JP2007153542A - Substrate carrying device and substrate drying device - Google Patents

Substrate carrying device and substrate drying device Download PDF

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JP2007153542A
JP2007153542A JP2005351891A JP2005351891A JP2007153542A JP 2007153542 A JP2007153542 A JP 2007153542A JP 2005351891 A JP2005351891 A JP 2005351891A JP 2005351891 A JP2005351891 A JP 2005351891A JP 2007153542 A JP2007153542 A JP 2007153542A
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substrate
magnetic member
transport
magnetic
roller
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Satoshi Yamamoto
悟史 山本
Yoshihiro Ogawa
喜博 小川
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Dainippon Screen Manufacturing Co Ltd
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Dainippon Screen Manufacturing Co Ltd
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<P>PROBLEM TO BE SOLVED: To stably carry a substrate without generating particles being the cause of substrate pollution. <P>SOLUTION: This device has a plurality of carrier rollers 18 having a roller part 181 supporting the substrate W, a rotary shaft 182 and a first magnetic member 11 arranged on one end side of the rotary shaft 182, a first support part 101 rotatably supporting the other end side of the rotary shaft 182 of the respective carrier rollers 18, a second support part 102 arranging a second magnetic member 13 of the same polarity as the first magnetic member 11 in a position opposed to the first magnetic member 11 and journaling the one end side of the rotary shaft 182 of the respective carrier rollers 18 arranged near the center of the substrate in the direction orthogonal to the substrate carrying direction by resiliency between the first magnetic member 11 and the second magnetic member 13, and a driving motor. The carrier rollers 18 are supported by the first support part 101 and the second support pat 102, and are arranged at a specific interval to the adjacent carrier rollers 18. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、並設された複数の搬送ローラにより基板を搬送する基板搬送装置及び当該基板搬送装置を備えた基板乾燥装置に関する。   The present invention relates to a substrate transport apparatus that transports a substrate by a plurality of transport rollers arranged in parallel, and a substrate drying apparatus including the substrate transport apparatus.

従来、並設された複数の搬送ローラにより基板を搬送する基板搬送装置として、下記特許文献１に示されるように、基板搬送方向に直交する方向に延びる回転軸を有する複数の片持ち式の搬送ローラが、同方向における基板両端部位置に、隣り合う搬送ローラと一定間隔を空けて配置されたものが知られている。この基板搬送装置によれば、基板両端部の下面側に接する上記片持ち式の搬送ローラが回転することで、基板が当該複数の搬送ローラ上を次々と移動して基板が搬送される。
実開平６−５９７９４号公報 Conventionally, as a substrate transport apparatus that transports a substrate by a plurality of transport rollers arranged in parallel, as shown in Patent Document 1 below, a plurality of cantilevered transports having a rotation axis extending in a direction orthogonal to the substrate transport direction It is known that rollers are disposed at both end positions of the substrate in the same direction with a certain distance from adjacent conveyance rollers. According to this substrate transport apparatus, the cantilevered transport roller in contact with the lower surface side of both ends of the substrate rotates, so that the substrate moves one after another on the plurality of transport rollers and the substrate is transported.
Japanese Utility Model Publication No. 6-59794

しかし、上記特許文献１に示される基板搬送装置は、上記片持ち式の搬送ローラの回転軸の一方端はベアリングにより支持されているが、他方端側は支持されていない。そのため、当該片持ち式の搬送ローラにより基板を支持すると、支持されていない回転軸の端部には基板の重さによる下向きの負荷がかかる。その結果、ベアリングで支持されている側の端部には上向きの負荷がかかることになり、搬送ローラの回転動作に支障をきたしたり、ベアリングの故障の原因になるという問題を生じる。   However, in the substrate transport apparatus disclosed in Patent Document 1, one end of the rotating shaft of the cantilevered transport roller is supported by a bearing, but the other end is not supported. For this reason, when the substrate is supported by the cantilevered conveyance roller, a downward load due to the weight of the substrate is applied to the end portion of the unsupported rotating shaft. As a result, an upward load is applied to the end portion supported by the bearing, which causes a problem that the rotation operation of the transport roller is hindered or the bearing is damaged.

また、上記問題を解決するために、回転軸の両端部をいずれもベアリングで回転自在に支持する構成の採用が考えられるが、この場合、搬送される基板の裏面となる位置にも、回転軸支持用のベアリングが配置されることになるため、当該ベアリングから発生するパーティクルが基板に付着して基板を汚染する可能性がある。   In order to solve the above problem, it is possible to adopt a configuration in which both end portions of the rotating shaft are rotatably supported by bearings. In this case, the rotating shaft is also disposed at the position on the back surface of the substrate to be transported. Since the supporting bearing is disposed, particles generated from the bearing may adhere to the substrate and contaminate the substrate.

本発明は、上記の問題を解決するためになされたもので、基板汚染の原因となるパーティクルを発生させることなく、基板を安定して搬送できるようにすることを目的とするものである。   The present invention has been made to solve the above-described problem, and an object of the present invention is to enable a substrate to be stably transported without generating particles that cause substrate contamination.

本発明の請求項１に記載の発明は、搬送の対象となる基板を支持するローラ部と、前記ローラ部の中心を貫通して前記ローラ部に固定された回転軸と、前記回転軸の一方端側に設けられた第１磁気部材とを有する複数の搬送ローラと、
前記各搬送ローラの回転軸の他方端側を回転自在に支持する第１支持手段と、
前記第１磁気部材との対向面が同一極性とされ、前記第１磁気部材に対して少なくとも下方側から対向する第２磁気部材が設けられ、基板搬送方向に直交する方向における基板の中央寄りに配置された前記各搬送ローラの回転軸の前記一方端側を、前記第１磁気部材と第２磁気部材との間の反発力により回転自在に支持する第２支持手段と、
前記複数の搬送ローラの回転軸の他方端側に回転駆動力を供給する回転駆動手段とを備え、
前記搬送ローラは、前記基板搬送方向に直交する方向における基板両端部位置に配設され、隣り合う搬送ローラとは基板搬送方向に一定間隔を空けて配置されている基板搬送装置である。 According to a first aspect of the present invention, there is provided a roller portion that supports a substrate to be transported, a rotation shaft that passes through the center of the roller portion and is fixed to the roller portion, and one of the rotation shafts. A plurality of transport rollers having a first magnetic member provided on an end side;
First support means for rotatably supporting the other end side of the rotation shaft of each of the transport rollers;
The opposing surface to the first magnetic member has the same polarity, and a second magnetic member that is opposed to the first magnetic member from at least the lower side is provided, closer to the center of the substrate in a direction orthogonal to the substrate transport direction. Second support means for rotatably supporting the one end side of the rotation shaft of each of the transport rollers arranged by a repulsive force between the first magnetic member and the second magnetic member;
Rotation drive means for supplying a rotation drive force to the other end side of the rotation shafts of the plurality of transport rollers,
The transport rollers are substrate transport devices that are disposed at both end positions of the substrate in a direction orthogonal to the substrate transport direction, and adjacent transport rollers are disposed at a predetermined interval in the substrate transport direction.

