TW201001603A - Method and apparatus for transferring substrates, and equipment for processing substrate having the apparatus - Google Patents

Method and apparatus for transferring substrates, and equipment for processing substrate having the apparatus Download PDF

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Publication number
TW201001603A
TW201001603A TW098118728A TW98118728A TW201001603A TW 201001603 A TW201001603 A TW 201001603A TW 098118728 A TW098118728 A TW 098118728A TW 98118728 A TW98118728 A TW 98118728A TW 201001603 A TW201001603 A TW 201001603A
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Taiwan
Prior art keywords
axis
shaft
substrate
support frame
length
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TW098118728A
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Chinese (zh)
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TWI415210B (en
Inventor
Sang-Kil Kim
Seung-Won Ham
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Semes Co Ltd
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Publication of TWI415210B publication Critical patent/TWI415210B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00Roller-ways
    • B65G13/02Roller-ways having driven rollers
    • B65G13/06Roller driving means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67736Loading to or unloading from a conveyor

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention provides a substrate transportation device and method, and a substrate manufacturing apparatus having the device. The substrate transportation device comprises a set of shaft; and a drive part for rotating the set of shaft, the set of shaft comprises at least a first shaft with a first length; a second shaft in same plane with the shaft and having a second length shorter than the first length; and a third shaft in same plane with the shaft and having a third length shorter than the first length; wherein the second shaft is at a place nearer to an end of the first shaft than that of the other end of the first shaft to the end of the shaft, the third shaft is at a place nearer to an end of the first shaft than that of the other end of the first shaft to the end of the shaft.

Description

201001603 六、發明說明: 【發明所屬之技術領域】 本發明係有關用於基板處理之裝置,更詳言 之’係有關用於平板顯示器(fla1: panel display) 之搬迗的裝置以及具有該裝置之基板製造設備。 【先前技術】 年來’資訊處理機器以種種形態之功能並以 極间貝。fl處理速度急速地發展。此資訊處理裝置具 有用以,示所處理資訊之顯示裝£。現在,就顯示 裝置而s ’叉到矚目者有諸如液晶顯示裝置、有機 队(電致發光)顯示裝置、電漿顯示裝置之平板 奘詈。 為製造此種平板顯示器(FDP: Flat Panel201001603 VI. Description of the Invention: [Technical Field] The present invention relates to a device for substrate processing, and more particularly to a device for handling a flat panel display (fla1: panel display) and having the device Substrate manufacturing equipment. [Prior Art] The information processing machine has been functioning in various forms for years. The processing speed of fl is rapidly developing. The information processing device has a display for displaying the processed information. Now, the display device is s'' to the eye-catcher, such as a liquid crystal display device, an organic group (electroluminescence) display device, and a plasma display device. To make such a flat panel display (FDP: Flat Panel)

’Play)裝置’進行種種步驟,基本上係使用平板 玻璃作,基板。於基板表面上形成絕緣層、彩色層、 偏光層等多數薄臈層,該基板係—面由搬送裝置裝 „ ’ 一面透過藥液塗佈步驟、洗淨步驟、乾 燥步驟等種種處理步 乂列把 起鹿1里 製造。因此,基板係對平 板顯4置之品質影響最大的零件之一。 a板列基板處理步驟通常與移送基板之 基板1达裝置有關而進行,因此,於基板 中,取重要的是以可維持基板之 : 密位置控制的方式操作。 k逮度及知 201001603 特別是,由於隨著平板顯示裝置之大型化(橫/ 縱寬度1870〜2200mm之第七代、2160〜2460mm以上 之第八、十代),基板亦大型化,因此,要求格外注 思' 基板的保管’特別是移送。 支持及移送基板之基板搬送裝置中的搬送用軸 的長度亦隨著基板之大型化而變長。一旦軸長度加 長,即有因軸本身重量、大型化基板之負載以及步 驟進行中供至基板上之處理液之喷射壓力及流量 等,而導致軸發生下垂變形,造成基板破損或變形 的可能性。又,若因軸下垂變形而降低直線前進性, 即有因軸本身旋轉時之振動等而損傷軸承等相關零 件的可能性。如此一來,步驟的精密度顯著減少, 基板的劣品率增加。 【發明内容】 本表月之目的在於提供適於大型基板搬送之! 2搬送裝置和方法、以及具有該裝置之基板處理言; 備。 本發明之另一目的在於提供可防止 搬送裝置和方法、以及具有該裝置之基:處 ::明之另一目的在於提供可防止 線别進性及同心度 基板搬送裝置和方法而適於大型基板搬送之 201001603 本發明欲解決之問題不限於此。 中具有通常知識者由以下記载可明確理解未提= 其他目的。 &久< 本各月提供搬送大型基板之基板搬送裝置 據本發明之—實施形態,基板搬送裝置包含:_: 軸;以及驅動部,係用以使前述-組軸旋轉。前述 一組轴包含:至少-第-袖,其具有第一長度 二二,係與前述第_軸位於同一平面上,具 述弟一長度短的裳-且总 第-軸位於同4::二及㈣’係與前述 _面上,具有較珂述第一長度短的 一一、又,則述第二軸位在相較於前述第一軸之另 一f更接近—端處,前述第三軸位在相較於前述第 一軸之一端更接近另一端處。 根據本發明之實施形態,前述驅動部包含 傳:二二係連結前述第一軸與前述第二軸以 動:傕於.至前述第一軸與前述第二軸之間;第二 ^ °卩,係連結前述第一軸與前述第三軸以傳 =力,前述第-轴與前述第三軸之間;以及】 "、糸提供旋轉力至前述第一動力傳輸部。 脫離美;Γ &月之實施㈣、’前述第—軸之兩端在 脫離基板搬送路# 與前述第三軸持;前述第二轴 之 ^在脫離基板搬送路徑之位置_ 轴承支持,另—. 曰 轴▼支彳、乃—^而在相當於基板搬送路徑之位置藉 201001603 根據本發明之實施形態,前述第二軸與前述第 二軸配置在同一直線上。又,前述第二軸與前述第 二軸父互配置’前述第二軸與前述第三轴隔離配置。 根據本發明之實施形態,前述第一長度較基板 之寬度長’前述第二長度與前述第三長度相等。 本發明提供用以製造平板顯示器之設備。基板 製造設備之特徵在於包含:腔室,係提供搬送基板 之空間;第~、二支持架,係平行於基板搬送方向 而設在前述腔室之搬送空間兩側;第三、四支持架, 係設在前述第一支持架與前述第二支持架之間;至 少/第一轴’係可旋轉地設於前述第一支持架及前 述第一支持架;第二軸,係可旋轉地設於前述第一 支持架及前述第三支持架;第三軸,係可旋轉地設 於前述第二支持架及前述第四支持架;以及驅動 部,係設於前述第一、二支持架之外側,具有用以 使前述第一轴、前述第二轴及前述第三軸旋轉之一 動力源。 根據本發明之實施形態,前述驅動部包含:第 一動力傳輪部,係連結前述第—軸與前述第二轴以 傳輸前述動力源之旋轉力至前述第一軸及前述第二 軸,第一動力傳輸部,係連結前述第一軸與前述第 三軸以傳輪前述第一軸之旋轉力於前述第三軸。 根據本發明之實施形態,前述第一軸、前述第 二軸及前述第三軸位於同一平面上。 201001603 月J述第二軸與前述第 别述第二軸與前述第 根據本發明之實施形態 三軸配置在同—直線上。 根據本發明之實施形態 三軸交互配置。 根據本發明之實施形態,前 三軸隔離配置。 