200903191 九、發明說明： 【發明所屬之技術領域】 本發明涉及一種狹縫式塗布機用預備排出裝置，尤其涉 及可以將用於清除塗布到滾輪表面的感光液的溶液均勻地 供應到滾輪表面的狹縫式塗布機用預備排出裝置。 【先前技術】BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a preliminary discharge device for a slit coater, and more particularly to a solution for uniformly removing a photosensitive liquid applied to a surface of a roller to a surface of a roller. A preliminary discharge device for a slit coater. [Prior Art]
本發明涉及一種狹縫式塗布機用預備排出裝置，尤其涉 及可以將用於清除塗布到滾輪表面的感光液的溶液均勻地 供應到滚輪表面的狹縫式塗布機用預備排出裝置。 背景技術 通常，半導體設備或者平板顯示器（FPD ·· flat panei _㈣的t造工程中1 了使在被處理基板㈣晶片或者 玻璃基板)上執行特定功能的薄m，例如氧化薄膜、金屬 薄膜、半導體薄膜等以所需的形狀圖案化(patterning)，進 行將”光源'産生反應的感光液（sensitive邮如W)塗布到所 述薄膜上面的工程。 如上所述地爲在被處理基板的薄臈上構成預定的回路模 式而塗布感域形成感光膜，並對應回路模式使所述感光 膜曝光’然後對曝光的部位或者沒有曝光的部位進行顯影 處理進而清除的一系歹丨丨讲 < 、、 '、歹I過耘稱4影印工程或者光刻 (Photolithography)工程。 所述影印工程中的咸Φ^+ Y的级先膜的厚度應以預定厚度均勻形 成。例如，若感光膜厚度比其 乂 基丰值厗，則溥膜中所需的部 为就不會被蝕刻，而若感光 手！比基準值溥，則溥獏的 131144.doc 200903191 被餘刻程度就會超過預期的蝕刻量。因此如果要在被處理 基板上形成厚度均勻的感光膜，應首先在被處理基板上均 勻地塗布感光液。 玻离基板主要使用利用平面板（surface plate)支樓基板的 狀心下’使形成在橫跨基板方向排出感光液的狹缝（slit)的 狹縫喷嘴沿著垂直於狭縫的形成方向移動的同時利用所述The present invention relates to a preliminary discharge device for a slit coater, and more particularly to a preliminary discharge device for a slit coater which can uniformly supply a solution for removing a photosensitive liquid applied to a surface of a roller to a surface of a roller. 2. Description of the Related Art In general, a semiconductor device or a flat panel display (FPD · flat panei _ (4) has a thin m for performing a specific function on a substrate (four) wafer or a glass substrate to be processed, such as an oxide film, a metal film, or a semiconductor. The film or the like is patterned in a desired shape, and a photosensitive liquid (sensitive, such as W) that reacts with the "light source" is applied to the film. As described above, the substrate is processed. Forming a predetermined loop mode and coating the sensing region to form a photosensitive film, and exposing the photosensitive film to a loop mode, and then developing or treating the exposed portion or the unexposed portion to remove a layer of sputum < , ', 歹 I 耘 4 4 photocopying engineering or photolithography (Photolithography) project. The thickness of the first film of salt Φ ^ + Y in the photocopying project should be uniformly formed with a predetermined thickness. For example, if the film thickness ratio If the 乂 base value is 厗, then the desired part of the enamel film will not be etched, and if the sensitized hand is 比 than the reference value, then 溥貘 131144.doc 200903191 is The degree of engraving will exceed the expected amount of etching. Therefore, if a photosensitive film having a uniform thickness is to be formed on the substrate to be processed, the photosensitive liquid should be uniformly coated on the substrate to be processed first. The glass substrate is mainly used by using a surface plate. Under the sub-center of the support substrate, the slit nozzle formed in the slit that discharges the photosensitive liquid in the direction of the substrate is moved while being perpendicular to the direction in which the slit is formed.
