TW201416401A - Coated nano-particle catalytically active composite inks - Google Patents

Coated nano-particle catalytically active composite inks Download PDF

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TW201416401A
TW201416401A TW101141719A TW101141719A TW201416401A TW 201416401 A TW201416401 A TW 201416401A TW 101141719 A TW101141719 A TW 101141719A TW 101141719 A TW101141719 A TW 101141719A TW 201416401 A TW201416401 A TW 201416401A
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pattern
ink
acrylate
substrate
printed
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TW101141719A
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Chinese (zh)
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Robert Petcavich
Danliang Jin
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Unipixel Displays Inc
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks

Abstract

Touch sensor circuits are used in touch screens for displays and graphical interfaces and may be, for example, resistive or capacitive touch sensor circuits. The touch sensor circuits may be manufactured using at least one catalytically active printable ink that may contain a plurality of radiation-curable binders, a plurality of coated electrically conductive nanoparticles, and may contain photo-initiators. The plurality of nanoparticles are coated by one of surfactants, polymers, or carbon. The ink is formulated to be used in a printing, process such as a flexographic printing process to print complicated geometries for microscopic patterns, particularly high resolution conductive patterns.

Description

經塗佈之奈米粒子催化活性複合墨水 Coated nanoparticle catalytically active composite ink

如用於LCD或其他顯示螢幕之觸控螢幕技術包括電阻性觸控感應器組態與電容性觸控感應器組態二者。此等感測器可藉由裝配導電材料之圖案來形成導電柵極而製造。 Touch screen technologies such as those used in LCDs or other display screens include both resistive touch sensor configurations and capacitive touch sensor configurations. These sensors can be fabricated by assembling a pattern of conductive material to form a conductive gate.

在一實施例中，一種催化活性可印刷墨水包括複數個輻射可固化黏合劑、複數個經塗佈之導電奈米粒子，其中複數個奈米粒子由界面活性劑、聚合物或碳中之一者塗佈，且其中墨水在25℃下具有500 cps至10000 cps之黏度。 In one embodiment, a catalytically active printable ink comprises a plurality of radiation curable adhesives, a plurality of coated conductive nanoparticles, wherein the plurality of nanoparticles are one of a surfactant, a polymer or carbon. The coating is applied, and wherein the ink has a viscosity of from 500 cps to 10000 cps at 25 °C.

在一替代實施例中，一種製造觸控螢幕感測器之方法包括：製備墨水，其中製備墨水包括兩種黏合劑及複數個經碳塗佈之導電奈米粒子；使用第一母版及墨水，藉由柔版印刷製程在一基板之第一側面上印刷第一圖案，其中該第一圖案包含第一複數條線條及第一尾部；固化該基板；及電鍍第一圖案。該實施例更包括：使用第二母版及墨水，藉由柔版印刷製程在以下中之一者上印刷第二圖案：第二基板、第一基板之第一側面或第一基板之第二側面，其中該第二圖案包括複數個線條，其中第二圖案包括第二複數 個線條及第二尾部；固化基板；電鍍第二圖案；及裝配第一圖案及第二圖案以形成觸控感應器。 In an alternate embodiment, a method of fabricating a touch screen sensor includes: preparing an ink, wherein preparing the ink comprises two adhesives and a plurality of carbon coated conductive nano particles; using the first master and ink And printing a first pattern on a first side of the substrate by a flexographic printing process, wherein the first pattern comprises a first plurality of lines and a first tail; curing the substrate; and plating the first pattern. The embodiment further includes: printing a second pattern on one of: a second substrate, a first side of the first substrate, or a second side of the first substrate by using a second master and ink a side surface, wherein the second pattern comprises a plurality of lines, wherein the second pattern comprises a second plurality a line and a second tail; a cured substrate; a second pattern is plated; and the first pattern and the second pattern are assembled to form a touch sensor.

在一替代實施例中，一種用於在基板上柔版印刷複數個線條之系統包括：複數個清潔站；第一印刷模組，其包括第一母版、第一墨水及第一轉移輥，其中該墨水包含複數個黏合劑及複數個經塗佈之奈米粒子；第一固化站；第二印刷模組，其包括第二母版、第二墨水及第二轉移輥；第二固化站；及電鍍站。 In an alternate embodiment, a system for flexographically printing a plurality of lines on a substrate includes: a plurality of cleaning stations; a first printing module including a first master, a first ink, and a first transfer roller, Wherein the ink comprises a plurality of binders and a plurality of coated nano particles; a first curing station; a second printing module comprising a second master, a second ink and a second transfer roller; and a second curing station ; and plating station.

以下討論針對本發明之各種實施例。儘管此等實施例中之一或多個可係較佳的，但所揭示之實施例不應解釋為或另外用作限制包括申請專利範圍之本揭露內容的範疇。另外，熟習該項技術者將瞭解以下描述具有廣泛應用，且任何實施例之討論僅意謂對該實施例之示範，且不意欲暗示：包括申請專利範圍之本揭露內容之範疇受限於該實施例。 The following discussion is directed to various embodiments of the invention. Although one or more of these embodiments may be preferred, the disclosed embodiments are not to be construed as limiting or limiting the scope of the disclosure. In addition, those skilled in the art will understand that the following description has broad application, and the discussion of any embodiment is merely intended to be an exemplification of the embodiment, and is not intended to suggest that the scope of the disclosure including the scope of the patent application is limited to Example.

觸控螢幕技術可包括不同觸控感應器組態，該等組態包括電容性觸控感應器及電阻性觸控感應器。電阻性觸控感應器包含彼此相對、中間具有間隙之若干層，該等間隙於製造製程期間形成之間隔物保持。電阻性觸控螢幕面板可由若干層組成，該等層包括可由間隔物產生之間隙分開的兩個薄金屬導電層。當諸如針突、手掌或手指之物體在面板外表面上之一點處按下時，該等兩個金屬層接觸且形成引起電流改變之連接。此觸碰事件被發送至控制器以用 於進一步處理。 Touch screen technology can include different touch sensor configurations, including capacitive touch sensors and resistive touch sensors. The resistive touch sensor includes a plurality of layers that are opposite each other with a gap therebetween, the gaps being maintained by spacers formed during the manufacturing process. The resistive touch screen panel can be composed of several layers comprising two thin metal conductive layers that can be separated by gaps created by the spacers. When an object such as a needle protrusion, a palm or a finger is pressed at a point on the outer surface of the panel, the two metal layers contact and form a connection that causes a change in current. This touch event is sent to the controller for use For further processing.

電容性觸控感應器可用於具有觸控敏感性特徵之電子裝置。此等電子裝置可包括顯示器裝置，諸如計算裝置、電腦顯示器或可攜式媒體播放機。顯示器裝置可包括電視、監視器及投影機，該等裝置可適於顯示影像，包括文本、圖形、視訊影像、靜止影像或演示。可用於此等顯示器裝置之影像裝置可包括陰極射線管(CRT)、投影機、平板液晶顯示器(LCD)、LED系統、OLED系統、電漿系統、電場發光顯示器(ELD)及場發射顯示器(FED)。隨著觸控螢幕裝置普及性增加，製造商可尋求採用將保證品質同時降低製造成本且簡化製造製程之方法。觸控螢幕之光學效能可藉由減少光學干擾而得以改良，該光學干擾例如由光刻製程形成之規則導電圖案所產生的波紋效應(moiré effect)。本文揭示在高容量輥至輥製造製程中製作柔性及光學相容性觸控感應器的系統及方法，在製造製程中，微導電特徵可以單程產生。 Capacitive touch sensors can be used in electronic devices with touch sensitive features. Such electronic devices may include display devices such as computing devices, computer displays, or portable media players. Display devices can include televisions, monitors, and projectors that can be adapted to display images, including text, graphics, video images, still images, or presentations. Imaging devices that can be used with such display devices can include cathode ray tubes (CRTs), projectors, flat panel liquid crystal displays (LCDs), LED systems, OLED systems, plasma systems, electric field illumination displays (ELDs), and field emission displays (FED). ). As the popularity of touch screen devices increases, manufacturers can seek ways to simplify manufacturing processes while maintaining quality while reducing manufacturing costs. The optical performance of the touch screen can be improved by reducing optical interference, such as the moiré effect produced by a regular conductive pattern formed by a photolithographic process. Disclosed herein are systems and methods for making flexible and optically compatible touch sensors in a high volume roll-to-roll manufacturing process in which micro-conductive features can be produced in a single pass.

可用於顯示螢幕之兩種類型投射電容性技術(PCT)係可使用互電容或者自電容之技術。自電容觸控感應器可包括沿著X軸及Y軸之複數個電極線條。在此實例中，複數個線條中每一者係脈衝調制的，且在複數個線條之任何軸線上的兩個手指產生與在該線條上僅有一個手指的情況相同之結果。在此實施例中，第一手指或針突位置及第二手指或針突位置讀取為一個手指位置。另一位置可稱作「疊影」。 Two types of projected capacitive technology (PCT) that can be used to display screens can use mutual capacitance or self capacitance. The self-capacitive touch sensor can include a plurality of electrode lines along the X-axis and the Y-axis. In this example, each of the plurality of lines is pulse modulated, and two fingers on any of the plurality of lines produce the same result as if there was only one finger on the line. In this embodiment, the first finger or needle position and the second finger or needle position are read as one finger position. Another location can be called "stacking."

與自電容感測器相反，互電容感測器由x-y柵極組成，其中在第一經裝配之基板及第二經裝配之基板或在另一實例中在第一基板(該基板具有印刷於x軸上之一圖案且具有印刷於y軸上之一圖案且接著加以切割及裝配以正交定向該等圖案)之各列及行的每一交叉點處存在電容器。在互電容感測器中，用電壓依次脈衝調制沿著X軸之複數個線條中每一者，且掃描沿著Y軸之複數個線條之電容改變。各節點(其中一節點可包括一x-y交叉點)為個別位址，且觸控之節點的影像藉由量測電壓而建立以判定觸控位置。應注意，節點位於複數個線條之每一交叉點處。在一實施例中，此舉允許多觸控操作，其中可準確地跟蹤多個手指、針突、手掌或其他導電實施體，允許觸控螢幕之多點控制及操控。 In contrast to a self-capacitance sensor, the mutual capacitance sensor consists of an xy gate, wherein in the first assembled substrate and the second assembled substrate or in another example on the first substrate (the substrate has a print on A capacitor is present at each intersection of each of the columns and rows of one of the x-axis patterns and having a pattern printed on the y-axis and then being cut and assembled to orient the patterns orthogonally. In a mutual capacitance sensor, each of a plurality of lines along the X-axis is sequentially pulsed with a voltage, and the capacitance of a plurality of lines along the Y-axis is scanned for change. Each node (one of the nodes may include an x-y intersection) is an individual address, and the image of the touched node is established by measuring the voltage to determine the touch position. It should be noted that the node is located at each intersection of a plurality of lines. In one embodiment, this allows multiple touch operations in which multiple fingers, pinions, palms, or other conductive embodiments can be accurately tracked, allowing for multiple points of control and manipulation of the touch screen.

總之，電容性觸控感應器使用手指中之電子來偵測觸點，故針突或其他實施體將不起作用，而電阻性面板僅需要由一物體按壓，該物體可為手指、手掌或無生命物體。 In short, a capacitive touch sensor uses the electrons in the finger to detect the contact, so the needle protrusion or other embodiment will not work, and the resistive panel only needs to be pressed by an object, which can be a finger, a palm or Inanimate objects.

本文揭示以下之實施例：一種包含墨水之系統，該系統包括經塗佈之奈米粒子及輻射可固化黏合劑系統；及一種方法，該方法使用此類墨水，藉由例如輥至輥製造製程來製作電阻性及電容性柔性觸控感應器電路(FTS)。經塗佈之奈米粒子亦可稱為奈米複合材料且顯示觸變性流動行為，該行為可為印刷寬度小至1微米之精細特徵所需。在以下情況下顯示出觸變性行為：諸如與奈米複合材料一起形成之墨水的流體在正常條件下為黏性的，但當經由搖晃或其他手動或自動攪動製程而攪動時，其黏度可隨著時間 之推移而變低。觸變性可為墨水之所需性質以用於形成精細特徵及錯綜複雜之幾何形狀，因為一旦墨水塗覆至例如柔版印刷製程中之基板上，則墨水再次獲得黏度，以便維持經印刷之圖案結構之完整性。複數個母版可使用選定設計之熱成像來製作，以便在基板上印刷高解析度導電線條。第一圖案可使用第一輥印刷於基板之第一側面上，且第二圖案可使用第二輥印刷於基板之第二側面上。在電鍍製程期間可使用無電電鍍。儘管無電電鍍可比其他方法更耗時，但對較小、複雜或錯綜複雜幾何形狀而言為較佳的。FTS可包括與介電層連通之複數個柔性薄電極。包含電引線之細長尾部可附接至電極，且在與引線電連通中可能存在電連接器。輥至輥製程(roll-to-roll process)係指以下事實：柔性基板加載至第一輥(亦可稱作解捲輥(unwinding roll))以將該基板饋入進行製作製程之系統中，且接著於製程完成時加以卸載至第二輥(亦可稱作捲繞輥(winding roll))。 The following embodiments are disclosed herein: a system comprising an ink comprising coated nanoparticle and a radiation curable adhesive system; and a method of using such ink by a roll to roll manufacturing process To make resistive and capacitive flexible touch sensor circuits (FTS). The coated nanoparticles may also be referred to as nanocomposites and exhibit thixotropic flow behavior which may be required for printing fine features as small as 1 micron in width. Thixotropy behavior is shown in the following cases: fluids such as inks formed with nanocomposites are viscous under normal conditions, but when agitated via shaking or other manual or automatic agitation processes, the viscosity can vary with Time It goes low. Thixotropy can be a desirable property of the ink for forming fine features and intricate geometries, as once the ink is applied to a substrate, such as in a flexographic printing process, the ink again acquires a viscosity to maintain the printed pattern structure. The integrity. A plurality of masters can be fabricated using thermal imaging of a selected design to print high resolution conductive lines on the substrate. The first pattern can be printed on the first side of the substrate using a first roll and the second pattern can be printed on the second side of the substrate using a second roll. Electroless plating can be used during the electroplating process. Although electroless plating can be more time consuming than other methods, it is preferred for smaller, complex or intricate geometries. The FTS can include a plurality of flexible thin electrodes in communication with the dielectric layer. An elongated tail containing electrical leads can be attached to the electrodes, and an electrical connector can be present in electrical communication with the leads. Roll-to-roll process refers to the fact that a flexible substrate is loaded onto a first roll (also referred to as an unwinding roll) to feed the substrate into a system for making a process, And then unloaded to the second roll (also referred to as the winding roll) when the process is complete.

觸控感應器可使用經由已知輥至輥操作方法而轉移之柔性薄基板製造。該基板被轉移至可包括諸如電漿清潔、彈性材料清潔、超音波清潔製程等製程之洗滌系統。洗滌循環可隨後接著物理或化學氣相沈積真空腔室中之薄膜沈積。在此可稱作印刷步驟之薄薄膜沈積步驟中，諸如氧化銦錫(ITO)之透明導電材料沈積於基板之至少一個表面上。 The touch sensor can be fabricated using a flexible thin substrate that is transferred via a known roll-to-roll operation method. The substrate is transferred to a washing system that can include processes such as plasma cleaning, elastomeric cleaning, ultrasonic cleaning processes, and the like. The wash cycle can then be followed by physical or chemical vapor deposition of thin film deposition in the vacuum chamber. In a thin film deposition step, which may be referred to herein as a printing step, a transparent conductive material such as indium tin oxide (ITO) is deposited on at least one surface of the substrate.