31弟一軸與前述第 根據本發明之實施形態,前述第—The 'Play' device performs various steps, basically using a flat glass as a substrate. A plurality of thin layers such as an insulating layer, a color layer, and a polarizing layer are formed on the surface of the substrate, and the substrate is coated by a transport device, and the processing steps such as a chemical coating step, a washing step, and a drying step are performed. It is manufactured in the deer 1. Therefore, the substrate is one of the parts that have the greatest influence on the quality of the flat panel. The processing procedure of the panel substrate is usually performed in association with the substrate 1 on which the substrate is transferred, and therefore, in the substrate, It is important to operate in a manner that maintains the substrate: dense position control. k-catch and know 201001603 In particular, due to the enlargement of the flat panel display device (the seventh generation of the horizontal/vertical width of 1870 to 2200 mm, 2160~) In the eighth and tenth generation of 2460mm or more, the substrate is also increased in size. Therefore, it is required to pay special attention to the 'storage of the substrate', especially the transfer. The length of the transfer shaft in the substrate transfer device supporting and transferring the substrate also follows the substrate. Larger and longer. Once the length of the shaft is lengthened, there is a load due to the weight of the shaft itself, the load on the large-sized substrate, and the processing liquid supplied to the substrate during the step. The flow rate is caused by the sag of the shaft, which may cause damage or deformation of the substrate. Further, if the shaft is drooped and the linear advancement is reduced, there is a possibility that the bearing or the like may be damaged due to the vibration of the shaft itself. In this way, the precision of the step is remarkably reduced, and the inferior rate of the substrate is increased. [Summary of the Invention] The purpose of the present month is to provide a substrate suitable for large-sized substrate transfer. 2 Transfer device and method, and substrate having the same Another object of the present invention is to provide a transport preventing apparatus and method, and a base having the same: Another object of the present invention is to provide a substrate transporting apparatus and method capable of preventing linearity and concentricity However, the problem to be solved by the present invention is not limited to this. Those having ordinary knowledge can be clearly understood from the following descriptions. Other purposes. & Long < This month, a substrate for transporting a large substrate is provided. According to the embodiment of the present invention, the substrate transport apparatus includes: a shaft: and a driving unit for pivoting the aforementioned group The aforementioned set of axes includes: at least a - sleeve, which has a first length of two or two, which is located on the same plane as the aforementioned _axis, and has a short length of the skirt - and the total first axis is at the same 4 ::2 and (4) 'the same as the aforementioned _ face, having a shorter one than the first length, and the second axis is closer to the end than the other f of the first axis The third axial position is closer to the other end than the one end of the first shaft. According to the embodiment of the present invention, the driving portion includes: the second shaft is coupled to the first shaft and the second shaft to move Between the first axis and the second axis; the second axis is coupled to the first axis and the third axis to transmit a force, between the first axis and the third axis ; and ] ", 糸 provides a rotational force to the aforementioned first power transmission unit. Out of the United States; Γ & month implementation (four), 'the first two ends of the shaft are separated from the substrate transport path # and the third axis; the second axis is at the position away from the substrate transport path _ bearing support, another In the embodiment corresponding to the present invention, the second axis and the second axis are arranged on the same straight line. Further, the second axis and the second axis parent are disposed to each other. The second axis is disposed apart from the third axis. According to an embodiment of the present invention, the first length is longer than a width of the substrate. The second length is equal to the third length. The present invention provides an apparatus for manufacturing a flat panel display. The substrate manufacturing apparatus is characterized by comprising: a chamber for providing a space for transporting the substrate; and a first and second support frames disposed on opposite sides of the transport space of the chamber in parallel with the substrate transport direction; third and fourth support frames, And being disposed between the first support frame and the second support frame; at least/the first axis is rotatably disposed on the first support frame and the first support frame; and the second axis is rotatably disposed The first support frame and