TW201213445A - A siloxane polymer composition, a curing film and a forming method for the curing film - Google Patents

Abstract

The present invention is related to a siloxane polymer composition, a curing film and a forming method for the curing film. The topic of the present invention is about providing a siloxane polymer composition. The siloxane polymer composition is suitable for a spray nozzle coating method without non-uniform coating and reveals excellent appearance as well as the siloxane polymer composition can achieve high evenness (the uniformity of film thickness) and high speed coating. The siloxane polymer composition can form a curing film with excellent transparency and anti-abrasion property which is used as a protective film and an interlaminar insulation film. A siloxane polymer composition comprises [A] a siloxane polymer having free radical reactive functional groups, [B] free radical polymerization initiator and [C] organic solutions, wherein the concentration of solid component is 5wt% to 30wt% and the viscosity is 2.0mPa.s to 10mPa.s at 25 DEG C and as [C] organic solutions, they at least comprise (C1) organic solutions having vapor pressure from 0.1 mmHg to 1 mmHg at 20 DEG C.

Description

201213445 六、發明說明： 【發明所屬之技術領域】 本發明涉及梦氧炫聚合物組成物、硬化膜以及硬化 膜的形成方法。 【先前技術】 顯示元件中一般基於使層狀地配置的佈線間絕緣的 目的而設置層間絶緣膜。作為層間絕緣膜的形成材料， 為了得到必要的圖案形狀的步驟數少，而且得到的層間 絕緣膜要求高度的平整性，所以廣泛使用正型感放射線 性組成物’還開發出了成本方面有利的負型感放射線性 組成物（參照日本特開2000_ 1 62769號公報 在液晶顯示元件等的製造步驟中 另外 ^ , 由於進行 ;谷劑的浸潰處理以及高溫處理，所以為了防止液晶顯示 几件劣化，會設置保護膜。因此，保護膜要求平整性、 透明性、足夠的表面硬度（耐擦傷性等）等。作為保護膜 的:成材料公開了使用透明性等優異的石夕氧院聚合物類 材枓的技術（參照日本特開2__⑽1 648號公報、日本特 =_]則6號公報、日本特開屬以⑽號公報）。 仁疋’目刚的矽氧烷聚合物類材料 希望開發出改善各種性能的"：聚ί 物類感放射線性組成物。 要用：保：板。觸摸面板内部也需 面板，根據其目的二驟液？示元件以及觸摸 但從削減成本的使:各種感放射線性組成物， —化。"’看，希望感放射線性組成物的统 201213445 另外’在日本特開2002-13 1 896號公報 k法作為在小型基板上塗布感放射線性組成 °亥方疋塗法’是在基板中央滴加感放射線性組 基板的塗布方法，藉由旋塗法可以得到良好 性。但是’在藉由旋塗法塗布到大型基板上 轉甩出而廢棄的感放射線性組成物變多、高 產生基板破裂、必須確保週期時間等問題。 於更大型的基板時’為了在旋轉時有必要的 以要求特製的電機，在製造成本方面是不利 因此，作為代替旋塗法的塗布方法，可 嘴喷出感放射線性組成物塗布到基板上的噴 布法。喷出噴嘴式塗布法是使塗布噴嘴在一 過’在基板上形成塗膜的塗布方法，與旋塗 以減少塗布必須的感放射線性組成物的量， 短塗布時間’在製造成本方面是有利的。 目前的感放射線性組成物藉由噴出喷嘴式 時’有可能產生塗布不均’成為實現作為層 保遵膜專的性質而要求的局度平整性的障礙 如在日本特開2009-98673號公報中，雖然記 中記載的感放射線性組成物可以藉由旋涂法 塗布的意思，但是沒有具體公開合適的黏度 濃度、溶劑等，在實施例中也沒有藉由喷出 法等塗布。 根據這種情況’希望開發出合適喷出 法’沒有塗布不均、外觀優異，而且可以實 中公開了旋 物的方法。 成物後旋轉 的塗布均勻 時，具有旋 速旋轉可能 另外’在用 力Cf速度’所 的0 以採用從喷 出噴嘴式塗 定方向上掃 法相比，可 而立還可以 然而’使用 塗难法塗布 間絕緣膜、 。另外，例 載了該公報 以外的方法 、固體成分 嗔嘴式塗布 喷嘴式塗布 現高度平整 -5- 201213445 性（膜厚均勻性）和高速塗布，且可以形成透明性、耐擦 傷性優異的硬化膜的矽氧烷聚合物組成物。 現有技術文獻 專利文獻 專利文獻1 日本特開2000-1 62769號公報 專利文獻2 日本特開2000-001648號公報 專利文獻3 日本特開2006-178436號公報 專利文獻4 日本特開2008-248239號公報 專利文獻5 日本特開2002- 1 3 1 896號公報 專利文獻6 日本特開2009-98673號公報 【發明内容】 本發明是根據上述問題提出的，其目的在於提供沒 有塗布不均、外觀優異，而且可以實現高度平整性（膜厚 均勻性）和高速塗布、且可以形成透明性、耐擦傷性優異 的作為保護膜和層間絕緣膜的硬化膜的矽氧烷聚合物組 成物。 為了解決上述問題而提出的本發明是一種矽氧烷聚 合物組成物，其包含： [A] 具有自由基反應性官能團的矽氧烷聚合物（以 下，也稱作“[A]矽氧烷聚合物”）， [B] 自由基聚合引發劑，以及 [C] 有機溶劑， 其中，固體成分濃度為5質量％以上30質量％以下， 25°C時的黏度為2.0mPa，s以上lOmPa.s以下，而且， 201213445 作為[c]有機溶劑至少包含（ci)2〇t：時的蒸氣壓是 “ 以上小於lmmHg的有機溶劑（以下，也稱 “（(：1)有機溶劑’，）。 本發明的矽氧烷聚合物組成物在形成硬化膜時 於3有[A]具有自由基反應性官能團的矽氧烷聚合物 以一般透明性優異。另外， 劑，所^ ^ 由於各有[Β]自由基聚合引發 朽J所以可以藉由[Α]矽氧烷夸人& 甘甘 烷聚合物的自由基聚合硬化， 另：下也可以得到具有足夠的耐擦傷性的硬化 猎由使忒矽乳烷聚合物組成物的固體成分濃 圍内，可有效抑制塗布不均的產生，從而可 外觀。此外’藉由使峨燒聚合物組成 'X上迷fe圍内，可在維持膜厚均句性的同時， 即使產生塗布不均，也可使 ..Z1 τ 也j使自發地達到均勻程度的黏度 建到平衡，且可以眚古、*、太i 、同速塗布性。此外，藉由使用具 有特疋範圍的蒸氣壓的（c i)有 …1)有钱洛劑，可以一邊更佳地 防止塗布不均，一邊莴# 遭问速塗布，即使採用例如喷出喷嘴 式k布法時，也是合適的。 [A ]石夕氧院聚合物是水解性石々p彳卜人此 物， 醉性石夕烷化合物的水解縮合 上述水解性…合物較佳是至少包含(a"下述式 U )所示的水解性矽烷化人妝 4 , 7沉化口物（以下，也稱作“(al)化合物”) α (a2)下述式（2)所示的水解性 7烷化合物（以下，也稱作 (a 2)化δ物”）的水解縮合物。 201213445201213445 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method for forming a dream oxygen polymer composition, a cured film, and a cured film. [Prior Art] In the display element, an interlayer insulating film is generally provided for the purpose of insulating between wirings arranged in a layer. As a material for forming the interlayer insulating film, the number of steps for obtaining a necessary pattern shape is small, and the obtained interlayer insulating film requires a high level of flatness, so that the positive-type radiation-radiating composition is widely used, and it is also advantageous in terms of cost. In the manufacturing process of a liquid crystal display element, etc., it is carried out in the manufacturing process of a liquid crystal display element, etc., and the impregnation process of a cereal agent and high-temperature processing are performed, in order to prevent several deterioration of liquid crystal display. A protective film is provided. Therefore, the protective film is required to have flatness, transparency, sufficient surface hardness (scratch resistance, etc.), etc. As a protective film, a material is disclosed which is excellent in transparency and the like. The technology of the 枓 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 希望 希望 希望 希望 希望 希望 希望 希望A ": poly-feel-like radioactive linear composition that improves various properties. To use: a: plate. The inside of the touch panel also requires a panel, according to its purpose. Two liquids show the components and touch but from the cost reduction: various senses of the linear composition, - ".", look forward to the sense of the radioactive composition of the 201213445 in addition to 'open in Japan 2002-13 1 896 No. k. method is applied to apply a radiation-induced linear composition on a small substrate. The method is a coating method in which a radiation-sensitive group substrate is dropped on the center of the substrate, and the spin coating method can be used for goodness. When the spin-coating method is applied to a large substrate, the amount of the radiation-sensitive composition that is discarded and discarded is high, and the substrate is broken, and the cycle time and the like must be ensured. In the case of a larger substrate, it is necessary for the rotation. A special motor is required to be disadvantageous in terms of manufacturing cost. Therefore, as a coating method instead of the spin coating method, a nozzle spray method in which a radiation-sensitive composition is applied onto a substrate can be applied. The nozzle nozzle coating method is a coating nozzle. In the case of a coating method of forming a coating film on a substrate, and spin coating to reduce the amount of the radiation-sensitive composition necessary for coating, the short coating time is in the manufacturing cost side. The surface is advantageous. The current radiation-sensitive composition, when it is sprayed out of the nozzle type, is likely to cause uneven coating, which is an obstacle to achieving the flatness required as a layer-specific property. In the publication of JP-A-2009-98673, although the radiation-sensitive composition described in the above description can be applied by a spin coating method, a suitable viscosity concentration, a solvent, and the like are not specifically disclosed, and in the embodiment, the discharge method is not used. According to this case, it is desirable to develop a suitable discharge method, which is not coated unevenly, and has an excellent appearance, and a method of rotating the object can be disclosed. When the coating after the rotation of the product is uniform, the rotation speed may be additionally The 0 at the "forced Cf speed" is comparable to the sweeping method in the spray nozzle type coating direction, but the interlayer insulating film can be applied by using the coating method. In addition, the method other than the above-mentioned publication, the solid-state poop-type coating nozzle type coating is now highly flat--5-201213445 (thickness uniformity) and high-speed coating, and it is possible to form a hardening property excellent in transparency and scratch resistance. The siloxane polymer composition of the membrane. CITATION LIST PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the invention is to provide an unapplied coating and an excellent appearance. Further, it is possible to realize a high-level flatness (film thickness uniformity) and a high-pressure coating, and it is possible to form a siloxane polymer composition which is a cured film of a protective film and an interlayer insulating film which is excellent in transparency and scratch resistance. The present invention proposed to solve the above problems is a siloxane polymer composition comprising: [A] a siloxane polymer having a radical-reactive functional group (hereinafter, also referred to as "[A] decane) Polymer"), [B] a radical polymerization initiator, and [C] an organic solvent, wherein the solid content concentration is 5% by mass or more and 30% by mass or less, and the viscosity at 25 ° C is 2.0 mPa, and s or more is 10 mPa. In the following, the vapor pressure at the time when the organic solvent contains at least (ci) 2〇t: 201213445 is "an organic solvent having a thickness of less than 1 mmHg (hereinafter, also referred to as "((1) organic solvent"). The oxime polymer composition of the present invention has a [A] a siloxane polymer having a radically reactive functional group at 3 in the formation of a cured film, and is excellent in general transparency. Further, the agent has a Β] The radical polymerization initiates the decay of J, so it can be hardened by the radical polymerization of [Α] oxime oxime & ganthanane polymer, and the hardening hunter with sufficient scratch resistance can also be obtained. The solid content of the ruthenium lactone polymer composition is within the concentration It can effectively suppress the occurrence of uneven coating, and thus can be made into appearance. In addition, by making the composition of the simmered polymer 'X on the inside, it is possible to maintain uniformity of the film thickness, even if uneven coating occurs. It is possible to make .Z1 τ and j to make the viscosity to reach a uniform degree spontaneously, and it can be coated with ancient, *, too i, and the same speed. In addition, by using a vapor pressure having a characteristic range (ci There is...1) It is suitable to prevent coating unevenness on the one hand, and it is suitable for coating at the same time, even if it is sprayed with a nozzle type k cloth method. [A] The ceramsite polymer is a hydrolyzable sarcophagus, and the hydrolytic condensation of the toxic oxalate compound preferably contains at least (a " U) Hydrolyzable sulfonated human makeup 4, 7 hydration mouth (hereinafter, also referred to as "(al) compound") α (a2) a hydrolyzable 7-alkyl compound represented by the following formula (2) (hereinafter also A hydrolysis condensate called (a 2) δ ""). 201213445

式（1)中，R1是碳原子數為i〜6的烷基^ R2是含有自 由基反應性官能團的有機基團。P…的整數。其中， 牙R為多個時’多個Rl和R2各自獨立； =U)中，R3是碳原子數為卜6的烷基。R4是氫原 λ ::,原 '數為1〜20的烷基、碳原子數A 1〜20的氟烷 :本基、奈基、環氧基、胺基或異氰酸酯基。n是0〜20 棚整數。q是0〜3的整數。其中，R~〇R4為多個時，多 個R和R4各自獨立。 由於（al)化合物具有自由基反應性官能團 {im 0/7 \ ’ 口 久—由基反應性官能團，所以合成[A]矽氧烷聚合物 制糟由調即（a 1)化合物和（a2)化合物的聚合比可以控 率，A]j夕氧烷聚合物t的自由基反應性官能團的含有 '攸而進一步提高形成的硬化膜的耐擦傷性。 蒸氣M ^ [C]有機'合劑較佳為進—步含有（C2)2Q °C時的 i溢i為lmmHg以上2〇_Hg以下的有機溶劑（以下， “（C2)有機溶劑，，），（c2)有機溶劑的含量相對於 以上機*溶劑和（C2)有機溶劑的總量，較佳為10質量％ 蒸氣ΓΛ量(m。11由使蒸氣壓低的（ci)有機溶劑和 N的（C2)有機溶劑的f量比在上述特定範圍内， 塗=1以使預烘烤後的塗膜中的殘留溶劑量最佳化， 、'抓動性均句’從而可以抑制塗布不均（條狀不勾、 ；不勻霧狀不勻等）的產生，進一步提高膜厚均勻性。 201213445In the formula (1), R1 is an alkyl group having a carbon number of i to 6 and R2 is an organic group containing a radical reactive functional group. An integer of P.... Wherein, when the teeth R are plural, "a plurality of R1 and R2 are each independently; in the case of =U), R3 is an alkyl group having a carbon number of 6; R4 is a hydrogen atom λ ::, an original alkyl group having a number of 1 to 20, and a fluoroalkane having a carbon number of 1 to 20: a group, a naphthyl group, an epoxy group, an amine group or an isocyanate group. n is a 0 to 20 shed integer. q is an integer from 0 to 3. When R~〇R4 is plural, a plurality of R and R4 are independent of each other. Since the (al) compound has a radically reactive functional group {im 0/7 \ 'mouth-based-based reactive functional group, the synthesis of [A]methoxyalkane polymer is tuned by the (a 1) compound and (a2) The polymerization ratio of the compound is controllable, and the radical reactive functional group of the A]j oxane polymer t contains '攸 to further improve the scratch resistance of the formed cured film. The vapor M ^ [C] organic 'mixture is preferably an organic solvent having a flow rate of (C2) at a temperature of 2 ° C at a temperature of 1 mmHg or more and 2 〇 Hg or less (hereinafter, "(C2) organic solvent,)) , (c2) the content of the organic solvent is preferably 10% by mass relative to the total amount of the above solvent * and (C2) organic solvent, and the amount of vapor is (m. 11 is obtained by making the vapor pressure low (ci) organic solvent and N (C2) The amount of f of the organic solvent is within the above-mentioned specific range, and coating = 1 to optimize the amount of residual solvent in the coating film after prebaking, and 'grabberability is uniform', thereby suppressing uneven coating (The strip is not hooked; the uneven mist is uneven, etc.), which further improves the film thickness uniformity. 201213445

該矽氧燒聚合％ M 面活性劑或有機石夕類界面：含有晴自含氟界 劑(以下’也稱作“[D]界面活性:二-種以上的界面活性 量相對於咖質量份⑷ ^)，⑼界面活性劑的含 量份以上2質量份以下 T合物’較佳為〇.〇1質 -步含有特定的[D]界面活性劑氧；聚合物組成物藉由進 滑性’從而可以進一步提言 M “塗膜的表面平 ^ Μ 0 y成的層間絕緣膜的膜厚均 内可1ΓΓ使[D]界面活性劑的含量在上述範圍 内可以進一步提高塗膜的表面平滑性。 該矽氧烷聚合物組成物較佳為進一步含有[EUA]矽 氧烧聚合物以外的乙烯基不飽和化合物(以下，也稱作 [E]乙烯基不飽和化合物”)。該石夕氧烧聚合物組成物藉由 進一步含有[E]乙烯基㈣和化合物，可以進—步提高由 該石夕氧烧聚合物組成物形成的硬化膜的耐擦傷性和透明 性。 該感放射線性組成物較佳為進一步含有[F]感放射 線性酸產生劑或感放射線性鹼產生劑（以下，也稱作“[F] 酸產生劑或鹼產生劑。該矽氧烷聚合物組成物藉由含 有[F]酸產生劑或驗產生劑’聚合性變得更高，可以得到 耐擦傷性等優異的硬化膜。 該矽氧炫聚合物組成物由於可以形成透明性、财擦 傷性優異的硬化膜’所以適合作為用於形成顯示元件或 觸摸面板用的保護膜或層間絕緣膜的硬化膜的材料。 本發明還適合包含使用該石夕氧院聚合物組成物形成 的硬化膜。 -9 - 201213445 本發明的硬化膜的形成方法包括. (1) 邊使噴出噴嘴和基板相對移 兮功θ P取人動，邊在基板上塗布 β亥石夕乳烧t S物組成物，形成塗膜并、 、 V驟； (2) 對上述塗膜的至少一部分昭 …、射放射線的步驟； (3) 將上述照射了放射線的塗膜 土犋顯影的步驟，以及 (4) 加熱上述顯影的塗膜的步驟。 焉速塗布的同時，可 該石夕氧烷聚合物組成 布法，也可以一邊防 ’藉由利用感放射線 可以容易地形成具有 在該形成方法中，使用可以在 以形成膜厚均勻性優異的硬化膜的 物。因此，即使採用喷出喷嘴式塗 止塗布不勻，一邊高速塗布。另外 性的曝光、顯影、加熱形成圖案， 微細且精巧的圖案的硬化膜。此外，竹炎_拔&上 1 邗為這樣形成的保 護膜和層間絕緣膜的硬化膜，沒有塗布τ仏 θ ^ ^ 乃上叩不均、具有高度 的平整性、適合用於液晶顯示元件、有機el顯示元件等 顯示元件以及觸摸面板。 另外，本說明書中所述的“噴出喷嘴式塗布法，，是指 藉由喷嘴，對被塗物喷出該矽氧烷聚合物組成物，進行 塗布的方法；可以列舉出例如使用具有多個喷嘴孔並列 狀配列的喷出口的喷嘴’塗布該矽氧烷聚合物組成物的 方法，使用具有狹縫狀喷出口的喷嘴，塗布該矽氧燒聚 合組成物的方法等；是包括在基板上塗布該矽氧烷聚合 物組成物後，旋轉基板、調節膜厚的操作的概念。另外， 本說明書中所述的“感放射線性樹脂組成物，，的“放射線，， 是包含可見光、紫外線、遠紫外線、χ光、帶電粒子束 等的概念。 -10- 201213445 如上說明所述，本發明提供沒有塗布不均、外觀優 異，而且可以實現高度平整性（膜厚均勻性）和高速塗 布，且可以形成透明性、耐擦傷性優異，可作為保嘐膜 和層間絕緣膜的硬化膜的妙氧燒聚合物纟且成物。咳砍氧 烷聚合物組成物為了達到高速塗布性等效果，適合使用 喷出噴嘴式塗布法等。另外，由該矽氡烷聚合物組成物 形成的硬化膜由於具有優異的透明性、耐擦傷性，所以 不僅可以在顯示it件中使用’而且還適合作為觸摸面板 用保護膜、層間絕緣膜等’在成本方面也就是有利的。 【實施方式】 </5夕乳院聚合物組成物> 本發明的矽氧烷聚合物組成物包含[Α]矽氧烷聚合 物、[Β]自由基聚合引發劑和[c]有機溶劑。另外，作為 適合成分’可以含有[D]界面活性劑、乙烯基不飽和 化s物、[F ]酸產生劑或驗產生劑。此外，在不損宝本發 明效果的範圍内，可以含有其他任意成分。以下，對各 成分進行詳細摇述。 <[Α]矽氧烷聚合物> §亥矽氧烷聚合物組成物含有的[Α]矽氧烧聚合物，只 要是在具有矽氧烷鍵的化合物的聚合物的主鏈或側鍵上 具有自由基反應性官能團的聚合物，就沒有特別的限 疋[Α]碎氧烧聚合物由於具有自由基反應性官能團，所 以可以藉由自由基聚合硬化，可以將硬化收縮抑制到最 低限度。 -11- 201213445 作為自由基反應性官 s此團’可以列舉出例如乙烯 基、α-甲基乙烯基、丙嫌航# 烯甲基丙烯醯基、苯乙烯 基#不飽和有機基團。此 專之中，從順利地進行硬化反 應出發，可以較佳為具有 ^ ’兩烯醯基或甲基丙烯酿.基〇 [Α]石夕魏聚合物是水解性Μ化合物的水解縮合 物，上述水解性石夕烧化合物較佳為至少是（ai)上述式 所示的水解性矽烧化合板 和（a 2)上述式（2)所示的水解性 石夕院化合物的水解縮合物。 本說明書中所述的“水解性石夕烷化合物，，通常是指且 有可以在無催化劑、過量的水的共存下，藉由在室溫(約 25C)〜約1GGt的溫度範圍内加熱，水解生成我醇基的 基團’或者具有可以形成矽氧烷縮合物的基團的化合 物。在上述式⑴和⑺所示的水解性⑦院化合物的水解反 應中，·生成的矽氧烷聚合物中一部分水解性基團可以以 未水解的狀態殘留。此處所述的“水解性基團，，是指可進 行上述水解生成矽烷醇基的基團或者可形成矽氧烷縮合 物的基團。另外，該矽氧烷聚合物組成物中，一 解]生矽烷化合物可以是該分子中的一部分或全部的水解 性基團以未水解的狀態，且未和其他水解性矽烷化合物 縮合’以單體的狀態殘留。另外，“水解縮合物，，是指水 解的石夕烷化合物的一部分的矽烷醇基之間縮合形成的水 解縮合物。以下，對（al)化合物和（a2)化合物進行詳細描 述0 201213445 [(al)化合 上述 有自由基 其中，R1 作為 基、乙基 於水解的 行水解縮 作為 舉出藉由 原子形成 烧基、碳 院基等。 立。另外 種有機基 作為 三曱氧基 矽烷、鄰 矽烷、間 矽烷、對 矽烷、烯 基丙烯酿 矽烷、甲 氧基硬燒 氧基矽烷 反應性官能團的有機基團。p是几土。R 和R2為多個時’多個R1和R2各 石反原子數為1〜6的院臭， 、正丙基、異丙基 觀點出發 具有自由基反應性官能團的有機基 上述自由基反應性官能團，取代 物] 式（1)中’ R1是碳原子數為1〜6 5的整 獨立, 以列舉出例 基等。它們之中 較佳為甲基、乙基。作為， 合反應的觀點出發，較佳為1或2 ,，’、、 p， ’更佳.The oxime-fired polymerization % M surfactant or organic sapphire interface: contains a clearing agent (hereinafter referred to as "[D] interface activity: two or more kinds of interface activity amount relative to coffee mass parts) (4) ^), (9) The content of the surfactant is more than 2 parts by mass. The T compound is preferably 〇. 〇1 --step contains a specific [D] surfactant oxygen; the polymer composition is slippery. 'Therefore, it can be further mentioned that the film thickness of the interlayer insulating film formed by the surface of the coating film is ΓΓ1 ΓΓ, so that the content of the [D] surfactant in the above range can further improve the surface smoothness of the coating film. . The siloxane polymer composition preferably further contains an ethylenically unsaturated compound other than the [EUA] oxy-oxygenated polymer (hereinafter also referred to as [E] ethylenically unsaturated compound"). The polymer composition can further improve the scratch resistance and transparency of the cured film formed of the composition of the oxy-oxygenated polymer by further containing [E]vinyl (tetra) and a compound. It is preferable to further contain a [F] sensitizing radioactive acid generator or a sensitizing radioactive base generator (hereinafter also referred to as "[F] acid generator or base generator. The siloxane polymer composition is contained by [F] Acid generator or test agent' polymerizability is higher, and a cured film excellent in scratch resistance and the like can be obtained. The oxime polymer composition can form a cured film excellent in transparency and scratch resistance. 'Therefore, it is suitable as a material for forming a cured film of a protective film or an interlayer insulating film for a display element or a touch panel. The present invention is also suitable for a cured film formed using the composition of the oxalate polymer. -9 - 201213445 this The method for forming the cured film includes: (1) applying a composition of β 亥 夕 夕 烧 在 在 在 在 在 在 在 在 在 θ θ θ θ θ θ θ θ θ θ θ θ θ θ θ θ θ θ (2) at least a part of the coating film, a step of emitting radiation, (3) a step of developing the coating film irradiated with the radiation, and (4) heating the film to be developed. At the same time as the idling coating, the oxaxy oxyalkylene polymer may be composed of a cloth method, or may be easily formed by using sensitizing radiation, and may be formed in the forming method, and the film thickness uniformity may be formed. Therefore, it is excellent in the film of the cured film. Therefore, even if the coating is not applied by the spray nozzle type, the coating is applied at a high speed. Further, the film is formed by exposure, development, and heating, and a fine and delicate pattern of the cured film is formed. Pulling & upper 1 is the cured film of the protective film and the interlayer insulating film thus formed, and is not coated with τ 仏 θ ^ ^, which is uneven in epitaxy, has high flatness, and is suitable for use in liquid crystal display elements and organic EL display elements. The "display nozzle coating method" as used in the present specification refers to a method in which the helium oxide polymer composition is sprayed onto the object to be coated by a nozzle; For example, a method of applying the siloxane polymer composition using a nozzle having a plurality of nozzle holes arranged in parallel, and using a nozzle having a slit-shaped discharge port, a method of coating the oxime-fired polymer composition The concept of the operation of rotating the substrate and adjusting the film thickness after coating the composition of the siloxane polymer on the substrate. In addition, the "radiation-sensitive resin composition described in the present specification", "radiation, It is a concept including visible light, ultraviolet ray, far ultraviolet ray, strontium light, charged particle beam, etc. -10- 201213445 As described above, the present invention provides no uneven coating, excellent appearance, and high flatness (even film thickness) And high-speed coating, and can form excellent transparency and scratch resistance, and can be used as a hardening film for the protective film and the interlayer insulating film. The compound is formed into a substance. In order to achieve high-speed coating properties and the like, the cough oxyalkylene polymer composition is preferably a spray nozzle coating method or the like. In addition, since the cured film formed of the decane polymer composition has excellent transparency and scratch resistance, it can be used not only as a display member but also as a protective film for a touch panel, an interlayer insulating film, or the like. 'It is also beneficial in terms of cost. [Embodiment] </5 eve dairy polymer composition> The oxirane polymer composition of the present invention comprises [Α] siloxane polymer, [Β] radical polymerization initiator, and [c] organic Solvent. Further, as a suitable component, a [D] surfactant, a vinyl-unsaturated substance, a [F] acid generator or an assay agent may be contained. Further, other optional components may be contained within the range not impairing the effects of the invention. Hereinafter, each component is described in detail. <[Α]methoxyalkane polymer> The [Α] oxy-fired polymer contained in the polymer composition of § 矽 矽 ,, as long as it is the main chain or side of the polymer of the compound having a siloxane coupling There is no particular limitation on the polymer having a radical reactive functional group on the bond. Since the oxy-fired polymer has a radical reactive functional group, it can be hardened by radical polymerization to suppress the hardening shrinkage to a minimum. limit. -11-201213445 As the radical reactive member, such a group is exemplified by a vinyl group, an α-methylvinyl group, a propylene group, a methacryloyl group, and a styryl group. In this specialization, from the smooth progress of the hardening reaction, it is preferred to have a hydrolyzed condensate of a hydrolyzable hydrazine compound. The hydrolyzable zephyr compound is preferably a hydrolyzed condensate of at least (a) a hydrolyzable sinter-fired slab shown in the above formula and (a 2) a hydrolyzable shoal compound represented by the above formula (2). The "hydrolyzable alkane compound" described in the present specification generally means that it can be heated in a temperature range of from room temperature (about 25 C) to about 1 GSt in the coexistence of no catalyst and excess water. a group which hydrolyzes to form a group of the alcohol group or a group which can form a group of the oxime condensate. In the hydrolysis reaction of the compound of the hydrolyzable 7th compound represented by the above formulas (1) and (7), the produced siloxane is polymerized. A part of the hydrolyzable group may remain in an unhydrolyzed state. The "hydrolyzable group" as used herein means a group which can carry out the above hydrolysis to form a stanol group or a group which can form a siloxane condensate. group. Further, in the siloxane polymer composition, the sulfolane compound may be a part or all of the hydrolyzable group in the molecule in an unhydrolyzed state, and is not condensed with other hydrolyzable decane compound. The state of the body remains. Further, the "hydrolyzed condensate" means a hydrolysis condensate formed by condensation of a sulfanol group of a part of the hydrolyzed oxalate compound. Hereinafter, the (al) compound and the (a2) compound are described in detail 0 201213445 [( Al) In combination with the above-mentioned radicals, R1 is used as a group, and ethyl group is hydrolyzed by hydrolysis. The alkyl group is formed by an atom, a carbon-based group, etc. The other organic group is used as a trimethoxy decane or o-decane. , m-decane, p-decane, alkenyl propylene decane, methoxy hard oxy oxane reactive functional group organic group. p is several soils. When R and R2 are multiple, 'multiple R1 and R2 stone counter The above-mentioned radical reactive functional group having a radical reactive functional group and a substituted radical functional group having a atomic number of 1 to 6 is a substituent. In the formula (1), R1 is a carbon atom. The singularity of 1 to 6 5 is exemplified, and examples thereof include a methyl group and an ethyl group. From the viewpoint of the reaction, it is preferably 1 or 2, and ', p, ' Better.