在一些實施例中，用於導電線條之適合材料尤其可包括銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、錫(Sn)及鈀(Pd)。視用於電路之材料的電阻率而定，電路可具有不同回應時間及功 率需求。導電材料之所沈積層可具有介於0.005微歐姆/公分與500歐姆/公分之範圍內的電阻，500埃或更小之物理厚度及25微米或更大之寬度。在其他實施例中，所印刷之基板可具有由噴射沈積或濕化學沈積塗覆之防光眩塗層或擴散體表面塗層。基板可由例如可見光、紫外線光或電子束固化。可重複此製程，且可能需要若干積層、蝕刻、印刷及裝配來完成觸控感應器電路。 In some embodiments, suitable materials for the conductive lines may include, inter alia, copper (Cu), silver (Ag), gold (Au), nickel (Ni), tin (Sn), and palladium (Pd). Depending on the resistivity of the material used in the circuit, the circuit can have different response times and functions. Rate demand. The deposited layer of conductive material can have a resistance in the range of 0.005 micro ohms/cm and 500 ohms/cm, a physical thickness of 500 angstroms or less, and a width of 25 microns or more. In other embodiments, the printed substrate can have an anti-glare coating or a diffuser surface coating applied by spray deposition or wet chemical deposition. The substrate can be cured by, for example, visible light, ultraviolet light, or an electron beam. This process can be repeated and may require several layers, etching, printing, and assembly to complete the touch sensor circuitry.

所印刷之圖案可為包括複數個線條之高解析度導電圖案。在一個實施例中，此等線條可為微觀尺寸。印刷圖案之難度可隨著線條尺寸減小及圖案幾何形狀之複雜性的增大而增大。用於印刷各種大小及幾何形狀之特徵之墨水亦可不同，一些墨水組合物可更適於較大、簡單特徵，且一些更適於較小，較錯綜複雜之幾何形狀。 The printed pattern can be a high resolution conductive pattern comprising a plurality of lines. In one embodiment, the lines may be microscopic in size. The difficulty of printing a pattern may increase as the line size decreases and the complexity of the pattern geometry increases. The inks used to print various sizes and geometries may also vary, some ink compositions may be more suitable for larger, simple features, and some are more suitable for smaller, more complex geometries.

在一實施例中，存在用於形成圖案之多個印刷站。此等站可受可於網紋輥上轉移之墨水的量限制。一些實施例中，存在專用站以印刷可跨過多個產品線或應用上運作之某些特徵，在一些情況下，對於每一印刷作業，此等專用站可使用相同墨水，或可係若干產品或產品線之共有標準特徵，該等產品或產品線接著可連續運作而無需改變輥。用於轉移製程之網紋輥或輥之單元體積可視被轉移之墨水的種類而定，在一些實施例中，該單元體積可在0.3 BCM至30 BCM(十億立方微米)之間變動而在其他實施例中，可在9 BCM至20 BCM之間變動。用於印刷所有或部分圖案之墨水之種類可視若干因素而定，包括線條之橫截面形 狀、線條厚度、線條寬度、線條長度、線條連接性及整體圖案幾何形狀。除印刷製程外，至少一個固化製程可在所印刷之基板上執行以便達成所要特徵高度。 In an embodiment, there are a plurality of printing stations for forming a pattern. These stations can be limited by the amount of ink that can be transferred on the anilox roll. In some embodiments, there are dedicated stations to print certain features that can operate across multiple product lines or applications, and in some cases, for each print job, such dedicated stations may use the same ink, or may be a number of products Or a common standard feature of the product line, which can then be operated continuously without changing the rolls. The unit volume of the anilox roll or roll used in the transfer process may depend on the type of ink being transferred, and in some embodiments, the unit volume may vary from 0.3 BCM to 30 BCM (billion cubic microns). In other embodiments, it can vary from 9 BCM to 20 BCM. The type of ink used to print all or part of the pattern may depend on several factors, including the cross-sectional shape of the lines. Shape, line thickness, line width, line length, line connectivity, and overall pattern geometry. In addition to the printing process, at least one curing process can be performed on the printed substrate to achieve the desired feature height.

圖1為柔性版100之實施例的透視圖。在圖1中，存在已記錄於積層光阻劑中之柔性版100。在圖1中，所示之圖案具有蜂巢格結構102。蜂巢結構102包括間隔開而形成槽孔106之壁104。在一個實例中，特定圖案設計之槽孔106可在其槽個中於柔性版上攜帶高達約14微米厚度之墨水(圖中未示)，此可最終以4至7微米之塗佈厚度結束。以下詳細描述之墨水包含複數種輻射可固化黏合劑、充當催化晶種之經塗佈之奈米粒子，且在一些實施例中包含光起始劑。 1 is a perspective view of an embodiment of a flexographic plate 100. In Figure 1, there is a flexographic plate 100 that has been recorded in a layered photoresist. In FIG. 1, the illustrated pattern has a honeycomb lattice structure 102. Honeycomb structure 102 includes walls 104 that are spaced apart to form slots 106. In one example, the particular pattern design slot 106 can carry ink up to about 14 microns thick (not shown) on the flexographic plate in its slot, which can end up with a coating thickness of 4 to 7 microns. . The inks described in detail below comprise a plurality of radiation curable binders, coated nanoparticles that act as catalytic seeds, and in some embodiments, a photoinitiator.

在柔版印刷製程期間，蜂巢格結構102可用於收集槽孔106中之墨水且將欲被轉移至基板之墨水保持於槽孔106中。來自柔性版100之蜂巢特徵之壁104的墨水未被壓印在蜂巢圖案中之基板上。實情為，墨水自槽孔106流至基板上，在基板上形成均質塗層，亦即蜂巢結構起轉移墨水之作用。在其他實施例中(圖中未示)，可使用不同於蜂巢幾何形狀之結構替代蜂巢結構，或除蜂巢幾何形狀之外可使用不同於蜂巢幾何形狀之結構，其中其他表面幾何形狀為彼等諸如菱形、圓形、鋸齒形或適於均勻轉移墨水之其他幾何形狀。然而，平坦、未圖案化之柔性版可能不能攜帶與具有蜂巢格結構之柔性版同樣多之墨水，故在實施例中，對於所要防光眩性質，較厚塗層係較佳的。 During the flexographic printing process, the honeycomb grid structure 102 can be used to collect ink in the slots 106 and retain ink to be transferred to the substrate in the slots 106. The ink from the wall 104 of the honeycomb features of the flexographic plate 100 is not embossed on the substrate in the honeycomb pattern. Actually, the ink flows from the slot 106 to the substrate, and a homogeneous coating is formed on the substrate, that is, the honeycomb structure functions to transfer the ink. In other embodiments (not shown), the honeycomb structure may be replaced with a structure other than the honeycomb geometry, or a structure other than the honeycomb geometry may be used in addition to the honeycomb geometry, wherein the other surface geometries are Such as diamonds, circles, zigzags or other geometric shapes suitable for evenly transferring ink. However, a flat, unpatterned flexographic plate may not carry as much ink as a flexographic plate having a honeycomb lattice structure, so in embodiments, a thicker coating is preferred for the desired anti-glare properties.

墨水製備 Ink preparation

用於柔版製程之墨水可為基於水的、基於溶劑的或UV固化的墨水。用於柔版製程之墨水的種類可視例如待印刷之基板之種類、印刷圖案之複雜性或多種因素之組合而定。較佳而言，墨水用以下方式製備：可將墨水自墨水盤或者墨水計量系統準確地轉移至柔性版，且接著以一致之體積自柔性版轉移至目標基板。應製備墨水以便其對基板具有良好黏著性且可在高印刷速度下立即固化，該高印刷速度例如750呎/分鐘(fpm)。基板可由聚對苯二甲酸乙二酯(PET)、聚甲基丙烯酸甲酯(PMMA)、紙張或其他適合材料組成。較佳而言，經印刷之結構將對基板具有良好黏著性，且係堅固的，諸如抗劃傷的，以便於日常操作。經印刷之結構可為複數個線條，其中術語線條用於描述由複數個線條中之一或多個線條產生之幾何形狀特徵。 The ink used in the flexographic process can be water based, solvent based or UV cured ink. The type of ink used in the flexographic process may depend, for example, on the type of substrate to be printed, the complexity of the printed pattern, or a combination of factors. Preferably, the ink is prepared by accurately transferring the ink from the ink tray or ink metering system to the flexographic plate and then transferring it from the flexographic plate to the target substrate in a consistent volume. The ink should be prepared so that it has good adhesion to the substrate and can be cured immediately at high printing speeds, such as 750 Å/min (fpm). The substrate may be composed of polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), paper or other suitable material. Preferably, the printed structure will have good adhesion to the substrate and be strong, such as scratch resistant, for ease of day-to-day operation. The printed structure can be a plurality of lines, wherein the term line is used to describe geometric features produced by one or more of the plurality of lines.

本文揭示之墨水係UV可固化墨水，該墨水不具有溶劑組分，但包含複數種輻射可固化黏合劑及經塗佈之奈米粒子，且在一些實施例中包含光起始劑。輻射可固化組合物具有對經塗佈之奈米粒子之相容性而在完全分散之後無粒子聚集。經塗佈之奈米粒子可維持均質分佈而在儲存及操作期間無沈降。奈米粒子上之塗層可包含分散促進層，諸如界面活性劑、聚合物及碳。經塗佈之奈米粒子受到保護以免可能歸因於經塗佈之奈米粒子之高表面能而氧化。經塗佈之奈米粒子上之分散加強層加強經塗佈之奈米粒子於輻射可固化樹脂中之相容性及分佈，進而在短期及長期儲 存及使用分散液中不發生聚集現象。可能不需要諸如鈀化合物之無電觸媒。習知而言，催化粒子可不與高分子黏合劑相容，然而，本文揭示之經塗佈之奈米粒子與如下揭示之聚合物相容，且可在與如下揭示之聚合物混合中均質化。此等經塗佈之奈米粒子或奈米粒子為輻射可固化組合物，其經設計用於高速印刷，且當在諸如柔版印刷製程之印刷製程中使用時，用以維持所印刷特徵之高精度水準。使用如本文所揭示之墨水組合物能夠以小至1微米之寬度印刷線條。諸如基板之經印刷之材料可在無任何溶劑條件下得以印刷，此意謂整個製造製程可不需要額外溶劑移除步驟。如下所討論，觸變性性質得以達成。由於經塗佈之奈米粒子充當用於電鍍製程之晶種，所以在無電電鍍製程之前，可能需要活化後處理之墨水中不存在觸媒。另外，使用墨水印刷之墨水圖案可在室溫下電鍍，該墨水包含複數種黏合劑及複數個經塗佈之奈米粒子。 The inks disclosed herein are UV curable inks that do not have a solvent component but comprise a plurality of radiation curable binders and coated nanoparticles, and in some embodiments, a photoinitiator. The radiation curable composition has compatibility with the coated nanoparticles without particle agglomeration after complete dispersion. The coated nanoparticles can maintain a homogeneous distribution without sedimentation during storage and handling. The coating on the nanoparticles may comprise a dispersion promoting layer such as a surfactant, a polymer, and carbon. The coated nanoparticle is protected from oxidation due to the high surface energy of the coated nanoparticle. The dispersion reinforcing layer on the coated nano particles enhances the compatibility and distribution of the coated nano particles in the radiation curable resin, thereby storing in short-term and long-term storage. Aggregation does not occur in the presence and use of the dispersion. Electroless catalysts such as palladium compounds may not be required. Conventionally, the catalytic particles may not be compatible with polymeric binders, however, the coated nanoparticles disclosed herein are compatible with the polymers disclosed below and may be homogenized in mixing with the polymers disclosed below. . Such coated nanoparticle or nanoparticle is a radiation curable composition designed for high speed printing and used to maintain printed features when used in a printing process such as a flexographic printing process High precision. The use of the ink composition as disclosed herein enables printing of lines at widths as small as 1 micron. A printed material such as a substrate can be printed without any solvent, which means that the entire manufacturing process does not require an additional solvent removal step. As discussed below, thixotropic properties are achieved. Since the coated nanoparticle acts as a seed for the electroplating process, it may be necessary to have no catalyst in the post-activation treatment ink prior to the electroless plating process. Additionally, the ink pattern printed using ink can be electroplated at room temperature, the ink comprising a plurality of binders and a plurality of coated nanoparticles.

奈米複合材料可包含輻射可固化黏合劑，該黏合劑包含單體、寡聚物及聚合物。複數種黏合劑可包括1,3-丁二醇基二(甲基)丙烯酸酯、1,4-丁二醇基二(甲基)丙烯酸酯、1,6己二醇基二(甲基)丙烯酸酯、烷氧基化脂族二丙烯酸酯、烷氧基化新戊二醇基二(甲基)丙烯酸酯、環己烷二甲醇基二(甲基)丙烯酸酯、二乙二醇基二(甲基)丙烯酸酯、二丙二醇基二(甲基)丙烯酸酯、乙氧基化雙酚A基二(甲基)丙烯酸酯、乙二醇基二(甲基)丙烯酸酯、新戊二醇二甲基丙烯酸酯、聚酯二丙烯酸酯、聚乙二醇基二(甲基)丙烯酸酯、聚丙 二醇基二(甲基)丙烯酸酯、丙氧基化新戊二醇二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、三乙二醇基二(甲基)丙烯酸酯、三丙二醇基二(甲基)丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、二新戊四醇五丙烯酸酯、乙氧基化新戊四醇四丙烯酸酯、其亦可為低黏度二新戊四醇五丙烯酸酯、五丙烯酸酯、新戊四醇四丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、高度丙氧基化甘油三丙烯酸酯、三羥甲基丙烷三丙烯酸酯、新戊四醇三丙烯酸酯、丙氧基化甘油三丙烯酸酯、丙氧基化三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三(2-羥基乙基)異氰尿酸三(甲基)丙烯酸酯、2(2-乙氧基乙氧基)乙基丙烯酸酯、2-苯氧基乙基甲基丙烯酸酯、3,3,5三甲基環己基甲基丙烯酸酯、烷氧基化月桂基丙烯酸酯、烷氧基化苯酚丙烯酸酯、烷氧基化四氫糠基丙烯酸酯、己內酯丙烯酸酯、環狀三羥甲基丙烷縮甲醛丙烯酸酯、脂環族丙烯酸酯單體、二環戊二烯甲基丙烯酸酯、二乙二醇甲基醚甲基丙烯酸酯、乙氧基化(4)壬基苯酚甲基丙烯酸酯、乙氧基化壬基酚丙烯酸酯、甲基丙烯酸異莰酯、甲基丙烯酸異癸酯、丙烯酸異辛酯、甲基丙烯酸月桂酯、甲氧基聚乙二醇單甲基丙烯酸酯、丙烯酸辛基癸酯、甲基丙烯酸硬脂醯酯、甲基丙烯酸四氫糠酯、甲基丙烯酸十三烷酯、三乙二醇乙基醚甲基丙烯酸酯、聚(肉桂酸乙烯酯)及N-甲基-4(4’-甲醯苯乙烯基)吡啶陽離子甲基硫酸酯縮醛)聚(乙烯醇)等。 The nanocomposite may comprise a radiation curable binder comprising monomers, oligomers and polymers. The plurality of binders may include 1,3-butanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(methyl) Acrylate, alkoxylated aliphatic diacrylate, alkoxylated neopentyl glycol di(meth) acrylate, cyclohexane dimethanol di(meth) acrylate, diethylene glycol amide (Meth) acrylate, dipropylene glycol bis (meth) acrylate, ethoxylated bisphenol A bis (meth) acrylate, ethylene glycol bis (meth) acrylate, neopentyl glycol Dimethacrylate, polyester diacrylate, polyethylene glycol di(meth)acrylate, polypropylene Glycol di(meth)acrylate, propoxylated neopentyl glycol diacrylate, tricyclodecane dimethanol diacrylate, triethylene glycol di(meth)acrylate, tripropylene glycol di (Meth) acrylate, di-trimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, ethoxylated pentaerythritol tetraacrylate, which may also be low viscosity dine pentaerythritol Pentaacrylate, pentaacrylate, pentaerythritol tetraacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylol Propane triacrylate, highly propoxylated glycerol triacrylate, trimethylolpropane triacrylate, neopentyl alcohol triacrylate, propoxylated glycerol triacrylate, propoxylated trimethylolpropane Triacrylate, trimethylolpropane trimethacrylate, tris(2-hydroxyethyl)isocyanuric acid tris(meth)acrylate, 2(2-ethoxyethoxy)ethyl acrylate, 2-phenoxyethyl methacrylate, 3,3,5 trimethylcyclohexyl methacrylate, alkoxylated lauryl propyl Oleate, alkoxylated phenol acrylate, alkoxylated tetrahydrofurfuryl acrylate, caprolactone acrylate, cyclic trimethylolpropane formal acrylate, alicyclic acrylate monomer, two Cyclopentadiene methacrylate, diethylene glycol methyl ether methacrylate, ethoxylated (4) nonyl phenol methacrylate, ethoxylated nonyl phenol acrylate, methacrylic acid Ester ester, isodecyl methacrylate, isooctyl acrylate, lauryl methacrylate, methoxy polyethylene glycol monomethacrylate, octyl decyl acrylate, stearyl methacrylate, methyl Tetrahydrofurfuryl acrylate, tridecyl methacrylate, triethylene glycol ethyl ether methacrylate, poly(vinyl cinnamate) and N-methyl-4 (4'-methylstilbene) Pyridine cation methyl sulfate acetal) poly(vinyl alcohol) or the like.