the third support frame; the third shaft is rotatably disposed on the second support frame and the fourth support frame; and the driving portion is disposed on the first and second support frames The outer side has a power source for rotating the first shaft, the second shaft, and the third shaft. According to an embodiment of the present invention, the driving unit includes: a first power transmission portion that connects the first shaft and the second shaft to transmit a rotational force of the power source to the first shaft and the second shaft, A power transmission unit connects the first shaft and the third shaft to transmit a rotational force of the first shaft to the third shaft. According to an embodiment of the present invention, the first axis, the second axis, and the third axis are located on the same plane. 201001603 The second axis of the month and the second axis of the second aspect are the same as the above-described embodiment. According to the embodiment of the present invention, the three axes are arranged on the same line. According to an embodiment of the present invention, a three-axis interactive configuration. According to an embodiment of the invention, the front three-axis isolation configuration. 31 brothers and the foregoing, according to an embodiment of the present invention, the aforementioned

述第三支持架之間隔、以及前述 前 第四支持架之間隔相等。 -支料與前述 方法供利用前述基板搬送裝置之基板搬送 鏟六、4运方法中’係自前述動力源提供旋 =!前述第一軸及前述第二軸,提供前述第 基之旋轉力而驅動前述第三軸,藉此搬送 又,本發明可將軸下垂變形最小化。 又’本發明可防止轴之直線前進性及同心度的 降低。 【實施方式】 以下茶考添附之第一圖至第七圖進一步詳細說 明本發明之實施形態。本發明之實施形態可變形成 各式各樣㈣恶’不得解釋為本發明之範圍限於後 述實施形ϋ。本實施形㈣為對該技㈣财具有 通常知識者更完整說明本發明而提供。因此,圖式 7 201001603 调更明確之說明而有一部分誇 中元件的形狀為強 張。 於本貫施形態中,基板係用以製造平板顯 I I I -.. _ 1 -* λ (fiatPanel display,以下稱「FDp」)元件者,卿 I為、LCD(液晶顯示器)、PDP(電漿顯示器)、VFD (真 螢光頦示益)、FED(場致發射顯示器)、ELD(電致 發光顯示器)。 、,,祀據本I明之—貫施形態之基板處理設備1可 適當用來進行對諸如玻璃基板之平板狀基板10之 處理v驟’例如钱刻、洗淨、剝離、顯影、沖洗等 參考第-圖至第三圖’基板處理設備】包含: 處理腔室進行對基板1G之處理步,驟,·以及基 板搬送裝置200,用以移送基板1〇。 基板處理步驟可於處理腔室100或處理槽内進 行。處理腔室100係例示性圖示者,可將與其類似 之處理腔室配置成—列。例如,可於基板10通過處 理腔室1GG移送期間依序進行諸如似彳、洗淨、剝 離、顯影等處理步驟丨、,Ώ 上 乂驟以及對所處理基板之洗淨步 驟、沖洗步驟、乾燥步驟等。處理腔t 1GG由四個 側壁112a〜112d構成’提供進行基板處理及基板搬 迗之空間。於處理腔室1 〇〇之侧壁112a、112c分別 設置基板ίο出入之入口 U4a及出口⑽。處理腔 室100包含:第一 支持架11 2、114,係以平行 201001603 於基板l 〇搬送方向而設於搬送空間兩側;以及第 二、四支持架116、118,係設於第一支持架112與 第二支持架114之間。前述第一、二、三、四支持 架112、114、116、118係支持基板搬送裝置2〇〇之 一組轴之構造物。 基板搬送裝置200設於處理腔室1〇〇。基板搬 达裝置200可包括_組軸、安裝於軸之多數滾輪2〇4 以及用以方疋轉一組轴之驅動部2 2 0。 一組軸包括第一轴212、第二轴214及第三軸 216。一組軸係沿—方向例如沿基板1〇之移送方向 平行排列,於各軸212、214、216上安裝有多數滾 輪204。滾輪204之安裝數量可隨著欲處理或移送 之基板10之大小進行變化。滾輪2 〇 4固定於軸212、 214、216上,滾輪2〇4亦藉由軸212、214、216之 旋轉一齊旋轉。因此,滾輪2〇4上之基板1〇藉由滾 輪2 0 4之旋轉沿一方向移送。 第一、二、三軸212、214、216之每一者藉配 置於處理腔室100内之第一、二、三、四支持架112、 114、116、118水平或略微傾斜地配置。第一、二、 二、四支持架112、114、116、118可包含用以使第 一 一轴212、214、216圓滑旋轉之種種形皞 之軸承120。 ^ 更具體加以說明,第一轴212藉軸承12〇可旋 轉地設於第一支持架112及第二支持架u4。第二 9 201001603 轴214與第一軸212位於同—平面上,具有較第— 軸212更短的長度。第二軸214藉軸承12〇可旋轉 地設於第一支持架112及第三支持架116。第三車I 216與第一軸212位於同—平面上,具有較第—軸 212更短並與第二軸214相等的長度。第三軸216 藉軸承12〇可旋轉地設於第四支持架118及第二支 持架114。第二軸214位在相較於第一軸212之另 一端更接近一端處,第三軸216位在相較於第一軸 212之一端更接近另一端處。而且’第二軸214及 第二轴216位於同一直線上。然而,如第四圖所示, 第一軸214及第三軸216亦可交互配置。第二軸214 及第—軸216雖然配置成相隔滾輪2 〇 4之安裝間距 的兩倍左右,第二軸214與第三軸216之間隔卻可 依第三支持架116與第四支持架118之安裝間隔, 位在更近或更遠處。 如第三圖所示,第一軸212係鄰接處理腔室ι〇0 之基板入口 114a而配置,第二、三軸214、216配 置於其後方。然而,第一、二、三軸212、214、216 之配置可作種種變更。第五A圖及第五B圖係顯示 第一、一、二軸212、214、216之種種配置構造之 圖式。如第五A圖所示,第一轴212可分別配置於 配置在中央之第一、二軸214、216的前方及後方。 或者’如第五β圖所示’第二、三軸214、216係鄰 接處理腔室1 〇〇之基板入口 1丨及基板出u 1} ΙΟ 201001603 側而配置The interval between the third support frame and the interval between the front and the fourth support frame are equal. - the support and the above method, in the substrate transfer shovel using the substrate transfer device, the method of providing the rotation of the first base from the power source by the first power source and the second axis The third shaft is driven to thereby convey, and the present invention minimizes sagging deformation of the shaft. Further, the present invention can prevent the linear advancement of the shaft and the reduction of the concentricity. [Embodiment] Embodiments of the present invention will be described in further detail in the following first to seventh drawings. The embodiments of the present invention may be modified to form various types of (four) evils. The scope of the present invention is not to be construed as being limited to the embodiments described below. This embodiment (4) is provided to more fully explain the present invention to those skilled in the art. Therefore, Figure 7 201001603 is more clearly stated and some of the components are exaggerated in shape. In the present embodiment, the substrate is used to manufacture a flat panel III-.. _ 1 -* λ (fiatPanel display, hereinafter referred to as "FDp") component, Qing I, LCD (liquid crystal display), PDP (plasma) Display), VFD (true fluorescent display), FED (field emission display), ELD (electroluminescent display). The substrate processing apparatus 1 according to the present invention can be suitably used for performing processing on a flat substrate 10 such as a glass substrate, such as money etching, washing, peeling, developing, rinsing, etc. The