TW201412508A - High-density mask for three-dimensional substrates and methods for making the same - Google Patents
High-density mask for three-dimensional substrates and methods for making the same Download PDFInfo
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
- G02C7/04—Contact lenses for the eyes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00038—Production of contact lenses
- B29D11/00125—Auxiliary operations, e.g. removing oxygen from the mould, conveying moulds from a storage to the production line in an inert atmosphere
- B29D11/00134—Curing of the contact lens material
- B29D11/00153—Differential curing, e.g. by differential radiation
- B29D11/00163—Movable masks or shutters, e.g. to vary the exposure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/0022—Multi-cavity moulds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49995—Shaping one-piece blank by removing material
Abstract
Description
本發明係關於遮罩和裝置及製造遮罩之方法，尤其係 關於用於具有極端誤差容許之複雜三維基板的精確性遮罩，以及用以製造該些高密度之精確性遮罩的裝置以及方法。 The present invention relates to a mask and device and a method of manufacturing the same, in particular Accurate masks for complex three-dimensional substrates with extreme tolerances, and devices and methods for making such high-density precision masks.
隨著電子產品越做越小，要製造出具備各種不同用途 的穿戴式或嵌入式的微電子產品也越來越有可能。相關的用途可包括監測體內各種化學變化、藉由不同的機制包括：自動地依據量測結果或外部控制信號來施予固定劑量的藥物或治療試劑，以及增強器官或組織的功能。類似的產品包括如葡萄糖輸液泵、人工心律調節器、電擊器、心室輔助裝置以及神經刺激器等。而眼鏡以及隱形眼鏡為其新穎且功效卓著的應用領域。例如，可將一具有電動對焦能力的鏡片組合與眼鏡結合以擴增或強化眼睛的功能。在另外一個例子中，隱形眼鏡可與電子感測器結合以檢測角膜淚液中的特定化學物質的濃度，不論該隱形眼鏡是否具有調整焦距能力。在鏡片組合中使用嵌入式電子元件將產生許多潛在需求，包括與該電子元件通訊、為該電子元件供電及/或充電、該些元件互相連接、內部以及 外部信號感測及/或監控以及控制該些電子元件以及該眼鏡的整體功能。 As electronic products become smaller and smaller, they must be manufactured for a variety of different purposes. Wearable or embedded microelectronics are also increasingly possible. Related uses may include monitoring various chemical changes in the body, including by different mechanisms including: automatically administering a fixed dose of the drug or therapeutic agent based on the measurement or external control signal, and enhancing the function of the organ or tissue. Similar products include, for example, glucose infusion pumps, artificial heart rhythm regulators, electric shocks, ventricular assist devices, and neurostimulators. Glasses and contact lenses are novel and highly effective applications. For example, a combination of lenses with motorized focus capabilities can be combined with glasses to amplify or enhance the function of the eye. In another example, a contact lens can be combined with an electronic sensor to detect the concentration of a particular chemical in the corneal tears, whether or not the contact lens has the ability to adjust the focal length. The use of embedded electronic components in a lens assembly creates a number of potential needs, including communicating with, charging and/or charging the electronic components, interconnecting the components, internal and The external signals sense and/or monitor and control the electronic components and the overall functionality of the glasses.
人類的眼睛可以分辨數百萬種顏色、輕易適應光強度 變動的環境、以超過高速網路傳輸的速度將信號或資訊傳送至大腦。目前如隱形眼鏡以及植入式鏡片等鏡片被使用來矯正諸如近視、遠視以及散光等視力缺陷。然而，可利用結合額外元件且經過適當設計的鏡片來增強視力以及矯正視力缺陷。 Human eyes can distinguish millions of colors and easily adapt to light intensity A changing environment that transmits signals or information to the brain at a rate that exceeds the speed of high-speed network transmission. Currently, lenses such as contact lenses and implantable lenses are used to correct visual impairments such as myopia, hyperopia, and astigmatism. However, properly designed lenses incorporating additional elements can be used to enhance vision and correct vision defects.
傳統隱形眼鏡為具有特定形狀以矯正如前所述的各 種視力缺陷的聚合物材料結構。為增強視力必須將各種電路和元件整合至該些聚合物材料結構。可藉由客製化的光電元件來將例如控制電路、微處理器、通訊裝置、電源供應器、偵測器、驅動器、發光二極體以及微型天線整合進隱形眼鏡當中，如此不僅可矯正視力也可以增強視力以及提供於本文所述的額外功能。可將電子式及/或電驅動的隱形眼鏡設計為藉由放大以及縮小的功能或單純調整鏡片的折射能力來增強視力。可將電子式及/或電驅動的隱形眼鏡設計為強化顏色以及解析度、展示有關結構的資訊、即時將演講翻譯成字幕、提供來自導航系統的視覺提示、提供影像處理以及網路連線。 可將該些鏡片設計為能讓使用者在低光度的環境下看見事物。適當設計的電子元件及/或鏡片上電子元件的配置可將影像投射至視網膜上，例如在沒有可變焦光學鏡片的狀況下提供新穎圖像展示以及甚至提供喚醒警示。或是，除了這些功能或與其相似的功能外，該隱形眼鏡可與用於非侵入式監控該使用者生物以及健康指標的元件結合。例如，內建於鏡片的感測器可讓糖尿病患者不需要抽血，而自淚液中分析其成分來監控血糖濃度。再者，適當配置的鏡片可與 監控膽固醇、鈉離子、鉀離子濃度以及其他生物性指標的感測器結合。再連接上無線資料傳輸器，這樣即能讓醫生幾乎可立即得到的病患血糖資訊，而不需要讓病患花時間至實驗室抽血檢驗。另外，可利用內建於鏡片的感測器來偵測入射至眼中的光線以補償周圍的光照狀況或測定眨眼模式。 Traditional contact lenses have a specific shape to correct each of the aforementioned A polymer material structure with visual defects. In order to enhance vision, various circuits and components must be integrated into the polymeric material structures. Customized optoelectronic components can be used to integrate control circuits, microprocessors, communication devices, power supplies, detectors, drivers, light-emitting diodes, and miniature antennas into contact lenses, so that vision can be corrected. It is also possible to enhance vision as well as provide additional functionality as described herein. Electronic and/or electrically powered contact lenses can be designed to enhance vision by amplifying and reducing the function or simply adjusting the refractive power of the lens. Electronic and/or electrically powered contact lenses can be designed to enhance color and resolution, display information about the structure, instantly translate speech into subtitles, provide visual cues from the navigation system, provide image processing, and network connectivity. The lenses can be designed to allow the user to see things in low light conditions. The appropriately designed electronic components and/or the configuration of the electronic components on the lens can project images onto the retina, such as providing a novel image display without the variable focus optical lens and even providing a wake-up alert. Alternatively, in addition to these functions or functions similar thereto, the contact lens can be combined with elements for non-invasive monitoring of the user's biological and health indicators. For example, sensors built into the lens allow diabetics to take blood and analyze their composition from tears to monitor blood glucose levels. Furthermore, a properly configured lens can be used with Monitor sensor combinations for monitoring cholesterol, sodium, potassium ion concentrations, and other biological indicators. Then connect the wireless data transmitter, so that the doctor can get the blood sugar information of the patient almost immediately, without having to take the time to the laboratory blood test. In addition, a sensor built into the lens can be used to detect light incident into the eye to compensate for ambient light conditions or to determine a blink mode.
這些裝置的適當結合可帶來潛力無窮的應用，然而要 結合這些額外的元件到光學層級聚合物上有許多的困難。整體來說，許多原因使得直接在鏡片上加工這些元件以及要在非平面表面上安裝和連接平面型裝置皆困難重重。要依照尺寸比例製造也很困難。需要將放置在鏡片上或鏡片中的元件微型化且整合至僅約1.5平方公分的透明聚合物上，同時還要保護這些元件不受眼睛中的潮濕環境所影響。在這些附加的元件增加厚度的狀況下，要讓隱形眼鏡使用者感到舒適和安全也很困難。 The proper combination of these devices can bring endless applications, but There are many difficulties in combining these additional components to the optical layer polymer. On the whole, there are many reasons why it is difficult to machine these components directly on the lens and to mount and connect the planar device on a non-planar surface. It is also difficult to manufacture according to the size ratio. It is desirable to miniaturize the components placed on the lens or in the lens and integrate them onto a transparent polymer of only about 1.5 square centimeters while protecting these components from the humid environment in the eye. It is also difficult to make the contact lens user feel comfortable and safe in the case where these additional components are increased in thickness.