團，可 個以^ V 的直鏈狀、支鏈狀或環狀的碳原子數 上 原子數為6〜12的芳基、碳原子數為^ 1〜 在同一分子記憶體在多個r2時 〜12 2 它們各 ，R表示的有機基團可以具有雜原子。 團，可以列舉出例如醚基、酯基、硫醚： P=1時的（al)化合物，可以列舉二 我、乙料三乙氧基我、乙 苯乙烯基三甲氧基矽烷、鄰笨乙烯基三乙 苯乙烯基三曱氧基矽烷、間笨乙烯基三乙 苯乙烯基三甲氧基矽烷、對苯乙烯基三乙 丙基二甲氧基矽烷、烯丙基三乙氧基矽院 氧基三甲氧基矽烷、甲基丙烯醯氧基三乙 基丙烯醯氧基三丙氧基矽烷、丙烯醯氧基 、丙烯醯氧基三乙氧基矽烷、丙烯醯氧基 、2-甲基丙烯醯氧基乙基三曱氧基矽烷、 是含 數。 如曱 從易 從進 ^ 1 〇 以列 的氫 12的 的芳 自獨 為這 等。 烯基 氧基 氧基 氧基 氧基 、曱 氧基 三甲 三丙 2-甲 -13- 201213445 基丙烯酿氧基乙基三乙氧基矽烷、2_甲基丙烯醯氧基乙 基二丙氧基矽烷' 3 -曱基丙烯醯氧基丙基三甲氧基矽 三乙氧基矽烷、3 -曱基丙烯 2-丙烯醯氧基乙基三曱氧基 乙氧基矽烷、2-丙烯醯氧基 醯氧基丙基三甲氧基矽烷、 矽烷、3 -丙烯醯氧基丙基三 氧基丙基三甲氧基矽烧、3-基矽烷、3 -甲基丙烯醯氧基 基三甲氧基矽烷、三氟丙基 甲氧基矽烷等三丁基烷氧基 物，可以列舉出例如乙稀基 曱基二乙氧基矽烷、乙烯基 苯基二乙氧基矽院、烯丙基 曱基二乙氧基矽烧、苯基三 氧基矽烷化合物。 物，可以列舉出稀丙基二曱 基乙氧基矽烷、二乙烯基曱 基乙氧基矽烷、3_曱基丙烯 烷、3 -丙烯醯氧基丙基二曱 醯氧基丙基二苯基甲氧基矽 基曱氧基矽烷、3,3’_二曱基 炫、3,3，-二丙稀醯氧基丙基 基丙烯醯氧基丙基甲氧基矽 炫*、3·甲基丙烯醯氧基丙基 酿氧基丙基三丙氧基矽烷、 石夕烧、2-丙烯醯氧基乙基三 乙基三丙氣基矽烷、3·丙烯 3 -丙烯醯氧基丙基三乙氧基 丙氧基矽烷、3-甲基丙烯醯 甲基丙烯醯氧基丙基三乙氧 丙基三丙氧基矽烷、三氟丙 二乙氧基矽烧、三氟丁基三 矽烧化合物。 作為p = 2時的（al)化合 曱基一甲氧基石夕烧、乙烯基 苯基二曱氧基矽烷、乙烯基 曱基二甲氧基石夕烧、稀丙基 氟丙基二甲氧基矽烷等二烷 作為p = 3時的（a 1)化合 基甲氧基矽烷、烯丙基二甲 基曱氧基矽烷、二乙烯基甲 醯氧基丙基二甲基曱氧基矽 基甲氧基矽烷、3-曱基丙烯 烷、3 -丙烯醯氧基丙基二苯 丙烯醯氧基丙基二曱氧基矽 二甲氧基矽烷、3,3’，3’’-三曱 -14- 201213445 烷、3,3’，3，，-三丙烯醯氣基丙基甲氧基矽烷、 氟丙基）甲氧基石夕烧等單燒氧基石夕烧化合物。 运些(al)化合物中，從可以實現 等’同時縮合反應性變高出發，較佳為：：：：：：; 矽烷、對苯乙烯基三乙氧 邱土一甲氧基 基=甲氧美石夕r l 甲基丙稀醯氧基丙 —甲氧基石夕说、3_内烯醯氧基丙基三甲 甲基丙烯醯氧基丙基三乙氧基矽烷、3丙说 三乙氧基矽烷。 3·丙烯醯氧基丙基 [(a2)化合物] 上述式(2)中，R3是碳原子數為卜6的 原子、碳原子數為1〜20的烷基、碳原子數；γ疋虱 代烧基、苯基、蔡基、環氧基、胺基或：為…氣 疋0〜20的整數。q是〇〜3的整數。其氰3酸酯基。n 個時，多個R3和R4各自獨立。 ” ，R3和R4為多 作為上述碳原子數為1〜6的烧基 甲基、乙基、正丙基、異丙基、丁 歹舉出例如 易於水解的觀點來看，較佳為甲基：乙其此等之中’從 進行水解縮合反應的觀點來看，較佳為作為q，從 作為上述碳原子數為N20的烷基，-2’更佳為卜 甲基、乙基、正丙基、 "可u列舉出例如 三丁基、正戊基、3-甲二Λ、Γ基、第二丁基、第 τ %丁基、2 -曱基丁波 U二甲基丙基、正己基、心甲基戊基甲基丁基、 甲基戊基、甲基戊基、3,3二甲基；甲基戊基、2- 基、i，3-二甲基丁基、2,2•二甲基丁土基二、2,3-二甲基丁 二甲基丁基、1}1_二甲基 /二甲基丁基、 正庚基、％曱基己基、 -15- 201213445 4-甲基己基、3-甲基己基、2-曱基己基、K甲 τ基己基、4,4- 二曱基戊基、3,4 -二甲基戊基、2,4 -二甲基戊茂 甲基戊基、3,3-二曱基戊基、2,3_二曱基戊基、n’二甲 基戊基、2,2-二曱基戊基、l，2-二曱基戊基、丨，卜二甲美 戊基、2,3,3-三甲基丁基、l，3,3-三曱基丁基、三甲 基丁基、正辛基、6-曱基庚基、5_曱基庚基、4_曱基庚美、 3-曱基庚基、2-曱基庚基、1-甲基庚基' 2_乙基己美、正 壬基、正癸基、正十一烷基、正十二烷基、 I Τ二院基、 正十四烷基、正十五烷基、正十六烷基、正十七烷美、 正十八烷基、正十九烷基等。較佳為碳原 土 J双馬1〜1 0的 烧基，更佳為碳原子數為1〜3的烧基。 作為q = 0時的(a2)化合物’例如’作為被4個水解 性基團取代的矽烷化合物，可以列舉出四甲氧美矽疒 四乙氧基石夕烧、四丁氧基石夕貌、四正丙氧基錢、：里 丙氧基矽烷等。 作為q=i時的（a2)化合物，作為被—個非水解性基 團和3個水解性基團取代的矽烷化合物可以列舉出甲 基三甲氧基Μ、甲基三乙氧基钱、甲基三異丙氧基 石夕烧、甲基三丁氧基石夕烧、乙基三甲氣基石夕烧乙基三 乙氧基石夕烧、乙基三異丙氧基石夕烧、乙基三丁氧基石夕烧、 丁基二甲氧基矽烷、苯基三甲氧基矽烷'萘基三甲氧基 石夕烧、苯基三乙氧基石夕炫、萘基三乙氣基石夕烧、胺基三 甲氧基石夕院、胺基三乙氧基钱、2_(3,4_環氧環己基）乙 基二曱氧基、γ_縮水甘油氧基丙基三甲氧基碎烧、[異 氰基丙基三"基石夕烧、3'異氰基丙基三乙氧基石夕院等。 -16- 201213445 作為q = 2時的（a2)化合物，作為被兩個非水解性基 團和兩個水解性基團取代的矽烷化合物，可以列舉出二 曱基二甲氧基矽烷、二苯基二甲氧基矽烷、二丁基二甲 氧基矽燒等。 作為q = 3時的（a2)化合物，例如，作為被3個非水 解性基團和一個水解性基團取代的石夕烧化合物，可以列 舉出三甲基甲氧基矽烷、三苯基甲氧基矽烷 '三丁基甲 氧基矽烧等。 這些（a2)化合物中，較佳為被4個水解性基團取代 的矽烷化合物、被一個非水解性基圑和3個水解性基團 取代的矽烷化合物，更佳為被一個非水解性基團和3個 水解性基團取代的矽烷化合物。作為特佳的水解性矽烷 化合物，可以列舉出四乙氧基矽烷、甲基三曱氧基矽烷、 甲基三乙氧基矽烷、曱基三異丙氧基矽烷、曱基三丁氧 基矽烷、苯基三甲氧基矽烷、乙基三曱氧基矽烷、乙基 三乙氧基矽烷、乙基三異丙氧基矽烷、乙基三丁氧基〇 烷、丁基三曱氧基矽烷、γ•縮水甘油氧基丙基三曱：基 石夕院、萘基三甲氧基石夕院、γ _胺基丙基三甲氧基石夕烧和二 異處基丙基三甲氧基戟。這種加水分解性石夕貌化 合物可以單獨或組合兩種以上使用。 上述⑻化合物和(a2)化合物的混合比希望是 合物超過5莫耳％。⑻化合物4 5莫耳％以下 ^匕膜時的曝Μ敏度低’進而有可能降低得硬成 膜的耐擦傷性等。 更化 -1 7- 201213445 作為使上述（a 1)化合物和（a2)化合物水解输合的條 件’只要是（a 1)化合物和（a2)化合物的至少一部分水解 水解性基團轉變為矽烷醇基，產生縮合反應，就沒有 別的限定，舉出一個例子，如下進行。 ’ 作為用於水解縮合反應的水，較佳為藉 處理、雜；一 44 + 欠〜透膜 处理離子父換處理、蒸館等方法精製 這種精製水，可以楠去,， 错由使用 為水的用量，相對於}副反應’提南水解的反應性。作 性基團…莫Γ，1)化合物和⑷)化合物的水解 莫耳〜2莫耳，特：：佳為0·1莫耳〜3莫耳’更佳為。.3 量的水，可以使水G·5莫耳〜1,5莫耳°藉由使用這種 .,Λ 解縮合的反應速度最佳化。The group may have a linear, branched or cyclic aryl group having 6 to 12 carbon atoms in the number of carbon atoms, and the number of carbon atoms is 1 1~ when the same molecular memory is in a plurality of r2 ～12 2 Each of them, the organic group represented by R may have a hetero atom. The group may, for example, be an ether group, an ester group or a thioether: (al) compound when P = 1, and may be exemplified by two, ethylene, triethoxy, ethyryltrimethoxydecane, ortho-vinyl Tris-ethylstyryl trimethoxy decane, m-styrene triethylstyryl trimethoxy decane, p-styryl triethyl propyl dimethoxy decane, allyl triethoxy oxime Trimethoxy decane, methacryl oxime triethyl propylene methoxy tripropoxy decane, propylene decyloxy, propylene decyloxy triethoxy decane, propylene decyloxy, 2-methyl propylene Alkoxyethyltrimethoxy decane is a number. Such as the 曱 from the easy to enter ^ 1 〇 list of hydrogen 12 of the singularity for this. Alkenyloxyoxyoxyoxy, decyloxytrimethyltripropene 2-methyl-13- 201213445 based propylene oxyethyl triethoxy decane, 2-methyl propylene oxiranyl ethyl dipropoxy矽 ' ' 3 -mercapto propylene methoxy propyl trimethoxy sulfonium triethoxy decane, 3-mercapto propylene 2-propenyl methoxyethyl trimethoxy ethoxy decane, 2-propene oxime Hydroxypropyltrimethoxydecane, decane, 3-propenyloxypropyltrioxypropyltrimethoxysulfonium, 3-terpene, 3-methylpropenyloxytrimethoxydecane Examples of the tributylalkoxy group such as trifluoropropyl methoxydecane include, for example, ethylene thiol diethoxy decane, vinyl phenyl diethoxy fluorene, and allyl fluorenyl Ethoxy oxime, phenyl trioxydecane compound. The substance may, for example, be a dipropyl decyl ethoxy decane, a divinyl decyl ethoxy decane, a 3-decyl propylene alkane, a 3- propylene methoxy propyl di methoxy propyl dibenzene. Methoxymethoxydecyloxydecane, 3,3'-dimercaptoxyl, 3,3,-dipropylene methoxypropyl propylene methoxypropyl methoxy oxime *, 3· Methyl propylene methoxy propyl oxypropyl tripropoxy decane, Shi Xi burning, 2-propenyl methoxyethyl triethyl propylene decyl, 3 propylene 3 - propylene oxy propylene Triethoxy methoxy decane, 3-methyl propylene hydrazine methacryloxypropyl triethoxy propyl tripropoxy decane, trifluoropropane diethoxy oxime, trifluorobutyl three Strontium compound. As the (al) compound (1), p- 2, methoxy-methoxy methoxy sulfonium, vinyl phenyl dimethoxy decane, vinyl fluorenyl dimethoxy oxalate, propyl propyl propyl dimethoxy Dioxane such as decane as (a 1) compound methoxy decane, allyl dimethyl decyl decane, divinyl methoxy dimethyl methoxy fluorenyl group at p = 3 Oxaloxane, 3-mercaptopropene, 3-propenyloxypropyldiphenylpropenyloxypropyldimethoxyoxydimethoxydecane, 3,3',3''-triterpene- 14-201213445 Alkoxide, 3,3',3,,-tripropylene fluorenyl propyl methoxy decane, fluoropropyl) methoxy sulphur, etc. Among these (al) compounds, from the viewpoint that the simultaneous condensation reactivity can be improved, it is preferably: :::::; decane, p-styryl triethoxy qi-methoxyl = methoxy美石夕 rl methyl propyl decyloxy propyl methoxy methoxy eve, 3 _ ene methoxy propyl trimethyl methacryl methoxy propyl triethoxy decane, 3 propyl triethoxy Decane. 3. Acryloxypropyl [(a2) compound] In the above formula (2), R3 is an atom having a carbon number of 6 and an alkyl group having 1 to 20 carbon atoms; An alkyl group, a phenyl group, a phenyl group, an epoxy group, an amine group or an integer of 0 to 20. q is an integer of 〇~3. Its cyanate ester group. When n, multiple R3 and R4 are independent of each other. Further, R3 and R4 are preferably a methyl group, an ethyl group, a n-propyl group, an isopropyl group or a butyl group having 1 to 6 carbon atoms, and a methyl group is preferably hydrolyzed, for example, from the viewpoint of easy hydrolysis. In the above, from the viewpoint of carrying out the hydrolysis condensation reaction, it is preferably q, from the alkyl group having the above carbon number of N20, and more preferably -2' is a methyl group, an ethyl group or a n-propyl group. And " can be enumerated, for example, tributyl, n-pentyl, 3-methyldifluorene, fluorenyl, t-butyl, t-th butyl, 2-mercapto-butyrate U-dimethylpropyl, hexyl Methyl pentylmethylbutyl, methylpentyl, methylpentyl, 3,3 dimethyl; methylpentyl, 2-yl, i,3-dimethylbutyl, 2, 2• dimethylbutanyl di-, 2,3-dimethylbutydimethylbutyl, 1}1-dimethyl/dimethylbutyl, n-heptyl, % mercaptohexyl, -15- 201213445 4-methylhexyl, 3-methylhexyl, 2-decylhexyl, K-methyl-t-hexyl, 4,4-dimercaptopentyl, 3,4-dimethylpentyl, 2,4-di Methylpentylmethylpentyl, 3,3-didecylpentyl, 2,3-didecylpentyl, n'dimethylpentyl, 2,2-di Pentyl, 1,2-didecylpentyl, anthracene, bismethylpentamyl, 2,3,3-trimethylbutyl, 1,3,3-tridecylbutyl, trimethyl Butyl, n-octyl, 6-fluorenylheptyl, 5-fluorenylheptyl, 4-fluorenylglycol, 3-decylheptyl, 2-decylheptyl, 1-methylheptyl' 2 _ethylhexyl, n-decyl, n-decyl, n-undecyl, n-dodecyl, I oxime, n-tetradecyl, n-pentadecyl, n-hexadecyl, N-heptadecane, n-octadecyl, n-nonadecyl, etc., preferably a carbon-based soil J-single 1 to 10, preferably a non-alkyl group having 1 to 3 carbon atoms. The (a2) compound 'for example, when q = 0, is a tetradecyl compound substituted with four hydrolyzable groups, and examples thereof include tetramethoxine tetraethoxy zephyr, tetrabutoxylate, and tetra In the case of the (a2) compound in the case of q=i, the decane compound substituted with one non-hydrolyzable group and three hydrolyzable groups may be exemplified by a methyl group. Trimethoxy oxime, methyl triethoxy ketone, methyl triisopropoxy zebra, methyl tripentin Base stone kiln, ethyl trimethyl sulphate, ethyl triethoxy sulphur, ethyl triisopropoxy sulphate, ethyl tributoxy sulphide, butyl dimethoxy decane, phenyl trimethyl Oxydecane 'naphthyltrimethoxy sulphur, phenyl triethoxy sulphur, naphthyl triethyl sulphate, amine trimethoxy sylvestre, amine triethoxy hydroxy, 2 _ (3, 4_epoxycyclohexyl)ethyldimethoxy, γ-glycidoxypropyltrimethoxycalcaze, [isocyanopropyl three" basestone, 3'-isocyanopropyltriethyl Oxygen stone court, etc. -16- 201213445 As the compound (a2) at q = 2, as a decane compound substituted with two non-hydrolyzable groups and two hydrolyzable groups, dimercaptodimethyl dimethyl Oxydecane, diphenyldimethoxydecane, dibutyldimethoxysulfonium, and the like. As the compound (a2) in the case of q = 3, for example, as a compound of the ceramsite substituted by three non-hydrolyzable groups and one hydrolyzable group, trimethylmethoxydecane, triphenylmethyl Oxydecane 'tributyl methoxy oxime or the like. Among these (a2) compounds, a decane compound substituted with four hydrolyzable groups, a decane compound substituted with one non-hydrolyzable group and three hydrolyzable groups, and more preferably a non-hydrolyzable group are preferred. a decane compound substituted with a group and three hydrolyzable groups. Preferred examples of the hydrolyzable decane compound include tetraethoxy decane, methyl trimethoxy decane, methyl triethoxy decane, decyl triisopropoxy decane, and decyl tributoxy decane. , phenyl trimethoxy decane, ethyl tridecyl decane, ethyl triethoxy decane, ethyl triisopropoxy decane, ethyl tributoxy decane, butyl tridecyl decane, γ•glycidoxypropyl triterpene: keishi Xiyuan, naphthyltrimethoxy sylvestre, γ-aminopropyltrimethoxy sulphide and diisopropylpropyltrimethoxy fluorene. Such a hydrolyzable zeolitic compound can be used singly or in combination of two or more. The mixing ratio of the above compound (8) and the compound (a2) is desirably more than 5 mol%. (8) The compound 4 is 5 mol% or less. The exposure sensitivity at the time of the ruthenium film is low, and the scratch resistance of the hard film may be lowered. Further -1 7 to 201213445 as a condition for hydrolyzing and transferring the above (a1) compound and (a2) compound, as long as at least a part of the hydrolyzable group of the (a1) compound and the (a2) compound is converted into a stanol The radical reaction is produced without any limitation, and an example is given as follows. 'As the water used for the hydrolysis condensation reaction, it is preferred to use a treatment such as treatment and miscellaneation; a 44 + owing ~ membrane treatment ion father treatment, steaming, etc. to refine the refined water, which can be used, The amount of water used is relative to the reactivity of the side reaction 'Tinan hydrolysis. Working groups... Mo), 1) hydrolysis of the compound and (4)) compound Moer ~ 2 Mo, special:: preferably 0. 1 Moer ~ 3 Mo's better. .3 The amount of water can be such that the water G·5 moles to 1,5 moles is optimized by using this.

