TW201614370A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
TW201614370A
TW201614370A TW104129238A TW104129238A TW201614370A TW 201614370 A TW201614370 A TW 201614370A TW 104129238 A TW104129238 A TW 104129238A TW 104129238 A TW104129238 A TW 104129238A TW 201614370 A TW201614370 A TW 201614370A
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
oxidant agent
composition
property
Prior art date
Application number
TW104129238A
Other languages
Chinese (zh)
Other versions
TWI665517B (en
Inventor
Hyun-Jung Wang
Ju-Ho Kim
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201614370A publication Critical patent/TW201614370A/en
Application granted granted Critical
Publication of TWI665517B publication Critical patent/TWI665517B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • C09B67/0041—Blends of pigments; Mixtured crystals; Solid solutions mixtures containing one azo dye
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Luminescent Compositions (AREA)
  • Optical Filters (AREA)

Abstract

This invention relates to a photosensitive resin composition and more particularly to a photosensitive resin composition which comprises photoluminescent quantum point particles, photopolymerizable compound, photopolymerization initiator, alkaline-soluble resin, solvent, and an anti-oxidant agent. The anti-oxidant agent accounts for 0.1-10 wt% of the total solid weight in the composition, thereby increasing the quantum efficiency without reducing illumination properties and capable of manufacturing color filters with improved pattern formation property and illumination property.
TW104129238A 2014-10-14 2015-09-03 Photosensitive resin composition TWI665517B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140138601A KR101856615B1 (en) 2014-10-14 2014-10-14 Photosensitive resin composition
??10-2014-0138601 2014-10-14

Publications (2)

Publication Number Publication Date
TW201614370A true TW201614370A (en) 2016-04-16
TWI665517B TWI665517B (en) 2019-07-11

Family

ID=55719307

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104129238A TWI665517B (en) 2014-10-14 2015-09-03 Photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP6768278B2 (en)
KR (1) KR101856615B1 (en)
CN (1) CN105511226B (en)
TW (1) TWI665517B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101996102B1 (en) * 2014-12-02 2019-07-03 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
WO2016194351A1 (en) * 2015-05-29 2016-12-08 富士フイルム株式会社 Wavelength conversion member and backlight unit provided with same, and liquid crystal display device
JP6653622B2 (en) * 2015-06-10 2020-02-26 富士フイルム株式会社 Wavelength conversion member, backlight unit, liquid crystal display, and quantum dot-containing polymerizable composition
JP6772494B2 (en) * 2016-03-16 2020-10-21 大日本印刷株式会社 Light wavelength conversion composition, light wavelength conversion member, light wavelength conversion sheet, backlight device, and image display device
TWI806827B (en) * 2016-05-27 2023-07-01 美商羅門哈斯電子材料有限公司 Rheology modifiers for encapsulating quantum dots
KR102529779B1 (en) * 2016-08-19 2023-05-08 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter, and image display apparatus comprising the same
KR102028968B1 (en) * 2016-10-20 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device produced using the same
KR102511820B1 (en) * 2016-11-15 2023-03-17 동우 화인켐 주식회사 Photosensitive Resin Composition and Color Filter Using the Same
KR102028969B1 (en) * 2016-11-15 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
JP6695369B2 (en) * 2017-02-16 2020-05-20 住友化学株式会社 Curable resin composition, cured film and display device
TWI753119B (en) * 2017-03-17 2022-01-21 南韓商東友精細化工有限公司 Quantum dot having organic ligand and use thereof
CN108089370A (en) * 2017-11-24 2018-05-29 宁波东旭成新材料科技有限公司 A kind of preparation method of the quantum dot film of no barrier
JP7030276B2 (en) * 2017-12-26 2022-03-07 東洋インキＳｃホールディングス株式会社 Semiconductor fine particle compositions and quantum dots, coating liquids and ink compositions containing them, inkjet inks, and coatings and printed materials using them, wavelength conversion films, color filters, light emitting elements
KR102237547B1 (en) * 2018-03-21 2021-04-07 동우 화인켐 주식회사 A light converting resin composition, a light converting laminated substrate and a display device using the same
JP7193306B2 (en) 2018-10-31 2022-12-20 住友化学株式会社 Curable composition, film, laminate and display device
JP2022524417A (en) * 2019-03-12 2022-05-02 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング Composition
CN113248953B (en) * 2020-02-12 2023-02-21 东友精细化工有限公司 Photoconversion curable composition, cured film, quantum dot light-emitting diode, and image display device
WO2021215254A1 (en) * 2020-04-24 2021-10-28 Dic株式会社 Ink composition for photoconversion layer formation, photoconversion layer, and color filter
TWI808324B (en) 2020-05-21 2023-07-11 新應材股份有限公司 Resin composition, light conversion layer and light emitting device
CN113703284A (en) * 2020-05-21 2021-11-26 新应材股份有限公司 Resin composition, light conversion layer, and light emitting device
KR20220093953A (en) 2020-12-28 2022-07-05 삼성전자주식회사 Core shell quantum dot and electronic device including the same
WO2023215153A1 (en) * 2022-05-02 2023-11-09 Applied Materials, Inc. Photoluminescent materials with phosphorous additives to reduce photodegradation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100697511B1 (en) * 2003-10-21 2007-03-20 삼성전자주식회사 Photocurable Semiconductor Nanocrystal, Photocurable Composition for Pattern Formation of Semiconductor Nanocrystal and Method of Patterning Nanocrystal using the same
US7192795B2 (en) * 2004-11-18 2007-03-20 3M Innovative Properties Company Method of making light emitting device with silicon-containing encapsulant
EP1864991A1 (en) * 2005-03-28 2007-12-12 Idemitsu Kosan Co., Ltd. Organic ligands for semiconductor nanocrystals
EP1949459A4 (en) * 2005-10-24 2014-04-30 3M Innovative Properties Co Method of making light emitting device having a molded encapsulant
US8008388B2 (en) * 2005-12-14 2011-08-30 Ferro Corporation Weatherable glass fiber reinforced polyolefin composition
EP2082436B1 (en) * 2006-10-12 2019-08-28 Cambrios Film Solutions Corporation Nanowire-based transparent conductors and method of making them
KR101376755B1 (en) * 2007-10-09 2014-03-24 삼성디스플레이 주식회사 Display Device
WO2011085150A1 (en) * 2010-01-11 2011-07-14 Isp Investments Inc. Reactive monomer for coating and/or reactive coating
JP2013134321A (en) * 2011-12-26 2013-07-08 Toyo Ink Sc Holdings Co Ltd Photosensitive colored composition and color filter
TWI463257B (en) * 2012-11-23 2014-12-01 Chi Mei Corp Photosensitive resin composition for color filters and uses thereof
CN103146262B (en) * 2012-12-12 2016-08-03 京东方科技集团股份有限公司 Quantum dot purposes in dispersible pigment dispersion and a kind of dispersible pigment dispersion and its preparation method
CN103408984A (en) * 2013-08-22 2013-11-27 广东普加福光电科技有限公司 Optical coating composition, fluorescent optical membrane and preparation method thereof
JP6299546B2 (en) * 2014-09-25 2018-03-28 Jsr株式会社 Curable resin composition, cured film, wavelength conversion film, light emitting element, and method for forming light emitting layer