因為眼用裝置(例如，隱形眼鏡)其在面積與體積上的 限制以及其所使用的環境，要實現這樣的裝置必須克服許多問題，包括在非平面表面上安裝和連接各個電子元件，其中該非平面表面之主體為光學塑料。因此，目前存在著形成三維形狀之需求，以及在該些三維形狀上高度精確地及重複地金屬化或形成內部連結及偏移之需求。 Because of the area and volume of an ophthalmic device (eg, a contact lens) Limitations and the environment in which they are used must overcome many problems in achieving such devices, including the mounting and attachment of individual electronic components on non-planar surfaces, wherein the body of the non-planar surface is an optical plastic. Therefore, there is currently a need to form three-dimensional shapes, as well as the need to highly accurately and repeatedly metallize or form internal bonds and offsets on such three-dimensional shapes.
本發明中用於三維基板之高密度遮罩以及其製造方法可克服如前簡短敘述的各種困難。 The high-density mask for a three-dimensional substrate of the present invention and the method of manufacturing the same can overcome various difficulties as briefly described above.
根據一第一態樣，本發明係為一製造一或多個與一非平面基板結合使用的陰影遮罩的方法。該方法包括下列步驟：製造 一心軸，其包括一或多個加工於該心軸中的形狀，其中該一或多個形狀對應至所要遮罩之非平面基板之形狀，於該心軸中的該一或多個形狀中形成一或多個陰影遮罩坯料，從該心軸移除該一或多個陰影遮罩坯料(shadow mask blank)，以及加工一預定的式樣至該一或多個陰影遮罩坯料中以形成一或多個陰影遮罩，該預定的式樣包括實質上小於該一或多個陰影遮罩之尺寸的特徵。 According to a first aspect, the invention is a method of making one or more shadow masks for use in conjunction with a non-planar substrate. The method comprises the following steps: manufacturing a mandrel comprising one or more shapes machined in the mandrel, wherein the one or more shapes correspond to a shape of a non-planar substrate to be masked, in the one or more shapes in the mandrel Forming one or more shadow mask blanks, removing the one or more shadow mask blanks from the mandrel, and processing a predetermined pattern into the one or more shadow mask blanks to form One or more shadow masks, the predetermined pattern comprising features that are substantially smaller than the size of the one or more shadow masks.
根據另一態樣，本發明係為一用以形成陰影遮罩坯料 之心軸。該心軸包括：一實質上圓柱狀結構，其包括一第一表面以及一第二表面，該第一以及第二表面實質上呈平行，一或多個連結機構與該實質上圓柱狀結構之第一表面協同地組合在一起，該一或多個連結機構被配置為使該心軸固定於一加工工具，以及一或多個形狀被加工於該實質上圓柱狀結構之該第二表面，該一或多個形狀具有與一需被遮罩之非平面基板相配的一非平面式樣。 According to another aspect, the invention is for forming a shadow mask blank The heart of the shaft. The mandrel includes: a substantially cylindrical structure including a first surface and a second surface, the first and second surfaces being substantially parallel, one or more joining mechanisms and the substantially cylindrical structure The first surfaces are cooperatively combined, the one or more attachment mechanisms being configured to secure the mandrel to a processing tool, and one or more shapes being machined to the second surface of the substantially cylindrical structure, The one or more shapes have a non-planar pattern that matches a non-planar substrate that needs to be masked.
產生閉塞區域和開放區域以形成一預定式樣的遮 罩，對用於在非平面或三維的表面或基板上形成內部連結的製程為有益的裝置。一般來說，讓一材料置放於一三維基板之預定部分中的單純遮罩可優化後續用於形成該特定特徵，例如一電動眼用裝置上的電性內部連結之材料移除製程。遮罩的該特定應用或使用不會過度複雜；換句話說，主要是因為該遮罩的品質而閉塞或暴露大區域。然而，根據本發明的該裝置以及方法，精確性遮罩可被製造，繼而用於在高度複雜三維基板上形成細部特徵，例如可用於電動眼用裝置之應用。 Creating an occlusion area and an open area to form a predetermined pattern of occlusion The cover is a useful device for processes that form internal bonds on non-planar or three-dimensional surfaces or substrates. In general, a simple mask that places a material in a predetermined portion of a three-dimensional substrate optimizes subsequent material removal processes for forming the particular feature, such as an electrical internal bond on an electric eye device. This particular application or use of the mask is not overly complicated; in other words, the large area is occluded or exposed primarily because of the quality of the mask. However, in accordance with the apparatus and method of the present invention, an accurate mask can be fabricated, which in turn can be used to form detail features on highly complex three-dimensional substrates, such as those useful in electric eye devices.
該根據本發明之製造一遮罩或陰影遮罩的方法包括 若干步驟。第一步驟包括製造或塑造一心軸。該心軸較佳地包括一 或多個形狀或形狀套管，其被塑造來代表該所需的內部輪廓以及該遮罩的物件或元件的特徵。製造根據本發明之一遮罩或陰影遮罩的下一步驟包括於該心軸中的該一或多個形狀中製造一或多個陰影遮罩坯料。在該所需的式樣被切削或加工至該陰影遮罩坯料中後，陰影遮罩坯料將成為陰影遮罩。該一或多個陰影遮罩坯料可用任一合適的技術(例如沉積製程)來製造，其包括電鑄法。製造根據本發明之一遮罩或陰影遮罩的製程中再下一步驟也是最後一步驟，包括自該心軸移除該包括一或多個陰影遮罩坯料之基板，以及於其中形成該式樣以塑造該特定的陰影遮罩。可利用任一精確加工製程，包括雷射刻蝕來形成該式樣。 The method of making a mask or shadow mask in accordance with the present invention includes Several steps. The first step involves making or shaping a mandrel. The mandrel preferably includes a Or a plurality of shapes or shapes of sleeves that are shaped to represent the desired internal contour and features of the object or element of the mask. The next step in fabricating a mask or shadow mask in accordance with the present invention includes fabricating one or more shaded mask blanks in the one or more shapes in the mandrel. After the desired pattern is cut or machined into the shadow mask blank, the shadow mask blank will become a shadow mask. The one or more shaded mask blanks can be fabricated using any suitable technique, such as a deposition process, including electroforming. The next and final step in the fabrication of a mask or shadow mask in accordance with the present invention includes removing the substrate comprising one or more shaded mask blanks from the mandrel and forming the pattern therein To shape this particular shadow mask. This pattern can be formed using any precision processing process, including laser etching.
根據本發明來製造及/或利用的心軸可包括一或多個 精確對應至所要遮罩的三維基板的形狀，以及該些形狀可以多種方式來配置。例如，可安排該心軸上的一或多個形狀的配置以提高該些形狀的密度。換句話說，可調整該心軸上的該些形狀的該配置以提高單一心軸上的設計之數目。該心軸上的該些形狀之該配置也可被調整以提高該製程中的重複性。換句話說，可調整該心軸的該配置以提高自該心軸移除該陰影遮罩坯料的便利性。重要的是需注意有許多其他配置可被用來達成各種不同的功能。 A mandrel made and/or utilized in accordance with the present invention may include one or more The shape of the three-dimensional substrate that exactly corresponds to the desired mask, and the shapes can be configured in a variety of ways. For example, a configuration of one or more shapes on the mandrel can be arranged to increase the density of the shapes. In other words, the configuration of the shapes on the mandrel can be adjusted to increase the number of designs on a single mandrel. This configuration of the shapes on the mandrel can also be adjusted to increase repeatability in the process. In other words, this configuration of the mandrel can be adjusted to increase the convenience of removing the shadow mask blank from the mandrel. It is important to note that there are many other configurations that can be used to achieve a variety of different functions.
該遮罩的精確性主要決定於該心軸中的該形狀的精 確性。較佳地，該心軸中的該形狀精確符合該三維基板的形狀。因此，在本發明中使用的製程可以極高的精確度將該些形狀加工至該心軸中。另外，該心軸也較佳地被設計為用以提高整體製程的效率。 The accuracy of the mask is mainly determined by the fineness of the shape in the mandrel Authenticity. Preferably, the shape in the mandrel exactly matches the shape of the three-dimensional substrate. Therefore, the process used in the present invention can process the shapes into the mandrel with extremely high precision. In addition, the mandrel is also preferably designed to increase the efficiency of the overall process.
根據本發明之該高密度遮罩以及該用以製造高密度 遮罩的製程提供一裝置，其用於遮罩細部的非平面或三維之基體， 以在其上形成精確特徵且不需要額外的後處理作業。於此描述之遮罩以及製程提供一用以製造細部組件的低成本且有效率的裝置。 The high density mask according to the present invention and the high density used to manufacture The process of the mask provides a means for masking the non-planar or three-dimensional base of the detail, To form precise features thereon and no additional post-processing operations are required. The masks and processes described herein provide a low cost and efficient means for making a detailed assembly.
