TW201837317A

TW201837317A - Vacuum pump, and blade parts and rotor and fixture blade used therein

Info

Publication number: TW201837317A
Application number: TW107109875A
Authority: TW
Inventors: 野中学; 江野澤秀樹
Original assignee: 日商埃地沃茲日本有限公司
Priority date: 2017-03-23
Filing date: 2018-03-22
Publication date: 2018-10-16
Also published as: TWI745570B; CN110382877B; CN110382877A; WO2018174013A1

Abstract

To provide vacuum pump, and blade parts and rotor used therein suitable for preventing contamination in vacuum chamber due to backflow particles which is capable of effectively preventing backflow of the particles from the vacuum pump to vacuum chamber without lowering gas molecules exhausting molecules of the vacuum pump. Vacuum pump comprising a plurality of exhaust stage PT performing as means which exhausts gas molecules between inlet port and exhaust port; and blades NB rotating together with rotor blades 7 (71,75) constituting the exhaust stage PT1 of the uppermost stage and a small number of them than that of the rotor blades 7 constituting the exhaust stage PT1 of the uppermost stage, as particles transfer stage transferring the particles to exhaust direction of the gas molecules, between the uppermost exhaust stage PT (PT1) in a plurality of exhaust stage PT and the inlet port.

Description

真空泵及使用於其之葉片零件及轉子、以及固定之葉片Vacuum pump, blade parts and rotors used therefor, and fixed blades

本發明係關於作為半導體製造裝置、平板顯示器製造裝置、太陽能板製造裝置中之製程腔室、其他真空腔室之氣體排氣機構使用之真空泵，尤其係關於不損害真空泵之氣體分子排氣性能，可有效防止粒子(微粒)自真空泵向腔室之逆流，防止因逆流之粒子導致之腔室內污染之較佳者。The present invention relates to a vacuum pump used as a gas exhaust mechanism of a semiconductor manufacturing device, a flat panel display manufacturing device, a solar panel manufacturing device, a process chamber, and other vacuum chambers, and in particular, it does not damage the gas molecule exhaust performance of the vacuum pump It can effectively prevent the backflow of particles (particles) from the vacuum pump to the chamber, and prevent the pollution in the chamber caused by the backflow of particles.

渦輪分子泵或螺紋槽式泵等真空泵多用於需要高真空之真空腔室之排氣。圖18係採用先前之真空泵作為真空腔室之氣體排氣機構之排氣系統之概要圖，圖19(a)係於圖18所示之先前之真空泵之最上段排氣段自圖18之箭頭D方向觀察旋轉葉片之狀態之模式圖，圖19(b)係位於圖19(a)所示之旋轉葉片之上端面側(吸氣口側)之葉片邊緣部之放大圖。構成圖18之排氣系統之先前之真空泵Z於吸氣口2至排氣口3之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段PT。先前之真空泵Z之各排氣段PT成為針對每個排氣段PT，藉由以特定間隔放射狀配置之複數片旋轉葉片7與固定葉片8而將氣體分子排氣之構造。如上述之氣體分子之排氣構造中，旋轉葉片7一體形成於藉由磁性軸承等軸承機構可旋轉地被支持之轉子6之外周面，且與轉子6一起高速旋轉。另一方面，固定葉片8係固定於外裝殼體1之內面(例如參照專利文獻1)。但，於圖18之排氣系統中，假設於真空腔室CH內進行CVD等化學製程，藉此二次生成之微粒子狀之製程副生成物浮游、擴散於真空腔室CH內，利用因自重或氣體分子之移送效果而向真空泵Z之吸氣口2落下。又，假設附著、堆積於真空腔室CH之內壁面之堆積物，或附著、堆積於壓力調整閥BL之堆積物等亦因振動等而被剝落，因自重而向真空泵Z之吸氣口2落下。且，因如上述之落下而來到吸氣口2之粒子自吸氣口2進而落下，如圖19(a)所示，入射至最上段排氣段PT(PT1)。若如此入射之粒子Pa與高速旋轉之該排氣段PT(PT1)之旋轉葉片7碰撞，則經碰撞之粒子如圖19(b)所示，與位於旋轉葉片7之上端面側之葉片邊緣部EG碰撞而彈開，於吸氣口2方向彈回而逆流，有因此種逆流粒子而真空腔室CH內被污染之虞。作為防止因如上述之逆流粒子導致之真空腔室CH內污染之機構，於先前之真空腔室Z中，作為構成最上段排氣段PT(PT1)之旋轉葉片7之具體構成，例如採用圖19(b)所示之旋轉葉片7。於圖19(b)所示之旋轉葉片7中，作為減少如上述逆流之粒子比率之機構，係對葉片邊緣部EG設置利用機械加工之倒角部MS(例如參照專利文獻1)。但，若參照專利文獻1之段落0026至段落0027之記載，則旋轉葉片7之葉片邊緣部EG附近之粒子之可碰撞區域極小(0.3 mm以下)。該碰撞區域為與最大可實用(量產)地機械加工而製作之邊緣之倒角相同程度之尺寸。於專利文獻1記載之先前之真空泵中，為了對如上述僅於極小之可碰撞區域限定倒角之切削範圍，且降低粒子向吸氣口側之反射概率，而形成為使該倒角面相對於旋轉體(4)之軸向成平行(參照本案之圖19(b))或朝向氣體分子排氣方向即朝下(參照本案之圖20)。但，因倒角部MS之機械加工時產生之加工邊緣部變鈍，或用以提高旋轉葉片7表面之耐蝕性之鍍敷，而無法避免使倒角部MS之上部MC變為凸圓弧面之形狀。落下至此種凸圓弧面之粒子因與凸圓弧面碰撞而彈開，彈回至吸氣口2側，向真空腔室CH方向逆流，故根據如專利文獻1記載之先前之真空泵般於葉片邊緣部EG設置倒角部MS之構成，無法有效防止粒子自真空泵Z向真空腔室CH之逆流，未充分防止因逆流之粒子導致之真空腔室CH內之污染。尤其，若參照專利文獻1之圖1至圖3，則倒角部之倒角面(28a)如上述，形成為相對於旋轉體(4)之軸向平行或朝下(分子排氣方向)，故粒子入射至該倒角面(28a)後，於水平方向或稍朝下游反射。該情形時，由於粒子之朝下游之速度較小，故有於反射後與旋轉方向前方之旋轉葉片(相同文獻1之圖3上，左側之旋轉葉片28)之背面(朝旋轉方向背側之吸氣口方向之斜面。以下亦相同)再碰撞，於吸氣口側再反射之虞。但，作為減少如上述逆流粒子之比率之構成，考慮全體擴大構成最上段排氣段PT(PT1)之旋轉葉片7之配置間隔之構成，或降低旋轉葉片7之周速之構成，但根據該等構成，均會產生損及作為真空泵Z之氣體分子排氣性能之問題。又，作為用以減少如上述逆流粒子之比率之具體構成，如圖20所示，亦考慮使上述倒角部MS向分子排氣方向朝下以機械加工而傾斜之構成。但，根據此種構成，由於旋轉葉片7之上端7A面與倒角部MS之面(倒角面)所成之角度為銳角，故易產生因機械加工之毛刺，因加工成本提高，又，機械加工時產生之加工邊緣部之變鈍，或因上述之鍍敷使凸圓弧面之曲率變大，而帶來導致逆流粒子之比例反而增大之反效果。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利第5463037號公報Vacuum pumps such as turbomolecular pumps or screw groove pumps are mostly used for exhausting vacuum chambers that require high vacuum. FIG. 18 is a schematic diagram of an exhaust system using a previous vacuum pump as a gas exhaust mechanism of a vacuum chamber, and FIG. 19 (a) is an uppermost exhaust section of the previous vacuum pump shown in FIG. 18 from the arrow of FIG. 18 A schematic view of the state of the rotating blade when viewed in the direction D. FIG. 19 (b) is an enlarged view of a blade edge portion located on an end surface side (intake port side) above the rotating blade shown in FIG. 19 (a). The previous vacuum pump Z constituting the exhaust system of FIG. 18 has a plurality of exhaust sections PT functioning as a mechanism for exhausting gas molecules between the intake port 2 to the exhaust port 3. Each exhaust section PT of the conventional vacuum pump Z has a structure for exhausting gas molecules by a plurality of rotating blades 7 and fixed blades 8 arranged radially at a specific interval for each exhaust section PT. In the exhaust structure of gas molecules as described above, the rotating blades 7 are integrally formed on the outer peripheral surface of the rotor 6 rotatably supported by a bearing mechanism such as a magnetic bearing, and rotate together with the rotor 6 at high speed. On the other hand, the fixed blade 8 is fixed to the inner surface of the exterior case 1 (for example, refer to Patent Document 1). However, in the exhaust system shown in FIG. 18, it is assumed that a chemical process such as CVD is performed in the vacuum chamber CH, and a secondary particle-like process by-product is floated and diffused in the vacuum chamber CH. Or the transfer effect of gas molecules falls to the suction port 2 of the vacuum pump Z. In addition, it is assumed that deposits adhering to and accumulating on the inner wall surface of the vacuum chamber CH, or deposits adhering to and accumulating on the pressure regulating valve BL are also peeled off due to vibration and the like, and are brought to the suction port 2 of the vacuum pump Z by their own weight. fall. Then, the particles that have come to the suction port 2 due to the drop as described above fall from the suction port 2 and fall, as shown in FIG. 19 (a), and enter the uppermost exhaust section PT (PT1). If the particle Pa thus incident collides with the rotating blade 7 of the exhaust section PT (PT1) rotating at high speed, the collided particle and the blade edge located on the end face side of the rotating blade 7 are shown in FIG. 19 (b). The part EG collided and bounced off, and bounced back in the direction of the suction port 2 to flow countercurrently. Therefore, the inside of the vacuum chamber CH may be contaminated due to such countercurrent particles. As a mechanism for preventing the contamination in the vacuum chamber CH caused by the countercurrent particles as described above, in the previous vacuum chamber Z, as the specific configuration of the rotating blade 7 constituting the uppermost exhaust section PT (PT1), for example, the diagram shown in FIG. The rotating blade 7 shown in 19 (b). In the rotating blade 7 shown in FIG. 19 (b), as a mechanism for reducing the particle ratio of the countercurrent as described above, the blade edge portion EG is provided with a chamfered portion MS that is machined (for example, refer to Patent Document 1). However, referring to paragraphs 0026 to 0027 of Patent Document 1, the collision area of particles near the blade edge portion EG of the rotating blade 7 is extremely small (0.3 mm or less). This collision area has the same size as the chamfer of the edge produced by the largest practical (mass production) machining. In the previous vacuum pump described in Patent Document 1, in order to limit the cutting range of the chamfer only to the extremely small collision area as described above, and to reduce the probability of reflection of particles to the suction port side, the chamfered surface is formed so that The axial direction of the rotating body (4) is parallel (refer to FIG. 19 (b) of the present case) or downward toward the exhaust direction of the gas molecules (refer to FIG. 20 of the present case). However, the machining of the chamfered portion MS during machining becomes dull or the plating is used to improve the corrosion resistance of the surface of the rotating blade 7, so that the upper portion MC of the chamfered portion MS cannot be turned into a convex arc. Face shape. The particles dropped to such a convex arc surface collided with the convex arc surface and bounced off, bounced back to the suction port 2 and counter-flowed in the direction of the vacuum chamber CH. Therefore, according to the previous vacuum pump described in Patent Document 1, The configuration in which the blade edge portion EG is provided with a chamfered portion MS cannot effectively prevent the backflow of particles from the vacuum pump Z to the vacuum chamber CH, and does not sufficiently prevent the contamination in the vacuum chamber CH caused by the backflowing particles. In particular, referring to FIGS. 1 to 3 of Patent Document 1, the chamfered surface (28a) of the chamfered portion is formed parallel or downward with respect to the axial direction of the rotating body (4) as described above (molecular exhaust direction). Therefore, after the particles are incident on the chamfered surface (28a), they are reflected in the horizontal direction or slightly downstream. In this case, because the downstream velocity of the particles is relatively small, there is the back surface (rotation blade 28 on the left side in the rotation direction) of the rotation blade (the same as in FIG. 3 on the left, the rotation blade 28 on the left side) after reflection and in the rotation direction. The inclined surface in the direction of the air inlet. The same applies hereinafter. However, as a configuration for reducing the ratio of the countercurrent particles as described above, a configuration in which the arrangement interval of the rotating blades 7 constituting the uppermost exhaust section PT (PT1) is enlarged as a whole or a configuration in which the peripheral speed of the rotating blades 7 is reduced is considered. Problems such as these can impair the gas molecule exhaust performance of the vacuum pump Z. In addition, as a specific configuration for reducing the ratio of the above-mentioned countercurrent particles, as shown in FIG. 20, a configuration in which the chamfered portion MS is inclined downward in the molecular exhaust direction and mechanically processed is also considered. However, according to this configuration, since the angle formed by the surface of the upper end 7A of the rotating blade 7 and the surface (chamfered surface) of the chamfered portion MS is an acute angle, burrs due to machining are likely to occur, and processing costs increase. The dullness of the processing edge portion produced during machining, or the curvature of the convex arc surface due to the above-mentioned plating, has the opposite effect of causing the proportion of countercurrent particles to increase. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent No. 5463037

