TW201245873A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition Download PDF

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TW201245873A
TW201245873A TW101100444A TW101100444A TW201245873A TW 201245873 A TW201245873 A TW 201245873A TW 101100444 A TW101100444 A TW 101100444A TW 101100444 A TW101100444 A TW 101100444A TW 201245873 A TW201245873 A TW 201245873A
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compound
resin composition
photosensitive resin
meth
group
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TW101100444A
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Chinese (zh)
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TWI613518B (en
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Yoshiko Miya
Hiroyuki Miura
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Sumitomo Chemical Co
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A colored photo-sensitive resin composition and a method for manufacturing a color filter using the same are provided to obtain patterns with superior durability. A colored photo-sensitive resin composition includes a coloring agent, a resin, a polymeric compound, a polymerization initiator, a multi-functional thiol compound, and a solvent. The resin is obtained by forming a copolymer based on a monomer with a C2 to C4 cyclic ether skeleton and an ethylenically unsaturated bond and a monomer with an unsaturated bond, which is copolymerizable with the preceding monomer, and reacting the copolymer with at least one selected from a group composed of unsaturated carboxylic acid and unsaturated carboxylic acid anhydride. The resultant is subsequently reacted with polybasic acid anhydride. The polymerization initiator is an oxime compound.

Description

201245873 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種著色感光性樹脂組成物。 【先前技術】 著色感光性樹脂組成物，係使用於彩色濾光片的製造 。於3本專利公開特開2004-83 8 5 7號公報中係記載有著 色感光性樹脂組成物，其係含有：由苄基甲基丙烯酸酯/ 甲基丙烯酸共聚物所成之樹脂、2-苄基-2-二甲基胺基-( 4-嗎啉基苯基）-丁烷-1-酮、4,4’·雙（二乙基胺基）-二苯 甲酮、季戊四醇肆（3-磺醯基丙酸酯）、光聚合性化合物 、溶if!l、顏料及顏料分散劑。 【發明內容】 於以往之著色感光性樹脂組成物中’所得之圖型的解 像性及耐久性仍存在有未必能滿意的情況。 π發明，係提供以下之Π]〜[9]者。 [1] 一種著色感光性樹脂組成物（colored photosensitive resin composition) ’ 其係含有（A)、( B )、( C )、( D ) 、（E)及（F): (A )著色劑； (B)使下述（a)與（b)共聚合所得之共聚物與（c)產 生反應，接著再與（d )產生反應而得之樹脂； (a):具有碳數2〜4之環狀醚骨架及乙嫌性不飽和鍵 -5- 201245873 的單體（m ο η 〇 m e r ) (b):具有可與（a)共聚合之不飽和鍵，且與（a) 不同的單體 (c ):由不飽和羧酸及不飽和羧酸酐所成之群中所選 出的至少1種 (d ):多元酸酉干 C polybasic acid anhydride) (C )聚合性化合物(polumerable compound): (D)聚合反應起始劑（polymerization initiator)； (E )多官能硫醇化合物(polyfunctional thiol compound )： (F )溶劑。 [2] 如[1]所記載之著色感光性樹脂組成物，其中（D )係肟（oxime )化合物。 [3] 如[1]或[2]所記載之著色感光性樹脂組成物，其 中進一步含有_噸酮（thioxanthone)化合物。 [4] 如[1 ]〜[3]中任一項所記載之著色感光性樹脂組 成物，其中（D)係含有醯基膦氧化物（acyl phosphine oxide)化合物或烷基苯酮（alkylphenone)化合物。 [5] 如[1]〜[4]中任一項所記載之著色感光性樹脂組 成物，其中（b)係含有具有至少1種由三環癸烷（ t r i c y c 1 〇 d e c a n e )骨架（s k e 1 e t ο π )及二環癸嫌（ tricyclodecene)骨架所成之群中所選出的骨架、與乙稀 性不飽和鍵（ethylenically unsaturated bond)之化合物 .201245873 [6] 如[1]〜[5]中任一項所記載之著色感光性樹脂組 成物，其中（a)係具有環氧乙烷基（oxiranyl group)及 乙烯性不飽和鍵之單體。 [7] —種圖型（patern)，其係使用如[1 ]〜[6 ]中任 一項所記載之著色感光性樹脂組成物所形成。 ：8]—種彩色濾光片，其係含有如[7]所記載之圖型 〇 [9] 一種彩色濾光片之製造方法，其係包含下述（1 )〜（3 )所示之步驟： (1)藉由將如[1]〜[6]中任一項所記載之著色感光性 樹脂徂成物塗佈於基板而得到塗佈膜的步驟； (2 )於塗佈膜上，經由遮罩而曝光，以得到曝光後 塗佈膜的步驟； (3 )藉由鹼顯像液使曝光後塗佈膜顯像，以得到圖 型的穸驟》 依據本發明之著色感光性樹脂組成物，係可得到解像 性及耐久性佳之圖型。 岑發明之著色感光性樹脂組成物，係含有著色劑（A )、樹脂（B )、聚合性化合物（C )、聚合反應起始劑 (D )、多官能硫醇化合物（E )及溶劑（F )，樹脂（B )，係使下述（a )與（b )共聚合所得之共聚物與（c ) 產生反應，接著再與（d)產生反應而得之樹脂。 (a):具有碳數2〜4之環狀醚骨架及乙烯性不飽和鍵 的單體 201245873 ( b ) :具有可與（ 〇共聚合之不飽和鍵， 且與 (a ) 不 同 的. 單體 ( c ) :不飽和羧酸 ( d ) :多元酸酐 本· 發明之著色感光性樹脂組成物，係 :含有; 著色 劑( A ) 〇 著- 色劑（A )，雖 可列舉顏料及染料 ，但就耐熱性 % 耐 光 性之觀點而言，係 以含有顔料者爲佳 〇 顏料，係可列舉有 機顏料及無機顏料 ，並可列舉利 用 色 指 數 (The Society of Dyers and Colo urists 出版） 來 分 類 成色素的化合物。 有機顔料，具體而 言，係可列舉例如 :C. I.色素 黃 色 1 、， 5 ' 12' 13' 14 、15、 16、 17、 20 、24、 3 1、 53 、 83 86 、93 、 94 、 109 、110、 117' 125、 128、 137 ' 1 38 139、 147、 148、 15C 、、153、 154、 166、 173' 194 、2 14 等 之 黃色顔料。 C. I.色素橙色13 、31、 36 、 38 ' 40 、42、 43、 5 1 55 > 59 、61、 64、 65、 71、73等之橙色顏 料； C. I.色素紅色9、 97、105、122、1 ： 23、1 44、 1 49 16 6、 168 、 176 、 177 ' 180' 192 ' 209 ' 2 15、2 16、 224 、 242、2 54、2 55、264、265 等之紅色顔料： C· I.色素藍色 15、15: 3、15: 4、15: 6、60 等之藍 色顏料；C. I.色素紫色1、19、23、29、32、36、38等之 紫色顔料； C. I.色素綠色7、36、58等之綠色顏料； 201245873 c· I.色素褐色23' 25等之褐色顏料； C. I·色素黑色1、7等之黑色顏料等。 其中’係以C. I.色素黃色138、150; C. I.色素紅 色177、254、C. I.色素紅紫色23; C· I.色素藍色15: 6 及C_ I.色素綠色36、58爲佳。此等顏料，係可單獨或將 2種以上混合使用。 前述顏料’亦可視需要，而實施松香處理、使用導入 有酸性基或鹼性基之顏料衍生物或顏料分散劑等之表面處 理、對由高分子化合物等所成之顏料表面的接枝處理、以 硫酸微粒法等而進行之微粒化處理、或者是以用來去除雜 質的有機溶劑或水等而進行之洗淨處理、以離子性子雜質 之離子交換法等而進行之去除處理等。此外，顔料，係以 粒徑爲均勻者爲佳。藉由含有顏料分散劑並進行分散處理 ，而可得於溶液中顔料爲均句分散狀態的顏料分散液。 前述顏料分散劑，係可使用市售之界面活性劑，並可 列舉例如：聚矽氧系、氟系、酯系、陽離子系、陰離子系 、非離子系、兩性、聚酯系、聚胺系、丙烯酸系等之界面 活性劑等。前述界面活性劑，除可列舉：聚氧乙烯烷基醚 類 '聚氧乙烯烷基苯基醚類、聚乙二醇二酯類、山梨醇脂 肪酸_類、脂肪酸改質聚酯類、3級胺改質聚胺甲酸酯類 、聚乙烯亞胺類等之外，可以商品名列舉：KP (信越化 學工業（股）製）、FLOWLEN (共榮社化學（股）製） 、Sol:5 perse (Zeneca(股）製）、EFICA_(CIBA 公司製）、 AJISPER ( Ajinomoto Fine-Techno Co·， Inc.製)、 201245873201245873 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a colored photosensitive resin composition. [Prior Art] A colored photosensitive resin composition is used for the production of a color filter. JP-A-2004-83 8 5 7 discloses a coloring photosensitive resin composition containing a resin composed of a benzyl methacrylate/methacrylic acid copolymer, and 2- Benzyl-2-dimethylamino-(4-morpholinylphenyl)-butan-1-one, 4,4'-bis(diethylamino)-benzophenone, pentaerythritol oxime ( 3-sulfonylpropionate), photopolymerizable compound, solvate, pigment, and pigment dispersant. SUMMARY OF THE INVENTION In the conventional coloring photosensitive resin composition, the resolution and durability of the pattern obtained may not be satisfactory. The π invention is provided by the following Π]~[9]. [1] A colored photosensitive resin composition comprising (A), (B), (C), (D), (E) and (F): (A) a colorant; (B) a resin obtained by copolymerizing the following (a) and (b) with (c), and then reacting with (d); (a) having a carbon number of 2 to 4 a monomer having a cyclic ether skeleton and a bivalent unsaturated bond-5-201245873 (m ο η 〇mer ) (b): having an unsaturated bond copolymerizable with (a) and different from (a) (c): at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (d): polybasic acid anhydride (C) a polymerizable compound (poumerable compound): (D) a polymerization initiator; (E) a polyfunctional thiol compound: (F) a solvent. [2] The colored photosensitive resin composition according to [1], wherein (D) is an oxime compound. [3] The colored photosensitive resin composition according to [1] or [2], which further contains a thioxanthone compound. [4] The colored photosensitive resin composition according to any one of [1] to [3] wherein (D) contains an acyl phosphine oxide compound or an alkylphenone. Compound. [5] The colored photosensitive resin composition according to any one of [1] to [4] wherein (b) contains at least one tricyc 1 〇decane skeleton (ske 1) Et ο π ) and the selected skeleton of the tricyclodecene skeleton, and the compound of the ethylenically unsaturated bond. 201245873 [6] such as [1]~[5] The colored photosensitive resin composition according to any one of the preceding claims, wherein (a) is a monomer having an oxiranyl group and an ethylenically unsaturated bond. [7] A pattern (patern) formed by using the colored photosensitive resin composition as described in any one of [1] to [6]. (8) A color filter comprising the pattern of 7[9] as described in [7], a method for producing a color filter, comprising the following (1) to (3); Step: (1) A step of applying a colored photosensitive resin composition according to any one of [1] to [6] to a substrate to obtain a coating film; (2) coating a coating film Exposing through a mask to obtain a coating film after exposure; (3) developing a coating film after exposure by an alkali developing solution to obtain a pattern of a pattern. Coloring sensitivity according to the present invention The resin composition is a pattern in which resolution and durability are excellent. The coloring photosensitive resin composition of the invention contains a coloring agent (A), a resin (B), a polymerizable compound (C), a polymerization initiator (D), a polyfunctional thiol compound (E), and a solvent ( F), the resin (B) is a resin obtained by reacting the copolymer obtained by copolymerizing the following (a) and (b) with (c), and then reacting with (d). (a): a monomer having a cyclic ether skeleton having a carbon number of 2 to 4 and an ethylenically unsaturated bond 201245873 (b): having an unsaturated bond which is copolymerizable with (〇) and different from (a). (c): unsaturated carboxylic acid (d): polybasic acid anhydride. The coloring photosensitive resin composition of the invention is: contains; coloring agent (A) 〇 - coloring agent (A), although pigments and dyes are mentioned However, in terms of heat resistance and light resistance, those containing pigments are preferred as organic pigments and inorganic pigments, and can be classified by color index (published by The Society of Dyers and Colo urists). Compounds which form pigments. Specifically, examples of the organic pigments include: CI Pigment Yellow 1, 5' 12' 13' 14 , 15, 16, 17, 20, 24, 3 1 , 53 , 83 86 , 93 , yellow pigments such as 94, 109, 110, 117' 125, 128, 137 ' 1 38 139, 147, 148, 15C, 153, 154, 166, 173' 194, 2 14 etc. CI pigment orange 13, 31, 36, 38 ' 40 , 42, 43, 5 1 55 > 59, 61, 64, 65, 71, 73, etc. orange pigment; CI pigment red 9, 97, 105, 122, 1: 23, 1 44, 1 49 16 6 , 168 176 , 177 ' 180 ' 192 ' 209 ' 2 15 , 2 16 , 224 , 242 , 2 54 , 2 55 , 264 , 265 , etc . Red pigment: C · I. Pigment blue 15, 15, 3, 15: 4 , blue pigments such as 15: 6, 60; purple pigments of CI pigment purple 1, 19, 23, 29, 32, 36, 38; green pigments of CI pigment green 7, 36, 58; 201245873 c· I . Pigment brown brown pigment such as 23' 25; C. I. Pigment black 1, 7 and other black pigments, etc., wherein 'the system is CI pigment yellow 138, 150; CI pigment red 177, 254, CI pigment red purple 23; C·I. Pigment blue 15: 6 and C_I. Pigment green 36, 58 is preferred. These pigments may be used singly or in combination of two or more kinds. The above-mentioned pigments may be subjected to a rosin treatment, a surface treatment using a pigment derivative or a pigment dispersant into which an acidic group or a basic group is introduced, a graft treatment of a pigment surface formed of a polymer compound or the like, The micronization treatment by the sulfuric acid microparticle method or the like, the cleaning treatment by an organic solvent or water for removing impurities, the removal treatment by ion exchange method using ionic sub-impurities, or the like. Further, it is preferred that the pigment be uniform in particle size. By containing a pigment dispersant and performing a dispersion treatment, a pigment dispersion in which the pigment in a solution is uniformly dispersed can be obtained. As the pigment dispersant, a commercially available surfactant can be used, and examples thereof include polyoxymethylene, fluorine, ester, cationic, anionic, nonionic, amphoteric, polyester, and polyamine. A surfactant such as acrylic or the like. The surfactant may be exemplified by polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyethylene glycol diesters, sorbitol fatty acids, fatty acid modified polyesters, and tertiary grades. Other than amine-modified polyurethanes and polyethyleneimine, KP (Shin-Etsu Chemical Co., Ltd.), FLOWLEN (Kyoeisha Chemical Co., Ltd.), and Sol: 5 perse are listed. (Zeneca), EFICA_ (made by CIBA), AJISPER (made by Ajinomoto Fine-Techno Co., Inc.), 201245873

