TW201236774A

TW201236774A - Sweeping member, sweeping method of coater, and manufacturing method of sweeping device and display member

Info

Publication number: TW201236774A
Application number: TW100146080A
Authority: TW
Inventors: Yoshiyuki Kitamura; Yoshinori Tani; Miki Nishimoto; Sadahiko Ito; Satoru Uchiyama; Hiroshi Yamada
Original assignee: Toray Eng Co Ltd
Priority date: 2011-03-07
Filing date: 2011-12-14
Publication date: 2012-09-16
Also published as: JP5138058B2; KR20120101986A; CN102674702B; CN102674702A; TWI405624B; KR101311841B1; JP2012185404A

Abstract

The topic of the present invention is to provide a sweeping member capable of increasing the outflow speed of the coating fluid removed from the coater along the sweeping member during sweeping without re-adhering to the coater, so that there is no residual coating fluid or cleaning solvent, etc. to prevent causing abnormal thickness of coating film or coated surface defect. The solution of the present invention is that a first surface and a second surface are provided which are opposite to each other, to be in contacting with a discharge port and the a discharge port surface extended in one direction of the coater and two adjacent surfaces of the discharge port face while sliding along that direction. The sweeping member provided for sweeping the discharge port surface and the two adjacent surfaces comprises a sweeping part disposed on the side of the first surface while contacting the discharge port surface and the two adjacent surfaces; and plural of outflow path surfaces starting from the sweeping part and extended to the side of second surface, wherein the outflow path surfaces have a notch on the aforementioned second surface.

Description

201236774 六、發明說明：【發明所屬之技術領域】師1] 本發明是關於使用於例如彩色液晶顯示器（C0 1 〇r liquid crystal display)用彩色濾光片（c〇i〇r filter)以及陣列基板（array substrate)、電漿顯示器（plasma display)用面板（panei)、濾光器 (optical filter)等的顯示器用構件的製造領域，詳細為關於適合使用於將塗佈液吐出到玻璃基板（glass D substrate)等的被塗佈構件表面並形成塗佈膜的開縫塗佈器（slit coater)的開縫噴嘴（siit nozzle)的吐出口及其周邊的清掃方法及清掃裝置以及使用該等清掃方法及清掃裝置之顯示器用構件的製造方法。 [先前技術】 [0002] 彩色液晶用顯示器是藉由彩色濾光片、 TFT(Thin-Film Transistor:薄膜電晶體）用陣列基板等的構件構成，而在彩色濾光片及TFT用陣列基板的製造 0 多半都包含有塗佈低黏度的液體材料，使塗佈的液體材料乾燥，形成塗佈膜的製程。例如在彩色濾光片的製程中，在玻璃基板上形成黑色的光阻（photoresist)材的塗佈膜，藉由微影法 (photo 1 ithographic method)將所形成的塗佈膜加工成格子狀（lattice-shaped)後，在格子間藉由同樣的手法依次形成紅色、藍色及綠色的光阻材的各個塗佈膜。此外，在彩色濾光片的製造中，有塗佈各色的光阻材並於塗佈膜的形成後形成用以得到被注入到彩色濾光片 π與陣列基板之間的液晶的空間的柱，或者形成用以使彩 10014608(^單編號Α0101 第3頁/共51頁 1013120709-0 201236774 色濾光片上的表面的凹凸平滑化的平滑化塗佈膜等的製程。塗佈膜形成用的塗佈裝置基於塗佈液的消耗量削減或電力消耗（power consumption)削減，進而基於使對應2m見方以上之超大型基板的裝置的大型化容易等的理由，開缝塗佈器（例如專利文獻1)近年來常被使用。該開縫塗钸器為塗佈頭，亦即塗佈器具有開縫喷嘴，一邊由設於開縫喷嘴的開縫狀的細長的吐出口吐出塗佈液，一邊形成塗佈膜於行走於一方向的玻璃基板等的單片狀的被塗佈構件。若一旦藉由開縫塗佈器進行塗佈液的塗佈，則塗佈液的一部分成滴狀或細長的液膜而殘留於開縫喷嘴之包含塗佈液被吐出的吐出口的吐出口面，與位於吐出口面的左右鄰的兩接鄰面（以後稱為[唇形斜面])。若在一次的塗佈程序的完了後，於滴狀或細長的液膜的塗佈液被放置在吐出口面及唇形斜面的狀態下繼續進行塗佈的話，則會產生無法得到均勻的塗佈面的問題。具體上，由於殘留於吐出口面或唇形斜面的塗佈液與被由開縫噴嘴吐出的塗佈液一起被塗佈於基板，因此產生塗佈膜厚的不均勻（以後稱為[塗佈不均])。而且，即使殘留的塗佈液不被塗佈，也會以其為起點於塗佈方向產生條紋（stripe)(以後稱為[塗佈條紋])。該等塗佈不均與塗佈條紋總稱為塗佈缺陷。當藉由開缝塗佈器接連不斷地在多數片的被塗佈構件進行高品質的塗佈時，為了避免這種塗佈缺陷，每一次的塗佈結束都需清掃開縫喷嘴的吐出口面及唇形斜面，除去附著殘留的塗佈液 1〇〇14_(Ρ編號删1 第4頁/共51頁 1013120709-0 201236774 為了除去這種殘留的塗佈液，在每次的塗佈的完了後或開始前使用清掃構件清掃開縫喷嘴的吐出口面及唇形斜面的方法及裝置被提出（例如專利文獻2、3)。具體上，藉由使具有與開縫喷嘴的吐出口面及唇形斜面的剖面形狀一致的形狀的合成樹脂製的清掃構件滑動於吐出口面及唇形斜面而進行清掃。可藉由使該清掃構件直接接觸並滑動於吐出口面及唇形斜面，確實地除去附著於吐出口面及卷形斜面的塗佈液，即使是連續塗佈於多數片的被塗佈構件時，也能穩定地得到膜厚均勻且無塗佈缺陷的高品質的塗佈膜。當使用感光性丙浠酸系色糊（photosensitive acrylic color paste)或光阻等的揮發性高的物質當作塗佈液時，特別被期望附著塗佈液的除去能力要高。因為若附著於吐出口面及唇形斜面的塗佈液的除去不充分，塗佈液剩餘一點點的話，則該剩餘的塗佈液乾燥而以固著殘留物殘留於吐出口面及唇形斜面。然後，固著殘留物在下次的塗佈時接觸塗佈液，除了產生以固著殘留物為起點的塗佈條紋外，固著殘留物之與吐出口面及唇形斜面的固著部分也會溶解且固著殘留物本身脫離吐出口面及唇形斜面並混入塗佈膜而成為微粒（particle) ，更進一步產生塗佈缺陷。因此，在專利文獻2、3中為了提高塗佈液的除去能力，亦即提高清掃能力，以便不產生固著殘留物，使清掃構件線接觸（line contact)吐出口面及唇形斜面。更在專利文獻2中，一旦完成清掃並朝附著塗佈液的清掃構 1013120709-0 10014608(^單編號A〇101 第5頁/共51頁 201236774 件由喷嘴吐出溶劑沖洗塗佈液，將清掃構件保持在潔淨的狀態並進行開縫喷嘴的清掃。據此，防止附著於清掃構件的塗佈液（固著殘留物）再附著於開縫喷嘴而產生塗佈骐面的缺點（塗佈缺陷）。更由接鄰清掃構件而設的吸弓丨口吸引該等液體，以便塗佈液或溶劑不殘留於清掃構件且不附著於開縫喷嘴。201236774 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a color filter (c〇i〇r filter) and an array for use in, for example, a color liquid crystal display (C1 1 liquidr liquid crystal display) The manufacturing field of a member for a display such as an array substrate, a panel display for a plasma display, or an optical filter is used in detail for discharging a coating liquid onto a glass substrate ( a cleaning method and a cleaning device of a discharge nozzle of a slit nozzle of a slit coater of a surface of a member to be coated such as a glass D substrate, and a cleaning device, and the use of the same A cleaning method and a method of manufacturing a member for a display of a cleaning device. [Prior Art] [0002] The color liquid crystal display is composed of a color filter, a TFT (Thin-Film Transistor) array substrate, and the like, and is used for a color filter and a TFT array substrate. More than half of the manufacturing process includes coating a low viscosity liquid material to dry the coated liquid material to form a coating film. For example, in a process of a color filter, a coating film of a black photoresist is formed on a glass substrate, and the formed coating film is processed into a lattice shape by a photo 1 ithographic method. After (lattice-shaped), each of the coating films of the red, blue, and green photoresist materials was sequentially formed by the same method between the lattices. Further, in the manufacture of the color filter, there is a column in which the color resists of the respective colors are applied, and after the formation of the coating film, a column for obtaining a space of the liquid crystal injected between the color filter π and the array substrate is formed. Or a process for forming a smoothing coating film for smoothing the unevenness of the surface on the color filter of the color code 10014608 (the single number Α 0101, the third page / the 51 page 1013120709-0 201236774 color filter). The coating device is based on the reduction in the consumption of the coating liquid or the reduction in the power consumption, and the slitting applicator (for example, a patent) is based on the fact that the size of the device corresponding to the ultra-large substrate of 2 m square or more is increased. Document 1) is often used in recent years. The slit applicator is a coating head, that is, the applicator has a slit nozzle, and the coating liquid is discharged by a slit-shaped elongated discharge port provided in the slit nozzle. A one-piece coated member such as a glass substrate that travels in one direction is formed by applying a coating film. When the coating liquid is applied by a slit coater, a part of the coating liquid is dropped. Residual or slender liquid film The discharge nozzle includes a discharge port surface of the discharge port through which the coating liquid is discharged, and two adjacent surfaces on the right and left sides of the discharge port surface (hereinafter referred to as [lip slope]). When the coating liquid of the liquid or the liquid film is placed on the discharge surface and the lip-shaped inclined surface, the application of the coating liquid to the surface of the discharge surface and the lip-shaped surface is continued, and a problem that a uniform coating surface cannot be obtained is caused. Since the coating liquid remaining on the discharge surface or the lip inclined surface is applied to the substrate together with the coating liquid discharged from the slit nozzle, unevenness in the thickness of the coating film occurs (hereinafter referred to as [uneven coating] Further, even if the remaining coating liquid is not applied, a stripe (hereinafter referred to as [coating stripe]) is generated in the coating direction from the starting point. The coating unevenness and coating are applied. The cloth stripes are collectively referred to as coating defects. When high-quality coating is continuously applied to a plurality of coated members by a slit coater, in order to avoid such coating defects, each coating end is completed. It is necessary to clean the discharge surface and the lip slope of the slit nozzle to remove the adhesion. The coating liquid to be left is 1〇〇14_(Ρ#删1第4//51 pages 1013120709-0 201236774 In order to remove such residual coating liquid, the cleaning member is used after each coating is completed or before starting. A method and an apparatus for cleaning the discharge surface and the lip slope of the slit nozzle are proposed (for example, Patent Documents 2 and 3). Specifically, the cross-sectional shape of the discharge port surface and the lip slope of the slit nozzle is made uniform. The synthetic resin-made cleaning member is slid on the discharge port surface and the lip-shaped inclined surface to be cleaned. The cleaning member can be reliably removed and adhered to the discharge port surface by directly contacting the cleaning member and sliding on the discharge port surface and the lip-shaped inclined surface. The coating liquid of the roll-shaped bevel can stably obtain a high-quality coating film having a uniform film thickness and no coating defects even when it is continuously applied to a plurality of coated members. When a highly volatile substance such as a photosensitive acrylic color paste or a photoresist is used as a coating liquid, it is particularly desirable to have a high removal ability of the coating liquid. When the coating liquid adhering to the discharge surface and the lip slope is insufficiently removed, if the coating liquid remains a little, the remaining coating liquid is dried, and the residue remains on the discharge surface and the lip shape. Beveled. Then, the fixing residue contacts the coating liquid at the time of the next coating, and in addition to the coating stripe starting from the fixing residue, the fixing portion of the fixing residue and the discharge surface and the lip slope are also fixed. The solution remains dissolved and the residue itself separates from the discharge surface and the lip slope, and is mixed into the coating film to form particles, which further causes coating defects. Therefore, in Patent Documents 2 and 3, in order to improve the removal ability of the coating liquid, that is, to improve the cleaning ability so that the fixing residue does not occur, the cleaning member is in line contact with the discharge port surface and the lip slope. Further, in Patent Document 2, once the cleaning is completed and the cleaning liquid is applied to the coating liquid 1013120709-0 10014608 (^, single number A〇101, page 5/51, 201236774, the solvent is sprayed from the nozzle, the cleaning liquid will be cleaned. The member is kept in a clean state and the slit nozzle is cleaned. Accordingly, the coating liquid (fixed residue) adhering to the cleaning member is prevented from adhering to the slit nozzle to cause a coating defect (coating defect) Further, the liquid is sucked by the suction opening provided by the adjacent cleaning member so that the coating liquid or the solvent does not remain in the cleaning member and does not adhere to the slit nozzle.

