CN101840155A - Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator - Google Patents

Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator Download PDF

Info

Publication number
CN101840155A
CN101840155A CN201010132318A CN201010132318A CN101840155A CN 101840155 A CN101840155 A CN 101840155A CN 201010132318 A CN201010132318 A CN 201010132318A CN 201010132318 A CN201010132318 A CN 201010132318A CN 101840155 A CN101840155 A CN 101840155A
Authority
CN
China
Prior art keywords
short wavelength
exposure apparatus
wavelength laser
photosensitive composition
laser exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201010132318A
Other languages
Chinese (zh)
Inventor
金一镐
姜台洙
黄世旭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of CN101840155A publication Critical patent/CN101840155A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

The present invention relates to a kind of short wavelength laser exposure apparatus photosensitive composition, it is characterized in that, comprise: the light trigger (A), silicon compound (B), adhesive resin (C), light polyacetylene compound (D), coloured material (E) and the solvent (F) that contain oxime ester class polymerization initiator, be provided at the short wavelength laser exposure apparatus photosensitive composition that presents ISO and high cohesive force characteristic in the short wavelength laser exposure apparatus, adopt its color filter and liquid crystal indicator.

Description

Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator
Technical field
The present invention relates to a kind of short wavelength laser exposure apparatus with photosensitive composition, the color filter that adopts it and liquid crystal indicator.This short wavelength laser exposure apparatus when being used for using short wavelength laser as the exposure device of the light source that forms the color filter pixel, can present ISO and high caking ability with photosensitive composition.
Background technology
Color filter has been widely used in imageing sensor, the liquid crystal indicator (LCD) etc., and its range of application increases day by day.Employed color filter such as color liquid crystal display arrangement and imageing sensor normally is prepared as follows: by spin coating, narrow slit coating, evenly coating contains after the photosensitive composition that is equivalent to redness, green and blue pigment respectively on the substrate that is formed with black matrix figure, heat drying (below, be also referred to as precalcining) form and film, this is filmed expose and develop, as required to each color repeat further heat hardening (below, be also referred to as the back calcining) operation, form each color pixel, thereby obtain.
As above-mentioned photosensitive composition, the composition that contains pigment, adhesive resin, light polyacetylene compound and light trigger commonly used also uses the photosensitive composition that contains black pigment when matrix is deceived in formation.
On the other hand, shorten activity time and reduce the major subjects that manufacturing cost has become nearest color filter manufacturing technology, and as the existing method (Korea S publication communique 2007-0021971) of photosensitive composition being exposed with the short wavelength laser light source of its solution.
Compare with the light source of existing high-pressure mercury etc., the exposure method luminous intensity of the long LASER Light Source of radiothermy is very high, and therefore comparing its advantage with existing high-pressure mercury etc. is significantly to be shortened the time shutter.On the other hand, because the time shutter is very short, so light energy source can't arrive the lower layer part of exposure property resin coating film, films and all can not carry out sufficient sclerous reaction, pixel graphics comes off easily/peels off in the videograph process.This type of unhardened pixel graphics also comes off in subsequent handling/peel off easily, thus in environment such as vacuum and heating discharge impurities, the afterimage of color filter etc. is brought influence, become the reason that fraction defective increases.
In addition, in the device that under the state of having fixed light source, exposes in the mobile lower basal plate, on characteristic, because the light sensitivity of existing photosensitive composition is low, can't realize uniform exposure to the surface element of pixel graphics, it is inhomogeneous to produce small video picture after the video picture, reduces the excitation of color filter.
Summary of the invention
Invent problem to be solved
The object of the present invention is to provide a kind of short wavelength laser exposure apparatus photosensitive composition, it has ISO and the exposure by the short wavelength laser light source to be high-adhesion in short wavelength laser exposure apparatus.
Another object of the present invention is to provide a kind of high reliability and high-quality color filter, it has adopted above-mentioned short wavelength laser exposure apparatus photosensitive composition.
Another object of the present invention also is to provide a kind of liquid crystal indicator, and it comprises above-mentioned color filter.
Solve the means of problem
In order to reach above-mentioned purpose, the invention provides a kind of short wavelength laser exposure apparatus photosensitive composition, it comprises: contain the light trigger (A) of the oxime ester class polymerization initiator of formula (1) expression, silicon compound (B), adhesive resin (C), light polyacetylene compound (D), coloured material (E) and the solvent (F) of formula (2) expression;
[formula 1]
Figure GSA00000043587100031
In the following formula, R1, R2, R3 represent hydrogen atom, R, OR, COR, SR, CONRR ' or CN independently of one another, the alkyl of R and R ' expression carbon number 1～8, the aryl of carbon number 6～12, the aralkyl of carbon number 7～13 or the heterocyclic radical of carbon number 5～7, these can be halogen atom or heterocyclic radical replacement or non-substituting group, wherein, the alkene part of alkyl and aralkyl can connect by unsaturated chain, ether chain, thioether chain, ester chain, and above-mentioned R and R ' can constitute ring jointly; R4, R5, R6, R7 represent the alkyl of hydrogen atom, halogen atom or carbon number 1～8 independently of one another; R8 represents the alkyl of carbon number 0～10; Y1, Y2, Y3 represent oxygen atom or sulphur atom independently of one another; X represents the alkyl of halogen atom or carbon number 1～8.
[formula 2]
Figure GSA00000043587100032
In the following formula, arbitrary organo-functional group of selecting in the group that R1 represents to be made up of glycidyl, (methyl) acryloyl group, aminopropyl, sulfydryl propyl group, cyanogen propyl group and isocyanic acid propyl group perhaps contains the aliphatics or the aromatic hydrocarbon of the carbon number 1～20 of any organo-functional group of selecting in above-mentioned group; R2 represents hydrogen atom, methyl, ethyl or hydroxyl; N represents 1～13 integer.
In addition, the invention provides a kind of color filter, it contains above-mentioned short wavelength laser exposure apparatus is formed with photosensitive composition after the figure of regulation, exposes and video picture and the color layers that forms.
In addition, the invention provides a kind of liquid crystal indicator, it contains above-mentioned color filter.
The effect of invention
Short wavelength laser exposure apparatus photosensitive composition of the present invention, owing to contain particular initiator and silicon compound, also can present good light sensitivity (sensitivity) and resolution (resolution) even expose with very in a small amount short wavelength laser light source, and short wavelength laser exposure apparatus is outstanding with the cohesive force between photosensitive composition and the base material, figure not taking place in videograph process peel off, has high reliability.
Thus, when short wavelength laser exposure apparatus of the present invention is applied to the manufacturing of color filter with photosensitive composition, can shorten activity time and can improve the operation characteristic, it is bad etc. not produce pixel portions surface, therefore can make high reliability and high-quality color filter.
Therefore, short wavelength laser exposure apparatus photosensitive composition of the present invention is highly suitable for the manufacturing of the various high-quality color filters such as liquid crystal display device color filter in the electronics industry.
Embodiment
Below, describe the present invention in detail.But it only is used for explanation, can not be construed to the method for the restriction scope of the invention.
Embodiment
The invention provides a kind of short wavelength laser exposure apparatus photosensitive composition, it comprises, light trigger (A), silicon compound (B), adhesive resin (C), light polyacetylene compound (D), coloured material (E) and solvent (F).
Light trigger (A)
Short wavelength laser exposure apparatus photosensitive composition of the present invention contains the oxime ester lightlike initiating agent of following formula (1) as light trigger (A).
[formula 1]
Figure GSA00000043587100051
In the following formula, R1, R2, R3 represent hydrogen atom, R, OR, COR, SR, CONRR ' or CN independently of one another, the alkyl of R and R ' expression carbon number 1～8, the aryl of carbon number 6～12, the aralkyl of carbon number 7～13 or the heterocyclic radical of carbon number 5～7, these can be halogen atom or heterocyclic radical replacement or non-substituting group, wherein, the alkene part of alkyl and aralkyl can connect by unsaturated chain, ether chain, thioether chain, ester chain, and above-mentioned R and R ' can constitute ring jointly; R4, R5, R6, R7 represent the alkyl of hydrogen atom, halogen atom or carbon number 1～8 independently of one another; R8 represents the alkyl of carbon number 0～10; Y1, Y2, Y3 represent oxygen atom or sulphur atom independently of one another; X represents the alkyl of halogen atom or carbon number 1～8.