この構成の場合、搬送ローラが基板を搬送するときに、基板の重さによる下向きの負荷が、基板の中央寄りの搬送ローラ回転軸端部に加わっても、この回転軸端部は第２支持手段に支持されているので、第１支持手段に支持された側の回転軸端部には上向きの負荷が加わらない。そのため、第１支持手段に支持された搬送ローラの回転動作に、上向きの負荷による支障が生じることがなく、第１支持手段で回転軸を支持する部分、例えばベアリング等が故障するという問題が生じない。   In this configuration, when the transport roller transports the substrate, even if a downward load due to the weight of the substrate is applied to the transport roller rotation shaft end near the center of the substrate, the rotation shaft end is the second support. Since it is supported by the means, no upward load is applied to the end of the rotary shaft supported by the first support means. Therefore, there is no problem due to the upward load in the rotation operation of the conveying roller supported by the first support means, and there is a problem that a part supporting the rotating shaft by the first support means, such as a bearing, breaks down. Absent.

また、上記第２支持手段による各搬送ローラの上記基板中央寄りの回転軸端部の支持は、第１磁気部材と第２磁気部材との間に発生する反発力を利用して非接触で行われるため、回転軸と第２支持手段の間で摩擦が生じることがなく、回転軸端部をベアリング等で支持する場合のようにパーティクルが発生することがない。   The second support means supports the end of the rotation shaft near the center of the substrate of each transport roller in a non-contact manner using a repulsive force generated between the first magnetic member and the second magnetic member. Therefore, there is no friction between the rotating shaft and the second support means, and no particles are generated unlike the case where the rotating shaft end is supported by a bearing or the like.

また、請求項２に記載の発明は、請求項１に記載の基板搬送装置であって、前記第２支持手段の前記第２磁気部材は、前記第１磁気部材の全周を覆うように設けられているものである。   The invention according to claim 2 is the substrate transfer apparatus according to claim 1, wherein the second magnetic member of the second support means is provided so as to cover the entire circumference of the first magnetic member. It is what has been.

この構成によれば、搬送ローラの回転軸端部に設けられている第１磁気部材の全周を、第２支持手段の第２磁気部材が覆うので、搬送ローラの回転軸端部は、第２支持手段によって、上下左右全ての方向において磁気による反発力で支持され、第２支持手段により安定した状態で支持される。   According to this configuration, since the second magnetic member of the second support means covers the entire circumference of the first magnetic member provided at the rotation shaft end of the transport roller, the rotation shaft end of the transport roller is The two support means are supported by the repulsive force by magnetism in all directions, up and down, left and right, and are supported in a stable state by the second support means.

また、請求項３に記載の発明は、請求項２に記載の基板搬送装置であって、前記第２磁気部材は、前記第１磁気部材に上方側から対向する上部部材と、当該上部部材とは別個の部材とされ、前記第１磁気部材に下方側から対向する下部部材とを有し、これら上部部材及び下部部材は、一方の部材が他方の部材に取り付けられて前記第１磁気部材の全周を覆う状態となり、一方の部材の他方の部材に対する取付位置を可変させることで当該両部材の間隔が変更されるものである。   Moreover, invention of Claim 3 is a board | substrate conveyance apparatus of Claim 2, Comprising: The said 2nd magnetic member is an upper member facing the said 1st magnetic member from the upper side, The said upper member, Is a separate member, and has a lower member facing the first magnetic member from the lower side, and the upper member and the lower member are attached to the other member of the first magnetic member. The entire circumference is covered, and the distance between the two members is changed by changing the mounting position of one member with respect to the other member.

この構成によれば、第２磁気部材をなす上部部材及び下部部材によって、第１磁気部材の全周を覆う状態となり、一方の部材の他方の部材に対する取付位置を可変させることで当該両部材の間隔が変更されるので、搬送ローラの回転軸の径や、第１及び第２磁気部材のそれぞれの磁気力、或いは基板搬送時に搬送ローラにかかる負荷等に応じて、第２磁気部材と第１磁気部材との間に発生する反発力を上記各種条件に応じて調整することができる。   According to this configuration, the upper member and the lower member constituting the second magnetic member are in a state of covering the entire circumference of the first magnetic member, and by changing the mounting position of one member with respect to the other member, Since the interval is changed, the second magnetic member and the first magnetic member are coupled with each other in accordance with the diameter of the rotation shaft of the transport roller, the magnetic force of each of the first and second magnetic members, or the load applied to the transport roller during substrate transport. The repulsive force generated between the magnetic member and the magnetic member can be adjusted according to the various conditions.

また、請求項４に記載の発明は、請求項１乃至請求項３のいずれかに記載の基板搬送装置と、
前記搬送ローラによって搬送される基板に対して気体を噴射する気体噴射手段とを備える基板乾燥装置である。 The invention according to claim 4 is a substrate transfer apparatus according to any one of claims 1 to 3,
A substrate drying apparatus comprising: gas injection means for injecting gas to the substrate conveyed by the conveyance roller.

気体噴射手段によって基板表面に気体を噴射した処理を行う場合、基板周囲に気流が発生するため、パーティクル発生を軽減及び防止して基板処理面に悪影響を及ぼさないようにすることが重要になるが、上記構成によれば、基板搬送時に第２支持手段に下方向の負荷が加わっても、第１及び第２磁気部材の間に発生する反発力により、搬送ローラは第２支持手段に非接触で支持されるために摩擦が生じず、パーティクルが発生しない。   When processing is performed by injecting gas onto the substrate surface by the gas injection means, an air flow is generated around the substrate, so it is important to reduce and prevent particle generation so as not to adversely affect the substrate processing surface. According to the above configuration, even if a downward load is applied to the second support means during substrate transport, the transport roller does not contact the second support means due to the repulsive force generated between the first and second magnetic members. No friction is generated because no particles are generated.

また、請求項５に記載の発明は、請求項４に記載の基板乾燥装置であって、前記気体噴射手段には、基板の搬送方向に交差する方向に延びるスリット状の噴射口を有するエアナイフノズルが設けられている。   Further, the invention according to claim 5 is the substrate drying apparatus according to claim 4, wherein the gas spraying means has an air knife nozzle having a slit-shaped spraying port extending in a direction crossing the substrate transport direction. Is provided.

エアナイフノズルから基板表面に気体を噴射するときには、基板周囲に気流が発生するため、パーティクル発生を軽減及び防止して基板処理面に悪影響を及ぼさないようにすることが重要になるが、上記構成によれば、基板搬送時に第２支持手段に下方向の負荷が加わっても、第１及び第２磁気部材の間に発生する反発力により、搬送ローラは第２支持手段に非接触で支持されるために摩擦が生じず、パーティクルが発生しない。   When gas is jetted from the air knife nozzle to the substrate surface, an air flow is generated around the substrate, so it is important to reduce and prevent the generation of particles so as not to adversely affect the substrate processing surface. According to this, even if a downward load is applied to the second support means during substrate transport, the transport roller is supported by the second support means in a non-contact manner due to the repulsive force generated between the first and second magnetic members. Therefore, no friction occurs and no particles are generated.