Disperbyk(BYK公司製）等。此等係可各自單獨或者是 將2種以上組合使用。 使用顏料分散劑時，其使用量，係相對於顔料，較佳 爲1〇〇質量％以下，更佳爲5〜50質量％。若顏料分散劑 之使用量在前述的範圍內，則有可得均勻分散狀態之顏料 分散液的傾向。 著色劑（A )之含量，係相對於著色感光性樹脂組成 物之固體成分，較佳爲5〜60質量％，更佳爲5〜45質量 %。若著色劑（A )之含量在前述之範圍內，則可得到所 期望之分光或色濃度。在此，本說明書中，固體成分係指 著色感光性樹脂組成物去除溶劑後的成分之合計量。 本發明之著色感光性樹脂組成物，係含有樹脂（B ) 。樹脂（B )，係使下述（a )與（b )共聚合所得之共聚 物與（c)產生反應，接著再與（d)產生反應而得之樹脂 〇 (a) :具有碳數2〜4之環狀醚骨架及乙烯性不飽和鍵的 單體 (b) :具有可與（a)共聚合之不飽和鍵’且與（a)不 同的單體 (c ):由不飽和羧酸及不飽和羧酸酐所成之群中所選出 的至少1種 (d ):多元酸酐 (a )係可列舉例如：具有環氧乙烷基及乙烯性不飽 和鍵之單體（a-1)(以下有時稱爲「（a-1)」）、具有 -10- 201245873 環氧丙院基（Oxetanyl groups)及乙烯性不飽和鍵之單體（ a-2)(以下有時稱爲「（a-2)」）'具有四氫呋喃基及 乙烯性不飽和鍵之單體（a-3 )(以下有時稱爲「（ a-3 ) 」）等。 (a-1 )係可列舉例如··具有直鏈烯烴經環氧化的結 構與乙烯性不飽和鍵之單體（a-11)(以下有時稱爲「（ a-1 1 )」）、具有環烯經環氧化的結構與乙烯性不飽和鍵 之單禮（a-12 )(以下有時稱爲「（ a-12 )」）.。 (a-1)係以具有環氧乙烷基與（甲基）丙烯醯氧基 之單體爲佳，以具有（甲基）丙烯醯氧基之（a-12)爲更 佳。 在此，於本說明書中，所謂「（甲基）丙烯醯氧基」 ，係表示至少1種由丙烯醯氧基及甲基丙烯醯氧基所成之 群中所選出。「（甲基）丙烯醯基」及「（甲基）丙烯酸 酯」等之表記也具有相同的含意。 (a-ΙΙ)具體而言，係可列舉：縮水甘油基（甲基） 丙烯酸酯、0 -甲基縮水甘油基（甲基）丙烯酸酯、Θ -乙 基縮水甘油基（甲基）丙烯酸酯、縮水甘油基乙烯基醚、 〇-乙烯基苄基縮水甘油基醚、m-乙烯基苄基縮水甘油基醚 、P-乙烯基苄基縮水甘油基醚、α-甲基-〇-乙烯基苄基縮 水甘油基醚、α-甲基-m-乙烯基苄基縮水甘油基醚、α-甲基乙烯基苄基縮水甘油基醚、2,3-雙（縮水甘油基氧 甲基）苯乙烯、2,4-雙（縮水甘油基氧甲基）苯乙烯、 2,5-雙（縮水甘油基氧甲基）苯乙烯、2,6-雙（縮水甘油 -11 - 201245873 基氧甲基）苯乙烯、2,3,4-參（縮水甘油基氧甲基）苯乙 烯、2,3,5-參（縮水甘油基氧甲基）苯乙烯、2,3,6_參（縮 水甘油基氧甲基）苯乙烯、3,4,5-參（縮水甘油基氧甲基 )苯乙烯、2,4,6-參（縮水甘油基氧甲基）苯乙烯、曰本 特開平7-248625號公報中所記載之化合物等。 (a-12 )係可列舉：乙烯基環己烯單氧化物、u-環 氧基-4 -乙烯基環己烷（例如，CELLOXIDE2000; DAICEL 股份有限公司（Daicel Corporation)製）、3,4-環氧基環 己基甲基丙烯酸酯（例如，CYCLOMER A400 ; DAICEL 股份有限公司製）、3,4-環氧基環己基甲基甲基丙烯酸酯 (例如，CYCLOMER M100; DAICEL股份有限公司製） 、式（I)所表示之化合物、式（II)所表示之化合物等Disperbyk (made by BYK), etc. These may be used alone or in combination of two or more. When the pigment dispersant is used, the amount thereof is preferably 1% by mass or less, and more preferably 5 to 50% by mass based on the total amount of the pigment. When the amount of the pigment dispersant used is within the above range, there is a tendency that a pigment dispersion liquid in a uniformly dispersed state can be obtained. The content of the colorant (A) is preferably from 5 to 60% by mass, more preferably from 5 to 45% by mass, based on the solid content of the colored photosensitive resin composition. If the content of the colorant (A) is within the above range, the desired spectral or color concentration can be obtained. Here, in the present specification, the solid content means the total amount of the components after the coloring photosensitive resin composition removes the solvent. The colored photosensitive resin composition of the present invention contains a resin (B). The resin (B) is obtained by reacting the copolymer obtained by copolymerizing the following (a) and (b) with (c), and then reacting with (d) to obtain a resin ruthenium (a): having a carbon number of 2 a monomer having a cyclic ether skeleton of ~4 and an ethylenically unsaturated bond (b): a monomer (c) having an unsaturated bond which is copolymerizable with (a) and different from (a): from unsaturated carboxylic acid At least one selected from the group consisting of an acid and an unsaturated carboxylic acid anhydride (d): the polybasic acid anhydride (a) may, for example, be a monomer having an oxiranyl group and an ethylenically unsaturated bond (a-1) (hereinafter sometimes referred to as "(a-1)"), a monomer (a-2) having -10-201245873 Oxetanyl groups and ethylenically unsaturated bonds (hereinafter sometimes referred to as "(a-2)")" A monomer (a-3) having a tetrahydrofuranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(a-3)"). (a-1), for example, a monomer (a-11) having a structure in which a linear olefin is epoxidized and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(a-1 1 )"), A single ritual (a-12) having a cyclic epoxidized structure and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(a-12)"). (a-1) is preferably a monomer having an oxirane group and a (meth) propylene fluorenyloxy group, and more preferably having a (meth) propylene fluorenyloxy group (a-12). Here, in the present specification, "(meth)acryloxyloxy group" means at least one selected from the group consisting of an acryloxy group and a methacryloxy group. The expressions "(meth)acrylonitrile" and "(meth)acrylate" have the same meaning. (a-ΙΙ) Specifically, glycidyl (meth) acrylate, 0-methyl glycidyl (meth) acrylate, Θ-ethyl glycidyl (meth) acrylate , glycidyl vinyl ether, 〇-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, P-vinylbenzyl glycidyl ether, α-methyl-hydrazine-vinyl Benzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methylvinylbenzyl glycidyl ether, 2,3-bis(glycidyloxymethyl)benzene Ethylene, 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidol-11 - 201245873-based oxymethyl ) styrene, 2,3,4-gins (glycidyloxymethyl)styrene, 2,3,5-gin (glycidyloxymethyl)styrene, 2,3,6-gin (glycidol) Base oxymethyl)styrene, 3,4,5-gin (glycidyloxymethyl)styrene, 2,4,6-gin (glycidyloxymethyl)styrene, 曰本特开平7- The description described in the 248625 bulletin And the like. (a-12): vinylcyclohexene monooxide, u-epoxy-4-vinylcyclohexane (for example, CELLOXIDE 2000; manufactured by Daicel Corporation), 3, 4 -Epoxycyclohexyl methacrylate (for example, CYCLOMER A400; manufactured by DAICEL Co., Ltd.), 3,4-epoxycyclohexylmethyl methacrylate (for example, CYCLOMER M100; manufactured by DAICEL Co., Ltd.) a compound represented by the formula (I), a compound represented by the formula (II), etc.

[式（1)及式（II)中，R1及R2，係各自獨立表示氫原子 '或碳數1〜4之烷基，且該烷基所含有的氫原子，亦可 被經基所取代。 X1及 X2，係各自獨立表示單鍵、-R3-、* -R3-〇_、 * -R -s-、* ·Κ3_ΝΗ_。 R係表示碳數1〜6之院二基（alkanediylgroups)。 *係表示與〇之鍵結鍵]。 -12- 201245873 碳數1〜4之烷基，具體而言，係可列舉：甲基、乙 基' η-丙基、異丙基、η-丁基、sec-丁基、tert-丁基等。 可被羥基所取代之烷基，係可列舉：羥甲基、1 -羥乙 基、2-羥乙基、1-羥丙基、2-羥丙基、3-羥丙基、1-羥基-1-甲基乙基、2-羥基-1·甲基乙基、1-羥丁基、2-羥丁基、 3-羥Γ基、4-羥丁基等。 R1及R2，係較佳爲可列舉：氫原子、甲基、羥甲基 、1-羥乙基' 2-羥乙基，更佳爲可列舉：氫原子、甲基。 院二基（alkanediyl groups)，係可列舉：伸甲基、伸 乙基、丙烷-1，2-二基、丙烷-1,3-二基、丁烷-1,4-二基、 戊烷·1，5-二基、己烷-1，6-二基等。 X1及X2，係較佳爲可列舉：單鍵、伸甲基、伸乙基 、* ·οη2-ο- ( *係表示與〇之鍵結鍵）基、 * -CH2CH2-〇-基，更佳爲可列舉：單鍵、* -ch2ch2-〇-基。 弍（I )所表示之化合物，係可列舉式（I - 1 )〜式（ 1-15 )所表示之化合物《較佳爲可列舉式（Ι·ι )、式（ 3)、式（1-5)、式（1-7)、式（1-9)、式（u】）〜式 (I-1 5 )中任一者所表示之化合物。更佳爲可列舉式（i )、式（1-7 ) '式（1-9 )、式（1-15 )中任—者所表示 之化合物。 -13- 201245873 i? o II h2c=ch-c-o—m h2c：=ch-c—o[In the formulae (1) and (II), R1 and R2 each independently represent a hydrogen atom' or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group may be substituted by a trans group. . X1 and X2 each independently represent a single bond, -R3-, *-R3-〇_, *-R-s-, *·Κ3_ΝΗ_. The R system represents alkaneiyl groups of carbon numbers 1 to 6. * indicates the bond with the ]]. -12- 201245873 Alkyl group having 1 to 4 carbon atoms, specifically, methyl, ethyl ' η-propyl, isopropyl, η-butyl, sec-butyl, tert-butyl Wait. The alkyl group which may be substituted by a hydroxyl group may, for example, be a methylol group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group or a 1-hydroxy group. 1-methylethyl, 2-hydroxy-1.methylethyl, 1-hydroxybutyl, 2-hydroxybutyl, 3-hydroxydecyl, 4-hydroxybutyl, and the like. R1 and R2 are preferably a hydrogen atom, a methyl group, a methylol group or a 1-hydroxyethyl '2-hydroxyethyl group, and more preferably a hydrogen atom or a methyl group. Alkanediyl groups, for example, methyl, ethyl, propane-1,2-diyl, propane-1,3-diyl, butane-1,4-diyl, pentane · 1,5-diyl, hexane-1,6-diyl, and the like. X1 and X2 are preferably a single bond, a methyl group, an ethyl group, a * οη2-ο- (* means a bond with a fluorene bond), a *-CH2CH2-〇- group, and Good can be listed: single bond, * -ch2ch2-〇-based. The compound represented by the formula (I) is a compound represented by the formula (I-1) to the formula (1-15). Preferably, the formula (Ι·ι), the formula (3), and the formula (1) are exemplified. -5) A compound represented by any one of the formula (1-7), the formula (1-9), the formula (u) to the formula (I-1 5 ). More preferably, it is a compound represented by the formula (i), the formula (1-7) 'formula (1-9), or the formula (1-15). -13- 201245873 i? o II h2c=ch-c-o-m h2c:=ch-c-o

o Η2〇=ΟΗ—C-O—C2H4—; α·ι) o so Η2〇=ΟΗ—C-O—C2H4—; α·ι) o s

σ-2) H2〇=CH—C~0 n o (Ι·3)Σ-2) H2〇=CH—C~0 n o (Ι·3)

HH

HjCsCH—C—O—C2H4·o H^C=CH—C*-O 〇2H4t«〇 ch3o HjCssC—C-^ α-4)HjCsCH—C—O—C2H4·o H^C=CH—C*-O 〇2H4t«〇 ch3o HjCssC—C-^ α-4)

(1-5)(1-5)

σ_7>Σ_7>

CH3〇 U—S HCH3〇 U-S H

HjCsssC—C—〇 —C2H4—SHjCsssC—C—〇—C2H4—S

α·6) ch3o H^CsC-—O—CHj··6) ch3o H^CsC-—O—CHj

OO

(1-9) Η20=Π- ch2oh o H2C=C-C-(1-9) Η20=Π- ch2oh o H2C=C-C-

™〇-^2H4—NTM〇-^2H4—N

α-8)-8-8)

(HO) ο(HO) ο

HjCasC—C—O—C2H4HjCasC—C—O—C2H4

HjC j ，J CH3〇 II —C—o 一C2H4—oHjC j , J CH3〇 II —C—o A C2H4—o

15) (1-13) c^h4oh o c ™*015) (1-13) c^h4oh o c TM*0

(1-12)o (1-14) 式（Π)所表示之化合物，係可列舉式（)〜式 (11 -1 5 )所表示之化合物。較佳爲可列舉式（丨：_丨）、式 (II-3)、式（II-5)、式（II-7)、式（II-9) '式（Π_ Η)〜式（Π-15)中任一者所表示之化合物。更佳爲可 列舉式（ΙΙ-1 )、式（ΙΙ-7 )、式（ΙΙ-9 ) '式（Π-15 ) 中任一者所表示之化合物。 14- 201245873 Ο(1-12) o (1-14) The compound represented by the formula (Π) is a compound represented by the formula () to the formula (11 - 15). Preferably, it is a formula (丨: 丨), a formula (II-3), a formula (II-5), a formula (II-7), a formula (II-9), a formula (Π_ Η)~ -15) A compound represented by any one of them. More preferably, it is a compound represented by any one of the formula (ΙΙ-1), the formula (ΙΙ-7), and the formula (ΙΙ-9) 'Formula (Π-15). 14- 201245873 Ο

弍（I )所表示之化合物及式（II )所表示之化合物 ，係可各自單獨使用。此外，此等係可以任意比例進行混 合。進行混合時，其混合比例係以莫耳比計，且式（1) :式（II)較佳爲5: 95〜95: 5，更佳爲10: 90〜90: 1 0，特別佳爲2 0 : 8 0〜8 〇 : 2 0。 (a-2)係以具有環氧丙烷基（Oxetanyl groups)與（甲 基）丙烯醯氧基之單體爲佳。（a-2 )係可列舉例如：3 - 甲基- 3-(甲基）丙烯醯基氧甲基環氧丙烷、3-乙基-3-( 甲基）丙烯醯基氧甲基環氧丙烷、3 -甲基- 3-(甲基）丙 燃醯基氧乙基環氧丙院' 3_乙基-3-(甲基）丙嫌醢基氧 -15- 201245873 乙基環氧丙烷等。 (a-3)係以具有四氫呋喃基與（甲基）丙烯醯氧基 之單體爲更佳。（a-3 )，具體而言，係可列舉：四氫糠 基丙烯酸酯（例如，VIS COAT V#1 50、大阪有機化學工業 (股）製）、四氫糠基甲基丙烯酸酯等。 (b )係可列舉例如：甲基（甲基）丙烯酸酯、乙基 (甲基）丙烯酸酯、η-丁基（甲基）丙烯酸酯、sec-丁基 (甲基）丙烯酸酯、tert-丁基（甲基）丙烯酸酯等之（甲 基）丙烯酸烷基酯類； 環己基（甲基）丙烯酸酯、2-甲基環己基（甲基）丙 烯酸酯、三環〔5.2·1.02’6〕癸烷-8-基（甲基）丙烯酸酯 (於該技術領域中，慣用名亦有稱爲二環戊二烷基（ Dicyclopentanyl)(甲基）丙烯酸酯）、二環戊二烷基氧 乙基（甲基）丙烯酸酯、異莰基（甲基）丙烯酸酯等之（ 甲基）丙烯酸環狀烷基酯類； 苯基（甲基）丙烯酸酯、苄基（甲基）丙烯酸酯等之 (甲基）丙烯酸芳基或芳烷基酯類； 馬來酸二乙酯、富馬酸二乙酯、衣康酸二乙酯等之二 羧酸二酯； 2-羥乙基（甲基）丙烯酸酯、2-羥丙基（甲基）丙烯 酸酯等之羥基烷基酯類； 雙環[2.2.1]庚-2-烯、5-甲基雙環[2.2.1]庚-2-烯、5-乙基雙環[2.2.1]庚-2-烯、5-羥基雙環[2.2.1]庚-2-烯、5-羥甲基雙環[2.2.1]庚-2-烯、5- (2，-羥乙基）雙環[2.2.1] -16- 201245873 、5-乙氧基雙環The compound represented by the formula (I) and the compound represented by the formula (II) can be used singly. In addition, these can be mixed in any ratio. When mixing, the mixing ratio is in molar ratio, and the formula (1): formula (II) is preferably 5: 95 to 95: 5, more preferably 10: 90 to 90: 1 0, particularly preferably 2 0 : 8 0~8 〇: 2 0. (a-2) is preferably a monomer having an oxyalkylene group and a (meth)acryloxy group. (a-2) may, for example, be 3-methyl-3-(meth)acryloyloxymethyl propylene oxide, 3-ethyl-3-(methyl) propylene fluorenyloxymethyl epoxide Propane, 3-methyl-3-(methyl)propanyloxyethyl epoxide propylene 3- 'ethyl-3-(methyl)-propyl decyloxy-15- 201245873 Ethyl propylene oxide Wait. (a-3) is more preferably a monomer having a tetrahydrofuranyl group and a (meth)acryloxy group. (a-3), specifically, tetrahydrofurfuryl acrylate (for example, VIS COAT V#1 50, manufactured by Osaka Organic Chemical Industry Co., Ltd.), tetrahydrofurfuryl methacrylate, or the like. (b) Examples thereof include methyl (meth) acrylate, ethyl (meth) acrylate, η-butyl (meth) acrylate, sec-butyl (meth) acrylate, tert- (meth)acrylic acid alkyl esters such as butyl (meth) acrylate; cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2·1.02'6 ] decane-8-yl (meth) acrylate (also known in the art as dicyclopentanyl (meth) acrylate), dicyclopentadienyl oxygen (Methyl)acrylic acid cyclic alkyl esters such as ethyl (meth) acrylate and isodecyl (meth) acrylate; phenyl (meth) acrylate, benzyl (meth) acrylate, etc. An aryl or aralkyl ester of (meth)acrylic acid; a dicarboxylic acid diester of diethyl maleate, diethyl fumarate, diethyl itaconate; 2-hydroxyethyl (A) Hydroxyalkyl esters of acrylates, 2-hydroxypropyl (meth) acrylates, etc.; bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2- Alkene, 5- Bicyclo[2.2.1]hept-2-ene, 5-hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2, -hydroxyethyl)bicyclo[2.2.1] -16- 201245873 , 5-ethoxybicyclo

