TW201018308A - Dual-screen display and manufacturing method thereof - Google Patents
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201018308 » · Ϊ W3744PA · . 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種雙面顯示裝置及其製造方法，且 特別是有關於一種使用有機電激發光材料之雙面顯示褒 置及其製造方法。 【先前技術】 目前’普遍運用於小尺寸電子產品之有機發光二極體 (Organic Light-emitting Diode，OLED)顯示裝置，由於 其元件結構較為簡單、不需外加背光源的特點，且封裝後 之顯示裝置其厚度很小，因此可充分表現攜帶產品所需 輕薄特性。 另外，為符合產品趨勢，例如手機具有内外螢幕以雙 面顯示畫面’多種雙面顯示裝置之技術亦逐漸發展中。現 仃其中-種採用有機發光二極體之雙面顯示裝置中 ❹ 透光之陰極電極透光以達到雙面顯示之效果，通 之極之材料製作得相當薄。然而，當陰極電極 μ⑽::題另外，也會因為阻抗問題而產生亮度不均之 【發明内容】 於陰⑽—種雙面顯Μ置及㈣造方法，係 " 置伽電極，此細電極對應可視 區之周' 5 201018308 邊或^列與列畫素之間設置，進而增加部分陰極電極之厚 度’藉此以解決壓差過大之問題。 本發明提出一種雙面顯示裝置，此裝置包括：—第— 透明基板、-陽極電極、一有機電激發光層、一陰極電極 與一第一輔助電極。陽極電極設置於第一透明基板上。有 機電激發光層没置於陽極電極上。陰極電極設置於有機電 激發光層上，且陰極電極之面積係不小於第一透明基板上 一可視區之範圍。第一輔助電極設置於陰極電極上，且第 一輔助電極係對應該可視區之至少一邊側設置。 本發明再提出一種雙面顯示裝置之製造方法，此方法 匕括&供帛透B月基板；形成一陽極電極於第一透明 基板上；形成-有機電激發光層於陽極電極上；形成一卜 極電極於有機電激發光層上，並使陰極電極之面積不小^ 第一透明基板上-可視區之範圍；以及，形成—第一辅助 電極於陰極電極上’並使第—輔助電極對應於可視區之至 少一邊側設置。 為讓本發明之上述内容能更明顯易懂，下文特舉較佳 實施例，並配合所附圖式，作詳細說明如下： 【實施方式】 實施例一 -凊參照第1圖，其繪示依照本發明實施例一之雙面顯 :裝置之面圖。如第！圖所示，雙面顯示裝置剛包括 一透明基板11G、第二透明基板12()、陽極電極、陰 201018308201018308 » · Ϊ W3744PA · . 9. Description of the Invention: [Technical Field] The present invention relates to a double-sided display device and a method of fabricating the same, and more particularly to a double-sided display using an organic electroluminescent material The device and its manufacturing method. [Prior Art] At present, the Organic Light-emitting Diode (OLED) display device, which is widely used in small-sized electronic products, has a simple structure, does not require an external backlight, and is packaged. The display device has a small thickness, so that the thin and light characteristics required for carrying the product can be sufficiently exhibited. In addition, in order to comply with product trends, for example, mobile phones have internal and external screens to display images on both sides. The technology of various double-sided display devices is gradually developing. Now, among the two-sided display devices using organic light-emitting diodes, the light-transmissive cathode electrode is transparent to achieve the effect of double-sided display, and the material of the electrode is made relatively thin. However, when the cathode electrode μ(10):: in addition, the brightness is uneven due to the impedance problem. [Inventive content] In the Yin (10)-type double-sided display device and (4) manufacturing method, the system is used to set the gamma electrode. The electrode corresponds to the circumference of the visible area ' 5 201018308 Side or column and column pixels are set, thereby increasing the thickness of part of the cathode electrode 'to thereby solve the problem of excessive pressure difference. The present invention provides a double-sided display device comprising: a first transparent substrate, an anode electrode, an organic electroluminescent layer, a cathode electrode and a first auxiliary electrode. The anode electrode is disposed on the first transparent substrate. An electromechanical excitation layer is not placed on the anode electrode. The cathode electrode is disposed on the organic electroluminescent layer, and the area of the cathode electrode is not less than a range of a visible region on the first transparent substrate. The first auxiliary electrode is disposed on the cathode electrode, and the first auxiliary electrode is disposed on at least one side of the visible region. The invention further provides a method for manufacturing a double-sided display device, which comprises: supplying a B-substrate substrate; forming an anode electrode on the first transparent substrate; forming an organic electroluminescent layer on the anode electrode; forming a dipole electrode on the organic electroluminescent layer, and the area of the cathode electrode is not small ^ on the first transparent substrate - the range of the visible region; and, forming - the first auxiliary electrode on the cathode electrode 'and the first - auxiliary The electrodes are disposed corresponding to at least one side of the viewable area. In order to make the above-mentioned contents of the present invention more comprehensible, the following detailed description of the preferred embodiments and the accompanying drawings will be described in detail as follows: [Embodiment] Embodiment 1 - 凊 Referring to FIG. A double-sided display of the device according to the first embodiment of the present invention. As the first! As shown in the figure, the double-sided display device has just included a transparent substrate 11G, a second transparent substrate 12 (), an anode electrode, and a yin 201018308
