TW200902622A - Curable composition, its cured film and laminate - Google Patents

Curable composition, its cured film and laminate Download PDF

Info

Publication number
TW200902622A
TW200902622A TW097109883A TW97109883A TW200902622A TW 200902622 A TW200902622 A TW 200902622A TW 097109883 A TW097109883 A TW 097109883A TW 97109883 A TW97109883 A TW 97109883A TW 200902622 A TW200902622 A TW 200902622A
Authority
TW
Taiwan
Prior art keywords
group
meth
compound
curable composition
acrylate
Prior art date
Application number
TW097109883A
Other languages
Chinese (zh)
Other versions
TWI364439B (en
Inventor
Toshimitsu Kikuchi
Akio Taira
Hitoshi Kato
Shuichi Sugawara
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200902622A publication Critical patent/TW200902622A/en
Application granted granted Critical
Publication of TWI364439B publication Critical patent/TWI364439B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/004—Reflecting paints; Signal paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2231—Oxides; Hydroxides of metals of tin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2296—Oxides; Hydroxides of metals of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

The present invention provides a curable composition which can be used for forming a cured film having stable antistatic performance, excellent scratch resistance and further, high refractive index and high reflectivity. The curable composition comprises (A) particles having a polymerizable unsaturated group and having a median diameter of 65-85 nm and containing an oxide of at least one element selected from a group consisting of zinc, indium, tin and antimony as a main ingredient, (B) a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains and two or more aromatic rings and (C) a compound having one or more polymerizable unsaturated groups other than components (A) and (B).

Description

200902622 九、發明說明 【發明所屬之技術領域】 本發明係關於硬化性組成物、使其硬化所成之硬化膜 以及層合體。更詳細言之，本發明係關於可獲得高折射率 及抗靜電性之硬化膜之硬化性組成物、硬化膜及其層合 體。 【先前技術】 近年來，作爲於塑膠（聚碳酸酯、聚甲基丙烯酸甲 酯、聚苯乙烯、聚酯、聚烯烴、環氧樹脂、三聚氰胺樹 脂、三乙醯基纖維素樹脂、AB S樹脂、A S樹脂、降冰片 烯系樹脂等）、金屬、木材、紙、玻璃、石棉等各種基材 表面用以防止傷痕（刮傷）及防止污染而使用之保護塗層材 以及作爲抗反射塗層材，需要一種具有優良塗覆性，且在 各種基材表面上可形成硬度、耐刮傷性、耐磨耗性、表面 平滑性、低捲曲性、密著性、透明性、耐藥品性及塗膜面 外觀均優異之之硬化膜的硬化性組成物。 再者’就獲得具有抗靜電性之硬化膜之硬化性組成物 而言’雖實施有使其含有導電性粒子，但有無法形成穩定 展現一定抗靜電性、透明性、反射率及耐刮傷性之硬化膜 之問題點。 專利文獻1:日本特開2004-331909號公報 專利文獻2:日本特開2005-31282號公報 專利文獻3:日本特開20〇5_146110號公報 200902622 【發明內容】 [發明欲解決之課題] 鑑於上述之問題’本發明之目的係提供一種可獲得具 有穩定抗靜電性與優良耐刮傷性，進而具有髙折射率以及 高反射率之硬化膜之硬化性組成物。 [解決問題之手段] 爲達到上述目的’本發明者積極進行硏究，發現藉由 控制具有聚合性不飽和基之導電性粒子之粒徑可達成一定 之表面電阻値’而且，藉由使用具有聚合性不飽和基、具 有EO改性之雙酚A骨架之化合物作爲黏合樹脂之一部 分’可得到可獲得高折射率、優良耐刮傷性之硬化膜的硬 化組合物，因而完成本發明。 亦即’本發明提供下述之硬化性組成物、其硬化膜及 其層合體。 1 · 一種硬化性組成物，其含有下列成分（A)〜（c)之： (A) 具有聚合性不飽和基、且中値粒徑在65~85nm 範圍內’且以選自由鋅、銦、錫以及銻組成中之至少一種 元素之氧化物作爲主要成分的粒子； (B) 具有一個以上之聚合性不飽和基、—個以上之環 氧烷鏈以及兩個以上芳香環之化合物； (C) 具有一個以上聚合性不飽和基之除了上述（A)及 (B)成份以外之化合物； 200902622 2 如上述〗所述之硬化性組成物’其中上述成分（B ) 之化合物具有如下通式（B_1)所示之結構：200902622 IX. Description of the Invention [Technical Field of the Invention] The present invention relates to a curable composition, a cured film formed by curing the laminate, and a laminate. More specifically, the present invention relates to a curable composition, a cured film, and a laminate thereof, which are capable of obtaining a cured film having high refractive index and antistatic property. [Prior Art] In recent years, as a plastic (polycarbonate, polymethyl methacrylate, polystyrene, polyester, polyolefin, epoxy resin, melamine resin, triethylenesulfonyl cellulose resin, AB S resin) , AS resin, norbornene resin, etc.), metal, wood, paper, glass, asbestos and other substrates used to prevent scratches (scratches) and to prevent contamination, and as an anti-reflective coating A material that requires excellent coating properties and can form hardness, scratch resistance, abrasion resistance, surface smoothness, low curling property, adhesion, transparency, and chemical resistance on various substrate surfaces. A curable composition of a cured film excellent in the appearance of a coating film. In addition, 'the curable composition of the cured film having antistatic properties' is made to contain conductive particles, but it cannot form a stable antistatic property, transparency, reflectance, and scratch resistance. The problem of the hardened film of sex. Patent Document 1: JP-A-2004-331909, JP-A-2005-31282, JP-A-2005-31282, JP-A-2005-31208 Problem The object of the present invention is to provide a curable composition which can obtain a cured film having stable antistatic property and excellent scratch resistance, and further having a yttrium refractive index and a high reflectance. [Means for Solving the Problem] In order to achieve the above object, the present inventors conducted an active investigation and found that a certain surface resistance 达成 can be achieved by controlling the particle diameter of the conductive particles having a polymerizable unsaturated group. The polymerizable unsaturated group and the compound having an EO-modified bisphenol A skeleton as a part of the binder resin can provide a cured composition of a cured film which can obtain a high refractive index and excellent scratch resistance, and thus the present invention has been completed. That is, the present invention provides the following curable composition, cured film thereof and laminate thereof. 1 . A curable composition comprising the following components (A) to (c): (A) having a polymerizable unsaturated group and having a median particle diameter in the range of 65 to 85 nm' and selected from the group consisting of zinc and indium a particle having at least one element of an oxide of tin and antimony as a main component; (B) a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings; C) a compound other than the above components (A) and (B) having one or more polymerizable unsaturated groups; 200902622 2 a hardenable composition as described above, wherein the compound of the above component (B) has the following formula (B_1) shows the structure:

(B-1) [式（B」）中，Ri及R2分別代表碳數2〜4之2價烴基，R3 爲單鍵或者亦可具有芳香環之碳數1〜20之2價烴基， r5~r6爲氬原子或甲基’ Rl4以及R15代表氫原子或（甲基） 丙烯醯基，q個r14以及p個Rl5中至少一個爲（甲基）丙 烯醯基，m及η分別代表1〜30之數’ p代表I-4之數，q 代表0〜4之數]。 3.如上述1或2所述之硬化性組成物’其中上述成 分（B)之化合物具有如下通式（B_2)所示之結構：(B-1) In the formula (B), Ri and R2 each represent a divalent hydrocarbon group having 2 to 4 carbon atoms, and R3 is a single bond or a divalent hydrocarbon group having a carbon number of 1 to 20 of an aromatic ring, r5 ~r6 is an argon atom or a methyl group 'Rl4 and R15 represents a hydrogen atom or a (meth) acrylonitrile group, at least one of q r14 and p Rl5 is a (meth) acryl fluorenyl group, and m and η represent 1~, respectively. The number of 30 'p stands for the number of I-4, and q stands for the number of 0~4. 3. The curable composition as described in the above 1 or 2 wherein the compound of the above component (B) has a structure represented by the following formula (B_2):

[式（B-2)中，R4分別代表氫原子或甲基，R11、R12分別代 表氫原子、甲基 '苯基’ R13爲氫原子或（甲基）丙烯醯 基，m分別獨立代表1~30之數]。 200902622 4 .如上述1 ~ 3中任一項所述之硬化性組成物’其中 上述成分（A)之氧化物粒子係選自由含有銻之氧化錫、含 有錫之氧化銦、含有氟之氧化錫、含有鋁之氧化鋅所組成 之群組。 5. 如上述4所述之硬化性組成物，其中上述成分（A) 之氧化物粒子爲含有銻之氧化錫。 6. 如上述1〜5中任一項所述之硬化性組成物，其中 上述成分（A)所含之聚合性不飽和基係含有下式（4)所示結 構之基： 【化6】 —U—C—N— (4)[In the formula (B-2), R4 represents a hydrogen atom or a methyl group, respectively, R11 and R12 each represent a hydrogen atom, and a methyl 'phenyl' R13 is a hydrogen atom or a (meth) acrylonitrile group, and m each independently represents 1 ~30 number]. The sclerosing composition according to any one of the above 1 to 3, wherein the oxide particles of the component (A) are selected from the group consisting of tin oxide containing antimony, indium oxide containing tin, and tin oxide containing fluorine. a group consisting of zinc oxide containing aluminum. 5. The curable composition according to the above 4, wherein the oxide particles of the component (A) are tin oxide containing antimony. 6. The curable composition according to any one of the above 1 to 5, wherein the polymerizable unsaturated group contained in the component (A) contains a group having a structure represented by the following formula (4): —U—C—N— (4)

