TW200948713A - Method of reclaiming silicon powder from slurry generated during back lapping process - Google Patents

Method of reclaiming silicon powder from slurry generated during back lapping process Download PDF

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Publication number
TW200948713A
TW200948713A TW098104240A TW98104240A TW200948713A TW 200948713 A TW200948713 A TW 200948713A TW 098104240 A TW098104240 A TW 098104240A TW 98104240 A TW98104240 A TW 98104240A TW 200948713 A TW200948713 A TW 200948713A
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Taiwan
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powder
centrifuge
collecting
bowl
slurry
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TW098104240A
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Chinese (zh)
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Seung-Ryong Lim
Sung-Shin Kim
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Silfine Co Ltd
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Publication of TW200948713A publication Critical patent/TW200948713A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04BCENTRIFUGES
    • B04B3/00Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering
    • B04B3/04Centrifuges with rotary bowls in which solid particles or bodies become separated by centrifugal force and simultaneous sifting or filtering discharging solid particles from the bowl by a conveying screw coaxial with the bowl axis and rotating relatively to the bowl
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04BCENTRIFUGES
    • B04B1/00Centrifuges with rotary bowls provided with solid jackets for separating predominantly liquid mixtures with or without solid particles
    • B04B1/20Centrifuges with rotary bowls provided with solid jackets for separating predominantly liquid mixtures with or without solid particles discharging solid particles from the bowl by a conveying screw coaxial with the bowl axis and rotating relatively to the bowl
    • B04B1/2016Driving control or mechanisms; Arrangement of transmission gearing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04BCENTRIFUGES
    • B04B5/00Other centrifuges
    • B04B5/10Centrifuges combined with other apparatus, e.g. electrostatic separators; Sets or systems of several centrifuges
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/037Purification
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Abstract

There is provided a method for reclaiming silicon powder by collecting and refining the silicon powder from slurry generated during a back lapping process, a post-process step for semiconductors, and, more particularly, a method for reclaiming silicon powder through collecting a low-purity silicon powder from slurry generated during a back lapping process by using a collecting centrifuge; mixing the collected silicon powder from the collecting centrifuge with a chemical solution to dissolve impurities; and refining the silicon powder mixed with the chemical solution into a high-purity silicon powder by using a refining centrifuge. The method for reclaiming silicon powder from slurry generated during a back lapping process comprises: a collecting step S100 of collecting silicon powder from the slurry, wherein the collecting step S100 supplies the slurry to a collecting centrifuge 100 in which a bowl and a screw shaft are installed horizontally and a bowl motor M1 and a screw shaft motor M2 are installed to individually control rotation of the bowl and screw shaft, and collects silicon powder from the slurry by a centrifugal separation method; a refining step S200 of refining the silicon powder collected from the slurry, wherein the refining step S200 comprises: a stirring step S210 of mixing the silicon powder collected in the collecting step S100 with a chemical solution having an acid as a main component and dissolving impurities; and a separating step S220 of supplying the mixture mixed in the stirring step S210 to a refining centrifuge 300 and separating the silicon powder; a drying step S300 of drying the silicon powder refined in the refining step S200 in a vacuum drier; and a packaging step S400 of packaging the silicon powder dried in the drying step S300.

Description

200948713 六、發明說明: 【發明所屬之技術領域】 本發明係關於藉由自背側磨光(lapping )處理(一半 導體後處理步驟)所產生之漿料中收集及精煉矽粉末而 回收利用矽粉末之方法,更具體地,係關於自背側磨光 處理所產生之漿料中收集低純度矽粉末之回收利用矽粉 末之方法’其係藉由使用一收集離心機;將收集離心機 Q 所收集的矽粉末與一化學溶液混合以溶解雜質;及使用 一精煉離心機將與化學溶液混合的矽粉末精煉為高純度 矽粉末。 【先前技術】 一般說來,一半導體晶圓處理大體上劃分為三大步 驟’ 一預備步驟、一前處理步驟、及一後處理步驟》 前處理步驟意指藉由在晶圓表面上分層堆積許多種類 W 的薄膜,及使用預先製造的光罩重複選擇性蝕刻晶圓上 一特定部分的工作,來配置電子電路。通常將前處理稱 為「FAB」。 後處理步驟係分類為:一背側磨光處理,其研磨晶圓 背側表面,而使得形成電子電路之一側具有一預定厚 度;一組裝處理,其切割晶圓為個別晶片並連接各晶片 至一導線架;及一測試處理。 一般說來,半導體晶圓係以晶圓直徑為基礎製造為各 200948713 種尺寸,例如,3英吋、4英吋、6英吋、及8英吋。一 初始晶圓的厚度約為6〇〇至8〇〇叫,且晶圓背側係在後 處理步称中以背側磨光處理研磨,以使經過處理的晶圓 厚度約為200 μπι。 石夕粉末係包含在半導體製造之後處理步驟中由背側磨 光處理所產生之衆料内。包含在漿料内之秒粉末的粒子 尺寸約為0.02至5μπι,所具有之平均尺寸為200948713 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to recycling and recycling of tantalum powder by slurry generated from a back side lapping process (a semiconductor post-processing step). The method of powder, more specifically, the method of recovering low-purity tantalum powder from the slurry produced by the backside polishing treatment, by using a collecting centrifuge; collecting the centrifuge Q The collected cerium powder is mixed with a chemical solution to dissolve the impurities; and the cerium powder mixed with the chemical solution is refined into a high-purity cerium powder using a refining centrifuge. [Prior Art] In general, a semiconductor wafer process is generally divided into three major steps 'a preliminary step, a pre-processing step, and a post-processing step." The pre-processing step means layering on the wafer surface. The electronic circuit is configured by stacking a plurality of types of W films and repeating the selective etching of a specific portion of the wafer using a pre-fabricated mask. The pre-processing is usually referred to as "FAB". The post-processing steps are classified into: a backside polishing process that polishes the backside surface of the wafer such that one side of the electronic circuit is formed to have a predetermined thickness; and an assembly process that cuts the wafer into individual wafers and connects the wafers To a lead frame; and a test process. In general, semiconductor wafers are manufactured to a thickness of 200948713 based on wafer diameter, for example, 3 inches, 4 inches, 6 inches, and 8 inches. An initial wafer thickness is about 6 〇〇 to 8 〇〇, and the back side of the wafer is ground in a post-processing step with a backside finish to make the processed wafer approximately 200 μm thick. The Shiki powder is contained in the mass produced by the backside polishing treatment in the processing step after semiconductor fabrication. The second powder contained in the slurry has a particle size of about 0.02 to 5 μm, and has an average size of

