TW201037459A

TW201037459A - Colored photosensitive resin composition for short wavelength laser exposure device, and LCD and color filter using the composition

Info

Publication number: TW201037459A
Application number: TW099107170A
Authority: TW
Inventors: Il-Ho Kim; Tae-Soo Kang; Se-Uk Hwang
Original assignee: Dongwoo Fine Chem Co Ltd
Priority date: 2009-03-16
Filing date: 2010-03-11
Publication date: 2010-10-16
Also published as: JP5011560B2; JP2010217895A; KR101403153B1; TWI402620B; CN101840155A; KR20100103987A

Abstract

This invention discloses a colored photosensitive resin composition for a short wavelength laser exposure device, and an LCD and a color filter using the composition. The colored photosensitive resin composition for a short wavelength laser exposure device of this invention comprises photopolymerization initiator (A) containing oxime ester polymerization initiator, silicon compound (B), adhesive resin (C), photopolymerizable compound (D), coloring material (E) and solvent (F), such that high sensitivity and high adhesion strength can be obtained when applied to the short wavelength laser exposure device.

Description

201037459 六、發明說明：【發明所屬之技術領域】本發明是有關於一種短波長雷射曝光裝置用光性樹脂組成物，特別是有關於一種應用於使用短^ 為光源’以使彩色濾光片可完成像素形成的曝^ ' 心#現高感度及高密著性等之短波長雷射曝光裝置用者色感紐樹脂組成物、使用此組色濾光片及液晶顯示裝置。 / Ο 【先前技術】干裝目署5 =濾光片係廣泛應用於攝像元件、液晶靡。虞置(LCD)·#領域，且其應用範圍正急劇地擴增。用在彩色液晶顯示裝置或攝像元件等彩 =言’是在形成有黑色矩陣圖型的基板=旋轉 =、狹縫塗㈣方式，將分別含有料的紅色、綠= 及益色顏料的著色感光性樹脂組成物均—地塗佈後，經 ΐ熱顯1有ί先燒成的情況)後所形成的塗膜進饤曝先及顯像’並可依據需求更進㈣各義色重複i 物作以形成各色像素，而製造出彩色遽光片。用以形成上述著色感光性樹脂組成 =劑樹脂的同時，亦常使用含有光聚合== 發劑的組成物’在黑色矩陣的形成中，也使用 3有黑色顏料的著色感光性樹脂組成物。 #久：t: ’主t近的彩色遽光片製造技術的主要課題 ίίί ㈣省製造費肖’用崎決上述課題〃 ’，、私國公開特許公報2007-0021971所提案 201037459 光源對著色感她旨組成物進行曝 ^用等法’相較於習知的高二退專，具有縮短曝光時間的優點。另-方面，由脂塗膜的短、，因而光能量無法傳送到達感光性樹 ^反二二’進而造成塗膜整體無法充分地產生硬顆二Γί過程中像賴形易於脫離或剝離等問或剝離，在真空 1=:二在後段製程亦易於脫離嘑熱4 ，因排出雜質而對彩色 Λ"' 、等產生影響，而成為不良率增加的原因。此外在光源是固定的狀態下，邊移動基板邊進行曝光的裝置在特性卜，田盔羽Λ # 牧透進订物㈣心Μ 因為嘉知的者色感光性樹脂組成像素圖型的表面部無法均-地曝 ;‘、、、象後產生微細的不均勻，而引起彩色滹光片的色純度下降的問題。 W私色慮先片【發明内容】一有鑑於上述先前技術之問題，本發明之1 就疋在提供一種短波長雷射曝 ^ 、度，且使用於短波長雷射曝光裝置時具有高感又丑波長辑射光源而具有高密著性之效果。 +射發明之另一目的，提出-種使用上述短波長品質的彩色濾、光片。取物之冋丌罪性及网目的’提出—種使用光片之液晶顯示裝置。 4t 201037459 為了達到上述目的，本發明所提供之短波長雷射曝光裝置用著色感光性樹脂組成物，係包含含有以一般式 1表示之肟酯系聚合引發劑之光聚合引發劑（A)、以一般式2表示之矽化合物（B)、結合劑樹脂（c)、光聚合性化合物（D)、著色材料（E)以及溶劑（F)。 (一般式1)201037459 VI. Description of the Invention: [Technical Field] The present invention relates to a light resin composition for a short-wavelength laser exposure apparatus, and more particularly to a method for applying a short light source to color filter The sheet can be used to form a color-sensitive neo-resin composition for a short-wavelength laser exposure apparatus such as a high-sensitivity and high-density of the pixel formation, using the color filter and the liquid crystal display device. / Ο [Prior Art] Dry Packing Station 5 = Filter system is widely used in imaging elements, LCD 靡. The device (LCD)·# field, and its application range is rapidly expanding. It is used in a color liquid crystal display device or an image sensor, etc., in the form of a substrate having a black matrix pattern = rotation =, slit coating (four), and coloring of red, green, and color pigments respectively containing materials. After the composition of the resin is applied to the ground, after the heat is displayed, the film formed by the film is exposed and the image is formed, and the film can be further exposed according to the demand (4) The object is formed to form pixels of various colors to produce a color calender. In order to form the above-mentioned colored photosensitive resin composition = a resin, a composition containing a photopolymerization == hair agent is often used. In the formation of a black matrix, a colored photosensitive resin composition having a black pigment is also used. #久:t: 'The main subject of the color twilight manufacturing technology of the main t ί ί ί 省 ' ' ' ' 用用用用用用、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、 She has the advantage of shortening the exposure time compared to the conventional high-level retreat method. On the other hand, the film of the grease film is short, and thus the light energy cannot be transmitted to reach the photosensitive tree, and the film is not able to sufficiently produce the hard film. In the process, the image is easily detached or peeled off. Peeling, in the vacuum 1 =: two in the latter stage of the process is also easy to get rid of the heat 4, due to the discharge of impurities on the color quot " ', etc., and the reason for the increase in the rate of non-performing. In addition, in the state where the light source is fixed, the device for performing exposure while moving the substrate is characterized by the characteristics of the surface, the surface of the helmet, and the surface of the pixel pattern. It is impossible to uniformly expose the ground; the fine unevenness is generated after the image, and the color purity of the color calender sheet is lowered. W Private color considerations [Invention] In view of the above problems of the prior art, the present invention 1 provides a short-wavelength laser exposure and a high-sensitivity when used in a short-wavelength laser exposure apparatus. The ugly wavelength is used to illuminate the light source and has a high adhesion effect. Another object of the invention is to use a color filter or a light sheet using the above short wavelength quality. The sinfulness of the object and the purpose of the network have been proposed as a liquid crystal display device using a light sheet. 4t 201037459 In order to achieve the above object, the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention comprises a photopolymerization initiator (A) containing an oxime ester-based polymerization initiator represented by the general formula 1, The hydrazine compound (B), the binder resin (c), the photopolymerizable compound (D), the coloring material (E), and the solvent (F) represented by the general formula 2. (General formula 1)

(上述一般式1中，R〗、R2、R3表示各自獨立之氫原子、R、OR、COR、SR、c〇NRR，或 CN，R 及 R，係為碳數1〜8之烷基、碳數6〜12之芳基、碳數7〜i3 之芳烧基或碳數5〜7之複素環基，該等係可以函素原子或複素環基來進行取代或者是無取代，其中，烷基及芳〇烧基之亞烧部分可採不飽和結合、縣合、硫醚二合或醋結合來加以鍵結，前述RR1 ...R R R Ώ别迷R及R可以一起形成環狀結構’^鳴則表示各自獨立子或碳數1〜8之燒基；R“系為碳數〇〜10之：：丫1、丫2、丫3表示各自獨立之氧屌早$坊店7您沉丞，素原子或碳數卜8之燒基t原子或硫原子；x係為函 (一般式2) 201037459(In the above general formula 1, R, R2, and R3 represent independently hydrogen atoms, R, OR, COR, SR, c〇NRR, or CN, R and R, and are alkyl groups having 1 to 8 carbon atoms, An aryl group having 6 to 12 carbon atoms, an aryl group having 7 to 3 carbon atoms or a complex ring group having 5 to 7 carbon atoms, which may be substituted or unsubstituted with a functional atom or a complex ring group, wherein The sub-sinter portion of the alkyl group and the aryl sulfonyl group may be bonded by an unsaturated bond, a county salt, a thioether dimer or a vinegar bond, and the aforementioned RR1 ... RRR Ώ R R and R may form a ring structure together. '^鸣 indicates the independent sub- or the carbon number 1~8; R" is the carbon number 〇~10:: 丫1, 丫2, 丫3 means the respective independent oxygen 屌 early shop Indulge, a carbon atom or a carbon number of a burning atom t atom or a sulfur atom; x is a function (general formula 2) 201037459

O —SiO — Si

(上述一：!又式2中，R係為自水甘油基稀醯基、氨基丙基、氫硫基丙基、氰基丙基及異& =組成之-群組中所選擇之任一有機官能基、或‘ 疋含有自該群組所選擇之任一有機官能基之碳數之脂肪族或芳香族碳氫化合物；R2係為氫原子、 2、ϋ 乙基或經基；η係為1〜13之整數）。 ^ 此外，本發明亦提供一種包含有於形成上述短雷射曝光裝置用著色感光性樹脂組成物後，進行顯像而形成的彩色層的彩色滤光片。曰顯此t署本發明更提供一種使用上述彩色濾光片之液曰曰顯不裝置。 $上所述，本發明之短波長雷射曝光裝置用 J =成物、使用該組成物之彩色濾光片及液= 不波置’其可具有一或多個下述優點：本發明之短波長雷射曝光裝置用著色感紐樹脂植 ^物二可藉含有特定引發劑及魏合物，藉此即便以非二小1的紐波長雷射光源進行曝光，也可以得到優異 ^裝置用者色感光性樹脂組成物與基材間的密著力果。’顯像過程中，圖型不會剝離而可展現高可靠性的效藉此，將本發明所述之短波長雷射曝光裝置用著 ff*性樹脂組成物，應用至彩色濾光片的製造時，可縮紐製程時間且可改善製程特性，因為像素部上不會發生 201037459 表面不良，所以可製造出高可貪^ σ 片。即便以非當/丨、旦的&I生及回w質的彩色濾光乃p便以非节小里的短波長雷射光源進行 J異的感度(sensmvity)及解析度(re·—，且且波長毎射曝光裝置用著色感光性樹脂著力優異，顯像過程中，圖型不會剝 •可靠性的效果。』展見同藉此，將本發明所述之短波長雷射曝光裝置用感f性樹脂組成物，應用至彩色濾光片的製造時，可縮 ^製程時間且可改善製程特性，因為像素部上不會發生〇 if不良’所以可製造出高可靠性及高品質的彩色滤光因此，本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物，在電子工業領域非常適合使用在製& 如液晶顯示裝置用彩色濾光片的各種高品質的彩色濾光片方面上。【實施方式】 Q 為清楚了解本發明之内容，謹詳細說明如下。但是，此些内容僅用於說明，並非用以解釋作為限制本發明範圍的方法。本發明所提供之短波長雷射曝光裝置用著色感光性樹脂組成物，係包含光聚合引發劑（A)、矽化合物（B)、結合劑樹脂（C)、光聚合性化合物（D)、著色材料（E)以及溶劑（F)。 [光聚合引發劑（A)] 本發明所述之短波長雷射曝光裝置用著色感光性樹脂组成物中，係包含以一般式1表示之肟酯系聚合引發 201037459 劑來作為光聚合引發劑（A)之引發劑。 (一般式1)(In the above one: ! In Equation 2, R is selected from the group consisting of glycidyl sulfhydryl, aminopropyl, thiopropylpropyl, cyanopropyl, and iso-amp; = An organofunctional group, or an aliphatic or aromatic hydrocarbon having a carbon number of any of the organic functional groups selected from the group; R2 is a hydrogen atom, 2, an oxime or a thiol; It is an integer from 1 to 13). Further, the present invention provides a color filter comprising a color layer formed by forming a coloring photosensitive resin composition for a short laser exposure apparatus and developing the composition. The present invention further provides a liquid crystal display device using the above color filter. As described above, the short-wavelength laser exposure apparatus of the present invention may have one or more of the following advantages by using J = a color filter, a color filter using the composition, and a liquid non-transfer: The short-wavelength laser exposure device can use a specific initiator and a Wei compound by using a colored sensitizing resin, so that it can be excellent even when exposed by a non-two small one-wavelength laser light source. The adhesion between the photosensitive resin composition and the substrate. In the developing process, the pattern is not peeled off and exhibits high reliability. The short-wavelength laser exposure apparatus of the present invention is applied to the color filter using the ff* resin composition. When manufacturing, the process time can be reduced and the process characteristics can be improved. Since the surface defect of 201037459 does not occur on the pixel portion, a high-corrosion film can be produced. Even if the color filter of the non-initial/丨, 旦, I, and w 质 quality is p, the sensmvity and resolution (re·— Moreover, the wavelength-emitting exposure apparatus is excellent in the coloring photosensitive resin, and the pattern is not peeled off and the reliability is improved during the development process. The same is true for the short-wavelength laser exposure of the present invention. When the device is used in the manufacture of a color filter, it can reduce the processing time and improve the process characteristics. Since the defect does not occur on the pixel portion, high reliability and highness can be produced. Quality color filter Therefore, the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention is very suitable for use in the electronic industry, and is used in various high quality such as color filters for liquid crystal display devices. [Embodiment] Q The following is a detailed description of the contents of the present invention, which are intended to be illustrative only, and are not intended to be construed as limiting the scope of the invention. The coloring photosensitive resin composition for a short-wavelength laser exposure apparatus provided includes a photopolymerization initiator (A), a ruthenium compound (B), a binder resin (C), a photopolymerizable compound (D), and a coloring material. (E) and the solvent (F). [Photopolymerization initiator (A)] The coloring photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention contains an oxime ester polymerization represented by the general formula 1. Initiating the 201037459 agent as an initiator for the photopolymerization initiator (A). (General formula 1)