狹缝在基板表面塗布感光液的非旋轉式塗布（sinless coating)法或者狹縫式塗布（sm⑶如吨）法。 圖1疋抓用非旋轉式塗布法的以往的感光液塗布裝置（狹 縫式塗布機）的概略的立體圖。 參照圖1可知，以往的狹縫式塗布機包含：平面板1〇， 裝載亚支撐需要進行感光液處理的基板S;狹縫喷嘴2〇, 在裝載於所述平面板10的基板S上面塗布感光液。 所述狹縫喷嘴2G在其底端形成長度與基板s的寬度謂 應的狹縫（未圖示）。當在基板8上面塗布感純時，在平 面板10的-側待機的狹縫噴嘴2〇朝基板8方向前進並通過 所述狹縫在基板S表面塗布感光液，㈤當感光液的塗布作 業完成後’後退至平面板丨〇 一側待機。 另外，以往的狹縫式塗布機的狹縫喷嘴2〇在塗布完感光 液之後’所述狹縫及所述狹縫周圍的兩側邊緣⑽)殘留著 t機絕緣物質或者部分感光液。在狹縫噴嘴20待機的時 段’所述殘留的感光液與外氣接觸後屬性會發生變化或者 狹缝㈣2G待機後再錢行㈣«時會發生H(surge) 現象’因而對於在基板上面形成均質的塗布臈造成不良影 13J144.doc 200903191 響。 爲解決上述問題，以往的狹縫式塗布機具備預備 置30，以用於狹縫喷嘴2〇對基板s進行涂 ^ 的塗布液或者在進行塗布時防止巨汤現象。月J讀殘留 圖圖2是圖1中示出的狹縫式塗布機用預備排出裝置的剖視 f 入參照圖2可知，以往的狹縫式塗布機用預備排出褒置包 …袞輪3卜接收狹縫噴嘴2〇預備排出的排出 …可旋轉地支撐所述滾輪31並將滾輪”收 = 洗元件 41、42、43、44、45、46Wl 向設置。 者所述滾輪的旋轉方 具體說’滾輪3!在收容部32内部旋轉的 狹縫喷嘴2。接收殘留於狹缝上的殘留液，而收容部： =^貝於=存在下部的清洗液内清除滚仙外沿的排出 二I:蘇a 件31包含：第一嘴嘴，給滾輪31的表面 I2*與滾輪3一1的外沿接觸而清除異物；第二喷嘴43,喷射 :、生液、’第二喷嘴44 ’在滾輪3 1浸漬於清洗液之後再次喷 ”月洗液；刮刀45’清除殘留清洗液；以及第四喷嘴，用 於喷射乾燥空氣。 =如上構成的以往的預備排出裝置執行的預備排出裝 》過程如下。狹縫喷_備排出藥液，例如感光 =朝:側方向旋轉的滾輪31表面，該感光液被旋轉的滾 神移运到收容部内部。在這個過程中，感光液被第一喷 13ll44.doc 200903191 嘴41喷射到滾輪31表面的溶液一次 液内的異物則通過刮刀42清除。 ’而包含於該感光 並Si:用儲存於收容部32内的清洗液清洗滾輪表面， 並k過α洗液清洗之後通過第三喷 輪表面進行清洗，最後利用第四4 和刮刀45再次姆滚 乾燥，由此=、生Γ 嘴46對滾輪31表面進行 嘴預備排+ Μ❼Μ上的作#過程在藥液通過狹縫嘴 I預備排出的時間内連續反復地進行。 、 根據如上所述的以往技術，以稀釋 滾輪表面的溶液’例如溶劑通過所述苐：噴二到 或者通過利用滴落單元(未圖示)的單純的滴落：射 滾輪表面稀釋感光液。 ^ 土布到 但是，如上所述地利用喷嘴喷射或者單純滴落 輪表面提供溶料，—部分溶液無法正確供應到滾輪^ 而飛：及流到外部或者其他區域導致消耗更多量的溶液， 而且d無法均勾塗布到整個滾輪導致對 效率降低。 衣甸的π洗 【發明内容】 本發明是爲了解決上述問題而提出的，本發明的 於提供-種狹缝式塗布機用預備排出裝置，其顯著一 要的浪費’且可以將溶液均勻地塗布 面:由=可以提高對滾輪表面的感光液的清洗效率。、 爲了實現上述目的，本發明提供的狹縫式塗布機 排出裝置包含：滾輪，接收通過狹缝喷嘴預備 液；收容部，可旋鳇沾± _、Α 的感光 疋轉地支撐滾輪並使收容的滾輪的一部分 131144.doc 200903191 露出到外部；、、主、、生_ ^ q洗兀件，在收容部内沿著所述滾輪外表面 貼近設置，所祕、主 、”、洗元件包含··溶液供應管，供應用於稀 釋感光液的溶液’·傾斜板’使通過溶液供應管供應的溶液 /爪向所述；t輪表面；多個刮刀，與滾輪外表面接觸而 異物。 μ 【實施方式】 、 4…、附圖來詳細說明本發明的優選實施例。 r 目3疋根據本發明實施例的狹缝式塗布機用預備排出裝 置的剖視圖。 ^ 了 4 根據本發明實施例的狭縫式塗布機用預 備排出裝置包含：可旋轉的滾輪31〇及可旋轉地支樓滾輪 並使收谷的滾輪3丨〇的一部分露出到外部的收容部 320。滾輪310接收通過狹縫喷嘴2〇〇預備排出的感光液， 而收谷邛320爲了對接收感光液的滾輪3 表面進行清洗， 内部設有填充了清洗液332的清洗槽33〇。這時，所述滾輪 I〆3 10以其外面的一部分浸潰到清洗液332的形態可旋轉地設 置在收容部320 ’所述收容部32〇具備清洗元件，以用於清 洗可旋轉地設置在收容部32〇的滾輪31〇。所述清洗元件包 •含用於清除滾輪表面異物及進行清洗的多個組成部分，而 这些組成部分在收容部320内沿著所述滾輪3丨〇的旋轉方向 貼近滾輪3 10外面設置。 具體說，所述清洗元件包含：溶液供應管41〇，用於供 應稀釋感光液的溶液；傾斜板42〇，爲使通過溶液供應管 410供應的溶液流向所述滚輪31〇表面而引導溶液的流動； 131144.doc -10- 200903191 多個刮刀430、440、450，與滾輪310外表面接觸而清除滾 輪表面的異物及感光液（或者清洗液）。The slit is coated with a sinless coating method or a slit coating method (sm (3) such as tons) on the surface of the substrate. Fig. 1 is a schematic perspective view showing a conventional photosensitive liquid application device (slit coater) using a non-rotation coating method. Referring to Fig. 1, a conventional slit coater includes a flat plate 1A, a substrate S on which a sub-support is required to perform a photosensitive liquid treatment, and a slit nozzle 2A coated on a substrate S loaded on the flat plate 10. Photosensitive liquid. The slit nozzle 2G has a slit (not shown) having a length corresponding to the width of the substrate s at its bottom end. When the coating on the substrate 8 is pure, the slit nozzle 2 that is on the side of the flat plate 10 advances toward the substrate 8 and the photosensitive liquid is applied to the surface of the substrate