first to third drawings, the substrate processing apparatus, includes: a processing chamber for processing the substrate 1G, and a substrate transfer device 200 for transferring the substrate 1A. The substrate processing steps can be performed in the processing chamber 100 or in the processing tank. The processing chamber 100 is an exemplary illustration, and a processing chamber similar thereto can be arranged in a column. For example, the processing steps such as licking, washing, peeling, developing, etc. may be sequentially performed during the transfer of the substrate 10 through the processing chamber 1GG, the 乂 upper step, and the washing step, the rinsing step, and the drying of the processed substrate. Steps, etc. The processing chamber t 1GG is composed of four side walls 112a to 112d' providing space for substrate processing and substrate removal. The inlets U4a and the outlets (10) of the substrate ίο are respectively disposed in the side walls 112a, 112c of the processing chamber 1 . The processing chamber 100 includes: first support frames 11 2, 114, which are disposed on both sides of the transport space in parallel with the substrate 01 603 in the transport direction of the substrate; and second and fourth support frames 116, 118 are provided in the first support Between the frame 112 and the second support frame 114. The first, second, third, and fourth support frames 112, 114, 116, and 118 support a structure of a set of shafts of the substrate transfer device 2''. The substrate transfer device 200 is provided in the processing chamber 1A. The substrate carrying device 200 may include a set of shafts, a plurality of rollers 2〇4 mounted to the shaft, and a drive unit 2200 for rotating a set of shafts. The set of shafts includes a first shaft 212, a second shaft 214, and a third shaft 216. A plurality of shafts are arranged in parallel along the direction of, for example, the transfer direction of the substrate 1A, and a plurality of rollers 204 are mounted on the respective shafts 212, 214, and 216. The number of rollers 204 installed can vary depending on the size of the substrate 10 to be processed or transferred. The rollers 2 〇 4 are fixed to the shafts 212, 214, 216, and the rollers 2〇4 are also rotated together by the rotation of the shafts 212, 214, 216. Therefore, the substrate 1 on the roller 2〇4 is transferred in one direction by the rotation of the roller 220. Each of the first, second, and third axes 212, 214, 216 is configured to be placed horizontally or slightly obliquely by the first, second, third, and fourth support frames 112, 114, 116, 118 disposed within the processing chamber 100. The first, second, second, and fourth support brackets 112, 114, 116, 118 may include bearings 120 of various shapes for smoothly rotating the first shafts 212, 214, 216. More specifically, the first shaft 212 is rotatably disposed on the first support frame 112 and the second support frame u4 by bearings 12 . The second 9 201001603 shaft 214 is located on the same plane as the first shaft 212 and has a shorter length than the first shaft 212. The second shaft 214 is rotatably disposed on the first support frame 112 and the third support frame 116 by bearings 12. The third vehicle I 216 is located on the same plane as the first shaft 212 and has a shorter length than the first shaft 212 and is equal to the length of the second shaft 214. The third shaft 216 is rotatably disposed on the fourth support frame 118 and the second support frame 114 by bearings 12 。. The second shaft 214 is located closer to the other end than the other end of the first shaft 212, and the third shaft 216 is located closer to the other end than one end of the first shaft 212. Further, the second shaft 214 and the second shaft 216 are located on the same straight line. However, as shown in the fourth figure, the first shaft 214 and the third shaft 216 may also be alternately arranged. The second shaft 214 and the first shaft 216 are disposed to be about twice the installation pitch of the roller 2 〇 4, and the second shaft 214 and the third shaft 216 are spaced apart from each other by the third support frame 116 and the fourth support frame 118. The installation interval is located closer or further. As shown in the third figure, the first shaft 212 is disposed adjacent to the substrate inlet 114a of the processing chamber ι0, and the second and third shafts 214, 216 are disposed rearward. However, the configuration of the first, second, and third axes 212, 214, and 216 can be variously changed. The fifth A diagram and the fifth B diagram show the various configurations of the first, first, and second axes 212, 214, and 216. As shown in Fig. AA, the first shafts 212 are respectively disposed in front of and behind the first and second shafts 214 and 216 disposed at the center. Or 'as shown in the fifth β-graph, the second and third axes 214 and 216 are arranged adjacent to the substrate inlet 1丨 of the processing chamber 1 and the substrate exit u 1} ΙΟ 201001603 side.