包含在背側磨光處理所產生之漿料内的矽粉末量約為 0.05% ^那就是說,每1〇〇〇公斤的漿料包含〇 $公斤的 梦粉末。 目前,僅一家韓國半導體公司每曰所產生之漿料量為 2000噸。2〇〇〇噸的漿料包含約夏噸的矽粉末。 * 藉由工業技術的發展,半導體使用已日漸増加。因此, 半導體製造所產生之漿料量已逐步增加。 另一方面,如上文所述,不僅包含在背側磨光處理所 產生之漿料内的矽粉末百分比非常小,而且矽粉末的粒 子尺寸亦非常小。由於這些原因,收集矽粉末非常困難, 因此漿料常透過廢棄物處理公司吾棄。 本發明係關於藉由收集及精煉來自常作為廢棄物吾棄 之背侧磨光處理所產生之漿料的矽粉末而回收利用約 99·9999%(6Ν)之高純度矽粉末之方法。 一般說來,如果一離心機用於收集包含在漿料内的矽 粉末’由於包含在背側磨光處理所產生之漿料内的發粉 末之尺寸及百分比量,發粉末無法以利用一般離心機之 6 200948713 操作方法收集。因此,已使用以過濾器收集矽粉末之方 法。 在一般離心機中’漿料係透過供應管供應,當一離心 碗(bowl)及一螺旋轴(screw shaft)旋轉時,離心力 藉由旋轉該離心碗而施加至所供應的漿料。包含在漿料 内的矽粉末在碗離心之内部表面上收集,且流體藉由離 ^力排出。在離心碗之内部表面上所收集的矽粉末藉由 〇 螺旋軸而沿著離心碗之傾斜表面移動。接著,藉由離心 碗的高迷旋轉而將大量的水分乾燥去除,且矽粉末排出 至一矽粉末收集出口。 不過’如所述’包含在背侧磨光處理所產生之漿料内 之矽粉末的粒子尺寸非常小。因此,如果使用一般離心 機,初始,當矽粉末藉由螺旋軸翼而沿的離心碗之傾斜 表面移動時,在離心碗之内部表面上收集的某些矽粉末 會因而消散◎不過,隨著矽粉末的消散量增加及水分乾 φ 燥增加,大部分尺寸為2至3 μιη或更小尺寸之消散的矽 粉末並未排出至矽粉末收集出口,而是混合在流體尹並 透過流體出口向外排出。因此,包含在背側磨光處理所 產生之漿料内之矽粉末無法以一般離心機收集。由於這 些原因’漿料係丟棄,或包含在漿料内之矽粉末係以過 濾器收集。 不過’在以過濾器收集矽粉末之方法中,過濾器必須 經常更換,當包含在漿料内的矽粉末量小時,由於所收 集的矽粉末量小,收集效能差,且由於過濾器成分與所 200948713 收集的矽粉末混合,故矽粉末純度低。 另外,如將低純度矽粉末精煉為高純度矽粉末之方 法,矽粉末通常以化學方法精煉。在化學方法中矽粉 末係放置到包含化學溶液之混合器中以進行精煉。 化學溶液使用酸作為主要成分以分離包含在矽粉末内 的雜質。酸之範例包含硫酸、過氧化氫、鹽酸、硝酸、 磷酸、及其類似物等,其通常用於半導體晶圓之清潔及The amount of niobium powder contained in the slurry produced by the backside polishing treatment is about 0.05%. That is to say, the slurry per 1 kg of the crumb contains 〇 $ kg of dream powder. Currently, only one Korean semiconductor company produces 2,000 tons of slurry per urn. The 2 ton tons of slurry contains about ton of tantalum powder. * With the development of industrial technology, the use of semiconductors has been increasing. Therefore, the amount of slurry produced by semiconductor manufacturing has gradually increased. On the other hand, as described above, not only the percentage of the cerium powder contained in the slurry produced by the backside polishing treatment is very small, but also the particle size of the cerium powder is very small. For these reasons, it is very difficult to collect the tantalum powder, so the slurry is often discarded by the waste disposal company. The present invention relates to a method for recovering about 99.9999% (6 Å) of high-purity cerium powder by collecting and refining cerium powder from a slurry which is usually used as a waste backside polishing treatment. In general, if a centrifuge is used to collect the niobium powder contained in the slurry, the powder cannot be used for general centrifugation due to the size and percentage of the hair powder contained in the slurry produced by the backside polishing treatment. Machine 6 200948713 Operation method collection. Therefore, a method of collecting tantalum powder with a filter has been used. In a general centrifuge, the slurry is supplied through a supply pipe, and when a centrifuge bowl and a screw shaft are rotated, centrifugal force is applied to the supplied slurry by rotating the centrifugal bowl. The tantalum powder contained in the slurry is collected on the inner surface of the bowl centrifuge, and the fluid is discharged by the force. The tantalum powder collected on the inner surface of the centrifuge bowl is moved along the inclined surface of the centrifuge bowl by the 螺旋 screw shaft. Next, a large amount of moisture is dried and removed by the high rotation of the centrifugal bowl, and the mash powder is discharged to a powder collection outlet. However, the particle size of the tantalum powder contained in the slurry produced by the backside polishing treatment is very small as described. Therefore, if a general centrifuge is used, initially, when the enamel powder is moved along the inclined surface of the centrifuge bowl by the spiral wing, some of the tantalum powder collected on the inner surface of the centrifuge bowl will be dissipated. The amount of 矽 powder is increased and the dryness of the water is increased. Most of the 矽 powder of 2 to 3 μm or smaller in size is not discharged to the 矽 powder collection outlet, but is mixed in the fluid and transmitted through the fluid outlet. Discharged outside. Therefore, the cerium powder contained in the slurry generated by the backside polishing treatment cannot be collected by a general centrifuge. For these reasons, the slurry is discarded, or the tantalum powder contained in the slurry is collected by a filter. However, in the method of collecting the tantalum powder by the filter, the filter must be frequently changed. When the amount of tantalum powder contained in the slurry is small, the collection efficiency is poor due to the small amount of tantalum powder collected, and due to the filter composition and The 矽 powder collected by 200948713 is mixed, so the 矽 powder has low purity. Further, if a low-purity cerium powder is refined into a high-purity cerium powder, the cerium powder is usually chemically refined. In a chemical process, the powder is placed in a mixer containing a chemical solution for refining. The chemical solution uses an acid as a main component to separate impurities contained in the cerium powder. Examples of acids include sulfuric acid, hydrogen peroxide, hydrochloric acid, nitric acid, phosphoric acid, and the like, which are commonly used in the cleaning of semiconductor wafers.

一習用的化學方法並未設置任何用於由矽粉末及化學 溶液之混合物分㈣粉末的裝置。因此,—過據器或沉 殿方法係用於分離矽粉末。 -不過’在以過遽器分離碎粉末之方法中,過據器必須 經常更換’且因為來自過遽器的外來物質添加至石夕粉末 之故而無法獲得高純度梦粉末。此外,在以沉澱分離矽 粉末之方法中,須耗費長時間以分離矽粉末因此無法 精煉大量的發粉末。 · 結果 以將低純 前文提及的習用方法具有耗費長時間 度矽粉末精煉為高純度矽粉末及因此增加精煉成本之問 題0 【發明内容】 〈技術問題〉 因此,本發明已成功解決上述問題,且本發明之一實 8 200948713 施態樣提供在短時間内自背侧磨光處理所產生之漿料回 收利用矽粉末之方法,其係藉由使用離心機收集包含在 漿料内之矽粉末的細小粒子,及將來自該離心機所收集 的矽粉末進行精鍊,藉此,將由漿料獲得的矽粉末經過 精煉並回收利用成為較高純度的矽粉末。 〈技術解決方案〉 根據本發明,上述及其他實施態樣可藉由自背側磨光A conventional chemical method does not provide any means for separating the powder from the mixture of the powder and the chemical solution. Therefore, the pass-through or sink method is used to separate the tantalum powder. - However, in the method of separating the powder by the pulverizer, the eliminator must be frequently replaced, and the high-purity dream powder cannot be obtained because the foreign matter from the sputum is added to the Shiki powder. Further, in the method of separating the cerium powder by precipitation, it takes a long time to separate the cerium powder and thus it is impossible to refine a large amount of hair powder. The result is that the conventional method mentioned in the low purity has a problem that it takes a long time to refine the powder into a high-purity yttrium powder and thus increases the refining cost. [Technical Problem] Therefore, the present invention has successfully solved the above problems. And the method of the present invention provides a method for recovering the use of the tantalum powder from the slurry generated by the backside polishing treatment in a short period of time, which is obtained by collecting the crucible contained in the slurry by using a centrifuge. The fine particles of the powder and the cerium powder collected from the centrifuge are refined, whereby the cerium powder obtained from the slurry is refined and recycled to obtain a higher purity cerium powder. <Technical Solution> According to the present invention, the above and other embodiments can be polished from the back side