IIII

VV

[式（4)中，U表示NH、0(氧原子）或S(硫原子），V表示0 或S] 〇 7 .如上述1〜6中任一項所述之硬化性組成物，其進 一步含有（D)可經活性能量射線照射引發活性種之化合 物。 8. 如上述1〜7項中任一項所述之硬化性組成物，其 進一步含有（E)有機溶劑。 9. 如上述1~8中任一項所述之硬化性組成物，其中 上述成分（C)所含之聚合性不飽和基爲（甲基）丙烯醯基。 1 0 . —種硬化膜，係由如1〜9中任一項所述之硬化性 組成物硬化所成者。 -8- 200902622 11. 一種層合體，其係於基材上具有如10所述之硬 化膜者。 [發明效果] 本發明之硬化性組成物可獲得具有安定抗靜電性且折 射率及反射率高、耐刮傷性優異之硬化膜。 本發明之硬化膜可作爲抗反射層合體之抗靜電層、高 折射率層、硬塗層而使用。 【實施方式】 I.硬化組成物 本發明之硬化組成物（以下稱爲本發明組成物）可含有 下列成分（A)〜（F)。其中，成分（A)〜（C)爲必要之成分，成 分（D)〜（F)爲可依據需要而添加之任意成分。 (A) 具有聚合性不飽和基且中値粒徑在65〜85nm範 圍內，且以選自由鋅、銦、錫以及銻組成中之至少一種元 素之氧化物作爲主要成分之粒子； (B) 具有一個以上之聚合性不飽和基、一個以上之環 氧烷鏈以及兩個以上芳香環之化合物； (C) 具有一個以上聚合性不飽和基之除上述成分（A) 及（B)以外之化合物； (D) 可經活化能量射線照射引發活性種之化合物； (E) 有機溶劑； (F )添加劑。 -9- 200902622 (1)以下說明各種成分 (A)具有聚合性不飽和基且中値粒徑在65〜85nm範 圍內，且以選自由鋅、銦、錫以及銻所組成之群組之至少 一種元素之氧化物作爲主要成分之粒子 成分（A)爲具有聚合性不飽和基，具有特定中値粒 徑，以特定元素之氧化物作爲主要成分之粒子（以下稱爲 「反應性粒子」）。 反應性粒子爲以由選自由鋅、銦、錫及銻所組成之群 組之至少一種元素之氧化物作爲主要成分之粒子（A a)與分 子內具有聚合性不飽和基及水解性矽烷基之有機化合物 (Ab)反應獲得。 藉由配合成分（A)，與後述成分（B)及（C)所具有之聚 合性不飽和基反應，藉由聚合，所得脂硬化膜之硬度可進 一步提高，且可減少硬化收縮（彎曲）。 (1)以氧化物作爲主要成分之粒子（Aa)(以下稱爲 「氧化物粒子」） 作爲氧化物粒子，可列舉有例如氧化鋅、氧化銦、氧 化錫、銦錫氧化物（ITO)、氧化銻等之粒子。其中，自高 硬度之觀點觀之，較佳爲氧化銻粒子。該等可單獨使用或 組合兩種以上使用。進而，氧化物粒子（Aa)較好作爲粉體 狀或溶劑分散溶膠狀使用。在作爲溶劑分散溶膠使用之情 況下，自與其他成分之相溶性、分散性之觀點觀之，分散 介質以有機溶劑較佳。至於該等有機溶劑，可列舉有例如 甲醇、乙醇、異丙醇、丁醇、辛醇等醇類；丙酮、甲基乙 -10- 200902622 基酮、甲基異丁基酮、環己酮等酮類；乙酸乙酯、乙酸丁 酯、乳酸乙酯、γ -丁內醋、丙二醇單甲基醚乙酸酯、丙二 醇單乙基醚乙酸酯等酯類；乙二醇單甲基醚、二乙二醇單 丁基醚等之醚類；苯、甲苯、二甲苯等芳香族烴類；二甲 基甲醯胺、二甲基乙醯胺、Ν -甲基吡咯烷酮等醯胺類。其 中，較佳者爲甲醇、異丙醇、丁醇、甲基乙基酮、甲基異 丁基酮、乙酸乙酯、乙酸丁酯、甲苯、二甲苯。 或者，作爲賦予優異抗靜電性之氧化物粒子（A a)，可 列舉有含有銻之氧化錫、含有錫之氧化銦、含有氟之氧化 錫、含有銘之氧化辞等。 反應性離子之中値粒徑必須在65〜85nm之範圍內， 較好在 70~80nm之範圍內。若粒子之中値粒徑小於 6 5 nm，則有表面電阻不夠高，耐刮傷性降低之情況。若 超過85nm，則有損及透明性、反射率下降之情況。 此處，中値粒徑意指將粉體自某粒徑分爲2半時’較 大的一邊與較小的一邊之量相等之粒徑。 所得分散液中所分散之含有銻之氧化錫粒子之中値粒 徑可以下列條件測定。 機器：（株）堀場製作所製動態光散射式粒徑分布測 定裝置 -11 - 200902622 測定條件： 溫度25°C 試料 樣品以原液直接測定 數據解析條件： 粒徑基準 體積基準 分散粒子 ΑΤΟ粒子 分散介質 甲醇 折射率2.05 折射率1.329 中値粒徑係藉由分散時間加以控制。亦即，藉由縮短 分散時間使中値粒徑增大，藉由增長分散時間使中値粒徑 變小。 又，作爲銻酸鋅粉末之水性分散物，可列舉有日產化 學工業（株）製之C e 1 u η ο X ;作爲氧化錫、氧化銦、氧化鋅 等粉末即溶劑分散物，可列舉有 CI化成（株）製之 Nanotech ;作爲摻雜銻之氧化錫水性分散溶膠，可列舉有 石原產業（株）製之SN-1 00D ;作爲ITO粉末，可列舉有三 菱材料（株）製之製品。 氧化物粒子（Aa)之形狀爲球狀、中空狀、多孔質狀、 棒狀、板狀、纖維狀或者無定形狀，較佳者爲球狀。氧化 物粒子（Aa)之比表面積（使用氮氣之BET表面積測定法測 定）較好爲10~ 1 000m2/g，更好爲1〇〇〜5 00m2/g。該氧化物 粒子（Aa)之使用形態可爲乾燥狀態之粉末，或者以水或有 機溶劑分散之狀態使用。例如，可直接使用本技藝中已知 之微粒子狀氧化物粒子之分散液作爲上述氧化物之溶劑分 散溶膠。尤其’在要求硬化物之優良透明性之用途中，較 好利用氧化物之有機溶劑分散溶膠。 -12- 200902622 (2)有機化合物（Ab) 本發明中所用之有機化合物（Ab)爲具有聚合性不飽和 基之化合物。較好爲含有下式（4)所示基之有機化合物。 【化7】 —U-C—N— ⑷In the formula (4), U represents NH, 0 (oxygen atom) or S (sulfur atom), and V represents 0 or S] 〇7. The curable composition according to any one of the above 1 to 6, wherein Further comprising (D) a compound which initiates the active species by irradiation with active energy rays. 8. The curable composition according to any one of the above 1 to 7, which further comprises (E) an organic solvent. 9. The curable composition according to any one of the above 1 to 8, wherein the polymerizable unsaturated group contained in the component (C) is a (meth) acrylonitrile group. A cured film obtained by hardening a curable composition according to any one of 1 to 9 above. -8- 200902622 11. A laminate having a hardened film as described in 10 on a substrate. [Effect of the Invention] The curable composition of the present invention can obtain a cured film having stable antistatic properties and having high refractive index and reflectance and excellent scratch resistance. The cured film of the present invention can be used as an antistatic layer, a high refractive index layer or a hard coat layer of an antireflection laminate. [Embodiment] I. Hardening composition The hardening composition of the present invention (hereinafter referred to as the composition of the present invention) may contain the following components (A) to (F). Among them, the components (A) to (C) are essential components, and the components (D) to (F) are optional components which can be added as needed. (A) particles having a polymerizable unsaturated group and having a median diameter of 65 to 85 nm and having an oxide selected from at least one element selected from the group consisting of zinc, indium, tin, and antimony as a main component; a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings; (C) having one or more polymerizable unsaturated groups other than the above components (A) and (B) a compound; (D) a compound capable of initiating an active species upon activation of an energy ray; (E) an organic solvent; (F) an additive. -9- 200902622 (1) Hereinafter, each component (A) has a polymerizable unsaturated group and a median diameter of 65 to 85 nm, and is at least selected from the group consisting of zinc, indium, tin, and antimony. The particle component (A) which is an elemental oxide as a main component is a particle which has a polymerizable unsaturated group, has a specific median particle diameter, and has an oxide of a specific element as a main component (hereinafter referred to as "reactive particle"). . The reactive particles are particles (A a) having an oxide of at least one element selected from the group consisting of zinc, indium, tin, and antimony as a main component, and a polymerizable unsaturated group and a hydrolyzable alkyl group in the molecule. The organic compound (Ab) is obtained by a reaction. By blending the component (A), it reacts with the polymerizable unsaturated groups of the components (B) and (C) described later, and the hardness of the resulting lipid cured film can be further improved by polymerization, and the hardening shrinkage (bending) can be reduced. . (1) Particles (Aa) having an oxide as a main component (hereinafter referred to as "oxide particles") Examples of the oxide particles include zinc oxide, indium oxide, tin oxide, and indium tin oxide (ITO). Particles such as cerium oxide. Among them, from the viewpoint of high hardness, cerium oxide particles are preferred. These may be used singly or in combination of two or more. Further, the oxide particles (Aa) are preferably used in the form of a powder or a solvent-dispersed sol. In the case of use as a solvent-dispersed sol, the dispersion medium is preferably an organic solvent from the viewpoint of compatibility with other components and dispersibility. Examples of the organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; acetone, methylethyl-10-200902622 ketone, methyl isobutyl ketone, cyclohexanone, and the like. Ketones; ethyl acetate, butyl acetate, ethyl lactate, γ-butane vinegar, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc.; ethylene glycol monomethyl ether, An ether such as diethylene glycol monobutyl ether; an aromatic hydrocarbon such as benzene, toluene or xylene; or a guanamine such as dimethylformamide, dimethylacetamide or hydrazine-methylpyrrolidone. Among them, preferred are methanol, isopropanol, butanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, toluene, and xylene. In addition, examples of the oxide particles (A a) which impart excellent antistatic properties include tin oxide containing bismuth, indium oxide containing tin, tin oxide containing fluorine, and oxidized words containing sulphur. The particle size of the ruthenium in the reactive ion must be in the range of 65 to 85 nm, preferably in the range of 70 to 80 nm. If the particle size of the particles is less than 65 nm, the surface resistance is not high enough and the scratch resistance is lowered. When it exceeds 85 nm, the transparency and the reflectance may be impaired. Here, the median particle diameter means a particle diameter in which the powder is equal to the smaller one side when the powder is divided into two halves. The ruthenium particle diameter of the ruthenium-containing tin oxide particles dispersed in the obtained dispersion liquid can be measured under the following conditions. Machine: Dynamic light scattering type particle size distribution measuring device manufactured by Horiba, Ltd. - 200902622 Measurement conditions: Temperature 25 °C Sample sample is directly measured by stock solution Data analysis conditions: Particle size Reference volume basis Dispersed particles ΑΤΟ Particle dispersion medium Methanol The refractive index of 2.05 and the refractive index of 1.329 are controlled by the dispersion time. That is, by shortening the dispersion time, the particle size of the crucible is increased, and the particle size of the crucible is made smaller by increasing the dispersion time. In addition, as the aqueous dispersion of the zinc phthalate powder, C e 1 u η ο X manufactured by Nissan Chemical Industries Co., Ltd., and a solvent dispersion such as a powder such as tin oxide, indium oxide or zinc oxide, may be mentioned. The Nano-technical Co., Ltd., which is a product of the oxidized tin oxide-doped sol, is SN-1 00D manufactured by Ishihara Sangyo Co., Ltd., and the ITO powder is exemplified by Mitsubishi Materials Co., Ltd. . The shape of the oxide particles (Aa) is spherical, hollow, porous, rod-shaped, plate-like, fibrous, or amorphous, and preferably spherical. The specific surface area of the oxide particles (Aa) (measured by a BET surface area measurement using nitrogen gas) is preferably from 10 to 1 000 m 2 /g, more preferably from 1 to 5 000 m 2 /g. The oxide particles (Aa) may be used in a dry state or in a state of being dispersed in water or an organic solvent. For example, a dispersion of fine particle-like oxide particles known in the art can be used as a solvent-dispersing sol of the above oxide. In particular, in applications requiring excellent transparency of a cured product, it is preferable to use an organic solvent-dispersing sol of an oxide. -12- 200902622 (2) Organic compound (Ab) The organic compound (Ab) used in the present invention is a compound having a polymerizable unsaturated group. It is preferably an organic compound containing a group represented by the following formula (4). [化7] —U-C—N— (4)

IIII

VV

[式（4)中，U表示NH、0(氧原子）或S(硫原子），V表 示〇或S]。 又，較好爲含有[-〇-C( = 0)-NH-]基，更好爲含有[-0-C( = S)-NH-]基以及[-S-C( = 0)-NH-]基至少之一者之有機化 合物。又，該有機化合物（Ab)較好爲分子內具有矽烷醇基 之化合物或者藉由水解生成矽烷醇基之化合物。 (i) 聚合性不飽和基 有機化合物（Ab)中所含之聚合性不飽和基並無特別限 制，作爲較佳例可列舉例如丙烯醯基、甲基丙烯醯基、乙 烯基、丙烯基、丁二烯基、苯乙烯基、乙炔基、月桂醯 基、馬來醯基、丙烯醯胺基。 該聚合性不飽和基可爲藉由活性游離基進行加成聚合 之構成單元。 (ii) 上述式（4)所示之基 有機化合物中所含之上述式（4)所示之基[-U-C( = V)_ NH-]具體而言，有[-〇-C( = 0)-NH-]、[-0-C( = S)-NH-]、 [-S-C( = 0)-NH-]、[-NH-C( = 0)-NH-]、[ - N Η - C (= S )-N Η -]及 -13- 200902622 [-S-C( = S)-NH-]之6種。此等基中，可單獨使用1種或組 合2種以上使用。其中，就熱安定性之觀點觀之，較好合 倂使用[-〇-C( = 0)-NH-]基與[-0-C( = S)-NH-]基及 [-S-C( = 0)-NH-]基中之至少一者。 認爲上述式（4)所示之基[-U-C( = V)-NH-]係藉由分子間 之氫鍵發生適度凝集力，於硬化物之情況下，可賦與優異 機械強度、與基材或高折射率層等鄰接層之密著性及耐熱 性等特性者。 (iii) 矽烷醇基或藉由水解生成矽烷醇基之基 有機化合物（Ab)較好爲分子內具有矽烷醇基之化合物 或者藉由水解生成矽烷醇基之化合物。作爲此等生成矽烷 醇基之化合物，可列舉有於矽原子上鍵結烷氧基、芳氧 基、乙醯氧基、胺基、鹵素原子等之化合物，較好爲於矽 原子上鍵結烷氧基或芳基氧基之化合物，亦即含有烷氧基 砂院基之化合物或含有芳氧基砂院基之化合物。 矽烷醇基或生成矽烷醇基之化合物之矽烷醇基生成部 位爲藉由縮合反應或水解後接著發生之縮合反應，而與氧 化物粒子（A a)鍵結之構成單元。 (iv) 較佳之樣態 作爲有機化合物（Ab)之較佳具體例，可列舉有例如下 式（1 1)所示之化合物： -14- 200902622 【化8】 (〇R6)j I |_| R73，j一SiH~R8—S—C—N—R9—N—C—〇 - R10—(Z)k 〇 〇 (11) 式（11)中，R6、R7可相同或不同，爲氫原子或碳數 1〜8之烷基或芳基，可列舉有例如甲基、乙基、丙基、丁 基、辛基、苯基、二甲苯基等。其中，j爲1〜3之整數。 作爲[(R60)jR73」Si-]所示之基，可舉例有例如三甲氧 基矽烷基、三乙氧基矽烷基、三苯氧基矽烷基、甲基二甲 氧基矽烷基、二甲基甲氧基矽烷基等。此等基中，較佳爲 三甲氧基矽烷基或三乙氧基矽烷基。 R8爲具有碳數1〜12之脂肪族或芳香族構造之2價有 機基，亦可包含直鏈狀、分支狀或環狀構造。至於具體 例，可列舉有亞甲基、伸乙基、伸丙基、仲丁基' 伸己烷 基、伸環己基、伸苯基、伸二甲苯基、伸十二烷基等。 R9爲2價有機基，通常係選自分子量14至1萬’較 好分子量76至500之2價有機基。至於具體例，列舉有 伸己烷基、伸辛烷基、伸十二烷基等直鏈聚伸烷基；伸環 己烷基、伸降冰片基等脂環式或多環式2價有機基；伸苯 基、伸萘基、伸聯苯基、聚伸苯基等2價芳香族基；及此 等之烷基取代基、芳基取代基。又，該等二價有機基亦可 含有包含除碳原子及氫原子以外之元素之原子基團，亦可 包含聚醚鍵、聚酯鍵、聚醯胺鍵、聚碳酸酯鍵。 R1()爲（k+Ι)價有機基，較好係選自直鏈狀、分支狀或 -15- 200902622 環狀飽和烴基、不飽和烴基。 Z代表在活性游離種存在下，於分子中具有可進行分 子間交聯反應之聚合性不飽和基之1價有機基。又’ k較 好爲1〜2〇之整數，更好爲1〜10之整數，最好爲1〜5之擊 數。 至於以式（11)表示之化合物之具體例，列舉有以下$ (12)及（13)表示之化合物： 【化9】In the formula (4), U represents NH, 0 (oxygen atom) or S (sulfur atom), and V represents 〇 or S]. Further, it preferably contains a [-〇-C(=0)-NH-] group, more preferably a [-0-C(=S)-NH-] group and [-SC(=0)-NH- An organic compound of at least one of the bases. Further, the organic compound (Ab) is preferably a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group. (i) The polymerizable unsaturated group contained in the polymerizable unsaturated organic compound (Ab) is not particularly limited, and preferred examples thereof include an acrylonitrile group, a methacryl fluorenyl group, a vinyl group, and a propylene group. Butadienyl, styryl, ethynyl, lauryl, maleidyl, acrylamide. The polymerizable unsaturated group may be a constituent unit of addition polymerization by an active radical. (ii) The group [-UC(=V)_NH-] represented by the above formula (4) contained in the base organic compound represented by the above formula (4) specifically has [-〇-C( = 0) -NH-], [-0-C( = S)-NH-], [-SC( = 0)-NH-], [-NH-C( = 0)-NH-], [- N Η - C (= S ) - N Η -] and -13 - 200902622 [-SC( = S)-NH-] 6 kinds. These may be used alone or in combination of two or more. Among them, in terms of thermal stability, it is better to use [-〇-C(=0)-NH-] and [-0-C(=S)-NH-] and [-SC( = 0) at least one of the -NH-] groups. It is considered that the group [-UC(=V)-NH-] represented by the above formula (4) is moderately cohesive by hydrogen bonding between molecules, and in the case of a cured product, excellent mechanical strength can be imparted. A property such as adhesion or heat resistance of an adjacent layer such as a substrate or a high refractive index layer. (iii) The stanol group or the group which forms a stanol group by hydrolysis The organic compound (Ab) is preferably a compound having a stanol group in the molecule or a compound which forms a stanol group by hydrolysis. Examples of the compound which forms a stanol group include a compound in which an alkoxy group, an aryloxy group, an ethoxylated group, an amine group, a halogen atom or the like is bonded to a ruthenium atom, and it is preferably bonded to a ruthenium atom. A compound of an alkoxy or aryloxy group, that is, a compound containing an alkoxy sand compound or a compound containing an aryloxy sand compound. The stanol group forming portion of the stanol group or the stanol group-forming compound is a constituent unit bonded to the oxidized particles (A a) by a condensation reaction or a condensation reaction which occurs after the hydrolysis. (iv) Preferred Embodiments As a preferred specific example of the organic compound (Ab), for example, a compound represented by the following formula (1 1): -14-200902622 (Chemical Formula 8) (〇R6)j I | | R73,j-SiH~R8—S—C—N—R9—N—C—〇- R10—(Z)k 〇〇(11) In the formula (11), R6 and R7 may be the same or different and are hydrogen. Examples of the atom or the alkyl group or the aryl group having 1 to 8 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, an octyl group, a phenyl group, and a xylyl group. Where j is an integer from 1 to 3. The group represented by [(R60)jR73"Si-] may, for example, be a trimethoxydecyl group, a triethoxydecyl group, a triphenyloxydecyl group, a methyldimethoxydecyl group, or a dimethyl group. Methoxymethoxyalkyl and the like. Among these groups, a trimethoxydecyl group or a triethoxydecyl group is preferred. R8 is a divalent organic group having an aliphatic or aromatic structure having 1 to 12 carbon atoms, and may also have a linear, branched or cyclic structure. Specific examples thereof include a methylene group, an exoethyl group, a propyl group, a sec-butyl group, a hexane group, a cyclohexylene group, a phenyl group, a xylylene group, and a dodecyl group. R9 is a divalent organic group, and is usually selected from a divalent organic group having a molecular weight of from 14 to 10,000's preferably from 76 to 500. Specific examples include straight-chain polyalkylene groups such as a hexane group, an octyl group, and a dodecyl group; an alicyclic or polycyclic ternary organic compound such as a cyclohexane group or a borneol group; a divalent aromatic group such as a phenyl group, a naphthyl group, a biphenyl group or a polyphenylene group; and an alkyl substituent or an aryl group. Further, the divalent organic group may contain an atomic group containing an element other than a carbon atom and a hydrogen atom, and may also contain a polyether bond, a polyester bond, a polyamid bond, or a polycarbonate bond. R1() is a (k+Ι)valent organic group, preferably selected from a linear, branched or -15-200902622 cyclic saturated hydrocarbon group or an unsaturated hydrocarbon group. Z represents a monovalent organic group having a polymerizable unsaturated group capable of undergoing crosslinking reaction between molecules in the presence of a living free species. Further, k is preferably an integer of 1 to 2 inches, more preferably an integer of 1 to 10, and preferably a number of strokes of 1 to 5. Specific examples of the compound represented by the formula (11) include the following compounds represented by (12) and (13):