丨 1 TW3744PA 極電極140、有機電激發光層150、第一偏光板160、第二 偏光板170與輔助電極。陽極電極130、陰極電極140 ' 有機電激發光層150與輔助電極係封裝於第一透明基板 110與第二透明基板120之間。其中，有機電激發光層150 位於陽極電極130與陰極電極140之間，輔助電極則位於 陰極電極140與第二透明基板120之間。第一偏光板160 設置於第一透明基板110之外側，第二偏光板170則設置 於第二透明基板120之外側。第一偏光板160與第二偏光 ® 板170是用以避免對向之光線穿透。輔助電極之配置與架 構將於以下附圖說明。 第1圖係簡化之圖示，雙面顯示裝置100實際上包括 多個畫素結構’每個畫素結構中包括一有機電激發光層 150與陽極電極130，而陰極電極14〇則為分佈於雙面顯 示裝置100上一可視區之整片電極。 請接著參照第2圖’其繪示第1圖雙面顯示裝置的單 ❿一晝素結構之剖面圖。為簡化圖示，第二透明基板12〇、 第一偏光板160與第二偏光板17〇係省略。如第2圖所示， 第透明基板11〇疋一薄膜電晶體（thin film transistor， TFT)基板，其上包括多個具驅動用途之薄膜電晶體。此 畫素結構上之陽極電極丨30係耦接至薄膜電晶體112。有 機電激發光層150設置於陽極電極13〇上，陰極電極14〇 則設置於有機電激發光層15〇上。 陽極電極130係一透明電極，其材質可以是氧化銦錫 (indium tin oxide ’ IT0)。陰極電極14〇之材質係為導電 7 201018308 ，料:之IS (A1)’其^整面蒸鍍於雙面顯示裝置⑽之 品為了達到雙面顯示之效果，必須控制陰極電極1 之膜厚、’使之成為可透光之電極。當陰極電極之膜層過薄 時，會造成阻抗增加，使雙面發光裝置之發光效率降低。 另外也會因為阻抗問題而產生亮度不均之問題。 而為了降錢關過薄所導致之壓差（IR Drop)問題，於 雙面顯示裝置1GG中之陰極電極14〇上可設置輔助電極 (見第4A圖等）μ降低壓差問題。另外’有機電激發光 層I50之材質係有機電激發光（organic eleCtro-luminescence)材料。係可根據各畫素結構所要顯 不之顏色以挑選合適之有機電激發光材料，以於有機電激 發光層15G目陰陽雜之電位差被激發時，使畫素顯示對 應之顏色。以下將附圖說明輔助電極之設計與製造。 本實施例提出雙面顯示裝置1〇〇之製造方法，其方法 流程圖請參照第3圖◊如第3圖所示，雙面顯示裝置1〇〇 之製造方法包括步驟31〜35 :提供第一透明基板；形成陽 極電極於第一透明基板上；形成有機電激發光層於陽極電 極上，形成陰極電極於有機電激發光層上，並使陰極電極 之面積係不小於第一透明基板上一可視區之範圍；及，形 成輔助電極於陰極電極上，並使該輔助電極對應於可視區 之至少一邊側。 於步驟31〜32中，可以利用一玻璃基板作為第一透明 基板110之底材，且薄膜電晶體112位於第一透明基板u〇 上，如第2圖所示。至於陽極電極13〇之製造，其可利用 201018308丨 1 TW3744PA pole electrode 140, organic electroluminescent layer 150, first polarizing plate 160, second polarizing plate 170 and auxiliary electrode. The anode electrode 130 and the cathode electrode 140' are electrically encapsulated between the first transparent substrate 110 and the second transparent substrate 120. The organic electroluminescent layer 150 is located between the anode electrode 130 and the cathode electrode 140, and the auxiliary electrode is located between the cathode electrode 140 and the second transparent substrate 120. The first polarizing plate 160 is disposed on the outer side of the first transparent substrate 110, and the second polarizing plate 170 is disposed on the outer side of the second transparent substrate 120. The first polarizing plate 160 and the second polarizing plate 170 are used to avoid light penetration in the opposite direction. The configuration and architecture of the auxiliary electrodes will be described in the following figures. 1 is a simplified illustration. The double-sided display device 100 actually includes a plurality of pixel structures. Each of the pixel structures includes an organic electroluminescent layer 150 and an anode electrode 130, and the cathode electrode 14 is distributed. The entire electrode of a visible area on the double-sided display device 100. Referring to Fig. 2, there is shown a cross-sectional view of the monolithic structure of the double-sided display device of Fig. 1. To simplify the illustration, the second transparent substrate 12, the first polarizing plate 160, and the second polarizing plate 17 are omitted. As shown in FIG. 2, the first transparent substrate 11 is a thin film transistor (TFT) substrate including a plurality of thin film transistors for driving applications. The anode electrode 30 of the pixel structure is coupled to the thin film transistor 112. An electromechanical excitation layer 150 is disposed on the anode electrode 13A, and a cathode electrode 14 is disposed on the organic electroluminescence layer 15A. The anode electrode 130 is a transparent electrode and may be made of indium tin oxide (IT0). The material of the cathode electrode 14 is electrically conductive 7 201018308, and the material of the IS (A1)' is vapor-deposited on the double-sided display device (10). In order to achieve the effect of double-sided display, the film thickness of the cathode electrode 1 must be controlled. , 'make it an permeable electrode. When the film layer of the cathode electrode is too thin, an increase in impedance is caused, and the luminous efficiency of the double-sided light-emitting device is lowered. In addition, there is a problem of uneven brightness due to impedance problems. In order to reduce the pressure drop (IR Drop) caused by the thinning of the money, an auxiliary electrode (see Fig. 4A, etc.) may be provided on the cathode electrode 14 of the double-sided display device 1GG to reduce the pressure difference problem. Further, the material of the organic electroluminescence layer I50 is an organic eleCtro-luminescence material. The organic electroluminescent material can be selected according to the color to be displayed for each pixel structure, so that when the potential difference of the organic electroluminescent layer 15G is mixed, the pixel displays the corresponding color. The design and manufacture of the auxiliary electrode will be described below with reference to the drawings. In this embodiment, a manufacturing method of the double-sided display device 1 is proposed. For a flowchart of the method, please refer to FIG. 3, as shown in FIG. 3, the manufacturing method of the double-sided display device 1 includes steps 31 to 35: providing the first a transparent substrate; forming an anode electrode on the first transparent substrate; forming an organic electroluminescent layer on the anode electrode, forming a cathode electrode on the organic electroluminescent layer, and making the area of the cathode electrode not smaller than the first transparent substrate a range of the visible region; and an auxiliary electrode is formed on the cathode electrode, and the auxiliary electrode corresponds to at least one side of the visible region. In the steps 31 to 32, a glass substrate can be used as the substrate of the first transparent substrate 110, and the thin film transistor 112 is located on the first transparent substrate u, as shown in Fig. 2. As for the manufacture of the anode electrode 13〇, it can be utilized 201018308
' 1 TW3744PA 110上，並使陽極 氧化銦錫（ITO)製作到第一透明基板 電極130耦接至薄膜電晶體〗12。 層於 比制極電極130、有機電激發光層150與陰極電極刚 白，作完成後’便是於陰極電極14G上製造出輔助電極。On the 1 TW3744PA 110, anodized indium tin oxide (ITO) was fabricated to the first transparent substrate electrode 130 coupled to the thin film transistor. The layer is formed on the cathode electrode 14G after the formation of the counter electrode 130, the organic electroluminescent layer 150 and the cathode electrode is completed.