Preferably, in the following formula (1), alkyl as R and R ' expression for example has methyl, ethyl, propyl group, isopropyl, butyl, isobutyl, sec-butyl, the tert-butyl group, amyl group, isopentyl, tertiary pentyl, hexyl, heptyl, octyl group, iso-octyl, the 2-ethylhexyl, uncle's octyl group, nonyl, different nonyl, decyl, isodecyl, vinyl, aryl, butenyl group, ethinyl, propinyl, methoxy ethyl, ethoxyethyl group, the propoxyl group ethyl, methoxyethoxyethyl, the ethoxy ethoxy ethyl, the propoxyl group ethoxyethyl group, methoxy-propyl, single fluoro methyl, two fluoro methyl, three fluoro methyl, three fluoro ethyls, the perfluoro ethyl, 2-(benzoxazoles-2 '-yl) ethinyl etc., wherein, the alkyl of carbon number 1～8 preferably.Aryl as R and R ' expression for example has phenyl, tolyl, xylyl, ethylphenyl, chlorophenyl, naphthyl, anthryl (anthryl), phenanthryl (phenan threnyl) etc., wherein, is preferably the aryl of carbon number 6～12.In addition, the alkyl as R and R ' expression for example preferably uses benzyl, chloro benzyl, α-Jia Jibianji, α, the aralkyl of the carbon number 7～13 of α-Er Jiajibianji, phenylethyl, phenylacetylene base etc.As the heterocyclic radical of R and R ' expression, for example preferably use the heterocyclic radical of the carbon number 5～7 of pyridine radicals, pyrimidine radicals, furyl (furyl), thienyl etc.In addition, for example preferably have piperidine ring, the ring of carbon numbers 5～7 such as morpholine ring as R and the common ring that constitutes of R '.In addition, R and R ' can also be by fluorine, chlorine, bromine, the substituting group that halogen element replaced of iodine etc., or pyridyl, pyrimidine radicals, furyl, benzoxazoles-2-base, THP trtrahydropyranyl, nafoxidine base (pyrrolidyl), imidazole radicals, pyrazolidinyl (pyrazolidyl), tetrahydro-thiazoles base (thiazolidyl), different tetrahydro-thiazoles base (isothiazolidyl), oxazolidinyl (oxazolidyl), isoxazole alkyl (iso oxazolidyl), piperidyl (piperidyl), the piperadyl base, the substituting group that heterocyclic radical replaced of carbon numbers such as morpholinyl 5～7.
The halogen atom of representing as X can use fluorine, chlorine, bromine and iodine.In addition, the alkyl of representing as X can use halogen atom to replace or methyl, ethyl, propyl group, isopropyl, butyl, isobutyl, sec-butyl, the tert-butyl group, amyl group, isopentyl, tertiary pentyl, hexyl, heptyl, octyl group, iso-octyl, 2-ethylhexyl, uncle's octyl group of non-replacement.In following formula (1), the halogen atom of representing as R4, R5, R6, R7 can use fluorine, chlorine, bromine, iodine.In following formula (1), the alkyl of representing as R4, R5, R6, R7 can use halogen atom to replace or methyl, ethyl, propyl group, isopropyl, butyl, isobutyl, sec-butyl, the tert-butyl group, amyl group, isopentyl, tertiary pentyl, hexyl, heptyl, octyl group, iso-octyl, 2-ethylhexyl, uncle's octyl group of non-replacement.
Can exemplify the compound of following formula (3)～(15) as the represented preferred object lesson of oxime ester compound of the present invention of following formula (1).But the present invention is not limited to following compound.
[formula 3]
Figure GSA00000043587100061
[formula 4]
Figure GSA00000043587100071
[formula 5]
Figure GSA00000043587100072
[formula 6]
Figure GSA00000043587100073
[formula 7]
[formula 8]
[formula 9]
[formula 10]
Figure GSA00000043587100082
[formula 11]
Figure GSA00000043587100083
[formula 12]
Figure GSA00000043587100084
[formula 13]
Figure GSA00000043587100085
[formula 14]
Figure GSA00000043587100091
[formula 15]
Figure GSA00000043587100092
Commercially available product with structure shown in the following formula (1) has N-1919 (Asahi Denka Co., Ltd.) etc.
Short wavelength laser exposure apparatus of the present invention can also contain other light trigger with the light trigger (A) that photosensitive composition added except the light trigger of following formula (1).With respect to the light trigger in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of the light trigger of following formula (1) is preferably more than the 50 quality %, more preferably 60～70 quality %.
When containing the light trigger of formula (1) with above-mentioned scope, also can present good light sensitivity and reliability during low exposure, it is bad etc. that the pixel portions surface does not take place, and the flatness on surface is also high, can guarantee not have the good tapering and the direct projection of figure loss.
For example can use from acetophenone compounds the compound of more than one that select in the group that bisglyoxaline compounds and oxime compound are formed as the light trigger except that the oxime ester lightlike initiating agent of following formula (1) expression.
As above-mentioned acetophenone compounds 2-methyl isophthalic acid-(4-methylthiophene)-2-morpholine propane-1-ketone is for example arranged, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone, benzyl dimethyl ketal, 2-hydroxyl-1-[4-(2-hydroxyl-oxethyl) phenyl]-2-methylpropane-1-ketone, 1-hydroxy-cyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone, 2-hydroxy-2-methyl-1-[4-(1-methyl ethylene) phenyl] oligomer etc. of propane-1-ketone.
In addition, except above-mentioned compound, can also use the compound of following formula (16) expression as described acetophenone compounds.
[formula 16]
Figure GSA00000043587100101
In the following formula (16), R1～R4 independently represents hydrogen atom, halogen atom, hydroxyl separately, replaced by the alkyl of carbon number 1～12 or the phenyl of non-replacement, replaced by the alkyl of carbon number 1～12 or the benzyl of non-replacement, or replaced by the alkyl of carbon number 1～12 or the naphthyl of non-replacement.
2-methyl-2-amino (4-morpholinyl phenyl) ethane-1-ketone is specifically arranged as the compound shown in the following formula (16), 2-ethyl-2-amino (4-morpholinyl phenyl) ethane-1-ketone, 2-propyl group-2-amino (4-morpholinyl phenyl) ethane-1-ketone, 2-butyl-2-amino (4-morpholinyl phenyl) ethane-1-ketone, 2-methyl-2-amino (4-morpholinyl phenyl) propane-1-ketone, 2-methyl-2-amino (4-morpholinyl phenyl) butane-1-ketone, 2-ethyl-2-amino (4-morpholinyl phenyl) propane-1-ketone, 2-ethyl-2-amino (4-morpholinyl phenyl) butane-1-ketone, 2-methyl-2-methylamino (4-morpholinyl phenyl) propane-1-ketone, 2-methyl-2-dimethylamino (4-morpholinyl phenyl) propane-1-ketone, 2-methyl-2-diethylamino (4-morpholinyl phenyl) propane-1-ketone etc.
As above-mentioned bisglyoxaline compounds, concrete have 2,2 '-two (2-chlorophenyls)-4,4 ', 5,5 '-tetraphenyl bisglyoxaline, 2,2 '-two (2,3-dichloro-phenyl)-4,4 ', 5,5 '-tetraphenyl bisglyoxaline, 2,2 '-two (2-chlorophenyls)-4,4 ', 5,5 '-four (alkoxyl phenyl) bisglyoxaline, 2,2 '-two (2-chlorophenyls)-4,4 ', 5,5 '-four (tri-alkoxy phenyl) bisglyoxaline, also comprise 4,4 in the above-mentioned united imidazole ', the imidazolium compounds that the phenyl of 5,5 ' position is replaced by alkoxy carbonyl group etc.Wherein, preferably use 2,2 '-two (2-chlorophenyls)-4,4 ', 5,5 '-tetraphenyl bisglyoxaline, 2,2 '-two (2,3-dichloro-phenyl)-4,4 ', 5,5 '-the tetraphenyl bisglyoxaline.
O-ethoxy carbonyl-α-oxyimino group-1-phenyl-propane-1-the ketone of following formula (17) etc. is for example arranged as above-mentioned oxime compound.
[formula 17]
Figure GSA00000043587100111
And, in the scope that does not influence effect of the present invention, can also append and with other commonly used light triggers of this area etc.For example can use styrax compounds, Benzophenone compounds, thioxanthones compounds, anthracene compounds etc. as other light triggers.They can be used singly or two or more kinds in combination separately.
As above-mentioned styrax compounds styrax, styrax methyl ether, styrax ethylether, benzoin isobutyl propyl group ether, benzoin isobutyl butyl ether etc. are for example arranged.
As above-mentioned Benzophenone compounds for example have Benzophenone, methyl o-benzoylbenzoate, 4-phenyl Benzophenone, 4-benzoyl-4 '-dimethyl diphenyl sulfide, 3,3 ', 4; 4 '-four (tert-butyl hydroperoxide carbonyl) Benzophenone; 2,4,6-trimethylbenzene ketone etc.
2-isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-dichloro-thioxanthones, 1-chloro-4-propoxyl group thioxanthones etc. are for example arranged as above-mentioned thioxanthones compounds.
For example have as above-mentioned anthracene compounds, 9,10-dimethoxy anthracene, 2-ethyl-9,10-dimethoxy anthracene, 9,10-diethoxy anthracene, 2-ethyl-9,10-diethoxy anthracene etc.
Can use 2,4 as other light triggers, 6-trimethylbenzoyl diphenyl phosphine oxide, 10-butyl-2-chloro acridone, 2-EAQ, benzyl, 9,10-phenanthrenequione, camphorquinone, phenyl glyoxalic acid methylester, two cyclopentadiene titanium compounds etc.
In addition, also can use the light trigger that contains the group that can cause chain transfer, as this light trigger for example Japanese patent publication 2002-544205 communique put down in writing.
With respect to the solid state component in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of above-mentioned light trigger (A) is preferably, 3～20 quality %, preferred 5～10 quality %.When containing light trigger (A),, boost productivity, and can keep high resolving power, so preferred because ISOization can shorten the time shutter with above-mentioned content range.
According to the present invention, preferably with light trigger (A) and with light-initiated auxiliary agent (A-1).And if with light-initiated auxiliary agent (A-1), the short wavelength laser exposure apparatus that then contains it becomes higher with the light sensitivity of photosensitive composition, so the throughput rate in the time of improving use said composition formation color filter is preferably.
With respect to the solid state component in the short wavelength laser exposure apparatus usefulness photosensitive composition, the use amount of above-mentioned light-initiated auxiliary agent (A-1) is generally 0.1～50 quality %, preferred 1～40 quality %.If the use amount of light-initiated auxiliary agent (A-1) is in above-mentioned scope, then short wavelength laser exposure apparatus will become higher with the light sensitivity of photosensitive composition, can improve the throughput rate when using said composition to form color filter, so preferred.
Can preferably use amines, carboxylic acid compound as light-initiated auxiliary agent (A-1).
Object lesson as above-mentioned amines has, the fatty amine compound of triethanolamine, methyldiethanolamine, triisopropanolamine etc., 4-dimethylaminobenzoic acid methyl esters, 4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid isopentyl ester, 4-dimethylaminobenzoic acid 2-ethylhexyl ester, benzoic acid 2-dimethylamino ethyl ester, N, N-dimethyl-p-toluidine, 4,4 '-two (dimethylamino) benzophenone (also claim: Michler's keton), 4,4 '-aromatic amines compound of two (diethylamino) benzophenone etc.Preferably use aromatic amines compound as amines.