S、^v^/Si(OCH3)3 (12)S, ^v^/Si(OCH3)3 (12)

(13) [式（12)及式（13)中「Acryl」代表丙烯醢基]。 本發明中所用之有機化合物（Ab)之合成，可使用例如 曰本特開平9- 1 00 1 1 1號公報中所述之方法。較好，使氫 硫基丙基二甲氧基砂院與異佛爾酮二異氰酸酯在二丁基錫 二月桂酸酯存在下混合’在60〜70°C下反應數小時左右之 後’添加季戊四醇三丙烯酸酯，進而在60〜70 X：下反應數 小時左右而製造。 -16- 200902622 (3)反應性粒子（A)之調配 具有矽烷醇基或藉水解生成矽烷醇基之基之有機化合 物（Eb)與金屬氧化物粒子（Aa)混合，予以水解使兩者鍵 結。所得反應性粒子（E)中之有機聚合物成分，亦即水解 性矽烷之水解物以及縮合物之比例，通常爲乾燥粉體在空 氣中完全燃燒時之重量減少％之恆定値，例如，可藉由在 空氣中於室溫至通常爲80CTC爲止之熱重量分析而求得。 有機化合物（Ab)對氧化物粒子（Aa)之鍵結量，以反應 性粒子（A )(金屬氧化物粒子（A a)及有機化合物（A b)之合計） 作爲1〇〇重量％，較好爲0.01重量％以上，更好爲0.1重 量％以上，最好爲1重量％以上。與金屬氧化物粒子（Aa) 鍵結之有機化合物（Ab)之鍵結量若未達0.01重量％，則組 成物中之反應性粒子（A)之分散性不足，有所得硬化物之 透明性、耐刮傷性不足之情況。又，反應性粒子（A)製造 時之原料中之金屬氧化物粒子（Aa)之調配比例，較好爲 5〜99重量％，更好爲10~98重量％。構成反應性粒子（A) 之氧化物粒子（Aa)之含量較好爲反應性粒子（A)之65~95 重量％。 有關本發明組成物中之成分（A)之調配量，於有機溶 劑除外之以組成物總量爲1 〇 〇重量％時’較好爲5 0〜9 0重 量％，更好爲6 5 ~ 8 5重量％ ’最好爲7 5〜8 0重量％之範 圍。若成分（A)之調配量未達5 0重量％ ’則作成硬化膜時 無法獲得高反射率，若超過9 0重量％，則成膜性不足。 此外，反應性粒子（A)之含量意指固成分’若反應性 -17- 200902622 粒子以溶劑分散溶膠之形態使用時，其含量不包含溶劑之 量。 (B)具有1個以上之聚合性不飽和基、1個以上之環 氧烷鏈以及2個以上芳香環之化合物 成分（B)儘可能爲高折射率之化合物，具有容易附著 於氧化物粒子上、空氣不容易附著之性質，可使所得之硬 化膜有更高折射率。 過去，認爲若使具有雙酚骨架之化合物經環氧烷（AO) 改質，由於化合物之可撓性變高，因此所得硬化膜之硬度 降低。然而，本發明者發現與含有銻之氧化錫（ΑΤΟ)組 合，使耐刮傷性等之硬化膜硬度不會降低。 成分（Β)之化合物較好爲具有下列通式（Β-1)所示之結 構。 【化1 0】(13) [Acryl" in the formula (12) and the formula (13) represents an acrylonitrile group]. For the synthesis of the organic compound (Ab) used in the present invention, for example, the method described in JP-A-H09-1001 1 1 can be used. Preferably, the thiopropyl propyl dimethoxy sand compound is mixed with isophorone diisocyanate in the presence of dibutyltin dilaurate. After reacting at 60 to 70 ° C for several hours, 'add pentaerythritol triacrylate. The ester is further produced by reacting for about several hours at 60 to 70 X:. -16- 200902622 (3) Preparation of Reactive Particles (A) The organic compound (Eb) having a stanol group or a group which is hydrolyzed to form a stanol group is mixed with metal oxide particles (Aa) to be hydrolyzed to give a bond Knot. The ratio of the organic polymer component in the obtained reactive particles (E), that is, the hydrolyzate of the hydrolyzable decane and the condensate, is usually a constant % of the weight loss of the dry powder when it is completely burned in the air, for example, It is determined by thermogravimetric analysis in air at room temperature to usually 80 CTC. The amount of bonding of the organic compound (Ab) to the oxide particles (Aa) is 1% by weight based on the reactive particles (A) (the total of the metal oxide particles (A a) and the organic compound (A b)). It is preferably 0.01% by weight or more, more preferably 0.1% by weight or more, and most preferably 1% by weight or more. When the amount of bonding of the organic compound (Ab) bonded to the metal oxide particles (Aa) is less than 0.01% by weight, the dispersibility of the reactive particles (A) in the composition is insufficient, and the transparency of the obtained cured product is obtained. Insufficient scratch resistance. Further, the proportion of the metal oxide particles (Aa) in the raw material in the production of the reactive particles (A) is preferably from 5 to 99% by weight, more preferably from 10 to 98% by weight. The content of the oxide particles (Aa) constituting the reactive particles (A) is preferably 65 to 95% by weight of the reactive particles (A). The compounding amount of the component (A) in the composition of the present invention is preferably from 50 to 90% by weight, more preferably from 6 to 5% by weight, based on the total amount of the composition excluding the organic solvent. 8 5 wt% 'preferably in the range of 7 5 to 80 wt%. When the amount of the component (A) is less than 50% by weight, a high reflectance cannot be obtained when the cured film is formed, and if it exceeds 90% by weight, the film formability is insufficient. Further, the content of the reactive particles (A) means a solid component. If the reactivity is -17-200902622, the particles are used in the form of a solvent-dispersed sol, and the content thereof does not include the amount of the solvent. (B) a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings (B) having a high refractive index as much as possible, and having easy adhesion to oxide particles The properties of the upper and the air which are not easily adhered can give the obtained cured film a higher refractive index. In the past, it has been considered that when a compound having a bisphenol skeleton is modified with an alkylene oxide (AO), since the flexibility of the compound becomes high, the hardness of the obtained cured film is lowered. However, the inventors have found that in combination with tin oxide containing antimony, the hardness of the cured film such as scratch resistance is not lowered. The compound of the component (Β) preferably has a structure represented by the following formula (Β-1). [化1 0]

(Β-1) 示（Β-1)中，R1及R2分別爲碳數2〜4之2價烴基，較 好爲伸乙基、伸丙基。 R3爲單鍵或亦可具有芳香環之碳數1〜20之2價烴 基，至於2價烴基，較好爲亞甲基、異丙叉、甲基苯基甲 叉等。 -18- 200902622 R5〜R6代表氫原子或甲基。 R14及r15代表氫原子或（甲基）丙烯醯基’ q個R14與 P個R15中至少一個爲（甲基）丙烯醯基。 m及η分別代表1~3〇之數’較好爲1~1〇。 Ρ代表1-4之數，較好爲1~2。 q代表〇~4之數，較好爲1〜2。 成分（B)之化合物更好具有下列通式（B-2)所示之結 【化1 1】(Β-1) In the formula (Β-1), R1 and R2 are each a divalent hydrocarbon group having 2 to 4 carbon atoms, preferably an exoethyl group and a propyl group. R3 is a single bond or a divalent hydrocarbon group having a carbon number of 1 to 20 in an aromatic ring, and a divalent hydrocarbon group is preferably a methylene group, a isopropylidene group or a methylphenylmethine group. -18- 200902622 R5 to R6 represent a hydrogen atom or a methyl group. R14 and r15 represent a hydrogen atom or a (meth)acrylinyl group, and at least one of R and R15 is a (meth)acrylinyl group. m and η represent the number of 1~3〇, respectively, and preferably 1~1〇. Ρ represents 1-4, preferably 1~2. q represents the number of 〇~4, preferably 1~2. The compound of the component (B) preferably has a knot represented by the following formula (B-2).

(B-2) 式（B-2)中，R4分別代表氫原子或甲基。 R11、R12分別代表氫原子、甲基、苯基。 R13代表氫原子或（甲基）丙烯醯基。 m代表1〜3 0之數，較好爲1~1〇。 (1)聚合性不飽和基 作爲成分（B)所具有之聚合性不飽和基，並沒有特別 限制，但作爲較佳例，可舉例有例如丙烯醯基、甲基丙烯 醯基、乙烯基、丙烯基、丁二烯基、苯乙烯基、乙炔基、 月桂醯基、馬來醯基、丙烯醯胺基。 該聚合性不飽和基爲藉由活性游離種使成份（A)及（C) 進行加成聚合之構成單元。 -19- 200902622 (2) 成份（B)化合物之製造方法 成份（B)之化合物，於環氧烷爲環氧乙烷（EO)之情 況，則可如下列般製造。 在鹼性條件下，使雙酚與環氧乙烷反應，製備雙酚之 Ε Ο加成物。以對甲苯磺酸作爲觸媒，使丙烯酸反應於雙 酚之EO加成物上，製備雙酚之EO加成物二丙烯酸酯。 (3) 具體例 至於成分（B)化合物之具體例，列舉有雙酚A之環氧 乙烷（以下稱爲「EO」）加成物二（甲基）丙烯酸酯、雙酚A 之環氧丙烷（以下稱爲「P〇」）P〇加成物二（甲基）丙烯酸 酯、雙酚F之EO加成物二（甲基）丙烯酸酯、雙酚F之PO 加成物二（甲基）丙烯酸酯，較好爲雙酚A之EO加成物二 (甲基）丙烯酸酯。(B-2) In the formula (B-2), R4 represents a hydrogen atom or a methyl group, respectively. R11 and R12 each represent a hydrogen atom, a methyl group, and a phenyl group. R13 represents a hydrogen atom or a (meth) acrylonitrile group. m represents a number of 1 to 3 0, preferably 1 to 1 〇. (1) The polymerizable unsaturated group is not particularly limited as the polymerizable unsaturated group of the component (B), and preferred examples thereof include an acrylonitrile group, a methacryl fluorenyl group, and a vinyl group. Propylene, butadienyl, styryl, ethynyl, lauryl, maleidyl, acrylamide. The polymerizable unsaturated group is a constituent unit in which the components (A) and (C) are subjected to addition polymerization by an active free species. -19- 200902622 (2) Method for producing the component (B) The compound of the component (B), when the alkylene oxide is ethylene oxide (EO), can be produced as follows. The bisphenol is obtained by reacting bisphenol with ethylene oxide under basic conditions to prepare a bismuth ruthenium adduct. The EO adduct diacrylate of bisphenol was prepared by reacting acrylic acid on the EO adduct of bisphenol with p-toluenesulfonic acid as a catalyst. (3) Specific examples of the compound of the component (B) include ethylene oxide of bisphenol A (hereinafter referred to as "EO") adduct di(meth)acrylate, epoxy of bisphenol A Propane (hereinafter referred to as "P〇") P〇 adduct di(meth)acrylate, EO adduct di(meth)acrylate of bisphenol F, PO adduct 2 of bisphenol F The acrylate is preferably an EO adduct di(meth)acrylate of bisphenol A.