於其間配置第一軸212。如此,可進行 二轴212、214、216之種種配置。 驅動部220包含:動力源222,用以產生旋轉 ,以及弟-、二動力傳輸部23Q、24q,係將動力 源222之旋轉力傳輸至第一、二、三軸2丨2、Μι 216。動力源222係產生旋轉力(動力)之部分,可使 =以電力操作之電動機,或將化學能轉換成機械運The first shaft 212 is disposed therebetween. In this way, various configurations of the two axes 212, 214, and 216 can be performed. The driving unit 220 includes a power source 222 for generating rotation, and the second and second power transmission portions 23Q and 24q for transmitting the rotational force of the power source 222 to the first, second, and third axes 2, 2, and 216. The power source 222 is part of the rotational force (power) that can be used to operate a motor with electricity or convert chemical energy into mechanical transport.

弟―、二動力傳輸部230、240為了將藉動力源 222所產生之旋轉力傳輸至第一、二、三軸Μ?、 214、216,可以多種形式構成。例如,第一、二動 :傳:部230、240可藉齒輪之組合、或定時皮帶與 多數帶輪、或磁鐵之非接觸方式等具體實現。The second and second power transmission units 230 and 240 can be configured in various forms in order to transmit the rotational force generated by the power source 222 to the first, second, and third axes, 214, and 216. For example, the first and second movements: the transmission parts 230, 240 can be realized by a combination of gears, or a non-contact manner of a timing belt and a plurality of pulleys, or magnets.

第—動力傳輸部23〇包括:第一驅動軸23 連結於動力源1第一齒請,設於第動: 232,以及第二齒輪236,設在第一轴212及第二轴 214之一端,俾與第一齒輪234嚙合。 …第二動力傳輸部24〇包含:第三齒輪242,設 於$ 一轴212之另一端及第三軸216之另一端;以 及第二驅動軸246,其設有第四齒輪244以與第一 、12及苐—軸216之第三齒輪242喷合。可使用 磁式齒輪作為用於第一、二動力傳輸部230、240之 w輪雖然’一般而言’齒輪意指藉由輪齒嚙合將 動力傳輸至另一軸的構造,不過,在使用磁式齒輪 201001603 的情況下,可不直接从 茲說明具有 w輛之輪齒即可傳輸動力。 置之動作,笋由“处構成之驅動部之基板搬送裝 轉’而設於第-驅動轴232 ^一‘驅動袖232即旋 ., Μ之第一食輪234方舍M, 依此,與第—齒輪2 人 口铷紋轉 轉。第二齒之弟二齒輪236 —齊旋 ,“輪236之旋轉使第—軸 同時旋轉。另—方面,第及第-軸214 一軸212之Mm 軸212之旋轉經由與第 弟二回輪242嚙合之第齒 第二驅動車由246旋轉,盥此門…4 244而使 2則合之第三轴^之第此问;:’經由與第四齒輪 ㈣轉。轴216之弟二嵩輪撕,第三轴216 亦P動力源222之旋轉力經由第— 部230使第—、二軸m、2U旋轉輸 旋轉=第二動力傳輪部240使第三軸216旋轉之 批苐/、圖係顯不第一、二動力傳輸部由定時皮* 及帶輪方式構成之驅動部之圖式。 π 如第六圖所示,第一動力傳輸部23〇&包 -帶輪233,其係與第一軸212之一端結人 帶輪235,其係與第二軸214之一端結合口以 帶237’係與鄰接之諸帶輪連結而傳輸旋轉力。土 力源2 2 2之旋轉軸與結合於第一軸212之—山 —帶輪233連結,提供旋轉力。 ~之第 第二動力傳輸部24〇a雖由大致類似於第— 力傳輸部230a之構造構成,惟包含:第三帶輪μ/ 12 201001603 係與第一轴 與第三 ^之另—端結合;第四帶輪245,係 接之諸帶丛之端結合,以及皮帶247,係與鄰 j咿輪連結而傳輸旋轉力。 磁式::::::說明以非接觸方式傳輸旋轉力之 輸旋轉力:C軸:動力傳輸部包括用以傳 262。驅動轴 及第二軸214之複數驅動軸 之一端$ pf 之、部與第一轴212及第二轴214 置,著處理腔室⑽之隔壁ii9對向配 動力傳輸構有以非接觸方式傳輸旋轉力之磁式 有相料^件。各磁式動力傳輸構件264内裝 次 於其中心呈放射狀配置之多數永久磁鐵,永 方Ml L磁式動力傳輸構件264之圓周 二Γ 上述,旋轉力自動力源、222,經由齒 :2=_時皮帶及帶輪)、驅動轴262及 =動力傳輸構件264傳輸至第—軸212及第二轴 ώ i 4 〇 =動—力傳輸部270包含:第一驅動轴272, 7 212 ㈣:::273,係自旋轉軸274將旋轉力傳 於第-㈣之另-端:第 第一、二驅動軸272、273之一浐另令而以及 -、二驅動軸^間二 k力傳輸係|皆由齒輪 201001603 方式進行。 由於上述基板搬送裝置2〇〇係比基板〗〇之寬度 狹窄之第二、三軸2H、216較比基板1〇之寬度寬 之第—軸212更靠近中心而搬送基板1〇,因此^即 使基板10大型化,仍可使基板]〇之下垂最小化, 特別是可防止因第一、二、三軸2]2、2】4、216之 下垂變化而發生之直線前進性、同心度的降低。又 由於本發明之基板搬送裝置2G()係、以單—驅動源所 產生之旋轉力使第一軸以2及第二軸214旋轉,又 經由長軸之第一軸212使苐三軸2i6旋轉,因此, 在使用二個驅動源的情況下,可消除 :源俾第二、三则,以相等旋轉力旋轉= 以上所述僅為本發明之較佳可行實施例,非因 此m艮本發明之專利保護範圍’故舉凡運用本 說明書及圖式内容所為之等效技術變化,均包:於 本發明之權利保護範圍内,合予陳明。 、 圖式簡單說明] 第-圖係顯示本發明基板處理設備 第二圖係第一圖所干其 u 圖 。 $㈣不基板處理設備之侧剖視 第三圖係第一圖所示其此老 一 .不基板處理設備之立體圖。 第四圖係顯示交互配置之 — 弟一軸及弟三軸之圖 14 201001603 式。 第五A圖係顯示第一、二、三軸之種種配置構 造之圖式。 種種配置構 弟五β圖係顯示第一、二、三軸之 造之圖式。 第,、圖係顯示第一、二動力傳輸部 及帶輪方式播士― 由疋化皮帶 式構成之驅動部之圖式。 第七圖係用來說明以非接 磁式驅動部之圖式。 安啁方式傳輪旋轉力之 【主要元件符號說明】 1 基板處理設備 10 基板 100處理腔室 112a〜112d側壁 114a 入口 114b 出口 112第一支持架 114第二支持架 116第三支持架 118第四支持架 119隔壁 120轴承 200基板搬送裝置 204滾輪 201001603 212第一轴 214 第二轴 216 第三軸 220驅動部 222動力源 230第一動力傳輸部 232 第一驅動軸 234第一齒輪 236第二齒輪 230a第一動力傳輸部 233第一帶輪 235第二帶輪 237皮帶 240第二動力傳輸部 242第三齒輪 244第四齒輪 246 第二驅動轴 240a第二動力傳輸部 243第三帶輪 245第四帶輪 247皮帶 260第一動力傳輸部 262複數驅動軸 264磁式動力傳輸構件 265齒輪 270第二動力傳輸部 201001603 272 第一驅動轴 273 第二驅動轴 274旋轉軸 275磁式動力傳輸構件 17The first power transmission unit 23 includes a first drive shaft 23 coupled to the first gear of the power source 1, a first motion: 232, and a second gear 236 disposed at one end of the first shaft 212 and the second shaft 214. , the 俾 meshes with the first gear 234. The second power transmission portion 24 includes: a third gear 242 disposed at the other end of the one shaft 212 and the other end of the third shaft 216; and a second drive shaft 246 provided with the fourth gear 244 to The third gear 242 of the first, second and second shafts 216 is sprayed. A magnetic gear can be used as the w wheel for the first and second power transmission portions 230, 240. Although the 'generally' gear means a configuration for transmitting power to another shaft