[專利文獻1]曰本國特開平6-339656號公報 [專利文獻2]曰本國特開平ii_3〇〇261號公報 [專利文獻3]日本國特開2008-268906號公報【發明内容】參照圖8及圖9，針對使用習知的清掃構件清掃開縫喷嘴的吐出口面及唇升>斜面的方法進行說明。在圖8的側剖面圖顯示使清掃構件之擦拭構件400滑動，附著於開縫喷嘴20的塗佈液150被除去的狀態。在圖9(a)顯示由斜方向看擦拭構件4〇〇的狀態。圖8所示的擦拭構件400的移動方向之箭頭Ds方向中的擦拔構件4〇〇與開縫喷嘴20的卡合狀況，之後如參照圖 4(b)說明的，是與本案發明中的一樣。唇形斜面34A(基於製圖上的方便起見，顯示相反面）接鄰吐出口面36的單側。此外，在唇形斜面34A上如後述，存在塗佈液424、殘留液420及附著的塗佈液15〇。如圖9所示，擦栻構件4〇〇為了加強與開縫喷嘴的線接觸並提高塗佈液麟去能力，且為了與㈣喷嘴2〇的吐出口面36或唇形斜面34A卡合，藉由使挖空的部分成最小限度的大小而謀求高剛性化。擦找構件_透過底邊 1〇〇146〇8(^ 單碥號 406、斜邊404A、404B線接觸吐出口㈣及唇形斜面 A0101 第6頁/共51頁 1013120709-0 201236774 34A並移動於箭頭Ds方向（在圖8中由右向左）而進行清掃如圖8所示，附著於開縫喷嘴20的塗佈液150—藉由擦拭構件400被由吐出口卸36或唇形斜面34A除去，就一時被匯集於藉由吐出口面36和與該吐出口面36對向的擦拭構件400的底面402包圍的空間S。被匯集的塗佈液154 成為順著底面402及前面41 2流出的塗佈液152而落下到下方，或者被由依照需要而設的吸引口 422吸引到保持擦拭構件400的托座（holder)112。但是，為了縮短清掃時間並提高生產性，若以更高速進行清掃，則被匯集於空間S的塗佈液154的量變成比順著底面402等流出的塗佈液152的量還多，故被由空間S 匯集的塗佈液154會溢出。即使加大來自吸引口 422的吸引速度，也因不影響順著底面402流出的塗佈液152的流出速度，故無法防止塗佈液由空間S溢出。由空間S溢出的塗佈液變成沿著擦拭構件4 0 0與唇形斜面34A之間的間隙移動到上部的塗佈液424，於唇形斜面34A的上部再附著，並於開縫喷嘴20的縱向以線狀的殘留液420殘留。再附著的殘留液420的量一多，殘留液 420就沿著唇形斜面34A落下到開縫喷嘴20的吐出口面36 ，依照情況在塗佈時會附著於塗佈膜面，引起塗佈條紋或塗佈不均等的塗佈缺陷。於開縫喷嘴20再附著成線狀的殘留液420每次清掃就儲存且線的寬度逐漸變大，若在該狀態下固化，則由於與擦拭構件4 0 0的接觸而使清掃構件磨耗。因擦拭構件 400的已磨耗的部分無充分的接觸壓力（contact 1013120709-0 10014608(^單編號A〇101 第7頁/共51頁 201236774 pressure)，故產生塗佈液的除去不能進行，可清掃的範圍變小，可使用於擦拭構件40 0的清掃的期間短，亦即使用壽命變短之問題。如上述，因擦拭構件400為了高剛性化起見而使挖空的部分成最小限度的大小，故如圖9(b)所示，在清掃結束後塗佈液附著殘留於擦拭構件400的底面402與其周邊，成為殘留塗佈液4 2 6。即使由喷嘴吐出溶劑清洗該殘留塗佈液4 2 6，溶劑也會取代殘留塗佈液4 2 6的塗佈液（與其一樣）而附著殘留於底面402與其周邊。如此，若在溶劑殘留於清掃構件（擦拭構件400)之上的狀態下進行開缝喷嘴20的清掃，則除了溶劑附著於清掃開始部並殘留於開縫喷嘴20外，附著的溶劑還與開縫喷嘴20的吐出口的塗佈液接觸並混合，塗佈液會被稀釋，故塗佈開始部的膜厚會變小。而且，由於溶劑與塗佈液混合而引起所謂的溶劑衝擊（sol vent shock)，塗佈液的固體含量（solid con tent)被分離並產生異物，該異物附著於塗佈面而顯著地損及塗佈品質。本發明是為了解決起源於上述的習知的清掃構件的問題點所進行的創作，其目的為實現一種可提高在清掃時由塗佈器除去的塗佈液順著清掃構件流出的速度且不產生再附著於塗佈器，以及塗佈液或清洗用的溶劑等不殘留而不會引起塗佈膜厚異常或塗佈膜面的缺點之清掃構件。再者，本發明的目的為提供一種使用該清掃構件，大大地貢獻於生產性或品質的提高之塗佈器的清掃方法及裝置以及使用該方法的顯示器用構件的製造方法。上述本發明的目的是藉由以下所述的手段（means) 1001460#單編號 A〇101 第8頁/共51頁 1013120709-0 201236774 達成。與本發明有關的清掃構件具有互相對向的第一面與第二面，一邊接觸延伸於塗佈器的一方向的吐出口的吐出口面，與該吐出口面的兩接鄰面，一邊滑動於該一方向，提供該吐出口面與該兩接鄰面的清掃，其特徵包含：配設於該第一面侧之同時接觸該吐出口面與該兩接鄰面之清掃部；以及以前述清掃部為起點，延伸至前述第二面側之複數個流出路徑面，在前述流出路徑面於前述第二面側設有缺口。此處，前述缺口具有三角形狀的剖面較佳。與本發明有關的塗佈器的清掃方法是藉由清洗液清洗申請專利範圍第1項或第2項之清掃構件的清掃部後，一邊使該清掃部接觸前述吐出口面及前述兩接鄰面，一邊使其滑動於前述一方向，清掃前述塗佈器的方法，其特徵為：在前述第二面側於重力方向中在比該缺口還下方的位置保持該清掃構件*以便塗佈液與清洗液由該缺口的一端流出。與本發明有關的塗佈器的清掃裝置是一邊使前述清掃部接觸前述吐出口面與前述兩接鄰面，一邊使申請專利範圍第1項或第2項之清掃構件滑動並進行清掃，其特徵包含：前述清掃構件的保持體；使前述清掃構件與前述保持體滑動於前述一方向之移動手段；以及透過清洗液進行清掃構件的清掃部的清洗之清掃構 10014608(P編號舰01 第9頁/共51頁 1013120709-0 201236774 件清洗裝置，前述保持體在前述第二面側中於重力方向中在比該缺口還下方的位置保持該清掃構件。與本發明有關的顯示器用構件的製造方法是使用申請專利範圍第3項之清掃方法製造顯示器用構件。 [0004] 【發明的功效】若使用與本發明有關的清掃構件與塗佈器的清掃方法及清掃裝置，因橫跨在流出與清掃構件的清掃部相反侧的液體的側相鄰的流出路徑面設有缺口，由塗佈器除去的塗佈液順著流出路徑面流出的速度僅提高由缺口造成的毛細管作用（capillary action)的部分，故可抑制在清掃時除去的塗佈液積存於塗佈與清掃構件之間並溢出。其結果，可避免塗佈液再附著於塗佈器之問題。而且，由於缺口使得塗佈液或清洗用的溶劑必定會由清掃構件流出'故可抑制在清掃構件的清掃部或其附近塗佈液或清洗液之溶劑的殘留。如此，因可抑制塗佈液之再附著於塗佈器，或者塗佈液或清洗用的溶劑殘留於清掃構件的清掃部或其附近之問題，故可使塗佈器成塗佈液完全不殘留的高品質的清掃狀態。其結果，可形成塗佈膜厚精度高，塗佈膜面完全無缺點的高品質的塗佈膜。依照與本發明有關的顯示器用構件的製造方法，因使用上述的優越的清掃方法製造顯示器用構件，故即使是高速清掃時也能提高清掃能力且作業時間（t a c t time)的大幅的縮短也可能，進而能以高的生產性與高良 1謝棚#單編號删1 第10頁/共51頁 1013120709-0 201236774 率（yield)製造膜厚精度高且無塗佈缺陷之優越的塗佈品味的顯示器用構件。【實施*方式】 [0005] 以下參照圖1、圖2、圖3、圖4、圖5、圖6及圖7，針對本發明的較佳的實施形態進行說明。圖1是顯示包含與本發明有關的清掃裝置的塗佈裝置的開縫塗佈器之概略，圖2是顯示藉由擦拭構件清掃開縫噴嘴的狀況，圖3 是顯示本發明的清掃構件之擦拭構件，圖4及圖5是顯示藉由與本發明的實施的形態有關的擦拭構件進行的開縫喷嘴的清掃作用，圖6是本發明的清掃構件的另一實施態樣例的擦拭構件300之概略斜視圖，而且圖7是表示藉由與本發明的實施的形態有關的擦拭構件進行的清掃作用的試驗結果。如圖1所示，與本發明的實施的形態有關的開縫塗佈器1包含清掃裝置之擦拭單元100。開縫塗佈器1具備基台 2，在基台2上配設有一對導軌（gu i de rail)4。在導軌 4上配置有被塗佈構件之基板A的承載台，亦即平台 (stage)6。平台6藉由線性馬達（linear motor)(未圖示）驅動，自在地往復運動於箭頭所示的X方向。平台6為其頂面平行於藉由對X方向垂直的Y方向與X方向規定的XY 平面而被承載。此外，XY面平行於水平面而被設定較佳再者，平台6的頂面成由吸附孔構成的真空吸附面，可吸附保持基板A。在基台2的中央配設有門型的支柱10 。在支柱10包含有自由地往復運動於對XY平面垂直的Z方向之上下升降單元70，進行塗佈的塗佈器之開縫喷嘴20 1013120709-0 10014608(^單編號A〇101 第11頁/共51頁 201236774 其縱向與Y方向平行而被安裝於該上下升降單元70。開缝喷嘴20為延伸於Υ方向的前唇（front 1 ip)22 及後唇（rear lip)24透過堅片（shim)32重疊於X方向，並且透過複數個連結螺栓（未圖示）被一體結合。在開縫喷嘴20的内部的中央形成有歧管（manifold)26。歧管 26也延伸於Y方向。在歧管26的下方連通形成有延伸於開缝喷嘴20的縱向（Y方向）的開縫（slit)28。開缝28的下端部在開缝喷嘴20的最下端面之吐出口面36開口，形成吐出口30。亦即開縫喷嘴20在其最下端具有延伸於縱向 (Y方向）的吐出口30，吐出口 30存在於吐出口面36。接鄰吐出口面36的兩侧的兩接鄰面有唇形斜面34A及34B。因開縫28藉由墊片32形成，故開縫28的間隙（X方向的餘隙（clearance))與墊片32的厚度相等。使開縫喷嘴20升降的上下升降單元70是藉由如下的構件構成：使吐出口 3 0朝下侧而保持開縫喷嘴2 0之懸掛保持台80 ;懸掛保持台80的一端被鎖緊且使該懸掛保持台 80升降之升降台78 ;將升降台78導引於上下方向之導件 (guide)74 ;將馬達72的旋轉運動轉換成升降台78的直線運動之滚珠螺桿（ball screw)76。上下升降單元70支撐開縫喷嘴20的縱向（Y方向）的兩端部，在左右配設有一對，以便可各自獨立升降。可透過該一對上下升降單元70，任意設定對開縫喷嘴20的縱向的水平（Υ方向）的傾斜角度。據此，可使開缝喷嘴20 的吐出口面36與基板Α遍及開縫噴嘴20的縱向成略平行。再者，可透過上下升降單元70將平台6上的基板A與開縫喷嘴2 0的吐出口面3 6之間的間隙，亦即餘隙 1001460#單編號 A0101 第12頁/共51頁 1013120709-0 201236774 (clearance)設定成任意的大小。開縫喷嘴20内的歧管26的上游側是經由内部通路（未圖示）始終連接於與塗佈液供給裝置40相連的供給管60 。可經由供給管60由塗佈液供給裝置4〇將塗佈液66供給至歧管26。被供給至岐管26的塗佈液在均等地被擴寬於開縫喷嘴20的縱向（Y方向）後，經由開縫28被由吐出口 3 0吐出。塗佈液供給裝置40在供給管6〇的上游侧具備：過滅 Ο 器（filter)46、供給閥 42、注射泵（syringe pump)50 、吸引閥44、吸引管62及槽（tank)64。在槽_存有塗佈液66。槽64被連結於I缩空氣_，可將任意大小的背壓（backpressure)附加於所儲存的塗佈液“。槽μ 内的塗佈液66透過吸引管62被供給至注射泵5〇。汪·射泉50為注射器（syringe) —一。’ 丞 Ο (piston)54被安裝於本體56而構成。活細可藉由驅動源（未圖示）自在地往復運動於上下方向。注射泵50為將塗佈細填充於具有一定的内徑的注射器52的内部，透過活塞54將塗佈液66擠出，將塗佈—片基板A的份的塗佈液66供給至開縫喷嘴2〇的定容量型的泵。將塗佈祕填充於注射器52_部時是令吸引祕為開:令供給閥42為關，使活塞54移動至下方。另一方面，藉由將被填充於注射器52内堂佈夜朝開縫喷嘴20 供給時疋令吸引閥44為關，令銘叙忍為開’使活塞54 移動至上方，以活塞54將注射器5 卜施廿姑山町円4的塗佈液66往上推並排出。活塞54的移動速度乘 L /王射盗剖面積為塗佈液66的供給速度，亦即泵供給速度。 10014608#草編號A〇101 S 13頁/共51頁又 1013120709-0 201236774 在圖1中如基台2的左侧所示，測定基板a的厚度的厚度感測器90被安裝於支撐台92。厚度感測器9〇使用雷射者較佳。藉由以厚度感測器90測定基板A的厚度，對不同厚度的基板A也能使開縫噴嘴20的吐出口面％與基板a之間的間隙之餘隙（clearance)始終一定。在圖1中於基台2的右側端部，清掃裝置之擦拭單元 100在導軌4上移動自如地被安裴於X方向。在擦拭單元 100 ’具有卡合於開縫喷嘴20的形狀的清掃構件之擦拭構件200被安裝於托座112。擦拭構件200藉由壓板114固定，以便不會移動。壓板114與托座112藉由螺旋（screw) 等的鎖緊手段（未圖示）鎖緊保持。托座112透過僅導引於上下方向的兩個導件ιΐ6被安裝於托架（braket)104。在各個導件116的周圍安裝有彈 1118 ’擦拭構件200透過托座112自在地追縱開縫喷嘴 2〇之由吐出口面36與唇形斜面3似3_成的頂端部的上下方向的位置變化。托架1〇4被安裝於滑件 (Slider)U)6。滑件1Q6藉由驅動單元1()8自在地移動於開縫喷嘴2〇的縱向（Y方向）。透過滑件106使擦拭構件200移動的驅動單元1〇8與托盤（叫MU)被固定於台車1〇2之上。托盤ΐι〇是用以回收藉由擦拭構件咖除去的塗佈液等的構件，連接於排出線（未圖不）’可將積存於内部的塗佈液等的液體排出、回收到外部。托盤110也能使用於用以回收由開縫喷嘴 20透過抽去空氣簟而，田開縫嘴嘴 Μ而吐出的塗佈液。台車1〇2位於導軌4 復運動L軌4導引’可藉由線性馬達(未圖示)自在地往[Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. 2008-268906. Fig. 9 shows a method of cleaning the discharge port surface and the lip lift > slope of the slit nozzle using a conventional cleaning member. In the side sectional view of Fig. 8, the wiping member 400 of the cleaning member is slid, and the coating liquid 150 adhering to the slit nozzle 20 is removed. Fig. 9(a) shows a state in which the wiping member 4 is viewed obliquely. The engagement state of the wiping member 4 〇〇 in the direction of the arrow Ds in the moving direction of the wiping member 400 shown in FIG. 8 and the slit nozzle 20, as described later with reference to FIG. 4(b), is the same as in the present invention. same. The lip bevel 34A (showing the opposite side based on the convenience of the drawing) is attached to one side of the adjacent discharge surface 36. Further, as described later, the coating liquid 424, the residual liquid 420, and the applied coating liquid 15〇 are present on the lip slope 34A. As shown in FIG. 9, the rubbing member 4A is for reinforcing the line contact with the slit nozzle and improving the coating liquid detachment ability, and for engaging with the discharge port face 36 or the lip bevel surface 34A of the (4) nozzle 2〇, The rigidity is increased by minimizing the size of the hollowed out portion. Wipe the component _ through the bottom edge 1〇〇146〇8 (^ single 碥 406, oblique 404A, 404B line contact spout (four) and lip bevel A0101 page 6 / total 51 page 1013120709-0 201236774 34A and move on Cleaning is performed in the direction of the arrow Ds (from right to left in Fig. 8). As shown in Fig. 8, the coating liquid 150 attached to the slit nozzle 20 is discharged from the discharge port 36 by the discharge member 400 or the lip slope 34A. When removed, it is once collected in the space S surrounded by the discharge surface 36 and the bottom surface 402 of the wiping member 400 opposed to the discharge surface 36. The collected coating liquid 154 follows the bottom surface 402 and the front surface 41 2 The outflowing coating liquid 152 is dropped to the lower side or is attracted to the holder 112 holding the wiping member 400 by the suction port 422 provided as needed. However, in order to shorten the cleaning time and improve the productivity, When the cleaning is performed at a high speed, the amount of the coating liquid 154 collected in the space S becomes larger than the amount of the coating liquid 152 flowing out along the bottom surface 402 or the like, so that the coating liquid 154 collected by the space S overflows. Increase the attraction speed from the suction port 422, and also do not affect the bottom Since the flow rate of the coating liquid 152 flowing out of the surface 402 is prevented, the coating liquid cannot be prevented from overflowing from the space S. The coating liquid overflowing from the space S moves along the gap between the wiping member 480 and the lip slope 34A to The upper coating liquid 424 is reattached to the upper portion of the lip inclined surface 34A, and remains in the linear residual liquid 420 in the longitudinal direction of the slit nozzle 20. The amount of the residual liquid 420 which is reattached is large, and the residual liquid 420 is along. The lip-shaped inclined surface 34A is dropped to the discharge opening surface 36 of the slit nozzle 20, and adheres to the coating film surface at the time of coating depending on the case, causing coating defects such as coating streaks or uneven coating. The line-shaped residual liquid 420 is stored every time it is cleaned and the width of the wire is gradually increased. When it is cured in this state, the cleaning member is worn by the contact with the wiping member 400. Because of the wiping member 400 The worn portion does not have sufficient contact pressure (contact 1013120709-0 10014608 (^ single number A〇101, page 7 / total page 51, 201236774 pressure), so the removal of the coating liquid cannot be performed, and the range of cleaning can be reduced. Can be used for cleaning the wiping member 40 0 The period is short, that is, the problem that the service life is shortened. As described above, since the wiping member 400 has a minimum size for the hollowed out portion for the purpose of high rigidity, as shown in Fig. 9(b), the cleaning is performed. After the completion, the coating liquid adheres to the bottom surface 402 of the wiping member 400 and the periphery thereof, and becomes the residual coating liquid 246. Even if the solvent is discharged from the nozzle to clean the residual coating liquid 4 2 6, the solvent replaces the residual coating liquid 4 The coating liquid of 2 6 (same as it) adheres to the bottom surface 402 and its periphery. When the cleaning nozzle 20 is cleaned in a state where the solvent remains on the cleaning member (wiping member 400), the solvent adheres to the cleaning start portion and remains in the slit nozzle 20, and the adhered solvent is also opened. The coating liquid of the discharge port of the slit nozzle 20 is brought into contact with and mixed, and the coating liquid is diluted, so that the film thickness at the coating start portion is reduced. Further, since the solvent and the coating liquid are mixed to cause a so-called solvent shock, the solid content of the coating liquid is separated and foreign matter is generated, and the foreign matter adheres to the coated surface to be significantly damaged. Coating quality. The present invention has been made to solve the problem of the above-mentioned conventional cleaning member, and the object thereof is to improve the speed at which the coating liquid removed by the applicator at the time of cleaning flows out along the cleaning member. A cleaning member that reattaches to the applicator, and does not remain in the coating liquid or the solvent for cleaning, and does not cause an abnormal coating film thickness or a coating film surface defect. Further, an object of the present invention is to provide a cleaning method and apparatus for an applicator which greatly contributes to improvement in productivity and quality using the cleaning member, and a method for producing a member for a display using the same. The above object of the present invention is achieved by means of the following means 1001460#single number A〇101 page 8/51 page 1013120709-0 201236774. The cleaning member according to the present invention has a first surface and a second surface facing each other, and contacts the discharge port surface of the discharge port extending in one direction of the applicator, and the adjacent surface of the discharge port surface Sliding in the one direction, providing cleaning of the discharge port surface and the two adjacent surfaces, and the method includes: a cleaning portion disposed on the first surface side while contacting the discharge port surface and the two adjacent surfaces; The plurality of outflow path surfaces extending from the cleaning portion are extended to the second surface side, and the outflow path surface is provided with a notch on the second surface side. Here, it is preferable that the notch has a triangular cross section. In the cleaning method of the applicator according to the present invention, after the cleaning portion of the cleaning member of the first or second aspect of the patent application is cleaned by the cleaning liquid, the cleaning portion is brought into contact with the discharge port surface and the two adjacent sides. a method of cleaning the applicator while sliding it in the one direction, wherein the cleaning member* is held at a position lower than the notch in the gravity direction on the second surface side so that the coating liquid The cleaning liquid flows out from one end of the notch. In the cleaning device for an applicator according to the present invention, the cleaning member of the first or second aspect of the patent application is slid and cleaned while the cleaning portion is brought into contact with the discharge surface and the adjacent surfaces. The feature includes: a holding body of the cleaning member; a moving means for sliding the cleaning member and the holding body in the one direction; and a cleaning structure for cleaning the cleaning portion of the cleaning member through the cleaning liquid 10014608 (P number ship 01 No. 9) The cleaning device holds the cleaning member in a position in the gravity direction at a position lower than the notch in the second surface side. The manufacturing of the member for display according to the present invention is exemplified. The method is to manufacture a member for a display using the cleaning method of the third application of the patent application. [0004] [Effect of the Invention] If the cleaning method and the cleaning device of the cleaning member and the applicator according to the present invention are used, the traverse is flowing out A surface of the outflow path adjacent to the side of the liquid on the side opposite to the cleaning portion of the cleaning member is provided with a notch, and the coating is removed by the applicator. The speed of the flow out along the outflow path surface only increases the portion of the capillary action caused by the notch, so that the coating liquid removed during the cleaning can be prevented from accumulating between the coating and the cleaning member and overflowing. The problem of reattachment of the coating liquid to the applicator is avoided. Moreover, since the coating liquid or the solvent for cleaning must flow out of the cleaning member due to the notch, it is possible to suppress the coating liquid or the cleaning in the cleaning portion of the cleaning member or in the vicinity thereof. In this case, since the coating liquid can be prevented from reattaching to the applicator, or the coating liquid or the cleaning solvent remains in the cleaning portion of the cleaning member or in the vicinity thereof, the applicator can be used. A high-quality cleaning state in which the coating liquid does not remain at all, and as a result, a high-quality coating film having high coating film thickness precision and a coating film surface without defects can be formed. According to the member for display according to the present invention In the manufacturing method, since the display member is manufactured by using the above-described superior cleaning method, the cleaning ability can be improved and the tact time can be increased even at the time of high-speed cleaning. The shortening of the width is also possible, and the high productivity and high-quality 1 shed # single number deletion 1 page 10 / 51 page 1013120709-0 201236774 yield (yield) high film thickness precision and no coating defects A member for a display having a taste for application. [Embodiment *] [0005] Hereinafter, a preferred embodiment of the present invention will be described with reference to FIGS. 1, 2, 3, 4, 5, 6, and 7. 1 is a schematic view showing a slit coater including a coating device of a cleaning device according to the present invention, FIG. 2 is a view showing a state in which a slit nozzle is cleaned by a wiping member, and FIG. 3 is a view showing cleaning of the present invention. FIG. 4 and FIG. 5 show the cleaning action of the slit nozzle by the wiping member according to the embodiment of the present invention, and FIG. 6 is another example of the cleaning member of the present invention. A schematic oblique view of the wiping member 300, and Fig. 7 shows a test result of the cleaning action by the wiping member according to the embodiment of the present invention. As shown in Fig. 1, a slit coater 1 according to an embodiment of the present invention includes a wiping unit 100 of a cleaning device. The slit coater 1 is provided with a base 2, and a pair of guide rails 4 are disposed on the base 2. A stage (i.e., stage) 6 on which the substrate A of the member to be coated is placed is disposed on the guide rail 4. The platform 6 is driven by a linear motor (not shown) to reciprocate freely in the X direction indicated by the arrow. The stage 6 is carried with its top surface parallel to the XY plane defined by the Y direction perpendicular to the X direction and the X direction. Further, the XY plane is set to be parallel to the horizontal plane. Further, the top surface of the stage 6 is a vacuum adsorption surface composed of adsorption holes, and the substrate A can be adsorbed and held. A gate-shaped pillar 10 is disposed in the center of the base 2. The slit 10 includes a slitting nozzle 20 that is freely reciprocating in a Z direction perpendicular to the XY plane, and a coating nozzle of the applicator that is coated 20 1013120709-0 10014608 (^单号 A〇101第11页/ 51 pages 201236774 The longitudinal direction is parallel to the Y direction and is attached to the upper and lower lifting unit 70. The slit nozzle 20 is a front lip and a rear lip 24 extending through the crucible. The shim) 32 is superimposed on the X direction, and is integrally joined by a plurality of connecting bolts (not shown). A manifold 26 is formed in the center of the inside of the slit nozzle 20. The manifold 26 also extends in the Y direction. A slit 28 extending in the longitudinal direction (Y direction) of the slit nozzle 20 is formed in communication under the manifold 26. The lower end portion of the slit 28 is opened at the discharge port surface 36 of the lowermost end surface of the slit nozzle 20. The discharge nozzle 30 is formed, that is, the slit nozzle 20 has a discharge port 30 extending in the longitudinal direction (Y direction) at the lowermost end thereof, and the discharge port 30 is present on the discharge port surface 36. Two sides of the discharge port surface 36 are adjacent to each other. The adjacent faces have lip-shaped bevels 34A and 34B. Since the slits 28 are formed by the spacers 32, The gap (clearance in the X direction) of the slit 28 is equal to the thickness of the spacer 32. The upper and lower lifting unit 70 that raises and lowers the slit nozzle 20 is constituted by a member having the discharge port 30 toward the lower side The suspension holding table 80 is held by the slitting nozzle 20; the lifting table 78 is fastened and the lifting table 78 is lifted and lowered; and the lifting platform 78 is guided to the upper and lower directions. 74; a ball screw 76 that converts the rotational motion of the motor 72 into a linear motion of the lifting platform 78. The upper and lower lifting unit 70 supports both ends of the slit nozzle 20 in the longitudinal direction (Y direction), and is provided with a left and right side. Therefore, it is possible to independently raise and lower each other. The angle of inclination of the longitudinal direction (Υ direction) of the slit nozzle 20 can be arbitrarily set by the pair of up-and-down lifting units 70. Accordingly, the discharge port surface 36 of the slit nozzle 20 can be made. The substrate Α is slightly parallel to the longitudinal direction of the slit nozzle 20. Further, the gap between the substrate A on the stage 6 and the discharge port surface 36 of the slit nozzle 20 can be transmitted through the upper and lower lifting unit 70, that is, Gap 1001460#单号A0101 Page 12 of 51 1013120709-0 201236774 (clearance) is set to an arbitrary size. The upstream side of the manifold 26 in the slit nozzle 20 is always connected to the supply pipe 60 connected to the coating liquid supply device 40 via an internal passage (not shown). The coating liquid 66 can be supplied to the manifold 26 from the coating liquid supply device 4 through the supply pipe 60. The coating liquid supplied to the manifold 26 is uniformly widened in the longitudinal direction of the slit nozzle 20 (Y direction) After that, it is discharged through the discharge port 30 through the slit 28. The coating liquid supply device 40 is provided on the upstream side of the supply pipe 6A with a filter 46, a supply valve 42, a syringe pump 50, a suction valve 44, a suction pipe 62, and a tank 64. . A coating liquid 66 is stored in the tank_. The groove 64 is connected to the air _, and an embossed back pressure of any size can be added to the stored coating liquid. The coating liquid 66 in the groove μ is supplied to the syringe pump 5 through the suction pipe 62. The spring sprayer 50 is a syringe (synthesis) - one. The piston 54 is attached to the main body 56. The live fine can be reciprocally moved in the up and down direction by a drive source (not shown). 50 is a method in which the coating is finely packed inside the syringe 52 having a constant inner diameter, the coating liquid 66 is extruded through the piston 54, and the coating liquid 66 of the coating-sheet substrate A is supplied to the slit nozzle 2 The fixed-capacity pump of the crucible. When the coating secret is filled in the 52-portion of the syringe, the suction is secreted: the supply valve 42 is closed, and the piston 54 is moved downward. On the other hand, by being filled in When the syringe 52 is placed in the night, the slit nozzle 20 is supplied, and the suction valve 44 is closed, so that the inscription "opens the piston 54 to the upper side, and the piston 54 applies the syringe 5 to the The coating liquid 66 is pushed up and discharged. The moving speed of the piston 54 is multiplied by the L/King shot area to be the coating liquid 66. The supply speed, that is, the pump supply speed. 10014608#草编号A〇101 S 13 pages/total 51 pages and 1013120709-0 201236774 In FIG. 1, the thickness of the substrate a is measured as shown on the left side of the base 2 The detector 90 is mounted on the support table 92. The thickness sensor 9 is preferably a laser. By measuring the thickness of the substrate A by the thickness sensor 90, the slit nozzle 20 can also be applied to the substrate A of different thicknesses. The clearance of the gap between the discharge port area % and the substrate a is always constant. In the right end portion of the base 2 in Fig. 1, the wiping unit 100 of the cleaning device is movably mounted on the guide rail 4 In the X direction, the wiping member 200 having the cleaning member of the wiping unit 100' having the shape of the slit nozzle 20 is attached to the bracket 112. The wiping member 200 is fixed by the pressing plate 114 so as not to move. The pressing plate 114 and The bracket 112 is locked and held by a locking means (not shown) such as a screw. The bracket 112 is attached to the bracket 104 through the two guides ι6 which are guided only in the up and down direction. Each of the guides 116 is mounted with a spring 1118 'wiping member 200 through The seat 112 freely follows the positional change of the tip end portion of the slit nozzle 2 and the lip-shaped inclined surface 3 in the vertical direction. The bracket 1〇4 is attached to the slider U. 6. The slider 1Q6 is freely moved in the longitudinal direction (Y direction) of the slit nozzle 2 by the drive unit 1 () 8. The drive unit 1〇8 and the tray (called MU) for moving the wiper member 200 through the slider 106 It is fixed on the trolley 1〇2. The tray ΐι〇 is a member for collecting the coating liquid or the like removed by the wiping member, and is connected to the discharge line (not shown) to coat the inside. The liquid such as liquid is discharged and recovered to the outside. The tray 110 can also be used for recovering the coating liquid which is discharged by the slit nozzle 20 by removing the air enthalpy and opening the nozzle. The trolley 1〇2 is located on the guide rail 4 and the moving L-track 4 guides ‘ can be freely moved by a linear motor (not shown)

