201131457 ( 六、發明說明： 【發明所屬之技術領域】 參考 本發明係主張關於2009年12月〇1日申請之韓國專利衆 號10-2009-0118068之優先權。藉以引用的方式併入本文用作 本發明侧於-種電容式觸控面板，特別是一種電容式觸 控面板配置多個光學層於一透明電極上，每一光學芦具有不同 的折射係數（refractive index)以減少透明電極的反射率 (reflexibility)和一基板的反射率，藉此改善透明可見電極現象 (transparent electrode-visible phenomenon)。 【先前技術】 觸控面板大部份可依_控面板的操作方法歸類為電版 膜法、電容式法、投射式電容法、感應式法、以及表面聲波法 (surface ac〇ustlc wave meth〇d)。電阻膜法使用類比電阻膜法作 為X-Y座標的偵測準則，以及使用—般偵測法作為偵測輸入 點的座標。電阻關控面板具有低成本與尺寸上的優勢，但卻 有因長』使用下，物性接觸造成表面損壞的缺點。 相對的I各式觸控面板法為一種技術當债測到—傳導體 接觸或接近電極板，因電容值(C叩acitance)的改變而產生二 切換訊號。因此，電容式觸控面板近來已被廣泛發展作為一輔 助物以克服傳統電阻膜法的缺點。 也就是說’電容式觸控面板偵測透明傳導膜和接觸該透明 201131457 < 、 傳導膜的觸控筆所產生的電荷(electric charge)。電容式觸控面 板依照透明傳導膜和觸控筆間產生的電荷為基準計算出座標 值。但是，為產生電荷’用於電容式觸控面板的觸控筆需要一 獨立電源。因此，通常以電阻膜觸控面板來取代電容式觸控面 板作為輸入裝置。 然而’電容式觸控面板因再撓性(ref]exibility)(介於透明電 極圖案形成的區域與未形成透明電極圖案的區域之間）的不同 而產生所謂的”氧化銦錫(ITO)圖案可見（或可視)現象”，因而 造成觸控面板外觀不佳的缺點。 【發明内容】 因上述缺點而創造出本發明，而本發明之主要目的在於提 供一種電容式觸控面板配置多個光學層在一透明電極上，每一 光學層具有不同的折射係數以減少透明電極的反射率和一基 板的反射率，藉此改善透明可見電極現象。 在本發明的-考量面提供一種電容式觸控面板，該面板包 括一基板；一透明電極形成在一基板的部份區域；以及一光學 層以覆蓋(overspreading 0r blanketing)方式形成在形成有該: 明電極的該基板上，其中該光學層具有與該透明電極不同的折 射係數(refractive index)。 在本發明的-些實施例中，電容式觸控面板更包括一下塗 覆層㈣der-Coatinglayer)介於該基板和該透。明電極之間，該層 具有高於該基板的折射係數，但小於該透明電極的折射係數曰。 201131457 ‘' 在本U的些實施例中，該光學層係可選自由氧化銘 (alUmi_ °Xide)、二氧化邦i〇2)、氧化鋅(zinc 〇xlde)、或其 混合物(mixture)所組成的群組。 在本發月的3彳I面提供一電容式觸控面板，該面板包 括-基板；-透明電極形成在一基板的部份區域；以及一光學 層形成在該基板和該透明電極之間，該光學層具有不同於該基 板的折射係數。 在本發明的部份實施例巾，該光學層係可選自由氧化叙 (ahnni麵。xide)、二氧切(Si〇2)、氧化辞(臟。⑽）、或其 混合物(mixture)所組成的群組。 本發明之電容式觸控面板因有如此的配置而得以改善透 明電極可見現象以減少缺陷及得到美麗的外觀。 本發明之其他優點、目的、和特徵將於下文中詳細說明， 使熟知此技*者能在審視說g歧從制巾的範例使得本發明 明顯易知。本發明的其他目的和優點將可從描述的說明結構、 權利宣告範圍以及圖示中得以實現或獲得。 應被理解的是前述的概要說明和後續的詳細描述僅為範 例況明及作為解釋以作為權利宣告進一步的描述解釋。 【實施方式】 本發明可被修改成各種實施例，而特定的實施例將伴隨圖 示進行說明。應被理解的是’實施例並非用以限定本發明，且 任何屬於本發明精神下的修改、等效、以及替代均包含在本發 201131457 明。 應被理解的是，雖然第一、第二 描述各種元件、零件、區域、;;第三等的名稱被使用來 件、區域'層及/輕段不應被名’但這私件、零 來區別-元件、零件、區域、層⑼=1。处名稱僅是用 段。因此’以下所描述的一第一元件、零件、區 :不=亦可被稱為一第二元件、零件、區域 而不逐背本發明所揭露。 如果提及一元件，，連接到，，或”結人 _ ^ ^ ^ 缺士 〇到另一兀件時，應被理 解忒7L件可直接連接到或結合到 疋件或者另有一元件插 目反地’如果提及—π件是”直接連接到”或，，直接 結合到”另—元件時，應_解未有料—元件插人於其中。 、在此所❹的術語僅為絲描述駄實施狀目的故不 應被用來限制本發明。如使用的單數型形式的”一，，、”該，， 應同時包含複數型形式，除敎有崎楚制。在圖示中，建 構元件的尺寸與形狀為了能被清楚說明，可被誇大或缩減，而 相同的元件符號在全文中代表相同元件。 圖1為根據本發明第一實施例之觸控面板的剖視圖。圖2 為根據本發明一實施例之不同光學層材料下的反射率差異示 圖。而圖3為根據本發明一實施例之以堆疊圖案形成有光學層 的觸控面板的剖視圖。 根據本發明的電容式觸控面板包括：一基板100 透明 電極300形成在基板1〇〇的一部份區域；以及一光學層400形 201131457 ( ' 成在形成有該透明電極的該基板和該基板的其餘部份上。 基板100可包括玻璃(glass)和其他各種塑膠材料包含但不 限定於聚對苯二曱酸乙二酯(PET)、丙烯酸聚碳酸 醋(polycarbonate)、以及透明傳導氧化物，例如摻雜氧化錫 (doped tin oxide)。基板1〇〇可具有厚度介於20〜5〇〇μιη，且藉 由一支撐物所貼附以確保其剛性(stiffness)。基板丨〇〇可形成有 一下塗覆層200其可包括如Si02、Ti02以及氧化錫(stannic oxide)的材料。 透明電極300形成在基板1〇〇上，可包括氧化銦錫(indium tin oxide; ITO)、氧化錫録(tin antimony oxide; TAO)以及透明傳 導氧化物(transparent conductive oxides)例如摻雜氧化錫(doped tin oxides)，其可使用物理氣相沉積法（PVD engineering methods)例如濺鍍（sputtering)、電阻蒸鍍（resistance evaporation)、電子束蒸鑛(eiectronic beam evaporation)、以及 離子電鍍法(ion plating method)而被蒸鍍在基板100上、或使 用化干氣相、’儿積（CVD engineering method)和印刷法（printing method) ° 雖然未纟會示於圖示上’透明電極3〇〇的一上邊限(margin) 可形成有一線路圖案(未繪示)其由傳導金屬所組成。該線路圖 案可排列在透明電極300的邊限區域以提供電壓到透明電極 300。該線路圖案可使用例如銀膠(Agpaste)的傳導材料，舉例 而§ ’該線路圖案可連接到一驅動整合線路晶片（driving integrated circuit chip)(未繪示）以接收一電力。 201131457 1 ， 舉例而言，透明電極300可採用菱形（1〇zenge)或矩形 (rectangle)的一預定圖案在基板削上。