[發明所欲解決之問題] 本發明係鑑於上述問題而完成者，其目的係提供一種較佳之真空泵及具備使用於其之葉片之零件及轉子、以及固定之葉片，其不會損害真空泵之氣體分子排氣性能，可有效防止粒子自真空泵向真空腔室之逆流，防止因逆流粒子導致之真空腔室內之污染。 [解決問題之技術手段] 為達成上述目的，本發明(1)係提供一種真空泵，其特徵係於吸氣口至排氣口之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段，上述複數個排氣段為依每個排氣段，藉由以特定間隔放射狀配置之複數片旋轉葉片與固定葉片而將上述氣體分子排氣之構造，且，於上述複數個排氣段中最上段排氣段至上述吸氣口之間，具備葉片作為於上述氣體分子之排氣方向移送粒子之粒子移送機構，該葉片與構成上述最上段排氣段之上述旋轉葉片一起旋轉，且其片數少於構成上述最上段排氣段之上述複數片旋轉葉片之片數。或其特徵在於，作為上述排氣段之一部分，於上述最上段排氣段，構成於上述氣體分子之排氣方向移送粒子之粒子移送段。於上述本發明(1)中，亦可為：構成上述粒子移送段之上述葉片係與構成上述最上段排氣段之上述複數片旋轉葉片隣接設置。於上述本發明(1)中，亦可為：對於構成上述最上段排氣段之上述複數片旋轉葉片中之至少任一片旋轉葉片全體或其一部分，一體設置構成上述粒子移送段之上述葉片。於上述本發明(1)中，亦可為：於構成上述最上段排氣段之上述複數片旋轉葉片中，與構成上述粒子移送段之上述葉片隣接之旋轉葉片之高度係藉由構成上述粒子移送段之上述葉片而延長，藉此，構成上述最上段排氣段之上述複數片旋轉葉片成為該等全體而言上游端之高度不同之參差構造。於上述本發明(1)中，亦可為：於構成上述最上段排氣段之上述複數片旋轉葉片中，因上述參差構造而上游端變高之旋轉葉片，與位於該旋轉葉片之旋轉行進方向前側之旋轉葉片之配置間隔，設定為較其他上述複數片旋轉葉片之配置間隔更廣。於上述本發明(1)中，亦可為：於構成上述最上段排氣段之上述複數片旋轉葉片中，位於因上述參差構造而上游端變高之旋轉葉片之旋轉行進方向前側之上述旋轉葉片之下游端，較其他上述複數片旋轉葉片之下游端更朝上述吸氣口方向退縮。於上述本發明(1)中，亦可為：於構成上述最上段排氣段之上述複數片旋轉葉片中，以因上述參差構造而上游端變高之旋轉葉片之下游端係以較其他上述複數片旋轉葉片之下游端更長之方式延長。於上述本發明(1)中，亦可為：成為因上述參差構造而階差之高度階梯狀變化之構成。於上述本發明(1)中，亦可為：成為因上述參差構造而階差之高度錐狀變化之構成。於上述本發明(1)中，亦可為：對於構成上述最上段排氣段之上述複數片旋轉葉片中之至少任一片旋轉葉片全體或其一部分，作為不同零件而安裝有構成上述粒子移送段之上述葉片。於上述本發明(1)中，亦可為：構成上述粒子移送段之上述葉片之仰角設定為小於構成上述最上段排氣段之上述複數片旋轉葉片之仰角。於上述本發明(1)中，亦可為：構成上述粒子移送段之上述葉片設置於自構成上述最上段排氣段之上述複數片旋轉葉片離開之位置。本發明(2)係一種葉片零件，其使用於上述本發明(1)之真空泵，且具備構成上述粒子移送段。本發明(3)係一種真空泵，其特徵係於吸氣口至排氣口之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段，上述複數個排氣段為依每個排氣段，藉由以特定間隔放射狀配置之複數片旋轉葉片與固定葉片而將上述氣體分子排氣之構造，且，藉由降低構成最上段排氣段之上述複數片旋轉葉片中，至少一部分上游端之高度，而成為該等全體而言上游端之高度不同之參差構造，且成為於上述氣體分子之排氣方向移送粒子之粒子移送段。於上述本發明(3)中，亦可為：成為因上述參差構造而階差之高度階梯狀變化之構成。於上述本發明(3)中，亦可為：成為因上述參差構造而階差之高度錐狀變化之構成。本發明(4)係一種轉子，其係上述本發明(1)或上述本發明(3)之真空泵所使用且具備構成上述粒子移送段之上述葉片。於上述本發明(1)或上述本發明(3)中，亦可為：於上述最上段排氣段之上游，設有以與構成該最上段排氣段之上述複數片旋轉葉片以逆向之角度傾斜之固定之葉片，作為反射機構。本發明(5)係一種固定葉片，其係使用於上述本發明(1)或上述本發明(3)之真空泵者，且於上述最上段排氣段之上游，作為上述反射機構，以與構成該最上段排氣段之上述複數片旋轉葉片以逆向之角度傾斜。 [發明之效果] 於本發明中，可提供一種真空泵及使用於其之葉片零件及轉子，如上述，作為於氣體分子之排氣方向移送粒子之粒子移送段，係採用具備如下葉片之構成：與構成最上段排氣段之旋轉葉片一起旋轉，且片數少於構成最上段排氣段之旋轉葉片之片數，或具備如下葉片之構成：一體設置於構成最上段排氣段之旋轉葉片，故不會損及真空泵之氣體分子排氣性能，可有效防止粒子自真空泵向真空腔室之逆流，可較佳地防止因逆流之粒子導致之真空腔室內之污染。且，即使粒子移送段成為與排氣段分開設置之構造及與排氣段成一體之構造之任一者，亦可較原來之排氣段構造更提高排氣性能。其理由如下述《理由1》及《理由2》。《理由1》於本發明中，由於粒子移送段與複數個排氣段分開設置，故作為可效率良好地排氣自吸氣口落下之粒子之機構，例如無需進行如擴大構成最上段排氣段之旋轉葉片之配置間隔等，降低排氣段之分子排氣性能之設計變更等，而可藉由以成為對氣體分子之排氣最佳之條件之方式設計之複數個排氣段，而效率良好地將氣體分子排氣。《理由2》於本發明中，藉由構成粒子移送段之葉片之片數少於構成最上段排氣段之旋轉葉片之片數，而使構成粒子移送段之葉片之配置間隔設定為廣於構成最上段排氣段之旋轉葉片之配置間隔。因此，將粒子移送段之粒子之可碰撞區域(=葉片之配置間隔×粒子之落下速度/葉片之旋轉速度)，與最上段排氣段之粒子之可碰撞區域(=旋轉葉片之配置間隔×粒子之落下速度/旋轉葉片之旋轉速度)進行比較之情形時，由於粒子之可碰撞區域係前者，即粒子移送段之粒子之可碰撞區域變得較大，故於粒子移送段與排氣段之比較中，粒子移送段因與葉片之碰撞而於排氣方向(具體而言係排氣段之方向)反射之粒子，亦即排氣方向反射粒子之比率較高，因與葉片碰撞而於吸氣口方向彈回之粒子，即逆流粒子之比率變低。總之其理由係若粒子之可碰撞區域較廣，則旋轉葉片或葉片中與朝分子排氣方向傾斜之斜面碰撞而於氣體分子排氣方向反射之概率更高於與在吸氣口方向逆流之概率較高之面(具體而言係上述倒角面及位於倒角部上部之凸圓弧面)碰撞之概率。[Problems to be Solved by the Invention] The present invention has been made in view of the above problems, and its purpose is to provide a better vacuum pump, parts and rotors with blades used for the pump, and fixed blades, which will not damage the gas of the vacuum pump. The molecular exhaust performance can effectively prevent the backflow of particles from the vacuum pump to the vacuum chamber, and prevent the pollution in the vacuum chamber caused by the backflow particles. [Technical means to solve the problem] In order to achieve the above-mentioned object, the present invention (1) provides a vacuum pump, which is characterized in that it is located between the suction port and the exhaust port, and has a plurality of functions functioning as a mechanism for exhausting gas molecules. Exhaust section, the plurality of exhaust sections is a structure in which each of the exhaust sections exhausts the above-mentioned gas molecules by a plurality of rotating blades and fixed blades arranged radially at a specific interval, and Between the uppermost exhaust section of the exhaust section and the intake port, a blade is provided as a particle transfer mechanism for moving particles in the exhaust direction of the gas molecules, and the blade is provided with the rotating blade constituting the uppermost exhaust section. Rotate, and its number is less than the number of the plurality of rotating blades constituting the uppermost exhaust section. Or it is characterized in that, as a part of the exhaust section, in the uppermost exhaust section, a particle transfer section that transports particles in the exhaust direction of the gas molecules is configured. In the present invention (1), the blades constituting the particle transfer section may be disposed adjacent to the plurality of rotating blades constituting the uppermost exhaust section. In the present invention (1), the whole or a part of at least one of the plurality of rotating blades constituting the uppermost exhaust section may be integrally provided with the blades constituting the particle transfer section. In the present invention (1), in the plurality of rotating blades constituting the uppermost exhaust section, the height of the rotating blades adjacent to the blades constituting the particle transfer section may be determined by constituting the particles. The blades in the transfer section are extended, whereby the plurality of rotating blades constituting the uppermost exhaust section become uneven structures with different heights at the upstream end as a whole. In the above-mentioned invention (1), it is also possible that among the plurality of rotating blades constituting the uppermost exhaust section, the rotating blades whose upstream ends become higher due to the staggered structure, and the rotation travelling on the rotating blades The arrangement interval of the rotating blades in the front side of the direction is set to be wider than that of the other plurality of rotating blades. In the above-mentioned invention (1), the rotation of the plurality of rotating blades constituting the uppermost exhaust section, which is located on the front side in the direction of travel of the rotating blades whose upstream end becomes higher due to the uneven structure, may be the above-mentioned rotation. The downstream end of the blade is more retracted toward the suction port than the downstream ends of the other rotating blades. In the present invention (1), the plurality of rotating blades constituting the uppermost exhaust section may be arranged such that the downstream ends of the rotating blades whose upstream ends become higher due to the staggered structure are compared with the other ones described above. The downstream end of the plurality of rotating blades is extended in a longer manner. In the invention (1) described above, it may be a configuration in which the height of the step is changed stepwise due to the above-mentioned staggered structure. In the invention (1) described above, it may be a configuration in which the height of the step is changed in a tapered shape due to the above-mentioned staggered structure. In the present invention (1), the particle transfer section constituting the particle transfer section may be installed as a different part of the whole or a part of at least any one of the plurality of rotary blades constituting the uppermost exhaust section. The above blades. In the present invention (1), the elevation angle of the blades constituting the particle transfer section may be set smaller than the elevation angle of the plurality of rotating blades constituting the uppermost exhaust section. In the present invention (1), the blades constituting the particle transfer section may be provided at positions separated from the plurality of rotating blades constituting the uppermost exhaust section. The present invention (2) is a blade part which is used in the vacuum pump of the present invention (1) and includes a particle transfer section. The present invention (3) is a vacuum pump, which is characterized in that it is located between the suction port and the exhaust port and has a plurality of exhaust sections functioning as a mechanism for exhausting gas molecules. Each exhaust section has a structure in which the above-mentioned gas molecules are exhausted by a plurality of rotating blades and fixed blades arranged radially at a specific interval, and by reducing the plurality of rotating blades constituting the uppermost exhaust section, At least a part of the height of the upstream end becomes the uneven structure with different heights of the upstream end as a whole, and becomes a particle transfer section that transfers particles in the exhaust direction of the above-mentioned gas molecules. In the present invention (3), it is also possible to have a configuration in which the height of the step is changed stepwise due to the staggered structure. In the invention (3) described above, it may be a configuration in which the height of the step is changed in a tapered shape due to the above-mentioned staggered structure. The present invention (4) is a rotor which is used in the vacuum pump of the present invention (1) or the present invention (3) and includes the blades constituting the particle transfer section. In the above-mentioned present invention (1) or the above-mentioned present invention (3), it may be that: upstream of the above-mentioned uppermost exhaust section, there are provided a plurality of rotating blades opposite to the above-mentioned upper-stage exhaust section to reverse the Angled fixed blades serve as a reflecting mechanism. The present invention (5) is a fixed blade, which is used for the vacuum pump of the above-mentioned present invention (1) or the above-mentioned present invention (3), and is upstream of the above-mentioned uppermost exhaust section, as the above-mentioned reflection mechanism, and constitutes The plurality of rotating blades of the uppermost exhaust section are inclined at a reverse angle. [Effects of the Invention] In the present invention, a vacuum pump and blade parts and rotors used therefor can be provided. As described above, as the particle transfer section for transferring particles in the direction of exhaust of gas molecules, the following blade configuration is adopted: Rotate together with the rotating blades constituting the uppermost exhaust section, and the number of blades is less than the number of rotating blades constituting the uppermost exhaust section, or have the following blade structure: integrally provided on the rotating blades constituting the uppermost exhaust section Therefore, it will not damage the exhaust performance of the gas molecules of the vacuum pump, can effectively prevent the particles from backflow from the vacuum pump to the vacuum chamber, and can better prevent the contamination in the vacuum chamber caused by the particles in the backflow. Moreover, even if the particle transfer section is a structure provided separately from the exhaust section and a structure integrated with the exhaust section, the exhaust performance can be improved more than the original exhaust section structure. The reasons are as follows "reason 1" and "reason 2". [Reason 1] In the present invention, since the particle transfer section is provided separately from the plurality of exhaust sections, as a mechanism that can efficiently exhaust particles falling from the suction port, for example, it is not necessary to expand the upper section exhaust structure. The arrangement interval of the rotating blades of the segment, etc., reduces the design exhaustion of the molecular exhaust performance of the exhaust segment, etc., and the exhaust segment can be designed by a plurality of exhaust segments in such a manner as to be the best condition for the exhaust of the gas molecules, and Efficiently exhaust gas molecules. "Reason 2" In the present invention, since the number of blades constituting the particle transfer section is less than the number of rotating blades constituting the uppermost exhaust section, the arrangement interval of the blades constituting the particle transfer section is set wider than The arrangement interval of the rotating blades constituting the uppermost exhaust section. Therefore, the collision area of the particles in the particle transfer section (= the configuration interval of the blades × the falling speed of the particles / the rotation speed of the blades) and the collision area of the particles in the uppermost exhaust section (= the configuration interval of the rotating blades × When comparing the falling speed of particles / the rotating speed of rotating blades), because the collision area of particles is the former, that is, the collision area of particles in the particle transfer section becomes larger, so the particle transfer section and the exhaust section In comparison, particles that are reflected by the particle transfer section in the exhaust direction (specifically, the direction of the exhaust section) due to the collision with the blade, that is, the ratio of particles reflected in the exhaust direction is higher, resulting in collision with the blade. The ratio of particles rebounding in the direction of the suction port, that is, countercurrent particles, becomes low. In short, the reason is that if the collision area of the particles is wide, the probability that the rotating blade or blade collides with the inclined surface inclined toward the molecular exhaust direction and reflects in the gas molecular exhaust direction is higher than the probability of countercurrent in the direction of the suction port. The probability of collision between the surface with a higher probability (specifically, the above-mentioned chamfered surface and the convex arc surface located at the upper part of the chamfered portion).