10014608(fME 麵、方向’故擦钱單元1〇〇全體可往復運動於χ方向第丨4頁/共51頁 1013120709-0 201236774 噴射溶劑並清洗擦拭構件2 〇〇的清洗單元丨4 〇於在χ 方向基台2的右側端部，在γ方向不與開縫喷嘴2〇的縱向端部干涉的位置，藉由托架（未圖示）固定。清洗單元14〇藉由噴射清洗液之溶劑的溶劑喷嘴142，與由溶劑供給源 (未圖不）將溶劑供給至溶劑喷嘴142的配管144構成。溶劑噴嘴142若為可將溶劑噴射成柱狀、喷淋（sh〇wer)狀或扇形狀等可噴射溶劑的話，則任何形態的都能適用。 0 根據以擦拭單元100為首，以及線性馬達、馬達72 塗佈液供給裝置4及洗淨單元丨4〇等的控制信號進行動作的機器都被電性連接於控制裝置94。控制裝置94依照被女裝於自身的自動運轉程式而將控制指令信號傳送至各機器，使各個機器進行預先決定的動作。此外，若適且將羑更參數輸入到操作盤Μ，則包含變更參數的控制指令信號被傳達至控制裝置94，被控制信號反映而能實現運轉動作的變更。 Q 關於擦拭單元100可任意控制擦拭構件200之開縫喷嘴20的縱向中的移動速度及/或清掃開始、結束位置等，可實現所給予的任意的清掃動作。關於清洗單元⑽為任意控制來自溶劑噴嘴142的溶劑的喷射速度或噴射時間，使其對擦拭構件200進行預先決定的清洗動作。其-人一邊參照圖2，一邊針對使用擦拭單元1〇〇的清掃方法進行說明。在圖2巾，轉拭構物Q清掃開縫喷嘴20的狀況被階段地顯示。此外在清掃開始前，擦拭構件200在X方向位於初始位置（在圖】中為基台2的右侧端部 )，在Y方向位於清掃開始位置。 10014608(^單編號A〇101 第15頁/共51頁 1013120709-0 20123677410014608 (fME face, direction 'There is a rubbing unit 1 〇〇 all reciprocating in the χ direction 丨 4 pages / a total of 51 pages 1013120709-0 201236774 Spraying the solvent and cleaning the wiping member 2 〇〇 cleaning unit 丨 4 〇右侧 The right end portion of the direction base 2 is fixed by a bracket (not shown) at a position where the γ direction does not interfere with the longitudinal end portion of the slit nozzle 2〇. The cleaning unit 14 喷射 sprays the solvent of the cleaning liquid The solvent nozzle 142 is configured by a pipe 144 that supplies a solvent to the solvent nozzle 142 from a solvent supply source (not shown). The solvent nozzle 142 can eject the solvent into a column shape, a shower, or a fan. Any shape can be applied to a solvent such as a shape. 0 A machine that operates based on a control signal such as the wiping unit 100 and the linear motor, the motor 72, the coating liquid supply device 4, and the cleaning unit 丨4〇. All of them are electrically connected to the control device 94. The control device 94 transmits a control command signal to each device in accordance with the automatic operation program of the woman, and causes each device to perform a predetermined operation. When the parameter is input to the operation panel, the control command signal including the change parameter is transmitted to the control device 94, and the operation signal can be changed by the control signal. Q The wiping unit 100 can arbitrarily control the slit nozzle of the wiping member 200. The movement speed in the longitudinal direction of the 20, the cleaning start and the end position, and the like can be achieved, and any cleaning operation can be performed. The cleaning unit (10) arbitrarily controls the ejection speed or the ejection time of the solvent from the solvent nozzle 142 to be The wiping member 200 performs a predetermined cleaning operation. The cleaning method using the wiping unit 1A will be described with reference to Fig. 2. In Fig. 2, the state of the swab structure Q cleaning slit nozzle 20 is Further, before the start of cleaning, the wiping member 200 is located at the initial position in the X direction (the right end portion of the base 2 in the figure) and at the cleaning start position in the Y direction. 10014608 (^单单号A〇 101 Page 15 of 51 1013120709-0 201236774

若清掃開始’則首先如圖2(a)所示，擦拭單元100 全體被移動於X方向，以便擦拭構件2〇〇來到與開縫喷嘴 20的吐出口面36與唇形斜面34A及34B卡合的位置的正下方。擦拭構件200為單側被支撑於位於托座112之以箭頭表示的移動方向側的前方支撐部12〇。前方支撐部120的頂部的上邊124朝下方與誘導面122及前斜面126相連。上邊124延伸於X方向’遍及擦拭構件2〇〇的X方向長度全體與擦拭構件200接觸。誘導面122形成沿著重力方向（Z 方向）向下側傾斜的平面狀’以便順著流出的塗佈液152 容易落下。誘導面122之對水平面（χγ平面）的傾斜角度較佳為15度~80度’更佳為30度~60度。其次如圖2(b)所示，若擦栻構件2〇〇來到開缝喷嘴 20的頂端部的正下方，且在γ方向稍微離開吐出口 3〇的清掃開始位置的話，則由開縫噴嘴2〇的吐出口 3〇吐出規定量的塗佈液66。被吐出的塗佈液66附著於開縫喷嘴2〇的吐出口面36或唇形斜面34A及34B而成為附著的塗佈液 150。If the cleaning starts, then first, as shown in Fig. 2(a), the entire wiping unit 100 is moved in the X direction so that the wiping member 2〇〇 comes to the ejection opening surface 36 and the lip inclined surfaces 34A and 34B of the slit nozzle 20. Just below the position of the snap. The wiping member 200 is supported on one side by a front support portion 12'' on the moving direction side indicated by an arrow on the bracket 112. The upper side 124 of the top of the front support portion 120 is connected downward to the induction surface 122 and the front slope 126. The upper side 124 extends in the X direction. The entire length in the X direction of the wiping member 2A is in contact with the wiping member 200. The inducing surface 122 forms a planar shape which is inclined downward in the direction of gravity (Z direction) so as to easily fall down along the flowing coating liquid 152. The angle of inclination of the inducing surface 122 to the horizontal plane (χγ plane) is preferably from 15 degrees to 80 degrees', more preferably from 30 degrees to 60 degrees. Next, as shown in Fig. 2(b), when the rubbing member 2 is directly below the tip end portion of the slit nozzle 20 and slightly away from the cleaning start position of the discharge port 3 in the γ direction, the slit is opened. A predetermined amount of the coating liquid 66 is discharged from the discharge port 3 of the nozzle 2A. The coating liquid 66 to be discharged adheres to the discharge port surface 36 of the slit nozzle 2 or the lip slopes 34A and 34B to form an applied coating liquid 150.