庚-2-烯、5-甲氧基雙環[2.2.1]庚_2_嫌、5_乙 [2.2.1] 庚-2-烯、 羥甲基）雙環[2_ [2.2.1] 庚-2-烯、 乙氧基雙環[2.2.1]庚·2·烯' 5·羥基_5-甲基雙環[2 2〗]庚 5-羥甲基-5-甲 2-烯、5-羥基-5-乙基雙環[2.2.1]庚_2_嫌、 基雙環[2.2.1]庚-2-烯、5-tert_ 丁氧基羰基雙環[2.21]庚_ 2-嫌、5-環己基氧代羰基雙環[^^庚-2 —烯' 5_苯氧基羯 基雙環[2.2.1]庚-2-烯、5,6·雙（tert_ 丁氧基羰基）雙環 [2.2.1]庚-2-烯、5,6·雙（環己基氧代羰基）雙環[221] 庚-2-烯等之雙環不飽和化合物類； N-苯基馬來醯亞胺、N -環己基馬來醯亞胺、N_节基馬 來醯亞胺、N-琥珀醯亞胺-3 -馬來醯亞胺苯甲酸酯、N _號 珀醯亞胺-4-馬來醯亞胺丁酸酯、N_琥珀醯亞胺_6_馬來醯 亞胺己酸酯（caproate ) 、N-琥珀醯亞胺-3-馬來醯亞胺丙 酸酯、N- ( 9-吖啶基）馬來醯亞胺等之二羰基醯亞胺衍生 物類： 苯乙烯、α-甲基苯乙烯、甲基苯乙烯、p-甲基苯 乙烯 乙烯基甲苯' P-甲氧基苯乙烯、丙烯腈、甲基丙烯 腈、氯乙烯、二氯亞乙烯、丙烯酸醯胺、甲基丙烯酸醯胺 、乙酸乙燃、1，3-丁二嫌、異戊二儲（isoprene) 、2,3 -二 甲基·1，3-丁二烯等。 此外，（b )係可列舉具有：至少1種由三環癸烷骨 架及三環癸烯骨架所成之群中所選出的骨架、與乙烯性不 -17- 201245873 飽和鍵之化合物（bl)(以下有時稱爲「（bl)」）。 當（b)爲（bl)時，可抑制因顯像所致之圖型的膜 削減》 在此，本說明書中之「三環癸烷骨架」及「三環癸烯 骨架」，係分別指以下之結構（各別鍵結鍵係任意之碳原 子）。Hept-2-ene, 5-methoxybicyclo[2.2.1]heptan-2-y,5-ethyl[2.2.1]hept-2-ene, hydroxymethyl)bicyclo[2_[2.2.1] g 2-ene, ethoxybicyclo[2.2.1]heptan-2-ene '5-hydroxy-5-methylbicyclo[2 2]hept-5-hydroxymethyl-5-methyl-2-ene, 5- Hydroxy-5-ethylbicyclo[2.2.1]heptan-2-y, bisbicyclo[2.2.1]hept-2-ene, 5-tert_butoxycarbonylbicyclo[2.21]g- 2-, 5- Cyclohexyloxycarbonylbicyclo[^^hept-2-ene]5-phenoxyindenylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2. 1] a bicyclic unsaturated compound such as hept-2-ene, 5,6·bis(cyclohexyloxycarbonyl)bicyclo[221]hept-2-ene; N-phenylmaleimide, N-ring Hexylmalanimine, N-based smectin, N-succinimide-3-maleimide benzoate, N-type peryleneimine-4-Malaya Aminobutyrate, N_succinimide _6_maleimide caproate (caproate), N-succinimide-3-maleimide propionate, N-(9-吖Dicarbonyl quinone imine derivatives such as pyridine), maleimide, etc.: styrene, α-methylstyrene, methylstyrene, p- Styrene vinyl toluene 'P-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, dichloroethylene vinyl, decylamine amide, decylamine methacrylate, ethyl acetate, 1,3-butyl Two suspects, isoprene, 2,3-dimethyl-1,3-butadiene, etc. Further, (b) may be a compound having at least one selected from the group consisting of a tricyclodecane skeleton and a tricyclodecene skeleton, and a compound having a saturated bond with an ethyl group of not -17-201245873 (bl). (The following is sometimes referred to as "(bl)"). When (b) is (bl), the film reduction of the pattern due to development can be suppressed. Here, the "tricyclodecane skeleton" and the "tricyclic terpene skeleton" in the present specification are respectively referred to The following structure (each bond bond is an arbitrary carbon atom).