S through the slit. (5) When the photosensitive liquid is applied After finishing, 'back to the side of the flat panel 待机 standby. Further, in the slit nozzle 2 of the conventional slit coater, after the application of the photosensitive liquid, the slit and the both side edges (10) around the slit remain as a t-machine insulating material or a part of the photosensitive liquid. During the period in which the slit nozzle 20 is in standby, the properties of the residual photosensitive liquid may change after contact with the external air or the slit (4) may wait for the H (surge) phenomenon after 2G standby (4), thus forming on the substrate. Homogeneous coating 臈 caused a bad shadow 13J144.doc 200903191 ringing. In order to solve the above problems, the conventional slit coater includes a preparation unit 30 for applying a coating liquid for coating the substrate s by the slit nozzle 2, or preventing a giant soup phenomenon during coating. Fig. 2 is a cross-sectional view of the preliminary discharge device for a slit coater shown in Fig. 1. Referring to Fig. 2, a conventional preliminary discharge package for a slit coater is used. The receiving slit nozzle 2 is configured to discharge the discharge rotatably. The roller 31 is rotatably supported and the roller is replaced by the washing elements 41, 42, 43, 44, 45, 46W1. Say the 'roller 3! The slit nozzle 2 that rotates inside the accommodating portion 32. The residual liquid remaining on the slit is received, and the accommodating portion: =^Bei = the cleaning liquid in the lower portion is removed to remove the outer edge of the rolling stalk I: The a-piece 31 includes: a first nozzle, the surface I2* of the roller 31 is in contact with the outer edge of the roller 3-1 to remove foreign matter; the second nozzle 43, injection: liquid, 'second nozzle 44' After the roller 3 1 is immersed in the cleaning liquid, the "moon washing liquid is sprayed again; the doctor blade 45' removes the residual cleaning liquid; and the fourth nozzle is used to spray the dry air. The process of the preliminary discharge device executed by the conventional preliminary discharge device configured as described above is as follows. The slit spray_prepares the liquid medicine, for example, the surface of the roller 31 which is rotated in the side direction, and the photosensitive liquid is transferred to the inside of the housing portion by the rotation. In this process, the photosensitive liquid is ejected by the first spray 1311. 'Including the sensitization and Si: cleaning the surface of the roller with the cleaning liquid stored in the accommodating portion 32, and cleaning the surface of the roller through the α-washing liquid, and then cleaning the surface of the third spray wheel, and finally using the fourth 4 and the scraper 45 again. The roll is dried, whereby the process of making the nozzle preparation row + the top surface of the roller 31 on the surface of the roller 31 is continuously repeated in the time when the chemical liquid is ready to be discharged through the slit nozzle 1. According to the