Specifically have as above-mentioned carboxylic acid compound, thiophenyl acetate, phenyl thio acetate, phenyl ethyl thioacetate, phenyl thioacetic acid methyl ethyl ester, phenyl thioacetic acid dimethyl ester, phenyl thioacetic acid methoxyethoxy ester, phenyl thioacetic acid dimethoxanate, chlorobenzene ethyl thioglycollic acid, dichlorobenzene ethyl thioglycollic acid, the N-phenylglycine, phenoxyacetic acid, naphthyl thioacetic acid, the aromatic series heteroatoms acetate class of N-naphthyl aminoacetic acid, naphthoxy acetic acid etc.
＜silicon compound (B) 〉
Short wavelength laser exposure apparatus of the present invention contains silicon compound (B) with photosensitive composition.
Above-mentioned silicon compound (B) has the structure of following formula (2) expression, is preferably through the sol-gel operation and three-dimensional hybrid architecture such as type or notch cuttype in the shape of a spiral.
[formula 2]
Figure GSA00000043587100131
In the following formula; arbitrary organo-functional group of selecting in the group that R1 represents to be made up of glycidyl, (methyl) acryloyl group, aminopropyl, sulfydryl propyl group, cyanogen propyl group and isocyanic acid propyl group; the aliphatics or the aromatic hydrocarbon that perhaps contain the carbon number 1～20 of any organo-functional group of from above-mentioned group, selecting; R2 represents hydrogen atom, methyl, ethyl or hydroxyl, and n represents 1～13 integer.
In following formula (2), R1 is (methyl) acryloyl group more preferably, but is not limited thereto.
As the represented silicon compound (B) of following formula (2), can use by the ethene trimethoxy silane, vinyl triethoxysilane, ethene three (2-methoxy ethoxy) silane, N-(2-amino-ethyl) 3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl) 3-TSL 8330, the 3-aminopropyltriethoxywerene werene, the 3-glycidyl ether oxygen propyl trimethoxy silicane, 3-glycidyl ether oxygen propyl methyl dimethoxysilane, 2-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane, 3-chloro propyl group methyl dimethoxysilane, the 3-chloropropyltrimethoxy silane, 3-sulfydryl propyl trimethoxy silicane, the methacryloxy methyl triethoxysilane, the methacryloxy methyltrimethoxy silane, 3-methacryloxypropyl three chloro silane, the 3-methacryloxypropyl trimethoxy silane, 3-methacryloxypropyl triethoxysilane, select a kind of in 3-acryloxy propyl trimethoxy silicane or the 3-acryloxy propyl group three chloro silane or make up two or more compounds, the material of making through the sol-gel operation, wherein, preferably by the methacryloxy methyl triethoxysilane, the methacryloxy methyltrimethoxy silane, 3-methacryloxypropyl three chloro silane, the 3-methacryloxypropyl trimethoxy silane, 3-methacryloxypropyl triethoxysilane, the compound of one or more that select in 3-acryloxy propyl trimethoxy silicane or the 3-acryloxy propyl group three chloro silane, the material of making through the sol-gel operation, more preferably, the material made through the sol-gel operation of 3-methacryloxypropyl trimethoxy silane.
With respect to the solid state component in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of above-mentioned silicon compound (B) is 0.1～2.0 quality %, is preferably 0.3～0.8 quality %.If when the content of above-mentioned silicon compound (B) was pressed said reference less than 0.1 weight %, the clinging power of substrate and light shield layer became bad, peeling off of figure taken place; When surpassing 2 weight %, form residual film on lower membrane or the substrate, video picture speed may be slack-off, also may produce residue.Especially, if with respect to light trigger (A) 100 mass parts in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of silicon compound (B) is 1～10 mass parts, 5～10 mass parts more preferably, in the ISO effect of light trigger, can provide cohesiveness to greatest extent so to substrate.
＜adhesive resin (C) 〉
Short wavelength laser exposure apparatus of the present invention is with adhesive resin (C) that photosensitive composition contained, its effect is as to the adhesive resin of coloured material (E), all can use so long as can be dissolved in the polymkeric substance of employed alkaline imaging liquid in video picture stage when making color filter.
As above-mentioned adhesive resin (C), for example can use carboxylic monomer and can with multipolymer of other monomer of this monomer copolymerization etc.
As above-mentioned carboxylic monomer, for example there is the molecule of unsaturated monocarboxylic, unsaturated dicarboxylic, unsaturated tricarboxylic acids etc. to contain the unsaturated carboxylic acid etc. of the unsaturated polybasic carboxylic acid etc. of 1 above carboxyl.
At this,, acrylic acid, methacrylic acid, crotonic acid, α-Lv Daibingxisuan, cinnamic acid etc. are for example arranged as unsaturated monocarboxylic.
As above-mentioned unsaturated dicarboxylic, maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid etc. are for example arranged.
Above-mentioned unsaturated polybasic carboxylic acid can be an acid anhydrides, and maleic anhydride, itaconic anhydride, citraconic anhydride etc. are specifically arranged.
Above-mentioned unsaturated polybasic carboxylic acid also can be its single (2-methacryl oxyalkyl) ester, for example mono succinate (2-acrylyl oxy-ethyl) ester, mono succinate (2-methylacryoyloxyethyl) ester, phthalic acid list (2-acrylyl oxy-ethyl) ester, phthalic acid list (2-methylacryoyloxyethyl) ester etc.
Above-mentioned unsaturated polybasic carboxylic acid also can be list (methyl) acrylate of its two terminal dicarboxyl polymkeric substance, as ω-carboxyl polycaprolactone single-acrylate, ω-carboxyl polycaprolactone monomethacrylates etc.
These carboxylic monomers can be used alone or in mixture of two or more separately.
Described can with other monomer of carboxylic monomer copolymerization, the aromatic ethylene compound of styrene, α-Jia Jibenyixi, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chlorostyrene, o-methoxy styrene, m-methoxy styrene, p-methoxy styrene, o-ethylene benzyl methyl ether, m-ethylene benzyl methyl ether, p-ethylene benzyl methyl ether, o-ethylene benzyl glycidyl ether, m-ethylene benzyl glycidyl ether, p-ethylene benzyl glycidyl ether, indenes etc. is for example arranged; Methacrylate, methyl methacrylate, ethyl acrylate, Jia Jibingxisuanyizhi, n-propyl group acrylate, n-propyl methyl acid esters, i-propyl group acrylate, i-propyl methyl acid esters, n-butylacrylic acid ester, n-butyl methyl acrylate, i-butylacrylic acid ester, i-butyl methyl acrylate, the sec-butyl acrylate, the sec-butyl methacrylate, t-butylacrylic acid ester, t-butyl methyl acrylate, 2-hydroxy acrylic acid ethyl ester, 2-hydroxymethyl ethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxymethyl propyl acrylate, 3-hydroxypropyl acrylate, 3-hydroxymethyl propyl acrylate, 2-hydroxybutyl acrylate, 2-hydroxymethyl butyl acrylate, 3-hydroxybutyl acrylate, 3-hydroxymethyl butyl acrylate, 4-hydroxybutyl acrylate, 4-hydroxymethyl butyl acrylate, the allyl acrylate, the allyl methyl acrylate, the benzyl acrylate, the benzyl methacrylate, the cyclohexyl acrylate, the cyclohexyl methyl acrylate, phenyl acrylate, the phenyl methyl acrylate, 2-methoxy acrylic acid ethyl ester, 2-methoxy ethyl acrylate, 2-epoxy radicals ethyl acrylate, 2-epoxy radicals Jia Jibingxisuanyizhi, methoxyl diethylene glycol acrylate, methoxyl diethylene glycol methacrylate, methoxyl triethylene glycol acrylate, methoxyl triethylene glycol methacrylate, the MPEG acrylate, the MPEG methacrylate, methoxyl dipropylene glycol acrylate, methoxyl dipropylene glycol methacrylate, iso-bornyl acrylate, the isobornyl methacrylate, the dicyclopentadienyl acrylate, the dicyclopentadienyl methacrylate, 2-hydroxyl-3-epoxypropyl acrylate, 2-hydroxyl-3-epoxy radicals propyl methacrylate, the glycerine mono acrylic ester, the unsaturated carboxylate type of glycerin monomethyl acrylic ester etc.; 2-aminoacrylic acid ethyl ester, 2-amino methyl ethyl acrylate, 2-dimethylamino ethyl acrylate, 2-dimethylaminomethyl ethyl acrylate, 2-aminopropyl acrylate, 2-amino methyl propyl acrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminomethyl propyl acrylate, 3-aminopropyl acrylate, 3-amino methyl propyl acrylate, 3-dimethylaminopropyl acrylate, class such as amino alkane ester such as the unsaturated carboxylic acid of 3-dimethylaminomethyl propyl acrylate etc.; The unsaturated carboxylic acid glycidyl esters class of glycidyl acrylate, glycidyl methacrylate etc.; The vinyl carboxylates class of vinyl acetate, propionate, butyric acid vinyl acetate, vinyl benzoate etc.; The unsaturated ether of ethene methyl ether, ethylene ethyl ether, allyl glycidyl ether etc.; The vinyl cyanide compound of vinyl cyanide, methacrylonitrile, α-Lv Daibingxijing, vinylidene dinitrile etc.; The unsaturated amine of acrylamide, Methacrylamide, alpha-chloro acrylamide, N-2-hydroxyethyl acrylamide, N-2-hydroxyethyl Methacrylamide etc.; The unsaturated imines class of maleimide, N-phenylmaleimide, N-cyclohexyl maleimide etc.; The aliphatics conjugated diolefine of 1,3-butadiene, isoprene, chlorbutadiene etc.; The end of the polymer molecular chain of polystyrene, polymethacrylate, polymethylmethacrylate, poly--n-butylacrylic acid ester, poly--n-butyl methyl acrylate, polysiloxane has the macromonomer class of single acryloyl group or monomethyl acryloyl group etc.These monomers can be used alone or in mixture of two or more separately.
Carboxylic content of monomer in the above-mentioned adhesive resin (C) is 10～50 quality % normally, and preferably 15～40 quality % are more preferably 25～40 quality %.When if the content of carboxylic monomer is 10～50 quality %, with the favorable solubility of imaging liquid, video picture the time can form figure exactly, so preferred.