三環癸烷骨架Tricyclodecane skeleton

三環癸烯骨架 (bl)，具體而言，係可列舉：二環戊二烷基（甲基 )丙烯酸酯' 二環戊二烯基（甲基）丙烯酸酯、二環戊二 烷基氧乙基（甲基）丙烯酸酯、二環戊二烯基氧乙基（甲 基）丙烯酸酯。 (b)係可各自單獨或者是將2種以上組合使用。 使（b ) 2種以上組合使用時，至少1種係以上述b 1 者爲佳，另1種，係以上述b中之苯基（甲基）丙烯酸酯 、苄基（甲基）丙烯酸酯等芳烷基酯類（以下有時稱爲「 (b2 )」）者爲佳。 於使（a) 、（bl)及（b2)共聚合所得之共聚物中 ’相對於使（a) 、（bl)及（b2)共聚合所得之共聚物 -18- 201245873 的比例，各單體所產生之構造單位的比例，係必 圍爲佳。 (a)所產生之構造單位：1〇〜90莫耳％ ( 〜80莫耳％ ) (b 1 )所產生之構造單位：5〜8 0莫耳％ ( 〜60莫耳％ ) (b2)所產生之構造單位：5〜60莫耳％ ( 〜40莫耳％ ) 其中，（a) 、 （bl)及（b2)之合計，係 莫耳％以下。若前述構成比例在上述範圍內，貝！J 成爲良好的傾向。 (c)具體而言，係可列舉：丙烯酸、甲基 巴豆酸、〇-乙烯基苯甲酸、m-乙烯基苯甲酸、ρ· 甲酸等之不飽和單羧酸類： 馬來酸、富馬酸、檸康酸、中康酸、衣康酸 基苯二甲酸、4 -乙烯基苯二甲酸、3，4,5,6 -四氫 、1，2,3,6 -四氫苯一甲酸、—甲基四氫苯二甲酸 己烯二羧酸等之不飽和二羧酸類； 含有甲基-5 -原冰片烯-2,3 -二羧酸、5-; [2.2.1]庚-2-烯、5,6-二羧基雙環[m]庚-2·烯 5_甲基雙環[2_2.1]庚_2-稀、5-殘基-5-乙基雙環 2-烯、5-羧基_6-甲基雙環[2.2.1]庚·2_嫌、5_殘 雙環[2.2.1]庚-2-稀等之翔基的雙環不飽和化合牧 馬，來酸酐、檸康酸酐、衣康酸酐、3 _乙燃基 L下述之範 更佳爲30 更佳爲1 0 更佳爲1 0 設爲1 0 0 有硬化性 丙烯酸、 -乙烯基苯 ί、3-乙烯 苯二甲酸 、1、4-環 竣基雙環 、5-羧基-[2.2.1]庚-基-6-乙基 類； 苯二甲酸 -19- 201245873 酐、4-乙烯基苯二甲酸酐、3，4,5，6 -四氫苯二甲酸酐、 1，2,3，6-四氫苯二甲酸酐、二甲基四氫苯二甲酸酐、5，6-二 羧酸雙環[2.2.1]庚-2-烯酐（納迪克酸酐）等之不飽和二 羧酸酐類； 琥珀酸單[2-(甲基）丙烯醯基氧乙基]、苯二甲酸單 [2-(甲基）丙烯醯基氧乙基]等之2元以上的多元羧酸之 不飽和單[(甲基）丙烯醯基氧烷基]酯類； 如α-(羥甲基）丙烯酸般，於同一分子中，含有趣 基及羧基之不飽和丙烯酸酯類等。 此等之中，就共聚合反應性之觀點或鹼溶解性之觀點 而言，以使用丙.稀酸、甲基丙烯酸、馬來酸酐等爲佳。 (c )之附加量，係以添加値換算，且相對於使（a ) 、（bl)及（b2)共聚合所得之共聚物，以10〜60質量 %爲佳，30〜40質量％爲更佳。 (d )係可使用眾所周知者，並可列舉：馬來酸酐、 琥珀酸酐、衣康酸酐、苯二甲酸酐、四氫苯二甲酸酐、六 氫苯二甲酸酐、氯橋酸酐等之二元酸酐；偏苯三甲酸酐、 苯均四酸酐、二苯甲酮四羧酸酐、聯苯四羧酸酐等之多元 酸酐。其中就顯像性之觀點而言，較佳爲四氫苯二甲酸酐 或琥珀酸酐。 (d)之加成反應，係可藉由在使單體附加於共聚物 時一般所使用的方法來進行。（d)之附加量，係丙烯基 、甲基丙嫌基（methacrylic)等之感光基導入時所生成之 羥基的5〜100莫耳％，較佳爲30〜1〇〇莫耳％之比例。 -20- 201245873 (d:之附加量爲未達丙嫌基、甲基丙稀基（methacrylic )等之感光基導入時所生成之羥基的5莫耳％時，對稀有 鹼之溶解性會降低。 樹脂（B)之含量，係相對於本發明之著色感光性樹 脂組成物100質量份，一般爲0.5〜30質量份，較佳爲1 〜20質量份，更佳爲2〜1 5質量份。 本發明之著色感光性樹脂組成物，係含有聚合性化合 物（C )。 聚合性化合物（C )，係可藉由聚合反應起始劑（D )所產生之活性自由基及酸等而聚合之化合物，可列舉例 如具有聚合性之乙烯性不飽和鍵之化合物等，較佳爲可列 舉（甲基）丙烯酸酯化合物。 具有1個乙烯性不飽和鍵之聚合性化合物（C)，係 可列舉與前述（a ) 、（ b )及（c )所列舉的化合物相同 者’其中’以（甲基）丙烯酸酯類爲佳。 具有2個乙烯性不飽和鍵之聚合性化合物（C )，係 可列舉：1，3·丁烷二醇二（甲基）丙烯酸酯、i，3-丁烷二 醇（甲基）丙烯酸酯、1，6-己烷二醇二（甲基）丙烯酸酯 、乙二醇二（甲基）丙烯酸酯、二乙二醇二（甲基）丙烯 酸醋’‘新戊基二醇二（甲基）丙烯酸酯、三乙二醇二（甲 基）丙烯酸酯、四乙二醇二（甲基）丙烯酸酯、聚乙二醇 二丙姑酸酯、雙酚A之雙（丙烯醯氧乙基）醚、乙氧基 化雙P A二（甲基）丙烯酸酯、丙氧基化新戊基二醇二 (甲基）丙烯酸酯、乙氧基化新戊基二醇二（甲基）丙烯 -21 - 201245873 酸酯、3-甲基戊烷二醇二（甲基）丙烯酸酯等。 具有3個以上之乙烯性不飽和鍵之聚合性化合物（C )，係可列舉：三羥甲基丙烷三（甲基）丙烯酸酯、季戊 四醇三（甲基）丙烯酸酯、參（2-羥乙基）異氰尿酸三（ 甲基）丙烯酸酯、乙氧基化三羥甲基丙烷三（甲基）丙烯 酸酯、丙氧基化三羥甲基丙烷三（甲基）丙烯酸酯、季戊 四醇四（甲基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸 酯' 二季戊四醇六（甲基）丙烯酸酯、三季戊四醇四（甲 基）丙烯酸酯、三季戊四醇五（甲基）丙烯酸酯、三季戊 四醇六（甲基）丙烯酸酯、三季戊四醇七（甲基）丙烯酸 酯、三季戊四醇八（甲基）丙烯酸酯、季戊四醇三（甲基 )丙烯酸酯與酸酐之反應物、二季戊四醇五（甲基）丙烯 酸酯與酸酐之反應物、三季戊四醇七（甲基）丙烯酸酯與 酸酐己內酯改質三羥甲基丙烷三（甲基）丙烯酸酯、己內 酯改質季戊四醇三（甲基）丙烯酸酯、己內酯改質參（2_ 羥乙基）異氰尿酸三（甲基）丙烯酸酯、己內酯改質季戊 四醇四（甲基）丙烯酸酯、己內酯改質二季戊四醇五（甲 基）丙烯酸酯、己內酯改質二季戊四醇六（甲基）丙烯酸 酯、己內酯改質三季戊四醇四（甲基）丙烯酸酯、己內酯 改質三季戊四醇五（甲基）丙烯酸酯、己內酯改質三季戊 四醇六（甲基）丙烯酸酯、己內酯改質三季戊四醇七（甲 基）丙烯酸酯、己內酯改質三季戊四醇八（甲基）丙烯酸 酯、己內醋改質季戊四醇三（甲基）丙烯酸酯與酸酐之反 應物、己內酯改質二季戊四醇五（甲基）丙烯酸酯與酸酐 -22- 201245873 之反應物、己內酯改質三季戊四醇七（甲基）丙烯酸酯與 酸酐等。 其中，以3官能以上之單體爲佳，以二季戊四醇六（ 甲基）丙烯酸酯爲更佳。 聚合性化合物（C )之含量，係相對於著色感光性樹 脂組成物之固體成分，以5〜50質量％爲佳，以1〇〜45 質量％爲更佳。此外，相對於樹脂（B )及聚合性化合物 (C)之合計量，較佳爲20〜80質量％，更佳爲40〜60 質量％。若聚合性化合物（C)之含量在前述之範圍內， 則會有感度、或圖型的強度或平滑性、信賴性成爲良好的 傾向。 本發明之著色感光性樹脂組成物，係含有聚合反應起 始劑（D )。 聚合反應起始劑（D )，係只要藉由光的作用而產生 活性自由基或酸等，並開始聚合性化合物（C)之聚合的 化合物，便無特別限定，且可使用眾所周知之聚合反應起 始劑β 聚合反應起始劑（D )，係以雙咪唑化合物、烷基苯 酮化合物、三氮雜苯化合物、醯基膦氧化物化合物、肟化 合物爲佳。此外，亦可使用日本特開2008- 1 8 1 087號公報 所記«之光陽離子聚合反應起始劑（例如，由鑰陽離子與 路易士酸所產生之陰離子所構成者）。其中，就感度之觀 點而1『，以肟化合物爲佳。 肓:j述雙咪唑化合物，係可列舉：2,2’-雙（2-氯基苯基 -23- 201245873 )-4,4，5,5 -四本基雙咪唑、2,2，-雙（2,3-二氯基苯基）· 4,4’，5,5’-四苯基雙咪唑（例如，參照日本特開平6 753 72 號公報、日本特開平6-75373號公報等）、2,2,_雙（2_氯 基苯基）-4,4’，5,5，-四苯基雙咪唑、2,2，-雙（2_氯基苯基 )-4,4，5,5 -四（院氧基苯基）雙咪哩、2,2，_雙（2-氯基 苯基）-4,4’，5,5’-四（二烷氧基苯基）雙咪唑、2,2，_雙（ 2-氯基苯基）_4,4，，5,5’-四（三烷氧基苯基）雙咪唑（例 如’參照日本特公昭48-3 84〇3號公報、日本特開昭 62- 1 74204號公報等）、4,4，，5,5，_位之苯基被碳烷氧基所 取代之咪嗤化合物（例如，參照日本特開平7 _丨〇 9 1 3號公 報等）等。較佳爲可列舉：2,2，-雙（2_氯基苯基）_ 4,4’，5’5’-四苯基雙咪唑、22’_雙（2、3_二氯基苯基）-4,4，5,5’-四苯基雙咪唑、2,2，_雙（2、4_二氯基苯基）_ 4,4’，5,5’-四苯基雙咪哩。 院基苯酮化合物，係指具有以式（d2 )所表示之部分 結構或式（d3)所表示之部分結構的化合物。於此等之部 分結構中苯環，亦可具有取代基。 〇rV、㈣ 〇rV、(d3) M胃&式（d2 )所表示之部分結構的化合物，係可列 舉例如：2'甲基-2-嗎啉基-1- ( 4-甲基磺醯基苯基）丙烷- 卜嗣' 2-=甲基胺基-1·(4-嗎啉基苯基）-2-苄基丁烷-1- 酮·、及2·(二甲基胺基）·2-〔 （4-甲基苯基）甲基〕-1- 〔4_(4-嗎啉基）苯基〕丁烷-1-酮。亦可使用Irgacure ( -24- 201245873 註冊商標）369' 907及379(以上’ BASF公司製）等之 市售品。 具有以式（d3 )所表示之部分結構的化合物，係可列 舉例如：2-羥基-2-甲基-1-苯基丙烷-1-酮、2-羥基-2-甲 基-1-〔4- (2-羥基乙氧基）苯基〕丙烷-1-酮、1-羥基環 己基苯基酮、2-羥基-2-甲基-1-( 4-異丙烯基苯基）丙烷-1-酮之寡聚物、及α,α-二乙氧基苯乙酮、苄基二甲基縮 酮(Benzyl dimethyl ketal ) ° 前述之三氮雜苯化合物，係可列舉：2,4-雙（三氯基 甲基）-6-( 4-甲氧基苯基）-1,3,5-三氮雜苯、2,4-雙（三 氯基甲基）-6- ( 4-.甲氧基萘基）-1，3,5-三氮雜苯、2,4-雙 (三氯基甲基）-6-向日葵基-1，3,5-三氮雜苯、2,4-雙（三 氯基甲基）-6·(4-甲氧基苯乙烯基）-1，3,5-三氮雜苯、2,4-雙（三氯基甲基）-6-〔2-(5-甲基呋喃-2-基）乙烯基〕_ 1，3,5.三氮雜苯、2,4-雙（三氯基甲基）-6-〔2-(呋喃_2_ 基）乙烯基〕_1，3,5_三氮雜苯、2,4-雙（三氯基甲基）-6-〔2- : 4-二乙基胺基-2-甲基苯基）乙烯基〕-1，3,5·三氮雜 苯、2,4-雙（三氯基甲基）-6-〔2- (3，4-二甲氧基苯基） 乙烯基〕1,3,5-三氮雜苯等。 前述之醯基膦氧化物起始劑，係可列舉：2,4,6-三甲 基苯甲醯基二苯基膦氧化物等。亦可使用Irgacure 819 ( 汽巴•日本公司製）等之市售品。 前述之肟化合物，係可列舉·· N-苯甲醯基氧基-1-( 4_苯基磺醯基苯基）丁烷-1-酮-2-亞胺、N-苯甲醯基氧基_ -25- 201245873 1-(4-苯基磺醯基苯基）辛烷-1-酮-2-亞胺、1乙醯氧基-l-〔9-乙基·6·(2-甲基苯甲醯基）-9H-咔唑-3-基〕乙烷· 1-亞胺、N-乙醯氧基-1-〔 9-乙基-6- { 2-甲基-4- ( 3,3-二 甲基-2,4-二氧雜環戊二烷基甲基氧基）苯甲醯基} -9H-咔 哩-3 -基〕乙院-1-亞胺等。亦可使用Irgacure OXE-01、 OXE-02 (以上，BASF 日本公司製）、N-1 9 1 9 ( ADEKA 公司製）等之市售品。 此外，具有可引起鏈轉移之聚合反應起始劑，係亦可 使用日本特表2002-544205號公報所記載之光聚合反應起 始劑。 前述之具有可引起鏈轉移之.聚合反應起始劑，係可列 舉例如以下述式（D-1 )〜（D-6)之化合物。The tricyclic terpene skeleton (bl), specifically, dicyclopentadienyl (meth) acrylate 'dicyclopentadienyl (meth) acrylate, dicyclopentadienyloxy Ethyl (meth) acrylate, dicyclopentadienyl oxyethyl (meth) acrylate. (b) Each of them may be used alone or in combination of two or more. When two or more types of (b) are used in combination, at least one of them is preferably the above b 1 , and the other is a phenyl (meth) acrylate or a benzyl (meth) acrylate in the above b. The arylalkyl esters (hereinafter sometimes referred to as "(b2)") are preferred. The ratio of the copolymer -18-201245873 obtained by copolymerizing (a), (bl) and (b2) in the copolymer obtained by copolymerizing (a), (bl) and (b2), each The proportion of the structural units produced by the body is better. (a) The structural unit produced: 1〇~90mol% (~80mol%) (b 1) The resulting structural unit: 5~8 0mol% (~60mol%) (b2) The structural unit produced is: 5 to 60 mol% (~40 mol%) wherein the total of (a), (bl) and (b2) is less than or equal to mol%. If the aforementioned composition ratio is within the above range, Bay! J is a good trend. (c) Specifically, an unsaturated monocarboxylic acid such as acrylic acid, methyl crotonic acid, fluorene-vinyl benzoic acid, m-vinyl benzoic acid or ρ·carboxylic acid may be mentioned: maleic acid, fumaric acid , citraconic acid, mesaconic acid, itaconic acid phthalic acid, 4-vinyl phthalic acid, 3,4,5,6-tetrahydro, 1,2,3,6-tetrahydrobenzene carboxylic acid, - an unsaturated dicarboxylic acid such as methyltetrahydrophthalic acid hexene dicarboxylic acid; containing methyl-5-formylbornene-2,3-dicarboxylic acid, 5-; [2.2.1] g-2 - alkene, 5,6-dicarboxybicyclo[m]hept-2-ene-5-methylbicyclo[2_2.1]heptane-2-diluted, 5-resin-5-ethylbicyclo-2-ene, 5- Carboxy-6-methylbicyclo[2.2.1]heptan-2-y,5-residual bicyclo[2.2.1]heptene-2-thylene, etc., a bicyclic unsaturated compound horse, an anhydride, citraconic anhydride , itaconic anhydride, 3 _ ethyl flaming base L is more preferably 30, more preferably 1 0, more preferably 1 0 is set to 1 0 0 with curable acrylic acid, -vinyl benzoquinone, 3-vinyl benzene Formic acid, 1, 4-cyclodecylbicyclo, 5-carboxy-[2.2.1]heptyl-6-ethyl; phthalic acid-19- 201245873 anhydride, 4-vinyl phthalic anhydride, 3, 4,5,6 - Hydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxylic acid bicyclo[2.2.1]hept-2-ene anhydride (Nadic anhydride), etc., unsaturated dicarboxylic anhydrides; succinic acid mono[2-(methyl)propenyloxyethyl], phthalic acid mono [2-(methyl)propenyl oxyethyl] An unsaturated mono-[(meth)acryloyloxyalkyl]ester of a polyvalent carboxylic acid of 2 or more equivalent; such as α-(hydroxymethyl)acrylic acid, containing an interesting group and a carboxyl group in the same molecule Unsaturated acrylates, etc. Among these, from the viewpoint of copolymerization reactivity or alkali solubility, it is preferred to use a dilute acid, methacrylic acid, maleic anhydride or the like. The amount of (c) added is preferably 10 to 60% by mass, and 30 to 40% by mass based on the copolymer obtained by copolymerizing (a), (bl), and (b2). Better. (d) can be used well-known, and can be cited as: maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, chlorine bridge anhydride, etc. An acid anhydride; a polybasic acid anhydride such as trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic anhydride, or biphenyltetracarboxylic anhydride. Among them, tetrahydrophthalic anhydride or succinic anhydride is preferred from the viewpoint of development. The addition reaction of (d) can be carried out by a method generally used in attaching a monomer to a copolymer. The additional amount of (d) is a ratio of 5 to 100 mol%, preferably 30 to 1 mol%, of a hydroxyl group formed at the time of introduction of a photosensitive group such as a acryl group or a methacrylic group. . -20- 201245873 (d: the additional amount is 5 mol% of the hydroxyl group formed when the photosensitive group such as propylene or methacrylic is introduced, the solubility to the rare base is lowered. The content of the resin (B) is usually 0.5 to 30 parts by mass, preferably 1 to 20 parts by mass, more preferably 2 to 15 parts by mass, per 100 parts by mass of the colored photosensitive resin composition of the present invention. The colored photosensitive resin composition of the present invention contains a polymerizable compound (C). The polymerizable compound (C) can be polymerized by active radicals and acids generated by the polymerization initiator (D). Examples of the compound include a compound having a polymerizable ethylenically unsaturated bond, and the like, and a (meth) acrylate compound is preferred. The polymerizable compound (C) having one ethylenically unsaturated bond can be used. The same as the compounds exemplified in the above (a), (b) and (c), wherein "the" is preferably a (meth) acrylate. The polymerizable compound (C) having two ethylenically unsaturated bonds, Can be cited as: 1,3 · butanediol di (methyl) Acrylate, i,3-butanediol (meth)acrylate, 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol II (Meth)acrylic acid vinegar ''neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol II Bisuccinate, bisphenol A bis(propylene oxiranyl) ether, ethoxylated bis PA di(meth) acrylate, propoxylated neopentyl diol di(meth) acrylate, Ethoxylated neopentyl glycol di(meth) propylene-21 - 201245873 acid ester, 3-methylpentane diol di (meth) acrylate, etc. having three or more ethylenically unsaturated bonds Examples of the polymerizable compound (C) include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and bis(2-hydroxyethyl)isocyanurate tris(meth)acrylic acid. Ester, ethoxylated trimethylolpropane tri(meth) acrylate, propoxylated trimethylolpropane tri(meth) acrylate, penta Alcohol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate 'dipentaerythritol hexa (meth) acrylate, tripentaerythritol tetra (meth) acrylate, tripentaerythritol penta (meth) acrylate, three Pentaerythritol hexa(meth) acrylate, tripentaerythritol hepta (meth) acrylate, tripentaerythritol octa (meth) acrylate, pentaerythritol tri(meth) acrylate and anhydride reaction, dipentaerythritol penta (methyl) Reaction of acrylate with anhydride, tripentaerythritol hepta (meth) acrylate and anhydride caprolactone modified trimethylolpropane tri(meth) acrylate, caprolactone modified pentaerythritol tri (meth) acrylate , caprolactone modified ginseng (2_ hydroxyethyl) isocyanuric acid tri(meth) acrylate, caprolactone modified pentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol penta (methyl) Acrylate, caprolactone modified dipentaerythritol hexa(meth) acrylate, caprolactone modified tripellitate tetrakis (meth) acrylate, caprolactone modified ternary Alcohol penta (meth) acrylate, caprolactone modified tripentaerythritol hexa (meth) acrylate, caprolactone modified tripellitate seven (meth) acrylate, caprolactone modified tripentaerythritol VIII (methyl) ) acrylate, caprolactone modified pentaerythritol tri(meth) acrylate and anhydride reaction, caprolactone modified dipentaerythritol penta (meth) acrylate and anhydride-22-201245873 reactant, caprolactone The trimer pentaerythritol hepta (meth) acrylate and an acid anhydride are modified. Among them, a trifunctional or higher monomer is preferred, and dipentaerythritol hexa(meth)acrylate is more preferred. The content of the polymerizable compound (C) is preferably from 5 to 50% by mass, more preferably from 1% to 45% by mass, based on the solid content of the colored photosensitive resin composition. Further, the total amount of the resin (B) and the polymerizable compound (C) is preferably 20 to 80% by mass, more preferably 40 to 60% by mass. When the content of the polymerizable compound (C) is within the above range, the sensitivity, the smoothness of the pattern, the smoothness, and the reliability tend to be good. The colored photosensitive resin composition of the present invention contains a polymerization initiator (D). The polymerization initiator (D) is not particularly limited as long as it generates a living radical, an acid or the like by the action of light, and starts polymerization of the polymerizable compound (C), and a well-known polymerization reaction can be used. The initiator β polymerization initiator (D) is preferably a diimidazole compound, an alkylphenone compound, a triazabenzene compound, a mercaptophosphine oxide compound or a ruthenium compound. Further, it is also possible to use a photocationic polymerization initiator (for example, an anion produced by a key cation and a Lewis acid) as described in JP-A-2008-181 1087. Among them, in terms of sensitivity, 1", it is preferable to use a ruthenium compound.肓: j The biimidazole compound is exemplified by 2,2'-bis(2-chlorophenyl-23- 201245873 )-4,4,5,5 -tetrakisylbiimidazole, 2,2,- Bis(2,3-dichlorophenyl) 4,4',5,5'-tetraphenylbisimidazole (for example, Japanese Laid-Open Patent Publication No. Hei 6-75372, Japanese Patent Application Laid-Open No. Hei 6-75373, etc. , 2,2,_bis(2-chlorophenyl)-4,4',5,5,-tetraphenylbisimidazole, 2,2,-bis(2-chlorophenyl)-4, 4,5,5 - four (homoyloxyphenyl) bismuth, 2,2,_bis(2-chlorophenyl)-4,4',5,5'-tetrakis(dialkyloxybenzene Bis-imidazole, 2,2,-bis(2-chlorophenyl)-4,4,5,5'-tetrakis(trialkoxyphenyl)bisimidazole (eg 'refer to Japanese Tetsuya 48-3 A bismuth compound in which a phenyl group at the 4, 4, 5, 5, and _ positions is substituted with a carboalkyloxy group (for example, refer to Japanese Patent No. 84-A-3, JP-A-62-147204, etc.) Kaiping 7 _丨〇9 1 3, etc.) and so on. Preferably, it is exemplified by 2,2,-bis(2-chlorophenyl)-4,4',5'5'-tetraphenylbisimidazole, 22'-bis (2,3-dichlorobenzene) -4,4,5,5'-tetraphenylbisimidazole, 2,2,_bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl Mi Mi. The phenyl ketone compound refers to a compound having a partial structure represented by the formula (d2) or a partial structure represented by the formula (d3). The benzene ring in some of these structures may also have a substituent. The compound having a partial structure represented by 〇rV, (4) 〇rV, (d3) M stomach & (d2), for example, 2'-methyl-2-morpholinyl-1-(4-methylsulfonate) Nonylphenyl)propane - 嗣' 2- 2-methylamino-1·(4-morpholinylphenyl)-2-benzylbutan-1-one·, and 2·(dimethylamine ))·2-[(4-Methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butan-1-one. Commercial products such as Irgacure (registered trademark of -24-201245873) 369' 907 and 379 (manufactured by BASF Corporation) can also be used. The compound having a partial structure represented by the formula (d3) may, for example, be 2-hydroxy-2-methyl-1-phenylpropan-1-one or 2-hydroxy-2-methyl-1-[ 4-(2-hydroxyethoxy)phenyl]propan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propane - 1-ketone oligomer, and α,α-diethoxyacetophenone, Benzyl dimethyl ketal ° The above-mentioned triazabenzene compound, for example, 2,4- Bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazabenzene, 2,4-bis(trichloromethyl)-6- (4- .Methoxynaphthyl)-1,3,5-triazabenzene, 2,4-bis(trichloromethyl)-6-mallowyl-1,3,5-triazabenzene, 2, 4-bis(trichloromethyl)-6·(4-methoxystyryl)-1,3,5-triazabenzene, 2,4-bis(trichloromethyl)-6- [2-(5-Methylfuran-2-yl)vinyl]_ 1,3,5. Triazabenzene, 2,4-bis(trichloromethyl)-6-[2-(furan_ 2_yl)vinyl]_1,3,5-triazabenzene, 2,4-bis(trichloromethyl)-6-[2-: 4-diethylamino-2-methylphenyl Ethylene 〕-1,3,5·triazabenzene, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]1,3, 5-triazabenzene and the like. The above-mentioned mercaptophosphine oxide initiator may, for example, be 2,4,6-trimethylbenzimidyldiphenylphosphine oxide or the like. Commercial products such as Irgacure 819 (made by Ciba Japan Co., Ltd.) can also be used. The above-mentioned oxime compound is exemplified by N-benzimidyloxy-1-(4-phenylsulfonylphenyl)butan-1-one-2-imine and N-benzylidene group. Oxy- _25- 201245873 1-(4-phenylsulfonylphenyl)octane-1-one-2-imine, 1-ethyloxy-l-[9-ethyl·6·(2 -methylbenzhydryl)-9H-indazol-3-yl]ethane·1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4 - (3,3-Dimethyl-2,4-dioxolethyleneoxy)benzhydryl}-9H-indole-3-yl]-2-indolamine . Commercial products such as Irgacure OXE-01, OXE-02 (above, BASF Japan), N-1 9 1 9 (made by ADEKA) can also be used. Further, a polymerization initiator which can cause chain transfer can also be used as a photopolymerization initiator as described in JP-A-2002-544205. The above-mentioned polymerization initiator which causes chain transfer can be exemplified by a compound of the following formula (D-1) to (D-6).