prior art as described above, the photosensitive liquid is diluted by the solution of the surface of the dilution roller, for example, a solvent, by spraying or by a simple dripping: a roller surface using a dropping unit (not shown). ^ The soil is, however, provided by the nozzle spray or simply the surface of the drip wheel as described above, the solution is not properly supplied to the roller ^ and flies: and flowing to the outside or other areas results in the consumption of a larger amount of solution, and d Failure to evenly coat the entire roller results in reduced efficiency. The present invention has been made to solve the above problems, and the present invention provides a preliminary discharge device for a slit coater which is significantly wasteful and can uniformly dissolve the solution. Coating surface: By = can improve the cleaning efficiency of the photosensitive liquid on the surface of the roller. In order to achieve the above object, the slit coater discharge device provided by the present invention comprises: a roller that receives the liquid through the slit nozzle; and a receiving portion that can rotate the photosensitive roller to rotate the support roller and support the roller. Part of the roller 131144.doc 200903191 exposed to the outside;, main, and raw _ ^ q washing parts, placed in the accommodating section along the outer surface of the roller, the secret, the main, ", wash components contain · a solution supply tube that supplies a solution for diluting the photosensitive liquid 'an inclined plate' such that the solution/claw supplied through the solution supply tube faces the t-wheel surface; a plurality of scrapers are in contact with the outer surface of the roller to cause foreign matter. BEST MODE FOR CARRYING OUT THE INVENTION A preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings, in which: FIG. 3 is a cross-sectional view of a preliminary discharge device for a slit coater according to an embodiment of the present invention. The preliminary discharge device for a slit coater includes a rotatable roller 31A and a rotatably supporting roller that exposes a part of the roller 3's to the outside of the accommodating portion 320. The roller 310 is connected. The discharged photosensitive liquid is prepared by the slit nozzle 2, and the receiving bowl 320 is provided with a cleaning tank 33〇 filled with the cleaning liquid 332 in order to clean the surface of the roller 3 that receives the photosensitive liquid. At this time, the roller I is provided. The 〆3 10 is rotatably provided in the accommodating portion 320 in a state in which a part of the outer surface is immersed in the cleaning liquid 332. The accommodating portion 32 〇 is provided with a cleaning member for cleaning the roller rotatably provided in the accommodating portion 32 〇 31. The cleaning component package includes a plurality of components for removing foreign matter on the surface of the roller and cleaning, and the components are in the accommodating portion 320 in the rotation direction of the roller 3 贴 to the outside of the roller 