201206549 六、發明說明： 【發明所屬之技術領域】 本發明係關於保持用以除去例如氣體中之不純物 過濾器之過濾器箱、具備此過濾器箱之曝光 、 以使用此曝光裝置製造例如半導體元件'⑨晶顯示=用 或攝影元件等之元件製造方法。 、 【先前技術】 在用以製造例如半導體元件等電子元件（微型元件）之 微影製程中使用之曝光裝置中，為了得到高曝光精度(解像 度及定位精度等），需將照明光學系統之照明特性及投影光 學系統之成像特性維持於既定之狀態且將設置標線片（或光 罩等）、投影光學系統、以及晶圓（或玻璃板等）之空間維持 於既定之環境。因此，以往包含曝光裝置之照明光學系統 之一部分、標線片載台、投影光學系統、以及晶圓載台等 之曝光本體部設置於箱型腔室内，於此腔室内具備空調裝 置’該空調裝置係將控制成既定溫度且通過濾塵器之清淨 氣體（例如空氣）以降流方式及侧流方式供給。 又’曝光裝置中，為了對應近年之電路圖案之顯著微 細化要求，曝光用光之波長不斷變短，最近係使用KrF準 分子雷射光（波長248nm)及進一步大致為真空紫外區之ArF 準分子雷射光（波長1 93nm)作為曝光用光。在使用此種短波 長之曝光用光時，當於曝光用光所通過之空間（例如鏡筒之 内部空間）内存在微量之有機物之氣體（有機系氣體）時，曝 201206549 光用光之透射率即會降低，且有因曝光用光與有機系氣體 之反應而於透鏡元件等光學元件之表面產生霧物質之虞。 再者’最好係從供應至腔室内之氣體亦除去與塗布於晶圓 之光阻（感光材料）反應之鹼性物質之氣體（鹼系氣體）等。 因此，以往係於曝光裝置之空調裝置之氣體之擷取 部，設有用以從供給至腔室内之氣體除去有機系氣體及/ 或鹼系氣體等之複數個化學過濾器（參照例如專利文獻丨）。 [專利文獻] [專利文獻1]國際公開第2004/108252號說明書 【發明内容】 以往之曝光裝置中，在將化學過濾器設置於盒體内 時’例如將收納化學過濾器之平板狀框架以橫置（過濾器面 成為鉛直方向之面向）搬入至抵接於盒體内之側壁後，作業 ^係=該㈣沿壁相對㈣器面於法線方向移動至既 疋又置位置為止。此情形下，若於框架之端面與形成有 忒-體之通氣用開口之分隔構件之面之間有間隙:，即有包 含不純物之氣體不通過化學過濾器而經由此間隙被供給至 +光本體#之虞1此，用以將該框架正確地定位於其設 置位置之時間變長、進而使用完畢之化學過濾器之更換時 間亦變長。 τ 日再者’曝光裝置中，由於對應被要求之曝光精度之更 力:提升而增加所設置之化學過渡器之數目，因此需正確且 有效率地進行化學過濾器之更換。 201206549 本發明有鑑於上述情事’其目的在於能將過濾器之設 置以容易定位之方式進行。 根據本發明之第 過濾器，其特徵在於 δ又於6玄框架之第1把手部 架之側面之至少一部分， 態樣，提供一種過濾器箱，係保持 具備：保持該過滤器之框架；以及 ;具有形狀變化部，其設於該框 從該框架之兩個端面中一端面側 往另一端面側且變化至該框架外侧。 又，根據本發明之第2態樣，提供一種曝光裝置，係 以曝光用光經由圖案使基板曝光，其特徵在於，具備：腔 至，收納使該基板曝光之曝光本體部；本發明之至少一個 過濾器箱；以及空調裝置，將從該腔室之外部擷取之氣體 經由該過濾器箱送至該腔室内。 又，根據本發明之第3態樣，提供一種元件製造方法， 其特徵在於，包含：使用本發明之曝光裝置使感光性基板 曝光之動作；以及處理該已曝光之感光性基板之動作。 根據本發明，能將過濾器之設置以容易定位之方式進 行0 【實施方式】 以下’參照圖1〜圖6説明本發明之較佳實施形態。 圖1，係顯示本實施形態之由掃描步進機構成之掃描曝 光型曝光裝置ΕΧ之一部分切除圖。圖1中，曝光裝置Εχ 具備：產生曝光用光（曝光用照明光）EL之光源部2、以曝光 用光EL照明標線片R(光罩）之照明光學系統ILS、保持標 201206549 線片R並移動之標線片載台RST、以及將標線片R之圖案 之像投影至塗布有光阻（感光材料）之晶圓W(基板）表面之投 影光學系統PL。再者，曝光裝置EX具備保持晶圓W並移 動之晶圓載台WST、其他驅動機構及感測器類等、保管複 數片標線片之標線片庫9、保管複數片未曝光及/或曝光完 畢之晶圓之晶圓匣7、以及統籌控制曝光裝置EX之動作之 主控制裝置（未圖示）。此等之從光源部2至主控制裝置（未 圖示）之構件，設置於例如半導體元件製造工廠之潔淨室内 之第1地FL1之上面。 又’曝光裝置EX具備設置於地FL1上之箱狀之高氣密 性腔至10 ’腔室1 〇内部，例如被具有兩個開口（以擔門24r 及24W開閉）之分隔構件丨〇d區劃成曝光室丨〇a與裝載室 10b °又’於曝光室1〇a内設置有包含照明光學系統ils、 標線片載台RST、投影光學系統pL、以及晶圓載台WST之 曝光本體部4，於裝載室1〇b内設置有分別包含標線片庫9 及晶圓匣7之標線片裝載系統及晶圓裝載系統。 又，曝光裝置EX具備用以進行腔室1〇内部整體之空 調之整體空調系統。此整體空調系統，具備：設置於第^ 地FL1之地下之機械室之第2地FL2上面且具有串聯配置 之複數個化學過濾器之過濾器裝置26、具有設置於地FL2 上面之空調本體部31之空調裴置3〇、設置於曝光室上 部之大型吹出口 18、配置於收納照明光學系統ILs之副腔 室22之底面之小型吹出口观、以及配置於投影光學系統 PL附近之小型吹出σ卿。㈣器裝置％係從經由配管 201206549 25供給之空調用氣體即空氣ar 除去不純物之空氣如耸 疋之不純物，將已 軋如以前頭Al所示铿由笛,~ 空調本體部31(詳細後述）。 、，由第1官32供給至 空調裝置3〇,具備第U32、空 於地FL1之開口連結空調本體部31與腔室1G 通過5又 管35、以及配置於例如第 之内部之第2201206549 VI. TECHNOLOGICAL FIELD OF THE INVENTION [Technical Field] The present invention relates to a filter case for holding a filter such as an impurity in a gas, an exposure provided with the filter case, and the manufacture of, for example, a semiconductor element using the exposure device '9 crystal display = component manufacturing method using or photographic element. [Prior Art] In an exposure apparatus used for manufacturing a lithography process such as an electronic component (micro component) such as a semiconductor element, illumination for an illumination optical system is required in order to obtain high exposure accuracy (resolution, positioning accuracy, etc.) The characteristics and imaging characteristics of the projection optical system are maintained in a predetermined state and the space for setting the reticle (or mask, etc.), the projection optical system, and the wafer (or glass plate, etc.) is maintained in an established environment. Therefore, in the past, an exposure main body portion including an illumination optical system including an exposure device, a reticle stage, a projection optical system, and a wafer stage is provided in a box chamber, and an air conditioner is provided in the chamber. It is controlled to a predetermined temperature and is supplied by a clean gas (for example, air) of the dust filter in a downflow manner and a side flow manner. In the 'exposure device, the wavelength of the exposure light is shortened in response to the demand for refinement of the circuit pattern in recent years. Recently, KrF excimer laser light (wavelength 248 nm) and ArF excimer which is further in the vacuum ultraviolet region are used. Laser light (wavelength 1 93 nm) is used as exposure light. When such short-wavelength exposure light is used, when there is a trace amount of organic matter gas (organic gas) in the space through which the exposure light passes (for example, the internal space of the lens barrel), the transmission of light of 201206549 is exposed. The rate is lowered, and there is a possibility that a mist substance is generated on the surface of an optical element such as a lens element due to the reaction between the exposure light and the organic gas. Further, it is preferable to remove a gas (alkaline gas) which is an alkaline substance which reacts with a photoresist (photosensitive material) applied to the wafer from the gas supplied into the chamber. Therefore, the gas extraction unit of the air conditioner of the exposure apparatus is provided with a plurality of chemical filters for removing organic gas and/or alkali gas from the gas supplied into the chamber (see, for example, Patent Document丨). [Patent Document 1] [Patent Document 1] International Publication No. 2004/108252 [Invention] In the conventional exposure apparatus, when the chemical filter is placed in the casing, for example, the flat frame in which the chemical filter is housed is When the transverse direction (the surface of the filter surface is in the vertical direction) is carried into the side wall of the casing, the operation is performed until the (4) surface of the wall is moved in the normal direction to the position. In this case, if there is a gap between the end surface of the frame and the surface of the partition member in which the opening for ventilation of the crucible is formed, the gas containing the impurity is supplied to the + light through the gap without passing through the chemical filter. After the main body #1, the time for correctly positioning the frame at the set position thereof becomes longer, and the replacement time of the chemical filter that has been used is also longer. In the τ day re-exposure device, the chemical filter is replaced correctly and efficiently because the number of chemical transitions provided is increased corresponding to the required exposure accuracy: the increase. 201206549 The present invention has been made in view of the above circumstances, and its object is to enable the setting of the filter to be easily positioned. A filter according to the present invention, characterized in that δ is at least a part of a side surface of the first handle frame of the six sinuous frame, in a manner, providing a filter case which is provided with: a frame for holding the filter; And a shape changing portion provided in the frame from one end surface side to the other end surface side of the two end faces of the frame and changing to the outside of the frame. Further, according to a second aspect of the present invention, an exposure apparatus is provided which exposes a substrate by exposure light through a pattern, and includes a cavity to accommodate an exposure main body portion for exposing the substrate; at least the present invention a filter box; and an air conditioning device, wherein gas extracted from the outside of the chamber is sent to the chamber through the filter box. Further, according to a third aspect of the present invention, a method of manufacturing a device comprising: an operation of exposing a photosensitive substrate using the exposure apparatus of the present invention; and an operation of treating the exposed photosensitive substrate. According to the present invention, the filter can be set to be easily positioned. [Embodiment] Hereinafter, a preferred embodiment of the present invention will be described with reference to Figs. Fig. 1 is a partially cutaway view showing a scanning exposure type exposure apparatus comprising a scanning stepper of the embodiment. In Fig. 1, an exposure apparatus 具备 includes a light source unit 2 that generates exposure light (exposure illumination light) EL, an illumination optical system ILS that illuminates a reticle R (mask) with exposure light EL, and a holding mark 201206549 line piece. The R-moving reticle stage RST and the image of the pattern of the reticle R are projected onto the projection optical system PL on the surface of the wafer W (substrate) coated with the photoresist (photosensitive material). Further, the exposure apparatus EX includes a wafer stage WST for holding the wafer W and moving, other driving mechanisms, sensors, and the like, and a plurality of reticle banks 9 for storing a plurality of reticle sheets, and storing a plurality of sheets without exposure and/or The wafer 匣 7 of the exposed wafer and the main control device (not shown) that collectively controls the operation of the exposure device EX. The members from the light source unit 2 to the main control unit (not shown) are provided, for example, on the upper surface of the first floor FL1 in the clean room of the semiconductor element manufacturing factory. Further, the exposure apparatus EX includes a box-shaped high airtight chamber provided on the ground FL1 to the inside of the 10' chamber 1 , for example, a partition member having two openings (opening and closing with the doors 24r and 24W) 丨〇d The exposure chamber 丨〇a and the loading chamber 10b° are disposed in the exposure chamber 1A, and the exposure body portion including the illumination optical system ils, the reticle stage RST, the projection optical system pL, and the wafer stage WST is disposed. 4. A reticle loading system and a wafer loading system each including a reticle library 9 and a wafer cassette 7 are disposed in the loading chamber 1b. Further, the exposure apparatus EX is provided with an overall air conditioning system for performing an air conditioning of the entire interior of the chamber 1 . The overall air conditioning system includes a filter device 26 having a plurality of chemical filters arranged in series on the second ground FL2 of the machine room underground of the first floor FL1, and an air conditioning main body portion disposed on the ground FL2. The air conditioner of 31, the large blowout port 18 provided in the upper part of the exposure chamber, the small blower view arranged on the bottom surface of the subchamber 22 in which the illumination optical system ILs is accommodated, and the small blowout arranged in the vicinity of the projection optical system PL σ Qing. (4) The device unit % removes the air of the impurity from the air ar which is supplied by the air supply gas, which is supplied through the pipe 201206549 25, such as the impure substance, and rolls it as shown in the previous head, and the air conditioner main unit 31 (described later) . The first officer 32 is supplied to the air conditioner 3, and the U32 and the air-to-ground FL1 are connected to the air-conditioning main unit 31, the chamber 1G, and the second chamber 35, and the second, for example, the second interior.
弟S 35之途中且從於内部流動之 工虱除去鏃小粒子（微粒）之ULpA d . 過，慮器（Ultra Low penetratl〇nAir-fllter)等濾 b J 2，：} 5及配管2 5，係 使用例如不鏽鋼或氟樹脂等染 ” 年〇木切買之產生量少之材料形 成0 空調本體部31具備：控制經由第1管32供給之空氣 之溫度之溫度控制部33A、控制該空氣之濕度之濕度控制部 33B、以及將該空氣送至第2管35側之風扇馬達μ。該空 氣被控制於溫度為2()t〜赃之範圍内之例如饥，經: 第2管35及吹出口 18以降流方式供給至曝光室i〇a内部。 腔室10内部藉由此空氣之供給被設定成正壓狀態。又，第 2管35内之空氣經由分歧管35&及35b與對應之吹出口 19撕 及吹出口 19R供給至曝光室1〇&内。曝光室1〇a内之空氣 一部分亦流入裝載室1 Ob。 作為一例’流動於腔室1〇内部（曝光室1〇a)之空氣，通 過設於腔室10底面之多數個開口 45a及設於地FL1之多數 個開口 45b流至地下之排氣管44内，排氣管44内之空氣 經由未圖示之過濾器排出。此外，亦能使流至排氣管44之 空氣之全部或一部分返回至配管25側而再利用。 201206549 以下，圖l t，係與投影光學系統PL之光軸Αχ平行 地取ζ軸’在與ζ軸垂直之平面(在本實施形態中為大致水 平面）内與® 1之紙面垂直地取，與圖i之紙面平行地 取Y軸來說明。本實施形態中，掃描曝光時之標線片汉及 晶圓W之掃描方向係γ方向。又，將繞與X軸、γ軸、ζ 軸平行之軸之旋轉方向亦稱為ΘΧ、0y、方向。 首先，設置於腔室10外側之地FL1上之光源部2,具 備產生ArF準分子雷射光（波長193nm)作為曝光用光^[之 曝光光源、以及將該曝光用光EL導至照明光學系統ils之 光束送光光學系統。光源部2之曝光用光EL2射出端，係 通過腔室10之+ Y方向側面上部之開口配置於曝光室⑺a 内。此外，亦能使用KrF準分子雷射光源（波長248nm)等紫 外脈衝雷射光源、YAG雷射之諧波產生光源、固態雷射（半 導體雷射等）之諧波產生裝置、或水銀燈（丨線等）等作為曝光 光源。 又，配置於腔室10内上部之照明光學系統ILS，如例 如美國發明專利申請公開第2003/0025890號說明書等所 揭示，具備包含光學積分器等之照度均一化光學系統、標 線片遮簾、以及聚光光學系統等。照明光學系統ILS係藉 由曝光用光E L以大致均一照度照明以標線片遮簾規定之標 線片R之圖案面之於X方向細長之狹缝狀照明區域。 形成於標線片R之圖案區域中照明區域内之圖案像， 係經由兩側遠心且投影倍率万為縮小倍率（例如1/4)之投 影光學系統PL成像投影至晶圓w之表面。 201206549On the way of S 35, the ULpA d of small particles (particles) is removed from the internal flow. Filters such as Ultra Low Penetratl〇nAir-fllter b J 2,:} 5 and piping 2 5 For example, the material is produced by using a material such as stainless steel or fluororesin. The air-conditioning main body unit 31 includes a temperature control unit 33A that controls the temperature of the air supplied through the first pipe 32, and controls the air. The humidity humidity control unit 33B and the fan motor 51 that sends the air to the second tube 35. The air is controlled to a temperature of 2 () t to 赃, for example, hunger, via: 2nd tube 35 The air outlet 18 is supplied to the inside of the exposure chamber i〇a in a downflow manner. The inside of the chamber 10 is set to a positive pressure state by the supply of the air. Further, the air in the second tube 35 is passed through the branch pipes 35& and 35b. The corresponding air outlet 19 is torn and the air outlet 19R is supplied to the exposure chamber 1 〇 & a part of the air in the exposure chamber 1 〇 a also flows into the load chamber 1 Ob. As an example, 'flows inside the chamber 1 ( (exposure chamber 1 The air of 〇a) passes through a plurality of openings 45a provided in the bottom surface of the chamber 10 and A plurality of openings 45b of the ground FL1 flow into the underground exhaust pipe 44, and the air in the exhaust pipe 44 is discharged through a filter (not shown). Further, all of the air flowing to the exhaust pipe 44 or A part is returned to the side of the pipe 25 and reused. 