值侍注意的是，輔助電極於陰極電極14〇上之形狀具有 種變形，以下逐一說明之。 、 請先參照第4A〜4B圖，第4A时示根據第3圖方法 流程製造之輔助電極之第一示意圖1 4B圖繪示形成第 4A圖辅助電極之第一光罩之示意圖。如第4a圖所示，陰 極電極140係整面覆蓋於第一透明基板11〇⑴之上，而辅 助電極180設置於陰極電極14〇丨，並對應於第一透明基 板110⑴上之可視區VR之至少一邊側設置。 輔助電極18〇包括四個長條形電極181〜184。四個長 條形電極181〜184分別對應於可視區VR之四邊側設置， 且彼此之間不相連。其中長條形電極181、183係搞接至 第-透明基板11G上之二個接觸孔（⑶ntaethQie)部〇、 C2’接觸孔部C1、C2係用以供電荷流入的部分。 如第4B圖所示，用以製造四個長條升》電極⑻〜⑻ 之第-光罩300包括四個長形開口 3〇1〜綱。這四個長形 開口 3〇1〜304可於陰極電極14〇上製造出圍繞可視區vr 设置之長條形電極181〜184，其中長條形電極181〜184之 形狀係分別對應於長形開口 3〇1〜3〇4之形狀。 201018308 製造辅助電極180時，是先將第一光罩3〇〇設置於第 一透明基板110(1)之陰極電極】上，並將第一光罩3〇〇 上之長形開口 301〜304對應於可視區VR之四邊側設置。 接著，便疋蒸鑛輔助電極18〇之材料於陰極電極“ο上， 使輔助電極140之電極材料填滿各個長形開口 3〇1〜3〇4。 於蒸鍍完成後，便可去除第一光罩3〇〇。如此一來，便可 以形成各個不相連之長條形電極181〜184。 於陰極電極140上設置之輔助電極18〇是圍繞著可視 區VR設置，並不會增加陰極電極14〇於可視區vr内之 厚度，因此不會影響可視區VR中之畫素顯示。當供給電 廢給可視區VR内之畫素時，由於辅助電極18()圍繞可視 區VR之„又汁，電荷可以直接透過周邊之輔助電極1 快 速地被帶到離接觸孔部C1、C2較遠的地方，如此一來，' 便可解決整個可視區VR上壓差不均與阻抗增加之問題。 由於第一光罩300之四個長形開口 3〇1〜3〇4之間具有 適當之間/鬲設計，使第一光罩300之結構較為堅固/、 接著請參照第5A〜5B圖，第5A圖緣示根據第3圖方 :流程製造之辅助電極之第二示意圖，第5B圖繪示形成 圖輔助電極之第二光罩之示意圖。如第μ圖所示， 極⑽包括二個L形電極191、192與—長條形電 VR ，、中L形電極191、192分別對稱設置於可視區 之—側，而長條形電極193則設置於可視區 邊側，並位於二個L形電極191、192之間。 如第5B圖所示，第二光罩働上具有二個匕形開口 201018308It is noted that the shape of the auxiliary electrode on the cathode electrode 14 has a deformation, which will be described below. Please refer to FIG. 4A to FIG. 4B first, and the first schematic diagram of the auxiliary electrode manufactured according to the method flow of FIG. 3 is shown in FIG. 4A. FIG. 4B is a schematic view showing the first photomask forming the auxiliary electrode of FIG. 4A. As shown in FIG. 4a, the cathode electrode 140 covers the entire surface of the first transparent substrate 11〇(1), and the auxiliary electrode 180 is disposed on the cathode electrode 14〇丨 and corresponds to the visible area VR on the first transparent substrate 110(1). Set on at least one side. The auxiliary electrode 18A includes four elongated electrodes 181 to 184. The four elongated electrodes 181 to 184 are respectively disposed corresponding to the four sides of the visible area VR, and are not connected to each other. The elongated electrodes 181 and 183 are connected to the two contact holes ((3) ntaethQie) of the first transparent substrate 11G, and the C2' contact holes C1 and C2 are portions for supplying electric charges. As shown in Fig. 4B, the first photomask 300 for fabricating the four strips of electrodes (8) to (8) includes four elongated openings 3〇1~. The four elongated openings 3〇1 to 304 can form elongated electrodes 181 to 184 disposed around the visible region vr on the cathode electrode 14A, wherein the shapes of the elongated electrodes 181 to 184 correspond to the elongated shapes, respectively. The shape of the opening 3〇1~3〇4. 201018308 When the auxiliary electrode 180 is manufactured, the first mask 3 is first disposed on the cathode electrode of the first transparent substrate 110 (1), and the elongated opening 301 to 304 of the first mask 3 is placed thereon. Corresponding to the four sides of the visible area VR. Then, the material of the auxiliary electrode 18 of the steaming electrode is placed on the cathode electrode "o, so that the electrode material of the auxiliary electrode 140 fills each elongated opening 3〇1~3〇4. After the evaporation is completed, the first electrode can be removed. A mask 3 is formed. In this way, the strip electrodes 181 to 184 which are not connected to each other can be formed. The auxiliary electrode 18 设置 disposed on the cathode electrode 140 is disposed around the visible area VR without increasing the cathode. The thickness of the electrode 14 within the visible region vr does not affect the pixel display in the visible region VR. When the supply of electricity is discarded to the pixels in the visible region VR, the auxiliary electrode 18() surrounds the visible region VR. Further, the electric charge can be quickly carried to the place farther from the contact hole portions C1 and C2 through the auxiliary electrode 1 at the periphery, so that the pressure difference and the impedance increase can be solved in the entire visible area VR. problem. Since the four elongated openings 3〇1~3〇4 of the first mask 300 have an appropriate design between the two sides, the structure of the first