Also Published As

Publication number Publication date
JP6768278B2 (en) 2020-10-14
CN105511226B (en) 2021-04-20
KR20160043860A (en) 2016-04-22
JP2016081055A (en) 2016-05-16
TWI665517B (en) 2019-07-11
KR101856615B1 (en) 2018-05-10
CN105511226A (en) 2016-04-20

Similar Documents

Publication Publication Date Title
TW201614370A (en) Photosensitive resin composition
BR112016023676A2 (en) low pressure sintering powder
MX2022015755A (en) Pth prodrugs.
MX2020006957A (en) Modified release composition comprising a cannabinoid.
CR20160418A (en) NEW BICYCLE COMPOUNDS OF 7 LINKS
EP3095778A4 (en) Novel -oximester fluorene compound, a photopolymerization initiator comprising same, and photoresist composition
EA201690781A1 (en) METHOD OF FORMING A DECORATIVE WEAR RESISTANT LAYER
UY35262A (en) PROCESS FOR THE PREPARATION OF OXIRANS AND SUBSTITUTED TRIAZOLS
IL261046A (en) Substituted 1,2,3-triazoles as nr2b-selective nmda modulators
TW201612627A (en) Photosensitive resin composition
PH12017500555A1 (en) Modified phosphpors and compositions thereof
MA39883A (en) Individualised inorganic particles
IN2014DN10108A (en)
BR112017021126A2 (en) activated lignin composition, method for its production and use
SG11202008346PA (en) Nanoparticle compositions
BR112015023291A2 (en) method for preparing a water based composition and a water based composition
BR112017003581A2 (en) oxidation resistant natural rubber and a method for its production
NI201700036A (en) STABILIZED DERIVATIVES OF ADRENOMEDULIN AND THE USE OF THEM.
EP3758490A4 (en) Nanoparticle compositions
WO2015171738A3 (en) Fragrance compositions
BR112016028922A8 (en) composition in the form of compacted particles and use of it
IN2015MN00064A (en)
PH12015501281A1 (en) Use of methyl mercapto-esters as chain transfer agents
PH12017500005A1 (en) Tricyclic triazolic compounds
AR095550A1 (en) METHODS TO REDUCE THE SOLUBILITY OF PHENOLIC RESINS USING LATENT ACIDS