TW201738551A - Inspection device for transparent plate surface, inspection method of transparent plate surface, and manufacturing method of glass plate with improved inspection precision - Google Patents
Inspection device for transparent plate surface, inspection method of transparent plate surface, and manufacturing method of glass plate with improved inspection precision Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
- G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/254—Projection of a pattern, viewing through a pattern, e.g. moiré
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
- G01N21/898—Irregularities in textured or patterned surfaces, e.g. textiles, wood
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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Abstract
Description
本發明係關於一種透明板表面檢查裝置、透明板表面檢查方法、及玻璃板之製造方法。The present invention relates to a transparent plate surface inspection device, a transparent plate surface inspection method, and a glass plate manufacturing method.
專利文獻1中記載之檢查裝置係利用設置於來自光源之光因透明板之檢查面反射後之前方之相機拍攝光源之條紋圖案,且藉由將由相機所拍攝之圖像進行圖像處理而檢查透明板之表面形狀。所拍攝之圖像具有亮部與暗部交替地反覆之條紋圖案。可藉由檢測該條紋圖案與基準圖案之偏移,而對檢查面之表面形狀進行檢查。作為基準圖案,於檢查面為理想平面之情形時使用相機拍攝之條紋圖案。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2005-345383號公報The inspection apparatus described in Patent Document 1 detects a stripe pattern of a light source by a camera disposed on a surface of a light source that is reflected by an inspection surface of a transparent plate, and is image-processed by performing image processing on an image captured by the camera. The surface shape of the transparent plate. The captured image has a stripe pattern in which the bright portion and the dark portion are alternately repeated. The surface shape of the inspection surface can be inspected by detecting the deviation of the stripe pattern from the reference pattern. As the reference pattern, the stripe pattern photographed by the camera is used when the inspection surface is an ideal plane. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-345383
[發明所欲解決之問題] 相機係包括含有直線上排列之複數個像素之攝像元件、及將條紋圖案在攝像元件中成像之透鏡。光源或攝像元件係兩者均配置於檢查面之單側,且分別與檢查面傾斜地對向。可藉由該配置,而有效地排列複數個檢查裝置。 先前,以檢查裝置之緊密化為目的,而使相機之位置靠近檢查面,且將廣角之透鏡用作相機之透鏡。 近年來,因透明板而要求較高之平坦度,從而先前之檢查裝置變得檢查精度不充分。 本發明係鑒於上述課題研製而成者,主要目的在於提供一種已將檢查精度提昇之透明板表面檢查裝置。 [解決問題之技術手段] 為解決上述課題,根據本發明之一態樣,提供一種透明板表面檢查裝置, 其係檢查透明板之主表面之透明板表面檢查裝置,且具有: 光源,其包含條紋圖案;線感測器相機,其設置於來自上述光源之光因上述主表面反射後之前方,拍攝上述條紋圖案;及圖像處理裝置,其係將所拍攝之上述條紋圖案之圖像進行圖像處理; 上述線感測器相機具有包含排列於特定方向上之複數個像素之攝像元件、及將上述條紋圖案於上述攝像元件上成像之透鏡, 上述光源及上述攝像元件係兩者均配置於上述主表面之單側,且分別與上述主表面傾斜地對向, 配置於上述特定方向之一端之上述像素之上述主表面中之攝像點之面積(S1)與配置於上述特定方向之另一端之上述像素之上述主表面中之攝像點之面積(S2(S2>S1))之比(S1/S2)為0.20以上。 [發明之效果] 根據本發明之一態樣,提供一種檢查精度提高之透明板表面檢查裝置、透明板表面檢查方法、及玻璃板之製造方法。[Problem to be Solved by the Invention] A camera includes an image pickup element including a plurality of pixels arranged in a line, and a lens for imaging a stripe pattern in the image pickup element. Both the light source and the imaging element are disposed on one side of the inspection surface, and are opposed to the inspection surface obliquely. With this configuration, a plurality of inspection devices can be efficiently arranged. Previously, for the purpose of compacting the inspection device, the position of the camera was brought close to the inspection surface, and a wide-angle lens was used as the lens of the camera. In recent years, a high degree of flatness is required due to a transparent plate, and thus the inspection apparatus of the prior art has become insufficient in inspection accuracy. The present invention has been made in view of the above problems, and a main object thereof is to provide a transparent plate surface inspection device which has improved inspection accuracy. [Means for Solving the Problems] In order to solve the above problems, according to an aspect of the present invention, a transparent plate surface inspection device for inspecting a transparent plate surface inspection device of a main surface of a transparent plate is provided, and has: a light source including a stripe pattern; the line sensor camera is configured to capture the stripe pattern before the light from the light source is reflected by the main surface; and the image processing device performs the image of the stripe pattern captured Image processing; the line sensor camera includes an imaging element including a plurality of pixels arranged in a specific direction, and a lens for imaging the stripe pattern on the imaging element, wherein the light source and the imaging element are both disposed On one side of the main surface, and obliquely facing the main surface, respectively, an area (S1) of an imaging point disposed in the main surface of the pixel at one end of the specific direction and another end disposed in the specific direction The ratio (S1/S2) of the area (S2 (S2>S1)) of the imaging point in the main surface of the pixel is 0.20 or more. [Effect of the Invention] According to an aspect of the present invention, a transparent plate surface inspection device with improved inspection accuracy, a transparent plate surface inspection method, and a glass plate manufacturing method are provided.