by tooth engagement, however, in the use of a magnetic type In the case of gear 201001603, the power can be transmitted without directly indicating the teeth having w wheels. In the action, the bamboo shoots are set on the first drive shaft 232 ^ a drive sleeve 232, which is rotated by the "substrate transfer drive" of the drive unit, and the first food wheel 234 square M, according to this, The tweeting of the population of the first gear 2 is reversed. The second gear 236 of the second tooth is aligned, "the rotation of the wheel 236 causes the first axis to rotate at the same time. On the other hand, the rotation of the Mm axis 212 of the first and second shafts 212 of the first shaft 212 is rotated by the second driving vehicle 246 which is meshed with the second wheel 242, and the door is ... 244 and the two are combined. The third axis ^ is the first question;: 'via the fourth gear (four) turn. The second shaft 216 is also twisted by the second wheel 216, and the rotational force of the power source 222 of the third shaft 216 is rotated by the first portion 230 to rotate the first, second, and second axes, and the second power transmission portion 240 is used to make the third shaft. 216 rotating batch 苐 /, the system shows the first and second power transmission parts by the timing of the skin * and the pulley mode of the drive part of the diagram. π, as shown in the sixth figure, the first power transmission portion 23 〇 & package-pulley 233, which is coupled to one end of the first shaft 212 to form a pulley 235 which is coupled to one end of the second shaft 214 The belt 237' is coupled to the adjacent pulleys to transmit a rotational force. The rotating shaft of the earth source 2 2 2 is coupled to the mountain-belt 233 coupled to the first shaft 212 to provide a rotational force. The second power transmission portion 24A is configured by a structure substantially similar to the first force transmission portion 230a, but includes: the third pulley μ/ 12 201001603 is coupled to the first shaft and the third end The fourth pulley 245, the end of the banded straps, and the belt 247 are coupled to the adjacent j-wheel to transmit the rotational force. Magnetic:::::: Describes the rotational force that transmits the rotational force in a non-contact manner: C-axis: The power transmission section is included to transmit 262. The drive shaft and the second shaft 214 are connected to the first shaft 212 and the second shaft 214 at one end of the plurality of drive shafts, and the partition wall ii9 of the processing chamber (10) is transmitted in a non-contact manner. The magnetic type of the rotating force has a phase material. Each of the magnetic power transmission members 264 is mounted in a plurality of permanent magnets arranged radially below the center thereof, and the circumference of the permanent Ml L magnetic power transmission member 264 is the same as above. The rotational force automatic force source, 222, via the teeth: 2 When the belt is belted, the drive shaft 262 and the power transmission member 264 are transmitted to the first shaft 212 and the second shaft ώ i 4 〇 = the dynamic force transmission portion 270 includes: the first drive shaft 272, 7 212 (4) ::: 273, the rotation axis 274 transmits the rotational force to the other end of the - (4): one of the first and second drive shafts 272, 273, and - and the two drive shafts. The transmission system is performed by the gear 201001603. Since the second and third axes 2H and 216 of the substrate transfer apparatus 2 having a narrower width than the substrate are transported closer to the center than the first axis 212 having a wider width than the substrate 1 , the substrate 1 is transported. When the substrate 10 is enlarged, the substrate can be minimized, and in particular, the linear advancement and concentricity of the first, second, and third axes 2, 2, 2, 4, and 216 can be prevented. reduce. Further, in the substrate transfer apparatus 2G() of the present invention, the first shaft is rotated by the second shaft 214 by the rotational force generated by the single-drive source, and the third shaft 2i6 is made via the first shaft 212 of the long axis. Rotation, therefore, in the case of using two drive sources, it can be eliminated: source 俾 second, third, rotate