(上述一般式1中，RrR2、；^3表示各自獨立之子、R、OR、COR、SR、CONRR’ 或 CN，R 及 R，係為碳數1〜8之烷基、碳數6〜12之芳基、碳數7〜u 之芳烷基或碳數5〜7之複素環基，該等係可由鹵素原子或複素環基來進行取代或者是無取代，其中，烷基及芳烷基之亞烷部分可採不飽和結合、醚結合、硫醚結合或酯結合來加以鍵結，前述R&R，可以一起形二钍構；心、115、11647則表示各自獨立之氮原子、函素；^ 子或碳數1〜8之烷基；Rs係為碳數〇〜1〇之烷基； l、Y2、Y3表示各自獨立之氧原子或硫原子；又係^鹵素原子或碳數1〜8之烧基）。上述一般式1中，較佳可使用例如甲基、乙基、丙基、異丙基、丁基、異丁基、sec__ 丁基、ten_ 丁基、戊基、異戊基、tert-戊基、己基、庚基、辛基、異辛基、 2-乙基己基、tert-辛基、壬基、異壬基、癸基、異癸基、乙，基、芳基、丁烯基、乙炔基、丙炔基、甲氧基乙基、乙氧基乙基、丙氧基乙基、曱氧基乙氧基乙基、乙氧基乙氧基乙基、丙氧基乙氧基乙基、甲氧基丙基、單氟甲基、二氟曱基、三氟甲基、三氟乙基、全氟乙基、2弋苯 201037459 並噁唑-2’ -基）乙烯基等來作為R及R’所示之烷基，其中，最佳是使用礙數1〜8之烧基。此外，例如可使用苯基、甲笨基、二曱苯基、乙苯基、氯苯基、萘基、蒽基（anthryl)、菲基（phenanthrenyl)等來作為 R 及 R’ 所示之芳基，其中，最佳是使用碳數6〜12之芳基。此外， • 較佳例如可使用苄氧基、氣苄基、α-甲基苄基、α,α- • 二曱基苄基、苯乙基、苯乙烯基等碳數7〜13之芳烷基來作為R及R’所示之芳烧基。較佳例如可使用吼α定基、嘧啶基、呋喃（furyl)、硫苯基等碳數5〜7之複素環 ^ 基來作為R及R’所示之複素環基。此外，舉例來說較佳可使用如哌啶環、嗎啉環等碳數5〜7之複素環基所形成的環來作為R及R’所一起形成環狀結構。此外，R 及R’可以氟、氣、溴、碘等鹵族元素來進行取代，或者是°比σ定基、喷α定基、11夫喃、苯並11惡唾-2-基、四氫D比喃基、ϋ比洛炫基（pyrrolidyl)、ϋ米嗤烧基、吼唾烧基 (pyrazolidyl)、四氫售峻基（thiazolidyl)、異嗟峻基 (isothiazolidyl)、σ惡唾烧基（oxazolidyl)、異 β惡嗤烧基 (isooxazolidyl)、旅11 定基（piperidyl)、胡椒基（piperadyl)、嗎啉等碳數5〜7之複素環基來進行取代。〇可使用氟、氣、溴、碘等來作為X所示之鹵素原子。此外，可使用以函素原子取代或者是無取代的甲基、乙基、丙基、異丙基、丁基、異丁基、sec-丁基、tert-丁基、戊基、異戍基、tert-戊基、己基、庚基、辛基、異辛基、2-乙基己基、tert-辛基等來作為X所示之烷基。在前述一般式1中，可使用氟、氯、溴、碘等來作為R4、R5、R6、117所示之鹵素原子。此外，在前述一般式1中，可使用以鹵素原子取代或者是無取代的甲基、乙基、丙基、異丙基、丁基、異丁基、sec-丁基、tert- 201037459 丁基、戊基、異戊基、tert-戊基、己基、庚基、辛基、異辛基、2-乙基己基、tert-辛基等來作為R4、R5、$/、 R7所示之烧基。可列舉出如下述一般式3〜15等化合物來作為以前述一般式1所表示的本發明之肟酯化合物的較佳具體例’但本發明不以下述化合物為限。〃 (一般式3)(In the above general formula 1, RrR2, ;^3 represent independent children, R, OR, COR, SR, CONRR' or CN, R and R, are alkyl groups having 1 to 8 carbon atoms, and carbon numbers 6 to 12 An aryl group, an aralkyl group having a carbon number of 7 to u or a complex ring group having a carbon number of 5 to 7, which may be substituted or unsubstituted by a halogen atom or a complex ring group, wherein an alkyl group and an aralkyl group are used. The alkylene moiety may be bonded by an unsaturated bond, an ether bond, a thioether bond or an ester bond, and the aforementioned R&R may be formed together; the core, 115, and 11647 represent respective independent nitrogen atoms, Or an alkyl group having a carbon number of 1 to 8; Rs is an alkyl group having a carbon number of 〇~1〇; l, Y2, Y3 are each an independent oxygen atom or a sulfur atom; and a halogen atom or a carbon number 1 to 8 of the base). In the above general formula 1, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec__butyl, ten-butyl, pentyl, isopentyl, tert-pentyl can be preferably used. , hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, tert-octyl, decyl, isodecyl, fluorenyl, isodecyl, ethyl, aryl, butenyl, acetylene Base, propynyl, methoxyethyl, ethoxyethyl, propoxyethyl, decyloxyethoxyethyl, ethoxyethoxyethyl, propoxyethoxyethyl , methoxypropyl, monofluoromethyl, difluorodecyl, trifluoromethyl, trifluoroethyl, perfluoroethyl, 2-indene benzene 201037459 oxazol-2'-yl) vinyl, etc. The alkyl group represented by R and R' is preferably an alkyl group having a hindrance of 1 to 8. Further, for example, a phenyl group, a phenyl group, a diphenyl group, an ethylphenyl group, a chlorophenyl group, a naphthyl group, an anthyl group, a phenanthrenyl group or the like can be used as the aryl group represented by R and R'. The base, wherein the aryl group having a carbon number of 6 to 12 is preferably used. Further, • preferably, for example, an aralkyl group having a carbon number of 7 to 13 such as a benzyloxy group, a gas benzyl group, an α-methylbenzyl group, an α,α- • dimercaptobenzyl group, a phenethyl group or a styryl group can be used. The base is an aryl group represented by R and R'. For example, a compound having a carbon number of 5 to 7 such as a 吼α group, a pyrimidinyl group, a furyl group or a thiophenyl group can be used as the complex ring group represented by R and R'. Further, for example, a ring formed by a polycyclic ring group having 5 to 7 carbon atoms such as a piperidine ring or a morpholine ring can be preferably used as a ring structure together with R and R'. Further, R and R' may be substituted by a halogen element such as fluorine, gas, bromine or iodine, or may be a ratio of σ to a base, a spray of an α group, a 11-propan, a benzoheptan-2-yl group or a tetrahydrogen D. Pyranidyl, pyrrolidyl, glutamic acid, pyrazolidyl, thiazolidyl, isothiazolidyl, σ oxalate Oxazolidyl), isoxazozolidyl, piperidyl, piperadyl, morpholine, etc., substituted with a carbon number of 5 to 7 complex ring groups.氟 Fluorine, gas, bromine, iodine or the like can be used as the halogen atom represented by X. Further, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a pentyl group, an isodecyl group which is substituted with a functional atom or is unsubstituted may be used. , tert-pentyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, tert-octyl and the like are used as the alkyl group represented by X. In the above general formula 1, fluorine, chlorine, bromine, iodine or the like can be used as the halogen atom represented by R4, R5, R6 and 117. Further, in the above general formula 1, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-201037459 butyl group which is substituted with a halogen atom or is unsubstituted may be used. , pentyl, isopentyl, tert-pentyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, tert-octyl, etc. as R4, R5, $/, R7 base. A compound such as the following general formulas 3 to 15 can be mentioned as a preferred specific example of the oxime ester compound of the present invention represented by the above general formula 1, but the present invention is not limited to the following compounds. 〃 (General 3)

(一般式4)(General 4)

(一般式5)(General form 5)

(一般式6)(General form 6)

(一般式7) 201037459 (一般式8) 〇 (一般式9) (一般式10) 〇 (一般式11) (一般式12) 201037459 ο(General formula 7) 201037459 (General formula 8) 〇 (General formula 9) (General formula 10) 〇 (General formula 11) (General formula 12) 201037459 ο

(一般式13)(General form 13)

ΟΟ

具有前述一般式1的結構，以市售品來說係有 Ν-1919(株式會社 ADEKA)。本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物中添加的光聚合引發劑（Α)，係除前述一般式i 的光聚合引發劑之外’更可包含其他的光聚合引發劑。相^短波長雷射曝光裝置用著色感光性樹脂組成物中的光聚合引發劑’前述一般式1的光聚合引發劑以質量分 12 201037459 說較佳疋含有50質量百分比（％)以上，更佳則是 =2 :〇〜70質量百分比(%)範圍間的質量百分比(%) 旦f一般式丨的光聚合引發劑是含有上述範圍間的質的狀態下，即便低曝光量也可以得到優異的 έ又罪丨生，像素部上不會發生表面不良，表面平坦性也鬲，而可確保圖型無損傷的優良膠膜與直進性。一例如可使用自苯乙酮系化合物、聯咪唑系 ❹ ，合物所組成群組中，選擇一種以上的化合物為前述一般式1所示之肟酯系光聚合引發劑的其他聚合引發劑使用。舉例來說係有如2-甲基-1-(4-曱硫基苯基）_2·吗啉基 -1-丙_、一乙氧基苯乙_、2-經基—2-曱基_卜苯基―卜丙酮女息香一甲鱗、2-經基-1-[4-(2-經乙氧基）笨基]-2-甲基-1-丙酮、^羥基环己基苯基甲酮、2_苄"^_2_ 二甲基氨基-1-(4-吗啉苯基）-1-丁酮、2-羥基_2_曱基 -1-[4-(1-甲基乙烯基）苯基卜卜丙酮的寡聚物等可作^ 苯乙酮系化合物。 … 此外’除上述化合物之外，也可使用以下述—般式 16所示之化合物來作為苯乙酮系化合物。 "" (一般式16)The structure of the above-described general formula 1 is commercially available as Ν-1919 (ADEKA Co., Ltd.). The photopolymerization initiator (Α) added to the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention may contain other photopolymerization in addition to the photopolymerization initiator of the above general formula i. Initiator. The photopolymerization initiator in the coloring photosensitive resin composition for the short-wavelength laser exposure apparatus' The photopolymerization initiator of the above general formula 1 is preferably 50 mass% (%) or more in mass fraction 12 201037459, more In addition, it is a mass percentage (%) in the range of 〇 to 70% by mass (%). The photopolymerization initiator of the general formula f is excellent in the amount of the above range, and can be excellent even at a low exposure amount. The cockroaches are also sinful, and there is no surface defect on the pixel portion, and the surface flatness is also flawed, and the excellent film and straightness of the pattern can be ensured without damage. For example, in the group consisting of an acetophenone-based compound and a biimidazole-based oxime, one or more compounds selected from the above-mentioned general formula 1 may be used as an additional polymerization initiator of the oxime ester-based photopolymerization initiator. . For example, it is, for example, 2-methyl-1-(4-sulfonylphenyl)_2·morpholinyl-1-propenyl, monoethoxyphenethyl, 2-trans-yl-2-yl- Phenyl-p-acetone female fragrant one-piece scale, 2-carbyl-1-[4-(2-ethoxylated) phenyl]-2-methyl-1-propanone, hydroxycyclohexyl phenyl Methyl ketone, 2-benzylidene "^_2_dimethylamino-1-(4-morpholinyl)-1-butanone, 2-hydroxy-2-indolyl-1-[4-(1-methyl An oligomer of vinyl) phenyl bromide or the like can be used as the acetophenone-based compound. Further, in addition to the above compounds, a compound represented by the following general formula 16 may be used as the acetophenone-based compound. "" (General form 16)

前述一般式16中，R!〜R4表示各自獨立氫原子、鹵素原子、羥基、使用碳數1〜12的烧基取代或無取代的苯基、使用碳數1〜12的烷基取代或無取代的节氧 13 201037459 基、或者是使用碳數1〜12的烷基取代或無取代的萘基。具體來說可以2-甲基—2-氨基（4-嗎啉笨基）-1一乙酮、2-乙基-2-氨基（4-嗎啉苯基乙酮、2_丙基—2_氨基（4-嗎啉苯基）-1-乙酮、2_ 丁基_2氨基（4_嗎啉苯基）-1-乙酮、2-甲基~2-氨基（4-嗎啉苯基卜丙酮、2_ 甲基-2-氨基（4-嗎啉苯基卜卜丁酮、2_乙基_2_氨基（4_ 嗎啉苯基）-1-丙酮、2-乙基-2-氨基（4-嗎啉苯基）—卜丁酮、2-甲基-2-甲基氨基（4_嗎啉苯基）—卜丙酮、2—甲基一2一二曱基氨基（4-嗎琳苯基）-1 一丙酮、2一曱基_2 —二乙灵氨基(4-嗎啉笨基）-1-丙酮來作為一般式16所示之化^ 物。具體來說有2,2’ -雙（2-氯苯基）_4,4，，55，-四基聯咪唑、2,2’ -雙（2,3-對氯苯基）_4,4， 55，—四聯口米唑、2,2’ -雙（2-氯苯基）-4,4,，5,5，—四（烷氧& 聯味唾、2,2’ -雙（2-氯苯基）-4,4,，5,5，-四（三坡^ 本基）聯°米吐、以及前述聯p米唾系化合物中* *， 55，置的本基由烧氧獄基來取代的咪η坐化合物等可作 t 聯咪唑系化合物。其中，使用2,2，雙（2—In the above general formula 16, R! to R4 represent each independently hydrogen atom, a halogen atom, a hydroxyl group, a substituted or unsubstituted phenyl group having a carbon number of 1 to 12, or an alkyl group having a carbon number of 1 to 12 or none. Substituted oxygen 13 201037459 or an alkyl substituted or unsubstituted naphthyl group having 1 to 12 carbon atoms. Specifically, 2-methyl-2-amino(4-morpholinyl)-1-ethanone, 2-ethyl-2-amino (4-morpholinyl phenylethanone, 2-propyl-2) _Amino (4-morpholinylphenyl)-1-ethanone, 2-butyl-2amino (4-morpholinylphenyl)-1-ethanone, 2-methyl~2-amino(4-morpholinene) Kebuacetone, 2-methyl-2-amino (4-morpholinyl phenylbutanone, 2-ethyl-2-amino (4-morpholinyl)-1-propanone, 2-ethyl-2- Amino (4-morpholinylphenyl)-butanone, 2-methyl-2-methylamino(4-morpholinylphenyl)-bupropion, 2-methyl-2-didecylamino (4- Morphine phenyl)-1-acetone, 2-indolyl-2-diethyleneamine amino (4-morpholinyl)-1-propanone as a compound of the general formula 16. Specifically, there are 2 , 2'-bis(2-chlorophenyl)_4,4,,55,-tetrazylimidazole, 2,2'-bis(2,3-p-chlorophenyl)_4,4, 55,-tetra Oral azole, 2,2'-bis(2-chlorophenyl)-4,4,,5,5,-tetra (alkoxy & sinus saliva, 2,2'-bis(2-chlorophenyl) )-4,4,,5,5,-four (three slopes ^ this base) in combination with the rice sputum, and the above-mentioned conjugated p-salt compound * *, 55, Group to the oxy-fired prison group substituted imidazole compounds and the like can be used as sitting η t biimidazole-based compound which, using 2,2-bis (2-

基）-4,4’，5,5，-四苯基聯咪唑、2,2’ -雙（23_對== 基）-4,4’，5,5，-四苯基聯咪唑等較佳。 ’ 本舉例來說，係有下述—般式17所示之〇_乙氣 —α-氧亞氨基苯基-卜丙酮可作為前述肟化合物板基 (一般式17)-4,4',5,5,-tetraphenylbiimidazole, 2,2'-bis(23_p-==)-4,4',5,5,-tetraphenylbiimidazole, etc. Preferably. For example, the oxime-α-oxyiminophenyl-bupropanone shown in the following General Formula 17 can be used as the above-mentioned ruthenium compound plate base (General Formula 17).