❹ 處理所產生之漿料回收利用矽粉末之方法來完成,其包 含: 、匕 一收集步驟‘S100’其將背側磨光處理所產生之聚料供 應至-收集離心機’—離心碗(b()wl)及—螺旋轴係水 平地安裝於收集離心機内’且安裝有一離心碗馬達M1 及-螺旋轴馬冑M2以個別地控制該離心碗及該 之旋轉;及以一離心分離方法收集漿料中的矽粉末。 一精煉步驟S200,其精煉由毁料所收集的矽粉末其 包含:一攪拌步驟S210;及一分離步驟S22〇,其中授拌 步驟議將在收集步驟_中所收集的㈣末盘以酸 作為主要成分之化學溶液混合以溶解雜質,且分離步驟 ㈣供應㈣拌步驟咖中所混合的發粉末及化學容 液之混合物給-精煉離心機,以由聚料分離所 粉末; -乾燥步真空乾燥機中對在精 S200中所精煉的矽粉末進行乾燥;以 一包裝步驟議,其包裝在乾燥步^_中所乾燥 9 200948713 的矽粉末。 精煉步驟S2〇〇、教慑牛锁 乾燥步驟S3〇〇、及包裝步驟S4〇〇係 在無塵室中執行以媒但&gt; ^ ώ 叮乂獲得问純度的石夕粉末。 在精煉步驟S200中,形成混合物之授拌步驟s2i〇及 ㈣㈣末之分離步驟_係以擾拌步驟〜分離步驟 -攪拌步驟-分離步驟之次序而交替地執行數次,通常 為2至6次。 Q 在使用收集離心機之收集步驟S100中,收集離心機係 根據#粉末收集步驟S110及一石夕粉末排出步驟犯0 而以不同方式驅動。其中在供應漿料及終止螺旋輛作動 之同時,矽粉末收集步驟S110以高速旋轉該離心碗以將 漿料分離成為矽粉末及流體,並在該離心碗之内部表面 上收集來自漿料的矽粉末,以使流體排出至一流體出 口;而在終止供應漿料及旋轉螺旋轴之同時,矽粉末排 出步驟S120降低該離心碗之旋轉速度以將所收集的矽 Θ 粉末保持在該離心碗之内部表面上,並排出在矽粉末收 集步驟S110中於該離心碗之内部表面上所收集的珍粉 末。 包含水平地安裝之該離心碗及水平地安裝在該離心碗 中之該螺旋轴的該收集離心機包含:一離心碗馬達Ml 及一螺旋軸馬達M2,其用於個別控制該離心碗及螺旋轴 之驅動與旋轉,以收集細小粒子的矽粉末。 在使用該精煉離心機之分離步驟S220中,該精煉離心 機係根據下列而驅動:一矽粉末收集步驟S22 1、一化學 200948713 溶液排出步驟S222、及一矽粉末移除步驟S223,其中矽 粉末收集步驟S221供應混合物至該離心碗中、高速旋轉 該離心碗以分離混合物成為矽粉末s及化學溶液、及在 該離心碗内側收集矽粉末s;化學溶液排出步驟s222在 矽粉末收集步驟S22i之後終止供應混合物、降低該離心 碗的旋轉速度、及以一勺狀葉片(sc〇〇p_Hke blad〇排 出殘留在該離心碗中之化學溶液;而矽粉末移除步驟 φ S223藉由在化學溶液排出步驟S222之後移動該勺狀葉 片以移除在該離心碗之内部表面上所收集的矽粉末。 該精煉離心機包含:一圓柱形外殼,其為水平地安裝, 並具有一由該外殼向下形成之排水設備(drain ); 一圓柱 形離心碗,其安裝在該外殼内侧,以藉由一馬達之動力 旋轉,並具有一形成在該離心碗之一側的孔以用於在該 離心碗之内部表面收集矽粉末;一供應管,其安裝用於 供應矽粉末之混合物至該離心碗中;一出口,其用於將 〇 在該離心碗之内部表面上所收集的矽粉末向外排出;及 一勺狀葉片,其用於供應在該離心碗之内部表面上所收 集的矽粉末至該出口,其中該勺狀葉片係安裝以由該離 心碗之旋轉中心向外移動。 〈有利的影響〉 根據本發明,自背侧磨光處理所產生之漿料回收利用 矽粉末之方法之特徵在於透過收集包含在漿料中之甚至 是小量的細小粒子之矽粉末而回收利用高純度的石夕粉 末。 11 200948713 也就是說,甚至是包含在漿料内之小量的細小粒子之 矽粉末係透過以不同方式操作該收集離心機而收集,其 能夠根據砍粉末收集步驟S110及矽粉末排出步驟sl2〇 而個別地控制該水平安裝的離心碗及螺旋轴之驅動與旋 轉。 此外’所收集之低純度矽粉末及化學溶液之混合物係 使用該精煉離心機在短時間内分離為精煉的梦粉末及流 因此,由於低純度矽粉末在短時間内精煉為高純度矽 粉末,則省去回收利用矽粉末之時間及成本。 【實施方式】 在下文中,本發明之實施例將參照伴隨圓式詳細敘述。 第1圖為說明一根據本發明之自背側磨光處理所產生 之漿料中回收利用矽粉末之方法的流程圖,而第2圖為 ❿ Μ明相同方法的方塊圖。一回收利用矽粉末之方法包含: 收集步驟S100 ’其使用收集離心機1〇〇自背側磨光處 S所產生之㈣10中收集秒粉末;精煉步驟s2〇〇,其 &lt;用精煉離心機3GG將收集步權81⑽所收集的低純度秒 粉末精煉為高純度發粉末;乾燥步驟S300,其乾燥在精 練步驟S200中經過精練㈣粉末;及包裝㈣_, 其包裝已乾燥的發粉末。 收集步驟SHH)包含:發粉末收集步驟sn〇,其在收 12 200948713 集離心機I 〇 n + # 之離心碗之内部表面上收 粉末排出步驟S19n ’物末,及梦 内部矣而 其排出在步驟S1】&quot;於離心碗之 内部表面上收集的矽粉末。 粉末收集步驟S11。中,於停止螺旋 轴作動之间時’供應漿料1〇,且離心碗以高逮旋轉,以 在離^碗之内部表面上收集⑦粉末且透過由漿料分 離梦粉末及流體而將流體排出至流體出口 Μ卜在梦粉 末排出步釋S120中’漿料1G之供應中斷以排出在步驟 sii〇中於離心碗之内部表面上收集的梦粉末,離心碗以 降低的速度旋轉以在離心碗之内部表面上料所收集的 矽粉末,且螺旋軸旋轉以排出在離心碗之内部表面上所浆料 The slurry produced by the treatment is recovered by the method of mashing powder, which comprises: 匕 a collecting step 'S100', which supplies the aggregate generated by the back side polishing treatment to the collecting centrifuge'-centrifugal bowl ( b()wl) and - the screw shaft is horizontally installed in the collecting centrifuge' and is equipped with a centrifugal bowl motor M1 and a screw shaft horse M2 to individually control the centrifugal bowl and the rotation thereof; and a centrifugal separation method The barium powder in the slurry was collected. a refining step S200, which refines the niobium powder collected by the decontamination, comprising: a stirring step S210; and a separating step S22, wherein the feeding step is to use the acid at the end of the (four) collected in the collecting step The chemical solution of the main component is mixed to dissolve the impurities, and the separation step (4) is supplied (4) the mixture of the hair powder and the chemical liquid mixture mixed in the step coffee is fed to the refining centrifuge to separate the powder from the polymer; - drying step vacuum drying The crucible powder refined in the fine S200 is dried in the machine; in a packaging step, it is packaged in the drying step of the drying powder 9 200948713. The refining step S2, the teaching of the yak lock, the drying step S3, and the packaging step S4 are performed in the clean room to obtain the purity of the stone powder of the medium, &gt; ^ ώ 。. In the refining step S200, the mixing step s2i 形成 of forming the mixture and the separation step _ at the end of (4) (4) are alternately performed several times, usually 2 to 6 times, in the order of the scramble step ~ separation step-stirring step-separation step. . Q In the collecting step S100 using the collecting centrifuge, the collecting centrifuge system is driven in a different manner according to the #powder collecting step S110 and the one-day powder discharging step. While the slurry is supplied and the screw is stopped, the tantalum powder collecting step S110 rotates the centrifuge bowl at a high speed to separate the slurry into a tantalum powder and a fluid, and collects the crucible from the slurry on the inner surface of the centrifuge bowl. a powder to discharge the fluid to a fluid outlet; and while terminating the supply of the slurry and rotating the screw shaft, the tantalum powder discharging step S120 lowers the rotational speed of the centrifuge bowl to maintain the collected tantalum powder in the centrifuge bowl On the inner surface, the precious powder collected on the inner surface of the centrifuge bowl in the tantalum powder collecting step S110 is discharged. The collecting centrifuge comprising the horizontally mounted centrifugal bowl and the screw shaft horizontally mounted in the centrifugal bowl comprises: a centrifugal bowl motor M1 and a screw shaft motor M2 for individually controlling the centrifugal bowl and the spiral The shaft is driven and rotated to collect fine particles of tantalum powder. In the separation step S220 using the refining centrifuge, the refining centrifuge is driven according to the following: a powder collection step S22 1, a chemical 200948713 solution discharge step S222, and a powder removal step S223, wherein the crucible powder The collecting step S221 supplies the mixture to the centrifuge bowl, rotates the centrifugal bowl at a high speed to separate the mixture into the tantalum powder s and the chemical solution, and collects the tantalum powder s inside the centrifuge bowl; the chemical solution discharging step s222 after the tantalum powder collecting step S22i Terminating the supply mixture, lowering the rotation speed of the centrifuge bowl, and discharging the chemical solution remaining in the centrifuge bowl with a scoop of leaves (sc〇〇p_Hke blad〇; and removing the powder φ S223 by discharging the chemical solution) After the step S222, the scoop blade is moved to remove the tantalum powder collected on the inner surface of the centrifuge bowl. The refining centrifuge comprises: a cylindrical outer casing which is horizontally mounted and has a downward direction from the outer casing a drain formed; a cylindrical centrifugal bowl mounted on the inside of the casing for rotation by a motor Rotating, and having a hole formed on one side of the centrifuge bowl for collecting the tantalum powder on the inner surface of the centrifuge bowl; a supply tube installed to supply the mixture of the tantalum powder into the centrifuge bowl; an outlet And a spoon-shaped blade for supplying the tantalum powder collected on the inner surface of the centrifuge bowl to the outlet, Wherein the scooped blade is mounted to move outward from the center of rotation of the centrifuge bowl. <Advantageous Effects> According to the present invention, the method for recovering the slurry from the backside polishing treatment using the tantalum powder is characterized by permeation collection The ruthenium powder containing even a small amount of fine particles contained in the slurry is recovered by using high-purity Shishi powder. 11 200948713 That is, even a small amount of fine particles contained in the slurry are passed through. The collecting centrifuge is operated in a different manner, and is capable of individually controlling the horizontally mounted centrifugal bowl and the spiral according to the chopping powder collecting step S110 and the chopping powder discharging step sl2〇 In addition, the mixture of the low-purity cerium powder and the chemical solution collected is separated into a refined dream powder and a stream in a short time by using the refining centrifuge, and therefore, the low-purity cerium powder is refined in a short time. The high-purity cerium powder omits the time and cost of recycling the cerium powder. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying circle. Fig. 1 is a view showing the self-back side according to the present invention. A flow chart of a method for recovering the ruthenium powder in the slurry produced by the buffing treatment, and a block diagram of the same method of Μ Μ 第 第 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 回收 回收 回收 回收 回收 回收 回收 回收 回收 回收 回收The machine 1 collects the second powder from the (4) 10 generated by the back side polishing station S; the refining step s2〇〇, which refines the low-purity second powder collected by the collection step 81 (10) to high purity by the refining centrifuge 3GG Hair powder; drying step S300, which is dried in a scouring step S200 by scouring (four) powder; and packaging (four) _, which packages the dried hair powder. The collecting step SHH) comprises: a powder collecting step sn〇, which receives the powder discharge step S19n on the inner surface of the centrifuge bowl of the centrifuge 12 487 + n + #, and the inner part of the dream is discharged Step S1] &quot; 矽 powder collected on the inner surface of the centrifuge bowl. Powder collection step S11. In the middle, when the screw shaft is stopped, the slurry is supplied 1 〇, and the centrifuge bowl is rotated at a high speed to collect 7 powder on the inner surface of the bowl and separate the fluid by the separation of the dream powder and the fluid from the slurry. Discharge to the fluid outlet 在 In the dream powder discharge step S120, the supply of the slurry 1G is interrupted to discharge the dream powder collected on the inner surface of the centrifuge bowl in the step sii, and the centrifuge bowl is rotated at a reduced speed to be centrifuged. The inner surface of the bowl is filled with the collected tantalum powder, and the screw shaft is rotated to be discharged on the inner surface of the centrifugal bowl.