以下，一面參照隨附圖式，一面針對用以實施本發明之最佳形態進行詳細說明。於本實施形態中，作為真空泵之一例，使用具備包含複數個排氣段之渦輪分子泵部與螺紋槽排氣段之所謂複合翼型渦輪分子泵作為排氣機構進行說明。另，於本實施形態中，亦可應用於僅具有渦輪分子泵部之泵。圖1係應用本發明之真空泵之剖視圖。若參照圖1，則該圖之真空泵P1具備剖面筒狀之外裝殼體1；配置於外裝殼體1內之轉子6；可旋轉地支持轉子6之支持機構；及旋轉驅動轉子6之驅動機構。外裝殼體1成為以緊固螺栓於其筒軸方向一體連結筒狀之泵殼1A與有底筒狀之泵座1B之有底圓筒形，泵殼1A之上端部側作為用以吸氣氣體之吸氣口2而開口，又，於泵座1B之下端部側，設置用以向外裝殼體1外將氣體排氣之排氣口3。吸氣口2經由壓力調整閥BL(參照圖18)，與如半導體製造裝置之製程腔室等成高真空之真空腔室CH(參照圖18)連接。排氣口3與未圖示之輔助泵連通連接。於泵殼1A內之中央部設有內置各種電氣組件之圓筒狀定子柱4。於圖1之真空泵P1中，將定子柱4形成作為與泵座1B分開之零件，且螺固固定於泵座1B之內底，藉此而將定子柱4立設於泵座1B上，但作為其他實施形態，亦可將該定子柱4一體立設於泵座1B之內底。於定子柱4之外側設有上述轉子6。轉子6內包於泵殼1A及泵座1B，且成為包圍定子柱4之外周之圓筒形狀。於定子柱4之内側設有轉子軸5。轉子軸5以其上端部朝向吸氣口2之方向且其下端部朝向泵座1B之方向之方式配置。又，轉子軸5藉由磁性軸承(具體而言為眾所周知之2組徑向磁性軸承MB1與1組軸向磁性軸承MB2)而被可旋轉地支持。再者，於定子柱4之內側設有驅動馬達MO，轉子軸5藉由該驅動馬達MO而繞其軸心旋轉驅動。轉子5之上端部自定子柱4之圓筒上端面向上方突出，轉子6之上端側以螺栓等緊固機構對該突出之轉子軸5之上端部一體固定。因此，轉子6經由轉子軸5以磁性軸承(徑向磁性軸承MB1、軸向磁性軸承MB2)被可旋轉地支持，又，於該支持狀態下，若啟動驅動馬達MO，則轉子6可與轉子軸5一體地繞該轉子軸心旋轉。總之，於圖1之真空泵P1中，轉子軸5與磁性軸承作為可旋轉地支持轉子6之支持機構發揮功能，再者，驅動馬達MO作為旋轉驅動轉子6之驅動機構發揮功能。且，圖1之真空泵P1於吸氣口2至排氣口3之間，具備作為將氣體分子排氣之機構發揮功能之複數個排氣段PT。又，於圖1之真空泵P1中，於複數個排氣段PT之下游部，具體而言，於複數個排氣段PT中最下段之排氣段PT(PTn)至排氣口3之間，設有螺紋槽泵段PS。再者，於圖1之真空泵P1中，於複數個排氣段PT之上游部，具體而言，於複數個排氣段PT中最上段之排氣段PT(PT1)至吸氣口2之間，設有於氣體分子之排氣方向移送粒子之粒子移送段PN。最上段之排氣段PT(PT1)與粒子移動段PN亦可為一體設置之構造。《排氣段之細節》圖1之真空泵P1於較轉子6之大致中間更上游係作為複數個排氣段PT發揮功能。以下，詳細說明複數個排氣段PT。於較轉子6之大致中間更上游之轉子6之外周面，設有與轉子6一體旋轉之複數片旋轉葉片7，該等旋轉葉片7係依每個排氣段PT(PT1、PT2、…PTn)，以轉子6之旋轉中心軸(具體而言為轉子軸5之軸心)或外裝殼體1之軸心(以下稱為「真空泵軸心」)為中心以特定間隔放射狀配置。另一方面，於泵殼1A之內周側設有複數片固定葉片8，該等固定葉片8亦又與旋轉葉片7相同地，依每個排氣段PT(PT1、PT2、…PTn)，以真空泵軸心為中心以等間隔放射狀配置。即，圖1之真空泵P1之各排氣段PT(PT1、PT2、…PTn)於自吸氣口2至排氣口3之間設置多段，且依每個排氣段PT(PT1、PT2、…PTn)具備以特定間隔放射狀配置之複數片旋轉葉片7與固定葉片8，成為藉此將氣體分子排氣之構造。任一旋轉葉片7皆為以與轉子6之外徑加工部一體地以切削加工切出形成之葉片狀切削加工品，且以對氣體分子之排氣最佳之角度傾斜。任一固定葉片8亦皆以對氣體分子之排氣最佳之角度傾斜。《複數個排氣段之排氣動作說明》包含以上構成之複數個排氣段PT中，於最上段排氣段PT(PT1)中，藉由驅動馬達MO之啟動，複數片旋轉葉片7與轉子軸5及轉子6一體高速旋轉，藉由旋轉葉片7之旋轉方向朝前且朝下(自吸氣口2向排氣口3之方向，以下簡稱為朝下)之傾斜面，對自吸氣口2入射之氣體分子賦予朝下方向且切線方向之運動量。藉由設置於固定葉片8之旋轉葉片7與在旋轉方向逆向之朝下之傾斜面，將具有該朝下方向之運動量之氣體分子送入下個排氣段PT(PT2)。又，在下個排氣段PT(PT2)及之後的排氣段PT亦與最上段排氣段PT(PT1)相同，使旋轉葉片7旋轉，進行如上述之藉由旋轉葉片7向氣體分子賦予運動量，及藉由固定葉片8進行氣體分子之送入動作，從而以使吸氣口2附近之氣體分子向轉子6之下游依序移行之方式被排氣。《螺紋槽泵層之詳情》於圖1之真空泵P1中，以較轉子6之大致中間更下游作為螺紋槽泵段PS發揮功能之方式構成。以下，詳細說明螺紋槽泵段PS。螺紋槽泵段PS於轉子6之外周側(具體而言，係較轉子6之大致中間更下游之轉子6部分之外周側)具有螺紋槽排氣部定子9作為形成螺紋槽排氣流路R之機構，該螺紋槽排氣部定子9係作為固定構件安裝於外裝殼體1之內周側。螺紋槽排氣部定子9係以其內周面與轉子6之外周面對向之方式配置之圓筒形固定構件，以包圍較轉子6之大致中間更下游之轉子6部分之方式配置。且，較轉子6之大致中間更下游之轉子6部分係作為螺紋槽排氣部PS之旋轉構件而旋轉之部分，經由特定之間隙***、收納於螺紋槽排氣部定子9之內側。於螺紋槽排氣部定子9之內周部，形成變化成深度朝下方小徑化之圓錐形狀之螺紋槽91。該螺紋槽91自螺紋槽排氣部定子9之上端向下端螺旋狀刻設。藉由具備如上述之螺紋槽91之螺紋槽排氣部定子9，而於轉子6之外周側形成用以氣體排氣之螺紋槽排氣流路R。另，雖省略圖示，但亦可構成為藉由於轉子6之外周面形成先前說明之螺紋槽91，而設置如上述之螺紋槽排氣流路R。於螺紋槽排氣部PS，藉由螺紋槽91與轉子6之外周面之牽制效應，一面壓縮氣體一面移送，故螺紋槽91之深度設定為於螺紋槽排氣流路R之上游入口側(靠近吸氣口2之流路開口端)最深，於其下游出口側(靠近排氣口3之流路開口端)變得最淺。螺紋槽排氣流路R之入口(上游開口端)向構成最下段排氣段PTn之固定葉片8E與螺紋槽排氣部定子9之間的間隙(以下稱為「最終間隙GE」)開口，又，該螺紋槽流路R之出口(下游開口端)通過泵內排氣口側流路S與排氣口3連通。泵內排氣口側流路S係藉由於轉子6或螺紋槽排氣部定子9之下端部與泵座1B之內底部之間設置特定之間隙(於圖1之真空泵P1中，繞定子柱4之下部外周一周之形態之間隙)，而自螺紋槽排氣流路R之出口形成至排氣口3。《螺紋槽排氣部之排氣動作說明》藉由先前說明之複數個排氣段PT之排氣動作之移送，而到達上述最終間隙GE之氣體分子移行至螺紋槽排氣流路R。移行之氣體分子藉由利用轉子6之旋轉產生之牽制效應，而自遷移流壓縮成黏性流，且向泵內排氣口側流路S移行。且，到達泵內排氣口側流路S之氣體分子流入排氣口3，通過未圖示之輔助泵向外裝殼體1外排氣。《粒子移送段之細節》圖2(a)係自轉子之外周面側觀察圖1之真空泵之粒子移送段之狀態之說明圖，圖2(b)係該圖(a)之A箭視圖，圖2(c)係該圖(a)之B箭視圖。若參照圖2(a)，則圖1之真空泵P1之粒子移送段PN成為具備葉片NB之構造，該葉片NB與構成最上段排氣段PT(PT1)之旋轉葉片7一起旋轉，且片數少於構成最上段排氣段PT(PT1)之旋轉葉片7之片數。構成粒子移送段PN之旋轉葉片7之片數如上述，少於構成最上段排氣段PT(PT1)之旋轉葉片7之片數，故設定為構成粒子移送段PN之旋轉葉片7之配置間隔L2較構成最上段排氣段PT(PT1)之旋轉葉片7之配置間隔L1更廣(L1＜L2)。於圖1之真空泵P1中，作為構成粒子移送段PN之葉片NB之具體構成，該葉片NB如圖2(a)與構成最上段排氣段PT(PT1)之旋轉葉片7隣接設置。藉由採用如上述之隣接構造，而於圖1之真空泵P1中，構成最上段排氣段PT(PT1)之旋轉葉片7中，與構成粒子移送段PN之葉片NB隣接之旋轉葉片7(71、74)之高度因構成粒子移送段PN之葉片NB而延長，藉此，構成最上段排氣段PT(PT1)之複數片旋轉葉片7成為該等全體而言上游端7A之高度不同之參差構造。作為如上述之隣接之具體構成例，於圖1之真空泵P1中，採用如圖2(a)之上述葉片NB與旋轉葉片7作為一個零件一體設置之構造。即，於圖1之真空泵P1中，採用如下構造：如圖2(a)所示，對於構成最上段排氣段PT(PT1)之複數片旋轉葉片7、7…中，至少任一片旋轉葉片7(71、74)全體(具體而言，係旋轉葉片7之直徑D方向及厚度T方向全體)，一體設置構成粒子移送段PN之葉片NB(以下稱為「葉片一體構造」)。於圖2(a)之例中，揭示有如下之構成：藉由採用如上述之葉片一體構造，位於2片旋轉葉片72、73兩側之2片旋轉葉片71、74之上游端7A高於其他旋轉葉片72、73、75之上游端7A，但並非限定於此。位於上游端7A之較高旋轉葉片71、74之間之旋轉葉片72、73之片數可視需要適當增減。《粒子移送層之動作說明》若參照圖18，則假設藉由真空腔室CH內之化學製程而二次生成之微粒子狀製程副生成物浮游、擴散於真空腔室CH內，利用自重或因氣體分子之移送效果而向真空泵P1之吸氣口2落下。又，假設附著堆積於真空腔室CH之內壁面之堆積物，或附著堆積於壓力調整閥BL之堆積物等亦因振動等而被剝落，因自重而向真空泵P1之吸氣口2落下。若參照圖2(a)，則藉由如上述之落下而來到吸氣口2之粒子Pa進而自吸氣口2落下，首先入射至粒子移送段PN。且，入射之粒子Pa與構成粒子移送段PN之葉片NB碰撞。此時，於粒子移送段PN中，對葉片NB碰撞之複數個粒子中，藉由因葉片NB之旋轉而與位於行進方向前側之該葉片NB之斜面FS(以下稱為「葉片NB之前斜面FS」)碰撞，而使於氣體分子排氣方向反射之粒子(以下稱為「排氣方向反射粒子」)之比率增加，向吸氣口2方向彈回之粒子(以下稱為「逆流粒子」)之比率減少。其理由如下述《探討1》及《探討2》。《探討1》於該探討1中，針對構成粒子移送段PN之葉片NB與構成最上段排氣段PT(PT1)之旋轉葉片7隣接設置之構造例進行檢討。於圖1之真空泵P1中省略粒子移送段PN之情形(相當於以往之真空泵)時，基於下式(1)特定出最上段排氣段PT(PT1)之粒子可碰撞區域Z1(參照圖2(a))。另一方面，如圖1之真空泵P1，具備粒子移送段PN之情形(相當於本發明之真空泵)時，基於下式(2)特定出該粒子移送段PN之粒子可碰撞區域Z2(參照圖2(a))。 Z1=L1×Vp/Vr …式(1) Z2=L2×Vp/Vr …式(2) L1：旋轉葉片7之配置間隔 L2：葉片NB之配置間隔 Vp：粒子Pa之落下速度 Vr：旋轉葉片7、葉片NB之旋轉速度(周速) 於圖1之真空泵P1中，如上述，構成粒子移送段PN之葉片NB之片數少於構成最上段排氣段PT1之旋轉葉片7之片數，從而構成粒子移送段PN之葉片NB之配置間隔L2設定為較構成最上段排氣段PT1之旋轉葉片7之配置間隔L1更廣。若考慮該點而比較檢討上式(1)與上式(2)，則因相較於Z1，Z2較大(Z2＞Z1)，故如上述，於粒子移送段PN中，排氣方向反射粒子之比率增加，逆流粒子之比率減少。總之其理由係若粒子之可碰撞區域擴大，則與旋轉葉片7或葉片NB中朝氣體分子排氣方向傾斜之斜面碰撞而向氣體分子排氣方向反射之概率高於與向吸氣口2方向逆流之概率較高之面(具體而言係上述倒角面及位於倒角部上部之凸圓弧面)碰撞之概率。《探討2》圖3係不具備粒子移送段之真空泵(相當於以往之真空泵)中，落下之粒子之可碰撞區域之說明圖，圖4係具備粒子移送段之圖1之真空泵(相當於本發明之真空泵)中，落下之粒子之可碰撞區域之說明圖。於探討2中，針對上述之參差構造進行檢討。若參照圖3，則於不具備上述之參差構造，亦即省略粒子移送段PN之真空泵(相當於以往之真空泵)中，以下式(3)求得最上段排氣段P(PT1)之直徑D部(參照圖2(c))之粒子可碰撞區域Zp1。 Zp1=｛(πD/N-T)Vp｝/(Vr) …式(3) N：構成最上段排氣段之旋轉葉片7之片數 D：直徑D部之尺寸(參照圖2(c)) T：構成最上段排氣段之旋轉葉片7之直徑D部之軸直角厚度(參照圖2(c)) Vp：粒子之落下速度 Vr：旋轉葉片7之直徑D部之旋轉速度(周速) 若參照圖4，則基於下式(4)特定出上述參差構造之階差高度(突出高度)Zp2。下式(4)係將圖2(a)之2片旋轉葉片72、73想為如圖3之n片旋轉葉片7、7…，應用於位於n片旋轉葉片7、7之兩側之旋轉葉片71、74之上游端7A高於其他旋轉葉片(71、74以外)之上游端之參差構造者。 Zp2=｛(πD・n/N)Vp｝/(Vr) …式(4) n：位於上游端較高之旋轉葉片71、74之間之旋轉葉片之片數 D：直徑D部之尺寸(參照圖2(c)) N：構成最上段排氣段之旋轉葉片7之片數 Vp：粒子Pa之落下速度 Vr：旋轉葉片7之直徑D部之旋轉速度(周速) 於圖2(c)之直徑D部，若如圖4將n片旋轉葉片7與位於其兩側之旋轉葉片7(71、74)之階差設為Zp2以上，則落下至符號71與74之旋轉葉片間之空間(圖2中相當於L2)之粒子不與n片旋轉葉片7碰撞，而碰撞至符號74之旋轉葉片之前面。且，粒子向符號74之旋轉葉片之前面之可碰撞區域係以下式(5)之後述Zp3特定。於具備上述參差構造亦即具備粒子移送段PN之圖1之真空泵(相當於本發明之真空泵)中，構成最上段排氣段PT(PT1)之複數片旋轉葉片7成為該等全體而言上游端7A之高度不同之參差構造。該參差構造係如上述，與構成粒子移送段PN之葉片NB隣接之旋轉葉片7之高度因上述葉片NB而延長者，故於該探討2中，認為“存在有上游端高出葉片NB之高度Zp2量的旋轉葉片”。如此想法之情形時，最上段排氣段PT(PT1)之直徑D部(參照圖2(c))之粒子之可碰撞區域Zp3(參照圖4)係基於下式(5)特定。 Zp3=[｛(πD(n+1)/N-T)｝Vp]/(Vr) …式(5) N：構成最上段排氣段之旋轉葉片7之片數 D：直徑D部之尺寸(參照圖2(c)) T：構成最上段排氣段之旋轉葉片7之直徑D部之軸直角厚度(參照圖2(c)) Vp：粒子之落下速度 Vr：旋轉葉片7之直徑D部之旋轉速度(周速) n：位於上游端較高之旋轉葉片71、74之間之旋轉葉片之片數若參照圖4，則自直徑D部(參照圖2)之旋轉葉片7之旋轉速度Vr與粒子之落下速度Vp，求得自旋轉葉片7觀察之粒子之相對速度Vc。於圖4中，若將上游端較高之旋轉葉片7(71、74)之間隔或區間設為葉片間隔L'，則自圖4之A地點入射之粒子(葉片間隔L'內可入射(落下)至最下游側之粒子)落下至葉片間隔L'之範圍內位於旋轉葉片7(74)末端之延長線上之B'地點。旋轉葉片7(74)之上端面7A至B'地點之落下距離成為以上式(5)求得之Zp3。於具備粒子移送段PN之圖1之真空泵(相當於本發明之真空泵)中，由於在該Zp3之範圍內並無倒角等之葉片面，故落下至B'地點之粒子可進而落下，最終與旋轉葉片7(74)之前面，具體而言與該旋轉葉片7(74)之朝下斜面之C'地點碰撞。如由以上之說明可知，於具備粒子移送段PN之圖1之真空泵(相當於本發明之真空泵)中，旋轉葉片7(74)之上端面7A至C'地點之粒子之落下距離Zp4成為該粒子之可碰撞區域，該可碰撞區域(落下距離Zp4)大於由上式(5)所得之可碰撞區域Zp3。總之，若將因上述參差構造之階差之高度設為Zp2，則自圖4之A點入射之粒子碰撞至B點，但若將此階差設為Zp2以上，則該粒子不與n片旋轉葉片7碰撞，而與旋轉葉片7(74)之前面(例如旋轉葉片7(74)之朝下斜面之C'地點)碰撞。此處，比較檢討上式(3)與上式(5)。此時，若為簡化而考慮忽視上式(3)與上式(5)中之旋轉葉片7之厚度T，則如上述採用階差之高度為Zp2以上之參差構造之情形時，即上式(5)之情形時，與上式(3)之情形相比，粒子Pa之可碰撞區域擴大為(n+1)倍，故排氣方向反射粒子之比率增加，逆流粒子之比率減少。總之，其理由係若粒子之可碰撞區域擴大，則與旋轉葉片7或葉片NB中朝分子排氣方向傾斜之斜面碰撞而於氣體分子排氣方向反射之概率更高於較與於吸氣口2方向逆流之概率較高之面(具體而言係於先前例中說明之倒角面及位於倒角部上部之凸圓弧面)碰撞之概率。另，即使係葉片NB與旋轉葉片7分開設置之構造，上述動作亦相同。《粒子移送段PN之其他實施形態(其1)》於圖1之真空泵P1中，作為粒子移送段PN之具體構成，採用對旋轉葉片7全體設置葉片NB之構成，但並非限定於此。例如，如圖5(a)、(b)、(c)所示，亦可採用於旋轉葉片7之長度L方向之一部分設置葉片NB之構成，或如該圖(d)、(e)所示，於旋轉葉片7之厚度T方向之一部分設置葉片NB之構成，藉由此種構成亦可獲得上述之作用效果(排氣方向反射粒子之比率增加，逆流粒子之比率減少)。《粒子移送段PN之其他實施形態(其2)》於圖1之真空泵中，如圖2(a)所示，作為構成最上段排氣段PT(PT1)之複數片旋轉葉片7之具體構成，係以複數片旋轉葉片7之間隔為相同間隔之方式構成，但並非限定於此。例如如圖6所示，因上述參差構造而上游端變高之旋轉葉片7(74)與位於該旋轉葉片7(74)之旋轉行進方向前側之旋轉葉片73(以下稱為「先行葉片7(73)」)之配置間隔，可設定為較其他旋轉葉片7之配置間隔更寬。參照圖6，採用如上述之配置間隔之設定之情形時，如上述與葉片NB之前斜面FS碰撞而反射之排氣方向反射粒子不易與先行葉片7(73)碰撞，且在與先行葉片7(73)之背面(朝旋轉方向背側之吸氣口2方向之斜面，以下亦同)碰撞而反射下向吸氣口2方向彈回之粒子(此亦為逆流粒子之一種)減少，粒子之排氣效率進而提高。《粒子移送段PN之其他實施形態(其3)》於圖1之真空泵中，如圖2(a)所示，作為構成最上段排氣段PT(PT1)之複數片旋轉葉片7之具體構成，係以複數片旋轉葉片7之下游端7B為相同高度之方式構成，但並非限定於此。例如如圖7(a)所示，亦可採用先行葉片7(73)之下游端7B較其他旋轉葉片7之下游端7B更為於吸氣口2方向退縮之構成(以下稱為「底部上升構造」)，或如圖7(b)所示，亦可設為切削先行葉片7(73)之下游端7B之一部分之底部上升構造。參照圖7(a)、(b)，採用如上述之底部上升構造之情形亦如上述，與葉片NB之前斜面FS碰撞而反射之排氣方向反射粒子不易與先行葉片7(73)之背面碰撞，且在與先行葉片7(73)之背面碰撞而反射下向吸氣口2方向彈回之粒子(此亦為逆流粒子之一種)減少，粒子之排氣效率進而提高。《粒子移送段PN之其他實施形態(其4)》於圖1之真空泵P1中，採用複數片旋轉葉片7作為全體其上游端7A成為參差構造之構成，亦即，旋轉葉片7之上游端7A因葉片NB而延長並變高之構造(以下稱為「單側延長葉片構造」)，但並非限定於此。例如，除如上述之單側延長葉片構造外，如圖8所示，進而亦可採用以因上述之參差構造而上游端7A變高之旋轉葉片7(71、74)之下游端7B延長為較其他旋轉葉片7 (72、73、75)之下游端7B更長之構造(以下稱為「兩側延長葉片構造」)。作為此種兩側延長葉片構造之具體構成例，另，於圖8中，因藉由獲得上述參差構造所使用之葉片NB同等之葉片NB而延長旋轉葉片7(71、74)之下游端7B，但並非限定於此種延長之形態。但，因旋轉葉片7與轉子6一體旋轉，故因此旋轉而產生之離心力自旋轉葉片7之固定端向自由端之方向作用，或自旋轉葉片7之旋轉中心(具體而言係轉子軸5之軸心)向放射方向作用。一般之旋轉葉片7係以其形狀與旋轉軸(具體而言係轉子軸5)成直角且繞放射方向之直線(以下為葉片之形狀中心)為對稱之方式設置。此係對於因如上述之旋轉產生之離心力，使得旋轉葉片7所產生之力之力矩繞旋轉葉片之形狀中心變得不平衡，用以降低由此而於旋轉葉片7之根部(固定端)產生扭矩、疲勞破損等風險之措施。於先前說明之單側延長葉片構造中，僅旋轉葉片7之上游端7A延長，故易產生繞旋轉葉片7之形狀中心之扭矩之不平衡，認為因此種扭矩而可能於旋轉葉片7之固定端附近，亦即位於轉子6之外周面側之部分產生疲勞破損等之旋轉葉片7之損傷。相對於此，於先前說明之兩側延長葉片構造中，於旋轉葉片7(71、74)之上游端7A與下游端7B兩者設有同等之葉片NB，故不易產生如上述之扭轉力，亦不易因扭轉力而產生疲勞破損等之旋轉葉片7之損傷。《粒子移送段PN之其他實施形態(其5)》於圖1之真空泵P1中，作為構成粒子移送段PN之葉片NB之具體構成，作為該葉片NB與構成最上段排氣段PT1之旋轉葉片7隣接設置之構成，及其隣接之具體構成例，係採用葉片NB與旋轉葉片7作為一個零件一體設置之構造(參照圖2(a))，但並非限定於此。作為如上述之隣接之具體其他構成例，亦可採用如下構成：例如如圖9(a)所示，對於構成最上段排氣段PT(PT1)之複數片旋轉葉片7中之至少任一片旋轉葉片7(71、74)全體或其一部分，構成粒子移送段PN之葉片NB係作為不同零件安裝。於此種不同零件之構成中，上述“旋轉葉片全體或其一部分”之解釋係基於上述《粒子移送段PN之其他實施形態(其1)》之說明，故省略其詳細說明。採用作為上述不同零件構成之上述葉片NB之情形亦又藉由作為其不同零件之葉片NB，構成最上段排氣段PT(PT1)之複數片旋轉葉片7成為其上游端7A之高度不同之參差構造，故獲得上述之作用效果(排氣方向反射粒子之比率增加、逆流粒子之比率減少)。採用如上述作為不同零件構成之葉片NB之情形時，亦有於構成粒子移送段PN之葉片NB與構成最上段排氣層PT(PT1)之旋轉葉片7(71)之間，例如如圖9(b)產生間隙，或如圖9(c)產生相對偏移之情形。產生該間隙或偏移之構成亦包含於上述“隣接”中，獲得上述之作用效果(排氣方向反射粒子之比率增加、逆流粒子之比率減少)。如上述之間隙或偏移有根據設計上需要而積極設置之情形，及與加工精度之關係而必然設計之情形。於如上述將構成粒子移送段PN之葉片NB作為不同零件之構成，亦可應用先前說明之《粒子移送段PN之其他實施形態(其1)》至《粒子移送段PN之其他實施形態(其4)》之構成。採用如上述作為不同零件而構成之葉片NB之構成中，該葉片NB，亦即構成粒子移送段PN之葉片NB與構成最上段排氣段PT(PT1)之旋轉葉片7(71)成為各個葉片面直接對向之構造，於如此直接對向之葉片面之間例如不介隔如固定葉片8之固定零件。該點於先前說明之葉片一體構造(參照圖2(a))中亦同樣。《粒子移送段PN之其他實施形態(其6)》於圖1之真空泵中，作為粒子移送段PN之具體構成，係採用構成粒子移送段PN之葉片NB與構成最上段排氣段PT(PT1)之旋轉葉片7隣接設置之構成，但並非限定於此。例如如圖10所示，構成粒子移送段PN之葉片NB亦可採用設置於自構成最上段排氣段PT(PT1)之旋轉葉片7離開特定距離之位置之構成，藉由此種構成，亦可獲得上述之作用效果(排氣方向反射粒子之比率增加、逆流粒子之比率減少)。《粒子移送段PN之其他實施形態(其7)》如先前說明之圖9(a)，於構成粒子移送段PN之葉片NB作為不同零件而安裝之構成中，該葉片NB之具體安裝構造採用如下方式：例如如圖11所示，準備可嵌入至轉子6上端面之凹部61之第1安裝構件62，於第1安裝構件62之外周面(具體而言係設置於第1安裝構件62之外周之凸緣62A之外周面)支持上述葉片NB，且於將第1安裝構件62嵌入至上述凹部61之狀態下，以螺栓BT螺固固定第1安裝構件62與轉子軸5之前端。於使用如上述之第1安裝構件62之葉片NB之安裝方式中，氣體可能滯留於轉子6上端面之凹部61內，故較佳為於第1安裝構件62設置排氣孔63，或於第1安裝構件62之凸緣62A與轉子6上端面之間設置排氣孔64等排氣機構。為了取得包含轉子6或旋轉葉片7等之旋轉體全體之旋轉平衡，圖11所示之葉片NB以自其旋轉體之旋轉中心觀察以如圖12成旋轉對稱之方式配置。對於此種配置構成，亦可應用於先前說明之圖1至圖10(除圖3外)之葉片NB或後述之圖13、圖4之葉片NB。《粒子移送段PN之其他實施形態(其8)》對於如上述作為不同零件而構成之葉片NB之具體安裝構造，例如亦可採用圖13所示之安裝構造。於該圖13之安裝構造中，準備可對轉子軸5之前端安裝之第2安裝構件65，於該第2安裝構件65之外周面支持上述葉片NB，且以螺栓BT螺固固定第2安裝構件65與轉子軸5之前端。《粒子移送段PN之其他實施形態(其9)》再者，作為以不同零件構成之上述葉片之具體安裝構造，雖省略圖示，但亦可採用對轉子6之吸氣口側之上端部以螺栓螺固固定上述葉片之方式。《粒子移送段PN之其他實施形態(其10)》於圖1之真空泵P1中，如圖2(a)所示，係採用以構成粒子移送段PN之葉片NB之仰角θ1與構成最上段排氣段PT(PT1)之複數片旋轉葉片7之仰角θ2成同等角度之方式設定之構成(θ1=θ2)，但並非限定於此。亦可構成為例如如圖14所示之仰角之設定，亦即以構成粒子移送段PN之葉片NB之仰角θ1小於構成最上段排氣段PT(PT1)之旋轉葉片7之仰角θ2之方式設定(θ1＜θ2)。採用如上述仰角之構成之情形時，成為構成粒子移送段PN之葉片NB相對於構成最上段排氣段PT(PT1)之旋轉葉片7(71、74)懸突之形態，由於較先行葉片之方向，更朝葉片下端間之空間之方向，亦即更向靠近旋轉體(具體而言係包含轉子6或旋轉葉片7等之旋轉體)之軸向朝下之方向之角度反射，故與葉片NB之前斜面FS之碰撞而反射之排氣方向反射粒子不易與先行葉片7(73)之背面碰撞，而使因與先行葉片7(73)之碰撞而反射並向吸氣口2方向彈回之粒子(此亦為逆流粒子之一種)減少，粒子之排氣效率進而提高。又，如上述之仰角之設定不僅應用於如圖14之葉片NB作為不同零件設置之構成，亦可應用於如圖6之葉片NB與旋轉葉片7一體設置之構成。《粒子移送段PN之其他實施形態(其11-1及11-2)》先前說明之因參差構造所致之階差高度(深度)不限於1種，亦可為複數種階差之高度(深度)組合之構造。例如，可形成階梯狀(參照圖15)，亦可形成如高度變化成錐狀之形狀(參照圖16)。再者，雖省略圖示，但作為複數種階差之高度(深度)之組合例，亦可採用以此種階差之高度(深度)變得散亂之方式設定之構成(階差高度或深度不均一之構成)。總之，複數種階差之高度(深度)之組合可視需要而適當變更。又，亦可根據旋轉葉片之半徑方向位置，改變階差之高度。圖15係粒子移送段PN之其他實施形態(其11-1)，具體而言，係作為複數種階差之高度之組合例，階差之高度變化成階梯狀之構成之說明圖。又，圖16係粒子移送段PN之其他實施形態(其11-2)，具體而言，係作為複數種階差之高度之組合例，階差之高度變化成錐狀之構成之說明圖。此處，例如若參照圖4，則於該圖4之例中，因上述之參差構造而使上游端7A變高之旋轉葉片7(71、74)與位於其之間之旋轉葉片7、7之階差之高度(深度)以一律相同之Zp2或Zp2以上之Zp3之方式構成。相對於此，若參照圖15，則於該圖15之例中，採用於第n片旋轉葉片7(80)中因上述參差構造所致之階差之高度(深度)成Zp2以上之方式變化成階梯狀(h1＜h2＜h3)之構成(以下稱為「階梯形狀型構成」)。因此，於該階梯形狀型構成中，因參差構造而上游端7A變高之旋轉葉片7(76、80)與位於其之間之旋轉葉片7(77、78、79)之階差之高度(深度)h1、h2、h3並非一律相同，而是向旋轉葉片7之旋轉方向依序逐段變低(變深)之方式設定。採用如此設定之階梯形狀型構成之情形時，亦由圖15所示之微粒子Pa之飛跡可知，微粒子Pa不與旋轉葉片7(77、78、79)碰撞，獲得上述之作用效果(排氣方向反射粒子之比率增加、逆流粒子之比率減少)。採用上述階梯形狀型構成之情形時，位於上游端7A變高之旋轉葉片7(76、80)之間之旋轉葉片7(77、78、79)之上游端7A皆以無傾斜之平面構成。若參照圖16，則於該圖16之例中，採用以於第n片旋轉葉片7(80)中因參差構造所致之階差之高度(深度)成Zp2以上之方式變化成錐狀(h4＜h5＜h6)之構成(以下稱為「錐形狀型構成」)。因此，於該錐形狀型構成中，因上述參差構造而上游端7A變高之旋轉葉片7 (76、80)與位於其之間之旋轉葉片7 (77、78、79)之階差之高度(深度)h4、h5、h6並非一律相同，而是向旋轉葉片7之旋轉方向連續變低(變深)之方式設定。採用如此設定之錐形狀型構成之情形時，如由圖16所示之微粒子Pa之飛跡可知，微粒子Pa不與旋轉葉片7(77、78、79)碰撞，獲得上述之作用效果(排氣方向反射粒子之比率增加、逆流粒子之比率減少)。採用上述錐形狀型構成之情形時，位於上游端7A變高之旋轉葉片7(76、80)之間之旋轉葉片7(77、78、79)之上游端7A皆以按特定角度傾斜之傾斜面構成。然而，旋轉葉片7之配置間隔與高度之比率係設定為可將氣體分子有效地移送至下游側之最佳值，故若旋轉葉片7之高度不同，則導致一部分旋轉葉片7自最佳設定值偏離，有帶來作為真空泵全體之排氣性能降低之虞。藉此，就確保排氣性能上，旋轉葉片7之高度差較小較好。該點於先前說明之圖15之階梯形狀型構成，或圖16之錐形狀型構成中，由於採用第n片旋轉葉片7(80)中因參差構造所致之階差之高度成Zp2以上之方式變化成階梯狀或錐狀之構成，故例如採用後述之減高式參差構造之情形時，旋轉葉片7之高度差亦變小，不易產生排氣性能之降低。另，圖15之階梯形狀型構成或圖16之錐形狀型構成不僅採用後述之減高式參差構造，當然亦可採用上述之參差構造。《粒子移送段PN附近之本發明之其他實施形態》圖17係粒子移送段PN附近之本發明之其他實施形態之說明圖。於該圖17之實施形態中，於最上段排氣段PT(PT1)之上游(具體而言係較粒子移送段PN更上游)，作為反射機構RF，設有以與構成最上段排氣段PT(PT1)之複數片旋轉葉片7逆向之角度傾斜之固定之葉片RF1(以下稱為「固定反射葉片RF1」)。若參照圖17，則微粒子Pa於構成排氣段PT(PT1)之旋轉葉片7(以下稱為「最上段旋轉葉片7」)於下游方向反射，向構成相同排氣段PT(PT1)之固定葉片8(以下稱為「最上段固定葉片8」)之方向移行。此時，移行之一部分微粒子Pa如圖17所示，藉由於最上段固定葉片8之背面或上端面再反射，不入射至最上段旋轉葉片7之前面，而以特定速度於最上段旋轉葉片7之間抽出，向吸氣口2或其之前的真空腔室CH之方向逆流之概率較高。作為防止如上述之因於最上段固定葉片8之再反射所致之微粒子Pa(以下稱為「再反射微粒子Pa」)逆流之機構，反射機構RF發揮功能。即，再反射微粒子Pa如圖17所示，於固定反射葉片RF1反射，再次向最上段排氣段PT(PT1)之方向移行。但，如上述逆流之再反射微粒子Pa如上述以特定速度貫穿最上段旋轉葉片7之間，故作為該貫穿所需要之速度成分，具有與最上段旋轉葉片之傾斜並行(旋轉方向)之速度成分。由此，於圖17之實施形態中，如上述，構成為固定反射葉片RF1成以與最上段旋轉葉片7逆向之角度傾斜之形狀，藉此而可以固定反射葉片RF1有效地捕捉逆流之再反射微粒子Pa。固定反射葉片RF1之片數與傾斜角度等可考慮因固定反射葉片RF1所致之微粒子Pa之反射或作為真空泵全體之排氣效率等，視需要而適當變更。於圖17之實施形態中，採用於真空泵P1之較吸氣口2更下游設置反射機構RF，於真空泵PI內配置反射機構RF之構成，但並非限定於此。雖省略圖示，但反射機構RF亦可設置於例如連接真空泵P1與真空腔室CH之路徑之中途。本發明不限於以上說明之實施形態，於本發明之技術性思想內可由本領域中具有通常知識者進行各種變形。例如，先前說明之《粒子移送段PN之其他實施形態(其1)》至《粒子移送段PN之其他實施形態(其11-2)》之構成，以及《粒子移送段PN附近之本發明之其他實施形態》之構成，可視需要而適當組合使用。以上說明之實施形態之真空泵於吸氣口2至排氣口3之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段PT，該複數個排氣段PT成為針對每個排氣段PT，藉由以特定間隔放射狀配置之複數片旋轉葉片7與固定葉片8而將氣體分子排氣之構造。於包含此種構造之複數個排氣段PT中，藉由減高式參差構造，亦即使構成最上段排氣段PT1之複數片旋轉葉片7中之至少一部分上游端7A之高度減低(減高)，而成為作為該等全體上游端7A之高度不同之參差構造，亦可成為於氣體分子之排氣方向移送粒子之粒子移送段。此種粒子移送段亦與上述粒子移送段PN同等地發揮功能。