請求項１に記載の発明によれば、第１支持手段に支持された搬送ローラの回転動作に、上向きの負荷による支障が生じることがなく、第１支持手段で回転軸を支持する例えばベアリングが故障するという問題が生じないので、基板を汚染するパーティクルを発生させることなく、基板を安定して搬送することができる。   According to the first aspect of the present invention, for example, a bearing that supports the rotating shaft by the first support means without causing any trouble due to the upward load in the rotation operation of the transport roller supported by the first support means. Since the problem of failure does not occur, the substrate can be stably transported without generating particles that contaminate the substrate.

請求項２に記載の発明によれば、搬送ローラの回転軸端部は、第２支持手段によって、上下左右全ての方向において磁気による反発力で支持されるため、より安定した状態で第２支持手段に支持される。   According to the second aspect of the present invention, the rotation shaft end portion of the transport roller is supported by the second support means with a magnetic repulsive force in all directions, up, down, left, and right. Supported by means.

請求項３に記載の発明によれば、搬送ローラの回転軸の径や、第１及び第２磁気部材のそれぞれの磁気力、或いは基板搬送時に搬送ローラにかかる負荷等に応じて、第２磁気部材と第１磁気部材との間に発生する反発力を上記各種条件に応じて調整することができる。   According to the third aspect of the present invention, the second magnetism depends on the diameter of the rotation shaft of the transport roller, the magnetic force of each of the first and second magnetic members, or the load applied to the transport roller during substrate transport. The repulsive force generated between the member and the first magnetic member can be adjusted according to the various conditions.

請求項４及び請求項５に記載の発明によれば、基板表面に気体を噴射して処理を行う場合に問題となるパーティクル発生を軽減及び防止し、基板処理面に悪影響を及ぼさないようにすることができる。   According to the invention described in claim 4 and claim 5, the generation of particles which is a problem when processing is performed by injecting gas onto the substrate surface is reduced and prevented, and the substrate processing surface is not adversely affected. be able to.

以下、本発明の一実施形態に係る基板搬送装置及び基板乾燥装置について図面を参照して説明する。図１は本発明の一実施形態に係る基板搬送装置を備えた基板乾燥装置を示す図である。本発明に係る基板搬送装置１は、基板を乾燥させる基板乾燥装置１０に適用される。基板乾燥装置１０は、基板Ｗの搬入口１２及び搬出口１４を有する閉鎖型の処理チャンバ１００を備えている。処理チャンバ１００における基板Ｗの搬入口１２側には、天井面及び底面にそれぞれ排気口１６ａ、１６ｂが設けられている。処理チャンバ１００の底面に設けられた排気口１６ｂは、処理チャンバ１００の一隅部分に配置されている。各排気口１６ａ、１６ｂには、図示していないが、それぞれ排気管が連通して接続されており、各排気管は排気ポンプにそれぞれ流路接続されている。   Hereinafter, a substrate transport device and a substrate drying device according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a view showing a substrate drying apparatus provided with a substrate transfer apparatus according to an embodiment of the present invention. The substrate transfer apparatus 1 according to the present invention is applied to a substrate drying apparatus 10 that dries a substrate. The substrate drying apparatus 10 includes a closed processing chamber 100 having a carry-in port 12 and a carry-out port 14 for the substrate W. Exhaust ports 16 a and 16 b are respectively provided on the ceiling surface and the bottom surface of the processing chamber 100 on the substrate 12 entrance side of the substrate W. An exhaust port 16 b provided on the bottom surface of the processing chamber 100 is disposed at one corner of the processing chamber 100. Although not shown, each exhaust port 16a, 16b is connected to an exhaust pipe, and each exhaust pipe is connected to a flow path of an exhaust pump.

処理チャンバ１００の内部には、基板Ｗを支持して水平方向へ搬送する複数の搬送ローラ１８と、図１では図略の回転軸支持部とで構成されたローラコンベアからなる基板搬送装置１が配設されている。   Inside the processing chamber 100, there is a substrate transport apparatus 1 comprising a roller conveyor composed of a plurality of transport rollers 18 that support and transport the substrate W in the horizontal direction, and a rotating shaft support portion (not shown in FIG. 1). It is arranged.

搬送ローラ１８は、基板搬送方向に直交する方向における処理チャンバ１００の両側部に支持され軸着されている。各搬送ローラ１８は、隣り合う搬送ローラ１８と一定間隔を空けて配置されている。搬送ローラ１８は、基板Ｗの裏面に接触して基板Ｗを支持するローラ部１８１と、ローラ部１８１の中心を貫通してローラ部１８１が固定される回転軸１８２とを有する。搬送ローラ１８の回転軸１８２の一方端、すなわち、基板搬送方向に直交する方向における基板Ｗの中央寄りの回転軸端部は、第２支持部１０２（第２支持手段）に回転自在に支持されている。この第２支持部１０２は、昇降部１０２２により昇降可能に構成されており、搬送ローラ１８の回転軸１８２の軸支部の上下位置を調整できるようになっている。さらに、搬送ローラ１８の回転軸１８２は、その他方端が処理チャンバ１００の側壁１００ａ及び当該側壁１００ａに設けられた軸受部からなる第１支持部（第１支持手段）１０１により回転自在に支持されている（軸受部及び第１支持部は図２参照）。搬送ローラ１８及びその支持機構の詳細については後述する。   The transport roller 18 is supported and pivotally supported on both sides of the processing chamber 100 in a direction orthogonal to the substrate transport direction. Each conveyance roller 18 is arranged with a certain interval from the adjacent conveyance roller 18. The transport roller 18 includes a roller portion 181 that contacts the back surface of the substrate W and supports the substrate W, and a rotation shaft 182 that passes through the center of the roller portion 181 and to which the roller portion 181 is fixed. One end of the rotation shaft 182 of the transport roller 18, that is, the rotation shaft end near the center of the substrate W in the direction orthogonal to the substrate transport direction is rotatably supported by the second support portion 102 (second support means). ing. The second support part 102 is configured to be movable up and down by an elevating part 1022, and the vertical position of the shaft support part of the rotation shaft 182 of the transport roller 18 can be adjusted. Further, the rotation shaft 182 of the transport roller 18 is rotatably supported at the other end by a first support portion (first support means) 101 including a side wall 100a of the processing chamber 100 and a bearing portion provided on the side wall 100a. (See FIG. 2 for the bearing portion and the first support portion). Details of the transport roller 18 and its support mechanism will be described later.

また、処理チャンバ１００の内部には、基板搬送装置１によって搬送される基板Ｗの搬送路を挟んでその上下両側に一対のエアナイフ２０ａ、２０ｂが配設されている。なお、基板Ｗの搬送方向に間隔をあけて二対あるいはそれ以上のエアナイフを設置するようにしてもよい。この実施形態では、平面視で基板搬送方向に対して交差する斜め方向にエアナイフ２０ａ、２０ｂが配置されている（後述の図５参照）。なお、図示の便宜上、図１にはエアナイフ２０ａ、２０ｂを基板搬送方向と直交するように描いている。   In addition, a pair of air knives 20 a and 20 b are disposed inside the processing chamber 100 on both upper and lower sides of the transport path of the substrate W transported by the substrate transport apparatus 1. Two pairs or more of air knives may be installed at intervals in the transport direction of the substrate W. In this embodiment, air knives 20a and 20b are arranged in an oblique direction intersecting the substrate transport direction in plan view (see FIG. 5 described later). For convenience of illustration, the air knives 20a and 20b are illustrated in FIG. 1 so as to be orthogonal to the substrate transport direction.

