and detachment of the
如圖6所示,裝配部36是在流路構件30的貫通口35(例如參照圖2)形成的母螺紋。另外,在構成光源部40的支撐構件41的外周面,形成與裝配部36螺合的公螺紋45。即,光源部40與流路構件30是通過裝配部36、與公螺紋45螺合而緊固固定。As shown in FIG. 6, the mounting
圖7所示的例子中,支撐構件41的內部為了輕量化而成為中空,但考慮到散熱性,支撐構件41也可形成為實心。In the example shown in FIG. 7, the inside of the
此外,例如也可在光源部40與流路構件30之間,以夾持橡膠襯墊(rubber packing)等密封構件的狀態來裝配光源部40。由此,能夠抑制流體洩漏至光源部40。In addition, for example, the
(第二實施方式)
其次,使用圖8,對第二實施方式的流體殺菌裝置1A進行說明。圖8是表示第二實施方式的裝配部的剖面示意圖。(Second Embodiment)
Next, using FIG. 8, the
第二實施方式的流體殺菌裝置1A與第一實施方式的流體殺菌裝置1相比較,光源部40及流路構件30的固定方式不同。具體而言,第二實施方式的流體殺菌裝置1A中,裝配部36a是沿著流路構件30a的貫通口35的周壁而延伸且向內側突出的鉤部。The
另一方面,在與支撐構件41連接的裝配構件41a的外周面,設置有用以與裝配部36a卡止的鎖孔部45a。即,第二實施方式的流體殺菌裝置1A中,通過設置於光源部40a的鎖孔部45a與裝配部36a卡合,而將光源部40a固定於裝配部36a。On the other hand, the outer peripheral surface of the mounting
由此,依據第二實施方式的流體殺菌裝置1A,能夠在不另外使用固定件的情況下,將光源部40a與流路構件30a固定(參照圖8的右圖)。即,能夠使光源部40a及流路構件30a容易拆裝,因此能容易更換組件。Thus, according to the
(第三實施方式)
其次,使用圖9,對第三實施方式的流體殺菌裝置1B進行說明。圖9是表示第三實施方式的裝配部的剖面示意圖。如圖9所示,第三實施方式的流體殺菌裝置1B中,鉤部45b沿著光源部40b的側壁而延伸,且向外壁側突出。(Third Embodiment)
Next, using FIG. 9, the
而且,在流路構件30b的內壁形成與鉤部45b的卡合的裝配部36b。第三實施方式的流體殺菌裝置1B中,通過鉤部45b與設置於流路構件30b的裝配部36b卡合,而使光源部40b固定於流路構件30b。Furthermore, a
即便是所述情況,也能夠容易拆裝光源部40b及流路構件30b,因此容易更換組件。此外,所述第二實施方式中,也可將鎖孔部45a及裝配部36a的形狀相互調換。同樣,第三實施方式中,也可將鉤部45b及裝配部36b的形狀相互調換。即便是所述情況,也可不使用固定件,而將光源部40a、光源部40b及裝配部36a、裝配部36b固定。Even in this case, the
(第四實施方式)
其次,使用圖10,對第四實施方式的流體殺菌裝置1C進行說明。圖10是表示第四實施方式的裝配部的示意圖。如圖10所示,第四實施方式的流體殺菌裝置1C中,固定部45c是從光源部40c向流路構件30c突出的***部,且在***部的前端具有沿著徑向而突出的爪部46。(Fourth Embodiment)
Next, using FIG. 10, the
另一方面,流路構件30c在端面具有裝配部36c,所述裝配部36c是作為供固定部45c***的***孔。例如,所述裝配部36c具有卡合部17,所述卡合部17在以***有固定部45c的狀態而向既定的方向旋轉的情況下,與爪部46卡合。On the other hand, the
圖10所示的例子中,若在已將固定部45c***裝配部36c的狀態下,使固定部45c順時針旋轉,則爪部46與卡合部17卡合。由此,能夠將光源部40c固定於流路構件30c。In the example shown in FIG. 10, if the fixing
如上所述,第四實施方式的流體殺菌裝置1C中,也能在不使用固定件的情況下,將光源部40c與流路構件30c固定,因此能夠容易更換組件。As described above, in the
此外,圖6~圖10所示的裝配部為一例,並不受其限定。即,若裝配部是使光源部與流路構件卡合而固定的結構,則也可以是其他的固定方式。通過裝配部是使光源部與流路構件卡合而固定的結構,則除了光源部以能拆裝的方式固定於流路構件以外,不僅能夠將光源部容易地裝配於流路構件,而且當在與流路構件的延伸方向垂直的剖面上看時,能夠使設置於光源部的光源42裝配於流路構件的大致中央,因此容易適當進行光源42的定位,能夠抑制由於光源部的更換而引起的殺菌性能下降。In addition, the mounting part shown in FIGS. 6-10 is an example, and is not limited to this. That is, if the mounting part is a structure in which the light source part and the flow path member are engaged and fixed, another fixing method may be used. The assembly part is a structure in which the light source part and the flow path member are engaged and fixed. In addition to the light source part being detachably fixed to the flow path member, not only the light source part can be easily assembled to the flow path member, but also When viewed in a cross section perpendicular to the direction in which the flow path member extends, the