收集的矽粉末。 如第3至5圖所示,收集離心機1〇〇包含:針對離心 碗120所裝設的離心碗馬達M1、及針對螺旋轴Ho所裝 設的螺旋轴馬達M2,而上述兩者係個別控制離心碗12〇 及螺旋軸130之驅動與旋轉。圓柱形的離心碗12〇係水 平地安裝在水平地安裝的圓柱形外殽11()中。離心碗12〇 之相對端以一輛承支撐以便旋轉。螺旋轴13〇係水平地 安裝在離心碗120中,其安裝方式為螺旋轴i3〇之相對 端以一轴承支推以便旋轉。 更詳細地說’收集離心機1〇〇主要包含:圓柱形外殼 110,其為水平地安裝;圓柱形離心碗12〇,其相對端以 一軸承支撐,並水平地安裝於外殼110内側、及藉由離 心碗馬達Ml傳輸之動力旋轉;圓柱形螺旋轴丨3〇,其形 13 200948713 成為〃有翼,並在其相對端以一轴承支撐且安裝於離 。碗120中及藉由螺旋軸馬達M2傳輸之動力旋轉;供 應管140 ’其用於供應漿料至螺旋軸130中;出口 150, 其用於排出所收集的矽粉末;及流體出口 160,其用於 $排除掉由漿料10分離出的矽粉末之後的流體排出,且 其中離心碗120及螺旋軸130之旋轉和漿料1〇之流量Q 係以一控制器控制。 收集離心機100進一步包含:數個支柱170,其高度 可調整並安裝在外殼11〇下方以控制收集離心機1〇〇之 位準。 離心碗120及螺旋轴13〇各自安裝為連接至其個別的 動力傳輸單元125及135,並各自以離心碗馬達Ml及螺 旋轴馬達M2之動力驅動β控制器係控制離心碗馬達mi 及螺旋轴馬達M2,以控制離心碗120及螺旋轴130之媒 動與旋轉。 φ 動力傳輸單元125及135通常使用三角皮帶(V-belt)。 如第5圖所示’在用於傳輸動力至離心碗12〇之動力傳 輸單元125中’連接至離心碗馬達Ml之三角皮帶驅動 滑輪(driving pulley) 126係驅動連接至驅動滑輪126 之三角皮帶從動滑輪(driven pulley ) 127,且從動滑輪 127使得連接至離心碗120之通心轴(quill shaft) 128 旋轉以傳輸動力。 如第4圖所示,在用於傳輸動力至螺旋轴130之動力 傳輸單元135中,連接至螺旋軸馬達M2之三角皮帶驅 200948713 動滑輪136驅動連接至驅動滑輪136之三角皮帶從動滑 輪137’且從動滑輪137使得安裝在連接支架138内側 之一軸旋轉,藉以旋轉連接至螺旋轴13〇(連接至該轴) 之轴139,以傳輸動力。 如第3至5圖所示’離心碗120係形成為圓柱形。離 心碗120之一側係形成為錐形,其内侧具有傾斜表面 12卜數個孔122係沿圓周方向繞傾斜表面121之一端形 成,其用於排出所收集的矽粉末。數個孔123係沿圓周 方向形成在離心碗120之另一側,其用於排出流體。 安裝在離心碗120内側之螺旋轴130係形成為圓柱 形°呈螺旋狀的翼131係由螺旋轴130向外形成。透過 供應管140供應之衆料1〇係流入一入口室I]】,該入口 至132係形成在螺旋軸13〇之内側的前方(在相關圖式中 為左側)。數個供應孔133係沿入口室132之圓周方向形 成’其用於供應漿料10至離心碗120 _。 〇 供應管140係形成以供應漿料10至螺旋軸13〇之入口 至132,並具有用於控制漿料1〇的流量Q之供應閥14卜 在上述的收集離心機100中,對設定在控制器中之收 集時間△ ti及排出時間△ t2來說,離心碗馬達M1及螺 旋軸馬達M2係受控以控制離心碗12〇及螺旋轴13〇之 驅動與旋轉,且安裝在供應管140内之供應閥141係受 控以控制漿料1 〇的流量Q。 第ό圖說明收集離心機100之操作方法。對設定在控 制器中之收集時間Atl來說,當供應漿料10給供應管 15 200948713 WO時,螺旋軸130停止作動,且離心碗ι2〇以4〇〇(&gt;至 7000 rpm之高速旋轉。接著,所供應的漿料1〇透過形成 在螺旋轴130之入口室132中的供應孔133供應至離心 碗120中。供應至離心碗12〇中之漿料1〇係藉由離心碗 120之高速旋轉而分離為矽粉末及流體。所分離的碎粉 末在離心碗120之内部表面上收集,而排除掉由漿料1〇 所分離出的矽粉末之流體係透過形成在離心碗12〇中之 孔123排出至流體出口 ι6〇 β 當輸入至控制器中之收集時間Atl向前推移時,對作 為輸入之排出時間A t2來說,控制器係驅動螺旋轴馬達 M2以旋轉螺旋軸130,藉以排出在離心碗12〇之内部表 面上收集的矽粉末。在排出同時,安裝在供應管14〇中 之供應閥141遭受中斷以終止供應槳料,且離心碗12〇 以1500至2500 rpm之降低的低速旋轉β 如第5圖所示,在離心碗12〇之内部表面上收集的矽 粉末藉由螺旋軸130之旋轉而朝離心碗12〇之傾斜表面 121移動,以透過形成在傾斜表面121之末端部分之孔 122排出至矽粉末收集出口 15〇。 如第1圖所示,精煉步驟S200包含:攪拌步驟S2l〇, 其將收集步驟S100所收集的低純度矽粉末與一攪拌器 中之化學溶液混合,並溶解包含在矽粉末内的雜質;及 分離步驟S220,其使用精煉離心機3〇〇而由攪拌步驟 S210製成之混合物中分離矽粉末。 分離步驟S220包含:矽粉末收集步驟S221,其收集 200948713 離心碗中的梦粉末;化學溶液排出 留在離心碗中之化學溶液 ,其排出殘 移除離心碗令經過精煉的發粉末。末移除步驟則,其 如第2圖所示’攪拌步驟s 複執抒且及刀離步驟S220係重 稷執打且通常重複1至6次。 擾掉步驟S210攪拌在收隼 度石々I 士企地 杲步騾Sl00 _所收集的低純 鉉 液以藉由化學溶液來溶Collected bismuth powder. As shown in FIGS. 3 to 5, the collecting centrifuge 1 includes a centrifugal bowl motor M1 installed for the centrifugal bowl 120 and a screw shaft motor M2 installed for the screw shaft Ho, and the two are individually The driving and rotation of the centrifuge bowl 12 and the screw shaft 130 are controlled. The cylindrical centrifuge bowl 12 is horizontally mounted in a horizontally mounted cylindrical outer tangible 11(). The opposite ends of the centrifuge bowl 12 are supported by a support for rotation. The screw shaft 13 is horizontally mounted in the centrifugal bowl 120 in such a manner that the opposite ends of the screw shaft i3 are pushed by a bearing for rotation. In more detail, the 'collection centrifuge 1' mainly comprises: a cylindrical outer casing 110 which is horizontally mounted; a cylindrical centrifugal bowl 12 〇 whose opposite ends are supported by a bearing and horizontally mounted inside the outer casing 110, and The power transmitted by the centrifugal bowl motor M1 is rotated; the cylindrical screw shaft 丨3〇, its shape 13 200948713 becomes a winged wing, and is supported by a bearing at its opposite end and mounted. The bowl 120 is rotated by the power transmitted by the screw shaft motor M2; the supply tube 140' is used to supply the slurry into the screw shaft 130; the outlet 150 is for discharging the collected tantalum powder; and the fluid outlet 160 is The fluid discharge after the removal of the tantalum powder separated by the slurry 10 is used, and wherein the rotation of the centrifuge bowl 120 and the screw shaft 130 and the flow rate Q of the slurry 1 are controlled by a controller. The collection centrifuge 100 further includes a plurality of struts 170 that are height adjustable and mounted below the casing 11 to control the level of the collection centrifuge. The centrifugal bowl 120 and the screw shaft 13 are each mounted to be connected to their respective power transmission units 125 and 135, and each of them is driven by a centrifugal bowl motor M1 and a screw shaft motor M2 to control the centrifugal bowl motor mi and the screw shaft. The motor M2 controls the medium and rotation of the centrifugal bowl 120 and the screw shaft 130. The φ power transmission units 125 and 135 generally use a V-belt. As shown in Fig. 5, 'in the power transmission unit 125 for transmitting power to the centrifugal bowl 12', a "bellow belt driving pulley" 126 connected to the centrifugal bowl motor M1 drives a V-belt connected to the driving pulley 126. A driven pulley 127, and the driven pulley 127 rotates a quiz shaft 128 connected to the centrifugal bowl 120 to transmit power. As shown in FIG. 4, in the power transmission unit 135 for transmitting power to the screw shaft 130, the V-belt drive 200948713 connected to the screw shaft motor M2 drives the V-belt driven pulley 137' connected to the drive pulley 136 and The driven pulley 137 rotates an axis mounted inside the connecting bracket 138 to rotationally connect to the shaft 139 of the screw shaft 13 (connected to the shaft) to transmit power. As shown in Figures 3 to 5, the centrifuge bowl 120 is formed in a cylindrical shape. One side of the center bowl 120 is formed in a tapered shape, and the inner side thereof has an inclined surface. The plurality of holes 122 are formed in the circumferential direction around one end of the inclined surface 121 for discharging the collected tantalum powder. A plurality of holes 123 are formed in the circumferential direction on the other side of the centrifugal bowl 120 for discharging the fluid. The screw shaft 130 mounted inside the centrifugal bowl 120 is formed into a cylindrical shape. The spiral 131 is formed outwardly from the screw shaft 130. The mass supplied through the supply pipe 140 flows into an inlet chamber I], which is formed in front of the inner side of the screw shaft 13〇 (left side in the related drawings). A plurality of supply holes 133 are formed along the circumferential direction of the inlet chamber 132 for supplying the slurry 10 to the centrifugal bowl 120_. The 〇 supply pipe 140 is formed to supply the slurry 10 to the inlet of the screw shaft 13 to 132, and has a supply valve 14 for controlling the flow rate Q of the slurry 1 卜 in the above-described collection centrifuge 100, set in In the controller, the collection time Δ ti and the discharge time Δ t2 , the centrifugal bowl motor M1 and the screw shaft motor M2 are controlled to control the driving and rotating of the centrifugal bowl 12 螺旋 and the screw shaft 13 , , and are installed in the supply tube 140 . The supply valve 141 is controlled to control the flow rate Q of the slurry 1 。. The figure illustrates the method of operation of the collection centrifuge 100. For the collection time At1 set in the controller, when the slurry 10 is supplied to the supply pipe 15 200948713 WO, the screw shaft 130 is stopped, and the centrifugal bowl ι2 is rotated at a high speed of 4 Torr (&gt; to 7000 rpm). Then, the supplied slurry 1供应 is supplied into the centrifugal bowl 120 through the supply hole 133 formed in the inlet chamber 132 of the screw shaft 130. The slurry 1 supplied to the centrifuge bowl 12 is passed through the centrifugal bowl 120. The high-speed rotation is separated into a tantalum powder and a fluid. The separated ground powder is collected on the inner surface of the centrifugal bowl 120, and the flow system of the tantalum powder separated from the slurry 1 is removed and formed in the centrifuge bowl 12 The hole 123 is discharged to the fluid outlet ι6〇β. When the collection time Atl1 input to the controller is moved forward, the controller drives the screw shaft motor M2 to rotate the screw shaft 130 with respect to the discharge time A t2 as an input. Thereby, the tantalum powder collected on the inner surface of the centrifuge bowl 12 is discharged. At the same time of discharge, the supply valve 141 installed in the supply tube 14 is interrupted to terminate the supply of the slurry, and the centrifuge bowl 12 is 1500 to 2500 rpm. Reduced low Speed rotation β As shown in Fig. 5, the tantalum powder collected on the inner surface of the centrifuge bowl 12 is moved toward the inclined surface 121 of the centrifuge bowl 12 by the rotation of the screw shaft 130 to be transmitted through the inclined surface 121. The end portion of the hole 122 is discharged to the crucible powder collecting outlet 15A. As shown in Fig. 1, the refining step S200 includes a stirring step S2l, which collects the low purity niobium powder collected in step S100 and the chemical in a stirrer The solution is mixed and the impurities contained in the niobium powder are dissolved; and a separation step S220 is performed in which the tantalum powder is separated from the mixture prepared by the stirring step S210 using a refining centrifuge 3. The separating step S220 comprises: a niobium powder collecting step S221 , which collects the dream powder in the 200948713 centrifuge bowl; the chemical solution discharges the chemical solution remaining in the centrifuge bowl, and discharges the residual centrifuge powder to remove the refined hair powder. The final removal step is as shown in FIG. 'Stirring step s re-execution and the knife is removed from step S220 and is usually repeated 1 to 6 times. Disturbing step S210 is stirred in the collection of stone 々 I Shishi 杲 step 骡Sl00 _ received Hyun low purity liquid chemical in solution by dissolving