mask 300 is relatively strong. Next, please refer to FIGS. 5A-5B. Fig. 5A shows a second schematic view of the auxiliary electrode manufactured according to the third figure: the flow, and Fig. 5B shows a schematic view of the second photomask forming the auxiliary electrode. As shown in FIG. 5, the pole (10) includes two L-shaped electrodes 191, 192 and an elongated electric VR, and the middle L-shaped electrodes 191, 192 are symmetrically disposed on the side of the visible region, respectively, and the elongated electrode 193 It is disposed on the side of the visible area and is located between the two L-shaped electrodes 191 and 192. As shown in FIG. 5B, the second mask has two dome-shaped openings 201018308
、 · TW3744PA 401、402與一個長形開口 403。於製造輔助電極190時，• TW3744PA 401, 402 with an elongated opening 403. When manufacturing the auxiliary electrode 190,
係將L形開口 401、402與長形開口 403對應於可視區VR 之周圍设置’接著再進行蒸鍵辅助電極190材料之步驟。 而於電極材料蒸鍍完畢，並將第二光罩400從第一透明基 板110(2)上移走後’便可形成如第5A圖所示之辅助電極 190架構。 辅助電極190於可視區VR之左上部分為連續之[形 電極19卜其與接觸孔部C1耦接；輔助電極1%於可視區 籲VR之右上部分亦為連續之L形電極192，其與接觸孔部 C2耦接，因此可視區VR内離接觸孔部C1、C2最遠端之 電荷亦可以由其二側之L形電極191、192被迅速地帶走， 使壓差過大情形獲得改善。 另外，請參照第6A〜6B圖，第6A圖繪示根據第3 圖方法流程製造之輔助電極之第三示意圖，第6B圖繪示 形成第6A圖辅助電極之第三光罩之示意圖。如第6A圖所 ❹示’辅助電極200包括二個门形電極2〇1、2〇2，其中门形 電極201、202對稱設置於可視區VR之二侧，且各別耦接 至接觸孔部Cl、C2。 如第6B圖所示，第三光罩5〇0上具有二個门形開口 501、502。於製造輔助電極2〇〇時，係將门形開口 5〇1、 502對應於可視區VR之周圍設置，接著再進行蒸鍍輔助 電極材料之步驟。而於電極蒸鍍完畢，並將第三光罩5〇〇 從第一透明基板11〇(3)上移走後，便可形成如第6A圖所 示之辅助電極架構。 201018308 輔助電極2GG之二仙形電極2G1、2()2皆為連續之 電極’其分別與接觸孔部C1、C2減，並圍繞於可視區 VR周圍，因此於可視區VR内離接觸孔部α、c2最遠端 之阻抗亦可獲得改善。第三光罩·之门形開口洲、逝 之間隔大小必須經過適當之設計，以作為第三光罩5〇〇設 置於第一透明基板Πο(3)上之支撐部分。 請參照帛7Α〜7C圖，帛7Α圖綠示根據第3圖方法流The steps of the L-shaped openings 401, 402 and the elongated opening 403 corresponding to the periphery of the visible area VR' are followed by the evaporation of the auxiliary electrode 190 material. After the electrode material is evaporated, and the second mask 400 is removed from the first transparent substrate 110 (2), the auxiliary electrode 190 structure as shown in Fig. 5A can be formed. The auxiliary electrode 190 is continuous in the upper left portion of the visible region VR [the electrode 19 is coupled to the contact hole portion C1; the auxiliary electrode 1% is also the continuous L-shaped electrode 192 in the upper right portion of the visible region VR, which is The contact hole portion C2 is coupled, so that the charge at the farthest end from the contact hole portions C1 and C2 in the visible region VR can be quickly taken away by the L-shaped electrodes 191 and 192 on both sides thereof, so that the pressure difference is excessively improved. . In addition, please refer to FIGS. 6A-6B, FIG. 6A is a third schematic diagram of the auxiliary electrode fabricated according to the method flow of FIG. 3, and FIG. 6B is a schematic view showing the third photomask forming the auxiliary electrode of FIG. 6A. As shown in FIG. 6A, the auxiliary electrode 200 includes two gate electrodes 2〇1 and 2〇2, wherein the gate electrodes 201 and 202 are symmetrically disposed on two sides of the visible region VR, and are respectively coupled to the contact holes. Department Cl, C2. As shown in Fig. 6B, the third mask 5〇0 has two gate-shaped openings 501, 502. When the auxiliary electrode 2 is fabricated, the gate-shaped openings 5?1, 502 are disposed corresponding to the periphery of the visible region VR, and then the step of vapor-depositing the auxiliary electrode material is performed. After the electrode evaporation is completed and the third mask 5 is removed from the first transparent substrate 11 (3), the auxiliary electrode structure as shown in Fig. 6A can be formed. 201018308 The second electrode 2G1 and 2()2 of the auxiliary electrode 2GG are continuous electrodes' which are respectively reduced from the contact hole portions C1 and C2 and surround the visible area VR, so that the contact hole portion is in the visible area VR. The impedance of the farthest end of α and c2 can also be improved. The size of the gate of the third mask must be appropriately designed to serve as a support portion of the third mask 5 disposed on the first transparent substrate Πο(3). Please refer to 帛7Α~7C diagram, 帛7Α diagram green display according to method flow of Figure 3.