201206549 Hereinafter, the figure lt is taken in parallel with the optical axis 投影 of the projection optical system PL, and the ζ axis 'is in a plane perpendicular to the ζ axis (in the present embodiment, a substantially horizontal plane). The Y-axis is taken perpendicularly to the plane of the paper of the sheet 1. The Y-axis is taken in parallel with the plane of the paper of Fig. i. In the present embodiment, the scanning direction of the reticle and the wafer W during scanning exposure is γ direction. The direction of rotation of the axis parallel to the X-axis, the γ-axis, and the ζ-axis is also referred to as ΘΧ, 0y, and direction. First, the light source unit 2 disposed on the ground FL1 outside the chamber 10 is provided with ArF excimer laser light (wavelength). 193 nm) is an exposure light source for exposure light and a beam light-transmitting optical system for guiding the exposure light EL to the illumination optical system ils. The light-emitting portion of the exposure light EL2 of the light source unit 2 passes through the chamber 10 + The opening in the upper side of the Y direction is disposed in the exposure chamber (7)a. In addition, it is also possible to use an ultraviolet pulse laser source such as a KrF excimer laser source (wavelength 248 nm), a harmonic generation source of a YAG laser, a harmonic generation device of a solid state laser (semiconductor laser, etc.), or a mercury lamp (丨The illuminating optical system ILS disposed in the upper portion of the chamber 10, as disclosed in, for example, the specification of the U.S. Patent Application Publication No. 2003/0025890, has illumination uniformity including an optical integrator or the like. Optical systems, reticle blinds, and concentrating optics. The illumination optical system ILS illuminates the slit-shaped illumination region which is elongated in the X direction by the exposure surface light E L with substantially uniform illumination with the pattern surface of the reticle R defined by the reticle blind. The pattern image formed in the illumination region in the pattern region of the reticle R is image-projected onto the surface of the wafer w via a projection optical system PL which is telecentric on both sides and has a magnification of magnification (e.g., 1/4). 201206549
又，於腔室10之曝光室10a内之地FL1上，透過複數 個台座11設置有下部框架12，於下部框架12之中央部固 定有平板狀之底座構件13，於底座構件13上透過例如L處 之防振台14支承有平板狀之晶圓底座WB，於晶圓底座WB 之與χγ平面平行之上面透過空氣軸承將晶圓載台wst載 置成可移動於X方向、γ方向且可旋轉於02方向。又於 下部框架12之上端，透過配置成包圍晶圓底座健之例如 三處之防振台15支承有光學系統框架16。於光學系統框架 16中央部之開口配置有投影光學系統pL，於光學系統框架 1 6上將上部框架丨7固定成包圍投影光學系統PL ^ 又於光學系統框架16底面之+ γ方向端部固定有γ 軸之雷射干涉儀21WY，於其底面之+ χ方向端部固定有χ 軸之雷射干涉儀（未圖示）。由此等干涉儀構成之晶圓干涉 儀，为別對晶圓載台WST之侧面之反射面（或移動鏡）照射 複數軸之測量用光束，以例如投影光學系統PL之側面之參 照鏡（未圖不）為基準，測量晶圓载台WST之χ方向、γ方 向之位置、以及0 x、0 y、Θ ζ方向之旋轉角，將測量值供 給至主控制裝置（未圖示）。 主控制裝置（未圖示）内之載台控制系統，係根據上述晶 圓干涉儀之測量值及自動聚焦感測器（未圖示）之測量值等 透過包含線性馬達等之驅動機構（未圖示）控制晶圓載台 WST之X方向、γ方向之位置及速度與方向之旋轉角， 且將晶圓載台WST内之Ζ载台（未圖示）控制成晶圆W之表 面對焦於投影光學系統PL之像面。又，亦設有用以進行標 ⑧ 201206549 線片R及晶圓w之對準之對準系統仙等。 另方面，於上部框架17之+ 丫 照明光學奉 _ 向上σΡ固定有收納 糸、，先ILS之gij腔室22。真士· +人 XY单’於上部框架17之與 成可宕、二乱軸承將軚線片載台RST载置 Τ疋逮移動於Υ方向且隸χ 轉。 砂勒及在θζ方向旋 於上部框架 雷射干涉儀2贈，於1上面之十乂……有¥軸 囟之+Χ方向端部固定有X舳 =干涉儀（未圖示）。由此等干涉儀構成之標線片干涉儀 :別對設於標線片載台RST之移動鏡21町等照射複數 測I用光束，以例如投影光學系統以之側面之參照 圖不）為基準，測量標線片載台WST之乂方向、γ方向兄' 置、以及θχ、θρ θζ方向之旋轉角，將測量值供给2 控制裝置（未圖示）。 ' 主控制裝置（未圖示）内之載台控制***，係根據該標線 片干涉儀之測量值等透過包含線性馬達等之驅動機構（未圖 不）控制標線片載台RST之Υ方向之速度及位置、χ方向之 位置 '以及θζ方向之旋轉角等。 又，本實施形態之曝光裝置ΕΧ為液浸型時，係從配置 於投影光學系統PL下端之光學構件之下面之包含例如環狀 嘴頭之局部液浸機構（未圖示），對投影光學系統pL前端之 光學構件與晶圓W之間之局部液浸區域供給既定之液體（純 水等）。作為該局部液浸機構’可使用例如於美國發明專利 申睛公開第20〇7/ 242247號說明書等所揭示之液浸機構。 11 201206549 此外，曝光裝置EX為乾燥型時，無需具 又’在裝載室i〇b内部，於上方之支承台67上面設置 有標線片庫9及水平多關節型機器手即標線片裝載器8。標 線片裝載Is 8 ’係通過以分隔構件1〇d之擋門24r開閉之間 口 ’在標線片庫9與標線片載台RST之間進行標線片r之 更換。 ^ 又，在裝載室i〇b内部，於下方之支承台68上面設置 有晶圓E 7與在與晶圓g 7之間進行晶圓之取出或置入之 水平多關節型機器手6a。於水平多關節型機器手以上方， 設置有與水平多關節型機器手6a 一起構成晶圓裝載器石之 晶圓搬送裝置6b。晶圓搬送裝置6b，係通過以分隔構件i〇d 之擋門24W開閉之開口在水平多關節型機器手&與晶圓載 台WST之間搬送晶圓W。 接著，在曝光裝置EX之曝光時，首先進行標線片尺及 晶圓W之對準。其後，開始對標線片R照射曝光用光el, 藉由一邊經由投影光學系統PL將標線片R之圖案之一部分 像投影至晶圓W表面之一個照射區域，一邊以投影光學系 統PL之投影倍率冷為速度比將標線片載台rst與晶圓載台 WST同步移動（同步掃描）於γ方向之掃描曝光動作，於該 照射區域轉印標線片R之圖案像。其後，反覆進行透過晶 圓載台WST將晶圓W步進移動於X方向、γ方向之動作與 上述掃描曝光動作’以步進掃描方式於晶圓w之全部照射 區域轉印標線片R之圖案像。 其次’本實施形態之曝光裝置EX，為了將照明光學系 12 201206549 先 之“、、明特性（照度均一性等）及投影光學系統之成像 特解像度等）維持於既m且將設置標線片r、投影 ::系統PL、以及晶圓w之環境氣氛(空間)維持於既定之 衣k U θ曝光精度（解像度、定位精度等）進行曝光，係如 述：備整體工調系統，該整體空調系統包含將經溫度控 月淨二氣以降流方式供給至腔室10内部之空調裝置 30 ° 味又該整體空調系統具備局部空調部。亦即，從第2 之刀歧管35b及35a分別對副腔室22底面之吹出部 19R及光學系統框架16底面之吹出部工擇供給經溫度控制 =清淨空氣。此情形下’吹出部19R及肩，分別配置於 ‘線片載台RST用之γ軸之雷射干涉儀2iry及晶圓載台 ST用之Y軸之雷射干涉儀21WY之測量用光束之光路 =吹出部19R，19W，係分別將經溫度控制之空氣以大致 均一之風速分布以降流方式（或亦可係側流方式）對測量用 :束之光路上吹出。同樣地，亦_ X軸之雷射干涉儀之測 里用光束之光路局部地供給經溫度控制之空氣。藉此，能 1由標線片干涉儀21R及晶圓干涉儀21W等高精度地測量 標線片載台RST及晶圓載台WST之位置。 又，於裝載室10b内設置有局部空調裝置6(^局部空 調裝置60具備配置於支承台68底面之小型風扇馬達61、 將=風扇馬it 61 it出之2氣供給至上部之管62、以及配置 於：線“ 9及晶圓g 7之上方之吹出口 65及Μ。管Μ 則端。P刀離至分別對吹出口 65及66供給空氣之分歧管 13 201206549 62R及62W。又，於吹出口 65及66之空氣流入口附近分 別設置有ULPA過濾器等濾塵器，於風扇馬達61附近之管 62内’設置有收納化學過濾器（用以除去既定不純物）之過 據器箱63，64。作為一例，過濾器箱63之化學過濾器係除 去有機系氣體（有機物之氣體），過濾器箱64之化學過濾器 係除去驗系氣體（鹼性物質之氣體）及酸性氣體（酸性物質之 氣體）。 在裝載室10b内使局部空調裝置6〇動作後，從風扇馬 達61送出之空氣’經由過濾器箱63，64及管62從吹出口 65及66分別以降流方式被供給至配置有標線片庫9及晶圓 匣7之空間。接著，流動於標線片庫9周圍之空氣，經由 支承。67周圍、支承台67下方之晶圓& 7周圍以及支 承台68周圍返回至風扇馬達6卜又從吹出口 ％供給至 曰曰圓匣7周圍之空氣，經由支承台⑽周圍返回至風扇馬達 61接著，返回至風扇馬達61之空氣，再次經由過遽器箱 64及濾塵器從吹出口 “，66供給至裝載室⑽内。如 此，藉由局部空調裝置6G，裝載室_内之线保持於清 其次，說明本實施形態之整體空調系統中，連結於 調裝置30之過據器裝置26之構成及作用。過濾器裝置 ；方向細長之經氣密化之箱狀盒體28、將盒體 内之空間在大致水平面内於γ方向分成四個之與灯平面 行之分隔板42A，42B，42C、與分隔板似，佩42C各 之-面㈤…+Y方向之面)緊貼而設置之η種類之 14 201206549 渡器箱38、第2種類之過遽器箱4〇、以及第i種類之過滤 器箱38。過濾器裝置26具有兩種類且三個（三段）串聯配置 之過遽器箱38, 40。以下，將第i種類之過滤器箱38亦稱 為第1過滤器箱38，將第2種類之過滤器箱4〇亦稱為第i 過濾器箱40。 本實施形態中，過濾器箱之過濾器面設置於與水平面 交叉之方向、例如過濾器箱之過濾器面設置於χζ面内。 此外，過濾器箱之過濾器面亦可設置成相對χζ面傾 斜。此情形下，只要於過濾器箱之框架設置面形成錐狀或 於盒體28之底板28h設置錐狀構件即可。 本實施形態中，將此過濾器箱之設置狀態設為橫置， 以下說明之。 進而，過濾器裝置26，具有在過濾器箱38, 4〇之*** 時或更換時，為了開啟用以取出或置入過濾器箱38,的之 窗部28b(參照圖2) ’而於盒體28在複數處透過鉸鏈機構 29h(參照圖3)可開閉地安裝之門巧。於盒體28之+丫方向 端部之第1空間之上板形成有開口 28a，於此開口 安裝 有擷取空調用空氣AR之配管25之端部，於盒體28之^ 方向側壁形成有開口 28g，於盒體28之1方向端部之第4 空間透過開口 28g連結有第1管32。 圖2係顯不已將圖1中之盒體28之門29開啟之狀熊 之過遽器裝置26。圖2中’為了說明方便，盒體28二、 29、以及分隔板42A〜42C係以兩點鍊線表示。圖2中，於 門29固定有用以在以門29關閉盒體28之窗部28b時密閉 15 201206549 窗部勘之周邊及分隔板42A〜42C之端部與 塾片46。墊片46能由耐純優異且脫氣較少之 二 鐵氟龍（杜邦公司之註冊商桿） 才枓、例如 成。 之片體、或矽橡膠之片等形 八，’於盒體28内部中，橫置成分別緊貼_γ方向端部之 为隔板42Α及+ γ方向娘部夕八 搞板42之第1過據器箱爪 L 50之開σ 5Gf(參照圖3)保持有用以除去有機系氣 雜機物之氣體）之化學過渡器51者。又，橫置成緊貼中 央^板42B之第2過渡器箱4〇 ’係於框架55之開口 (參,，、' ® 3)保持有除去氨或胺等驗性系氣體（驗性物質之 氣體）及酸性氣體（酸性物質之氣體）之化學㈣器％者。 各過濾器箱38,40之¥方向寬度為例如2〇〇〜4〇(^1^， 各過濾器箱38,40之重量為例如1〇〜2〇]^左右。 作為有機系氣體除去用之化學過濾器51，可使用例如 活***型過濾器或陶究型過濾器等。&，作為驗系氣體及 酸性氣體除去用之化學過濾器56，能使用添加劑活性碳型 過濾器、離子交換樹脂型過濾器、離子交換纖維型過濾器、 或添加劑陶瓷型過濾器等。又，框架5〇,55、分隔板42a〜 42C '盒體28、以及門29，分別由具有耐蝕性且脫氣等較 >之材料、例如於表面形成有氡化皮膜（氧化鋁等）之鋁（經 氧化處理之紹）或不鏽鋼等形成。此外，框架5〇, 55等亦能 以包含具有财触性且脫氣較少之材料（以聚乙烯覆蓋之層板 或氟系樹脂等）等形成。 此外’藉由除去有機系氣體，使腔室1〇之曝光室l〇a 201206549 内曝光用光；ET夕、 透射率提升，且藉由有機系氣體與曝光用 ，/互作用抑制形成於光學元件表面之霧物質之產 。又’藉由除去驗系氣體及酸性氣體，抑制 阻特性之轡介笙, — 之支化4 °特別是，當光阻為化學放大型光阻時， :於，中有氧或胺等驗系氣體，即有產生之酸反應而於 先阻表面形成難溶化層之虞…匕， 鹼系氣體為有效。 虱次胺等 、此=’圖1之裝載室1Gb内之過濾器箱63, 64内之化 學過濾之構成，與化學過濾器51，56之構成相同。不過， 過濾器箱63, 64較過濾器箱38, 4〇小型亦可。 又，過濾器裝置26,具有固定於盒體28之_乂方向之 側壁28i且分別將過滤器箱38, 4〇, 38定位於分隔板似， 彻，42C之定位塊48 A，48B，批、以及分別將過據器箱从 4〇, 38在Z方向中央附近對定位塊48A，4印，48c彈壓之移 動用桿58A，58B，58C。定位塊48A，48B，48C具有由分別 相對zy平面順時針以既定錐角參照圖3)傾斜之平面構 成之錐部 48Aa，48Ba，48Ca。 圖3係顯示已將圖2中之盒體28之門29關閉之狀態 之過濾器裝置26之俯視之剖面圖。不過，圖3中，形成於 盒體28之上板之空氣擷取用開口 28a係以兩點鍊線顯示。 圖3中，於分隔板42a〜42C分別形成有使通過過遽器箱 3 8，40之空氣通過之開口 42Aa，42Ba，42Ca。又，盒體28 内之空間係被分隔板42A〜42C從+Y方向依序分成四個空 間28C，28d，28e，28f，第1空間28c通過開口 28a連通於圖Further, in the floor FL1 in the exposure chamber 10a of the chamber 10, a plurality of pedestals 11 are provided with a lower frame 12, and a flat base member 13 is fixed to a central portion of the lower frame 12, for example, through the base member 13 The anti-vibration stage 14 at the L supports a flat wafer base WB, and the wafer stage wst is placed in the X direction and the γ direction through the air bearing on the wafer pedestal WB parallel to the χ γ plane. Rotate in the 02 direction. Further, at the upper end of the lower frame 12, the optical system frame 16 is supported by an anti-vibration table 15 disposed, for example, to surround the wafer base. A projection optical system pL is disposed in the opening of the central portion of the optical system frame 16, and the upper frame 丨7 is fixed to surround the projection optical system PL^ on the optical system frame 16 and is fixed at the +γ end of the bottom surface of the optical system frame 16. A laser interferometer 21WY having a gamma axis is provided with a x-axis laser interferometer (not shown) at the + χ end of the bottom surface. The wafer interferometer formed by the interferometer is configured such that the reflection surface (or the moving mirror) on the side of the wafer stage WST is irradiated with the measurement beam of the plurality of axes, for example, the reference mirror of the side of the projection optical system PL (not In the figure, the measurement of the wafer stage WST in the χ direction, the γ direction, and the rotation angles in the 0 x, 0 y, and Θ directions is performed, and the measured value is supplied to the main control unit (not shown). The stage control system in the main control unit (not shown) transmits a drive mechanism including a linear motor or the like based on the measured value of the wafer interferometer and the measured value of an autofocus sensor (not shown). The figure shows the position of the wafer stage WST in the X direction and the γ direction, and the rotation angle of the speed and direction, and controls the surface of the wafer stage WST (not shown) to the surface of the wafer W to focus on the projection. The image plane of the optical system PL. In addition, there is also an alignment system for performing alignment of the line R, 201206549, and the wafer w. On the other hand, the gij chamber 22 of the ILS is fixed to the upper frame 17 + 照明 illumination optics _ upward σ 。.真士·+人 XY single in the upper frame 17 and the Chengke 二, the two chaotic bearings will be placed on the 軚 line stage RST, and the movement will move in the Υ direction and turn around. The sander is rotated in the direction of θζ to the upper frame. The laser interferometer 2 is given, and the tenth of the upper part of the 乂 有 has a ¥ axis. The X 舳 = interferometer (not shown) is fixed at the end of the Χ direction. The reticle interferometer formed by the interferometer is not irradiated to the moving mirror 21, which is provided on the reticle stage RST, for example, for example, the projection optical system is not referred to as a side view. The reference is used to measure the rotation direction of the reticle stage WST, the gamma direction, and the rotation angles in the directions of θ χ and θ ρ θ, and supply the measured values to the 2 control device (not shown). 'The stage control system in the main control unit (not shown) controls the reticle stage RST through a drive mechanism (not shown) including a linear motor or the like based on the measured value of the reticle interferometer. The speed and position of the direction, the position of the χ direction, and the rotation angle of the θ ζ direction. Further, when the exposure apparatus according to the present embodiment is a liquid immersion type, a partial liquid immersion mechanism (not shown) including, for example, an annular nozzle disposed on the lower surface of the optical member disposed at the lower end of the projection optical system PL is used for projection optics. A local liquid (pure water, etc.) is supplied to a partial liquid immersion area between the optical member of the front end of the system pL and the wafer W. As the partial liquid immersion mechanism, a liquid immersion mechanism disclosed in, for example, the specification of the U.S. Patent Application Publication No. 20/7/242247 can be used. 11 201206549 In addition, when the exposure apparatus EX is of the dry type, it is not necessary to have the inside of the loading chamber i〇b, and the reticle magazine 9 and the horizontal articulated robot hand, that is, the reticle loading, are provided on the upper support table 67. 