the following, With reference to the accompanying drawings, The best mode for carrying out the present invention will be described in detail. In this embodiment, As an example of a vacuum pump, A so-called compound airfoil turbomolecular pump having a turbomolecular pump section including a plurality of exhaust sections and a screw groove exhaust section will be described as an exhaust mechanism. another, In this embodiment, It can also be applied to a pump having only a turbo molecular pump section. Fig. 1 is a sectional view of a vacuum pump to which the present invention is applied. If referring to FIG. 1, The vacuum pump P1 in the figure is provided with a cylindrical outer casing 1 in cross section; A rotor 6 arranged in the outer casing 1; A support mechanism that rotatably supports the rotor 6; And a driving mechanism for rotationally driving the rotor 6. The outer casing 1 has a bottomed cylindrical shape that integrally connects the cylindrical pump casing 1A and the bottomed cylindrical pump base 1B with fastening bolts in the direction of its cylinder axis. The upper end side of the pump casing 1A is opened as a suction port 2 for suction gas, also, On the lower end side of the pump base 1B, An exhaust port 3 is provided for exhausting the gas from the outer casing 1. The suction port 2 passes through a pressure regulating valve BL (see FIG. 18), It is connected to a high-vacuum chamber CH (see FIG. 18) such as a process chamber of a semiconductor manufacturing apparatus. The exhaust port 3 is connected to an auxiliary pump (not shown). A cylindrical stator post 4 in which various electrical components are built is provided in the center of the pump casing 1A. In the vacuum pump P1 of FIG. 1, Forming the stator column 4 as a separate part from the pump base 1B, And screwed to the inner bottom of pump base 1B, In this way, the stator column 4 is erected on the pump base 1B, But as another embodiment, The stator column 4 can also be integrally erected on the inner bottom of the pump base 1B. The rotor 6 is provided on the outer side of the stator column 4. The rotor 6 is enclosed in a pump casing 1A and a pump base 1B. It has a cylindrical shape surrounding the outer periphery of the stator column 4. A rotor shaft 5 is provided inside the stator column 4. The rotor shaft 5 is arranged such that the upper end portion thereof faces the intake port 2 and the lower end portion thereof faces the pump base 1B. also, The rotor shaft 5 is rotatably supported by magnetic bearings (specifically, two sets of radial magnetic bearings MB1 and one set of axial magnetic bearings MB2, which are well known). Furthermore, A drive motor MO is provided inside the stator column 4, The rotor shaft 5 is rotationally driven around its axis by the drive motor MO. The upper end portion of the rotor 5 projects upward from the upper end surface of the cylinder of the stator column 4, The upper end of the rotor 6 is integrally fixed to the upper end of the protruding rotor shaft 5 by a fastening mechanism such as a bolt. therefore, The rotor 6 is supported by a magnetic bearing (radial magnetic bearing MB1, via a rotor shaft 5). The axial magnetic bearing MB2) is rotatably supported, also, With this support, If the drive motor MO is activated, Then, the rotor 6 can rotate integrally with the rotor shaft 5 about the rotor axis. Anyway, In the vacuum pump P1 of FIG. 1, The rotor shaft 5 and the magnetic bearing function as a support mechanism that rotatably supports the rotor 6, Furthermore, The drive motor MO functions as a drive mechanism that rotationally drives the rotor 6. And The vacuum pump P1 in FIG. 1 is between the suction port 2 and the exhaust port 3, A plurality of exhaust sections PT functioning as a mechanism for exhausting gas molecules. also, In the vacuum pump P1 of FIG. 1, In the downstream of the plurality of exhaust sections PT, in particular, Between the exhaust section PT (PTn) at the bottom of the exhaust section PT to the exhaust port 3, With thread groove pump section PS. Furthermore, In the vacuum pump P1 of FIG. 1, Upstream of the plurality of exhaust sections PT, in particular, Between the exhaust section PT (PT1) in the uppermost section of the plurality of exhaust sections PT to the suction port 2, A particle transfer section PN is provided to transfer particles in the exhaust direction of gas molecules. The uppermost exhaust section PT (PT1) and the particle moving section PN can also be integrated. << Details of Exhaust Section >> The vacuum pump P1 of FIG. 1 functions as a plurality of exhaust sections PT more upstream than approximately the middle of the rotor 6. the following, The plurality of exhaust sections PT will be described in detail. On the outer peripheral surface of the rotor 6 which is more upstream than approximately the middle of the rotor 6, Provided with a plurality of rotating blades 7 rotating together with the rotor 6, The rotating blades 7 are based on each exhaust section PT (PT1, PT2, ... PTn), The center of rotation of the rotor 6 (specifically, the axis of the rotor shaft 5) or the axis of the outer casing 1 (hereinafter referred to as the "vacuum pump axis") is radially arranged at a specific interval. on the other hand, A plurality of fixed blades 8 are provided on the inner peripheral side of the pump casing 1A, The fixed blades 8 are also the same as the rotating blades 7, According to each exhaust section PT (PT1, PT2, ... PTn), Radially arranged at equal intervals around the vacuum pump axis. which is, Each exhaust section PT (PT1, PT1, of the vacuum pump P1 of Fig. 1) PT2, … PTn) Set multiple sections from the suction port 2 to the exhaust port 3, And according to each exhaust section PT (PT1, PT2, ... PTn) includes a plurality of rotating blades 7 and fixed blades 8 arranged radially at a specific interval, This structure is used to exhaust gas molecules. Each of the rotating blades 7 is a blade-shaped machined product that is cut out by a cutting process integrally with the outer diameter processing portion of the rotor 6. And it is tilted at an angle that is optimal for the exhaust of gas molecules. Each of the fixed blades 8 is also inclined at an angle optimal for exhaust of gas molecules. "Explanation of Exhaust Operation of Multiple Exhaust Sections" Included in the multiple exhaust sections PT constituted above, In the top exhaust section PT (PT1), With the start of the drive motor MO, The plurality of rotating blades 7 rotate at a high speed integrally with the rotor shaft 5 and the rotor 6, With the rotation direction of the rotating blade 7 facing forward and downward (from the direction of the suction port 2 to the direction of the exhaust port 3, Hereinafter referred to as downward) The gas molecules incident from the suction port 2 are given a movement amount in a downward direction and a tangential direction. With the rotating blade 7 provided on the fixed blade 8 and the inclined surface facing downward in the direction of rotation, The gas molecules having the downward movement amount are sent to the next exhaust section PT (PT2). also, The next exhaust section PT (PT2) and subsequent exhaust sections PT are also the same as the uppermost exhaust section PT (PT1), Rotating the rotating blade 7 As described above, the amount of motion is given to the gas molecules by rotating the blades 7, And the feeding action of the gas molecules by the fixed blade 8, Thereby, the gas molecules in the vicinity of the suction port 2 are sequentially discharged downstream of the rotor 6 so as to be exhausted. "Details of the screw groove pump layer" In the vacuum pump P1 of Figure 1, It is comprised so that it may function as a screw groove pump section PS further downstream than the substantially middle of the rotor 6. the following, Details of thread groove pump section PS. The screw groove pump section PS is on the outer peripheral side of the rotor 6 (specifically, The rotor 6 has a threaded groove exhaust portion stator 9 as a mechanism for forming a threaded groove exhaust flow path R. The thread groove exhaust part stator 9 is mounted on the inner peripheral side of the exterior case 1 as a fixing member. The screw groove exhaust part stator 9 is a cylindrical fixing member arranged so that its inner peripheral surface faces the outer peripheral surface of the rotor 6, The rotor 6 is disposed so as to surround a portion of the rotor 6 further downstream than substantially the middle of the rotor 6. And The portion of the rotor 6 which is further downstream than the middle of the rotor 6 is a portion that rotates as a rotating member of the thread groove exhaust portion PS. Insert through a specific gap, It is housed inside the screw groove exhaust part stator 9. In the inner peripheral part of the stator 9 of the screw groove exhaust part, A conical thread groove 91 is formed, which is changed to a smaller diameter in the downward direction. The screw groove 91 is spirally carved from the upper end to the lower end of the screw groove exhaust part stator 9. With the screw groove exhaust portion stator 9 provided with the screw groove 91 described above, A screw groove exhaust gas flow path R for gas exhaust is formed on the outer peripheral side of the rotor 6. another, Although not shown, However, it may be configured by forming the previously described thread groove 91 on the outer peripheral surface of the rotor 6, A screw groove exhaust flow path R is provided as described above. For the thread groove exhaust PS, By the pinning effect of the thread groove 91 and the outer peripheral surface of the rotor 6, While transporting compressed gas, Therefore, the depth of the screw groove 91 is set to be the deepest on the upstream inlet side of the screw groove exhaust flow path R (close to the open end of the flow path of the suction port 2), It becomes the shallowest at its downstream outlet side (the open end of the flow path near the exhaust port 3). The inlet (upstream open end) of the threaded groove exhaust flow path R opens to a gap (hereinafter referred to as "final gap GE") between the fixed blade 8E constituting the lowermost exhaust section PTn and the threaded groove exhaust portion stator 9, also, The outlet (downstream open end) of the screw groove flow path R communicates with the exhaust port 3 through the exhaust port side flow path S in the pump. The exhaust port side flow path S in the pump is provided with a specific gap between the lower end of the rotor 6 or the screw groove exhaust part stator 9 and the inner bottom of the pump base 1B (in the vacuum pump P1 in FIG. 1, A gap around the periphery of the lower periphery of the stator column 4), The outlet from the threaded groove exhaust flow path R is formed to the exhaust port 3. "Description of Exhaust Operation of Thread Slot Exhaust Portion" By transferring the exhaust operation of the plurality of exhaust sections PT described previously, The gas molecules reaching the above-mentioned final gap GE migrate to the screw groove exhaust flow path R. The pinching effect of the moving gas molecules by using the rotation of the rotor 6, While the self-migrating stream is compressed into a viscous stream, And it moves to the exhaust port side flow path S in a pump. And The gas molecules that have reached the exhaust port side flow path S in the pump flow into the exhaust port 3, The external casing 1 is vented by an auxiliary pump (not shown). "Details of Particle Transfer Section" Fig. 2 (a) is an explanatory view of the state of the particle transfer section of the vacuum pump of Fig. 1 viewed from the outer peripheral surface side of the rotor. Figure 2 (b) is a view of arrow A in the figure (a), Fig. 2 (c) is an arrow B view of Fig. (A). Referring to FIG. 2 (a), Then the particle transfer section PN of the vacuum pump P1 of FIG. 1 has a structure provided with a blade NB, This blade NB rotates with the rotating blades 7 constituting the uppermost exhaust section PT (PT1), And the number of pieces is less than the number of the rotating blades 7 constituting the uppermost exhaust section PT (PT1). The number of the rotating blades 7 constituting the particle transfer section PN is as described above, Less than the number of rotating blades 7 constituting the uppermost exhaust section PT (PT1), Therefore, the arrangement interval L2 of the rotating blades 7 constituting the particle transfer section PN is set wider than the arrangement interval L1 of the rotating blades 7 constituting the uppermost exhaust section PT (PT1) (L1 <L2). In the vacuum pump P1 of FIG. 1, As a specific configuration of the blade NB constituting the particle transfer section PN, The blade NB is disposed adjacent to the rotating blade 7 constituting the uppermost exhaust section PT (PT1) as shown in FIG. 2 (a). By adopting the adjacent structure as described above, In the vacuum pump P1 of FIG. 1, Among the rotating blades 7 constituting the uppermost exhaust section PT (PT1), The rotating blade 7 (71, 71) adjacent to the blade NB constituting the particle transfer section PN 74) The height is extended by the blade NB constituting the particle transfer section PN, With this, The plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1) have uneven structures with different heights of the upstream end 7A as a whole. As a specific configuration example of the adjacent as described above, In the vacuum pump P1 of FIG. 1, The structure in which the above-mentioned blade NB and the rotating blade 7 are integrated as one component as shown in FIG. 2 (a) is adopted. which is, In the vacuum pump P1 of FIG. 1, Use the following structure: As shown in Figure 2 (a), For the plurality of rotating blades constituting the uppermost exhaust section PT (PT1) 7, 7…, At least one rotating blade 7 (71, 74) All (specifically, The diameter D and thickness T of the rotating blade 7), A blade NB (hereinafter referred to as a "blade integrated structure") constituting the particle transfer section PN is integrally provided. In the example of Figure 2 (a), The reveal has the following composition: By adopting the integrated structure of the blades as described above, Located on 2 rotating blades 72, 73 two rotating blades on both sides 71, The upstream end 7A of 74 is higher than other rotating blades 72, 73, 75A upstream end 7A, But it is not limited to this. Higher rotating blades 71 at the upstream end 7A, Rotating blades between 74, 72, The number of pieces of 73 can be appropriately increased or decreased as needed. "Description of Operation of Particle Transfer Layer" With reference to FIG. 18, It is assumed that the by-products of the microparticle-like process secondary generated by the chemical process in the vacuum chamber CH float, Diffused in the vacuum chamber CH, It is dropped to the suction port 2 of the vacuum pump P1 by its own weight or by the transfer effect of gas molecules. also, Suppose that the deposits deposited on the inner wall surface of the vacuum chamber CH are attached, Or the deposits deposited on the pressure regulating valve BL are also peeled off due to vibration, etc. Due to its own weight, it falls to the suction port 2 of the vacuum pump P1. Referring to FIG. 2 (a), Then, the particles Pa that come to the suction port 2 and fall from the suction port 2 by falling as described above, First, it enters the particle transfer section PN. And The incident particles Pa collide with the blades NB constituting the particle transfer section PN. at this time, In the particle transfer section PN, Among the plurality of particles colliding with the blade NB, As a result of the blade NB rotating, it collides with the inclined surface FS of the blade NB (hereinafter referred to as "the blade NB front inclined surface FS") located on the front side of the traveling direction, While increasing the ratio of particles reflecting in the exhaust direction of gas molecules (hereinafter referred to as "exhaust-direction reflecting particles"), The ratio of particles that bounce back toward the suction port 2 (hereinafter referred to as "countercurrent particles") decreases. The reason for this is as described in Discussion 1 and Discussion 2 below. Discussion 1 In Discussion 1, A configuration example in which the blades NB constituting the particle transfer section PN and the rotating blades 7 constituting the uppermost exhaust section PT (PT1) are disposed adjacent to each other will be reviewed. When the particle transfer section PN is omitted from the vacuum pump P1 in FIG. 1 (equivalent to a conventional vacuum pump), Based on the following formula (1), the particle collision area Z1 of the uppermost exhaust section PT (PT1) is specified (see FIG. 2 (a)). on the other hand, As shown in Figure 1 vacuum pump P1, When the particle transfer section PN is provided (equivalent to the vacuum pump of the present invention), Based on the following formula (2), the particle collision area Z2 of the particle transfer section PN is specified (see FIG. 2 (a)). Z1 = L1 × Vp / Vr… Formula (1) Z2 = L2 × Vp / Vr… Formula (2) L1: Configuration interval L2 of rotating blades 7: Configuration interval Vp of blade NB: Falling speed Vr of particles Pa: Rotating blades 7, The rotation speed (peripheral speed) of the blade NB is shown in the vacuum pump P1 in FIG. 1, As above, The number of blades NB constituting the particle transfer section PN is less than that of the rotating blades 7 constituting the uppermost exhaust section PT1, Therefore, the arrangement interval L2 of the blades NB constituting the particle transfer section PN is set wider than the arrangement interval L1 of the rotating blades 7 constituting the uppermost exhaust section PT1. If we consider this point and compare the above formula (1) and (2), Because compared to Z1, Z2 is larger (Z2> Z1), So as mentioned above, In the particle transfer section PN, The ratio of particles reflecting in the exhaust direction increases, The ratio of countercurrent particles is reduced. In short, the reason is that if the collision area of the particles is enlarged, Then the probability of collision with the inclined surface of the rotating blade 7 or the blade NB inclined toward the gas molecular exhaust direction and reflecting in the gas molecular exhaust direction