Hi之輔助電極之第四示意圖，第7Β圖繪示形成第7Α ，輔助電極之第四光罩之示意圖，第7C_示第7β圖之 先罩設置於第一透明基板上之示意圖。如第7Α圖所 示’輔助電極210係-設置於陰極電们4〇上之連續電A fourth schematic diagram of the auxiliary electrode of Hi, FIG. 7 is a schematic view showing a fourth photomask forming a seventh electrode, and an auxiliary mask, and a seventh mask showing the seventh mask is disposed on the first transparent substrate. As shown in Figure 7, the auxiliary electrode 210 is connected to the continuous power of the cathode.
St續：間斷地環繞於可視區VR設置，且整個輔助 電極210係耦接至接觸孔部CM、C2。 如第7B圖所示，第四光罩_包括邊框⑽、板面 =〇與多個支撐部㈣，邊框⑽與板面_之間是 撐部63〇相連接，邊框610是藉由支 620夕#罢 Λ „ 疋稭由支撐部630以固定板面 = 邊框61。與板面62°之間具有多個開口 :4些開η刚是由前述之支撐部㈣所分隔開來。 製造第四光罩6〇〇時’苴俜可以法丨 .1Λ 卞，、係了以利用半蝕刻的方式於邊框 610與板面620之間形成多個支撐部63〇。 如第7C圖所示，製造輔助電極21〇時，是先 光罩600以反過來張網之太彳 、第四 上，t U於第-透明基板㈣⑷ 61。·^ 蒸鍍的步驟。其中，第四光罩_之邊框 两度h約為100微米（㈣，支撐部630與第一透明 12 201018308St continued: intermittently surrounding the viewable area VR setting, and the entire auxiliary electrode 210 is coupled to the contact hole portions CM, C2. As shown in FIG. 7B, the fourth mask_ includes a frame (10), a plate surface=〇 and a plurality of support portions (four), and the frame (10) and the plate surface are connected by a support portion 63〇, and the frame 610 is supported by a branch 620.夕# Λ „ 疋 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由When the fourth mask is 6 〇〇, it is possible to form a plurality of support portions 63 边框 between the frame 610 and the plate surface 620 by half etching. As shown in FIG. 7C When the auxiliary electrode 21 is manufactured, the photomask 600 is firstly opened to reverse the net, and the fourth upper portion, t U is applied to the first transparent substrate (4) (4) 61. The vapor deposition step is performed. The frame is twice the degree h is about 100 microns ((4), the support portion 630 and the first transparent 12 201018308
* 1 TW3744PA =)二T透：’支採部630之-寬“ R藉的―透基板11G(4)與切部63〇間 二輔助電極21°於蒸鑛完畢後形成 辅助電極210之㈣係由第四光罩 基板11〇(4)之方向進行蒸錢。為使第四光罩60〇ΐ4Γ -内之電極材料相連接，較佳是進行二次蒸鑛：： 土板110(4)進行第一次的電極材料蒸 再次調整電極材料之蒸鑛角度，亦即，再從另一個角= 電極材料蒸鏟於第一透明基板110(4)上。如此一來，ς信 第四光罩_上之各開口 640内填滿辅助電極训之 材料，且第—次蒸鑛時被多個支撐部630遮住而未有 1料覆蓋於其上之陰極電極刚區域，也因為蒸鑛角的改 良’將電極材料覆蓋上去’如帛7Α圖所示，辅助電極加 瘳係一環繞可視區VR且設置於陰極電極14〇上之連續電極 架構。當然，陰極電極M0上之電荷便可以直接流向其鄰 近之連續輔助電極210，並透過輔助電極21〇迅速地流 離接觸孔較遠的地方。 另外’除了可藉由第四光罩_製造如第从圖所示 ==電極架構，亦可利用其他之光罩製造連續之辅助電 請接著參照第8A—8B圖，第8A圖繪示形成第7八圖 輔助電極之第五光罩之示意圖，第8B圖繪示第从圖之第 13 201018308 五光罩設置於第一透明基板上之示意圖。如第8A圖所 示，第五光罩700包括邊框710、板面720與多個支撐部 730，其中邊框710與板面720之間是以支撐部730相連 接，且邊框710與板面720之間之多個開口 740係由支撐 部730所分隔開來。第五光罩700上之支撐部730可利用 蝕刻之方式製造，其中支撐部730之部分較薄，於蒸鍍輔 助電極210之材料時，亦需將第五光罩700以反過來張網 之方式設置於第一透明基板110(4)上。 於製造輔助電極210時，是先將第五光罩700之板 ⑩ 面720對應於第一透明基板110(4)之可視區VR設置，並 使第五光罩700上之開口 740對應於可視區VR之周圍設 置。如第8Β圖所示，第五光罩700之支撐部730與第一 透明基板110(4)之間具有一間距，於蒸鍍電極材料時，此 間距可使各開口 740内之電極相連接。同樣地，輔助電極 210之電極材料之蒸鍍角較佳是介於0〜30度之間。當對第 一透明基板110(4)進行第一次的電極材料之蒸鍍後，便可 以再次調整電極材料之蒸鍍角度，亦即從另一個角度將電 ❿ 極材料蒸鍍於第一透明基板110(4)上。如此一來，便可以 使輔助電極210連續成膜。 至於辅助電極180、190、200與210之材料，其係可 與陰極電極140之材質相同或不相同。較佳地，輔助電極 180、190、200與210之材質可為鋁或銀。 由於當可視區VR上之壓差不均與阻抗增加時，會影 響畫素之顯示效果。當設置輔助電極於陰極電極140上 14 201018308* 1 TW3744PA =) Two T:: "Losing part 630 - wide" R borrowed through the substrate 11G (4) and the cut portion 63 between the two auxiliary electrodes 21 ° after the completion of the distillation to form the auxiliary electrode 210 (4) The money is evaporated in the direction of the fourth mask substrate 11 (4). In order to connect the electrode materials in the fourth mask 60 〇ΐ 4 Γ -, it is preferable to carry out secondary distillation:: soil plate 110 (4 The first electrode material is steamed to adjust the evaporation angle of the electrode material again, that is, from another angle = electrode material to the first transparent substrate 110 (4). Thus, the fourth letter Each of the openings 640 in the reticle _ is filled with the material of the auxiliary electrode training, and is covered by the plurality of supporting portions 630 during the first steaming, and the first portion of the cathode electrode is not covered by the material, and also because of steaming The improvement of the angle of the mine 'covers the electrode material' as shown in Fig. 7 , the auxiliary electrode is twisted and connected to a continuous electrode structure which surrounds the visible region VR and is disposed on the cathode electrode 14 . Of course, the charge on the cathode electrode M0 It can flow directly to the adjacent auxiliary electrode 210 adjacent thereto, and rapidly flows away from the contact hole through the auxiliary electrode 21 In the far place. In addition to the fourth reticle _ manufacturing as shown in the figure below == electrode structure, you can also use other reticle to make continuous auxiliary power, please refer to Figure 8A-8B, 8A The figure shows a schematic diagram of a fifth mask forming the