至於成分（B)化合物之市售商品，列舉有例如B i s c 〇 a t 700(雙酚A，EO加成物二丙烯酸酯；大阪有機化學（株）製 造）、Light-Ester BP-2EM(雙酚A之EO加成物二甲基丙 稀酸酯）、Light-Acrylate BP-4EA(雙酣A之EO力日成物二 丙烯酸酯）、Light-Acrylate BP-4PA(雙酚A之PO加成物 二丙烯酸酯）；共榮社化學（株）製造，Aronix M-208(雙酚 F 之 EO加成物二丙稀酸醋）、Aronix M-210、Aronix 21 1B(雙酚A之EO加成物二丙烯酸酯）；東亞合成（株） 製，SR-349、SR-601、SR-602(雙酚 A 之 EO 加成物二丙 烯酸酯）、SR-348、SR-480、SR-9036(雙酚 A 之 EO 加成 物二甲基丙烯酸酯）、Cayarad R-551、R712(雙酚A之EO -20- 200902622 加成物二丙烯酸酯）；日本化藥（株）製’ NK ESTER ABE-300 、 A-BPE-4 、 A-BPE-10 、 A-BPE-20 、 A-BPE-30 、 A-BPE-3(雙酚 A之EO加成物二丙烯酸酯）、NK ESTER BPE-100、BPE-200、BPE-3 00、BPE-5 00、BPE-900、 BPE- 1 3 00N(雙酚A之E◦加成物二甲基丙烯酸酯）；新中 村化學工業（株）製等。 本發明組成物中成分（B)之調配量，以有機溶劑除外 之組成物全量作爲100重量％時，通常爲1〜15重量％，較 好爲2~10重量％，更好在4〜6重量％之範圍內。若成分（B) 之含量未達1重量％，則有時反射率下降，若超過1 5重 量％，則有時硬化性不足。 (C)具有1個以上之聚合性不飽和基之除成分（A)及 (B)以外之化合物 具有1個以上之聚合性不飽和基之化合物係爲了提高 使本發明組成物硬化所獲得之硬化膜以及使用該硬化膜之 抗反射膜之耐刮傷性所用者。 就該化合物而言，只要是分子內至少含有一個以上之 聚合性不飽和基之化合物，則沒有特別限制。就聚合性不 飽和基而言，較好爲（甲基）丙烯醯基。 至於具有1個（甲基）丙烯醯基之化合物，列舉者爲例 如丙烯醯基嗎啉、（甲基）丙烯酸異冰片酯、（甲基）丙烯酸 冰片酯、（甲基）丙烯酸三環癸酯、（甲基）丙烯酸二環戊 酯、（甲基）丙烯酸二環戊烯酯、（甲基）丙烯酸環己酯等之 含有脂環式結構之（甲基）丙烯酸酯，（甲基）丙烯酸苄酯、 -21 - 200902622 (甲基）丙烯酸4 -丁基環己酯、丙烯醯基嗎咻、乙烯基咪 哩、乙稀基卩比陡、（甲基）丙嫌酸2 -徑基乙醋、（甲基）丙烯 酸2-羥基丙酯 '(甲基）丙烯酸2-羥基丁酯、（甲基）丙烯酸 甲酯、（甲基）丙稀酸乙醋、（甲基）丙烯酸丙酯、（甲基）丙 稀酸異丙酯、（甲基）丙烧酸丁酯、（甲基）丙燒酸戊酯、（甲 基）丙烯酸異丁酯、（甲基）丙烯酸第三丁酯、（甲基）丙烯酸 戊酯、（甲基）丙烯酸異戊酯、（甲基）丙烯酸己酯、（甲基） 丙烯酸庚酯、（甲基）丙烯酸辛酯、（甲基）丙烯酸異辛酯、 (甲基）丙烯酸2 -乙基己酯、（甲基）丙烯酸壬酯、（甲基）丙 烯酸癸酯、（甲基）丙烯酸異癸酯、（甲基）丙烯酸Η——烷 酯、（甲基）丙烯酸十二烷酯、（甲基）丙烯酸月桂酯、（甲基） 丙烯酸硬脂酯、（甲基）丙烯酸異硬脂酯、（甲基）丙烯酸四 氫糠酯、（甲基）丙烯酸丁氧基乙酯、（甲基）丙烯酸乙氧基 二乙二醇酯、（甲基）丙烯酸苄酯、（甲基）丙烯酸苯氧基乙 酯、聚乙二醇單（甲基）丙烯酸酯、聚丙二醇單（甲基）丙烯 酸酯、甲氧基乙二醇（甲基）丙烯酸酯、（甲基）丙烯酸乙氧 基乙酯、甲氧基聚乙二醇（甲基）丙烯酸酯、甲氧基聚丙二 醇（甲基）丙烯酸酯、二丙酮（甲基）丙烯醯胺、異丁氧基甲 基（甲基）丙烯醯胺、Ν，Ν-二甲基（甲基）丙烯醯胺、第三辛 基（甲基）丙烯醯胺、（甲基）丙烯酸二甲胺基乙酯、（甲基） 丙烯酸二乙胺基乙酯、（甲基）丙烯酸7-胺基-3,7-二甲基辛 酯、Ν,Ν-二乙基（甲基）丙烯醯胺、ν，Ν-二甲基胺基丙基 (甲基）丙烯醯胺、羥基丁基乙烯基醚、月桂基乙烯基醚、 十四烷基乙烯基醚、2 -乙基己基乙烯基醚、以下式（15)表 -22- 200902622 示之化合物等。 CH2 = C(R26)-C00(R270)d-Ph-R28 (15) (式中，R26代表氫原子或甲基，R27代表碳數2-6， 較好2〜4之伸烷基，R28代表氫原子或碳數1〜12 ’較好 1〜9之烷基，Ph代表伸苯基，d代表0〜12，較好1〜8之 數）。 至於此等之市售品，列舉者爲人1*〇1^\]^-101、]^· 102、M-lll、M-113、M-114、M-117(以上爲東亞合成（株） 製造）；Biscoat LA、STA、IBAX、2-MTA、#192、 #193(大阪有機化學（株）製）；NK ESTER AMP-10G、AMP-200 、 AMP-60G(以上 爲新中 村化學 （株） 製 ）； Light-Acrylate L-A 、 S-A 、 IB-ΧΑ 、 PO-A 、 PO-200A 、 NP-4EA 、 NP-8EA(以上爲共榮社化學（株）製）；FA-511、FA-512A、 FA-5 1 3 A(以上爲日立化成工業（株）製）。 至於具有2個以上（甲基）丙烯醯基之化合物可列舉有 爲例如乙二醇二（甲基）丙烯酸酯、二環戊烯基二（甲基）丙 烯酸酯、三乙二醇二丙烯酸酯、四乙二醇二（甲基）丙烯酸 酯、叁環癸烷二基二亞甲基二（甲基）丙烯酸酯、叁（2-羥基 乙基）聚異氰酸酯二（甲基）丙烯酸酯、叁（2-羥基乙基）聚異 氰酸酯三（甲基）丙烯酸酯、己內酯改性之叁（2-羥基乙基） 聚異氰酸酯三（甲基）丙烯酸酯、三羥甲基丙烷三（甲基）丙 烯酸酯、環氧乙烷（以下稱爲「E0」）改性之三羥甲基丙烷 -23- 200902622 三（甲基）丙烯酸酯、環氧丙烷（以下稱爲「PO」）改性之三 經甲基丙院三（甲基）丙燦酸酯、三丙二醇二（甲基）丙嫌酸 酯、新戊二醇二（甲基）丙烯酸酯、雙酚A二縮水甘油基醚 之二末端（甲基）丙烯酸加成物、1，4 -丁二醇二（甲基）丙烯 酸酯、1，6 -己二醇二（甲基）丙烯酸酯、季戊四醇三（甲基） 丙烯酸酯、季戊四醇四（甲基）丙烯酸酯、聚酯二（甲基）丙 烯酸酯、聚乙二醇二（甲基）丙烯酸酯、二季戊四醇六（甲 基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸酯、二季戊四 醇四（甲基）丙烯酸酯、己內酯改性之二季戊四醇六（甲基） 丙烯酸酯、己內酯改性之二季戊四醇五（甲基）丙烯酸酯、 二（三羥甲基丙烷）四（甲基）丙烯酸酯等。至於該等多官能 性單體之市售品可列舉有例如 SA 1 002(以上由三菱化學 (株）製造）、Biscoat 195、Biscoat 230、Biscoat 260、 Biscoat 215 、 Biscoat 310 、 Biscoat 214HP 、 Biscoat 2 9 5、Biscoat 3 00、Biscoat 3 60、Biscoat GPT、Biscoat 400、Biscoat 3000、Biscoat 3700(以上由大阪有機化學工 業（株）製造）、Casarate R-256、HDDA、NPGDA、 TPGDA、MANDA、R-604、R-6 84、PET-30、GPO-3 03、 TMPTA 、 THE-3 3 0 、 DPHA 、 DPHA-2H 、 DPHA-2C 、 DPHA-2I、D-3 10、D- 3 3 0、DPCA-20、DPCA-30、DPCA-60 > DPCA-120、DN-0075、DN-247 5、T- 1 420 ' T-2020、 T-2040 、 TPA-320 、 TA-330 、 RP-1040 、 RP-2040 、 R- 011、R-300、R-205(以上由日本化藥（株）製造）、M-220、 M-23 3 、 M-240 、 M-215 、 M-3 05 、 M-309 、 M-310 、 M- -24- 200902622 315、M-325、M-400、M-6200、M-6400(以上由東亞合成 (株）製造）、Nufrontea BPE-400、BR-42M、GX-8345(以上 由第一工業製藥（株）製）、ASF-400(以上由新日鐵化學（株） 製造）、Lypoxy SP-1506 、 SP-1507 、 SP-1509 、 VR-77 、 SP-4010、SP-4060(以上由昭和高分子（株）製造）等。 又，本發明之組成物中，更好爲分子內至少含有3個 以上（甲基）丙烯醯胺基之化合物。至於該等含3個以上 (甲基）丙烯醯胺基之化合物，可選自由上述列舉之三（甲 基）丙烯酸酯化合物、四（甲基）丙烯酸酯化合物、五（甲基） 丙烯酸酯化合物、六（甲基）丙烯酸酯化合物等，其中最佳 爲季戊四醇羥基三丙烯酸酯、三羥甲基丙烷三丙烯酸酯。 上述化合物可單獨1種使用或組合2種以上使用。 本發明組成物中之成分（C)之調配量並無特別限制， 以有機溶劑除外之組成物總量作爲1 00重量％，通常爲 1〜1 5重量％，較好爲5 ~ 1 4重量％，更好爲1 1〜1 3重量％之 範圍。若成分（C)之調配量未達1重量％，則有無法獲得所 得硬化塗膜之耐刮傷性之情況，另一方面，若超過1 5重 量％，則會使折射率下降。 (D)藉由活性能量射線照射引發活性種之化合物 本發明之組成物中，可添加藉由活性能量射線照射引 發活性種之化合物（以下稱爲「（D)成分」）。該等化合物 爲用於使硬化性組成物有效率的硬化而使用者。 至於藉由活性能量射線照射引發活性種之化合物（以 下稱爲「光聚合起始劑」），作爲活性種，可列舉有引發 -25- 200902622 游離基之光游離基產生劑。 另外’活性能量射線定義爲可使引發活性種之化合物 分解而產生活性種之能量射線。至於該等活性能量射線列 舉有爲可見光、紫外線、紅外線、χ射線、α射線、卢射 線、r射線等光能量射線。其中，由具有一定能量位階、 加速硬化速度、而且照射裝置比較便宜、小型之觀點觀 之，較好使用紫外線。 至於光游離基產生劑之實例，可列舉有例如苯乙酮、 苯乙酮苄基縮酮、蒽醌、1-(4 -異丙基苯基）-2 -羥基-2-甲基 丙烷-1-酮、咔唑、咕噸酮、4 -氯二苯甲酮、4,4，-二胺基 二苯甲酮、1,1-二甲氧基脫氧苯偶因、3，3，_二甲基-4_甲氧 基二苯甲酮、噻噸酮、2,2 -二甲氧基-2-苯基苯乙酮、1-(4 -十二烷基苯基）-2 -羥基-2-甲基丙烷-1-酮、2 -甲基- l- [4-(甲基硫基）苯基]-2-嗎啉基丙烷-1-酮、三苯胺、2,4,6-三 甲基苯甲醯基二苯基膦氧化物、1-羥基環己基苯基酮、2-羥基-2·甲基-1-苯基丙烷-卜酮、芴酮、芴、苯甲醛、苯偶 因乙基醚、苯偶因丙基醚、二苯甲酮 '米希勒酮、3 -甲基 苯乙酮、3，3’，4,4’ -四（第三丁基過氧羰基）二苯甲酮 (BTTB)、2-(二甲胺基）-1-[4-(嗎啉基）苯基]-2-苯基甲基）-1-丁酮、4 -苯甲醯基- 4’-甲基二苯基硫醚、2 -羥基-2-甲基-[4-(1-甲基乙烯基）苯基]丙醇寡聚物、苄基、或者BTTB 與咕噸、硫咕噸、香豆素、酮基香豆素、其他色素增感劑 之組合。 該等光聚合起始劑中，較佳爲2,2 -二甲氧基-2-苯基 -26- 200902622 苯乙酮、2 -羥基-2-甲基-1-苯基丙烷-1-酮、1-羥基環己基 苯基酮、2,4,6-三甲基苯甲醯基二苯基膦氧化物、2-甲基· 1-[4-(甲基硫基）苯基]-2-嗎琳基丙烷-1-酮、2-(二甲胺基）_ 卜[4-(嗎啉基）苯基]-2-苯基甲基）-1-丁醇、2-羥基-2-甲基_ [4-(1-甲基乙烯基）苯基]丙醇寡聚物等，更好爲1-羥基環 己基苯基酮、2-甲基-1-[4-(甲基硫基）苯基]-2-嗎啉基丙 烷-1-酮、2-(二甲胺基）-1-[4-(嗎啉基）苯基]-2-苯基甲基）_ 1-丁醇、2-羥基-2-甲基-[4-(1-甲基乙烯基）苯基]丙醇寡聚 物等。 本發明組成物中之成分（D)之調配量並無特別限制’ 以有機溶劑除外之組成物總量作爲1 00重量。/。時’較好爲 〇~1 5重量％，更好爲2~8重量％，最好爲3~6重量％之範 圍內，若超過1 5重量％，則有使硬度降低之情況。 (E)有機溶劑 本發明之組成物可含有有機溶劑。藉由含有有機溶 劑，可形成薄膜之均一抗反射膜。至於該等有機溶劑’列 舉有丙酮、甲基異丁基酮、甲基乙基酮、環己酮、甲基戊 基酮等酮類，乙酸乙酯、乙酸丁酯、丙二醇單甲基醚乙酸 酯等酯類，丙二醇單甲基醚、甲醇、乙醇、第二丁醇、第 三丁醇、2-丙醇、異丙醇等醇類，苯、甲苯、氯苯等芳香 族類，己烷、環己烷等脂肪族類等之單一或兩種以上之組 合。此等中，較好爲丙酮、甲基異丁基酮、甲基乙基酮、 環己酮、甲基戊基酮等酮類，乙酸乙酯、乙酸丁酯、丙二 醇單甲基醚乙酸酯等酯類；丙二醇單甲基醚、甲醇、乙 -27- 200902622 醇、第二丁醇、第三丁醇、2-丙醇、異丙醇等醇類，更好 爲甲基異丁基酮、甲基戊基酮、第三丁醇之單獨一種或兩 種以上之組合。 至於有機溶劑，亦可使用上述成分（A)之反應性粒子 之分散介質者，亦可進而與其他有機溶劑倂用。 有機溶劑之調配量並無特別限制，相對於有機溶劑除 外之組成物總量爲1 0 0重量份，較好爲1 〇〜1 〇 〇，〇 〇 0重量 份。其理由爲當有機溶劑之調配量未達1 0重量份，則有 難以調整硬化性組成物黏度之情況，另一方面，若超過 1 0 0，0 0 0重量份，而有硬化性組成物之保存安定性降低或 黏度降低，使操作變困難之情況。 (F)添加劑 本發明之組成物在不損及本發明之目的及效果之範圍 內較好含有光增感劑、聚合抑制劑、聚合起始助劑、平流 劑、濕潤性改質劑、界面活性劑、可塑劑、紫外線吸收 劑、抗氧化劑、抗靜電劑、矽烷偶合劑、無機充塡劑、顏 料、染料等添加劑。 (2)本發明組成物之調製方法 本發明之組成物可在室溫或加熱條件下混合，藉由分 別添加含有上述（A)〜（D)成分之組成物與依需要之上述 (E)〜（F)成分而製備。具體而言，可使用混練機、捏合 機、球磨機 '三輥滾筒等混合機調製。 (3 )本發明組成物之硬化條件 本發明之組成物可藉由熱及/或放射線（光）而硬化。若 -28- 200902622 爲熱之情況’則該熱源可使用例如電加熱器、紅外線燈、 熱風等。若爲放射線（光）之情況，則該放射線源只要是可 使組成物於塗佈後短時間硬化者，則無特別限制，例如， 作爲紅外線放射線源，可列舉有燈、電阻加熱板、雷射 等，又作爲可見光之放射源，可列舉有太陽光、燈、螢光 燈、雷射等，又作爲紫外線之放射線源，可列舉有水銀 燈、鹵素燈、雷射等，又作爲電子線之放射線源，可列舉 有利用自市售鎢絲產生熱電子之方式，使高電壓脈衝通過 金屬而發生之冷陰極方式、以及利用使離子化氣態分子與 金屬電經由衝撞產生2次電子之2次電子方式。另外，作 爲〇：射線、/3射線及r射線之放射線源，可列舉有例如 c〇6()等核***物質，於r射線係利用加速電子衝撞陽極之 真空管等。該等放射線可單獨一種或2種以上同時或於固 定期間加以照射。 至於藉由加熱硬化之條件，較好在30~200 °c範圍內 之溫度下加熱1〜180分鐘。經由該等加熱，不會損及基 材，且可更有效地獲得耐刮傷性優異之抗反射膜。 又，基於該等理由，更好在50〜180 °C範圍內之溫度 加熱2〜120分鐘，最好在 80~150°C範圍內之溫度加熱 5〜6 0分鐘。 後續放射線照射之條件，較好爲使曝光量成爲 0.01〜lOJ/cm2範圍內之値。 該理由爲若曝光量未達〇.〇1 J/cm2，則有硬化不良之 情況，另一方面，若曝光量超過1 〇J/cm2，則有硬化時間 -29- 200902622 過常之情況。 又，基於該等理由，較佳之曝光量値爲0.1~5J/cm2範 圍內之値，更好爲〇_3〜3J/cm2範圍內之値。 II.硬化膜及層合體 本發明之硬化膜係使上述之本發明組成物硬化之硬化 物所構成，本發明之硬化膜由於爲高折射率且具有抗靜電 性，因此可用作高折射率抗靜電層。 本發明之層合體爲含有由本發明硬化膜構成之層。由 本發明硬化膜構成之層爲具有高折射率層及/或抗靜電層 功能之層。再者，在本發明層合體爲抗反射膜之情況下， 除上述層外，可含有低折射率層、硬塗層及/或基材等。 圖1顯示該抗反射膜之剖面圖。如圖1所示，基材2 上，積層有硬塗層3、高折射率層4及低折射率層5。 此時，在基材2上，亦可替代硬塗層3，直接形成高 折射率層4。另外，亦可在硬塗層3與高折射率層4之間 設置中折射率層6(未圖示）。 (1)低折射率層 作爲用以形成低折射率層之硬化性組成物，並無特別 限制，可使用習知之低折射率層形成用材料。 低折射率層之折射率（Na-D線之折射率，測定溫度25 °C )較好成爲1 . 5 0以下。其理由爲低折射率膜之折射率超 過1 · 5 0時，有抗反射效果顯著降低之情況。據此，低折 射率膜之折射率較好成爲1.48以下，更好成爲1.45以 下。 -30- 200902622 此外，對於設置多層低折射率膜之情況’只要其中至 少一層具有上述範圍內之折射率値，據此，其他低折射率 膜之折射率値亦可爲超過丨·50之値。 低折射率層之厚度並無特別限制’但較好爲例如 50~200nm。其理由爲，若低折射率層之厚度未達50nm， 有無法充分獲得抗反射效果之情況，另一方面’若厚度超 過2 0 0 nm，則有發生光干涉使抗反射效果降低之情況。 因此，低折射率層之厚度更好成爲50〜250nm之値， 進而更好成爲70〜150nm。 (2)高折射率層 高折射率層係由使本發明組成物硬化所得之硬化膜所 構成。高折射率層由於亦具有抗靜電性，因此可提高層合 體之防塵性。 本發明之組成物之構成等中，由於上述爲眾所週知， 故此處省略其具體說明，以下，就高折射率層及厚度加以 說明。 高折射率層之折射率較好爲1 . 5 7以上，更好爲1.58 以上，最好爲1 .5 9以上。高折射率層之折射率若未達 1 . 5 7，則有無法獲得充分抗反射性之情況。 又，較好與低折射率層之折射率的差爲0.1 6以上， 更好爲〇 · 1 7以上。高折射率層與低折射率層之折射率差 若未達〇 · 1 6，則有無法獲得充分之抗反射效果之情況。 高折射率層之厚度並無特別限制，例如較好爲 50〜30,000nm。其理由爲若高折射率層之厚度未達50nm， -31 - 200902622 在與低折射率層組合之情況下，會有抗反射效果或對基材 之密著力降低之情況，另一方面，若厚度超過 3 0,000nm ’則產生光干涉反而使抗反射效果降低。 據此’高折射率層之厚度更好爲 50~l，000nm，進而 更好爲60〜500nm。 又’爲了獲得更高之抗反射性，於設置複數層高折射 率層而成爲多層結構之情況下，該複數層高折射率層之厚 度合計只要爲50〜3 0,000nm即可。 又’高折射率層與基材間設置硬塗層之情況下，高折 射率層之厚度可成爲50〜3 00ηιη。 (3) 硬塗層 本發明之抗反射膜中所用之硬塗層之構成材料並無特 別限制。至於該等材料，列舉有矽氧烷樹脂、丙烯酸系樹 脂、三聚氰胺樹脂、環氧樹脂等之單獨一種或兩種以上之 組合。 又，硬塗層之厚度並無特別限制，較好爲1~100μιη， 更好爲3~30μηι。其理由爲若硬塗層之後度未達Ιμηι，則 有作爲硬塗層時硬度降低之情況，另一方面，若厚度超過 1 0 0 μ m，則有因硬塗層硬化收縮使基材變形之情況。 (4) 基材 本發明之抗反射膜所用之基材種類並無特別限制，可 列舉有例如由玻璃、聚碳酸酯系樹脂、聚酯系樹脂、丙烯 酸系樹脂、聚對苯二甲酸乙二醇酯樹脂（PET)、三乙醯纖 維素樹脂（TAC)等構成之基材。藉由成爲含該等基材之抗 -32- 200902622 反射膜’在照相機之透鏡部、電視機（CRT)之畫面顯示 部’或液晶顯示裝置中之彩色濾光片等廣泛之抗反射膜應 用領域中’可獲得優異之抗反射效果。 以下’以實施例具體說明本發明，該等實施例並不以 任何方式限制本發明。另外，「％」及「份」除非另有說 明否則意指重量％及重量份。 製造例1 :銻粒子分散液之調配 將含銻之氧化錫粒子（石原Techno(株）製，商品名： SN-100P ’ 一次粒徑10〜30nm)、分散劑（（株）ADEKA，商 品名：Adecapulronick TR-701)及甲醇以 2 9 · 1/0 · 9/7 0 (重量 比）之調配量混合（全固成份含量3 0 %，全無機物含量 2 9.1%)。 使用三井礦山（株）製造之SC硏磨機，在以下條件下 處理1小時，獲得中値粒徑5 9nm之粒子分散溶液。 機器： 三井礦山（株）製造之SC硏磨機 頻率： 60Hz(相當於轉速3600rpm) 外殻容量： 5 9毫升 液量： 5 0 0克 分散珠粒之充塡量：玻璃珠（TOSHINRIKO製、BZ-01) (珠粒直徑0.1毫米）40克，體積充塡率27% 以下列條件測定所得分散液中分散之含銻氧化錫粒子 之中値粒徑。 -33- 200902622 機器： （株）堀場製作所製動態光散射式粒徑 分布測定裝置As a commercial product of the component (B), for example, B isc 〇at 700 (bisphenol A, EO adduct diacrylate; Osaka Organic Chemical Co., Ltd.), Light-Ester BP-2EM (bisphenol) A's EO adduct dimethyl acrylate), Light-Acrylate BP-4EA (double oxime A EO force diacrylate), Light-Acrylate BP-4PA (bisphenol A PO addition) Manufactured by Kyoritsu Chemical Co., Ltd., Aronix M-208 (EO propylene diacetate of bisphenol F), Aronix M-210, Aronix 21 1B (EO of bisphenol A) Adult diacrylate); manufactured by Toagosei Co., Ltd., SR-349, SR-601, SR-602 (EO adduct diacrylate of bisphenol A), SR-348, SR-480, SR-9036 (EO diol dimethacrylate of bisphenol A), Cayarad R-551, R712 (EO -20-200902622 bisphenol A); NK ESTER manufactured by Nippon Kayaku Co., Ltd. ABE-300, A-BPE-4, A-BPE-10, A-BPE-20, A-BPE-30, A-BPE-3 (EO addition bisacrylate of bisphenol A), NK ESTER BPE -100, BPE-200, BPE-3 00, BPE-5 00, BPE-900, BPE- 1 3 00N (E ◦ adduct dimethacrylate of bisphenol A); New Nakamura Chemical Industry Co., Ltd., etc. The compounding amount of the component (B) in the composition of the present invention is usually 1 to 15% by weight, preferably 2 to 10% by weight, more preferably 4 to 6% by weight based on the total amount of the composition excluding the organic solvent. Within the range of % by weight. When the content of the component (B) is less than 1% by weight, the reflectance may be lowered, and if it exceeds 15% by weight, the curability may be insufficient. (C) A compound having one or more polymerizable unsaturated groups and having one or more polymerizable unsaturated groups in addition to the components (A) and (B) is obtained by curing the composition of the present invention. The cured film and the scratch resistance of the antireflection film using the cured film. The compound is not particularly limited as long as it is a compound containing at least one polymerizable unsaturated group in the molecule. In the case of a polymerizable unsaturated group, a (meth) acrylonitrile group is preferred. As the compound having one (meth) propylene fluorenyl group, for example, acryloyl morpholine, isobornyl (meth) acrylate, borneol (meth) acrylate, tricyclodecyl (meth) acrylate (meth)acrylic acid ester of (cyclo)-(meth)acrylic acid, dicyclopentenyl (meth)acrylate, cyclohexyl (meth)acrylate, etc., (meth)acrylic acid, (meth)acrylic acid Benzyl ester, -21 - 200902622 4-butylcyclohexyl (meth)acrylate, propylene hydrazide, vinyl oxime, ethylene bismuth ratio, (methyl) propylene acid 2 - basal Vinegar, 2-hydroxypropyl (meth)acrylate 2-hydroxybutyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, (methyl) isopropyl acrylate, butyl (meth)propionate, amyl (meth)propionate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, Amyl (meth)acrylate, isoamyl (meth)acrylate, hexyl (meth)acrylate, glycol (meth)acrylate Ester, octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, decyl (meth) acrylate, decyl (meth) acrylate, (methyl) Isodecyl acrylate, hydrazine (meth) acrylate - alkyl ester, dodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, (meth) acrylate Stearyl ester, tetrahydrofurfuryl (meth)acrylate, butoxyethyl (meth)acrylate, ethoxydiethylene glycol (meth)acrylate, benzyl (meth)acrylate, (methyl) ) phenoxyethyl acrylate, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, methoxy ethylene glycol (meth) acrylate, (meth) acrylate ethoxylate Ethyl ethyl ester, methoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, diacetone (meth) acrylamide, isobutoxymethyl (methyl) Acrylamide, hydrazine, hydrazine-dimethyl(meth) acrylamide, third octyl (meth) propylene Amine, dimethylaminoethyl (meth)acrylate, diethylaminoethyl (meth)acrylate, 7-amino-3,7-dimethyloctyl (meth)acrylate, hydrazine, hydrazine- Diethyl (meth) acrylamide, ν, Ν-dimethylaminopropyl (meth) acrylamide, hydroxybutyl vinyl ether, lauryl vinyl ether, tetradecyl vinyl ether 2-Ethylhexyl vinyl ether, a compound represented by the following formula (15), Table-22-200902622, and the like. CH2 = C(R26)-C00(R270)d-Ph-R28 (15) (wherein R26 represents a hydrogen atom or a methyl group, and R27 represents a carbon number of 2-6, preferably 2 to 4 alkyl, R28 It represents a hydrogen atom or an alkyl group having a carbon number of 1 to 12', preferably 1 to 9, Ph represents a phenyl group, and d represents 0 to 12, preferably 1 to 8. As for the commercial products of these, the list is human 1*〇1^\]^-101,]^·102, M-lll, M-113, M-114, M-117 (above is East Asia Synthetic Co., Ltd. ) Manufacturing); Biscoat LA, STA, IBAX, 2-MTA, #192, #193 (made by Osaka Organic Chemical Co., Ltd.); NK ESTER AMP-10G, AMP-200, AMP-60G (above is New Nakamura Chemical ( )), Light-Acrylate LA, SA, IB-ΧΑ, PO-A, PO-200A, NP-4EA, NP-8EA (above is Kyoritsu Chemical Co., Ltd.); FA-511, FA- 512A, FA-5 1 3 A (The above is manufactured by Hitachi Chemical Co., Ltd.). Examples of the compound having two or more (meth) acrylonitrile groups include, for example, ethylene glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, and triethylene glycol diacrylate. , tetraethylene glycol di(meth)acrylate, anthracene dialkyl dimethylene di(meth) acrylate, hydrazine (2-hydroxyethyl) polyisocyanate di(meth) acrylate, hydrazine (2-hydroxyethyl) polyisocyanate tri(meth)acrylate, caprolactone modified bismuth (2-hydroxyethyl) polyisocyanate tri(meth) acrylate, trimethylolpropane tris(methyl) ) acrylate, ethylene oxide (hereinafter referred to as "E0") modified trimethylolpropane-23- 200902622 tris(meth)acrylate, propylene oxide (hereinafter referred to as "PO") modified Trimethoprim tris(methyl)propanoate, tripropylene glycol di(methyl)propionate, neopentyl glycol di(meth)acrylate, bisphenol A diglycidyl ether Terminal (meth)acrylic acid adduct, 1,4-butanediol di(meth)acrylate, 1,6-hexane Di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, polyester di(meth)acrylate, polyethylene glycol di(meth)acrylate, dipentaerythritol Hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol hexa (meth) acrylate, caprolactone modified Dipentaerythritol penta (meth) acrylate, bis(trimethylolpropane) tetra (meth) acrylate, and the like. As a commercial item of such a polyfunctional monomer, for example, SA 1 002 (manufactured by Mitsubishi Chemical Corporation), Biscoat 195, Biscoat 230, Biscoat 260, Biscoat 215, Biscoat 310, Biscoat 214HP, Biscoat 2 may be mentioned. 9 5, Biscoat 3 00, Biscoat 3 60, Biscoat GPT, Biscoat 400, Biscoat 3000, Biscoat 3700 (above manufactured by Osaka Organic Chemical Industry Co., Ltd.), Casarate R-256, HDDA, NPGDA, TPGDA, MANDA, R- 604, R-6 84, PET-30, GPO-3 03, TMPTA, THE-3 3 0, DPHA, DPHA-2H, DPHA-2C, DPHA-2I, D-3 10, D- 3 3 0, DPCA -20, DPCA-30, DPCA-60 > DPCA-120, DN-0075, DN-247 5, T-1 420 'T-2020, T-2040, TPA-320, TA-330, RP-1040, RP-2040, R- 011, R-300, R-205 (above manufactured by Nippon Kayaku Co., Ltd.), M-220, M-23 3, M-240, M-215, M-3 05, M -309, M-310, M--24-200902622 315, M-325, M-400, M-6200, M-6400 (above manufactured by Toagosei Co., Ltd.), Nufrontea BPE-400, BR-42M, GX-8345 (above by Daiichi Kogyo Co., Ltd.), ASF- 400 (above, manufactured by Nippon Steel Chemical Co., Ltd.), Lypoxy SP-1506, SP-1507, SP-1509, VR-77, SP-4010, SP-4060 (above, manufactured by Showa Polymer Co., Ltd.) . Further, the composition of the present invention is more preferably a compound containing at least three (meth)acrylamide groups in the molecule. As the compound containing three or more (meth) acrylamide groups, the above-exemplified three (meth) acrylate compound, tetra (meth) acrylate compound, and penta (meth) acrylate compound may be selected. And a hexa(meth) acrylate compound or the like, and among them, pentaerythritol hydroxy triacrylate and trimethylolpropane triacrylate are most preferable. These compounds may be used alone or in combination of two or more. The compounding amount of the component (C) in the composition of the present invention is not particularly limited, and the total amount of the composition excluding the organic solvent is 100% by weight, usually 1 to 15% by weight, preferably 5 to 14% by weight. %, more preferably in the range of 1 1 to 1 3 wt%. When the amount of the component (C) is less than 1% by weight, the scratch resistance of the obtained cured coating film may not be obtained. On the other hand, if it exceeds 15% by weight, the refractive index is lowered. (D) Compound which initiates active species by irradiation with an active energy ray A compound which induces an active species by irradiation with an active energy ray (hereinafter referred to as "(D) component") may be added to the composition of the present invention. These compounds are used to cure the curable composition efficiently. As a compound which initiates an active species by irradiation with an active energy ray (hereinafter referred to as "photopolymerization initiator"), examples of the active species include a photoradical generator which initiates a radical of -25 to 200902622. Further, the 'active energy ray' is defined as an energy ray which can cause decomposition of a compound which initiates an active species to produce an active species. The active energy ray includes light energy rays such as visible light, ultraviolet rays, infrared rays, xenon rays, alpha rays, radiance rays, and r rays. Among them, ultraviolet rays are preferably used from the viewpoint of having a certain energy level, an accelerated hardening speed, and an inexpensive and small irradiation device. As examples of the photo radical generating agent, for example, acetophenone, acetophenone benzyl ketal, anthracene, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane- 1-ketone, carbazole, xanthone, 4-chlorobenzophenone, 4,4,-diaminobenzophenone, 1,1-dimethoxyoxybenzoin, 3,3,_ Dimethyl-4_methoxybenzophenone, thioxanthone, 2,2-dimethoxy-2-phenylacetophenone, 1-(4-dodecylphenyl)-2 Hydroxy-2-methylpropan-1-one, 2-methyl-l-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, triphenylamine, 2,4, 6-trimethylbenzimidyldiphenylphosphine oxide, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2.methyl-1-phenylpropane-buxone, anthrone, anthracene, benzaldehyde , benzoin ethyl ether, benzoin propyl ether, benzophenone 'michlerone, 3-methylacetophenone, 3,3', 4,4'-tetra (t-butyl) Oxycarbonyl)benzophenone (BTTB), 2-(dimethylamino)-1-[4-(morpholino)phenyl]-2-phenylmethyl)-1-butanone, 4-benzene Mercapto-4'-methyldiphenyl sulfide, 2-hydroxy-2-methyl-[4-(1-methylvinyl)phenyl]propene Oligomers, benzyl, or BTTB and xanthene, sulfur xanthene, coumarin, ketocoumarin, other combinations of dye sensitizer. Among these photopolymerization initiators, preferred is 2,2-dimethoxy-2-phenyl-26-200902622 acetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1- Ketone, 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzimidyl diphenylphosphine oxide, 2-methyl·1-[4-(methylthio)phenyl] -2-Mercaprylpropan-1-one, 2-(dimethylamino)-bu [4-(morpholinyl)phenyl]-2-phenylmethyl)-1-butanol, 2-hydroxyl -2-methyl-[4-(1-methylvinyl)phenyl]propanol oligomer, etc., more preferably 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-( Methylthio)phenyl]-2-morpholinylpropan-1-one, 2-(dimethylamino)-1-[4-(morpholinyl)phenyl]-2-phenylmethyl) 1-butanol, 2-hydroxy-2-methyl-[4-(1-methylvinyl)phenyl]propanol oligomer, and the like. The compounding amount of the component (D) in the composition of the present invention is not particularly limited. The total amount of the composition excluding the organic solvent is 100% by weight. /. The case is preferably in the range of 〇~15 wt%, more preferably 2-8 wt%, and most preferably 3% wt%, and if it exceeds 15 wt%, the hardness may be lowered. (E) Organic solvent The composition of the present invention may contain an organic solvent. By containing an organic solvent, a uniform anti-reflection film of a film can be formed. As for the organic solvents, exemplified are ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, and methyl amyl ketone, ethyl acetate, butyl acetate, and propylene glycol monomethyl ether. Esters such as esters, propylene glycol monomethyl ether, methanol, ethanol, second butanol, third butanol, 2-propanol, isopropanol and other alcohols, aromatics such as benzene, toluene, chlorobenzene, etc. A single or a combination of two or more of aliphatics such as alkane and cyclohexane. Among these, ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, and methyl amyl ketone are preferred, and ethyl acetate, butyl acetate, and propylene glycol monomethyl ether acetate are preferred. Ester and other esters; propylene glycol monomethyl ether, methanol, ethylene -27-200902622 alcohol, second butanol, third butanol, 2-propanol, isopropanol and other alcohols, more preferably methyl isobutyl A single one or a combination of two or more of a ketone, methyl amyl ketone, and a third butanol. As the organic solvent, a dispersion medium of the reactive particles of the above component (A) may be used, and it may be further used in combination with other organic solvents. The amount of the organic solvent to be blended is not particularly limited, and the total amount of the composition excluding the organic solvent is 100 parts by weight, preferably 1 Torr to 1 〇 〇, 〇 〇 0 parts by weight. The reason is that when the amount of the organic solvent is less than 10 parts by weight, it is difficult to adjust the viscosity of the curable composition. On the other hand, if it exceeds 100 parts