其次如圖2(c)所示，開縫喷嘴2〇被下降並使其卡合 (接觸）擦拭構件200。開縫噴嘴2〇被下降到彈簧118收縮較佳為〇. 5mm〜5mm，更佳為imm〜3mm的位置。若彈簧丄18 在此範圍（0.5mra~5mm)内收縮，則擦拭構件2〇〇可容易追蹤開縫喷嘴20的頂端部的上下（z)方向的位置變動。其次如圖2(d)所示，在使驅動單元1〇8驅動，使擦栻構件200接觸開縫喷嘴2〇的吐出口面36與唇形斜面34八及34B的狀態下’使擦栻構件2〇〇移動於箭頭所示的方 1〇〇146〇8(^ 單編號向，除去清掃附著於開縫噴嘴2Q的吐出口面36與唇形斜 A°101 « ^ 1013120709-0 201236774 面34A及34B的各面的塗佈液15〇與其他的污染物。|^方向為擦拭構件200 —邊接觸開縫噴嘴2〇，一邊移動，亦即滑動的滑動方向，與γ方向或開縫喷嘴2〇的縱向一致。被除去的塗佈液及其他的物質成為順著擦拭構件2〇〇或托座11 2的誘導面122或前斜面126流出的塗佈液152，進而落下到托盤110而被回收。擦拭構件2〇〇繼續移動於 Ds方向（γ方向）’在通過開縫噴嘴2〇的縱向端部的位置，亦即不與開縫喷嘴2〇的縱向端部干涉的位置停止。接著 ’擦拭單元全體移動至X方向中的初始位置，擦拭構件200在清洗單元14〇的正下方被停止。如圖2(e)所示，擦拭構件200在上述的停止位置中位於溶劑喷嘴142的下方。在該狀態下由溶劑噴嘴142喷射經由配管144供給的溶劑，清洗擦拭構件2〇〇。若清洗完了，使擦拭構件200回到Y方向的清掃開始位置。之後每次塗佈重複相同的清掃方法。其次參照圖3針對與本發明的實施的形態有關的擦拭構件20 0詳細地說明《此外，在圖3中顯示有在清掃動作時由滑動方向（Ds方向）的斜前侧看的擦拭構件2〇〇。擦拭構件200具有平板狀的形狀，具有後面21〇(第一面）與前面212(第二面）。在該後面210設有：線接觸開縫噴嘴2〇的吐出口面36的底邊206 ;線接觸成為吐出口面36的兩接鄰面的唇形斜面34A及34B的斜邊204A及204B。線接觸是指成為邊的線完全被包含在作為對象的面上的狀態《因此’底邊206的全部被包含在吐出口面36上而接觸，斜邊 204A及204B的全部各自被包含在唇形斜面34A及34B上而接觸。 mum^A0101 第17頁/共51頁 1013120709-0 201236774 此處，後面210為擦栻構件2〇〇的一方側的端面，前面212為僅距後面210厚度τ的他方側的端^。亦即，後面 210與則面212存在互相對向的位置關係。而且，在本實施形態中厚度方向是指與後面21〇及前面212的各面成直方向，如圖3所示定義為f方向。此外如後述，F方向在擦轼構件2〇〇被搭載於擦拭單元1〇〇的狀態下，成為對Y 方向僅朝下規定角度。後面210包含同時接觸開縫噴嘴2〇的吐出口面⑽與成為其兩接鄰面的唇形斜面34A及34B的清掃部之底邊 206與斜邊2〇4A及204B，後面21〇定義為位於單側人。後面的厚度方向的對面，亦即成為位於相反側的面為前面212，前面212定義為位於與單側A成與厚度方向的相反側的單侧B。在擦拭構件2 〇〇被滑動於d s方向時，單侧b位於比單側A還前方。在此意義下，稱單側A及單侧B分別為後面側及前面側。於在厚度方向（F方向）看擦拭構件2〇〇的狀態下，斜邊204A及204B成角度yc而設’各自相連於底邊2〇6的兩端而構成。於厚度方向底面202以底邊206為邊界，斜面 208A及208B以斜邊204A及204B為邊界而與後面21〇相連。在開縫喷嘴20的頂端部與擦拭構件2〇〇卡合時，底面 202與吐出口面36對向，斜面208A及208B與唇形斜面 34A及34B對向。包含底邊206的底面202在與後面210之間成角度々。包含斜邊204A及204B的斜面208A及208B 在與後面210之間成角度p。在圖3中’一點鏈線代表後面210，角度召被表示為底面202與一點鏈線之間的角度。底面202與後面210所 1013120709-0 10〇14_(P_ A(nQ1 ^ 18 1 7 ^ 51 1 201236774 成的角度；8詳細被定義為在底面202與後面210都正交的參考面内，參考面與底面202的交線（line of intersection)和參考面與後面210的交線所成的角度。而且’斜面208A及208B與後面210所成的角度p詳細被定義為在斜面208A及208B與後面210都正交的參考面内’參考面與斜面208A及208B的交線和參考面與後面 210的交線所成的角度。擦拭構件2〇〇為角度召及角度妒都是90度的情形的實施的形態例。此外，在斜面208A及 208B的頂部接連且水平地延伸者為頂面214A及214B。上述的底面202、斜面208A及208B及前面212因成為以清掃部之底邊206、斜邊204A及204B為起點，於厚度方向（F方向）延伸相連至單侧b為止的面，故被定義為流出路徑面。在具有前面212的單側B，橫跨成為相鄰的流出路徑面之底面202與前面212設有缺口 220。缺口 220連通流出路徑面而形成。在本實施形態中是連通於底面202與前面212而形成。缺口 220具有三角形剖面’藉由相當於三角形的頂點的缺口底邊222，與相當於三角形的邊的缺口斜面224A及224B構成。在本實施形態中該缺口底邊222形成直線狀。亦即，因底面2〇2與前面212透過該缺口底邊222而被直線地連通，故與缺口底邊222撓曲、彎曲的情形比較，積存於底面2〇2的塗佈液平順地流到前面212。缺口斜面224A及224B對缺口底邊 222形成對稱形，惟形成非對稱形也可以。缺口22〇的大小是藉由缺口底邊222之與前面212所成的角度0^1 (以包含於前面212的一點鏈線與缺口底邊222所成的角度而圖示）缺口底邊222的長度lc(在與前面212構成角度0 100146Next, as shown in Fig. 2(c), the slit nozzle 2 is lowered and engaged (contacts) with the wiping member 200. The slit nozzle 2 is lowered to a contraction of the spring 118. Preferably, it is 5 mm to 5 mm, more preferably 1 mm to 3 mm. When the spring weir 18 is contracted in this range (0.5 mra to 5 mm), the wiping member 2 can easily track the positional change in the vertical direction (z) direction of the distal end portion of the slit nozzle 20. Next, as shown in Fig. 2(d), the driving unit 1〇8 is driven to make the wiping member 200 contact the discharge port surface 36 of the slit nozzle 2〇 and the lip bevels 34 and 34B. The member 2〇〇 is moved by the square 1〇〇146〇8 indicated by the arrow (^ single direction, except for the discharge port 36 attached to the slit nozzle 2Q and the lip oblique A°101 « ^ 1013120709-0 201236774 The coating liquid 15 各 of each side of 34A and 34B and other contaminants. The direction of the wiping member 200 is in contact with the slit nozzle 2 〇, while moving, that is, sliding sliding direction, and γ direction or slitting The longitudinal direction of the nozzles 2 is uniform. The removed coating liquid and other substances become the coating liquid 152 flowing out along the induction surface 122 or the front inclined surface 126 of the wiping member 2 or the holder 11 2 , and then drop to the tray 110. And the scraping member 2 continues to move in the Ds direction (γ direction)' at a position passing through the longitudinal end of the slit nozzle 2, that is, at a position that does not interfere with the longitudinal end of the slit nozzle 2〇. Then, the whole wipe unit moves to the initial position in the X direction, and the wiping member 200 is The cleaning unit 200 is stopped immediately below the washing unit 14A. As shown in Fig. 2(e), the wiping member 200 is located below the solvent nozzle 142 in the above-described stop position. In this state, the solvent supplied through the pipe 144 is ejected by the solvent nozzle 142. The cleaning member 2 is cleaned. When the cleaning is completed, the wiping member 200 is returned to the cleaning start position in the Y direction. Thereafter, the same cleaning method is repeated for each application. Next, referring to FIG. 3, the embodiment related to the embodiment of the present invention will be described. The wiping member 20 0 will be described in detail. Further, in Fig. 3, the wiping member 2 is viewed from the oblique front side in the sliding direction (Ds direction) during the cleaning operation. The wiping member 200 has a flat shape and has a rear surface. 21〇 (first side) and front side 212 (second side). The rear side 210 is provided with a line contacting the bottom side 206 of the discharge port surface 36 of the slit nozzle 2〇; the line contact is the two sides of the discharge port surface 36. The oblique sides 204A and 204B of the lip faces 34A and 34B of the adjacent faces. The line contact means a state in which the line that becomes the side is completely included on the surface to be the target. Therefore, all of the bottom sides 206 are included in the discharge face 36. Get in touch, All of the sides 204A and 204B are respectively included in the lip-shaped inclined faces 34A and 34B to be in contact. mum^A0101 Page 17 of 51 pages 1013120709-0 201236774 Here, the rear face 210 is one side of the rubbing member 2〇〇 In the end surface, the front surface 212 is only the end side of the thickness τ of the rear surface 210. That is, the rear surface 210 and the rear surface 212 have a positional relationship with each other. Further, in the present embodiment, the thickness direction refers to the rear surface. And each face of the front face 212 is in a straight direction, and is defined as an f direction as shown in FIG. Further, as will be described later, in the state in which the wiping member 2 is mounted on the wiping unit 1 in the F direction, the F direction is only a predetermined angle in the Y direction. The rear surface 210 includes a bottom side 206 and a beveled edge 2〇4A and 204B of the cleaning portion that simultaneously contacts the discharge opening surface (10) of the slit nozzle 2〇 and the lip inclined surfaces 34A and 34B which are the adjacent surfaces thereof, and the rear surface 21〇 is defined as Located on one side of the person. The opposite side in the thickness direction, that is, the surface on the opposite side is the front surface 212, and the front surface 212 is defined as the one side B on the opposite side to the one side A in the thickness direction. When the wiping member 2 is slid in the d s direction, the one side b is located forward of the one side A. In this sense, the one side A and the one side B are referred to as the rear side and the front side, respectively. In a state where the wiping member 2 is viewed in the thickness direction (F direction), the oblique sides 204A and 204B are formed at an angle yc and are connected to both ends of the bottom side 2〇6. The bottom surface 202 in the thickness direction is bounded by the bottom side 206, and the slopes 208A and 208B are connected to the rear surface 21 by the oblique sides 204A and 204B. When the distal end portion of the slit nozzle 20 is engaged with the wiping member 2B, the bottom surface 202 faces the discharge port surface 36, and the inclined surfaces 208A and 208B oppose the lip inclined surfaces 34A and 34B. The bottom surface 202 including the bottom edge 206 is angled at an angle to the rear surface 210. The ramps 208A and 208B including the beveled edges 204A and 204B are at an angle p to the rear face 210. In Fig. 3, the dot line represents the rear face 210, and the angle is represented as the angle between the bottom face 202 and the point chain. The bottom surface 202 and the rear surface 210 are 1013120709-0 10〇14_(P_A(nQ1 ^ 18 1 7 ^ 51 1 201236774; the angle 8 is defined in detail as a reference plane orthogonal to the bottom surface 202 and the rear surface 210, the reference surface The angle of intersection with the bottom surface 202 and the intersection of the reference surface and the rear surface 210. Moreover, the angle p formed by the slopes 208A and 208B and the rear surface 210 is defined in detail as the slopes 208A and 208B and the rear surface. 210 is the angle between the reference plane and the intersection of the slopes 208A and 208B and the intersection of the reference plane and the back 210. The wiping member 2 is angled and the angle 妒 is 90 degrees. In addition, the top surfaces 214A and 214B are connected to the tops of the inclined surfaces 208A and 208B and are horizontally extended. The bottom surface 202, the inclined surfaces 208A and 208B, and the front surface 212 are the bottom edges 206 of the cleaning portion. Since the oblique sides 204A and 204B are starting points and extend in the thickness direction (F direction) to the one side b, they are defined as the outflow path surface. On the one side B having the front surface 212, the crossing becomes an adjacent outflow path. The bottom surface 202 and the front surface 212 of the surface are provided with a notch 220 The notch 220 is formed to communicate with the outflow path surface. In the present embodiment, it is formed by communicating with the bottom surface 202 and the front surface 212. The notch 220 has a triangular cross section 'with a notched bottom edge 222 corresponding to a vertex of a triangle, and a side corresponding to a triangle The notch slopes 224A and 224B are formed. In the embodiment, the notch bottom 222 is formed in a straight line. That is, since the bottom surface 2〇2 and the front surface 212 are linearly communicated through the notch bottom edge 222, the bottom edge of the notch is When the 222 is deflected or bent, the coating liquid accumulated on the bottom surface 2〇2 flows smoothly to the front surface 212. The notched slopes 224A and 224B form a symmetrical shape to the notched bottom edge 222, but may form an asymmetrical shape. The size of the notch is shown by the angle θ of the bottom edge 222 of the notch 222 with the front surface 212 (illustrated by the angle formed by the one-point chain line included in the front surface 212 and the bottom edge 222 of the notch). Lc (in the angle with the front 212 constitutes 0 100146

煸號A0101 第19頁/共51頁 1013120709-0 201236774 cl的方向的長度）以及缺口斜面224A及224B夾在缺口底邊222裏所成的角度0c2直接被定義。針對長度LC與角度 θεΐ也能以缺口底邊222之各自被投影於底面2〇2及前面 212的長度LP1及LP2代替。缺口斜面224Α與缺口斜面224Β所成的角度0C2詳細被定義為在缺口斜面224A與缺口斜面224B都正交的參考面内’參考面與缺口斜面224A的交線和參考面與缺口斜面224B的交線所成的角度。而且，缺口 22〇在缺口底邊 222與厚度方向（F)正交的方向，亦即擦拭構件2〇〇的縱向位於底面202的中央而被配置’但若缺口 220被包含在底面202之中，則配置於擦拭構件200的縱向的任一位置均可。其次’參照圖4及圖5針對使用擦拭構件2〇〇的清掃的作用進行說明。圖4(a)是由X方向看擦栻構件2〇〇與開縫噴嘴20的卡合狀況之侧視圖。如圖4(a)所示，擦拭構件2〇〇為後面21〇對以一點鏈線表示的延伸於上下方向（2 方向）的鉛直面僅傾斜角度0於擦拭構件2〇〇的滑動方向 (Ds方向）側而被安裝於擦拭單元1〇〇的粍座112。鉛直面與以箭頭表示的擦拭構件200的滑動方向（Ds方向）及平台 6的頂面（χγ平面）正交。吐出口面36也與鉛直面正交。擦栻構件200傾斜於滑動方向（Ds方向）側乃因容易使附著於唇形斜面34A及34B的塗佈液等落下到下側。藉由擦栻構件2〇〇傾斜於滑動方向（Ds方向）側在相對於開縫噴嘴20的吐出口面36的擦拔構件2〇〇的底面2〇2比線接觸吐出口面36的底邊206還靠滑動方向（Ds方向）的前方 ’對吐出口面36僅傾斜角心於重力方向的下側而被配 10014608(P編號 A〇101 第 20 頁 / 共 51 頁 1013120709-0 201236774 置。同樣地，相對於開縫喷嘴20的唇形斜面34A及34B的擦拭構件200的斜面208A及208B比線接觸唇形斜面34A及 34B的斜邊204A及204B還傾斜於滑動方向（Ds方向）的前方而被配置。在圖4(b)顯示在圖4(a)所示的狀態時，在滑動方向 (Ds方向）看的擦拭單元100。底邊206與吐出口面36，斜邊204A及204B與開鏠喷嘴20的唇形斜面34A及34B同時線接觸。為了使該線接觸可能，斜邊204A及204B間的角 0 度r c被決定，幾何學上必定比在鉛直面内開縫噴嘴2 〇的唇形斜面34A及34B所成的角度rn小。圖5是放大顯示在圖4(a)所示的狀態下使擦拭構件 200移動於滑動方向（DS方向），除去附著於開缝喷嘴2〇的吐出口面36及唇形斜面34A及34B的塗佈液150的狀況。但是，圖5成為在缺口 220的缺口底邊222的位置的侧面剖面圖。位於接鄰吐出口面36的唇形斜面34A側者（附著的塗佈液150、斜邊204A、斜面208A等）是以虛線表示。The nickname A0101, page 19 of 51, 1013120709-0 201236774, the length of the direction of cl) and the angle 0c2 formed by the notch ramps 224A and 224B sandwiched in the bottom edge 222 of the notch are directly defined. The length LC and the angle θεΐ can also be replaced by the lengths LP1 and LP2 of the notched bottom edges 222 projected onto the bottom surface 2〇2 and the front surface 212, respectively. The angle 0C2 formed by the notch inclined surface 224 Α and the notch inclined surface 224 ′ is defined in detail as the intersection of the reference surface and the notched inclined surface 224A and the reference surface and the notched inclined surface 224B in the reference plane orthogonal to both the notched inclined surface 224A and the notched inclined surface 224B. The angle formed by the line. Further, the notch 22 is disposed in a direction orthogonal to the thickness direction (F) of the notch bottom edge 222, that is, the longitudinal direction of the wiping member 2 is located at the center of the bottom surface 202, but if the notch 220 is included in the bottom surface 202 It is disposed at any position in the longitudinal direction of the wiping member 200. Next, the action of cleaning using the wiping member 2A will be described with reference to Figs. 4 and 5 . Fig. 4 (a) is a side view showing the engagement state of the wiping member 2 〇〇 and the slit nozzle 20 in the X direction. As shown in Fig. 4 (a), the wiping member 2 is a rear face 21, and the vertical plane extending in the up and down direction (2 directions) indicated by a one-dot chain line is inclined only at an angle of 0 to the sliding direction of the wiping member 2 ( The Ds direction is attached to the sley 112 of the wiping unit 1A on the side. The vertical plane is orthogonal to the sliding direction (Ds direction) of the wiping member 200 indicated by the arrow and the top surface (χγ plane) of the stage 6. The discharge surface 36 is also orthogonal to the vertical plane. The rubbing member 200 is inclined to the sliding direction (Ds direction) side because the coating liquid or the like adhering to the lip inclined surfaces 34A and 34B is easily dropped to the lower side. The bottom surface 2〇2 of the wiping member 2〇〇 with respect to the discharge port surface 36 of the slit nozzle 20 is inclined to the bottom of the discharge port surface 36 by the wiping member 2〇〇 obliquely to the sliding direction (Ds direction) side. The side 206 is also equipped with the front side of the sliding direction (Ds direction). The discharge port surface 36 is only inclined to the lower side of the gravity direction and is equipped with 10014608 (P No. A 〇 101 page 20 / 51 page 1013120709-0 201236774) Similarly, the inclined faces 208A and 208B of the wiping member 200 with respect to the lip inclined faces 34A and 34B of the slit nozzle 20 are inclined to the sliding direction (Ds direction) than the oblique sides 204A and 204B of the line contact lip inclined faces 34A and 34B. 4(b) shows the wiping unit 100 seen in the sliding direction (Ds direction) in the state shown in Fig. 4(a). The bottom side 206 and the discharge side surface 36, the oblique side 204A And 204B are in line contact with the lip slopes 34A and 34B of the opening nozzle 20. In order to make the line contact possible, the angle 0 rc between the oblique sides 204A and 204B is determined, and geometrically must be slit than in the vertical plane. The angle rn formed by the lip slopes 34A and 34B of the nozzle 2 is small. Fig. 5 is enlarged and shown in Fig. 4 ( In the state shown in a), the wiping member 200 is moved in the sliding direction (DS direction), and the coating liquid 150 adhering to the discharge port surface 36 and the lip slopes 34A and 34B of the slit nozzle 2A is removed. Fig. 5 is a side cross-sectional view showing the position of the notched bottom side 222 of the notch 220. The side of the lip-shaped inclined surface 34A adjacent to the discharge opening surface 36 (the applied coating liquid 150, the oblique side 204A, the inclined surface 208A, etc.) is The dotted line indicates.