然而，該圖案並非限 定於此，其可採用其它任意的形狀。舉例而言，透明電極可以 預定的厚度塗覆在基板100上，並根據圖案而從基板刚移 除。為了移除該些部份，可利用包括微影蝕刻 (photolithography)、雷射剝蝕（laser ablati〇n)、蝕刻和圖案剝 離(patterned lift-off)的各種技術。 因此，基板100形成有一塗覆透明電極3〇〇的區域及一暴 4出該基板的暴路區。而為方便起見，被透明電極3〇〇塗覆的 區域定義為”第一區域(A)”而該暴露區定義為，，第二區域 ⑻”。 基於透明電極300和基板1〇〇或下塗覆層2〇〇的折射係數 差異’第-和第二區段(A，B)可產生對可見光反射的不同反射 率(reflectivity)。 光學層400形成來克服反射率的差異。光學層4〇〇可選自 由氧化铭(aluminum oxide)、氧化矽(silic〇n 〇xide)、氧化辞⑶此 oxide)、或 tin oxide-oxide hafnium 系列、smc〇n 〇xide silic〇n oxide系列、zinc oxide-titan oxide系列材料所組成的群組。 更精確的說，光學層400以相同厚度蒸鍵在第一區域(A) 和第二區域(B)上’其中該聽法包括所有的蒸鍍法。舉例而 言，光學層400可使用例如濺鍍（sputtering)、電阻蒸鍍 (resistance evaporation) ' 以及電子束蒸鍍（dectr〇nic beam evaporation)法。 201131457 * ^ 光學層可依據所使用的材料而形成有不同的厚度。參閱圖 2，應注意的是反當氧化鋁的折射係數是163而蒸鑛厚度是接 近40 60nm與純粹(bare)ITO的穿透率(transmittance)|^為不顯 著時，折射率(reflectivity)的差異變最小。 應注意的是當氧化鋅的折射係數是2. 〇 2 5而蒸鍍厚度是接 近40〜50mn時，與純粹汀〇穿透率(transmittance)的差異是減 少的。再者，當透明電極300的厚度是少於25nm時，從第一 和第二區域(A，B)反射的光的折射率差異的絕對值可減少到少 於0.5 ’即使是氧化鋅的厚度少於4〇nm。 當為氧化鈦(titan oxide)時，如果蒸鍍後的厚度為丨〇〜3 〇nm 小於氧化銘(aluminum oxide)或氧化辞(zinc oxide)的厚度時，值 得注意的是純粹(bare)ITO和穿透率的差異得以降低。再者， 在一情況下光學層400形成在第一和第二區域(A，B)，從第一 區域(A)和第二區域⑺)反射的外部光的波長變為相互干擾抵 消波長(interference-offsetting wavelength)，因此透明電極 3〇〇 的圖案是不容易從外部被看見的，因而有利於改善可見性問 題。 參閱圖3, 一光學層500可在一堆疊形態上形成有一低折 射係數層510以及一高折射係數層52〇具有相對高於低折射係 數層510的折射係數。此時，高折射係數層52〇可包括蒸鍍厚 度為10〜50nm的矽石氧化膜⑽ic〇n st_ 〇xide fihn)，而低折 射係數層510可包括蒸鑛厚度為5〇〜1〇〇nm的氧化石夕膜㈣如 silicon film)。 201131457 · ' 如此結構的配置可創造出限制可見光在入射至觸控面板 内部時’在同時穿越每一層具有不同折射係數的多層膜時，多 達一半的反射效果。 圖4為根據本發明另一實施例的電容式觸控面板的剖視 圖。 根據本發明另一實施例的電容式觸控面板可包括一基板 100，一透明電極3〇〇形成在一基板的部份區域；以及一光學 層600形成在基板1〇〇和透明電極3〇〇之間，該層具有不同於 基板100的折射係數。 光學層600蒸鍍在第一區域(A)及具有均勻厚度，其中蒸 鍍法可包括一般的蒸鍍法，其包含但不限定於濺鍍法、電阻蒸 鍍和電子束蒸鍍法。光學層600形成在透明電極3〇〇和基板 100之間，其中透明電極3〇〇經塗覆和蝕刻以形成預定圖案後 被塗佈到光學層600。 然而，所述之配置並不限定於此。舉例而言，光學層6〇〇 可形成在透明電極3〇〇的上表面上。依據這些配置，透明電極 300的厚度和第一區域(A )的光學層600可提供一防止反射特 徵’因此可見光從第一區域(A)和第二區域(B)的反射變得相 同。 再者，塗佈在第一區域(A)的光學層600使用光干擾 (optical interference)以允許從光學層600的表面反射光及表面 活性物質（Surfactant)反射光的相位(phases)反向（reverse)。因 此’重疊的波長將干擾抵消以減少反射光。此時，下列公式必 11 201131457 ^ ' 須得到滿足。 【公式1】 (η ι)2= η。*ιΐ2 【公式2】 ηι *<1ι=λ/4 其中η為一薄膜折射係數’ di為一薄膜厚度而di為基板 (100)的折射係數。 如果符合上述狀況’從光學層600反射的光的波長和從透 明電極300反射的光的波長產生一 λ/4相位差，藉此產生干擾 使反射為0百分比。因此，光學層600的厚度可調整到符合公 式1和2的狀況，藉此透明電極300的圖案將無法外部看見。 雖然本發明以示範實施例方式進行說明，本發明揭露的實 施例所考量的方面僅為例證，且並非用以限定本發明。雖然較 佳實施例被揭露用來描述本發明，但應理解，熟習此項技術者 可想出落入本發明之原理的精神及範疇内的眾多其他修改及 實施例之可能。 【圖式簡單說明】 作為提供進一步了解以及構成本發明之附圖繪示出本發 明之實施例及作為解釋本發明之原理。在圖示中： 圖1為根據本發明第一實施例之觸控面板的剖視圖； 圖2為根據本發明一實施例之不同光學層材料下的反射 率(reflectivity)差異示圖； 圖3為根據本發明一實施例之以堆疊圖案形成有光學層 12 201131457 * 、 .的觸控面板的剖視圖；以及 圖4為根據本發明另一實施例之電容式觸控面板的剖視 圖。 【主要元件符號說明】 100 基板 200 下塗覆層 300 透明電極 400 光學層 500 光學層 510 低折射係數層 520 高折射係數層 600 光學層 R1 折射係數 R2 折射係數 A 第一區域 B 第二區域 13</ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> <RTIgt; The present invention is directed to a capacitive touch panel, in particular, a capacitive touch panel is provided with a plurality of optical layers on a transparent electrode, each optical reed having a different refractive index to reduce the transparent electrode. Reflectivity (reflexibility) and reflectivity of a substrate, thereby improving the transparent electrode-visible phenomenon. [Prior Art] Most of the touch panel can be