3 10 Specifically, the cleaning member includes: a solution supply tube 41〇 for supplying a solution for diluting the photosensitive liquid; and a tilting plate 42〇 for guiding the solution supplied through the solution supply tube 410 to the surface of the roller 31〇 Flow of solution; 131144.doc -10- 200903191 A plurality of scrapers 430, 440, 450 are in contact with the outer surface of the roller 310 to remove foreign matter and photosensitive liquid (or cleaning liquid) on the surface of the roller.
所述傾斜板420向著滾輪3 1 〇的外面向下傾斜，引導通過 所述溶液供應管410提供的溶液100順利地流向滾輪3 1〇表 面，而多個刮刀分爲沿著滾輪3 1 0的圓周方向貼近滾輪表 面設置的第一、第二、第三刮刀430、440、450。第一刮 刀430佈置於所述溶液供應管41〇及傾斜板42〇下側的收容 部3 2 0内，用於清除滾輪表面的異物及混合有溶液的稀釋 液’而第二刮刀440佈置於填充清洗液332的清洗槽33〇 内，用於清除浸潰於清洗液332的滾輪31〇表面的異物及感 光液。並且，第三刮刀450用於清除通過清洗液332浸潰清 洗後殘留於滾輪3 1 0表面的清洗液。 優選地，所述溶液供應管41〇及傾斜板42〇佈置於預備排 出到露出於收容部320外部的滚輪31〇表面的感光液由滚輪 31〇帶入收容部320内部的方向的收容部32〇内部上側。這 時1過狹縫喷嘴200向一侧方向旋轉的滚輪31〇表面預備 排出藥液’例如預備排出感光液時，所述感光液在旋轉的 滾輪則的帶動下移送至收容部320内部，在此過程中溶液 i、應g 410提供的溶液，例％溶劑通過傾斜板4別供應到滾 輪310的表面，由此對枯附在滾輪310表面的感光液進行一 次稀釋，而稀釋物及溶劑中包含的異物則被第-刮刀42一 這時，所述第一刮刀 端向著與所述滾輪旋轉 430在與滾輪310外面接觸的刀身末 方向相反的方向設有凹陷預定厚度 131144.doc 200903191 的凹槽432(參照圖十所述凹槽432内殘留著沿著滾輪川 表面流下的-部分溶液刚。即，所述凹槽432截留爲稀釋 感光液而從傾斜板·供應到滾輪31G表面的溶液⑽中的 -部分’而被殘留的溶液100用於再次稀釋殘存於滾輪加 表面的感光液。 即，所述第-到刀430清除通過溶液一次稀釋的滾輪31〇 表面的感光液及異物的同時利用殘留於其刀身末端的凹槽 432内的溶液對滾輪31G表面實施清洗。這時，利用通過溶 液供應管提供到滾輪31Q表面的溶液稀釋感光液後，由 第一刮刀430對殘留於滾輪31〇表面的感光液再次進行稀 釋，進而可進一步提高對滾輪31〇的清洗效率。 /4是放大了圖3中的要部的要部放大圖，放大示出包含 溶液供應管及傾斜板的清洗元件的主要部分。 如圖4所示，所述傾斜板42〇在其末端的自由端側具備 用於臨時收容溶液100的溶液收容部似。這種溶液收容 部422用於防止溶液供應管41〇提供的溶液過量的供應到 =輪310的表面，其結構可通過向上弯曲傾斜板伽自由 端侧端部形成’而沿著彎曲端的長度方向形成用於排出溶 液的又窄又細的狹、縫424。由此，當通過溶液供應管“Ο 供餘液時’該溶液沿著傾斜板42〇流動並流入所述溶液 收谷部422聚集而只有其中的一部分溶液通過狹縫似供 應到滾輪3 1 〇的表面。 、如上所述地在傾斜板420上設置用於臨時儲存溶液的溶 液收容部422時，通過溶液供應管41G供應的溶液臨時收容 131144.doc 200903191 於所述浴液收容部422 ’只有其中的一部分溶液通 -供應到滚輪則的表面，因此與以往的溶液嘴 滴 減少溶液的不必要的浪費。而且，在溶液供 應@41°的溶液供應暫時停止的狀況下，由於—定量的冰 液100臨時儲存於溶液收容部422，因此溶液在―： 可連續供應到滚輪310表面。進而可防止溶液供應中_ 起的刮刀負荷過大及無法清洗。 ，如上所述’根據本發明的實施例，用於清洗接收了藥 液：例如感光液的滾輪310的清洗裝置採用的清洗元件包 、、Ά夜供應管41G，爲稀釋感光液而提供類似溶劑的溶 液，傾斜板420，爲使通過溶液供應管41〇供應的溶液供應 :旋轉的滾輪31°表面而引導溶液流動。所述清洗元： 、’傾斜板420包含臨時收容溶液1〇〇的溶液收容部422， 以避免溶液供應管41〇提供的溶液過量地供應到滾輪㈣表 面。 通過溶液供應管410供應的溶液臨時儲存於溶液 W 422’其中僅一部分溶液通過狹缝424少量地供應到 滚輪加表面，因而與以往的溶液噴射或者滴落方式不 同’不會消耗大量的溶液，且使得供應到滾輪3ι〇表面的 溶液量始終保持一定並均勻排出到滾輪的寬度方向，進而 可進-步提高對枯附於滾輪310表面的感光液的清洗效 率。 同時，由於溶液收容部422臨時儲存有一定量的溶液 100 ’因而即使通過溶液供應管41〇的溶液供應—時中斷， 131144.doc -13 - 200903191 在一定時間内連續供應到滾輪表面， 洛液供應中料致的心負荷增大及無法清洗。 而且，根據本發明的實施 夏施例弟—刮刀430的刀身太诚 凹形成具有預定深度的凹槽432 滾輪川表面流下的^ ^用於截取一部分通過 3⑽面… 由此再-次稀釋殘留於滾輪 、感先液，進而可提高對滾輪的清洗效果。 發==的僅僅是用於實施本發明的—個實施例，而本 戶;屬領物Γ實施例，在不脫離本發明範圍的情況下， 所屬料的技術人員可以進行各«形和修改。 溶明可知，本發明中的通過溶液供應管提供的 輪傾斜板的溶液收容部並通過狹縫供應到滾 顯者減少溶液的不必要的浪費的優點。 ，、有 ^，臨時儲存於溶液收容部的溶液通過狹縫排出方式 布…到滚輪表面，由此可實現對滾輪表面的溶液的均勾塗 進而進—步提高對滾輪表面感光液的清洗效率。 【圖式簡單說明】 的^是圖根據_轉式塗布法㈣往的錢式塗布機概略 圖圖2是圖1中示出的狹缝式塗布機用預備排出裝置的剖視 二是根據本發明實施例的狹缝式塗布機用 置的剖視圖； 衣 圖4是放大了圖3中的要部的要部放大圖。 131144.doc •14- 200903191 【主要元件符號說明】 S 基板 W 寬度 10 平面板 20 狹縫喷嘴 30 預備排出裝置 3 1 滾輪 32 收容部 41 第一喷嘴 42 刮刀 43 第二喷嘴 44 第三喷嘴 45 刮刀 46 第四喷嘴 100 溶液 200 狹縫喷嘴 200 狹缝喷嘴 310 滾輪 3 10 滚輪 320 收容部 320 收容部 330 清洗槽 330 清洗槽 332 清洗液 131144.doc 200903191 332 清洗液 410 溶液供應管 410 溶液供應管 420 傾斜板 420 傾斜板 422 溶液收容部 422 溶液收容部 424 狹縫 424 狹缝 430 第1 一刮刀 430 第1刮刀 432 凹槽 432 凹槽 440 第2二刮刀 440 第2刮刀 450 第3三刮刀。 