〇而且被在空間S匯集的塗佈液154遮蔽視野者（斜邊204A 、斜面208A等）也以虛線表示。因底邊206與吐出口面36，斜邊204A及204B與開縫噴嘴20的唇形斜面34A及34B同時線接觸而無間隙，故擦栻構件200—移動於滑動方向（Ds方向），附著於吐出口面 36與唇形斜面34A及34B的塗佈液150就必定會透過底邊 206與斜邊204A及204B被由開縫喷嘴2〇除去。藉由設於成為單側A的後面210之由底邊206與斜邊204A及204B構成的清掃部除去的塗佈液也會成滴而原封不動地落下到下方 10014608(^單編號 ΑΟίοι 惟大多數成為在沿著擦拭構件2〇〇的流出路徑面之第21頁/共51頁 1013120709-0 201236774 底面202與斜面208八及20心、前面212流出後，成為沿著托座112的誘導面122、前斜面126流出到下方之塗佈液 152。透過擦拭構件20 0被由開縫噴嘴2〇除去的塗佈液一旦被匯集到底面202與其周邊且成為被匯集的塗佈液154 後就沿著底面202流出，在單側B附近流出速度僅增加如下的部分Η黃跨在與單侧A成厚度方向的相反側的單側B相鄰的底面202與前面212而設的缺口 220的毛細管作用的部分。因此，即使是附著於開縫喷嘴2〇的塗佈液15〇的量多的情形’或擦拭構件200的移動速度高且每一單位時間的除去的塗佈液量多的情形’透過擦拭構件2〇〇的清掃部除去的塗佈液也會平順地沿著底面2 〇 2等的流出路徑面流下而去，可抑制由藉由底面202與吐出口面36間包圍的空間之空間S溢出。因此，可抑制塗佈液由空間s溢出並沿著斜面208A及208B與唇形斜面34A及34B之間的間隙移動到上部而再附著於唇形斜面34A及34B成線狀。以下，針對與本實施的形態有關的擦栻構件2〇〇的清掃作用，與參照圖8及圖9說明的習知的擦拭構件4〇〇的清掃作用比較而進行說明。習知的擦拭構件400除了無缺口 220外，其餘與擦拭構件200完全相同。但是，在無缺口 220的擦拭構件4〇〇中，沿著底面402流出的塗佈液也往往會因在成為底面4〇2與前面412的邊界的邊緣部作用的表面張力而使流出速度減速，塗佈液由空間S溢出，再附著於唇形斜面34A成線狀並成為殘留液420。此外，擦拭構件400如圖9(a)所示，線接觸開縫噴嘴的底邊4〇6與斜邊404A及404B被設於後面410内’與其相連於厚度方 1013120709-0 10014608(^單編號A0101 第22頁/共51頁 201236774 向（F方向）而形成有底面402、斜面408A及408B，與後面 410平行地配設有前面412。如此，因與本實施的形態有關的擦拭構件200具有缺口 220，故與習知的擦拭構件 400比較，清掃能力顯著地提高。而且，若藉由擦拭構件的滑動進行的清掃結束，無缺口 220的擦拭構件400的情形如圖9(b)所示會殘留塗佈液，成為殘留塗佈液426。而且，透過清洗單元140將溶劑喷射到擦拭構件400進行清洗的情形也同樣地，溶劑會如圖9(b)所示的殘留塗佈液426般殘留。此點為塗佈液或〇溶劑的黏度、表面張力越高越顯著。此乃因在成為底面 402與前面412的邊界的邊緣部作用的表面張力比沿著底面402作用的重力成分大，塗佈液的流下（流出）被阻止。此點若像本發明的擦拭構件2〇〇般具有缺口 220的話，則與表面張力和重力成分的力關係無關，由於毛細管作用使接觸缺口 220的塗佈液或溶劑流出，故可抑制塗佈液或溶劑殘留於底面2.02。因此，在本發明的擦拭構件2〇〇中〇可迴避塗佈液或溶劑殘留於底面202與其周邊所造成的不利因素。其次’參照圖6針對上述的擦拭構件2〇〇的變形例進行說明。擦拭構件300除了使擦拭構件2〇〇的角度p成銳角外，其餘與擦拭構件2 〇〇完全相同。藉由使角度史成銳角，使斜邊204A及204B之線接觸於唇形斜面μα及34B變的更強，使在高速下的附著塗佈液的除去能力變高。由擦拭構件300產生的清掃作用，亦即透過缺口 22〇使沿著底面202及前面212流出的塗佈液152的流出速度增加等 _46〇#單錢_Γ對在清掃後不殘留塗佈液或清洗用的溶劑的作用是第23頁/共51頁 1013120709-0 201236774 與擦栻構件200完全相同。擦栻構件200及300為了都順著底面2〇2、缺口220 及别面212以本來的流出速度流出塗佈液，如圖5及圖6所不’需將在滑動方向（DS、γ)的前側保持擦拭構件2〇〇及 300的前方支撐部12〇的頂部之上邊124配置於比缺口 22〇還Λ重力方向的下側。據此，在成為單侧b的前面212中 ’於重力方向中在比缺口 220還下方的位置擦拭構件200 及3 〇 0被保持。結果，塗佈液或清洗液之溶劑仍舊由位於則面212上的缺口 220的一端流出，朝誘導面122流下而去°备'上邊124位於像干涉缺口 220的位置，則來自缺口 220的塗佈液或溶劑的流出被阻礙，發生流出速度降低，或者在非常的情況下完全不流出，故不佳。針對設於擦拭構件200、300的缺口 220，長度LP1 較佳為〇· 2_~2mm，更佳為0. 5mm〜1. 5mm，長度LP2較佳為〇. 2_~3mm，更佳為1. 5mm~2. 5mm，角度0 c2較佳為度〜80度，更佳為30度〜70度。若比該等範圍小，則因毛細管作用而使塗佈液或溶劑流出的速度變低，在非常的情況下完全看不到毛細管作用，而在底面202與其周邊殘留了塗佈液或溶劑。另一方面，若比該範圍大，則因擦栻構件2〇〇及300的剛性降低，故底邊206之對吐出口面36的線接觸以及斜邊204A及2 04B之對唇形斜面34A及 34B的線接觸變弱，在高速下的附著塗佈液的除去性能降低’在非常的情況下附著的塗佈液幾乎無法除去。缺口 220在塗佈液或溶劑流出的方向，亦即缺口底邊 222延伸的方向看具有三角形剖面。但是不被限定於此，面向缺口底邊222形成像長方形或梯形的四角剖面也可以 10014608(^單編號 A0101 第 24 頁 / 共 51 頁 ιηιπ1 201236774 。而且，缺口斜面224A及224B為曲面也可以。擦拭構件200及300的材質為具有彈性的高分子樹脂，例如合成橡膠（synthetic rubber)較佳，以便底邊 20 6與吐出口面36，斜邊2044及2046與唇形斜面34入及 34B可同時確實地線接觸。合成橡膠具有適度的彈性與對塗佈液的抗化學腐钱性（chemical resistance)。例如乙稀-丙稀橡膠（ethylene-propylene rubber)、石夕氧橡膠（silicon rubber)及丁基橡膠（butyl rubber)、全氟橡膠（perfluoro rubber)(商品名，，kalrez” 等）較佳。表示彈性的程度的橡膠硬度使用c型的彈簧型硬度試驗機（spring type hardness tester)測定，較佳為50°〜90。，更佳為60、80。。缺口 220若藉由以最小限度的大小挖空清掃部並進行高剛性化而適用於線接觸強且清掃能力高的清掃構件，則其效果更被發揮。因此，適用本發明的清掃構件的較佳形狀為擦拭構件200及300，角度*較佳為9〇度以下，更佳為80、90。’角度石較佳為8〇。〜13〇。，更佳為9〇。〜120。。其次，針對使用本發明的清掃構件及清掃方法之利用開縫塗佈器1進行的塗佈方法進行詳述。首先，若開縫塗佈器1的各動作部的零點回復（zer0 return)被進行，則各動作部移動至待機位置（standby position)。亦即’平台6移動至圖1的左側端部（以虛線表示的位置），開縫噴嘴2〇移動至頂部的原點位置，並且擦拭單元1〇〇由初始位置（基台2的右側端部）移動，以便托盤11〇來到開她Q的下部位置。此時，擦栻構件綱在x方向中位第25頁/共51頁 1013120709-0 201236774 於開縫噴嘴2 0的吐出口 3 0的正下方的位置，而在開縫喷嘴20的縱向之Υ方向，如圖2(a)所示位於稍為離開吐出口 30的清掃開始位置。在此時間點由槽64到開缝喷嘴20為塗佈液66已經被填滿，排出開缝喷嘴20内部的殘留空氣的作業已經結束。此時的塗佈液供給裝置40的狀態為塗佈液66被填充於注射器52，吸引閥44被關閉，供給閥42被打開，然後活塞54位於最下端的位置，成為始終可將塗佈液66供給至開縫喷嘴20的狀態。最初使頂出銷（lift pin)(未圖示）上升到平台6的表面，基板A被由裝載機（loader)(未圖示）承載到頂出銷的上部。接著，使頂出銷下降並將基板A承載到平台6 的頂面，同時進行吸附保持。與此同時進行使塗佈液供給裝置40運轉，由注射泵50將預先決定的量的塗佈液66 供給至開縫喷嘴20，由開縫喷嘴20朝托盤110吐出塗佈液 66。此時，擦拭構件200因在Y方向不在吐出口 30的正下方的位置，故被由開縫噴嘴20的吐出口 30吐出的塗佈液不會落下。塗佈液66的供給停止後，使開縫喷嘴20下降並使擦拭構件20 0接觸開縫喷嘴20的吐出口面36與唇形斜面34A 及34B後，使擦拭構件200在Y方向滑動到終點位置，遍及 Y方向清掃位於開縫喷嘴20的吐出口 30附近的吐出口面36 與唇形斜面3 4 A及3 4 B。藉由該清掃，以塗佈液完全填滿開缝喷嘴2 0的内部通路直到吐出口 3 0為止之初始化也完了。清掃完了後，使開縫喷嘴20上升到原點位置，並且 10014608(^單編號 A〇101 第26頁/共51頁 1013120709-0 201236774 使擦拭單元100移動於X方向並使其返回到初始位置（美A 2的右侧端部）。在由溶劑喷嘴142將溶劑噴射到此時在太洗單元140的正下方停止的擦拭構件2〇〇並對擦拭構件 200進行溶劑清洗後，使擦拭構件2〇〇移動於與滑動方向 (Ds方向）相反的方向，使擦拭構件2〇〇返回到γ方向的太掃開始位置。在確認擦拭單元100之朝初始位置移動後，開始承载了基板A的平台6的移動。此時開縫噴嘴20在上下方向位於比塗佈被進行的位置還上方的原點位置，另一方面，注射泵50停止並待機◊然後，在基板八通過厚度感測器9〇下的時候測定基板厚度。然後，若基板A的塗佈開始部到達開縫噴嘴20的吐出口 30的正下方的話，使平台6停止。此時，使用已測定的基板A的厚度資料，驅動上下升降單元70並使開縫噴嘴20下降並停止，以便開縫噴嘴2〇的吐出口面36與基板A之間的間隙，亦即餘隙成為預先決疋的值。在開縫喷嘴20與平台6完全停止的狀態下，以規疋速度使注射泵5 0的活塞5 4上升，由開縫噴嘴2 〇吐出塗佈液66並在開縫噴嘴20與基板a之間形成液珠（bead)B後，以規定速度開始移動平台6於义方向，開始將塗佈液66 塗佈於基板A，形成塗佈膜c。然後，比基板A的塗佈結束位置稍為跟前的位置來到開缝喷嘴20的吐出口 30的正下方的話，使活塞54停止而停止塗佈液66的供給，接著，在基板八的塗佈結束位置來到開縫喷嘴20的吐出口 30的正下方時，驅動上下升降單兀70並使’噴嘴2G_L升。據此，形成於基板績開縫喷嘴20之間的液珠B被斷絕，塗佈結束。旅單編號A0101 1〇〇14608(Γ 第27頁/共51頁 1013120709-0 201236774 其間平台6繼續動作，在到達終點位置的時間點停止，解除基板A的吸附並使頂出銷上升將基板八舉起◊此時透過卸載機（unloader)(未圖示）保持基板八的底面，將基板A運送至下一個製程。若將基板A遞送至卸載機的話，平台6使頂出銷下降返回到原點位置。平台6返回到原點位置後，使擦拭單TL100移動，以便托盤11〇來到開縫喷嘴20的吐出口 30的下部位置。在移動完了後，令吸引閥44為開，令供給閥42為關 ’然後，使活塞54下降，將塗佈祕填充於注射器咖在填充完了後’使活塞54停止’令吸引閥44為關，令供給闕42為開，等待下-片基板A的到來，重複相同的動作。塗佈液是以黏度imPas~100inPas，更佳為 ImPas〜50mPas，基於塗佈性以牛頓流體（^_⑽ fluid)較佳，惟也能適用於具有觸變性（thi如什〇py) 的塗液。尤其在塗佈溶劑使用揮發性高者，例如 PGMEA(Pr〇pyiene Glycol Monomethyl Ether〇 The person who shields the field of view by the coating liquid 154 collected in the space S (the oblique side 204A, the inclined surface 208A, etc.) is also indicated by a broken line. Since the bottom edge 206 and the discharge port surface 36, the oblique sides 204A and 204B are in line contact with the lip slopes 34A and 34B of the slit nozzle 20 without a gap, so that the rubbing member 200 moves in the sliding direction (Ds direction) and adheres. The coating liquid 150 on the discharge surface 36 and the lip slopes 34A and 34B is surely removed by the slit nozzles 2 through the bottom side 206 and the oblique sides 204A and 204B. The coating liquid removed by the cleaning portion provided by the bottom side 206 and the oblique sides 204A and 204B of the rear surface 210 which becomes the one side A is also dripped and dropped to the lower side 10014608 (^ single number ΑΟίοι Most of them become the inducing surface along the bracket 112 after the bottom surface 202 and the slope 208 eight and twenty hearts and the front surface 212 flow out along the outflow path surface of the wiping member 2 第 21 pages/to 51 pages 1013120709-0 201236774. 122. The front bevel 126 flows out to the coating liquid 152 below. The coating liquid that has been removed by the slitting nozzle 2 by the wiping member 20 0 is collected on the bottom surface 202 and the periphery thereof, and becomes the collected coating liquid 154. Flowing along the bottom surface 202, the outflow speed is increased only in the vicinity of the one side B. The portion of the yellow hole spans the bottom surface 202 adjacent to the one side B opposite to the one side A in the thickness direction and the notch 220 provided on the front surface 212. The capillary action portion. Therefore, even if the amount of the coating liquid 15 附着 attached to the slit nozzle 2 is large, the moving speed of the wiping member 200 is high and the amount of the coating liquid removed per unit time is large. Situation 'through the wiping member 2〇 The coating liquid removed by the cleaning portion also flows smoothly along the flow path surface of the bottom surface 2 〇 2 or the like, and the space S overflowing from the space surrounded by the bottom surface 202 and the discharge surface 36 can be suppressed from overflowing. The coating liquid can be prevented from overflowing from the space s and moved to the upper portion along the gap between the slopes 208A and 208B and the lip slopes 34A and 34B, and then adhered to the lip slopes 34A and 34B in a line shape. The cleaning action of the cleaning member 2 is described in comparison with the cleaning action of the conventional wiping member 4A described with reference to Figs. 8 and 9. The conventional wiping member 400 has no gap 220. The rest is identical to the wiping member 200. However, in the wiping member 4A without the notch 220, the coating liquid flowing out along the bottom surface 402 tends to be at the edge portion which becomes the boundary between the bottom surface 4〇2 and the front surface 412. The surface tension of the action is decelerated, the coating liquid overflows from the space S, and adheres to the lip slope 34A in a line shape and becomes a residual liquid 420. Further, the wiping member 400 is in line contact as shown in Fig. 9(a). The bottom edge of the slotted nozzle 4〇6 The beveled edges 404A and 404B are disposed in the rear surface 410 and are connected to the thickness side 1013120709-0 10014608 (^ single number A0101 page 22/51 pages 201236774 direction (F direction) to form the bottom surface 402, the slopes 408A and 408B The front surface 412 is disposed in parallel with the rear surface 410. Thus, since the wiping member 200 according to the embodiment of the present embodiment has the notch 220, the cleaning ability is remarkably improved as compared with the conventional wiping member 400. When the cleaning by the sliding of the wiping member is completed, the wiping member 400 having no notch 220 remains as shown in Fig. 9(b), and remains as the residual coating liquid 426. Further, in the case where the solvent is ejected by the cleaning unit 140 to the wiping member 400 for cleaning, the solvent remains as in the residual coating liquid 426 as shown in Fig. 9(b). This is the viscosity of the coating liquid or the hydrazine solvent, and the higher the surface tension, the more remarkable. This is because the surface tension acting on the edge portion which becomes the boundary between the bottom surface 402 and the front surface 412 is larger than the gravity component acting along the bottom surface 402, and the flow (flow) of the coating liquid is prevented. In this case, if the notch 220 is provided like the wiping member 2 of the present invention, the coating liquid or the solvent contacting the notch 220 flows out due to capillary action regardless of the force relationship between the surface tension and the gravity component, so that the coating can be suppressed. The liquid or solvent remains on the bottom surface of 2.02. Therefore, in the wiping member 2 of the present invention, it is possible to avoid the disadvantage that the coating liquid or the solvent remains on the bottom surface 202 and its periphery. Next, a modification of the above-described wiping member 2A will be described with reference to Fig. 6 . The wiping member 300 is identical to the wiping member 2 except that the angle p of the wiping member 2 is sharp. By making the angle history an acute angle, the lines of the oblique sides 204A and 204B become stronger in contact with the lip slopes μα and 34B, and the ability to remove the coating liquid at a high speed becomes high. The cleaning action by the wiping member 300, that is, the flow rate of the coating liquid 152 flowing out along the bottom surface 202 and the front surface 212 is increased by the gap 22, etc. _46〇#单钱_ΓThere is no residual coating after cleaning The effect of the liquid or cleaning solvent is the same as that of the rubbing member 200 on page 23 of 51, 1013120709-0 201236774. The rubbing members 200 and 300 flow out the coating liquid at the original outflow speed along the bottom surface 2〇2, the notch 220, and the other surface 212, as shown in Figs. 5 and 6 (in the sliding direction (DS, γ)) The top side 124 of the front support portion 12A of the front side holding wiping members 2A and 300 is disposed on the lower side in the gravity direction than the notch 22A. Accordingly, the wiping members 200 and 3 〇 0 are held in the front surface 212 which becomes the one side b in the gravity direction at a position lower than the notch 220. As a result, the solvent of the coating liquid or the cleaning liquid still flows out from one end of the notch 220 on the face 212, and flows down toward the inducing surface 122 to prepare the upper side 124 at the position like the interference notch 220. The outflow of the cloth liquid or the solvent is hindered, the outflow speed is lowered, or in some cases, it does not flow at all, which is not preferable. The length LP1 is preferably 〇 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 5mm~2. 5mm, angle 0c2 is preferably -80 degrees, more preferably 30 degrees to 70 degrees. When the ratio is smaller than these ranges, the rate at which the coating liquid or the solvent flows out due to the capillary action becomes low, and in most cases, the capillary action is not observed at all, and the coating liquid or the solvent remains on the bottom surface 202 and the periphery thereof. On the other hand, if it is larger than this range, the rigidity of the rubbing members 2A and 300 is lowered, so the line contact of the bottom side 206 with respect to the discharge surface 36 and the pair of lip bevels 34A of the oblique sides 204A and 204B The line contact of 34B is weak, and the removal performance of the adhesion coating liquid at a high speed is lowered. In a very case, the coating liquid adhering to the coating liquid is hardly removed. The notch 220 has a triangular cross section in the direction in which the coating liquid or solvent flows out, that is, the direction in which the notch bottom edge 222 extends. However, the present invention is not limited thereto, and the four-corner cross-section that forms a rectangular or trapezoidal shape toward the notch bottom edge 222 may be 10014608 (^, single number A0101, page 24/51), and the notched slopes 224A and 224B may be curved surfaces. The materials of the wiping members 200 and 300 are elastic polymer resins, for example, synthetic rubber, so that the bottom edge 20 6 and the discharge port surface 36, the bevel edges 2044 and 2046 and the lip slope 34 and 34B can be used. At the same time, it is indeed in-line contact. Synthetic rubber has moderate elasticity and chemical resistance to the coating liquid, such as ethylene-propylene rubber and silicon rubber. And butyl rubber, perfluoro rubber (trade name, kalrez, etc.) are preferred. The rubber hardness indicating the degree of elasticity is a spring type hardness tester using a c-type. The measurement is preferably 50° to 90°, more preferably 60 or 80. The notch 220 is appropriately hollowed out by the cleaning unit with a minimum size and is highly rigid. The cleaning member having strong line contact and high cleaning ability is more effective. Therefore, the cleaning member to which the present invention is applied is preferably the wiping members 200 and 300, and the angle * is preferably 9 degrees or less, more preferably It is 80, 90. The angle stone is preferably 8 〇. 〜13 〇., more preferably 9 〇. ～120. Next, the use of the slitting coater 1 for the cleaning member and the cleaning method of the present invention is performed. The coating method will be described in detail. First, when the zero recovery (zer0 return) of each operation unit of the slot coater 1 is performed, each operation unit moves to a standby position. To the left end of FIG. 1 (the position indicated by the broken line), the slit nozzle 2 is moved to the origin position of the top, and the wiping unit 1 is moved from the initial position (the right end of the base 2) so that the tray 11〇 came to the lower position of her Q. At this time, the rubbing member is in the position of the middle of the x-direction page 25/51 pages 1013120709-0 201236774 directly below the discharge port 30 of the slit nozzle 20 And in the longitudinal direction of the slit nozzle 20, as shown in FIG. (a) is shown at a cleaning start position slightly away from the discharge port 30. At this point of time, from the groove 64 to the slit nozzle 20, the coating liquid 66 has been filled, and the operation of discharging the residual air inside the slit nozzle 20 has been performed. The state of the coating liquid supply device 40 at this time is that the coating liquid 66 is filled in the syringe 52, the suction valve 44 is closed, the supply valve 42 is opened, and then the piston 54 is at the lowermost position, so that the coating can always be applied. The cloth liquid 66 is supplied to the slit nozzle 20. Initially, a lift pin (not shown) is raised to the surface of the platform 6, and the substrate A is carried by a loader (not shown) to the upper portion of the ejector pin. Next, the ejector pin is lowered and the substrate A is carried to the top surface of the stage 6 while being adsorbed and held. At the same time, the coating liquid supply device 40 is operated, and the predetermined amount of the coating liquid 66 is supplied to the slit nozzle 20 by the syringe pump 50, and the coating liquid 66 is discharged from the slit nozzle 20 toward the tray 110. At this time, since the wiping member 200 is not located directly below the discharge port 30 in the Y direction, the coating liquid discharged from the discharge port 30 of the slit nozzle 20 does not fall. After the supply of the coating liquid 66 is stopped, the slit nozzle 20 is lowered, and the wiping member 20 is brought into contact with the discharge port surface 36 and the lip slopes 34A and 34B of the slit nozzle 20, and then the wiping member 200 is slid in the Y direction to the end point. At the position, the discharge port surface 36 and the lip slopes 3 4 A and 3 4 B located in the vicinity of the discharge port 30 of the slit nozzle 20 are swept in the Y direction. By this cleaning, the initialization of the internal passage of the slit nozzle 20 until the discharge port 30 is completely filled with the coating liquid is completed. After the cleaning is completed, the slit nozzle 20 is raised to the home position, and 10014608 (^单号 A〇101 page 26/51 pages 1013120709-0 201236774 causes the wiping unit 100 to move in the X direction and return it to the initial position. (right end portion of the beauty A 2 ). After the solvent is ejected by the solvent nozzle 142 to the wiping member 2 停止 stopped immediately below the over-wash unit 140 and the solvent is cleaned by the wiping member 200, the wiping member is caused 2〇〇 moves in a direction opposite to the sliding direction (Ds direction), and causes the wiping member 2 to return to the too-scanning start position in the γ direction. After confirming that the wiping unit 100 is moved toward the initial position, the substrate A is loaded. The movement of the platform 6. At this time, the slit nozzle 20 is located at an origin position above the position where the coating is performed in the up and down direction, and on the other hand, the syringe pump 50 is stopped and stands by, and then, the substrate is passed through the thickness sensor. When the coating start portion of the substrate A reaches directly below the discharge port 30 of the slit nozzle 20, the stage 6 is stopped. At this time, the thickness of the measured substrate A is used. The upper and lower lifting unit 70 is driven to lower and stop the slit nozzle 20 so that the gap between the discharge port surface 36 of the slit nozzle 2 and the substrate A, that is, the clearance becomes a predetermined value. When the nozzle 20 and the stage 6 are completely stopped, the piston 5 4 of the syringe pump 50 is raised at a constant speed, and the coating liquid 66 is discharged from the slit nozzle 2 to form a liquid between the slit nozzle 20 and the substrate a. After the bead B, the substrate 6 is moved in the sense direction at a predetermined speed, and the coating liquid 66 is applied to the substrate A to form the coating film c. Then, the coating end position of the substrate A is slightly higher than the front end. When the discharge port 30 is immediately below the discharge port 30, the piston 54 is stopped and the supply of the coating liquid 66 is stopped. Then, at the application end position of the substrate eight, the discharge port 30 of the slit nozzle 20 is brought to the positive side. In the lower case, the up and down lift unit 70 is driven to raise the 'nozzle 2G_L. Accordingly, the liquid bead B formed between the substrate caulking nozzles 20 is cut off, and the application is completed. Travel order No. A0101 1〇〇14608 (Γ Page 27 of 51 Page 1013120709-0 201236774 Platform 6 continues to move When the end point is reached, the substrate A is stopped, the substrate A is released, and the ejector pin is raised to lift the substrate. At this time, the bottom surface of the substrate 8 is held by an unloader (not shown), and the substrate A is transported to The next process. If the substrate A is delivered to the unloader, the platform 6 lowers the ejector pin back to the original position. After the platform 6 returns to the original position, the wiping sheet TL100 is moved so that the tray 11 comes to the slit The lower position of the discharge port 30 of the nozzle 20. After the movement is completed, the suction valve 44 is opened, the supply valve 42 is closed, and then the piston 54 is lowered, and the coating secret is filled in the syringe after the filling is completed. The piston 54 is stopped to close the suction valve 44, and the supply port 42 is opened, waiting for the arrival of the lower substrate A, and repeating the same operation. The coating liquid is preferably having a viscosity of imPas to 100 inPas, more preferably ImPas to 50 mPas, and is preferably a Newtonian fluid (^_(10) fluid) based on coating properties, but is also applicable to a coating liquid having thixotropic properties (thi such as py). . Especially in coating solvents, those with high volatility, such as PGMEA (Pr〇pyiene Glycol Monomethyl Ether)