作為用於水解始X 醚類、二醇醚、 &的溶劑，可以列舉出例如醇類、 醇烧基鍵乙酸醋、二甘隨| jc 丙二醇單烷基醚、& 甘知烷基醚、 基醚丙酸酿、芳^二醇單烷基醚乙酸酿、丙二醇單烷 以單獨或將兩種二酮類、其他㈣等。這些溶劑可 ^ 上〜起使用。 作為醇類，可 2-笨乙醇、…乂列舉出例如甲醇、乙醇、笨甲醇、 扣本基而醇等。 作為峻類可ιν 列舉出例如四氫呋喃等。 作為二醇醚， 二醇單乙基喊等。卩列舉出例如乙二醇單甲基喊、乙 作為乙二醇烷 纖素乙酸錯、乙美ΐ 酸醋’可以列舉出例如甲基溶 西旨、7 1 土 '么纖素乙酸酯、乙二醇單丁美7 乙二醇單乙基 平丁基醚乙酸 悉岐己酸酯等。 -18- 201213445 作為二甘醇烷基醚，可以列舉出例如二甘醇單曱基 醚、二甘醇單乙基醚、二甘醇二甲基醚、二甘醇二乙基 醚、二甘醇乙基曱基醚等。 作為丙二醇單烷基醚，可以列舉出例如丙二醇單曱 基醚、丙二醇單乙基醚、丙二醇單丙基醚、丙二醇單丁 基醚等。 作為丙二醇單烷基醚乙酸酯，可以列舉出例如丙二 醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單 丙基醚乙酸酯、丙二醇單丁基醚乙酸酯等。 作為丙二醇單烷基醚丙酸酯，可以列舉出例如丙二 醇單甲基醚丙酸酯、丙二醇單乙基醚丙酸酯、丙二醇單 丙基醚丙酸酯、丙二醇單丁基醚丙酸酯等。 . 作為芳香族烴類，可以列舉出例如曱苯、二曱苯等。Examples of the solvent for hydrolyzing the starting X ethers, the glycol ethers, and the & alcohols, alcoholic carboxylic acid vinegar, digans with | jc propylene glycol monoalkyl ether, & , ether ether propionic acid brewing, aryl glycol monoalkyl ether acetic acid brewing, propylene glycol monoalkane alone or two diketones, other (four) and the like. These solvents can be used up and down. Examples of the alcohols include 2-hydroxyethanol, and the like, and examples thereof include methanol, ethanol, stupid methanol, and a solvent-based alcohol. For example, tetrahydrofuran or the like can be enumerated as a class. As a glycol ether, a diol monoethyl group or the like. For example, exemplified by ethylene glycol monomethyl ketone, B as ethylene glycol alkane cellulose acetate acetate, and acetaminophen vinegar, for example, methyl methacrylate, 71 soil auxin acetate, Ethylene glycol monobutylene 7 ethylene glycol monoethyl butyl butyl ether acetic acid hexanoate. -18- 201213445 As the diethylene glycol alkyl ether, for example, diethylene glycol monodecyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, digan Alcohol ethyl decyl ether and the like. The propylene glycol monoalkyl ether may, for example, be propylene glycol monodecyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether or propylene glycol monobutyl ether. Examples of the propylene glycol monoalkyl ether acetate include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, and the like. . Examples of the propylene glycol monoalkyl ether propionate include propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether propionate, propylene glycol monopropyl ether propionate, propylene glycol monobutyl ether propionate, and the like. . Examples of the aromatic hydrocarbons include toluene, diphenylbenzene, and the like.

I 作為酮類，可以列舉出例如曱乙酮、環己酮、4 -羥 基-4-曱基-2-戊酮等。 作為其他酯類，可以列舉出例如乙酸甲酯、乙酸乙 酯、乙酸丙酯、乙酸丁酯、2-羥基丙酸乙酯、2-羥基-2-曱基丙酸曱酯、2-羥基-2-甲基丙酸乙酯、羥基乙酸甲酯、 羥基乙酸乙酯、羥基乙酸丁酯、乳酸曱酯、乳酸乙酯、 乳酸丙酯、乳酸丁酯、3 -羥基丙酸曱酯、3 -羥基丙酸乙 酯、3-羥基丙酸丙酯、3-羥基丙酸丁酯、2-羥基-3-甲基 丁酸曱酯、甲氧基乙酸曱酯、曱氧基乙酸乙酯、曱氧基 乙酸丙酯、曱氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基 乙酸乙酯、乙氧基乙酸丙酯、乙氧基乙酸丁酯、丙氧基 乙酸甲酯、丙氧基乙酸乙酯、丙氧基乙酸丙酯、丙氧基 -19- 201213445 乙酸丁酷、丁氧基乙酸曱酯、丁氧基乙酸乙酯、丁氧基 乙酸丙s旨、丁氧基乙酸丁酯、2 _曱氧基丙酸甲酯、2 •甲 氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-曱氧基丙酸丁酯、 2- 乙氧基丙酸曱酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸丙 8曰、2 -乙氧基丙酸丁酯、2_ 丁氧基丙酸甲酯、2_ 丁氧基丙 酸乙_、2 - 丁氧基丙酸丙酯、2 _ 丁氧基丙酸丁酯、3 _甲氧 基丙酸甲酯、3 -甲氧基丙酸乙酯、3-曱氧基丙酸丙酯、 3- 甲氧基丙酸丁酯、3_乙氧基丙酸曱酯、3_乙氧基丙酸乙 西曰、3 -乙氧基丙酸丙酯' 3 _乙氧基丙酸丁酯、3 _丙氧基丙 酸甲醋、3-丙氧基丙酸乙酯、3_丙氧基丙酸丙酯、3_丙氧 基丙酸丁酯、3 -丁氧基丙酸曱酯、3 -丁氧基丙酸乙酯、 3 -丁氧基丙酸丙酯、3_ 丁氧基丙酸丁酯等。 在這些溶劑中’較佳為乙二醇烷基醚乙酸酯、二甘 醇烧基喊、丙二醇單烧基醚、丙二醇單炫基醚乙酸酯、 甲氧基乙酸丁酯’特佳為二甘醇二曱基醚、二甘醇乙基 甲基醚、丙一醇單曱基喊乙酸酯、丙二醇單甲基醚、甲 氡基乙酸丁酯。 ,水解縮合反應較佳在酸催化劑（例如，鹽酸、硫酸、 :·久曱@文、草酸、乙酸、三氟乙酸、三氟甲磺酸、磷 士馱丨生離子父換樹脂、各種路易士酸等）、鹼催化劑（例 胺、-級胺、二級胺、三級胺、。比。定等含氮化合物； ::離子交換樹脂；氯氧化納等氣氧化物；碳酸钟等碳 :二乙酸納等幾醆鹽；各種路易士驗)或者炫氧化物(例 燒乳化錯、貌氧化鈦、炫氧化銘)等催化劑的存在下 仃。例如，作為院氧化紹可以使用三異丙氧基紹。作 -20- 201213445 =催化劑的用量，從促進水解縮合反應的觀點來看，相 對於1莫耳水解性石夕烧化合物的單體，較佳為0.2莫耳 以下，更佳為〇.〇〇〇〇]〜〇」莫耳。 水解縮合中的反應溫度和反應時間可以適當設定， 車父佳為4 0 C〜2 0 0 °C，更佳為5 〇 Τ' 1 s η 為5〇C〜15〇t。反應時間較佳 為30分鐘〜24小時，更祛亙μ 、全括c也、 更佳為1小時〜1 2小時。藉由選取 这種反應溫度和反應時間，可以右辞从、&amp;/ ^丄 Π Χ以有效地進行水解、縮合 反應。在§亥水解縮合中，可以力巧施么^ J以在反應糸統内一次性添加 ::性…合物、水和催化劑，進行單步驟反應；或 可以分幾次在反應系統内添加水解性錢化合物、 :“口催化劑，進行多步驟的水解和縮合反應。另外，水 解縮合反應後，加人脫水劑，接著藉由蒸發從反應系 統除去水和生成的醇。該階段中使用的脫水劑，一般由 於吸附或包合過量的水’脫水能完全 發除去。 4者精由热 上述水解縮合物的GPCV;隸腴、姿、* &amp; . (凝骖滲透邑譜法）得到的聚 本乙烯換算的重量平均分子量 ._ 里（以下，也稱作“Mw”）較佳 為500〜5,000，更佳為1〇〇〇〜3 ,、，， ，υ 错由使Mw為500 上，:以改善該石夕氧烧聚合物組成物的成膜性。另一 方面’藉由使Mw為5,0〇〇以下，可以陆L ^ 物組成物的顯影性降低。 了乂防止铺聚合 上述水解縮合物的由GPC得到的¥7 ^ , 旦正a ^ 2 θ , 仔主』的來本乙烯換算的數 里千均分子篁（以下，也稱作“Mn”）較佳為MM，·，更 佳為500〜1，200。藉由使[A]矽氧院人 μ 孔凡眾σ物的Μη在上述 靶圍内，可以提高該矽瓮桉螯人礼4上、， ,…“ μ ^夕氧烷忒合物組成物的塗膜硬化時 的硬化反應性。 -2 1 - 201213445 作為上述水解縮合物的分子量分佈“Mw/M 3 0以下，更祛i ， 平乂 1玄两 .μ 2.6以下。藉由使（al)化合物和（a2)化 δ物的水解縮合物 Mn 7 J . υ Μ τ7，丐以提高错 ilf 的硬化膜的顯影性。A右rAU々β 捉间侍到 人 3有 夕氣烷聚合物的該矽氧烷聚 S物組成物在顯影性丰 /注岬很乂屋生顯影殘留，可以容易地 形成希望的圖案形狀。 〈[Β]自由基聚合引發劑&gt; 該矽氧烷聚合物組成物由於含有[Β]自由基聚合引 發劑’可以藉由[Α]石夕氧烷聚合物的自由基聚合硬化，即 使低曝光量’也可以得到具有足夠的耐擦傷性的硬化 膜。另外’ [Β]自由基聚合引發劑較佳為感放射線性聚合 引發劑。 作為[Β]自由基聚合引發劑，可以列舉出〇-醯基肟化 合物、乙醯苯化合物、聯咪唑化合物等。這些[Β]自由基 聚合引發劑可以單獨或混合兩種以上使用。 作為Ο -醯基肟化合物，可以列舉出例如乙酮-1 - [9 -乙基- 6-(2 -甲基苯曱醯基）-9Η-咔唑-3-基]-1-(〇-乙醯基 肟）、1-[9 -乙基-6-苯曱醯基-9.H. -咔唑-3-基]-辛-1-_肟 -〇 -乙酸酯、1-[9 -乙基-6-(2-甲基苯曱醯基）-9.Η·-咔唑- 3-基]-乙-1-酮肟-0-苯曱酸酯、1-[9-正丁基-6-(2-乙基苯曱 醯基）-9. Η.-叶。坐-3 -基]-乙-1 -酮月亏_ 〇 _苯曱酸酯、乙酮 -1-[9 -乙基-6-(2 -曱基-4 -四氫呋喃基苯曱醯基）-9·Η·-咔 。坐-3 -基]_ι_(〇_乙酿基肪）、乙嗣_1_[9_乙基_6-(2 -甲基-4_ 四氫。比喃基苯甲醯基）-9.Η.-咔唑-3-基]-卜（〇-乙醯基 肟）、乙酮- l-[9 -乙基_6-(2-甲基-5 -四氫呋喃基苯甲醯 -22- 201213445 基）-9 · Η ·-咔唑-3 -基]-1 - (Ο -乙醯基肟）、乙酮-1 - [ 9 -乙基 -6-{2-曱基-4-(2,2-二甲基-1,3-二氧戊環基）曱氧基苯曱 醯基} - 9 · Η ·-咔唑-3 -基]-1 - (Ο -乙醯基肟）' 乙酮-1 - [ 9 -乙基 -6-(2 -曱基-4-四氫呋喃基曱氧基苯曱醯基）-9.Η.-咔唑-3-基]-1-(0-乙醯基肟）等。 此等之中，作為較佳的Ο -醯基肟化合物，可以列舉 出乙酮-l-[9-乙基-6-(2-曱基苯曱醯基）-9H-咔唑-3-基]-1-(0 -乙總基月亏）、乙酉同-1 -[9-乙基-6-(2-甲基-4-四鼠 呋喃基甲氧基苯曱醯基）-9.Η·-咔唑-3-基]-1-(0-乙醯基 月亏）、乙嗣-l-[9-乙基-6 - {2 -曱基-4 - (2，2 -二曱基-1，3 -二氧 戊環基）甲氧基苯甲醯基}-9·!!.-咔唑-3-基]-1-(0-乙醯基 肟）。 作為乙醯苯化合物，可以列舉出例如α-胺基酮.化合 物、α-經基酮化合物等。 作為 α-胺基酮化合物，可以列舉出例如 2-苄基-2-二甲基胺基-1-(4-咮啉代苯基）-丁 -1-酮、2-二甲基胺基 -2-(4 -曱基苄基）-1-(4-咪啉-4-基-苯基）-丁 -1-酮、2-曱基 -1-(4-曱硫基苯基）-2-咮啉丙-1-酮等。 作為 α-羥基酮化合物，可以列舉出例如 1 -苯基-2-羥基-2-曱基丙-1-酮、1-(4-異丙基苯基）-2-羥基-2-曱基丙 -1-酮、4-(2-羥基乙氧基）苯基- (2-羥基-2-丙基）酮、1-羥 基環己基苯基酮等。 此等之中，作為較佳的乙醯苯化合物，較佳為α-胺 基酮化合物，可以列舉出 2-二甲基胺基-2-(4-甲基苄 基）-1 - (4 -味。林-4 -基苯基）-丁 -1-®同、2 -甲基-1-(4-甲硫基 苯基）-2-咮啉丙-1 -酮。 -23- 201213445 作為聯咪唑化合物，可以列舉出例如2,2’-二（2-氣苯 基）-4,4’，5,5’-四（4-乙氧基羰基苯基）-1，2’-聯咪唑、2,2’-二（2 -氣苯基）-4,4’，5,5’ -四苯基-1，2’-聯咪唑、2,2’ -二 (2,4-二氯苯基）-4,4’，5,5’-四苯基-1，2’··聯咪唑、2,2’-二 (2,4,6-三氣苯基）-4,4’，5,5’-四苯基-1,2’-聯咪唑。 此等之中，作為較佳的聯咪唑化合物，可以列舉出 2,2’-二（2-氯苯基）-4,4’，5,5’-四苯基-1,2’-聯咪唑、2,2’-二（2,4-二氣苯基）-4,4’，5,5’-四苯基-1，2’-聯咪唑、2,2’-二（2,4,6-三氣苯基）-4,4’，5,5’-四苯基-1,2’-聯咪唑，更佳 為2,2’-二（2,4-二氣苯基）-4,4’，5,5’-四苯基-1，2’-聯咪唑。 作為[B]自由基聚合引發劑，在使用聯咪嗤化合物 時，為了增加其靈敏度，可以添加具有二烷基胺基的脂 肪族或芳香族化合物（以下，稱作“胺基類增感劑”）。 作為胺基類增感劑，可以列舉出例如 4,4’-二（二曱 基胺基）二苯甲酮、4,4’-二（二乙基胺基）二苯曱酮等。這 些胺基類增感劑中，較佳為4,4’-二（二乙基胺基）二苯曱 酮。這些胺基類增感劑可以單獨或混合兩種以上使用。 此外，在該矽氧烷聚合物組成物中，將聯咪唑化合 物和胺基類增感劑一起使用時，可以添加硫醇化合物作 為氫自由基供應劑。聯咪唑化合物藉由胺基類增感劑增 敏開裂，產生咪唑自由基，但僅如此操作，有可能無法 直接顯現出高的聚合引發能。但是，藉由在聯咪唑化合 物和胺基類增感劑共存的體系中，添加硫醇化合物，可 以從硫醇化合物對咪唑自由基供應氫自由基。結果是， 咪唑自由基轉變為中性的咪唑，同時產生具有聚合引發 -24- 201213445 能高的硫自由基的成分，由此，即使是低的放射性照射 量，也可以形成耐擦傷性等高的硬化膜。 作為該硫醇化合物，可以列舉出例如： 2 -疏基苯并°塞嗤、2-疏基苯并噚唑、2_酼基笨并味 吐、2-巯基-5-甲氧基苯并噻唑等芳香族硫醇化合物； 3-巯基丙酸、3-巯基丙酸曱基等脂肪族單硫醇化合 物； 新戊四醇四（疏基乙酸醋）、新戊四醇四（3_翰兵丙面Λ 酯）等2官能以上的脂肪族硫醇化合物。這些硫醇化人物 中’特佳為2-毓基笨并噻唑。 在將硫醇化合物和胺基類增感劑一起使用時，作為 胺基類增感劑的用量，相對於1 〇〇質量份聯咪。坐化合 物’較佳為0· 1質量份〜50質量份，更佳為i質量份〜2°〇 負嚴份。藉由使胺基類增感劑的用量為〇 · 1質量份5 〇 貝罝伤’可以提尚該石夕氣烧聚合物組成物曝光時的硬化 反應性，可以提高得到的硬化膜的耐擦傷性等。 另外，在將聯咪唑化合物、胺基類增感劑以及硫醇 化合物一起使用時’作為硫醇化合物的用量，相對於1 〇〇 質里份聯咪唑化合物’較佳為〇. 1質量份〜5〇質量份，更 佳為1質量份〜20質量份。藉由使硫醇化合物的用量為 〇.1質量份~50質量份’可以改善得到的硬化膜的 性等。 *傷 作為該矽氧烷聚合物組成物中的[B]自由基聚人引 發劑的用量’相對於1 00質量份[A]矽氧烷聚合物，較佳 為0.〇5質量份〜30質量份，更佳為0.1質量份〜 旦 -25- 201213445 份。藉由使[B]自由基聚合引發劑的用量為上述範圍，該 石夕氧院聚合物組成物顯示出高的放射線靈敏度，可以形 成具有更高的耐擦傷性等的硬化膜。 &lt;[C]有機溶劑&gt; 該矽氧烷聚合物組成物中’作為[C]有機溶劑，至少 含有（C1)20°C的蒸氣壓是〇 lmmHg以上不足丨_^的 有機溶劑。另外’較佳為含有（c2)2(rc的蒸氣壓是各 、2〇mmHg以下的有機溶劑。藉由使用具有特定範圍 的洛軋壓的[C]有機溶劑，即使採用喷出噴嘴式塗布法， 邊防止塗布不句，一邊高速塗布。另夕卜，蒸氣 土 ”貝疋可以使用習知的方;去，在本說明書中，是指藉 由蒸發峨體流通法)測定的值。 疋.曰錯 各播I :有機'谷劑’適合使用均勻地溶解或分散上述 各構成要素，且無法$ 種[C]有機溶劑，可; 。反應的溶劑。作為這 類、乙二醇類、乙二醇單烧基鍵 單烷基醚類、二：一醇單烷基趟類、二乙二醇 乙酸醋類、二丙'醇'醇二，鍵類、-乙二醇單烧基縫 二丙二醇單烧基早烧基秘類、二丙二醇二烧基醚類、 類、醯胺類、内㈣酸醋類、礼酸醋類、脂肪族缓酸雖 也可以混入*錄曰…酮類寺。它們可以單獨使用-種， 吧】以此σ兩種以上使用。 作為(C 1)有機溶 苯甲醇等醇類； 』舉出例如 乙二醇單甲基醚、乙二醇 ^ 醚、乙二醇單乙基醚、乙二醇單丙基 丁基轉等乙二醇單境基㈣； -26- 201213445 乙二醇二曱基醚、乙二醇二乙基醚、乙二醇二丙基 醚等乙二醇二烷基醚類； 丙二醇單乙基醚、丙二醇單丙基醚、丙二醇單丁基 醚等丙二醇單烷基醚類； 二乙二醇單曱基醚、二乙二醇單乙基醚等二乙二醇 單烷基醚類； 二乙二醇二乙基醚、二乙二醇乙基曱基醚等二乙二 醇二烷基醚類； 二乙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸 酯、二乙二醇單丙基醚乙酸酯、二乙二醇單丁基醚乙酸 酯等二乙二醇單烷基醚乙酸酯類； 二丙二醇單甲基醚、二丙二醇單乙基醚、二丙二醇 單丙基醚、二丙二醇單丁基醚等二丙二醇單烷基醚類； 二丙二醇二曱基醚、二丙二醇二乙基醚等二丙二醇 二烷基醚類； 二丙二醇單甲基醚乙酸酯、二丙二醇單乙基醚乙酸 酯、二丙二醇單丙基醚乙酸酯、二丙二醇單丁基醚乙酸 酯等二丙二醇單烷基醚乙酸酯類； 乳酸正丙基酯、乳酸異丙基酯、乳酸正丁基酯、乳 酸異丁基酯、乳酸正戊基酯、乳酸異戊基酯等乳酸酯類； 羥基乙酸乙酯、2-羥基-2-甲基丙酸乙酯、2-羥基- 3-曱基丁酸乙酯、乙氧基乙酸乙酯、3 -曱氧基丙酸乙酯、 3 -乙氧基丙酸曱酯、3 -乙氧基丙酸乙酯、3 -甲氧基丁基乙 酸酯、3-甲基-3-曱氧基丁基乙酸酯、3-甲基-3-曱氧基丁 基丙酸酯、3-曱基-3-曱氧基丁基丁酸酯、乙醯乙酸甲酯、 乙醯乙酸乙酯、丙酮酸曱酯、丙酮酸乙酯等脂肪族羧酸 酯類； -27- 201213445 N-甲基曱醯胺、Ν,Ν-二甲基曱醯胺、N-甲基乙醯胺、 Ν,Ν-二甲基乙醯胺等醯胺類； Ν -曱基吡咯啶酮、γ - 丁内酯等内酯類； 二丙基酮等酮類等。它們可以單獨使用，也可以混 合兩種以上使用。 作為（C2)有機溶劑，可以列舉出例如二乙二醇二曱 基醚、乙二醇單曱基醚乙酸酯、乙二醇單乙基醚乙酸酯、 乙二醇單丙基醚乙酸酯、乙二醇單丁基醚乙酸酯、丙二 醇單曱基醚、丙二醇單曱基醚乙酸酯、環己酮、乙酸乙 酯、乙酸丙酯、乙酸正丁酯、曱基丙基酮、甲基異丁基 酮、3 -甲氧基丙酸曱酯、乳酸曱酯、乳酸乙酯等。它們 可以單獨使用一種，也可以混合兩種以上使用。 將（C 1)有機溶劑和（C2)有機溶劑混合使用時，較佳 為下述組合： 二乙二醇乙基曱基醚/二乙二醇二甲基醚、 二乙二醇乙基曱基醚/丙二醇單曱基醚乙酸酯、 二乙二醇乙基曱基醚/丙二醇單曱基醚、 二乙二醇乙基曱基醚/環己酮、 二乙二醇二乙基醚/二乙二醇二曱基鍵、 二乙二醇二乙基醚/丙二醇單曱基醚乙酸酯、 二乙二醇二乙基醚/環己酮、 二乙二醇二乙基醚/3 -曱氧基丙酸曱基、 二乙二醇二乙基醚/曱基異丁基酮、 二乙二醇二乙基醚/乙酸正丁酯、 乙二醇單丁基醚/丙二醇單甲基醚、 -28- 201213445 乙一醇單丁基醚/二 。 丁基喊/環己酮等。 ⑭早甲基越乙酸醋、乙一酉子早 以上卜，（C1)有機溶劑或（C2)有機溶劑可以滿合兩種 u上使用，可以 ⑷ 甲美 1 +出例如二乙二醇二乙基醚/丙二醇單 甲基醚乙酸酯/環已 r軋丞丙酸甲酯.等。 :(C2)有機溶劑的含量’Examples of the ketones include, for example, anthraquinone, cyclohexanone, and 4-hydroxy-4-indolyl-2-pentanone. Examples of the other esters include methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, decyl 2-hydroxy-2-mercaptopropionate, and 2-hydroxy- Ethyl 2-methylpropionate, methyl hydroxyacetate, ethyl hydroxyacetate, butyl glycolate, decyl lactate, ethyl lactate, propyl lactate, butyl lactate, decyl 3-hydroxypropionate, 3- Ethyl hydroxypropionate, propyl 3-hydroxypropionate, butyl 3-hydroxypropionate, decyl 2-hydroxy-3-methylbutanoate, decyl methoxyacetate, ethyl decyloxyacetate, hydrazine Propyl oxyacetate, butyl oxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, propyl ethoxyacetate, butyl ethoxyacetate, methyl propoxyacetate, propoxy Ethyl acetate, propyl propyl acetate, propoxy-19-201213445 butyl acetoacetate, butyl acetoacetate, ethyl butoxylate, butoxyacetic acid, butoxyacetate Ester, methyl 2-methoxypropionate, 2 • ethyl methoxypropionate, propyl 2-methoxypropionate, butyl 2-methoxypropionate, bismuth 2-ethoxypropionate Ester, 2-ethoxypropane Ethyl ester, 2-ethoxypropionic acid propane 8 oxime, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, 2-butoxypropionic acid B-, 2-butoxypropionic acid Ester, butyl 2-propoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, 3-methoxypropanoate Ester, decyl 3-ethoxypropionate, acetaminophen 3-ethoxypropionate, propyl 3-ethoxypropanoate, butyl 3-ethoxypropionate, 3-propoxypropionic acid Methyl vinegar, ethyl 3-propoxypropionate, propyl 3-propoxypropionate, butyl 3-propoxypropionate, decyl 3-butoxypropionate, 3-butoxypropionic acid Ethyl ester, propyl 3-butoxypropionate, butyl 3-butoxypropionate, and the like. Among these solvents, 'preferably ethylene glycol alkyl ether acetate, diethylene glycol alkyl ketone, propylene glycol monoalkyl ether, propylene glycol monoether ether acetate, butyl methoxy acetate' is particularly preferred Diethylene glycol didecyl ether, diethylene glycol ethyl methyl ether, propanol monodecyl acetate, propylene glycol monomethyl ether, butyl mercaptoacetate. The hydrolysis condensation reaction is preferably carried out on an acid catalyst (for example, hydrochloric acid, sulfuric acid, :·久曱@文, oxalic acid, acetic acid, trifluoroacetic acid, trifluoromethanesulfonic acid, phosphorus samarium ion replacement resin, various Lewis Acid, etc., alkali catalyst (example amine, -amine, secondary amine, tertiary amine, ratio, nitrogen-containing compound; :: ion exchange resin; gas oxide such as sodium chloride oxide; carbon such as carbonic acid clock: In the presence of a catalyst such as sodium diacetate or a few cesium salts; various Lewis oxides or smouldering oxides (such as emulsification, titanium oxide, and oxidized oxide). For example, triisopropoxy can be used as a hospital oxide. -20-201213445 = the amount of the catalyst, from the viewpoint of promoting the hydrolysis condensation reaction, it is preferably 0.2 mol or less, more preferably 〇. 相对, relative to the monomer of the 1 mol hydrolyzable sinter compound. 〇〇]~〇" Moer. The reaction temperature and the reaction time in the hydrolysis condensation can be appropriately set, and the car father preferably has a temperature of 4 0 C to 2 0 0 ° C, more preferably 5 〇 Τ ' 1 s η is 5 〇 C 15 15 〇 t. The reaction time is preferably from 30 minutes to 24 hours, more preferably 、μ, all inclusive c, more preferably from 1 hour to 12 hours. By selecting this reaction temperature and reaction time, it is possible to liberate the hydrolysis and condensation reaction from &/amp; 丄 Π 。. In the hydration condensation of § hai, it is possible to apply a single step in the reaction system by adding: a compound, a water and a catalyst for a single-step reaction; or adding a hydrolysis in the reaction system several times. Sex money compound, "portal catalyst, multi-step hydrolysis and condensation reaction. In addition, after the hydrolysis condensation reaction, a dehydrating agent is added, followed by evaporation to remove water and the resulting alcohol from the reaction system. Dehydration used in this stage. The agent is generally completely removed by the dehydration of the adsorbed or encapsulated excess water. The GPCV of the above hydrolyzed condensate is heated by the heat, the enthalpy, the posture, the * & The ethylene-based weight average molecular weight ._ (hereinafter, also referred to as "Mw") is preferably 500 to 5,000, more preferably 1 〇〇〇 to 3, ,,, υ 由 by making Mw 500, In order to improve the film formability of the composition of the oxy-oxygenated polymer, on the other hand, by making Mw 5 Å or less, the developability of the composition of the lanthanum compound can be lowered. ¥7 ^ , denier a ^ 2 θ obtained from GPC of the above hydrolysis condensate The number of molecules per million in the ethylene conversion (hereinafter, also referred to as "Mn") is preferably MM, ·, more preferably 500 to 1,200. By [A] oxygen In the above-mentioned target circumference, the Μη of the μ 凡 凡 凡 凡 凡 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于Sex. -2 1 - 201213445 The molecular weight distribution of the above-mentioned hydrolysis condensate is "Mw/M 3 0 or less, more 祛i, 乂1 玄2.μ 2.6 or less. By (al) compound and (a2) δ Hydrolyzed condensate Mn 7 J . υ Μ τ7, 丐 to improve the developability of the hardened film of the wrong ilf. A right rAU 々 β captures the oxirane poly s composition of the human ethane alkane polymer It is easy to form a desired pattern shape in the case where the developability is high, and the desired pattern shape can be easily formed. <[Β] radical polymerization initiator> The rhodium oxide polymer composition contains [Β] radical polymerization The initiator ' can be hardened by radical polymerization of [Α] oxasulfanyl polymer, and a cured film having sufficient scratch resistance can be obtained even at a low exposure amount. In addition, the [[Β] radical polymerization initiator is more A radiation polymerization initiator is preferred. Examples of the [Β] radical polymerization initiator include an anthracene-fluorene-based compound, an acetophenone compound, a biimidazole compound, etc. These [Β] radical polymerization initiators may be used alone. Or a mixture of two or more types. For example, ethyl ketone-1 - [9-ethyl-6-(2-methylphenylhydrazino)-9Η-oxazol-3-yl]-1-(indolyl hydrazinyl), 1-[9-ethyl-6-phenylindenyl-9.H.-carbazol-3-yl]-oct-1-yl-indole-acetate, 1-[9-ethyl-6 -(2-methylphenylhydrazino)-9.Η·-carbazole-3-yl]-ethan-1-one oxime-0-benzoate, 1-[9-n-butyl-6- (2-ethylphenylhydrazino)-9. Η.-叶. Sodium-3-yl]-ethyl-1-one monthly loss _ 〇 benzoyl benzoate, ethyl ketone-1-[9-ethyl -6-(2-indolyl-4 -tetrahydrofuranylphenylhydrazone)-9·Η·-咔.Sit-3 -yl]_ι_(〇_乙酿基肥),乙嗣_1_[9_乙_6-(2-methyl-4_tetrahydro.pyridylbenzhydryl)-9.Η.-carbazol-3-yl]-b (〇-acetamido), ethyl ketone-l -[9-ethyl_6-(2-methyl-5-tetrahydrofuranylbenzimid-22-201213445 base)-9 · Η ·-carbazole-3-yl]-1 - (Ο-acetamido)肟), ethyl ketone-1 - [ 9 -ethyl-6-{2-mercapto-4-(2,2-dimethyl-1,3-dioxolanyl) decyl phenyl fluorenyl } - 9 · Η ·-carbazole-3-yl]-1 -(Ο-acetamido)' Ethylketone-1 - [ 9 -ethyl-6-(2-indolyl-4-tetrahydrofuranylhydrazine) Oxyphenyl fluorenyl -9. Η.-oxazol-3-yl]-1-(0-ethenyl fluorene), etc. Among them, as a preferred fluorene-fluorenyl hydrazine compound, ethyl ketone-l- [9-Ethyl-6-(2-mercaptobenzoyl)-9H-indazol-3-yl]-1-(0-ethyl group-based monthly loss), acetamidine-1 -[9-B Keto-6-(2-methyl-4-tetrafurfurylmethoxyphenylhydrazino)-9.Η·-carbazol-3-yl]-1-(0-ethenyl group) Ethyl-l-[9-ethyl-6 - {2-indenyl-4 -(2,2-didecyl-1,3-dioxolanyl)methoxybenzylidene}-9 ·!!.-Indazole-3-yl]-1-(0-ethylindenyl). The acetophenone compound may, for example, be an α-amino ketone compound or an α-pyridyl ketone compound. The α-amino ketone compound may, for example, be 2-benzyl-2-dimethylamino-1-(4-porphyrinylphenyl)-butan-1-one or 2-dimethylamino group. -2-(4-mercaptobenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 2-mercapto-1-(4-sulfonylphenyl) -2-Porphyrin propan-1-one and the like. The α-hydroxyketone compound may, for example, be 1-phenyl-2-hydroxy-2-mercaptopropan-1-one or 1-(4-isopropylphenyl)-2-hydroxy-2-indenyl group. Propan-1-one, 4-(2-hydroxyethoxy)phenyl-(2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenyl ketone, and the like. Among these, as the preferred acetophenone compound, an α-amino ketone compound is preferred, and 2-dimethylamino-2-(4-methylbenzyl)-1 - (4) is exemplified. - Taste. Lin-4-phenylphenyl)-but-1-yl, 2-methyl-1-(4-methylthiophenyl)-2-indolyl propan-1-one. -23- 201213445 As the biimidazole compound, for example, 2,2'-bis(2-phenylphenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1 can be exemplified. , 2'-biimidazole, 2,2'-bis(2-phenylene)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-di ( 2,4-Dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'.-biimidazole, 2,2'-di(2,4,6-triphenyl) -4,4',5,5'-tetraphenyl-1,2'-biimidazole. Among these, as a preferred biimidazole compound, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-linked may be mentioned. Imidazole, 2,2'-bis(2,4-diphenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-di(2, 4,6-trisylphenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, more preferably 2,2'-di(2,4-diphenyl) -4,4',5,5'-tetraphenyl-1,2'-biimidazole. As the [B] radical polymerization initiator, in order to increase the sensitivity, an aliphatic or aromatic compound having a dialkylamine group may be added as the [B] radical polymerization initiator (hereinafter, referred to as "amine-based sensitizer" "). The amine-based sensitizer may, for example, be 4,4'-bis(didecylamino)benzophenone or 4,4'-bis(diethylamino)benzophenone. Among these amine-based sensitizers, 4,4'-bis(diethylamino)dibenzophenone is preferred. These amine-based sensitizers may be used singly or in combination of two or more. Further, in the rhodium oxide polymer composition, when a biimidazole compound is used together with an amine-based sensitizer, a thiol compound may be added as a hydrogen radical supply agent. The biimidazole compound is sensitized to crack by an amine-based sensitizer to produce an imidazole radical, but only by doing so, it is impossible to directly exhibit high polymerization initiation energy. However, by adding a thiol compound to a system in which a biimidazole compound and an amine-based sensitizer coexist, a hydrogen radical can be supplied to the imidazole radical from the thiol compound. As a result, the imidazole radical is converted into a neutral imidazole, and a component having a high sulfur radical of the polymerization initiation -24-201213445 is produced, whereby the scratch resistance can be formed even with a low radioactive irradiation amount. Hardened film. Examples of the thiol compound include 2-carbylbenzoxanthene, 2-sulfobenzoxazole, 2-mercaptopurine, and 2-mercapto-5-methoxybenzone. An aromatic thiol compound such as thiazole; an aliphatic monothiol compound such as 3-mercaptopropionic acid or 3-mercaptopropionate; neopentyl alcohol tetrakis(kiloacetate), neopentyltetraol (3_han) A bifunctional or higher aliphatic thiol compound such as propylene sulfonate. Among these thiolated characters, 'extra is 2-mercapto-benzothiazole. When the thiol compound and the amine-based sensitizer are used together, the amount of the amine-based sensitizer is 5% by mass relative to 1 part by mass. The sitting compound ' is preferably from 0.1 part by mass to 50 parts by mass, more preferably from 1 part by mass to 2 parts by weight. By using the amine-based sensitizer in an amount of 〇·1 part by mass and 5 mussels, it is possible to improve the curing reactivity of the polymer composition after exposure, thereby improving the durability of the obtained cured film. Scrub and so on. Further, when the biimidazole compound, the amine-based sensitizer, and the thiol compound are used together, the amount of the thiol compound is preferably 〇. 1 part by mass. 5 parts by mass, more preferably 1 part by mass to 20 parts by mass. The properties of the obtained cured film and the like can be improved by using the thiol compound in an amount of from 0.1 part by mass to 50 parts by mass. * The amount of the [B] radical polyinitiator used as the composition of the siloxane polymer is '0 〇 5 parts by mass relative to 100 parts by mass of the [A] siloxane polymer. 30 parts by mass, more preferably 0.1 parts by mass - dan - 25 - 201213445 parts. By using the amount of the [B] radical polymerization initiator in the above range, the polymer composition exhibits high radiation sensitivity and can form a cured film having higher scratch resistance and the like. &lt;[C]Organic solvent&gt; The [0] organic solvent as the [C] organic solvent contains at least (C1) an organic solvent having a vapor pressure of 20 ° C or more and less than mm lmmHg or more. Further, it is preferable to contain (c2) 2 (the vapor pressure of rc is an organic solvent of 2 〇 mmHg or less. By using a [C] organic solvent having a specific range of rolling pressure, even by spray nozzle coating The method is applied at a high speed while preventing the coating from being applied. In addition, the vapor soil "Beibei can use a conventional one; in the present specification, it means a value measured by an evaporation corpuscular circulation method".曰 各 each of the broadcast I: organic 'treats' is suitable for use to uniformly dissolve or disperse the above-mentioned components, and can not be used to [C] organic solvents, can be used as a solvent for the reaction. Ethylene glycol monoalkyl bond monoalkyl ether, di: monool monoalkyl hydrazine, diethylene glycol acetate vinegar, dipropylene 'alcohol' alcohol II, bond, - ethylene glycol single alkyl base Dipropylene glycol monoalkyl base early burning base secret, dipropylene glycol dialkyl ether, class, guanamine, internal (four) acid vinegar, vinegar vinegar, aliphatic acid can also be mixed into the * ketone ... ketones Temple. They can be used alone - kind of, 】 use σ or more. As (C 1) organic soluble benzyl alcohol and other alcohols; For example, ethylene glycol monomethyl ether, ethylene glycol ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl butyl conversion, etc. (4); -26- 201213445 ethylene glycol Ethylene glycol dialkyl ethers such as mercaptoether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether; propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, etc. Diethyl glycol monoalkyl ethers such as diethylene glycol monodecyl ether, diethylene glycol monoethyl ether; diethylene glycol diethyl ether, diethylene glycol ethyl decyl ether Diethylene glycol dialkyl ethers; diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene Diethylene glycol monoalkyl ether acetate such as alcohol monobutyl ether acetate; dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, etc. Propylene glycol monoalkyl ethers; dipropylene glycol dialkyl ethers such as dipropylene glycol dimercapto ether, dipropylene glycol diethyl ether; dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether Dipropylene glycol monoalkyl ether acetates such as acid esters, dipropylene glycol monopropyl ether acetate, dipropylene glycol monobutyl ether acetate; n-propyl lactate, isopropyl lactate, n-butyl lactate , lactic acid esters such as isobutyl lactate, n-amyl lactate, and isoamyl lactate; ethyl hydroxyacetate, ethyl 2-hydroxy-2-methylpropionate, 2-hydroxy-3-mercaptobutyl Ethyl acetate, ethyl ethoxyacetate, ethyl 3-methoxyoxypropionate, decyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methoxybutylacetic acid Ester, 3-methyl-3-decyloxybutyl acetate, 3-methyl-3-decyloxybutyl propionate, 3-mercapto-3-indolyl butyl butyrate, An aliphatic carboxylic acid ester such as ethyl acetate, ethyl acetate, ethyl pyruvate or ethyl pyruvate; -27- 201213445 N-methyl decylamine, hydrazine, hydrazine-dimethyl hydrazine Amidoxime such as amine, N-methylacetamide, hydrazine, hydrazine-dimethylacetamide; lactones such as hydrazine-mercaptopyrrolidone and γ-butyrolactone; ketones such as dipropyl ketone Wait. They may be used singly or in combination of two or more. Examples of the (C2) organic solvent include diethylene glycol didecyl ether, ethylene glycol monodecyl ether acetate, ethylene glycol monoethyl ether acetate, and ethylene glycol monopropyl ether. Acid ester, ethylene glycol monobutyl ether acetate, propylene glycol monodecyl ether, propylene glycol monodecyl ether acetate, cyclohexanone, ethyl acetate, propyl acetate, n-butyl acetate, mercaptopropyl Ketone, methyl isobutyl ketone, decyl 3-methoxypropionate, decyl lactate, ethyl lactate, and the like. They may be used alone or in combination of two or more. When the (C 1 ) organic solvent and the (C 2 ) organic solvent are used in combination, the following combination is preferred: diethylene glycol ethyl decyl ether / diethylene glycol dimethyl ether, diethylene glycol ethyl hydrazine Ether/propylene glycol monodecyl ether acetate, diethylene glycol ethyl decyl ether/propylene glycol monodecyl ether, diethylene glycol ethyl decyl ether/cyclohexanone, diethylene glycol diethyl ether /diethylene glycol dimercapto bond, diethylene glycol diethyl ether / propylene glycol monodecyl ether acetate, diethylene glycol diethyl ether / cyclohexanone, diethylene glycol diethyl ether / 3-mercaptopropionic acid decyl, diethylene glycol diethyl ether / decyl isobutyl ketone, diethylene glycol diethyl ether / n-butyl acetate, ethylene glycol monobutyl ether / propylene glycol single Methyl ether, -28- 201213445 Ethyl monobutyl ether / two. Butyl shunt / cyclohexanone and the like. 14 early methyl acetate vinegar, B. scorpion early or above, (C1) organic solvent or (C2) organic solvent can be used in both types of u, can be (4) 甲美1 + out, for example, diethylene glycol diethyl Ether/propylene glycol monomethyl ether acetate/ring r-rolled methyl propionate. :(C2) content of organic solvent’