所使用之光起始劑之類型可視所使用之複數種黏合劑交聯機理而定。光起始劑由於起始材料之廣泛可用性而可用於大部分常見材料系統，但並非絕對必要。光起始劑係特別添加至調配物之化合物，其將所吸收之光能、UV或可見光以引發物質之形式，亦即引發自由基或陽離子之形式轉換為化學能。基於該機理形成起始基。就有效進行光起始而言，光起始劑之吸收帶必須與光源之發射光譜重疊，且在相應於光起始劑激發之波長下必須存在調配物組分之最小競爭吸收。如以下所討論，若電子束固化用作固化機理，則可不使用光起始劑。光起始劑可為例如苯乙酮、大茴香偶姻(anisoin)、蒽醌、蒽醌-2-磺酸、鈉鹽一水合物，(苯)三羰基鉻、二苯乙二酮、苯偶姻(benzoin)、苯偶姻***、苯偶姻異丁基醚、苯偶姻甲基醚、二苯甲酮、二苯甲酮/1-羥基環己基苯基酮、50/50摻合物，3,3'4.4,4'-二苯甲酮四碳酸二酐、4-苯甲醯基聯苯、2-苄基-2-(二甲基胺基)-4'-嗎啉基苯基丁酮、4,4'-雙(二乙基胺基)二苯甲酮、4,4'-雙(二甲基胺基)二苯甲酮、莰醌、2-氯硫-9-酮、(異丙苯)環戊二烯六氟磷酸鐵(ii)、二苯并環庚烯酮、2,2-二乙氧基苯乙酮、4,4'-二羥基二苯甲酮、2,2-二甲氧基-2-苯基苯乙酮、4-(二甲基胺基)二苯甲酮、4,4'-二甲基苯偶醯、2,5-二甲基二苯甲酮、3,4-二甲基二苯甲酮、二苯基(2,4,6-三甲基苯甲醯基)氧化膦/2-羥基-2-甲基丙苯酮之50/50摻合物、4'-乙氧基苯乙酮、2-乙基蒽醌、二茂鐵、3'-羥基苯乙酮、4'-羥基苯乙酮、3-羥基二苯甲酮、4-羥基二苯甲酮、1-羥基環己基苯基 酮、2-羥基-2-甲基苯丙酮、2-甲基二苯甲酮、3-甲基二苯甲酮、甲基苯甲醯甲酸酯、2-甲基-4’-(甲基硫基)-2-嗎啉基-苯丙酮、菲醌、4'-苯氧基苯乙酮、硫-9-酮、以50%混於碳酸丙烯酯中三芳基硫六氟銻酸鹽及以50%混於碳酸丙烯酯中之三芳基鋶六氟磷酸鹽。如以上所討論，在某些條件下不可使用光起始劑。舉例而言，當電子束用作固化高能量引發源時，或當光環加成機制用作交聯基團，諸如N-甲基-4(4'-甲醯苯乙烯基)吡啶陽離子甲基硫酸酯縮醛)聚(乙烯醇)時，可不使用光起始劑。 The type of photoinitiator used can depend on the crosslinking mechanism of the plurality of binders used. Photoinitiators are available for most common material systems due to the wide availability of starting materials, but are not absolutely necessary. Photoinitiators are compounds which are specifically added to the formulation which convert the absorbed light energy, UV or visible light into chemical energy in the form of an initiating substance, ie in the form of a free radical or cation. A starting group is formed based on this mechanism. For efficient light initiation, the absorption band of the photoinitiator must overlap the emission spectrum of the source and the minimum competing absorption of the formulation components must be present at the wavelength corresponding to the excitation of the photoinitiator. As discussed below, if electron beam curing is used as the curing mechanism, the photoinitiator may not be used. The photoinitiator can be, for example, acetophenone, anisoin, anthraquinone, anthraquinone-2-sulfonic acid, sodium salt monohydrate, (phenyl)tricarbonyl chromium, diphenylethylenedione, benzene. Benzoin (benzoin), benzoin ethyl ether, benzoin isobutyl ether, benzoin methyl ether, benzophenone, benzophenone / 1-hydroxycyclohexyl phenyl ketone, 50/50 blending ,3,3'4.4,4'-benzophenone tetracarbonic dianhydride, 4-benzylidenebiphenyl, 2-benzyl-2-(dimethylamino)-4'-morpholinyl Phenylbutanone, 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(dimethylamino)benzophenone, anthracene, 2-chlorosulfur -9-ketone, (cumene) cyclopentadienyl iron hexafluorophosphate (ii), dibenzocycloheptenone, 2,2-diethoxyacetophenone, 4,4'-dihydroxy Benzophenone, 2,2-dimethoxy-2-phenylacetophenone, 4-(dimethylamino)benzophenone, 4,4'-dimethylbenzidine, 2,5 -Dimethylbenzophenone, 3,4-dimethylbenzophenone, diphenyl(2,4,6-trimethylbenzylidene)phosphine oxide/2-hydroxy-2-methyl 50/50 blend of benzophenone, 4'-ethoxyacetophenone, 2-ethylhydrazine, ferrocene, 3'-hydroxyacetophenone, 4'-hydroxyacetophenone, 3- Hydroxybenzophenone, 4-hydroxybenzophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methylpropiophenone, 2-methylbenzophenone, 3-methyldiphenyl Ketone, methylbenzate, 2-methyl-4'-(methylthio)-2-morpholinyl-propiophenone, phenanthrenequinone, 4'-phenoxyacetophenone, sulfur The -9-ketone is mixed with triarylsulfur hexafluoroantimonate in 50% of propylene carbonate and triarylsulfonium hexafluorophosphate mixed with 50% of propylene carbonate. As discussed above, photoinitiators cannot be used under certain conditions. For example, when an electron beam is used as a curing high energy initiating source, or when a halo addition mechanism is used as a crosslinking group, such as N-methyl-4(4'-methylstilbene)pyridine cation methyl In the case of a sulfate acetal) poly(vinyl alcohol), a photoinitiator may not be used.

墨水可包含導電奈米粒子，該等奈米粒子包括奈米金屬、奈米氧化物及奈米碳基材料，諸如奈米管、奈米石墨烯及巴克球。此等導電粒子可用作替代品來電鍍可在用於柔版印刷之其他類型墨水中發現之觸媒。由於不使用電鍍觸媒，所以不存在觸媒活化製程，且可在與高溫相對之室溫下執行以下描述之電鍍製程，使用電鍍觸媒時，觸媒反應發生可能需要該高溫。當需要可重複同時印刷廣泛範圍特徵尺寸之方法時可使用該墨水，且該墨水可減少可發生於光刻製程中之過切(undercutting)，當包含所印刷圖案之所印刷特徵之寬度各小於20微米時，該過切減少可為關鍵的。在一些實施例中，印刷製程可在高達1000呎/分鐘之速度下執行。另外，可能存在經改良之黏著性/經減少之分層。導電奈米粒子可由界面活性劑、聚合物或碳塗佈或隔離。經塗佈之金屬粒子上之碳可為非晶形、sp2雜化或類石墨烯的粒徑可為0.01微米至50微米。所用之金屬可為銅(Cu)、 鎳(Ni)、鈷(Co)、銀(Ag)、金(Au)、鐵(Fe)、鋅(Zn)等。碳塗層可阻止金屬粒子之聚集且容易在輻射可固化基體中分散。用於分散導電粒子之方法包括諸如球磨、磁力攪拌、高速均質機、高壓均質機及超音波處理之方法。可組合或替代地使用導電氧化物，包括氧化銦錫、氧化銻、氧化銻錫、氧化銦、氧化鋅、氧化鋅鋁等。 The ink may comprise conductive nanoparticles including nano-metals, nano-oxides, and nano-carbon based materials such as nanotubes, nanographenes, and buckyballs. These conductive particles can be used as an alternative to electroplating catalysts that can be found in other types of inks used in flexographic printing. Since the plating catalyst is not used, there is no catalyst activation process, and the plating process described below can be performed at room temperature opposite to the high temperature, which may be required when the plating catalyst is used. The ink can be used when it is desired to repeat the method of simultaneously printing a wide range of feature sizes, and the ink can reduce undercutting that can occur in a lithographic process, when the width of the printed features comprising the printed pattern is less than This overcut reduction can be critical at 20 microns. In some embodiments, the printing process can be performed at speeds up to 1000 Å/min. In addition, there may be improved adhesion/reduced delamination. The conductive nanoparticle can be coated or isolated by a surfactant, polymer or carbon. The carbon on the coated metal particles may be amorphous, sp2 hybrid or graphene-like may have a particle size of from 0.01 micron to 50 microns. The metal used may be copper (Cu), Nickel (Ni), cobalt (Co), silver (Ag), gold (Au), iron (Fe), zinc (Zn), and the like. The carbon coating prevents aggregation of the metal particles and is easily dispersed in the radiation curable matrix. Methods for dispersing conductive particles include methods such as ball milling, magnetic stirring, high speed homogenizers, high pressure homogenizers, and ultrasonic processing. Conductive oxides may be used in combination or alternatively, including indium tin oxide, antimony oxide, antimony tin oxide, indium oxide, zinc oxide, zinc aluminum oxide, and the like.

經固化之奈米複合材料可直接在商業可購得之電鍍溶液中(諸如Cu、Ni、Co、Ag、Au等)加以電鍍，而在固化後無任何後處理。此不僅節省時間及成本，而且亦達成恆定及可靠電鍍。傳統方法可能需要活化製程，諸如UV或熱活化或其二者。在一實施例中，所電鍍之銅層可進一步由Ni、Ag或較佳Au電鍍以具有較低接觸電阻及較好之抗氧化保護。 The cured nanocomposite can be electroplated directly in a commercially available plating solution (such as Cu, Ni, Co, Ag, Au, etc.) without any post treatment after curing. This not only saves time and cost, but also achieves constant and reliable plating. Conventional methods may require an activation process such as UV or thermal activation or both. In one embodiment, the plated copper layer may be further plated with Ni, Ag or preferably Au to have a lower contact resistance and better oxidation protection.

圖2為製造用於柔版製程中之墨水之方法的實施例。墨水在墨水製備站202處藉由混合複數種輻射可固化黏合劑與複數個奈米複合材料粒子204而製備，且在一些實施例中，添加至少一種光起始劑204a。奈米複合材料粒子係以上所討論且一般為具有塗層之金屬粒子，其亦可稱作晶種，因為奈米複合材料粒子之一個目的在於充當用於電鍍製程之晶種。先於基板或與清潔站206處之第一清潔同時發生，墨水可在墨水製備站202處製備。清潔站206用於清潔第一基板，該第一基板接著在印刷站210處使用柔版印刷使用在墨水製備站202處製備之墨水加以印刷。應瞭解印刷站210可包括一或多個印刷輥，且在一些實施例中 該等印刷輥可使用一種以上類型之墨水。在該實例中，墨水製備站處可發生一種以上墨水之製備。在印刷站210處印刷之後，第一基板由紫外線光或可見光固化。如以上所述，若墨水中不存在光起始劑，則可使用電子束固化第一基板。印刷站210將圖案印刷在該基板上，該圖案包含如以下至少在圖4A至圖4C及圖5B及圖6中所討論之複數個線條。在站210處印刷之圖案係於電鍍站214處由例如無電電鍍製程電鍍。所印刷之圖案的幾何形狀可係關於或相關於經電鍍之圖案的幾何形狀。舉例而言，若在由電鍍形成之導電圖案中需要線條<10微米厚，則墨水厚度係1微米至100奈米。在另一實例中，經電鍍之導電線條之厚度亦可介於3微米與500奈米之間。在電鍍站214之後，第一基板在第二清潔站216處清潔且在第一乾燥站218處乾燥。 2 is an embodiment of a method of making an ink for use in a flexographic process. The ink is prepared at the ink preparation station 202 by mixing a plurality of radiation curable binders with a plurality of nanocomposite particles 204, and in some embodiments, adding at least one photoinitiator 204a. Nanocomposite particles are discussed above and are generally coated metal particles, which may also be referred to as seed crystals, since one purpose of the nanocomposite particles is to serve as a seed for the electroplating process. The ink may be prepared at the ink preparation station 202 prior to the substrate or concurrent with the first cleaning at the cleaning station 206. The cleaning station 206 is used to clean the first substrate, which is then printed at the printing station 210 using flexographic printing using ink prepared at the ink preparation station 202. It should be appreciated that printing station 210 can include one or more printing rollers, and in some embodiments More than one type of ink can be used for the printing rolls. In this example, the preparation of more than one ink can occur at the ink preparation station. After printing at the printing station 210, the first substrate is cured by ultraviolet light or visible light. As described above, if the photoinitiator is not present in the ink, the first substrate can be cured using an electron beam. Printing station 210 prints the pattern on the substrate, the pattern comprising a plurality of lines as discussed below at least in Figures 4A-4C and 5B and 6. The pattern printed at station 210 is electroplated at electroplating station 214 by, for example, an electroless plating process. The geometry of the printed pattern can be related to or related to the geometry of the plated pattern. For example, if a line <10 microns thick is required in a conductive pattern formed by electroplating, the ink thickness is from 1 micron to 100 nm. In another example, the thickness of the electroplated conductive lines can also be between 3 microns and 500 nanometers. After the plating station 214, the first substrate is cleaned at the second cleaning station 216 and dried at the first drying station 218.