8. The reticle loading Is 8 ' is used to replace the reticle r between the reticle library 9 and the reticle stage RST by opening and closing the door 24r with the partition member 1 〇d. Further, inside the loading chamber i〇b, a wafer E 7 and a horizontal articulated robot hand 6a for taking out or inserting the wafer with the wafer g 7 are provided on the lower support table 68. Above the horizontal articulated robot hand, a wafer transfer device 6b constituting a wafer loader stone together with the horizontal articulated robot hand 6a is provided. The wafer transfer device 6b transfers the wafer W between the horizontal articulated robot & and the wafer stage WST through an opening that is opened and closed by the shutter 24W of the partition member i〇d. Next, at the time of exposure of the exposure apparatus EX, alignment of the reticle and the wafer W is first performed. Thereafter, the exposure light el is irradiated onto the reticle R, and a part of the pattern of the reticle R is projected onto one of the irradiation regions of the wafer W via the projection optical system PL, and the projection optical system PL is used. The projection magnification is a speed-to-speed ratio scanning operation in which the reticle stage rst and the wafer stage WST are synchronously moved (synchronously scanned) in the γ direction, and the pattern image of the reticle R is transferred in the irradiation area. Thereafter, the operation of sequentially moving the wafer W in the X direction and the γ direction through the wafer stage WST and the scanning exposure operation are repeated to transfer the reticle R to the entire irradiation area of the wafer w by the step scanning method. The pattern image. Next, in the exposure apparatus EX of the present embodiment, in order to maintain the illumination optical system 12 201206549, "characteristics (illuminance uniformity, etc.) and imaging resolution of the projection optical system, etc.), the reticle will be set. r, projection:: the system PL, and the ambient atmosphere (space) of the wafer w are maintained at a predetermined clothing k U θ exposure accuracy (resolution, positioning accuracy, etc.) for exposure, as described: the overall industrial tuning system, the whole The air conditioning system includes an air conditioner that supplies the temperature to the interior of the chamber 10 by means of a temperature-controlled moon-two gas in a downflow manner. The overall air-conditioning system has a partial air-conditioning unit, that is, from the second knife manifolds 35b and 35a, respectively. The blow-out portion 19R on the bottom surface of the sub-chamber 22 and the blow-out portion on the bottom surface of the optical system frame 16 are optionally supplied with temperature control = clean air. In this case, the blow-out portion 19R and the shoulder are respectively disposed on the wafer carrier RST. The γ-axis laser interferometer 2iry and the Y-axis laser interferometer 21WY for the wafer stage ST are used to measure the light path of the beam = the blowing portions 19R, 19W, which respectively distribute the temperature-controlled air at a substantially uniform wind speed. In the downflow mode (or in the side stream mode), the measurement is used: the beam path is blown out. Similarly, the X-axis laser interferometer is used to locally supply the temperature-controlled air by the beam path. Thereby, the position of the reticle stage RST and the wafer stage WST can be accurately measured by the reticle interferometer 21R and the wafer interferometer 21W, etc. Further, the local air conditioner 6 is provided in the load chamber 10b. (The local air conditioner 60 includes a small fan motor 61 disposed on the bottom surface of the support base 68, a tube 62 for supplying the gas generated by the fan unit to the upper portion, and a line "9" and a wafer g7. The upper outlets 65 and Μ. The tube ends, and the P-knife is separated from the manifolds 13 201206549 62R and 62W which supply air to the outlets 65 and 66, respectively, and are respectively disposed near the air inlets of the outlets 65 and 66. There is a dust filter such as a ULPA filter, and a tube box 63, 64 for accommodating a chemical filter (to remove a predetermined impurity) is provided in a tube 62 near the fan motor 61. As an example, chemical filtration of the filter box 63 Removal of organic gases (organic gases) The chemical filter of the filter case 64 removes the gas (the gas of the alkaline substance) and the acid gas (the gas of the acidic substance). After the local air conditioner 6 is operated in the load chamber 10b, it is sent out from the fan motor 61. The air "is supplied to the space in which the reticle library 9 and the wafer cassette 7 are disposed from the air outlets 65 and 66 through the filter boxes 63, 64 and the tubes 62, respectively. Then, the air flows through the reticle library 9 The surrounding air passes through the support 67. Around the wafer & 7 under the support table 67 and around the support table 68, the air is returned to the fan motor 6 and is supplied from the blowout port % to the air around the dome 7 via the support. The periphery of the stage (10) is returned to the fan motor 61. Then, the air returned to the fan motor 61 is again supplied to the loading chamber (10) from the air outlet ", 66 via the buffer box 64 and the dust filter. As a result, the local air conditioner 6G maintains the line in the load compartment_clear. Next, the configuration and operation of the passer device 26 connected to the adjustment device 30 in the overall air conditioning system of the present embodiment will be described. a filter device; a directionally elongated, airtight box-like casing 28, dividing the space in the casing into four in the gamma direction in a substantially horizontal plane, and separating the plates 42A, 42B, 42C from the lamp plane row, and The sub-separator is similar to the η type of the singularity of the surface of the slabs of the slabs of the spurs of the spurs of the spurs of the syllabus. Filter box 38. The filter unit 26 has two types and three (three-stage) series arrangement of buffer boxes 38, 40. Hereinafter, the filter case 38 of the i-th type is also referred to as a first filter case 38, and the filter case 4 of the second type is also referred to as an i-th filter case 40. In the present embodiment, the filter surface of the filter case is disposed in a direction crossing the horizontal plane, for example, the filter surface of the filter case is disposed in the surface of the filter. In addition, the filter face of the filter box may also be arranged to tilt relative to the face. In this case, it is sufficient to form a tapered member on the frame installation surface of the filter case or a tapered member on the bottom plate 28h of the casing 28. In the present embodiment, the installation state of the filter case is set to be horizontal, which will be described below. Further, the filter device 26 has a window portion 28b (see Fig. 2) for opening or inserting the filter case 38 when the filter case 38, 4 is inserted or replaced. The body 28 is openably and closably mounted at a plurality of places by a hinge mechanism 29h (refer to FIG. 3). An opening 28a is formed in the upper space of the first space of the end portion of the casing 28 in the + direction, and an end portion of the pipe 25 for drawing the air-conditioning air AR is attached to the opening, and the side wall of the casing 28 is formed in the side wall. The opening 28g is connected to the first tube 32 through the fourth space transmission opening 28g at the one end portion of the casing 28 in one direction. Fig. 2 shows the bridging device 26 of the bear that has not opened the door 29 of the casing 28 of Fig. 1. In Fig. 2', for convenience of explanation, the cartridges 28, 29, and the partition plates 42A to 42C are indicated by two-dot chain lines. In Fig. 2, the door 29 is fixed to seal the periphery of the window portion and the end portions of the partition plates 42A to 42C and the cymbal 46 when the window portion 28b of the casing 28 is closed by the door 29. The gasket 46 can be made of, for example, a Teflon (a registrar bar of DuPont) which is excellent in purity and degassing. The sheet body, or the sheet of the rubber sheet, is shaped as "eight" in the interior of the box body 28, and is placed transversely to the end portion of the _γ direction, which is the partition 42 Α and the + γ direction of the 娘 夕 八 八 板 42 1 The chemical transition device 51 of the opener σ 5Gf (see FIG. 3) of the actuator box claw L 50 is held to remove the gas of the organic gas. Further, the second transition box 4'' placed transversely to the center plate 42B is attached to the opening of the frame 55 (see, ', 3') to retain an inert gas such as ammonia or amine (inspective substance) The gas () gas) and the acid (gas) gas chemical (four) device%. The direction width of each of the filter boxes 38 and 40 is, for example, 2 〇〇 to 4 〇 (^1^, and the weight of each of the filter boxes 38 and 40 is, for example, about 1 〇 to 2 〇). For the chemical filter 51, for example, an active slave filter or a ceramic filter can be used. As the chemical filter 56 for the gas and acid gas removal, an additive activated carbon filter or ion can be used. Exchange resin type filter, ion exchange fiber type filter, or additive ceramic type filter, etc. Further, the frame 5, 55, the partition plates 42a to 42C 'the case 28, and the door 29 are respectively made of corrosion resistance and A material such as degassing or the like, for example, aluminum having a deuterated film (alumina or the like) formed on the surface (oxidized) or stainless steel, etc. Further, the frame 5, 55, etc. can also be included It is formed of a material that is less inductively and degassed (a layer covered with polyethylene or a fluorine-based resin, etc.). Further, by removing the organic gas, the exposure chamber of the chamber 1 is exposed to 201206549. Light; ET eve, increased transmittance, and by organic gases and For exposure, / interaction suppresses the production of mist material formed on the surface of the optical element. In addition, by removing the test gas and acid gas, the barrier property is suppressed, and the branching is 4 °, especially when the photoresist is In the case of a chemically amplified photoresist, an oxygen-based or amine-based gas, that is, an acid reaction which occurs to form an insoluble layer on the surface of the first resistance, 碱, an alkali gas is effective. The configuration of the chemical filter in the filter boxes 63, 64 in the loading chamber 1Gb of Fig. 1 is the same as that of the chemical filters 51, 56. However, the filter boxes 63, 64 are smaller than the filter box 38. Further, the filter device 26 has a side wall 28i fixed in the 乂 direction of the casing 28 and positions the filter boxes 38, 4, 38, respectively, on the partition plate, and the 42C Positioning blocks 48 A, 48B, batches, and moving rods 58A, 58B, 58C for respectively positioning the block 48A, 4, 48c in the vicinity of the center of the Z direction from the center of the Z direction, 38. 48B, 48C have a tapered portion 48 formed by a plane inclined with respect to the zy plane clockwise at a predetermined taper angle with reference to FIG. 3). Aa, 48Ba, 48Ca. Fig. 3 is a plan sectional view showing the filter device 26 in a state in which the door 29 of the casing 28 of Fig. 2 has been closed. However, in Fig. 3, the air intake opening 28a formed in the upper plate of the casing 28 is shown by a two-dot chain line. In Fig. 3, openings 42Aa, 42Ba, and 42Ca through which the air passing through the buffer boxes 38, 40 pass are formed in the partition plates 42a to 42C, respectively. Further, the space in the casing 28 is divided into four spaces 28C, 28d, 28e, 28f from the +Y direction by the partition plates 42A to 42C, and the first space 28c is connected to the figure through the opening 28a.
S 17 201206549 1之配管25,第4空間28f通過開口 28g連通於圖！之第j 官32。進而，定位塊48A〜48C之錐部48Aa〜48Ca之錐角 ⑽等，錐“為例如〜，作為一例，二角 為 30。。 又，彼此相同構成之移動用桿58A，58B, 58C被連結成 可相對分別固定於分隔板42B，42C及盒體28之+丫方向侧 壁之支點構件59A，59B，59C繞與Z軸平行之軸（0Z方向） 旋轉。作為一例，移動用# 58A &有能旋轉地連結於支點 冓牛A之# 58A1、固定於桿58A1前端部之各過濾器箱 38側及與此相反之側之半球狀抵接構件59a2及把手58A3。 J次’參照從圖2之分隔板42A& 42B側分別觀看過 濾器箱38及40時之立體圖即圖4(A)及圖4(b),說明過濾 器箱38及40之構成。圖4⑷及圖叫）中之正交座標系統 (X’ y’ z)係分別表示過濾器箱38及4〇在過遽器裝置_ 設置於作為目標之位置之狀態之座標系統。 如® 4(A)所示’第1過據器箱38具有於中央部設有大 方形開口 50f之大致環狀框架5〇、保持於開口 内 之化學過據器51、以及固定於框架5〇之一對凸狀把手部 70A。塾片54之材料與塾片之材料相同。 再者，本實施形態中，於框架5〇之與χζ平行之_γ方 〇第1端面5〇a ’ 5又有藉接著等固定成包圍開口 50f之大 =正方形環狀墊片54(密封構件）。此外，塾片⑷亦可設於 第1端© 50a所緊貼之對象側（例如分隔板）。 此外，f 1過滤器箱38之開口 5〇f亦可係四角形等矩 ⑧ 18 201206549 形或多角形。又 長方形或多角形 框架50之形狀亦不限於正方形，亦可係 产又，過濾器箱38 ’於框架50之四個側面中_χ方向側 第側面及+Χ方向側之第2側面全面，分別具有對稱之 第1錐部50b及第2錐部50c，該第i錐部5〇b及第2雖部 50c由形成為從框架50之與xz平行之外方向之第2端面 5〇g往第1端面50“則傾斜至框架5〇外側之平面所構成。 第2側面係隔著化學過濾器56(或框架π之開口 與 第1側面相反側之面。第i錐部通相對ζγ平面順時針以 錐角0傾斜1 2錐部…相對ζγ平面逆時針以錐角必傾 錐角必與圖3之定位塊48Α〜48C之錐部48Aa〜48Ca 之錐角相等。因此，圖3中’當設相對框架5〇之端面 之第1錐冑50b所構成之角度為α時，角度“與錐 之 和為90。。 圖4(A)中，於框架5〇之第i錐部5〇b之從中央部往ζ 方向偏移之位置固定有把手部7GA，於框架5()之第2錐部 50。之從中央部往+Z方向偏移之位置固定有把手部7〇A。 亦即，相對框架50巾心，一對把手部7〇A位於大致點對稱 之位置。又，框架50之_z方向及+z方向之第3側面及第4 側面係分別與χγ平面平行之設置面5〇(1及5〇e。 將過濾is箱38之框架50之設置面5〇d載置於盒體Μ 之第3空帛28e之底板28h上面，如圖3所示，使框架w 之第1錐部50b接觸於定位塊48 A之錐部48Aa，且框架π 之力而面50a透過墊片54緊貼於分隔板42A之狀態，係第3 201206549 空間28e内之過濾器箱38之設置位置Q1。過濾器箱3 8因 橫置而藉由自重穩定靜止。此情形下，由於於定位塊48A 之錐部48Aa之與把手部70A對向之位置形成有凹部 48Ab ’因此即使有把手部7〇A亦可將第1錐部5〇b緊貼於 錐部48Aa。 同樣地，在盒體28之第1空間28c内之設置位置q3， 過濾器箱38之框架50之設置面50d載置於底板28h之上 面，框架50之第1錐部50b接觸定位塊48C之錐部48Ca， 且端面50a透過墊片54緊貼於分隔板42C。又，設於第i 錐部50b之把手部70A收納於定位塊48C之錐部48Ca之凹 部48Cb内。 再者，過濾器箱38，由於在卸除一對把手部7〇A之狀 態下，即使繞與Y軸平行之軸（0 y方向）旋轉丨8〇。形狀亦相 同’因此亦能將框架50之另一設置面5〇e載置於盒體28 之底板28h上《如上述將設置面50e載置於底板28h上時， 由於框架50之第2錐部50c接觸定位塊48A(48C)之錐部 48Aa(48Ca) ’設於第2錐部50c之把手部7〇A收納於凹部 48Ab(48Cb)内，因此過濾器箱38能正確地設置於設置位置 Q1 或 Q3。 如圖4(B)所示，第2過濾器箱4〇具有與框架5〇相同 形狀之於中央部設有開口 55f之大致環狀框架55、保持於 開口 55f内之化學過濾器56。又，過濾器箱4〇，於框架55 之-X方向側之側面及+X方向側之側面全面，分別具有第i 錐部55b及第2錐部55c，該第1錐部55b及第2錐部5丸 ⑧ 20 201206549 對稱地形成為從+Y方向之第2端面55g往-Y方向之第1 端面55a側以錐角0傾斜至框架55外側。第2過濾器箱40 與第1過濾器箱38同樣地，亦可於框架55之_丫方向之第 1端面55a將墊片54固定成包圍開口 。又，第2過濾器 粕40之開口 55f亦與第i過濾器箱π同樣地，可係四角形 等矩开^或夕角形。又，框架55之形狀亦不限於正方形，亦 可係長方形或多角形。 此外’框架5〇, 55可藉由例如模成形等來製造。 再者’過遽器箱40 ’具有固定於從第1錐部55b之中 央往+Z方向偏移之位置、以及與此位置在框架乃中心大致 點對稱之第2錐部55c上之位置之—對把手部細。又，框 木55之Z方向及+z方向之側面分別係設置面55d及η。。 本實施形態令，帛i過濾器箱38及第2過遽器箱4〇 之形狀之相異點在於’各自之__對把手部观&細之位 置沿Z方向偏移於相反方向。又，此形狀之相異，即使將 過據器箱38’ 40往^方向旋轉18〇。亦被維持。因此，作 業者可容易地從外觀互相辨別過濾器肖38, 4〇。進而，圖 1(A)之框架50之一對把手部观例如被以螺栓(未圖示)固 疋於錐部50b，50c之螺礼’於從錐部_，5〇c中心在與把 手部7〇A對稱於Z方向之位置設定有安裝區域e开; 有能安裝把手部70A之螺孔）。因此，—對 邛50b，50a之安裝位置，係沿與傾斜方向相里之方 太 :施形態中係沿相對傾斜方向正交之方向為；變。因此， 藉由將把手部70A安裝於框架50之安裝 ， ; 场* b1，E2，框架 21 201206549 50可作為第2過渡器箱4〇用之框架55使用。 同樣地’圖4(B)中，—對把手部则對框架55之錐部 別，55a之安裝位置，係沿在與安裝區域e3, ^之間無傾 斜之方向為可變。因此’藉由將把手#雇安裝於框架Μ 之安裝㈣E3, E4’框架55可作為第1過滤器箱38用之 框架50使用。 將過濾器箱40之框架55之設置面55d載置於盒體μ 之第2空fa’ 28d之底板28h上面，如圖3所示，使框架55 之第1錐部55b接觸於定位塊48A之錐部48Ba，且框架 之端面55a透過墊片54緊貼於分隔板42B之狀態，係第2 =間28d内之過濾器箱40之設置位置Q2。過濾器箱4〇因 柷置而藉由自重穩定靜止。此情形下，由於於定位塊 之錐部48Ba之與把手部观對向之位置形成有凹部4嶋， 因此即使有把手部70B亦可將第1錐部55b緊貼於錐部 48Ba。 