(第五實施方式)
其次,使用圖11~圖14,對第五實施方式的流體殺菌裝置1D進行說明。圖11是表示第五實施方式的流體殺菌裝置的剖面圖。圖12是圖11的D-D剖面圖。圖13是圖11的E-E剖面圖。圖14是圖11的F-F剖面圖。(Fifth Embodiment)
Next, the
第一實施方式的流體殺菌裝置1中,光源部40是構成為在沿著構成處理部20的管狀構件21的長度方向的Z軸方向上能夠拆裝,與此相對,第五實施方式的流體殺菌裝置1D中,不同之處在於,光源部40在與管狀構件21的長度方向交叉的徑向、此處為X軸方向上能夠拆裝。In the fluid sterilization device 1 of the first embodiment, the
具體而言,如圖12、圖13所示,構成流路構件30的第二凸緣302具有貫通孔38,所述貫通孔38在X軸方向貫通,能進行光源部40的拆裝。另外,第二凸緣302中,在Y軸方向上夾持光源部40而相向延伸的流路33a是以避開貫通孔38的方式形成。Specifically, as shown in FIGS. 12 and 13, the
另外,如圖14所示,流路33a在光源部40的背面側與下游側流路構件5連通。利用此種流體殺菌裝置1D,也能夠使用在流路33a中通過的流體來進行光源42的冷卻,由此在不使用例如散熱片等其他冷卻構件的情況下,抑制流體殺菌裝置1的溫度上升。In addition, as shown in FIG. 14, the
此外,第五實施方式的流體殺菌裝置1D是圖示為大致稜柱狀,但並不限定於此,也可為例如圓柱狀。In addition, the
(第六實施方式)
其次,使用圖15,對第六實施方式的流體殺菌裝置1E進行說明。圖15是表示第六實施方式的流體殺菌裝置的剖面圖。(Sixth Embodiment)
Next, using FIG. 15, the
如圖15所示,第六實施方式的流體殺菌裝置1E在支撐構件41的內部形成介質流路412,且在支撐構件41的背面414側形成與介質流路412相連的開口411、開口413。另外,在開口411、開口413,連接有與冷卻裝置60相連的未圖示配管。As shown in FIG. 15, in the
此處,冷卻裝置60例如為冷卻器(chiller)。冷卻裝置60在與介質流路412之間使加熱介質流通。加熱介質例如為與處理流體不同的自來水。具體而言,從冷卻裝置60供給至開口411的冷卻介質是隨著在介質流路412中通過而在與支撐構件41之間進行熱交換,且從開口413排出。由此,能夠進一步抑制經由支撐構件41的光源42的溫度上升。Here, the
此外,例如也可代替介質流路412而設置貫通孔,所述貫通孔從支撐構件41的背面414朝向前表面415而貫通。在所述情況下,若使作為加熱介質的例如乾燥空氣,從支撐構件41的貫通孔流通至支撐構件41的前表面415側的空間49,則例如能夠防止或消除蓋構件50的結露,抑制殺菌性能的下降。In addition, for example, instead of the
如上所述,實施方式的流體殺菌裝置1包括處理部20、光源部40、蓋構件50、及流路構件30。處理部20對流體進行處理。光源部40包括朝向處理部20照射紫外線的光源42、以及支撐光源42的支撐構件41。蓋構件50配置於光源部40的前表面側,保護光源42不受流體影響。流路構件30包括將蓋構件50加以保持的保持部、以及使處理部20與外部連通的流體流路。流體流路的至少一部分位於光源部40的側方,且光源部40與流路構件30熱性接觸。流路構件30包括能拆裝地裝配光源部40的裝配部。因此,不僅能夠抑制光源42的溫度上升,而且能夠容易更換光源部40。As described above, the fluid sterilization device 1 of the embodiment includes the
另外,實施方式的流路構件30在光源部40的背面側延伸存在,光源部40從蓋構件50的側面側裝配於流路構件30。因此,不僅能夠抑制光源42的溫度上升,而且能夠容易更換光源部40。In addition, the
另外,實施方式的支撐構件41包括使與流體不同的加熱介質流通的介質流路412。因此,能夠進一步抑制光源42的溫度上升。In addition, the
另外,實施方式的流路構件30在光源部40的側方具有流體流路的開口。因此,不僅能夠確保殺菌性能,而且能夠小型化。In addition, the
此外,流路構件30中的流體的流動方向並不限定於圖示的方向,也可為反方向。即,流路構件30可與上游側流路構件4連接,連接構件10可與下游側流路構件5連結。In addition, the flow direction of the fluid in the
另外,各實施方式的流體殺菌裝置能以任意朝向來使用。例如,能以流路構件30成為上方、連接構件10成為下方的朝向來使用,也能以連接構件10成為上方、流路構件30成為下方的朝向來使用。進而,能以管狀構件21的長度方向成為水平的方式來配置,也能傾斜來使用。In addition, the fluid sterilization device of each embodiment can be used in any orientation. For example, it can be used in an orientation in which the