450 第3刮刀。 131144.doc •16The inclined plate 420 is inclined downward toward the outer surface of the roller 3 1 ,, and guides the solution 100 provided by the solution supply pipe 410 to smoothly flow to the surface of the roller 3 1 , and the plurality of blades are divided into the roller 3 1 0 The first, second, and third scrapers 430, 440, and 450 are disposed in the circumferential direction adjacent to the surface of the roller. The first scraper 430 is disposed in the receiving portion 310 of the lower side of the solution supply tube 41 and the inclined plate 42, for removing foreign matter on the surface of the roller and the diluted solution mixed with the solution, and the second scraper 440 is disposed at The cleaning tank 33 filled with the cleaning liquid 332 is used to remove foreign matter and a photosensitive liquid which are immersed in the surface of the roller 31 of the cleaning liquid 332. Further, the third scraper 450 is for removing the cleaning liquid remaining on the surface of the roller 310 by the impregnation of the cleaning liquid 332. Preferably, the solution supply tube 41 and the inclined plate 42 are disposed in the accommodating portion 32 in a direction in which the photosensitive liquid which is discharged to the surface of the roller 31 which is exposed outside the accommodating portion 320 is brought into the accommodating portion 320 by the roller 31 〇 〇 Internal upper side. At this time, the surface of the roller 31 that rotates in the one direction by the slit nozzle 200 is prepared to discharge the chemical liquid. For example, when the photosensitive liquid is prepared to be discharged, the photosensitive liquid is transferred to the inside of the accommodating portion 320 by the rotating roller. In the process, the solution i, the solution provided by g 410, the example % solvent is supplied to the surface of the roller 310 through the inclined plate 4, thereby diluting the photosensitive liquid adhered to the surface of the roller 310 once, and the dilution and the solvent are contained therein. The foreign matter is then the first scraper 42. At this time, the first scraper end is provided with a recess 432 having a predetermined thickness 131144.doc 200903191 toward a direction opposite to the end of the blade rotating 430 in contact with the outer surface of the roller 310. (Refer to FIG. 10, there is a portion of the solution flowing down the surface of the roller in the groove 432. That is, the groove 432 is trapped in the solution (10) for diluting the photosensitive liquid from the inclined plate to the surface of the roller 31G. The remaining portion of the solution 100 is used to dilute the photosensitive liquid remaining on the roller plus surface. That is, the first-to-knife 430 removes the sensitization of the surface of the roller 31 which is once diluted by the solution. While cleaning the surface of the roller 31G with the solution remaining in the groove 432 at the end of the blade body, the surface of the roller 31G is