14 201037459 卞=並在Λ損及本發明的效果的程度上，該所屬技 ί ILL使用的其一他光聚合引發劑等亦可加：：人你牛冷"s '，可使用女息香系化合物、二苯甲酮系化 1、㈣酮系化合物、蒽系化合物等作為其他光聚人引^劑。當然’可以各別單獨使用上述化合物二組合兩種以上的上述化合物使用。人 =如’安息香、安息香甲基趟、安息香乙基趟、安丙基醚、安息香異丁基醚等可作為前述安息香系〇例如有二苯甲酮、〇-過氧化二苯甲酰、4-苯基二装了，、4-苯甲酰_4’ _甲基二苯硫越、3,3,，4,4，一四氧異丙苯)二苯甲酉同、2,4,6-三甲基二苯甲酮等可作為則述二苯甲酮系化合物。一#例如有2-異丙基噻噸酮、2,4_二乙基噻噸酮、2,4_ ^塞頓酮、卜氯^—異丙噻噸酮等可作為前述噻噸酮化合物。例如有9，1〇-二甲氧基蒽、2_乙基_9，10_二曱氧基 °二乙氧基蒽、2-乙基—9,10-二乙氧基蒽等可作為則述4系化合物。例^如有2,4,6_三甲基苯甲酰基二苯基氧化膦、1〇_丁丫啶酮、2—乙基蒽醌、苄氧基、9，10_菲醌、樟苯基乙醛酸甲基、二茂鈦化合物等可作為其他的先聚合引發劑。 ^外，也可使用具可產生鏈轉移的基的光聚合引發 =由例如可使用記載於曰本特許公表2002-544205號公報中之引發劑作為前述光聚合引發劑。 15 201037459 相對短波長雷射曝光裝置用著色感光性樹脂組成物中的固體成分，前述光聚合引發劑（A)係含有質量分率介於3〜20質量百分比（％)，較適當為含有介於3〜2〇質量百分比（％)係較佳。當前述光聚合引發劑（A)的含有量介 ^上述含量範圍時，藉其高感度化而可縮短曝光時間提尚生產性，且可維持高解析度，因此較為合宜。根據本發明，光聚合引發劑（A)中併用光聚合引發助劑（A_l)較為適宜。當併用光聚合引發助劑（A」）時，可更提高含有這些引發劑、引發助劑的短波長雷射曝光裝置用著色感光性樹脂組成物的感度，而在形成使用此組成物的彩色濾光片時，可提高生產性，因此較為合宜。相對紐波長雷射曝光裝置用著色感光性樹脂組成物中的，體成分，前述光聚合引發助劑（Α_υ的使用量，其質量分率通常介於仏丨〜咒質量百分比（％)，較適當為 1有介於Ν40 f量百分比（％)。此夕卜，當前述光聚合引發助劑（A-1)的含有量介於上述含量範圍時，可更提高短波長雷射曝光裝置用著色感光性樹脂組成物的感度: 而在形成使用此組成物的彩色濾光片時，可提性，因此較為合宜。 ° 就月ό述光1合引發助劑（八_ 1)而言，較佳可使用胺化合物、羧酸化合物等。就前述胺化合物的具體例而言，舉例來醇胺、甲基二乙醇胺、三異丙醇胺等的脂^^合"；勿以及4-二甲基氨基安息香酸甲基、4_二？基氨基安息香酸乙基、4-二曱基氨基安息香酸異戊基、4_二甲基氨基女息香酉夂2-乙基己基、安息香酸2--甲其裔其7其、眼二甲基鄰甲苯胺、M’ -雙（二；： = 甲 201037459 酮（俗稱：米氏酮）、4,4’ -雙（二乙基氨基）二苯曱酮等的芳香族胺化合物可適用。使用芳香族胺化合物來作為胺化合物較佳。就前述叛酸化合物而言，具體來說係有苯硫基乙酸、苯基硫代乙酸曱g旨、苯基硫代醋酸乙醋、甲基苯基硫代醋酸乙酯、苯基硫代乙酸二甲酯、甲氧基苯硫基乙酸、二甲氧基苯硫基乙酸、氯苯硫基乙酸、對氯苯硫基乙酸、N-苯氨基乙酸、苯氧基乙酸、萘硫脲醋酸、n— 萘乙甘氨酸、萘氧基乙酸等的芳香族雜環醋酸類。〇 [矽化合物（B)] 本發明所述之短波長雷射曝光装置用著色感光性樹脂組成物係包含石夕化合物（β)。物⑻係—般式2表示，通過溶膠-凝膠製耘而具有蘢型或梯等立體的混合型結構較佳。 (一般式2)14 201037459 卞 = and to the extent that the effect of the present invention is degraded and the effect of the present invention, the other photopolymerization initiator used in the technique can also be added:: You are cold, "s ', can use feminine A fragrant compound, a benzophenone-based 1, a (tetra) ketone-based compound, an anthraquinone-based compound, and the like are used as other photopolymerization agents. Of course, the above compounds may be used singly, and two or more of the above compounds may be used in combination. People = such as 'benzoin, benzoin methyl hydrazine, benzoin ethyl hydrazine, propyl ether, benzoin isobutyl ether, etc. can be used as the aforementioned benzoin system such as benzophenone, hydrazine-dibenzoyl peroxide, 4 -Phenyl diphenyl, 4-benzoyl-4'-methyldiphenylsulfide, 3,3,4,4,tetraisopropenyl)benzhydryl, 2,4, 6-trimethylbenzophenone or the like can be used as the benzophenone-based compound. A #, for example, 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-exexanone, or chlorothioxanthone can be used as the aforementioned thioxanthone compound. For example, there are 9,1 fluorene dimethoxy oxime, 2-ethyl -9,10-dimethoxy oxy-diethoxy fluorene, 2-ethyl-9,10-diethoxy fluorene, etc. The 4 series compounds are described. For example, there are 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 1〇-butroacridone, 2-ethylhydrazine, benzyloxy, 9,10-phenanthrenequinone, anthracene A methylglyoxylate methyl group, a titanocene compound or the like can be used as another prepolymerization initiator. In addition, it is also possible to cause photopolymerization initiation of a chain-transferring group. For example, an initiator which is described in the publication of the Japanese Patent Publication No. 2002-544205 can be used as the photopolymerization initiator. 15 201037459 The solid content of the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus, the photopolymerization initiator (A) contains a mass fraction of 3 to 20% by mass (%), which is more appropriate The mass percentage (%) is preferably 3 to 2%. When the content of the photopolymerization initiator (A) is in the above-mentioned range, it is preferable because the high sensitivity is obtained, the exposure time can be shortened, the productivity is improved, and the high resolution can be maintained. According to the invention, it is preferred to use a photopolymerization initiation aid (A-1) in combination with the photopolymerization initiator (A). When the photopolymerization initiation aid (A") is used in combination, the sensitivity of the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus containing these initiators and initiators can be further improved, and the color of the composition using the composition can be formed. When the filter is used, productivity can be improved, so it is more convenient. The color component of the coloring photosensitive resin composition for the relative-wavelength laser exposure apparatus, the photopolymerization initiation aid (the amount of Α_υ used, the mass fraction is usually between 仏丨~ curse mass percentage (%), It is appropriate to have a percentage (%) of Ν40 f. In this case, when the content of the photopolymerization initiation aid (A-1) is in the above range, the short-wavelength laser exposure apparatus can be further improved. Sensitivity of the coloring photosensitive resin composition: When forming a color filter using the composition, the extractability is preferable, and therefore, it is more suitable for the light-emitting initiator (eight_1). An amine compound, a carboxylic acid compound, etc. are preferably used. Specific examples of the above amine compound include, for example, an aliphatic amine, a methyldiethanolamine, a triisopropanolamine, and the like. Dimethylaminobenzoic acid methyl, 4-diaminoaminobenzoic acid ethyl, 4-didecylaminobenzoic acid isoamyl, 4-dimethylaminodesin 2-ethylhexyl, benzoin Acid 2--Kaki, 7 of them, eye dimethyl o-toluidine, M'-double (two : = A201037459 Aromatic amine compounds such as ketone (commonly known as: Michler's ketone) and 4,4'-bis(diethylamino)benzophenone are suitable. It is preferred to use an aromatic amine compound as the amine compound. In the case of the above-mentioned tickic acid compound, specifically, phenylthioacetic acid, phenylthioacetic acid, phenylthioacetic acid ethyl acetate, methylphenylthioacetic acid ethyl ester, phenylthioacetic acid Dimethyl ester, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, p-chlorophenylthioacetic acid, N-phenylaminoacetic acid, phenoxyacetic acid, naphthylthioacetic acid, n—Aromatic heterocyclic acid acetate such as naphthylethylene glycine or naphthyloxyacetic acid. 〇 [矽 compound (B)] The coloring photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention contains a compound (β) The object (8) is a general formula 2, and it is preferable to have a mixed structure of a scorpion type or a ladder or the like by a sol-gel method. (General formula 2)