(methyl) acrylic acid/(methyl) methyl acrylate copolymer is for example arranged as above-mentioned adhesive resin, (methyl) acrylic acid/benzyl (methyl) acrylate copolymer, (methyl) acrylic acid/2-hydroxyethyl (methyl) acrylate/benzyl (methyl) acrylate copolymer, (methyl) acrylic acid/(methyl) methyl acrylate/polystyrene macromolecular monomer copolymer, (methyl) acrylic acid/(methyl) methyl acrylate/poly-(methyl) methyl acrylate macromonomer multipolymer, (methyl) acrylic acid/benzyl (methyl) acrylate/polystyrene macromolecular monomer copolymer, (methyl) acrylic acid/benzyl (methyl) acrylate/poly-(methyl) methyl acrylate macromonomer multipolymer, (methyl) acrylic acid/2-hydroxyethyl (methyl) acrylate/benzyl (methyl) acrylate/polystyrene macromolecular monomer copolymer, (methyl) acrylic acid/2-hydroxyethyl (methyl) acrylate/benzyl (methyl) acrylate/poly-(methyl) methyl acrylate macromonomer multipolymer, (methyl) acrylic acid/styrene/benzyl (methyl) acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/mono succinate (2-acryloxy) ester/styrene/benzyl (methyl) acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/mono succinate (2-acryloxy ethyl) ester/styrene/allyl (methyl) acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/benzyl (methyl) acrylate/N-phenylmaleimide/styrene/glycerine list (methyl) acrylate copolymer etc.Wherein, preferred (methyl) acrylic acid/benzyl (methyl) acrylate copolymer, (methyl) acrylic acid/benzyl (methyl) acrylate/styrol copolymer, (methyl) acrylic acid/(methyl) methyl acrylate copolymer, (methyl) acrylic acid/(methyl) methyl acrylate/styrol copolymer of using.
Its acid number of adhesive resin of the present invention is preferably in the scope of 20～200 (mg KOH/g).Acid number can improve the dissolubility to imaging liquid in above-mentioned scope the time, and non-exposure portion is dissolved easily, and super-sens, the figure of result exposure portion when video picture be residual, thereby improves residual film ratio (film remaining ratio), so preferred.At this, the amount (mg) of required potassium hydroxide during acid number is meant and during the 1g acrylic polymers usually, is carried out titration and is obtained with potassium hydroxide aqueous solution.
And, preferably by gel permeation chromatography (GPC; The stripping solvent: tetrahydrofuran) the polystyrene conversion weight average molecular weight of Ce Lianging (below, be called for short " weight average molecular weight ") is 3000～200000, is preferably 5000～100000 alkali soluble resin.If molecular weight in above-mentioned scope, then can improve the hardness of surface coating film, residual film ratio uprises, and non-exposure portion is to the favorable solubility of imaging liquid, thereby improves resolution, and is therefore preferred.
With respect to the solid state component in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of adhesive resin of the present invention (C) is 10～80 quality %, preferred 20～70 quality %.If in above-mentioned scope, then can form figure, improve resolution and residual film ratio, so preferred.
＜light polyacetylene compound (D) 〉
Short wavelength laser exposure apparatus of the present invention is under the effect of light and light trigger polymeric compounds to take place with the light polyacetylene compound (D) that photosensitive composition contained, and can contain monofunctional monomer, two functional monomers and other polyfunctional monomer.
As above-mentioned monofunctional monomer, nonyl phenyl carbitol acrylate, 2-hydroxyl-3-phenoxy propyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethylmethacry,ate, N-vinyl pyrrolidone etc. are arranged specifically.
As above-mentioned two functional monomers, specifically have 1, two (acrylyl oxy-ethyl) ethers of 6-hexanediol two (methyl) acrylate, ethylene glycol bisthioglycolate (methyl) acrylate, neopentyl glycol two (methyl) acrylate, triethylene glycol two (methyl) acrylate, bisphenol-A, 3-methyl pentanediol two (methyl) acrylate etc.
As other polyfunctional monomer, trimethylolpropane tris (methyl) acrylate, pentaerythrite three (methyl) acrylate are specifically arranged, pentaerythrite four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate etc.
Wherein, preferably use the above polyfunctional monomer of two senses.
With respect to the solid state component in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of above-mentioned smooth polyacetylene compound (D) is preferably 1～80 quality %.If light polyacetylene compound (D) is in above-mentioned scope, then the intensity of pixel portions and flatness will become well, so preferred.
＜coloured material (E) 〉
Its tone of employed coloured material (E) does not limit among the present invention, can be selected according to the purposes of color filter.Particularly, can be in pigment, dyestuff or the natural colouring matter any one, wherein preferred what use is thermotolerance, the organic pigment that colour rendering is good.As organic pigment and inorganic pigment, specifically can use the compound that in colour index (The Society of Dyers and Colourists publication), is classified as pigment (Pigment).
More specifically, can use C.I. pigment yellow 1, C.I. pigment yellow 3, C.I. pigment Yellow 12, C.I. pigment yellow 13, C.I. pigment Yellow 14, C.I. pigment yellow 15, C.I. pigment yellow 16, C.I. pigment yellow 17, C.I. pigment yellow 20, C.I. pigment yellow 24, C.I. pigment yellow 31, C.I. pigment yellow 53, C.I. pigment yellow 83, C.I. pigment yellow 86, C.I. pigment yellow 93, C.I. pigment yellow 94, C.I. pigment yellow 109, C.I. pigment yellow 110, C.I. pigment yellow 117, C.I. pigment Yellow 12 5, C.I. pigment Yellow 12 8, C.I. pigment yellow 13 7, C.I. pigment yellow 13 8, C.I. pigment yellow 13 9, C.I. pigment yellow 147, C.I. pigment Yellow 14 8, C.I. pigment yellow 150, C.I. pigment yellow 153, C.I. pigment yellow 154, C.I. pigment yellow 166, C.I. pigment yellow 17 3, C.I. pigment yellow 180, C.I. pigment yellow 185, C.I. pigment yellow 194, C.I. pigment yellow 214 yellow uitramarines such as grade; C.I. orange pigments such as pigment orange (Pigment Orange) 13, C.I. pigment orange 31, C.I. pigment orange 36, C.I. pigment orange 38, C.I. pigment orange 40, C.I. pigment orange 42, C.I. pigment orange 43, C.I. pigment orange 51, C.I. pigment orange 55, C.I. pigment orange 59, C.I. pigment orange 61, C.I. pigment orange 64, C.I. pigment orange 65, C.I. pigment orange 71, C.I. pigment orange 73; C.I. paratonere (Pigment Red) 9, C.I. Pigment Red 97, C.I. paratonere 105, C.I. pigment red 122, C.I. pigment red 123, C.I. paratonere 144, C.I. pigment red 149, C.I. paratonere 166, C.I. paratonere 168, C.I. paratonere 176, C.I. paratonere 177, C.I. paratonere 180, C.I. paratonere 192, C.I. paratonere 209, C.I. pigment red 21 5, C.I. pigment red 21 6, C.I. paratonere 224, C.I. paratonere 242, C.I. paratonere 254, C.I. paratonere 264, C.I. red pigment such as paratonere 265; C.I. alizarol saphirol (Pigment Blue) 15, C.I. pigment blue 15: 3, C.I. pigment blue 15: 4, C.I. pigment blue 15: 6, blue pigment such as C.I. pigment blue 60; C.I. violet pigments such as pigment violet (Pigment Violet) 1, C.I. pigment violet 19, C.I. pigment Violet 23, C.I. pigment violet 29, C.I. pigment violet 32, C.I. pigment violet 36, C.I. pigment violet 38; C.I. viridine greens such as naphthol green (Pigment Green) 7, C.I. pigment green 36, C.I. naphthol green 58; C.I. browns such as pigment brown (Pigment Brown) 23, C.I. pigment brown 25; C.I. pigment black (Pigment Black) 1, C.I. pigment black 7 black pigments such as grade etc.Wherein, preferably, comprise and be selected from C.I. pigment yellow 13 8, C.I. pigment yellow 13 9, C.I. pigment yellow 150, C.I. paratonere 177, C.I. paratonere 209, C.I. paratonere 254, C.I. pigment Violet 23, C.I. pigment blue 15: 6, the more than one pigment of C.I. pigment green 36 and C.I. naphthol green 58.
Especially, these organic pigments and inorganic pigment can use separately separately, also can mix two or more uses.For example, in the formation of red pixel, preferably comprise C.I. paratonere 254 and C.I. pigment yellow 13 9; In the formation of green pixel, preferably comprise be selected from the combination of forming by C.I. pigment green 36, C.I. naphthol green 58, C.I. pigment yellow 150 and C.I. pigment yellow 13 8 more than one; In the formation of blue picture element, preferably comprise the C.I. pigment blue 15: 6.
The relative short wavelength laser exposure apparatus of content of this coloured material (E) is generally 10～70 weight %, the scope of 20～60 weight % preferably with the solid state component in the photosensitive composition with massfraction.If in above-mentioned scope, the color depth when making as color filter is abundant and polymkeric substance is contained with necessary amount in composition, therefore can form the sufficient figure of physical strength.
Among the present invention, short wavelength laser exposure apparatus is meant the summation of the composition of having removed solvent with the solid state component in the painted exposure composition.
To the organic pigment in the above-mentioned pigment; as required, also can implement the surface treatment with the pigment derivative etc. that has imported acidic groups or basic group, the micronize processing of handling, waiting based on sulfuric acid micronize (refinement) based on the grafting of the surface of pigments of polymer compound etc. or based on the cleaning treatment of organic solvent that is used to remove impurity and water etc., based on the removal processing of the ion exchange process of ionic impurity etc. etc.
Preferably the particle diameter of coloured material (E) is even.Coloured material is under the situation of pigment, makes it to contain pigment dispersing agent and carries out distributed treatment, can obtain the dispersible pigment dispersion of pigment even dispersed state in solution thus.
As above-mentioned pigment dispersing agent, for example can use cationic, anionic species, the nonionic class, the positive, surfactants such as polyesters and polyamines class, these can two or more alone or in combination separately uses.
Under the situation of using pigment dispersing agent, its use amount is equivalent to short wavelength laser exposure apparatus with coloured material 1 weight portion in the photosensitive composition, preferably below 1 weight portion, more preferably below above 0.5 weight portion of 0.05 weight portion.If the use amount of pigment dispersing agent can obtain the pigment of uniform disperse state in above-mentioned scope, be preferred therefore.
＜solvent (F) 〉
Short wavelength laser exposure apparatus of the present invention does not have restriction especially with the solvent (F) that photosensitive composition contained, and can use the various organic solvents that use in the photosensitive composition field.