auxiliary electrode of the seventh figure, and FIG. 8B is a schematic diagram of the fifth mask of the first layer of the first transparent substrate according to the 13th 201018308. As shown in FIG. 8A, The fifth reticle 700 includes a frame 710, a plate surface 720 and a plurality of support portions 730. The frame 710 and the plate surface 720 are connected by a support portion 730, and a plurality of openings 740 between the frame 710 and the plate surface 720. The support portion 730 is separated by the support portion 730. The support portion 730 on the fifth mask 700 can be fabricated by etching, wherein a portion of the support portion 730 is thin, and when the material of the auxiliary electrode 210 is evaporated, The fifth mask 700 is disposed on the first transparent substrate 110 (4) in a reverse manner. When the auxiliary electrode 210 is manufactured, the board 10 surface 720 of the fifth mask 700 is first corresponding to the first transparent substrate. The visible area VR of 110 (4) is set, and the opening 740 on the fifth mask 700 corresponds to The periphery of the area VR is disposed. As shown in FIG. 8 , the support portion 730 of the fifth mask 700 and the first transparent substrate 110 ( 4 ) have a spacing between the openings, and when the electrode material is evaporated, the spacing can make the openings The electrodes in the 740 are connected. Similarly, the evaporation angle of the electrode material of the auxiliary electrode 210 is preferably between 0 and 30 degrees. When the first transparent substrate 110 (4) is subjected to the first electrode material After vapor deposition, the vapor deposition angle of the electrode material can be adjusted again, that is, the electric electrode material is evaporated onto the first transparent substrate 110 (4) from another angle. In this way, the auxiliary electrode 210 can be continuously formed into a film. As for the materials of the auxiliary electrodes 180, 190, 200 and 210, they may be the same as or different from the material of the cathode electrode 140. Preferably, the auxiliary electrodes 180, 190, 200 and 210 may be made of aluminum or silver. Since the unevenness of the differential pressure and the impedance increase in the visible area VR, the display effect of the pixels is affected. When the auxiliary electrode is disposed on the cathode electrode 140 14 201018308
' * TW3744PA 後，其有效地使壓差與阻抗降低，此時雙面顯示裝置100 之亮度便得以提升。當雙面顯示裝置100之亮度較大時， 顯示裝置100上之MURA情形亦不明顯；也就是說，當亮 度較高時，MURA也較不容易被人眼觀察出來，當然，對 於雙面顯示裝置100之顯示品質就相對的提高不少。另 外，由於輔助電極之設置，使陰極電極140之厚度可以適 當的變薄，使光穿透陰極電極140之比率增加。如此一來， 除了可增加雙面顯示效果，亦可減少雙面顯示裝置100之 ❿厚度。 實施例二 請參照第9A〜9C圖，第9A圖繪示依照本發明實施例 二之輔助電極之示意圖，第9B圖繪示第9A圖的輔助電極 之局部示意圖，第9C圖繪示形成第9A圖輔助電極之第六 光罩之示意圖。由於實施例二與實施例一之不同之處在於 輔助電極之架構與位置，因此於圖中相同之元件將沿用舊 有標號，且在此不加以贅述。於實施例一中之輔助電極係 設置於可視區VR之外側，而與本實施例二之輔助電極則 除了設置於可視區VR外側，亦可設置於可視區VR内， 只要不遮蓋到原本各晝素之發光區即可。 如第9A〜9B圖所示，第一透明基板110(5)上設置有 陰極電極140,而輔助電極220則設置於陰極電極140上。 其中，第一透明基板110(5)於可視區VR内包括多個晝素 P，這些畫素P成列排列，且相鄰之列晝素間具有一間隔。 15 201018308 輔助電極220包括長條形電極221〜224與多個橫向電極 225,其中長條形電極221〜224係圍繞於可視區VR設置（如 第9A圖所示），而橫向電極225、226等係設置於可視區 VR内，但係對應於列畫素之間的間隔設置（如第9B圖所 示），或是對應於晝素P與晝素P之間的絕緣層（未繪製） 設置。 至於製作輔助電極220之第六光罩800之架構，如第 9C圖所示，第六光罩800上包括數個尺寸較為寬大之長形 開口 801〜804與多個橫向狹縫805。其中，長形開口 ⑩ 801〜804是用以製造輔助電極220之長條形電極 221〜224，而橫向狹縫805則用以製造橫向電極225、226 等。 於製造輔助電極220時，是先將第六光罩800設置於 第一透明基板110(5)之上，其必須使第六光罩800之長形 開口 801〜804對應可視區VR之周邊，且橫向狹縫805必 須精確對應於列晝素之間的間隔。如此一來，當蒸鍍輔助 電極220之電極材料時，才可以使橫向電極225、226等 ❿ 精確對位於各列晝素之間。 由於實施例二之輔助電極220是接近於在可視區VR 上整面塗佈，其有效地增加陰極電極140之厚度，使壓差 確實降低，卻又不會影響各晝素P之穿透率。 本發明上述實施例所揭露之雙面顯示裝置及其製造 方法，係利用可透光之陽極電極與陰極電極由兩面同時顯 16 201018308After the * TW3744PA, it effectively reduces the differential pressure and impedance, and the brightness of the double-sided display device 100 is improved. When the brightness of the double-sided display device 100 is large, the MURA condition on the display device 100 is also not obvious; that is, when the brightness is high, the MURA is less likely to be observed by the human eye, of course, for the double-sided display. The display quality of the device 100 is relatively improved. In addition, due to the arrangement of the auxiliary electrodes, the thickness of the cathode electrode 140 can be appropriately thinned, and the ratio of light penetrating the cathode electrode 140 is increased. In this way, in addition to the double-sided display effect, the thickness of the double-sided display device 100 can be reduced. Embodiment 2 Please refer to FIG. 9A to FIG. 9C, FIG. 9A is a schematic diagram of an auxiliary electrode according to Embodiment 2 of the present invention, FIG. 9B is a partial schematic view of the auxiliary electrode of FIG. 9A, and FIG. 9C is a diagram showing formation 9A is a schematic view of the sixth mask of the auxiliary electrode. Since