by weight, the curable composition is present. The preservation stability is lowered or the viscosity is lowered, making the operation difficult. (F) Additive The composition of the present invention preferably contains a photosensitizer, a polymerization inhibitor, a polymerization initiator, a leveling agent, a wet modifier, and an interface within a range not impairing the object and effect of the present invention. Additives such as active agents, plasticizers, ultraviolet absorbers, antioxidants, antistatic agents, decane coupling agents, inorganic filling agents, pigments, dyes, and the like. (2) Modification method of the composition of the present invention The composition of the present invention can be mixed at room temperature or under heating, by separately adding the composition containing the above components (A) to (D) and the above (E) as needed Prepared by ~(F) ingredients. Specifically, it can be prepared by using a mixer such as a kneader, a kneader, or a ball mill 'three-roller drum. (3) Hardening conditions of the composition of the present invention The composition of the present invention can be hardened by heat and/or radiation (light). If -28-200902622 is a hot case, the heat source can use, for example, an electric heater, an infrared lamp, a hot air or the like. In the case of the radiation (light), the radiation source is not particularly limited as long as the composition can be cured for a short period of time after application. For example, as the infrared radiation source, a lamp, a resistance heating plate, and a lightning can be cited. For example, there are sunlight, lamps, fluorescent lamps, lasers, etc., and radiation sources of ultraviolet rays, such as mercury lamps, halogen lamps, lasers, etc., and electron beams. Examples of the radiation source include a cold cathode method in which a high-voltage pulse is generated by a metal by using a commercially available tungsten wire, and a secondary cathode method in which an ionized gaseous molecule and a metal are generated by collision. Electronic way. Further, examples of the radiation source of the ray, the /3 ray, and the r ray include a nuclear cleavage material such as c 〇 6 (), and a vacuum tube which accelerates electrons against the anode in the r ray system. These radiations may be irradiated one by one or two or more simultaneously or during a fixed period. As for the conditions by heat hardening, it is preferred to heat at a temperature in the range of 30 to 200 ° C for 1 to 180 minutes. By such heating, the base material is not damaged, and the antireflection film excellent in scratch resistance can be obtained more effectively. Further, for these reasons, it is preferably heated at a temperature in the range of 50 to 180 ° C for 2 to 120 minutes, preferably at a temperature in the range of 80 to 150 ° C for 5 to 60 minutes. The condition for subsequent radiation irradiation is preferably such that the exposure amount becomes in the range of 0.01 to 10 J/cm 2 . The reason is that if the exposure amount is less than 〇1 J/cm2, there is a case where the curing is poor. On the other hand, if the exposure amount exceeds 1 〇J/cm2, there is a case where the curing time -29-200902622 is abnormal. Further, for these reasons, the preferable exposure amount 値 is in the range of 0.1 to 5 J/cm 2 , more preferably in the range of 〇 3 to 3 J/cm 2 . II. Cured film and laminate The cured film of the present invention is composed of a cured product obtained by hardening the above-described composition of the present invention, and the cured film of the present invention can be used as a high refractive index because of its high refractive index and antistatic property. Antistatic layer. The laminate of the present invention contains a layer composed of the cured film of the present invention. The layer composed of the cured film of the present invention is a layer having a function of a high refractive index layer and/or an antistatic layer. Further, in the case where the laminate of the present invention is an antireflection film, a low refractive index layer, a hard coat layer, a substrate, or the like may be contained in addition to the above layer. Figure 1 shows a cross-sectional view of the antireflection film. As shown in FIG. 1, on the substrate 2, a hard coat layer 3, a high refractive index layer 4, and a low refractive index layer 5 are laminated. At this time, on the substrate 2, the high refractive index layer 4 may be directly formed instead of the hard coat layer 3. Further, a medium refractive index layer 6 (not shown) may be provided between the hard coat layer 3 and the high refractive index layer 4. (1) Low refractive index layer The curable composition for forming the low refractive index layer is not particularly limited, and a conventional material for forming a low refractive index layer can be used. The refractive index of the low refractive index layer (the refractive index of the Na-D line, the measurement temperature of 25 ° C) is preferably 1.50 or less. The reason is that when the refractive index of the low refractive index film exceeds 1,500, the antireflection effect is remarkably lowered. Accordingly, the refractive index of the low refractive index film is preferably 1.48 or less, more preferably 1.45 or less. -30- 200902622 Further, in the case of providing a plurality of low-refractive-index films, as long as at least one of the layers has a refractive index 上述 within the above range, the refractive index 其他 of the other low-refractive-index films may be more than 丨·50. . The thickness of the low refractive index layer is not particularly limited, but is preferably, for example, 50 to 200 nm. The reason for this is that if the thickness of the low refractive index layer is less than 50 nm, the antireflection effect may not be sufficiently obtained. On the other hand, if the thickness exceeds 200 nm, light interference may occur to reduce the antireflection effect. Therefore, the thickness of the low refractive index layer is more preferably from 50 to 250 nm, and further preferably from 70 to 150 nm. (2) High refractive index layer The high refractive index layer is composed of a cured film obtained by curing the composition of the present invention. Since the high refractive index layer also has antistatic properties, the dustproofness of the laminate can be improved. In the constitution and the like of the composition of the present invention, the above description is well known, and the detailed description thereof will be omitted. Hereinafter, the high refractive index layer and the thickness will be described. The refractive index of the high refractive index layer is preferably 1.57 or more, more preferably 1.58 or more, and most preferably 1.59 or more. If the refractive index of the high refractive index layer is less than 1.57, sufficient antireflection may not be obtained. Further, the difference in refractive index between the low refractive index layer and the low refractive index layer is preferably 0.16 or more, more preferably 〇1.7 or more. The difference in refractive index between the high refractive index layer and the low refractive index layer may not be sufficient to achieve an antireflection effect if it does not reach 〇 · 1.6. The thickness of the high refractive index layer is not particularly limited, and is, for example, preferably from 50 to 30,000 nm. The reason is that if the thickness of the high refractive index layer is less than 50 nm, -31 - 200902622 may have an antireflection effect or a decrease in the adhesion to the substrate when combined with the low refractive index layer. When the thickness exceeds 30,000 nm', light interference is generated and the antireflection effect is lowered. Accordingly, the thickness of the high refractive index layer is more preferably from 50 to 1,000 nm, and even more preferably from 60 to 500 nm. Further, in order to obtain a higher antireflection property, when a plurality of high refractive index layers are provided to have a multilayer structure, the thickness of the plurality of high refractive index layers may be 50 to 30,000 nm in total. Further, in the case where a hard coat layer is provided between the high refractive index layer and the substrate, the thickness of the high refractive index layer may be 50 to 300 nm. (3) Hard coat layer The constituent material of the hard coat layer used in the antireflection film of the present invention is not particularly limited. As the materials, a single or a combination of two or more of a decyl alkane resin, an acrylic resin, a melamine resin, and an epoxy resin is exemplified. Further, the thickness of the hard coat layer is not particularly limited, and is preferably from 1 to 100 μm, more preferably from 3 to 30 μm. The reason is that if the hard coat layer does not reach Ιμηι, the hardness is lowered as a hard coat layer. On the other hand, if the thickness exceeds 100 μm, the base material is deformed by hardening and shrinking of the hard coat layer. The situation. (4) Substrate The type of the substrate used for the antireflection film of the present invention is not particularly limited, and examples thereof include glass, polycarbonate resin, polyester resin, acrylic resin, and polyethylene terephthalate. A substrate composed of an alcohol ester resin (PET), a triacetyl cellulose resin (TAC) or the like. By using anti-32-200902622 reflective film containing these substrates, a wide range of anti-reflection film applications such as a lens portion of a camera, a screen display portion of a television (CRT), or a color filter in a liquid crystal display device Excellent anti-reflection effect in the field. The invention is specifically described by the following examples, which are not intended to limit the invention in any way. In addition, "%" and "parts" mean % by weight and parts by weight unless otherwise stated. Production Example 1 Preparation of a ruthenium-based dispersion of ruthenium-containing bismuth-containing tin oxide particles (manufactured by Ishihara Techno Co., Ltd., trade name: SN-100P 'primary particle size: 10 to 30 nm), dispersant (trade name: ADEKA, trade name) :Adecapulronick TR-701) and methanol are mixed in a ratio of 2 9 ·1/0 · 9/7 0 (weight ratio) (the total solid content is 30%, the total inorganic content is 2 9.1%). Using a SC honing machine manufactured by Mitsui Mining & Co., Ltd., it was treated under the following conditions for 1 hour to obtain a particle dispersion solution having a particle diameter of 5 9 nm. Machine: SC honing machine frequency manufactured by Mitsui Mining Co., Ltd. Frequency: 60 Hz (equivalent to 3600 rpm) Shell capacity: 5 9 ml Liquid volume: 500 gram of dispersed beads: Glass beads (TOSHINRIKO, BZ-01) (bead diameter 0.1 mm) 40 g, volume filling rate 27% The particle size of cerium in the cerium-containing tin oxide particles dispersed in the obtained dispersion was measured under the following conditions. -33- 200902622 Machine: Dynamic light scattering type particle size distribution measuring device manufactured by Horiba, Ltd.