is higher than the surface with a higher probability of countercurrent to the suction port 2 Probability of collision between the chamfered surface and the convex arc surface located on the upper part of the chamfered portion. "Exploration 2" Figure 3 shows a vacuum pump (equivalent to a conventional vacuum pump) without a particle transfer section. An illustration of the collision area of falling particles, FIG. 4 shows the vacuum pump of FIG. 1 (equivalent to the vacuum pump of the present invention) provided with a particle transfer section. An illustration of the collision area of falling particles. In Discussion 2, Review the above-mentioned uneven structure. Referring to FIG. 3, In the absence of the above-mentioned staggered structure, That is, in a vacuum pump (equivalent to a conventional vacuum pump) in which the particle transfer section PN is omitted, The particle collision area Zp1 of the diameter D part (refer to FIG. 2 (c)) of the uppermost exhaust section P (PT1) is obtained by the following formula (3). Zp1 = ｛(πD / N-T) Vp｝ / (Vr)… Formula (3) N: Number of rotating blades 7 constituting the uppermost exhaust section D: Dimension of diameter D (refer to Figure 2 (c)) T: The right-angle thickness of the axis D portion of the rotating blade 7 constituting the uppermost exhaust section (refer to FIG. 2 (c)) Vp: Falling speed of particles Vr: Rotational speed (circumferential speed) of the diameter D portion of the rotating blade 7 The step height (protruding height) Zp2 of the above-mentioned staggered structure is specified based on the following formula (4). The following formula (4) is based on the two rotating blades 72, 73 want to be n rotating blades as shown in Figure 3, 7 ..., Applied to n rotating blades Rotating blades 71 on both sides of 7, The upstream end 7A of 74 is higher than other rotating blades (71, (Other than 74) upstream staggered constructor. Zp2 = ｛(πD · n / N) Vp｝ / (Vr)… Equation (4) n: Rotating blades 71 located higher on the upstream end Number of rotating blades between 74 D: Dimension of diameter D (refer to Figure 2 (c)) N: Number of rotating blades 7 constituting the uppermost exhaust section Vp: Falling speed Vr of particles Pa: The rotation speed (peripheral speed) of the diameter D portion of the rotary blade 7 is shown in the diameter D portion of FIG. 2 (c). If n rotating blades 7 and rotating blades 7 (71, 71 74) The step difference is set above Zp2, Then the particles falling to the space between the rotating blades of symbols 71 and 74 (equivalent to L2 in FIG. 2) do not collide with the n rotating blades 7, And hit the front of the rotating blade of symbol 74. And The collision area between the front surface of the rotating blade of the particle 74 and the collision area is specified by Zp3 described in the following formula (5). In the vacuum pump (equivalent to the vacuum pump of the present invention) of FIG. 1 having the above-mentioned staggered structure, that is, having the particle transfer section PN, The plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1) have uneven structures with different heights of the upstream end 7A as a whole. The staggered structure is as described above, The height of the rotating blade 7 adjacent to the blade NB constituting the particle transfer section PN is extended by the above blade NB, So in this discussion 2, It is considered that “there is a rotating blade having an upstream end that is higher than the height Zp2 of the blade NB”. When thinking about this, The collision area Zp3 (see FIG. 4) of the particles in the diameter D part (see FIG. 2 (c)) of the uppermost exhaust section PT (PT1) is specified based on the following formula (5). Zp3 = [｛(πD (n + 1) / N-T)｝ Vp] / (Vr)… Equation (5) N: Number of rotating blades 7 constituting the uppermost exhaust section D: Dimension of diameter D (refer to Figure 2 (c)) T: The right-angle thickness of the axis D portion of the rotating blade 7 constituting the uppermost exhaust section (refer to FIG. 2 (c)) Vp: Falling speed of particles Vr: Rotation speed (circumferential speed) of the diameter D part of the rotating blade 7 n: Rotating blades 71 located higher on the upstream end Number of rotating blades between 74 If referring to FIG. 4, Then, the rotation speed Vr and the particle dropping speed Vp of the rotating blade 7 from the diameter D portion (see FIG. 2), The relative velocity Vc of the particles observed from the rotating blade 7 is obtained. In Figure 4, If the rotating blade 7 (71, 71, 74) The interval or interval is set to the blade interval L ', Then the particles (particles that can be incident (dropped) to the most downstream side in the blade interval L ') falling from the point A in Fig. 4 fall to the range of the blade interval L' and located on the extension line B of the rotating blade 7 (74) 'location. The falling distance from the upper end surface 7A to the position B 'of the rotating blade 7 (74) becomes Zp3 obtained by the above formula (5). In the vacuum pump (equivalent to the vacuum pump of the present invention) of FIG. 1 having the particle transfer section PN, Since there is no blade surface such as a chamfer in the range of Zp3, Therefore, the particles that have fallen to the B 'site can further fall, Finally with the front of the rotating blade 7 (74), Specifically, it collides with the position C 'of the downwardly inclined surface of the rotating blade 7 (74). As can be seen from the above description, In the vacuum pump (equivalent to the vacuum pump of the present invention) of FIG. 1 having the particle transfer section PN, The falling distance Zp4 of the particle at the point 7A to C 'above the rotating blade 7 (74) becomes the collision area of the particle, The collisionable region (falling distance Zp4) is larger than the collisionable region Zp3 obtained by the above formula (5). Anyway, If the height of the step difference due to the above-mentioned staggered structure is set to Zp2, The particles incident from point A in Figure 4 collide with point B, But if this step is set above Zp2, Then the particle does not collide with the n rotating blades 7, It collides with the front surface of the rotating blade 7 (74) (for example, the position C 'of the downward inclined surface of the rotating blade 7 (74)). Here, Compare and review the above formula (3) and (5). at this time, If we consider ignoring the thickness T of the rotating blades 7 in the above formula (3) and (5), Then, as described above, when the uneven structure with a step height of Zp2 or more is used, In the case of the above formula (5), Compared with the case of the above formula (3), The collision area of the particles Pa is enlarged to (n + 1) times, Therefore, the ratio of particles reflecting in the exhaust direction increases, The ratio of countercurrent particles is reduced. Anyway, The reason is that if the collision area of the particles is enlarged, Then the probability of collision with the inclined surface of the rotating blade 7 or the blade NB inclined toward the molecular exhaust direction and reflecting in the gas molecular exhaust direction is higher than the surface with higher probability than the reverse flow in the direction of the suction port 2 The probability of collision between the chamfered surface and the convex arc surface located on the upper part of the chamfered portion described in the previous example. another, Even if the blade NB is provided separately from the rotating blade 7, The above operation is the same. "Other Embodiments of Particle Transfer Section PN (Part 1)" In the vacuum pump P1 of FIG. 1, As a specific structure of the particle transfer section PN, Adopting a structure in which blades NB are provided to the entire rotating blade 7, But it is not limited to this. E.g, As shown in Figure 5 (a), (b), (c), It is also possible to adopt a configuration in which the blade NB is provided in a part of the length L direction of the rotating blade 7, Or as shown in figure (d), (e), A configuration in which a blade NB is provided in a part of the thickness T direction of the rotating blade 7, With this configuration, the above-mentioned effect can also be obtained (the ratio of particles reflecting in the exhaust direction increases, The ratio of countercurrent particles decreases). "Other Embodiments of Particle Transfer Section PN (Part 2)" In the vacuum pump of Fig. 1, As shown in Figure 2 (a), As a specific structure of a plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1), It is configured such that the interval between the plurality of rotating blades 7 is the same interval, But it is not limited to this. For example, as shown in Figure 6, The arrangement interval between the rotating blade 7 (74) whose upstream end becomes higher due to the above-mentioned staggered structure and the rotating blade 73 (hereinafter referred to as the "leading blade 7 (73)") located on the front side of the rotating direction of the rotating blade 7 (74) , It can be set wider than the arrangement interval of other rotating blades 7. Referring to Figure 6, When using the setting of the configuration interval as described above, As mentioned above, the exhaust direction reflecting particles colliding with the inclined plane FS before the blade NB are not easy to collide with the leading blade 7 (73). And on the back surface of the leading blade 7 (73) (the inclined surface toward the suction port 2 on the back side in the rotation direction, The same applies below) particles that bounce back toward the suction port 2 due to collision and reflection (this is also a kind of countercurrent particles) are reduced, The exhaust efficiency of the particles is further improved. "Other Embodiments of Particle Transfer Section PN (Part 3)" In the vacuum pump of Fig. 1, As shown in Figure 2 (a), As a specific structure of a plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1), It is configured such that the downstream ends 7B of the plurality of rotating blades 7 have the same height, But it is not limited to this. For example, as shown in Figure 7 (a), The downstream end 7B of the leading vane 7 (73) can also be used to retract in the direction of the suction port 2 than the downstream end 7B of other rotating vanes 7 (hereinafter referred to as "bottom rising structure"). Or as shown in Figure 7 (b), It is also possible to provide a bottom-up structure for cutting a part of the downstream end 7B of the leading blade 7 (73). Refer to Figure 7 (a), (b), The same applies to the bottom-rise structure as described above, Exhaust-direction reflecting particles colliding with the oblique FS before the blade NB are difficult to collide with the back surface of the leading blade 7 (73). And the particles that bounce back toward the suction port 2 (this is also a kind of counter-current particles) under the reflection of the collision with the back surface of the leading blade 7 (73) are reduced, The exhaust efficiency of the particles is further improved. "Other Embodiments of Particle Transfer Section PN (Part 4)" In the vacuum pump P1 of FIG. 1, A plurality of rotating blades 7 are used as a structure in which the upstream end 7A has a staggered structure, that is, A structure in which the upstream end 7A of the rotating blade 7 is extended and heightened by the blade NB (hereinafter referred to as a "unilateral extended blade structure"), But it is not limited to this. E.g, In addition to the unilateral extension blade structure as described above, As shown in Figure 8, Furthermore, a rotating blade 7 (71, 71 74) 's downstream end 7B is longer than other rotating blades 7 (72, 73, 75) The structure with a longer downstream end 7B (hereinafter referred to as the "side extension blade structure"). As a specific configuration example of such an extended blade structure on both sides, another, In Figure 8, The rotating blades 7 (71, 71 74) downstream end 7B, But it is not limited to this extended form. but, Since the rotating blade 7 and the rotor 6 rotate together, Therefore, the centrifugal force generated by the rotation acts from the fixed end to the free end of the rotating blade 7, Or, the center of rotation of the self-rotating blade 7 (specifically, the axis of the rotor shaft 5) acts in the radial direction. Generally, the rotating blades 7 are provided in a manner such that the shape of the rotating blades 7 is at right angles to the rotation axis (specifically, the rotor shaft 5) and a straight line (hereinafter, the shape center of the blade) around the radial direction is symmetrical. This is the centrifugal force caused by the rotation as described above, So that the moment of the force generated by the rotating blade 7 becomes unbalanced around the shape center of the rotating blade, To reduce the torque generated at the root (fixed end) of the rotating blade 7, Measures against risks such as fatigue damage. In the one-sided extension blade structure described previously, Only the upstream end 7A of the rotating blade 7 is extended, Therefore, it is easy to produce an imbalance of the torque around the shape center of the rotating blade 7, It is considered that this torque may be near the fixed end of the rotating blade 7, That is, damage to the rotating blades 7 such as fatigue damage occurs in a portion located on the outer peripheral surface side of the rotor 6. In contrast, In the previously described two-side extension blade structure, For rotating blades 7 (71, 74) Both the upstream end 7A and the downstream end 7B are provided with equivalent blades NB, Therefore, it is not easy to generate the twisting force as described above. It is also less likely to cause damage to the rotating blade 7 due to fatigue damage due to torsional force. "Other Embodiments of Particle Transfer Section PN (Part 5)" In the vacuum pump P1 of FIG. 1, As a specific configuration of the blade NB constituting the particle transfer section PN, As the structure in which the blade NB is disposed adjacent to the rotating blade 7 constituting the uppermost exhaust section PT1, And its adjacent specific configuration examples, It is a structure in which the blade NB and the rotating blade 7 are integrally provided as one component (refer to FIG. 2 (a)). But it is not limited to this. As a specific example of the other adjacent configuration described above, The following constitutions can also be adopted: For example, as shown in Figure 9 (a), For at least any one of the plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1), 74) the whole or part of it, The blades NB constituting the particle transfer section PN are installed as different parts. In the composition of such different parts, The above explanation of "the whole or a part of the rotating blade" is based on the above description of "Other Embodiments of Particle Transfer Section PN (Part 1)", Therefore, its detailed description is omitted. The case of using the above-mentioned blade NB constituted as the above-mentioned different parts also uses the blade NB as its different part, The plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1) become uneven structures with different heights at the upstream end 7A, Therefore, the above-mentioned effect is obtained (the ratio of particles reflecting in the exhaust direction is increased, The ratio of countercurrent particles decreases). In the case of using the blade NB composed of different parts as described above, There is also between the blade NB constituting the particle transfer section PN and the rotating blade 7 (71) constituting the uppermost exhaust layer PT (PT1), For example, a gap is generated as shown in FIG. 9 (b), Or, as shown in Fig. 9 (c), a relative offset occurs. The composition that produces the gap or offset is also included in the "adjacent" above, The above-mentioned effect is obtained (the ratio of particles reflecting in the exhaust direction is increased, The ratio of countercurrent