with equal rotational force = the above is only a preferred possible embodiment of the present invention, not 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 BRIEF DESCRIPTION OF THE DRAWINGS The first figure shows the substrate processing apparatus of the present invention. The second figure is the first figure of the system. $ (4) Side section of the substrate processing equipment The third figure is the first picture shown in the first figure. A perspective view of the substrate processing equipment. The fourth figure shows the interactive configuration of the brother-axis and the three-axis diagram 14 201001603. The fifth A diagram shows a layout of various configurations of the first, second, and third axes. The various configurations of the five-figure system show the patterns of the first, second, and third axes. First, the figure shows the first and second power transmission sections and the pulley-type broadcaster - the diagram of the drive section composed of the braided belt type. The seventh figure is for explaining the diagram of the non-magnetic driving portion. Ampoule mode transmission wheel rotation force [main component symbol description] 1 substrate processing apparatus 10 substrate 100 processing chambers 112a to 112d side wall 114a inlet 114b outlet 112 first support frame 114 second support frame 116 third support frame 118 fourth Support frame 119 partition 120 bearing 200 substrate transfer device 204 roller 201001603 212 first shaft 214 second shaft 216 third shaft 220 drive portion 222 power source 230 first power transmission portion 232 first drive shaft 234 first gear 236 second gear 230a first power transmission portion 233 first pulley 235 second pulley 237 belt 240 second power transmission portion 242 third gear 244 fourth gear 246 second drive shaft 240a second power transmission portion 243 third pulley 245 Four pulley 247 belt 260 first power transmission portion 262 plural drive shaft 264 magnetic power transmission member 265 gear 270 second power transmission portion 201001603 272 first drive shaft 273 second drive shaft 274 rotation shaft 275 magnetic power transmission member 17

Claims (1)

201001603 七、申請專利範圍: 1、一種基板搬送裝置,包含· 一組轴;以及 ,動部,用以使前述一組軸旋轉,又 前述一組軸包含: 至少一第一軸,其具有第—長声. 系與前述第一軸位於二平面上,具有較 弟長度紐的第二長度;以及 第三軸,係與前述第一軸位於 前述第-長度短的第三長度,又 +面上,具有較 則述苐二軸位在相較於前 — 近-端處,前述第三軸位在相較二』之二—端更接 接近另1處。 奴於别述弟一軸之一端更 盆中ttl請專利範圍第1項所述之基板搬送裝置, 兵甲則述驅動部包含: < 衣直 第動力傳輸部,係連結前述第__ 14、+. # . 以傳輸旋轉力$义、+、~ 乩弟軸與刖述弟二軸 第= 弟一軸與前述第二軸之間; 以傳輸:耪/專輸部’係連結前述第-軸與前述第三軸 i與前述第三輛之間;以及 q :、由係提供旋轉力至前述第一動力傳輸部。 3、如申請專利範圍笛 置,其中前述第—軸二1或2項所述之基板搬送裝 藉軸承支持;釉之兩知在脫離基板搬送路徑之位置 三軸之一端在脫離基板搬送 —端在相當於基板搬送路徑 月ί述第二軸與前述第 路徑之位置藉輛承支持,另 之位置藉軸承支持。 18 201001603 4、如申請專利範圍 置,其中前述第二二二? 2項所述之基板搬送裝 上。 釉與則述苐三軸係配置在同一直線 置 ^二申二專利範圍第1或2項所述之基板搬送裝 ’、θ处弟—軸與前述第三軸係交互配置。 置 專利範㈣1或2項所述之基板搬送裝 '、刚込第一軸與前述第三軸係隔離配置。 置 :二申、t專利範圍第1或2項所述之基板搬送裝 ,、中刚述第一長度較基板之寬度長。 置 8、 匕申請專利範圍第工或2項所述之基板搬送裴 其中别述第二長度與前述第三長度相等。 9、 一種用以製造平板顯示器之設備,其包含: 腔室’係提供搬送基板之空間; 弟一、一支持架,係與基板搬送方向平行地設在前 述腔室之搬送空間兩侧; 第三、四支持架,係設在前述第一支持架與第二支 持架之間; 至少一第一軸,係可旋轉地設於前述第一支持架及 前述第二支持架; 第二軸,係可旋轉地設於前述第一支持架及前述第 三支持架之間; 第三軸,係可旋轉地設於前述第二支持架及前述第 四支持架,以及 驅動部,係設於前述第一、一支持架之外側,具有 用以使前述第一轴、前述第二軸及别述第三軸旋轉之一 動力源 19 201001603 1。〇、如申請專利範圍第9項所述之 -、不設備,其中前述驅動部包括: -造平板 以傳前述第1與前述第二轴 轴;動力权_力至前述第1及前述= π =〜動力傳輸部’係連結前述第一轴遍& 以傳輸前述第-轴之旋轉力於前述第三:與,述第三轴 1 1、如申請專利範圍第g或1〇項所 造平板顯示器之設備,其 &、斤述之用以製 前述第三軸係位於同一平中面:边弟-轴、前述第二轴及 1 2、如申請專利範圍第9或丄 造平板顯示器之設備,其中 、厅处之用以製 配置在同-直線上。“弟-轴與前述第三軸係 1 3、如申請專利範圍第9或丄〇項 造平板顯示器之設備,其中前、+、& ^ t、汀处之用以製 交互配置。 '中爾-軸與前述第三轴係 1 4、如申請專利範圍第9或丄〇項 造平板顯示器之設備,其中前、+、$ _ 、、之用以製 隔離配置。 巾…-轴與前述第三軸係 1 5、如中請專利範圍第9或1 〇項所述之用 造平板顯^之設備,其中前述第-支持架盥前述第 支持架之;隔、以及前述第二支持架與前述第四 尤間隔相等。 寻木 1 6、種基板搬⑨方法,係使用巾請專利範圍 工項所述之基板搬达裝置者,該方法係藉由:前述第— 軸及前述弟-軸係自耵述動力源提供旋轉力而受驅 20 201001603 動,前述第三軸係受提供由前述第一轴所提供之旋轉力 而驅動,以搬送基板。 21201001603 VII. Patent application scope: 1. A substrate conveying device comprising: a set of shafts; and a moving portion for rotating the set of axes, wherein the set of axes comprises: at least one first axis having a first a long sound. The first length is on a second plane and has a second length that is longer than the first length; and the third axis is a third length that is shorter than the first length of the first axis, and is + face In the above, the second axis position is closer to the other end than the front-near end of the second axis. In the case of one of the other axes of the other hand, the substrate transfer device described in the first paragraph of the patent range, the armor of the armor, includes: < the clothing direct transmission unit, which links the aforementioned __14, +. # . to transmit the rotational force $ 义, +, ~ 乩 轴 刖 刖 刖 刖 刖 二 二 二 = = = = = = = = = = ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; And the third axis i and the third vehicle; and q:, providing a rotational force to the first power transmission portion. 