エアナイフ２０ａ、２０ｂには、基板Ｗと対向するように、基板Ｗの幅方向全体にわたって空気、不活性ガス等の気体を噴射するスリット状の噴射口がそれぞれ形設されている。従って、エアナイフ２０ａ、２０ｂのスリット状の噴射口は、基板搬送方向と交差する方向に延びている。エアナイフ２０ａ、２０ｂは、その噴射口から基板搬送方向における上流側に向けて気体を噴射するように鉛直面に対し傾斜した姿勢に保持されている。   The air knives 20a and 20b are respectively provided with slit-like injection ports for injecting air, inert gas, or the like over the entire width of the substrate W so as to face the substrate W. Therefore, the slit-like injection ports of the air knives 20a and 20b extend in a direction intersecting the substrate transport direction. The air knives 20a and 20b are held in a posture inclined with respect to the vertical plane so as to inject gas from the injection port toward the upstream side in the substrate transport direction.

また、基板搬送路の下方側空間には、エアナイフ２０ｂの配設位置より基板搬送方向における下流側に複数の補助ローラ３２が配設されている。補助ローラ３２は、処理チャンバ１００の底壁面上に垂設された図略の支柱桿の上端部に支持されている。さらに、処理チャンバ１００の内部には、基板搬送路の上方側の空間を、エアナイフ２０ａの配設位置を境に、基板搬送方向における上流側と下流側とに仕切るように内部仕切壁３４が配設されている。   A plurality of auxiliary rollers 32 are disposed in the lower space of the substrate conveyance path on the downstream side in the substrate conveyance direction from the arrangement position of the air knife 20b. The auxiliary roller 32 is supported by an upper end portion of a column rod (not shown) that is suspended from the bottom wall surface of the processing chamber 100. Further, an internal partition wall 34 is arranged inside the processing chamber 100 so as to partition the space above the substrate transport path into an upstream side and a downstream side in the substrate transport direction with the position of the air knife 20a as a boundary. It is installed.

上記構成を備えた基板乾燥装置１０においては、前段の洗浄装置による洗浄処理を終えた基板Ｗが処理チャンバ１００内に搬入口１２から搬入され、ローラコンベアによって基板Ｗが処理チャンバ１００内を搬送される過程で、エアナイフ２０ａ、２０ｂの噴射口から基板Ｗの上下両面に向かって気体が噴射される。エアナイフ２０ａ、２０ｂの噴射口から噴出した気体は、基板Ｗの上下両面に当たって基板搬送方向における上流側へ跳ね返る。この際に、基板Ｗに付着した純水等の洗浄液が気体によって吹き飛ばされ、基板Ｗの上下両面から洗浄液が除去される。そして、洗浄液が除去された基板Ｗは、搬出口１４を通って処理チャンバ１００内から搬出され、基板搬送方向下流側の装置へ搬送される。   In the substrate drying apparatus 10 having the above configuration, the substrate W that has been subjected to the cleaning process by the preceding cleaning apparatus is carried into the processing chamber 100 from the carry-in port 12, and the substrate W is transported through the processing chamber 100 by the roller conveyor. In the process, gas is ejected from the ejection ports of the air knives 20a and 20b toward the upper and lower surfaces of the substrate W. The gas ejected from the ejection ports of the air knives 20a and 20b strikes the upper and lower surfaces of the substrate W and rebounds upstream in the substrate transport direction. At this time, the cleaning liquid such as pure water attached to the substrate W is blown off by the gas, and the cleaning liquid is removed from the upper and lower surfaces of the substrate W. Then, the substrate W from which the cleaning liquid has been removed is unloaded from the processing chamber 100 through the unloading port 14, and is transported to the apparatus on the downstream side in the substrate transport direction.

エアナイフ２０ａ、２０ｂの噴射口から噴出し基板Ｗから除去された洗浄液のミストを含んだ気体は、排気口１６ａ、１６ｂに向かって流動する。洗浄液のミストを含んだ気体は、処理チャンバ１００の内壁面に対し斜め方向に当たって排気口１６ａ，１６ｂの方へ流動し、排気口１６ａ，１６ｂを通って処理チャンバ１００内から排出される。このように、エアナイフ２０ｂの噴射口から噴射され基板Ｗの下面で跳ね返った気体は、排気口１６ｂに導かれて排気され、その気体と一緒に洗浄波のミストも処理チャンバ１００内から排出される。このため、基板Ｗの下面から除去された洗浄液のミストが、エアナイフ２０ｂの配設位置より基板搬送方向における下流側まで飛散して基板Ｗの下面に再付着することが防止される。   The gas containing the mist of the cleaning liquid ejected from the ejection ports of the air knives 20a and 20b and removed from the substrate W flows toward the exhaust ports 16a and 16b. The gas containing the mist of the cleaning liquid strikes the inner wall surface of the processing chamber 100 in an oblique direction, flows toward the exhaust ports 16a and 16b, and is discharged from the processing chamber 100 through the exhaust ports 16a and 16b. As described above, the gas that is ejected from the ejection port of the air knife 20b and bounces off the lower surface of the substrate W is guided to the exhaust port 16b and exhausted, and the mist of the cleaning wave is also discharged from the processing chamber 100 together with the gas. . Therefore, the mist of the cleaning liquid removed from the lower surface of the substrate W is prevented from being scattered from the position where the air knife 20b is disposed to the downstream side in the substrate transport direction and reattaching to the lower surface of the substrate W.

一方、上側のエアナイフ２０ａの噴射口から基板Ｗの上面に対し噴射され基板Ｗの上面に当たってはね返った気体は、場合によっては乱流状態となりながら排気口１６ａに向かって流動するが、基板Ｗの上面から除去された洗浄液のミストの一部は、重力の作用で処理チャンバ１００内を降下し、下側のエアナイフ２０ｂの噴射口から噴射された気体と一緒になって、排気口１６ｂを通って処理チャンバ１００内から排出される。また、基板Ｗの上面から吹き飛ばされて除去された洗浄液のミストは、内部仕切壁３４により、エアナイフ２０ａよりも基板搬送方向における下流側の室内に流れ込むことが阻止される。このため、エアナイフ２０ａの配設位置を通過した基板Ｗの上面側に洗浄液のミストが再付着することが防止される。   On the other hand, the gas that is ejected from the ejection port of the upper air knife 20a to the upper surface of the substrate W and bounces off the upper surface of the substrate W may flow toward the exhaust port 16a while being in a turbulent state. A part of the mist of the cleaning liquid removed from the gas descends in the processing chamber 100 due to the action of gravity, and is processed through the exhaust port 16b together with the gas jetted from the jet port of the lower air knife 20b. It is discharged from the chamber 100. Also, the cleaning liquid mist blown off from the upper surface of the substrate W is prevented from flowing into the chamber downstream of the air knife 20a in the substrate transport direction by the internal partition wall 34. For this reason, it is possible to prevent the mist of the cleaning liquid from reattaching to the upper surface side of the substrate W that has passed through the position where the air knife 20a is disposed.