ΟΗ C則述一般式2中，Ri係為自水烯醯基、氨基丙基、氫硫基丙基甘義由基、(：基)丙組成之-群組中所選擇之任— =自該群組所選擇之任一有機官乙基或羥基;η係為卜13之整f糸為虱原子、甲基、雖然沒有限制，但前述一般式奴式2中，R1為（甲基）丙 17 201037459 稀醯基較佳。就前述一般式2所示的矽化合物（b)而言，可使用自乙坤基二甲氧基石夕烧、乙稀基三乙氧基石夕烧、乙晞基三 (2-甲氧基乙氧基）石夕院、N-(2-氨基乙基）3-氨基丙基甲基二甲氧基矽烷、N-(2-氨基乙基）3-氨基丙基三曱氧基矽烷、3-氨基丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基石夕烧、 2-(3,4-環氧環己基己基）乙基三甲氧基矽烷、3_氣丙基甲基二甲氧基矽烷、3-氯丙基三曱氧基矽烷、3_氫硫基丙基三甲氧基矽烷、甲基丙烯酰氧基T基三乙氧基矽烷、甲基丙烯酰氧基甲基三甲氧基矽烷、3_甲基丙烯酰氧基丙基三氯矽烷、3-甲基丙烯酰氧基丙基三甲氧基矽烧、3-甲基丙烯醜氧基丙基三乙氧基石夕燒、3—丙烯酰氧基丙基三曱氧基矽烷或3-丙烯酰氧基丙基三氯矽烷等可供選擇化合物中，各自單獨選擇或選擇兩種以上的組合後，經溶膠-凝膠製程所製造出的矽化合物。其中，使用自甲基丙烯酰氧基甲基三乙氧基矽烷、甲基丙烯酰氧基甲基三甲氧基矽烷、3-甲基丙烯酰氧基丙基三氣矽烷三3-甲基丙烯酰氧基丙基三甲氧基矽烷、3一甲基丙烯酰氧基丙基三乙氧基矽烷、3-丙烯酰氧基丙基三曱氧基石夕燒或3-丙烯酰氧基丙基三氯石夕烧等可供選擇化合物中’各自單獨選擇或選擇兩種以上的組合後，經溶膠_ 凝膠製程所製造出的矽化合物較佳，更佳為使用由3曱基丙烯酰氧基丙基三曱氧基矽烷經溶膠_凝膠製程所製造出的矽化合物，較為合宜。相對短波長雷射曝光裝置用著色感光性樹脂組成物中的固體成分，前述矽化合物（B)係含有質量分率介於 0·1〜2.0質量百分比（％)’更佳則是含有介於〇 3〜〇 8質 18 201037459 量百分比（％)範圍間的質矽化合物（B)的含有量未達二，（％)曰較為良好。當前述基板及遮光層間的黏著力 ·質罝百分比（％)時，因當含有量超過2.0質量百%:以離；形成残膜，而造成顯像速度變；)夺:板上會是相對短波長雷射曝光穿w ，-之虞。特別的光聚合引發劑(A) 100 i量邱者色,1性樹脂組成物中〜i0質量部，更二是二匕合物⑻可含有！合引發劑具有高感度效果3二5; 0 達到最大化。㈣叫，對基板的密著性也可 [結合劑樹脂（C)] =波長雷射曝光裝置用著色感光性樹脂組劑樹脂(Q，是對著色材料⑻來說，、有結合劑樹脂作用的成分，任何可以溶解在彩色濾光 =製造所需的顯像階段中所使用驗性顯像液的聚合體，皆可使用。。就前述結合劑樹脂（c)而言，例如可以使用含有羧基單體’及與此單體可共聚合共聚合其他單體間的合體等。 οα就七述含有缓基的單體而言，例如，可以是不飽和單幾酸、不飽和二叛酸或不飽和三叛酸等的分子中，具有一個羧基以上的不飽和多價羧酸等的不飽和羧酸。於此’就不飽和單羧酸而言，舉例來說係有丙烯酸、曱基丙烯酸、丁烯酸、α -氯丙婦酸、肉桂酸等。就前述不飽和二羧酸而言’舉例來說係有馬來酸、富馬酸、衣康酸、檸康酸、中康酸等。 19 201037459 前述不飽和多倾酸可以是酸軒，具體來說係有馬來酸酐、衣康酸酐、檸康酸酐等。 … 此外，前述不飽和多價羧酸可以是單（2甲基丙基烧）酯’舉例來說係有號轴酸單（2_丙烯酰氧基 =酸單(2-甲基丙浠氧基乙基）、駄酸單(2_丙稀醜氧)基乙基）、酞酸單（2-甲基丙烯氧基乙基）等。前述不飽和多價羧酸，其兩末端可以是二羧酸聚合體的^ (甲基）丙烯酸酯，舉例來說係有^―羧酸聚己内酯單丙烯酸酯、ω-羧酸聚己内酯單甲基丙烯酯等。此些含有羧基的單體，可各自單獨使用或混合以上使用。就與前述含有羧基的單體可共聚合共聚合其他單體而^，舉例來說係有苯乙烯' α〜甲基苯乙烯、〇_乙烯基曱，、m-乙烯基曱苯、Ρ-乙烯基甲笨、ρ 一氯笨乙烯、〇_ 甲氧基苯乙烯、m-甲氧基苯乙烯、p_甲氧基苯乙烯、〇一乙$基苄氧基曱基醚、m-乙烯基苄氧基甲基醚、p_乙烯基苄氧基曱基醚、〇-乙烯基苄氧基水甘油基醚、m_乙烯，苄氧基水甘油基醚、p-乙烯基苄氧基水甘油基醚、茚荨的方香族乙稀基化合物；如曱基丙烯酸醋、曱基曱基丙烯酯、乙基丙烯酸酯、乙基曱基丙烯酯、n_丙基丙$ 酉文醋、η-丙基甲基丙烯醋、i-丙基丙烯酸酯、i一丙基曱基丙烯酯、η-丁基丙烯酸酯、n-丁基曱基丙烯酯、卜丁基丙烯酸醋、i-丁基甲基丙烯酯、sec—丁基丙烯酸酯、sec一丁基甲基丙婦酯、t-丁基丙烯酸酯、卜丁基曱基丙稀酯、 2-羥基乙基丙烯酸酯、2-羥基乙基甲基丙烯酯、2_羥基丙基丙烯酸酯、2-羥基丙基甲基丙烯酯、3—羥基丙基丙烯酸酯、3-羥基丙基曱基丙烯酯、2_羥基丁基丙 20 201037459 烯酸酯、2-羥基丁基甲基丙烯酯、3_羥基丁基丙烯酸酯、3-羥基丁基曱基丙烯酯、4_羥基丁基丙烯酸酯、 4-羥基丁基甲基丙烯酯、芳基丙烯酸酯、芳基甲基丙烯酯、苄氧基丙烯酸酯、甲基丙烯酸苄基酯、環己基丙烯酸酉曰、環己基曱基丙稀醋、苯基丙婦酸酯、苯基甲基丙烯酯、2-甲氧基乙基丙烯酸酯、2-甲氧基乙基甲基丙烯酯、2-苯氧基乙基丙烯酸酯、2-苯氧基乙基甲基丙烯酯、甲氧基一甘醇丙烯酸酯、甲氧基二甘醇甲基丙稀酯、甲氧基二甘醇丙烯酸酯、甲氧基三甘醇甲基丙婦酯、甲氧〇基丙二醇丙烯酸酯、甲氧基丙二醇甲基丙烯酯、甲氧基一丙二醇丙烯酸酯、曱氧基二丙二醇甲基丙烯酯、異冰片丙烯酸酯、異冰片甲基丙烯酯、環戊二烯基丙烯酸酯、環戊二烯基曱基丙烯酯、2-羥基-3-苯氧基丙基丙烯酸酯、2-羥基-3-苯氧基丙基甲基丙烯酯、甘油單丙烯酸酉旨、甘油單甲基丙烯酯等的不飽和羧酸酯類；如2_氨基乙基丙稀酸酯、2-氨基乙基甲基丙烯酯、2-二甲基氨基乙基丙烯酸酯、2-二甲基氨基乙基甲基丙烯酯、2-氨基丙基丙稀酸酯、2-氨基丙基甲基丙烯酯、2-二甲基氨基 Q 丙基丙烯酸酯、2-二甲基氨基丙基甲基丙烯酯、3-氨基丙基丙烯酸酯、3-氨基丙基甲基丙烯酯、3_二甲基氨基丙基丙烯酸酯、3-二甲基氨基丙基甲基丙烯酯等的不飽和羧酸氨基烷酯類；如水甘油基丙烯酸酯、水甘油基曱基丙烯酯等的不飽和羧酸水甘油基酯類；如醋酸乙烯基、丙酸乙烯基、酪酸乙烯基、安息香酸乙烯基等的羧酸乙烯基酯類；如乙烯基甲基醚、乙烯基乙基醚、芳基水甘油基醚等的不飽和醚類；如丙烯腈、甲基丙烯腈、氯丙烯腈、氰化亞乙烯基等的氰化乙烯基化合物；如丙稀酰胺、甲基丙稀醯胺、α-氣丙烯酿胺、Ν-2-經基乙基丙烯酰胺、Ν-2-羥基乙基甲基丙烯醯胺等的不飽 21 201037459 口胺土類，如馬來醯胺、N—苯基馬來醯胺、N—環己基馬，醯胺等的不飽和亞胺基類；如u — 丁二烯、異戊二婦、氯丁二稀等的脂肪族共軏二晞類；如聚苯乙稀、聚甲基丙烯馱自曰、聚曱基曱基丙烯酯、聚_n_ 丁基丙烯酸酯、聚 η:1!基曱基丙烯酯、聚矽氧烷的聚合體分子鏈的末端上 $有單丙烯醯基或單曱基丙稀基的巨大單體類等。此些单體，可各自單獨使用或混合兩種以上使用。旦則述結合劑樹脂（C)中的含有羧基的單體單位的含有量’以質量分率表示通常為15〜4〇質量百分比（％)、較佳為15〜40質量百分比（％)、更佳為25〜40質量百分比（％)。當含有羧基的單體單位的含有量為1〇〜5〇質量百分比（％)時，當對顯像液而言，具有良好的溶解性，像時圖型可正確地形成，因此較為合宜。 ” 就刖述結合劑樹脂（C)而言，舉例來說係有（甲夹丙烯酸<甲基（甲基）丙烯酸酯共聚合體、（曱基）丙^ 酸/苄氧基（甲基）丙烯酸酯共聚合體、（曱基）丙烯酸 /2-羥基乙基（甲基）丙烯酸酯/苄氧基（甲基）丙酸醋共聚合體、（甲基）丙烯酸/甲基（甲基）丙稀 /聚苯乙烯巨大單體共聚合體、（甲基）丙烯酸/甲基（甲基）丙婦酸酯/聚甲基（甲基）丙烯酸酯巨大單體*** 合體、（甲基）丙烯酸/苄氧基（甲基）丙烯酸酯乙烯巨大單體共聚合體、（甲基）丙烯酸/苄氧基（甲美丙烯酸酯/聚f基（甲基）丙烯酸酯巨大單體共聚合，二（甲基）丙烯酸/2-經基乙基（甲基）丙稀。醋; 苄氧基（甲基）丙烯酸酯/聚苯乙烯巨大單體丘聚 (甲基）輯酸/2-祕乙基（甲基酸H、基（甲基）丙烯酸酯/聚甲基（甲基）丙烯酸酯巨大m 體共聚合體、（曱基）丙烯酸/苯乙烯/苄氧基（甲其1 22 201037459 丙烯酸醋/ N-苯基馬來酿胺共聚合體、（甲基）丙稀酸 /琥ίό酸單（2_丙浠醜氧基）/笨乙稀/节氧基彳甲基）丙烯酸酯/ Ν-苯基馬來酸胺共聚合體、（甲基）丙稀酸 /琥珀酸單（2-丙烯酰氧基乙基）/苯乙烯/芳基（甲基）丙浠酸酯/Ν-苯基馬來酿胺共聚合體、（甲基）丙烯酸/苄氧基（曱基）丙烯酸酯/Ν-苯基馬來醯胺/苯乙稀/甘油單（甲基）丙稀酸酯共聚合體等。其中，較佳為（甲基）丙烯酸/苄氧基（曱基）丙烯酸共聚合體、（甲基）丙烯酸/苄氧基（曱基）丙烯酸酯/苯乙烯 ❹共聚合體、（甲基）丙烯酸/甲基（甲基）丙烯酸酯共聚合體、（曱基）丙烯酸/曱基（曱基）丙烯酸酯/苯乙烯共聚合體使用。本發明的結合劑樹脂，其酸價較佳為2〇〜 200(mgKOH/g)的範圍。當酸價介於前述範圍時，對顯像液而言溶解性提高、非曝光部可容易地溶解增加感度，結果，而改善曝光部的圖型顯像時殘留的殘膜率（行以 remaining rati0)，較為合宜。此處的酸價係定義為以中 =丙烯酸系聚合體lg所必要的氫氧化鉀量（mg)進行測 ° ，所得之值，通常，可以使用氫氧化鉀水溶液進行滴定來取得酸價。此外，以凝膠滲透色譜法（GPC;以四氫呋工詧，)、測定的聚苯乙烯換算重量平均分子量（以下，以「重量平均分子量」表示）為3000〜200000， 5000〜100000的驗可溶性樹脂，較為合宜。當分古里二於前述範圍時，塗佈薄膜的硬度增強、殘膜率升 m員=而言非曝光部的溶解性優異而可提高解析相對短波長雷射曝光裝置用著色感光性樹脂组成物 23 201037459 中的固體成分，本發明所述的結合劑樹脂（c)係含有質量分率介於10〜80質量百分比（％)，較佳為20〜70質量百分比（％)較適當。當介於前述範圍時，可形成圖型、'解度及殘膜率可提高，較為合宜。 [光聚合性化合物（D)] 本發明的短波長雷射曝光裝置用著色感光性樹脂組成物中含有的光聚合性化合物（D)，係為光及光聚合引發劑的作用而得以聚合之化合物，係可包含單官能單體、雙B月b早體及其他的多官能單體。就單官能單體而言，具體來說係有壬基酚卡必醇丙烯酸酯、2-羥基-3—苯氧基丙基丙烯酸酯、2—乙美己美卡必醇丙烯酸酯、2-羥基乙基丙烯酸酯、N : 咯烷酮等。就雙官能單體而言，具體來說係有1,6-己二醇二（甲基）丙烯酸酯、乙二醇二（曱基）丙烯酸酯、新戊二醇 :(甲基）丙婦酸醋、三甘醇二（甲基）丙烯酸醋、雙，酚A的雙（丙烯酰氧基乙基）醚、3_甲基戊二醇二 (甲基）丙烯酸酯等。就其他的多官能單體而言，具體來說係有三羥甲基於(甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸季戊四醇四（甲基）丙烯酸酯、二季戊四醇五（甲土丙烯酸酯、二季戊四醇六（甲基）丙烯酸酯等。其中，較佳係使用含雙官能基以上的多官能單體。中的2短波長雷射曝光裝置用著色感光性樹脂組成物介於體成分二前述光聚合性化合物（D)係含有質量分率 ; 1〜80質量百分比（％)較適宜。當光聚合性化合物（d) 24 201037459 介於前述範圍時，為合宜。像素部的強度或平滑性變得良好 [著色材料（E)]ΟΗ C, in the general formula 2, Ri is selected from the group consisting of alkynyl group, aminopropyl group, thiopropylpropylglycine group, (:) group C-- Any one of the organo-ethyl or hydroxyl groups selected by the group; the η system is a fluorene atom, a methyl group, and although not limited, in the above general formula 2, R1 is (methyl) C 17 201037459 Dilute base is preferred. For the ruthenium compound (b) represented by the above general formula 2, it can be used from the group consisting of succinyl dimethoxy sulphate, ethylene triethoxy sulphur, and ethyl succinyl (2-methoxy ethane). Oxygen) Shixiyuan, N-(2-aminoethyl)3-aminopropylmethyldimethoxydecane, N-(2-aminoethyl)3-aminopropyltrimethoxyoxydecane, 3 -aminopropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxycarbazide, 2-(3,4-ring Oxycyclohexylhexyl)ethyltrimethoxydecane, 3-propylmethyldimethoxydecane, 3-chloropropyltrimethoxyoxydecane, 3-hydrothiopropyltrimethoxydecane, methyl Acryloxy T-based triethoxydecane, methacryloxymethyltrimethoxydecane, 3-methacryloxypropyltrichlorodecane, 3-methacryloxypropyltrimethyl Oxygen oxime, 3-methacryloxyl triethoxy zeoxime, 3-acryloxypropyltrimethoxy decane or 3-acryloyloxypropyltrichloro decane Selecting compounds, individually selecting or selecting two or more After the combination, by the sol - gel process the manufactured silicon compound. Wherein, from methacryloxymethyltriethoxydecane, methacryloxymethyltrimethoxydecane, 3-methacryloxypropyltrioxanetris 3-methoxypropene Acyloxypropyltrimethoxydecane, 3-methacryloxypropyltriethoxydecane, 3-acryloyloxypropyltrimethoxysulfide or 3-acryloxypropyltri Preferably, the ruthenium compound produced by the sol-gel process is preferably selected from the alternative compounds such as chlorite and the like, and the ruthenium compound is preferably used. The ruthenium trimethoxy decane is preferably a ruthenium compound produced by a sol-gel process. The solid component in the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus, the above-mentioned cerium compound (B) contains a mass fraction of from 0.1 to 2.0% by mass (%), and more preferably contains 〇 3~〇8质18 201037459 The content of the bismuth compound (B) in the range of percentage (%) is less than two, and (%) 曰 is relatively good. When the adhesion between the substrate and the light-shielding layer is percentage (%), the content is more than 2.0% by mass: the residual film is formed to cause the development speed to change; Short-wavelength laser exposure is worn by w, -. The special photopolymerization initiator (A) 100 i is a color of Qiu, the mass of the one-component resin is ~i0 mass, and the second is a di-compound (8). The initiator has a high sensitivity effect of 3 2 5; 0 is maximized. (4) Calling, the adhesion to the substrate can also be [Binder resin (C)] = coloring photosensitive resin group resin for wavelength laser exposure device (Q, for coloring material (8), with binder resin effect Any of the components which can be dissolved in the color filter = the developer liquid used in the development stage required for the production can be used. For the above-mentioned binder resin (c), for example, it can be used. The carboxy monomer 'and the monomer may be copolymerized to copolymerize other monomers, etc. οα, as for the monomer containing a slow group, for example, may be an unsaturated monoacid, an unsaturated diteric acid Or an unsaturated carboxylic acid having a carboxyl group or more, such as an unsaturated polyvalent carboxylic acid, in the molecule such as unsaturated tri-baric acid. Here, as for the unsaturated monocarboxylic acid, for example, acrylic acid or sulfhydryl group is used. Acrylic acid, crotonic acid, α-chloropropionic acid, cinnamic acid, etc. In the case of the aforementioned unsaturated dicarboxylic acid, 'exemplified by maleic acid, fumaric acid, itaconic acid, citraconic acid, and mesaconic acid Et. 19 201037459 The aforementioned unsaturated polyacid can be acid Xuan, specifically There are maleic anhydride, itaconic anhydride, citraconic anhydride, etc. Further, the aforementioned unsaturated polyvalent carboxylic acid may be mono(2-methylpropyl)ester, which is exemplified by oleic acid mono (2-propylene) Acyloxy group = acid mono(2-methylpropoxyethyl), phthalic acid mono(2-propyleneoxy)ethyl), decanoic acid mono(2-methylpropenyloxyethyl), etc. The above unsaturated polyvalent carboxylic acid may be a (meth) acrylate of a dicarboxylic acid polymer at both ends, for example, a carboxylic acid polycaprolactone monoacrylate, an ω-carboxylic acid polymer. Caprolactone monomethacrylate, etc. These carboxyl group-containing monomers may be used singly or in combination of the above. The monomer having the carboxyl group may be copolymerized to copolymerize other monomers, for example, There are styrene 'α-methyl styrene, 〇曱 vinyl 曱, m-vinyl fluorene, Ρ-vinyl phenyl, ρ-chloro benzyl, 〇 methoxy styrene, m-methoxy Styrene, p_methoxystyrene, fluorene-ethyl benzyloxy decyl ether, m-vinylbenzyloxymethyl ether, p-vinylbenzyloxydecyl ether, fluorene-vinyl Benzyl Oxyhydroglycidyl ether, m_ethylene, benzyloxy glyceryl ether, p-vinylbenzyloxy glyceryl ether, oxime-based aromatic vinyl compound; such as mercapto acrylate, sulfhydryl Mercapto acrylate, ethyl acrylate, ethyl decyl acrylate, n propyl propyl 酉 vinegar, η-propyl methacrylate, i-propyl acrylate, i-propyl decyl propylene Ester, η-butyl acrylate, n-butyl decyl acrylate, butyl acrylate vinegar, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methyl propyl ester, t-butyl acrylate ,Bubutylmercaptopropyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate Ester, 3-hydroxypropyl decyl acrylate, 2-hydroxybutyl acrylate 20 201037459 enoate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, aryl acrylate, aryl methacrylate, benzyl oxy acrylate , benzyl methacrylate, bismuth cyclohexyl acrylate, cyclohexyl decyl propylene vinegar, phenyl propyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxy Ethylethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxy monoethylene glycol acrylate, methoxy diglycol methyl propyl ester , methoxy diglycol acrylate, methoxy triethylene glycol methyl propyl methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy propylene glycol acrylate, decyloxy Dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, cyclopentadienyl acrylate, cyclopentadienyl decyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate , 2-hydroxy-3-phenoxypropyl methacrylate, glycerin monoacrylic acid, unsaturated carboxylic acid esters such as glycerol monomethacrylate; such as 2-aminoethyl acrylate, 2 -aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-amino propyl Acrylate, 2-aminopropylmethacrylate, 2-dimethylamino Q propyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3- Aminoalkyl esters of unsaturated carboxylic acids such as aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, 3-dimethylaminopropyl methacrylate; such as hydroglyceryl acrylate, water glycerol An unsaturated carboxylic acid hydroglyceryl ester such as a decyl acrylate or the like; a carboxylic acid vinyl ester such as vinyl acetate, vinyl propionate, vinyl butyric acid or vinyl benzoate; such as vinyl methyl ether An unsaturated ether such as vinyl ethyl ether or aryl glyceryl ether; a vinyl cyanide compound such as acrylonitrile, methacrylonitrile, chloroacrylonitrile or vinylidene cyanide; such as acrylamide , methyl acrylamide, α-gas acrylamide, hydrazine-2-ylethyl acrylamide, hydrazine-2-hydroxyethyl methacrylamide, etc. 21 201037459 Unsaturated imine groups such as maleic amine, N-phenyl maleate, N-cyclohexyl horse, decylamine, etc.; such as u-butadiene An aliphatic conjugated diterpenoid such as isoprene or chloroprene; such as polystyrene, polymethacryl oxime, polydecylmercapto acrylate, poly-n-butyl acrylate, poly η:1! A large monomer having a monopropenylfluorenyl group or a monomercaptopropyl group at the end of the polymer molecular chain of the fluorenyl acrylate or polyoxyalkylene. These monomers may be used alone or in combination of two or more. The content of the carboxyl group-containing monomer unit in the binder resin (C) is usually 15 to 4% by mass (%), preferably 15 to 40% by mass, based on the mass fraction. More preferably 25 to 40% by mass (%). When the content of the monomer unit containing a carboxyl group is from 1 〇 to 5 〇 by mass% (%), it is preferable to have a good solubility for a developing solution and to form an image pattern correctly. For the purpose of the binder resin (C), for example, there is a (meth)acrylic acid <methyl (meth) acrylate copolymer, (mercapto) propyl acid / benzyloxy (methyl) Acrylate copolymer, (mercapto)acrylic acid/2-hydroxyethyl (meth) acrylate / benzyloxy (meth) propionic acid vinegar copolymer, (meth) acrylate / methyl (meth) propylene /Polystyrene macromonomer copolymer, (meth)acrylic acid/methyl(methyl)propionate/polymethyl(meth)acrylate macromonomer co-shovel, (meth)acrylic acid/benzyl Oxy (meth) acrylate ethylene macromonomer copolymer, (meth)acrylic acid / benzyloxy (methionate acrylate / polyf-group (meth) acrylate macromonomer copolymerization, di(methyl) Acrylic acid/2-transethylethyl (meth) propylene. vinegar; benzyloxy (meth) acrylate / polystyrene giant monomer poly (methyl) acid / 2 - secret ethyl (methyl Acid H, based (meth) acrylate / polymethyl (meth) acrylate macrom body copolymer, (mercapto) acrylic / styrene / Benzyloxy (meth) 1 22 201037459 Acrylic vinegar / N-phenyl maleic amine copolymer, (meth) acrylic acid / succinic acid mono (2 _ 浠浠氧基氧基 /) / stupid / thin Oxime oxime methyl) acrylate / Ν-phenylmaleic acid amine copolymer, (meth) acrylic acid / succinic acid mono (2-acryloyloxyethyl) / styrene / aryl (methyl Propionate/Ν-phenyl maleic amine copolymer, (meth)acrylic acid/benzyloxy(fluorenyl)acrylate/Ν-phenyl maleamide/styrene/glycerol single (A) a acrylate copolymer, etc. Among them, a (meth)acrylic acid/benzyloxy(fluorenyl)acrylic acid copolymer, (meth)acrylic acid/benzyloxy(fluorenyl)acrylate/styrene is preferred. a ruthenium copolymer, a (meth)acrylic acid/methyl (meth) acrylate copolymer, or a (mercapto)acrylic acid/fluorenyl (mercapto) acrylate/styrene copolymer. The binder resin of the present invention, The acid value is preferably in the range of 2 〇 to 200 (mgKOH/g). When the acid value is in the above range, the solubility is improved for the developing solution, and the non-exposed portion can be accommodated. Easily dissolve and increase the sensitivity, and as a result, it is more suitable to improve the residual film rate (remaining rati0) remaining in the pattern development of the exposed portion. The acid value here is defined as medium = acrylic polymer lg The amount of potassium hydroxide (mg) necessary is measured, and the value obtained is usually titrated with an aqueous potassium hydroxide solution to obtain an acid value. Further, by gel permeation chromatography (GPC; tetrahydrofuran, The measured polystyrene-equivalent weight average molecular weight (hereinafter referred to as "weight average molecular weight") is preferably from 3,000 to 200,000 to 5,000 to 100,000, and is suitable for the test of the soluble resin. The hardness is increased, and the residual film rate is increased. The solubility in the non-exposed portion is excellent, and the solid content in the colored photosensitive resin composition 23 201037459 for the relatively short-wavelength laser exposure apparatus can be improved. The binder resin (c) contains a mass fraction of 10 to 80% by mass (%), preferably 20 to 70% by mass (%). When it is in the above range, the pattern can be formed, and the 'solution and residual film rate can be increased, which is more suitable. [Photopolymerizable Compound (D)] The photopolymerizable compound (D) contained in the colored photosensitive resin composition for a short-wavelength laser exposure apparatus of the present invention is polymerized by the action of light and a photopolymerization initiator. The compound may comprise a monofunctional monomer, a double B month early body, and other polyfunctional monomers. In the case of a monofunctional monomer, specifically, nonylphenol carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylmethicone acrylate, 2- Hydroxyethyl acrylate, N: pyrrolidone, and the like. In the case of a bifunctional monomer, specifically, 1,6-hexanediol di(meth)acrylate, ethylene glycol di(decyl)acrylate, neopentyl glycol: (meth)propyl Sour vinegar, triethylene glycol di(meth)acrylic acid vinegar, bis, bis(acryloyloxyethyl)ether of phenol A, 3-methylpentanediol di(meth)acrylate, and the like. As for other polyfunctional monomers, specifically, there are trimethylol groups in (meth) acrylate, pentaerythritol tris (meth) acrylate pentaerythritol tetra (meth) acrylate, dipentaerythritol pentoxide (methane acrylate) Dipentaerythritol hexa(meth) acrylate, etc. Among them, a polyfunctional monomer containing a difunctional group or more is preferably used. The coloring photosensitive resin composition for the 2 short-wavelength laser exposure apparatus is different in the body composition 2 The photopolymerizable compound (D) contains a mass fraction; 1 to 80% by mass (%) is suitable. When the photopolymerizable compound (d) 24 201037459 is in the above range, it is suitable. The strength or smoothness of the pixel portion Sex becomes good [coloring material (E)]