Acetate:丙二醇甲醚醋酸酯）、乙酸丁酯化时“ acetate)及乳酸乙醋（ethyl ]actate)等的塗佈液時有效0 具體上可適用的塗佈液的例子除了上述的彩色滤光片用的黑色矩陣（black matrix)及RGB色像素（pixel) 开/成用塗佈液之外，有総液、平滑化材及柱形成材料等。基板之《佈構絲了麵之外也能使_等的金屬板、陶究板及石夕晶圓（silicon wafer)等。 10014608(^^^^ 、再者’就塗佈速度等所使用的塗饰條件，塗佈速度為 l〇«nn/s〜600mm/s ’ £佳為 i〇〇_/s〜随&，清掃 0101 第28頁/共5】頁 1013120709-0 201236774 構件之擦拭構件200及300的滑動速度較佳為 UOmm/s〜l〇〇〇mm/s，更佳為2〇〇11]111/卜6〇〇丽/8，開縫噴嘴的唇形間隙為50"m〜i〇〇〇vm，更佳為8〇ym~2〇〇 _，塗饰厚度在濕潤狀態下為1 t佳為 m〜2〇以m。以下為了確認由與本發明的實施的形態有關的擦拭構件達成的清掃效果，實際作祕拭構件並進行了試驗】。以下針對其内容來敘述。〈試驗1>Acetate: propylene glycol methyl ether acetate), a coating liquid such as "acetate" and ethyl acetate (ethyl)actate in the case of butyl acetate. It is effective as an example of a coating liquid which is specifically applicable except for the color filter described above. In addition to the black matrix and the RGB color pixel (pixel) opening/forming coating liquid for the sheet, there are sputum liquid, smoothing material, column forming material, etc. The substrate is also covered with a silk fabric. It is possible to use a metal plate, a ceramic plate, a silicon wafer, etc. 10014608 (^^^^, and then the coating conditions used for the coating speed, etc., the coating speed is l〇 «nn/s~600mm/s ' £ is preferably i〇〇_/s~ with & cleaning 0101 page 28/total 5] page 1013120709-0 201236774 The sliding speed of the wiping members 200 and 300 of the member is preferably UOmm/s~l〇〇〇mm/s, more preferably 2〇〇11]111/b6〇〇丽/8, the lip gap of the slit nozzle is 50"m~i〇〇〇vm, better 8 〇 ym 〜 2 〇〇 _, the coating thickness is 1 t in the wet state, preferably m 2 / 2 〇 m. Hereinafter, in order to confirm the cleaning by the wiping member related to the embodiment of the present invention As a result, the actual secret for the swab member and the following tests] to describe the contents for <Test 1 &gt..;

開縫喷嘴20是使用吐出口 3〇的縱向長度為11〇〇咖，開縫28的間隙為1QG"，可在基板形成i刚心的塗佈膜。開縫喷嘴20的吐出口面36的塗佈方向⑴的長度為㈠咖，在開縫喷嘴2〇的縱向看的唇形斜面3u及34b所成的角度T(參照圖4為使用於具有這種吐出口面形斜面34Α及34Β的開縫噴嘴2q之擦拭構件是採用以圖6所示的擦拭構件綱當作試驗的對象之試驗片iThe slit nozzle 20 has a longitudinal length of 11 使用 using the discharge port 3 ,, and a gap of the slit 28 is 1 QG", and a coating film of i-center can be formed on the substrate. The length of the application direction (1) of the discharge port surface 36 of the slit nozzle 20 is (i) the angle T formed by the lip slopes 3u and 34b in the longitudinal direction of the slit nozzle 2 (see FIG. The wiping member of the slit nozzle 2q of the spouting surface-shaped inclined surfaces 34A and 34Β is a test piece using the wiping member shown in Fig. 6 as a test object.