以下,參照圖式,對用以實施本發明之透明板表面檢查裝置及透明板表面檢查方法之形態進行說明。於各圖式上,對於同一或對應之構成,標註同一或對應之符號且省略說明。 圖1係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之剖視圖,且係沿著圖2之I-I而成之剖視圖。圖2係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。 透明板表面檢查裝置10係如圖1及圖2所示,檢查透明板60之表側之主表面61(以下,亦稱為「檢查面61」)之形狀。作為透明板60,可列舉玻璃板、樹脂板等。透明板表面檢查裝置10具有例如光源20、線感測器相機30、及圖像處理裝置50。 光源20具有LED(Light-emitting diode,發光二極體)等光源本體21、及條紋圖案22。條紋圖案22係設置於光源本體21之發光面上。亦可於條紋圖案22與光源本體21之間,設置光擴散片等光學片。 線感測器相機30係設置於光源20之光被檢查面61反射後之前方,且拍攝光源20中所含之條紋圖案22。線感測器相機30具有包含排列於特定方向上之複數個像素之攝像元件31、及使條紋圖案22於攝像元件31中成像之透鏡32。作為攝像元件31,使用有例如CCD(Charge-coupled Device,電荷耦合元件)影像感測器、CMOS(Complementary Metal Oxide Semiconductor,互補金屬氧化物半導體)影像感測器等。 圖像處理裝置50係將利用線感測器相機30所拍攝之圖像進行圖像處理。圖像處理裝置50具有CPU(Central Processing Unit,中央處理單元)51、記憶體等記憶媒體52。圖像處理裝置50係藉由使CPU51執行記憶媒體52中記憶之程式而進行圖像處理。 圖3係表示藉由一實施形態之線感測器相機所拍攝之圖像之亮度分佈中之由透明板之表側之主表面反射所得之條紋圖案之像之亮度分佈之圖。於圖3中,橫軸表示線感測器相機30之像素之編號,縱軸表示亮度。像素之編號係表示像素排列之順序(整數)。如圖3所示,所拍攝之圖像具有亮部與暗部交替地反覆之條紋圖案。 圖像處理裝置50係檢測所拍攝之條紋圖案與基準圖案之偏移。作為基準圖案,於檢查面61為理想平面之情形時使用線感測器相機30所拍攝之條紋圖案。基準圖案係將藉由計算等而求出且預先記憶於記憶媒體52者讀出使用。 圖像處理裝置50可藉由檢測所拍攝之條紋圖案自基準圖案之偏移,而檢測檢查面61之各點上之斜率,且可藉由將該斜率進行積分而檢測表面形狀。對於根據條紋圖案之偏移導出表面形狀之方法,可使用一般性者,例如可使用上述專利文獻1中記載者。 且說,如圖1所示,光源20及攝像元件31兩者均配置於檢查面61之單側,且分別與檢查面61傾斜地對向。來自光源20之光之中心線相對於檢查面61之傾斜角θ1例如為35°以上55°以下,較佳為40°以上50°以下。而且,朝向攝像元件31之光之中心線相對於檢查面61之傾斜角θ2例如為35°以上55°以下,較佳為40°以上50°以下。傾斜角θ1與傾斜角θ2係於上述範圍內相等。 如上所述,可藉由使光源20及攝像元件31兩者均配置於檢查面61之單側且分別與檢查面61傾斜地對向,而有效地排列複數個透明板表面檢查裝置10。為提高該透明板表面檢查裝置10之檢查精度,本發明者著眼於攝像元件31之各像素之檢查面61中之攝像點之面積之不均。 圖4係利用一實施形態之攝像元件之一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。於圖4中,將光源20之條紋圖案22上之一點22P1成像於攝像元件31之一端之像素31P1。該像素31P1之檢查面61中之攝像點之面積S1可使用下述式(1)~(3)進行運算。 S1=α×Sf×β12
…(1) β1=A1b/A1…(2) A1=A1a+A1b…(3) 此處,α係表示顯示檢查面61對於透鏡32之光軸正交面OP之傾斜的影響之係數,Sf係表示透鏡32之光圈面積,A1a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P1為止之距離,A1b係表示自P1至光源20之一點22P1為止之距離。所謂透鏡32之光軸正交面OP係指與透鏡32之光軸32b正交之平面。透鏡32之光圈面積Sf係透鏡32之焦距f與光圈值之函數,且為固定。 圖5係利用一實施形態之攝像元件之另一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。於圖5中,將光源20之條紋圖案22上之一點22P2成像於攝像元件31之另一端之像素31P2。該像素31P2之檢查面61中之攝像點之面積S2可利用下述式(4)~(6)進行運算。 S2=α×Sf×β22