the second embodiment differs from the first embodiment in the structure and position of the auxiliary electrodes, the same elements will be used in the drawings, and will not be described herein. The auxiliary electrode system in the first embodiment is disposed on the outer side of the visible area VR, and the auxiliary electrode in the second embodiment is disposed outside the visible area VR, and can also be disposed in the visible area VR, as long as it does not cover the original The light-emitting area of the vegetarian element can be used. As shown in Figs. 9A to 9B, the first transparent substrate 110 (5) is provided with a cathode electrode 140, and the auxiliary electrode 220 is provided on the cathode electrode 140. The first transparent substrate 110 (5) includes a plurality of halogens P in the visible region VR. The pixels P are arranged in a row, and the adjacent pixels have a space therebetween. 15 201018308 The auxiliary electrode 220 includes elongated electrodes 221 224 224 and a plurality of lateral electrodes 225 , wherein the elongated electrodes 221 224 224 are disposed around the visible area VR (as shown in FIG. 9A ), and the lateral electrodes 225 , 226 The system is disposed in the visible area VR, but corresponds to the interval between the column pixels (as shown in FIG. 9B), or corresponds to the insulating layer between the pixel P and the pixel P (not drawn). Settings. As for the structure of the sixth mask 800 for fabricating the auxiliary electrode 220, as shown in FIG. 9C, the sixth mask 800 includes a plurality of elongated openings 801-804 and a plurality of lateral slits 805. Among them, the elongated openings 10 801 to 804 are used to manufacture the elongated electrodes 221 to 224 of the auxiliary electrode 220, and the lateral slits 805 are used to manufacture the lateral electrodes 225, 226 and the like. When the auxiliary electrode 220 is manufactured, the sixth mask 800 is first disposed on the first transparent substrate 110 (5), and the elongated openings 801 804 to 804 of the sixth mask 800 must be adjacent to the periphery of the visible area VR. And the transverse slit 805 must exactly correspond to the spacing between the listed elements. In this way, when the electrode material of the auxiliary electrode 220 is vapor-deposited, the lateral electrodes 225, 226, etc. can be accurately positioned between the respective elements. Since the auxiliary electrode 220 of the second embodiment is coated close to the entire surface of the visible area VR, it effectively increases the thickness of the cathode electrode 140, so that the pressure difference is surely reduced without affecting the transmittance of each element P. . The double-sided display device and the method for fabricating the same according to the above embodiments of the present invention utilize the permeable anode electrode and the cathode electrode to be simultaneously displayed on both sides.
• •丁 W3744PA =，：於陰極電極上設計出適當之辅助電極以解決壓 差，。輔助電極係設置於雙面顯示裝置之可視區周圍， 或是可視區内而不遮蓋於畫素之發光部分，其增加阶極電 極之厚度以有效解決壓差過大之問題。藉此，亦可防止阻 抗過大之情形發生，使雙面顯示裝置之亮度提高，進而降 低MURA情形，使顯示效果更佳。當然，應用本發明之雙 面顯示震置之電子裝置，如手機等，亦具有較佳之顯示效 果。• • D3 W3744PA =,: Design an appropriate auxiliary electrode on the cathode electrode to resolve the differential pressure. The auxiliary electrode is disposed around the visible area of the double-sided display device or in the visible area without covering the light-emitting portion of the pixel, which increases the thickness of the step electrode to effectively solve the problem of excessive pressure difference. Thereby, it is also possible to prevent the occurrence of an excessively large impedance, thereby increasing the brightness of the double-sided display device, thereby lowering the MURA condition and making the display effect better. Of course, the electronic device to which the double-sided display of the present invention is applied, such as a mobile phone, also has a better display effect.
I 綜上所述，雖然本發明已以較佳實施例揭露如上，然 其並非用以限定本發明。本發明所屬技術領域中具有通常 知識者，在不脫離本發明之精神和範圍内，當可作各種之 更動與潤飾。因此，本發明之保護範圍當視後附之申請專 利範圍所界定者為準。 ❹ 17 201018308 【圖式簡單說明】 剖面圖第。1圖繪示依照本發明實施例-之雙面顯示装置之 面圖第S緣不第1圖雙面顯示裝置的單〆畫素結構之剖 第3圖繪示製造雙面顯示襄置之方法流程圖。 第-矛第Γ圖时示根據第3圖方法流程製造之輔助電極之 圖輔助電極之第一光罩In the above, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. ❹ 17 201018308 [Simple description of the diagram] Section view. 1 is a cross-sectional view showing a double-sided display device according to an embodiment of the present invention. FIG. 3 is a cross-sectional view showing a single-sided pixel structure of the double-sided display device. FIG. flow chart. The first ejector diagram shows the first mask of the auxiliary electrode of the auxiliary electrode fabricated according to the method flow of FIG.