(C2)有機溶劑的總 W 以τ 1乂佳為10質量。/〇以上、50質量％ °猎由使蒸氣壓低 有機溶劑的質量比機溶劑和蒸氣麼南的（C2) ^ ^ ^ .，、、、上述乾圍，尤其是可以使預烘烤後 幻土 Μ中的殘留溶劑量 而可以鈿μ &gt; t 取佳化，塗膜的流動性平衡，從 叩J以抑制塗布不均（條 产 的產生，進一牛接」不勻、乳孔不勻、霧狀不勻等） 進 v提向膜厚均勻性。 &lt; [D ]界面活性劑&gt; 為了進一步提高該矽氧 型，切氧烧聚合物組成物的覆膜形成 氟JR rft、* 成物’較佳為進—步含有[D]由含 氟界面活性劑和有機矽 3有[』由3 出的-種以上的界面、制:相構成的群組中選 由進一步含有[D〗界 Μ °亥矽氧烷聚合物組成物藉 性，從 '/舌性劑，可以提高塗膜的表面平滑 作為含亂界面活==化膜的，厚均勻性。 的至少某個部位具有 /’”、在末'而、主鏈和側鏈 物。作為含氣界面活性二基和/或氟伸烧基的化合 代正辛基-四氣列舉出例如U，2,2-四氣 叫㈣、六乙二醇:U，2,2-四氣正辛基 乙二醇二Π i 2 2 (，，2,2,3,3-六虱正戊基）¾、八 ，，，-四氟正丁基）醚 '六丙二醇二 -29- 201213445 (1，1，2,2,3,3-六氟正戊基）醚、八丙二醇二（1，1，2,2_四氟正 丁基）醚、全氟正矽烷磺酸鈉、六氟正矽烷、 1，1，2,2,3,3,9,9，10，1〇 -十氟正十二烧、氟烧基苯續酸鈉、 氟炫基磷酸鈉、氟烷基羧酸鈉、二甘油四（氟烷基聚氧乙 烯醚）、氟烧基銨碘化物、氟烷基甜菜鹼、氟烷基聚氧乙 烯鍵、全氟烷基聚氧乙醇、全氟烷基烷氧化物、羧酸氟 烷基酯等。 作為含氟界面活性劑的商品，可以列舉出例如 BM-1000、ΒΜ-11〇〇(以上，BM CHEMIE 公司）、megaface F142D、megaface F172、megaface F173、megaface F183、 megaface F178、megaface F191、megaface F471、megaface F476(以上，大曰本油墨化學工業公司）、Fluorad FC-170C、Fluorad FC-171、Fluorad FC-430、Fluorad FC-43 1(以上，住友 3M 公司）、Surflon S-112、Surflon S-113、Surflon S-131、Surflon S-141、Surflon S-145、 Surflon S-3 82 ' Surflon SC-101 ' Surflon SC-102' Surflon SC-103、Surflon SC-104、Surflon SC-105、Surflon 3(：-106(以上，旭硝子公司）、卩丁0?[?30]、？1'0?丑？303、 FTOP EF352(以上，新秋田化成公司）、FTERGENT FT-100、FTERGENT FT-110、FTERGENT FT-140 A、 FTERGENT FT-150、FTERGENT FT-250、FTERGENT FT-251、FTERGENT FT-300、FTERGENT FT-310、 FTERGENT FT-400S、FTERGENT FTX-218、FTERGENT FT-251(以上，NEOS公司）等。 -30- 201213445 作為有機矽類界面活性劑的商品’可以列舉出例如 Toray Silicone DC3PA ' Toray Silicone DC7PA ' Toray Silicone SH11PA、Toray Silicone SH21PA、Toray Silicone SH28PA 'Toray Silicone SH29PA 'Toray Silicone SH30PA ' Toray Silicone SH-190 ' Toray Silicone SH-193 ' Toray Silicone SZ-6032、Toray Silicone SF-8428、Toray Silicone DC-57、Toray Silicone DC-190、SH 8400 FLUID(以上， Toray· Corning· Silicone 公司）、TSF-4440、TSF_4300、 TSF-4445、TSF-4446 ' TSF-4460、TSF-4452(以上，GE 東芝 silicone 公司）、Organosiloxane polymer KP341(信 越化學工業公司）等。 這些[D]界面活性劑可以單獨使用，也可以混合兩種 以上使用。作為忒矽氧院聚合物組成物中的[D ]界面活性 劑的含量，相對於100質量份[A]矽氧烷聚合物，較佳為 更佳為0.05質量份以上 0.01質量份以上2質量份以下 1質量份以下。藉由使[D]界面活性劑的含量為上述範 圍，可以進一步提高塗膜的表面平滑性。 &lt; [E ]乙稀基不餘和化合物(C2) The total W of the organic solvent is preferably 10 mass in terms of τ 1 . /〇 above, 50% by mass ° Hunting by making the vapor pressure lower than the organic solvent mass ratio of the machine solvent and the vapor of the South (C2) ^ ^ ^ ., ,, the above dry circumference, especially can make the pre-baking after the magic soil The amount of residual solvent in the crucible can be improved by 钿μ &gt; t, and the fluidity of the coating film is balanced. From the 叩J, the coating unevenness is suppressed (the production of the product, the feeding is uneven), the uneven pores, Irregularity of the mist, etc.) Into the v thickness uniformity of the film. &lt;[D] surfactant] In order to further increase the bismuth oxide type, the film of the oxy-oxygenated polymer composition forms fluorine JRR ft, and * is preferably contained in the step [D] by fluorine The surfactant and the organic ruthenium 3 have a combination of [3] and more than one type of interface, and the system consists of a phase consisting of a mixture of [D] Μ 矽 矽 矽 矽 聚合物 聚合物 , , '/ Tongue agent, can improve the surface smoothness of the coating film as a disordered interface == film, thickness uniformity. At least some portion of the group has /'", at the end, and the main chain and the side chain. As a gas-containing interfacial two-group and/or a fluorine-based alkyl group, a compound such as n-octyl-tetra gas lists, for example, U, 2,2-four gas called (four), hexaethylene glycol: U, 2,2-tetraqi n-octyl glycol dihydrazide i 2 2 (,, 2,2,3,3-hexa-n-pentyl) 3⁄4,8,,,--tetrafluoro-n-butyl)ether 'hexapropanediol di-29- 201213445 (1,1,2,2,3,3-hexafluoro-n-pentyl)ether, octapropylene glycol II (1,1 , 2,2_tetrafluoro-n-butyl)ether, sodium perfluoro-n-decane sulfonate, hexafluoro-n-decane, 1,1,2,2,3,3,9,9,10,1〇-decafluoro-positive 12-burning, sodium fluorobenzoate, sodium fluorophosphate, sodium fluoroalkylcarboxylate, diglycerol tetrakis(fluoroalkylpolyoxyethylene ether), fluoroalkylammonium iodide, fluoroalkylbetaine And a fluoroalkyl polyoxyethylene bond, a perfluoroalkyl polyoxyethylene, a perfluoroalkyl alkoxide, a fluoroalkyl carboxylate, etc. As a commercial product of a fluorine-containing surfactant, for example, BM-1000, ΒΜ-11〇〇 (above, BM CHEMIE company), megaface F142D, megaface F172, megaface F173, megaface F183, me Gaface F178, megaface F191, megaface F471, megaface F476 (above, Otsuka Ink Chemical Industry Co., Ltd.), Fluorad FC-170C, Fluorad FC-171, Fluorad FC-430, Fluorad FC-43 1 (above, Sumitomo 3M) , Surflon S-112, Surflon S-113, Surflon S-131, Surflon S-141, Surflon S-145, Surflon S-3 82 ' Surflon SC-101 ' Surflon SC-102' Surflon SC-103, Surflon SC- 104, Surflon SC-105, Surflon 3 (:-106 (above, Asahi Glass), Kenting 0?[?30], ?1'0? Ugly? 303, FTOP EF352 (above, New Akita Chemical Co., Ltd.), FTERGENT FT-100, FTERGENT FT-110, FTERGENT FT-140 A, FTERGENT FT-150, FTERGENT FT-250, FTERGENT FT-251, FTERGENT FT-300, FTERGENT FT-310, FTERGENT FT-400S, FTERGENT FTX-218, FTERGENT FT-251 (above, NEOS) and so on. -30- 201213445 As a commercial product of organic terpene surfactants, for example, Toray Silicone DC3PA 'Toray Silicone DC7PA ' Toray Silicone SH11PA, Toray Silicone SH21PA, Toray Silicone SH28PA 'Toray Silicone SH29PA 'Toray Silicone SH30PA ' Toray Silicone SH- 190 'Toray Silicone SH-193' Toray Silicone SZ-6032, Toray Silicone SF-8428, Toray Silicone DC-57, Toray Silicone DC-190, SH 8400 FLUID (above, Toray Corning· Silicone), TSF-4440, TSF_4300, TSF-4445, TSF-4446 'TSF-4460, TSF-4452 (above, GE Toshiba Silicon Corporation), Organosiloxane polymer KP341 (Shin-Etsu Chemical Industries, Inc.), and the like. These [D] surfactants may be used singly or in combination of two or more. The content of the [D] surfactant in the polymer composition of the oxime is preferably 0.05 parts by mass or more and 0.01 parts by mass or more based on 100 parts by mass of the [A] siloxane polymer. The following parts are 1 part by mass or less. By making the content of the [D] surfactant in the above range, the surface smoothness of the coating film can be further improved. &lt; [E] Ethyl group and compound