With respect to the short wavelength laser exposure apparatus that contains it photosensitive composition total amount, short wavelength laser exposure apparatus of the present invention is generally 60～90 quality % with the content of the solvent (F) of photosensitive composition, preferably 70～85 quality %.If the content of solvent (F) is by the words of said reference in 60～90 quality % scopes, then use squeeze roll coater, rotary coating machine, slit-rotary coating machine, slit type coater (being also referred to as the die type coating machine), coating was better when the apparatus for coating of ink jet type etc. was coated with, so preferred.
Object lesson as spendable solvent (F) has, the ethylene glycol monoalkyl ether class of glycol monomethyl methyl ether, ethylene glycol monomethyl ether, glycol monomethyl propyl ether, ethylene glycol monobutyl ether etc.; The diethylene glycol dialkyl ether class of diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ethers etc.; The ethylene glycol alkyl ether acetate salt of acetic acid methyl cellosolve, acetate ethyl cellosolve etc.; The enediol alkyl ether acetic acid salt of propylene glycol monomethyl ether acetate, propylene glycol list ethylether acetate, propylene glycol list propyl ether acetate, methoxyl butyl acetate, methoxyl amyl acetate etc.; Benzene,toluene,xylene, sym-trimethyl benzene etc. aromatic hydrocarbon based; The ketone of methyl ethyl ketone, acetone, methyl-n-amyl ketone, methyl isobutyl ketone, cyclohexanone etc.; The alcohols of ethanol, propyl alcohol, butanols, hexanol, cyclohexanol, ethylene glycol, glycerine etc.; The ester class of 3-ethoxyl ethyl propionate, 3-methoxypropionic acid methyl esters etc.; The cyclic ester class of gamma-butyrolacton etc. etc.
In the above-mentioned solvent, if consider coating and drying property, the organic solvent that boiling point in the above-mentioned solvent of then preferred use is 100～200 ℃, more preferably use the ester class of enediol alkyl ether acetic acid salt, ketone, 3-ethoxyl ethyl propionate and 3-methoxypropionic acid methyl esters etc., more preferably use propylene glycol monomethyl ether acetate, propylene glycol list ethylether acetate, cyclohexanone, 3-ethoxyl ethyl propionate or 3-methoxypropionic acid methyl esters etc. again.
These solvents (F) can independent separately or mixing use more than 2 kinds.
Short wavelength laser exposure apparatus of the present invention is with in the photosensitive composition, except above-mentioned composition, also can add the adjuvant that filling agent, other macromolecular compound, pigment dispersing agent, ultraviolet light absorber, aggegation prevent agent etc. as required.
As above-mentioned filling agent, glass, silica, aluminium oxide etc. are arranged specifically.
As above-mentioned other macromolecular compound, the hardening resin of epoxy resin, succinimide resin etc. is specifically arranged, the thermoplastic resin of polyvinyl alcohol (PVA), polyacrylic acid, polyalkylene glycol monoalkyl ether, poly-fluoroalkyl acrylate, polyester, polyurethane etc. etc.
As above-mentioned pigment dispersing agent, can use commercially available surfactant, as using surfactants such as silicon class, fluorine class, ester class, cationic, anionic species, nonionic class, the positive etc.These can use more than 2 kinds separately alone or in combination.
As above-mentioned surfactant, polyoxyethylene alkyl ether class, polyoxyethylene alkyl phenyl ether class, polyethylene glycol di class, sorbitan carboxylic esters class, fatty acid modified polyesters, tertiary amine modified polyurethane, polyethyleneimine: amine etc. are for example arranged, in addition, can also the following material of commodity in use name: KP (SHIN-ETSU HANTOTAI's chemical industry (strain) system), POLYFLOW (common prosperity society chemistry (strain) system), EFTOP ( ト one ケ system プ ロ ダ Network StarCorporate system), MEGAFAC (big Japanese ink chemical industry (strain) system), Fluorad (Sumitomo 3M (strain) system), Asahi guard, Surflon (above by Morning sun (strain)Make), SOLSPERSE ( ゼ ネ カ (strain)System), EFKA (EFKA chemical company system), PB821 (aginomoto (strain) system) etc.
As above-mentioned ultraviolet light absorber 2-(the 3-tert-butyl group-2-hydroxy-5-methyl base phenyl)-5-chloro benzo triazole, alkoxy benzene ketone etc. are arranged specifically.
Prevent that as above-mentioned aggegation agent from specifically having sodium polyacrylate etc.
Short wavelength laser exposure apparatus photosensitive composition of the present invention for example can be according to following method manufacturing.In advance coloured material (E) is mixed with solvent (F), the mean grain size that use bowl mill etc. is dispersed to coloured material becomes the following degree of 0.2 μ m.At this moment, can use pigment dispersing agent as required, in addition, can also be with part or all mixing of adhesive resin (C).To the gained dispersion liquid (below, be also referred to as lotion) add remainder, simple function adjuvant, light polyacetylene compound (D) and the light trigger (A) of adhesive resin (C), add other composition as required, further add solvent furnishing normal concentration as required, thereby obtain short wavelength laser exposure apparatus photosensitive composition as target.
Below, describe with the method that photosensitive composition forms figure using short wavelength laser exposure apparatus of the present invention.
The short wavelength laser exposure apparatus of the present invention pattern forming method of photosensitive composition, comprise: above-mentioned short wavelength laser exposure apparatus is applied to stage on the base material with photosensitive composition, stage that above-mentioned short wavelength laser exposure apparatus is exposed with the part scope of photosensitive composition optionally, and remove above-mentioned short wavelength laser exposure apparatus with the exposure range of photosensitive composition or the stage of non-exposure range.
As an example, as following on base material the above-mentioned short wavelength laser exposure apparatus photosensitive composition of coating, by photo-hardening and video picture formation figure, thereby use as colored pixels (rendered image).At this, can use glass or silicon chip as base material, but the present invention is not limited thereto.
At first, short wavelength laser exposure apparatus of the present invention is applied on the base material with photosensitive composition, or be applied to preformed containing on the layer of short wavelength laser exposure apparatus with the photosensitive composition solid state component, prepare drying, remove volatile ingredient such as desolvate and obtain level and smooth filming.The coating thickness of this moment is about 0.5 μ m～4 μ m degree.
For as above-mentioned filming of obtaining on making targeted graphical, across mask to the particular range irradiation ultraviolet radiation.At this moment, to all uniform irradiation parallel rayss of exposure portion, use the device of mask aligner and exposure machine etc. for the optimum seeking site of accurately align mask and substrate.Then, filming after the sclerosis end contacted with alkaline aqueous solution, make non-exposure range dissolving video picture, thereby can form targeted graphical.After the video picture, can implement the back dried of 120～230 ℃, 10～60 minutes degree as required.
Be the imaging liquid that the video picture after the graphical exposure is used, normally contain the aqueous solution of alkali compounds and surfactant.
Alkali compounds can be inorganic arbitrarily and organic basic compound.Object lesson as inorganic alkaline compound has, NaOH, potassium hydroxide, sodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate (ADP), potassium dihydrogen phosphate, sodium silicate, potassium silicate, sodium carbonate, sal tartari, sodium bicarbonate, saleratus, sodium borate, potassium borate, ammonium etc.In addition, object lesson as organic basic compound has, Tetramethylammonium hydroxide, 2-hydroxyethyl trimethylammonium hydroxide, monomethyl amine, dimethyl amine, trimethylamine, mono aminoethane, diethylamide, triethylamine, single isopropylamine, diisopropylamine, monoethanolamine etc.These inorganic and organic basic compounds can two or more alone or in combination separately uses.
The preferred concentration of the above-mentioned alkali compounds in the alkalescence imaging liquid is the scope of 0.01～10 quality %, is more preferably 0.03～5 quality %.
Surfactant in the alkalescence imaging liquid can use nonionic class surfactant, anionic species surfactant or cationic surfactant arbitrarily.Object lesson as above-mentioned nonionic class surfactant has polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkylaryl ether, other polyoxyethylene deriv, oxygen ethene/oxypropylene block polymer, sorbitan carboxylic esters, polyoxyethylene sorbitan carboxylic ester, Polyoxyethylene Sorbitol Fatty Acid Esters, fatty acid glyceride, polyoxyethylene fatty acid ester, polyoxyethylene alkyl amine etc.Object lesson as above-mentioned anionic species surfactant has, the higher alcohol sulfate salt of lauryl alcohol sodium sulfovinate and oleyl alcohol sodium sulfovinate etc., the alkylsurfuric acid salt of NaLS and Texapon Special etc., the alkyl aryl sulfonate class of neopelex and dodecyl sodium naphthasulfonate etc. etc.Object lesson as above-mentioned cationic surfactant has, the amine salt of octadecylamine hydrochloride and lauryl trimethyl ammonium chloride etc. or 4 grades of ammonium salts etc.These surfactants can use more than 2 kinds separately alone or in combination.
Above-mentioned surfactant concentrations in alkaline imaging liquid is generally 0.01～10 quality %, is preferably 0.05～8 quality %, more preferably 0.1～5 quality %.
Below, color filter of the present invention is described.
Color filter of the present invention contains color layers, and this color layers is to form with the figure that photosensitive composition exposes, video picture becomes to stipulate by above-mentioned short wavelength laser exposure apparatus.
Short wavelength laser exposure apparatus is narrated in above content with the pattern forming method of photosensitive composition, therefore omits its detailed explanation.