解混合在矽粉末内的雜質。 Ο 々分離步驟S·使用精煉離心機3〇〇而由梦粉末及化學 /谷液之混合物中僅分離出矽粉末’其中雜質在攪拌步驟 S210中由化學溶液所率解。精練離心機鳩係根據下列 步驟操作:矽粉末收集步驟S221,其供應混合物至離心 碗中,並以高速旋轉離心碗以分離混合物成為矽粉末S 及化學溶液’以使石夕粉末s收集在離心碗中;化學溶液 排出步驟S222,其在矽粉末收集步驟S221之後,終止 供應混合物,並降低離心碗的旋轉速度以藉由勺狀葉片 (scoop-hke blade )排出餘留在離心碗中的化學溶液; 及矽粉末移除步驟S223,其藉由在化學溶液排出步驟 S222後移動勺狀葉片來移除離心碗中所收集的發粉末。 如第7至1〇圖所述,精煉離心機3〇〇主要包含:基底 31〇 ;圓柱形外殼32〇,其水平地安裝在基底31〇上;離 心碗330 ’其水平地安裝在外殼320中以便旋轉;馬達 34〇’其安裝為與一動力傳輸單元連接,以旋轉離心碗 330 ;出口管350,其用於排出在離心碗330中分離的矽 17 200948713 粉末;勺狀葉片360,其用於排出在離心碗33〇之内部 表面上分離收集的矽粉末S;以及供應管370,其用於供 應矽粉末及化學溶液之混合物至離心碗33〇中。 如第7及8圖所示’基底310包含:上部基底311, 其形成為具有一厚度之正方形面板;下部基底312,其 形成以對應上部基底311;及數個緩衝構件313,其放置 在上部基底311及下部基底312間。一般說來,緩衝構 件313使用具有彈性的橡膠以吸收正震波(n〇mal ® shock )。 如第7至10圖所示’外殼320係形成為圓柱形並水平 地安裝在基底310上。排水設備(drain) 321由外殼320 向下形成。由在離心碗330中分離出矽粉末s之混合物 的流體係透過排水設備321排出。 旋轉轴外殼344係安裝在外殼320之一侧《連接至離 心碗330之旋轉軸343係安裝在旋轉轴外殼344中,其 φ 將在稍後敘述。蓋322係放置在外殼320之另一側。 如第9圖所示’離心碗330係形成為圓柱形,並水平 地安裝以在外殼320中旋轉^離心碗330之一側受到支 撐,以圍繞安裝在旋轉軸外殼344中之旋轉轴343旋轉, 而旋轉軸外殼344係藉由旋轉軸343之旋轉而旋轉。如 第9至12圖所示,離心碗330之另一側包含孔331。排 除掉由供應至離心碗330中之混合物所分離出的矽粉末 S之後的流體係透過孔331排出,以便透過外殼320之 排水設備321向外排出。 18 200948713 如第9至12圖所示,形成在離心碗wo之另一侧之孔 的尺寸小於離心碗3 3 0之内部直徑,以防止在離心 碗330之内部表面上分離收集的矽粉末s透過孔SB排 出。 馬達340係安裝在基底31〇之一侧,其藉由動力傳輸 單το來旋轉離心碗33〇。如第7圖所示馬達34〇包含: 驅動皮帶輪341 ;從動皮帶輪342,其藉由一皮帶操作性 地連接至驅動皮帶輪341 ;及旋轉轴343,其操作性地連 ® 揍至從動皮帶輪342。 馬達340電連接至控制器,以使離心碗33〇之驅動與 旋轉受到控制器控制。 如第9圖所示,出口管35〇通過外殼32〇之蓋322並 穿過離心碗330之孔33 1安裝在離心碗33〇内側,以排 出在離心碗330中分離收集的矽粉末s。 如第9至12圖所示’出口管35〇包含:入口 351,其 〇 形成在離心碗330内側;及導板352,其用於引導由勺 狀葉片360(稍後敘述)所供應的矽粉末s至入口 351。 如第11圖所示,出口管35〇可進一步包含:螺旋轴 354,其在出口 350内侧形成為具有螺旋形翼,以輕易地 將流入入口 35 1的矽粉末S排出至外側;及螺旋轴馬達 355’其旋轉該螺旋轴354。出口 3 53係形成在出口管35〇 之一側。 螺旋轴馬達355電連接至控制器,以使控制器控制螺 旋軸354之驅動與旋轉。 19 200948713 如第7至12圖所示’勺狀葉片36()係安裝在離心碗 330内侧,以使由離心碗330之旋轉中心向外移動,並 供應在離心碗33〇之内部表面上分離收集时粉末給出 口管350之入口 351。 勺狀葉片3 60藉由_移位器而由離心碗33()内側(旋轉 巾心)向外移動。如第7至10圖所示,用於移動勺狀葉 360之移位器包含:勺狀葉片軸⑹,其—侧通過外 殼320之蓋322,而另一側安裝在勺狀葉片360上,並 肖時由離心碗之旋轉中心偏心設置;凸輪連桿(camlink) 362’其固定地安裝以操作性地連接至勺狀葉片抽如之 一端,及脹縮活塞(expanding and contracting piston) 36卜其安裝以藉由一插針而在凸輪連桿362中柩轉。如 第7及8圖所示’制動器365係安裝在外殼32〇之蓋322 的一側’以限制凸輪連桿362之樞轉。 當凸輪連桿362藉由活塞361的膨脹與收縮而繞著勺 〇 狀葉片軸363樞轉,及勺狀葉片轴363藉由凸輪連桿362 之樞轉而旋轉時,移位器如第10至12圖所示般由離心 碗330之中心向外或向内移動勺狀葉片360。 在勺狀葉片360的一端裝有壓力感測器364。 壓力感測器364量測施加至勺狀葉片36〇之壓力,以 區分由勺狀葉片360所引導的材料。 控制器控制活塞361之脹縮且因而控制勺狀葉片36〇 之移動。控制器以傳送至壓力感測器364之訊號為基礎 來區分由勺狀葉片360所引導的材料為矽粉末及化學溶 20 200948713 液(流體)。 如第9圖所示’供應管3 70通過外殼320之蓋322並 安裝在離心碗3 3 0之孔3 3 1中,以供應混合物至離心碗 330 中。 由於在攪拌器中攪拌之矽粉末及化學溶液的混合物係 供應給供應管370,控制器則控制供應給供應管37〇之 混合物的供應。為此目的,一般說來,一閥係安裝在供 應管370之一開口中以控制供應給供應管37〇之混合物。 外殼320、離心碗330、出口管350、勺狀葉片360、 及其類似物等係以鐵氟龍(Teflon )塗佈,以防止精煉的 矽粉末内含有外來物質。 乾燥步驟S3 00係用於乾燥精煉的石夕粉末而使之具有 高純度’且較佳地’其可在一真空乾燥機中執行。 包裝步釋S400包裝乾燥的梦粉末。 精煉步驟S200、乾燥步驟S300、及包裝步驟S400係 〇 在無塵室中執行以獲得高純度的矽粉末》 本發明已使用較佳的示範實施例敘述。不過,須了解 本發明之範圍並未受限於所揭示之實施例。反之,本發 明之範圍意欲包含熟悉此技術者在能力範圍内使用目前 已知或未來之技術及等同物所發展之不同的修改及替代 女排。因此’申請專利範圍之範疇必須與最廣泛的詮釋 一致以便包含所有這類修改及類似的安排。 【圖式簡單說明】 21 200948713 斂,+、發月之延些及其他實施態樣與優點由下文之實施例 連同伴隨圖式當可更加明白及更容易了解’其中: «為-流程圖,其說明—根據本發明之自背側磨 自所產生之漿料中回收利用矽粉末之方法; 第2圖為一方塊圖,其說明根據本發明之自背側磨光 理所產生之㈣中回收利用㈣末之方法; 第3圖為一前視剖面圖,其說明根據本發明之一較佳 ❹ 實施例之一收集 離心機; 第4圖為一部分細節剖面圖,其說明用在本發明之收 集離心機; 第5圖為一部分細節剖面圖,其說明用在本發明之收 集離心機; 第6圖為說明根據本發明操作收集離心機之步驟圖; 第7圖為一平面圖,其說明用在本發明之一精煉離心 機; 0 第8圖為一側視圖,其說明用在本發明之精煉離心機; 第9圖為-前視剖面圖,其說明用在本發明之精煉離 心機; 第1〇圖為一側視剖面圖,其制用在本發明之精煉離 心機; 帛11 ®為根據本發明之另—實施例之精煉離心機之 部分細節剖面圖;及 第12圖為說明根據本發明之另一實施例之精煉離心 機之操作圖。 22 200948713The impurities mixed in the tantalum powder are decomposed. Ο 々 Separation step S· Using a refining centrifuge 3, only the cerium powder is separated from the mixture of the dream powder and the chemical/gluten solution, wherein the impurities are decomposed by the chemical solution in the stirring step S210. The scouring centrifuge is operated according to the following steps: a powder collection step S221, which supplies the mixture into a centrifuge bowl, and rotates the centrifuge bowl at a high speed to separate the mixture into a mash powder S and a chemical solution 'to collect the shi s powder s in the centrifuge In the bowl, the chemical solution is discharged to step S222, after the mash powder collecting step S221, the supply mixture is terminated, and the rotation speed of the centrifuge bowl is lowered to discharge the chemistry remaining in the centrifuge bowl by a scoop-hke blade a solution; and a bismuth powder removing step S223, which removes the hair powder collected in the centrifuge bowl by moving the scoop blade after the chemical solution discharging step S222. As shown in FIGS. 7 to 1 , the refining centrifuge 3 〇〇 mainly comprises: a base 31 〇; a cylindrical outer casing 32 〇 horizontally mounted on the base 31 ;; and a centrifugal bowl 330 ′ horizontally mounted on the outer casing 320 For rotation; the motor 34'' is mounted to be coupled to a power transmission unit for rotating the centrifuge bowl 330; the outlet tube 350 for discharging the 矽17 200948713 powder separated in the centrifuge bowl 330; the scooped blade 360, For discharging the tantalum powder S separated and collected on the inner surface of the centrifuge bowl 33; and a supply tube 370 for supplying the mixture of the tantalum powder and the chemical solution into the centrifuge bowl 33. As shown in FIGS. 7 and 8, the substrate 310 includes: an upper substrate 311 formed as a square panel having a thickness; a lower substrate 312 formed to correspond to the upper substrate 311; and a plurality of buffer members 313 placed on the upper portion Between the substrate 311 and the lower substrate 312. In general, the cushioning member 313 uses elastic rubber to absorb a shock wave (n〇mal ® shock ). The outer casing 320 is formed in a cylindrical shape as shown in Figs. 7 to 10 and is horizontally mounted on the substrate 310. A drain 321 is formed downward from the outer casing 320. The flow system separated from the mixture of the cerium powder s in the centrifugal bowl 330 is discharged through the draining device 321. The rotary shaft housing 344 is attached to one side of the housing 320. The rotary shaft 343 connected to the center bowl 330 is mounted in the rotary shaft housing 344, which will be described later. A cover 322 is placed on the other side of the outer casing 320. As shown in Fig. 9, the 'centrifugal bowl 330 is formed in a cylindrical shape and horizontally mounted to be rotated in the outer casing 320. One side of the centrifugal bowl 330 is supported to rotate around the rotating shaft 343 mounted in the rotating shaft housing 344. And the rotating shaft housing 344 is rotated by the rotation of the rotating shaft 343. As shown in Figures 9 through 12, the other side of the centrifuge bowl 330 includes an aperture 331. The flow system discharged from the tantalum powder S separated from the mixture supplied to the centrifugal bowl 330 is discharged through the hole 331 to be discharged to the outside through the drain 321 of the outer casing 320. 