cleaned by the solution supplied to the surface of the roller 31Q through the solution supply tube, and then the residue is left by the first blade 430. The photosensitive liquid on the surface of the roller 31 is diluted again, and the cleaning efficiency of the roller 31A can be further improved. /4 is an enlarged view of the main part of the main part of Fig. 3, and the solution supply tube and the inclination are enlarged. The main portion of the cleaning member of the plate. As shown in Fig. 4, the inclined plate 42 is provided with a solution accommodating portion for temporarily accommodating the solution 100 at the free end side of the end. This solution accommodating portion 422 is for preventing the solution. The solution supplied from the supply pipe 41〇 is supplied to the surface of the = wheel 310 in an excessive amount, and its structure can be formed by forming an 'end free end side end portion' and forming a narrow and thin discharge medium in the longitudinal direction of the curved end. The narrow slit 424. Thus, when passing through the solution supply pipe "when the remaining liquid is supplied", the solution flows along the inclined plate 42 and flows into the solution collecting portion 422 to gather only A part of the solution is supplied to the surface of the roller 3 1 through the slit. When the solution accommodating portion 422 for temporarily storing the solution is provided on the inclined plate 420 as described above, the solution supplied through the solution supply pipe 41G is temporarily accommodated. 131144.doc 200903191 Only a part of the solution in the bath accommodating portion 422' is supplied to the surface of the roller, so that the conventional solution nozzle drops the unnecessary waste of the solution. Moreover, the solution supply is @41°. In the case where the supply of the solution is temporarily stopped, since the quantitative ice liquid 100 is temporarily stored in the solution accommodating portion 422, the solution can be continuously supplied to the surface of the roller 310. In addition, the blade load in the solution supply can be prevented from being excessively large and cannot be cleaned. As described above, according to an embodiment of the present invention, a cleaning component package for cleaning a liquid receiving device that receives a chemical liquid: a roller 310 such as a photosensitive liquid, and a day and night supply tube 41G provide a similar solvent for diluting the photosensitive liquid. The solution, the inclined plate 420, guides the solution flow by supplying a solution supplied through the solution supply pipe 41〇: a rotating roller 31° surface. The cleaning unit:, the inclined plate 420 includes a solution accommodating portion 422 for temporarily accommodating the solution 1 , to prevent the solution supplied from the solution supply tube 41 from being excessively supplied to the surface of the roller (4). The solution supplied through the solution supply pipe 410 is temporarily stored in the solution W 422' in which only a part of the solution is supplied to the roller