…(4) β2=A2b/A2…(5) A2=A2a+A2b…(6) 此處,α係表示顯示檢查面61相對於透鏡32之光軸正交面OP之傾斜的影響之係數,Sf係表示透鏡32之光圈面積,A2a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P2為止之距離,A2b係表示自P2至光源20之一點22P2為止之距離。再者,A1與A2相等。 圖6係利用一實施形態之攝像元件之中點之像素所拍攝之檢查面上之攝像點之面積之說明圖。圖6係將光源20之條紋圖案22上之一點22P3成像於攝像元件31之中點之像素31P3。該像素31P3之檢查面61中之攝像點之面積S3可利用下述式(7)~(9)進行運算。 S3=α×Sf×β32
…(7) β3=A3b/A3…(8) A3=A3a+A3b…(9) 此處,α係表示顯示檢查面61對於透鏡32之光軸正交面OP之傾斜的影響之係數,Sf係表示透鏡32之光圈面積,A3a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P3為止之距離,A3b係表示自P3至光源20之一點22P3為止之距離。P3係檢查面61中之與透鏡32之光軸之交點。 如根據圖1、圖4~圖6所明確,攝像元件31中所含之各像素之檢查面61中之攝像點之面積S中之最大值為S2,且最小值為S1。攝像點之面積S之不均能夠以作為S之最小值之S1與作為S之最大值之S2之比(S1/S2)表示。於上述式(1)、(4)中,Sf係完全相同之值,α係大致相同之值。因而,S1/S2係根據S1/S2=β12
/β22
之近似式進行運算。S1/S2越接近1,則攝像點之面積S之不均變得越小。 再者,如上所述,光源20及攝像元件31係兩者均配置於檢查面61之單側且分別與檢查面61傾斜地對向,故而,理所當然地,S2大於S1,且S1/S2未達1。S1/S2根據透明板表面檢查裝置10之小型化及光學系統與透明板60之防止干擾等觀點,較佳為0.45以下。 本發明者將於實施例之欄目中說明詳情,但利用實驗等發現可藉由將S1/S2設為0.20以上,而提昇透明板表面檢查裝置10之檢查精度。 透鏡32之焦距f較佳為110 mm以上。若透鏡32之焦距f為110 mm以上,則可使用視角較狹窄之透鏡32,且因穿過透鏡32之複數個光線接近於平行線,故容易將S1/S2設為0.20以上。透鏡32之焦距f進而較佳為120 mm以上。 就透鏡32之焦距f而言,下述式(4)成立。 1/f=1/A3+1/B3 (4) 於上述式(4)中,A3為A3a與A3b之和。另一方面,B3表示自透鏡32之光學中心32a至攝像元件31之中點之像素31P3為止之距離。 於透鏡32之焦距f為110 mm以上之情形時,透鏡32之視角較狹窄,故為使檢查面61中之攝像範圍61A充分地變大,A3較佳為800 mm以上。 另一方面,根據透明板表面檢查裝置10之小型化之觀點,A3較佳為1500 mm以下。於A3為1500 mm以下之情形時,為使檢查面61中之攝像範圍61A充分地變大,透鏡32之焦距f較佳為225 mm以下。 且說,線感測器相機30係將於被表側之主表面61反射後之前方所觀測之條紋圖案22之像、與於被背側之主表面62反射後之前方所觀測之條紋圖案22之像重合地進行攝像。 於被表側之主表面61反射後之前方觀測之條紋圖案22之像係亮部與暗部之對比率高於在被背側之主表面62反射後之前方觀測之條紋圖案22之像。 該等像較佳為暗部彼此(或亮部彼此)不重合,以使容易分離。傾斜角θ1及傾斜角θ2較佳為35°以上55°以下,以避免暗部彼此(或亮部彼此)重合。 再者,如上所述,2個像係亮部與暗部之對比率不同,故即便2個像之暗部彼此(或亮部彼此)重合之情形時,亦可將2個像分離。 透明板表面檢查裝置10係於圖1中檢查表側之主表面61之表面形狀,但亦可如圖7所示地檢查背側之主表面62(以下,亦稱為「檢查面62」)之表面形狀。再者,透明板表面檢查裝置10亦可檢查兩主表面61、62之表面形狀。 透明板表面檢查裝置10於檢查背側之檢查面62之表面形狀之情形時,於「S1/S2」、「f」、「A3」等之說明中,將「檢查面61」替換為「檢查面62」即可。此處,「S1/S2」等係考慮到透明板60與空氣之交界處之光之折射而進行運算。再者,因透明板60之板厚充分小,故若對於表側之檢查面61而言,上述條件(例如S1/S2為0.20以上)成立,則對於背側之檢查面62而言,上述條件亦基本上成立。 再者,於本實施形態中,如圖2所示,於俯視下,於同一直線上配置有攝像元件31、透明板60之檢查面61中之攝像範圍61A、及光源20之條紋圖案22中之攝像範圍22A,但本發明不僅限於此。如圖8所示,於俯視下,攝像元件31、透明板60之檢查面61中之攝像範圍61A、及光源20之條紋圖案22中之攝像範圍22A亦可扭轉而不排列於直線上地配置。而且,亦可一邊搬送透明板60一邊檢查表面形狀。 而且,可將利用上述透明板表面檢查方法之檢查步驟適用於至少包含自熔融玻璃成形為板狀玻璃之步驟、及將板狀之玻璃切斷而切取玻璃板之步驟之玻璃板之製造方法。可藉由經由利用透明板表面檢查方法之檢查步驟,而確實地獲得預期之表面形狀之玻璃板。 [實施例] 以下,藉由實施例及比較例對本發明詳細地進行說明,但本發明並非限定於下述實施例。試驗例1為實施例,且試驗例2為比較例。 [試驗例1] 於試驗例1中,利用圖1等所示之透明板表面檢查裝置,檢查玻璃板之表側之主表面(以下,亦簡稱為「檢查面」)。玻璃板之檢查面係藉由預先研磨而無限地接近理想平面。而且,檢查面上之攝像範圍之左端P1(參照圖1)與右端P2(參照圖1)之距離L(參照圖1)設為250 mm。線感測器相機之像素數設為7450。 首先,利用設置於來自光源之光被檢查面反射後之前方之線感測器相機拍攝光源之條紋圖案,且藉由將所拍攝之圖像進行圖像處理而運算檢查面之形狀。運算形狀之範圍係設為(1)自左端P1起30 mm以內之部分(以下,亦稱為「左側之檢查部分」)、及(2)自右端P2起30 mm以內之部分(以下,亦稱為「右側之檢查部分」)之兩者。