色指數（The Society of Dyers and Colourists 出版）中: 〇依顏料（Pigment)進行分類的化合物。機顏料而言，具體來說，可使用彩更具體來說可使用如C.I.顏料黃1、c.i.顏料黃3、 C.I.顏料頁12、C.I.顏料黃π、C.I.顏料黃14、C.I.顏料黃15、C.I.顏料黃16、C.I·顏料黃17、C I顏料黃加、 C.I.顏料黃24、C.I.顏料黃31、C.I.顏料黃53、C.I·顏料黃83、C.I.顏料黃86、C.I.顏料黃93、C.I·顏料黃94、 C.I.顏料黃109、C.I.顏料黃no、c.i.顏料黃Η?、c I 顏料黃125、C.I·顏料黃128、C.I.顏料黃137、C.I.顏料黃138、C.I·顏料黃139、C.I.顏料黃147、C.I.顏料黃148、 C.I.顏料黃 150、C.I.顏料黃 153、C.I.顏料黃 154、C.I. 顏料黃166、C.I.顏料黃173、C.I.顏料黃180、C.I.顏料黃185、C.I.顏料黃194、C.I.顏料黃214等的黃色顏料；如 C.I.顏料橙（Pigment Orange)13、C.I.顏料橙 31、C.I. 顏料橙36、C.I.顏料橙38、C.I.顏料橙40、C.I.顏料橙 42、C.I.顏料橙 43、C.I·顏料撥 51、C.I.顏料橙 55、C.I. 顏料橙59、C.I.顏料橙61、C.I.顏料橙64、C.I.顏料橙 65、C.I.顏料橙71、C.I.顏料橙73等的橙色顏料；如c.i. 顏料紅（Pigment Red)9、C.I.顏料紅 97、C.I.顏料紅 105、 C.I.顏料紅 122、C.I.顏料紅 123、C.I.顏料紅 144、C.I. 25 201037459 顏料紅149、C.I.顏料紅166、C.I.顏料紅168、c j顏料紅i76、C丄顏料紅177、C丄顏料紅18〇、c〗顏紅·〃 2、 C.I.顏料紅209、C丄顏料紅215、c丄顏料紅216 顏料紅224、C.I.顏料紅242、C.I.顏料紅254、匚Γ顏斜紅264、C.L顏料紅265等的紅色顏料；如 (Pigment Blue)15、C.I.顏料藍 15 : 3、c丄顏料藍·Η : 4、 C.I.顏料藍15 : 6、C.I.顏料藍60等的藍色顏料；顏料紫（Pigment Violet)l、C.I.顏料紫 19、C I .、· C.I.顏料紫29、C · I、顏料紫32、顏料紫％、，料紫38等的紫色顏料；如c丄顏料綠 ⑽ Green)7、C.L顏料綠36、c丄顏料綠％等的綠色 =c.i.顏料棕（Pigment Brown)23、c【顏料棕25等的棕色顏料；如C.I.顏料黑（Pigment Black)1、c工 ^ 等的黑色顏料。其中，包含自Cl顏料黃138 /ci mCJ.顏料黃15〇、C.L顏料紅177、C‘L顏料紅2〇9、 L.I.顏料紅254、C.I.顏料紫23、C.I.顏料藍15 · 6、c工 ίΐ綠36及c.1·顏料綠58中所選擇之一種以上的顏料特別是此些有機顏料及無機顏料可各自單 HI:?以上混合後使用。例如，分別可以為形成：顏料黃150及CU.顏料黃138所組成的群組中選擇之一· 種以上、為形成藍色像素而包含c.i.顏料藍15: 6較佳。中的i目if皮長雷射曝光裝置用著色感光性樹脂組成物固體成分，此種著色材料（E)的含有量通常係含有質率介於10〜70質量百分比（％)，較佳係介於2〇〜6〇 ' 1百分比（％)的範圍。當介於前述範圍時，作成彩色淚 26 201037459 分且可在組成物中含有必要量的組成物聚口體，因此可形成機械強度充分的圖型。中的射曝光裝置用著色感光性組成物中的固體成分，係意指除去溶劑的成分總合。前述顏料中的有機顏料，可視需求，加入使入有齩基或鹼基的顏料衍生物等的表化合物等的表面的轉接虚拂 Γ田枝i t 口體广_〇等的微粒化處理、或利用有機溶〇洗淨處理、利用離子性議離二的可使卜較佳。著色材料為顏料時，其含有顏枓分散劑進行分散處理，可得到使在洛液中均一地分散狀態的顏料分散液。 … 阶離= 言，舉例來說係可使用陽離子系、活性劑’可各自單獨使用或組合兩等的表面〇色残相對短波長雷射曝光震置用著劑=:重量部，顏料分散 Ρ下’更佳係介於㈣5重詈邻 ^ 重量部以下。當顏料分散劑的 = 氣圍時，可得到均一地分散狀態的顏料，較為合=这 [溶劑（F)] :者色感光性樹脂組成物領域的各種有機溶劑，二】 27 201037459 包含置用著色感光性樹脂組成物的整體里’本發明的波長雷射曝光裝荽質i二=組成物中的溶劑(f)的含有量通常係含有 85所刀旦於6〇〜9”量百分比(%)，較佳係介於70〜 9〇比（％)°當溶劑（F)❺含有量介於上述60〜貝置百匀比（％)範圍的時，以輥塗佈機、轉塗佈機、狹縫塗佈機（也有模具塗佈機裝置進行鲁就了使用;谷劑（F)的具體例而言，係有乙二醇美鍵够乙二醇單乙基鍵、乙二醇單丙㈣、乙二醇單丁 1 醚等的乙二醇單烷醚類；如二甘醇二甲基醚、二甘醇二乙基醚、二甘醇二丙基醚、二甘醇二丁基醚等的二甘^ 二烷醚類；如醋酸甲基溶纖劑、醋酸乙基溶纖劑等的乙二醇烷醚醋酸鹽類；如丙二醇单甲醚乙酸酯、丙二醇乙基醚醋酸鹽、丙二醇單丙基醚醋酸鹽、甲氧基丁旯萨酸鹽、曱氧基戊烷基醋酸鹽等的聚烯烴基二醇烷醚醋^ ，類’·如苯 '甲苯、二甲苯、三甲苯等的芳香族碳氯化 δ物類；如曱基乙基酮、丙酮、甲基戊基酮、甲基異丁基酮、環己酮等的酮類；如乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙三醇等的醇類；如3_乙氧基丙酸乙 S曰、3-曱氧基丙酸曱基等的酯類；如γ_ 丁内酯酯類等。衣状前述溶劑中，就塗佈性及乾燥性進行考量時，較佳可使用前述溶劑中沸點為介K100〜2〇(rc間的有^溶劑’更佳係可使用如聚烯烴基二醇烷醚醋酸鹽類、_類、 3-乙氧基丙酸乙酯或3-甲氧基丙酸甲基等的酯類、最佳則可使用如丙二醇单甲醚乙酸酯、丙二醇單乙基醚醋酸 28 201037459 鹽、環己_、3-乙氧基丙酸乙酯或3-甲氧基丙酸甲基等。這些溶劑（F)可各自單獨使用也可混合兩種以上使用。本發明的短波長雷射曝光裝置用著色感光性樹脂組成物中’可視需求’於上述成分中添加如充填劑、其他的高分子化合物、顏料分散劑、紫外線吸收劑、凝集防止劑等添加劑亦可。〃就前述充填劑而言，具體來說係可使用玻璃、石夕、 ❹ 氧化鋁等。就前述其他的高分子化合物而言，具體來說係可使用壤氧樹脂、馬來醯胺樹脂等的硬化性樹脂；如聚乙稀基醇、聚丙烯酸、聚乙二醇、單烷醚、聚氟基烷丙烯酸酉曰、I Sg、聚氣基曱酸乙S曰專的熱可塑性樹脂等。就前述顏料分散劑而言’可使用市售的表面活性劑，舉例來說，可使用矽系、氟系、酯系、陽離子系、陰離子系、非離子系、陽性等的表面活性劑。這些表面活性劑可各自單獨使用’也可以組合兩種以上使用。Color Index (published by The Society of Dyers and Colourists): 化合物 A compound classified by Pigment. In terms of organic pigments, specifically, color can be used, for example, CI Pigment Yellow 1, ci Pigment Yellow 3, CI Pigment Sheet 12, CI Pigment Yellow π, CI Pigment Yellow 14, CI Pigment Yellow 15, CI Pigment Yellow 16, CI·Pig Yellow 17, CI Pigment Yellow Plus, CI Pigment Yellow 24, CI Pigment Yellow 31, CI Pigment Yellow 53, CI·Pig Yellow 83, CI Pigment Yellow 86, CI Pigment Yellow 93, CI·Pig Yellow 94, CI Pigment Yellow 109, CI Pigment Yellow No, ci Pigment Astragalus, c I Pigment Yellow 125, CI·Pigment Yellow 128, CI Pigment Yellow 137, CI Pigment Yellow 138, CI·Pig Yellow 139, CI Pigment Yellow 147 , CI Pigment Yellow 148, CI Pigment Yellow 150, CI Pigment Yellow 153, CI Pigment Yellow 154, CI Pigment Yellow 166, CI Pigment Yellow 173, CI Pigment Yellow 180, CI Pigment Yellow 185, CI Pigment Yellow 194, CI Pigment Yellow 214 Such as yellow pigment; such as CI Pigment Orange 13, CI Pigment Orange 31, CI Pigment Orange 36, CI Pigment Orange 38, CI Pigment Orange 40, CI Pigment Orange 42, CI Pigment Orange 43, CI·Pigment 51 , CI Pigment Orange 55, CI Pigment Orange 59, CI Pigment Orange 61, CI Pigment Orange 64 Orange pigments such as CI Pigment Orange 65, CI Pigment Orange 71, CI Pigment Orange 73; such as ci Pigment Red 9, Pigment Red 97, CI Pigment Red 105, CI Pigment Red 122, CI Pigment Red 123, CI Pigment Red 144, CI 25 201037459 Pigment Red 149, CI Pigment Red 166, CI Pigment Red 168, cj Pigment Red i76, C丄 Pigment Red 177, C丄 Pigment Red 18〇, c〗颜红·〃 2, CI Pigment Red 209, C 丄 pigment red 215, c 丄 pigment red 216 pigment red 224, CI pigment red 242, CI pigment red 254, 匚Γ 斜 oblique red 264, CL pigment red 265 and other red pigment; such as (Pigment Blue) 15, CI Pigment Blue 15 : 3, c丄 Pigment Blue·Η : 4, CI Pigment Blue 15 : 6, Blue Pigment Blue 60 and other blue pigments; Pigment Violet l, CI Pigment Violet 19, CI . Purple pigments such as CI Pigment Violet 29, C · I, Pigment Violet 32, Pigment Violet %, and Violet 38; such as c丄 Pigment Green (10) Green) 7, CL Pigment Green 36, c丄 Pigment Green%, etc. Green = Ci pigment brown 23, c [pigment brown 25 and other brown pigment; such as CI pigment black (Pigment Black) 1, c work ^ Black pigments such as. Among them, it contains from Cl pigment yellow 138 /ci mCJ. Pigment Yellow 15〇, CL Pigment Red 177, C'L Pigment Red 2〇9, LI Pigment Red 254, CI Pigment Violet 23, CI Pigment Blue 15 · 6, C One or more pigments selected from the group consisting of 36 ΐ green 36 and c. 1 、 pigment green 58, in particular, these organic pigments and inorganic pigments may be used after mixing HI:? or more. For example, it is preferable to select one of the group consisting of Pigment Yellow 150 and CU. Pigment Yellow 138, and to form c.i. Pigment Blue 15:6 for forming a blue pixel. In the i mesh if-length laser exposure apparatus, the solid content of the coloring photosensitive resin composition is used, and the content of the coloring material (E) is usually 10 to 70 mass% (%), preferably Between 2〇~6〇' 1 percentage (%) range. When it is in the above range, the colored tears 26 201037459 can be formed and the necessary amount of the composition agglomerates can be contained in the composition, so that a pattern having sufficient mechanical strength can be formed. The solid component in the coloring photosensitive composition for the medium exposure apparatus means the total of the components of the solvent to be removed. The organic pigment in the above-mentioned pigment may be added to the surface of a surface compound such as a fluorenyl group or a base-derived pigment derivative, and the like. Or it can be better to use the organic solvent to wash the treatment and to use the ionic separation. When the coloring material is a pigment, it is dispersed by a pigment dispersing agent to obtain a pigment dispersion liquid which is uniformly dispersed in the Lok solution. ... Descending = 言, for example, can use cationic system, active agent' can be used alone or in combination with two kinds of surface chrome residual relatively short-wavelength laser exposure shocking agent =: weight, pigment dispersion Ρ The lower 'better' is below (4) 5 heavy neighbors ^ below the weight. When the pigment dispersant = gas enthalpy, a pigment in a uniformly dispersed state can be obtained, which is more = this [solvent (F)]: various organic solvents in the field of photosensitive resin composition, 2] 27 201037459 Including use In the whole of the coloring photosensitive resin composition, the wavelength of the wavelength laser exposure device of the present invention i = the content of the solvent (f) in the composition usually contains 85 centistokes in a volume of 6 〇 to 9 ” ( %), preferably in the range of 70 to 9 〇 (%) ° When the solvent (F) ❺ content is in the range of the above 60 to bai ratio (%), by roller coater, transfer coating Cloth machine, slit coater (there is also a mold coater device for use in Lu; the specific example of the trough (F) is ethylene glycol US key to ethylene glycol monoethyl bond, ethylene glycol Ethylene glycol monoalkyl ethers such as monopropyl (tetra), ethylene glycol monobutyl ether; such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol a diethylene ether such as butyl ether; an ethylene glycol alkyl ether acetate such as methyl cellosolve acetate or ethyl cellosolve acetate; such as propylene glycol monomethyl ether acetate , propylene glycol ethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyrate, decyloxypentane acetate, etc., polyolefin-based glycol alkyl ether vinegar ^, such as benzene 'Aromatic carbon chlorinated δ species such as toluene, xylene, and trimethylbenzene; ketones such as mercaptoethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone; Alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerin, etc.; such as 3-ethoxypropionic acid ethyl sulfonate, 3-methoxyoxypropionic acid sulfhydryl group, etc. Esters such as γ-butyrolactone esters, etc. In the case of the above-mentioned solvent, in terms of coatability and dryness, it is preferred to use a solvent having a boiling point of K100 〜2 〇 (the rc between the rc) 'More preferably, esters such as polyolefin-based glycol alkyl ether acetates, _, 3-ethoxypropionate or 3-methoxypropionic acid methyl groups can be used, and the best can be used. Such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetic acid 28 201037459 salt, cyclohexyl, 3-ethoxypropionate ethyl ester or 3-methoxypropionic acid methyl group, etc. These solvents (F) can be Separately The short-wavelength laser exposure apparatus of the present invention may be added to the above-mentioned components by a 'visible demand' in a short-wavelength laser exposure apparatus, such as a filler, another polymer compound, a pigment dispersant, and ultraviolet rays. An additive such as an absorbent or an aggregation inhibitor may be used. 〃 For the above-mentioned filler, specifically, glass, shoal, yttrium alumina, etc. may be used. For the other polymer compounds described above, specifically A curable resin such as a terrestrial resin or a maleic acid resin; for example, a polyethylene glycol, a polyacrylic acid, a polyethylene glycol, a monoalkyl ether, a polyfluoroalkane ruthenium hydride, an I Sg, a polyglycol ruthenium For the pigment dispersant, a commercially available surfactant can be used. For example, anthraquinone, fluorine, ester, cation, anion, or non can be used. A surfactant such as an ion system or a positive one. These surfactants may be used singly or in combination of two or more.