classified into an electrotype according to the operation method of the control panel. Membrane method, capacitive method, projected capacitance method, inductive method, and surface acoustic wave method (surface ac〇ustlc wave meth〇d). The resistive film method uses the analog resistive film method as the detection criterion for XY coordinates, and uses— The general detection method is used as the coordinate for detecting the input point. The resistance control panel has the advantages of low cost and size, but it has a long-term use and physical contact. The disadvantage of causing surface damage. The relative I touch panel method is a technique when the debt is measured - the conductor contacts or approaches the electrode plate, and the switching signal is generated due to the change of the capacitance value (C叩acitance). Therefore, the capacitor Recently, touch panels have been widely developed as an aid to overcome the shortcomings of the traditional resistive film method. That is to say, the capacitive touch panel detects the transparent conductive film and the stylus that contacts the transparent 201131457 < The electric charge generated. The capacitive touch panel calculates the coordinate value based on the charge generated between the transparent conductive film and the stylus. However, in order to generate the charge, the stylus for the capacitive touch panel A separate power supply is required. Therefore, a resistive touch panel is usually used as an input device instead of a capacitive touch panel. However, the capacitive touch panel is re-flexible (in the region where the transparent electrode pattern is formed). A so-called "indium oxide tin (ITO) pattern visible (or visible) phenomenon" is caused by a difference between a region where a transparent electrode pattern is not formed), thereby causing a touch surface The present invention has been made in view of the above disadvantages, and the main object of the present invention is to provide a capacitive touch panel having a plurality of optical layers disposed on a transparent electrode, each optical layer having a different Refractive index to reduce the reflectivity of the transparent electrode and the reflectivity of a substrate, thereby improving the transparent visible electrode phenomenon. In the present invention, a capacitive touch panel is provided, the panel includes a substrate; a transparent electrode is formed And a portion of the substrate; and an optical layer is formed on the substrate on which the electrode is formed by overspreading, wherein the optical layer has a different refractive index than the transparent electrode . In some embodiments of the invention, the capacitive touch panel further includes a lower coating layer (four) der-Coating layer between the substrate and the transparent layer. Between the bright electrodes, the layer has a refractive index higher than that of the substrate, but is smaller than the refractive index 曰 of the transparent electrode. 201131457 '' In some embodiments of the present U, the optical layer is selected from the group consisting of free oxidized (alUmi_°Xide), oxidized zinc (i2), zinc oxide (zinc 〇xlde), or a mixture thereof. The group consisting of. Providing a capacitive touch panel on the side of the first month of the month, the panel includes a substrate; a transparent electrode is formed in a partial region of the substrate; and an optical layer is formed between the substrate and the transparent electrode The optical layer has a refractive index different from that of the substrate. In some embodiments of the present invention, the optical layer may be selected from the group consisting of ahnni (xide), dioxin (Si〇2), oxidized (dirty (10)), or a mixture thereof. The group consisting of. The capacitive touch panel of the present invention has such a configuration that the visible electrode visible phenomenon can be improved to reduce defects and obtain a beautiful appearance. Other advantages, objects, and features of the invention will be described in detail hereinafter, and the present invention will be readily apparent to those skilled in the art. Other objects and advantages of the present invention will be realized or obtained from the description of the appended claims. It is to be understood that the foregoing general description and claims [Embodiment] The present invention can be modified into various embodiments, and specific embodiments will be described with reference to the drawings. It is to be understood that the embodiments are not intended to limit the invention, and any modifications, equivalents, and substitutions in the spirit of the invention are included in the present invention. It should be understood that although the first and second descriptions of various components, parts, regions,; third name are used, the area 'layer and / light section should not be named' but this is a private piece, zero To distinguish - components, parts, regions, layers (9) = 1. The name is only used. Thus, a first element, component, or region described below is not to be referred to as a second component, component, or region, and is not disclosed herein. If a component is mentioned, connected to, or "connected" _ ^ ^ ^ is missing from another component, it should be understood that the 7L piece can be directly connected or bonded to the component or another component is inserted. Inversely, if the reference to -π is "directly connected to" or, when directly combined with the "other" component, the component should be inserted into it. The terminology used herein is for the purpose of describing the invention and is not intended to limit the invention. If the singular type of "one,,," is used, it shall contain the plural form, except for the singularity. In the drawings, the size and shape of the structural elements may be exaggerated or reduced in order to be clearly described, and the same element symbols represent the same elements throughout. 1 is a cross-sectional view of a touch panel in accordance with a first embodiment of the present invention. 2 is a graph showing the difference in reflectance under different optical layer materials in accordance with an embodiment of the present invention. 3 is a cross-sectional view of a touch panel in which an optical layer is formed in a stacked pattern in accordance with an embodiment of the present invention. The capacitive touch panel according to the present invention comprises: a substrate 100; a transparent electrode 300 formed on a portion of the substrate 1; and an optical layer 400 shaped 201131457 ('in the substrate on which the transparent electrode is formed and the The remaining portion of the substrate. The substrate 100 may comprise glass and various other plastic materials including, but not limited to, polyethylene terephthalate (PET), acrylic polycarbonate, and transparent conductive oxidation. The substrate, for example, doped tin oxide, may have a thickness of 20 to 5 μm and is attached by a support to ensure its rigidity. A lower coating layer 200 may be formed which may include materials such as SiO 2 , TiO 2 , and stannic oxide. The transparent electrode 300 is formed on the substrate 1 , and may include indium tin oxide (ITO), tin oxide. Tin antimony oxide (TAO) and transparent conductive oxides such as doped tin oxides, which can be used by PVD engineering methods such as sputtering (sp Butting), resistance evaporation, eiectronic beam evaporation, and ion plating method are deposited on the substrate 100, or using a dry gas phase, CVD engineering method) and printing method ° Although an upper limit of the 'transparent electrode 3' is shown in the figure, a line pattern (not shown) may be formed which is composed of a conductive metal. The line pattern may be arranged in a margin region of the transparent electrode 300 to provide a voltage to the transparent electrode 300. The line pattern may use a conductive material such as Agpaste, for example, § 'The line pattern can be connected to a driver integrated A driving integrated circuit chip (not shown) is used to receive a power. 201131457 1 For example, the transparent electrode 300 may be cut on the substrate by a predetermined pattern of a diamond or a rectangle. However, the pattern is not limited thereto, and any other shape may be employed. For example, the transparent electrode may be coated on the substrate 100 with a predetermined thickness, and In addition to the case just shifted from the substrate. In order to remove these portions, various techniques including photolithography, laser ablading, etching, and patterned lift-off can be utilized. Therefore, the substrate 100 is formed with a region where the transparent electrode 3 is coated and a storm region where the substrate is exploded. For convenience, the area coated by the transparent electrode 3〇〇 is defined as “first area (A)” and the exposed area is defined as, the second area (8)”. Based on the transparent electrode 300 and the substrate 1〇〇 or The difference in refractive index of the lower coating layer 2', the first and second sections (A, B), can produce different reflectivities for visible light reflection. The optical layer 400 is formed to overcome the difference in reflectance. 