為製得電容性或電阻性觸控感應器，柵極由兩個線條圖案形成。在一實施例中，第二基板在第三清潔站220處清潔。術語「第二基板」可指三種可能組態。在第一組態中，第二基板係處於方塊206至方塊218製造之第一基板的同一側面，其中第二圖案鄰近於第一圖案印刷。在第二組態中，第二基板可處於經印刷之第一圖案的第二側面，對置於經印刷之第一圖案。在第三組態中，第二基板可為未預先在此製程中印刷之新基板。較佳而言，第二圖案在三種組態之任何者中皆先於電鍍第一圖案加以印刷，且經印刷之第一圖案及第二圖案同時電鍍。在第一組態或第三組態之一些實施例中，一個或兩個基板具有印刷有一個或 兩個經印刷之圖案之複數個間隔物(圖中未示)。不考慮組態，第二圖案在印刷站210處印刷，如以上所討論，該印刷站可包括如印刷第一基板所使用之相同輥及墨水，或可包括不同於在印刷站210處在第一基板上印刷第一圖案所使用之輥及墨水。經印刷之第二圖案在固化站208處使用電子束固化(若用於印刷第二圖案之墨水不含有光起始劑)，或者在固化站212處使用UV光或可見光固化。在固化站208或者在固化站212固化之後，經印刷之第二圖案在電鍍站222處用導電材料電鍍且在第四清潔站224處清潔，在乾燥站226處乾燥，且在鈍化站228處鈍化。 To make a capacitive or resistive touch sensor, the gate is formed by two line patterns. In an embodiment, the second substrate is cleaned at the third cleaning station 220. The term "second substrate" can refer to three possible configurations. In a first configuration, the second substrate is on the same side of the first substrate fabricated by blocks 206 through 218, wherein the second pattern is printed adjacent to the first pattern. In a second configuration, the second substrate can be on the second side of the printed first pattern, facing the printed first pattern. In a third configuration, the second substrate can be a new substrate that has not been previously printed in this process. Preferably, the second pattern is printed prior to electroplating the first pattern in any of the three configurations, and the printed first pattern and the second pattern are simultaneously plated. In some embodiments of the first configuration or the third configuration, one or both of the substrates have one or two printed A plurality of spacers (not shown) of the two printed patterns. Regardless of the configuration, the second pattern is printed at the printing station 210, which, as discussed above, may include the same rollers and inks as used to print the first substrate, or may include a different one than at the printing station 210. A roller and ink used for printing the first pattern on a substrate. The printed second pattern is cured at the curing station 208 using electron beam (if the ink used to print the second pattern does not contain a photoinitiator) or is cured at the curing station 212 using UV light or visible light. After curing station 208 or curing station 212, the printed second pattern is electroplated with a conductive material at plating station 222 and cleaned at fourth cleaning station 224, dried at drying station 226, and at passivation station 228 Passivation.

視組態而定，經電鍍之第一基板及第二基板可在裝配站230處裝配。在第一組態中，第一基板及第二基板得以印刷且接著彼此鄰近地電鍍。在此實例中，基板可被切割，裁剪且與正交定向之圖案裝配，或基板可加以折疊以建立對齊。在裝配站230處可使用黏著劑。在第二組態中，圖案二者在同一基板之對置側面上印刷，故可無需裝配站230，或裝配站可包括裁剪或其他修整步驟。在第三組態中，第一圖案及第二圖案在獨立基板上印刷，且該等基板可在裝配站230處使用黏著劑裁剪及裝配。 Depending on the configuration, the plated first substrate and the second substrate can be assembled at the assembly station 230. In a first configuration, the first substrate and the second substrate are printed and then plated adjacent to each other. In this example, the substrate can be cut, cropped and assembled with an orthogonally oriented pattern, or the substrate can be folded to establish alignment. An adhesive can be used at the assembly station 230. In the second configuration, both of the patterns are printed on opposite sides of the same substrate, so assembly station 230 may not be required, or the assembly station may include cutting or other finishing steps. In a third configuration, the first pattern and the second pattern are printed on separate substrates, and the substrates can be cut and assembled using an adhesive at the assembly station 230.

在一實例中(圖中未示)，藉由混合黏合劑，詳言之，藉由將176 g環氧丙烯酸酯與112 g新戊四醇四丙烯酸酯及124 g聚乙二醇二丙烯酸酯混合而製備墨水。接著，可向溶液中加入103 g 25奈米經碳塗佈之Cu或Ag粒子。可使用音波處理器來幫助分散直至獲得第二均質溶液。所得之奈 米複合材料可顯示觸變性性質，該等性質可有助於印刷小特徵而無聚合物滲出或線條變寬現象。在一些實施例中，可向混合物中添加光起始劑，諸如24.7公克1-羥基環己基苯基酮及12.4公克2,2-二甲氧基-2-苯基苯乙酮，且攪拌直至完全溶解。應瞭解的是，只要最終混合物為均質的且奈米複合材料粒子得以溶解，就可以各種順序及組合向溶液中添加黏合劑、光起始劑及奈米複合材料粒子。 In one example (not shown), by mixing the binder, in detail, by 176 g of epoxy acrylate with 112 g of neopentyl alcohol tetraacrylate and 124 g of polyethylene glycol diacrylate The ink is prepared by mixing. Next, 103 g of 25 nm carbon coated Cu or Ag particles can be added to the solution. A sonic processor can be used to aid dispersion until a second homogeneous solution is obtained. Nai Rice composites can exhibit thixotropic properties that can help print small features without polymer bleed or line broadening. In some embodiments, a photoinitiator can be added to the mixture, such as 24.7 grams of 1-hydroxycyclohexyl phenyl ketone and 12.4 grams of 2,2-dimethoxy-2-phenylacetophenone, and stirred until completely dissolved. It will be appreciated that as long as the final mixture is homogeneous and the nanocomposite particles are dissolved, the binder, photoinitiator and nanocomposite particles can be added to the solution in various sequences and combinations.

在另一實例中，如以上描述混合墨水，例外為向溶液中加入73公克25奈米經碳塗佈之Ag或Ni粒子。用於墨水溶液之奈米複合材料粒子之量可影響所電鍍之線條的可見度，因為在一些應用中，可能更需要較暗之圖案，且因此，經電鍍之圖案之光學性質由使用墨水組合物，且詳言之，用於製造墨水之奈米複合材料粒子之量及類型調整。對1微米至20微米寬度極其精細之線條而言，奈米複合材料可呈現其他益處，諸如對基板之基底材料的良好黏著性以便基板無需用底塗層預處理或無需金屬離子之與包含電鍍觸媒之墨水發生的還原製程，此與奈米複合材料離子相對。在介於35℃與45℃之間之溫度下，第一圖案及第二圖案之電鍍速率可在18奈米/分鐘至60奈米/分鐘之間變動。電鍍可使用奈米複合材料墨水在操作介於20℃與70℃之間的溫度下達成。在一些實施例中，電鍍可在室溫下以較慢速率進行且甚至在較長製程(與將在高處理溫度下執行之製程相比)之後仍顯示足夠黏著性。 In another example, the ink was mixed as described above, with the exception that 73 grams of 25 nanometer carbon coated Ag or Ni particles were added to the solution. The amount of nanocomposite particles used in the ink solution can affect the visibility of the electroplated lines, as in some applications, a darker pattern may be more desirable, and thus, the optical properties of the electroplated pattern are used by the ink composition. And, in particular, the amount and type adjustment of the nanocomposite particles used to make the ink. For composite lines with extremely fine widths from 1 micron to 20 microns, nanocomposites can present other benefits, such as good adhesion to the substrate material of the substrate so that the substrate does not require pre-treatment with the undercoat or does not require metal ions and includes electroplating. The reduction process of the catalyst ink occurs as opposed to the nanocomposite ions. The plating rate of the first pattern and the second pattern may vary between 18 nm/min and 60 nm/min at a temperature between 35 ° C and 45 ° C. Electroplating can be achieved using a nanocomposite ink at a temperature between 20 ° C and 70 ° C. In some embodiments, electroplating can be performed at a slower rate at room temperature and still exhibit sufficient adhesion even after a longer process (compared to a process that will be performed at high processing temperatures).

母版形成 Master formation

柔版印刷係輪轉腹板凸版印刷之形式，其中凸版安裝至例如具有雙面黏著劑之印刷滾筒。此等凸版亦可稱作母版或柔性版，其可與快速乾燥、低黏度溶劑及自網紋輥或其他兩輥式墨水系統饋入之墨水共同使用。網紋輥可為用以將經量測之墨水量提供至印刷版之滾筒。墨水可為例如基於水的墨水或紫外線(UV)固化墨水。在一實例中，第一輥自墨水盤或計量系統轉移至計量輥或網紋輥。當墨水自網紋輥轉移至印版滾筒時，其可經計量至均一厚度。當基板自印版滾筒穿過輥至輥操作系統移動至壓印滾筒時，壓印滾筒將壓力施加至印版滾筒，該印版滾筒將凸版上之影像轉移至基板。在一些實施例中，可能存在上墨輥而非印版滾筒，且刮片可用於改良墨水至輥之分佈。 Flexographic printing is in the form of a web of relief printing in which a relief is mounted to, for example, a printing cylinder having a double-sided adhesive. These reliefs may also be referred to as master or flexographic plates, which can be used with fast drying, low viscosity solvents and inks fed from anilox rolls or other two roll ink systems. The anilox roller can be a roller for providing a measured amount of ink to the printing plate. The ink can be, for example, a water based ink or an ultraviolet (UV) curable ink. In one example, the first roller is transferred from an ink tray or metering system to a metering roller or anilox roller. When the ink is transferred from the anilox roll to the plate cylinder, it can be metered to a uniform thickness. As the substrate moves from the plate cylinder through the roller to the roller operating system to the impression cylinder, the impression cylinder applies pressure to the plate cylinder, which transfers the image on the relief to the substrate. In some embodiments, there may be an inking roller rather than a plate cylinder, and the blade may be used to improve the ink to roller distribution.

柔版可由例如塑膠、橡膠或光聚合物(亦可稱作UV敏感聚合物)製得。印版可由雷射蝕刻、照相製版或光化學方法製得。印版可根據任何已知方法購買或製得。較佳柔版製程可設置為堆疊類型，其中一或多層印刷站垂直佈置於壓機框架之各側，且各層自身具有使用一種類型之墨水印刷之印版滾筒，且該設置可容許在基板之一或兩側上印刷。在另一實施例中，可使用中心壓印滾筒，其使用安裝於壓機框架之單個壓印滾筒。當基板進入壓機時，基板與壓印滾筒接觸且適當圖案得以印刷。或者，可利用直列式柔版印刷製程，其中印刷站經佈置呈水平線且由共用總軸傳動。在此實例中，印刷站可耦接至固化站、切割機、折疊機或其他印刷後處理設備。亦可利用柔版製程之其他組 態。 Flexographic plates can be made, for example, from plastic, rubber or photopolymers (also known as UV-sensitive polymers). The printing plate can be made by laser etching, photoengraving or photochemical methods. The printing plate can be purchased or prepared according to any known method. Preferably, the flexographic process can be set to a stack type in which one or more printing stations are vertically disposed on each side of the press frame, and each layer itself has a plate cylinder printed using one type of ink, and the arrangement can be tolerated in the substrate Print on one or both sides. In another embodiment, a central impression cylinder can be used that uses a single impression cylinder mounted to the press frame. When the substrate enters the press, the substrate is in contact with the impression cylinder and the appropriate pattern is printed. Alternatively, an in-line flexographic printing process can be utilized in which the printing station is arranged in a horizontal line and is driven by a common main shaft. In this example, the printing station can be coupled to a curing station, a cutter, a folder, or other post-printing processing equipment. Other groups that can also use the flexo process state.

在一實施例中，在例如立體(ITR)成像製程中可使用柔性版套筒。在ITR製程中，在套筒上處理光聚合物印版材料，該套筒將加載至壓機上，與以上討論之方法--扁平版可被安裝至印刷滾筒(亦可稱作習知版滾筒)形成對照。柔性套筒可為表面安置有雷射剝蝕遮罩塗層之光聚合物之連續套筒。在另一實例中，光聚合物之個別零件可用膠帶安裝於基底套筒上，且接著以與具有以上所討論之雷射剝蝕遮罩相同之方式成像及處理。柔性套筒可以若干方式使用，例如用作用於安裝在載體輥表面上之經成像平淡印版之載體輥，或作為已用影像直接立體雕刻之套筒表面。在套筒獨自起到載體作用之實例中，具有經雕刻之圖案之印刷版可安裝至套筒，套筒接著安裝至滾筒上之印刷站中。由於套筒可與已安裝至套筒之版一起儲存，所以此等經預先安裝之印版可減少更換時間。套筒由各種材料製成，包括熱塑性複合材料、熱固性複合材料及鎳，且可或不可用纖維加強來抵抗斷裂及撕裂。併入泡沫或墊片基底之長期運作、可再用式套筒用於極高品質之印刷。在一些實施例中，可使用無泡沫或墊片之拋棄式「薄」套筒。 In an embodiment, a flexographic sleeve can be used in, for example, a stereoscopic (ITR) imaging process. In the ITR process, the photopolymer plate material is processed on a sleeve that will be loaded onto the press, and the method discussed above - the flat plate can be mounted to the printing cylinder (also known as the conventional version) The drum) forms a contrast. The flexible sleeve can be a continuous sleeve of photopolymer with a laser ablated mask coating disposed on the surface. In another example, individual parts of the photopolymer can be taped to the substrate sleeve and then imaged and processed in the same manner as the laser ablation mask discussed above. The flexible sleeve can be used in a number of ways, for example as a carrier roll for an imaged, plain printing plate mounted on the surface of a carrier roll, or as a sleeve surface that has been directly engraved with an image. In the example where the sleeve acts alone as a carrier, a printing plate having an engraved pattern can be mounted to the sleeve, which is then mounted to a printing station on the drum. Since the sleeve can be stored with the plate that has been mounted to the sleeve, such pre-installed plates can reduce replacement time. The sleeve is made of a variety of materials, including thermoplastic composites, thermoset composites, and nickel, with or without fiber reinforcement to resist breakage and tear. Long-term, reusable sleeves incorporated into foam or gasket substrates for extremely high quality printing. In some embodiments, disposable "thin" sleeves that are free of foam or gaskets can be used.