18 200948713 As shown in Figures 9 to 12, the size of the hole formed on the other side of the centrifuge bowl wo is smaller than the inner diameter of the centrifuge bowl 330 to prevent separation of the collected tantalum powder on the inner surface of the centrifuge bowl 330. It is discharged through the hole SB. The motor 340 is mounted on one side of the base 31, which rotates the centrifuge bowl 33 by power transmission το. The motor 34A as shown in Fig. 7 comprises: a drive pulley 341; a driven pulley 342 operatively connected to the drive pulley 341 by a belt; and a rotary shaft 343 operatively connected to the driven pulley 342. The motor 340 is electrically coupled to the controller such that the drive and rotation of the centrifuge bowl 33 is controlled by the controller. As shown in Fig. 9, the outlet tube 35 is attached to the inside of the centrifuge bowl 33 through the cover 322 of the outer casing 32 and passed through the hole 33 1 of the centrifuge bowl 330 to discharge the tantalum powder s separated and collected in the centrifuge bowl 330. As shown in Figs. 9 to 12, the 'outlet pipe 35' includes an inlet 351 which is formed inside the centrifugal bowl 330, and a guide 352 for guiding the crucible supplied by the scoop blade 360 (described later). Powder s to inlet 351. As shown in Fig. 11, the outlet pipe 35A may further include: a screw shaft 354 formed inside the outlet 350 to have a spiral wing to easily discharge the tantalum powder S flowing into the inlet 35 1 to the outside; and a screw shaft Motor 355' rotates the screw shaft 354. The outlet 3 53 is formed on one side of the outlet pipe 35〇. The screw shaft motor 355 is electrically coupled to the controller to cause the controller to control the drive and rotation of the solenoid shaft 354. 19 200948713 As shown in Figures 7 to 12, the scoop-like blade 36 () is mounted inside the centrifuge bowl 330 so as to be moved outward from the center of rotation of the centrifuge bowl 330 and supplied on the inner surface of the centrifuge bowl 33. The powder is supplied to the inlet 351 of the outlet pipe 350 at the time of collection. The scoop-like blade 3 60 is moved outward by the inside of the centrifuge bowl 33 () by the _ shifter. As shown in Figures 7 through 10, the shifter for moving the scoop 34 includes a scooped blade shaft (6) that passes sideways through the cover 322 of the outer casing 320 and the other side is mounted on the scooped blade 360. And the cam is eccentrically disposed by the center of rotation of the centrifuge bowl; the cam link 362' is fixedly mounted to be operatively coupled to one end of the scoop blade, and an expanding and contracting piston 36 It is mounted to be twisted in the cam link 362 by a pin. As shown in Figures 7 and 8, the 'brake 365 is attached to one side of the cover 322 of the outer casing 32' to limit the pivoting of the cam link 362. When the cam link 362 is pivoted about the scoop-like vane shaft 363 by expansion and contraction of the piston 361, and the scoop-like vane shaft 363 is rotated by the pivoting of the cam link 362, the shifter is like the tenth The scooped blade 360 is moved outwardly or inwardly from the center of the centrifuge bowl 330 as shown in FIG. A pressure sensor 364 is attached to one end of the scooping blade 360. The pressure sensor 364 measures the pressure applied to the scooped blade 36〇 to distinguish the material guided by the scooped blade 360. The controller controls the expansion and contraction of the piston 361 and thus controls the movement of the scooping blade 36A. Based on the signal transmitted to the pressure sensor 364, the controller distinguishes the material guided by the scooping blade 360 as a powder and a chemical solution (20090013). As shown in Fig. 9, the supply pipe 3 70 passes through the cover 322 of the outer casing 320 and is installed in the hole 3 3 1 of the centrifuge bowl 330 to supply the mixture into the centrifuge bowl 330. Since the mixture of the mash powder and the chemical solution supplied to the supply pipe 370 is stirred in the agitator, the controller controls the supply of the mixture supplied to the supply pipe 37. For this purpose, in general, a valve train is installed in one of the openings of the supply pipe 370 to control the mixture supplied to the supply pipe 37. The outer casing 320, the centrifugal bowl 330, the outlet pipe 350, the scooped blade 360, and the like are coated with Teflon to prevent the foreign matter contained in the refined tantalum powder. The drying step S3 00 is for drying the refined Shishi powder to have a high purity 'and preferably' it can be carried out in a vacuum dryer. Packing step release S400 package dry dream powder. The refining step S200, the drying step S300, and the packaging step S400 are performed in a clean room to obtain high purity niobium powder. The present invention has been described using preferred exemplary embodiments. However, it is to be understood that the scope of the invention is not limited by the disclosed embodiments. Rather, the scope of the present invention is intended to encompass various modifications and alternatives to those skilled in the art, which are in the <RTIgt; Therefore, the scope of the patent application must be consistent with the broadest interpretation to include all such modifications and similar arrangements. [Simplified illustration] 21 200948713 Convergence, +, extension of the month and other implementations and advantages The following examples, together with the accompanying schema, can be more clearly understood and easier to understand 'where: «for-flow chart, Description of the Invention - A method for recovering ruthenium powder from a slurry produced from a back side grinding according to the present invention; FIG. 2 is a block diagram illustrating (4) of the self-back side honing according to the present invention. A method of recycling (4) at the end; FIG. 3 is a front cross-sectional view illustrating a collecting centrifuge according to one of the preferred embodiments of the present invention; FIG. 4 is a partial cross-sectional view illustrating the use of the present invention Figure 5 is a partial cross-sectional view illustrating a collection centrifuge used in the present invention; Figure 6 is a flow chart illustrating the operation of the collection centrifuge according to the present invention; and Figure 7 is a plan view illustrating Used in one of the refining centrifuges of the present invention; FIG. 8 is a side view illustrating a refining centrifuge used in the present invention; and FIG. 9 is a front cross-sectional view illustrating the refining centrifuge used in the present invention The first picture is one Side cross-sectional view for use in a refining centrifuge of the present invention; 帛11® is a partial detailed cross-sectional view of a refining centrifuge according to another embodiment of the present invention; and FIG. 12 is a view illustrating another embodiment in accordance with the present invention An operational diagram of the refinery centrifuge of the embodiment. 22 200948713