G 就前述表面活性劑而言，舉例來說係有聚乙烯烷醚類、聚乙烯烷苯基醚類、聚乙二醇二酯類、山梨醇脂肪酸酯類、脂肪酸變性聚酯類、3級胺變性聚氨基曱酸乙酯類、聚乙烯類等，其他尚有商品名為KP(信越化學工業株式會社製、POLYFLOW (共榮社化學株式會社製）、EFTOP (TO-KEMUPORODAKUTSU社製、MEGAFAC(大日本 INK化學工業株式會社製）、Fluorad (住友3M株式會社製）、Asahi guard、Surflon(以上、旭硝子株式會社製造）、 SOLSPERSE (捷利康株式會社製）、EFKA(EFKA CHEMICAL社製）、PB821(味之素株式會社製）等可供使 29 201037459 用。就前述紫外線吸收劑而言，具 2-(3-tert-丁基—2_羥基 _5_ 甲基 ”— 氧基二苯甲酮等。土氣本丙二唑、烷納等。、刖述凝集防止劑而s，具體來說可使用聚丙稀酸本發明的短波長雷射曝光裝匕^ 成物，舉例來說可以下、用者色饮先性樹月曰組直杰伽、、六如π . 下述方法加以製造。將著色材料（Ε) I )混合，著色材料的平均粒徑達到〇.2um程度下為止，使用珠磨機等加以分散。此時，可視需求劑，有與結合劑樹脂心= 成物的Ϊ件到的分散液（以下，也有稱為顏料組 '曲声：二人，使可視需求追加的溶劑可達到一預定劑樹脂(〇的殘留物、單官能添加劑、光聚 :&八二(D)及光聚合引發劑（Α)、可視需求使用的其的添加的話，即可得到達成本發明目的之短波長由射曝光裝置用著色感光性樹脂組成物。 ^下，將針對使用本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物’形成圖型的方法進行說明。本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物的，型形成方法，係包含將上述的短波長雷射 ^，裝置用著色感光性樹脂組成物塗佈在基材上的塗佈产白長對鈿述短波長雷射曝光裝置用著色感光性樹脂組 f；物的部分領域選擇地進行曝光的曝光階段、以及除去前述短波長雷射曝光裝置用著色感光性樹脂組成物的曝光領域或非曝光領域的除去階段。就其中一實施例來說，係如下述說明般地在基材上 30 201037459 J佈上述的短波長雷射曝光裝置用著色感光性樹脂组成物，藉，光硬化及顯像使圖型逐漸形成，而可作為著色像素（著色畫像）來使用。於此，就基材來說係可使用玻璃或矽晶圓’但本發明對此並無限制。首，，在基材上塗伟本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物，或者是塗佈在事先已形成的包含有短波長雷射曝光裝置用著色感光性樹脂組成物的固體成分的層上後，進行事先乾燥而可得到除去溶背I專的揮發成分的平滑的塗膜。此時，塗膜的厚度約介〇於0.5 μιη〜4 μηι程度左右。又、為了在依上述方式得到的塗膜上，能得到目標圖型，可透過光罩對特定領域進行紫外線照射。此時，曝光部整體均一地由平行光線照射著，為使光罩與基板間的位置能夠正確地對齊排列，可使用光罩定位儀或步進機等裝置較佳。此外，當硬化結束之後將塗膜與鹼水溶液接觸，使非曝光領域得以溶解進而顯像，而可形成目標圖型。顯像後，還可以視需求實施12〇〜23(rc的溫度環境下，10〜60分左右的後乾燥。〇圖型化曝光後的顯像中所使用的顯像液，通常係為包含驗性化合物與表面活性劑的水溶液。鹼性化合物可以是無機及有機鹼性化合物中的任一種皆可。就無機鹼性化合物的具體例而言，係有水酸化鈉、氫氧化鉀、燐酸水素二鈉、燐酸二水素鈉、璘酸水素二銨、燐酸二水素錄、璘酸二水素鉀、碎酸納、梦酸鉀、炭酸鈉、炭酸鉀、炭酸水素鈉、炭酸水素鉀、硼酸鈉、硼酸鉀、氨水等。此外，就有機鹼性化合物的具體例而言，係有四曱基氢氧化铵、2_羥基乙基三曱基氢氧 31 201037459 化4*、單曱基胺、二曱基胺、三甲基胺、單乙基胺、二乙基胺、三乙基胺、單異丙基胺、二異丙基胺、乙醇胺等。此些無機及有機鹼性化合物，可各自獨自使用或組合兩種以上使用。、驗顯像液中的前述驗性化合物的較佳濃度為介於 0.01〜10質量百分比（％)的範圍，更佳為介於0 03〜量百分比（％)的範圍。鹼顯像液中的表面活性劑，係可使用於非離子系 =活性劑、陰離子系表面活性劑或陽離子系表面活性劑丄的任種ϋ述非離子系表面活性劑的具體例而 =係有聚乙料醚、聚乙烯m聚乙烯烧芳基趟、 2的聚乙嫦衍生㊈、乙烯/丙烯氧基共聚合體、 =月曰肪酸S旨、聚乙稀山梨醇脂肪動旨 ^ 丙三醇脂肪酸醋、聚乙浠脂肪酸醋 =酿就 =述陰離子系表面活性劑的具體例而言，h 類ί ϋ ί納或油醇硫酸酿納等的高級醇硫酸醋趟等。就前述陽離子系表面活性;丨納的=二i續= 以上使用。獨自使用或組合兩種質量百分上1=為介於⑽〜8 (0/〇)的範圍。 ’、、、w於0.1〜5質量百分比以下將對本發騎叙彩⑽光片進行說明 201037459 本發明所述之彩色濾光片係包含，將上述的短波每射曝光裝置用者色感光性樹脂組成物依預定圖型進― 曝光、顯像後所形成的彩色層。仃短波長雷射曝光裝置用著色感光性樹脂組成物型形成方法係如上所述，其詳細說明則於此省略。 ❹ ❹ 如上所迤，通過短波長雷射曝光裝置用著色樹脂溶液的塗佈、乾燥、對所得之乾燥塗膜進行圖曝光，接下來則是顯像等等各項操作，以得到與短= 雷射曝光裝置用著色感光性樹脂組成物中的著色料顏色相當的像素或黑色矩陣。此外，上述操作僅复彩色濾光片中所需的顏色的次數，即可得到片。因彩色滤光片的構成及製造方法為本技術領域;^ 知技術，故其詳細說明則於此省略。一 *、、、使用本發明的短波長雷射曝光|置脂組成物所製造的彩色濾光片，雖然面内的^= 二;例如介於。—的膜厚’面内的膜〇·15 μιη以下，更可設定在』運到彩声s Γ μ 下。據此，所得之 I色忒先片具有優異的平滑性，當將此彩置彩色液晶顯示裝置、攝像％ ^ : 、、、裴造出高口曾的、、杰曰⑪Γ像件4尸可以高良率地製 L出间口口質的液日日顯示裝置、攝像元件。置。本發明提供—種包含上述彩色濾光片之液晶顯示裝本發明的液晶顯示裝詈哈直供、+、4 A上外，尚包含本技術領域中熟知^備3^色濾光片之内。舉例來說%装/皆包含在本發明範圍像素電極及配向層的對向、=體（TFT元件）、丁 Π窀極基板間隔一預定間隔地對 33 201037459 二:己，、於其間隙部内注入液晶材料以作為液晶層的透過式液晶顯示裝置。此外，也可以是於彩色渡光片的基板與彩色層間設置反射層的反射歧晶顯示裝置。此外，就其他例子而言，也可以是包含有結合在彩色濾光片的透明電極上❺TFT(薄膜電晶體：Thin HimG For the aforementioned surfactant, for example, polyvinyl alkane ether, polyvinyl alkphenyl ether, polyethylene glycol diester, sorbitan fatty acid ester, fatty acid modified polyester, grade 3 Amine-denatured polyamino phthalate, polyethylene, etc., and other products are available under the trade name KP (manufactured by Shin-Etsu Chemical Co., Ltd., POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by TO-KEMUPORODAKUTSU, MEGAFAC). (manufactured by Dainippon Ink Chemical Co., Ltd.), Fluorad (manufactured by Sumitomo 3M Co., Ltd.), Asahi guard, Surflon (above, manufactured by Asahi Glass Co., Ltd.), SOLSPERSE (manufactured by Jielikang Co., Ltd.), EFKA (manufactured by EFKA CHEMICAL Co., Ltd.), PB821 (manufactured by Ajinomoto Co., Ltd.), etc., can be used for 29 201037459. For the aforementioned ultraviolet absorber, 2-(3-tert-butyl-2-hydroxy-5-methyl)-oxybenzophenone Ketones, etc. Rustic propylene diazole, alkane, etc., to describe the aggregation inhibitor s, specifically polyacrylic acid can be used in the short-wavelength laser exposure device of the present invention, for example, User color drink first sex tree Yuet group straight伽, 六, such as π. Manufactured by the following method, the coloring material (Ε) I) is mixed, and the average particle size of the coloring material is about 〇2 μm, and is dispersed by using a bead mill or the like. Agent, there is a dispersion of the resin with the binder resin core = (hereinafter, there is also called a pigment group's song: two people, so that the solvent added to the visual demand can reach a predetermined agent resin (residue residue) , a monofunctional additive, a photopolymerization: & octagonal (D) and a photopolymerization initiator (Α), which can be used as needed, can obtain a short-wavelength coloring photosensitive device for the purpose of the present invention. The resin composition is described below. The method for forming a pattern by using the colored photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention will be described. The short-wavelength laser exposure apparatus of the present invention is used. The method for forming a coloring photosensitive resin composition includes a short-wavelength laser which is applied to a substrate by applying the above-described short-wavelength laser light, and a coating coloring photosensitive resin composition is coated on a substrate. Exposure device The exposure stage in which the coloring photosensitive resin group f is partially used for the exposure, and the removal stage in the exposure field or the non-exposure field in which the coloring photosensitive resin composition for the short-wavelength laser exposure apparatus is removed. In the embodiment, the coloring photosensitive resin composition for the short-wavelength laser exposure apparatus described above is used on the substrate as described below, and the pattern is gradually formed by photohardening and development. It is used as a colored pixel (colored image). Here, a glass or a tantalum wafer can be used for the substrate. However, the present invention is not limited thereto. First, on the substrate, the coated photosensitive resin composition for short-wavelength laser exposure apparatus according to the present invention is coated with a colored photosensitive resin containing a short-wavelength laser exposure apparatus which has been formed in advance. After the layer of the solid component of the material is dried, a smooth coating film for removing the volatile component of the solvent-free I is obtained. At this time, the thickness of the coating film is about 0.5 μm to 4 μm. Further, in order to obtain a target pattern on the coating film obtained as described above, it is possible to irradiate a specific region with ultraviolet rays through a photomask. At this time, the entire exposed portion is uniformly illuminated by the parallel light, and in order to accurately align the position between the mask and the substrate, a device such as a photomask or a stepper can be preferably used. Further, when the hardening is completed, the coating film is brought into contact with the aqueous alkali solution, so that the non-exposure field is dissolved and developed, and a target pattern can be formed. After development, it is also possible to carry out post-drying at a temperature of 12 to 60 minutes in a temperature environment of rc as required. The developing solution used in the development of the image after exposure is usually included. An aqueous solution of a test compound and a surfactant. The basic compound may be any of an inorganic and an organic basic compound. Specific examples of the inorganic basic compound include sodium acid hydrate, potassium hydroxide, and citric acid. Hydrosodium disodium, sodium citrate dihydrate, diammonium citrate dihydrate, bismuth citrate dihydrate, potassium bismuth citrate, sodium citrate, potassium citrate, sodium carbonate, potassium carbonate, sodium carbonate, potassium carbonate, sodium borate And potassium borate, ammonia water, etc. Further, as a specific example of the organic basic compound, there are tetradecylammonium hydroxide, 2-hydroxyethyltrimethylidene hydroxide 31 201037459 4*, monodecylamine, Dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, ethanolamine, etc. These inorganic and organic basic compounds can be They are used alone or in combination of two or more. The preferred concentration of the aforementioned test compound in the liquid is in the range of 0.01 to 10% by mass (%), more preferably in the range of 0 03 to the percentage by weight (%). Surfactant in the alkali imaging solution A specific example of a nonionic surfactant which can be used for a nonionic surfactant, an anionic surfactant or a cationic surfactant 而 = polyethylene ether, polyethylene m Polyethylene aryl hydrazine, 2 polyethyl hydrazine derivative 9, ethylene / propylene oxyethylene copolymer, = sulphuric acid S, polyethylene sorbitol fat gamma glycerol fatty acid vinegar, polyacetic acid fatty acid Vinegar = brewing = specific examples of the anionic surfactant, high-grade alcohol sulfate vinegar, etc., such as h-type ϋ ί ί or oleyl sulfate, etc., in terms of the aforementioned cationic surface activity; Cannes = 2 i continued = above. Use alone or in combination of two mass percentages above 1 = is in the range of (10) ~ 8 (0 / 〇). ',,, w under 0.1~5 mass% will be on the ride (10) Light sheet description 201037459 The color filter system of the present invention includes, will be The short-wave per-exposure device uses a photosensitive resin composition to enter a color layer formed by exposure and development according to a predetermined pattern. The formation method of the coloring photosensitive resin composition type of the short-wavelength laser exposure apparatus is as follows. The detailed description thereof is omitted here. ❹ ❹ As described above, the coating of the colored resin solution by the short-wavelength laser exposure apparatus, drying, and exposure of the obtained dried coating film are followed by image development. And other operations to obtain a pixel or a black matrix equivalent to the color of the coloring material in the coloring photosensitive resin composition for the short = laser exposure device. Further, the above operation only requires the color of the color filter. The number of times can be obtained. Since the configuration and manufacturing method of the color filter are in the technical field, the detailed description is omitted here. A color filter manufactured by using the short-wavelength laser exposure|fatting composition of the present invention, although in-plane ^=2; for example, is interposed. - The film thickness in the plane of the film 〇·15 μιη or less can be set to be transferred to the color sound s Γ μ. According to this, the obtained I color enamel first film has excellent smoothness, and when the color is set to a color liquid crystal display device, the image is taken as %^:, 裴, 裴, 曰, 曰, Γ Γ Γ Γ 4 4 A high-yield liquid-to-liquid display device and an imaging element. Set. The present invention provides a liquid crystal display device comprising the above color filter. The liquid crystal display device of the present invention is provided with a direct supply of +, 4, 4 A, and is also included in the well-known 3 color filter of the prior art. . For example, % loading/all are included in the range of the pixel electrode and the alignment layer of the present invention, the body (TFT element), and the Π窀-electrode substrate are spaced apart by a predetermined interval, 33 201037459, in the gap portion thereof. A liquid crystal display device in which a liquid crystal material is injected as a liquid crystal layer. Further, a reflective crystal display device in which a reflective layer is provided between the substrate of the color light guide sheet and the color layer may be used. Further, as another example, it may be a TFT including a transparent electrode incorporated in a color filter (thin film transistor: Thin Him)