圖3A至圖3C為柔性母版實施例之圖解。如以上所述，術語「母版」及「柔性母版」可交換使用。圖3A為直線式柔性母版302之等角圖300，該母版為圓筒狀。圖3B為經電路圖案化之柔性母版304之實施例的等角圖。圖3C為部分如圖3A中所示之直線式柔性母版在方塊306處之橫截面 圖。圖3C亦繪示「W」，其為柔性母版突出之寬度；「D」，其為複數個突出306之中心點之間之距離；及「H」，其為突出306之高度。在一實施例中(圖中未示)，D、W及H中的一個或全部在整個柔性母版上可為相同的。在另一實施例中(圖中未示)，橫越柔性母版之D、W及H中的一個或全部可係不同的。在一實施例中(圖中未示)，柔性母版突出之寬度W係介於3微米與5微米之間，鄰近突出之間之距離D係介於1 mm與5 mm之間，突出之高度H可在3微米至4微米之間變動，且突出之厚度T係介於1.67 mm與1.85 mm之間。在一實施例中，可在基板之一個側面例如使用包括兩個圖案之一個輥，或藉由各包括一個圖案之兩個輥完成印刷，且接著該基板可得以切割及裝配。在一替代實施例中，可使用兩個不同印刷站及兩個不同柔性母版印刷基板之兩個側面。例如，因為印刷滾筒可為昂貴且難於更換的，此將使得滾筒有效用於高容量印刷，但不可能使得系統為小批量或唯一組態所需，所以可使用柔性母版。歸因於佔用之時間，更換可為高成本的。相反，柔版印刷可意謂如下：紫外線曝露可用於光版以製得新印版(可耗用低至1個小時之時間)。在一實施例中，與此等柔性母版一起使用適當墨水可容許墨水自例如容器或盤以更容易受控制之方式加載，其中在墨水轉移期間壓力及表面能可能夠加以控制。用於印刷製程之墨水可需要具有諸如黏著性、黏度及添加劑之性質，以便於印刷時墨水留在原位置且不自所印刷之圖案散開，變模糊或另外變形，且以便由墨水形成之 特徵參與形成所需特徵。例如，各圖案可使用一種配方製得，其中該配方包括至少一個柔性母版及至少一種類型墨水。例如，不同解析度線條、不同大小線條及不同幾何形狀可需要不同配方。 3A-3C are illustrations of a flexible master embodiment. As mentioned above, the terms "master" and "flexible master" are used interchangeably. FIG. 3A is an isometric view 300 of a linear flexure master 302 having a cylindrical shape. FIG. 3B is an isometric view of an embodiment of a circuit patterned flexure master 304. Figure 3C is a cross section of the linear flexible master as shown in Figure 3A at block 306. Figure. 3C also shows "W", which is the width of the flexible master protrusion; "D", which is the distance between the center points of the plurality of protrusions 306; and "H", which is the height of the protrusion 306. In one embodiment (not shown), one or all of D, W, and H may be the same across the flexible master. In another embodiment (not shown), one or all of D, W, and H across the flexible master may be different. In an embodiment (not shown), the flexible master has a width W between 3 microns and 5 microns, and a distance D between adjacent protrusions is between 1 mm and 5 mm. The height H can vary from 3 microns to 4 microns and the protruding thickness T is between 1.67 mm and 1.85 mm. In one embodiment, printing may be performed on one side of the substrate, for example, using one of two rolls, or by two rolls each including a pattern, and then the substrate may be cut and assembled. In an alternate embodiment, two different printing stations and two sides of two different flexible master printed substrates can be used. For example, because the printing cylinder can be expensive and difficult to replace, this would make the drum effective for high volume printing, but it is not possible to make the system required for small batch or unique configuration, so a flexible master can be used. Due to the time of occupancy, replacement can be costly. In contrast, flexographic printing can mean the following: UV exposure can be used on optical plates to make new plates (which can be used for as little as one hour). In one embodiment, the use of a suitable ink with such flexible masters allows the ink to be loaded from, for example, a container or tray in a more controlled manner, wherein pressure and surface energy can be controlled during ink transfer. The ink used in the printing process may need to have properties such as adhesion, viscosity and additives so that the ink remains in place during printing and does not spread out from the printed pattern, becomes blurred or otherwise deformed, and is formed by the ink. Features participate in forming the desired features. For example, each pattern can be made using a formulation wherein the formulation includes at least one flexible master and at least one type of ink. For example, different resolution lines, different size lines, and different geometries may require different recipes.

圖4A為柔性薄膜之一個側面之俯視圖的實施例之圖解，該柔性薄膜具有待印刷於基板上之圖案400a。第一圖案400a可印刷在第一柔性偏光板薄膜之一個側面上，該圖案包含：第一複數個線條402，其可構成X-Y柵極之定向為Y之區段；及尾部404，其包括電引線406及電連接器408。圖4B為可印刷在第二柔性偏光板薄膜之一個側面上之第二圖案400b的實施例之圖解，該圖案包括：第二複數個線條410，其可構成X-Y柵極(圖中未示)之定向為X之區段；及尾部412，其包括電引線414及電連接器416。在一實施例中，經組合之第一圖案及第二圖案二者將形成X-Y柵極，該柵極將在大小及形狀上匹配嵌入RGB濾波器(圖中未示)之黑矩陣。 4A is an illustration of an embodiment of a top view of one side of a flexible film having a pattern 400a to be printed on a substrate. The first pattern 400a may be printed on one side of the first flexible polarizing film, the pattern comprising: a first plurality of lines 402 constituting a section of the XY gate oriented Y; and a tail 404 including the electric Lead 406 and electrical connector 408. 4B is an illustration of an embodiment of a second pattern 400b printable on one side of a second flexible polarizer film, the pattern comprising: a second plurality of lines 410 that may form an XY gate (not shown) The section oriented as X; and the tail 412, which includes an electrical lead 414 and an electrical connector 416. In one embodiment, both the combined first pattern and second pattern will form an X-Y gate that will match the size and shape of the black matrix embedded in an RGB filter (not shown).

圖5A及圖5B為電路結構之實施例。轉而參閱圖2及圖5A，圖5A圖示電路結構500，該圖代表電容性觸控感應器之橫截面圖。圖6B為電容性觸控感應器之等角圖510。用導電材料之薄、不透明柔性圖案塗佈薄膜508之頂部508a及底部508b。在圖5A及5B中，所示之頂部電極504及底部電極506印刷在柔性偏光板薄膜508之頂部508a及底部508b上。用於電極之材料可為例如銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、錫(Sn)及鈀(Pd)。視用於電路之材料的電阻率而定， 電路可具有不同回應時間及功率需求。在一些實施例中，電路線條可具有介於0.005微歐姆/正方形與500歐姆/正方形之間之電阻率，且回應時間可介於奈秒與微微秒之範圍內。較佳而言，電阻率介於2歐姆/公分與10歐姆/公分之間。在此實例中，「/正方形」指兩個圖案彼此正交裝配以形成可稱作柵極或x-y柵極之正方形。一般而言，對於以上電極金屬組態，電路電力消耗75%(少於使用ITO(氧化銦錫)之電路電力消耗)係可達成的。 5A and 5B show an embodiment of a circuit configuration. Turning now to Figures 2 and 5A, Figure 5A illustrates a circuit structure 500 that represents a cross-sectional view of a capacitive touch sensor. FIG. 6B is an isometric view 510 of a capacitive touch sensor. The top 508a and bottom 508b of film 508 are coated with a thin, opaque flexible pattern of electrically conductive material. In FIGS. 5A and 5B, the top electrode 504 and the bottom electrode 506 are shown printed on the top 508a and the bottom 508b of the flexible polarizing film 508. Materials for the electrodes may be, for example, copper (Cu), silver (Ag), gold (Au), nickel (Ni), tin (Sn), and palladium (Pd). Depending on the resistivity of the material used in the circuit, Circuits can have different response times and power requirements. In some embodiments, the circuit traces can have a resistivity between 0.005 micro ohms/square and 500 ohms/square, and the response time can be in the range of nanoseconds and picoseconds. Preferably, the resistivity is between 2 ohms/cm and 10 ohms/cm. In this example, "/square" means that the two patterns are orthogonally assembled to each other to form a square that may be referred to as a gate or an x-y gate. In general, for the above electrode metal configuration, circuit power consumption of 75% (less than the circuit power consumption using ITO (Indium Tin Oxide)) is achievable.

在圖5A及圖5B中示出之實施例中，複數個電極線條之橫截面幾何形狀為正方形。然而，複數個線條之橫街面幾何形狀可為任何適合形狀，諸如矩形、正方形、梯形、三角形或半圓形。所印刷之電極之寬度W可在5微米至35微米之間變動且具有+/-10%公差。線條之間的間隔D可在約0.1 mm至5 mm之間變動。就最佳光學效能而言，導電圖案應匹配顯示器黑矩陣之尺寸及形狀。因此，間隔D及寬度W可隨顯示器之黑矩陣之尺寸變化。高度H可介於150奈米與6微米之範圍內。薄膜508展現介於1微米與1毫米之間之厚度T及介於20達因/公分(D/cm)至90 D/cm之間之較佳表面能。儘管以上揭示第一複數個線條及第二複數個線條，以上空間資訊可應用至以上揭示之複數個線條中之一者或二者。 In the embodiment illustrated in Figures 5A and 5B, the cross-sectional geometry of the plurality of electrode lines is square. However, the cross-sectional geometry of the plurality of lines can be any suitable shape, such as rectangular, square, trapezoidal, triangular, or semi-circular. The width W of the printed electrode can vary from 5 microns to 35 microns with a tolerance of +/- 10%. The spacing D between the lines can vary between about 0.1 mm and 5 mm. For optimal optical performance, the conductive pattern should match the size and shape of the display black matrix. Thus, the spacing D and width W can vary with the size of the black matrix of the display. The height H can be in the range of 150 nm and 6 microns. Film 508 exhibits a thickness T between 1 micrometer and 1 millimeter and a preferred surface energy between 20 dynes/cm (D/cm) to 90 D/cm. Although the first plurality of lines and the second plurality of lines are disclosed above, the above spatial information can be applied to one or both of the plurality of lines disclosed above.

圖6A至圖6B為電阻性觸控感應器結構之等角圖及橫截面圖的圖解。圖6A展示電阻性觸控感應器之等角圖600。圖6B示出電阻性觸控感應器之橫截面圖，該電阻性 觸控感應器包含安置於第一基板、偏光板薄膜上之第一複數個導電線條604及複數個間隔物圓點606，第二複數個導電線條612安置於第二基板610及促黏劑608上，該促黏劑黏結偏光板薄膜602及第二基板610，其中第二基板610為光學等角透明薄膜。用於形成導電線條之材料可包含銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、錫(Sn)及鈀(Pd)。視用於電路之材料的電阻率而定，電路可具有不同回應時間及電力需求。 6A-6B are illustrations of an isometric view and a cross-sectional view of a resistive touch sensor structure. FIG. 6A shows an isometric view 600 of a resistive touch sensor. 6B shows a cross-sectional view of a resistive touch sensor, the resistive The touch sensor includes a first plurality of conductive lines 604 disposed on the first substrate and the polarizing film, and a plurality of spacer dots 606. The second plurality of conductive lines 612 are disposed on the second substrate 610 and the adhesion promoter 608. The adhesion promoting agent is bonded to the polarizing plate film 602 and the second substrate 610, wherein the second substrate 610 is an optical isometric transparent film. The material for forming the conductive lines may include copper (Cu), silver (Ag), gold (Au), nickel (Ni), tin (Sn), and palladium (Pd). Depending on the resistivity of the material used in the circuit, the circuit can have different response times and power requirements.

在一些實施例中，電路線條可具有介於0.005微歐姆/公分與500歐姆/正方形之間之電阻率，且具有介於奈秒與微微秒之範圍內之回應時間。一般而言，對於以上電極組態，電路電力消耗75%(少於(或在一些實施例中多於)使用ITO(氧化銦錫)之電路電力消耗)係可達成的。在一個特定實施例中，所印刷之電極之寬度W在5微米至10微米之間變動，公差為+/-10%。線條之間的間隔D可在約0.1 mm至5 mm之間變動。就最佳光學效能而言，導電圖案應大體上匹配顯示器黑矩陣之尺寸及形狀。因此，間隔D及寬度W為顯示器之黑矩陣之尺寸的函數。高度H可介於6奈米與150微米之範圍內。視導電線條之高度H而定，促黏劑608及複數個間隔物圓點606之高度h可為500奈米或以上。在一實施例中，促黏劑608之高度與複數個間隔物圓點606之高度係不同的。偏光板薄膜602及第二基板610可具有介於1微米及1毫米之間之厚度T及介於20達因/公分(D/cm)至90 D/cm之間之表面能。 In some embodiments, the circuit traces can have a resistivity between 0.005 micro ohms/cm and 500 ohms/square with a response time in the range of nanoseconds to picoseconds. In general, for the above electrode configuration, circuit power consumption is 75% (less than (or in some embodiments more than) circuit power consumption using ITO (indium tin oxide)). In a particular embodiment, the width W of the printed electrode varies between 5 microns and 10 microns with a tolerance of +/- 10%. The spacing D between the lines can vary between about 0.1 mm and 5 mm. For optimal optical performance, the conductive pattern should substantially match the size and shape of the display black matrix. Thus, the spacing D and the width W are a function of the size of the black matrix of the display. The height H can be in the range of 6 nm and 150 microns. Depending on the height H of the conductive lines, the height h of the adhesion promoter 608 and the plurality of spacer dots 606 may be 500 nm or more. In one embodiment, the height of the adhesion promoter 608 is different from the height of the plurality of spacer dots 606. The polarizing plate film 602 and the second substrate 610 may have a thickness T of between 1 μm and 1 mm and a surface energy of between 20 dynes/cm (D/cm) and 90 D/cm.

高解析度導電線條之印刷 High resolution conductive line printing

圖7為生產電容性觸控感應器之製造方法之實施例。製造方法700為生產電容性觸控感應器之方法。在圖7中，細長、柔性薄膜508置放於解捲輥702上。偏光板薄膜508之厚度可經選擇以便該薄膜足夠薄來：避免在觸控感應器之撓曲過程中之過度應力；及在一些實施例中，改良光透射率，且足夠薄來保護在製造製程期間之層的連續性及/或其材料性質。較佳而言，薄膜508之厚度可介於1微米與1毫米之間。 FIG. 7 is an embodiment of a method of manufacturing a capacitive touch sensor. Manufacturing method 700 is a method of producing a capacitive touch sensor. In Figure 7, an elongated, flexible film 508 is placed over the unwinding roll 702. The thickness of the polarizer film 508 can be selected such that the film is sufficiently thin to avoid excessive stress during deflection of the touch sensor; and in some embodiments, improve light transmission and be thin enough to protect in manufacturing The continuity of the layer during the process and/or its material properties. Preferably, film 508 can have a thickness between 1 micrometer and 1 millimeter.

薄膜508較佳經由輥至輥操作方法自解捲輥702轉移至第一清潔站704。在一些實施例中，薄膜508可為偏光板薄膜。因為輥至輥製程涉及柔性材料，所以特徵之對齊可略有挑戰性。已知可能需要印刷高解析度線條，維持適當對齊中之精度可解釋設置及製造製程中之原因。在一個實施例中，定位電纜706用於維持特徵之適當對齊，在其他實施例中，可使用任何已知機構來達成此目的。若對齊偏離，則以上揭示之印刷製程不可正確地進行，此可導致成本及安全問題。在一些實施例中，第一清潔站704包括高電場臭氧產生器。臭氧產生器係用於移除自薄膜508之諸如油或脂之雜質。 Film 508 is preferably transferred from unwinding roll 702 to first cleaning station 704 via a roll-to-roll operation. In some embodiments, film 508 can be a polarizer film. Because the roll-to-roll process involves flexible materials, the alignment of features can be slightly more challenging. It is known that it may be necessary to print high resolution lines, maintaining the accuracy of proper alignment to explain the reasons for setup and manufacturing processes. In one embodiment, the positioning cable 706 is used to maintain proper alignment of features, and in other embodiments, any known mechanism can be used to accomplish this. If the alignment is deviated, the printing process disclosed above may not be performed correctly, which may result in cost and safety issues. In some embodiments, the first cleaning station 704 includes a high electric field ozone generator. The ozone generator is used to remove impurities such as oil or grease from the film 508.