如此一來,獲得各檢查部分之與理想平面之偏移(高低差)之原始資料。不改變攝像範圍地將該操作反覆進行250次,藉此,獲得對於每一檢查部分之250次數之原始資料。 繼而,使用視窗函數,將250次數之原始資料進行迴旋積分,擷取(A)以波長10 mm為中心之週期帶之頻率成分(以下,亦稱為「第1頻率成分」)、及(B)以波長5 mm為中心之週期帶之頻率成分(以下,亦稱為「第2頻率成分」)。作為視窗函數,使用高斯視窗。如此一來,對於各檢查部分中之中央部分,運算各頻率成分之標準偏差,且將運算所得之標準偏差作為評價值。此處,各檢查部分之中央部分之左右長度設為5 mm。於運算標準偏差時,僅使用各檢查部分之中央部分之原因在於在獲得充分小之範圍內獲得評價值,且於迴旋積分之計算時將端部假設地摺疊。 再者,推定玻璃板中存在長週期成分與短週期成分之波動,將以波長10 mm為中心之第1頻率成分設為長週期成分,且將以波長5 mm為中心之第2頻率成分設為短週期成分進行評價。 [試驗例2] 於試驗例2中,除了以「S3」大致相同且「S1/S2」不同之方式,變更「f」、光圈、「A3」、「A3b」等以外,以與試驗例1相同之方式,檢查玻璃板之表側之主表面,求出評價值。 [總結] 將試驗條件及試驗結果示於表1中。於表1中,「FC1L」係表示左側之檢查部分之中央部分中之第1頻率成分之標準偏差,「FC2L」係表示左側之檢查部分之中央部分中之第2頻率成分之標準偏差,「FC1R」係表示右側之檢查部分之中央部分中之第1頻率成分之標準偏差,「FC2R」係表示右側之檢查部分之中央部分中之第2頻率成分之標準偏差。 [表1]
10‧‧‧透明板表面檢查裝置
20‧‧‧光源
21‧‧‧光源本體
22‧‧‧條紋圖案
22A‧‧‧攝像範圍
22P1、22P2、22P3‧‧‧條紋圖案上之一點
30‧‧‧線感測器相機
31‧‧‧攝像元件
31P1、31P2、31P3‧‧‧像素
32‧‧‧透鏡
32a‧‧‧光學中心
32b‧‧‧光軸
50‧‧‧圖像處理裝置
51‧‧‧CPU(Central Processing Unit,中央處理單元)
52‧‧‧記憶媒體
60‧‧‧透明板
61‧‧‧表側之主表面(檢查面)
61A‧‧‧攝像範圍
62‧‧‧背側之主表面(檢查面)
A1a、A2a、A3a、A1b、A2b、A3b、B3‧‧‧距離
L‧‧‧左端P1與右端P2之距離
OP‧‧‧光軸正交面
P1、P2、P3‧‧‧攝像點之中心
θ1、θ2‧‧‧傾斜角10‧‧‧Transparent board surface inspection device
20‧‧‧Light source
21‧‧‧Light source body
22‧‧‧ striped pattern
22A‧‧‧Photo range
22P1, 22P2, 22P3‧‧‧ one point on the stripe pattern
30‧‧‧ line sensor camera
31‧‧‧Photographic components
31P1, 31P2, 31P3‧‧ ‧ pixels
32‧‧‧ lens
32a‧‧ Optical Center
32b‧‧‧ optical axis
50‧‧‧Image processing device
51‧‧‧CPU (Central Processing Unit)
52‧‧‧Memory Media
60‧‧‧Transparent board
61‧‧‧Main surface of the front side (inspection surface)
61A‧‧·Scope of photography
62‧‧‧Main surface of the back side (inspection surface)
Distances A1a, A2a, A3a, A1b, A2b, A3b, B3‧‧
Distance between L‧‧‧ left end P1 and right end P2
OP‧‧‧Axis orthogonal plane
P1, P2, P3‧‧‧ Center of camera point θ1, θ2‧‧‧ tilt angle
圖1係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之剖視圖,且係沿著圖2之I-I所得之剖視圖。 圖2係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。 圖3係表示利用一實施形態之線感測器相機所拍攝之圖像之亮度分佈中之由透明板之表側之主表面反射而成之條紋圖案之像之亮度分佈之圖。 圖4係由一實施形態之攝像元件之一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖5係由一實施形態之攝像元件之另一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖6係由一實施形態之攝像元件之中點之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖7係一實施形態之透明板表面之檢查裝置檢查透明板之背側之主表面時之剖視圖。 圖8係變化例之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。