再者，過濾器箱40亦同樣地，由於即使繞0 y方向旋 轉1 80形狀亦相同’因此亦能在卸除一對把手部7〇a之狀 態下，將框架55之另一設置面55e載置於盒體28之底板 28h上《如上述將設置面55e載置於底板28h上時，由於框 未55之第2錐部55c接觸定位塊48B之錐部48Ba，設於第 2錐部55c之把手部70B收納於凹部48Bb内，因此過遽器 箱40能正確地設置於設置位置q2。 此外，如圖2所示’定位塊48C之凹部48Cb之位置係 配合把手部70A而位於較低位置（定位塊48A之凹部48Ab 22 201206549 亦相同）’疋位塊48B之凹部48Bb之位置係配合把手部7〇B 而位於較高位置。因此，若欲將第2過濾器箱40設置於空 間28c或28e内之設置位置Q3或Q1，由於過濾器箱4〇之 把手部70B會與定位塊48C或48A之錐部48Ca或48Aa機 械干涉，因此能防止誤將過濾器箱4〇設置於設置位置Q3, Q1。同樣地，若欲將第1過濾器箱38設置於空間28d内之 3又置位置Q2，由於過濾器箱3 8之把手部70A會與定位塊 48B之錐部48Ba機械干涉，因此能防止誤將過濾器箱38 設置於設置位置Q2。如上述，根據本實施形態，過濾器箱 38之把手部70A之位置與過濾器箱4〇之把手部70B之位 置相異，且對應之盒體28内之定位塊48A，480之凹部48Aa， 48Ca之位置與定位塊48B之凹部48Bb之位置相異。因此， 月&防止於分隔板42A，42C前面設置具有化學過濾器56(用 以除去鹼系氣體及酸性氣體）之過濾器箱4〇,相反地，防止 於分隔板42B之前面設置具有化學過濾器5丨（用以除去有機 系氣體）之過濾器箱38。， 接著，圖3中，於分隔板42A, 42B，42C之前面之設置 位置Ql，Q2, Q3分別設置過濾器箱38, 40, 38後，以移動用 桿58A，58B，58C將各過濾器箱38, 4〇, 38彈壓於分隔板42八， 42B，42C，在盒體28之門29被關閉之狀態下，藉由定位塊 48入〜480及移動用桿58八〜58(：，使分隔板42八〜42(：與過 濾器箱38, 40之框架50, 55之間之氣密性被墊片54維持得 較高。此結果，盒體28之形成有開口 28a之上板與分隔板 42C所夾之第1空間28c内之氣體，必定在通過過濾器箱 23 201206549 38之化學過濾器51後，通過開口 42Ca，流入以分隔板42B 及42C所夾之第2空間28d »同樣地，空間28d内之氣體， 必定在通過過濾器箱40之化學過濾器56後，通過開口 42Ba ’流入以分隔板42A及42B所夾之第3空間28e。同 樣地，空間28e内之氣體，必定在通過過濾器箱38之化學 過濾器51後，通過開口 42Aa、分隔板42A背面之第4空 間28f、盒體28之側壁之開口 28g，流至圖2之第1管32。 因此’由於從盒體28之+Y方向之上部之開口 28a流入之空 氣AR，必定通過兩個（兩段）之有機系氣體除去用之過濾器 箱38及一個（一段）之鹼系氣體及酸性氣體除去用之過濾器 箱40而供給至圖1之空調裝置3〇，因此腔室1〇内被供給 已高度除去不純物之空氣。 其次’參照圖5(A)〜圖6(B)說明過濾器箱38，4〇對盒 體28之設置動作及更換動作。圖5(A)〜圖6(B)，分別係以 剖面表示盒體28之過濾器裝置26之俯視圖。 首先’於盒體28最初設置兩個過濾器箱38及一個過 濾器箱3 8時’準備圖4(A)之填充有未使用之化學過濾器5 J 之兩個過濾器箱38、以及圖4(B)之填充有未使用之化學過 濾器56之一個過濾器箱40。其次，在解除盒體28之鎖固（未 圖示）而開啟門29後，如圖5(A)中箭頭B1所示將移動用桿 58A〜58C往前方（盒體28之窗部28b之外側）開啟。 其次，作業者抓持第一個過濾器箱38之把手部7〇A， 將過遽器箱38(框架50)之設置面50d載置於盒體28之第3 空間28e内之底板28h(參照圖2)上。接著，作業者如以箭 24 201206549 頭B2所示，將過據器箱％壓入第3空間28e内。其次， 如圖5⑻中箭頭B3所示，作業者使過濾器箱w之第1雜 部娜卡合（接觸）於定位塊似之錐部48Aa。過據器箱38 之一把手部70A收納於定位塊似之凹部48Ab内。接著， 如以箭頭B4所示’將移動用桿58A㈣於㈣器箱38之 第2錐一 5〇C。其次’作業者如圖6(A)中箭頭B5所示，使 移動用桿58A進-步旋轉’而將過濾器箱38往-X方向及_γ 方向彈壓。藉此，如以箭頭Β6所示，過濾器箱38移動至 盒體28之設置位置Q1，過遽器箱38(框架50)之端面遍 經由墊片54緊貼於分隔板42A。此外，亦可在過滤器箱％ 之墊片54接觸於分隔板42A之狀態下，使移動用桿“A壓 抵於過濾器箱38之第2錐部50c後，使移動用桿58A進一 步旋轉。 作業者其次抓持第二個過濾器箱4〇之把手部7〇b，將 過濾器箱40(框架55)之設置面5兄載置於盒體28之第2空 間28d内之底板28h上。接著，作業者如以箭頭B7所示， 將過濾器箱40壓入盒體28之第2空間28d内。其次，作 業者如圖6(B)所示，使過濾器箱4〇之第i錐部5几卡合（接 觸）於定位塊48B之錐部48Ba，將移動用桿58B壓抵於過濾 器箱40之第2錐部55c。過濾器箱4〇之一把手部7〇B收納 於定位塊48B之凹部48Bb内。 其次，作業者如箭頭B8所示，使移動用桿58B進一步 方疋轉如以箭頭B9所示’使過遽器箱4〇移動至盒體28内 之設置位置Q2。藉此，過濾器箱4〇(框架55)之端面5元經 25 201206549 由塾片54緊貼於分隔板42B。此外，亦可在過渡器箱40 之墊片54接觸於分隔板42B之狀態下，使移動用桿5 8B壓 抵於過濾器箱40之第2錐部55c後，使移動用桿58B進一 步旋轉。 其次如箭頭B10所示，在盒體28之第1空間28c内 移動第三個過濾器箱38 ’使移動用桿5 8C旋轉而將過濾器 箱38設置於第1空間28c内之設置位置。其次，關閉盒體 28之門29而鎖固，藉此過濾器箱38, 4〇之設置即結束。 此時’將過濾器箱38(40)之第1錐部50b(55b)壓抵於定 位塊48A(48B)之錐部48Aa(48Ba)而僅彈壓過滤器箱 38(40)’過濾器箱38(4〇)即短時間設置於分隔板42Α(42β) 月'J面之設置位置Q 1 (Q2)。因此’能以有效率地且容易地定 位之方式進行過濾器箱38(4〇)、進而此内部之化學過濾器 5 1 (56)對作為目標之位置之設置。 其次’在進行盒體28内之過濾器箱38, 40之更換時， 首先作業者係解除盒體28之鎖固而開啟門29，而如圖6(B) 以箭頭ϋΐ所示將移動用桿58C從過濾器箱38卸除。其次， 作業者抓持第1空間28c内之過濾器箱38之把手部7〇A ’ 並如以箭頭D2所示搬出過濾器箱38。其次，如圖6(A)以 箭頭D3所示將移動用桿58B從過濾器箱％卸除後，作業 者抓持第2空間28d内之過濾器箱40之把手部70B，並將 過渡器箱40之第！錐部奶沿定位塊48b之錐部4他往 前方移動。其次’作業者如以箭頭D4所示將過渡器箱4〇 從盒體28之第2空間28d拔出。 ⑧ 26 201206549 其次’如圖5(B)以箭頭〇5所示將移動用桿58a從過遽 器箱38卸除後，作業者抓持第3空間…内之過遽器箱π 之把手部70A，並將把手部7qa拉往以箭頭如所示方向。 2此’如以箭頭D7所示，過滤器箱38之第丨錐部働沿 疋位塊48A之錐部48Aa往前方移動。其次，作業者如圖 5(A)以箭頭D8所示將過濾器箱38從盒體28之第3空間Μ。 拔出。 其次，藉由與上述過濾器箱38, 40之設置動作相同之 步驟，作業者將新的過濾器箱38, 4〇設置於盒體28内之作 為目標之位置。其次，藉由關閉盒體28之門29而鎖固， 結束過濾器箱38, 40之更換。 此時，過濾器箱38, 40由於能從設置位置容易地拔出， 因此能容易且有效率地進行盒體28中之過濾器箱38, 4〇之 更換。 本實施形態之效果等如下所述。 (1)本實施形態之曝光裝置EX具備包含過濾器裝置26 及空調裝置30之整體空調系統，過濾器裝置26係具備兩 個第1過濾器箱38及一個第2過濾器箱40。 接著，保持化學過濾器5 1之第1過濾器箱38，具有保 持化學過濾器51之框架50 ;設於框架50之把手部（第1把 手部）·’以及形成於框架50之側面之至少一部分，從框架 50之第2端面5〇g往第1端面50a側逐漸傾斜至框架50外 側之第1錐部50b (作為形狀變化部之第1傾斜部）。又，第 2過濾器箱4〇亦同樣地構成，於過濾器箱40之樞架5 5設 27 201206549 有第1錐部55b。 進而，於框架50之兩個端面中之第i端面5〇a設有墊 片54(密封構件）。 根據本實施形態，於收納過濾器箱38, 40之盒體28内 之設置位置附近’設有定位塊48A，48B，該定位塊48A，48B 設㈣第i錐部50b，55b相同傾斜角之錐部48心，4伽。 接著’藉由彈壓（移動）框架5〇, 55以使框架5〇, 55之第i 錐j 50b，55b沿盒體28之錐部48Aa，48Ba移動，而能以有 效率 '及容易定位之方式進行過濾器箱38, 40(化學過濾器 ，6)對皿體28内之目標位置之設置。換言之，過濾器箱 % 40之第i錐部，汾能發揮移動及定位之兩個功能。 () 第1過;慮器相38具有第2錐部5〇c，，該第2 錐部5〇c形成於隔著化學過濾器51與框架％之第丨側面為 相反側之第2側面，㈣2端面5()g往第丨端面_側與第 1錐部_對稱地逐漸傾斜至框架5G外側。同樣地第2 過據器箱40亦具有於框架55與第丄錐部说對稱形成之 第2錐部5 5 c。 是以，即使使過濾器箱38, 40旋轉18〇。，亦能使框架 5〇, 55之第2錐部5〇c，55c沿盒體28之錐部輪，4心移 動’藉此能有效率地進行過德器箱38,40(化學過滤器51,56) 對盒體28内之目標位置之設置。 (3)又’框架50之第i錐部5〇b及第2錐部5〇c形成於 框架50之第i側面及第2側面全面，框架”之第1錐部 说及第2錐部55c形成於框架55之第^面及第2側面 ⑧ 28 201206549 全面。因此，錐部50b，50c等之加工係容易。 此外，錐部5〇b，5〇c亦可僅形成於框架5〇之第}側面 及第2側面之-部分。此情形下，亦可在盒體⑴則之對應 定位塊48A，48C，僅於與錐部5〇b對應之部分形成錐部。 此點錐部5 5 b，5 5 c亦相同。 (4) 又，由於過濾器箱38(框架5〇)之錐部5〇b，5〇c及過 渡器箱40(框架55)之錐部55b，55e分別形成為平面、亦即 直線狀，與此等對應之定位塊48A，48B之錐部48Aa，48仏 亦形成為平面，因此錐部50b，5〇c等之形成係容易。 然而，亦可將錐部50b，50c及錐部55b，55c形成為凸 或凹之球面狀、亦即曲線狀。此情形下，藉由與此等對應 之定位塊48A，48B之錐部48Aa，48Ba形成為凹或凸之球面 狀’.而能與上述實施形態同樣地使用定位塊48A，48B進行 過濾器箱38, 40之移動及定位。 (5) 又’設於圖4(A)之過濾器箱38之框架5〇之乂方向 之第1侧面之凸把手部70A(第i把手部）係設於第i錐部 50b，於與此對應之盒體28内之定位塊48A之錐部48八玨設 有把手部70A能通過之凹部48Ab。因此，即使有把手部7〇a 亦能使框架50之第1錐部50b緊貼於定位塊48A之錐部 48Aa而移動。此點關於過濾器箱4〇之第1錐部55b之把手 部70B(第2把手部）亦相同。 (6) 又’設於圖4(A)之過濾器箱38之框架50之+X方向 第2側面之凸把手部7〇A(第2把手部）係設於第2錐部5〇〇 ,，.此情形下，由於有兩個把手部7〇A，因此過濾器箱38之搬 29 201206549 送係容易’且即使使過濾器箱38旋轉18〇。，亦能使框架 5〇之第2錐部50c緊貼於定位塊48A之錐部48Aa而移動。 此點關於過濾器箱40之第2錐部55c之把手部7〇B亦相同。 又’由於把手部70A對過濾器箱38之框架50之位置 關係與把手部70B對過濾器箱40之框架55之位置關係相 異，因此，作業者僅憑外觀即能容易地識別過濾器箱38, 4〇。 又’圖4(A)中，亦可在第i過濾器箱38之框架5〇之 第2錐部50c中央附近，於接近端面5〇a之位置F2設置把 手部70A’於與第1錐部5〇b之位置F2對稱之位置設置把 手部70A。此情形下，先於圖2之定位塊48A之錐部48^ 之對應位置形成凹部48 Ab。又，圖4(B)中，在第2過濾器 箱40之框架55之第2錐部5氕中央附近，於遠離端面5〇a 之位置F4設置把手部7〇B，於與第i錐部55b之位置 對稱之位置設置把手部7〇B。進而，於圖2之定位塊MB 之錐部48Ba之對應位置形成凹部48Bb。此情形下，把手部 70A，70B對框架50, 55之位置關係與端面55&，55&之距離 相異。因此，作業者能從把手部7〇A，7〇B對框架5〇, 55之 位置識別過濾器箱38, 4〇。 此外例如亦可於框架50，55貼附種類可識別之標籤 等，使把手部70A對框架50之位置關係與把手部7〇b對框 架5 5之位置關係為相同。 (7)又，由於過濾器裝置26具備在盒體28内將過濾器 箱38, 40往定位塊48A〜48C側彈壓之移動用桿“A〜 5 8C，因此能順暢地進行過濾器箱38, 4〇之移動。 ⑧ 30 201206549 此外，移動用桿58A〜58C不一定姜設置。 又，分隔板42A〜42C，雖係、與包含錯直線之面大致平 行(大致垂直於水平面）’但本實施形態中由於有定位塊 48A〜48C，@此能順暢地進行過濾器箱38,4〇之移動及定 位。此外，定位塊48A〜48C，例如亦可相對包含錯直線之 面傾斜。 W又，過濾器箱38之化學過濾器51(濾材)係除去通過 ,、中之氣體中之有機,系氣體（有機物），過濾器箱⑽之化學 過濾·器56(濾材）係除去通過其中之氣體中之驗性氣體及酸 I·生氣體’因此忐將已高度除去不純物之空氣供給至收納曝 光本體部4之腔室10内。 此外，過濾箱40内之過濾器亦可係例如除去通過其 中之氣體中之鹼性物質及酸性物質之至少一方。又，化學 二濾器除去之不純物亦可係任意，例如藉由一個化學過濾 器吸收有機系氣體與鹼性氣體及酸性氣體。 再者，過濾器箱38，40内之過濾器能使用化學過濾器 以外之任忍過濾器（濾材）。例如，作為過濾器箱38, 之過 攄器，亦能使用如HEPA㈣器或ULpA過據器之用以除去 微小粒子（微粒）之濾塵器。 (9)再者，於本實施形態之過濾器裝置26雖設置有兩個 過濾盗相38及一個過濾器箱4〇，但過濾器裝置％所具備 •^過濾器鈿38, 40之數目係任意。又，於過濾器裝置26亦 可僅叹置—個或複數個過濾器箱3 8、或一個或複數個過濾 器箱40。 31 201206549 (10)又’本實施形態之曝光裝置EX，係以曝光用光EL 經由標線片R之圖案及投影光學系統PL使晶圓w(基板）曝 光’其具備：腔室ίο，收納使晶圓w曝光之曝光本體部4 ; 本實施形態之過濾器裝置26 ;以及空調裝置30，將從腔室 10之外部擷取之空氣經由過濾器裝置26送至腔室丨〇内。 根據本實施形態’由於能以有效率之方式進行過滤器 箱3 8，40之更換，能高精度地進行過濾器箱38，4〇間之定 位’因此能有效率地進行曝光裝置之維護，且能高精度地 除去腔室10内之空氣之不純物。 此外，本實施形態中，作為裝載室10b内之局部空調 裝置60之過濾器箱63, 64之框架，亦可使用與過濾器箱38, 40之框架50, 55相同之形成有錐部之框架，將過濾器箱63, 64收納於具備形成有與定位塊48 a〜48C相似形狀之錐部 之定位塊之盒體。 此外’上述實施形態亦可如下變形。以下變形例中， 係對與圖3、圖4(A)及圖5(B)對應之部分賦予相同符號， 省略其詳細說明。 (1)圖7(A)係顯示上述實施形態之第1變形例之第1過 渡器箱38A及與此對應之定位塊48A之立體圖，圖7(B)係 顯示該第1變形例之第2過濾器箱40A及與此對應之定位 塊48B之立體圖。藉由將圖7(A)之定位塊48A及圖7(B)之 定位塊48A分別取代圖2之定位塊48A，48C及48B而設置 於盒體28内，而能將此第1變形例之過濾器箱38A，40A 設置於盒體28内。 ⑧ 32 201206549 畑圖7(A)中，第1過濾器箱38A具有保持化學過濾器5i 之環狀框架50、設於框架50之第1端面50a之墊片54八（切 除塾片54之—部分後之形狀）、由設於框_ 50之第i側面 之凹部構成之把手部龍U 1把手部）' 以及於框架50之 第1側面形成為於z方向挾持把手部50bl且從框架5〇之 第2端面50g往第丨端面5〇a側逐漸傾斜至框架外側之 兩個第1錐部50132及5〇]33(第】傾斜部之兩個部分卜再者， 過濾器箱38A具有由設於框架5〇之第2側面之凹部構成之 把手部50cl(第2把手部）、以及於框架5〇之第之側面形成 為於Z方向挾持把手部50cl且與第1錐部5〇b2, 5〇b3對稱 地傾斜之兩個第2錐部5〇c2及5〇(；3(第2傾斜部之兩個部 分）。又，於把手部5〇bl，5〇cl為使作業者更容易抓持而設 有抓持部49A。 又，把手部50b 1對框架50之設置面之z方向位置， 較把手部50cl之z方向位置低，把手部5〇bl，5〇cl係相對 框架50中心以旋轉對稱之位置關係設置。換言之，—把手 部50bl之從框架50下方之設置面起在z方向之距離與另 一把手部50cl之從框架50上方之設置面起在z方向之距 離相等。進而，於定位塊48A之錐部48Aa之與把手部 5〇M (及50cl)對應之位置設有凸部49(>凸部49c之高度設 定成較從錐部50b2, 50b3至抓持部49A之深度低。因此， 框架50之錐部50b2, 50b3(或5〇c2, 5〇c3)能緊貼於定位塊 48A之錐部48Aa。 又’圖7(B)中，第2過濾器箱40A具有保持化學過遽 33 201206549 器56之環狀框架55、設於框架55之第〖端面55a之墊片 54B(切除墊片54之一部分後之形狀）' 由設於框架55之第 1側面及第2侧面之凹部構成之一對把手部55M 55ci(第i 把手部及第2把手部）、以及於框架55之第i側面及第2 側面分別形成為於Z方向挾持把手部5 5 b丨，5 5 c丨之第i錐 部55b2及55b3(第1傾斜部之兩個部分）及第2錐部55c2 及55c3(第2傾斜部之兩個部分）β又，於把手部55bi，55ci 設有抓持部49B。 又，把手部5 5 b 1，5 5 c 1對框架5 5之Z方向位置關係， 與把手部50b 1，50c 1對框架50之Z方向位置關係為相反。 換言之，一把手部55bl之從框架55下方之設置面起在z 方向之距離與另一把手部55()1之從框架55上方之設置面起 在z方向之距離相等。進而，過濾器箱4〇A之一把手部55bi 之從框架55下方之設置面起在z方向之距離與過濾器箱 38A之一把手部50bl之從框架5〇下方之設置面起在冗方 向之距離互異。再者，於定位塊48B之錐部48Ba之與把手 部55bl(及55cl)對應之位置設有凸部49De因此，若誤使 第1過濾器箱38A之框架50接觸於定位塊48B時，凸部 49D與框架50之第1錐部50b2(或50c2)會機械干涉。相對 於此，框架55之錐部55b2,55b3(或55C2,55C3)能緊貼於定 位塊48B之錐部48Ba。相反地，若誤使第2過濾器箱4〇a 之框架55接觸於圖7(A)之定位塊48A時，凸部49C與框架 55之第1錐部55b2(或55c2)會機械干涉。因此，在此第i 變形例亦同樣地，能防止誤將第2過濾器箱4〇A設置於定 34 201206549 « 位塊48 A之某空間，防止誤將第i過濾器箱3 8 A設置於定 位塊48B之某空間。 此外，此第1變形例中，過濾器箱38A之抓持部49A 及過渡器箱40A之抓持部49B亦可.不一定要設置。 (2)其次，圖8(A)係顯示上述實施形態之第2變形例之 第1過濾器箱38B及與此對應之定位塊48A1之立體圖，圖 8(B)係顯示該第i變形例之第2過濾器箱4〇B及與此對應 之定位塊48A2之立體圖。藉由將圖8(A)之定位塊48Al及 圖8(B)之定位塊48Ai分別取代圖2之定位塊48A，48c及 48B而設置於盒體28内，而能將此第2變形例之過濾器箱 38B, 40B設置於盒體28内。 圖8(A)中，第1過據器相38B具有保持化學過遽器5 1 之環狀框架50A、設於框架50A之-γ方向第i端面之墊片 54、由設於框架50之+2方向之第4側面之凸部構成之把手 部70C(第1把手部）、以及形成於框架5〇A之第丨側面5〇从 之+Z方向側且朝向墊片54側以錐角0傾斜至框架5〇a外 侧之第1錐部50Abt(第1傾斜部）。框架5〇A2+x方向第2 側面50Ac係與ZY平面平行地傾斜。 再者，定位塊48A1之錐角必之錐部48Ala僅形成於框 架50A之與第i錐部5〇Abt對應之部分。因此，框架 之第1錐部50Abt能緊貼於定位塊48A1之錐部48αι&。 又’圖_中，第2㈣器箱儀具有保持化學過遽 器56之環狀框架55A、設於框架55A之第（端面之墊片 由設於框帛55 方向f 4側面之凸部構成之把手部 35 201206549 70D(第1把手部）、以及形成於框架55八之_乂方向第1侧面 55 Ab之-Z方向側且朝向墊片54側以錐角0傾斜至框架55A 外側之第1錐部55Abt(第1傾斜部）。框架μα之+X方向 側面55Ac係與ZY平面平行地傾斜。再者，定位塊48八2 之錐角0之錐部48A2a僅形成於框架55A之與第1錐部 5 5Abt對應之部分。 此情形下，第1錐部55Abt對框架55A之Z方向位置 關係’與第1錐部50Abt對框架50A之Z方向位置關係為 相反。再者，於定位塊48A1之錐部48Ala與定位塊48A2 之錐部48A2a在Z方向之位置相異。因此，能防止誤將第} 過濾器箱38B設置於定位塊48A2之某空間，相反地，能防 止誤將第2過濾器箱40B設置於圖8(A)之定位塊48A1之某 空間。 此外，此變形例t，例如，亦可使在第丨過濾器箱38b 之框架50A上面之把手部70C之與第2側面5〇Ac之距離與 在第2過據器箱40B之框架55A上面之把手部70D之與第 2側面50Ac之距離相異。又，亦可使把手部7〇c之與端面 50Aa之距離與把手部70D之與端面5〇Ac之距離相異。 (3)其次，圖9(A)係顯示上述實施形態之第3變形例之 第1過濾器箱38C及與此對應之定位塊48A之俯視圖。過 濾器箱38C係將化學過濾器51收納於環狀之框架5〇c内， 於框架50C端面固定有墊片54者。又，框架5〇c之對向之 第1側面50Cb及第2側面50Cc係平均對稱地傾斜，且分 別形成階梯狀之段差部，於侧面5〇cb，50Cc安裝有把手部 36 201206549 70A。 藉由使第1側面50Cb或第2側面50Cc接觸於定位塊 48A之錐部而移動過濾器箱38c，能容易地在盒體内將 過濾器箱38C定位成接觸分隔板42A。 又，圖9(B)係顯示第4變形例之第！過濾器箱38D及 與此對應之定位塊48A之俯視圖。過濾器箱38D係將化學 過濾器5 1收納於環狀之框架5〇D内，於框架5〇D端面固定 有墊片54者。又，框架50D之對向之第i側面5〇Db及第 2側面50Dc係平均對稱地傾斜，且分別於外側形成凸之複 數個圓弧部，於側面50Db，5〇Dc安裝有把手部7〇A。 藉由使第1側面50Db或第2側面50Dc接觸於定位塊 48A之錐部而移動過濾器箱38D，能容易地將過濾器箱38D 定位成接觸分隔板42A。 又’圖9(C)係顯示第5變形例之第1過濾器箱38E及 與此對應之定位塊48A之俯視圖。過濾器箱38E係將化學 過滤器5 1收納於環狀之框架50E内，於框架50E端面固定 有塾片54者。又，框架50E之對向之第1側面5〇Eb及第2 側面50Ec係平均對稱地傾斜，且分別於外側形成凸之圓弧 部’於側面50Eb，50Ec安裝有把手部70A。 藉由使第1側面50Eb或第2側面50Ec接觸於定位塊 48A之錐部而移動過濾器箱38E，能容易地將過濾器箱38E 定位成接觸分隔板42A。 此外’亦可將圖9(B)之複數個圓弧部或圖9(c)之凸之 圓孤部以旋轉滾子構成。 37 201206549 (4)其次，圖10(A)係顯示上述實施形態之其他例之過濾 器裝置26B，圖10(B)係顯示圖10(A)中之第1過濾器箱 38F。圖10(A)之過濾器裝置26B中，於盒體28内之分隔板 42A之與過濾器箱38F，40F對向之面，覆裝有能從墊片54 容易地分離且易滑動且於中央部形成有使氣體通過之開口 之平板狀罩構件TF5。罩構件TF5由例如合成樹脂形成， 具體而言，係由例如鐵氟龍（杜邦公司之註冊商標）形成。 又，以緊貼覆裝於分隔板42A之罩構件TF5之方式定 位有第1過濾器箱38F，以緊貼此過濾器箱38F之方式依序 定位有第2過濾器箱40F、第1過濾器箱38F、以及第2過 濾器箱40F。一列之過濾器箱38F，40F，38F，40F，分別被固 定於盒體28内面之定位塊48A3, 48B3, 48A4, 48B4定位。 定位塊48A3, 48B3等之Y方向之長度，設定成較過濾器箱 38F，40F之Y方向高度小。 過濾器箱38F, 40F係將化學過濾器51，56分別收納於 環狀之框架50F，5 5F内，於框架50F, 5 5F端面固定有墊片 54者。再者，框架50F，55F之對向之第1側面及第2側面 係對稱地傾斜之錐面，沿框架50F，55F之第1側面、第2 側面、以及與固定有墊片54之端面對向之端面，覆裝有能 從墊片54容易地分離且易滑動之罩構件TF 1，TF2。於框架 50F，55F之對向之第1側面及第2側面，透過罩構件TF3, TF4固定有把手部70A，70B。於定位塊48A3, 48A4及48B3, 48B4之錐部，亦分別固定有為平板狀且於一部分形成有槽 之罩構件TF3及TF4。罩構件TF1, TF2, TF3, TF4之材料與 (S) 38 201206549 1 例如罩構件TF5之材料相同。 如圖10(B)所示，於過濾器箱38F之罩構件TF1之與化 干過;慮器51對向之部分形成有使氣體通過之矩形之開口 TF1 c。覆蓋框架50F之第1側面及第2側面之罩構件TF jIn the piping 25 of S 17 201206549 1, the fourth space 28f is connected to the figure through the opening 28g! The jth officer 32. Further, the taper angles (10) of the taper portions 48Aa to 48C of the positioning blocks 48A to 48C, etc., and the taper are, for example, 〜, as an example, the two corners are 30. Further, the movement levers 58A, 58B, 58C having the same configuration are connected. The fulcrum members 59A, 59B, 59C which are fixed to the partition plates 42B, 42C and the + 丫 direction side walls of the casing 28 are respectively rotated about an axis parallel to the Z axis (0Z direction). For example, the movement #58A And a hemispherical abutting member 59a2 and a handle 58A3 which are rotatably coupled to the fulcrum yak A #58A1, fixed to the filter case 38 side of the front end portion of the rod 58A1, and the opposite side. 4(A) and 4(b), which are perspective views of the filter boxes 38 and 40, respectively, from the sides of the partition plates 42A & 42B of Fig. 2, illustrate the configuration of the filter boxes 38 and 40. Fig. 4 (4) and Fig. 4 The orthogonal coordinate system (X' y' z) indicates the coordinate system of the filter boxes 38 and 4 in the state where the filter device _ is placed at the target position, as shown in Fig. 4 (A). The first passer box 38 has a substantially annular frame 5〇 having a large square opening 50f at the center, and is kept in the opening. The device 51 and the pair of convex handle portions 70A are fixed to the frame 5. The material of the crotch piece 54 is the same as the material of the crotch piece. Further, in the present embodiment, the frame 5 is parallel to the _ γ. The first end face 5〇a '5 of the square cymbal has a large square ring spacer 54 (sealing member) which is fixed to surround the opening 50f. Further, the cymbal piece (4) may be provided at the first end © 50a. The object side (for example, the partition plate) is attached. Further, the opening 5〇f of the f 1 filter box 38 may be a quadrangular equal-shaped moment 8 18 201206549 or a polygon. The shape of the rectangular or polygonal frame 50 is not limited thereto. In addition, the filter case 38' is formed on the four sides of the frame 50, the first side surface on the χ-direction side and the second side surface on the +Χ direction side, and each has a first tapered portion 50b and a second portion. In the tapered portion 50c, the i-th tapered portion 5b and the second portion 50c are formed so as to be inclined from the second end face 5〇g of the frame 50 to the direction parallel to xz