図２は、基板搬送装置１における搬送ローラ１８及びその支持機構部分を示す斜視図である。図３は第２支持部１０２の第２磁気部材１３による搬送ローラ１８の回転軸１８２の軸支を処理チャンバ１００の内側から見た状態を示す斜視図、図４は第２支持部１０２の第２磁気部材１３による搬送ローラ１８の回転軸１８２の軸支を処理チャンバ１００の外側から見た状態を示す斜視図である。   FIG. 2 is a perspective view showing the transport roller 18 and its support mechanism portion in the substrate transport apparatus 1. 3 is a perspective view showing a state in which the shaft of the rotation shaft 182 of the transport roller 18 by the second magnetic member 13 of the second support portion 102 is viewed from the inside of the processing chamber 100, and FIG. 2 is a perspective view showing a state in which the shaft support of the rotation shaft 182 of the transport roller 18 by the magnetic member 13 is viewed from the outside of the processing chamber 100.

搬送ローラ１８の回転軸１８２の一方端を軸支する第１支持部１０１は、処理チャンバ１００の側壁１００ａ及び軸受部１００ｂで構成されている。軸受部１００ｂは、回転軸１８２のスラスト方向における移動を規制する。第１支持部１０１よりも更に外側に位置する回転軸１８２の先端部には、図２では図略の駆動モータからの駆動力を伝達すベルトが巻き付けられるプーリが設けられている。かかる駆動機構の詳細は後述する。   The first support portion 101 that pivotally supports one end of the rotation shaft 182 of the transport roller 18 includes a side wall 100 a and a bearing portion 100 b of the processing chamber 100. The bearing portion 100b regulates the movement of the rotating shaft 182 in the thrust direction. A pulley around which a belt for transmitting a driving force from a drive motor (not shown in FIG. 2) is wound is provided at the tip of the rotating shaft 182 positioned further outside the first support portion 101. Details of such a drive mechanism will be described later.

回転軸１８２の他方端（基板搬送方向に直交する方向における基板Ｗの中央寄りとなる側の回転軸端部）の周面上には、例えば7000ガウスの磁力を有する第１磁気部材１１が設けられている。また、当該第１磁気部材１１が設けられている回転軸１８２端部側を軸支する第２支持部１０２には、第１磁気部材１１との対向面が同一極性とされ、第１磁気部材１１の全周を覆う第２磁気部材１３が設けられている。第２磁気部材１３は、例えば、9600ガウスの磁力を有する。第２支持部１０２は、第１磁気部材１１と第２磁気部材１３との間に生じる反発力により、回転軸１８２を非接触状態で軸支する。   The first magnetic member 11 having a magnetic force of, for example, 7000 gauss is provided on the peripheral surface of the other end of the rotation shaft 182 (the rotation shaft end near the center of the substrate W in the direction orthogonal to the substrate transport direction). It has been. In addition, the second support portion 102 that pivotally supports the end of the rotary shaft 182 where the first magnetic member 11 is provided has a surface facing the first magnetic member 11 having the same polarity, and the first magnetic member The 2nd magnetic member 13 which covers the perimeter of 11 is provided. The second magnetic member 13 has a magnetic force of 9600 gauss, for example. The second support portion 102 supports the rotating shaft 182 in a non-contact state by a repulsive force generated between the first magnetic member 11 and the second magnetic member 13.

第２磁気部材１３は、上部部材１３１及び下部部材１３２からなる。上部部材１３１は、第１磁気部材１１に上方側から対向する。下部部材１３２は、上部部材１３１とは別個の部材からなり、第２支持部１０２に設けられた凹部１０２１に取り付けられている。下部部材１３２は、回転軸１８２の第１磁気部材１１に下方側から対向する。   The second magnetic member 13 includes an upper member 131 and a lower member 132. The upper member 131 faces the first magnetic member 11 from above. The lower member 132 is a member separate from the upper member 131 and is attached to a recess 1021 provided in the second support portion 102. The lower member 132 faces the first magnetic member 11 of the rotating shaft 182 from below.

上部部材１３１は、逆Ｕ字型状に形成され、逆Ｕ字型状の内側の縁部には、磁気部１３１０が設けられている。上部部材１３１は、その両下端部１３１１が第２支持部１０２の下部部材１３２近傍に取り付けられ、磁気部１３１０と下部部材１３２とで、搬送ローラ１８の回転軸１８２が貫通可能な孔を形成し、回転軸１８２の第１磁気部材１１が当該孔部分に位置することで、回転軸１８２の第１磁気部材１１の全周が磁気部１３１０と下部部材１３２とで覆われるようになっている。上部部材１３１の両下端部１３１１には、長孔１３１１ａが設けられている。また、第２支持部１０２の下部部材１３２近傍位置には、図略のネジ孔が設けられている。上部部材１３１を第２支持部１０２に取り付ける場合は、上部部材１３１の長孔１３１１ａを、第２支持部１０２のネジ孔部分にあてがい、図略のネジを長孔１３１１ａ及びネジ孔に貫通させて、ネジ止めにより上部部材１３１を第２支持部１０２に固定する。この上部部材１３１の固定時には、上部部材１３１の長孔１３１１ａ内におけるネジ位置を変更することで、第２支持部１０２及び下部部材１３２に対する上部部材１３１の取り付け位置を変えることができ、これにより上部部材１３１及び下部部材１３２の間隔が変更される。   The upper member 131 is formed in an inverted U shape, and a magnetic portion 1310 is provided on the inner edge of the inverted U shape. The lower end portion 1311 of the upper member 131 is attached in the vicinity of the lower member 132 of the second support portion 102, and the magnetic portion 1310 and the lower member 132 form a hole through which the rotation shaft 182 of the transport roller 18 can pass. Since the first magnetic member 11 of the rotating shaft 182 is located in the hole portion, the entire circumference of the first magnetic member 11 of the rotating shaft 182 is covered with the magnetic portion 1310 and the lower member 132. Long holes 1311a are provided in both lower end portions 1311 of the upper member 131. A screw hole (not shown) is provided in the vicinity of the lower member 132 of the second support portion 102. When attaching the upper member 131 to the second support portion 102, the elongated hole 1311a of the upper member 131 is assigned to the screw hole portion of the second support portion 102, and a screw (not shown) is passed through the elongated hole 1311a and the screw hole. The upper member 131 is fixed to the second support part 102 by screwing. At the time of fixing the upper member 131, the mounting position of the upper member 131 with respect to the second support portion 102 and the lower member 132 can be changed by changing the screw position in the elongated hole 1311a of the upper member 131. The interval between the member 131 and the lower member 132 is changed.