particles decreases). If the above-mentioned gap or offset is actively set according to design needs, And the design of the relationship with processing accuracy. As described above, the blade NB constituting the particle transfer section PN is configured as a different part, The structures described in "Other Embodiments of Particle Transfer Section PN (Part 1)" to "Other Embodiments of Particle Transfer Section PN (Part 4)" can also be applied. In the configuration using the blade NB configured as different parts as described above, The blade NB, That is, the blade NB constituting the particle transfer section PN and the rotating blade 7 (71) constituting the uppermost exhaust section PT (PT1) become structures in which each blade surface directly faces, Between the blade surfaces which are directly opposed in this way, for example, no fixed parts such as the fixed blade 8 are interposed. This point is the same in the blade integrated structure described earlier (see FIG. 2 (a)). "Another embodiment of the particle transfer section PN (No. 6)" In the vacuum pump of Fig. 1, As a specific structure of the particle transfer section PN, The blade NB constituting the particle transfer section PN and the rotary blade 7 constituting the uppermost exhaust section PT (PT1) are arranged adjacent to each other. But it is not limited to this. For example, as shown in Figure 10, The blade NB constituting the particle transfer section PN can also be configured to be located at a certain distance from the rotating blade 7 constituting the uppermost exhaust section PT (PT1) With this constitution, The above-mentioned effect can also be obtained (the ratio of particles reflecting in the exhaust direction is increased, The ratio of countercurrent particles decreases). "Other Embodiments of Particle Transfer Section PN (No. 7)" As shown in FIG. 9 (a), In the configuration in which the blade NB constituting the particle transfer section PN is installed as different parts, The specific installation structure of the blade NB is as follows: For example, as shown in Figure 11, Prepare the first mounting member 62 that can be fitted into the recess 61 in the upper end surface of the rotor 6, Support the blade NB on the outer peripheral surface of the first mounting member 62 (specifically, the outer peripheral surface of the flange 62A provided on the outer periphery of the first mounting member 62), In a state where the first mounting member 62 is fitted into the recessed portion 61, The first mounting member 62 and the front end of the rotor shaft 5 are fixed by screws BT. In the mounting method using the blade NB of the first mounting member 62 as described above, Gas may be trapped in the recess 61 on the upper end surface of the rotor 6, Therefore, it is preferable to provide an exhaust hole 63 in the first mounting member 62, Alternatively, an exhaust mechanism such as an exhaust hole 64 is provided between the flange 62A of the first mounting member 62 and the upper end surface of the rotor 6. In order to achieve a rotational balance of the entire rotating body including the rotor 6 or the rotating blade 7, The blades NB shown in FIG. 11 are arranged in a rotationally symmetrical manner as shown in FIG. 12 as viewed from the center of rotation of the rotating body. For this configuration, It can also be applied to the blades NB of Figs. 1 to 10 (except Fig. 3) described previously or Figs. Blade NB in Figure 4. "Other Embodiments of Particle Transfer Section PN (No. 8)" For the specific installation structure of the blade NB constructed as different parts as described above, For example, the mounting structure shown in FIG. 13 may be adopted. In the installation structure of FIG. 13, Prepare a second mounting member 65 that can be mounted on the front end of the rotor shaft 5, Supporting the blade NB on the outer peripheral surface of the second mounting member 65, The second mounting member 65 and the front end of the rotor shaft 5 are fixed by screws BT. "Other Embodiments of Particle Transfer Section PN (Part 9)" Furthermore, As a specific installation structure of the above-mentioned blade composed of different parts, Although not shown, However, a method may also be adopted in which the upper end of the suction port side of the rotor 6 is bolted to fix the blade. "Other Embodiments of Particle Transfer Section PN (No. 10)" In the vacuum pump P1 of FIG. 1, As shown in Figure 2 (a), The configuration is set such that the elevation angle θ1 of the blade NB constituting the particle transfer section PN and the elevation angle θ2 of the plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1) are equal (θ1 = θ2), But it is not limited to this. It can also be configured to set the elevation angle as shown in FIG. 14, for example. That is, the elevation angle θ1 of the blade NB constituting the particle transfer section PN is smaller than the elevation angle θ2 of the rotating blade 7 constituting the uppermost exhaust section PT (PT1) (θ1 <θ2). When adopting the configuration of the elevation angle as described above, The blades NB constituting the particle transfer section PN relative to the rotating blades 7 (71, 71, 71) constituting the uppermost exhaust section PT (PT1). 74) The shape of overhangs, Due to the direction of the leading blade, Towards the space between the lower ends of the blades, That is, the angle is closer to the angle of the rotating body (specifically, the rotating body including the rotor 6 or the rotating blade 7) and the downward direction, Therefore, the exhaust direction reflection particles reflected by the collision with the inclined plane FS before the blade NB are not easy to collide with the back surface of the leading blade 7 (73), As a result, the number of particles that are reflected by the collision with the leading blade 7 (73) and bounce back toward the suction port 2 is reduced (this is also a type of countercurrent particles). The exhaust efficiency of the particles is further improved. also, The setting of the elevation angle as described above is not only applied to the configuration in which the blade NB is set as different parts as shown in FIG. 14, It can also be applied to a structure in which the blade NB and the rotating blade 7 are integrally provided as shown in FIG. 6. "Other Embodiments of Particle Transfer Section PN (11-1 and 11-2)" The step height (depth) caused by the staggered structure described earlier is not limited to one type, It can also be a structure of a plurality of height (depth) combinations of step differences. E.g, Can be stepped (see Figure 15), It is also possible to form a shape such that the height changes into a cone shape (see FIG. 16). Furthermore, Although not shown, However, as a combination example of the height (depth) of plural step differences, It is also possible to adopt a configuration (a configuration in which the height or depth of the step is not uniform) set such that the height (depth) of the step becomes scattered. Anyway, The combination of the heights (depths) of the plural step differences can be appropriately changed as required. also, According to the radial position of the rotating blade, Change the height of the step. Fig. 15 shows another embodiment of the particle transfer section PN (11-1 thereof), in particular, Is a combination example of the height of a plurality of step differences, An explanatory diagram of a structure in which the height of the step is changed into a step shape. also, FIG. 16 shows another embodiment of the particle transfer section PN (part 11-2), in particular, Is a combination example of the height of a plurality of step differences, An explanatory diagram of a configuration in which the height of the step difference changes into a cone shape. Here, For example, referring to FIG. 4, In the example of FIG. 4, The rotating blade 7 (71, 71) 74) and rotating blades located between them The height (depth) of the step difference of 7 is composed of Zp2 or Zp3 equal to or more than Zp2. In contrast, Referring to FIG. 15, In the example of FIG. 15, The structure (hereinafter referred to as "step" Shape structure "). therefore, In this stepped configuration, Rotating blades 7 (76, 76 80) and the rotating blade 7 (77, 78, 79) step height (depth) h1, h2, h3 is not always the same, Instead, it is set in such a way that the direction of rotation of the rotating blade 7 becomes lower (deeper) step by step. In the case of adopting the step-shaped configuration thus set, It can also be seen from the trace of the fine particles Pa shown in FIG. 15 that The fine particles Pa are not related to the rotating blade 7 (77, 78, 79) collision, The above-mentioned effect is obtained (the ratio of particles reflecting in the exhaust direction is increased, The ratio of countercurrent particles decreases). In the case of the above step-shaped structure, The rotating blade 7 (76, 80) rotating blades 7 (77, 78, The upstream end 7A of 79) is constituted by a plane without tilt. Referring to FIG. 16, In the example of FIG. 16, It adopts a structure in which the height (depth) of the step difference due to the staggered structure in the nth rotating blade 7 (80) is changed to be Zp2 or more (h4 <h5 <h6) (hereinafter referred to as "cone Shape structure "). therefore, In this cone-shaped configuration, The rotating blade 7 (76, 80) and the rotating blades 7 (77, 78, 79) step height (depth) h4, h5, h6 is not always the same, Instead, it is set so as to continuously decrease (deeper) in the rotation direction of the rotary blade 7. When a cone-shaped structure set in this way is used, As can be seen from the trace of the fine particles Pa shown in FIG. 16, The fine particles Pa are not related to the rotating blade 7 (77, 78, 79) collision, The above-mentioned effect is obtained (the ratio of particles reflecting in the exhaust direction is increased, The ratio of countercurrent particles decreases). When the above-mentioned cone-shaped structure is adopted, The rotating blade 7 (76, 80) rotating blades 7 (77, 78, The upstream end 7A of 79) is formed by an inclined surface inclined at a specific angle. however, The ratio of the arrangement interval and the height of the rotating blades 7 is set to an optimal value for efficiently transferring gas molecules to the downstream side. Therefore, if the heights of the rotating blades 7 are different, This causes a part of the rotating blades 7 to deviate from the optimal set value, The exhaust performance of the entire vacuum pump may be reduced. With this, In terms of ensuring exhaust performance, The difference in height of the rotating blades 7 is preferably small. This point is based on the step-shaped configuration of FIG. 15 described earlier. Or in the cone-shaped configuration of FIG. 16, Since the height of the step difference due to the staggered structure in the nth rotating blade 7 (80) is changed into a stepped or tapered configuration such that the height is greater than Zp2, Therefore, for example, in the case of the reduced staggered structure described later, The height difference of the rotating blades 7 also becomes smaller, It is not easy to reduce the exhaust performance. another, The step-shaped configuration of FIG. 15 or the cone-shaped configuration of FIG. 16 not only adopts a height-reducing staggered structure described later, Of course, the above-mentioned uneven structure can also be adopted. "Other embodiment of the present invention near the particle transfer section PN" Fig. 17 is an explanatory diagram of another embodiment of the present invention near the particle transfer section PN. In the embodiment of FIG. 17, Upstream of the uppermost exhaust section PT (PT1) (specifically more upstream than the particle transfer section PN), As a reflection mechanism RF, A fixed blade RF1 (hereinafter referred to as a "fixed reflection blade RF1") is provided which is inclined at an angle opposite to the plurality of rotating blades 7 constituting the uppermost exhaust section PT (PT1). Referring to FIG. 17, The fine particles Pa are reflected in the downstream direction by the rotating blades 7 (hereinafter referred to as "the uppermost rotating blades 7") constituting the exhaust section PT (PT1), It moves in the direction of the stationary blades 8 (hereinafter referred to as "the uppermost stationary blades 8") constituting the same exhaust section PT (PT1). at this time, A part of the fine particles Pa is shown in FIG. 17. Since the back or upper end surface of the uppermost stationary blade 8 is reflected again, Not incident on the front surface of the uppermost rotating blade 7, And at a specific speed between the uppermost rotating blades 7, The probability of backflow in the direction of the suction port 2 or the vacuum chamber CH before it is high. As a mechanism for preventing the reverse flow of the fine particles Pa (hereinafter referred to as "re-reflective particles Pa") caused by the re-reflection of the uppermost stationary blade 8 as described above, The reflection mechanism RF functions. which is, The re-reflected particles Pa are shown in FIG. 17, For fixed reflection blade RF1 reflection, Move again in the direction of the top exhaust section PT (PT1). but, As described above, the re-reflective particles Pa in the countercurrent flow through the uppermost rotating blades 7 at a specific speed as described above. Therefore, as the speed component required for this penetration, It has a velocity component parallel to the tilt of the uppermost rotating blade (direction of rotation). thus, In the embodiment of FIG. 17, As above, The fixed reflecting blade RF1 is formed in a shape inclined at an angle opposite to the uppermost rotating blade 7. Thereby, the reflection blade RF1 can be fixed to effectively capture the re-reflective particles Pa in the backward flow. The number of fixed reflection blades RF1 and the inclination angle can be considered by the reflection of fine particles Pa caused by the fixed reflection blade RF1 or the exhaust efficiency of the entire vacuum pump. Change as needed. In the embodiment of FIG. 17, The reflecting mechanism RF is arranged downstream of the suction port 2 in the vacuum pump P1, The configuration of the reflection mechanism RF in the vacuum pump PI, But it is not limited to this. Although not shown, However, the reflection mechanism RF may be provided in the middle of a path connecting the vacuum pump P1 and the vacuum chamber CH, for example. The invention is not limited to the embodiments described above, Various modifications can be made by those skilled in the art within the technical idea of the present invention. E.g, The structures of "Other Embodiments of Particle Transfer Section PN (Part 1)" to "Other Embodiments of Particle Transfer Section PN (Part 11-2)" described earlier, And the structure of "another embodiment of the present invention near the particle transfer section PN", It can be used in appropriate combination as required. The vacuum pump of the embodiment described above is between the suction port 2 to the exhaust port 3, A plurality of exhaust sections PT functioning as a mechanism for exhausting gas molecules, The plurality of exhaust sections PT become PT for each exhaust section, A structure in which gas molecules are exhausted by a plurality of rotating blades 7 and fixed blades 8 arranged radially at a specific interval. In the plurality of exhaust sections PT including this structure, By reducing the staggered structure, Even if the height of at least a part of the upstream end 7A of the plurality of rotating blades 7 constituting the uppermost exhaust section PT1 decreases (increases), It becomes a staggered structure with different heights for all the upstream 7A, It can also be a particle transfer section that transfers particles in the exhaust direction of gas molecules. Such a particle transfer section functions equally as the particle transfer section PN.