to the first end face 50. The outer plane is formed. The second side surface is separated from the chemical filter 56 (or the surface of the frame π opposite to the first side surface. The i-th tapered portion is inclined clockwise with respect to the ζγ plane by a cone angle of 0 2 2 cones... counterclockwise with respect to the ζ γ plane The taper angle of the taper angle must be equal to the taper angle of the taper portions 48Aa to 48Ca of the positioning blocks 48Α to 48C of Fig. 3. Therefore, the first taper 50b of the end face of the opposite frame 5〇 is formed in Fig. 3 When the angle is α, the angle "the sum of the angles and the taper is 90. In Fig. 4(A), the handle portion is fixed at a position offset from the center portion toward the ζ direction of the i-th tapered portion 5〇b of the frame 5〇. 7GA is fixed to the second tapered portion 50 of the frame 5 () with a handle portion 7A at a position offset from the central portion in the +Z direction. That is, the pair of handle portions 7A with respect to the frame 50. The position is substantially point-symmetric. Further, the third side and the fourth side of the frame 50 in the _z direction and the +z direction are respectively disposed on the plane 平行 平行 (1 and 5 〇 e) parallel to the χ γ plane. The setting surface 5〇d of the frame 50 is placed on the bottom plate 28h of the third opening 28e of the casing ,, as shown in Fig. 3, the first tapered portion 50b of the frame w is brought into contact with the tapered portion of the positioning block 48A. 48Aa The force of the frame π and the surface 50a are in close contact with the partition plate 42A through the spacer 54, which is the installation position Q1 of the filter box 38 in the space 20e of the 201206549. The filter box 38 is caused by the transverse direction. The self-weight is stable and stationary. In this case, since the recessed portion 48Ab is formed at the position where the tapered portion 48Aa of the positioning block 48A opposes the handle portion 70A, the first tapered portion 5〇b can be tightened even if the handle portion 7A is provided. It is attached to the tapered portion 48Aa. Similarly, at the installation position q3 in the first space 28c of the casing 28, the installation surface 50d of the frame 50 of the filter box 38 is placed on the upper surface of the bottom plate 28h, and the first tapered portion of the frame 50 is placed. 50b contacts the tapered portion 48Ca of the positioning block 48C, and the end surface 50a is in close contact with the partition plate 42C through the spacer 54. Further, the handle portion 70A provided on the i-th tapered portion 50b is received in the recess 48Cb of the tapered portion 48Ca of the positioning block 48C. Further, in the state in which the pair of grip portions 7A are removed, the filter case 38 is rotated about the axis (0 y direction) parallel to the Y axis. The shape is the same. The other setting surface 5〇e of the frame 50 is placed on the bottom plate 28h of the casing 28. The installation surface 50e is placed on the bottom plate 28h as described above. In the upper case, the tapered portion 48Aa (48Ca) of the second tapered portion 50c of the frame 50 contacting the positioning block 48A (48C) is placed in the recess 48Ab (48Cb). The filter case 38 can be correctly set at the installation position Q1 or Q3. As shown in Fig. 4(B), the second filter case 4A has a substantially annular shape with an opening 55f at the center portion of the same shape as the frame 5A. Frame 55, chemical filter 56 held within opening 55f. Further, the filter case 4A is provided on the side surface on the -X direction side of the frame 55 and the side surface on the +X direction side, and has an i-th tapered portion 55b and a second tapered portion 55c, respectively, and the first tapered portion 55b and the second portion The taper portion 5 pill 8 20 201206549 is symmetrically formed so that the second end surface 55g in the +Y direction is inclined to the outer side of the frame 55 at the taper angle 0 toward the first end surface 55a side in the -Y direction. Similarly to the first filter case 38, the second filter case 40 may be fixed to the opening 54 in the first end face 55a of the frame 55 in the 丫 direction. Further, the opening 55f of the second filter 粕40 is also similar to the i-th filter case π, and may be quadrangular or the same. Further, the shape of the frame 55 is not limited to a square, and may be a rectangle or a polygon. Further, the frame 5, 55 can be manufactured by, for example, molding. Further, the 'over-cylinder case 40' has a position fixed to the position shifted from the center of the first tapered portion 55b in the +Z direction and a position on the second tapered portion 55c which is substantially point-symmetric with respect to the center of the frame. - Thin the handle. Further, the side faces 55d and η are provided on the side faces of the frame 55 in the Z direction and the +z direction, respectively. . In the present embodiment, the difference between the shapes of the 过滤i filter case 38 and the second damper case 4〇 is that the position of the handle portion & fine position is shifted in the opposite direction in the Z direction. Further, this shape is different, even if the robot case 38' 40 is rotated by 18 turns in the ^ direction. Also maintained. Therefore, the operator can easily distinguish the filter shawles 38, 4 from the appearance. Further, one of the frames 50 of the frame of Fig. 1(A) is fixed to the tapered portion 50b by a bolt (not shown), for example, at the center of the cone portion _, 5〇c The portion 7A is symmetrically disposed in the Z direction, and the mounting region e is opened; there is a screw hole in which the handle portion 70A can be attached. Therefore, the mounting position of the 邛50b, 50a is in the direction of the oblique direction. In the embodiment, the direction orthogonal to the oblique direction is changed. Therefore, by attaching the handle portion 70A to the frame 50, the field * b1, E2, the frame 21 201206549 50 can be used as the frame 55 for the second transition box 4 . Similarly, in Fig. 4(B), the mounting position of the handle portion to the tapered portion of the frame 55 and 55a is variable in a direction that does not incline with the mounting region e3, ^. Therefore, the E4, E4' frame 55 can be used as the frame 50 for the first filter case 38 by attaching the handle # to the frame Μ (4) E3. The setting surface 55d of the frame 55 of the filter case 40 is placed on the bottom plate 28h of the second space fa' 28d of the casing μ, and as shown in FIG. 3, the first tapered portion 55b of the frame 55 is brought into contact with the positioning block 48A. The tapered portion 48Ba and the end surface 55a of the frame are in contact with the partition plate 42B through the spacer 54, and are disposed at the position Q2 of the filter case 40 in the second = 28d. The filter case 4 is stabilized by its own weight due to the device. In this case, since the recessed portion 4 is formed at the position where the tapered portion 48Ba of the positioning block faces the handle portion, the first tapered portion 55b can be brought into close contact with the tapered portion 48Ba even if the handle portion 70B is provided. Further, the filter case 40 is also the same in that the shape is the same even if it is rotated by 180 in the 0 y direction. Therefore, the other setting surface 55e of the frame 55 can be removed in a state where the pair of handle portions 7〇a are removed. When the mounting surface 55e is placed on the bottom plate 28h as described above, the second tapered portion 55c of the frame 55 contacts the tapered portion 48Ba of the positioning block 48B, and is disposed on the second tapered portion. Since the handle portion 70B of the 55c is housed in the recess 48Bb, the filter box 40 can be accurately set at the installation position q2. Further, as shown in Fig. 2, the position of the recess 48Cb of the positioning block 48C is located at a lower position with the handle portion 70A (the recess 48Ab 22 201206549 of the positioning block 48A is also the same). The position of the recess 48Bb of the clamp 48B is matched. The handle portion 7〇B is located at a higher position. Therefore, if the second filter case 40 is to be placed at the set position Q3 or Q1 in the space 28c or 28e, since the handle portion 70B of the filter case 4 is mechanically interfered with the tapered portion 48Ca or 48Aa of the positioning block 48C or 48A. Therefore, it is possible to prevent the filter case 4 from being set to the set positions Q3, Q1 by mistake. Similarly, if the first filter case 38 is to be placed in the position Q2 in the space 28d, since the handle portion 70A of the filter case 38 mechanically interferes with the tapered portion 48Ba of the positioning block 48B, it is possible to prevent mistakes. The filter box 38 is set at the set position Q2. As described above, according to the present embodiment, the position of the handle portion 70A of the filter case 38 is different from the position of the handle portion 70B of the filter case 4, and corresponds to the recess 48Aa of the positioning block 48A, 480 in the case 28, The position of 48Ca is different from the position of the recess 48Bb of the positioning block 48B. Therefore, the month & prevents the filter case 4〇 having the chemical filter 56 (to remove the alkali gas and the acid gas) from being disposed in front of the partition plates 42A, 42C, and conversely, preventing the front side of the partition plate 42B from being disposed. A filter box 38 having a chemical filter 5 (for removing organic gases). Next, in Fig. 3, after the filter boxes 38, 40, and 38 are disposed at the setting positions Q1, Q2, and Q3 on the front faces of the partition plates 42A, 42B, and 42C, respectively, the respective filters are moved by the moving rods 58A, 58B, and 58C. The boxes 38, 4, 38 are pressed against the partition plates 42, 42B, 42C, and the door 29 is closed by the positioning block 48 and the moving rod 58 8 to 58 (in the state where the door 29 of the casing 28 is closed). :, the airtightness between the partition plates 42 to 42 (: and the frames 50, 55 of the filter boxes 38, 40 is maintained high by the spacer 54. As a result, the case 28 is formed with the opening 28a. The gas in the first space 28c sandwiched between the upper plate and the partition plate 42C must pass through the chemical filter 51 of the filter case 23 201206549 38, and pass through the opening 42Ca to flow into the partition plates 42B and 42C. Similarly, in the second space 28d, the gas in the space 28d passes through the chemical filter 56 of the filter case 40, and then flows into the third space 28e sandwiched by the partition plates 42A and 42B through the opening 42Ba'. The gas in the space 28e must pass through the chemical filter 51 of the filter box 38, pass through the opening 42Aa, the fourth space 28f on the back side of the partition plate 42A, The opening 28g of the side wall of the casing 28 flows to the first pipe 32 of Fig. 2. Therefore, the air AR flowing in from the opening 28a in the upper portion of the +Y direction of the casing 28 must pass through two (two segments) organic The filter case 38 for removing gas and one (one) of the alkali-type gas and the filter case 40 for acid gas removal are supplied to the air conditioner 3 of FIG. 1, so that the chamber 1 is supplied with height removal. The air of the impure material. Next, the installation operation and the replacement operation of the filter case 38, 4〇 with respect to the casing 28 will be described with reference to Figs. 5(A) to 6(B). Fig. 5(A) to Fig. 6(B), respectively A plan view showing the filter device 26 of the casing 28 is shown in section. First, when the two filter boxes 38 and one filter box 38 are initially provided in the casing 28, the filling of the filling of the ready-to-use FIG. 4 (A) is prepared. Two filter boxes 38 of the chemical filter 5 J and one filter case 40 filled with the unused chemical filter 56 of Fig. 4 (B). Secondly, the lock of the case 28 is released (not shown) After the door 29 is opened, the movement levers 58A to 58C are moved forward as shown by an arrow B1 in Fig. 5(A) (the outer side of the window portion 28b of the casing 28) Next, the operator grips the handle portion 7A of the first filter case 38, and places the setting surface 50d of the filter box 38 (frame 50) on the bottom plate in the third space 28e of the case 28. 