TW201519048A - 圖案形成方法及使用該方法之觸控面板的製造方法 - Google Patents

圖案形成方法及使用該方法之觸控面板的製造方法 Download PDF

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Publication number
TW201519048A
TW201519048A TW103130985A TW103130985A TW201519048A TW 201519048 A TW201519048 A TW 201519048A TW 103130985 A TW103130985 A TW 103130985A TW 103130985 A TW103130985 A TW 103130985A TW 201519048 A TW201519048 A TW 201519048A
Authority
TW
Taiwan
Prior art keywords
pattern
film
mask
sputtering
mask sheet
Prior art date
Application number
TW103130985A
Other languages
English (en)
Chinese (zh)
Inventor
Michinobu Mizumura
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW201519048A publication Critical patent/TW201519048A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Position Input By Displaying (AREA)
  • Physical Vapour Deposition (AREA)
TW103130985A 2013-09-09 2014-09-09 圖案形成方法及使用該方法之觸控面板的製造方法 TW201519048A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013186256A JP2015052156A (ja) 2013-09-09 2013-09-09 パターン形成方法及びこの方法を用いたタッチパネルの製造方法

Publications (1)

Publication Number Publication Date
TW201519048A true TW201519048A (zh) 2015-05-16

Family

ID=52628552

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103130985A TW201519048A (zh) 2013-09-09 2014-09-09 圖案形成方法及使用該方法之觸控面板的製造方法

Country Status (5)

Country Link
JP (1) JP2015052156A (ko)
KR (1) KR20160053908A (ko)
CN (1) CN105531393A (ko)
TW (1) TW201519048A (ko)
WO (1) WO2015034095A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101748826B1 (ko) * 2015-07-16 2017-07-04 이민수 터치패널 및 그 터치패널 생성방법
CN109445632A (zh) * 2018-10-24 2019-03-08 信利光电股份有限公司 一种金属网格触摸屏制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006077276A (ja) * 2004-09-08 2006-03-23 Seiko Epson Corp マスク、マスクの製造方法、薄膜パターンの形成方法、電気光学装置の製造方法
KR100708654B1 (ko) * 2004-11-18 2007-04-18 삼성에스디아이 주식회사 마스크 조립체 및 이를 이용한 마스크 프레임 조립체
JP5410377B2 (ja) * 2010-07-15 2014-02-05 株式会社ディスコ マスクセット
JP2012111985A (ja) * 2010-11-22 2012-06-14 Toppan Printing Co Ltd 蒸着マスクおよびそれを用いた薄膜パターン形成方法

Also Published As

Publication number Publication date
WO2015034095A1 (ja) 2015-03-12
CN105531393A (zh) 2016-04-27
KR20160053908A (ko) 2016-05-13
JP2015052156A (ja) 2015-03-19

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