3. If the patent application range is set, the substrate conveyance bearing support described in the above-mentioned first-axis two or two items is supported; the two sides of the glaze are separated from the substrate at the one end of the three-axis position away from the substrate transport path. In the position corresponding to the substrate transport path, the second axis and the first path are supported by the support, and the other position is supported by the bearing. 18 201001603 4. If the scope of application for patents is set, what is the second and second two? The substrate transfer described in item 2 is carried out. The glaze is arranged in the same line as the triaxial system. The substrate transfer device ’, θ at the θ, and the third axis are alternately arranged. The substrate transfer device ', the first axis of the rigid raft, and the third axis are disposed in isolation from each other. In the substrate transfer apparatus described in the first or second aspect of the patent application, the first length is longer than the width of the substrate. 8. The substrate transfer method described in the Patent Application No. 2 or Item 2, wherein the second length is equal to the third length. 9. A device for manufacturing a flat panel display, comprising: a chamber that provides a space for transporting a substrate; and a support frame that is disposed on both sides of the transport space of the chamber in parallel with the substrate transport direction; The third support frame is disposed between the first support frame and the second support frame; at least one first axis is rotatably disposed on the first support frame and the second support frame; the second axis, The first shaft is rotatably disposed between the first support frame and the third support frame; the third shaft is rotatably disposed on the second support frame and the fourth support frame, and the driving portion is disposed on the foregoing The first side of the first support frame has a power source 19 201001603 1 for rotating the first axis, the second axis and the third axis. 〇 如 如 如 如 如 如 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述 前述= 动力 power transmission unit ′ is connected to the first axis traverse & to transmit the rotational force of the first-axis to the third: and the third axis 1 1 , as in the g- or g A device for a flat panel display, wherein the third axis system is located on the same flat surface: the brother-axis, the second axis, and the second, or the flat panel display. The equipment, in which the hall is used to make the configuration on the same line. "Different-axis and the aforementioned third-axis system 13, as in the device of claim 9 or the device for manufacturing a flat panel display, wherein the front, +, & ^ t, Ting is used for interactive configuration. - The shaft and the aforementioned third shaft system 1 4, as in the device of claim 9 or the apparatus for manufacturing a flat panel display, wherein the front, +, $ _ , , are used for the isolation configuration. The apparatus for slab display according to the above-mentioned first-support frame, the foregoing first support frame, the second support frame, and the second support frame It is equal to the fourth interval. The method of finding the wood is to use the substrate transfer method according to the patent scope project. The method is: the first axis and the aforementioned brother- The shaft system is driven by a rotational power generated by the power source, and the third shaft is driven by the rotational force provided by the first shaft to transport the substrate.
TW098118728A 2008-06-12 2009-06-05 Substrate transfer apparatus and method, and a substrate manufacturing apparatus having the same TWI415210B (en)

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