搬送ローラ１８の回転軸１８２に設けられた第１磁気部材１１は、第２支持部１０２に設けられた第２磁気部材１３をなす上部部材１３１及び下部部材１３２によって全周が覆われる位置に配置される。このように回転軸１８２の第１磁気部材１１の全周が第２磁気部材１３に覆われることで、当該回転軸１８２端部は、上下左右全ての方向において磁気による反発力を受け、第２支持部１０２に対して非接触状態で安定して支持される。これにより、基板Ｗ搬送時に回転軸１８２が回転しても、回転軸１８２と第２支持部１０２との間に摩擦が生じないので、パーティクルが発生しない。   The first magnetic member 11 provided on the rotation shaft 182 of the transport roller 18 is disposed at a position where the entire circumference is covered by the upper member 131 and the lower member 132 that form the second magnetic member 13 provided in the second support portion 102. Is done. As described above, the entire circumference of the first magnetic member 11 of the rotating shaft 182 is covered with the second magnetic member 13, so that the end of the rotating shaft 182 receives a repulsive force due to magnetism in all directions, up, down, left, and right. The support unit 102 is stably supported in a non-contact state. Thereby, even if the rotating shaft 182 rotates during the transport of the substrate W, no friction is generated between the rotating shaft 182 and the second support portion 102, so that no particles are generated.

また、第２支持部１０２では、上部部材１３１の取付位置を変更することによって、上部部材１３１及び下部部材１３２の間隔を拡げる又は狭めることが可能であるため、搬送する基板Ｗの重量に応じて回転軸１８２に対して下向きにかかる負荷が相違する場合に、各負荷に応じて回転軸１８２を非接触状態で軸支可能な磁力が得られるように、上部部材１３１及び下部部材１３２の間隔を調整できる。また、上部部材１３１及び下部部材１３２が発する磁力には個体差があることが予想されるが、この場合、各個体差に応じて、回転軸１８２の軸支に必要な磁力が得られるように、第２支持部１０２に設けられている各第２磁気部材１３の上部部材１３１及び下部部材１３２の間隔を、それぞれ調整できる。   Further, in the second support portion 102, the interval between the upper member 131 and the lower member 132 can be increased or decreased by changing the mounting position of the upper member 131, so that it depends on the weight of the substrate W to be transported. When the load applied downward with respect to the rotation shaft 182 is different, the interval between the upper member 131 and the lower member 132 is set so that a magnetic force capable of supporting the rotation shaft 182 in a non-contact state is obtained according to each load. Can be adjusted. Further, it is expected that there is an individual difference in the magnetic force generated by the upper member 131 and the lower member 132. In this case, the magnetic force necessary for the shaft support of the rotating shaft 182 is obtained according to each individual difference. The distance between the upper member 131 and the lower member 132 of each second magnetic member 13 provided in the second support portion 102 can be adjusted.

また、搬送ローラ１８のローラ部１８１の高さは、上部部材１３１を第２支持部１０２に対して最も高い位置に取り付けた場合における上部部材１３１の高さ、及び第１支持部１０１に回転軸１８２を軸支させた場合における第１支持部１０１又は回転軸１８２の高い方の高さよりも高く設定されている。これにより、基板Ｗがローラ部１８１に載置された状態となっても、基板Ｗがローラ部１８１以外には接触しない。   Further, the height of the roller portion 181 of the transport roller 18 is the height of the upper member 131 when the upper member 131 is attached to the highest position with respect to the second support portion 102, and the rotational axis of the first support portion 101. The height is set to be higher than the height of the first support portion 101 or the rotary shaft 182 when the shaft 182 is pivotally supported. As a result, even when the substrate W is placed on the roller portion 181, the substrate W does not contact other than the roller portion 181.

搬送ローラ１８の駆動機構を説明する。図５は基板乾燥装置１０の概略構成を示す平面図、図６は図５のＡ方向から見た基板乾燥装置１０の概略側面図、図７は図５のＢ方向から見た基板乾燥装置１０の概略側面図である。なお、図５では便宜上、上部部材１３１及びエンドレスベルトの図示を省略している。   The drive mechanism of the conveyance roller 18 will be described. 5 is a plan view showing a schematic configuration of the substrate drying apparatus 10, FIG. 6 is a schematic side view of the substrate drying apparatus 10 viewed from the direction A in FIG. 5, and FIG. 7 is a substrate drying apparatus 10 viewed from the direction B in FIG. FIG. In FIG. 5, illustration of the upper member 131 and the endless belt is omitted for convenience.

処理チャンバ１００の一方の側壁１００ａの外壁部には、搬送ローラ１８に回転駆動力を供給する駆動源となる駆動モータ５０が設けられている。この駆動モータ５０は、側壁１００ａの外壁部に設けられている回転駆動軸５１に連結されて、回転駆動軸５１に回転駆動力を伝達するようになっている。各搬送ローラ１８はその回転軸１８２が、第１支持部１０１よりも更に外側まで延び、側壁１００ａから外側に突出している。第１支持部１０１よりも外側に位置する回転軸１８２の先端部には、駆動モータ５０からの駆動力を伝達するためのエンドレスベルト６０が張架されるプーリ１８５が設けられている。   A driving motor 50 serving as a driving source for supplying a rotational driving force to the transport roller 18 is provided on the outer wall portion of one side wall 100 a of the processing chamber 100. The drive motor 50 is connected to a rotation drive shaft 51 provided on the outer wall portion of the side wall 100 a so as to transmit a rotation drive force to the rotation drive shaft 51. Each conveyance roller 18 has a rotation shaft 182 extending further outward than the first support portion 101 and protruding outward from the side wall 100a. A pulley 185 on which an endless belt 60 for transmitting a driving force from the driving motor 50 is stretched is provided at the tip of the rotating shaft 182 located outside the first support portion 101.

更に側壁１００ａの外壁部には、側壁１００ａから突出した各回転軸１８２先端の間に第１補助回転軸５２が設けられている。さらに、回転軸１８２先端の下方には第２補助回転軸５３と、第３補助回転軸５４とが設けられている。   Furthermore, the 1st auxiliary | assistant rotating shaft 52 is provided in the outer wall part of the side wall 100a between each rotating shaft 182 protrusion protruded from the side wall 100a. Further, a second auxiliary rotating shaft 53 and a third auxiliary rotating shaft 54 are provided below the tip of the rotating shaft 182.

上記駆動モータ５０が設けられている側壁１００ａとは反対側の側壁１００ａにも、図７に示すように、駆動モータ５０配設側の側壁１００ａと同様に、各回転軸１８２の先端部にプーリ１８５と、第１補助回転軸５２と、第２補助回転軸５３と、第３補助回転軸５４とが設けられている。なお、当該反対側の側壁１００ａには、回転駆動軸５１は設けられておらず、対応する位置には、エンドレスベルト６０の走行に応じて従動回転する第３補助回転軸５４が設けられている。   As shown in FIG. 7, on the side wall 100a opposite to the side wall 100a on which the drive motor 50 is provided, as shown in FIG. 185, a first auxiliary rotating shaft 52, a second auxiliary rotating shaft 53, and a third auxiliary rotating shaft 54 are provided. The rotation drive shaft 51 is not provided on the opposite side wall 100a, and a third auxiliary rotation shaft 54 that is driven to rotate according to the travel of the endless belt 60 is provided at a corresponding position. .