薄膜508接著通過第二清潔站708處之第二清潔。在此特定實施例中，第二清潔站708包含腹板清潔器。腹板清潔器可為用於腹板製造中以自腹板或基板移除粒子之任何裝置。在清潔站704及708之後，薄膜508通過第一印 刷製程712，其中在薄膜508之側面之一者上印刷微觀圖案。微觀圖案係使用可具有200 cps至2000 cps黏度之間之輻射可固化墨水(圖中未示)由母版710壓印。在一些實施例中，墨水在25℃下具有500 cps至10000 cps之黏度。 Film 508 is then passed through a second cleaning at second cleaning station 708. In this particular embodiment, the second cleaning station 708 includes a web cleaner. The web cleaner can be any device used in web manufacturing to remove particles from the web or substrate. After cleaning stations 704 and 708, film 508 passes the first print Brush process 712 wherein a micropattern is printed on one of the sides of film 508. The micropattern is imprinted by the master 710 using a radiation curable ink (not shown) that can have a viscosity between 200 cps and 2000 cps. In some embodiments, the ink has a viscosity of from 500 cps to 10000 cps at 25 °C.

墨水可為單體、低聚體或聚合物、金屬元素、金屬元素複合物或液態金屬有機化合物之組合，該組合直接應用於整個基板表面。此外，微觀圖案包括具有介於2至20微米之間之寬度之線條，且類似於圖5A中所示之第一圖案。自母版710轉移至薄膜508之墨水的量由高精度計量系統712調整且視以下而定：製程之速度、墨水組合物、及圖案形狀、尺寸及包括圖案之複數個線條之橫截面幾何形狀。機器之速度可在20呎/分鐘(fpm)至1000 fpm之間變動，然而對一些應用而言，50 fpm至200 fpm可係適合的。 The ink can be a combination of a monomer, an oligomer or a polymer, a metal element, a metal element composite or a liquid metal organic compound, and the combination is applied directly to the entire substrate surface. Further, the microscopic pattern includes a line having a width of between 2 and 20 microns, and is similar to the first pattern shown in FIG. 5A. The amount of ink transferred from the master 710 to the film 508 is adjusted by the high precision metering system 712 and depends on the speed of the process, the ink composition, and the shape, size, and cross-sectional geometry of the plurality of lines including the pattern. . The speed of the machine can vary from 20 呎/min (fpm) to 1000 fpm, although for some applications, 50 fpm to 200 fpm may be suitable.

第一印刷製程712可位於固化站714處之固化製程之前，以自經印刷之墨水圖案形成經圖案化之線條。固化製程可指先前應用於基板上之乾燥、凝固或固定任何塗層或墨水印記之製程。固化可包括紫外線光固化站714，其具有介於約0.5 mW/cm2(毫瓦/平方公尺)至約50 mW/cm2之間之目標強度及介於280 nm至480 nm之間之波長。 The first printing process 712 can be located prior to the curing process at the curing station 714 to form patterned lines from the printed ink pattern. The curing process can refer to a process previously applied to the substrate to dry, solidify, or fix any coating or ink imprint. Curing can include an ultraviolet light curing station 714 having a target intensity between about 0.5 mW/cm2 (milliwatts per square meter) to about 50 mW/cm2 and a wavelength between 280 nm and 480 nm.

薄膜508之未經圖案化之底部側面接著得以印刷，以便自如以上描述之所印刷之電極形成微觀圖案，該圖案代表薄膜508之對置側面上之觸控感應器的電極。微觀圖案印刷於薄膜508之底部側面上。微觀圖案係使用UV可固化墨水由第二母版720壓印。可使用類似於圖5中所示之第 二圖案的圖案。自第二母版720轉移至薄膜508之底部側面之墨水的量由高精度計量站722調整。此第二印刷製程可位於固化站724處固化步驟之前。固化可包括紫外線光固化站724，其具有介於約0.5 mW/cm2至約50 mW/cm2之間之目標強度及介於280奈米至480奈米之間之波長。 The unpatterned bottom side of film 508 is then printed to form a microscopic pattern of the electrodes printed as described above, which represents the electrodes of the touch sensor on opposite sides of film 508. The microscopic pattern is printed on the bottom side of the film 508. The micropattern is imprinted by the second master 720 using UV curable ink. A pattern similar to the second pattern shown in FIG. 5 can be used. The amount of ink transferred from the second master 720 to the bottom side of the film 508 is adjusted by the high precision metering station 722. This second printing process can be located prior to the curing step at curing station 724. Curing can include an ultraviolet light curing station 724 having a target intensity between about 0.5 mW/cm 2 to about 50 mW/cm 2 and a wavelength between 280 nm and 480 nm.

無電電鍍 Electroless plating

具有經印刷之薄膜508之兩個側面上的微觀圖案、經圖案化之第一線條718及經圖案化之底部線條728，薄膜508可曝露於無電電鍍站730。術語「無電電鍍」可描述為用於將導電材料層沈積至給定表面之催化活性化學技術。當所需為室溫時，可使用奈米複合材料(可稱為經塗佈之奈米粒子或「晶種」)，而非墨水中之傳統電鍍觸媒及溶劑。奈米複合材料充當用於電鍍製程之晶種。另外，要瞭解的是，可能需要二次固化，因為墨水不含有溶劑或其他液體。在一實施例中，導電材料之沈積以1 nm/min(奈米/分)至100 nm/min執行，較佳以30 nm/min至70 nm/min執行。 With a microscopic pattern on both sides of the printed film 508, a patterned first line 718, and a patterned bottom line 728, the film 508 can be exposed to the electroless plating station 730. The term "electroless plating" can be described as a catalytically active chemical technique for depositing a layer of electrically conductive material onto a given surface. When it is desired to use room temperature, a nanocomposite material (which may be referred to as coated nanoparticle or "seed") may be used instead of the conventional plating catalyst and solvent in the ink. The nanocomposite acts as a seed for the electroplating process. In addition, it is to be understood that secondary curing may be required because the ink does not contain solvents or other liquids. In one embodiment, the deposition of the conductive material is performed at 1 nm/min (nano/minute) to 100 nm/min, preferably at 30 nm/min to 70 nm/min.

在電鍍站730處，導電材料層沈積於微觀圖案718及728上。此可藉由以下完成：將薄膜508之經圖案化的第一線條718及經圖案化之底部線條728浸沒入無電電鍍站730，該電鍍站使用含有在溫度範圍介於20℃與90℃之間(在一些實施例中所應用之溫度為80℃)處於液態之銅或其他導電材料之槽。視腹板之速度而定且根據應用，沈積速率可為10奈米/分鐘且具有約0.001微米至約100微米之厚度。此無電電鍍製程無需施加電流，且其僅電鍍含有墨水 之經圖案化之區域，該區域預先在固化製程期間藉由曝露於UV輻射下而活化。在其他實施例中，鎳可用作電鍍金屬。銅電鍍浴可包含引起電鍍發生之強還原劑，諸如甲醛、硼氫化物或次磷酸鹽。相較於電鍍，電鍍厚度歸因於無電場之存在趨向均一。無電電鍍可極其適於包括精細特徵之複雜幾何形狀。在電鍍站730之後，電容性觸控感應器由薄膜508之兩個側面上之經印刷的導電線條718及728形成。 At electroplating station 730, a layer of electrically conductive material is deposited on micropatterns 718 and 728. This can be accomplished by immersing the patterned first line 718 of the film 508 and the patterned bottom line 728 into an electroless plating station 730 that is used at temperatures ranging between 20 ° C and 90 ° C. The temperature (applied at 80 ° C in some embodiments) is in the form of a liquid copper or other conductive material. Depending on the speed of the web and depending on the application, the deposition rate can be 10 nanometers per minute and have a thickness of from about 0.001 micron to about 100 microns. This electroless plating process does not require current application, and it only contains ink The patterned region, which is previously activated by exposure to UV radiation during the curing process. In other embodiments, nickel can be used as a plating metal. The copper electroplating bath may contain a strong reducing agent that causes electroplating to occur, such as formaldehyde, borohydride or hypophosphite. Compared to electroplating, the thickness of the plating tends to be uniform due to the absence of an electric field. Electroless plating can be extremely suitable for complex geometries including fine features. After the plating station 730, the capacitive touch sensor is formed from printed conductive lines 718 and 728 on both sides of the film 508.

在無電電鍍站730之後，電容性觸控感應器可在洗滌站728處藉由在室溫下浸沒入含有水之清潔槽而清潔，且在室溫下經由施加空氣而乾燥。在另一實施例中，繼乾燥步驟之後可在圖案噴射中添加鈍化步驟，以阻止導電材料與水之間的任何危險或不希望之化學反應。在此實例中，薄膜508係兩面印刷的。在第二實例中，第一薄膜可一面印刷且第二薄膜可一面印刷，且如以下所示處理且接著裝配薄膜。在第三實例中，第一薄膜具有印刷於薄膜之一個側面上之兩個圖案，且接著如以下所示處理，接著切割且裝配薄膜。在第二及第三實例中，裝配製程包括裝配兩個圖案，其中第一圖案之複數個線條正交地裝配至複數個第二圖案之線條以形成x-y柵極。此裝配製程可包括將圖案切割開或撕裂開，在一些實施例中，基板可具有指示切割位置之標記，或具有使得基板較易於撕裂之穿孔。在替代實施例中，圖案可彼此折疊，其中在折疊之前無需將圖案分開，或其中歸因於基板中之標記、壓痕或穿孔，折疊將在 圖案之間之基板分開。在一些實施例中，在處理之前可添加標記或穿孔，且在其他實施例中，可在處理期間添加標記或穿孔。 After the electroless plating station 730, the capacitive touch sensor can be cleaned at the washing station 728 by immersion in a cleaning bath containing water at room temperature and dried by applying air at room temperature. In another embodiment, a passivation step can be added to the pattern spray following the drying step to prevent any dangerous or undesirable chemical reactions between the conductive material and the water. In this example, film 508 is printed on both sides. In a second example, the first film can be printed on one side and the second film can be printed on one side and processed as shown below and then assembled into a film. In a third example, the first film has two patterns printed on one side of the film and then processed as shown below, followed by cutting and assembling the film. In the second and third examples, the assembly process includes assembling two patterns, wherein a plurality of lines of the first pattern are orthogonally assembled to the lines of the plurality of second patterns to form an x-y gate. This assembly process can include cutting or tearing the pattern, and in some embodiments, the substrate can have indicia indicating the location of the cut, or have perforations that make the substrate easier to tear. In an alternative embodiment, the patterns may be folded over one another, wherein the pattern need not be separated prior to folding, or where the folding will be due to markings, indentations or perforations in the substrate The substrates between the patterns are separated. In some embodiments, indicia or perforations may be added prior to processing, and in other embodiments, indicia or perforations may be added during processing.

精度計量系統 Precision metering system

圖8A及圖8B為高精度計量系統之實施例。印刷製程係墨水圖案形成之製程，該墨水圖案將最終與導電材料一起電鍍。因此，所印刷之圖案之完整性、線條形狀、厚度、均一性及圖案形成可影響所電鍍之圖案的整體性。圖8A為高精度計量站712之實施例，且圖8B為高精度計量站722之實施例。藉由圖8A中之第一母版710及圖8B中之第二母版720，如在圖7中之製造方法700之兩個印刷步驟所描述，站712及722二者控制轉移至薄膜508之墨水的量。在一較佳實施例中，圖8A中之站用於印刷基板之第一側面且圖8B中之站用於印刷基板之其他(第二)側面。圖8A展示墨水盤802a、轉移輥804、網紋輥806a、刮片808a及母版710。網紋輥可為用於將經量測之墨水量提供至印刷版之滾筒，在單個製程中可使用一個以上輥且該輥或該等輥可與墨水盤或與計量墨水系統共同使用。在一個實施例中，墨水盤802a中含有之部分墨水被轉移至網紋輥806a，該網紋輥可由塗佈工業陶瓷(其表面含有稱為單元之極其精細的凹坑)之鋼或鋁芯建構。視印刷製程之設計而定，網紋輥806a可半浸沒於墨水盤802a中或者與計量輥接觸(圖中未示)。刮片808a用於自表面刮去過多墨水，將經量測之墨水量留在單元中。輥接著旋轉以與自單元接收墨水以用於轉移至 薄膜508a之柔版母版710接觸。印刷版之旋轉速度應與腹板之速度匹配，該速度可在20fpm至750fpm之間變動。在圖8B中，墨水自墨水盤802b轉移至網紋輥806b。刮片808b可用於自表面刮去過多墨水，如圖8A，且輥旋轉以與將墨水轉移至基板508b之母版720接觸。在一替代實施例中，基板508a不同於基板508b。 8A and 8B are embodiments of a high precision metering system. The printing process is a process of ink pattern formation that will ultimately be plated with the conductive material. Thus, the integrity, line shape, thickness, uniformity, and patterning of the printed pattern can affect the integrity of the pattern being plated. FIG. 8A is an embodiment of a high precision metering station 712, and FIG. 8B is an embodiment of a high precision metering station 722. With the first master 710 of FIG. 8A and the second master 720 of FIG. 8B, both stations 712 and 722 control transfer to film 508 as described in the two printing steps of manufacturing method 700 in FIG. The amount of ink. In a preferred embodiment, the station of Figure 8A is used to print the first side of the substrate and the station of Figure 8B is used to print the other (second) side of the substrate. FIG. 8A shows an ink tray 802a, a transfer roller 804, an anilox roller 806a, a wiper 808a, and a master 710. The anilox roll can be a roll for providing the measured amount of ink to the printing plate, and more than one roll can be used in a single process and the roll can be used with an ink tray or with a metered ink system. In one embodiment, a portion of the ink contained in the ink tray 802a is transferred to an anilox roll 806a, which may be a steel or aluminum core coated with an industrial ceramic having a surface containing extremely fine pits called cells. Construction. Depending on the design of the printing process, the anilox roll 806a may be sub-immersed in or in contact with the metering roll 802a (not shown). The wiper 808a is used to scrape excess ink from the surface and leave the measured amount of ink in the unit. The roller then rotates to receive ink from the unit for transfer to The flexographic master 710 of film 508a is in contact. The rotational speed of the printing plate should match the speed of the web, which can vary from 20 fpm to 750 fpm. In FIG. 8B, ink is transferred from the ink tray 802b to the anilox roller 806b. The wiper 808b can be used to scrape excess ink from the surface, as in Figure 8A, and the roller rotates to contact the master 720 that transfers the ink to the substrate 508b. In an alternate embodiment, substrate 508a is different than substrate 508b.

最終產品薄膜 Final product film

圖9展示電容性觸控感應器之俯視圖900。在此圖中示出導電柵極線條902(係電極)及包括電引線906及電連接器908之尾部904。電極902及尾部904藉由電鍍由以上揭示之柔版印刷製程印刷之圖案形成。此等電極形成x-y柵極，該x-y柵極允許對藉以使用者與感測器相互作用之點的辨識。此柵極可具有16×9或以上之導電線條及例如介於2.5 mm比2.5 mm至2.1 m比2.1 m之間之尺寸範圍。頂部電極604為對應於Y軸之導電線條且印刷在薄膜508之第一側面上，且底部電極606(對應於X軸之導電線條)印刷在薄膜508之第二側面上。 FIG. 9 shows a top view 900 of a capacitive touch sensor. Conductive gate lines 902 (tie electrodes) and tails 904 including electrical leads 906 and electrical connectors 908 are shown in this figure. Electrode 902 and tail 904 are formed by electroplating from the pattern printed by the flexographic printing process disclosed above. These electrodes form an x-y gate that allows identification of the point by which the user interacts with the sensor. The grid may have a conductive line of 16 x 9 or more and a size range of, for example, between 2.5 mm and 2.5 mm to 2.1 m to 2.1 m. The top electrode 604 is a conductive line corresponding to the Y-axis and is printed on the first side of the film 508, and the bottom electrode 606 (corresponding to the conductive line of the X-axis) is printed on the second side of the film 508.