1‧‧‧外裝殼體1‧‧‧ Outer shell

1A‧‧‧泵殼1A‧‧‧Pump casing

1B‧‧‧泵座1B‧‧‧Pump Block

2‧‧‧吸氣口2‧‧‧ suction port

3‧‧‧排氣口3‧‧‧ exhaust port

4‧‧‧定子柱4‧‧‧ Stator post

5‧‧‧轉子軸5‧‧‧ rotor shaft

6‧‧‧轉子6‧‧‧ rotor

7‧‧‧旋轉葉片7‧‧‧ rotating blade

7A‧‧‧上端7A‧‧‧Top

7B‧‧‧下游端7B‧‧‧ downstream

8、8E‧‧‧固定葉片8, 8E‧‧‧Fixed blade

9‧‧‧螺紋槽排氣部定子9‧‧‧Threaded groove exhaust stator

61‧‧‧轉子上端面之凹部61‧‧‧Concave part of the upper end surface of the rotor

62‧‧‧第1安裝構件62‧‧‧The first mounting member

62A‧‧‧凸緣62A‧‧‧ flange

63‧‧‧排氣孔63‧‧‧Vent hole

64‧‧‧排氣槽64‧‧‧Exhaust trough

65‧‧‧第2安裝構件65‧‧‧ 2nd mounting member

71～80‧‧‧旋轉葉片71 ～ 80‧‧‧rotating blade

91‧‧‧螺紋槽91‧‧‧Thread groove

A、B、C‧‧‧箭頭A, B, C‧‧‧ arrows

B'、C'‧‧‧地點B ', C'‧‧‧ Place

BL‧‧‧壓力調整閥BL‧‧‧Pressure regulating valve

BT‧‧‧螺栓BT‧‧‧bolt

CH‧‧‧真空腔室CH‧‧‧Vacuum chamber

D‧‧‧旋轉葉片之直徑D‧‧‧ diameter of rotating blade

EG‧‧‧葉片邊緣部EG‧‧‧Edge of blade

FS‧‧‧構成粒子移送段之葉片之前斜面FS‧‧‧ Bevel before the blade constituting the particle transfer section

GE‧‧‧最終間隙GE‧‧‧ Final clearance

h1～h5‧‧‧深度h1 ～ h5‧‧‧‧depth

L'‧‧‧葉片間隔L'‧‧‧ blade interval

L1‧‧‧構成最上段排氣段之旋轉葉片之配置間隔L1‧‧‧arrangement of the arrangement of the rotating blades in the uppermost exhaust section