(D-I) C4H9—S—CH2 2 Vc-o-(ch2(D-I) C4H9-S-CH2 2 Vc-o-(ch2

C4H9—S (D-2)C4H9-S (D-2)

-26- 201245873-26- 201245873

(D-5)(D-5)

? ?h2 /CH3 C—C—N c2h5Xch3?h2 /CH3 C-C-N c2h5Xch3

H2 一c —sH2 a c — s

HjCOOC 再者，聚合反應起始劑（D )，係可列舉例 香、安息香甲基醚、安息香乙基醚、安息香異丙 息香異丁基醚等之安息香化合物；二苯甲酮、〇 -苯甲酸甲酯、4 -苯基二苯甲酮、4 -苯甲醯基- 4’-基硫化物、3,3’，4,4’-四（tert-丁基過氧羰基）二 2，4,6-三甲基二苯甲酮等之二苯甲酮化合物；9,1 2-乙基蒽醌、樟腦烷醌等之醌化合物·，10-丁基_ 啶酮、苄基、苯基乙醛酸甲酯、二茂鈦化合物等 以與後述之聚合起始助劑（D 1 )(特別是胺類 用者爲佳。 肓：ί述之具有可引起鏈轉移之聚合反應起始劑 爲構成樹脂（A )的成分（c )使用。 亦可進一步含有聚合起始助劑（D1)。聚 劑（D 1 )，係可與聚合反應起始劑（D)組合使 爲了促進藉由聚合反應起始劑而開始聚合的聚合 -27- (D-6) 如：安息 基醚、安 苯甲醯基 甲基二苯 苯甲酮、 0-菲醌、 2-氯基吖 。此等係 )組合使 ，亦可作 合起始助 用’且是 性化合物 201245873 之聚合所使用的化合物、或者是增感劑。 聚合起始助劑（D 1 )，係可列舉：胺化合物、噻唑 啉化合物、烷氧基蒽化合物、噻噸酮化合物、羧酸化合物 等。 胺化合物，係可列舉：三乙醇胺、甲基二乙醇胺、三 異丙醇胺、4-二甲基胺基苯甲酸甲酯、4-二甲基胺基苯甲 酸乙酯、4-二甲基胺基苯甲酸異戊酯、苯甲酸2-二甲基胺 基乙酯、4-二甲基胺基苯甲酸2-乙基己酯、Ν,Ν-二甲基對 甲苯胺、4,4’·雙（二甲基胺基）二苯甲酮（通稱米希勒酮 (Michler’s ketone) ) 、4,4’-雙（二乙基胺基）一本甲 酮、4,4，-雙（乙基甲基胺基）二苯甲.酮等，其中以4,4’-雙（二乙基胺基）二苯甲酮爲佳。亦可使用EAB-F (保土 谷化學工業（股）製）等之市售品。_ 噻唑啉化合物，係可列舉式（III-1 )〜式（ΙΠ-3 )所 表示之化合物等。 -28- 201245873HjCOOC Further, the polymerization initiator (D) may, for example, be a benzoin compound such as scent, benzoin methyl ether, benzoin ethyl ether, benzoin isopropylidene isobutyl ether; benzophenone, hydrazine- Methyl benzoate, 4-phenylbenzophenone, 4-benzylidene-4'-yl sulfide, 3,3',4,4'-tetra(tert-butyl peroxycarbonyl) di 2 a benzophenone compound such as 4,6-trimethylbenzophenone; a quinone compound such as 9,1 2-ethyl hydrazine or camphor hydrazine, 10-butyl ketone, benzyl, The phenylglyoxylate methyl ester, the titanocene compound, and the like are preferably used in combination with a polymerization starting aid (D 1 ) to be described later (particularly an amine-based one. 肓: 具有 has a polymerization reaction which causes chain transfer) The initiator is used as the component (c) constituting the resin (A). The polymerization initiator (D1) may be further contained. The polymerization agent (D 1 ) may be combined with the polymerization initiator (D) to promote Polymerization -27-(D-6) which starts polymerization by a polymerization initiator, such as: benzoyl ether, benzoyl methyl benzophenone, 0-phenanthrenequinone, 2-chloro hydrazine. These combinations) It can be used as a starting aid and is a compound used in the polymerization of the compound 201245873 or a sensitizer. The polymerization initiation aid (D 1 ) may, for example, be an amine compound, a thiazoline compound, an alkoxyfluorene compound, a thioxanthone compound or a carboxylic acid compound. The amine compound may, for example, be triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate or 4-dimethyl group. Isoamyl benzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, hydrazine, hydrazine-dimethyl-p-toluidine, 4,4 '·Bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)-methanone, 4,4,-double (Ethylmethylamino)benzonitrile or the like, of which 4,4'-bis(diethylamino)benzophenone is preferred. Commercial products such as EAB-F (manufactured by Hodogaya Chemical Industry Co., Ltd.) can also be used. The thiazoline compound may, for example, be a compound represented by the formula (III-1) to the formula (ΙΠ-3). -28- 201245873

CHa (ΠΙ-1)CHa (ΠΙ-1)