圖10為對齊方法之圖解。對齊方法1000用於將觸控感應器1008之位置與給定顯示器之黑矩陣1002匹配。在此特定實施例中，使用對準標記1004將觸控感應器1008與黑矩陣1002對齊。較佳而言，觸控感應器1008及黑矩陣1002具有大體上相同尺寸及形狀且如在對齊結構1006中適當地加以對齊。亦可採用其他已知對齊方法。在裝配電阻性觸控感應器之一實施例中(圖中未示)，亦可在對齊製 程中使用複數個間隔物圓點。 Figure 10 is an illustration of the alignment method. The alignment method 1000 is used to match the position of the touch sensor 1008 to the black matrix 1002 of a given display. In this particular embodiment, touch sensor 1008 is aligned with black matrix 1002 using alignment marks 1004. Preferably, touch sensor 1008 and black matrix 1002 have substantially the same size and shape and are suitably aligned as in alignment structure 1006. Other known alignment methods can also be used. In an embodiment in which a resistive touch sensor is mounted (not shown), it can also be aligned A plurality of spacer dots are used in the process.

圖11示出放大圖910，其中展示複數個間隔物圓點606及由第一導電線條604及第二導電線條612形成之X-Y柵極。圖11為根據各種實施例之在薄膜602上建置之電阻性觸控感應器之俯視圖900的實施例。在此圖中展示導電柵極線條902及包括電引線906及電連接器908之尾部904。此等導電線條形成x-y柵極，該x-y柵極允許對藉以使用者與感測器相互作用之點的辨識。此柵極可具有16×9或以上之導電線條及例如介於2.5 mm比2.5 mm至2.1 m比2.1 m之間之尺寸範圍。對應於Y軸之導電線條及間隔物圓點(圖中未示)印刷於薄膜602上，且對應於X軸之導電線條印刷在第二光學等角透明基板上。如以上所解釋，間隔物圓點可印刷在該等兩個薄膜中任一者上。 11 shows an enlarged view 910 in which a plurality of spacer dots 606 and an X-Y gate formed by a first conductive line 604 and a second conductive line 612 are shown. 11 is an embodiment of a top view 900 of a resistive touch sensor built on a film 602 in accordance with various embodiments. Conductive gate lines 902 and tails 904 including electrical leads 906 and electrical connectors 908 are shown in this figure. These conductive lines form an x-y gate that allows identification of the point by which the user interacts with the sensor. The grid may have a conductive line of 16 x 9 or more and a size range of, for example, between 2.5 mm and 2.5 mm to 2.1 m to 2.1 m. Conductive lines corresponding to the Y-axis and spacer dots (not shown) are printed on the film 602, and conductive lines corresponding to the X-axis are printed on the second optical equi-angular transparent substrate. As explained above, spacer dots can be printed on either of the two films.

圖12展示具有電容性觸控螢幕結構之顯示器之分解等角圖。等角圖1100可為例如在圖1中所示之觸控結構100，且可包括LCD 1102、觸控感應器1104及遮蓋玻璃1120。LCD 1102包括諸如背光燈之光源1106，其中背光燈1106包括光源、加強薄膜及擴散板中之至少一個。LCD 1102更包含偏光板1108，該偏光板安置於背光燈1106上，且第一玻璃基板1110安置於第一偏光板1108上。TFT(薄膜電晶體)層1112安置於玻璃基板1110上且液晶單元1114安置於TFT層1112上。黑矩陣1002嵌入RGB濾波器1116內且安置於液晶單元1114與第二玻璃基板1118之間。觸控感應器1104可安置於第二玻璃1118上。觸控感應器1104可包 括頂部電極504及底部電極506，其中，在一實施例中，在同一偏光板薄膜之兩個側面上印刷頂部電極504及底部電極506。在另一實施例中，在第一薄膜508之第一側面上印刷頂部電極504，且在第二隔膜的第一側面上印刷底部電極506，且接著裝配。遮蓋玻璃1120可置放於觸控感應器1104之上面。在一些實施例中，可將一硬塗層(圖中未示)應用至觸控感應器1104之外表面。 Figure 12 shows an exploded isometric view of a display having a capacitive touch screen structure. The isometric view 1100 can be, for example, the touch structure 100 shown in FIG. 1 and can include an LCD 1102, a touch sensor 1104, and a cover glass 1120. The LCD 1102 includes a light source 1106, such as a backlight, wherein the backlight 1106 includes at least one of a light source, a reinforced film, and a diffuser. The LCD 1102 further includes a polarizing plate 1108 disposed on the backlight 1106, and the first glass substrate 1110 is disposed on the first polarizing plate 1108. A TFT (Thin Film Transistor) layer 1112 is disposed on the glass substrate 1110 and a liquid crystal cell 1114 is disposed on the TFT layer 1112. The black matrix 1002 is embedded in the RGB filter 1116 and disposed between the liquid crystal cell 1114 and the second glass substrate 1118. The touch sensor 1104 can be disposed on the second glass 1118. Touch sensor 1104 can be packaged A top electrode 504 and a bottom electrode 506 are included, wherein, in one embodiment, the top electrode 504 and the bottom electrode 506 are printed on both sides of the same polarizer film. In another embodiment, the top electrode 504 is printed on the first side of the first film 508 and the bottom electrode 506 is printed on the first side of the second film and then assembled. The cover glass 1120 can be placed on the touch sensor 1104. In some embodiments, a hard coat layer (not shown) can be applied to the outer surface of the touch sensor 1104.

圖13展示電阻性觸控感應器之等角分解圖1100。在此圖中，吾等可見LCD 1102包括光源1106、第一偏光板1108、第一玻璃基板1110、TFT 1112層、液晶單元1114及嵌於RGB濾波器1116上之黑矩陣1002及第二玻璃基板1118。第一偏光板1108安置於光源1106上。TFT層1112安置於第一玻璃基板1110上且液晶單元1114安置於TFT層1112之上面。RGB濾波器1116安置於液晶單元1114上且具有經嵌入之黑矩陣1002。第二玻璃基板1118安置於RGB濾波器1116上。觸控螢幕結構亦包括觸控感應器1104。觸控螢幕感測器1104包括印刷於偏光板薄膜602之第一複數個導電線條604、間隔物圓點606及第二基板610。第二基板610包括第二複數個導電線條612。在一些實施例中，在觸控感應器1104之上面，可置放遮蓋薄膜1202。或者，可將一硬塗層(圖中未示)應用至觸控感應器1104之外表面以代替遮蓋薄膜1202。 FIG. 13 shows an isometric exploded view 1100 of a resistive touch sensor. In this figure, we can see that the LCD 1102 includes a light source 1106, a first polarizing plate 1108, a first glass substrate 1110, a TFT 1112 layer, a liquid crystal cell 1114, and a black matrix 1002 and a second glass substrate embedded in the RGB filter 1116. 1118. The first polarizing plate 1108 is disposed on the light source 1106. The TFT layer 1112 is disposed on the first glass substrate 1110 and the liquid crystal cell 1114 is disposed on the TFT layer 1112. The RGB filter 1116 is disposed on the liquid crystal cell 1114 and has an embedded black matrix 1002. The second glass substrate 1118 is disposed on the RGB filter 1116. The touch screen structure also includes a touch sensor 1104. The touch screen sensor 1104 includes a first plurality of conductive lines 604, a spacer dot 606, and a second substrate 610 printed on the polarizing film 602. The second substrate 610 includes a second plurality of conductive lines 612. In some embodiments, a cover film 1202 can be placed over the touch sensor 1104. Alternatively, a hard coat layer (not shown) may be applied to the outer surface of the touch sensor 1104 instead of the cover film 1202.

現將參看隨附圖式詳細描述本發明之示例性實施例， 其中：圖1為用於墨水轉移之柔性版之實施例的圖解。 Exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. 1 is an illustration of an embodiment of a flexographic plate for ink transfer.

圖2為使用奈米複合材料墨水製造觸控感應器之實施例的流程圖。 2 is a flow diagram of an embodiment of a touch sensor fabricated using nanocomposite ink.

圖3A至圖3C為經圖案化之柔性母版之等角及橫截面圖的圖解。 3A-3C are illustrations of isometric and cross-sectional views of a patterned flexible master.

圖4A及圖4B為經圖案化之柔性版之俯視圖圖解。 4A and 4B are top plan views of a patterned flexographic plate.

圖5A至圖5B為電容性觸控感應器之實施例之等角圖及橫截面圖的圖解。 5A-5B are diagrams of an isometric view and a cross-sectional view of an embodiment of a capacitive touch sensor.

圖6A及圖6B為電阻性觸控感應器之實施例之等角圖及橫截面圖的圖解。 6A and 6B are illustrations of an isometric view and a cross-sectional view of an embodiment of a resistive touch sensor.

圖7為製造觸控感應器之方法之實施例。 7 is an embodiment of a method of fabricating a touch sensor.

圖8A至圖8B為經計量之墨水印刷系統之實施例的圖解。 8A-8B are illustrations of embodiments of a metered ink printing system.

圖9為包括黑矩陣之電容性觸控感應器之裝配的圖解。 9 is an illustration of the assembly of a capacitive touch sensor including a black matrix.

圖10為觸控感應器裝配之俯視圖圖解。 Figure 10 is a top plan view of the touch sensor assembly.

圖11為經裝配之電阻性觸控螢幕感測器之俯視圖及分解圖。 Figure 11 is a top plan view and an exploded view of the assembled resistive touch screen sensor.

圖12為具有電容性觸控螢幕結構之顯示器之等角分解圖。 Figure 12 is an isometric exploded view of a display having a capacitive touch screen structure.

圖13為具有電阻性觸控螢幕結構之顯示器之等角分解圖。 Figure 13 is an isometric exploded view of a display having a resistive touch screen structure.

202‧‧‧墨水製備站 202‧‧‧Ink preparation station

204‧‧‧奈米複合材料粒子 204‧‧‧Nano composite particles

204a‧‧‧光起始劑 204a‧‧‧Photoinitiator

206‧‧‧清潔站 206‧‧‧Clean station

208‧‧‧固化站 208‧‧‧Cure station

210‧‧‧印刷站 210‧‧‧Printing Station

212‧‧‧固化站 212‧‧‧Cure station

214‧‧‧電鍍站 214‧‧‧Electroplating station

216‧‧‧第二清潔站 216‧‧‧Second cleaning station

218‧‧‧第一乾燥站 218‧‧‧First Drying Station

220‧‧‧第三清潔站 220‧‧‧ third cleaning station

222‧‧‧電鍍站 222‧‧‧Electroplating station

224‧‧‧第四清潔站 224‧‧‧fourth cleaning station

226‧‧‧乾燥站 226‧‧‧Drying station

228‧‧‧鈍化站 228‧‧‧passivation station

230‧‧‧裝配站 230‧‧‧Assembling station

Claims (30)