進一步提高耐擦傷性和透明，丨 進一步含有[E]乙烯 聚合物組成物藉由進一步含 提高放射線靈敏度，昇華性 合物組成物形成的硬化膜， 性。 &quot;31- 201213445 作為[E]乙烯基不飽和化合物’從聚合性良好提高 得到的硬化膜的強度的觀點來看，較佳為單官能、2 = 能j 3官能以上的（甲基）丙烯酸酯。該感放射線性組成 物藉由含有這些化合物，可以形成透明性 高度均衡的硬化膜。 … 作為單官能（曱基）丙烯酸酯，可以列舉出例如2-羥 基乙基（甲基）丙烯酸酯、2-羥基乙基甲基丙烯酸酯、二乙 二醇單乙基醚丙烯酸酯、二乙二醇單乙基醚甲基丙烯酸 酯、（2-丙烯醯氧基乙基）（2_羥基丙基）鄰苯二甲酸酯、（2_ 曱基丙烯醯氧基乙基）（2-羥基丙基）鄰苯二甲酸酯、ω緩 基聚己内醋單丙烯酸酯等作為商品，可以列舉出例如 ARONIX M-101 ^ ARONIX M-111 . ARONIX Μ-114 &gt;Further, the scratch resistance and the transparency are further improved, and the [E] ethylene polymer composition further contains a cured film formed by sublimating the composition of the composition by further improving the sensitivity of the radiation. &quot;31-201213445 As the [E] ethylenically unsaturated compound', from the viewpoint of the strength of the cured film obtained by improving the polymerizability, it is preferably a monofunctional, 2 = (3) functional (meth)acrylic acid ester. By containing these compounds, the radiation-sensitive composition can form a cured film having a highly transparent transparency. Examples of the monofunctional (fluorenyl) acrylate include 2-hydroxyethyl (meth) acrylate, 2-hydroxyethyl methacrylate, diethylene glycol monoethyl acrylate, and diethyl Glycol monoethyl ether methacrylate, (2-propenyloxyethyl) (2-hydroxypropyl) phthalate, (2-decyl propylene methoxyethyl) (2-hydroxyl) Examples of the propyl) phthalate ester, the ω-stable polyhexyl vinegar monoacrylate, and the like include ARONIX M-101 ^ ARONIX M-111. ARONIX Μ-114 &gt;

ARONIX Μ-5300(以上，東亞合成公司）；KAYARAD TC-110S、KAYARAD TC-120S(以上，曰本化藥公司）； Viscoat 158、Viscoat 2311(以上，大阪有機化學工業公 司）·等。ARONIX Μ-5300 (above, East Asia Synthetic Company); KAYARAD TC-110S, KAYARAD TC-120S (above, Sakamoto Chemical Co., Ltd.); Viscoat 158, Viscoat 2311 (above, Osaka Organic Chemical Industry Co., Ltd.), etc.

作為2官能（曱基）丙烯酸酯，可以列舉出例如乙二 醇二（曱基）丙浠酸醋、丙二醇二丙烯酸酿、丙二醇二曱 基丙烯酸酯、乙二醇二曱基内烯酸酯、二乙二醇二丙烯 Ss. Sa 一乙·一醇·一曱基丙稀酸I旨、四乙二醇二丙稀酸g旨、 四乙'一醇一曱基丙細酸S旨、1，6 -己二醇二丙稀酸醋、1，6 _ 己·一醇一曱基丙細酸自旨、1，9 -壬二醇二丙稀酸g旨、1，9-壬二醇二甲基丙烯酸酯等。作為商品，可以列舉出例如 ARONIX M-210、ARONIX M-240、ARONIX M-6200(以 上，東亞合成公司）；KAYARAD HDDA、KAYARAD -32- 201213445 HX-220、KAYARAD R-604(以上，日本化藥公司）；Viscoat 260、Viscoat 3 12、Viscoat 3 3 5HP(以上，大阪有機化學 工業公司）；LIGHT ACRYLATE 1，9_NDA(共榮社化學公 司）等。 作為3官能以上的（甲基）丙烯酸酯，可以列舉出例 如三羥曱基丙烷三丙烯酸酯、三羥甲基丙烷三曱基丙烯 酸酯、新戊四醇三丙烯酸酯、新戊四醇三曱基丙烯酸酯、 新戊四醇四丙烯酸酯、新戊四醇四曱基丙烯酸酯、二新 戊四醇五丙烯酸酯、二新戊四醇五曱基丙烯酸酯、二新 戊四醇六丙烯酸酯、二新戊四醇五丙烯酸酯和二新戊四 醇六丙烯酸酯的混合物、二新戊四醇六曱基丙烯酸酯、 環氧乙烷改性的二新戊四醇六丙烯酸酯、三（2-丙烯醯氧 基乙基）磷酸酯、三（2-甲基丙烯醯氧基乙基）磷酸酯、琥 珀酸改性的新戊四醇三丙烯酸酯、琥珀酸改性的二新戊 四醇五丙烯酸酯，以及具有直鏈伸烷基和脂環式結構而 且具有兩個以上的異氰酸酯基的化合物與在分子内具有 一個以上的羥基且具有3個、4個或5個（曱基）丙烯醯氧 基的化合物反應得到的多官能胺基曱酸乙酯丙烯酸酯類 化合物等。作為商品，可以列舉出例如ARONIX M-309、 ARONIX M-400、ARONIX M-405、ARONIX M-450、 ARONIX M-7100、ARONIX M-8030、ARONIX M-8060、 ARONIXTO-1450(以上，東亞合成公司）；KAYARAD TMPTA、KAYARAD DPHA、KAYARAD DPCA-20 &gt; KAYARAD DPCA-30、KAYARAD DPCA-60、KAYARAD DPCA-120、KAYARAD DPEA-12(以上，日本化藥公司）； -33- 201213445Examples of the bifunctional (fluorenyl) acrylate include ethylene glycol bis(indenyl)propionic acid vinegar, propylene glycol diacrylic acid brewing, propylene glycol dimercapto acrylate, and ethylene glycol dimercapto enoate. Diethylene glycol dipropylene Ss. Sa-Ethyl alcohol-monomethyl acrylate I, tetraethylene glycol diacrylic acid g, tetraethyl'-ol-mercaptopropionic acid S, 1 ,6-hexanediol diacrylic acid vinegar, 1,6-hexanol-mercaptopropionic acid, 1,9-nonanediol diacrylic acid, 1,9-nonanediol Dimethacrylate and the like. As a commercial product, for example, ARONIX M-210, ARONIX M-240, ARONIX M-6200 (above, East Asia Synthetic Company); KAYARAD HDDA, KAYARAD-32-201213445 HX-220, KAYARAD R-604 (above, Japaneseization) Pharmaceutical company); Viscoat 260, Viscoat 3 12, Viscoat 3 3 5HP (above, Osaka Organic Chemical Industry Co., Ltd.); LIGHT ACRYLATE 1, 9_NDA (Kyoeisha Chemical Co., Ltd.), and the like. Examples of the trifunctional or higher (meth) acrylate include trishydroxypropyl propane triacrylate, trimethylolpropane tridecyl acrylate, neopentyl alcohol triacrylate, and neopentyl alcohol triterpene. Acrylate, neopentyl alcohol tetraacrylate, neopentyl alcohol tetradecyl acrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentadecyl acrylate, dipentaerythritol hexaacrylate , a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, dipentaerythritol hexamethylene acrylate, ethylene oxide modified dipentaerythritol hexaacrylate, three ( 2-propenyloxyethyl)phosphate, tris(2-methylpropenyloxyethyl)phosphate, succinic acid-modified neopentyl alcohol triacrylate, succinic acid-modified dipentaerythritol Alcohol pentaacrylate, and a compound having a linear alkyl and alicyclic structure and having two or more isocyanate groups and having one or more hydroxyl groups in the molecule and having three, four or five (fluorenyl) groups Polyfunctional amine group obtained by reacting a propylene oxy group compound Ethyl acrylate compound. As a commercial product, for example, ARONIX M-309, ARONIX M-400, ARONIX M-405, ARONIX M-450, ARONIX M-7100, ARONIX M-8030, ARONIX M-8060, ARONIXTO-1450 (above, East Asian synthesis) Company); KAYARAD TMPTA, KAYARAD DPHA, KAYARAD DPCA-20 &gt; KAYARAD DPCA-30, KAYARAD DPCA-60, KAYARAD DPCA-120, KAYARAD DPEA-12 (above, Nippon Chemical Co., Ltd.); -33- 201213445

Viscoat 295、Viscoat 300、Viscoat 360、Viscoat GPT 'Viscoat 295, Viscoat 300, Viscoat 360, Viscoat GPT '