丹猫上，碎驗片 …/1、…^Τ〇υΐυ根據圖6為厚度「= 5丽，斜面208Α及208Β與後面21〇所成的角度卜⑽。，斜邊204Α及204Β間所成的角度rc〜Sl。。 m ，底面2〇2 與後面21G所成的角度"9〇。，底邊咖之擦找構件· 的縱向（與塗佈方向的X方向一致）的只沒Ll = 〇. 6職，斜邊204A及難的錯直線方向（上下方向）的長度叫咖 ’擦拭構件300的鉛直線方向的長声又Ld = 2〇_，以及擦拭構件300的縱向的長度L4 = 25mm。 *單編號 1〇0146〇8(Γ Α0101 前面212與後面210平行而形成1於缺口 22〇為第29頁/共51頁 β 1013120709-0 201236774 LP1 = 0.9_，LP2 = 2_，角度0c2為50°。依照上述的尺寸’缺口 220為對在擦拭構件3 0 0的縱向的中央點與該縱向正交而設的鉛直面成面對稱的形狀。此外，試驗片1 ( 擦拭構件300)是使用以橡膠硬度60°的乙烯-丙烯橡膠作為材料，透過模具成型作成，以便成為被以上述的參數規定的形狀。使後面210對鉛直方向（重力方向）僅傾斜角度0 =30 度而將試驗片1(擦拭構件300)安裝於托座112。在該狀態下使試驗片1(擦拭構件300)與開缝喷嘴20接觸時的斜面208A及208B與唇形斜面34A及34B所成的角度為7°，底面202與吐出口面36所成的角度α=30°。開缝喷嘴2 0 與試驗片1(擦拭構件300)接觸時是使開縫喷嘴20下降到彈簣118的收縮量成為1 mm的位置。〈評價〉其次，使用彩色濾光片用的R色（紅色）用塗佈液，當作用以評價試驗片1(擦拭構件300 )的清掃能力的塗佈液。R色用塗佈液為黏度3mPas，以丙歸樹脂（aery 1 i c resin)當作黏結劑（binder)，以PGMEA當作溶劑使用的感光性（photosensitivity)的塗佈液，固體含量濃度 (solid contentconcentration)為 20%。在開縫塗佈器1的槽64~開縫喷嘴20填充了 R色用塗佈液。而且，在藉由擦拭構件300進行的清掃後，由溶劑喷嘴142對擦拭構件300喷射溶劑成角度60°的扇形狀而實施了溶劑清洗。清洗溶劑使用PGMEA，每次清洗喷射了 100 //L的PGMEA。以上述的條件，關於以下所述的4個項目（評價卜評價4)，進行了試驗片1(擦拭構件300 )的清掃能力的評價 10014608产單編A〇101 第30頁/共51頁 1013120709-0 201236774 (ο、評價ι(在高速條件下的清掃能力評價）由開縫噴嘴吐出2〇〇〇eL的R色用塗佈液後’使擦拭構件300接觸開縫噴嘴20，以500mm/s的滑動速度使其滑動於Y方向。重複10次該動作，各在10次後與100次後，觀察在吐出口面36與唇形斜面34Α及34Β的r色用塗佈液的殘留狀況與擦拭構件3_磨耗狀況。 (2)、#價2(清掃後的試驗片1(擦拭構件300)上的塗佈液的殘留評價）根據價1之各在1G次與100次的清掃後，觀察在擦牛300的底面202與其周邊部的R色用塗佈液的殘留狀留評價）° 3(擦核《構件300的溶劑清洗後的溶劑的殘根*據評價1 在擦试構件之各在次與次的溶劑清洗後’觀察 Ο 殘留狀況3〇0的底面202與其周邊部的清洗用的溶劑的 (4)、評價4(塗饰評價) 根據評^曾1 13〇〇Ιηιη 之各在10次與100次的清掃後，在ΙΙΟΟχ 的無鹼玻璃基板（alkali free gUss substrat、八 1 cnm 全面，以濕潤厚度10/zm及塗佈速度〇Inin/s的條件進基板之n 、仃K色用塗佈液的塗佈。開缝喷嘴20與的真*的餘隙為150 Win °所塗佈的基板以減壓到60Pa 二乾燥進杆# 蝉檣ώ A %概’進行塗佈方向（X)的膜厚精度U的 •平價與塗佈_ 以外狀，凡的觀察。膜厚精度U在除了端部1 Omm 的區域以U=：r县丄 1〇〇娜(Ρ编號 U)l〇i 大值-最小值）/(2x平均值）χ100(ο/〇) 共51頁 1013120709-0 第31頁 201236774 算出。參照圖7，說明進行了關於試驗片1(擦拭構件300 ) 的評價卜評價4的結果。在圖7中表T是針對試驗片1的清掃能力，關於評價1〜評價4的各個，與比較試驗1比較而表示。〈比較試驗1> 比較試驗片1是由試驗片1(擦拭構件300)去除缺口 220而構成。使用該比較試驗片1，以與試驗片1完全相同的條件進行清掃與塗佈，進行了相同的清掃能力及塗佈的評價1~評價4。關於評價1且關於試驗片1，清掃10次後及100次後，在吐出口面36及唇形斜面34A及34B都不殘留R色用塗佈液。其結果，在擦拭構件300未被觀察到磨耗。另一方面，在比較試驗片1中雖然在吐出口面36不殘留R色用塗佈液，但是在唇形斜面34A及34B的上部遍及開縫噴嘴20 的縱向全長，R色用塗佈液殘留成線狀。殘留的R色用塗佈液的線的寬度在清掃10次後為Imm，而在100次後為 2mm。伴隨於此，清掃構件其斜邊的上部遍及相當於殘留的R色用塗佈液的線寬的長度磨耗了。關於評價2，在試驗片1中在擦拭構件300的底面202 與其周邊部不殘留R色用塗佈液。另一方面，在比較試驗片1中在擦拭構件200與其周邊部殘留了 R色用塗佈液。關於評價3，在試驗片1中在擦拭構件300的底面202 與其周邊部不殘留清洗用的溶劑之PGMEA。另一方面，在比較試驗片1中在擦拭構件200的底面與其周邊部殘留了清洗用的溶劑之PGMEA。 100146G8(^單編號 A〇101 第32頁/共51頁 1013120709-0 201236774 關於評價4，在試驗片1中於塗佈面完全無缺點，藉由在透射光下進行的目視觀察的結果為全面同一的色度 (chromaticity)。代表性地測定中央部的塗佈方向的膜厚，算出膜厚精度U後，在除了距基板端10m以外的區域，平均值為2. 0/zm且膜厚精度U為2%以下。另一方面，在比較試驗片1中塗佈面在清掃的開始部與相當於塗佈開始部的位置顏色變薄一些，此點藉由在透射光下進行的目視觀察觀察到。包含該部分而測定塗佈方向的膜厚並算出膜厚精度U後，在除了距基板端10mm以外的區域，平均值為1.97#m、最大值為2.04μηι、最小值為1.8/zm，膜厚精度U為6%以下。〈實施例〉使用開縫塗佈器1製造彩色濾光片。開縫喷嘴20與擦拭構件使用了試驗1所示的擦拭構件300。使用了該擦拭構件30 0的開縫喷嘴20的清掃是對任一種塗佈液都以來自清掃前的開縫喷嘴的塗佈液的吐出量1 000 //L、滑動速度 500mm/s的條件，在每次的塗佈前進行。清掃後的擦拭構件的溶劑清洗也是以P G Μ E A當作清洗液以喷射量10 0以L 實施。最初在清洗1100x1300 mm且厚度0.7mm的無驗玻璃基板後，以基板短邊侧當作開縫喷嘴縱向（Y)方向，藉由濕潤厚度10 、開縫喷嘴與基板之間的餘隙150 且 150mm/s塗佈了黑色矩陣塗佈液。此時所塗佈的黑色矩陣塗佈液使用以氮氧化鈦（titanium oxynitride)當作遮光材料，以丙烯樹脂當作黏結劑，以PGMEA當作溶劑，將固體含量濃度調整成10%並且將黏度調整成4mPas的感光 1013120709-0 10014608(^單編號A〇101 第33頁/共51頁 201236774 性的塗佈液。此外，塗佈的作業時間為6 〇秒。所塗佈的基板在進行60秒於30秒到達65Pa的真空乾燥後，以100°C的熱板（hot plate)更進一步乾燥1〇分鐘。接著進行曝光（exposure)、顯影（development)、剝離後，以230度的熱板加熱30分，進行固化（cure)，作成在基板的寬度方向間距（pitch)為254/zm ,在基板的縱向間距為8 5 // m ’線寬成為15 # m的格子形狀，厚度成為1 μ m的黑色矩陣膜。此外’在乾燥後的格子圖案 (lattice pattern)形成前的狀態下測定塗佈厚度，在除了端部lOmm以外的區域以IJ=(最大值-最小值）/(2x平均值）xl00(9〇算出膜厚精度U，結果基板行走方向、寬度方向都是3%以下。其次’在濕式清洗（wet cleaning)後，以厚度2〇 /zm、開縫喷嘴與基板之間的餘隙丨5〇及塗佈速度 150rani/s的條件進行了 R色用塗佈液的塗佈。r色用塗佈液是以丙烯樹脂當作黏結劑，以PGMEA當作溶媒，以顏料紅 177(Piginent Red 177)當作顏料（Pigment)並以固體含量濃度10%混合，進而將黏度調整成51111^5的感光性的塗佈液β塗佈了 20 μ m的塗佈膜的基板在進行6〇秒於3〇秒到達65Pa的真空乾燥後，以10(rc的熱板更乾燥了分鐘。接著進行曝光、顯影、剝離，僅在像素部殘留厚度2αιπ的R色塗佈膜，以23(rc的熱板加熱3〇分，進行了固化。接著以厚度20 、開縫喷嘴與基板之間的餘隙On the cat, the broken piece.../1,...^Τ〇υΐυ According to Fig. 6, the thickness is “= 5 丽, the angle between the 208 Α and 208 斜 and the back 21 卜 (10), and the oblique side 204 Α and 204 所The angle rc~Sl..m, the angle between the bottom surface 2〇2 and the rear 21G"9〇., the longitudinal direction of the bottom edge of the member (the X direction of the coating direction) is only Ll = 〇. 6 positions, the oblique side 204A and the length of the difficult straight line direction (up and down direction) are called the long sound of the lead line direction of the wiping member 300 and Ld = 2 〇 _, and the longitudinal length L4 of the wiping member 300 = 25mm. * Single number 1〇0146〇8 (Γ Α0101 Front 212 parallel to rear 210 to form 1 in the gap 22〇Page 29/51 pages β 1013120709-0 201236774 LP1 = 0.9_, LP2 = 2_, angle 0c2 is 50°. The size of the notch 220 is a shape that is plane-symmetrical with respect to the vertical plane provided orthogonally to the longitudinal direction at the center point of the wiping member 300. In addition, the test piece 1 (wiping member 300) ) is made by using an ethylene-propylene rubber having a rubber hardness of 60° as a material and forming it through a mold to be The shape of the above-mentioned parameter is defined. The test piece 1 (wiping member 300) is attached to the holder 112 by tilting the rear direction (gravity direction) by only 0 = 30 degrees in the vertical direction. In this state, the test piece 1 is wiped. The angle between the inclined surfaces 208A and 208B of the member 300) and the lip inclined surfaces 34A and 34B when the member 300 is in contact with the slit nozzle 20 is 7°, and the angle α=30° between the bottom surface 202 and the discharge port surface 36. The slit nozzle 2 When it comes into contact with the test piece 1 (wiping member 300), the slit nozzle 20 is lowered to a position where the contraction amount of the magazine 118 is 1 mm. <Evaluation> Next, the R color (red) for the color filter is used. The coating liquid was used as a coating liquid for evaluating the cleaning ability of the test piece 1 (wiping member 300). The coating liquid for the R color was a viscosity of 3 mPas, and the aery 1 ic resin was used as a binder (binder). The photosensitization liquid used in the use of PGMEA as a solvent has a solid content concentration of 20%. The groove 64 to the slit nozzle 20 of the slit coater 1 is filled with the R color. a coating liquid, and further, after being cleaned by the wiping member 300, dissolved The solvent nozzle 142 sprays the solvent into the fan shape at a 60° angle to the wiping member 300. The cleaning solvent uses PGMEA, and 100 GB of PGMEA is ejected per cleaning. Under the above conditions, regarding the following 4 Item (evaluation evaluation 4), evaluation of the cleaning ability of the test piece 1 (wiping member 300) 10014608 Production order A〇101 Page 30/51 page 1013120709-0 201236774 (o, evaluation ι (at high speed) Evaluation of the cleaning ability under the condition) After the coating liquid for R color of 2 〇〇〇 eL was discharged from the slit nozzle, the wiping member 300 was brought into contact with the slit nozzle 20, and was slid in the Y direction at a sliding speed of 500 mm/s. This operation was repeated 10 times, and after 10 times and 100 times, the residual state of the r-color coating liquid on the discharge surface 36 and the lip slopes 34A and 34Β and the wiping member 3_wear state were observed. (2), #价2 (Residual evaluation of the coating liquid on the test piece 1 (wiping member 300) after cleaning) According to the price 1, after 1G times and 100 times of cleaning, the bottom surface of the scouring 300 is observed. 202. Residues of the coating liquid for the R color in the peripheral portion thereof are evaluated.) 3 (The rubbing core "The residual root of the solvent after the solvent cleaning of the member 300 * According to the evaluation 1 The solvent in each of the wiping members. (4) and evaluation 4 (painting evaluation) of the solvent for cleaning the bottom surface 202 and the peripheral portion of the bottom surface 202 of the residual state of 3〇0 after cleaning, according to the evaluation of the 1st and 13th times of the evaluation After the cleaning, the alkali-free glass substrate (alkali free gUss substrat, eight 1 cnm comprehensive, wet thickness 10/zm and coating speed 〇Inin/s conditions into the substrate n, 仃K color coating liquid Coating. The slit nozzle 20 and the true * clearance are 150 Win ° coated substrate with a reduced pressure to 60 Pa two drying rods # 蝉樯ώ A % ' 'coating direction (X) film Thickness Accuracy U • Parity and Coating _ Others, Where to Observe. Film Thickness Accuracy U in the area of 1 Omm except for the end U=:r County 丄1〇〇娜(Ρ编U) l〇i large value - minimum value / (2x average value) χ 100 (ο / 〇) 51 pages 1013120709-0 page 31 201236774 Calculation. Referring to Fig. 7, the description regarding the test piece 1 (wiping member 300) The results of the evaluation of the evaluation 4. In the table of Fig. 7, the table T is the cleaning ability of the test piece 1, and each of the evaluation 1 to the evaluation 4 is shown in comparison with the comparison test 1. <Comparative test 1> Comparative test piece 1 The test piece 1 (wiping member 300) was removed by removing the notch 220. Using the comparative test piece 1, cleaning and coating were carried out under the same conditions as the test piece 1, and the same cleaning ability and coating evaluation were performed. Evaluation No. 4. With respect to the evaluation 1 and the test piece 1, after 10 times of cleaning and 100 times, the coating liquid for R color was not left in the discharge surface 36 and the lip inclined surfaces 34A and 34B. As a result, the wiping member was On the other hand, in the comparative test piece 1, although the coating liquid for R color does not remain on the discharge surface 36, the longitudinal length of the slit nozzle 20 is over the upper portion of the lip slopes 34A and 34B. , the R color coating liquid remains in a line shape. The residual R color coating liquid The width of the wire is 1 mm after cleaning for 10 times, and is 2 mm after 100 times. Accordingly, the upper portion of the oblique side of the cleaning member is worn over the length corresponding to the line width of the residual coating liquid for R color. In the test piece 1, the coating liquid for R color was not left on the bottom surface 202 of the wiping member 300 and the peripheral portion thereof. On the other hand, in the comparative test piece 1, the R color coating was left on the wiping member 200 and its peripheral portion. Cloth liquid. In the evaluation 3, in the test piece 1, the PGMEA in which the solvent for washing was not left in the bottom surface 202 of the wiping member 300 and the peripheral portion thereof. On the other hand, in the comparative test piece 1, the PGMEA in which the solvent for washing was left on the bottom surface and the peripheral portion of the wiping member 200. 100146G8 (^单单号 A〇101 page 32/to 51 page 1013120709-0 201236774) Regarding evaluation 4, in the test piece 1, the coated surface was completely free of defects, and the result of visual observation under transmitted light was comprehensive. The chromaticity is the same. The film thickness in the direction of the coating in the center portion is measured, and the average thickness is 2.0/zm and the film thickness is calculated in a region other than 10 m from the substrate end. The accuracy U is 2% or less. On the other hand, in the comparative test piece 1, the coated surface is thinner at the start portion of the cleaning and the position corresponding to the coating start portion, which is visually observed by the transmitted light. It was observed that the film thickness of the coating direction was measured and the film thickness accuracy U was measured. The average value was 1.97 #m, the maximum value was 2.04 μηι, and the minimum value was 1.8 in the region other than 10 mm from the substrate end. /zm, the film thickness accuracy U is 6% or less. <Example> A color filter was produced using the slit coater 1. The wiping member 300 shown in Test 1 was used for the slit nozzle 20 and the wiping member. The cleaning of the slit nozzle 20 of the wiping member 30 0 is for either The coating liquid was applied before each application with the discharge amount of the coating liquid from the slit nozzle before the cleaning of 1 000 //L and the sliding speed of 500 mm/s. The solvent of the wiping member after cleaning Cleaning is also carried out with PG Μ EA as the cleaning solution at a spray rate of 10 0 L. Initially after cleaning the 1100 x 1300 mm and 0.7 mm thick glass substrate, the short side of the substrate is used as the slit nozzle longitudinal (Y) direction. The black matrix coating liquid was applied by wetting the thickness 10, the gap between the slit nozzle and the substrate 150 and 150 mm/s. At this time, the applied black matrix coating liquid was made of titanium oxynitride (titanium oxynitride). ) as a light-shielding material, using propylene resin as a binder, using PGMEA as a solvent, adjusting the solid content concentration to 10% and adjusting the viscosity to 4 mPas. 1013120709-0 10014608 (^单单号 A〇101第33页/ Total 51 pages of 201236774 coating liquid. In addition, the coating operation time is 6 〇 seconds. The coated substrate is vacuum dried at 65 ° after 60 seconds at 30 seconds, and a hot plate at 100 ° C ( Hot plate) further drying for 1 minute. Then proceed After exposure, development, and peeling, the film was heated by a hot plate at 230 degrees for 30 minutes to be cured, and the pitch in the width direction of the substrate was 254/zm, and the longitudinal pitch of the substrate was 8 5 // m 'The line width becomes a lattice shape of 15 # m, and the thickness becomes a black matrix film of 1 μm. Further, the coating thickness was measured in a state before the formation of the lattice pattern after drying, and IJ=(maximum-minimum value)/(2xmean value) xl00 (9〇) in the region other than the end portion of 10 mm. When the film thickness accuracy U was calculated, the substrate traveling direction and the width direction were both 3% or less. Next, after the wet cleaning, the thickness was 2 〇/zm, and the clearance between the slit nozzle and the substrate 丨5 Coating of R color coating liquid was carried out under the conditions of coating speed and coating speed of 150 rani/s. The coating liquid for r color was made of propylene resin as a binder, PGMEA was used as a solvent, and pigment red 177 (Piginent Red). 177) As a pigment (Pigment) and mixed at a solid content concentration of 10%, and a photosensitive coating liquid having a viscosity adjusted to 51111^5, a substrate coated with a coating film of 20 μm is subjected to 6 sec. After drying to vacuum at 65 Pa in 3 sec., the hot plate of 10 (rc was dried for a few minutes. Then, exposure, development, and peeling were performed, and only the R color coating film having a thickness of 2αιπ remained in the pixel portion, and 23 (rc) The hot plate was heated for 3 minutes and cured. Then with a thickness of 20, the slit nozzle and the substrate Clearance between