28h (refer to Fig. 2) Then, the operator presses the instrument case % into the third space 28e as indicated by the arrow 24 201206549 head B2. Next, as shown by the arrow B3 in Fig. 5 (8), the operator makes The first miscellaneous portion of the filter case w is in contact with the tapered portion 48Aa of the positioning block. One of the handle portions 70A of the instrument case 38 is housed in a recess 48Ab similar to the positioning block. Next, as shown by the arrow B4, the moving rod 58A (four) is placed in the second cone of the (four) tank 38 by 5 〇C. Then, as shown by an arrow B5 in Fig. 6(A), the operator rotates the movement lever 58A to rotate the filter case 38 in the -X direction and the _γ direction. Thereby, as indicated by the arrow Β 6, the filter case 38 is moved to the set position Q1 of the case 28, and the end face of the filter case 38 (frame 50) is in close contact with the partition plate 42A via the spacer 54. Further, in a state where the spacer 54 of the filter case is in contact with the partition plate 42A, the movement lever "A is pressed against the second tapered portion 50c of the filter case 38, and the movement lever 58A is further advanced. The operator secondly grips the handle portion 7〇b of the second filter case 4, and places the setting face 5 of the filter case 40 (frame 55) on the bottom plate in the second space 28d of the case 28. Then, the operator presses the filter case 40 into the second space 28d of the case 28 as indicated by an arrow B7. Next, the operator makes the filter case 4 as shown in Fig. 6(B). The i-th tapered portion 5 is engaged (contacted) with the tapered portion 48Ba of the positioning block 48B, and the moving rod 58B is pressed against the second tapered portion 55c of the filter case 40. One of the filter case 4's handle portion 7〇 B is housed in the recess 48Bb of the positioning block 48B. Next, as shown by an arrow B8, the operator moves the movement lever 58B further as shown by the arrow B9 to move the filter box 4 to the casing 28. The position Q2 is set. Thereby, the end face 5 of the filter case 4 (frame 55) is pressed against the partition plate 42B by the bracts 54 via 25 201206549. In addition, the transition box 40 can also be used. When the spacer 54 is in contact with the partition plate 42B, the movement lever 58B is pressed against the second tapered portion 55c of the filter case 40, and the movement lever 58B is further rotated. Next, as indicated by an arrow B10, The third filter case 38' is moved in the first space 28c of the casing 28 to rotate the movement lever 58C, and the filter case 38 is placed at the installation position in the first space 28c. Next, the door of the case 28 is closed. 29, the lock is completed, whereby the setting of the filter box 38, 4〇 is completed. At this time, the first tapered portion 50b (55b) of the filter case 38 (40) is pressed against the cone of the positioning block 48A (48B). The portion 48Aa (48Ba) and only the filter case 38 (40) 'filter box 38 (4 〇) are placed in the set position Q 1 (Q2) of the partition plate 42 Α (42β) for a short time. 'The filter box 38 (4〇) and the internal chemical filter 5 1 (56) can be placed in a position to be targeted as efficiently and easily. Next, 'in the case 28 When the filter boxes 38, 40 are replaced, first, the operator releases the lock of the case 28 to open the door 29, and as shown by the arrow ϋΐ, the moving rod 58C is removed from the filter case 3 as shown in Fig. 6(B). 8. The operator grips the handle portion 7A' of the filter case 38 in the first space 28c and carries it out of the filter case 38 as indicated by the arrow D2. Secondly, as shown in Fig. 6(A), the arrow When the moving rod 58B is removed from the filter box % as indicated by D3, the operator grips the handle portion 70B of the filter box 40 in the second space 28d, and positions the milk cone of the transition box 40. The taper 4 of the block 48b moves forward. Next, the operator pulls the transition box 4 〇 from the second space 28d of the casing 28 as indicated by an arrow D4. 8 26 201206549 Next, as shown in Fig. 5(B), the moving rod 58a is removed from the buffer box 38 as indicated by the arrow 〇5, and the operator grips the handle portion of the filter box π in the third space... 70A, and pull the handle portion 7qa to the direction of the arrow as shown. 2 As indicated by the arrow D7, the second tapered portion 过滤 of the filter case 38 moves forward along the tapered portion 48Aa of the clamp 48A. Next, the operator smashes the filter case 38 from the third space of the casing 28 as indicated by an arrow D8 in Fig. 5(A). Pull out. Next, by the same steps as the above-described setting operations of the filter boxes 38, 40, the operator sets the new filter boxes 38, 4 于 in the box 28 as the target position. Next, the lock is closed by closing the door 29 of the casing 28, and the replacement of the filter boxes 38, 40 is ended. At this time, since the filter boxes 38, 40 can be easily pulled out from the installation position, the filter cases 38, 4 in the casing 28 can be easily and efficiently replaced. The effects and the like of the embodiment are as follows. (1) The exposure apparatus EX of the present embodiment includes an entire air conditioning system including a filter device 26 and an air conditioner 30. The filter device 26 includes two first filter cases 38 and one second filter case 40. Next, the first filter case 38 of the chemical filter 51 is held, and has a frame 50 for holding the chemical filter 51; a handle portion (first handle portion) of the frame 50 and a side formed on the side of the frame 50. In some cases, the first tapered portion 50b (the first inclined portion as the shape changing portion) is gradually inclined from the second end surface 5〇g of the frame 50 toward the first end surface 50a side to the outside of the frame 50. Further, the second filter case 4 is also configured in the same manner, and the first flange portion 55b is provided in the pivot frame 5 5 of the filter case 40. Further, a spacer 54 (sealing member) is provided on the i-th end face 5〇a of the two end faces of the frame 50. According to the present embodiment, positioning blocks 48A, 48B are provided in the vicinity of the installation position in the casing 28 in which the filter boxes 38, 40 are housed, and the positioning blocks 48A, 48B are provided with the same inclination angle of the (i) i-th taper portions 50b, 55b. Cone 48 heart, 4 gamma. Then, by springing (moving) the frame 5, 55 so that the i-th taps j 50b, 55b of the frame 5, 55 move along the tapered portions 48Aa, 48Ba of the casing 28, and can be efficiently and easily positioned. The setting of the filter box 38, 40 (chemical filter, 6) to the target position within the dish 28 is performed in a manner. In other words, the i-th tapered portion of the filter box % 40 can perform two functions of movement and positioning. (1) The first over-diameter phase 38 has a second tapered portion 5〇c formed on the second side opposite to the second side of the frame side of the frame by the chemical filter 51 (4) The 2 end faces 5 () g are gradually inclined to the outer side of the frame 5G symmetrically toward the second end face_side and the first taper portion. Similarly, the second actuator case 40 also has a second tapered portion 5 5 c which is formed symmetrically with respect to the frame 55 and the second tapered portion. Therefore, even if the filter boxes 38, 40 are rotated by 18 turns. The second tapered portion 5〇c, 55c of the frame 5〇, 55 can also be moved along the tapered wheel of the casing 28, and the center of the movement can be efficiently performed by the frame 38, 40 (chemical filter 51, 56) Setting of the target position within the casing 28. (3) Further, the i-th tapered portion 5〇b and the second tapered portion 5〇c of the frame 50 are formed on the i-th side surface and the second side surface of the frame 50, and the first tapered portion and the second tapered portion of the frame are described. The 55c is formed on the first surface of the frame 55 and the second side surface 8 28 201206549. Therefore, the processing of the tapered portions 50b, 50c, etc. is easy. Further, the tapered portions 5〇b, 5〇c may be formed only in the frame 5〇. The portion of the first side and the second side. In this case, the positioning block 48A, 48C corresponding to the case body (1) may be formed only in a portion corresponding to the tapered portion 5〇b. 5 5 b, 5 5 c is also the same. (4) Also, due to the tapered portion 5〇b, 5〇c of the filter case 38 (frame 5〇) and the tapered portion 55b, 55e of the transition box 40 (frame 55) The flat portions, that is, the straight portions, are formed in a straight line, and the tapered portions 48Aa, 48B of the positioning blocks 48A, 48B corresponding thereto are also formed into a flat surface, so that the formation of the tapered portions 50b, 5〇c, etc. is easy. The tapered portions 50b, 50c and the tapered portions 55b, 55c are formed in a convex or concave spherical shape, that is, a curved shape. In this case, the tapered portions 48Aa, 48Ba of the positioning blocks 48A, 48B corresponding thereto are formed as Concave or convex Planar '. Similarly, the positioning blocks 48A, 48B can be used to move and position the filter boxes 38, 40 in the same manner as in the above embodiment. (5) Further, the convex handle portion 70A (the i-th handle portion) provided on the first side surface in the direction of the frame 5 of the filter case 38 of Fig. 4(A) is provided in the i-th tapered portion 50b. The tapered portion 48 of the positioning block 48A in the corresponding casing 28 is provided with a recess 48Ab through which the handle portion 70A can pass. Therefore, even if the handle portion 7a is provided, the first tapered portion 50b of the frame 50 can be moved in close contact with the tapered portion 48Aa of the positioning block 48A. In this regard, the handle portion 70B (second handle portion) of the first tapered portion 55b of the filter case 4 is also the same. (6) Further, the convex handle portion 7A (the second grip portion) provided on the second side surface in the +X direction of the frame 50 of the filter case 38 of Fig. 4(A) is attached to the second tapered portion 5〇〇 ,,. In this case, since the two handle portions 7A are provided, the filter case 38 is transported 29 201206549, and the filter case 38 is rotated by 18 turns. Further, the second tapered portion 50c of the frame 5 can be moved in close contact with the tapered portion 48Aa of the positioning block 48A. This point is also the same for the handle portion 7〇B of the second tapered portion 55c of the filter case 40. Further, since the positional relationship of the handle portion 70A to the frame 50 of the filter case 38 and the positional relationship of the handle portion 70B to the frame 55 of the filter case 40 are different, the operator can easily recognize the filter case by the appearance only. 38, 4〇. Further, in FIG. 4(A), the handle portion 70A' may be provided in the vicinity of the center of the second tapered portion 50c of the frame 5 of the i-th filter case 38 at the position F2 close to the end surface 5A. The handle portion 70A is provided at a position where the position F2 of the portion 5〇b is symmetrical. In this case, the recess 48 Ab is formed at a position corresponding to the tapered portion 48 of the positioning block 48A of Fig. 2 . Further, in Fig. 4(B), in the vicinity of the center of the second tapered portion 5氕 of the frame 55 of the second filter case 40, the handle portion 7〇B is provided at a position F4 away from the end surface 5〇a, and the i-th cone The handle portion 7B is provided at a position where the position of the portion 55b is symmetrical. Further, a concave portion 48Bb is formed at a corresponding position of the tapered portion 48Ba of the positioning block MB of Fig. 2 . In this case, the positional relationship of the handle portions 70A, 70B to the frames 50, 55 is different from the distance between the end faces 55 & 55 & Therefore, the operator can recognize the filter boxes 38, 4 from the positions of the frames 5A, 55 from the handle portions 7A, 7B. Further, for example, a type identifiable label or the like may be attached to the frames 50, 55 so that the positional relationship between the handle portion 70A and the frame 50 is the same as the positional relationship between the handle portion 7b and the frame 55. (7) Further, since the filter device 26 is provided with the movement levers "A to 5 8C" which press the filter boxes 38, 40 toward the positioning blocks 48A to 48C in the casing 28, the filter case 38 can be smoothly performed. 8 30 201206549 In addition, the movement levers 58A to 58C are not necessarily provided with ginger. Moreover, the partition plates 42A to 42C are substantially parallel to the surface including the wrong line (substantially perpendicular to the horizontal plane). In the present embodiment, the positioning blocks 48A to 48C are provided, and the movement and positioning of the filter boxes 38 and 4 can be smoothly performed. Further, the positioning blocks 48A to 48C can be inclined with respect to the surface including the wrong line, for example. Further, the chemical filter 51 (filter material) of the filter case 38 is removed, and the organic gas in the gas is removed, and the chemical filter 56 (filter material) of the filter case (10) is removed. The gas in the gas and the acid I and the raw gas are supplied to the chamber 10 in which the exposed body portion 4 is stored. Further, the filter in the filter box 40 may be removed, for example. Among them, the alkaline substance and acidity in the gas At least one of the impurities may be arbitrarily removed, for example, by a chemical filter to absorb organic gases and alkaline gases and acid gases. Furthermore, the filters in the filter boxes 38, 40 Any filter other than the chemical filter (filter material) can be used. For example, as the filter box 38, the filter can also use a filter such as a HEPA (four) or ULpA filter to remove fine particles (fine particles). (9) Further, in the filter device 26 of the present embodiment, two filter stealing phases 38 and one filter case 4 are provided, but the filter device % has a filter 钿 38, 40 The number is arbitrary. Further, the filter device 26 may also sing only one or a plurality of filter boxes 38, or one or a plurality of filter boxes 40. 