Viscoat 3PA、Viscoat 400(以上，大阪有機化學工業公 司）；作為含有多官能胺基曱酸乙酯丙稀酸酯類化合物的 商品，可以列舉出newfrontierR-115 0(第一工業製藥公 司）、KAYARAD DPHA-40H(曰本化藥公司）等。 這些[E]乙浠基不飽和化合物中，較佳為含有ω_羧基 聚己内酯單丙烯酸酯、1,9-壬二醇二曱基丙稀酸酯、三 經甲基丙烧三丙浠酿酯、新戊四醇三丙炼酸酯、新戊四 醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇六 丙烯酸酯以及二新戊四醇六丙烯酸酯和二新戊四醇五丙 烯酸酯的混合物、環氧乙烷改性的二季戊四六丙炼酸 醋、琥珀酸改性的新戊四醇三丙稀酸酯、琥珀酸改性的 二新戊四醇五丙烯酸酯、多官能胺基曱酸乙酯丙烯酸酯 類化合物的商品。 上述[Ε]乙稀基不飽和化合物可以單獨使用，也可以 混合兩種以上使用。作為該組成物中的[Ε]乙烯基不飽和 化合物的使用比例，相對於100質量份[Α]矽氧烷聚合 物，較佳為5質量份〜80質量份，更佳為1〇質量份〜3〇 資量份。藉由使[Ε ]乙烯基不飽和化合物的用量為上述範 圍’可以使該組成物的放射線靈敏度和得到的硬化膜的 耐擦傷性等更好。 &lt; [F ]酸產生劑或驗產生劑〉 作為[F]感放射線性酸產生劑或感放射線性鹼產生 劑’定義為藉由照射放射線，可以放出酸性活性物質或 驗性活性物質的化合物。[Α]矽氧烷聚合物藉由[F]酸產 生劑或驗產生劑的催化作用硬化，聚合性更高，可以得 到耐擦傷性等優異的硬化膜。 -34- 201213445 作為使[F]酸產生劑或鹼產生劑分解，產生酸性活性 物質或鹼性活性物質的陽離子或陰離子而照射的放射 線，可以列舉出可見光、紫外線、紅外線、X光、α射 線、β射線、γ射線等。這些放射線中，從具有一定的能 級’可以實現高的硬化速度，而且從照射裝置比較廉價 且小型來看，較佳為使用紫外線。 作為感放射線性酸產生劑，較佳為二苯基峨鑌鹽、 二苯基錄鹽、四氫嗟吩鐵鹽，更佳為三苯基疏鹽’四氫 噻吩鑌鹽。 作為二苯基碘鑌鹽，可以列舉出例如二苯基碘鏘四 氟硼酸鹽、二苯基碘鑌六氟磷酸鹽、二苯基碘鏽六氟砷 酸鹽、二笨基碘鏽三氟甲磺酸鹽、二苯基碘·鑌三氟乙酸 鹽、二苯基碘鏽-對甲苯磺酸鹽、二苯基碘鑌丁基三（2，6- 一氟代笨基）侧酸鹽、4 -曱氧基苯基-苯基硬鏽四氟硼酸 鹽、雙（4-第三丁基苯基）碘鏽四氟硼酸鹽、雙（4_第三丁 基苯基）碘鑌六氟砷酸鹽、雙（4_第三丁基苯基）碘鑌三氟 曱磺酸鹽、雙（4_第三丁基苯基）碘鏽三氟乙酸鹽、雙（4_ 第二丁基笨基）碘鑌-對甲苯磺酸鹽、雙（4_第三丁基苯基） 碘鏽樟腦磺酸鹽等。 作為三苯基銕鹽，可以列舉出例如三苯基疏三氣甲 績：鹽、，苯基鈒樟腦續酸鹽、三苯基疏四誠鹽、 二本基疏二敗乙酸鹽、三笨某妒料田# 4 本丞爲IL _對甲苯磺酸鹽、三苯基 ’危丁基二（2,6 -二敗代苯基）删酸鹽等。 作為四氫噻吩鏽鹽，可 — ^ J 乂夕】舉出例如1-(4-正丁氡基 奈-1-基）四氧嗟吩鑌三氣甲確 队τ s α夂盟、1-(4_正丁氧基萘小 -35- 201213445 基）四氫β塞吩鏽九氟正丁橫酸鹽、1_(4 -正丁氧基萘_1_基） 四氫°塞吩鑌-1，1，2，2 -四氟代-2 -(降茨院-2 -基）乙續酸鹽、 1-(4-正丁氧基萘-1-基）四氫噻吩鏽-2-(5 -第三丁氧基幾 基氧基二環[2.2.1]庚-2-基）-1，1，2,2-四氟乙磺酸鹽、1_(4_ 正丁氧基萘-1-基）四氫噻吩鏽-2-(6-第三丁氧基羰基氧基 二環[2_2.1]庚-2-基）-1，1，2,2-四氟乙磺酸鹽、1_(4,7_ 二丁 氧基-1 -萘基）四氫噻吩鏽三氟曱磺酸鹽等。 這些感放射線性酸產生劑中’從提高感放射線性組 成物的放射線靈敏度的觀點來看’特佳為三苯基錡三氟 曱磺酸鹽、三苯基銃樟腦磺酸鹽、1-(4:,7-二丁氧基-1-萘 基）四氫噻吩鑌三氟甲磺酸鹽。 作為感放射線性鹼產生劑，可以列舉出例如2-；ε肖基 苄基環己基胺基曱酸醋、[[(2,6 -二硝基节基）氧基]数基] 環己基胺、Ν · (2 -确基苄基氧基幾基）υ比略烧、雙[[(2 _硝 基十基）乳基]幾基]己烧-1，6-二胺' 三笨基曱醇、〇_胺基 甲酿基輕基酿胺、0 -胺基曱酿基月亏、4 -(甲某硫苯甲酿 基）-1-甲基-1-咪啉乙烷、（4-咮啉苯曱醯基）_卜苄基_卜二 曱基胺基丙烷、2-苄基-2-二曱基胺基咮啉苯基）_ 丁酉同、六胺錄（III)二（三苯基曱基石朋酸鹽）等。 這些感放射線性驗產生劑中’從提高感放射線性組 成物的放射線靈敏度的觀點來看，較佳為2硝基节基環 己基胺基曱酸酯、〇-胺基甲醯基羥基醯胺。 [F]酸產生劑或鹼產生可以單獨使用，也可以混合兩 種以上使用。作為[Fm產生劑或驗產生劑的用量，相對 於100質罝份[A]矽氧烷聚合物，較佳為0.01〜2〇質量份 *36- 201213445 佺為°，1〜10 f*份以下。藉由使[D]酸產生劑 或鹼產生劑的用量為0.01〜20質量份，，可α γ Η | 雷Μ厣β , ζυ質里伤’可以付到放射線 X ^擦傷性、透明性等均衡性良好的優異的硬 膜0 &lt;其他任意成分&gt; &quot;亥矽氧烷聚合物組成物除了上述[Α]〜[f]以外，在不 損害本發明的效果的範圍内，根據需要可 劑、鹼性化合物、附_矗名 另在σ助 f 物醌一疊氮化合物等其他任意成分。以 子k二成分進行詳細描述。另外，其他任意 以分別單獨使用，也可以混合兩種以上使用。 [密合助劑] 在°玄矽氧烷聚合物組成物中，可以 :基板的無機物，例如石夕、氧切、氣化…夕化二 二銅、㉝等金屬和絕緣膜的黏結性的密合助劑 這種密合助劑較佳為徒用官At # ^ 乂佳為使用S犯性矽烷偶合劑。作為官能 性石夕烧偶合劑，可以歹丨丨I屮办丨上日 其s ^ 叮以列舉出例如具有羧基、曱基丙烯醯 酸賴&amp;、環氧基(較佳為環氧乙烧基)、硫醇基 寺反應性取代基的矽烷偶合劑。 能性…聯劑’可以列舉出例如三甲氧基 甲基丙稀酿氧基丙基三甲氧基碎 里敗^厂乙醯^錢、w基三以基錢、γ- ; = 基™院”·縮水甘油氧基丙基三 院、γ-縮水甘油氧基丙基燒基二 氣代丙基三烷氧基矽烷、”巯 γ β-(3 4 if ϋ ϊ» 3 « 土丙基三烷氧基矽烷、 (，…己基)乙基三甲氧基Μ等。此…，較 -37- 201213445 佳為γ -縮水甘油氧基丙基烧基二烧氧基石夕烧、β - (3，4 -環 氧環己基）乙基三曱氧基矽烷' γ-曱基丙烯醯氧基丙基三 曱氧基矽烷。 在該矽氧烷聚合物組成物中，這種密合助劑相對於 100質量份[Α]矽氧烷聚合物，較佳為0.5質量份以上20 質量份以下，更佳為1質量份以上1 0質量份以下。藉由 使密合助劑的量為上述範圍，可以改善形成的硬化膜和 基板的密合性。 [驗性化合物] 作為鹼性化合物，可以從化學增幅光阻劑中使用的 鹼性化合物中任意選擇使用。作為鹼性化合物可以列舉 出例如脂肪族胺、芳香族胺、雜環胺、氫氧化四級銨、 羧酸四級銨鹽等。藉由在該矽氧烷聚合物組成物中含有 鹼性化合物，可以適當控制曝光而由光酸產生劑產生的 酸的擴散長，可以形成良好的圖案顯影性。 作為脂肪族胺，可以列舉出例如三甲基胺、二乙基 胺、三乙基胺、二正丙基胺、三正丙基胺、二正戊基胺、 三正戊基胺、二乙醇胺、三乙醇胺、二環己基胺、二環 己基曱基胺等。 作為芳香族胺，可以列舉出例如苯胺、苄基胺、Ν,Ν-二甲基苯胺、二苯胺等。 作為雜環胺，可以列舉出例如吡啶、2-曱基吡啶、 4-甲基吡啶、2-乙基吡啶、4-乙基吡啶、2-苯基吡啶、4-苯基0比0定、Ν -曱基-4 -苯基。比。定、4 -二曱基胺基°比。定、咪 唑、苯并咪唑、4-甲基咪唑、2-苯基苯并咪唑、2,4,5-三 -38- 201213445 苯基α米σ坐、煙驗、煙酸、煙酸酸胺、啥琳、8 -氧代啥琳、 °比。井、°比吐、°荅听、。票吟、。比η各炫《、旅咬、旅听、味琳、 4-曱基味啉、1，5-二氮雜二環[4,3,0]-5-壬烯、1,8-二氮雜 二環[5,3,0]-7-十一烯等。 作為四級銨氫氧化物，可以列舉出例如氫氧化四甲 基銨、氫氧化四乙基銨、氫氧化四正丁基銨、氫氧化四 正己基銨等。 作為羧酸四級銨鹽，可以列舉出例如四曱基敍乙酸 鹽、四曱基銨苯曱酸鹽、四正丁基銨乙酸鹽、四正丁基 銨苯甲酸鹽等。 該石夕氧烧聚合物組成物中的驗性化合物的含量，相 對於[Α] 100質量份矽氧烷聚合物，較佳為0.001質量份 〜1質量份，更佳為0.005質量份〜0.2質量份。藉由使鹼 性化合物的含量為上述範圍，圖案顯影性良好。 [酿二疊氮化合物] 醌二疊氮化合物是藉由照射放射線產生羧酸的化合 物。作為醌二疊氮化合物可以使用酚性或醇性化合物（以 下，稱作“母核”）和1，2-萘醌二疊氮磺醯ii的縮合物。 作為上述母核，可以列舉出例如三羥基二苯曱酮、 四羥基二苯曱酮、五羥基二苯曱酮、六羥基二苯曱酮、（多 羥基苯基）烷烴、其他母核。 作為三羥基二苯甲酮，可以列舉出例如2,3，4-三羥 基二苯甲酮、2,4,6-三羥基二苯曱酮等。 作為四羥基二苯曱酮，可以列舉出例如2,2’，4,4’-四 羥基二苯甲酮、2,3,4,3’-四羥基二苯甲酮、2,3,4,4’ -四羥 -39- 201213445 基二苯曱酮、2,3,4,2’-四羥基- 4’-曱基二苯曱酮、2,3,4，4’-四羥基-3’-曱氧基二苯甲酮等。 作為五羥基二苯曱酮，可以列舉出例如2,3,4，2’，6’-五羥基二苯曱酮等。 作為六羥基二苯曱酮，可以列舉出例如 2,4,6,3’，4’，5’-六羥基二苯曱酮、3,4,5,3’，4’，5’-六羥基二 苯甲酮等。 作為（多羥基苯基）烷烴，可以列舉出例如雙（2,4-二 羥基苯基）曱烷、雙（對羥基苯基）甲烷、三（對羥基苯基） 曱烷、1，1,1-三（對羥基苯基）乙烷、二（2:,3,4-三羥基苯基） 曱烷、2,2-二（2,3,4-三羥基苯基）丙烷、1，1，3-三（2,5-二甲 基-4-羥基苯基）-3-苯基丙烷、4,4’-[1·[4-[1-[4-羥基苯 基]-1-曱基乙基]苯基]伸乙基]聯苯酚、二（2,5-二甲基-4-羥基苯基）-2-羥基苯基曱烷、3,3，3’，3’-四甲基-1，1 螺二 茚-5,6,7,5，，6’，7’-六醇、2,2,4-三甲基-7,2’，4’-三羥基黃烷 等。 作為其他母核，可以列舉出例如2-甲基-2-(2,4-二羥 基苯基）-4-(4-輕基苯基）-7-經基咬π完、1-[1-(3-{1-(4-經基 苯基）-1-曱基乙基}-4,6-二羥基苯基）-1-曱基乙 基]-3-(1-(3-{1-(4-經基苯基）-1-甲基乙基]·_4,6-二輕基苯 基）-1-曱基乙基）苯、4,6-雙{1-(4-羥基苯基）-1-曱基乙 基}-1,3-二羥基苯等。 在這些母核中，較佳為2,3,4,4’-四羥基二苯曱酮、 1，1,1-三（對羥基苯基）乙烷、4,4’-[1-[4-[1-[4-羥基苯 基]-1-曱基乙基]苯基]伸乙基]聯苯酚。 -40- 201213445 另外，作為1，2 -萘g昆二最氣A航 且氮蝕醯鹵，可以使用1，2 - 萘醌二疊氮磺醯氯。作為1 2篡柄-# “奈醌一疊氮磺醯氯，可以 列舉出例如1，2 -萘醌二疊氮、4生 乱4-化醯虱和1,2-萘醌二疊氮 -5-確酿氣。此％•之中，特佳我站田，η 饤住為使用1,2-萘醌二疊氮-5- 石黃酿氯。 作為酚性化合物或醇性彳卜人輪4 化合物和】，2-萘醌二疊氮磺 酸#的縮合物，較佳為三（對經基笨基）乙烧和0 萘醌二疊氮-5-磺醯氣的縮合物、Μ’·&quot;，-。，·羥基苯 基]-1-甲基乙基]苯基]伸乙基1胸贫 巷j聯本酚和丨，2·萘醌二疊氮 -5 -續醯氯的縮合物。 在酚性化合物或醇性化合物 儿。物（母核）和1，2-萘醌二疊 氮石黃醯鹵的縮合反應中，相斜於 相對於酚性化合物或醇性化合 物中的ΟΗ基數量，使用相♦於 义扣子目田於較佳為3〇莫耳0/〇〜85莫 耳％ ’更佳為50莫耳％〜70莫耳 吴耳/。的1,2-萘醌二疊氮磺醯 函。縮合反應錯由習知的方法進行 另外，作為醌二疊氛 卜人礼、甚a 虱化11物還適合使用將上述例示 的母核的醋鍵改變為醯胺鍵 1 2笑职足亡 ，2_萘fct二疊氮磺醯胺 類’例如2,3,4-三胺基二苯曱 、 ',2 -萘醍二疊氮_ 4 -磺醯 胺寻。 &lt;矽氧烷聚合物組成物的製備&gt; 該矽氧烷聚合物組成物在[ 沙你丨脾ΓΑ1功p L』有機洛劑中’以規定的 比例將[A]矽氧烷聚合物、[B]自 姑命|蚀田AA 土 t A引發劑以及根 據而要使用的任意成分均勻地混入 — 態下製備。 〇在〉谷解或分散的狀 201213445 將該石夕氧烧聚合物組.成物製備為溶液狀態時 固體成分（[A]矽氧烷聚合物、[B]自由基聚合引發南| r為 根據需要含有的任意成分的總量）的濃度，是=及 以上30質量％以下。較佳為！ 5質量％〜3〇質量％ /里〇/〇 佳為20質量％〜28質量％。另外，該矽氧烷聚合物^較 物的2 5 C時的黏度是2.0 m P a. s以上1 〇 m p a. s 7 成Viscoat 3PA, Viscoat 400 (above, Osaka Organic Chemical Industry Co., Ltd.); as a product containing a polyfunctional amine-based ethyl phthalate acrylate compound, new frontier R-115 0 (first industrial pharmaceutical company), KAYARAD DPHA-40H (Sakamoto Chemical Co., Ltd.) and the like. Among these [E]ethenyl unsaturated compounds, it is preferred to contain ω-carboxypolycaprolactone monoacrylate, 1,9-nonanediol dimercapto acrylate, and trimethyl methacrylate tripropyl acrylate. Brewed ester, neopentyl alcohol tripropionate, neopentyl alcohol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and dipentaerythritol hexaacrylate and a mixture of pentaerythritol pentaacrylate, ethylene oxide modified dipentaerythritol vinegar, succinic acid modified neopentyl alcohol triacrylate, succinic acid modified dipentaerythritol A commercial product of an alcohol pentaacrylate or a polyfunctional amine phthalate acrylate compound. The above [Ε] ethylenically unsaturated compound may be used singly or in combination of two or more. The use ratio of the [Ε] ethylenically unsaturated compound in the composition is preferably 5 parts by mass to 80 parts by mass, more preferably 1 part by mass, per 100 parts by mass of the [Α] siloxane polymer. ~3〇 Quantities. The radiation sensitivity of the composition and the scratch resistance of the obtained cured film can be made better by using the amount of the [Ε] ethylenically unsaturated compound in the above range. &lt;[F]acid generator or test agent> As a [F] sensitizing radioactive acid generator or a sensitizing radioactive base generator, 'defined as a compound capable of releasing an acidic active substance or an active substance by irradiation with radiation . [Α] The siloxane polymer is hardened by the catalytic action of the [F] acid generator or the test agent, and has higher polymerizability, and a cured film excellent in scratch resistance and the like can be obtained. -34-201213445 Radiation which is irradiated with a cation or an anion which generates an acidic active material or a basic active material by decomposing a [F] acid generator or an alkali generator, and examples thereof include visible light, ultraviolet light, infrared light, X-ray, and alpha light. , β rays, γ rays, and the like. Among these radiations, a high curing rate can be achieved from a certain energy level, and it is preferable to use ultraviolet rays from the viewpoint that the irradiation device is relatively inexpensive and small. The radiation-sensitive acid generator is preferably a diphenyl phosphonium salt, a diphenyl salt, or a tetrahydroporphin iron salt, more preferably a triphenyl salt-salt tetrahydrothiophene salt. The diphenyliodonium salt may, for example, be diphenyliodonium tetrafluoroborate, diphenyliodonium hexafluorophosphate, diphenyliodium hexafluoroarsenate or dipyridyl iodine trifluoride. Methanesulfonate, diphenyliodonium fluorene trifluoroacetate, diphenyl iodine rust-p-toluene sulfonate, diphenyl iodonium butyl tris(2,6-fluoroindolyl) side acid salt , 4-methoxyphenyl-phenyl rust tetrafluoroborate, bis(4-t-butylphenyl) iodine tetrafluoroborate, bis(4_t-butylphenyl) iodonium Fluorinium arsenate, bis(4_t-butylphenyl)iodonium trifluorosulfonate, bis(4_t-butylphenyl)iodine rust trifluoroacetate, bis(4_second butyl Stupid) iodonium-p-toluenesulfonate, bis(4_t-butylphenyl) iodine rust camphorsulfonate, and the like. Examples of the triphenylsulfonium salt include, for example, triphenyl sulfonate: salt, phenyl decanoate, triphenyl sulfonate, dibasic bismuth acetate, and tris A 妒料田# 4 This 丞 is IL _ p-toluene sulfonate, triphenyl 'thousa butyl bis (2,6-di-substituted phenyl) decamate salt and the like. As the tetrahydrothiophene rust salt, it is possible to give, for example, 1-(4-n-butylidenyl-1-nyl)tetraoxin, a gas, a group of τ s α 夂, 1-(4 _ n-butoxynaphthalene small -35- 201213445 base) tetrahydro β-sentole rust nonafluoro-n-butyl sulphate, 1-(4-n-butoxynaphthalene-1-yl)tetrahydro-septane-1 1,2,2-tetrafluoro-2-((Zheshen-2-yl)-propionate, 1-(4-n-butoxynaphthalen-1-yl)tetrahydrothiophene rust-2-(5 -Tertibutoxyhexyloxybicyclo[2.2.1]hept-2-yl)-1,1,2,2-tetrafluoroethanesulfonate, 1_(4-n-butoxynaphthalene-1- Tetrahydrothiophene rust-2-(6-tert-butoxycarbonyloxybicyclo[2_2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethanesulfonate, 1_ (4,7-Dibutoxy-1-naphthyl)tetrahydrothiophene rust trifluorosulfonate or the like. Among these radiation-sensitive acid generators, 'from the viewpoint of improving the radiation sensitivity of the radiation-sensitive composition, 'preferably triphenylsulfonium trifluorosulfonate, triphenyl camphorsulfonate, 1-( 4: 7-Dibutoxy-1-naphthyl)tetrahydrothiophene trifluoromethanesulfonate. The radiation-sensitive alkali generating agent may, for example, be 2-; ε-Schottkybenzylcyclohexylamino phthalic acid vinegar, [[(2,6-dinitro] benzyl] oxy] benzyl] cyclohexylamine Ν · (2 -Acetylbenzyloxy) hydrazine is slightly calcined, bis[[(2 _nitrodecyl)) aryl] hexene-1,6-diamine' Hydroxide, hydrazine-amine-based aryl-based light-branched amine, 0-amino hydrazine base, 4 - (methyl thiobenzoyl)-1-methyl-1- morpholine ethane, ( 4-porphyrinbenzoyl)-benzylidene-di-diylaminopropane, 2-benzyl-2-didecylaminoporphyrin phenyl)-butanthene, hexamine (III) two (three Phenyl fluorenyl pate) and the like. Among these sensitizing radioactivity generators, 'from the viewpoint of improving the radiation sensitivity of the radiation-sensitive composition, 2 nitro-nodal cyclohexylamino phthalate, hydrazine-aminomethyl hydrazino hydroxy guanamine is preferred. . [F] The acid generator or the base may be used singly or in combination of two or more. The amount of the [Fm generating agent or the test agent to be used is preferably 0.01 to 2 parts by mass relative to 100 parts by mass of the [A] siloxane polymer. *36-201213445 佺 is °, 1 to 10 f* parts. the following. By using the [D] acid generator or the alkali generator in an amount of 0.01 to 20 parts by mass, α γ Η | Thunder β, enamel damage can be paid to radiation X ^ abrasion, transparency, etc. The excellent hard film 0 &lt;other arbitrary component&gt;&quot;&quot;&quot;&quot;&quot;&quot;&gt; The agent, the basic compound, the _ 矗 另 另 另 助 助 助 助 助 助 助 助 助 助 助 助 。 。 。 。 。 。 The sub-k two components are described in detail. Further, any other one may be used alone or in combination of two or more. [Adhesive Aid] In the β-xanthene polymer composition, it can be: an inorganic substance of a substrate, such as a stone, an oxygen cut, a gasification, a copper, a metal such as 33, and an adhesive film. The adhesion aid such as the adhesion aid is preferably a use of the official At # ^ 乂 good for the use of S sputum decane coupling agent. As a functional stagnation coupling agent, it is possible to exemplify, for example, a carboxyl group, a mercapto acrylonitrile ruthenium &amp; an epoxy group (preferably an epoxy ethene). a decane coupling agent for a reactive substituent of a thiol group. The energy-linking agent can be exemplified by, for example, trimethoxymethyl propylene oxypropyl trimethoxy slag, smashing, smashing, smashing, gamma, gamma, gamma · Glycidoxypropyl tri-supplement, γ-glycidoxypropyl succinyl di- propyl propyl decyloxy decane, "巯 γ β- (3 4 if ϋ ϊ» 3 « propyl propyl hexane Oxydecane, (, hexyl) ethyltrimethoxy hydrazine, etc. This is, compared to -37-201213445, preferably γ-glycidoxypropyl ketone di-oxygen oxysalination, β - (3,4 -Epoxycyclohexyl)ethyltrimethoxy decane' γ-mercapto propylene methoxy propyl trimethoxy decane. In the oxirane polymer composition, the adhesion aid is relative to 100 The mass fraction of [Α] methoxyalkane polymer is preferably 0.5 parts by mass or more and 20 parts by mass or less, more preferably 1 part by mass or more and 10 parts by mass or less. By setting the amount of the adhesion aid to the above range, The adhesion between the formed cured film and the substrate is improved. [Experimental Compound] The basic compound can be arbitrarily selected from the basic compounds used in the chemically amplified photoresist. Examples of the basic compound include an aliphatic amine, an aromatic amine, a heterocyclic amine, a quaternary ammonium hydroxide, a quaternary ammonium carboxylic acid salt, etc. By including a basic compound in the siloxane polymer composition, The exposure of the acid generated by the photoacid generator can be appropriately controlled to be long, and good pattern developability can be formed. Examples of the aliphatic amine include trimethylamine, diethylamine, triethylamine, and N-propylamine, tri-n-propylamine, di-n-pentylamine, tri-n-pentylamine, diethanolamine, triethanolamine, dicyclohexylamine, dicyclohexyldecylamine, etc. Examples of the aromatic amines include For example, aniline, benzylamine, hydrazine, hydrazine-dimethylaniline, diphenylamine, etc. Examples of the heterocyclic amine include pyridine, 2-mercaptopyridine, 4-methylpyridine, 2-ethylpyridine, and 4 -ethylpyridine, 2-phenylpyridine, 4-phenyl 0-butoxy, fluorenyl-fluorenyl-4-phenyl. Ratio, 4 - dimercaptoamine group ratio, imidazole, benzo Imidazole, 4-methylimidazole, 2-phenylbenzimidazole, 2,4,5-tri-38- 201213445 Phenyl α-mσ, smoke test, niacin, niacin Acid amine, 啥琳, 8-oxo 啥 、, ° ratio. Well, ° than spit, ° 荅 listen, vote, 比 η each 炫 ", travel bite, travel listen, taste Lin, 4-曱 base Pyrolin, 1,5-diazabicyclo[4,3,0]-5-pinene, 1,8-diazabicyclo[5,3,0]-7-undecene, etc. Examples of the quaternary ammonium hydroxide include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetra-n-butylammonium hydroxide, tetra-n-hexylammonium hydroxide, etc. As the quaternary ammonium salt of a carboxylic acid, For example, tetradecyl sulphate, tetradecylammonium benzoate, tetra-n-butylammonium acetate, tetra-n-butylammonium benzoate, etc. The content of the compound is preferably 0.001 part by mass to 1 part by mass, more preferably 0.005 part by mass to 0.2 part by mass, per 100 parts by mass of the oxime polymer. When the content of the basic compound is in the above range, the pattern developability is good. [Broken diazide compound] The quinonediazide compound is a compound which generates a carboxylic acid by irradiation with radiation. As the quinonediazide compound, a condensate of a phenolic or alcoholic compound (hereinafter, referred to as "mother core") and 1,2-naphthoquinonediazide sulfonium ii can be used. Examples of the mother nucleus include trihydroxybenzophenone, tetrahydroxybenzophenone, pentahydroxybenzophenone, hexahydroxydibenzophenone, (polyhydroxyphenyl)alkane, and other parent cores. The trihydroxybenzophenone may, for example, be 2,3,4-trihydroxybenzophenone or 2,4,6-trihydroxydibenzophenone. Examples of the tetrahydroxydibenzophenone include 2,2',4,4'-tetrahydroxybenzophenone, 2,3,4,3'-tetrahydroxybenzophenone, and 2,3,4. , 4'-tetrahydroxy-39- 201213445 bisbenzophenone, 2,3,4,2'-tetrahydroxy-4'-mercaptobenzophenone, 2,3,4,4'-tetrahydroxy- 3'-decyloxybenzophenone and the like. The pentahydroxybenzophenone may, for example, be 2,3,4,2',6'-pentahydroxydibenzophenone or the like. Examples of the hexahydroxydibenzophenone include 2,4,6,3',4',5'-hexahydroxydibenzophenone, 3,4,5,3',4',5'-hexa. Hydroxybenzophenone and the like. Examples of the (polyhydroxyphenyl)alkane include bis(2,4-dihydroxyphenyl)decane, bis(p-hydroxyphenyl)methane, tris(p-hydroxyphenyl)decane, 1,1. 1-tris(p-hydroxyphenyl)ethane, bis(2:,3,4-trihydroxyphenyl)decane, 2,2-bis(2,3,4-trihydroxyphenyl)propane, 1, 1,3-tris(2,5-dimethyl-4-hydroxyphenyl)-3-phenylpropane, 4,4'-[1·[4-[1-[4-hydroxyphenyl]-1 -mercaptoethyl]phenyl]extended ethyl]biphenol, bis(2,5-dimethyl-4-hydroxyphenyl)-2-hydroxyphenyldecane, 3,3,3',3' -tetramethyl-1,1 spirobiindole-5,6,7,5,6',7'-hexaol, 2,2,4-trimethyl-7,2',4'-trihydroxy Flavanane and the like. As other parent cores, for example, 2-methyl-2-(2,4-dihydroxyphenyl)-4-(4-lightylphenyl)-7-trans-base π, 1-[1 -(3-{1-(4-Phenylphenyl)-1-indolylethyl}-4,6-dihydroxyphenyl)-1-indolylethyl]-3-(1-(3- {1-(4-Phenylphenyl)-1-methylethyl]·_4,6-diheptylphenyl)-1-indenylethyl)benzene, 4,6-double {1-(4 -Hydroxyphenyl)-1-indenylethyl}-1,3-dihydroxybenzene and the like. Among these cores, 2,3,4,4'-tetrahydroxydibenzophenone, 1,1,1-tris(p-hydroxyphenyl)ethane, 4,4'-[1-[ 4-[1-[4-Hydroxyphenyl]-1-indenylethyl]phenyl]extended ethyl]biphenol. -40- 201213445 In addition, 1,2 - naphthoquinonediazide sulfonium chloride can be used as the 1,2 -naphthalene g quinone and the nitrogen etched halogen. As the 1 2 stalk-# "Nipples azimuth sulfonium chloride, for example, 1,2-naphthoquinonediazide, 4-disorder 4-quinone, and 1,2-naphthoquinonediazide- 5- indeed brewing gas. Among the %•, especially the one I stand in the field, η 饤 live using 1,2-naphthoquinonediazide-5- feldspar to brew chlorine. As a phenolic compound or alcoholic scorpion a condensate of the compound of the round 4 and the 2-naphthoquinonediazidesulfonic acid #, preferably a condensate of tris(p-butyryl)acetone and 0 naphthoquinonediazide-5-sulfonium, Μ'·&quot;,-.,hydroxyphenyl]-1-methylethyl]phenyl]extended ethyl 1 chest lean lane j bisphenol and hydrazine, 2·naphthoquinonediazide-5 - continued a condensate of ruthenium chloride. In the condensation reaction of a phenolic compound or an alcoholic compound (mother core) and 1,2-naphthoquinonediazide xanthine, the phase is oblique to the phenolic compound or alcohol. The amount of sulfhydryl groups in the compound, using phase ♦ in the deduction of the subfield of the field is preferably 3 〇 Mo Er 0 / 〇 ~ 85 Moer % 'better than 50 Mo % % ~ 70 Mo Er Wu Er /. , 2-naphthoquinonediazide sulfonium oxime. Condensation reaction is carried out by a conventional method, in addition, as a bismuth It is also suitable to use the vinegar bond of the above-exemplified parent nucleus to change the guanamine bond to the guanamine bond. 2 2 naphthalene fct diazonium sulfonamides such as 2, 3, 4 -Triaminodiphenyl hydrazine, ',2-naphthoquinonediazide-4 sulfonamide 。. &lt;Preparation of oxirane polymer composition&gt; The siloxane polymer composition in [Sand you丨 ΓΑ ΓΑ 功 功 功 』 』 』 』 』 』 』 』 』 』 』 』 』 』 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 』 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机Prepared by mixing in the state - 〇 〉 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷 谷The concentration of the base polymerization initiation south | r is the total amount of the optional components contained as needed, and is 30% by mass or less. Preferably, it is 5 mass% to 3 〇 mass% / 〇 〇 / 〇 is 20 mass %〜28质量百分比。 In addition, the viscosity of the alumite polymer at 2 5 C is 2.0 m P a. s or more 1 〇 mp a. s 7

下^ 0 J 使S亥石夕氧烧聚合物組成物的黏度為上述範圍，兄、 膜厚均勻性，且更均衡地實現即使產生塗布不岣，。 f 以自發地均勻的程度的黏度，而且可以實現高迷2可 性。製備的該矽氧烷聚合物組成物的溶液=用塗布 0.2μηι〜0·5μΐη左右的微孔篩檢程式等過濾後使用。 杈 〈硬化膜&gt; 本發明還適合包含使用該矽氧烷聚合物組成物， 的硬化膜。本發明中所述的“硬化膜，，是使用該矽氧形成Lower ^ 0 J makes the viscosity of the composition of the S-Xi Xi oxy-fired polymer into the above range, the uniformity of the film and the film thickness, and more evenly, even if coating is not produced. f A self-sufficient degree of viscosity and a high degree of flexibility. The solution of the prepared naphthenic polymer composition is filtered by a micropore screening method or the like coated with 0.2 μηι to 0·5 μΐη.硬化 <Cured film> The present invention is also suitable for a cured film comprising the use of the siloxane polymer composition. The "hardened film" described in the present invention is formed using the helium oxygen