L2‧‧‧構成粒子移送段之旋轉葉片之配置間隔L2‧‧‧ Arrangement of rotating blades constituting the particle transfer section

MB1‧‧‧徑向磁性軸承MB1‧‧‧Radial Magnetic Bearing

MB2‧‧‧軸向磁性軸承MB2‧‧‧ axial magnetic bearing

MC‧‧‧倒角部之上部MC‧‧‧Chamfer upper part

MO‧‧‧驅動馬達MO‧‧‧Drive motor

MS‧‧‧倒角部MS‧‧‧Chamfer

NB‧‧‧葉片NB‧‧‧ Blade

P1‧‧‧真空泵P1‧‧‧Vacuum pump

Pa‧‧‧微粒子Pa‧‧‧ Particles

PN‧‧‧粒子移送段PN‧‧‧Particle transfer section

PS‧‧‧螺紋槽泵段PS‧‧‧Thread groove pump section

PT‧‧‧排氣段PT‧‧‧Exhaust section

PT1‧‧‧最上段之排氣段PT1‧‧‧ the top exhaust section

PTn‧‧‧最下段之排氣段PTn‧‧‧ bottom exhaust section

R‧‧‧螺紋槽排氣流路R‧‧‧ Thread groove exhaust flow path

RF‧‧‧反射機構RF‧‧‧Reflection mechanism

RF1‧‧‧固定反射葉片RF1‧‧‧Fixed reflective blade

S‧‧‧泵內排氣口側流路S‧‧‧Exhaust port side flow path in the pump

T‧‧‧厚度T‧‧‧thickness

Vc‧‧‧相對速度Vc‧‧‧ relative speed

Vp‧‧‧粒子Pa之落下速度Vp‧‧‧ Falling speed of particle Pa

Vr‧‧‧旋轉葉片7、葉片NB之旋轉速度(周速)Vr‧‧‧Rotating blade 7, Rotation speed of blade NB (peripheral speed)

Z‧‧‧先前之真空泵Z‧‧‧Previous vacuum pump

Z1、Z2‧‧‧粒子之可碰撞區域Collision area of Z1, Z2‧‧‧ particles

Zp1‧‧‧粒子之可碰撞區域Collision area of Zp1‧‧‧ particles

Zp2‧‧‧參差構造之階差之高度Zp2‧‧‧ the height of the step difference

Zp3‧‧‧粒子之可碰撞區域Collision area of Zp3‧‧‧ particles

Zp4‧‧‧落下距離Zp4‧‧‧ Falling distance

θ1、θ2‧‧‧仰角θ1, θ2‧‧‧ elevation angle

圖1係應用本發明之真空泵之剖視圖。圖2(a)係自轉子之外周面側觀察圖1之真空泵之粒子移送段之狀態之說明圖，(b)係圖2(a)之A箭視圖，(c)係圖2(a)之B箭視圖。圖3係不具備粒子移送段之真空泵(相當於先前之真空泵)中落下之粒子之可碰撞區域之說明圖。圖4係具備粒子移送段之圖1之真空泵(相當於本發明之真空泵)中落下之粒子之可碰撞區域之說明圖。圖5(a)、(b)、(c)、(d)及(e)係粒子移送段之其他實施形態(其1)之說明圖。圖6係粒子移送段之其他實施形態(其2)之說明圖。圖7(a)、(b)係粒子移送段之其他實施形態(其3)之說明圖。圖8係粒子移送段之其他實施形態(其4)之說明圖。圖9(a)、(b)及(c)係粒子移送段之其他實施形態(其5)之說明圖。圖10係粒子移送段之其他實施形態(其6)之說明圖。圖11係粒子移送段之其他實施形態(其7)之說明圖。圖12係圖11之C箭視圖。圖13係粒子移送段之其他實施形態(其8)之說明圖。圖14係粒子移送段之其他實施形態(其10)之說明圖。圖15係粒子移送段之其他實施形態(其11-1)之說明圖。圖16係粒子移送段之其他實施形態(其11-2)之說明圖。圖17係粒子移送段附近之本發明之其他實施形態之說明圖。圖18係採用先前之真空泵作為真空腔室之氣體排氣機構之排氣系統之概要圖。圖19(a)係於圖18所示之先前之真空泵之最上段排氣段自圖18之箭頭D方向觀察排氣段之旋轉葉片之狀態之模式圖，(b)係位於圖19(a)所示之旋轉葉片之上端面側之葉片邊緣部之放大圖。圖20係使倒角部向分子排氣方向朝下以機械加工傾斜之狀態之說明圖。Fig. 1 is a sectional view of a vacuum pump to which the present invention is applied. Fig. 2 (a) is an explanatory view of a state in which the particle transfer section of the vacuum pump of Fig. 1 is viewed from the outer peripheral side of the rotor, (b) is an arrow A view of Fig. 2 (a), and (c) is Fig. 2 (a) B arrow view. FIG. 3 is an explanatory diagram of a collision area of particles falling in a vacuum pump (equivalent to the previous vacuum pump) without a particle transfer section. FIG. 4 is an explanatory diagram of a collision area of particles falling in the vacuum pump (equivalent to the vacuum pump of the present invention) of FIG. 1 provided with a particle transfer section. 5 (a), (b), (c), (d), and (e) are explanatory diagrams of another embodiment (Part 1) of the particle transfer section. Fig. 6 is an explanatory diagram of another embodiment (part 2) of the particle transfer stage. 7 (a) and (b) are explanatory diagrams of another embodiment (part 3) of the particle transfer section. FIG. 8 is an explanatory diagram of another embodiment (part 4) of the particle transfer stage. 9 (a), (b), and (c) are explanatory diagrams of another embodiment (part 5) of the particle transfer section. FIG. 10 is an explanatory diagram of another embodiment (part 6) of the particle transfer stage. FIG. 11 is an explanatory diagram of another embodiment (part 7) of the particle transfer stage. FIG. 12 is an arrow C view of FIG. 11. FIG. 13 is an explanatory diagram of another embodiment (part 8) of the particle transfer stage. FIG. 14 is an explanatory diagram of another embodiment (No. 10) of the particle transfer stage. FIG. 15 is an explanatory diagram of another embodiment (part 11-1) of the particle transfer stage. FIG. 16 is an explanatory diagram of another embodiment (part 11-2) of the particle transfer stage. FIG. 17 is an explanatory diagram of another embodiment of the present invention in the vicinity of a particle transfer section. FIG. 18 is a schematic diagram of an exhaust system of a gas exhaust mechanism using a conventional vacuum pump as a vacuum chamber. FIG. 19 (a) is a schematic diagram of the state of the rotating blades of the exhaust section viewed from the direction of arrow D in FIG. 18 in the upper exhaust section of the previous vacuum pump shown in FIG. 18, (b) is located in FIG. 19 (a ) An enlarged view of a blade edge portion on the upper end side of the rotating blade shown in FIG. FIG. 20 is an explanatory view of a state in which the chamfered portion is tilted downward in the molecular exhaust direction and is machined.

Claims

一種真空泵，其特徵係於吸氣口至排氣口之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段，上述複數個排氣段為依每個排氣段，藉由以特定間隔放射狀配置之複數片旋轉葉片與固定葉片而將上述氣體分子排氣之構造，且於上述複數個排氣段中最上段排氣段至上述吸氣口之間，具備葉片作為於上述氣體分子之排氣方向移送粒子之粒子移送段，該葉片與構成上述最上段排氣段之上述複數旋轉葉片一起旋轉，且其片數少於構成上述最上段排氣段之上述複數片旋轉葉片之片數。A vacuum pump is characterized in that it is located between an intake port and an exhaust port, and has a plurality of exhaust sections functioning as a mechanism for exhausting gas molecules, and the plurality of exhaust sections are based on each exhaust section. A structure in which the gas molecules are exhausted by a plurality of rotating blades and fixed blades arranged radially at a specific interval, and a blade is provided between the uppermost exhaust section of the plurality of exhaust sections and the suction port. In the particle transfer section for transferring particles in the exhaust direction of the gas molecules, the blade rotates together with the plurality of rotating blades constituting the uppermost exhaust section, and the number of blades is less than the plurality of pieces constituting the uppermost exhaust section. Number of rotating blades.

如請求項1之真空泵，其中構成上述粒子移送段之上述葉片係與構成上述最上段排氣段之上述複數片旋轉葉片隣接設置。The vacuum pump according to claim 1, wherein the blades constituting the particle transfer section are arranged adjacent to the plurality of rotating blades constituting the uppermost exhaust section.

如請求項1至2中任一項之真空泵，其中對於構成上述最上段排氣段之上述複數片旋轉葉片中之至少任一片旋轉葉片全體或其一部分，一體設置構成上述粒子移送段之上述葉片。The vacuum pump according to any one of claims 1 to 2, wherein at least any one of the plurality of rotating blades constituting the uppermost exhaust section of the plurality of rotating blades or a part of the rotating blades are integrally provided with the blades constituting the particle transfer section. .

如請求項1至3中任一項之真空泵，其中於構成上述最上段排氣段之上述複數片旋轉葉片中，與構成上述粒子移送段之上述葉片隣接之旋轉葉片之高度係藉由構成上述粒子移送段之上述葉片而延長，藉此，構成上述最上段排氣段之上述複數片旋轉葉片成為該等全體而言上游端之高度不同之參差構造。The vacuum pump according to any one of claims 1 to 3, wherein, among the plurality of rotating blades constituting the uppermost exhaust section, the height of the rotating blades adjacent to the blades constituting the particle transfer section is formed by the above The blades of the particle transfer section are extended, whereby the plurality of rotating blades constituting the uppermost exhaust section become uneven structures having different heights at the upstream end as a whole.

如請求項4之真空泵，其中於構成上述最上段排氣段之上述複數片旋轉葉片中，因上述參差構造而上游端變高之旋轉葉片，與位於該旋轉葉片之旋轉行進方向前側之旋轉葉片之配置間隔，設定為較其他上述複數片旋轉葉片之配置間隔更廣。The vacuum pump according to claim 4, wherein among the plurality of rotating blades constituting the uppermost exhaust section, the rotating blade whose upstream end becomes higher due to the above-mentioned staggered structure, and the rotating blade located in front of the rotating traveling direction of the rotating blade The arrangement interval is set to be wider than the arrangement intervals of the other plurality of rotating blades.

如請求項4之真空泵，其中於構成上述最上段排氣段之上述複數片旋轉葉片中，位於因上述參差構造而上游端變高之旋轉葉片之旋轉行進方向前側之上述旋轉葉片之下游端，較其他上述複數片旋轉葉片之下游端更朝上述吸氣口方向退縮。The vacuum pump according to claim 4, wherein among the plurality of rotating blades constituting the uppermost exhaust section, the downstream end of the rotating blades located on the front side in the direction of travel of the rotating blades whose upstream end becomes higher due to the uneven structure, Compared with other downstream ends of the plurality of rotating blades, the end is retracted toward the suction port.

如請求項4之真空泵，其中於構成上述最上段排氣段之上述複數片旋轉葉片中，因上述參差構造而上游端變高之旋轉葉片之下游端係以較其他上述複數片旋轉葉片之下游端更長之方式延長。The vacuum pump according to claim 4, wherein, among the plurality of rotating blades constituting the uppermost exhaust section, the downstream end of the rotating blade that becomes higher due to the uneven structure is downstream of the other plurality of rotating blades. End longer way to extend.

如請求項4至7中任一項之真空泵，其中成為因上述參差構造而階差之高度階梯狀變化之構成。The vacuum pump according to any one of claims 4 to 7, wherein the vacuum pump has a stepwise change in height due to the above-mentioned staggered structure.

如請求項4至7中任一項之真空泵，其中成為因上述參差構造而階差之高度錐狀變化之構成。The vacuum pump according to any one of claims 4 to 7, wherein the vacuum pump has a configuration in which the height of the step varies in a tapered manner due to the above-mentioned staggered structure.

如請求項1至9中任一項之真空泵，其中對於構成上述最上段排氣段之上述複數片旋轉葉片中之至少任一片旋轉葉片全體或其一部分，作為不同零件而安裝構成上述粒子移送段之上述葉片。The vacuum pump according to any one of claims 1 to 9, wherein the whole or a part of at least any one of the plurality of rotating blades constituting the uppermost exhaust section is installed as different parts to constitute the particle transfer section. The above blades.

如請求項1至10中任一項之真空泵，其中構成上述粒子移送段之上述葉片之仰角設定為小於構成上述最上段排氣段之上述複數片旋轉葉片之仰角。The vacuum pump according to any one of claims 1 to 10, wherein the elevation angle of the blades constituting the particle transfer section is set smaller than the elevation angle of the plurality of rotating blades constituting the uppermost exhaust section.

如請求項1至11中任一項之真空泵，其中構成上述粒子移送段之上述葉片設置於自構成上述最上段排氣段之上述複數片旋轉葉片離開之位置。The vacuum pump according to any one of claims 1 to 11, wherein the blades constituting the particle transfer section are provided at positions separated from the plurality of rotating blades constituting the uppermost exhaust section.

一種葉片零件，其使用於如請求項1至12中任一項之真空泵，且具備構成上述粒子移送段之上述葉片。A blade part, which is used in the vacuum pump according to any one of claims 1 to 12, and includes the blades constituting the particle transfer section.

一種真空泵，其特徵係於吸氣口至排氣口之間，具有作為將氣體分子排氣之機構發揮功能之複數個排氣段，上述複數個排氣段為依每個排氣段，藉由以特定間隔放射狀配置之複數片旋轉葉片與固定葉片而將上述氣體分子排氣之構造，且藉由降低構成最上段排氣段之上述複數片旋轉葉片中之至少一部分上游端之高度，而成為該等全體而言上游端之高度不同之參差構造，且成為於上述氣體分子之排氣方向移送粒子之粒子移送段。A vacuum pump is characterized in that it is located between an intake port and an exhaust port, and has a plurality of exhaust sections functioning as a mechanism for exhausting gas molecules, and the plurality of exhaust sections are based on each exhaust section. A structure in which the above gas molecules are exhausted by a plurality of rotating blades and fixed blades arranged radially at a specific interval, and by reducing the height of at least a part of the upstream end of the plurality of rotating blades constituting the uppermost exhaust section, These become the uneven structures with different heights at the upstream end as a whole, and become a particle transfer section that transfers particles in the exhaust direction of the above-mentioned gas molecules.

如請求項14之真空泵，其中成為因上述參差構造而階差之高度階梯狀變化之構成。For example, the vacuum pump according to claim 14 has a stepwise change in the height of the step due to the above-mentioned staggered structure.

如請求項14之真空泵，其中成為因上述參差構造而階差之高度錐狀變化之構成。For example, the vacuum pump of claim 14 has a configuration in which the height of the step varies in a tapered shape due to the above-mentioned staggered structure.

一種轉子，其使用於如請求項1至12或14至16中任一項之真空泵，且具備構成上述粒子移送段之上述葉片。A rotor used in the vacuum pump according to any one of claims 1 to 12 or 14 to 16 and including the blades constituting the particle transfer section.

如請求項1至12或14至16中任一項之真空泵，其中於上述最上段排氣段之上游，設有以與構成該最上段排氣段之上述複數片旋轉葉片逆向之角度傾斜之固定之葉片，作為反射機構。The vacuum pump according to any one of claims 1 to 12 or 14 to 16, wherein upstream of the above-mentioned uppermost exhaust section, a vacuum pump is provided which is inclined at an angle opposite to the plurality of rotating blades constituting the uppermost exhaust section. The fixed blade acts as a reflecting mechanism.

一種固定葉片，其特徵在於，其係使用於如請求項18之真空泵者，且於上述最上段排氣段之上游，作為上述反射機構，以與構成該最上段排氣段之上述複數片旋轉葉片逆向之角度傾斜。A fixed blade characterized in that it is used for the vacuum pump as claimed in claim 18 and is upstream of the uppermost exhaust section and serves as the reflection mechanism to rotate with the plurality of pieces constituting the uppermost exhaust section. The blades are angled in the opposite direction.