一種催化活性可印刷墨水，其包含：複數種輻射可固化黏合劑；複數個經塗佈之導電奈米粒子，其中該複數個奈米粒子由表面活性劑、聚合物或碳中之一者塗佈；且其中該墨水在25℃下具有500 cps至10000 cps之黏度。 A catalytically active printable ink comprising: a plurality of radiation curable adhesives; a plurality of coated conductive nanoparticles, wherein the plurality of nanoparticles are coated with one of a surfactant, a polymer or carbon Cloth; and wherein the ink has a viscosity of from 500 cps to 10000 cps at 25 °C. 如申請專利範圍第1項之墨水，其中該兩種輻射可固化黏合劑係選自由以下組成之群組：1,3-丁二醇基二(甲基)丙烯酸酯、1,4-丁二醇基二(甲基)丙烯酸酯、1,6己二醇基二(甲基)丙烯酸酯、烷氧基化脂族二丙烯酸酯、烷氧基化新戊二醇基二(甲基)丙烯酸酯、環己烷二甲醇基二(甲基)丙烯酸酯、二乙二醇基二(甲基)丙烯酸酯、二丙二醇基二(甲基)丙烯酸酯、乙氧基化雙酚A基二(甲基)丙烯酸酯、乙二醇基二(甲基)丙烯酸酯、新戊二醇二甲基丙烯酸酯、聚酯二丙烯酸酯、聚乙二醇基二(甲基)丙烯酸酯、聚丙二醇基二(甲基)丙烯酸酯、丙氧基化新戊二醇二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、三乙二醇基二(甲基)丙烯酸酯、三丙二醇基二(甲基)丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、二新戊四醇五丙烯酸酯、乙氧基化新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、五丙烯酸酯、新戊四醇四丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、高度丙氧基化甘油三丙烯酸酯、三羥甲基丙烷三丙烯酸酯、新戊四醇三丙烯酸酯、丙氧基化甘油三丙烯酸酯、丙氧基化 三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三(2-羥基乙基)異氰尿酸三(甲基)丙烯酸酯、2(2-乙氧基乙氧基)乙基丙烯酸酯、2-苯氧基乙基甲基丙烯酸酯、3,3,5三甲基環己基甲基丙烯酸酯、烷氧基化月桂基丙烯酸酯、烷氧基化苯酚丙烯酸酯、烷氧基化四氫糠基丙烯酸酯、己內酯丙烯酸酯、環狀三羥甲基丙烷縮甲醛丙烯酸酯、脂環族丙烯酸酯單體、二環戊二烯甲基丙烯酸酯、二乙二醇甲基醚甲基丙烯酸酯、乙氧基化(4)壬基苯酚甲基丙烯酸酯、乙氧基化壬基酚丙烯酸酯、甲基丙烯酸異莰酯、甲基丙烯酸異癸酯、丙烯酸異辛酯、甲基丙烯酸月桂酯、甲氧基聚乙二醇單甲基丙烯酸酯、丙烯酸辛基癸酯、甲基丙烯酸硬脂醯酯、甲基丙烯酸四氫糠酯、甲基丙烯酸十三烷酯、三乙二醇乙基醚甲基丙烯酸酯、聚(肉桂酸乙烯酯)及N-甲基-4(4’-甲醯苯乙烯基)吡啶陽離子甲基硫酸酯縮醛)聚(乙烯醇)。 The ink of claim 1, wherein the two radiation curable adhesives are selected from the group consisting of 1,3-butanediol di(meth)acrylate, 1,4-butane Alcohol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, alkoxylated aliphatic diacrylate, alkoxylated neopentyl glycol di(meth)acrylic acid Ester, cyclohexanedimethanol di(meth)acrylate, diethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, ethoxylated bisphenol A bis ( Methyl) acrylate, ethylene glycol di(meth) acrylate, neopentyl glycol dimethacrylate, polyester diacrylate, polyethylene glycol di(meth) acrylate, polypropylene glycol based Di(meth)acrylate, propoxylated neopentyl glycol diacrylate, tricyclodecane dimethanol diacrylate, triethylene glycol di(meth)acrylate, tripropylene glycol di(methyl) Acrylate, di-trimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, ethoxylated pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, five Acrylate, neopentyl alcohol tetraacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, Highly propoxylated glycerol triacrylate, trimethylolpropane triacrylate, neopentyl alcohol triacrylate, propoxylated glycerol triacrylate, propoxylated Trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, tris(2-hydroxyethyl)isocyanurate tri(meth)acrylate, 2(2-ethoxyethoxy) Ethyl acrylate, 2-phenoxyethyl methacrylate, 3,3,5 trimethylcyclohexyl methacrylate, alkoxylated lauryl acrylate, alkoxylated phenol acrylate, alkane Oxidized tetrahydrofurfuryl acrylate, caprolactone acrylate, cyclic trimethylolpropane formal acrylate, alicyclic acrylate monomer, dicyclopentadiene methacrylate, diethylene glycol Methyl ether methacrylate, ethoxylated (4) nonylphenol methacrylate, ethoxylated nonyl phenol acrylate, isodecyl methacrylate, isodecyl methacrylate, isooctyl acrylate Ester, lauryl methacrylate, methoxy polyethylene glycol monomethacrylate, octyl decyl acrylate, stearyl methacrylate, tetrahydrofurfuryl methacrylate, tridecyl methacrylate , triethylene glycol ethyl ether methacrylate, poly(vinyl cinnamate) and N-methyl-4(4'-methylstilbene)pyr Pyridine cation methyl sulfate acetal) poly(vinyl alcohol). 如申請專利範圍第1項之墨水，其更包含光起始劑，其中該光起始劑包含以下中之一者：苯乙酮、大茴香偶姻(anisoin)、蒽醌、蒽醌-2-磺酸、鈉鹽一水合物，(苯)三羰基鉻、二苯乙二酮、苯偶姻(benzoin)、苯偶姻***、苯偶姻異丁基醚、苯偶姻甲基醚、二苯甲酮、二苯甲酮/1-羥基環己基苯基酮、50/50摻合物，3,3'4.4,4'-二苯甲酮四碳酸二酐、4-苯甲醯基聯苯、2-苄基-2-(二甲基胺基)-4'-嗎啉基苯基丁酮、4,4'-雙(二乙基胺基)二苯甲酮、4,4'-雙(二甲基胺基)二苯甲酮、莰醌、2-氯硫-9-酮、(異丙苯)環戊二烯 六氟磷酸鐵(ii)、二苯并環庚烯酮、2,2-二乙氧基苯乙酮、4,4'-二羥基二苯甲酮、2,2-二甲氧基-2-苯基苯乙酮、4-(二甲基胺基)二苯甲酮、4,4'-二甲基苯偶醯、2,5-二甲基二苯甲酮、3,4-二甲基二苯甲酮、二苯基(2,4,6-三甲基苯甲醯基)氧化膦/2-羥基-2-甲基丙苯酮之50/50摻合物、4'-乙氧基苯乙酮、2-乙基蒽醌、二茂鐵、3'-羥基苯乙酮、4'-羥基苯乙酮、3-羥基二苯甲酮、4-羥基二苯甲酮、1-羥基環己基苯基酮、2-羥基-2-甲基苯丙酮、2-甲基二苯甲酮、3-甲基二苯甲酮、甲基苯甲醯甲酸酯、2-甲基-4’-(甲基硫基)-2-嗎啉基-苯丙酮、菲醌、4'-苯氧基苯乙酮、硫-9-酮、以50%混於碳酸丙烯酯中三芳基硫六氟銻酸鹽及以50%混於碳酸丙烯酯中之三芳基鋶六氟磷酸鹽。 The ink of claim 1, further comprising a photoinitiator, wherein the photoinitiator comprises one of the following: acetophenone, anisoin, anthraquinone, anthracene-2 - sulfonic acid, sodium salt monohydrate, (phenyl) chromium tricarbonyl, diphenylethylenedione, benzoin, benzoin ethyl ether, benzoin isobutyl ether, benzoin methyl ether, Benzophenone, benzophenone/1-hydroxycyclohexyl phenyl ketone, 50/50 blend, 3,3'4.4,4'-benzophenone tetracarboxylic dianhydride, 4-benzylidene Biphenyl, 2-benzyl-2-(dimethylamino)-4'-morpholinylphenyl butanone, 4,4'-bis(diethylamino)benzophenone, 4,4 '-Bis(dimethylamino)benzophenone, hydrazine, 2-chlorosulfur -9-ketone, (cumene) cyclopentadienyl iron hexafluorophosphate (ii), dibenzocycloheptenone, 2,2-diethoxyacetophenone, 4,4'-dihydroxy Benzophenone, 2,2-dimethoxy-2-phenylacetophenone, 4-(dimethylamino)benzophenone, 4,4'-dimethylbenzidine, 2,5 -Dimethylbenzophenone, 3,4-dimethylbenzophenone, diphenyl(2,4,6-trimethylbenzylidene)phosphine oxide/2-hydroxy-2-methyl 50/50 blend of benzophenone, 4'-ethoxyacetophenone, 2-ethylhydrazine, ferrocene, 3'-hydroxyacetophenone, 4'-hydroxyacetophenone, 3- Hydroxybenzophenone, 4-hydroxybenzophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methylpropiophenone, 2-methylbenzophenone, 3-methyldiphenyl Ketone, methylbenzate, 2-methyl-4'-(methylthio)-2-morpholinyl-propiophenone, phenanthrenequinone, 4'-phenoxyacetophenone, sulfur The -9-ketone is mixed with triarylsulfur hexafluoroantimonate in 50% of propylene carbonate and triarylsulfonium hexafluorophosphate mixed with 50% of propylene carbonate. 如申請專利範圍第1項之墨水，其中該等經塗佈之導電奈米粒子包含以下中之一者：奈米金屬、奈米氧化物、奈米碳基奈米管、奈米石墨烯及複數個巴克球。 The ink of claim 1, wherein the coated conductive nano particles comprise one of: a nano metal, a nano oxide, a nano carbon nanotube, a nano graphene, and A number of buck balls. 如申請專利範圍第4項之墨水，其中該等經塗佈之導電奈米粒子更包含銅(Cu)、鎳(Ni)、鈷(Co)、銀(Ag)、金(Au)、鐵(Fe)及鋅(Zn)。 The ink of claim 4, wherein the coated conductive nano particles further comprise copper (Cu), nickel (Ni), cobalt (Co), silver (Ag), gold (Au), iron ( Fe) and zinc (Zn). 如申請專利範圍第4項之墨水，其中該經塗佈之奈米氧化物包含以下中之一者：氧化銦錫、氧化銻、氧化銻錫、氧化銦、氧化鋅、氧化鋅鋁。 The ink of claim 4, wherein the coated nano oxide comprises one of: indium tin oxide, antimony oxide, antimony tin oxide, indium oxide, zinc oxide, zinc aluminum oxide. 如申請專利範圍第1項之墨水，其中該墨水包含176公克環氧丙烯酸酯、112公克新戊四醇四丙烯酸酯、124公克聚乙二醇二丙烯酸酯、24.7公克1-羥基環己基苯基酮及 12.4公克2,2-二甲氧基-2-苯基苯乙酮。 The ink of claim 1, wherein the ink comprises 176 grams of epoxy acrylate, 112 grams of neopentyltetraol tetraacrylate, 124 grams of polyethylene glycol diacrylate, and 24.7 grams of 1-hydroxycyclohexyl phenyl. Ketone and 12.4 grams of 2,2-dimethoxy-2-phenylacetophenone. 如申請專利範圍第7項之墨水，其中該組合物更包含103公克以下中之一者：25奈米經碳塗佈之Ag粒子、或25奈米經碳塗佈之Cu粒子或25奈米經碳塗佈之Ni粒子，或此等經碳塗佈之導電奈米粒子之任何組合。 The ink of claim 7, wherein the composition further comprises one of 103 grams or less: 25 nanometer carbon coated Ag particles, or 25 nanometer carbon coated Cu particles or 25 nm Carbon coated Ni particles, or any combination of such carbon coated conductive nanoparticles. 一種製造一觸控螢幕感測器之方法，其包括：製備墨水，其中製備該墨水包括兩種黏合劑及複數個經碳塗佈之導電奈米粒子；使用第一母版及該墨水，藉由柔版印刷製程在一基板之第一側面上印刷第一圖案，其中該第一圖案包含第一複數條線條及第一尾部；固化該基板；電鍍該第一圖案；使用第二母版及該墨水，藉由柔版印刷製程在以下中之一者上印刷第二圖案：第二基板、該第一基板之該第一側面或該第一基板之第二側面，其中該第二圖案包含複數條線條，其中該第二圖案包含第二複數條線條及第二尾部；固化該基板；電鍍該第二圖案；及裝配該第一圖案及該第二圖案以形成觸控感應器。 A method of manufacturing a touch screen sensor, comprising: preparing an ink, wherein preparing the ink comprises two kinds of adhesives and a plurality of carbon coated conductive nano particles; using the first master and the ink, Printing, by a flexographic printing process, a first pattern on a first side of a substrate, wherein the first pattern comprises a first plurality of lines and a first tail; curing the substrate; plating the first pattern; using a second master and The ink is printed by the flexographic printing process on the second pattern: the second substrate, the first side of the first substrate or the second side of the first substrate, wherein the second pattern comprises a plurality of lines, wherein the second pattern comprises a second plurality of lines and a second tail; curing the substrate; plating the second pattern; and assembling the first pattern and the second pattern to form a touch sensor. 如申請專利範圍第9項之方法，其中固化包括離子化輻射源製程，諸如電子束製程。 The method of claim 9, wherein the curing comprises an ionizing radiation source process, such as an electron beam process. 如申請專利範圍第9項之方法，其中製備該墨水更包括：先於加入該等經碳塗佈之導電奈米粒子，將光起始 劑加入該第一均質黏性溶液中及攪拌該溶液直至該光起始劑溶解於該第一均質溶液中以形成第二均質黏性溶液，且其中固化包括紫外線製程或可見光製程。 The method of claim 9, wherein the preparing the ink further comprises: prior to adding the carbon coated conductive nano particles, starting the light The agent is added to the first homogeneous viscous solution and the solution is stirred until the photoinitiator is dissolved in the first homogeneous solution to form a second homogeneous viscous solution, and wherein curing comprises an ultraviolet process or a visible light process. 如申請專利範圍第9項之方法，其中在該第一基板之該第一側面上印刷該第二圖案包括鄰近該第二圖案印刷該第二圖案。 The method of claim 9, wherein printing the second pattern on the first side of the first substrate comprises printing the second pattern adjacent the second pattern. 如申請專利範圍第9項之方法，其更包括：若該第二圖案印刷在該第二基板上或印刷在該第一基板之該第一側面上，則在該所印刷之第一圖案或第二圖案中之至少一者上印刷複數個間隔物，且其中使用第二墨水及第三柔性版印刷該複數個間隔物。 The method of claim 9, further comprising: if the second pattern is printed on the second substrate or printed on the first side of the first substrate, then the printed first pattern or A plurality of spacers are printed on at least one of the second patterns, and wherein the plurality of spacers are printed using the second ink and the third flexographic plate. 如申請專利範圍第9項之方法，其中電鍍該第一圖案及第二圖案係藉由無電電鍍製程達成，該無電電鍍製程沈積導電材料，該導電材料沈積於該第一圖案及第二圖案上，其中該導電材料包含以下中之一者：銅、鎳、金、銀、鈷或其組合。 The method of claim 9, wherein the electroplating the first pattern and the second pattern are achieved by an electroless plating process, wherein the electroless plating process deposits a conductive material, and the conductive material is deposited on the first pattern and the second pattern. Wherein the electrically conductive material comprises one of: copper, nickel, gold, silver, cobalt or a combination thereof. 如申請專利範圍第9項之方法，其中該方法由以速度為20至1000 ft/min之輥至輥操作方法執行。 The method of claim 9, wherein the method is performed by a roll-to-roll operation method at a speed of 20 to 1000 ft/min. 如申請專利範圍第9項之方法，其中連續地印刷該第一圖案及該第二圖案且接著電鍍該等圖案。 The method of claim 9, wherein the first pattern and the second pattern are continuously printed and then electroplated. 如申請專利範圍第9項之方法，其中同時印刷該第一圖案及該第二圖案且接著同時電鍍該等圖案。 The method of claim 9, wherein the first pattern and the second pattern are simultaneously printed and then the patterns are simultaneously plated. 如申請專利範圍第9項之方法，其中印刷及電鍍該第一圖案發生於印刷及電鍍該第二圖案之前。 The method of claim 9, wherein the printing and plating the first pattern occurs prior to printing and plating the second pattern. 如申請專利範圍第9項之方法，其中各固化由電子束達成。 The method of claim 9, wherein each curing is achieved by an electron beam. 如申請專利範圍第11項之方法，其中各固化由可見光或紫外線光達成。 The method of claim 11, wherein each curing is achieved by visible light or ultraviolet light. 如申請專利範圍第9項之方法，其中該第一圖案及第二圖案之該複數條線條中每一者為1微米至5微米寬。 The method of claim 9, wherein each of the plurality of lines of the first pattern and the second pattern is 1 micron to 5 microns wide. 如申請專利範圍第9項之方法，其中該第一圖案及第二圖案之該複數個經印刷之線條中的每一者係100奈米至1.5微米厚。 The method of claim 9, wherein each of the plurality of printed lines of the first pattern and the second pattern is 100 nanometers to 1.5 microns thick. 如申請專利範圍第9項之方法，其中該第一圖案及第二圖案之該複數條線條中每一者具有0.005微歐姆/公分至500歐姆/公分之電阻率。 The method of claim 9, wherein each of the plurality of lines of the first pattern and the second pattern has a resistivity of from 0.005 micro ohms/cm to 500 ohms/cm. 一種用於在基板上柔版印刷複數條線條之系統，其包括：複數個清潔站；第一印刷模組，其包括第一母版、第一墨水及第一轉移輥，其中該墨水包含複數種黏合劑及複數個經塗佈之奈米粒子；第一固化站；第二印刷模組，其包括第二母版、第二墨水及第二轉移輥；第二固化站；電鍍站。 A system for flexographic printing a plurality of lines on a substrate, comprising: a plurality of cleaning stations; a first printing module comprising a first master, a first ink, and a first transfer roller, wherein the ink comprises a plurality a binder and a plurality of coated nano particles; a first curing station; a second printing module comprising a second master, a second ink and a second transfer roller; a second curing station; and a plating station. 如申請專利範圍第24項之系統，其中該複數個清 潔站包括高電場臭氧產生器或腹板清潔器中之一者。 For example, the system of claim 24, wherein the plurality of clear The cleaning station includes one of a high electric field ozone generator or a web cleaner. 如申請專利範圍第24項之系統，其中該第一固化站及該第二固化站為紫外線光固化及可見光固化中之一者。 The system of claim 24, wherein the first curing station and the second curing station are one of ultraviolet light curing and visible light curing. 如申請專利範圍第26項之系統，其中各固化係相同的。 For example, the system of claim 26, wherein each curing system is the same. 如申請專利範圍第26項之系統，其中各固化係不同的。 For example, the system of claim 26, wherein each curing system is different. 如申請專利範圍第24項之方法，其中該墨水更包含一種光起始劑且該固化站係電子束固化。 The method of claim 24, wherein the ink further comprises a photoinitiator and the curing station is electron beam cured. 如申請專利範圍第24項之系統，其更包含乾燥站及裝配站。 For example, the system of claim 24 includes a drying station and an assembly station.
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