31 201206549 (10) Further, the exposure apparatus of the present embodiment EX exposes the wafer w (substrate) by the exposure light EL via the pattern of the reticle R and the projection optical system PL. The lens is provided with a chamber ίο, and the exposed main body portion 4 for exposing the wafer w is received. Form filter device 26; and air conditioner At 30, the air taken from the outside of the chamber 10 is sent to the chamber chamber via the filter device 26. According to the present embodiment, the replacement of the filter boxes 3, 40 can be performed in an efficient manner. The filter case 38 can be positioned with high precision. Therefore, the maintenance of the exposure apparatus can be performed efficiently, and the impurities in the air in the chamber 10 can be removed with high precision. Further, in the present embodiment, The frame of the filter boxes 63, 64 of the local air conditioning unit 60 in the loading chamber 10b may also be formed with a frame having a tapered portion similar to the frames 50, 55 of the filter boxes 38, 40, and the filter boxes 63, 64 The casing is housed in a positioning block having a tapered portion formed in a shape similar to the positioning blocks 48a to 48C. Further, the above embodiment may be modified as follows. In the following modifications, the same reference numerals will be given to the portions corresponding to those in FIGS. 3, 4(A) and 5(B), and detailed description thereof will be omitted. (1) Fig. 7(A) is a perspective view showing a first transition box 38A according to a first modification of the embodiment and a positioning block 48A corresponding thereto, and Fig. 7(B) is a view showing the first modification. 2 is a perspective view of the filter box 40A and the positioning block 48B corresponding thereto. The positioning block 48A of FIG. 7(A) and the positioning block 48A of FIG. 7(B) are provided in the casing 28 instead of the positioning blocks 48A, 48C and 48B of FIG. 2, respectively. The filter boxes 38A, 40A are disposed in the casing 28. 8 32 201206549 In Fig. 7(A), the first filter case 38A has an annular frame 50 holding the chemical filter 5i, and a spacer 54 provided on the first end face 50a of the frame 50 (the cut-off piece 54 is - a portion of the rear shape), a handle portion U 1 handle portion) formed by a recess provided on the i-th side of the frame _ 50, and a first side surface of the frame 50 formed to grip the handle portion 50b1 in the z direction and from the frame 5 The second end surface 50g of the crucible is gradually inclined to the second end surface 5〇a side to the two first tapered portions 50132 and 5〇]33 on the outer side of the frame (the second portion of the inclined portion), and the filter case 38A has The handle portion 50cl (the second handle portion) formed by the concave portion provided on the second side surface of the frame 5A and the side surface of the frame 5A are formed so as to grip the handle portion 50cl in the Z direction and the first tapered portion 5 B2, 5〇b3 two second tapered portions 5〇c2 and 5〇 (3 (two portions of the second inclined portion)) which are inclined symmetrically. Further, in the handle portion 5〇bl, 5〇cl The grip portion 49A is more easily gripped, and the position of the grip portion 50b 1 facing the frame 50 in the z direction is lower than the position of the grip portion 50cl in the z direction, and the grip portion 5 is The bl, 5〇cl is disposed in a rotationally symmetrical positional relationship with respect to the center of the frame 50. In other words, the distance of the handle portion 50b1 from the setting surface below the frame 50 in the z direction and the setting of the other handle portion 50cl from above the frame 50 The surface is equidistant in the z direction. Further, a convex portion 49 is provided at a position corresponding to the handle portion 5A (and 50cl) of the tapered portion 48Aa of the positioning block 48A (> the height of the convex portion 49c is set to be larger The depth of the tapered portions 50b2, 50b3 to the grip portion 49A is low. Therefore, the tapered portions 50b2, 50b3 (or 5〇c2, 5〇c3) of the frame 50 can be in close contact with the tapered portion 48Aa of the positioning block 48A. In (B), the second filter case 40A has an annular frame 55 that holds the chemical 遽 33 201206549, and a spacer 54B that is provided at the end face 55a of the frame 55 (the shape after cutting off a part of the spacer 54) 'The handle portion 55M 55ci (the i-th handle portion and the second handle portion) formed by the recesses provided on the first side surface and the second side surface of the frame 55, and the i-th side surface and the second side surface of the frame 55, respectively For gripping the handle portion 5 5 b丨, 5 5 c丨 of the i-th taper portions 55b2 and 55b3 in the Z direction (two portions of the first inclined portion) The second tapered portions 55c2 and 55c3 (two portions of the second inclined portion) β are further provided with grip portions 49B at the grip portions 55bi and 55ci. Further, the grip portions 5 5 b 1, 5 5 c 1 are opposed to the frame 5 5 The positional relationship in the Z direction is opposite to the positional relationship of the handle portions 50b 1, 50c 1 in the Z direction of the frame 50. In other words, the distance of the handle portion 55b1 from the installation surface below the frame 55 is equal to the distance in the z direction from the installation surface of the other handle portion 55()1 from above the frame 55. Further, the distance of the handle portion 55bi of the filter case 4A from the setting surface below the frame 55 in the z direction is at a distance from the setting surface of the handle portion 50b1 of the filter case 38A from below the frame 5? Different from each other. Further, the convex portion 49De is provided at a position corresponding to the handle portion 55b1 (and 55cl) of the tapered portion 48Ba of the positioning block 48B. Therefore, when the frame 50 of the first filter case 38A is mistakenly brought into contact with the positioning block 48B, the convex portion is convex. The portion 49D mechanically interferes with the first tapered portion 50b2 (or 50c2) of the frame 50. On the other hand, the tapered portions 55b2, 55b3 (or 55C2, 55C3) of the frame 55 can be in close contact with the tapered portion 48Ba of the positioning block 48B. On the contrary, when the frame 55 of the second filter case 4A is accidentally brought into contact with the positioning block 48A of Fig. 7(A), the convex portion 49C mechanically interferes with the first tapered portion 55b2 (or 55c2) of the frame 55. Therefore, in the same manner as in the i-th modification, it is possible to prevent the second filter case 4A from being set in the space of the block 34 201206549 « Bit block 48 A, and prevent the i-th filter case 3 8 A from being set incorrectly. A space in the block 48B is located. In addition, in the first modification, the grip portion 49A of the filter case 38A and the grip portion 49B of the transition box 40A may also be used. Not necessarily set. (2) Next, Fig. 8(A) shows a perspective view of the first filter case 38B and the positioning block 48A1 corresponding thereto according to the second modification of the above embodiment, and Fig. 8(B) shows the i-th modification. A perspective view of the second filter case 4B and the positioning block 48A2 corresponding thereto. By providing the positioning block 48Al of FIG. 8(A) and the positioning block 48Ai of FIG. 8(B) in place of the positioning blocks 48A, 48c and 48B of FIG. 2, respectively, the second modification can be provided. The filter boxes 38B, 40B are disposed in the casing 28. In Fig. 8(A), the first interposer phase 38B has an annular frame 50A holding the chemical filter 5 1 and a spacer 54 provided on the i-th surface of the frame 50A in the -γ direction, which is provided in the frame 50. The handle portion 70C (first handle portion) formed by the convex portion on the fourth side surface in the +2 direction, and the second side surface 5 形成 formed on the frame 5A from the +Z direction side and toward the spacer 54 side at a taper angle 0 is inclined to the first tapered portion 50Abt (first inclined portion) outside the frame 5〇a. The second side 50Ac of the frame 5〇A2+x direction is inclined in parallel with the ZY plane. Further, the tapered corner portion 48A1a of the positioning block 48A1 is formed only in a portion of the frame 50A corresponding to the i-th tapered portion 5A, Abt. Therefore, the first tapered portion 50Abt of the frame can be brought into close contact with the tapered portion 48αι& of the positioning block 48A1. Further, in the figure, the second (fourth) box has an annular frame 55A for holding the chemical filter 56, and a second portion of the frame 55A (the spacer of the end surface is formed by a convex portion provided on the side of the frame 帛55 in the direction f 4 The handle portion 35 201206549 70D (first handle portion) and the first side formed on the -Z direction side of the first side surface 55 Ab of the frame 55 in the direction of the frame 55 and inclined toward the spacer 54 side at the taper angle 0 to the outside of the frame 55A The taper portion 55Abt (first inclined portion). The +X direction side surface 55Ac of the frame μα is inclined in parallel with the ZY plane. Further, the taper portion 48A2a of the taper angle 0 of the positioning block 48 is formed only in the frame 55A and the 1 corresponds to the portion of the tapered portion 5 5Abt. In this case, the positional relationship 'the Z direction of the first tapered portion 55Abt to the frame 55A is opposite to the positional relationship of the first tapered portion 50Abt to the Z direction of the frame 50A. The tapered portion 48A1a of the 48A1 and the tapered portion 48A2a of the positioning block 48A2 are different in position in the Z direction. Therefore, it is possible to prevent the first filter case 38B from being erroneously disposed in a certain space of the positioning block 48A2, and conversely, it is possible to prevent the first error. 2 The filter case 40B is disposed in a certain space of the positioning block 48A1 of Fig. 8(A). Further, this modification t, for example, The distance between the handle portion 70C on the frame 50A of the second filter case 38b and the second side face 5A and the handle portion 70D on the upper surface of the frame 55A of the second passer box 40B may be the same as the second side. The distance of the 50Ac is different. Further, the distance between the handle portion 7〇c and the end surface 50Aa may be different from the distance between the handle portion 70D and the end surface 5〇Ac. (3) Next, FIG. 9(A) shows the above. A plan view of the first filter case 38C and the positioning block 48A corresponding thereto according to the third modification of the embodiment. The filter case 38C houses the chemical filter 51 in the annular frame 5〇c at the end face of the frame 50C. Further, the first side surface 50Cb and the second side surface 50Cc of the frame 5〇c are inclined symmetrically on average, and stepped portions are formed on the side surfaces 5〇cb and 50Cc, respectively. Handle portion 36 201206549 70A. By moving the filter case 38c by bringing the first side face 50Cb or the second side face 50Cc into contact with the tapered portion of the positioning block 48A, the filter case 38C can be easily positioned in contact with the partition in the casing. Plate 42A. Fig. 9(B) shows the fourth modification example of the filter case 38D and the corresponding positioning block 48A. In the filter box 38D, the chemical filter 51 is housed in the annular frame 5〇D, and the spacer 54 is fixed to the end surface of the frame 5〇D. Further, the i-side 5 of the frame 50D is opposite. The 〇Db and the second side surface 50Dc are inclined symmetrically on average, and a plurality of convex arc portions are formed on the outer side, respectively, and the handle portion 7A is attached to the side surfaces 50Db and 5〇Dc. By moving the filter case 38D by bringing the first side face 50Db or the second side face 50Dc into contact with the tapered portion of the positioning block 48A, the filter case 38D can be easily positioned to contact the partition plate 42A. Further, Fig. 9(C) is a plan view showing the first filter case 38E of the fifth modification and the positioning block 48A corresponding thereto. In the filter case 38E, the chemical filter 51 is housed in the annular frame 50E, and the cymbal 54 is fixed to the end surface of the frame 50E. Further, the first side face 5〇Eb and the second side face 50Ec of the frame 50E are inclined symmetrically on the average side, and the convex arc portion is formed on the outer side, and the handle portion 70A is attached to the side faces 50Eb and 50Ec. By moving the filter case 38E by bringing the first side face 50Eb or the second side face 50Ec into contact with the tapered portion of the positioning block 48A, the filter case 38E can be easily positioned to contact the partition plate 42A. Further, the plurality of circular arc portions of Fig. 9(B) or the convex circular portions of Fig. 9(c) may be formed by a rotating roller. 