第4B圖繪示形成第4A 之示 意圖 第5A圖緣示根據第3圖 第二示意圖。 时法-耘製造之輔助電極之 意圖 第5B圖㈣形成第5A圖辅助電極之第二 光罩之示 第三H騎示根據第3圖方法流程製造之輔助電極之 意圖第6B圖繪不形成第6A圖辅助電極之第三光罩之示 第四矛第^騎示根據第3圖方法流程製造之輔助電極之 意圖第7B圖緣示形成第7A圖輔助電極之第四光罩之示 第7C圖緣示第圖之第四光罩 板上之示意圖。 元卓。又置於第一透明基 201018308Fig. 4B shows the intention of forming the 4A. Fig. 5A shows the second schematic according to Fig. 3. The intention of the auxiliary electrode manufactured by the method of time - 5B (4) The second mask of the auxiliary electrode forming the 5A diagram is shown. The third H ride shows the intention of the auxiliary electrode manufactured according to the method flow of Fig. 3, which is not formed in Fig. 6B. FIG. 6A shows the third reticle of the auxiliary electrode, and the fourth lance shows the intention of the auxiliary electrode manufactured according to the method flow of FIG. 3, and FIG. 7B shows the fourth reticle forming the auxiliary electrode of FIG. 7A. The 7C figure shows the schematic diagram of the fourth mask on the figure. Yuan Zhuo. Also placed on the first transparent base 201018308
• TW3 744PA 意圖 第8A圖繪示形成第7A圖辅助電極之第 五光罩之示 透明基 第8B圖繪示第8A圖之第五光罩設置於第 板上之示意圖。 圖 第9A圖纷示依照本發明實施例二之辅助電極之示 意 第9B圖繪不第9A圖的輔助電極之局部示意圖。 第9C圖繪示形成第9A圖辅助電極之第六光罩之示 意圖。 【主要元件符號說明】 100 :雙面顯示裝置 110、110(1)〜110(5):第一透明基板 112 :薄膜電晶體 120 :第二透明基板 130 :陽極電極 140 :陰極電極 150 :有機電激發光層 160 :第一偏光板 17 0 .第二偏光板 180、190、200、21〇、220:輔助電極 181〜184、193、221〜224:長條形電極 191、192 : L形電極 201、202 : Π形電極 201018308 225 :橫向電極 300 :第一光罩 301 〜304、403、801 〜804 :長形開口 400 :第二光罩• TW3 744PA Intent Figure 8A shows the fifth reticle forming the auxiliary electrode of Figure 7A. Transparent substrate. Fig. 8B is a schematic view showing the fifth reticle of Fig. 8A disposed on the first plate. Fig. 9A is a schematic view showing the auxiliary electrode according to the second embodiment of the present invention. Fig. 9B is a partial schematic view showing the auxiliary electrode of Fig. 9A. Fig. 9C is a view showing the sixth reticle forming the auxiliary electrode of Fig. 9A. [Description of Main Component Symbols] 100: Double-sided display device 110, 110(1) to 110(5): First transparent substrate 112: Thin film transistor 120: Second transparent substrate 130: Anode electrode 140: Cathode electrode 150: Yes Electromechanical excitation layer 160: first polarizing plate 17 0. Second polarizing plate 180, 190, 200, 21〇, 220: auxiliary electrodes 181 to 184, 193, 221 to 224: elongated electrodes 191, 192: L shape Electrode 201, 202: Π-shaped electrode 201018308 225: lateral electrode 300: first reticle 301 〜 304, 403, 801 804 804: elongated opening 400: second reticle
401、402 : L 形開口 500 :第三光罩 501、502 :门形開口 600 :第四光罩 610、710 :邊框 620、720 :板面 630、730 :支撐部 640 、 740 :開口 700 :第五光罩 800 :第六光罩 805 :橫向狹縫 Cl、C2 :接觸孔部 P :晝素 VR :可視區 20401, 402: L-shaped opening 500: third mask 501, 502: gate opening 600: fourth mask 610, 710: frame 620, 720: plate surface 630, 730: support portion 640, 740: opening 700: Fifth mask 800: sixth mask 805: lateral slits C1, C2: contact hole portion P: halogen VR: visible area 20
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI552401B (en) * | 2010-07-26 | 2016-10-01 | 半導體能源研究所股份有限公司 | Light-emitting device, lighting device, and manufacturing method of light-emitting device |
| TWI684274B (en) * | 2017-12-13 | 2020-02-01 | 南韓商樂金顯示科技股份有限公司 | Display apparatus |
| CN112216805A (en) * | 2019-07-12 | 2021-01-12 | 陕西坤同半导体科技有限公司 | Photomask structure, method for forming cathode film layer and cathode film layer on array substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105702875B (en) | 2014-12-11 | 2018-04-27 | 财团法人工业技术研究院 | Light-emitting element, electrode structure and manufacturing method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI552401B (en) * | 2010-07-26 | 2016-10-01 | 半導體能源研究所股份有限公司 | Light-emitting device, lighting device, and manufacturing method of light-emitting device |
| TWI587556B (en) * | 2010-07-26 | 2017-06-11 | 半導體能源研究所股份有限公司 | Light-emitting device |
| US9728737B2 (en) | 2010-07-26 | 2017-08-08 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device, lighting device, and manufacturing method of light-emitting device |
| TWI684274B (en) * | 2017-12-13 | 2020-02-01 | 南韓商樂金顯示科技股份有限公司 | Display apparatus |
| US10608199B2 (en) | 2017-12-13 | 2020-03-31 | Lg Display Co., Ltd. | Display apparatus |
| CN112216805A (en) * | 2019-07-12 | 2021-01-12 | 陕西坤同半导体科技有限公司 | Photomask structure, method for forming cathode film layer and cathode film layer on array substrate |
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