合物組成物形成的熱硬化物的總稱。該 I /羊^沉聚合物名且 成物可以形成透明性、耐擦傷性優異的硬化膜， 硬化膜可以在需要該耐擦傷性等以及透明性的技術用厂 中使用，例如適合作為液晶顯示元件以及觸摸面板等： 種裝置的保護膜、層間絕緣膜等使用。 &lt;硬化膜的形成方法&gt; 本發明的硬化膜的形成方法包括： (1) 邊使喷出噴嘴和基板相對移動，邊在基板上塗布 該矽氧烷聚合物組成物，形成塗膜的步驟； 土 (2) 對上述塗膜的至少一部分照射放射線的步驟·， (3) 將上述照射了放射線的塗臈顯影的步驟，以及 -42- 201213445 (4)加熱上述顯影 主犋的步驟。 以下’對各步驟佳 r牛-μ” 驟進仃，細描述。 L步驟（1)] 本步驟相當於在其 、 土坂上塗布感放射線性樹脂組成 物，形成塗膜的步驟。涂 + I現有的感放射線性樹脂組成 物時，作為其方法，可 乂知用例如喷霧法、輥塗法、旋 轉塗布法（旋塗法）、狹缝 '键塗布法（縫模塗布法）等噴出喷嘴 式塗布法、棒式塗布、喑 ^墨塗布法等適當的方法，本發 明的矽氧烷聚合物可以、力 ’又有塗布不均地高速塗布，所以 可以採用喷出噴嘴式塗右 Λ含布法。步驟（1)中的噴出噴嘴式塗 布法中，在基板的一面卜^丄 甶上形成透明導電膜，邊使喷出噴 嘴和基板相對移動，邊Α 遺:在透明導電膜上塗布該矽氧烷聚 合物組成物，然猞鲂估兔4 _ 便1乂佳為稭由預烘烤塗布面，除去[C] 有機溶劑，形成塗膜。 作為可以使用的基板，可以列舉出例如玻璃石英、 矽、树脂等。作為樹脂’可以列舉出例如聚對苯二甲酸 乙一酯、聚對苯二甲酸丁二酯、聚醚颯、聚碳酸酯、聚 醯亞胺、環狀烯烴的開環聚合物及其氫化物等。作為在 上述透明導電膜，可以列舉出由氧化錫（Sn02)形成的 NESA膜（美國ppg公司的註冊商標）、由氧化銦-氧化錫 (In2〇3_Sn〇2)形成的ITO膜等。預烘烤的條件根據各成分 的種類、混合比例等而異，較佳為在7 〇。(〕〜1 2 0 °C下進行 1分鐘〜1 0分鐘左右。 -43- 201213445 [步驟（2)] 在本步驟中，將形成的上述塗膜的至少一部分曝 光。對塗膜的一部分曝光時’通常藉由具有規定圖案的 光掩模曝光。作為曝光使用的放射線，較佳為波長在 1 9 0 n m〜4 5 0 n m的範圍的放射線’特佳為含有3 6 5 n m的紫 外線的放射線。本步驟中的曝光量是指藉由照度計（OAI model 356，OAI Optical Associates 公司製造）測定放射 線的波長為 3 6 5nm 時的強度得到的值，較佳為 500J/m2〜10,000J/m2，更佳為 l，500J/m2〜7,〇〇〇J/m2。 [步驟（3)] 在本步驟中’藉由將曝光後的塗膜顯影，除去不需 要的部分（放射線的非照射部分），形成規定的圖案。^ 為顯影步驟中使用的顯影液，較佳為鹼性的水溶液。 為驗’可以列舉出例如氫氧化鈉、氫氧化鉀、碳酸納 笮酸鈉、偏矽酸鈉、胺等無機鹼，氫氧化四甲基=' 氧化四乙基錢等四級敍鹽等。 氣 力汁，在這種 ^ 〜…^里添加曱函 乙醇等水溶性有機溶劑或界面活性劑。從得到適卷— 影性的觀點來|，驗水溶液中的驗的濃度較佳^田白 量％以上5質量％以下。作為顯影方法，：〇’1 液體堆積法(旋覆浸沒法）、浸潰法、震動浸漬法用{ 法等適當的方法。顯影時間根據該矽氧烷 / 、% 的組成而異，較佳為1〇秒〜18〇秒左右。在0言为％; 理之後，例如進行30秒〜9〇秒鐘流水洗滌後^種顯； 壓縮空氣或壓縮氮氣風乾’可以形成所例如^ 的_衆（ -44- 201213445 [步驟（4)] 在本步驟中，使用埶知 l 圖案的薄膜加熱，促進箱等加熱裝置，對形成 應，可以得到硬化物。作為：烷聚合物組成物的硬化反 l2〇〇r ^ ^ 馮本步驟中的加熱溫度例如是 20 C〜250 c。加熱時間根墟 A 媒加熱設備的種類而異，例如 在熱板上進行加熱步驟時， _ 从丄 了進仃5分鐘〜3〇分鐘；在烘 相中進行加熱步驟時，是3〇八# λ 疋3〇刀雀里〜90分鐘。還可以使用 進行兩次以上的加熱步驟的階段性烘烤法等。 這樣形成的硬化膜的膜厚較佳$ Ο」—〜—，更佳 為Ο.ίμηι〜6μιη，進一步更佳為〇 1μπι〜4μιη。 在該形成方法中，使用可以在高速塗布的同時，可 以形成膜厚均勻性優異的硬化膜的該矽氧烷聚合物組成 物。因此’即使採用喷出噴嘴式塗布法，也可以一邊防 止塗布不勻，一邊高速塗布。另外，藉由利用感放射線 性的曝光、顯影 '加熱形成圖案，可以容易地形成具有 微細且精巧的圖案的硬化膜。此外，這樣形成的作為保 護膜和層間絕緣膜的硬化膜，沒有塗布不均，具有高度 的平整性，適合用於液晶顯示元件、有機EL顯示元件等 _示元件以及觸摸面板。 [實施例] 以下，基於實施例，對本發明進行詳細描述，但本 發明並不是根據該實施例的記載而限定的解釋。 聚合物的Mw和Μη藉由下述條件進行的凝膠滲透 色譜法（GPC)測定。 裝置：GPC-101(昭和電工公司） -45- 201213445 管柱：組合 GPC-KF-801、GPC-KF-802、GPC-KF-803 和 GPC-KF-804 移動相：四氫呋喃 管柱溫度：40°C 流速：1 · 0 m L /分鐘 試樣濃度：1.0質量％ 试樣注入量：1 〇 〇 μ L 檢測器：差示折射率計 標準物質：單分散聚苯乙烯 黏度使用Ε型黏度計（東機產業公司，viscONIC ELD.R) ’測定25°C時的該矽氧烷聚合物組成物的黏度。 另外，固體成分濃度是精確秤量〇 3g的該矽氧烷聚合物 組成物到氧化鋁皿上，加入約lg的二乙二醇二甲基醚 後，在175t下在熱板上乾燥硬化6〇分鐘，從乾燥前後 的質量求得。 &lt;[A]矽氧烷聚合物&gt; [合成例1] 在具有攪拌益的容器内，加入24質量份丙二醇單甲 基崎，然後加入39質量份苯基三甲氧基石夕烧、18質量 份3-甲基丙烯醯氧基丙基三甲氧基石夕烧，加熱到溶液溫 度為60°C。溶液溫度達到6〇t後加入〇」質量份甲酸、 19貝，伤離子交換水’加熱到75°C，保持2小時。冷卻 到45 C後’加入28督·旦々、田缺田炸，达 貝里伤原甲酸甲酯作為脫水劑， 掉1小時。铁接 .± 見 …、後，使洛液溫度為4(TC，一邊保持、、w译 一邊蒸發，將u Α 付恤度’ 將水和水解縮合產生的甲醇除去。由上^ -46- 201213445 到水解縮合物（A _ 1)( MWMw/Mn = 2)(2)固體成分濃度…質量％， [合成例2] 在具有撥拌器的容器内’加人23質量 基鍵’然後加入24質 、 - ”甲 份四曱氧基錢、17f量份基錢、16質量 氧她，加熱到溶液：；：：基：細醯氧基丙基三曱 。。後，加入(Μ質量f、： “ 6°C。溶液溫度達到6。 貝里托甲酸、2 1質量份離子交換水， ::甲7?，Γ持2小時。冷卻到价後，加入3。質量 々&amp;甲酯作為脫水劑’攪拌1小時。然後，使溶液 :度為贼：-邊保持溫度一邊蒸發，將水和水：： 。產生的曱酵除去。由上，得到水解縮合物（Α·2)(固體 成分濃度=35 質量％，Mw = 2,5〇〇、Mwm)。 [合成例3 ] 在具有攪拌器的容器内’加入27質量份丙二醇單曱 ^鍵，，然後加人6質量份甲基三甲氧基钱、2G質量份 表基一甲氧基石夕烧、丨6質量份γ-縮水甘油氧基丙基三曱 氧基矽烷、15質量份3_曱基丙烯醯氧基丙基三甲氧基矽 烷，加熱到溶液溫度為6〇〇c。溶液溫度達到6〇亡後加 入〇.1質量份甲酸、16質量份離子交換水，加熱到75ec， 保持2小時。冷卻到45β(：後，加入3〇質量份原曱酸曱 酯作為脫水劑，攪拌1小時。然後，使溶液溫度為4〇它， —邊保持溫度，一邊蒸發，將水和水解縮合產生的甲醇 除去。由上，得到水解縮合物（A_3)(固體成分濃度=28質 量 ％，Mw=l，80〇、Mw/Mn = 2 〇)。 -47- 201213445 [合成例4] 在具有 基醚，然後 份苯基三甲 1 5質量份3 溶液溫度為 份曱酸、16 時。冷卻到 水劑，攪拌 持溫度，一 由上，得到 M w = 15 8 0 0 ' [合成例5] 搜拌器的容器内，加入27暂θ八 八z / .f夏份丙二醇單甲 加入16質量份甲基二甲羞 —T乳基矽烷、20質量 氧基石夕烷、6 f量份正癸基三甲氧基石夕烷、 Μ㈣三甲氧基钱，加熱到 °溶液溫度達到6〇〇C後，加人〇」質量 質量份離子交換水’加熱到75。(：，保持2小 4 5 C後’加入3 〇質量份原曱酸曱酯作為脫 1小時。然後’使溶液溫度為4(rc，一邊保 邊蒸發，將水和水解縮合產生的甲醇除去。 水解縮合物（A-4)(固體成分濃度=28質量％ ’A general term for a thermosetting product formed by a composition. The I / 羊 沉 polymer name and the product can form a cured film excellent in transparency and scratch resistance, and the cured film can be used in a technical factory that requires such scratch resistance and transparency, for example, as a liquid crystal display. Components, touch panels, etc.: Protective films, interlayer insulating films, etc. of the device are used. &lt;Method of Forming Cured Film&gt; The method for forming a cured film of the present invention includes: (1) applying a coating of a naphthenic polymer on a substrate while relatively moving the discharge nozzle and the substrate Step; soil (2) a step of irradiating at least a part of the coating film with radiation, (3) a step of developing the above-described irradiated enamel, and -42-201213445 (4) heating the developing main cymbal. The following is a detailed description of the steps of the "r-r-μ" step. L step (1)] This step is equivalent to the step of coating the radiation-sensitive resin composition on the soil and the soil to form a coating film. In the case of the conventional radiation-sensitive resin composition, it is known that the method is sprayed by, for example, a spray method, a roll coating method, a spin coating method (spin coating method), a slit 'key coating method (slot die coating method), or the like. According to a suitable method such as a nozzle coating method, a bar coating method, or an ink coating method, the neodymium oxide polymer of the present invention can be applied at a high speed and unevenly coated, so that it can be sprayed with a nozzle. In the discharge nozzle type coating method in the step (1), a transparent conductive film is formed on one side of the substrate, and the discharge nozzle and the substrate are relatively moved, while on the transparent conductive film. The composition of the siloxane polymer is coated, and then the rabbit is coated with a pre-baked coated surface to remove the [C] organic solvent to form a coating film. As a substrate that can be used, it can be enumerated. Such as glass quartz, enamel, resin, etc. as a tree Examples of the fat include, for example, polyethylene terephthalate, polybutylene terephthalate, polyether oxime, polycarbonate, polyamidimide, a ring-opening polymer of a cyclic olefin, a hydrogenated product thereof, and the like. Examples of the transparent conductive film include a NESA film formed of tin oxide (SnO 2 ) (registered trademark of ppg Corporation, USA), an ITO film formed of indium oxide-tin oxide (In 2 〇 3 _ Sn 2 ), and the like. The conditions for baking vary depending on the type of each component, the mixing ratio, etc., and are preferably 7 〇. (1) to 1 2 0 ° C for 1 minute to 10 minutes. -43- 201213445 [Step (2)] In this step, at least a part of the formed coating film is exposed. When a part of the coating film is exposed, it is usually exposed by a photomask having a predetermined pattern. The radiation used for exposure is preferably at a wavelength of 190. The radiation in the range of nm to 4 50 nm is particularly preferably a radiation containing ultraviolet rays of 365 nm. The exposure amount in this step is measured by an illuminometer (OAI model 356, manufactured by OAI Optical Associates). The intensity at a wavelength of 3 6 5 nm The value is preferably from 500 J/m 2 to 10,000 J/m 2 , more preferably from 1,500 J/m 2 to 7, and 〇〇〇 J/m 2 . [Step (3)] In this step, 'by exposure The coating film is developed to remove an unnecessary portion (non-irradiated portion of the radiation) to form a predetermined pattern. The developing solution used in the developing step is preferably an alkaline aqueous solution. , potassium hydroxide, sodium citrate sodium carbonate, sodium metasilicate, amine and other inorganic bases, tetramethyl hydroxide = 'oxidation of tetraethyl money, etc. four grades of salt, etc. Pneumatic juice, in this ^ ~ ... ^ A water-soluble organic solvent such as ethanol or a surfactant is added thereto. From the viewpoint of obtaining a suitable roll-shadow, the concentration of the test in the aqueous solution is preferably from 5% by mass to 5% by mass. As the developing method, an appropriate method such as a 〇'1 liquid deposition method (spinning immersion method), a dipping method, or a vibration immersion method is used. The development time varies depending on the composition of the decane/, %, and is preferably about 1 sec to about 18 sec. After the 0 words are %; after the treatment, for example, 30 seconds to 9 seconds of water washing after washing; compressed air or compressed nitrogen air drying 'can form a ^ for the public (-44-201213445 [step (4) In this step, the film is heated by using the pattern of the l l l pattern, and a heating device such as a box is promoted, and a hardened material can be obtained for the formation. The hardening of the alkyl polymer composition is reversed. The heating temperature is, for example, 20 C to 250 c. The heating time varies depending on the type of the heating device of the root market, for example, when the heating step is performed on a hot plate, _ from the enthalpy for 5 minutes to 3 minutes; When the heating step is carried out, it is ～90 minutes in the case of 3〇8#λ疋3〇. It is also possible to use a stepwise baking method in which two or more heating steps are performed, etc. The film thickness of the cured film thus formed is preferably Further, it is preferably Ο1μπι~4μιη. In the formation method, a cured film excellent in film thickness uniformity can be formed at the same time as high-speed coating. The siloxane polymer composition. By using the discharge nozzle coating method, it is possible to apply high-speed coating while preventing uneven coating. Further, by using radiation-sensitive exposure and development to form a pattern by heating, it is possible to easily form a fine and delicate pattern. Further, the cured film as the protective film and the interlayer insulating film thus formed has a high degree of flatness without coating unevenness, and is suitably used for a liquid crystal display element, an organic EL display element, or the like, and a touch panel. [Examples] Hereinafter, the present invention will be described in detail based on examples, but the present invention is not construed as being limited by the description of the examples. Mw and Μ of the polymer are subjected to gel permeation chromatography under the following conditions. (GPC) measurement Device: GPC-101 (Showa Denko Corporation) -45- 201213445 Pipe column: combination GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804 Mobile phase: tetrahydrofuran Column temperature: 40 ° C Flow rate: 1 · 0 m L / min Sample concentration: 1.0 mass % Sample injection amount: 1 〇〇 μ L Detector: Differential refractometer standard substance: single point The viscosity of the polystyrene was measured using a Ε-type viscometer (Toki Industries, Inc., viscONIC ELD.R) 'measuring the viscosity of the siloxane polymer composition at 25 ° C. In addition, the solid concentration was accurately measured 〇 3 g of the viscosity. The siloxane polymer composition was placed on an alumina dish, and about lg of diethylene glycol dimethyl ether was added, and then dried and hardened on a hot plate at 175 tons for 6 minutes, and the quality was obtained from before and after drying. [A] oxime polymer> [Synthesis Example 1] In a container having a stirring benefit, 24 parts by mass of propylene glycol monomethyl sulphate was added, and then 39 parts by mass of phenyltrimethoxy sulphate and 18 parts by mass were added. -Methyl propylene methoxy propyl trimethoxy zeoxime, heated to a solution temperature of 60 ° C. After the solution temperature reached 6 Torr, 〇 mass parts of formic acid, 19 Å, and wound ion exchange water were added to 75 ° C for 2 hours. After cooling to 45 C, add 28 Duan·Dan, and the field is fried, and Dabéli is used as a dehydrating agent for 1 hour. After the iron is connected, the temperature of the liquid is 4 (TC, while maintaining, and the evaporation is carried out, and the degree of u Α is paid). The water and the methanol produced by the hydrolysis condensation are removed. From ^46- 201213445 to hydrolysis condensate (A _ 1) (MWMw / Mn = 2) (2) solid content concentration ... mass%, [Synthesis Example 2] Add '23 mass base bond' in the container with the stirrer and then join 24 quality, - "A part of tetradecyloxy money, 17f parts of base money, 16 mass of oxygen her, heated to the solution:;:: base: fine methoxypropyl triterpene. After that, add (Μ mass f ,: "6 ° C. The solution temperature reached 6. Beretuic acid, 21 parts by mass of ion-exchanged water, :: A 7?, held for 2 hours. After cooling to the price, add 3. Mass 々 &amp; methyl ester Stir for 1 hour as a dehydrating agent. Then, make the solution: the degree of thief: - while maintaining the temperature while evaporating, remove the water and water:: The resulting fermentation is carried out. From above, the hydrolysis condensate (Α·2) is obtained. Solid content concentration = 35 mass%, Mw = 2, 5 Å, Mwm) [Synthesis Example 3] In a container having a stirrer, '27 parts by mass of propylene glycol monoterpene ^ bond was added, 6 parts by mass of methyltrimethoxy money, 2 g parts by mass of monomethoxy sulphur, 6 parts by mass of γ-glycidoxypropyltrimethoxy decane, 15 parts by mass of 3 fluorenyl group Propylene methoxypropyltrimethoxydecane, heated to a solution temperature of 6 ° C. After the solution temperature reached 6 〇, add 1 part by mass of formic acid, 16 parts by mass of ion-exchanged water, and heat to 75 ec for 2 hours. After cooling to 45β (:, add 3 parts by mass of decanoic acid decanoate as a dehydrating agent, stir for 1 hour. Then, let the temperature of the solution be 4 〇, while maintaining the temperature, evaporate, and condense water and hydrolysis. The methanol was removed. From the above, a hydrolysis condensate (A_3) was obtained (solid content concentration = 28% by mass, Mw = 1, 80 Å, Mw / Mn = 2 〇). -47 - 201213445 [Synthesis Example 4] Ether, then a portion of phenyltrimethylamine (5 parts by mass), a solution of decanoic acid, at a temperature of 16. The mixture is cooled to a water, stirred and held at a temperature, and one is obtained to obtain M w = 15 8 0 0 ' [Synthesis Example 5] In the container of the mixer, add 27 temporary θ eight eight z / .f summer propylene glycol monomethyl addition of 16 parts by mass methyl dimethyl shame - T-milky decane, 20-mass oxygen oxetane, 6 f parts of n-decyltrimethoxy oxalate, ruthenium (tetra)trimethoxy ketone, heated to ° solution temperature reached 6 〇〇 C, added 〇 〇 mass mass parts Ion-exchanged water 'heated to 75. (:, after keeping 2 small 4 5 C, 'add 3 parts by mass of decanoic acid decanoate as 1 hour. Then 'make the solution temperature 4 (rc, while the edge is evaporated, The methanol produced by the condensation of water and hydrolysis is removed. Hydrolyzed condensate (A-4) (solid content concentration = 28% by mass)

Mw/Mn = 2.〇)。 在具有攪拌器的容器内，加入27質量份丙二醇單甲 基醚，然後加入16質量份甲基三曱氧基矽烷、20質量 份苯基三曱氧基矽烷、6質量份三氟丙基三甲氧基矽烷、 15質量份3-曱基丙烯醯氧基丙基三甲氧基矽烷，加熱到 溶液溫度為60°C。溶液溫度達到6〇〇c後，加入〇. 1質量 伤甲酸、16質量份離子交換水，加熱到.7 $。匸，保持2小 k。冷卻到4 5 C後’加入3 0質量份原曱酸曱醋作為脫 水劑，攪拌1小時。然後，使溶液溫度為40〇C，一邊保 持溫度一邊蒸發，將水和水解縮合產生的曱醇除去。由 上’得到水解縮合物（A-5)(固體成分濃度=28質量〇/°’ Mw=1?800 &gt; Mw/Mn = 2.〇) 〇 -48- 201213445 &lt;矽氧烷聚合物組成物&gt; [實施例1 ] 、 -成例1彳于到的含水解縮合物（a _ 1)的溶液（相當 ;# θ ^ i伤水解縮合物（A-1)(固體成分）的量）中，添加 貝里伤作為[B]自由基聚合引發劑的後述（B-1)、作為[C] :機冷劑的後述(C_ 1-1)和(C-1-2)為所希望的固體成分 /辰度/tCi合0.2〇質量份作為[D]界面活性劑的後述 (D-1)’藉由孔徑〇.2μηι的微孔筛檢程式過濾，製備該矽 氧炫聚合物組成物。 [貫施例2〜1 1和比較例1 ~4] 除了各成分種類和混合量如表1所記載以外，和實 施例1同樣地操作，製備實施例2〜u和比較例1〜4的組 成物。另外’表1所示的[c]有機溶劑的數值是（C1)有機 溶劑和（C2)有機溶劑的質量。/〇 » 表1所示的實施例和比較例中使用的其他成分如下 所述。 [B]自由基聚合引發劑 B-1:乙酮- l-[9 -乙基-6-(2-曱基苯甲醯基）-9H-咔唑 -3-基]-l-(〇-乙醯基肟）（irgACURE OXE02、Ciba Specialty Chemicals 公司） B-2 : 1，2-辛二酮- l-[4-(苯基硫基）·苯基]-2-(0-苯曱 醯基肟 KIRGACURE OXEOl、Ciba Specialty Chemicals 公司） B-3 : 2-曱基-[4-(曱硫基）苯基]-2-咪啉-1-丙烷 (IRGACURE 907、Ciba Specialty Chemicals 公司） -49- 201213445 B-4 : 2-二曱基胺基-2_[(4-曱基苯基）曱基]-l-[4-(4-味 °林基）苯基）]_1_ 丁酮（jrGACURE 379EG、Ciba Specialty Chemicals 公司） [C ]有機溶劑 (Cl)有機溶劑（20。〇時蒸氣壓為0.1 mmHg以上不足Mw/Mn = 2.〇). In a vessel having a stirrer, 27 parts by mass of propylene glycol monomethyl ether was added, and then 16 parts by mass of methyltrimethoxy decane, 20 parts by mass of phenyltrimethoxy decane, and 6 parts by mass of trifluoropropyltrimethyl group were added. Oxydecane, 15 parts by mass of 3-mercaptopropenyloxypropyltrimethoxydecane, was heated to a solution temperature of 60 °C. After the solution temperature reached 6 〇〇c, add 1 mass of formic acid, 16 parts by mass of ion-exchanged water, and heat to .7 $. Hey, keep 2 small k. After cooling to 4 5 C, 30 parts by mass of ruthenium ruthenate was added as a dehydrating agent, and the mixture was stirred for 1 hour. Then, the solution was allowed to have a temperature of 40 ° C, and while evaporating while maintaining the temperature, the water and the sterol produced by the hydrolysis condensation were removed. From the above, a hydrolysis condensate (A-5) was obtained (solid content concentration = 28 mass 〇 / ° ' Mw = 1 800 &gt; Mw / Mn = 2. 〇) 〇 -48 - 201213445 &lt; oxime polymer Composition&gt; [Example 1], - a solution containing the hydrolysis-containing condensate (a _ 1) in a conventional example (corresponding; #θ^i-injury hydrolysis condensate (A-1) (solid content) In the amount), the Berry injury is added as the [B] radical polymerization initiator (B-1), and the following (C_1-1) and (C-1-2) as the [C]: machine refrigerant are The desired solid content/density/tCi and 0.2 part by mass are prepared as a [D] surfactant (D-1) described later by a microporous screening procedure of pore size 〇.2μηι to prepare the oxime polymerization. Composition. [Examples 2 to 1 and Comparative Examples 1 to 4] Examples 2 to 5 and Comparative Examples 1 to 4 were prepared in the same manner as in Example 1 except that the respective component types and mixing amounts are as shown in Table 1. Composition. Further, the values of the [c] organic solvent shown in Table 1 are the mass of the (C1) organic solvent and the (C2) organic solvent. /〇» The other components used in the examples and comparative examples shown in Table 1 are as follows. [B] Radical polymerization initiator B-1: Ethylketone-l-[9-ethyl-6-(2-mercaptobenzylidene)-9H-indazol-3-yl]-l-(〇 -Ethyl hydrazine) (irgACURE OXE02, Ciba Specialty Chemicals) B-2 : 1,2-octanedione- l-[4-(phenylthio)phenyl]-2-(0-phenylhydrazine)醯基肟KIRGACURE OXEOl, Ciba Specialty Chemicals Inc.) B-3 : 2-mercapto-[4-(indolylthio)phenyl]-2-imidoline-1-propane (IRGACURE 907, Ciba Specialty Chemicals) - 49- 201213445 B-4 : 2-Dimercaptoamino-2_[(4-mercaptophenyl)indolyl]-l-[4-(4-flamo-)-phenyl)]-1-butanone ( jrGACURE 379EG, Ciba Specialty Chemicals) [C] organic solvent (Cl) organic solvent (20. 蒸气 蒸气 vapor pressure is less than 0.1 mmHg