100‧‧‧心軸 100‧‧‧ mandrel
102‧‧‧形狀或 102‧‧‧ Shape or
104‧‧‧平面表面 104‧‧‧ planar surface
106‧‧‧陰影遮罩坯料基板 106‧‧‧Shadow mask blank substrate
108‧‧‧陰影遮罩基板 108‧‧‧Shadow mask substrate
110‧‧‧連接軸 110‧‧‧Connected shaft
200‧‧‧圓盤狀心軸 200‧‧‧disc spindle
202‧‧‧形狀 202‧‧‧ shape
204‧‧‧平面表面 204‧‧‧ planar surface
206‧‧‧陰影遮罩坯料基板 206‧‧‧Shadow mask blank substrate
208‧‧‧陰影遮罩坯料 208‧‧‧Shadow mask blank
210‧‧‧連接軸 210‧‧‧Connected shaft
300‧‧‧圓盤狀結構 300‧‧‧Disc structure
302‧‧‧貫穿開口 302‧‧‧through opening
304‧‧‧心軸結構 304‧‧‧ mandrel structure
306‧‧‧形狀 306‧‧‧ Shape
308‧‧‧心軸組件 308‧‧‧Heart assembly
310‧‧‧陰影遮罩坯料基板 310‧‧‧Shadow mask blank substrate
312‧‧‧陰影遮罩坯料 312‧‧‧ Shadow mask blank
400‧‧‧基板 400‧‧‧Substrate
402‧‧‧外部部分 402‧‧‧External part
404‧‧‧中央部分 404‧‧‧Central Part
406‧‧‧中間特徵 406‧‧‧Intermediate features
408‧‧‧中間特徵 408‧‧‧Intermediate features
500‧‧‧陰影遮罩 500‧‧‧ Shadow mask
502‧‧‧切口 502‧‧‧ incision
600‧‧‧導電跡線 600‧‧‧ conductive traces
700‧‧‧隱形眼鏡 700‧‧‧Contact lenses
702‧‧‧光學區域 702‧‧‧ Optical area
704‧‧‧基板 704‧‧‧Substrate
706‧‧‧半導體晶片 706‧‧‧Semiconductor wafer
708‧‧‧電池 708‧‧‧Battery
712‧‧‧導電跡線 712‧‧‧ conductive traces
714‧‧‧前部光學電極 714‧‧‧ front optical electrode
716‧‧‧後部光學電極 716‧‧‧ Rear optical electrode
718‧‧‧黏著層 718‧‧‧Adhesive layer
從以下的本發明較佳實施例之詳細說明中，並配合附圖所示，將更清楚明白本發明之前述及其他特徵與優勢。圖1A、1B以及1C為根據本發明之具有一個陰影遮罩坯料的第一例示性心軸之圖示。例示性圖2A、2B以及2C為根據本發明之具有多個陰影遮罩坯料的第二例示性心軸之圖示。例示性圖3A、3B、3C以及3D為根據本發明之具有多個陰影遮罩坯料的例示性心軸組合件圖示。例示性圖4為根據本發明之具有表面的三維基板之例示性圖示，其中可使用一遮罩在該表面上配置內部連結。例示性圖5為根據本發明之位於圖4中所描繪的該基板上之例示性陰影遮罩的圖示。例示性圖6為根據本發明之位於圖4中描繪具有內部連結置放於其上的該基板之圖示，其中使用一陰影遮罩來置放該內部連結。圖7為一包括光學元件以及電子元件之隱形眼鏡的圖示。 The above and other features and advantages of the present invention will become more apparent from the aspects of the appended claims. 1A, 1B and 1C are illustrations of a first exemplary mandrel having a shaded mask blank in accordance with the present invention. Illustrative Figures 2A, 2B, and 2C are illustrations of a second exemplary mandrel having a plurality of shaded mask blanks in accordance with the present invention. Illustrative Figures 3A, 3B, 3C, and 3D are illustrations of exemplary mandrel assemblies having multiple shaded mask blanks in accordance with the present invention. Illustrative FIG. 4 is an illustrative illustration of a three-dimensional substrate having a surface on which an internal bond can be placed using a mask. Illustrative FIG. 5 is an illustration of an exemplary shadow mask located on the substrate depicted in FIG. 4 in accordance with the present invention. Illustrative FIG. 6 is an illustration of the substrate depicted in FIG. 4 with an internal bond placed thereon in accordance with the present invention, wherein a shadow mask is used to place the internal bond. Figure 7 is an illustration of a contact lens comprising an optical component and an electronic component.
如本文所簡要闡述，產生封閉區域與開放區域以形成一預定式樣的遮罩，對用於在非平面的或三維的表面或基板上形成式樣(例如電子內部連結)為有用的裝置。在許多應用上遮罩的使用不會過度複雜；換句話說，主要是因為該遮罩的品質而閉塞或暴露大區域。然而，根據本發明的該裝置以及方法，精確性遮罩可被製造繼而用於在高度複雜三維表面上形成例如內部連結之特徵，其可用於例如電動眼用裝置之應用。 As briefly set forth herein, a closed region and an open region are created to form a predetermined pattern of masks useful for forming a pattern (e.g., electronic internal bonds) on a non-planar or three-dimensional surface or substrate. The use of a mask in many applications is not overly complicated; in other words, it is mainly due to the quality of the mask that occludes or exposes a large area. However, in accordance with the apparatus and method of the present invention, precision masks can be fabricated and subsequently used to form features such as internal joints on highly complex three-dimensional surfaces that can be used, for example, in applications for electric eye devices.
根據本發明之製造或塑造一遮罩或陰影遮罩的該第一例示之步驟包括該心軸的製造。對於一心軸有許多不同的定義， 包括一用於使加工工作形成之物件、一維持或固定要加工的材料之工具，或是可用於固定其他動態工具之工具。如同此處所使用以及隨後詳細闡述的，一心軸為可讓一陰影遮罩於其上製造之一基座形狀。更具體地說，該心軸為可讓一或多個陰影遮罩坯料於其上或其中形成之該元件。 The first illustrative step of making or shaping a mask or shadow mask in accordance with the present invention includes the manufacture of the mandrel. There are many different definitions for a mandrel, It includes an object for forming a machining work, a tool for maintaining or fixing the material to be processed, or a tool for fixing other dynamic tools. As used herein and as explained in detail below, a mandrel is a pedestal shape that allows a shadow to be masked thereon. More specifically, the mandrel is the element upon which one or more shadow mask blanks can be formed.
該例示性心軸包括一實質上圓盤狀或圓柱狀結構，其 具有一或多個軸件用以將其連結至一機械車床或相似裝置的一平面表面上，以及連結至該相對平面表面上的一平坦表面。重要的是需注意根據本發明，除了連結軸外還有其他用於標準機械車床的連結機構可被使用，例如操作上可與機器(包括真空卡盤)，來一同作業之連結機構。藉由任一適合用於塑造精細及/或複雜幾何形狀之加工技術，來在該心軸之該平坦表面上複製一或多次所要遮罩之三維表面或基板的確切式樣。基本上在加工後，該心軸將包括一或多個式樣或形狀，其代表該須被遮罩之物件所需的內部輪廓及特徵。藉由任一適合加工精細式樣的技術(包括使用一車床)可將所要遮罩之三維表面的式樣加工至該心軸的該平坦表面；即如本文中詳細說明的，此解釋了需要一或多個用於連結的軸之原因。 The exemplary mandrel includes a substantially disc or cylindrical structure, There are one or more shaft members for attaching them to a planar surface of a mechanical lathe or similar device, and to a flat surface on the opposite planar surface. It is important to note that in accordance with the present invention, in addition to the connecting shaft, other joining mechanisms for standard mechanical lathes can be used, such as a joining mechanism that can be operated in conjunction with a machine (including a vacuum chuck). The exact pattern of the three-dimensional surface or substrate to be masked is replicated on the flat surface of the mandrel by any processing technique suitable for shaping fine and/or complex geometries. Substantially after processing, the mandrel will include one or more patterns or shapes that represent the internal contours and features required for the item to be masked. The pattern of the three-dimensional surface of the desired mask can be machined to the flat surface of the mandrel by any technique suitable for processing the fine pattern (including the use of a lathe); that is, as explained in detail herein, this explains the need for one or The reason for multiple axes for joining.