さらに、一方の側壁１００ａから他方の側壁１００ａに、駆動力伝達シャフト７０が架け渡されている。この駆動力伝達シャフト７０は、駆動モータ５０が設けられている側壁１００ａ側から、反対側の側壁１００ａ側に駆動モータ５０からの回転駆動力を伝達するものである。駆動力伝達シャフト７０は、その両端部がそれぞれ側壁１００ａに回転自在に軸支されている。駆動力伝達シャフト７０は、いずれの側壁１００ａからも突出されており、側壁１００ａよりも外側となる両先端部にプーリ７１が設けられている。なお、駆動力伝達シャフト７０には、基板Ｗの裏面に接触して基板Ｗを搬送するためのローラ部７２が、長さ方向における適所に設けられている。   Further, a driving force transmission shaft 70 is bridged from one side wall 100a to the other side wall 100a. The driving force transmission shaft 70 transmits the rotational driving force from the driving motor 50 to the opposite side wall 100a side from the side wall 100a side where the driving motor 50 is provided. Both ends of the driving force transmission shaft 70 are rotatably supported on the side wall 100a. The driving force transmission shaft 70 protrudes from any of the side walls 100a, and pulleys 71 are provided at both front ends that are outside the side walls 100a. In addition, the driving force transmission shaft 70 is provided with a roller portion 72 for contacting the back surface of the substrate W and transporting the substrate W at an appropriate position in the length direction.

上記エンドレスベルト６０は、回転軸１８２の先端部のプーリ１８５と、回転駆動軸５１と、第１補助回転軸５２と、第２補助回転軸５３と、第３補助回転軸５４と、さらに、駆動力伝達シャフト７０のプーリ７１とに、緊張を持たせた状態で架け渡されている。駆動モータ５０からの回転駆動力で回転駆動軸５１が回転すると、駆動モータ５０が設けられている側壁１００ａにおいて、エンドレスベルト６０が走行し、回転軸１８２の先端部のプーリ１８５、第１補助回転軸５２、第２補助回転軸５３、第３補助回転軸５４、及び駆動力伝達シャフト７０のプーリ７１が回転する。これにより、駆動モータ５０が設けられている側壁１００ａに設けられている各搬送ローラ１８が回転する。   The endless belt 60 includes a pulley 185 at the tip of the rotary shaft 182, a rotary drive shaft 51, a first auxiliary rotary shaft 52, a second auxiliary rotary shaft 53, a third auxiliary rotary shaft 54, and a drive. It is stretched over the pulley 71 of the force transmission shaft 70 in a tensioned state. When the rotary drive shaft 51 is rotated by the rotary drive force from the drive motor 50, the endless belt 60 travels on the side wall 100a where the drive motor 50 is provided, and the pulley 185 at the tip of the rotary shaft 182 and the first auxiliary rotation. The shaft 52, the second auxiliary rotating shaft 53, the third auxiliary rotating shaft 54, and the pulley 71 of the driving force transmission shaft 70 rotate. Thereby, each conveyance roller 18 provided in the side wall 100a in which the drive motor 50 is provided rotates.

上記のように駆動力伝達シャフト７０が回転すると、この駆動力伝達シャフト７０の回転により、反対側の側壁１００ａ側において、駆動力伝達シャフト７０のプーリ７１に張架されているエンドレスベルト６０が走行し、回転軸１８２の先端部のプーリ１８５、第１補助回転軸５２、第２補助回転軸５３、及び第３補助回転軸５４が回転する。すなわち、駆動モータ５０の回転駆動力が、駆動力伝達シャフト７０によって反対側の側壁１００ａまで伝達され、当該反対側の側壁１００ａに設けられている各搬送ローラ１８が回転する。   When the driving force transmission shaft 70 rotates as described above, the endless belt 60 stretched around the pulley 71 of the driving force transmission shaft 70 travels on the opposite side wall 100a side by the rotation of the driving force transmission shaft 70. Then, the pulley 185, the first auxiliary rotating shaft 52, the second auxiliary rotating shaft 53, and the third auxiliary rotating shaft 54 at the tip of the rotating shaft 182 rotate. That is, the rotational driving force of the drive motor 50 is transmitted to the opposite side wall 100a by the driving force transmission shaft 70, and each transport roller 18 provided on the opposite side wall 100a rotates.

なお、本発明は上記実施の形態の構成に限られず種々の変形が可能である。例えば、上記実施形態では、搬送ローラ１８の回転軸１８２の第１磁気部材１１の全周が、第２支持部１０２の第２磁気部材１３をなす上部部材１３１及び下部部材１３２によって覆われる構成としているが、本発明は当該構成に限定されるものはない。例えば、第２磁気部材１３として下部部材１３２のみが設けられ、この下部部材１３２の磁力によって搬送ローラ１８の回転軸１８２が第２支持部１０２に軸支されるものとしてもよい。この場合には、下部部材１３２及び第１磁気部材１１の磁力は、搬送ローラ１８及び搬送される基板Ｗの重量を、下部部材１３２及び第１磁気部材１１の間に発生する反発力で支持できる大きさに設定される。   The present invention is not limited to the configuration of the above embodiment, and various modifications can be made. For example, in the above embodiment, the entire circumference of the first magnetic member 11 of the rotation shaft 182 of the transport roller 18 is covered by the upper member 131 and the lower member 132 that form the second magnetic member 13 of the second support portion 102. However, the present invention is not limited to this configuration. For example, only the lower member 132 may be provided as the second magnetic member 13, and the rotation shaft 182 of the transport roller 18 may be pivotally supported by the second support portion 102 by the magnetic force of the lower member 132. In this case, the magnetic force of the lower member 132 and the first magnetic member 11 can support the weight of the transport roller 18 and the transported substrate W by the repulsive force generated between the lower member 132 and the first magnetic member 11. Set to size.

また、上記実施形態では、処理チャンバ１００の内部には、基板搬送装置１によって搬送される基板Ｗの搬送路を挟んでその上下両側に一対のエアナイフ２０ａ、２０ｂが配設される構成を採っているが、基板Ｗの搬送路を挟んでその上側のみにエアナイフ２０ａが配設される構成であっても構わない。   In the above embodiment, the processing chamber 100 has a configuration in which a pair of air knives 20 a and 20 b are disposed on both upper and lower sides of the substrate W transported by the substrate transport apparatus 1 across the transport path. However, the air knife 20a may be disposed only on the upper side of the conveyance path of the substrate W.

本発明の一実施形態に係る基板搬送装置を備えた基板乾燥装置を示す図である。It is a figure which shows the board | substrate drying apparatus provided with the board | substrate conveyance apparatus which concerns on one Embodiment of this invention. 基板搬送装置における搬送ローラ及びその支持機構部分を示す斜視図である。It is a perspective view which shows the conveyance roller and its support mechanism part in a board | substrate conveyance apparatus. 第２支持部の第２磁気部材による搬送ローラの回転軸の軸支を処理チャンバの内側から見た状態を示す斜視図である。It is a perspective view which shows the state which looked at the axial support of the rotating shaft of the conveyance roller by the 2nd magnetic member of a 2nd support part from the inner side of the processing chamber. 第２支持部の第２磁気部材による搬送ローラの回転軸の軸支を処理チャンバの外側から見た状態を示す斜視図である。It is a perspective view which shows the state which looked at the axial support of the rotating shaft of the conveyance roller by the 2nd magnetic member of a 2nd support part from the outer side of the processing chamber. 基板乾燥装置の概略構成を示す平面図である。It is a top view which shows schematic structure of a board | substrate drying apparatus. 図５のＡ方向から見た基板乾燥装置の概略側面図である。It is a schematic side view of the board | substrate drying apparatus seen from the A direction of FIG. 図５のＢ方向から見た基板乾燥装置の概略側面図である。It is a schematic side view of the board | substrate drying apparatus seen from the B direction of FIG.