(m -2) (m-3) 烷氧基蒽化合物，係可列舉：9,10-二甲氧基蒽、2-乙 基-9，10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9，10-二 乙氧基蒽、9,10-二丁氧基蒽、2-乙基-9,10-二丁氧基蒽等 〇 噻噸酮化合物，係可列舉：2-異丙基噻噸酮、4-異丙 基噻噸酮、2,4-二乙基噻噸酮、2,4-二氯基噻噸酮、1-氯 基-4-丙氧基噻噸酮等。 羧酸化合物，係可列舉：苯基磺醯基乙酸、甲基苯基 磺醯基乙酸、乙基苯基磺醯基乙酸、甲基乙基苯基磺醯基 乙酸 '二甲基苯基磺醯基乙酸、甲氧基苯基磺醯基乙酸、 二甲氣基苯基磺醯基乙酸、.氯基苯基磺醯基乙酸、二氯基 苯基磺醯基乙酸、N-苯基甘胺酸、苯氧基乙酸、萘基硫乙 酸、N-萘基甘胺酸、萘氧基乙酸等。 相對於樹脂（B )及聚合性化合物（C )之合計量1 00 -29- 201245873 質量份，聚合反應起始劑（D)之含量較佳爲0.1〜40質 量份，更佳爲1〜30質量份。若聚合反應起始劑（D)之 合計量在該範圍內，則可以高感度形成圖型，並有圖型之 耐藥品性、機械強度、表面平滑性成爲良好的傾向。 於使用聚合起始助劑（D1)的情況，相對於樹脂（B )及聚合性化合物（C)之合計量1〇〇質量份，其使用量 較佳爲0.01〜50質量份，更佳爲0.1〜40質量份。此外 ，每1莫耳聚合反應起始劑（D)，較佳爲0·01〜10莫耳 ，更佳爲0.01〜5莫耳。若聚合起始助劑（D1)之量在該 範圍內，則更可以高感度形成圖型，並有圖型之生產性提 昇的傾向。 此外，本發明之著色感光性樹脂組成物，係含有多官 能硫醇化合物（Ε )。該多官能硫醇化合物（Ε )，係分 子內具有2個以上之磺醯基的化合物。其中，若使用具有 2個以上與脂肪族烴基鄰接的磺醯基之化合物，則由於可 以高感度形成圖型，故爲佳。 多官能硫醇化合物（Ε )，係可列舉：己烷二硫醇、 癸烷二硫醇、1，4-雙（甲基磺醯基）苯、丁烷二醇雙（3-磺醯基丙酸酯）、丁烷二醇雙（3-磺醯基乙酸酯）、乙二 醇雙（3-磺醯基乙酸酯）、三羥甲基丙烷參（3-磺醯基乙 酸酯）、丁烷二醇雙（3-磺醯基丙酸酯）、三羥甲基丙烷 參（3-磺醯基丙酸酯）、三羥甲基丙烷參（3_磺醯基乙酸 酯）、季戊四醇肆（3-磺醯基丙酸酯）、季戊四醇肆（3-磺醯基乙酸酯）、參羥乙基參（3-磺醯基丙酸酯）、季戊 -30- 201245873 四醇肆（3 -磺醯基丁酸酯）、1,4 -雙（3 -磺醯 )丁烷等’其中以季戊四醇肆（3-磺醯基丙酸 相對於聚合反應起始劑（D ) 1 0 0質量份 醇化合物（E)之含量，較佳爲10〜150質量 3〇〜80質量份。若多官能硫醇化合物（E)之 圍內，則有感度提高，且顯像性成爲良好的傾 溶劑（F )並無特別限制，可使用在該領 使用的溶劑。可從例如：酯溶劑（分子內含， 之溶劑）、酯溶劑以外之醚溶劑（分子內含1 溶劑）、醚酯溶劑（分子內含有- COO·構造與-劑）、酯溶劑以外之酮溶劑（分子內含有-CO-)、醇溶劑、芳香族烴溶劑、醯胺溶劑、二甲 中選擇使用。此等溶劑，係可單獨或將2種以 〇 酯溶劑，係可列舉：乳酸甲酯、乳酸乙酯 、2-羥基異丁酸甲酯 '乙酸乙酯、乙酸η-丁酯 酯、甲酸戊酯、乙酸異戊酯、丙酸丁酯、丁酸 酸乙酯、丁酸丁酯、戊酸甲酯、戊酸乙酯、戊 醯乙酸甲酯、乙醯乙酸乙酯、環己醇乙酸酯 等。 醚溶劑，係可列舉：乙二醇單甲基醚、乙 醚、Ζ:二醇單丙基醚、乙二醇單丁基醚、二乙 醚、二乙二醇單乙基醚、二乙二醇單丁基醚、 基醚、丙二醇單乙基醚、丙二醇單丙基醚、丙 基丁基氧代 醋）爲佳。 ，多官能硫 份，更佳爲 含量在該範 向。 域中所通常 Γ -COO-構造 嘗-〇-構造之 〇-構造之溶 構造之溶劑 基亞颯等之 上組合使用 、乳酸丁酯 、乙酸異丁 異丙酯、丁 酸丙酯、乙 、7 -丁內酯 二醇單乙基 二醇單甲基 丙二醇單甲 二醇單丁基 -31 - 201245873 醚、3-甲氧基-1-丁醇、3-甲氧基-3-甲基丁醇、四氫呋喃 、四氫吡喃、1,4-二噁烷、二乙二醇二甲基醚、二乙二醇 二乙基醚、二乙二醇甲基乙基醚、二乙二醇二丙基醚、二 乙二醇二丁基醚、苯甲醚、苯***、甲基苯甲醚等。 醚酯溶劑，係可列舉：甲氧基乙酸甲酯、甲氧基乙酸 乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙 酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙 酸甲酯、3-乙氧基丙酸乙酯、2-甲氧基丙酸甲酯、2-甲氧 基丙酸乙酯、2-甲氧基丙酸丙酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯、3-甲氧基丁基乙酸酯、3-甲基：3-甲氧基 丁基乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙 酸酯、丙二醇單丙基醚乙酸酯、乙二醇單甲基醚乙酸酯、 乙二醇單乙基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二乙 二醇單丁基醚乙酸酯等。 酮溶劑，係可列舉：4-羥基-4-甲基-2-戊酮、丙酮、 2-丁酮、2-庚酮、3-庚酮、4-庚酮、4-甲基-2-戊酮、環戊 酮、環己酮、異佛酮等。 醇溶劑，係可列舉：甲醇、乙醇、丙醇、丁醇、己醇 、環己醇、乙二醇、丙二醇、丙三醇等。 芳香族烴溶劑，係可列舉：苯、甲苯、二甲苯、 1，3,5-三甲苯等。 醯胺溶劑，係可列舉：N，N-二甲基甲醯胺、N，N-二甲 基乙醯胺、N-甲基吡咯啶酮等。 -32- 201245873 上述之溶劑當中，就塗佈性、乾燥性的觀點而言，以 於latm之沸點爲120°C以上180°C以下之有機溶劑爲佳。 其中，以丙二醇單甲基醚、丙二醇單甲基醚乙酸酯等爲佳 〇 溶劑（F )之含量，係相對於著色感光性樹脂組成物 ，較佳爲60〜95質量％，更佳爲70〜90質量％。換言之 ，著色感光性樹脂組成物之固體成分，較佳爲5〜40質量 %，更佳爲10〜30質量％。若溶劑（F)之含量在前述之 範圍內，則會有塗佈時之平坦性成爲良好的傾向。 本發明之著色感光性樹脂組成物，係以含有界面活性 劑（G )者爲佳。界面活性劑，係可列舉.例如：聚矽氧系 界面活性劑、氟系界面活性劑、具有氟原子之聚矽氧系界 面活性劑等。藉由含有界面活性劑，而有塗佈時之平坦性 成爲良好的傾向。 聚矽氧系界面活性劑，係可列舉：具有矽氧烷鍵之界 面活性劑。 具體而言，係可列舉：托徕（Toray )聚矽氧DC3PA 、同 SH7PA、同 DC11PA、同 SH21PA、同 SH28PA、同 SH29PA、同SH30PA '聚醚改質聚矽酮油SH8400 (商品 名：Dow Corning Toray Co.，Ltd.製）、KP321、KP322、 KP323 ' KP 3 24、KP326、KP340、KP341 (信越化學工業 (股）製）、TSF400、TSF401、TSF410、TSF43 00、 TSF4440 、 TSF4445 、 TSF-4446 、 TSF4452 、 TSF4460 ( Momentive Performance Materials Japan 聯合公司製）等 -33- 201245873 氟系界面活性劑係可列舉：具有氟碳鏈之界面活性劑 0 具體而言，係可列舉：FLUORINERT (註冊商標） FC430、同 FC43 1 (住友 3M (股）製）、MEGAFACE (註 冊商標）F142D、同 F171、同 F172、同 F173、同 F177、 同F183、同R30 ( DIC (股）製）、F-Top (註冊商標） EF301、同 EF303、同 EF351、同 EF352 (三菱金屬電子 化成（股）製）'SURFLON (註冊商標）S381、同 S382 、同 SC101、同 SC105 (旭硝子（股）製）、E5844 (( 股）大金精密化學硏究所製）等。 具有氟原子之聚矽氧系界面活性劑係可列舉：具有矽 氧烷鍵及氟碳鏈之界面活性劑。具體而言，係可列舉： MEGAFACE (註冊商標）R08、同 BL20、同 F475、同 F477、同 F443 ( DIC (股）製）等。較佳爲可列舉： MEGAFACE (註冊商標）F475。 相對於著色感光性樹脂組成物，界面活性劑（G)係 0.001質量％以上0.2質量％以下，較佳爲0.002質量％ 以上0.1質量％以下’更佳爲0.01質量％以上0.05質量 %以下。可藉由含有該範圍之界面活性劑，而使塗膜之平 坦性良好。 本發明之著色感光性樹脂組成物，係亦可視需要而含 有：塡充劑、其他的高分子化合物、密著促進劑、抗氧化 劑、紫外線吸收劑、光安定劑、鏈轉移劑等之種種添加劑 -34- 201245873 本發明之著色感光性樹脂組成物，係可例如以下的方 式進行調製。 首先，預先將著色劑（A )的顏料與溶劑（E )混合 ，並使用珠磨機使顏料的平均粒徑分散至成爲〇.2/zm以 下程度爲止。此時，亦可視需要調配顔料分散劑、樹脂（ B )的一部分或全部。於所得之顏料分散液中，可視需要 使用除樹脂（B )的殘餘、聚合性化合物（C )及聚合反 應起始劑（D)以外之其他的成分，進一步依據所需而添 加追加的溶劑，以成爲特定的濃度，而得到目的之著色感 光性澍脂組成物。 辱到圖型的方法’係可列舉：光微影成像法、噴墨法 、印刷法等。其中·，以光微影成像法爲佳。光微影成像法 ’係藉由將前述著色感光性樹脂組成物塗佈於基板上，乾 燥後經由光遮罩而曝光、顯像，而得到圖型的方法。 前述基板’係可列舉例如：玻璃、金屬、塑膠等，可 爲板吠，亦可爲薄膜狀。 塑膠，係可列舉例如：聚乙烯、聚丙烯 '原冰片烯系 聚合物等之聚烯烴、聚乙烯醇、聚對苯二甲酸乙二酯、聚 蔡〜甲酸乙二酯、聚（甲基）丙烯酸酯、纖維素酯、聚碳 酸醋.聚楓、聚醚颯、聚醚酮、聚苯硫醚、聚苯醚等。在 此’：甲基）丙烯酸，係指至少1種由丙烯酸及甲基丙烯 酸所成之群中所選出者。於此等之基板上，亦可形成有彩 色媳光片、各種絕緣或導電膜、驅動電路等之結構體。 -35- 201245873 根據本發明之著色感光性樹脂組成物，由於可形成 更低溫硬化的圖型，因此在將圖型形成於塑膠基板時特 有用。 對基板之塗佈方法，係可列舉例如：擠壓塗佈法、 接凹版塗佈法（Direct gravure coating)、逆轉凹版塗 法（Reverse gravure coating) 、CAP 塗佈法、模具塗 法等。此外，亦可使用含浸塗佈機、輥式塗佈機、刮棒 佈機、旋轉塗佈機、縫隙&旋轉塗佈機、縫隙塗佈機（ 稱爲模具塗佈機、淋幕式塗佈機、狹縫式精密塗佈機） 噴墨等之塗佈裝置進行塗佈。其中，以使用縫隙塗佈機 旋轉塗佈機、輥式塗佈機等進行塗佈者爲佳。 塗佈於基板之膜的乾燥方法，係可列舉例如：加熱 燥、自然乾燥、通風乾燥、減壓乾燥等之方法。亦可組 複數種方法來進行。 乾燥溫度，係以10〜12(TC爲佳，以25〜100t爲 佳。此外，加熱時間，係以1 〇秒〜60分鐘者爲佳，以 秒〜30分鐘者爲更佳。(m -2) (m-3) alkoxy oxime compound, which may be exemplified by 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-di Antimony thioxanthone compound such as ethoxylated hydrazine, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxyanthracene or 2-ethyl-9,10-dibutoxyfluorene , can be cited as: 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-dichlorothioxanthone, 1-chloro- 4-propoxythioxanthone and the like. Examples of the carboxylic acid compound include phenylsulfonyl acetic acid, methylphenylsulfonyl acetic acid, ethylphenylsulfonyl acetic acid, and methyl ethyl phenylsulfonyl acetic acid 'dimethylphenylsulfonate. Thioglycolic acid, methoxyphenylsulfonyl acetic acid, dimethyl phenyl sulfonyl acetic acid, chlorophenyl sulfonyl acetic acid, dichlorophenyl sulfonyl acetic acid, N-phenylgan Amine acid, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, and the like. The content of the polymerization initiator (D) is preferably 0.1 to 40 parts by mass, more preferably 1 to 30, based on the total amount of the resin (B) and the polymerizable compound (C) of 1 00 -29 to 201245873 parts by mass. Parts by mass. When the total amount of the polymerization initiator (D) is within this range, the pattern can be formed with high sensitivity, and the chemical resistance, mechanical strength, and surface smoothness of the pattern tend to be good. In the case of using the polymerization starting aid (D1), the amount of the resin (B) and the polymerizable compound (C) is preferably from 0.01 to 50 parts by mass, more preferably from 0.01 to 50 parts by mass. 0.1 to 40 parts by mass. Further, the initiator (D) per 1 mole of the polymerization reaction is preferably from 0.01 to 10 moles, more preferably from 0.01 to 5 moles. When the amount of the polymerization initiation aid (D1) is within this range, the pattern can be formed with high sensitivity, and the productivity of the pattern tends to increase. Further, the colored photosensitive resin composition of the present invention contains a polyfunctional thiol compound (Ε). The polyfunctional thiol compound (Ε) is a compound having two or more sulfonyl groups in a molecule. Among them, when a compound having two or more sulfonyl groups adjacent to an aliphatic hydrocarbon group is used, it is preferable because the pattern can be formed with high sensitivity. The polyfunctional thiol compound (Ε) may, for example, be hexanedithiol, decanedithiol, 1,4-bis(methylsulfonyl)benzene or butanediol bis(3-sulfonyl). Propionate), butanediol bis(3-sulfonyl acetate), ethylene glycol bis(3-sulfonyl acetate), trimethylolpropane ginseng (3-sulfonyl acetic acid) Ester), butanediol bis(3-sulfonylpropionate), trimethylolpropane ginseng (3-sulfonylpropionate), trimethylolpropane ginseng (3_sulfonylacetic acid) Ester), pentaerythritol oxime (3-sulfonylpropionate), pentaerythritol oxime (3-sulfonyl acetate), hydroxyethyl ginseng (3-sulfonylpropionate), penta-30- 201245873 Tetramer oxime (3-sulfobutyrate), 1,4-bis(3-sulfonyl)butane, etc. ' Among them, pentaerythritol oxime (3-sulfonylpropionic acid relative to polymerization initiator ( D) The content of the alcohol compound (E) is preferably 10 to 150 masses 3 to 80 parts by mass. If the polyfunctional thiol compound (E) is contained, the sensitivity is improved and the image is developed. Sex is a good solvent (F) which is not particularly limited and can be used in this collar. The solvent may be, for example, an ester solvent (a solvent contained in the molecule), an ether solvent other than the ester solvent (1 solvent in the molecule), an ether ester solvent (containing -COO·structure and agent in the molecule), and an ester solvent. Other than the ketone solvent (containing -CO- in the molecule), the alcohol solvent, the aromatic hydrocarbon solvent, the guanamine solvent, and the dimethyl ester, these solvents may be used alone or in combination with two kinds of oxime ester solvents. : methyl lactate, ethyl lactate, methyl 2-hydroxyisobutyrate 'ethyl acetate, η-butyl acetate, amyl formate, isoamyl acetate, butyl propionate, ethyl butyrate, butyl Butyl acrylate, methyl valerate, ethyl valerate, methyl pentanoacetate, ethyl acetate, cyclohexanol acetate, etc. Ether solvent, for example, ethylene glycol monomethyl ether, diethyl ether Ζ: diol monopropyl ether, ethylene glycol monobutyl ether, diethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, ether, propylene glycol monoethyl ether, propylene glycol single Preferably, propyl ether or propyl butyl oxoacetate is preferred. , a polyfunctional sulfur, more preferably in the range. In the domain, the Γ-COO-structure 尝-〇-structure 〇-structured solvent structure is used in combination with the solvent, butyl acrylate, isobutyl isopropyl acetate, propyl butyrate, B, 7-butyrolactone diol monoethyl diol monomethyl propylene glycol monomethyl diol monobutyl-31 - 201245873 ether, 3-methoxy-1-butanol, 3-methoxy-3-methyl Butanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol Dipropyl ether, diethylene glycol dibutyl ether, anisole, phenethyl ether, methyl anisole, and the like. The ether ester solvent may, for example, be methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate or 3-methoxypropionic acid. Methyl ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, 2-methoxypropionic acid Ethyl ester, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, 2- Ethyl ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl: 3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol Monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate , diethylene glycol monobutyl ether acetate, and the like. The ketone solvent may, for example, be 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone or 4-methyl-2- Pentanone, cyclopentanone, cyclohexanone, isophorone, and the like. Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin. Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, 1,3,5-trimethylbenzene and the like. The guanamine solvent may, for example, be N,N-dimethylformamide, N,N-dimethylacetamide or N-methylpyrrolidone. -32- 201245873 Among the above-mentioned solvents, from the viewpoint of coatability and drying property, an organic solvent having a boiling point of lamat of from 120 ° C to 180 ° C is preferred. In particular, the content of the solvent (F) such as propylene glycol monomethyl ether or propylene glycol monomethyl ether acetate is preferably 60 to 95% by mass, more preferably 60 to 95% by mass, based on the coloring photosensitive resin composition. 70 to 90% by mass. In other words, the solid content of the colored photosensitive resin composition is preferably from 5 to 40% by mass, more preferably from 10 to 30% by mass. When the content of the solvent (F) is within the above range, the flatness at the time of coating tends to be good. The colored photosensitive resin composition of the present invention is preferably one containing a surfactant (G). Examples of the surfactant include a polyfluorene-based surfactant, a fluorine-based surfactant, and a polyfluorene-based surfactant having a fluorine atom. When the surfactant is contained, the flatness at the time of coating tends to be good. The polyoxo-based surfactant may, for example, be an interface having a siloxane coupling. Specifically, it can be exemplified by Toray polyoxyl DC3PA, same SH7PA, same DC11PA, same SH21PA, same SH28PA, same SH29PA, and SH30PA 'polyether modified polyketone oil SH8400 (trade name: Dow) Corning Toray Co., Ltd.), KP321, KP322, KP323 'KP 3 24, KP326, KP340, KP341 (Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF43 00, TSF4440, TSF4445, TSF- 4446, TSF4452, TSF4460 (manufactured by Momentive Performance Materials Japan Co., Ltd.), etc. -33 - 201245873 The fluorine-based surfactant is a surfactant having a fluorocarbon chain. Specifically, FLUORINERT (registered trademark) FC430, with FC43 1 (Sumitomo 3M (share) system), MEGAFACE (registered trademark) F142D, with F171, with F172, with F173, with F177, with F183, with R30 (DIC), F-Top ( Registered trademark) EF301, EF303, EF351, EF352 (Mitsubishi Metal Electronics Co., Ltd.) 'SURFLON (registered trademark) S381, same as S382, same as SC101, same as SC105 (Asahi Glass Co., Ltd.), E5844 (( Share) Subcommittee to study Fine Chemicals Ltd.) and the like. The polyoxo-based surfactant having a fluorine atom may be a surfactant having a siloxane chain and a fluorocarbon chain. Specifically, MEGAFACE (registered trademark) R08, the same BL20, the same F475, the same F477, and the same F443 (DIC system) are listed. Preferably, it is MEGAFACE (registered trademark) F475. The surfactant (G) is 0.001% by mass or more and 0.2% by mass or less, preferably 0.002% by mass or more and 0.1% by mass or less based on the coloring photosensitive resin composition, and more preferably 0.01% by mass or more and 0.05% by mass or less. The coating film can be made flat by containing a surfactant in this range. The colored photosensitive resin composition of the present invention may optionally contain various additives such as a chelating agent, other polymer compound, adhesion promoter, antioxidant, ultraviolet absorber, light stabilizer, and chain transfer agent. -34- 201245873 The colored photosensitive resin composition of the present invention can be prepared, for example, in the following manner. First, the pigment of the colorant (A) is mixed with the solvent (E) in advance, and the average particle diameter of the pigment is dispersed to a degree of 〇.2/zm or less using a bead mill. At this time, a part or all of the pigment dispersant and the resin (B) may be blended as needed. In the obtained pigment dispersion liquid, a component other than the resin (B), the polymerizable compound (C), and the polymerization initiator (D) may be used as needed, and an additional solvent may be further added depending on the necessity. The desired coloring photosensitive blush composition is obtained at a specific concentration. Examples of the method of humiliating the pattern include a photolithography method, an inkjet method, a printing method, and the like. Among them, photolithography is preferred. The photolithography method is a method in which the coloring photosensitive resin composition is applied onto a substrate, dried, and exposed and developed through a light mask to obtain a pattern. The substrate ′ is, for example, glass, metal, plastic, or the like, and may be a sheet or a film. Examples of the plastics include polyolefins such as polyethylene and polypropylene 'orinelene-based polymers, polyvinyl alcohol, polyethylene terephthalate, poly-ethylene dicarboxylate, and poly(methyl). Acrylate, cellulose ester, polycarbonate, poly maple, polyether oxime, polyether ketone, polyphenylene sulfide, polyphenylene ether and the like. Here, ':meth)acrylic acid means at least one selected from the group consisting of acrylic acid and methacrylic acid. On such a substrate, a structure such as a color light-receiving sheet, various insulating or conductive films, and a driving circuit can be formed. -35- 201245873 The color-sensitive photosensitive resin composition according to the present invention is particularly useful in forming a pattern on a plastic substrate because it can form a pattern which is cured at a lower temperature. Examples of the method of applying the substrate include an extrusion coating method, a direct gravure coating method, a reverse gravure coating method, a CAP coating method, and a die coating method. In addition, an impregnation coater, a roll coater, a bar coater, a spin coater, a slit & spin coater, a slit coater (referred to as a die coater, a curtain coater) may also be used. Cloth machine, slit type precision coater) Coating apparatus such as inkjet is applied. Among them, it is preferred to apply it by using a slit coater, a spin coater, a roll coater or the like. The drying method of the film applied to the substrate may, for example, be a method such as heat drying, natural drying, air drying, or reduced pressure drying. It is also possible to combine a number of methods. The drying temperature is preferably 10 to 12 (TC is preferably 25 to 100 t. Further, the heating time is preferably 1 sec to 60 minutes, and more preferably sec to 30 minutes.