雖然該例示性心軸包含一實質上圓盤狀或圓柱狀的 結構，重要的是需注意，其可包括任一合適的外形，只要可於其中加工一形狀。例如，可使用一非圓形結構。 Although the exemplary mandrel comprises a substantially disc or cylinder Structure, it is important to note that it can include any suitable shape as long as a shape can be machined therein. For example, a non-circular structure can be used.
該心軸的尺寸、單一個的陰影遮罩坯料的尺寸以及期 望在單一個心軸上製造幾個陰影遮罩坯料，將決定要在該心軸的該平坦表面上加工幾個形狀或形狀套管。若在每個心軸上只需要一個形狀，則該心軸較佳地包括一圓柱狀結構而非一圓盤狀結構，且其 具有單一個連結軸位於該心軸的該反面之中心。然而，若在單一個心軸上需要多個形狀或形狀套管，則該心軸較佳地需要為一圓盤狀結構，其具有單一個連接軸位於該心軸的反面且位於每個形狀或形狀套管中間。例如，若將13個形狀加工在該心軸中，則需要13個連結軸，該些連結軸每個直接位於每個形狀後方之中心。如上所述，可使用其他的連結機構，例如操作上可與具有真空卡盤之機器一起作業的連結機構。若該些形狀的加工是以一旋轉工具(例如一車床)來完成的，則就需要該中心對準。使用一旋轉工具時，為了讓該形狀呈對稱，該連接軸必須與該形狀的中心重合。除了每個形狀具有其個別之中心連結軸外，該心軸較佳地由一質輕的材料所形成，如此可避免在遠離該心軸之該中心加工一形狀時產生搖晃(例如在接近其周界時)，以及夠強韌以承受應力、形變以及重複使用之損耗。 在一例示性實施例中，該心軸可由一質輕、高強度-重量比以及相對較便宜之金屬材料(例如鋁)來製造。另外，因為鋁可輕易地加工，或在另一實施例中，可輕易地以化學方式溶解，因此可創造一極精確的複雜形狀。 The size of the mandrel, the size of the single shadow mask blank, and the period Looking to create several shaded mask blanks on a single mandrel, it will be decided to machine several shapes or shapes of the sleeve on the flat surface of the mandrel. If only one shape is required on each mandrel, the mandrel preferably includes a cylindrical structure instead of a disc-like structure, and There is a single connecting shaft located at the center of the opposite side of the mandrel. However, if a plurality of shapes or shape sleeves are required on a single mandrel, the mandrel preferably needs to be a disc-like structure having a single connecting shaft on the opposite side of the mandrel and in each shape. Or the middle of the shape casing. For example, if 13 shapes are machined into the mandrel, 13 connecting shafts are required, each of which is located directly at the center of each shape. As noted above, other attachment mechanisms can be used, such as a linkage mechanism that can be operated with a machine having a vacuum chuck. If the machining of the shapes is done with a rotating tool, such as a lathe, then the center alignment is required. When using a rotating tool, in order to make the shape symmetrical, the connecting shaft must coincide with the center of the shape. In addition to each shape having its own central connecting shaft, the mandrel is preferably formed of a lightweight material that avoids shaking when machining a shape away from the center of the mandrel (eg, near its Perimeter), and strong enough to withstand the stress, deformation and loss of reuse. In an exemplary embodiment, the mandrel can be fabricated from a lightweight, high strength-to-weight ratio and relatively inexpensive metal material such as aluminum. In addition, since aluminum can be easily processed, or in another embodiment, it can be easily chemically dissolved, a very precise and complicated shape can be created.
如上所述之例示性實施例中，該一或多個形狀可使用 任何用於製造精確及/或複雜/細部的特徵之技術來製造。如前所述，一車床(lathe)或其他的車削加工機(如一車銑(turn mill)以及一旋轉傳送機(rotary transfer))可裝配天然或合成的鑽石刀具，在被稱為單點鑽石車削(diamond point turning)的製程中來製造該一或多個形狀。單點鑽石車削為一多步驟式製程，其中使用一系列的電腦數值控制車床來進行該加工之起始步驟。該系列中每個接續的車床都較前一個車床更準確。在該系列的最後一步，使用一鑽石刀具來達到 次奈米級之表面處理以及次微米級之形狀準確度。在另一例示性實施例中，可使用放電加工來製造該一或多個形狀。放電加工為一用以得到一預定的外形的製程，其藉由放電來移除材料以塑造該預定的外形或形狀。 In the exemplary embodiment described above, the one or more shapes may be used Any technique used to create precise and/or complex/detailed features. As mentioned earlier, a lathe or other turning machine (such as a turn mill and a rotary transfer) can be fitted with natural or synthetic diamond cutters, known as single-point diamonds. The one or more shapes are fabricated in a diamond point turning process. Single point diamond turning is a multi-step process in which a series of computer numerical control lathes are used to perform the initial steps of the process. Each successive lathe in the series is more accurate than the previous lathe. In the final step of the series, use a diamond cutter to achieve Sub-nano surface treatment and sub-micron shape accuracy. In another exemplary embodiment, electrical discharge machining can be used to fabricate the one or more shapes. The electrical discharge machining is a process for obtaining a predetermined shape which is removed by electrical discharge to shape the predetermined shape or shape.
根據本發明之製造或塑造一遮罩或陰影遮罩的該下 一例示之步驟，包括在該心軸的該一或多個形狀或形狀套井中，製造該一或多個陰影遮罩坯料。在該所需的式樣被切削入該陰影遮罩坯料後，陰影遮罩坯料將成為陰影遮罩，如以下詳述。因為該一或多個形狀精確對應至所要遮罩之三維表面或基板，所以該心軸中的該形狀為該陰影遮罩坯料的模具。根據本發明之一例示性實施例，可藉由一電鍍或電鑄製程來將一陰影遮罩坯料製造於該心軸的每一形狀中。電鑄為一金屬形成製程，其中薄件為使用一電鍍製程來製造。當要製造的零件具有極端的誤差容許或複雜性，則會使用電鑄法。電鍍法為一藉由一電場移動一溶液中的金屬離子來塗佈或沉積一金屬薄層至一基座形狀的製程，其中該基座形狀在該鍍層完成後會從該形狀被移除。因為該製程之性質，因此可用此技術來生產高保真度的結構。換言之，電鑄法精確地複製該形狀且不會造成任何的收縮或變形。可使用任何金屬材料來製造該陰影遮罩坯料。在一例示性實施例中，該陰影遮罩坯料以鎳來製造，且其總厚度在約50微米至約150微米間。重要的是需注意該陰影遮罩坯料之厚度可依據該應用來做變動，因此該用以形成該陰影遮罩坯料之製程，可由電鑄法改為另一合適的製程。 Making or shaping a mask or shadow mask according to the present invention An exemplary step includes fabricating the one or more shaded mask blanks in the one or more shapes or shapes of the mandrel. After the desired pattern is cut into the shadow mask blank, the shadow mask blank will become a shadow mask, as detailed below. Because the one or more shapes correspond exactly to the three-dimensional surface or substrate of the desired mask, the shape in the mandrel is the mold of the shadow mask blank. In accordance with an exemplary embodiment of the present invention, a shadow mask blank can be fabricated in each shape of the mandrel by an electroplating or electroforming process. Electroforming is a metal forming process in which thin parts are fabricated using an electroplating process. Electroforming is used when the part to be manufactured has extreme tolerance or complexity. The electroplating process is a process of coating or depositing a thin metal layer to a susceptor shape by moving a metal ion in a solution by an electric field, wherein the susceptor shape is removed from the shape after the plating is completed. Because of the nature of the process, this technique can be used to produce high fidelity structures. In other words, the electroforming method accurately replicates the shape without causing any shrinkage or deformation. The shadow mask blank can be fabricated using any metallic material. In an exemplary embodiment, the shadow mask blank is fabricated from nickel and has a total thickness of between about 50 microns and about 150 microns. It is important to note that the thickness of the shadow mask blank can be varied depending on the application, so that the process for forming the shadow mask blank can be changed from electroforming to another suitable process.