As mentioned above, by coating, the drying of short wavelength laser exposure apparatus with the coloring phototonus resin solution, and to various operations such as the graphical exposure of gained dry coating and video pictures, and obtain with short wavelength laser exposure apparatus with suitable pixel or the black matrix of coloured material color in the photosensitive composition.And, as long as repeat this operation of color filter required color quantity get final product color filter.Because the structure and the manufacture method of color filter belong to present technique field conventional techniques, therefore omit its detailed explanation.
Use short wavelength laser exposure apparatus of the present invention little with the film thickness difference in the color filter surface of photosensitive composition manufacturing, for example, when the film thickness of 0.5～4 μ m, the film thickness difference in the surface can be controlled at below the 0.15 μ m, further can be controlled at below the 0.05 μ m.Therefore, the flatness of gained color filter is good, by applying it to color liquid crystal display arrangement, imageing sensor, can make high-quality liquid crystal indicator, imageing sensor with high yield.
The invention provides a kind of liquid crystal indicator that contains above-mentioned color filter.
Liquid crystal indicator of the present invention except possessing above-mentioned color filter, has structure well-known in the art.That is, comprise among the present invention that all can use the liquid crystal indicator of color filter of the present invention.Comprise the liquid crystal indicator of transmission-type as an example, it will have a pair of electrode base board in opposite directions of thin film transistor (TFT) (TFT unit), pixel electrode and both alignment layers, and will be relative with the interval of regulation, and liquid crystal material injects as liquid crystal layer in crack portion betwixt.In addition, also be included in the reflective liquid crystal indicator that is provided with the reflection horizon between the substrate of color filter and the color layers.
Also have following liquid crystal indicator as other example, it comprises, is connected TFT on the transparency electrode of color filter (thin film transistor (TFT): substrate Thin Film Transistor), and be fixed in back of the body illuminator on TFT substrate and the color filter lap position.Above-mentioned TFT substrate comprises: encirclement color filter periphery surface, by the external frame of anti-photopolymer resin (light-proofresin) formation; Be additional in the external frame liquid crystal layer that constitutes by nematic crystal; Be provided in each each field of liquid crystal layer, a plurality of pixel electrodes; Be formed with the transparent glass substrate of pixel electrode; Be formed on the lip-deep Polarizer that transparent glass substrate exposes.
Polarizer has the polarization direction of vertical crosscut, is made of the organic material as polyvinyl alcohol etc.Most pixel electrodes respectively with the glass substrate that is formed on the TFT substrate on a plurality of thin film transistor (TFT)s interconnect.If use the potential difference (PD) of regulation on specific pixel electrode, then Gui Ding voltage is suitable between specific pixel electrode and transparency electrode.Thereby the electric field that forms because of voltage will change the orientation corresponding to the field of liquid crystal layer specific pixel electrode.
Below, describe the present invention in detail according to embodiment, still, show that embodiments of the present invention only are illustrations down, the present invention is not limited to these embodiments.Scope of the present invention is the scope described in claims, and comprises that all and claims record content are equal to the change in meaning or the scope.
Among the following embodiment and comparative example, " % " and " part " of expression content all refers to the quality to be benchmark outside the situation of refering in particular to.
At first, in order to make short wavelength laser exposure apparatus photosensitive composition of the present invention, prepared the silicon compound that contains organic functional group through hydrolysis reaction as silicon compound.Following synthesis example the 1,2, the 3rd is used to promote cohesiveness and the synthesis example of making silicon compound.
＜synthesis example 1 〉
Take into account and add 3-methacryloxypropyl trimethoxy silane (the system A-174 of MTMS:GE-Toshiba) 80ml in the reaction vessel of pH meter to possessing stirring machine, temperature, and will be to the malonic acid aqueous solution 5ml of methyl alcohol 15ml mixing pH2.5 and the mixed liquor 20ml that obtains puts into funnel, at normal temperatures the stirring reaction container time, with the mixed liquor that dripped methyl alcohol and malonic acid aqueous solution in 30 minutes.After dripping end, the state of keeping normal temperature stirred 2 hours down.Stir after 2 hours, remove solvent under the reduced pressure.With anhydrous magnesium sulfate remaining distilled water is dewatered, filter and remove anhydrous magnesium sulfate.In the said process, the silicon compound that finally obtains, be with promote performance in the cohesiveness the colorless viscous liquid silicasol shape of suitable performance exist.
＜synthesis example 2 〉
In the container identical with synthesis example 1, the 3-methacryloxypropyl trimethoxy silane is replaced to 3-diglycidyl propyl trimethoxy silicane (the system A-187 of GPTMS:GE-Toshiba) in addition, identical with synthetic example 1.
＜embodiment 1-5 and comparative example 1-4 〉
Each composition in his-and-hers watches 1 and the table 2 carries out mixed dissolution and has made photopolymerizable composition.
[table 1]
Embodiment ??1 ??2 ??3 ??4 ??5
??A-1 ??0.62 ??0.66 ??0.67 ??0.65 ??0.66
??A-2 ??0.16 ??0.17 ??0.16 ??0.17 ??0.17
??A-3 ??2.33 ??1.66 ??1.64 ??1.65 ??1.66
??A-4 ? ? ? ? ?
??B-1 ??0.1 ??0.2 ??0.3 ??0.25 ?
??B-2 ? ? ? ? ??0.2
??C-1 ??3.16 ??3.52 ??3.47 ??3.5 ??3.52
??D-1 ??2.33 ??2.49 ??2.46 ??2.48 ??2.49
??E-1 ??3.27 ??3.27 ??3.27 ??3.27 ??3.27
??E-2 ??6.89 ??6.89 ??6.89 ??6.89 ??6.89
??E-3 ??1.13 ??1.13 ??1.13 ??1.13 ??1.13
??F-1 ??56.01 ??56.01 ??56.01 ??56.01 ??56.01
??F-2 ??16 ??16 ??16 ??16 ??16
??F-3 ??8 ??8 ??8 ??8 ??8
[table 2]
Comparative Examples 1 ??1 ??2 ??3 ??4
??A-1 ??0.7 ??0.67 ??0.67 ??0.67
??A-2 ??0.2 ??0.17 ??0.17 ??0.17
??A-3 ??1.7 ??1.67 ??1.67 ?
??A-4 ? ? ? ??1.67
??B-1 ??0 ? ? ??0.1
??B-3 ? ??0.1 ? ?
??B-4 ? ? ??0.1 ?
??C-1 ??3.6 ??3.58 ??3.58 ??3.58
??D-1 ??2.5 ??2.51 ??2.51 ??2.51
??E-1 ??3.3 ??3.27 ??3.27 ??3.27
??E-2 ??6.9 ??6.89 ??6.89 ??6.89
??E-3 ??1.1 ??1.13 ??1.13 ??1.13
??F-1 ??56 ??56.01 ??56.01 ??56.01
??F-2 ??16 ??16 ??16 ??16
??F-3 ??8 ??8 ??8 ??8
(A-1) butane-[Irgacure 369 for 1-ketone for 2-benzyl-2-dimethylamino-1-(4-morpholinyl-phenyl); Ciba Specialty Chemical corporate system]
(A-2) 4,4 '-two (diethylamino) Benzophenone [E A B-F; Hodogaya chemical corporate system]
(A-3) (E)-(((4-((2 for 6-for 1-for 1-, 2-dimethyl-1,3-dioxolan-4-yl) methoxy)-2-methylbenzoyl)-9-ethyl-9,9a-dihydro-4aH-carbazol-3-yl) ethylideneaminooxy) ethanone [N-1919＜A D E K A company makes 〉]
(A-4) three chloro methyl triazines
(B-1) silicon compound＜synthesis example 1 〉
(B-2) silicon compound＜synthesis example 2 〉
(B-3) silicon compound: 3-methyl allyl acyloxypropyl trimethoxysilane
(B-4) silicon compound: ethene trimethoxy silane
(C-1) multipolymer of methacrylic acid and benzyl methacrylate (the unit ratio of methacrylic acid monomer and benzyl methacrylate monomers is mol ratio: 25: 75, acid value was 82, and the polystyrene conversion weight average molecular weight is 28000)
(D-1) double pentaerythritol methacrylate
(E-1) the C.I. paratonere 254
(E-2) the C.I. paratonere 177
(E-3) the C.I. pigment yellow 150
(F-1) propylene glycol monomethyl ether acetate
(F-2) 3-ethoxyl ethyl propionate
(F-3) methoxypropanol
＜experimental example 〉
With the color filter photosensitive composition of the foregoing description 1～5 and comparative example 1～4, after usefulness surface of revolution coating was coated with on glass substrate, mounting on heating plate had formed film with 3 fens kinds of 100 ℃ temperature maintenance.Then, on above-mentioned film, with change in the scope of transmissivity 1～100%, ladder type, with the mode that is spaced apart 100 μ m of photomask, irradiation exposure 30mJ/cm 2, the test photomask of mounting from 1 μ m to line/space diagram of 100 μ m is controlled to 200 μ m with the interval of testing photomask, irradiation exposure 30mJ/cm 2
Is object with the color filter of the foregoing description 1～5 and comparative example 1～4 with the color filter of photosensitive composition manufacturing, and the rectilinear propagation of light sensitivity, briliancy minimizing, taper and figure is estimated, and its result is as shown in table 3 below.
＜light sensitivity 〉
Be used to form and carry out the required lowest exposure amount of figure that video picture does not have surfaceness yet.
Zero: below 15mJ, no surfaceness
△: greater than 15mJ, below the 30mJ
*: greater than 30mJ
＜conical in shape 〉
The shape of having observed the pixel surface with S EM (10000 multiplying power).
Zero: graphic attribute (Pattern proffile) and rectilinear propagation are good
△: graphic attribute (Pattern proffile) is good
*: (Pattern proffile) is bad for graphic attribute
＜cohesiveness 〉
The shape of having observed the pixel surface with microscope (500 multiplying power).
Zero: the figure of pattern edge (Pattern edge) portion is peeled off well
△: the figure of pattern edge (Pattern edge) portion is peeled off common
*: the figure of pattern edge (Pattern edge) portion is peeled off bad
＜residue 〉
Observed the surface configuration and the transmissivity of pixel measures with microscope (500 multiplying power).
Zero: residue, transmissivity is good
△: residue is good, and transmissivity is bad
*: residue, transmissivity is bad
[table 3]
Figure GSA00000043587100301
To the result who estimates with the color filter of photosensitive composition manufacturing with the color filter of the foregoing description 1～5 and comparative example 1～4, with the silicon compound of the oxime ester class polymerization initiator (A-3) of formula (1) expression and formula (2) expression composition as necessary composition, with not with the oxime ester class polymerization initiator of formula (1) expression as necessary composition, though perhaps as must composition use settle and do not use the composition of silicon compound to compare, even carry out a spot of exposure, also can present good light sensitivity, conical in shape, the character of figure cohesiveness and residue aspect.