雖已對本發明的若干實施方式加以說明,但這些實施方式是作為例子而提出,並非想要限定發明的範圍。這些實施方式能夠以其他的多種方式來實施,能夠在不脫離發明的要旨的範圍內進行各種省略、置換、變更。這些實施方式或其變形包含於發明的範圍或要旨中,同樣包含於申請專利範圍所記載的發明及其均等的範圍內。Although some embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments or their modifications are included in the scope or gist of the invention, and are also included in the invention described in the scope of patent applications and their equivalent scope.
1、1A~1E:流體殺菌裝置
2:供給箱
3:泵
4:上游側流路構件
5:下游側流路構件
6:流量調整機構
7:回收箱
10:連接構件
11:整流板
17:卡合部
20:處理部
21:管狀構件
21a:外表面
22:反射板
23:收納構件
24、31、32、33、33a、34、39:流路
30、30a、30b、30c:流路構件
301:第一凸緣
302:第二凸緣
35:貫通口
36、36a、36b、36c:裝配部
38:貫通孔
40、40a、40b、40c:光源部
41:支撐構件
41a:裝配構件
411、413:開口
412:介質流路
414:背面
415:前表面
42:光源
43:基板
45:公螺紋
45a:鎖孔部
45c:固定部
45b:鉤部
46:爪部
49:空間
50:蓋構件
60:冷卻裝置
X、Y、Z:軸1. 1A~1E: fluid sterilization device
2: supply box
3: pump
4: Upstream flow path member
5: Downstream flow path components
6: Flow adjustment mechanism
7: Recycle bin
10: Connection member
11: Rectifier board
17: Card joint
20: Processing Department
21:
圖1是表示第一實施方式的流體殺菌裝置的應用例的示意圖。 圖2是表示第一實施方式的流體殺菌裝置的剖面圖。 圖3是圖2的A-A剖面圖。 圖4是圖2的B-B剖面圖。 圖5是圖2的C-C剖面圖。 圖6是表示第一實施方式的裝配部的示意圖。 圖7是表示第一實施方式的光源部的裝配方式的剖面示意圖。 圖8是表示第二實施方式的裝配部的剖面示意圖。 圖9是表示第三實施方式的裝配部的剖面示意圖。 圖10是表示第四實施方式的裝配部的示意圖。 圖11是表示第五實施方式的流體殺菌裝置的剖面圖。 圖12是圖11的D-D剖面圖。 圖13是圖11的E-E剖面圖。 圖14是圖11的F-F剖面圖。 圖15是表示第六實施方式的流體殺菌裝置的剖面圖。Fig. 1 is a schematic diagram showing an application example of the fluid sterilization device of the first embodiment. Fig. 2 is a cross-sectional view showing the fluid sterilization device of the first embodiment. Fig. 3 is a sectional view taken along the line A-A in Fig. 2. Fig. 4 is a B-B sectional view of Fig. 2. Fig. 5 is a cross-sectional view taken along line C-C in Fig. 2. Fig. 6 is a schematic diagram showing the mounting part of the first embodiment. Fig. 7 is a schematic cross-sectional view showing an assembly method of the light source unit of the first embodiment. Fig. 8 is a schematic cross-sectional view showing the mounting portion of the second embodiment. Fig. 9 is a schematic cross-sectional view showing a fitting part of the third embodiment. Fig. 10 is a schematic diagram showing a fitting part of the fourth embodiment. Fig. 11 is a cross-sectional view showing a fluid sterilization device of a fifth embodiment. Fig. 12 is a cross-sectional view taken along the line D-D in Fig. 11. Fig. 13 is an E-E cross-sectional view of Fig. 11. Fig. 14 is a cross-sectional view taken along the line F-F in Fig. 11. Fig. 15 is a cross-sectional view showing a fluid sterilization device of a sixth embodiment.