減壓乾燥，係以在50〜150Pa之壓力下，20〜25 °C 溫度範圍內進行者爲佳》 乾燥後之塗佈膜的厚度，並無特別限定，但可依據 使用之材料、用途等而適當調整，例如0.1〜20以m， 佳爲1〜6 μ m。 乾燥後之塗佈膜，係經由爲形成目的之圖型的光遮 而曝光。此時之光遮罩上的圖型形狀並無特別限定，可 以 別 直 佈 佈 塗 也 乾 合 更 30 之 所 較 罩 使 -36- 201245873 用視成爲目的之用途的圖型形狀。 曝光所使用的光源，係以產生250〜450nm的波長之 光的光源爲佳。例如：可對未達35 Onm的光，使用用以 切取該波長區域的濾波器來切取，或對43 6nm附近、 408ηπι附近、365nm附近之光，使用用以取出該等波長區 域的通帶濾波器來取出。具體而言，可列舉：水銀燈、發 光二極體、金屬鹵素燈、鹵素燈等。 爲了可使平行光線均勻地照射到曝光面整體，或進行 遮罩與基材之正確的對位，以使用光罩對準曝光機、步進 器等之裝置者爲佳。 可藉由使曝光後之塗佈膜接觸顯像液，而使特定部分 ，例扣未曝光部溶解、顯像，而得到圖型。顯像液，雖也 可使.1有機溶劑，但塗佈膜之顯像部難以因顯像液而溶解 或膨潤’且爲了得到良好的形狀之圖型，因此以使用鹼性 化合物之水溶液者爲佳。 顯像方法’亦可爲盛液法、浸漬法、噴灑法等之任何 一種=再者，顯像時亦可使基板傾斜成任意角度。 潁像後，係以進行水洗者爲佳。 前述鹼性化合物，係可列舉：氫氧化鈉、氫氧化鉀、 磷酸氫二鈉、磷酸二氫鈉、磷酸氫二銨、磷酸二氫銨、磷 酸二氫鉀、矽酸鈉、矽酸鉀、碳酸鈉、碳酸鉀、碳酸氫鈉 、碳酸氫鉀、硼酸鈉、硼酸鉀、氨等之無機鹼性化合物； 氫氧化四甲基銨、氫氧化2-羥乙基三甲基銨、單甲基胺 、二甲基胺 '三甲基胺、單乙基胺、二乙基胺、三乙基胺 -37- 201245873 、單異丙基胺、二異丙基胺、乙醇胺等之有機鹼性化合物 。其中，以氫氧化鉀、碳酸鈉及氫氧化四甲基銨爲佳。 此等無機及有機鹼性化合物之水溶液中的濃度，較佳 爲0.01〜10質量％，更佳爲0.03〜5質量％。 前述鹼性化合物之水溶液，亦可含有界面活性劑。 界面活性劑，係可列舉：聚氧乙烯烷基醚、聚氧乙烯 芳基醚、聚氧乙烯烷基芳基醚、其他之聚氧乙烯衍生物、 氧乙烯/氧丙烯嵌段聚合物、山梨醇脂肪酸酯、聚氧乙烯 山梨醇脂肪酸酯、聚氧乙烯山梨糖醇脂肪酸酯、丙三醇脂 肪酸酯、聚氧乙烯脂肪酸酯、聚氧乙烯烷基胺等之非離子 系界面活性劑； 月桂醇硫酸酯鈉、油醇硫酸酯鈉、月桂基硫酸鈉、月 桂基硫酸銨、十二烷基苯磺酸鈉、十二烷基萘磺酸鈉等之 陰離子系界面活性劑； 硬脂基胺鹽酸鹽、月桂基三甲基銨氯化物等之陽離子 系界面活性劑等。 鹼性化合物之水溶液中的界面活性劑之濃度，較佳爲 0.01〜10質量％，更佳爲0.05〜8質量％，特別佳爲0.1 〜5質量％。 可藉由進一步烘烤上述所得之圖型，而得到已硬化的 圖型。烘烤溫度，係2 5 °C以上2 3 0 °C以下，較佳爲2 5 °C 以上20(TC以下，更佳爲25°C以上16(TC以下，再更佳爲 25°C以上120°C以下。烘烤時間，係1〜300分鐘，較佳 爲1〜180分鐘，更佳爲1〜60分鐘。 -38- 201245873 可由本發明之著色感光性組成物得到圖型及彩色濾光 片。此等圖型或彩色濾光片’係可以眾所周知的態樣’並 於與具備圖型或彩色爐光片作爲構成零件的一部分之顯示 裝置，例如：眾所周知的液晶顯不裝置、有機EL裝置' 固體成像元件、電子紙等之各種的著色圖像相關連之機器 中加以利用。 【實施方式】 實施例 以下，藉由實施例更詳細地說明本發明。例中之「％ 」及「份」，在無特別表記的情況下爲質量％及質量份。 <樹脂溶液B 1之合成> 合成例1 於具備有攪拌機、溫度計、回流冷卻管、滴下漏斗及 氮導入管之燒瓶中，導入571份之丙二醇單甲基醚乙酸酯 ’並在使燒瓶內氛圍從空氣置換爲氮後，昇溫至110 °C後 ，在由17.6份之苄基甲基丙烯酸酯、113.7份之縮水甘油 基甲IS丙烯酸酯、及22·〇份之二環戊烷基甲基丙烯酸酯 (日立化成（股）製FA-5 ISM)所構成之單體混合物中， 將I53份之丙二醇單甲基醚乙酸酯中添加有3.6份之偶氮 二異丁腈的溶液’耗費2小時從滴下漏斗滴入燒瓶中，進 —步右1 00°C下持續攪拌2小時。接著，使燒瓶內氛圍從 氮置換爲空氣，並將517份之丙烯酸、〇 9份之參二甲基 -39- 201245873 胺基甲酚及0·145份之對苯二酚投入燒瓶內，在110°C下 持續反應6小時，在固體成分酸價成爲lmgKOH/g時結束 反應。 然後，加入53.3份之四氫苯二甲酸酐、0·8份之三乙 基胺，使其在12(TC下反應3.5小時，得到固體成分37.7 %、酸價爲66.8mgKOH/g (固體成分換算）之樹脂溶液 B1。經GPC測量出之聚苯乙烯換算的重量平均分子量爲 8,700 〇 <樹脂溶液B2之合成> 合成例2 於具備有搅拌機、溫度計、回流冷卻管、滴下漏斗及 氮導入管之燒瓶中，導入593份之丙二醇單甲基醚乙酸酯 ，並在使燒瓶內氛圍從空氣置換爲氮後，昇溫至110°C後 ，在由88.1份之苄基甲基丙烯酸酯、56.9份之縮水甘油 基甲基丙烯酸酯、及22.0份之二環戊烷基甲基丙烯酸酯 (日立化成（股）製FA-5 13M )所構成之單體混合物中， 將153份之丙二醇單甲基醚乙酸酯中添加有3.6份之偶氮 二異丁腈的溶液，耗費2小時從滴下漏斗滴入燒瓶中，進 —步在l〇〇°C下持續擬拌2小時。 接著，使燒瓶內氛圍從氮置換爲空氣，並將28.8份 之丙烯酸、0.9份之參二甲苯胺基甲酚及0.145份之對苯 二酚投入燒瓶內，在U〇°C下持續反應6小時，在固體成 分酸價成爲ImgKOH/g時結束反應。 -40- 201245873 然後，加入47.2份之四氫苯二甲酸酐、〇·8份之三乙 基胺，使其在1 2 0 °C下反應3.5小時，得到固體成分3 6.5 %、酸價爲71.8mgKOH/g (固體成分換算）之樹脂溶液 B2 ° 經GPC測量出之聚苯乙烯換算的重量平均分子量爲 8,600 ° <樹脂溶液B3之合成> 合成例3 於具備有攪拌機、溫度計、回流冷卻管、滴下漏斗及 氮導入管之燒瓶中，導入591份之丙二醇單甲基醚乙酸酯 ，並在使燒瓶內氛圍從空氣置換爲氮後，昇溫至110 °C後 ，在由17.6份之苄基甲基丙烯酸酯、113.7份之縮水甘油 基甲基丙烯酸酯、及22.0份之二環戊烷基甲基丙烯酸酯 (日立化成（股）製FA-513M)所構成之單體混合物中， 將153份之丙二醇單甲基醚乙酸酯中添加有3.6份之偶氮 二異丁腈的溶液，耗費2小時從滴下漏斗滴入燒瓶中，進 —步在l〇(TC下持續攪拌2小時。接著，使燒瓶內氛圍從 氮置換爲空氣，並將68.9份之甲基丙烯酸、0.9份之參二 甲苯胺基甲酚及0.145份之對苯二酚投入燒瓶內，在110 t下持續反應6小時，在固體成分酸價成爲lmgKOH/g時 結束反應。 然後，加入53.3份之四氫苯二甲酸酐、0.8份之三乙 基胺，使其在120°C下反應3.5小時，得到固體成分37.9 -41 - 201245873 %、酸價爲68.6mgKOH/g (固體成分換算）之樹脂溶液 B3 〇 經GPC測量出之聚苯乙烯換算的重量平均分子量爲 7,900 « <樹脂溶液B4之合成> 合成例4 於具備有攪拌機、溫度計、回流冷卻管、滴下漏斗及 氮導入管之燒瓶中，導入505份之丙二醇單甲基醚乙酸酯 ，並在使燒瓶內氛圍從空氣置換爲氮後，昇溫至U0°C後 ，在由88.1份之苄基甲基丙烯酸酯、56.9份之縮水甘油 基甲基丙烯酸酯、及22.0份之二環戊烷基甲基丙烯酸酯 (曰立化成（股）製FA-513M)所構成之單體混合物中， 將153份之丙二醇單甲基醚乙酸酯中添加有3.6份之偶氮 二異丁腈的溶液，耗費2小時從滴下漏斗滴入燒瓶中，進 —步在100°C下持續攪拌2小時。 接著，使燒瓶內氛圍從氮置換爲空氣，並將34.4份 之丙烯酸、0.9份之參二甲苯胺基甲酚及0.145份之對苯 二酚投入燒瓶內，在110 °C下持續反應6小時，在固體成 分酸價成爲lmgKOH/g時結束反應。 然後，加入47.2份之四氫苯二甲酸酐、〇.8份之三乙 基胺，使其在120 °C下反應3.5小時，得到固體成分37.1 %、酸價爲72.2mgKOH/g (固體成分換算）之樹脂溶液 B4 ° -42- 201245873 經GPC測量出之聚苯乙烯換算的重量平均分子量爲 8,900 » 實施例1〜7 表1記載之各成分當中，預先將顏料及顏料分散劑總 量與作爲溶劑之丙二醇單甲基醚乙酸酯作混合。此時，以 使顏料及顏料分散劑之合計量相對於混合物成爲20質量 %的方式混合丙二醇單甲基醚乙酸酯。使用球磨機，使混 合物中之顏料充分分散，且將含有丙二醇單甲基醚乙酸酯 之殘量的殘餘之成分加入其中，進一步混合前述之混合物 ，而県到感光性樹脂組成物。 比較例1 丨余將實施例1中樹脂B1變更成樹脂B5 (苄基甲基丙 烯酸酯/甲基丙烯酸共聚物（質量組成比80/ 20、聚苯 乙烯換算重量平均分子量3 5，000 ))之外，與實施例1進 行相同的操作。 -43- 201245873 表1Drying under reduced pressure is preferably carried out at a temperature of 20 to 25 ° C under a pressure of 50 to 150 Pa. The thickness of the coating film after drying is not particularly limited, but may be based on the materials used, the use, and the like. The appropriate adjustment is, for example, 0.1 to 20 in m, preferably 1 to 6 μm. The coated film after drying is exposed to light which is a pattern for forming a target. The shape of the pattern on the light mask at this time is not particularly limited, and it is possible to use a pattern that is not intended to be used as a purpose for the purpose of the use of the cover. The light source used for the exposure is preferably a light source that generates light having a wavelength of 250 to 450 nm. For example, light that is less than 35 Onm can be cut using a filter for cutting out the wavelength region, or light near the vicinity of 436 nm, around 408 ηπι, and around 365 nm, using passband filtering to extract the wavelength regions. To take it out. Specific examples thereof include a mercury lamp, a light-emitting diode, a metal halide lamp, and a halogen lamp. In order to uniformly irradiate the parallel light to the entire exposed surface, or to perform the correct alignment of the mask with the substrate, it is preferable to use a mask to align the exposure machine, the stepper, or the like. The coating film after exposure can be brought into contact with the developing liquid, and a specific portion, for example, an unexposed portion can be dissolved and developed to obtain a pattern. In the developing solution, the organic solvent may be used as the organic solvent, but the developing portion of the coating film is hardly dissolved or swollen by the developing solution, and in order to obtain a pattern of a good shape, an aqueous solution using a basic compound is used. It is better. The developing method 'may be any one of a liquid filling method, a dipping method, a spraying method, and the like. Further, the substrate may be inclined at an arbitrary angle during development. After the sputum, it is better to wash it. Examples of the basic compound include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium citrate, potassium citrate, and the like. Inorganic basic compound of sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium borate, potassium borate, ammonia, etc.; tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, monomethyl Organic basic compound such as amine, dimethylamine 'trimethylamine, monoethylamine, diethylamine, triethylamine-37-201245873, monoisopropylamine, diisopropylamine, ethanolamine, etc. . Among them, potassium hydroxide, sodium carbonate and tetramethylammonium hydroxide are preferred. The concentration in the aqueous solution of the inorganic and organic basic compounds is preferably 0.01 to 10% by mass, more preferably 0.03 to 5% by mass. The aqueous solution of the above basic compound may also contain a surfactant. The surfactant may, for example, be a polyoxyethylene alkyl ether, a polyoxyethylene aryl ether, a polyoxyethylene alkyl aryl ether, other polyoxyethylene derivatives, an oxyethylene/oxypropylene block polymer, or a sorbent Nonionic interface of alcohol fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, glycerol fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine, etc. An active agent; an anionic surfactant such as sodium lauryl sulfate, sodium oleyl sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzenesulfonate or sodium dodecyl naphthalenesulfonate; A cationic surfactant such as stearylamine hydrochloride or lauryl trimethylammonium chloride. The concentration of the surfactant in the aqueous solution of the basic compound is preferably 0.01 to 10% by mass, more preferably 0.05 to 8% by mass, particularly preferably 0.1 to 5% by mass. The hardened pattern can be obtained by further baking the pattern obtained as described above. The baking temperature is 2 5 ° C or more and 2 3 0 ° C or less, preferably 2 5 ° C or more and 20 or less (TC or less, more preferably 25 ° C or more and 16 or less (TC or less, more preferably 25 ° C or more). The baking time is 1 to 300 minutes, preferably 1 to 180 minutes, more preferably 1 to 60 minutes. -38 to 201245873 The pattern and color filter can be obtained from the colored photosensitive composition of the present invention. Light sheet. These patterns or color filters 'are well-known patterns' and display devices having a pattern or a colored oven sheet as a part of a component, such as a well-known liquid crystal display device, organic The EL device is used in a device in which various color images such as solid-state imaging devices and electronic paper are associated with each other. [Embodiment] Hereinafter, the present invention will be described in more detail by way of examples, in which "%" and "Parts" are mass% and parts by mass unless otherwise specified. <Synthesis of Resin Solution B1> Synthesis Example 1 A flask equipped with a stirrer, a thermometer, a reflux cooling tube, a dropping funnel, and a nitrogen introduction tube Medium, introducing 571 parts of propylene glycol monomethyl ether The acid ester' was heated to 110 ° C after the atmosphere in the flask was replaced with nitrogen, and then 17.7 parts of benzyl methacrylate, 113.7 parts of glycidyl methacrylate, and 22·〇 In a monomer mixture composed of dicyclopentaalkyl methacrylate (FA-5 ISM manufactured by Hitachi Chemical Co., Ltd.), 3.6 parts of I53 parts of propylene glycol monomethyl ether acetate was added. The solution of nitrogen diisobutyronitrile was dropped into the flask from the dropping funnel for 2 hours, and stirring was continued for 2 hours at the right of 00 ° C. Then, the atmosphere in the flask was replaced with nitrogen from air, and 517 parts were added. Acrylic acid, hydrazine 9 parts of dimethyl dimethyl-39-201245873 amino cresol and 0. 145 parts of hydroquinone were put into the flask, and the reaction was continued at 110 ° C for 6 hours, and the acid value of the solid component became 1 mg KOH / The reaction was completed at g. Then, 53.3 parts of tetrahydrophthalic anhydride and 0.88 parts of triethylamine were added, and the mixture was reacted at 12 (TC for 3.5 hours to obtain a solid content of 37.7% and an acid value of 66.8 mgKOH). /g (solid content conversion) resin solution B1. Weight average score in terms of polystyrene measured by GPC The amount is 8,700 Å <Synthesis of Resin Solution B2> Synthesis Example 2 In a flask equipped with a stirrer, a thermometer, a reflux cooling tube, a dropping funnel, and a nitrogen introduction tube, 593 parts of propylene glycol monomethyl ether acetate was introduced. After the atmosphere in the flask was replaced with nitrogen from air, the temperature was raised to 110 ° C, and then 88.1 parts of benzyl methacrylate, 56.9 parts of glycidyl methacrylate, and 22.0 parts of dicyclopentan In a monomer mixture composed of alkyl methacrylate (FA-5 13M manufactured by Hitachi Chemical Co., Ltd.), 3.6 parts of propylene glycol monomethyl ether acetate was added with 3.6 parts of azobisisobutyronitrile. The solution was dropped into the flask from the dropping funnel for 2 hours, and the mixture was continuously mixed for 2 hours at 10 °C. Next, the atmosphere in the flask was replaced with nitrogen from air, and 28.8 parts of acrylic acid, 0.9 parts of dimethylglycine cresol, and 0.145 parts of hydroquinone were placed in the flask, and the reaction was continued at U 〇 ° C. The reaction was terminated when the acid value of the solid component became 1 mgKOH/g. -40- 201245873 Then, 47.2 parts of tetrahydrophthalic anhydride and 8 parts of triethylamine were added and reacted at 120 ° C for 3.5 hours to obtain a solid content of 36.5 %, and the acid value was 71.8 mgKOH/g (solid content conversion) of the resin solution B2 ° The polystyrene-equivalent weight average molecular weight measured by GPC is 8,600 ° <Synthesis of Resin Solution B3> Synthesis Example 3 is equipped with a stirrer, a thermometer, and a reflux In a flask of a cooling tube, a dropping funnel, and a nitrogen introduction tube, 591 parts of propylene glycol monomethyl ether acetate was introduced, and after the atmosphere in the flask was replaced with nitrogen by air, the temperature was raised to 110 ° C, and then 17.6 parts. a monomer mixture of benzyl methacrylate, 113.7 parts of glycidyl methacrylate, and 22.0 parts of dicyclopentyl methacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) Adding 3.6 parts of propylene glycol monomethyl ether acetate to 3.6 parts of azobisisobutyronitrile, dropping it into the flask from the dropping funnel for 2 hours, and continuing to stir at 10 ° (TC) 2 hours. Next, the atmosphere in the flask was replaced with nitrogen from air. 68.9 parts of methacrylic acid, 0.9 parts of xylylene cresol and 0.145 parts of hydroquinone were placed in a flask, and the reaction was continued at 110 t for 6 hours, when the acid value of the solid component became 1 mgKOH/g. The reaction was terminated. Then, 53.3 parts of tetrahydrophthalic anhydride and 0.8 parts of triethylamine were added and reacted at 120 ° C for 3.5 hours to obtain a solid component of 37.9 - 41 - 201245873 % and an acid value of 68.6 mg KOH. /g (solid content conversion) of the resin solution B3 The polystyrene-equivalent weight average molecular weight measured by GPC is 7,900 « <Synthesis of Resin Solution B4> Synthesis Example 4 is equipped with a stirrer, a thermometer, and a reflux cooling tube The flask was dropped into a funnel and a nitrogen introduction tube, and 505 parts of propylene glycol monomethyl ether acetate was introduced, and after the atmosphere in the flask was replaced with nitrogen from the air, the temperature was raised to U0 ° C, and then 88.1 parts of benzylidene was obtained. a monomer mixture composed of methacrylic acid ester, 56.9 parts of glycidyl methacrylate, and 22.0 parts of dicyclopentyl methacrylate (FA-513M manufactured by Keli Chemical Co., Ltd.) 153 parts of propylene glycol monomethyl ether acetate A solution of 3.6 parts of azobisisobutyronitrile was added thereto, and it was dropped into the flask from the dropping funnel over 2 hours, and stirring was continued for 2 hours at 100 ° C. Next, the atmosphere in the flask was replaced with nitrogen from air. And 34.4 parts of acrylic acid, 0.9 part of xylene cresol and 0.145 part of hydroquinone were put into the flask, and the reaction was continued at 110 ° C for 6 hours, when the acid value of the solid component became 1 mgKOH/g. End the reaction. Then, 47.2 parts of tetrahydrophthalic anhydride and 8 parts of triethylamine were added and reacted at 120 ° C for 3.5 hours to obtain a solid content of 37.1% and an acid value of 72.2 mgKOH/g (solid content). Recycled resin solution B4 ° -42- 201245873 The polystyrene-equivalent weight average molecular weight measured by GPC was 8,900 » Examples 1 to 7 Among the components described in Table 1, the total amount of pigment and pigment dispersant was previously Propylene glycol monomethyl ether acetate as a solvent is mixed. In this case, propylene glycol monomethyl ether acetate was mixed so that the total amount of the pigment and the pigment dispersant was 20% by mass based on the mixture. The pigment in the mixture was sufficiently dispersed using a ball mill, and the residual component containing the residual amount of propylene glycol monomethyl ether acetate was added thereto, and the above mixture was further mixed to obtain a photosensitive resin composition. Comparative Example 1 The resin B1 in Example 1 was changed to a resin B5 (benzyl methacrylate/methacrylic acid copolymer (mass composition ratio: 80/20, polystyrene-equivalent weight average molecular weight: 35,000)) The same operation as in Example 1 was carried out. -43- 201245873 Table 1