測定條件： 溫度25°C 試料樣品以原液直接測定 數據解析條件： 粒徑基準 體積基準 分散粒子 ΑΤΟ粒子 折射率2.05 分散介質 甲醇 折射率1.329 製造例2:具有聚合性不飽和基之有機化合物（Ab)之 製造 在乾燥空氣中，於50 °C下及以1小時內，於含221 份氫硫基丙基三甲氧基矽烷、1份二丁基錫二月桂酸酯所 成之溶液中，邊攪拌邊滴加222份異佛爾酮二異氰酸酯 後，在7〇t加熱攪拌3小時。在30°C下1小時內於其中 滴力卩5 49份之新中村化學製之 NK Ester A-TMM-3LM-N(60重量％之季戊四醇三丙烯酸酯與40重量％季戊四醇 四丙烯酸酯所構成。其中僅具有羥基之季戊四醇三丙烯酸 酯與反應有關）後，在60t：下加熱攪拌1 〇小時後，獲得 含有聚合性不飽和基之有機化合物（Ab)。生成物中殘留之 異氰酸酯基量以FT-IR分析爲0.1%以下，顯示反應大致 上定量地結束。生成物之紅外線吸收光譜中，發現特徵爲 25 50CHT1吸收峰之原料中氫硫基，以及特徵爲226(^1^1 吸收峰之原料異氰酸酯基均消失，且有新的特徵爲 1 660CI1T1峰之胺基甲酸酯鍵及S(C = 0)NH-基以及特徵爲 -34- 200902622 1720cm·1峰之丙烯醯基，顯示生成同時具有作爲聚合性不 飽和基之丙烯醯基與-S(C = 0)NH-、胺基甲酸酯鍵之經丙 烯醯氧基修飾之烷氧基矽烷。 製造例3 :反應性粒子分散液A之調配 使9 8.6份製造例1製造之銻粒子分散液、1 · 2份製造 例2製造之組成物、〇.〇2份離子交換水以及0.01份對-羥 基苯基單甲基醚在60°c下攪拌4小時後，添加0.20份原 甲酸甲酯，且在1小時內於同一溫度下加熱攪拌，獲得反 應性粒子分散液 A。於鋁盤上稱取該分散液2克後’在 1 7 5 °C之加熱板上乾燥1小時，求得所稱量之固成份含量 爲3 1 %。另外，將分散液在磁性瓶中稱取2克後，於80 °C之加熱板上預乾燥30分鐘，自於7 5 0 °C之隔焰（Muffle) 爐中燒成1小時後之無機殘留物，計算出固成份中之無機 物含量爲96%。 製造例4 ‘·反應性粒子分散液B之調配 除製造例1中之銻粒子分散液之中値粒徑成爲7〇nm 外，其餘均以製造例1~3爲準調配反應性粒子分散液B。 製造例5 :反應性粒子分散液C之調配 除製造例1中之銻粒子分散液之中値粒徑成爲78nm 外，其餘均以製造例1〜3爲準調配反應性粒子分散液C。 -35- 200902622 製造例6 :反應性粒子分散液D之調配 除製造例1中之銻粒子分散液之中値粒徑成爲8 9nm 外，其餘均以製造例1〜3爲準調配反應性粒子分散液D。 實施例1 (1) 高折射率抗靜電硬化性組成物之調製 於遮蔽紫外線之容器中添加表1中所示之各成分，於 室溫下攪拌1小時獲得均勻之組成物。 (2) 具有硬塗層及高折射率抗靜電層之層合體之製造 使用裝置環棒（#12)之塗佈器將硬塗層材料（jsr(株） 製，商品名：Z7501)塗佈於作爲基材之聚對苯二甲酸乙二 醇酯（PET)膜（東洋紡績（株）製之PET A4300)上。隨後，於 烘箱中於80°C下乾燥3分鐘，形成塗膜。接著，於大氣 中使用高壓水銀燈’以900mJ/cin2之光照射條件使塗膜經 紫外線硬化。再者，使用裝置有環棒（#3)之塗佈器將以上 述（1)調配之組成物塗佈在硬塗層硬化膜上。隨後，在烘 箱中於8 0 °C下乾燥2分鐘，形成塗膜。接著，於大氣中 使用高壓水銀燈，以600mJ/cm2之光照射條件使塗膜經紫 外線硬化，製成層合體。 (3) 具有硬塗層、高折射率抗靜電層以及低折射率層 之層合體之製備 於依據上述（2)製作之層合體上，使用裝置有環棒 (#12)之塗佈器塗佈低折射率材料（JSR(株）製，商品名： TU21S7)。此時，使用以甲基異丁基酮將低折射率材料之 -36 - 200902622 固成份稀釋成3.6%者。隨後，在烘箱中於8(rc乾燥2分 鐘’形成塗膜。接著’在氮氣氛圍中，使用高壓水銀燈， 以6 00mJ/cm2之光照射條件，使塗膜經紫外線硬化，製作 層合體。 (4) 具有硬塗層及高折射抗靜電層之層合體之評估 測定依據上述（2)製作之層合體之透明性（霧濁度）、表 面電阻以及反射率。 又，霧濁度係使用顏色-霧濁計（S U G A試驗機（株） 製），依據ASTMD1003測定。 表面電阻（Ω/口）係使用Agilent Technology製之高電 阻計（High Resistance Meter) 4339B，以施加電壓 100V 下 測定。 反射率測定係在分光光度計（日本分光（株）製，商品 名：V-5 70)中利用大型積分球裝置（日本分光（株）製，商品 名：ILV-471)測定。 結果顯不於表1中。 (5) 具有硬塗層、高折射率抗靜電層及低折射率抗靜 電層之層合體之評估 以下列所示方法測定依據上述（3 )製作之層合體之耐 刮傷性（鋼絲毛織品抗性）。 將鋼絲毛織品（BOSTARNo. 0000，日本Steelwool(株） 製）安裝在學振型摩擦堅牢度試驗機（AB-301，Tester產業 (株）製）上，以荷重23 3克/cm2之條件在硬化膜表面上來 ®摩擦1 0次，以目視確認該硬化膜表面是否出現刮傷， -37- 200902622 依據以下基準評估。結果列於表1。 〇：辨識出硬化膜上僅少許細微刮傷 X :辨識出硬化膜全部表面有條狀刮傷 實施例2及比較例1〜4 除調配表1中記載者以外，與實施例1同樣調製組成 物，製作層合體並評價，結果列於表1。 [表1] 成份 組成(重量份） 實施例 1 實施例 2 比較例 1 比較例 2 比較例 3 比較例 4 反應性粒子A(中値粒徑59nm) _ _ 78.58 _ _ • ㈧ 反應性粒子B(中値粒徑70nm) 78.58 _ _ _ 78.58 - 反應性粒子C(中値粒徑78nm) _ 78.58 _ - _ 78.58 __ 反應性粒子D沖値粒徑89nm) • _ 一 78.58 - (B) Biscoat 700 5.04 5.04 5.04 5.04 . 辦 (C) ΡΕΤΑ 12.13 12.13 12.13 12.13 17.17 17.17 (D) Irg. 907 4.25 4.25 4.25 4.25 4.25 4.25 固成分合計 100 100 100 100 100 100 (E) 丙二醇單甲基醚 1250 1250 1250 1250 1250 1250 甲醇(包含粒子之分散介質） 225 225 225 225 225 225 溶劑合計 1475 1475 1475 1475 1475 1475 固成分濃度(重量％) 6.3% 6.3% 6.3% 6.3% 6.3% 6.3% 特 性 評 估 高折射率抗靜電層/硬塗層 /PET層合體 霧濁度(％) 1.6 1.5 1.2 1.8 1.6 1.5 表面電阻(Ω/口） 3x109 5xl09 5xl012 5xl08 3x109 5xl09 最咼反射率(％) 12.3 12.3 12.3 11.9 12.0 12.0 低折射率層/高折射率抗靜電 層/硬塗層/PET層合體 耐刮傷性(鋼絲毛織品抗性） 〇 〇 X 〇 〇 〇 -38- 200902622 表1中之成份代表如下所述者： 反應性粒子A :製造例3，中値粒徑59nm 反應性粒子B :製造例4，中値粒徑70nm 反應性粒子C :製造例5，中値粒徑78ηιη 反應性粒子D :製造例6，中値粒徑89nm Biscoat 700:大阪有機化學（株）製，雙酣A、EO加 成物二丙烯酸酯 PET A :新中村化學（株）製，四羥甲基甲烷三丙烯酸酯 Irg.907 ： Ciba Special Chemicals(株）製，2-甲基-1-[4-(甲基硫基）苯基-2-嗎啉基丙烷-1-酮 由表1之結果可看出，反應性粒子爲中値粒徑7 Onm 及78nm且含成分（B)之化合物之實施例1、2，其表面電 阻低如1 〇9 Ω /cm2等級、最高反射率高、耐刮傷性優異。 相反地，可看出反應性粒子的中値粒徑小如5 9nm之比較 例1，其表面電阻高且耐刮傷性惡化。反之，可看出反應 性粒子的中値粒徑大如8 9nm之比較例2，其霧濁性高、 最高反射率低。又，可看出不含有成分（B)之化合物的比 較例3及4，最局反射率變低。 [產業上可利用性] 本發明之硬化性組成物可用於製造高折射率、抗靜電 性及耐刮傷性優異之硬化膜。 本發明之硬化膜可作爲需要抗靜電性及耐刮傷性之塗 層膜，又’可用做抗反射膜之高折射率抗靜電層。 -39- 200902622 【圖式簡單說明】 圖1顯示本發明層合體（抗反射膜）之一實施形態之模 式圖。 【主要元件符號說明】 1 :抗反射膜 2 :基材 3 :硬塗層 4 :局折射率抗靜電層 5 :低折射率層 -40-Measurement conditions: Temperature 25 °C The sample sample was directly measured by the stock solution. Data analysis conditions: Particle size Reference volume basis Dispersed particles ΑΤΟ Particle refractive index 2.05 Dispersion medium Methanol refractive index 1.329 Production example 2: Organic compound having a polymerizable unsaturated group (Ab Manufactured in a dry air at 50 ° C for 1 hour in a solution containing 221 parts of hydrothiopropyltrimethoxydecane and 1 part of dibutyltin dilaurate while stirring After dropwise addition of 222 parts of isophorone diisocyanate, the mixture was stirred under heating at 7 ° C for 3 hours. NK Ester A-TMM-3LM-N (60% by weight of pentaerythritol triacrylate and 40% by weight of pentaerythritol tetraacrylate) of New Nakamura Chemical Co., Ltd. was added in an amount of 5 49 parts at 30 ° C for 1 hour. After the reaction of the pentaerythritol triacrylate having only a hydroxyl group with the reaction, the organic compound (Ab) containing a polymerizable unsaturated group is obtained after heating and stirring at 60 t: for 1 hour. The amount of the isocyanate group remaining in the product was 0.1% or less by FT-IR analysis, indicating that the reaction was substantially quantitatively completed. In the infrared absorption spectrum of the product, it was found that the hydrogenthio group in the raw material characterized by the absorption peak of 25 50 CHT1 and the isocyanate group of the material having the characteristic peak of 226 (^1^1 absorption disappeared, and a new amine group having a characteristic of 1 660 CI1T1 peak was observed. The acid ester bond and the S(C=0)NH- group and the propylene fluorenyl group having a peak of -34-200902622 1720 cm·1 are shown to have an acryl fluorenyl group as a polymerizable unsaturated group and -S (C = 0) The acryloxy group-modified alkoxy decane of the NH- or urethane bond. Production Example 3: Preparation of the reactive particle dispersion A 9 8.6 parts of the ruthenium particle dispersion produced in Production Example 1, 1 After 2 parts of the composition produced in Production Example 2, 2 parts of ion-exchanged water, and 0.01 part of p-hydroxyphenyl monomethyl ether were stirred at 60 ° C for 4 hours, 0.20 part of methyl orthoformate was added, and The mixture was heated and stirred at the same temperature for 1 hour to obtain a reactive particle dispersion A. After weighing 2 g of the dispersion on an aluminum pan, it was dried on a hot plate at 175 ° C for 1 hour to obtain a weighed amount. The solid content of the solid content is 31%. In addition, the dispersion is weighed in a magnetic bottle and weighed 2 g at 80 °C. The hot plate was pre-dried for 30 minutes, and the inorganic residue after firing for 1 hour from a muffle furnace at 750 ° C was calculated to have a 96% inorganic content in the solid content. In the preparation of the reactive particle dispersion liquid B, the reactive particle dispersion liquid B was prepared in the same manner as in Production Examples 1 to 3 except that the ruthenium particle diameter in the ruthenium particle dispersion liquid in Production Example 1 was 7 〇 nm. In the preparation of the reactive particle dispersion C, the reactive particle dispersion C was prepared in the same manner as in Production Examples 1 to 3 except that the ruthenium particle diameter in the ruthenium particle dispersion in Production Example 1 was 78 nm. -35- 200902622 Production Example 6: Preparation of Reactive Particle Dispersion D The reactive particle dispersion D was prepared in the same manner as in Production Examples 1 to 3 except that the ruthenium particle diameter in the ruthenium particle dispersion liquid in Production Example 1 was 8 9 nm. Example 1 (1) Preparation of a high refractive index antistatic hardening composition The components shown in Table 1 were added to a container for shielding ultraviolet rays, and stirred at room temperature for 1 hour to obtain a uniform composition. (2) The manufacture of a laminate of a hard coat layer and a high refractive index antistatic layer uses a device ring rod ( In the applicator of #12), a hard coat material (manufactured by JSr Co., Ltd., trade name: Z7501) was applied to a polyethylene terephthalate (PET) film as a substrate (Toyobo Co., Ltd.) Then, it was dried on a PET A4300. Then, it was dried in an oven at 80 ° C for 3 minutes to form a coating film. Then, a high-pressure mercury lamp was used in the atmosphere to cure the coating film by ultraviolet light at a light irradiation condition of 900 mJ/cin 2 . The composition prepared in the above (1) was coated on the hard coat cured film using an applicator having a ring bar (#3). Subsequently, it was dried in an oven at 80 ° C for 2 minutes to form a coating film. Next, a high-pressure mercury lamp was used in the atmosphere, and the coating film was cured by ultraviolet rays under a light irradiation condition of 600 mJ/cm 2 to obtain a laminate. (3) A laminate having a hard coat layer, a high refractive index antistatic layer, and a low refractive index layer is prepared on the laminate prepared according to the above (2), and is coated with a coater having a ring bar (#12). A low refractive index material (manufactured by JSR Corporation, trade name: TU21S7). At this time, the solid component of the low refractive index material of -36 - 200902622 was diluted to 3.6% with methyl isobutyl ketone. Subsequently, a coating film was formed in an oven at 8 (r drying for 2 minutes). Then, in a nitrogen atmosphere, a high-pressure mercury lamp was used, and the coating film was cured by ultraviolet rays under a light irradiation condition of 600 mJ/cm 2 to prepare a laminate. 4) Evaluation of laminate having a hard coat layer and a high-refraction antistatic layer The transparency (haze), surface resistance, and reflectance of the laminate produced in the above (2) were measured. - Haze meter (manufactured by SUGA Test Instruments Co., Ltd.), measured in accordance with ASTM D1003. Surface resistance (Ω/port) was measured using an Aohment Technology High Resistance Meter 4339B at an applied voltage of 100 V. The measurement was carried out by a spectrophotometer (manufactured by JASCO Corporation, trade name: V-5 70) using a large-scale integrating sphere apparatus (manufactured by JASCO Corporation, trade name: ILV-471). (1) Evaluation of laminate having a hard coat layer, a high refractive index antistatic layer, and a low refractive index antistatic layer The scratch resistance of the laminate produced according to the above (3) was measured by the following method ( Steel wire Product resistance) A steel wool fabric (BOSTAR No. 0000, manufactured by Japan Steelwool Co., Ltd.) was attached to a vibration-type friction fastness tester (AB-301, manufactured by Tester Industries Co., Ltd.) at a load of 23 3 g/ The condition of cm2 was rubbed 10 times on the surface of the cured film to visually confirm whether or not the surface of the cured film was scratched. -37-200902622 The evaluation was based on the following criteria. The results are shown in Table 1. 〇: Only a little on the cured film was identified. Fine scratching X: It was found that the surface of the cured film was scratched in a strip shape. Example 2 and Comparative Examples 1 to 4 The composition was prepared in the same manner as in Example 1 except that the composition shown in Table 1 was prepared, and a laminate was produced and evaluated. The composition is shown in Table 1. [Table 1] Ingredient composition (parts by weight) Example 1 Example 2 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Reactive particle A (midium particle size 59 nm) _ _ 78.58 _ _ • (8) Reactive particle B (median particle size 70 nm) 78.58 _ _ _ 78.58 - Reactive particle C (median particle size 78 nm) _ 78.58 _ - _ 78.58 __ Reactive particle D punching particle size 89 nm) • _ 78.58 - (B) Biscoat 700 5.04 5.04 5.04 5.04 . Office (C) ΡΕΤΑ 12.13 12.13 12.13 12.13 17.17 17.17 (D) Irg. 907 4.25 4.25 4.25 4.25 4.25 4.25 Total solids 100 100 100 100 100 100 (E) Propylene glycol monomethyl ether 1250 1250 1250 1250 1250 1250 Methanol (dispersion medium containing particles) 225 225 225 225 225 225 Solvent total 1475 1475 1475 1475 1475 1475 Solid concentration (% by weight) 6.3% 6.3% 6.3% 6.3% 6.3% 6.3% Evaluation of high refractive index antistatic layer / hard coating / PET laminate haze (%) 1.6 1.5 1.2 1.8 1.6 1.5 Surface resistance (Ω/port) 3x109 5xl09 5xl012 5xl08 3x109 5xl09 Final reflectance (%) 12.3 12.3 12.3 11.9 12.0 12.0 Low refractive index layer / high refractive index antistatic layer / hard coating /PET laminate scratch resistance (steel wool resistance) 〇〇X 〇〇〇-38- 200902622 The components in Table 1 represent the following: Reactive particle A: Production example 3, medium 値 particle size 59 nm reaction Particle B: Production Example 4, medium-sized particle size: 70 nm Reactive particle C: Production Example 5, medium-sized particle size: 78 ηηη Reactive particle D: Production Example 6, medium-thickness particle size: 89 nm Biscoat 700: Osaka Organic Chemical Co., Ltd. System, double 酣A EO adduct diacrylate PET A: manufactured by Shin-Nakamura Chemical Co., Ltd., tetramethylol methane triacrylate Irg. 907: manufactured by Ciba Special Chemicals Co., Ltd., 2-methyl-1-[4-( Methylthio)phenyl-2-morpholinylpropan-1-one As seen from the results of Table 1, examples in which the reactive particles are compounds having a median diameter of 7 Onm and 78 nm and containing the component (B) 1, 2, its surface resistance is as low as 1 〇 9 Ω / cm2 grade, the highest reflectivity is high, and the scratch resistance is excellent. On the contrary, in Comparative Example 1, in which the particle diameter of the reactive particles was as small as 5 9 nm, the surface resistance was high and the scratch resistance was deteriorated. On the other hand, in Comparative Example 2 in which the particle diameter of the reactive particles was as large as 8.9 nm, the haze property was high and the highest reflectance was low. Further, it can be seen that Comparative Examples 3 and 4 which do not contain the component (B) have the lowest partial reflectance. [Industrial Applicability] The curable composition of the present invention can be used for producing a cured film excellent in high refractive index, antistatic property, and scratch resistance. The cured film of the present invention can be used as a coating film which requires antistatic property and scratch resistance, and can be used as a high refractive index antistatic layer of an antireflection film. -39-200902622 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of a laminate (antireflection film) of the present invention. [Main component symbol description] 1 : Anti-reflection film 2 : Substrate 3 : Hard coat 4 : Local refractive index antistatic layer 5 : Low refractive index layer -40-