根據本發明之製造或塑造一遮罩或陰影遮罩的該下 一也是最後例示之步驟，包括自該心軸移除該一或多個陰影遮罩坯 料之該基板，以及於其中形成該式樣以塑造該陰影遮罩。可藉由數種方式來自該心軸移除該基板，包括以化學方式移除該心軸或以物理方式分離該兩個元件。根據一以化學方式移除該心軸的例示性實施例，該心軸本身可被一僅與該心軸反應而不會與該基板反應之化學藥劑溶解。在該例示性實施例中，該陰影遮罩坯料為以物理方式自該心軸手動地移除，或藉由機械手臂來移除，再放置於一固定具中以進行更進一步處理，包括藉由於其中形成該所需式樣來塑造該陰影遮罩。為促進物理方式分離，該心軸可被搖動、振動、輕敲或以其他方式攪動以造成物理分離。該所需的式樣對應至該特定的應用，例如電子內部連結。可使用任何合適的裝置以任何合適的方式來形成該式樣，包括雷射加工、雷射消蝕、電漿蝕刻及/或化學蝕刻。 在一例示性實施例中，該式樣是以雷射微加工技術來形成於該陰影遮罩坯料中。因此，當該陰影遮罩坯料自該心軸移除後，該些陰影遮罩坯料被放置在一與該雷射加工系統相容之固定具上。目前可用的雷射系統之精確性已讓極端精細式樣之微加工變得可行。例如，可達到寬度小至1微米之特徵式樣。 Making or shaping a mask or shadow mask according to the present invention And a final illustrated step comprising removing the one or more shadow mask blanks from the mandrel The substrate is formed, and the pattern is formed therein to shape the shadow mask. The substrate can be removed from the mandrel by several means, including chemically removing the mandrel or physically separating the two elements. According to an exemplary embodiment of chemically removing the mandrel, the mandrel itself can be dissolved by a chemical that reacts only with the mandrel without reacting with the substrate. In the exemplary embodiment, the shadow mask blank is physically removed from the mandrel or removed by a robotic arm and placed in a fixture for further processing, including The shadow mask is shaped as the desired pattern is formed therein. To facilitate physical separation, the mandrel can be shaken, vibrated, tapped, or otherwise agitated to cause physical separation. The desired pattern corresponds to that particular application, such as an electronic internal link. The pattern can be formed in any suitable manner using any suitable means, including laser processing, laser ablation, plasma etching, and/or chemical etching. In an exemplary embodiment, the pattern is formed in the shadow mask blank by laser micromachining techniques. Thus, after the shadow mask blank is removed from the mandrel, the shadow mask blanks are placed on a fixture that is compatible with the laser processing system. The precision of currently available laser systems has made micromachining of extremely fine patterns feasible. For example, a feature pattern with a width as small as 1 micron can be achieved.
當完成該一或多個陰影遮罩後，將該一或多個陰影遮 罩自該雷射微加工固定具移至一固定具或一裝置，以將該一或多個陰影遮罩安裝至或暫時固定至該須被遮罩之表面或基板，來產生一成品。例如，若該成品將做為一電動隱形眼鏡之嵌入件上的電子內部連結之基板，則可藉由一專門的固定具將該陰影遮罩固定至該前部光學元件，該專門的固定具可讓該內部連結之材料通過該陰影遮罩中的開口以被置放在該基板上。可使用任何合適且與該基板相容的置放製程。 After the one or more shadow masks are completed, the one or more shadows are masked The cover is moved from the laser micromachined fixture to a fixture or a device to mount or temporarily secure the one or more shadow masks to the surface or substrate to be masked to produce a finished product. For example, if the finished product is to be an electronically interconnected substrate on an insert of an electric contact lens, the shadow mask can be secured to the front optical component by a special fixture, the specialized fixture The internally joined material can be placed over the substrate through an opening in the shadow mask. Any suitable placement process that is compatible with the substrate can be used.
參照圖1A、1B以及1C，其描繪一例示性具有一單獨 的形狀或形狀套井102之心軸100，其中該形狀或形狀套井102被加工於該心軸100之平面表面104中(圖1A)，該例示性具有一陰影遮罩坯料基板106且包括一單獨形成於其上之陰影遮罩基板108的心軸100(圖1B)，以及自該心軸100分離之該陰影遮罩坯料基板106(圖1C)。如前所述，該陰影遮罩坯料108可自該陰影遮罩坯料基板106移除以形成該陰影遮罩，如以下詳細敘述。該用以自該遮罩坯料來製造該遮罩之製程，例如雷射加工，可用來自該陰影遮罩坯料基板106移除該陰影遮罩或遮罩。在此例示性實施例中，當一單獨的形狀102加工於其中時，該心軸100具有一實質上呈圓柱狀之形狀。以虛線表示一用於固定該心軸100至一車床之連接軸110。如上所述，若使用另一製程(例如放電加工)來加工該形狀102，則不需要任何連接軸。在該圖解例示性實施例中，該形狀102包括數個與該三維基板相符合的疊層以及表面，其中該遮罩於該三維基板上使用。重要的是需注意圖1A、1B以及1C為用於說明性的目的，不一定描繪一真實形狀之詳細細節。該心軸100較佳地包含鋁，且該陰影遮罩坯料108較佳地包含鎳。可使用任何合適的製程(包括於本文中描述的該些製程)來製造該陰影遮罩坯料108以及該陰影遮罩本身。 1A, 1B and 1C, which depict an exemplary one with a single The shape or shape of the mandrel 100 of the well 102, wherein the shape or shape of the well 102 is machined into the planar surface 104 of the mandrel 100 (Fig. 1A), which illustratively has a shadowed mask blank substrate 106 and includes A mandrel 100 (FIG. 1B) of a shadow mask substrate 108 formed thereon, and the shadow mask blank substrate 106 (FIG. 1C) separated from the mandrel 100. As previously described, the shadow mask blank 108 can be removed from the shadow mask blank substrate 106 to form the shadow mask, as described in detail below. The process for fabricating the mask from the mask blank, such as laser processing, can be removed from the shadow mask blank substrate 106 by the shadow mask or mask. In this exemplary embodiment, the mandrel 100 has a substantially cylindrical shape when a single shape 102 is machined therein. A connecting shaft 110 for fixing the mandrel 100 to a lathe is indicated by a broken line. As described above, if another shape (e.g., electrical discharge machining) is used to machine the shape 102, no connecting shaft is required. In the illustrated exemplary embodiment, the shape 102 includes a plurality of laminates and surfaces conforming to the three-dimensional substrate, wherein the mask is used on the three-dimensional substrate. It is important to note that Figures 1A, 1B, and 1C are for illustrative purposes and do not necessarily depict the details of a true shape. The mandrel 100 preferably comprises aluminum and the shadow mask blank 108 preferably comprises nickel. The shadow mask blank 108 and the shadow mask itself can be fabricated using any suitable process, including those described herein.