Transistor)基板、以及可將TFT基板固定在與彩色濾光片相重疊位置上的背光模組的液晶顯示裝置。前述基板可具備有用以包圍彩色濾光片的周邊表面的光防止樹脂（llght-pr00f resin)所構成的外部框架、增設在外部 =内由向列型液晶所構成的液晶層、液晶層的依各領域各別提供之複數個像素電極、像素電極所形成的透明，璃基板、以及形成在透明玻璃基板的露出表面上的偏偏光板，具有在垂直方向上橫切的偏光方向，以如聚乙烯基醇等有機材料所構成。複數個像素電極，各自，形成在TFT基板的玻璃基板上的複數個薄，。當特定像素電極上適用一預定電位差時電； J電極與透明電極間則適用一預定電壓。因此，隨電壓 =化所形成的電場不同，而可控制變化液晶層的特定素電極所屬領域的配向。以下僅根據實施例更進一步詳細說明本發明，於下所揭示本發明之實施形態僅用於例示而已，並非用以阼 ^本發明實施之範圍。故該等技術領域具有通常知^ 者，根據本發明所作出各種等效或輕易的結構變化者，在不脫離本發明之精神與範圍下所作之均等變化與修飾’皆應涵蓋於本創作之專利範圍内。〃 > 以下的實施例、比較例中用以表示含有量的「百分 34 201037459 比（％)」及「部」若無特別解釋，皆以直量為基準。首先，為了製造本發明所述之短波長雷射曝光裝置用著色感光性樹脂組成物，在石夕化合物方面係準備了經過加水分解反應的具有有機官能基的石夕化合物。下述的合成例1、2、3係為為了增進密著性所製造的矽化合物的合成例。 <合成例1> 在具備有攪拌機、溫度計及pH測定器的反應容器 _ 中，置入3-曱基丙烯酰氧基丙基三乙氧基矽烷〇 (MTMSiGE-東芝製A-174)80 m卜將曱醇15 ml中混合pH2.5的丙二酸水溶液5 ml所製造的混合液20 ml置入滴下漏斗、一邊對反應容器進行攪拌，於常溫環境下，一邊進行30分的曱醇與丙二酸水溶液的混合液滴下步驟。當滴下完成後，邊維持常温邊進行2小時間的攪拌。經2小時的攪拌後，於減壓環境下除去溶媒。使用無水硫酸鎂進行殘留蒸餾水的脫水，將無水硫酸鎂進行過濾而得以分別。上述過程中，最後所得的矽化合物係以增進密著性上，表現最適當機能的無色黏性液體的 ^ 矽溶膠狀態存在著。 <合成例2 > 與合成例1相同的容器中，除將3-曱基丙烯酰氧基丙基三乙氧基矽烷變更為3-環氧丙氧基丙基三曱氧基矽烷（GPTMS:GE-東芝製A-187)之外，其餘皆與合成例 1相同的步驟進行合成。〈實施例1 -5及比較例1 -4 > 將表1及表2中記載的各成分進行混合溶解，以製 35 201037459 造光聚合組成物。 (表1) 實施例 1 2 3 4 5 A-l 0.62 0.66 0.67 0.65 0.66 A-2 0.16 0.17 0.16 0.17 0.17 A-3 2.33 1.66 1.64 1.65 1.66 A-4 B-l 0.1 0.2 0.3 0.25 B-2 0.2 C-l 3.16 3.52 3.47 3.5 3.52 D-l 2.33 2.49 2.46 2.48 2.49 E-l 3.27 3.27 3.27 3.27 3.27 E-2 6.89 6.89 6.89 6.89 6.89 E-3 1.13 1.13 1.13 1.13 1.13 F-l 56.01 56.01 56.01 56.01 56.01 F-2 16 16 16 16 16 F-3 8 8 8 8 8 (表2) 比較例1 1 2 3 4 A-l 0.7 0.67 0.67 0.67 A-2 0.2 0.17 0.17 0.17 A-3 1.7 1.67 1.67 A-4 1.67 B-l 0 0.1 B-3 0.1 B-4 0.1 C-l 3.6 3.58 3.58 3.58 D-l 2.5 2.51 2.51 2.51 E-l 3.3 3.27 3.27 3.27 E-2 6.9 6.89 6.89 6.89 E-3 1.1 1.13 1.13 1.13 F-l 56 56.01 56.01 56.01 F-2 16 16 16 16 F-3 8 8 8 8 (A-1 )2-节氧基-2-二甲基氨基-1嗎琳-苯基）-1-丁酮[Irgacure 369;Ciba Specialty Chemical 社製] 36 201037459 (A-2)4,4’ ~雙（二乙基氨基）二苯甲酮[EAB-F; 保土谷化學株式會社製]A substrate and a liquid crystal display device capable of fixing a TFT substrate to a backlight module at a position overlapping the color filter. The substrate may be provided with an external frame formed of a light-preventing resin surrounding the peripheral surface of the color filter, and a liquid crystal layer or a liquid crystal layer formed by external nevotic liquid crystals. a plurality of pixel electrodes and transparent electrodes formed by respective fields, a glass substrate, and a polarizing plate formed on an exposed surface of the transparent glass substrate, having a polarizing direction transverse to the vertical direction, such as polyethylene It is composed of organic materials such as alcohol. A plurality of pixel electrodes, each of which is formed in a plurality of thin layers on the glass substrate of the TFT substrate. When a predetermined potential difference is applied to a specific pixel electrode, a predetermined voltage is applied between the J electrode and the transparent electrode. Therefore, the alignment of the field of the specific electrode of the varying liquid crystal layer can be controlled as the electric field formed by the voltage = is different. The invention is further illustrated by the following examples, which are intended to be illustrative only, and are not intended to be Therefore, those skilled in the art will be able to devise various equivalents or modifications of the invention in accordance with the present invention. Within the scope of the patent. 〃 > In the following examples and comparative examples, "% 34 201037459 ratio (%)" and "part" used to indicate the content are based on the amount of direct quantity unless otherwise specified. First, in order to produce a colored photosensitive resin composition for a short-wavelength laser exposure apparatus according to the present invention, an organic functional group-containing compound is prepared in the case of a compound. The following Synthesis Examples 1, 2, and 3 are examples of synthesis of an anthracene compound produced to improve adhesion. <Synthesis Example 1> In a reaction vessel _ equipped with a stirrer, a thermometer, and a pH measuring device, 3-mercaptoacryloxypropyltriethoxydecane oxime (MTM SiGE-Ashiba A-174) 80 was placed. Mb, 20 ml of a mixture of 5 ml of a malonic acid aqueous solution of pH 2.5 in 15 ml of sterol was placed in a dropping funnel, and the reaction vessel was stirred, and 30 minutes of sterol was carried out under normal temperature. Mixing with a solution of malonic acid in a submerged step. After the completion of the dropping, stirring was carried out for 2 hours while maintaining the normal temperature. After stirring for 2 hours, the solvent was removed under reduced pressure. The residual distilled water was dehydrated with anhydrous magnesium sulfate, and anhydrous magnesium sulfate was filtered to obtain a difference. In the above process, the finally obtained ruthenium compound exists in the ruthenium sol state of the colorless viscous liquid which exhibits the most appropriate function in adhesion. <Synthesis Example 2 > In the same vessel as in Synthesis Example 1, except that 3-mercaptoacryloxypropyltriethoxydecane was changed to 3-glycidoxypropyltrimethoxy decane ( The same procedure as in Synthesis Example 1 was carried out except that GPTMS: GE-Toshiba A-187). <Examples 1 - 5 and Comparative Examples 1 - 4 > Each component described in Tables 1 and 2 was mixed and dissolved to prepare a photopolymerization composition of 35 201037459. (Table 1) Example 1 2 3 4 5 Al 0.62 0.66 0.67 0.65 0.66 A-2 0.16 0.17 0.16 0.17 0.17 A-3 2.33 1.66 1.64 1.65 1.66 A-4 Bl 0.1 0.2 0.3 0.25 B-2 0.2 Cl 3.16 3.52 3.47 3.5 3.52 Dl 2.33 2.49 2.46 2.48 2.49 El 3.27 3.27 3.27 3.27 3.27 E-2 6.89 6.89 6.89 6.89 6.89 E-3 1.13 1.13 1.13 1.13 1.13 Fl 56.01 56.01 56.01 56.01 56.01 F-2 16 16 16 16 16 F-3 8 8 8 8 8 (Table 2) Comparative Example 1 1 2 3 4 Al 0.7 0.67 0.67 0.67 A-2 0.2 0.17 0.17 0.17 A-3 1.7 1.67 1.67 A-4 1.67 Bl 0 0.1 B-3 0.1 B-4 0.1 Cl 3.6 3.58 3.58 3.58 Dl 2.5 2.51 2.51 2.51 El 3.3 3.27 3.27 3.27 E-2 6.9 6.89 6.89 6.89 E-3 1.1 1.13 1.13 1.13 Fl 56 56.01 56.01 56.01 F-2 16 16 16 16 F-3 8 8 8 8 (A-1 )2-节oxy-2-dimethylamino-1 morphine-phenyl)-1-butanone [Irgacure 369; manufactured by Ciba Specialty Chemical Co., Ltd.] 36 201037459 (A-2) 4,4' ~bis(diethyl Amino)benzophenone [EAB-F; manufactured by Hodogaya Chemical Co., Ltd.]