1:流體殺菌裝置 1: Fluid sterilization device
4:上游側流路構件 4: Upstream flow path member
5:下游側流路構件 5: Downstream flow path components
10:連接構件 10: Connection member
11:整流板 11: Rectifier board
20:處理部 20: Processing Department
21:管狀構件 21: Tubular member
21a:外表面 21a: outer surface
22:反射板 22: reflector
23:收納構件 23: Storage components
24、31、33、34、39:流路 24, 31, 33, 34, 39: flow path
30:流路構件 30: Flow path components
301:第一凸緣 301: first flange
302:第二凸緣 302: second flange
35:貫通口 35: Through mouth
40:光源部 40: light source
41:支撐構件 41: Supporting member
42:光源 42: light source
43:基板 43: substrate
50:蓋構件 50: cover member
X、Y、Z:軸 X, Y, Z: axis
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2019-056806 | 2019-03-25 | ||
JP2019056806A JP7230624B2 (en) | 2019-03-25 | 2019-03-25 | Fluid sterilizer |
Publications (2)
Publication Number | Publication Date |
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TW202100185A true TW202100185A (en) | 2021-01-01 |
TWI814985B TWI814985B (en) | 2023-09-11 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW109104266A TWI814985B (en) | 2019-03-25 | 2020-02-11 | Fluid sterilization device |
Country Status (4)
Country | Link |
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JP (1) | JP7230624B2 (en) |
KR (1) | KR20200115053A (en) |
CN (1) | CN111732157A (en) |
TW (1) | TWI814985B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3992154A1 (en) * | 2020-10-29 | 2022-05-04 | Toshiba Lighting & Technology Corporation | Fluid sterilization device |
KR20230146212A (en) | 2022-04-12 | 2023-10-19 | (주)포인트엔지니어링 | Sterilization apparatus |
KR102611015B1 (en) * | 2023-03-28 | 2023-12-07 | 퀀텀매트릭스 주식회사 | Light source module and sterilization device including the same |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2003096387A2 (en) * | 2002-05-08 | 2003-11-20 | Phoseon Technology, Inc. | High efficiency solid-state light source and methods of use and manufacture |
US9592102B2 (en) * | 2009-05-18 | 2017-03-14 | Kavo Dental Technologies, Llc | Dental hand tool with disinfection reactor |
JP5500488B1 (en) * | 2013-03-21 | 2014-05-21 | 日本プライスマネジメント株式会社 | Irradiation device |
JP2014233646A (en) * | 2013-05-30 | 2014-12-15 | 日機装株式会社 | Water purifier |
JP5798645B2 (en) * | 2014-02-17 | 2015-10-21 | 日本プライスマネジメント株式会社 | Irradiation device |
JP6530681B2 (en) * | 2015-09-07 | 2019-06-12 | 日機装株式会社 | Sterilizer |
JP6681314B2 (en) | 2016-10-31 | 2020-04-15 | 日機装株式会社 | Water treatment apparatus and water treatment method |
JP6798327B2 (en) * | 2017-01-24 | 2020-12-09 | 東芝ライテック株式会社 | Fluid sterilizer |
JP6891537B2 (en) * | 2017-02-28 | 2021-06-18 | 東芝ライテック株式会社 | Fluid sterilizer |
JP6863135B2 (en) * | 2017-06-29 | 2021-04-21 | 東芝ライテック株式会社 | Fluid sterilizer |
-
2019
- 2019-03-25 JP JP2019056806A patent/JP7230624B2/en active Active
-
2020
- 2020-01-07 KR KR1020200002052A patent/KR20200115053A/en unknown
- 2020-02-07 CN CN202010082729.3A patent/CN111732157A/en active Pending
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CN111732157A (en) | 2020-10-02 |
KR20200115053A (en) | 2020-10-07 |
JP7230624B2 (en) | 2023-03-01 |
JP2020157187A (en) | 2020-10-01 |
TWI814985B (en) | 2023-09-11 |
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