如上所述，該心軸可包括任何結構，包括一用於在單一的陰影遮罩基板上形成多個陰影遮罩坯料之實質上圓盤狀結構。圖2A、2B以及2C描繪一例示性具有多個形狀或形狀套井202之圓盤狀心軸200，其中該多個形狀或形狀套井202被加工於該圓盤狀心軸200之一平面表面204中(圖2A)，該例示性具有一陰影遮罩坯 料基板206之圓盤狀心軸200包括多個陰影遮罩坯料208形成於其上(圖2B)，以及該陰影遮罩坯料基板206與該心軸200分離(圖2C)。 該多個陰影遮罩坯料208，其如同描繪的為一高密度陰影遮罩坯料，其可自該陰影遮罩坯料基板206移除以形成該陰影遮罩，其使用同於用以自該基底製造該遮罩之製程，例如雷射加工。在此例示性實施例中，該心軸200具有一實質上圓盤狀形狀以容納該多個加工於其中之形狀202。該些形狀202之尺寸、該些形狀202之數目以及該心軸200之尺寸皆與彼此相關或皆依彼此而定的。該多個形狀202可以任何合適的配置來安排。可因為不同的理由或是為了納入不同的設計參數而調整該配置。例如，可調整該配置以提高密度。 換句話說，即可調整該配置以增加一心軸上的設計之數目。也可調整該配置以增加該製程之可重複性。換句話說，即可調整該配置以增加自該心軸移除該陰影遮罩坯料的便利性。一用於固定該心軸200至一車床之連結軸210(以虛線表示)位於該每個形狀202之後方相對表面的中心。如上所述，若使用另一製程例如放電加工，來加工該多個形狀202，則不需要任何連接軸。在該圖解例示性實施例中，每個該些形狀202包括相同的且與該三維基板相符合之疊層以及表面式樣，其中該遮罩將於該三維基板中使用；然而，可在一單獨的心軸上使用不同之形狀。再一次地，該心軸200較佳地包括鋁，以及該多個陰影遮罩坯料208較佳地包括鎳。可使用任何合適的製程，包括本文中所述之該些製程，來製造該陰影遮罩坯料208以及該陰影遮罩本身。再一次地，重要的是需注意圖2A、2B以及2C為用於說明性的目的，不一定反映一真實形狀之詳細細節。 As noted above, the mandrel can include any structure including a substantially disc-like structure for forming a plurality of shadow mask blanks on a single shadow mask substrate. 2A, 2B, and 2C depict an exemplary disc-shaped mandrel 200 having a plurality of shapes or shapes of casing wells 202, wherein the plurality of shapes or shapes of casing wells 202 are machined to a plane of the disc-shaped mandrel 200 In the surface 204 (Fig. 2A), the illustration has a shadow mask blank The disc-shaped mandrel 200 of the substrate 206 includes a plurality of shaded mask blanks 208 formed thereon (Fig. 2B), and the shadow mask blank substrate 206 is separated from the mandrel 200 (Fig. 2C). The plurality of shaded mask blanks 208, which are depicted as a high density shaded mask blank, are removable from the shadow mask blank substrate 206 to form the shadow mask, which is used in the same manner as the substrate The process of making the mask, such as laser processing. In this exemplary embodiment, the mandrel 200 has a substantially disc-like shape to accommodate the plurality of shapes 202 machined therein. The dimensions of the shapes 202, the number of the shapes 202, and the dimensions of the mandrel 200 are all related to each other or to each other. The plurality of shapes 202 can be arranged in any suitable configuration. This configuration can be adjusted for different reasons or to incorporate different design parameters. For example, the configuration can be adjusted to increase density. In other words, the configuration can be adjusted to increase the number of designs on a mandrel. This configuration can also be adjusted to increase the repeatability of the process. In other words, the configuration can be adjusted to increase the convenience of removing the shadow mask blank from the mandrel. A coupling shaft 210 (shown in phantom) for securing the mandrel 200 to a lathe is located at the center of the opposite surface of each of the shapes 202. As described above, if the plurality of shapes 202 are processed using another process such as electrical discharge machining, no connecting shaft is required. In the illustrative exemplary embodiment, each of the shapes 202 includes the same laminate and surface pattern that conforms to the three-dimensional substrate, wherein the mask will be used in the three-dimensional substrate; however, Different shapes are used on a single mandrel. Again, the mandrel 200 preferably comprises aluminum, and the plurality of shaded mask blanks 208 preferably comprise nickel. The shadow mask blank 208 and the shadow mask itself can be fabricated using any suitable process, including those described herein. Again, it is important to note that Figures 2A, 2B, and 2C are for illustrative purposes and do not necessarily reflect the details of a true shape.
根據另一例示性實施例，可結合某些來自以上所述之 二實施例的特性至一單獨的新設計。圖3A、3B、3C以及3D描繪此另一例示性心軸組件設計。圖3A描繪一實質上圓盤狀結構300，其中包括複數個貫穿開口302。可用任何材料(包括如上所述的鋁)來製造此實質上圓盤狀結構300。該些貫穿開口302之尺寸大小可接受單獨的且具有單一的形狀或形狀套井306於其中之心軸結構304。該單獨的心軸結構304可與該些於圖1A以及1B中描繪之心軸結構相同。基本上，該實質上圓盤狀結構300與該單獨的心軸結構304之結合將形成一心軸組件308。該單獨的心軸結構304與該實質上圓盤狀結構300可包括任何合適的用於可拆卸地連結彼此之裝置，例如藉由螺紋來連結。藉著使該些元件以此種方式作內部連結，可將各個形狀306併入一單獨的心軸組件308中。換句話說，在單一的組件上，可利用不同的形狀以塑造不同的遮罩坯料。圖3C描繪該具有一陰影遮罩坯料基板310以及相連的陰影遮罩坯料312之心軸組件308，以及圖3D描繪該與該心軸組件308分離之陰影遮罩坯料基板310。如上所述，重要的是需注意圖3A、3B以及3C為用於說明性的目的，不一定反映一真實形狀之詳細細節。 According to another exemplary embodiment, some may be combined from the above The characteristics of the two embodiments are to a single new design. 3A, 3B, 3C, and 3D depict this alternative illustrative mandrel assembly design. FIG. 3A depicts a substantially disk-like structure 300 including a plurality of through openings 302. This substantially disc-like structure 300 can be fabricated from any material, including aluminum as described above. The through openings 302 are sized to receive a single mandrel structure 304 having a single shape or shape of the well 306 therein. The separate mandrel structure 304 can be identical to the mandrel structures depicted in Figures 1A and 1B. Basically, the combination of the substantially disc-shaped structure 300 and the separate mandrel structure 304 will form a mandrel assembly 308. The separate mandrel structure 304 and the substantially disc-shaped structure 300 can comprise any suitable means for removably joining one another, such as by threads. The various shapes 306 can be incorporated into a single mandrel assembly 308 by having the elements interconnected in this manner. In other words, different shapes can be utilized to shape different mask blanks on a single component. 3C depicts the mandrel assembly 308 having a shaded mask blank substrate 310 and associated shadow mask blanks 312, and FIG. 3D depicts the shadow mask blank substrate 310 separated from the mandrel assembly 308. As noted above, it is important to note that Figures 3A, 3B, and 3C are for illustrative purposes and do not necessarily reflect the details of a true shape.
雖然圖3B以及3C裡的該心軸中未以虛線描繪任何軸 件，但是較佳地，會使用一些連接裝置以製造該心軸。例如，可使用單一的用以連接至一車床或一真空卡盤之軸件。 Although no axis is drawn in the mandrel in Figures 3B and 3C by a dashed line Pieces, but preferably, some connecting means are used to make the mandrel. For example, a single shaft member for attachment to a lathe or a vacuum chuck can be used.
可在任何基板上(包括三維基板)使用本發明之該陰影遮罩。圖4描繪這樣的例示基板400。如上所述，該基板400可為一視覺裝置或視覺系統(例如一可變光學的電子眼用鏡片)的元件。圖4藉由描繪該基板400之一部分的橫切面來圖解該基板400的三 維方位之各個特徵。該基板400包括一外部部分或邊緣402，一中央部分或中央區域404以及中間特徵406及408。如圖所示，該些中間特徵406及408具有其個別的局部三維拓樸結構。可在一眼用鏡片中使用該基板400的例示性實施例中，自該邊緣區域402至該中央區域404的高度差可達4毫米，以及該中間特徵406及408可具有局部的高度差，其中該高度差為0.001毫米至0.5毫米且其側壁之斜率約為2度至90度。雖然該針對一用於眼用裝置之基板400的例示性實施例之敘述，在敘述根據本發明之遮罩與用以製造該遮罩之方法是有利的，但是對於本發明所屬領域具一般知識者來說，很明顯地，基本上任何三維基板皆與該陰影遮罩以及用於形成本文所述之陰影遮罩的方法相容。然而，尤其需注意該用於眼用裝置之基板的極端細部性質，以及因此對於一遮罩的需求，以及用於製造一具有如此極端誤差容許遮罩之製程的需求。 The shadow mask of the present invention can be used on any substrate, including a three-dimensional substrate. FIG. 4 depicts such an exemplary substrate 400. As noted above, the substrate 400 can be an element of a visual device or vision system, such as a variable optical electronic ophthalmic lens. 4 illustrates three of the substrate 400 by depicting a cross-section of a portion of the substrate 400. The various characteristics of the dimension. The substrate 400 includes an outer portion or edge 402, a central portion or central region 404, and intermediate features 406 and 408. As shown, the intermediate features 406 and 408 have their individual partial three-dimensional topologies. In an exemplary embodiment in which the substrate 400 can be used in an ophthalmic lens, the height difference from the edge region 402 to the central region 404 can be up to 4 mm, and the intermediate features 406 and 408 can have local height differences, wherein The height difference is from 0.001 mm to 0.5 mm and the slope of the side walls is about 2 to 90 degrees. Although the description of the exemplary embodiment of a substrate 400 for an ophthalmic device is described, the mask according to the present invention and the method for fabricating the mask are advantageous, but have general knowledge for the field to which the present invention pertains. It will be apparent that substantially any three-dimensional substrate is compatible with the shadow mask and the method used to form the shadow mask described herein. However, particular attention needs to be paid to the extreme detail properties of the substrate for ophthalmic devices, and therefore the need for a mask, and the need to create a process with such extreme error tolerance masks.