addition surface through the slit 424 in a small amount, and thus unlike the conventional solution spray or dripping method, 'a large amount of solution is not consumed, Moreover, the amount of the solution supplied to the surface of the roller 3 始终 is always kept constant and uniformly discharged to the width direction of the roller, so that the cleaning efficiency of the photosensitive liquid adhered to the surface of the roller 310 can be further improved. At the same time, since the solution accommodating portion 422 temporarily stores a certain amount of the solution 100' and thus is interrupted even when the solution is supplied through the solution supply tube 41, 131144.doc -13 - 200903191 is continuously supplied to the surface of the roller for a certain period of time, The heart load caused by the medium material is increased and cannot be cleaned. Moreover, according to the embodiment of the present invention, the blade of the doctor blade 430 is too concave to form a groove 432 having a predetermined depth, and the surface of the roller is flowed for intercepting a part of the surface through the 3 (10) surface. The roller and the first liquid can improve the cleaning effect on the roller. The invention is only an embodiment for carrying out the invention, and the embodiment of the invention is an embodiment of the invention. Without departing from the scope of the invention, the technician of the material can perform various shapes and modifications. . It is known that the solution accommodating portion of the wheel slanting plate provided by the solution supply pipe in the present invention is supplied to the roller by the slit to reduce the unnecessary waste of the solution. , and ^, the solution temporarily stored in the solution accommodating portion is discharged through the slit to the surface of the roller, thereby achieving uniform coating of the solution on the surface of the roller and further improving the cleaning efficiency of the photosensitive liquid on the roller surface. . BRIEF DESCRIPTION OF THE DRAWINGS FIG. 2 is a cross-sectional view of the preliminary discharge device for a slit coater shown in FIG. Fig. 4 is an enlarged view of an essential part of the main part of Fig. 3 in an enlarged view of a slit coater according to an embodiment of the invention. 131144.doc •14- 200903191 [Description of main component symbols] S Substrate W Width 10 Plane plate 20 Slit nozzle 30 Pre-discharge device 3 1 Roller 32 accommodating part 41 First nozzle 42 Scraper 43 Second nozzle 44 Third nozzle 45 Scraper 46 fourth nozzle 100 solution 200 slit nozzle 200 slit nozzle 310 roller 3 10 roller 320 housing portion 320 housing portion 330 cleaning tank 330 cleaning tank 332 cleaning liquid 131144.doc 200903191 332 cleaning liquid 410 solution supply tube 410 solution supply tube 420 Inclined plate 420 Inclined plate 422 Solution accommodating portion 422 Solution accommodating portion 424 Slit 424 Slit 430 1st scraper 430 1st scraper 432 Groove 432 Groove 440 2nd scraper 440 2nd scraper 450 3rd scraper. 450 third scraper. 131144.doc •16