(A-3) (E)-K(i_(6_(4_((2,2_ 二曱基 _u 二氧戊蝝 -4-基）甲氧基）_2_甲基苯甲醯）9乙基_9,9a二氮 -4aH-吟嗤-3-基）亞乙基胺氧基）乙酮[N_1919<製造社：株式會社ADEKA>J (A-4)三氣甲基三嗪 (B—1)矽化合物< 合成例1> Ο (B~2)矽化合物 < 合成例2 > (B-3)矽化合物·· 3-甲基丙烯酰氧基丙基三乙氧基矽燒 (B-4)矽化合物：乙烯基三曱氧基矽烷 (C-1)甲基丙烯酸與甲基丙烯酸苄基酯的共聚合體 (甲基丙烯酸單體與甲基丙烯酸苄基酯單體間的比為、莫耳比為25 : 75、酸價為82、聚苯乙烯換算重量平均分子量為28000) ❸ （D-1)聚二季戊四醇六丙烯酸酯 (E-l)C.I.顏料紅 254 (E-2)C.I.顏料紅 177 (E-3)C.I.顏料黃 150 (F-1)丙二醇单曱醚乙酸酯 (F-2)3_乙氧基丙酸乙酉旨 (F-3)甲氧基丙醇 <實驗例> 37 201037459 將前述實施例1〜5與比較例丨〜4的彩色濾光片用著色感光性樹脂組成物旋轉塗佈法塗佈至玻璃基板上後，載置至加熱板上，於l〇(TC的溫度下維持3分鐘以形成薄膜。接著’將前述薄膜與可令透過率在1〜丨〇〇百分比（％)的範圍進行變化的光罩間之間隔設為1〇〇 μιη，以曝光量30 mJ/cm2進行照射，載置具有自i μιη 起到100 μιη為止的線/空間圖型的試驗光罩，與試驗光罩間之間隔設為200 μπι，以曝光量30 mJ/cm2進行照射。以使用前述實施例1〜5與比較例1〜4的彩色濾光片用著色感光性樹脂組成物所製造的彩色濾光片為對1 f 象，就感度、亮度減少、膠膜及圖型直進性進行評價，其結果記在於下數表3中。、 <感度> 設定為為了得到即使顯像仍可形成無表面粗糙度的圖型’所需要的最低必要曝光量。〇·· 15 m J以下且無表面粗縫度 △.超過15 mJ、30 mJ以下 C )(A-3) (E)-K(i_(6_(4_((2,2_didecyl_udioxoindol-4-yl)methoxy)-2-methylbenzhydrazide) 9 ethyl _9,9adiaza-4aH-indol-3-yl)ethylideneoxy)ethanone [N_1919<manufacturing company: ADEKA> J (A-4) tri-gas methyltriazine (B- 1) hydrazine compound <Synthesis Example 1> Ο (B~2) 矽 compound < Synthesis Example 2 > (B-3) 矽 compound·· 3-methacryloxypropyltriethoxy oxime (B-4) anthracene compound: a copolymer of vinyltrimethoxy decane (C-1) methacrylic acid and benzyl methacrylate (between a methacrylic acid monomer and a benzyl methacrylate monomer) The ratio is 25:75, the acid value is 82, and the weight average molecular weight is 28,000 in terms of polystyrene. ❸ (D-1) polydipentaerythritol hexaacrylate (El) CI Pigment Red 254 (E-2) CI Pigment Red 177 (E-3) CI Pigment Yellow 150 (F-1) Propylene Glycol Monoterpene Ether Acetate (F-2) 3_Ethoxypropionate Ethyl (F-3) Methoxypropanol < Experimental Example> 37 201037459 The color filters of the above Examples 1 to 5 and Comparative Examples 丨 to 4 were coated by a spin coating method using a colored photosensitive resin composition. After being placed on a glass substrate, it is placed on a hot plate and maintained at a temperature of TC for 3 minutes to form a film. Then, the film is made to have a transmittance of 1 to 丨〇〇% (%). The interval between the masks whose range was changed was set to 1 μm, and the exposure was performed at an exposure amount of 30 mJ/cm 2 , and a test mask having a line/space pattern from i μm to 100 μm was placed and tested. The interval between the masks was set to 200 μm, and the exposure amount was 30 mJ/cm 2 . The colores produced by using the coloring photosensitive resin composition for the color filters of the above-described Examples 1 to 5 and Comparative Examples 1 to 4 were used. The filter is a 1 f image, and the sensitivity, brightness reduction, film and pattern straightness are evaluated. The results are shown in Table 3. The <sensitivity> is set to obtain even the image. The minimum necessary exposure required to form a pattern without surface roughness. 〇·· 15 m J or less and no surface roughness △. More than 15 mJ, 30 mJ or less C)

X :超過30 mJ <膠膜形狀> 使用SEM ( 10000倍率）觀察像素表面的形狀〇：圖型輪廓（Pattern profile)及直進性良好 △:圖型輪廓（Pattern profile)良好 X:圖型輪廓（Pattern profile)不良 <密著性> 38 201037459 使用顯微鏡（500倍率）觀察像素表面的形狀。〇：圖型邊緣（Pattern edge)部的圖型剝離良好 △.圖型邊緣(Pattern edge)部的圖型剝離普通 x.圖型邊緣（Pattern edge)部的圖型剝離不良 <殘潰> 像素的透過率測定及使用顯微鏡（5〇〇倍率）表面形狀。〃〇〇：殘渣、透過率良好 △:殘渣良好、透過率不良 X :殘潰、透過率不良X: more than 30 mJ <film shape> The shape of the pixel surface was observed using SEM (10000 magnification) 〇: Pattern profile and straightness were good △: Pattern profile was good X: Pattern Poor of the profile profile <Adhesiveness> 38 201037459 The shape of the pixel surface was observed using a microscope (500 magnification). 〇: The pattern of the pattern edge is peeled off Δ. The pattern of the pattern edge is peeled off. The pattern of the pattern edge is poor. <; Pixel transmittance measurement and use of a microscope (5 〇〇 magnification) surface shape. 〃〇〇: Residue and good transmission rate △: Good residue and poor transmittance X: Residual, poor transmittance

光源短波長雷射曝光裝置（308nm) (曝光量：30m J / cm2) 短波長雷射曝光裝置（355nm) (曝光董·· 30m J / c m2) 評奶 ί項目感度（m j / c m2) 膠膜形狀密著性殘渣感度（m j / c m2) 膠膜形狀密著性殘法贫施例 1 2 6(〇) Ο ο X 3 (〇) ο ο X 8 (。） ο 〇 0 4 (〇) ο 0 ο 3 9(〇) 0 〇 Δ 6(〇) 〇 ο △ 4 ι〇(〇) 〇〇 0 4(〇) ο ο ο 5 Π (ο) 0 ο ο 6(〇) ο ο 0 比較例 1 18 (Δ) Δ Δ 0 16 (〇) Λ Λ ο 2 34(Χ) X X ο 30 (X) X Δ ^ 0 3 32 (X) X X 0 >40 (X) X X ο — 4 >40 (X) X X X >40 (X) X X X 對使用前述實施例1〜5與比較例1〜4的彩色濾光片用著色感光性樹脂組成物所製造的彩色濾光片進行評價’其結果為，以一般式1所示的躬' S旨糸聚合引發劑（Α-3) 39 201037459 與以一般式2所示的矽化合物作為必與不使用-般式1所示的㈣系聚的組成物’ 必要成分的組成物、或即便使用—Hf劑(A·3)作為聚合引發劑（A-3)作為必要成分但不^ 旨系示的石夕化合物的組成物相較，雖僅進 2所在感度、膠膜、圖型密著性及殘渣算置的曝光，仍異的評價。 —寺°平仏項目中得到優上所述僅為舉例性，而/ 離本發明之精神與範疇，而對其 2 任何未脫更，均應包含於後附之申請專利範圍^之等欵修改或變【圖式簡單說明】【主要元件符號說明】Light source short-wavelength laser exposure device (308nm) (exposure: 30m J / cm2) Short-wavelength laser exposure device (355nm) (exposure Dong··30m J / c m2) Evaluation of milk ί project sensitivity (mj / c m2) Film shape Adhesive residue sensitivity (mj / c m2) Film shape Adhesive residue method 1 2 6(〇) ο ο X 3 (〇) ο ο X 8 (.) ο 〇0 4 ( 〇) ο 0 ο 3 9(〇) 0 〇Δ 6(〇) 〇ο △ 4 ι〇(〇) 〇〇0 4(〇) ο ο ο 5 Π (ο) 0 ο ο 6(〇) ο ο 0 Comparative Example 1 18 (Δ) Δ Δ 0 16 (〇) Λ Λ ο 2 34(Χ) XX ο 30 (X) X Δ ^ 0 3 32 (X) XX 0 > 40 (X) XX ο — 4 >40 (X) XXX > 40 (X) XXX The color filter produced by using the colored photosensitive resin composition for color filters of the above-mentioned Examples 1 to 5 and Comparative Examples 1 to 4 was evaluated' As a result, the 糸' S 糸 polymerization initiator (Α-3) 39 201037459 represented by the general formula 1 and the ruthenium compound represented by the general formula 2 are used as the (four) system shown in the general formula 1. The composition of the poly' composition, or the composition of the essential component, or even the use of the Hf agent (A·3) The polymerization initiator (A-3) is an essential component, but the composition of the Shishi compound is not the same as that of the composition, and the exposure is only calculated by the sensitivity, the film, the pattern adhesion, and the residue. Different evaluation. The superiority of the Temple ° Pingyi project is only exemplified, and / from the spirit and scope of the present invention, and any of its 2 is not included in the scope of the attached patent application. Modify or change [Simple description of the diagram] [Main component symbol description]

Claims

201037459 七、申請專利範圍： 1· 一種短波長雷射曝光裝置用著色感光性樹脂組物，係包含：般式1表示之辟酉旨一光聚合引發劑（A)，含有以一系聚合引發劑；一矽化合物（B)，係以一般式2表示；一結合劑樹脂（C);201037459 VII. Patent application scope: 1. A coloring photosensitive resin group for a short-wavelength laser exposure apparatus, comprising: a photopolymerization initiator (A) represented by the general formula 1, which is caused by polymerization of a series a compound (B), represented by the general formula 2; a binder resin (C);

一光聚合性化合物; 一著色材料（E);以及一溶劑（F)， (一般式1)a photopolymerizable compound; a coloring material (E); and a solvent (F), (General Formula 1)

RsRs

(該一般式1中，R〗、R2、R3表示各自獨立之氫原子、R、OR、COR、SR、CONRR，或 CN，R 及R’係為碳數1〜8之烷基、碳數6〜12之芳基、碳數7〜13之芳烷基或碳數5〜7之複素環基’該等係以卣素原子或複素環基取代或無取代，其中，炫基及芳烷基之亞烷部分係採不飽和結合、醚結合、硫醚結合或酯結合而鍵結，該R及該R’係可相互形成環狀結構；R4、R5、R6、R7表示各自獨立 41 201037459 2原乂子、齒素原子或碳數卜8 碳數0〜1〇之焓其.ν ν + _ 8 η 4 I[庳j -V、汰ns •土， 1 Y2、Y3表示各自獨立之烷s瓜原子，X係為鹵素原子或碳數丨〜^之 (一般式2)(In the general formula 1, R, R2, and R3 represent independent hydrogen atoms, R, OR, COR, SR, CONRR, or CN, and R and R' are alkyl groups having 1 to 8 carbon atoms, and carbon number. An aryl group of 6 to 12, an aralkyl group having 7 to 13 carbon atoms or a reciprocating ring group having 5 to 7 carbon atoms, which are substituted or unsubstituted with a halogen atom or a complex ring group, wherein a leuco group and an aralkyl group The alkylene moiety is bonded by an unsaturated bond, an ether bond, a thioether bond or an ester bond, and the R and the R' system may form a cyclic structure with each other; R4, R5, R6 and R7 represent respective independents 41 201037459 2 original scorpion, dentate atom or carbon number b 8 carbon number 0~1〇焓 . ν ν + _ 8 η 4 I[庳j -V, ns ns • soil, 1 Y2, Y3 means independent Alkane s melon atom, X is a halogen atom or carbon number 丨~^ (general formula 2)

OH 嫌酼並〇Χ丁，1" 1乐局目水甘油基、（甲基）f 酿糾土、氰基丙基、氫硫基丙基、氰基丙基及異I 处=丙基所組成之一群組t所選擇之任一有機$ =土1或者是含有自該群組所選擇之任一有機官倉 & 數1〜20之脂肪族或芳香族碳氫化合物，· ，為氫原子、甲基、乙基或羥基；η係〜之整數）。 =專利範圍第1項所述之短波長雷射曝光裝用著色感光性樹脂組成物，其中，相對短波長雷、曝光裝置用著色感光性樹脂組成物中的光聚合發劑，該一般式1的光聚合引發劑係含有質量率50質量百分比（％)以上。申=專利範圍第1項所述之短波長雷射曝光裝用著色感光性樹脂組成物，其中，相對短波長雷射曝光裝置用著色感光性樹脂組成物中的光聚合 =發劑，該一般式1的光聚合引發劑係含有質量分率介於60〜70質量百分比（％)。、 4.如申請專利範圍第1項所述之短波長雷射曝光裝 42 201037459 置用著色感光性樹脂組成物，其中，相對短波長雷射曝光裝置用著色感光性樹脂組成物中的固體成分’該光聚合引發劑（A)係含有質量分率介於3〜2〇質量百分比。 5·如申請專利範圍第丨項所述之短波長雷射曝光裝置用考色感光性樹脂組成物，其中，該碎化合物（B) 係選自甲基丙烯酰氧基甲基三乙氧基矽烷、甲基丙烯基甲基三甲氧基矽烷、3-甲基丙烯酰氧基丙基二氯矽烷、3—甲基丙烯酰氧基丙基三甲氧基矽 Ό 燒、3_甲基丙烯酰氧基丙基三乙氧基矽烷、3-丙稀酰氧基丙基三甲氧基矽烷、3_丙烯酰氧基丙基三氣矽烷所形成之群組中之至少一化合物，經溶膠_凝膠製程而取得。 6. 如申請專利範圍第1項所述之短波長雷射曝光裝置用著色感光性樹脂組成物，其中，相對短波長雷 2曝光裝置用著色感光性樹脂組成物中的固體成分’該石夕化合物(Β)係含有質量分率介於〇」〜]〇 Q 質量百分比（％)。 7. 如申，專利範圍第1項所述之短波長雷射曝光裝置用著色感光性樹脂組成物，其中，該短波長雷射曝光裝·置之曝光波長係為介於3〇〇 nm〜400 nm之短波長。如申明專利範圍第1項所述之短波長雷射曝光裝置，著色感光性樹脂組成物，其中，該短波長雷射曝光裝置之曝光波長係為308 nrn或355 nm。 9 彩色滤光片’係包含一彩色層’該彩色層係由如申請專利範圍第1項至第8項中之任一項所述之 43 201037459 短波長雷射曝光裝置用著色感光性樹脂組成物形成一預定圖型後，進行曝光及顯像後所形成。 10. —種液晶顯示裝置，係包含如申請專利範圍第9項所述之彩色濾光片。 44OH 酼酼〇Χ 〇Χ 1 1 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Any organic $=soil 1 selected from a group t or an aliphatic or aromatic hydrocarbon containing 1 to 20 of any organic official tank selected from the group, A hydrogen atom, a methyl group, an ethyl group or a hydroxyl group; an integer of η system ~). The coloring photosensitive resin composition for short-wavelength laser exposure according to the first aspect of the invention, wherein the photopolymerization agent in the composition of the photosensitive resin composition for short-wavelength lightning and exposure apparatus is used in the general formula 1 The photopolymerization initiator contains a mass ratio of 50% by mass or more. The coloring photosensitive resin composition for short-wavelength laser exposure according to the first aspect of the invention, wherein the photopolymerization of the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus is a general agent. The photopolymerization initiator of Formula 1 contains a mass fraction of from 60 to 70% by mass (%). 4. The short-wavelength laser exposure apparatus 42 according to claim 1, wherein the coloring photosensitive resin composition is used, and the solid content in the coloring photosensitive resin composition for a short-wavelength laser exposure apparatus is used. The photopolymerization initiator (A) contains a mass fraction of 3 to 2 Å by mass. 5. The color-sensitive photosensitive resin composition for a short-wavelength laser exposure apparatus according to the above-mentioned claim, wherein the pulverized compound (B) is selected from the group consisting of methacryloxymethyltriethoxy. Decane, methacryloylmethyltrimethoxydecane, 3-methacryloxypropyldichlorodecane, 3-methacryloxypropyltrimethoxysulfonium, 3-methacryloyl At least one compound of the group formed by oxypropyltriethoxydecane, 3-propoxypropyltrimethoxydecane, 3-acryloxypropyltrioxane, by sol-condensation Made by the glue process. 6. The colored photosensitive resin composition for a short-wavelength laser exposure apparatus according to the first aspect of the invention, wherein the solid component in the coloring photosensitive resin composition for a short-wavelength Ray 2 exposure apparatus The compound (Β) contains a mass fraction of 〇"~]〇Q mass percentage (%). 7. The coloring photosensitive resin composition for short-wavelength laser exposure apparatus according to claim 1, wherein the short-wavelength laser exposure apparatus has an exposure wavelength of 3 〇〇 nm~ Short wavelength of 400 nm. The short-wavelength laser exposure apparatus according to claim 1, wherein the short-wavelength laser exposure apparatus has an exposure wavelength of 308 nrn or 355 nm. 9 彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色彩色After the object forms a predetermined pattern, it is formed after exposure and development. A liquid crystal display device comprising the color filter according to claim 9 of the patent application. 44