A1 ： C. I. 色 素 綠 色 36 A2 ： C. I. 色 素 黃 色 150 A3 ： c. I. 色 素 綠 色 58 A4 ： c. I. 色 素 黃 色 13 8 A5 ： c. I. 色 素 紅 色 177 -44 - 201245873 A6 ： C. I.色素紅色 254 A7 ： C. I.色素藍色15:6 A8 ： C. I.色素紫色 23 B5:苄基甲基丙烯酸酯/甲基丙烯酸共聚物（質量組 成比80/ 20、聚苯乙烯換算重量平均分子量35,〇〇〇：>A1 : CI Pigment Green 36 A2 : CI Pigment Yellow 150 A3 : c. I. Pigment Green 58 A4 : c. I. Pigment Yellow 13 8 A5 : c. I. Pigment Red 177 -44 - 201245873 A6 : CI Pigment Red 254 A7 : CI Pigment Blue 15:6 A8 : CI Pigment Violet 23 B5: Benzyl methacrylate/methacrylic acid copolymer (mass composition ratio 80/20, polystyrene-converted weight average molecular weight 35, 〇〇〇: >

Cl:二季戊四醇六丙烯酸酯（KAYARAD DPHA;曰 本化藥（股）製） D1: 2-苄基-2-二甲基胺基- (4-嗎啉基苯基）_丁烷_ 1-酮（IRGACURE 369 ; BASF 日本公司製） :D2: 4,4，-雙（二乙基胺基）二苯甲酮（EAB-F;保土 谷化學工業（股）製） D3: N-苯甲醯基氧基-1-(4-苯基磺醯基苯基）辛烷· 1-酮-2-亞胺（OXE-01; BASF日本公司製） D4:雙（2,4,6-三甲基苯甲醯基）苯基膦氧化物（ Irgacure819; BASF.日本公司製） D5: 2-甲基-2-嗎啉基（4-甲基醯基苯基）-丙烷-1-酮 (Irgacure907 ; BASF .日本公司製） D6:二乙基噻噸酮（KAYACURE DETX;日本化藥（ 股）Μ )Cl: dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Sakamoto Chemical Co., Ltd.) D1: 2-benzyl-2-dimethylamino-(4-morpholinylphenyl)-butane _ 1- Ketone (IRGACURE 369; manufactured by BASF Japan): D2: 4,4,-bis(diethylamino)benzophenone (EAB-F; manufactured by Hodogaya Chemical Industry Co., Ltd.) D3: N-Benzyl Mercaptooxy-1-(4-phenylsulfonylphenyl)octane·1-keto-2-imine (OXE-01; manufactured by BASF Japan) D4: double (2,4,6-three Methyl benzhydryl) phenylphosphine oxide (Igly made by Irfacure 819; BASF. Japan) D5: 2-methyl-2-morpholinyl (4-methylnonylphenyl)-propan-1-one ( Irgacure907 ; BASF . made by Japanese company) D6: diethyl thioxanthone (KAYACURE DETX; Nippon Chemical Co., Ltd.)

El:季戊四醇肆（3-磺醯基丙酸酯）（PEMP: SC有 機化學（股）製） F1 :丙二醇單甲基醚乙酸酯 F2 : 3-乙氧基丙酸乙酯 G 1 :顏料分散劑（聚酯系） -45- 201245873 G2 :顏料分散劑（丙烯酸系）El: pentaerythritol oxime (3-sulfonylpropionate) (PEMP: SC Organic Chemical Co., Ltd.) F1: propylene glycol monomethyl ether acetate F2: 3-ethoxypropionate ethyl ester G 1 : pigment Dispersant (Polyester) -45- 201245873 G2 : Pigment Dispersant (Acrylic)

G3 : SUMI-EPOXY ESCN-195XL G4 :界面活性劑：聚醚改質聚矽酮油 (Toray SILICONE SH8400 ; Dow Corning Toray Co.，Ltd.製） <耐溶劑性評估> 藉由旋轉塗佈法，將著色感光性組成物1〜8塗佈在 貼合有PET薄膜（Toray製LUMILER 75-T60)於2英吋 四方的玻璃板上的基板上，並在加熱板上、以80°C預烘 烤2分鐘。 放冷後，使用曝光機（TEM-15 0RSK ; TOPCON (股 )製），在大氣氛圍下，以150mJ/cm2之曝光量（ 365nm 基準）進行光照射。光照射後，於含有〇. 1 2%之非離子系 界面活性劑與0.04%之氫氧化鉀的水系顯像液中，以23 °C浸漬50秒而顯像，以白度（whiteness )洗淨之後，以 6〇°C加熱5分鐘，而形成著色圖型。所得之圖型的膜厚’ 係使用膜厚測量裝置（DEKTAK3 ;曰本真空技術（股） 製）測量爲2 // m ° 色度，係使用顯微分光測光裝置（OSP-SP200 OLYMPUS公司製）所測得之値。另外，色度測量之光源 係使用C光源。 將丙二醇單甲基醚乙酸酯滴下lml至測量後之塗膜上 ，在槳式攪拌器靜置30s後’以1 000rPm之旋轉數甩動 -46- 201245873 1 0 s 1 然後，以與前述記載相同的方法測量出膜厚與色度。 以下述記載的式子，計算出丙二醇單甲基醚乙酸酯接觸測 量前後的膜厚變化率。 膜厚保持率（％) =接觸後之膜厚/接觸前之膜厚xl 00 此外，根據ns Z 8730及丙二醇單甲基醚乙酸酯接觸 測量前後之色度，計算出色差。 當膜厚保持率越高，且色差越小，則耐溶劑性越爲良 好，而形成彩色濾光片時，可防止混色。 <解像度評估> 以雷射顯微鏡（Axio Imager MAT Carl Zeiss公司製 )觀察先前所形成之圖型，將解像之最小尺寸設爲解像度 。解像度係可形成越微細的圖型，加工性越優異。 表2 實施例 1 實施例 2 實施例 3 實施例 4 實施例 5 Θ施例 6 實施例 7 比較例 1 著色握;光性樹脂 組成物 1 2 3 4 5 6 7 8 解像m(iim) 20 2 0 2 0 20 2 0 2 0 2 0 3 0 娜保時率 (%) 8 0 9 9 10 0 9 9 9 3 9 8 9 3 膜 剝離 色差 5. 1 0. 7 0-6 0. 7 4. 6 4. 7 4. 2 膜 剝離 -47- 201245873 產業上之可利用性 依據本發明之著色感光性樹脂組成物，係可得到具有 優異的解像性及耐久性之圖型。 -48 -G3: SUMI-EPOXY ESCN-195XL G4: surfactant: polyether modified polyketone oil (Toray SILICONE SH8400; manufactured by Dow Corning Toray Co., Ltd.) < evaluation of solvent resistance> by spin coating In the method, the colored photosensitive compositions 1 to 8 were applied onto a substrate on which a PET film (LUMILER 75-T60 manufactured by Toray) was laminated on a glass plate of 2 inches square, and on a hot plate at 80 ° C. Pre-bake for 2 minutes. After allowing to cool, an exposure machine (TEM-15 0RSK; TOPCON) was used to irradiate light at an exposure amount of 150 mJ/cm 2 (365 nm basis) in an air atmosphere. After light irradiation, it was immersed in an aqueous imaging solution containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 23 ° C for 50 seconds to be imaged, and washed with whiteness. After the net, it was heated at 6 ° C for 5 minutes to form a color pattern. The film thickness of the obtained pattern was measured using a film thickness measuring device (DEKTAK3; manufactured by Sakamoto Vacuum Technology Co., Ltd.) to be 2 // m ° chromaticity, using a microscopic spectrophotometer (OSP-SP200 OLYMPUS) ) The measured flaws. In addition, the light source for colorimetric measurement uses a C light source. Drop 1 ml of propylene glycol monomethyl ether acetate onto the measured coating film, and after the paddle stirrer is left for 30 s, 'pulse with a rotation number of 1 000 rPm -46-201245873 1 0 s 1 The film thickness and chromaticity were measured by the same method. The film thickness change rate before and after the contact measurement of propylene glycol monomethyl ether acetate was calculated by the following formula. Film thickness retention ratio (%) = film thickness after contact / film thickness before contact xl 00 In addition, the excellent difference was calculated from the chromaticity before and after the measurement of ns Z 8730 and propylene glycol monomethyl ether acetate contact. When the film thickness retention ratio is higher and the chromatic aberration is smaller, the solvent resistance is better, and when the color filter is formed, color mixing can be prevented. <Resolution Evaluation> The previously formed pattern was observed with a laser microscope (manufactured by Axio Imager MAT Carl Zeiss Co., Ltd.), and the minimum size of the resolution was set as the resolution. The resolution is such that a finer pattern can be formed, and the workability is more excellent. Table 2 Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Comparative Example 1 Colored grip; Photoreceptor composition 1 2 3 4 5 6 7 8 Solution m(iim) 20 2 0 2 0 20 2 0 2 0 2 0 3 0 Nabao time rate (%) 8 0 9 9 10 0 9 9 9 3 9 8 9 3 Film peeling color difference 5. 1 0. 7 0-6 0. 7 4 6 4. 7 4. 2 Film peeling - 47 - 201245873 INDUSTRIAL APPLICABILITY According to the colored photosensitive resin composition of the present invention, a pattern having excellent resolution and durability can be obtained. -48 -

Claims (1)

201245873 七、申請專利範圍： 1 . 一種著色感光性樹脂組成物，其係含有（A )、 (B ) 、( C) 、( D)、（E)及（F)： (A )著色劑； (B )使下述（a )與（b )共聚合所得之共聚物與（c )產生反應，接著再與（d)產生反應而得之樹脂； (a) :具有碳數2〜4之環狀醚骨架及乙烯性不飽 和鍵的單體 (b) :具有可與（a)共聚合之不飽和鍵，且與（ a )不同的單體 (c) :由不飽和羧酸及不飽和羧酸酐所成之群中 所選出的至少1種 (d) :多元酸酐 (C )聚合性化合物； (D) 聚合反應起始劑； (E) 多官能硫醇化合物； (F )溶劑。 2-如申請專利範圍第1項所記載之著色感光性樹脂 組成物，其中（D)係肟化合物。 3. 如申請專利範圍第1項或第2項所記載之著色感 光性樹脂組成物，其中進一步含有噻噸酮化合物。 4. 如申請專利範圍第1項所記載之著色感光性樹脂 組成物，其中（D)係含有醯基膦氧化物化合物或烷基苯 酮化合物。 -49- 201245873 5 ·如申請專利範圍第1項所記載之著色感光性樹脂 組成物，其中（b)係含有具有：至少1種由三環癸烷骨 架及三環癸烯骨架所成之群中所選出的骨架、和乙烯性不 飽和鍵之化合物。 6. 如申請專利範圍第1項所記載之著色感光性樹脂 組成物，其中（a)係具有環氧乙烷基及乙烯性不飽和鍵 之單體。 7. —種圖型，其係使用如申請專利範圍第1項所記 載之著色感光性樹脂組成物所形成。 8. —種彩色濾光片，其係含有如申請專利範圍第7 項所記載之圖型。 9. —種彩色濾光片之製造方法，其係包含下述（1) 〜（3 )所示之步驟： (1 )藉由將如申請專利範圍第1項所記載之著色感 光性樹脂組成物塗佈於基板而得到塗佈膜的步驟； (2 )於塗佈膜上，經由遮罩而曝光，以得到曝光後 塗佈膜的步驟； (3 )藉由鹼顯像液使曝光後塗佈膜顯像，以得到圖 型的步驟》 -50- 201245873 四 指定代表圖： (一） 本案指定代表圖為：無 (二） 本代表圖之元件符號簡單說明：無 201245873 五 本案若有化學式時，請揭示最能顯示發明特徵的化學 式：無201245873 VII. Patent application scope: 1. A colored photosensitive resin composition containing (A), (B), (C), (D), (E) and (F): (A) a coloring agent; (B) a resin obtained by copolymerizing the following (a) and (b) with (c), and then reacting with (d) to obtain a resin; (a): having a carbon number of 2 to 4 a monomer having a cyclic ether skeleton and an ethylenically unsaturated bond (b): a monomer having an unsaturated bond copolymerizable with (a) and different from (a): from an unsaturated carboxylic acid and not At least one selected from the group consisting of saturated carboxylic anhydrides (d): polybasic acid anhydride (C) polymerizable compound; (D) polymerization initiator; (E) polyfunctional thiol compound; (F) solvent. The coloring photosensitive resin composition as described in claim 1, wherein (D) is a ruthenium compound. 3. The color-sensitive photosensitive resin composition according to claim 1 or 2, further comprising a thioxanthone compound. 4. The colored photosensitive resin composition according to claim 1, wherein (D) contains a mercaptophosphine oxide compound or an alkylphenone compound. The colored photosensitive resin composition according to the first aspect of the invention, wherein (b) contains at least one group consisting of a tricyclodecane skeleton and a tricyclodecene skeleton. a skeleton selected from the group and a compound having an ethylenically unsaturated bond. 6. The colored photosensitive resin composition according to the first aspect of the invention, wherein (a) is a monomer having an oxirane group and an ethylenically unsaturated bond. 7. A pattern formed by using a colored photosensitive resin composition as recited in claim 1 of the patent application. 8. A color filter comprising the pattern as recited in claim 7 of the scope of the patent application. 9. A method of producing a color filter comprising the steps of (1) to (3) below: (1) comprising a colored photosensitive resin as recited in claim 1 of the patent application; a step of applying a coating on a substrate to obtain a coating film; (2) exposing on the coating film through a mask to obtain a film after exposure; (3) after exposing by an alkali developing solution Coating film development, to obtain the pattern of the steps" -50- 201245873 four designated representative map: (a) The representative representative of the case is: no (two) the representative symbol of the symbol of the figure is simple: no 201245873 five cases if In the chemical formula, please reveal the chemical formula that best shows the characteristics of the invention: none
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