任何根據本發明且為此基板400所製造的陰影遮罩較佳地與該基板400的精確形狀一致。換句話說，根據本發明準備之一陰影遮罩較佳地應該精確符合該基板的形狀，而且表面至表面，表面至基板均需盡可能地相近。參照圖5，其描繪一置放於該基板400上的例示陰影遮罩500。該陰影遮罩500與該特定的基板400之形狀一致，且在任何需要將材料置放至該基板400上的時候，包括切口502。可結合任何如本文所述之置放技術來使用該陰影遮罩500。如上所述，若該基板400為一眼用裝置之一元件，則可使用該陰影遮罩500在該基板400上形成導電跡線/內部連結。在該陰影遮罩500中的該切口502較佳地應該對應至該所需的導電跡線/內部連結之該式樣。 Any shadow mask made in accordance with the present invention and made for this substrate 400 preferably conforms to the precise shape of the substrate 400. In other words, a shadow mask prepared in accordance with the present invention should preferably conform exactly to the shape of the substrate, and the surface to surface, the surface to the substrate should be as close as possible. Referring to Figure 5, an exemplary shadow mask 500 placed on the substrate 400 is depicted. The shadow mask 500 conforms to the shape of the particular substrate 400 and includes a slit 502 whenever any material needs to be placed onto the substrate 400. The shadow mask 500 can be used in conjunction with any placement technique as described herein. As described above, if the substrate 400 is an element of an ophthalmic device, the shadow mask 500 can be used to form conductive traces/internal connections on the substrate 400. The slit 502 in the shadow mask 500 should preferably correspond to the pattern of the desired conductive trace/internal connection.
當在與其相符之三維基板400上置放且調準好該具有 連帶切口502之陰影遮罩500後，即完成該陰影遮罩程序，接著可使用任何適合用於薄膜形成的技術，包括一金膜之濺鍍沉積。雖然此例示說明中闡述一金膜，但是應注意可使用各種與遮罩沉積相容之薄膜，包括金屬膜、介電薄膜、高介電係數之介電薄膜、導電以及非導電薄膜。 When placed on the three-dimensional substrate 400 corresponding thereto and aligned After the shadow mask 500 with the slit 502 is completed, the shadow masking process is completed, and then any technique suitable for film formation can be used, including a gold film sputter deposition. Although a gold film is illustrated in this illustration, it should be noted that various films compatible with mask deposition can be used, including metal films, dielectric films, high dielectric dielectric films, conductive and non-conductive films.
在進行該沉積製程以在該基板400上對應至該切口 502的部分以及在該陰影遮罩500本身上沉積一適當厚度的金膜後，即形成一具有直接形成的導電跡線/內部連結600之基板400，如圖6所描繪。該陰影遮罩500直接在該三維基板400之不需要導電跡線/內部連結的部分造成陰影。然而，在對應至該切口502的部分，導電跡線/內部連結特徵600被形成在該基板400的該表面上。 Performing the deposition process to correspond to the incision on the substrate 400 A portion of 502 and a gold film of appropriate thickness are deposited on the shadow mask 500 itself to form a substrate 400 having directly formed conductive traces/internal bonds 600, as depicted in FIG. The shadow mask 500 directly shadows portions of the three-dimensional substrate 400 that do not require conductive traces/internal connections. However, at a portion corresponding to the slit 502, a conductive trace/internal joint feature 600 is formed on the surface of the substrate 400.
在依照該描述的方式設定該導電跡線/內部連結特徵 600後，在一些例示性實施例中可再次使用雷射消蝕加工。若藉由一陰影遮罩500設定之該導電跡線/內部連結特徵600未達雷射消蝕可得之精確性，該設定的導電跡線/內部連結特徵600可再修整或再使用雷射消蝕來進一步設定。在一些例示性實施例中，這樣的修整可改善生產率，因為可藉由陰影遮罩來形成非常接近該所需成品的特徵，接著再藉由雷射消蝕來微幅修改。 Setting the conductive trace/internal connection feature in a manner consistent with this description After 600, the laser ablation process can be reused in some exemplary embodiments. If the conductive trace/internal connection feature 600 set by a shadow mask 500 does not achieve the accuracy of laser ablation, the set conductive trace/internal connection feature 600 can be refinished or reused. Erosion to further set. In some exemplary embodiments, such trimming may improve productivity because the features of the desired finished product may be formed by shadow masking, followed by micro-modification by laser ablation.
雖然可在任何基板上使用根據本發明之遮罩以及製 造遮罩的方法，本發明之例示性實施例為參照一可用在眼用裝置或眼用系統之元件之基板來闡述。一如此的眼用裝置或眼用系統為一電動或電子隱形眼鏡。因此為了完整性，於本文中簡短說明一例示之電動或電子隱形眼鏡。 Although the mask and system according to the present invention can be used on any substrate The method of making a mask, an exemplary embodiment of the present invention is set forth with reference to a substrate that can be used in an ophthalmic device or an ophthalmic system. One such ophthalmic device or ophthalmic system is an electric or electronic contact lens. Thus, for the sake of completeness, an exemplary electric or electronic contact lens is briefly described herein.
一例示之電動或電子隱形眼鏡包括該些必須元件，以 矯正及/或強化該具有一或多個視力缺陷之病人的視力，或是用來執行一有用的眼用功能。再者，可純粹使用該些電動或電子隱形眼鏡來強化正常的視力或提供廣泛的功能。該電子隱形眼鏡可包括一可變焦的光學鏡片、一嵌入隱形眼鏡中的前部光學組件或在沒有鏡片的狀況下僅嵌入電子元件，以用於任何適當的功能。可將該例示性電子鏡片納入任何數量之隱形眼鏡中；然而為了說明上的方便，本說明書將專注在一用於矯正視力缺陷且單次使用之日拋型電子隱形眼鏡。 An exemplary electric or electronic contact lens includes the necessary components to Correcting and/or enhancing the vision of the patient with one or more visual impairments or performing a useful ophthalmic function. Furthermore, these electric or electronic contact lenses can be used purely to enhance normal vision or provide a wide range of functions. The electronic contact lens can include a variable focus optical lens, a front optical component embedded in the contact lens, or only embedded electronic components in the absence of a lens for any suitable function. The exemplary electronic lens can be incorporated into any number of contact lenses; however, for convenience of description, the present specification will focus on a disposable electronic contact lens for correcting visual defects and for single use.
參照圖7，其描繪一包括光學元件與電子元件兩者之 隱形眼鏡700，因此其需要電子與機械內部連結。該隱形眼鏡700包括一光學區域702，其可發揮作用以提供視力矯正及/或視力強化也可不發揮任何作用，或可單純地作為該用於任何適當功能的嵌入式電子元件之一基板。在該描繪的例示性實施例中，形成該光學區域702之該聚合物/塑料被延伸以形成一基板704，其中該些電子元件附著於該基板704上。如半導體晶片706以及電池708之電子元件機械式地且電性地連結至該基板704。導電跡線712在該基板704上電性地內部連結該電子元件706以及708。在該例示性實施例中描繪導電跡線712a將半導體晶片706連結至該前部光學電極714，以及導電跡線712b將半導體晶片706連結至該後部光學電極716。 可使用一黏著層718以連結該前部以及後部光學元件；然而，可使用任何其它適合用以接合該兩層的裝置，或該設計可僅使用單一層。 Referring to Figure 7, a depiction includes both an optical component and an electronic component. Contact lens 700, therefore, requires electronic and mechanical internal connections. The contact lens 700 includes an optical region 702 that can function to provide vision correction and/or vision enhancement without any function, or simply as one of the embedded electronic components for any suitable function. In the depicted exemplary embodiment, the polymer/plastic forming the optical region 702 is extended to form a substrate 704 to which the electronic components are attached. Electronic components such as semiconductor wafer 706 and battery 708 are mechanically and electrically coupled to the substrate 704. Conductive traces 712 electrically electrically interconnect the electronic components 706 and 708 on the substrate 704. Conductive trace 712a is depicted in the exemplary embodiment to couple semiconductor wafer 706 to the front optical electrode 714, and conductive trace 712b joins semiconductor wafer 706 to the rear optical electrode 716. An adhesive layer 718 can be used to join the front and rear optical elements; however, any other suitable device for joining the two layers can be used, or the design can use only a single layer.