150 # m及塗佈速度1 5〇mm/s的條件，對形成黑色矩陣、R 色的塗佈膜的基板進行了G色用塗佈液的塗佈。將塗佈了 10014608(^單編號A0101 第34頁/共51頁 1013120709-0 201236774 20 的塗佈膜的基板進行60秒於30秒到達65Pa的真* 乾燥後，以100°C的熱板更進一步乾燥了 1〇分鐘。接著進行曝光、顯影、剝離，僅在G色像素部殘留厚度2；am的G色塗佈膜，以230°C的熱板加熱3〇分，進行了固化。進而以厚度20/z m、開縫喷嘴與基板之間的餘隙 150//111及塗佈速度15〇111111/3的條件，對形成黑色矩陣、^ 色、G色的塗佈膜的基板進行了B色用塗佈液的塗佈。塗佈了 20 μ m的塗佈膜的基板在進行60秒於30秒到達65Pa ^ 的真空乾燥後，以100°C的熱板更進一步乾燥了 1〇分鐘。接著進行曝光、顯影、剝離，僅在B色像素部殘留厚度2"m的B色塗佈膜，以230度的熱板加熱30分，進行了固化。此外’ G色用塗佈液是以R色用塗佈液將顏料更換成顏料綠36(Pigment Green 36)並以固體含量濃度將黏度調整成5mPas的塗佈液。B色用塗佈液是以r色用塗佈液將顏料更換成顏料藍15(Pigment Blue 15)並以固體含量濃度10%將黏度調整成5mPas的塗佈液。R、g、B ^ 色塗佈時的作業時間都是60秒。此外，塗佈品位都是各色沒話說’針對膜厚分布也是在乾燥後各色都測定，在除了端部10mm以外的區域以U =(最大值-最小值）/(2x平均值）χ100(%)算出膜厚精度U，結果基板行走方向、寬度方向都是3%以下的良好。然後最後’藉由濺錄（sputtering)使ITO(Indium Tin Oxide:銦錫氧化物）附著。藉由該製造方法作成了 1 000片的彩色濾光片。所得到的彩色濾光片在除了距基板端部10mm以外的製品區域無塗佈不均，色度也均勻，也無微粒缺點等的清掃所引起的缺陷，品質上沒話說。 1013120709-0 1〇〇146〇8(^·早編號A0101 第35頁/共51頁 201236774 更進一步使該彩色濾光片與形成TFT陣列的基板重疊，在烘箱（oven)中一邊加壓，一邊以160°C加熱90分鐘，使密封劑（sealing compound)硬化。在進行將液晶注入該單元（cell)後，藉由紫外線固化樹脂（UV-curable resin)將液晶注入口密封。接著，將偏光板貼附於單元的兩片玻璃基板的外侧，更進一步使所得到的單元模組化（modularization)，完成液晶顯示器。所得到的液晶顯示器為色濃度（color density)均勻且也無微粒缺點，品質上沒話說。 [0006] [0007] 【產業上的可利用性】本發明可利用於在彩色液晶顯示器用彩色濾光片以及陣列基板、電漿顯示器用面板、濾光器等的基板上，形成均勻且高品質的塗佈膜的各種顯示器用構件的製造〇【圖式簡單說明】圖1是具備與本發明的實施的形態有關的清掃裝置的塗佈裝置之說明圖。圖2(a)、（b)、（c)、（d)、（e)是階段地顯示藉由圖1所示的清掃裝置清掃的程序之說明圖。圖3是顯示與本發明的實施的形態有關的擦拭構件之概略斜視圖。圖4(a)、（b)是顯示圖2所示的擦拭構件與開縫喷嘴的位置關係之說明圖。圖5是藉由圖3所示的擦拭構件進行的開縫喷嘴的清掃作用之說明圖。 1001棚#單編號A0101 第36頁/共51頁 1013120709-0 201236774 圖6是顯示圖3所示的擦拭構件的變形例之概略斜視圖。圖7是表示藉由與本發明的實施的形態有關的擦拭構件進行的清掃作用的試驗結果之圖。圖8是藉由習知的清掃構件進行的開縫喷嘴的清掃作用之說明圖。圖9(a)、（b)是圖8的清掃構件之擦拭構件400與溶劑清洗後的狀況之說明圖。〇 [0008] 0 10014608(^^^^ 【主要元件符號說明】 1 :開缝塗佈器 2:基台 4:導轨 6:平台 10:支柱 20 :開縫噴嘴 22:前唇 24:後唇 26:歧管 28:開縫 30 :吐出口 32:墊片 34A、34B:唇形斜面 3 6 :吐出口面 40.·塗佈液供給裝置 42:供給閥 44:吸引閥 A0101 第37頁/共51頁 1013120709-0 201236774 4 6 :過滤器 5 0 :注射泵 52:注射器 ’ 5 4 :活塞 56:本體 6 0 :供給管 62:吸引管 64:槽 66 ' 150 ' 424:塗佈液 68 :壓縮空氣源 70:上下升降單元 72 :馬達 74:導件 76:滚珠螺桿 78:升降台 80:懸掛保持台 9 0 :厚度感測器 92:支撐台 94:控制裝置 96:操作盤 100:擦拭單元 102:台車 1 0 4 :托架 106:滑件 1 08 :驅動單元 110:托盤 1013120709-0 第38頁/共51頁 201236774 112:托座 114 :壓板 116:導件 118:彈簧 120:前方支撐部 122:誘導面 124:上邊 140:清洗單元 142:溶劑喷嘴 " 144:配管 150:附者的塗佈液 152:流出的塗佈液 154:被匯集的塗佈液 200、30(h擦拭構件 202、402 :底面 204A、204B:斜邊 ^ 206、406:底邊 ) 208A、208B:斜面 210 :後面 212、412:前面 214A、214B:頂面 220 :缺口 222 :缺口底邊 224A、224B:缺口斜面 400:習知的擦拭構件 404A、404B·.斜邊 10014608(^單編號 A〇101 ^ 39 1 / ^- 51 I 1013120709-0 201236774 4 2 0 :殘留液 422 :吸引口 424:移動到上部的塗佈液 426:殘留塗佈液 Α:基板（被塗佈構件） Β:液珠 C:塗佈膜 D s :滑動方向 F:箭頭方向（擦拭構件的厚度方向） LI、L2、L3、L4:擦拭構件的各部的長度 Lc :缺口底邊的長度 LP1:被投影到缺口底邊的底面的長度 LP2 :被投影到缺口底邊的前面的長度 5 :空間 T:擦拭構件的厚度 α :底面與吐出口面所成的角度召：底面與後面所成的角度 γ c :斜邊間的角度 7 η:開縫喷嘴之與唇形斜面34Α及34Β所成的角度 :後面與斜面所成的角度 0:對擦拭構件的前面的鉛直面的傾斜角度 6>cl:缺口底邊之與前面所成的角度 6>c2:缺口斜面夾在缺口底邊裏所成的角度 10014608^^'^ A〇101 第40頁/共51頁 1013120709-0150 μM and a coating speed of 15 〇mm/s were applied to the substrate on which the coating film of the black matrix and the R color was formed, and the coating liquid for G color was applied. The substrate coated with the coating film of 10014608 (^ 单号 A0101第34页/ 51 pages 1013120709-0 201236774 20 was subjected to true* drying for 60 seconds in 30 seconds at 30 seconds, and then heated at 100 ° C. Further, it was dried for 1 minute. Then, exposure, development, and peeling were carried out, and only the thickness 2 of the G color pixel portion was left; the G-color coating film of am was heated by a hot plate at 230 ° C for 3 minutes to be solidified. A substrate having a coating film of a black matrix, a color, and a G color was formed under the conditions of a thickness of 20/zm, a clearance of 150//111 between the slit nozzle and the substrate, and a coating speed of 15〇111111/3. Coating of coating liquid for B color. The substrate coated with a coating film of 20 μm was vacuum dried at 65 Pa ^ in 60 seconds at 30 seconds, and further dried by a hot plate at 100 ° C for 1 〇. Then, exposure, development, and peeling were carried out, and only the B color coating film having a thickness of 2 " m remained in the B color pixel portion, and was heated by heating on a hot plate of 230 degrees for 30 minutes. Further, the coating liquid for the G color was used. The pigment was replaced with Pigment Green 36 by the coating solution for R color and the viscosity was adjusted to 5 mPas at a solid content concentration. The coating liquid for B color is a coating liquid in which the pigment is replaced with Pigment Blue 15 by a coating liquid for r color, and the viscosity is adjusted to 5 mPas at a solid content concentration of 10%. g, B ^ color coating work time is 60 seconds. In addition, the coating grade is all colors, nothing to say 'for the film thickness distribution is also measured after drying each color, in the region except the end 10mm U = (Maximum-minimum value)/(2x average value) χ100 (%) The film thickness accuracy U was calculated, and as a result, the substrate traveling direction and the width direction were both 3% or less. Then, finally, ITO was sputtered. (Indium Tin Oxide: Indium Tin Oxide) was attached. By this manufacturing method, 1 000 color filters were produced. The obtained color filters were not coated in the product area except for 10 mm from the end of the substrate. All, the chromaticity is also uniform, and there are no defects caused by the cleaning of the particles, etc., and there is nothing to say about the quality. 1013120709-0 1〇〇146〇8(^·早号A0101 Page 35/51 of 201236774 Further The color filter overlaps with the substrate forming the TFT array in an oven The film was heated while being heated at 160 ° C for 90 minutes to cure the sealing compound. After the liquid crystal was injected into the cell, the liquid crystal injection port was sealed by a UV-curable resin. Next, the polarizing plate is attached to the outside of the two glass substrates of the unit, and the obtained unit is further modularized to complete the liquid crystal display. The resulting liquid crystal display has a uniform color density and no particle defects, and the quality is nothing to say. [Industrial Applicability] The present invention can be used to form uniform and high on a color filter for a color liquid crystal display, an array substrate, a panel for a plasma display panel, a filter, or the like. Manufacture of various display members for a coating film of a quality 〇 [Brief Description of the Drawings] Fig. 1 is an explanatory view of a coating device including a cleaning device according to an embodiment of the present invention. 2(a), (b), (c), (d), and (e) are explanatory views showing a procedure for cleaning the cleaning device shown in Fig. 1 in stages. Fig. 3 is a schematic perspective view showing a wiping member according to an embodiment of the present invention. 4(a) and 4(b) are explanatory views showing the positional relationship between the wiping member and the slit nozzle shown in Fig. 2. Fig. 5 is an explanatory view showing the cleaning action of the slit nozzle by the wiping member shown in Fig. 3; 1001 Shelf #单编号A0101 Page 36/51 Page 1013120709-0 201236774 Fig. 6 is a schematic perspective view showing a modification of the wiping member shown in Fig. 3. Fig. 7 is a view showing the test results of the cleaning action by the wiping member according to the embodiment of the present invention. Fig. 8 is an explanatory view showing the cleaning action of the slit nozzle by a conventional cleaning member. Figs. 9(a) and 9(b) are explanatory views showing the state of the wiping member 400 of the cleaning member of Fig. 8 after the solvent is cleaned. 〇[0008] 0 10014608(^^^^ [Description of main component symbols] 1 : Slot coater 2: Abutment 4: Guide rail 6: Platform 10: Pillar 20: Slotted nozzle 22: Front lip 24: Rear Lip 26: Manifold 28: Slot 30: Discharge port 32: Gasket 34A, 34B: Lip slope 3 6: Exudation surface 40. • Coating liquid supply device 42: Supply valve 44: Suction valve A0101 Page 37 / Total 51 pages 1013120709-0 201236774 4 6 : Filter 5 0 : Syringe pump 52 : Syringe ' 5 4 : Piston 56 : Body 6 0 : Supply tube 62 : Suction tube 64 : Slot 66 ' 150 ' 424: Coating solution 68: compressed air source 70: up and down lifting unit 72: motor 74: guide 76: ball screw 78: lifting platform 80: suspension holding table 90: thickness sensor 92: support table 94: control device 96: operating panel 100 : Wiping unit 102: Pallet 1 0 4 : Bracket 106: Sliding member 1 08 : Drive unit 110: Pallet 1013120709-0 Page 38 of 51 201236774 112: Bracket 114: Platen 116: Guide 118: Spring 120 : Front support portion 122: Induction surface 124: Upper side 140: Cleaning unit 142: Solvent nozzle " 144: Pipe 150: Coating liquid 152 of the attached: Coating liquid 154 flowing out: Coating liquid 200, 30 to be collected (h wipe member 202, 402: bottom surface 204A, 204B: oblique edge ^ 206, 406: bottom edge) 208A, 208B: bevel 210: rear 212, 412: front 214A, 214B: top surface 220: notch 222: notched bottom edge 224A, 224B: Notch slanting surface 400: conventional wiping member 404A, 404B·. oblique side 10014608 (^ single number A 〇 101 ^ 39 1 / ^- 51 I 1013120709-0 201236774 4 2 0 : residual liquid 422: suction port 424: moving to Upper coating liquid 426: Residual coating liquid Α: Substrate (coated member) Β: Liquid bead C: Coating film D s : Sliding direction F: Arrow direction (thickness direction of wiping member) LI, L2, L3 L4: length Lc of each portion of the wiping member: length L1 of the bottom side of the notch: length LP2 projected to the bottom surface of the bottom side of the notch: length 5 projected to the front of the bottom side of the notch: space T: thickness α of the wiping member : The angle between the bottom surface and the discharge surface: the angle between the bottom surface and the back surface γ c : the angle between the oblique sides 7 η: the angle between the slit nozzle and the lip slope 34 Α and 34 :: the back and the slope Angle of formation 0: Angle of inclination of the front face of the wiping member 6>cl: angle of the bottom edge of the notch 6 > c2: notch in the bottom edge of the notch inclined surfaces the angle 10014608 ^^ '^ A〇101 page 40 / of 51 1013120709-0

Claims

201236774 七、申請專利範圍： 1 . 一種清掃構件，具有互相對向的第一面與第二面，一邊接觸延伸於塗佈器的一方向的吐出口的吐出口面，與該吐出口面的兩接鄰面，一邊滑動於該一方向，提供該吐出口面與該兩接鄰面的清掃，其特徵包含：配設於該第一面側之同時接觸該吐出口面與該兩接鄰面之清掃部；以及以該清掃部為起點，延伸至該第二面側之複數個流201236774 VII. Patent application scope: 1. A cleaning member having first and second faces facing each other, and contacting a discharge port surface of a discharge port extending in one direction of the applicator and a discharge port surface The two adjacent surfaces are slid in the one direction to provide cleaning of the discharge surface and the two adjacent surfaces, and the method includes: providing the first surface side while contacting the discharge surface and the two adjacent sides a cleaning portion of the surface; and a plurality of streams extending from the cleaning portion to the second surface side

出路徑面，在該流出路徑面於該第二面侧設有缺口。 2 .如申請專利範圍第1項之清掃構件，其中該缺口具有三角形狀的剖面。 3 . —種塗佈器的清掃方法，是藉由清洗液清洗申請專利範圍第1項或第2項之清掃構件的清掃部後，一邊使該清掃部接觸該吐出口面及該兩接鄰面，一邊使其滑動於該一方向，清掃該塗佈器的方法，其特徵為：在該第二面側於重力方向令在比該缺口還下方的位置保持該清掃構件，以便塗佈液與清洗液由該缺口的一端流出。 4 . 一種清掃裝置，是一邊使該清掃部接觸該吐出口面與該兩接鄰面，一邊使申請專利範圍第1項或第2項之清掃構件滑動並進行清掃，其特徵包含：該清掃構件的保持體，使該清掃構件與該保持體滑動於該一方向之移動手段；以及 10014_(P 編號皿01 第41頁/共51頁 1013120709-0 201236774 透過清洗液進行清掃構件的清掃部的清洗之清掃構件清洗裝置，該保持體在該第二面側中於重力方向中在比該缺口還下方的位置保持該清掃構件。 5 . —種顯示器用構件的製造方法，是使用申請專利範圍第3 項之清掃方法製造顯示器用構件。 10014608(^單編& A() 1(51 第42頁/共51頁 1013120709-0The exit path surface is provided with a notch on the second surface side of the outflow path surface. 2. The cleaning member of claim 1, wherein the notch has a triangular shaped cross section. The cleaning method of the applicator is to clean the cleaning portion of the cleaning member according to item 1 or item 2 of the patent application by the cleaning liquid, and then contact the cleaning portion with the discharge port surface and the two adjacent sides. a method of cleaning the applicator while sliding it in the one direction, wherein the cleaning member is held at a position lower than the notch in the direction of gravity on the second surface side, so as to apply a liquid The cleaning liquid flows out from one end of the notch. A cleaning device that slides and cleans a cleaning member of the first or second aspect of the patent application while the cleaning portion is in contact with the discharge port surface and the two adjacent surfaces, and the cleaning device includes: the cleaning a holding body of the member, a moving means for sliding the cleaning member and the holding body in the one direction; and 10014_ (P No. 01 page 41/51 pages 1013120709-0 201236774 cleaning the cleaning member through the cleaning liquid a cleaning cleaning member cleaning device that holds the cleaning member at a position lower than the notch in the gravity direction in the second surface side. 5. A manufacturing method for a display member is to use a patent application range The cleaning method of item 3 manufactures components for display. 10014608(^单编& A() 1(51 Page 42 of 51 1013120709-0