符号の説明Explanation of symbols

１ 基板搬送装置
１０ 基板乾燥装置
１１ 第１磁気部材
１２ 搬入口
１３ 第２磁気部材
１３１ 上部部材
１３２ 下部部材
１８ 搬送ローラ
１８１ ローラ部
１８２ 回転軸
１８５ プーリ
２０ａ エアナイフ
２０ｂ エアナイフ
５０ 駆動モータ
５１ 回転駆動軸
５２ 第１補助回転軸
５３ 第２補助回転軸
５４ 第３補助回転軸
６０ エンドレスベルト
７０ 駆動力伝達シャフト
１００ 処理チャンバ
１００ａ 側壁
１００ｂ 軸受部
１０１ 第１支持部
１０２ 第２支持部
Ｗ 基板 DESCRIPTION OF SYMBOLS 1 Substrate conveyance apparatus 10 Substrate drying apparatus 11 1st magnetic member 12 Carry-in port 13 2nd magnetic member 131 Upper member 132 Lower member 18 Conveyance roller 181 Roller part 182 Rotating shaft 185 Pulley 20a Air knife 20b Air knife 50 Drive motor 51 Rotation drive shaft 52 First auxiliary rotating shaft 53 Second auxiliary rotating shaft 54 Third auxiliary rotating shaft 60 Endless belt 70 Driving force transmission shaft 100 Processing chamber 100a Side wall 100b Bearing portion 101 First support portion 102 Second support portion W Substrate

Claims (5)

搬送の対象となる基板を支持するローラ部と、前記ローラ部の中心を貫通して前記ローラ部に固定された回転軸と、前記回転軸の一方端側に設けられた第１磁気部材とを有する複数の搬送ローラと、
前記各搬送ローラの回転軸の他方端側を回転自在に支持する第１支持手段と、
前記第１磁気部材との対向面が同一極性とされ、前記第１磁気部材に対して少なくとも下方側から対向する第２磁気部材が設けられ、基板搬送方向に直交する方向における基板の中央寄りに配置された前記各搬送ローラの回転軸の前記一方端側を、前記第１磁気部材と第２磁気部材との間の反発力により回転自在に支持する第２支持手段と、
前記複数の搬送ローラの回転軸の他方端側に回転駆動力を供給する回転駆動手段とを備え、
前記搬送ローラは、前記基板搬送方向に直交する方向における基板両端部位置に配設され、隣り合う搬送ローラとは基板搬送方向に一定間隔を空けて配置されている基板搬送装置。 A roller portion that supports a substrate to be conveyed; a rotation shaft that passes through the center of the roller portion and is fixed to the roller portion; and a first magnetic member provided on one end side of the rotation shaft. A plurality of transport rollers having;
First support means for rotatably supporting the other end side of the rotation shaft of each of the transport rollers;
The opposing surface to the first magnetic member has the same polarity, and a second magnetic member that is opposed to the first magnetic member from at least the lower side is provided, closer to the center of the substrate in a direction orthogonal to the substrate transport direction. Second support means for rotatably supporting the one end side of the rotation shaft of each of the transport rollers arranged by a repulsive force between the first magnetic member and the second magnetic member;
Rotation drive means for supplying a rotation drive force to the other end side of the rotation shafts of the plurality of transport rollers,
The substrate transport apparatus is disposed at both end positions of the substrate in a direction orthogonal to the substrate transport direction, and is disposed at a predetermined interval from the adjacent transport roller in the substrate transport direction. 前記第２支持手段の前記第２磁気部材は、前記第１磁気部材の全周を覆うように設けられている請求項１に記載の基板搬送装置。   The substrate transfer apparatus according to claim 1, wherein the second magnetic member of the second support means is provided so as to cover the entire circumference of the first magnetic member. 前記第２磁気部材は、前記第１磁気部材に上方側から対向する上部部材と、当該上部部材とは別個の部材とされ、前記第１磁気部材に下方側から対向する下部部材とを有し、これら上部部材及び下部部材は、一方の部材が他方の部材に取り付けられて前記第１磁気部材の全周を覆う状態となり、一方の部材の他方の部材に対する取付位置を可変させることで当該両部材の間隔が変更される請求項２に記載の基板搬送装置。   The second magnetic member includes an upper member that faces the first magnetic member from above and a lower member that is a member separate from the upper member and faces the first magnetic member from below. The upper member and the lower member are in a state where one member is attached to the other member and covers the entire circumference of the first magnetic member, and the attachment position of the one member with respect to the other member can be varied. The board | substrate conveyance apparatus of Claim 2 by which the space | interval of a member is changed. 請求項１乃至請求項３のいずれかに記載の基板搬送装置と、
前記搬送ローラによって搬送される基板に対して気体を噴射する気体噴射手段とを備える基板乾燥装置。 A substrate transfer apparatus according to any one of claims 1 to 3,
A substrate drying apparatus comprising: gas injection means for injecting gas onto the substrate conveyed by the conveyance roller. 前記気体噴射手段には、基板の搬送方向に交差する方向に延びるスリット状の噴射口を有するエアナイフノズルが設けられている請求項４に記載の基板乾燥装置。   The substrate drying apparatus according to claim 4, wherein the gas spraying unit is provided with an air knife nozzle having a slit-shaped spraying port extending in a direction intersecting with the substrate transport direction.
JP2005351891A 2005-12-06 2005-12-06 Substrate carrying device and substrate drying device Abandoned JP2007153542A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009302529A (en) * 2008-06-12 2009-12-24 Semes Co Ltd Substrate carrier and method, and substrate manufacturing facility having the device
JP2010093196A (en) * 2008-10-10 2010-04-22 Dainippon Screen Mfg Co Ltd Apparatus for drying substrate
CN109084543A (en) * 2018-08-23 2018-12-25 盐城名杰纸品包装有限公司 A kind of cardboard drying unit
CN110806086A (en) * 2019-10-21 2020-02-18 安徽省辉煌机械制造有限公司 Blow-drying device for casting production

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009302529A (en) * 2008-06-12 2009-12-24 Semes Co Ltd Substrate carrier and method, and substrate manufacturing facility having the device
TWI415210B (en) * 2008-06-12 2013-11-11 Semes Co Ltd Substrate transfer apparatus and method, and a substrate manufacturing apparatus having the same
JP2010093196A (en) * 2008-10-10 2010-04-22 Dainippon Screen Mfg Co Ltd Apparatus for drying substrate
TWI386613B (en) * 2008-10-10 2013-02-21 Dainippon Screen Mfg Substrate drying device
CN109084543A (en) * 2018-08-23 2018-12-25 盐城名杰纸品包装有限公司 A kind of cardboard drying unit
CN109084543B (en) * 2018-08-23 2024-02-02 盐城名杰纸品包装有限公司 Paperboard drying device
CN110806086A (en) * 2019-10-21 2020-02-18 安徽省辉煌机械制造有限公司 Blow-drying device for casting production

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