較佳地使用本文闡述之該遮罩以及遮罩技術來製造 於上所述之該導電跡線712。該導電跡線712對應至該陰影遮罩中 的該開口。為了得到精確導電跡線712，該遮罩必須具有精確切口且該遮罩必須對應至該三維表面或基板。換句話說，該遮罩較佳地反映該基板或表面，以及該切口精確地符合該特徵，以致不需要多餘的製程步驟。換句話說，若有根據本發明製造的一遮罩，則不應需要進一步的製程來清理該沉積的特徵式樣。例如，若使用一先前技術之遮罩，則可能需要一雷射消蝕製程來清理該沉積的特徵式樣(導電內部連結跡線)之線路，然而若使用本發明之遮罩，則該遮罩之該精確性質將讓該些線路更乾淨且更精確。 Preferably, the mask and mask techniques described herein are used to fabricate The conductive trace 712 is described above. The conductive trace 712 corresponds to the shadow mask The opening. In order to obtain a precise conductive trace 712, the mask must have a precise cut and the mask must correspond to the three dimensional surface or substrate. In other words, the mask preferably reflects the substrate or surface, and the slit accurately conforms to the feature such that no unnecessary processing steps are required. In other words, if there is a mask made in accordance with the present invention, no further processing should be required to clean the deposited feature pattern. For example, if a prior art mask is used, a laser ablation process may be required to clean the deposited feature pattern (conductive internal interconnect traces), however, if the mask of the present invention is used, the mask This precise nature will make the lines cleaner and more accurate.
儘管所顯示與所描繪的被相信是最實用且最佳的實施例，但對熟悉此項技術者來說，仍可輕易思及偏離所描述且所顯示的特定設計與方法，且以不脫離本發明的精神與範疇之方式加以運用。本發明並不被限制於特定構造所描繪與所說明的，而是應該被構成以符合可落在所附申請專利範圍之範疇內易所有改良。 While the invention has been shown to be the most practical and preferred embodiment, it will be readily apparent to those skilled in the art that The spirit and scope of the invention are utilized. The present invention is not limited to the specific constructions described and illustrated, but should be constructed to conform to all modifications within the scope of the appended claims.
100‧‧‧心軸 100‧‧‧ mandrel
102‧‧‧形狀或 102‧‧‧ Shape or
104‧‧‧平面表面 104‧‧‧ planar surface
110‧‧‧連接軸 110‧‧‧Connected shaft
Claims (19)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/455,209 US9056432B2 (en) | 2012-04-25 | 2012-04-25 | High-density mask for three-dimensional substrates and methods for making the same |
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| TW201412508A true TW201412508A (en) | 2014-04-01 |
| TWI598220B TWI598220B (en) | 2017-09-11 |
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| TW102114509A TWI598220B (en) | 2012-04-25 | 2013-04-24 | Methods for making high-density mask for three-dimensional substrates |
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| RU2668664C2 (en) | 2014-04-25 | 2018-10-02 | Джонсон Энд Джонсон Вижн Кэа, Инк. | Methods of patterning and making masks for three-dimensional substrates |
| US9907498B2 (en) * | 2014-09-04 | 2018-03-06 | Verily Life Sciences Llc | Channel formation |
| EP3328166A1 (en) * | 2016-11-29 | 2018-05-30 | IMEC vzw | Method for forming non-flat devices |
| CN111826607A (en) * | 2019-04-18 | 2020-10-27 | 天通（嘉兴）新材料有限公司 | Laser tube cap coating shielding jig |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3900359A (en) * | 1973-02-26 | 1975-08-19 | Dynamics Res Corp | Method and apparatus for television tube shadow mask |
| US3944867A (en) * | 1974-03-15 | 1976-03-16 | Zenith Radio Corporation | Shadow mask having ribs bounding rectangular apertures |
| US4587455A (en) * | 1982-10-12 | 1986-05-06 | Hughes Aircraft Company | Controlled porosity dispenser cathode |
| EP0121564B1 (en) * | 1982-10-12 | 1987-11-25 | Hughes Aircraft Company | Method for fabricating a dispenser-reservoir housing for a dispenser cathode |
| SU1254417A1 (en) * | 1985-01-07 | 1986-08-30 | Предприятие П/Я А-1819 | Method of manufacturing masks for non-flat objects |
| US4702574A (en) | 1985-10-15 | 1987-10-27 | Bausch & Lomb Incorporated | Contact lenses having fluorescent colorants and apparatus for making such lenses |
| US4680500A (en) * | 1986-03-06 | 1987-07-14 | The United States Of America As Represented By The Secretary Of The Air Force | Integral grid/cathode for vacuum tubes |
| JPH03264685A (en) * | 1990-03-13 | 1991-11-25 | Kyushu Hitachi Maxell Ltd | Production of metal mask screen |
| JPH0469617A (en) * | 1990-07-11 | 1992-03-04 | Asahi Chem Ind Co Ltd | Button for contact lens and manufacture of contact lens using same |
| JPH0580530A (en) | 1991-09-24 | 1993-04-02 | Hitachi Ltd | Production of thin film pattern |
| CA2076578A1 (en) * | 1992-08-21 | 1994-02-22 | Miroslav Milinkovic | Mandrel for use in nickel vapour deposition processes and nickel molds made therefrom |
| US5395718A (en) | 1992-11-18 | 1995-03-07 | The Boeing Company | Conformal photolithographic method and mask for manufacturing parts with patterned curved surfaces |
| US5772864A (en) * | 1996-02-23 | 1998-06-30 | Meadox Medicals, Inc. | Method for manufacturing implantable medical devices |
| GB2315078A (en) | 1996-07-06 | 1998-01-21 | Ford Motor Co | Moulding tools |
| US5976340A (en) * | 1997-10-28 | 1999-11-02 | Lockheed Martin Corporation | Method of fabricating elevated temperature application parts with a serrated surface |
| US6162564A (en) | 1997-11-25 | 2000-12-19 | Kabushiki Kaisha Toshiba | Mask blank and method of producing mask |
| AU2001284896A1 (en) | 2000-08-14 | 2002-02-25 | Surface Logix, Inc. | Deformable stamp for patterning three-dimensional surfaces |
| JP2002260547A (en) * | 2001-02-27 | 2002-09-13 | Toshiba Corp | Color cathode-ray tube |
| US7387759B2 (en) | 2002-12-17 | 2008-06-17 | Novartis Ag | System and method for curing polymeric moldings having a masking collar |
| US20060011305A1 (en) * | 2003-09-19 | 2006-01-19 | Donald Sandell | Automated seal applicator |
| US20050074616A1 (en) | 2003-10-02 | 2005-04-07 | John Harchanko | Lithographic method for forming mold inserts and molds |
| US20060043623A1 (en) * | 2004-08-27 | 2006-03-02 | Powell P M | Masked precure of ophthalmic lenses: systems and methods thereof |
| US20060113054A1 (en) | 2004-12-01 | 2006-06-01 | Silvestrini Thomas A | Method of making an ocular implant |
| US7615501B2 (en) * | 2005-08-11 | 2009-11-10 | 3M Innovative Properties Company | Method for making a thin film layer |
| WO2007033060A1 (en) * | 2005-09-12 | 2007-03-22 | Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno | Targets and processes for fabricating same |
| US20090284837A1 (en) * | 2008-05-13 | 2009-11-19 | Micron Technology, Inc. | Method and apparatus providing uniform separation of lens wafer and structure bonded thereto |
| JP2011098487A (en) | 2009-11-05 | 2011-05-19 | Fujifilm Corp | Element array mold and element array molded using the mold |
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2012
- 2012-04-25 US US13/455,209 patent/US9056432B2/en active Active
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2013
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- 2013-03-20 CA CA2810054A patent/CA2810054A1/en not_active Abandoned
- 2013-04-12 AU AU2013204341A patent/AU2013204341B2/en not_active Ceased
- 2013-04-22 KR KR20130044215A patent/KR20130120396A/en not_active Application Discontinuation
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- 2013-04-25 EP EP13165414.7A patent/EP2657009B1/en active Active
- 2013-04-25 CN CN201310148427.1A patent/CN103376564B/en active Active
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| KR20130120396A (en) | 2013-11-04 |
| RU2013119135A (en) | 2014-10-27 |
| BR102013009987A2 (en) | 2015-06-16 |
| IL225131A0 (en) | 2013-06-27 |
| AU2013204341B2 (en) | 2014-12-18 |
| JP2013229605A (en) | 2013-11-07 |
| AU2013204341A1 (en) | 2013-11-14 |
| EP2657009A1 (en) | 2013-10-30 |
| TWI598220B (en) | 2017-09-11 |
| RU2573127C2 (en) | 2016-01-20 |
| CN103376564A (en) | 2013-10-30 |
| US9056432B2 (en) | 2015-06-16 |
| US20130284691A1 (en) | 2013-10-31 |
| JP6246487B2 (en) | 2017-12-13 |
| SG194282A1 (en) | 2013-11-29 |
| IL225131A (en) | 2017-03-30 |
| EP2657009B1 (en) | 2020-02-26 |
| CN103376564B (en) | 2016-11-09 |
| CA2810054A1 (en) | 2013-10-25 |
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