ImmHg的有機溶劑） C-1-1:二乙二醇乙基甲基醚（2〇°c，〇 75inmHg) C-1-2:乙二醇單 丁基醚（2〇°c，〇 76rnmHg) (C2)有機溶劑（2〇 t時蒸氣壓為ImmHg以上 20mmHg以下的有機溶劑） C-2-1 :丙二醇單曱基醚（2〇。〇，6.7mmHg) C-2-2 :丙二醇單曱基醚乙酸酯（20HC，3.75mmHg) C-2-3:環己酮（2〇°C，3.4mmHg) 比較例中使用的溶劑 1,4 -二喝烧（20°C，29mmHg) 乙二醇（2〇C ，0.08mmHg) [D] 界面活性劑 D-l :有機矽類界面活性劑（SH 8400 FLUID，Toray Corning Silicone 公司） D-2 :含氟界面活性劑（FTERGENT FTX-218，NEOS 公司） [E] 乙烯基不飽和化合物 E-1:二新戊四醇五丙稀酸酯和二新戊四醇六丙烯酸 酯的混合物（KAYARAD DPHA，日本化藥公司） E-2 :新戊四醇三丙稀酸酯（A-TMM-3LMN，新中村 化學工業公司） -50- 201213445 E-3 :琥珀酸改性的二新戊四醇五丙烯酸酯 [F ]酸產生劑或鹼產生劑 F-l : 1-(4,7-二丁氧基-1-萘基）四氫噻吩鏽三氟曱石黃 酸鹽 F-2 : 2-硝基苄基環己基胺基曱酸酯 &lt;硬化膜的形成&gt; 在55〇x65〇mm的玻璃基板上塗布六曱基二石夕氮 烷，在60°C下加熱1分鐘。使用缝模塗布器（東京應化工 業公司，TR632105-CL)，在該六甲基二矽氮烷處理後的形 成鉻膜的玻璃上塗布實施例1〜11和比較例1〜4的矽氧燒 聚合物組成物，將達到的壓力設定為1 〇 〇 P a，在真空下 除去溶劑後，進而在9 0 °C下進行2分鐘預供烤，形成·膜 厚3.〇μηι的塗膜。接著’使用曝光機（佳能公司， MPA-600FA)，以5,000J/m2的曝光量曝光。接著，藉由 〇.〇5質量％的氫氧化鉀水溶液，在25°C下顯影，藉由超 純水進行1分鐘流水洗滌，之後，藉由在230。(：的烘箱 中加熱60分鐘，形成膜厚（2.0μπι)的作為硬化膜的保護 膜。 &lt;評價&gt; 對實施例1〜1 1和比較例1〜4的矽氧烷聚合物組成 物、以及由該石夕氧院聚合物組成物形成的硬化膜，評價 下述性質。評價結果合併到表1表示。另外，對該矽氧 燒聚合物組成物的黏度和固體成分濃度由於和評價結杲 的相關性高，所以合併到表1中表示。 201213445 [塗膜的外觀] 在55〇&gt;&lt;650mm的形成鉻膜的玻璃上，使用縫模塗布 器（東京應化工業公司，TR632 1 〇5_CL):塗布實施例卜u 彳比I乂例1〜4的石夕氧院聚合物組成物，減壓到0.5 rr 燥後在熱板上，在1〇〇°C下預烘烤2分鐘，形成塗 膜，然後以2,〇〇〇J/m2的曝光量曝光，在形成鉻膜的玻璃 面形成膜厚4 μηι的膜。在鈉燈下，藉由肉眼觀察該塗 膜的外觀。此時，研究塗膜整體中的條狀不勻（塗布方向 或和其交叉的方向上的一條或多條直線不勻）、霧狀不勻 (一狀不勻）、氣孔不勻（在基板的支撑銷上的點狀不勻） 的出現情況。幾乎都沒有發現這些不勻的情形為“Α”（評 價為良好）’少量發現這些不勻的任意的情形為“Β”（評價 為略差）’清楚的看到的情形為“c，，（評價為不合格）。 [膜厚均勻性] 使用探針接觸式測定器（KLa Tencor公司，AS200) 測疋如上製造的形成隔膜的玻璃上的塗膜的膜厚。膜厚 均勻性是測定9個測定點的膜厚，從下式計算。所述的 9個測定點是假設基板的短軸方向為X，長轴方向為γ， (X[mm]、Y[mm])是（275、20)、（275、3 0)、（275、60)、 (275、100)、（275、325)、（275、550)、（275、590)、（275、 620)、（275、63 0)。膜厚均勻性為3%以下時，可以判斷 膜厚均勻性良好。 膜厚均勻性（％)={FT(X 、 Y)max.FT(x x Y)min}xl00/{2xFT(X、Y)avg_} -52- 201213445 上述式中，FT(X、Y)max是9個測定點的膜厚中的 最大值，FT(X、Y)min是9個測定點的膜厚中的最小值， FT(X、Y)avg.是9個測定點的膜厚的平均值。 [tfj速塗布性] 在550mmx650mm的無鹼玻璃基板上，使用狹縫塗 布器塗布，塗布條件是基底和喷嘴的距離i 15〇叫、曝 光後的膜厚是2.5μηι，從喷嘴喷出塗布液，噴嘴的移動 速度是120mm/S〜22〇mm/s的範圍内變化戈 液體切斷導致的條狀不句的最大速度。即二 以上的速度下，也沒有產生條狀不勻的情形可以判斷 為能夠適應高速塗布。 [透明性] 對具有如上形成的作為保護膜的硬化臈的基板，使 用分光光度計（日立製作所，丨5〇_2〇雙光束型），測定波 長40〇nm〜800nm的光線透過率（％)。以波長 400nm〜800nm的光線透過率（％)的最小值作為透明性。 s亥值為95°/〇以上時，保護膜的透明性判斷為良好。另外， 是作為層間絕緣膜的硬化膜時，該膜厚是3 〇μιη，只是 和作為保護膜的硬化膜（2. 〇|Im)的膜厚不同，所以層間絕 緣膜的透明性的δ平價和保護膜的透明性的評價同樣地判 斷。 [耐擦傷性] 對具有如上形成的作為保護膜的硬化膜的基板，使 用學振型磨耗試驗機，在鋼絲棉（#〇〇〇〇)上施加2〇〇g的 負重，重複1 〇次。肉眼確認擦傷的情況，藉由以下的基 準評價。 -53- 201213445 A :完全沒有傷痕 B :有1〜3條傷痕 C :有4〜10條傷痕 D ··有11條以上的傷痕 只要是A或B，都可以判斷為耐擦傷性良好。另外， 和透明性的評價同樣，在層間絕緣膜的情況下，由於只 是膜厚和保護膜不同，所以層間絕緣膜的耐擦傷性的評 價判斷為和保護膜的耐擦傷性的評價相同。 -54- 201213445 1比較例4 1 〇 200 1 0.20 p 〇 〇〇 U U 〇 7.88 200 ΙΛ 〇\ aa 比較例3 〇 m 0.20 12.0 35.0 U U U 6.58 yn oo u 比較例2 〇 m g S 0.20 兮· 25.5 〇 〇 U 4.23 〇 oo 00 Q 比較例1 〇 ΓΛ ο 0.20 23.4 U U 〇 4.56 〇 &lt;N O' Q 實施例11 〇 co 00 0.20 u-&gt; - ― 25.2 &lt; &lt; &lt; 5 200 00 〇\ &lt; 實施例10 〇 f&lt;1 V) 00 «η 0.20 w*&gt; - 寸· 25.3 &lt; &lt; &lt; in 00 200 oo o &lt; 實施例9 〇 00 u-j 0.20 «Λ — oq ― 25.4 &lt; &lt; &lt; 1.86 200 oo o &lt; 實施例8 〇 fN s ο 0.20 o ο 寸· 25.3 &lt; &lt; &lt; 1.88 〇 &lt;Ν oo ON CQ 實施例7 〇 (N § ο 0.20 O Ο 25.7 &lt; &lt; &lt; 1.78 200 s； CQ 實施例6 〇 m fS s ο 0.20 〇〇 25.6 &lt; &lt; &lt; 1.78 200 ε CQ 實施例5 r*» CN s 〇 0.20 S 30 25.4 &lt; &lt; &lt; oo 200 s； CQ 實施例4 〇 &lt;N o 0.30 s CC -t 25.6 &lt; &lt; &lt; 2.21 200 s； 0Q 實施例3 〇 «η s 0.20 23.5 &lt; &lt; CQ 2.35 200 s； CQ 實施例2 〇 o 0.30 V) 勺: 23.4 &lt; &lt; CQ 2.63 200 v〇 ON CQ 實施例1 〇 0.20 对· 23.2 CQ &lt; CQ 2.56 200 v〇 O' CQ &lt; Α-2 Α-3 Α-4 Α-5 Α-6 ώ fN CQ B-3 B-4 | C-l-1 C-l-2 C-2-1 'C-2-2 C-2-3 1,4-二噚烷 乙二醇 D-l D-2 ώ (Ν ώ Γ^&gt; ώ uL &lt;Ν uL 點度(mPa_s) 1 固體成分濃度(質量％) 條狀不勻 霧狀不勻 氣孔不勻 膜厚均勻性(％) 高速塗布性(mm/s) 透明性(％) 耐擦傷性 5 fS υ [Α]矽氧烷聚合 物 [B]自由基聚合 引發劑 [c]有機溶劑 [D]界面活性劑 [E]乙烯基 1不飽和化合物 [F]酸或鹼 產生劑 塗膜的外覲 組成 評價 s 201213445 從表！的結果’表明實施例1M1的該石夕氧院 組成物與比較例1〜4的矽氧烷聚合物組成物相比，塗 不勻更少，而且可以高速塗布，得到的塗膜的膜厚均 性以及外觀也良好。另外，還表明由該矽氧烷聚合物组 成物得到的作為保護膜或層間絕緣膜的硬化膜，透明性 和耐擦傷性也優異。因此，還暗示了該硬化膜作為顯示 元件或觸摸面板是有用的。 產業實用性 本發明提供沒有塗布不均，外觀優異，而且可以實 現问度平整性（膜厚均勻性）和高速塗布，且可以形成透 月I·生耐擦傷性優異的作為保護膜和層間絕緣膜的硬化 膜的矽氧烷聚合物組成物。該矽氧烷聚合物組成物為了 起到高速塗布性等效果，適合使用嘴出喷嘴式塗布法 等另外，由該矽氧烷聚合物組成物形成的硬化膜由於 :到優異的透明性、耐擦傷性，所以不僅可以在顯示元 中使用而且還適合作為觸摸面板用保護膜、層間絕 緣膜等’在成本方面也就是有利的。 【圖式簡單說明】 益 0 【主要元件符號說明】 益 〇 *»»&gt; -56-ImmHg organic solvent) C-1-1: diethylene glycol ethyl methyl ether (2〇°c, 〇75inmHg) C-1-2: ethylene glycol monobutyl ether (2〇°c, 〇76rnmHg (C2) Organic solvent (an organic solvent having a vapor pressure of 2 mmHg or more and 20 mmHg or less at 2 Torr) C-2-1: propylene glycol monodecyl ether (2 〇.〇, 6.7 mmHg) C-2-2: propylene glycol single Mercaptoether acetate (20HC, 3.75mmHg) C-2-3: cyclohexanone (2〇°C, 3.4mmHg) Solvent used in the comparative example 1,4 - two-boiled (20 ° C, 29 mmHg) Ethylene glycol (2〇C, 0.08mmHg) [D] Surfactant Dl: Organic quinone surfactant (SH 8400 FLUID, Toray Corning Silicone) D-2: Fluorinated surfactant (FTERGENT FTX-218, NEOS Company) [E] Vinyl unsaturated compound E-1: a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (KAYARAD DPHA, Nippon Kayaku Co., Ltd.) E-2: New Pentaerythritol triacrylate (A-TMM-3LMN, Xinzhongcun Chemical Industry Co., Ltd.) -50- 201213445 E-3 : Succinic acid-modified dipentaerythritol pentaacrylate [F] acid generator or base Producer Fl : 1-(4,7-dibutoxy-1-naphthyl)tetra Thiophene rust garnet phthalate F-2 : 2-nitrobenzylcyclohexylamine phthalate &lt;Formation of cured film&gt; Cobalt hexafluoride is coated on a glass substrate of 55 〇 x 65 〇 mm The decane was heated at 60 ° C for 1 minute. The tantalum oxides of Examples 1 to 11 and Comparative Examples 1 to 4 were coated on the chrome-forming glass after the hexamethyldiazane treatment using a slit die coater (Tokyo Chemical Co., Ltd., TR632105-CL). The polymer composition was fired, the pressure reached was set to 1 〇〇P a, and the solvent was removed under vacuum, and then pre-baked at 90 ° C for 2 minutes to form a coating film having a film thickness of 3. 〇μηι . Then, using an exposure machine (Canon, MPA-600FA), exposure was performed at an exposure amount of 5,000 J/m 2 . Subsequently, it was developed by a 5% by mass aqueous potassium hydroxide solution at 25 ° C, and washed with running water for 1 minute by ultrapure water, and then at 230. The film was heated in an oven for 60 minutes to form a protective film as a cured film having a film thickness of 2.0 μm. <Evaluation> The oxirane polymer compositions of Examples 1 to 1 1 and Comparative Examples 1 to 4 were used. And the cured film formed from the polymer composition of the Oxygen Institute, and the following properties were evaluated. The evaluation results are shown in Table 1. In addition, the viscosity and solid content concentration of the oxy-oxygenated polymer composition were evaluated and evaluated. The correlation of the crusting is high, so it is shown in Table 1. 201213445 [Appearance of Coating Film] On a chrome-forming glass of 55 Å &gt; 650 mm, a slot die coater (Tokyo Yinghua Industrial Co., Ltd., TR632 1 〇5_CL): coating Example 卜 彳 彳 乂 乂 乂 乂 1 1 1 1 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 聚合物 减压 减压 减压 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 聚合物 聚合物 聚合物After baking for 2 minutes, a coating film was formed, and then exposed to an exposure amount of 2, 〇〇〇J/m 2 to form a film having a film thickness of 4 μm on the glass surface on which the chromium film was formed. Under the sodium lamp, the film was observed by naked eyes. Appearance. At this time, the strip unevenness in the entire coating film was investigated (the coating direction or the direction in which it intersected) The occurrence of one or more lines is uneven, the unevenness of the mist (unevenness), the unevenness of the pores (dot unevenness on the support pins of the substrate), and almost no such unevenness is found. "Α" (evaluated as good) 'Anything in which a small amount of these unevenness was found was "Β" (evaluated as slightly worse) 'clearly seen the case as "c,, (evaluated as unqualified). Uniformity] The film thickness of the coating film on the separator-formed glass produced as described above was measured using a probe contact type measuring instrument (KLa Tencor Co., Ltd., AS200). The film thickness uniformity was measured by measuring the film thickness at nine measurement points. Calculation: The nine measurement points are assumed to be X in the short axis direction, γ in the long axis direction, and (275, 20), (275, 3 0) in (X[mm], Y[mm]). , (275, 60), (275, 100), (275, 325), (275, 550), (275, 590), (275, 620), (275, 63 0). Film thickness uniformity is 3 When the ratio is less than %, the film thickness uniformity can be judged to be good. Film thickness uniformity (%) = {FT(X, Y)max.FT(xx Y)min}xl00/{2xFT(X, Y)avg_} -52- 201213445 In the above formula, FT(X, Y) Max is the maximum value among the film thicknesses of the nine measurement points, FT(X, Y)min is the minimum value among the film thicknesses of the nine measurement points, and FT(X, Y)avg. is the film thickness of the nine measurement points. [tfj speed coating property] On a 550 mm x 650 mm alkali-free glass substrate, coating was carried out using a slit coater under the conditions of a distance between the substrate and the nozzle i 15 、, and the film thickness after exposure was 2.5 μm, from the nozzle When the coating liquid is ejected, the moving speed of the nozzle is a maximum speed of the stripe caused by the liquid cutting in the range of 120 mm/s to 22 mm/s. That is, in the case where the stripe unevenness does not occur at the speed of two or more, it can be judged that it can be adapted to the high speed coating. [Transparency] For a substrate having a hardened crucible as a protective film formed as described above, a spectrophotometer (Hitachi, Ltd., 丨5〇_2〇 double beam type) is used, and a light transmittance of 40 〇 nm to 800 nm is measured (%). ). The minimum value of the light transmittance (%) at a wavelength of 400 nm to 800 nm was used as the transparency. When the s value is 95°/〇 or more, the transparency of the protective film is judged to be good. In addition, when it is a cured film of an interlayer insulating film, the film thickness is 3 〇μιη, and is different from the film thickness of the cured film (2. 〇|Im) as a protective film, so the δ parity of the transparency of the interlayer insulating film It is judged similarly to the evaluation of the transparency of a protective film. [Scratch Resistance] For the substrate having the cured film as the protective film formed as described above, a weight of 2 〇〇g was applied to the steel wool (#〇〇〇〇) using a vibration-type abrasion tester, and repeated 1 time. . The condition of the scratch was confirmed with the naked eye and evaluated by the following criteria. -53- 201213445 A : There are no scars at all B: There are 1 to 3 scars C: There are 4 to 10 scars D ·· There are 11 or more scars As long as it is A or B, it can be judged that the scratch resistance is good. In the case of the interlayer insulating film, the evaluation of the scratch resistance of the interlayer insulating film is the same as the evaluation of the scratch resistance of the protective film. -54- 201213445 1Comparative Example 4 1 〇200 1 0.20 p 〇〇〇UU 〇7.88 200 ΙΛ 〇\ aa Comparative Example 3 〇m 0.20 12.0 35.0 UUU 6.58 yn oo u Comparative Example 2 〇mg S 0.20 兮· 25.5 〇〇 U 4.23 〇oo 00 Q Comparative Example 1 〇ΓΛ ο 0.20 23.4 UU 〇 4.56 〇 &lt;NO' Q Example 11 〇co 00 0.20 u-&gt; - ― 25.2 &lt;&lt;&lt; 5 200 00 〇\ &lt; Embodiment 10 〇f &lt;1 V) 00 «η 0.20 w*&gt; - inch · 25.3 &lt;&lt;&lt; in 00 200 oo o &lt; Example 9 〇00 uj 0.20 «Λ — oq ― 25.4 &lt; &lt &lt; 1.86 200 oo o &lt; Example 8 〇fN s ο 0.20 o ο 寸 · 25.3 &lt;&lt;&lt; 1.88 〇&lt;Ν oo ON CQ Example 7 〇(N § ο 0.20 O Ο 25.7 &lt;&lt;&lt; 1.78 200 s; CQ Example 6 〇m fS s ο 0.20 〇〇 25.6 &lt;&lt; 1.78 200 ε CQ Example 5 r*» CN s 〇0.20 S 30 25. 4 &lt;&lt;&lt;&lt; oo 200 s; CQ Example 4 〇 &lt;N o 0.30 s CC -t 25.6 &lt;&lt;&lt; 2.21 200 s; 0Q Example 3 〇«η s 0.20 23.5 &lt;&lt; CQ 2.35 200 s; CQ Example 2 〇o 0.30 V) Spoon: 23.4 &lt;&lt; CQ 2.63 200 v〇ON CQ Example 1 〇 0.20 对 · 23.2 CQ &lt; CQ 2.56 200 v〇O' CQ &lt; Α -2 Α-3 Α-4 Α-5 Α-6 ώ fN CQ B-3 B-4 | Cl-1 Cl-2 C-2-1 'C-2-2 C-2-3 1,4- Dioxane glycol Dl D-2 ώ (Ν ώ Γ^> ώ uL &lt;Ν uL Dot (mPa_s) 1 Solid content concentration (% by mass) Strip unevenness, unevenness, uneven pore size Uniformity (%) High-speed coating property (mm/s) Transparency (%) Scratch resistance 5 fS υ [Α] siloxane polymer [B] Radical polymerization initiator [c] Organic solvent [D] interface activity Agent [E] vinyl 1 unsaturated compound [F] acid or alkali generator coating film outer layer composition evaluation s 201213445 From the table! The results of 'the results show that the composition of the composition of the embodiment 1M1 is less uniform than the composition of the oxoxane polymer of Comparative Examples 1 to 4, and can be applied at a high speed to obtain a film thickness of the coating film. Uniformity and appearance are also good. Further, it has also been shown that a cured film which is a protective film or an interlayer insulating film obtained from the azoxyalkylene polymer composition is also excellent in transparency and scratch resistance. Therefore, it is also suggested that the cured film is useful as a display element or a touch panel. INDUSTRIAL APPLICABILITY The present invention provides a coating film which is excellent in appearance without uneven coating, and which can achieve flatness (thickness uniformity) and high-speed coating, and can be formed into a protective film and interlayer insulation which is excellent in vapor permeability and scratch resistance. A siloxane polymer composition of the cured film of the film. In order to achieve high-speed coating properties and the like, the siloxane polymer composition is preferably a nozzle-out nozzle coating method or the like, and the cured film formed of the siloxane polymer composition has excellent transparency and resistance. Since it is scratch-resistant, it can be used not only in a display element but also as a protective film for a touch panel, an interlayer insulating film, etc., which is advantageous in terms of cost. [Simple description of the diagram] Benefit 0 [Description of main component symbols] Benefits *»»&gt; -56-

Claims (1)

201213445 七、申請專利範圍： 1 · 一種矽氧烷聚合物組成物，其包含： [A]具有自由基反應性官能團的矽氧烷聚合物， [B ]自由基4合引發劑，以及 [C]有機溶劑， 其中，固體成分濃度為5質量％以上3 0質量0/〇以 25C時的黏度為2.〇mPa.s以上lOmPa.s以下， 壓疋（MmmHg以上不足lm 2·如申請專利範圍第1項之多 [Α]矽氧烷聚合物是水解性夺 上述水解性矽烷化合物 示的水解性矽烷化合物和 而且作為[C]有機溶劑至少包含（C1)2(TC時的蒸氣 ImmHg的有機溶劑。 矽烷化合物， g 1項之矽氧烷聚合物組成物，其巾 是水解性矽烷化合物的水解縮合物， 夕烧化合物至少包含（al)下述式（1)所 匕合物和（a2)下述式（2)所示的水解性201213445 VII. Patent Application Range: 1 · A siloxane polymer composition comprising: [A] a siloxane polymer having a radical reactive functional group, [B] a radical 4-initiator, and [C An organic solvent, wherein the solid content concentration is 5% by mass or more, 30% by mass, and the viscosity at 25 C is 2. 〇mPa.s or more and less than 10 mPa·s, and the pressure is M (MmmHg or more is less than lm 2 · as claimed In the range of the first item, the [Α] methoxyalkane polymer is hydrolyzable to the hydrolyzable decane compound represented by the above hydrolyzable decane compound and, as the [C] organic solvent, contains at least (C1) 2 (vapor ImmHg at TC) The organic solvent: a decane compound, a methoxy alkane polymer composition of g 1 , wherein the towel is a hydrolysis condensate of a hydrolyzable decane compound, and the smelting compound contains at least (al) a compound of the following formula (1) and A2) Hydrolyzability represented by the following formula (2) (R3〇krSi~&quot;f CHa^R4 式（1)中(R3〇krSi~&quot;f CHa^R4 in (1) 〜6的烷基，R2是含有 ，P是1〜3的整數，其 和r2各自獨立； 1〜6的烷基，R4是氫原 1〜的氟 2〇的烷基、碳原子數為的 基、氧基、胺基或異氰酸酯基 q是〇〜3的整數，其中，r3和r4 1 r3和：R4各自獨立。 -57- 201213445 3.如申請專利範圍第1 从貝之矽氧烷聚合物組虑铷 作為[C]有機溶劑進— 成物’其中 步含有（C2)20°C時的γ &gt; ImmHg以上20mmHe w τ )条氣壓為 S M下的有機溶劑，（C2)古灿 的含量相對於（C1)有檣、、六 ）有機溶劑 1 〇質罝％以上50質量％以下 幻〜$，為 4·如申請專利範圍第1 (ΓΛ 貝之矽氧烷聚合物組成物， (Cl)有機溶劑是由 成物其中 .^ 乙—醇乙基子基醚、二乙二醇一 7 基趟、一丙二醇- 井一乙 醚、乙二醇單丁 —醇早甲基 土 所構成的群組中選出的至少括 有機溶劑。 ]主ν —種 5. 如申清專利範圍第3 ^ ^ t(C2)^M-. 或4項之矽氧烷聚合物組成物， 八甲有機溶劑 _ «. —乙一醇二甲基驗、乙二醇單Ψ 基醚乙酸酯、乙二 私早甲 私爭乙基醚乙酸酯、乙二醇單丙其 醚乙酸酯'丙二醇坪早丙基 子早曱基醚、丙二醇單甲基醚乙酸酯、 %己酮、乙酸lT T A gt _ m 曰、曱基異丁基酮、3 _曱氧基丙酸甲 酉曰所構成的群組中 甲 甲k出的至少一種有機溶劑。 6. 如申請專利範圍 】 組成物，其中進^ 1至4項中任一項之石夕氧烧聚合物 矽類界面活性齋丨㈣有[D]由含氟界面活性劑或有機 幻所構成的群組中選出的一種以上的 面活性劑，[m灵 介 1面活性劑的含量相對於100質量份[A1 矽氧烷聚合物， ] 為0 · 0 1質量份以上2質量份以下。 7 ·如申請專利範 弟1至4項中任一項之矽氧烷聚合物 ，·且成物，其中推 一步含有[E ][ A ]石夕氧烧聚合物以外的乙 烯基不飽和化合物。 J G -58- 201213445 8. 如申請專利範圍第1至4項中任一項之矽氧烷聚合物 組成物，其中進一步含有[F]感放射線性酸產生劑或感 放射線性鹼產生劑。 9. 如申請專利範圍第1至4項中任一項之矽氧烷聚合物 組成物’其中該矽氧烷聚合物組成物用於作為顯示元 件或觸摸面板使用的保護膜或作為層間絕緣膜的硬化 族的形成。～6 alkyl, R 2 is contained, P is an integer of 1 to 3, which is independent of r 2 ; 1 to 6 alkyl, R 4 is a hydrogen atom 1 to a fluorine 2 fluorene alkyl group, and the number of carbon atoms is The group, oxy group, amine group or isocyanate group q is an integer of 〇~3, wherein r3 and r4 1 r3 and :R4 are each independently. -57- 201213445 3. If the scope of patent application is 1st, consider the [C] organic solvent as the [C] organic solvent into the product, where the step contains (C2) γ &gt; ImmHg or more at 20 °C 20mmHe w τ ) The gas pressure is an organic solvent under SM, (C2) The content of Gucan is relative to (C1), and the organic solvent is 1% 罝%% or more 50%% illusion~$, which is 4· For example, in the scope of patent application No. 1 (a sulfonate polymer composition of (b), the organic solvent of (Cl) is a product of which: ^ ethyl alcohol ethyl ether, diethylene glycol - 7 hydrazine, monopropylene glycol - At least one organic solvent selected from the group consisting of well-diethyl ether and ethylene glycol monobutyl-alcohol early methyl soil.] main ν — species 5. If the scope of patent application is 3 ^ ^ t (C2) ^ M -. or 4 of the oxirane polymer composition, octadecyl organic solvent _ «. - ethoxylated dimethyl methacrylate, ethylene glycol monodecyl ether acetate, 乙二私早甲私争ethyl ether Acetate, ethylene glycol monopropyl ether acetate 'propanediol blister early propyl mercapto ether, propylene glycol monomethyl ether acetate, % ketone, acetic acid lT At least one organic solvent derived from the group consisting of TA gt _ m 曰, decyl isobutyl ketone, and 3 _ methoxy propionate formazan. 6. As claimed in the patent composition, wherein Incorporating any of the surface activities selected from the group consisting of a fluorine-containing surfactant or an organic illusion The content of the [m Lingling 1 surfactant] is 0 to 0 1 part by mass or more and 2 parts by mass or less based on 100 parts by mass of the [A1 decane polymer]. 7 · If the patent application is 1 to 4 Any of the oxirane polymers of the present invention, wherein one step comprises a vinyl unsaturated compound other than the [E][A] oxalate-oxygenated polymer. JG-58-201213445 8. Patent application The alkane polymer composition according to any one of items 1 to 4, which further comprises a [F]roceptive ortho-acid generator or a sensitizing base generator. 9. The scope of claims 1 to 4 Any of the oxirane polymer compositions of the present invention, wherein the siloxane polymer composition is used as a display A protective film used for the element or the touch panel or a hardened family as an interlayer insulating film. (1)一邊使喷出喷嘴和基板相對移 上塗布如申請專利範圍第1至9項中 聚合物組成物，形成塗膜的舟酿.(1) A coating film is formed by moving the discharge nozzle and the substrate relative to each other as applied in the polymer composition of Items 1 to 9 of the patent application. (4)加熱上述顯影的塗膜的步驟 射放射線的步驟； 影的步驟，以及 -59- 201213445 四、指定代表圖： (一) 本案指定代表圖為：無。 (二) 本代表圖之元件符號簡單說明： 無。 五、本案若有化學式時，請揭示最能顯示發明特徵的化學式：(4) The step of heating the above-mentioned developed coating film; the step of emitting radiation; the step of shadowing, and -59-201213445 4. The designated representative figure: (1) The designated representative figure of the case is: none. (2) A brief description of the component symbols of this representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: