TW201129505A - Synthetic amorphous silica powder and process for producing the same - Google Patents

Synthetic amorphous silica powder and process for producing the same

Info

Publication number
TW201129505A
TW201129505A TW100100200A TW100100200A TW201129505A TW 201129505 A TW201129505 A TW 201129505A TW 100100200 A TW100100200 A TW 100100200A TW 100100200 A TW100100200 A TW 100100200A TW 201129505 A TW201129505 A TW 201129505A
Authority
TW
Taiwan
Prior art keywords
silica powder
amorphous silica
synthetic amorphous
less
powder
Prior art date
Application number
TW100100200A
Other languages
English (en)
Other versions
TWI488812B (zh
Inventor
Toshiaki Ueda
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW201129505A publication Critical patent/TW201129505A/zh
Application granted granted Critical
Publication of TWI488812B publication Critical patent/TWI488812B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
TW100100200A 2010-01-07 2011-01-04 合成之非晶質二氧化矽粉末及其製造方法 TWI488812B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010001793 2010-01-07

Publications (2)

Publication Number Publication Date
TW201129505A true TW201129505A (en) 2011-09-01
TWI488812B TWI488812B (zh) 2015-06-21

Family

ID=44305446

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100100200A TWI488812B (zh) 2010-01-07 2011-01-04 合成之非晶質二氧化矽粉末及其製造方法

Country Status (7)

Country Link
US (1) US8883110B2 (zh)
EP (1) EP2522630B1 (zh)
JP (3) JP2011157261A (zh)
KR (1) KR101668906B1 (zh)
CN (1) CN102656117B (zh)
TW (1) TWI488812B (zh)
WO (1) WO2011083710A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140002673A (ko) * 2011-03-23 2014-01-08 미쓰비시 마테리알 가부시키가이샤 합성 비정질 실리카 분말 및 그 제조 방법
JP5857525B2 (ja) * 2011-08-18 2016-02-10 富士ゼロックス株式会社 シリカ粒子及びその製造方法
KR20160068828A (ko) 2013-10-04 2016-06-15 코닝 인코포레이티드 Rf 플라즈마를 사용하는 유리 재료의 용융
CN104568535A (zh) * 2013-10-29 2015-04-29 中芯国际集成电路制造(上海)有限公司 Vpd样品收集方法
CN103712951B (zh) * 2013-12-31 2016-03-09 清华大学深圳研究生院 一种基于三维结构纳米阵列生物芯片的制备方法及其应用
US9745201B2 (en) * 2014-01-29 2017-08-29 Mitsubishi Materials Corporation Synthetic amorphous silica powder and process for manufacturing same
US9550694B2 (en) 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
CN104451621A (zh) * 2014-12-04 2015-03-25 苏州润佳工程塑料股份有限公司 二氧化硅镀银复合粉体的制备方法
US20160200618A1 (en) 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
EP3807215A1 (de) 2018-06-15 2021-04-21 Solar Silicon GmbH Verfahren zur herstellung von elementarem silizium

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1493394A (en) 1974-06-07 1977-11-30 Nat Res Dev Plasma heater assembly
US4789501A (en) * 1984-11-19 1988-12-06 The Curators Of The University Of Missouri Glass microspheres
JPS62176929A (ja) 1986-01-30 1987-08-03 Olympus Optical Co Ltd 成形型の離型リング
JP2545282B2 (ja) * 1989-04-17 1996-10-16 日東化学工業株式会社 球状シリカ粒子の製造方法
JPH03275527A (ja) 1990-03-24 1991-12-06 Mitsubishi Kasei Corp 多孔質シリカガラス粉末
JPH0475848A (ja) 1990-07-17 1992-03-10 Toyoda Mach Works Ltd 適応制御装置
GB9108891D0 (en) * 1991-04-25 1991-06-12 Tetronics Research & Dev Co Li Silica production
FR2693451B1 (fr) * 1992-07-07 1994-08-19 Alcatel Nv Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique.
US5888587A (en) 1992-07-07 1999-03-30 Alcatel N.V. Method of manufacturing silica powder and use of such powder in making an optical fiber preform
JP3350139B2 (ja) 1993-03-31 2002-11-25 三菱レイヨン株式会社 球状シリカ粒子の製造方法
JP3566825B2 (ja) * 1996-12-27 2004-09-15 高周波熱錬株式会社 熱プラズマによる加熱処理粒体及び加熱処理方法
GB0130907D0 (en) * 2001-12-22 2002-02-13 Ineos Silicas Ltd Amorphous silica
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
JP3639279B2 (ja) * 2003-01-24 2005-04-20 高周波熱錬株式会社 熱プラズマによる粉末の合成／精製または球状化方法とその装置
CN1281488C (zh) * 2004-06-25 2006-10-25 中国科学院过程工程研究所 一种纳米高纯二氧化硅的制备方法
EP1777302B1 (en) * 2005-10-21 2009-07-15 Sulzer Metco (US) Inc. Plasma remelting method for making high purity and free flowing metal oxides powder
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
JP5115209B2 (ja) * 2008-01-21 2013-01-09 東ソー株式会社 表面が平滑なセラミックビーズの製造方法

Also Published As

Publication number Publication date
KR101668906B1 (ko) 2016-10-24
JPWO2011083710A1 (ja) 2013-05-13
EP2522630B1 (en) 2016-11-16
US20120299207A1 (en) 2012-11-29
WO2011083710A1 (ja) 2011-07-14
US8883110B2 (en) 2014-11-11
CN102656117A (zh) 2012-09-05
JP2011157261A (ja) 2011-08-18
EP2522630A1 (en) 2012-11-14
KR20120120149A (ko) 2012-11-01
JP5724881B2 (ja) 2015-05-27
EP2522630A4 (en) 2014-06-11
TWI488812B (zh) 2015-06-21
CN102656117B (zh) 2016-04-13
JP2011157264A (ja) 2011-08-18

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