【主要元件符號說明】 S100 收集步驟 S110 矽粉末收集步驟 S120 矽粉末排出步驟 S200 精煉步驟 S210 攪拌步驟 S220 分離步驟 S221 矽粉末收集步驟 S222 化學溶液排出步驟 S223 矽粉末移除步驟 S300 乾燥步驟 S400 包裝步驟 Δ tl 收集時間 △ t2 排出時間 Ml 離心碗馬達 M2 螺旋軸馬達 10 漿料 100 收集離心機 110 外殼 120 離心碗 121 傾斜表面 122、 123 孔 23 200948713[Main component symbol description] S100 Collection step S110 矽 powder collection step S120 矽 powder discharge step S200 refining step S210 stirring step S220 separation step S221 矽 powder collection step S222 chemical solution discharge step S223 矽 powder removal step S300 drying step S400 packaging step Δ tl collection time Δ t2 discharge time Ml centrifugal bowl motor M2 screw shaft motor 10 slurry 100 collection centrifuge 110 housing 120 centrifugal bowl 121 inclined surface 122, 123 hole 23 200948713

125、 135 動力傳輸單元 126、 136 驅動滑輪 127、 137 從動滑輪 128 通心轴 130 螺旋轴 131 翼 132 入口室 133 供應孔 138 連接支架 139 轴 140 供應管 141 供應閥 150 出口 160 流體出口 170 支柱 300 精煉離心機 310 基底 311 上部基底 312 下部基底 313 緩衝構件 320 外殼 321 排水設備 322 蓋 330 離心碗 24 200948713 孔 馬達 、342 皮帶輪 旋轉軸 外殼 出口管/出口 入口 導板 〇 出口 螺旋軸 螺旋轴馬達 勺狀葉片 活塞 凸輪連桿 勺狀葉片軸 壓力感測器 制動器 供應管125, 135 power transmission unit 126, 136 drive pulley 127, 137 driven pulley 128 through mandrel 130 screw shaft 131 wing 132 inlet chamber 133 supply hole 138 connection bracket 139 shaft 140 supply tube 141 supply valve 150 outlet 160 fluid outlet 170 pillar 300 Refining centrifuge 310 base 311 upper base 312 lower base 313 cushioning member 320 outer casing 321 drainage device 322 cover 330 centrifugal bowl 24 200948713 hole motor, 342 pulley rotating shaft housing outlet pipe / outlet inlet guide 〇 outlet screw shaft screw shaft motor scoop Blade piston cam link scoop vane shaft pressure sensor brake supply tube

Claims (1)

200948713 七、申請專利範圍: !.-種自—背侧磨光(lapping)處理所產生之一漿料 _回收利用梦粉末之方法,其包含·· 一收集步驟S100,其收集該漿料中的矽粉末,其中 該收集步驟S100供應該漿料給一收集離心機1〇〇,二離 心碗(b〇wl)及一螺旋軸係水平地安裝在該收集離心機 1〇0中’且—離心碗馬達M1及—螺旋I*馬it M2係安裝 以個別地控制該離心碗及該螺旋轴之旋轉,並以一離心 分離方法收集該漿料中的矽粉末;以及 一精煉步驟S200,其精煉由該漿料中所收集的矽粉 末’其中該精煉步驟S200包含:一授拌步驟S21〇,其 將在該收集步驟S100中所收集的矽粉末舆一以酸作為 主要成分之化學溶液混合並溶解雜質;及一分離步驟 S220’其供應在該攪拌步驟S210中混合之一混合物給一 精煉離心機300並分離矽粉末。 2. 如申請專利範圍第1項所述之方法,更包含: 一乾燥步驟S300,其在一真空乾燥機中將在該精煉 步驟S200中所精煉的矽粉末進行乾燥;以及 一包裝步驟S400,其包裝在該乾燥步驟S300中所 乾燥的秒粉末。 3. 如申請專利範圍第1項所述之方法,其中該精煉步驟 26 200948713 S200以攪採+ 驟〜分離步驟—攪拌步驟—分離步驟之次 序而交替地勃 钒仃形成該混合物之該攪拌步驟S21〇及分 離矽粉末之該分離步驟 S220。 , 1Λ申請專利範圍第1項所述之方法,其中使用該收集 〜100之該收集步驟S100包含: -矽粉末收集步驟S110’纟收集在該離心碗之一内 〇 ° 收集矽粉末,其中在供應該漿料及終止該螺旋 抽之作動的同時,該步驟S110以高速旋轉該離心碗,藉 ㈣㈣料分離成為w及流體,並在該離心碗之該 内部表面上枚集來自該讓料之梦粉末,以使流體排出至 一流體出口;以及 一矽粉末排出步驟S120,其排出在該離心碗之該内 部表面上收集的矽粉末,其中在終止供應該漿料及旋轉 該螺旋轴之同時,該步驟S120降低該離心碗之旋轉速 ❹纟’以將收集的矽粉末保持在該離心碗之該内部表面 上,並將在該離心碗之該内部表面上收集的矽粉末排出。 5. #申請專利範圍第!項所述之方法,其中使用該精煉 離心機300之該分離步驟S220包含: S221 一矽粉末收集步驟S22卜其供應該混合物至該離心 碗中、以高速旋轉該離心碗而藉以由該混合物分離出矽 粉末S及化學溶液、及在該離心碗内側收集矽粉末s ; 一化學溶液排出步驟S222,其在該收集步驟 27 200948713 之後終止供應該混合物、降低該離心喊之旋轉速度、及 藉由一勺狀葉片(SCOOp_like blade )掷出殘留在該離心 碗中之化學溶液;以及 步踢S222之後,銘备 货^移動該勺狀葉 集的矽粉末。 發粉末移除步驟S223, 其藉由在談化學溶液排出 片以移除該離心碗中所收200948713 VII. Patent application scope: !.--One kind of slurry produced by the back-lapping process_The method of recycling dream powder, which comprises a collection step S100, which collects the slurry The crucible powder, wherein the collecting step S100 supplies the slurry to a collecting centrifuge 1 , a two-centrifugal bowl (b〇wl) and a screw shaft are horizontally installed in the collecting centrifuge 1〇0 and a centrifuge bowl motor M1 and a helix I* horse it M2 are installed to individually control the rotation of the centrifuge bowl and the screw shaft, and collect the tantalum powder in the slurry by a centrifugal separation method; and a refining step S200, Refining the tantalum powder collected from the slurry, wherein the refining step S200 comprises: a mixing step S21, which mixes the tantalum powder collected in the collecting step S100 with a chemical solution containing acid as a main component And dissolving the impurities; and a separating step S220' supplying the mixture in the stirring step S210 to a refining centrifuge 300 and separating the niobium powder. 2. The method of claim 1, further comprising: a drying step S300 of drying the tantalum powder refined in the refining step S200 in a vacuum dryer; and a packaging step S400, It is packaged in the second powder dried in the drying step S300. 3. The method of claim 1, wherein the refining step 26 200948713 S200 alternates the vanadium hydrazine to form the mixture in the order of agitation + agglomeration - separation step - agitation step - separation step This separation step S220 of S21〇 and the separation of the cerium powder. The method of claim 1, wherein the collecting step S100 using the collection ~100 comprises: - a 矽 powder collecting step S110 纟 collecting 之一 in one of the centrifugal bowls, collecting 矽 powder, wherein While supplying the slurry and terminating the operation of the spiral pumping, the step S110 rotates the centrifugal bowl at a high speed, and separates into a fluid and a fluid by (4) (4), and collects the material from the material on the inner surface of the centrifugal bowl. Dreaming the powder to discharge the fluid to a fluid outlet; and a powder discharge step S120 discharging the tantalum powder collected on the inner surface of the centrifuge bowl, wherein the supply of the slurry and the rotation of the screw shaft are terminated The step S120 lowers the rotation speed of the centrifuge bowl to hold the collected tantalum powder on the inner surface of the centrifuge bowl, and discharges the tantalum powder collected on the inner surface of the centrifuge bowl. 5. #Application for patent scope! The method of claim 7, wherein the separating step S220 of using the refining centrifuge 300 comprises: S221 a powder collecting step S22, which supplies the mixture into the centrifuge bowl, and rotates the centrifuge bowl at a high speed to thereby separate the mixture Extracting the powder S and the chemical solution, and collecting the tantalum powder s on the inside of the centrifuge bowl; a chemical solution discharging step S222, which terminates the supply of the mixture after the collecting step 27 200948713, reduces the rotational speed of the centrifugal shout, and A scoop-like blade (SCOOp_like blade) throws the chemical solution remaining in the centrifuge bowl; and after step S222, the stock picks the powder of the spoon-shaped leaf set. a powder removing step S223, which removes the centrifuge bowl by discharging the chemical solution 2828
TW098104240A 2008-03-05 2009-02-10 Method of reclaiming silicon powder from slurry generated during back lapping process TW200948713A (en)

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CN109137065A (en) * 2018-10-24 2019-01-04 镇江环太硅科技有限公司 One kind is for the silicon material recovery and treatment method that gives up
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