〇〇Optional aluminum oxide, silic〇n 〇xide, oxidized (3)oxide, or tin oxide-oxide hafnium series, smc〇n 〇xide silic〇n oxide series, zinc oxide More specifically, the optical layer 400 is steamed at the same area (A) and the second area (B) with the same thickness. The method includes all vapor deposition methods. For example, the optical layer 400 may use, for example, sputtering, resistance evaporation, and electron beam evaporation. 201131457 * ^ The optical layer may be based on the material used. And formed with different thicknesses. See 2. It should be noted that when the refractive index of alumina is 163 and the thickness of the evaporated ore is close to 40 60 nm and the transmittance of bare ITO is not significant, the difference in reflectivity It should be noted that when the refractive index of zinc oxide is 2. 〇2 5 and the thickness of vapor deposition is close to 40~50mn, the difference from the puret transmittance is reduced. When the thickness of the transparent electrode 300 is less than 25 nm, the absolute value of the refractive index difference of the light reflected from the first and second regions (A, B) can be reduced to less than 0.5 ' even if the thickness of the zinc oxide is less than 4 〇 Nm. When it is titanium oxide, if the thickness after evaporation is 丨〇~3 〇nm is less than the thickness of aluminum oxide or zinc oxide, it is worth noting that it is pure (bare The difference in ITO and transmittance is reduced. Further, in one case, the optical layer 400 is formed in the first and second regions (A, B), reflected from the first region (A) and the second region (7). The wavelength of the external light becomes the interference-offsetting wavelength, so it is transparent Very 3〇〇 pattern is not readily visible from the outside, and thus help to improve the visibility of the problem. Referring to Fig. 3, an optical layer 500 may have a low refractive index layer 510 and a high refractive index layer 52 in a stacked configuration having a refractive index relatively higher than that of the low refractive index layer 510. At this time, the high refractive index layer 52 may include a vermiculite oxide film (10) ic〇n st_ 〇xide fihn) having an evaporation thickness of 10 to 50 nm, and the low refractive index layer 510 may include a vapor deposition thickness of 5 〇 1 to 1 〇〇. The oxidized stone film of nm (4) is a silicon film. 201131457 · 'The configuration of this structure can create up to half of the reflection effect when the visible light is incident on the inside of the touch panel while simultaneously traversing each layer of the multilayer film with different refractive indices. 4 is a cross-sectional view of a capacitive touch panel in accordance with another embodiment of the present invention. A capacitive touch panel according to another embodiment of the present invention may include a substrate 100, a transparent electrode 3 is formed in a partial region of the substrate, and an optical layer 600 is formed on the substrate 1 and the transparent electrode 3 Between the turns, the layer has a refractive index different from that of the substrate 100. The optical layer 600 is vapor-deposited in the first region (A) and has a uniform thickness, wherein the evaporation method may include a general vapor