Claims (10)

1. short wavelength laser exposure apparatus photosensitive composition, it is characterized in that, comprising: contain the light trigger (A) of the oxime ester class polymerization initiator of formula (1) expression, silicon compound (B), adhesive resin (C), light polyacetylene compound (D), coloured material (E) and the solvent (F) of formula (2) expression;
[formula 1]
Figure FSA00000043587000011
In the following formula, R1, R2, R3 represent hydrogen atom, R, OR, COR, SR, CONRR ' or CN independently of one another, the alkyl of R and R ' expression carbon number 1～8, the aryl of carbon number 6～12, the aralkyl of carbon number 7～13 or the heterocyclic radical of carbon number 5～7, these are the heterocyclic radical replacement or the non-substituting group of halogen atom or carbon number 5～7, wherein, the alkene part of alkyl and aralkyl can connect by unsaturated chain, ether chain, thioether chain, ester chain, and above-mentioned R and R ' can constitute ring jointly; R4, R5, R6, R7 represent the alkyl of hydrogen atom, halogen atom or carbon number 1～8 independently of one another; R8 represents the alkyl of carbon number 0～10; Y1, Y2, Y3 represent oxygen atom or sulphur atom independently of one another; X represents the alkyl of halogen atom or carbon number 1～8;
[formula 2]
Figure FSA00000043587000012
In the following formula, arbitrary organo-functional group of selecting in the group that R1 represents to be made up of glycidyl, (methyl) acryloyl group, aminopropyl, sulfydryl propyl group, cyanogen propyl group and isocyanic acid propyl group perhaps contains the aliphatics or the aromatic hydrocarbon of the carbon number 1～20 of any organo-functional group of selecting in above-mentioned group; R2 represents hydrogen atom, methyl, ethyl or hydroxyl; N represents 1～13 integer.
2. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1 is characterized in that, with respect to the light trigger in the photosensitive composition, the content of the light trigger of following formula (1) is more than the 50 quality %.
3. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1, it is characterized in that, with respect to the light trigger in the short wavelength laser exposure apparatus usefulness photosensitive composition, the content of the light trigger of following formula (1) is more than 60～70 quality %.
4. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1, it is characterized in that, with respect to the solid state component of short wavelength laser exposure apparatus with photosensitive composition, the content of described light trigger (A) is 3～20 quality %.
5. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1, it is characterized in that described silicon compound (B) is to being selected from by the methacryloxy methyl triethoxysilane, the methacryloxy methyltrimethoxy silane, 3-methacryloxypropyl three chloro silane, the 3-methacryloxypropyl trimethoxy silane, 3-methacryloxypropyl triethoxysilane, 3-acryloxy propyl trimethoxy silicane, at least one compound in the group that 3-acryloxy propyl group three chloro silane groups become carries out the sol-gel operation and obtains.
6. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1, it is characterized in that, with respect to the solid state component of short wavelength laser exposure apparatus with photosensitive composition, the content of described silicon compound (B) is 0.1～2.0 quality %.
7. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1 is characterized in that, the exposure wavelength of described short wavelength laser exposure apparatus is the short wavelength of 300nm～400nm.
8. short wavelength laser exposure apparatus photosensitive composition as claimed in claim 1 is characterized in that, the exposure wavelength of described short wavelength laser exposure apparatus is 308nm or 355nm.
9. a color filter is characterized in that, contains color layers, and this color layers is that each described short wavelength laser exposure apparatus of claim 1～8 is formed with photosensitive composition after the figure of regulation, exposes and video picture forms.
10. liquid crystal indicator, it contains the described color filter of claim 9.
CN201010132318A 2009-03-16 2010-03-16 Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator Pending CN101840155A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0022098 2009-03-16
KR1020090022098A KR101403153B1 (en) 2009-03-16 2009-03-16 Colored photosensitive resin composition for short wavelength laser exposure apparatus, color filter and liquid crystal display device employing the same