Fig. 1 is a cross-sectional view showing the main surface of the front side of the transparent plate of the transparent plate surface inspection apparatus of the embodiment, taken along the line I-I of Fig. 2. Fig. 2 is a plan view showing the main surface of the front side of the transparent plate of the transparent plate surface inspection device of the embodiment. Fig. 3 is a view showing a luminance distribution of an image of a stripe pattern reflected by a main surface of a front side of a transparent plate in a luminance distribution of an image captured by a line sensor camera according to an embodiment. Fig. 4 is an explanatory view showing an area of an imaging point on an inspection surface taken by a pixel at one end of an imaging element of an embodiment. Fig. 5 is an explanatory view showing an area of an imaging point on an inspection surface taken by a pixel at the other end of the imaging element of the embodiment. Fig. 6 is an explanatory view showing an area of an imaging point on an inspection surface taken by a pixel of a dot among the imaging elements of the embodiment. Fig. 7 is a cross-sectional view showing the inspection apparatus for the surface of the transparent plate of the embodiment inspecting the main surface of the back side of the transparent plate. Fig. 8 is a plan view showing a state in which the main surface of the front side of the transparent plate is inspected by the transparent plate surface inspection device of the modification.
10‧‧‧透明板表面檢查裝置 10‧‧‧Transparent board surface inspection device
20‧‧‧光源 20‧‧‧Light source
21‧‧‧光源本體 21‧‧‧Light source body
22‧‧‧條紋圖案 22‧‧‧ striped pattern
22P1、22P2、22P3‧‧‧條紋圖案上之一點 22P1, 22P2, 22P3‧‧‧ one point on the stripe pattern
30‧‧‧線感測器相機 30‧‧‧ line sensor camera
31‧‧‧攝像元件 31‧‧‧Photographic components
31P1、31P2、31P3‧‧‧像素 31P1, 31P2, 31P3‧‧ ‧ pixels
32‧‧‧透鏡 32‧‧‧ lens
32a‧‧‧光學中心 32a‧‧ Optical Center
32b‧‧‧光軸 32b‧‧‧ optical axis
50‧‧‧圖像處理裝置 50‧‧‧Image processing device
51‧‧‧CPU(Central Processing Unit,中央處理單元) 51‧‧‧CPU (Central Processing Unit)
52‧‧‧記憶媒體 52‧‧‧Memory Media
60‧‧‧透明板 60‧‧‧Transparent board
61‧‧‧表側之主表面(檢查面) 61‧‧‧Main surface of the front side (inspection surface)
62‧‧‧背側之主表面(檢查面) 62‧‧‧Main surface of the back side (inspection surface)
A1a、A2a、A3a、A1b、A2b、A3b、B3‧‧‧距離 Distances A1a, A2a, A3a, A1b, A2b, A3b, B3‧‧
L‧‧‧左端P1與右端P2之距離 Distance between L‧‧‧ left end P1 and right end P2
P1、P2、P3‧‧‧攝像點之中心 P1, P2, P3‧‧‧ Center of camera
θ1、θ2‧‧‧傾斜角 Θ1, θ2‧‧‧ tilt angle
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