deposition method including, but not limited to, sputtering, resistance vapor deposition, and electron beam evaporation. The optical layer 600 is formed between the transparent electrode 3A and the substrate 100, wherein the transparent electrode 3 is coated and etched to form a predetermined pattern and then applied to the optical layer 600. However, the configuration described is not limited to this. For example, an optical layer 6〇〇 may be formed on the upper surface of the transparent electrode 3〇〇. According to these configurations, the thickness of the transparent electrode 300 and the optical layer 600 of the first region (A) can provide a reflection preventing feature so that the reflection of visible light from the first region (A) and the second region (B) becomes the same. Furthermore, the optical layer 600 coated in the first region (A) uses optical interference to allow reflection of light from the surface of the optical layer 600 and reverse phase of reflected light of the surface active material (Surfactant) ( Reverse). Therefore, the overlapping wavelengths will interfere with the cancellation to reduce the reflected light. At this time, the following formula must be met 11 201131457 ^ '. [Formula 1] (η ι) 2 = η. *ιΐ2 [Formula 2] ηι *<1ι=λ/4 where η is a film refractive index 'di is a film thickness and di is a refractive index of the substrate (100). If the wavelength of the light reflected from the optical layer 600 and the wavelength of the light reflected from the transparent electrode 300 are caused to produce a λ/4 phase difference, the interference is caused to cause the reflection to be 0%. Therefore, the thickness of the optical layer 600 can be adjusted to conform to the conditions of the formulas 1 and 2, whereby the pattern of the transparent electrode 300 will not be externally visible. While the invention has been described by way of illustrative embodiments, the aspects of the embodiments disclosed herein Although the preferred embodiments are disclosed to describe the present invention, it is understood that those skilled in the art can devise various other modifications and embodiments within the spirit and scope of the principles of the invention. BRIEF DESCRIPTION OF THE DRAWINGS The embodiments of the present invention are shown as a 1 is a cross-sectional view of a touch panel according to a first embodiment of the present invention; FIG. 2 is a view showing a difference in reflectivity under different optical layer materials according to an embodiment of the present invention; A cross-sectional view of a touch panel in which an optical layer 12 201131457* is formed in a stacked pattern in accordance with an embodiment of the present invention; and FIG. 4 is a cross-sectional view of a capacitive touch panel in accordance with another embodiment of the present invention. [Main component symbol description] 100 substrate 200 lower coating layer 300 transparent electrode 400 optical layer 500 optical layer 510 low refractive index layer 520 high refractive index layer 600 optical layer R1 refractive index R2 refractive index A first region B second region 13