Publications (1)

Publication Number Publication Date
CN101840155A true CN101840155A (en) 2010-09-22

Family

ID=42743610

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201010132318A Pending CN101840155A (en) 2009-03-16 2010-03-16 Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator

Country Status (4)

Country Link
JP (1) JP5011560B2 (en)
KR (1) KR101403153B1 (en)
CN (1) CN101840155A (en)
TW (1) TWI402620B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012068879A1 (en) * 2010-11-23 2012-05-31 常州强力先端电子材料有限公司 High photosensibility carbazole oxime ester photoinitiator,preparation and use thereof
CN107652383A (en) * 2011-10-20 2018-02-02 日立化成株式会社 Photosensitive polymer combination, photosensitive element, the manufacture method of the forming method of resist pattern and printed circuit board (PCB)
WO2020010770A1 (en) * 2018-07-10 2020-01-16 武汉华星光电半导体显示技术有限公司 Method for manufacturing color film substrate
CN110785705A (en) * 2017-11-24 2020-02-11 株式会社Lg化学 Photoresist composition and photoresist film using the same
CN115286656A (en) * 2022-08-05 2022-11-04 广州华星光电半导体显示技术有限公司 Additive, preparation method thereof, alignment composition and display device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012058498A (en) * 2010-09-09 2012-03-22 Toray Ind Inc Photosensitive colored composition for color filter and color filter
KR20120035995A (en) * 2010-10-07 2012-04-17 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and liquid crystal display using same
US8808969B2 (en) 2011-04-12 2014-08-19 Brewer Science Inc. Method of making radiation-sensitive sol-gel materials
EP3125031A4 (en) 2014-03-26 2017-12-06 Sumitomo Chemical Company, Limited Liquid crystal display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177227A (en) * 2001-12-10 2003-06-27 Toppan Printing Co Ltd Method for manufacturing color filter, black photosensitive resin composition used for the same and color filter
CN1805955A (en) * 2004-08-20 2006-07-19 旭电化工业株式会社 Oxime ester compound and photopolymerization initiator containing such compound
CN101093355A (en) * 2006-06-23 2007-12-26 富士胶片株式会社 Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof
WO2008078686A1 (en) * 2006-12-27 2008-07-03 Adeka Corporation Oxime ester compound and photopolymerization initiator comprising the compound
KR20080107128A (en) * 2007-06-05 2008-12-10 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter and liquid crystal display device having the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007041158A (en) 2005-08-01 2007-02-15 Fujifilm Holdings Corp Colored photosetting resin composition for color filter fabrication, photosetting resin transfer film, and method for producing color filter using those
JP2008122750A (en) 2006-11-14 2008-05-29 Toray Ind Inc Photosensitive resist composition for color filter, and the color filter
JP5191241B2 (en) * 2007-01-12 2013-05-08 東洋インキＳｃホールディングス株式会社 Coloring composition and method for producing color filter
JP5109437B2 (en) * 2007-03-27 2012-12-26 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003177227A (en) * 2001-12-10 2003-06-27 Toppan Printing Co Ltd Method for manufacturing color filter, black photosensitive resin composition used for the same and color filter
CN1805955A (en) * 2004-08-20 2006-07-19 旭电化工业株式会社 Oxime ester compound and photopolymerization initiator containing such compound
CN101093355A (en) * 2006-06-23 2007-12-26 富士胶片株式会社 Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof
WO2008078686A1 (en) * 2006-12-27 2008-07-03 Adeka Corporation Oxime ester compound and photopolymerization initiator comprising the compound
KR20080107128A (en) * 2007-06-05 2008-12-10 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter and liquid crystal display device having the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012068879A1 (en) * 2010-11-23 2012-05-31 常州强力先端电子材料有限公司 High photosensibility carbazole oxime ester photoinitiator,preparation and use thereof
CN107652383A (en) * 2011-10-20 2018-02-02 日立化成株式会社 Photosensitive polymer combination, photosensitive element, the manufacture method of the forming method of resist pattern and printed circuit board (PCB)
CN110785705A (en) * 2017-11-24 2020-02-11 株式会社Lg化学 Photoresist composition and photoresist film using the same
US11537046B2 (en) 2017-11-24 2022-12-27 Lg Chem, Ltd. Photoresist composition and photoresist film using the same
CN110785705B (en) * 2017-11-24 2023-03-28 株式会社Lg化学 Photoresist composition and photoresist film using the same
WO2020010770A1 (en) * 2018-07-10 2020-01-16 武汉华星光电半导体显示技术有限公司 Method for manufacturing color film substrate
CN115286656A (en) * 2022-08-05 2022-11-04 广州华星光电半导体显示技术有限公司 Additive, preparation method thereof, alignment composition and display device

Also Published As

Publication number Publication date
JP5011560B2 (en) 2012-08-29
TW201037459A (en) 2010-10-16
JP2010217895A (en) 2010-09-30
KR101403153B1 (en) 2014-06-09
TWI402620B (en) 2013-07-21
KR20100103987A (en) 2010-09-29

Similar Documents

Publication Publication Date Title
CN101840155A (en) Short wavelength laser exposure apparatus is with photosensitive composition, the color filter that adopts it and liquid crystal indicator
KR101302508B1 (en) Negative photosensitive resin composition, liquid crystal display having that curing product, method of forming a pattern of liquid crystal display using the same
JP4821206B2 (en) Photosensitive coloring composition for color filter and color filter
CN102279522B (en) Coloring composition for color filter and color filter
JP2014146029A (en) Coloring photosensitive resin compositions suitable for both column spacer and black matrix
JP2007034119A5 (en)
TWI559084B (en) Blue photosensitive resin composition for color filter and application thereof
TWI507817B (en) Coloring composition for color filter, color filter and color liquid crystal display element
CN104423148A (en) A color photosensitive resin composition, color filter and display device comprising the same
CN102156383A (en) Coloring composition, color filter and color liquid crystal display element
TW201141933A (en) Colored composition, color filter and color liquid crystal display element
CN103365080A (en) Colored photopolymer composition
CN102445847A (en) Colored photosensitive resin composition, color filter and liquid crystal display
CN104914674A (en) Colored photosensitive resin composition
CN103969953A (en) Colored Photosensitive Resin Composition
JP2014123116A (en) Photosensitive resin composition
CN105388705A (en) Coloured photosensitive resin composition
CN103509151A (en) Alkali soluble resin and photosensitive resin composition containing the same
CN104345559B (en) Photosensitive composition and colored filter and liquid crystal display with it
KR20150134989A (en) Colored photosensitive resin composition with dual property for column spacer and black matrix
CN104345552A (en) Colored photosensitive resin composition, color filter, and liquid crystal display device having the same
CN103969950A (en) Colored Photopolymer Composition
CN108957951A (en) Photosensitive polymer combination, photo-sensitive resin and colour filter using it
CN104932196B (en) Colored photosensitive resin composition and colour filter comprising the composition
TWI534534B (en) Coloring composition for color filter, color filter and display element

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20100922