37 201206549 (4) Next, Fig. 10(A) shows a filter device 26B of another example of the above embodiment, and Fig. 10(B) shows a first filter case 38F of Fig. 10(A). In the filter device 26B of Fig. 10(A), the partitioning plate 42A in the casing 28 is opposed to the filter boxes 38F, 40F, and the covering member can be easily separated from the gasket 54 and is slidable. A flat cover member TF5 having an opening through which a gas passes is formed in the center portion. The cover member TF5 is formed of, for example, a synthetic resin, and is specifically formed of, for example, Teflon (registered trademark of DuPont). Further, the first filter case 38F is positioned so as to be in close contact with the cover member TF5 that is attached to the partition plate 42A, and the second filter case 40F and the first one are sequentially positioned in close contact with the filter case 38F. The filter box 38F and the second filter box 40F. A row of filter boxes 38F, 40F, 38F, 40F are respectively positioned on the positioning blocks 48A3, 48B3, 48A4, 48B4 of the inner face of the casing 28. The lengths of the positioning blocks 48A3, 48B3 and the like in the Y direction are set to be smaller than the heights of the filter boxes 38F and 40F in the Y direction. In the filter boxes 38F and 40F, the chemical filters 51 and 56 are housed in the annular frames 50F and 55F, respectively, and the spacers 54 are fixed to the end faces of the frames 50F and 5 5F. Further, the first side surface and the second side surface of the frame 50F, 55F are symmetrically inclined, and the first side surface, the second side surface, and the end surface to which the spacer 54 is fixed are provided along the frames 50F, 55F. The opposite end faces are covered with cover members TF 1, TF2 which are easily separated from the spacer 54 and are slidable. The handle portions 70A and 70B are fixed to the first side surface and the second side surface opposite to the frames 50F and 55F through the cover members TF3 and TF4. Cover members TF3 and TF4 which are flat and partially grooved are also fixed to the tapered portions of the positioning blocks 48A3, 48A4, 48B3, and 48B4, respectively. The materials of the cover members TF1, TF2, TF3, TF4 are the same as those of (S) 38 201206549 1 such as the cover member TF5. As shown in Fig. 10(B), the cover member TF1 of the filter case 38F is dried, and the opening 51 TF1 c through which the gas passes is formed in the opposite portion of the filter 51. a cover member TF j covering the first side and the second side of the frame 50F
之部分作成對稱傾斜之錐部TFla，TFlb。雖過濾器箱4〇F 之構成亦相同，但把手部70B之位置與把手部7〇 A之位置 相異。 圖10(A)中，於關閉盒體28之門29之内侧設有移動用 桿58G。移動用桿58G具備台座部58G3、沿γ方向延伸之 導引部58G4、具有能沿導引部58G4移動於γ方向之傾斜 面之桿部58G卜以及從台座部58G3將桿部58G1往接觸定 位塊48B4之過濾器箱40F之罩構件TF2之錐部彈壓之壓縮 線圈彈簧58G2。 此例之過濾器裝置26B中，在將過濾器箱38F，4〇?收 納於盒體28内時，係分別使過濾器箱38F，4〇]ρ之罩構件τ]ρι TF2之錐部接觸於覆蓋定位塊48A3, 48B3, 48a4, 之之 罩構件TF3, TF4，使過濾器箱38F，40F依序往大致_γ方向 移動。此時，由於罩構件TF1〜TF4容易滑動，因此能容易 地移動過濾器箱38F, 40F。 進而，在已定位過濾器箱38F，4〇F, 38F，4〇F之狀態下， _Y方向端部之過濾器箱38F2墊片接觸覆蓋分隔板42A之 罩構件TF5，與過慮器相38F(40F)之罩構件tf 1 (TF2)相鄰 之過濾器箱40F(38F)之墊片54接觸於其。若在此狀態下關 閉門29’由於藉由移動用桿則將+γ方向端部之過濾器箱 39 201206549 40F往-Y方向彈壓，因此分隔板42A(罩構件TF5)與過濾器 箱38F，40F能保持氣密性地緊貼。因此，能通過四段過渡 器箱38F，40F將清淨之氣體供應至空調裝置之送風部（不圖 示）。 又，在更換過濾器箱38F，40F時，係開啟門29，依序 將過濾器箱38F，40F從盒體28搬出。此時，由於例如過遽 器箱40F之墊片54能從過濾器箱38F之罩構件TF1容易地 分離，過濾器箱38F之墊片54亦能從罩構件TF5容易地分 離，因此能容易地進行過濾器箱38F，40F之更換。 此外，過濾器裝置26B中，過濾器箱38F，4〇F之段數 為任意。又，定位塊48A3,48B3等之罩構件TF3，TF4係能 省略。進而，在設有定位塊48A3,48B3等之罩構件TF3,TF4 時’亦能省略過濾器箱38F，40F之罩構件TF1，TF2之錐部。 再者，亦能取代罩構件TF1〜TF4，貼附例如易滑動之 樹脂製黏附帶》 (5)上述實施形態及變形例中，過濾器箱38, 38A〜38F， 40’ 40A〜40之框架50, 50A〜50F及55, 55A〜55F之外形 係大致正方形（大致正方形之環狀（框狀））。然而，框架5〇, 55A及55, 55A等之外形亦可係例如長方形等大致矩形（大 致矩形之環狀（框狀））或大致正方形或矩形且於角部施有去 角等。 又’在使用上述實施形態之曝光裝置EX製造半導體元 件等電子元件（或微型元件）時，電子元件如圖丨丨所示，係 經進行電子元件之功能、性能設計之步驟22 1，根據此設計 40 201206549 乂驟製作光罩（標線片）之步驟222，製造元件基材即基板（晶 圓） 々九阻之步驟223，包含藉由前述實施形態之曝光 裝置將光軍之圖案曝光於基板（感應基板）之步驟、使已曝光 之基板顯影之步驟、已顯影基板之加熱（CURE)以及顯影步 驟之基板処理步驟224，元件組裝步驟（包含切割步驟、接 合步驟、封裝步驟等加工製程）225，以及檢査步驟226等而 製造。 疋以’此元件製造方法，包含使用上述實施形態之曝 光裝置於基板上形成感光層之圖案之動作與處理形成有該 圖案之基板之動作（步驟224)。藉由該曝光裝置，由於能減 低維護成本，提升曝光精度，因此能廉價且高精度地製造 電子元件。 此外，上述貫施形態中，雖使用空氣作為空調用之氣 體，但亦可取代其而使用氮氣或稀有氣體（氦、氖等）' 或此 等氣體之混合氣體等。 又，本發明不僅可適用於使用掃描曝光型之投影曝光 裝置進行曝光之情形，亦能適用於使用一次曝光型（步進機 型）之投影曝光裝置進行曝光之情形。 又，本發明亦能適用於以不使用投影光學系統之近接 方式或接觸方式之曝光裝置等進行曝光時。 又’本發明並不限定適用於半導體元件之製程， 乃、月b 廣泛適用於例如形成於角型玻璃板之液晶顯示元件、或電 漿顯示器等顯示器裝置之製程、或攝影元件（CCD等）、微型 機械、MMS(Microelectromechanical Systems :微小電氣機 201206549 械系統）、薄膜磁頭及DNA晶片等各種元件之製裎。進而， 本發明亦能適用於使用微影製程製造形成有各種元件之遮 罩圖案之遮罩（光罩、標線片等）時之製造步驟β 如上述’本發明並不限定於上述實施形態，當然可在 不脫離本發明要旨之範圍内採取各種構成。 又’援用本案所記載之上述公報' 各國際公開小冊子、 美國發明專利、或美國發明專利申請公開說明書中之揭示 作為本說明書記載之一部分。又，包含說明書、申請專利 範圍、圖式、以及摘要之2010年4月5日提出之美國發明 專利申請第61/320, 823號之所有揭示内容，均直接引用而 力α入本案中。 明 說 簡 式 圖 圖1係顯示實施形態一例之曝光裝置之構成之一部分 已切除之圖。 圖2係顯示圖1之過渡器裝置26之立體圖。 圖3係顯示圖2之過濾器裝置26之剖面圖。 圖4(A)係顯示圖3中之過濾器箱38之立體圖，（…係 顯示圖3中之過濾器箱4〇之立體圖。 圖5(A)及（B)係分別顯示過濾器箱與盒體28之相對 位置之變化之—部分已切除之俯視圖。 圖6(A)及（B)係分別顯示過濾器箱38，4〇與盒體28之 相對位置之變化之一部分已切除之俯視圖。 圖7(A)係顯示第1變形例之過據器箱“A之立體圖， 42 201206549 (B)係顯示第1變形例之過濾器箱40A之立體圖。 圖8(A)係顯示第2變形例之過濾器箱38B之立體圖， (B)係顯示第2變形例之過濾器箱40B之立體圖。 圖9(A)、（B)、（C)係分別顯示第3變形例、第4變形例、 及第5變形例之過濾器箱之俯視圖。 圖10(A)係顯示其他例之過濾器裝置之剖面圖，（B)係 顯示圖10(A)中之過濾器箱之立體圖。 圖11係顯示電子元件之製程一例之流程圖。 【主要元件符號說明】 EX :曝光裝置 R :標線片 PL :投影光學系統 W :晶圓 4 :曝光本體部 10 :腔室 26 :過濾器裝置 28 :盒體 30 :空調裝置 38,40 :過濾器箱 42A〜42C ·分隔板 48A〜48C :定位塊 50, 55 :框架 50b，55b :第1錐部 43 201206549 51，56 :化學過濾器 60 :局部空調裝置 70A，70B :把手部 ⑧ 44The portion is formed as a symmetrically inclined tapered portion TFla, TFlb. Although the configuration of the filter case 4〇F is also the same, the position of the handle portion 70B is different from the position of the handle portion 7A. In Fig. 10(A), a movement lever 58G is provided inside the door 29 closing the casing 28. The movement lever 58G includes a pedestal portion 58G3, a guide portion 58G4 extending in the γ direction, a rod portion 58Gb having an inclined surface that can move in the γ direction along the guide portion 58G4, and a contact portion 58G1 from the pedestal portion 58G3. The taper of the cover member TF2 of the filter case 40F of the block 48B4 is compressed by the compression coil spring 58G2. In the filter device 26B of this example, when the filter boxes 38F, 4b are housed in the casing 28, the taper portions of the cover members τ] ρ TF2 of the filter boxes 38F, 4 〇 ρ are respectively contacted. The cover members TF3, TF4 covering the positioning blocks 48A3, 48B3, 48a4, and the filter boxes 38F, 40F are sequentially moved in the substantially _γ direction. At this time, since the cover members TF1 to TF4 are easily slid, the filter boxes 38F, 40F can be easily moved. Further, in a state in which the filter boxes 38F, 4〇F, 38F, 4〇F are positioned, the filter case 38F2 at the end in the _Y direction contacts the cover member TF5 covering the partition plate 42A, and the filter unit 38F The cover member 54 of the (40F) cover member tf 1 (TF2) adjacent to the filter case 40F (38F) is in contact therewith. When the door 29' is closed in this state, the filter case 39 201206549 40F at the end in the +γ direction is biased in the -Y direction by the moving lever, so the partition plate 42A (cover member TF5) and the filter case 38F , 40F can maintain a close airtightness. Therefore, the cleaned gas can be supplied to the air supply portion (not shown) of the air conditioner through the four-stage transition box 38F, 40F. Further, when the filter boxes 38F and 40F are replaced, the door 29 is opened, and the filter boxes 38F and 40F are sequentially carried out from the casing 28. At this time, since the spacer 54 of the filter case 40F can be easily separated from the cover member TF1 of the filter case 38F, the spacer 54 of the filter case 38F can be easily separated from the cover member TF5, so that the spacer 54 can be easily separated. The filter boxes 38F, 40F are replaced. Further, in the filter device 26B, the number of the filter boxes 38F, 4〇F is arbitrary. Further, the cover members TF3, TF4 such as the positioning blocks 48A3, 48B3 can be omitted. Further, when the cover members TF3 and TF4 such as the positioning blocks 48A3 and 48B3 are provided, the tapered portions of the cover members TF1 and TF2 of the filter boxes 38F and 40F can be omitted. Further, in place of the cover members TF1 to TF4, it is also possible to attach, for example, a resin which is easy to slide, and the adhesive is attached. (5) In the above-described embodiments and modifications, the filter case 38, 38A to 38F, 40' 40A to 40 are framed. 50, 50A to 50F and 55, 55A to 55F are generally square in shape (a substantially square ring shape (frame shape)). However, the shapes of the frames 5, 55A, 55, 55A, etc. may be, for example, a rectangular shape such as a rectangle (a substantially rectangular ring shape (frame shape)) or a substantially square or rectangular shape, and a corner portion may be applied to the corner portion. Further, when an electronic component (or a micro component) such as a semiconductor element is manufactured by using the exposure apparatus EX of the above embodiment, the electronic component is subjected to a step 22 of performing the function and performance design of the electronic component as shown in FIG. Design 40 201206549 Step 222 of fabricating a mask (reticle), manufacturing a component substrate, ie, a substrate (wafer) step 223, including exposing the pattern of the light army to the pattern by the exposure apparatus of the above embodiment a step of a substrate (inductive substrate), a step of developing the exposed substrate, a heating of the developed substrate (CURE), and a substrate processing step 224 of the developing step, and a component assembly step (including a cutting step, a bonding step, a packaging step, etc.) ) 225, and inspection step 226, etc. are manufactured. The method for manufacturing the device includes the operation of forming a pattern of the photosensitive layer on the substrate by using the exposure device of the above embodiment, and the operation of forming the substrate on which the pattern is formed (step 224). According to this exposure apparatus, since the maintenance cost can be reduced and the exposure accuracy can be improved, the electronic component can be manufactured inexpensively and with high precision. Further, in the above-described embodiment, air is used as the gas for air conditioning, but a nitrogen gas or a rare gas (such as helium or neon) or a mixed gas of such a gas may be used instead. Further, the present invention can be applied not only to exposure using a scanning exposure type projection exposure apparatus but also to exposure using a single exposure type (stepper type) projection exposure apparatus. Further, the present invention is also applicable to exposure when an exposure apparatus or the like that does not use the projection optical system in the proximity or contact mode. Further, the present invention is not limited to a process suitable for a semiconductor device, and is widely applicable to, for example, a process of forming a liquid crystal display device such as a prismatic glass plate or a display device such as a plasma display device, or a photographic element (CCD, etc.). , micro-mechanics, MMS (Microelectromechanical Systems: micro electrical machine 201206549 mechanical system), thin film magnetic head and DNA wafers and other components. Furthermore, the present invention is also applicable to a manufacturing step of manufacturing a mask (a mask, a reticle, etc.) in which a mask pattern of various elements is formed by using a lithography process, as described above. The present invention is not limited to the above embodiment. It is a matter of course that various configurations can be made without departing from the gist of the invention. Further, the above-mentioned publications referred to in the present application are disclosed in the publications of the International Publications, the U.S. Patent, or the U.S. Patent Application Publications. In addition, all disclosures of the U.S. Patent Application Serial No. 61/320, 823, filed on Apr. 5, 2010, which is incorporated herein by reference in its entirety, is incorporated herein by reference. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a part of the configuration of an exposure apparatus showing an example of the embodiment. 2 is a perspective view showing the transition device 26 of FIG. 1. 3 is a cross-sectional view showing the filter device 26 of FIG. 2. Fig. 4(A) is a perspective view showing the filter case 38 of Fig. 3, showing a perspective view of the filter case 4'' in Fig. 3. Fig. 5(A) and Fig. 5(B) respectively show the filter case and A partial view of the change in the relative position of the casing 28. Fig. 6(A) and (B) are plan views showing a portion of the change in the relative position of the filter box 38, 4〇 and the casing 28, respectively. Fig. 7(A) is a perspective view showing a filter case "A" according to a first modification, and 42 201206549 (B) is a perspective view showing a filter case 40A according to a first modification. Fig. 8(A) shows a second view. (B) is a perspective view showing a filter case 40B according to a second modification. Fig. 9 (A), (B), and (C) are respectively showing a third modification and a fourth modification. A plan view of a filter case according to a modification and a fifth modification. Fig. 10(A) is a cross-sectional view showing a filter device of another example, and Fig. 10(B) is a perspective view showing the filter case of Fig. 10(A). Fig. 11 is a flow chart showing an example of the process of the electronic component. [Description of main component symbols] EX: Exposure device R: reticle PL: projection optical system W: wafer 4: Light main body portion 10: chamber 26: filter device 28: case 30: air conditioners 38, 40: filter boxes 42A to 42C, partition plates 48A to 48C: positioning blocks 50, 55: frame 50b, 55b: 1 Cone portion 43 201206549 51,56 : Chemical filter 60 : Local air conditioning unit 70A, 70B : Handle portion 8 44