Claims (1)

200902622 十、申請專利範圍 1 . 一種硬化性組成物，該硬化性組成物含有下列成 分（A)~(C): (A) 具有聚合性不飽和基、且中値粒徑在65〜8 5nm 範圍內，且以選自由鋅、絪、錫以及銻組成之群的至少一 種元素之氧化物作爲主要成分的粒子； (B) 具有一個以上之聚合性不飽和基、一個以上之環 氧烷鏈以及兩個以上芳香環之化合物； (C) 具有一個以上聚合性不飽和基之除了上述（A)及 (B )成份以外之化合物。 2.如申請專利範圍第1項之硬化性組成物，其中上 述成分（B)之化合物具有如下通式（B-1)所示之結構：200902622 X. Patent application scope 1. A curable composition containing the following components (A) to (C): (A) having a polymerizable unsaturated group and having a median diameter of 65 to 8 5 nm a particle having an oxide of at least one element selected from the group consisting of zinc, bismuth, tin, and antimony as a main component; (B) having one or more polymerizable unsaturated groups and one or more alkylene oxide chains And a compound of two or more aromatic rings; (C) a compound other than the above components (A) and (B) having one or more polymerizable unsaturated groups. 2. The sclerosing composition of claim 1, wherein the compound of the above component (B) has a structure represented by the following formula (B-1): [式（B-1)中’ R1及R2分別代表碳數2〜4之2價烴 基’ R3爲單鍵或者亦可具有芳香環之碳數1〜2〇之2價烴 基’ R5〜R6爲氫原子或甲基，Rw以及代表氫原子或 (甲基）丙烯醯基，q個R14以及p個r15中至少一個爲（甲 基）丙烯醯基’ m及η分別代表1〜3〇之數，p代表之 數，q代表〇〜4之數]。 3.如申請專利範圍第1或2項之硬化性組成物，其 -41 - 200902622 中上述成分（B)之化合物具有如下通式（B_2)所示之結構： 【化2】[In the formula (B-1), R1 and R2 each represent a divalent hydrocarbon group having a carbon number of 2 to 4, and R3 is a single bond or a divalent hydrocarbon group having a carbon number of 1 to 2 Å of an aromatic ring, R5 to R6. A hydrogen atom or a methyl group, Rw and a hydrogen atom or a (meth) acrylonitrile group, at least one of q R14 and p r15 is a (meth) acryloyl group 'm and η represents a number of 1 to 3 Å, respectively. , p represents the number, q represents the number of 〇 ~ 4]. 3. The curable composition according to claim 1 or 2, wherein the compound of the above component (B) in -41 - 200902622 has a structure represented by the following formula (B_2): 別代表氫原子、甲基、苯基’ Rl3爲氫原子或（甲基）丙烯 醯基，m分別獨立代表1〜30之數]。 4 .如申請專利範圍第1〜3項中任一項之硬化性組成 物，其中上述成分（A)之氧化物粒子係選自由含有銻之氧 化錫、含有錫之氧化銦、含有氟之氧化錫、含有鋁之氧化 鋅所組成之群組。 5-如申請專利範圍第4項之硬化性組成物，其中上 述成分（A)之氧化物粒子爲含有銻之氧化錫。 6 .如申請專利範圍第1〜5項中任一項之硬化性組成 物，其中上述成分（A)所含之聚合性不飽和基係含有下式 (4)所τκ結構之基： 【化3】 —U—C—N— (4) II V [式（4)中，U表示NH、0(氧原子）或S(硫原子）’ V表 示0或S ]。 -42- 200902622 7.如申請專利範圍第1~6項中任一項之硬化性組成 物，其進一步含有（D)藉由活性能量射線照射產生活性種 之化合物。 8 ·如申請專利範圍第1 ~7項中任一項之硬化性組成 物，其進一步含有（E)有機溶劑。 9 .如申請專利範圍第1 ~ 8項中任—項之硬化性組成 物，其中上述成分（C)所含之聚合性不飽和基爲（甲基）丙 烯醯基。 10. 一種硬化膜，係使如申請專利範圍第1〜9項中任 一項之硬化性組成物硬化所成者。 1 1 · 一種層合體’其係於基材上具有如申請專利範圍 第10項之硬化膜者。 -43-It does not represent a hydrogen atom, a methyl group, or a phenyl group. Rl3 is a hydrogen atom or a (meth)acryl fluorenyl group, and m each independently represents a number from 1 to 30]. 4. The curable composition according to any one of claims 1 to 3, wherein the oxide particles of the component (A) are selected from the group consisting of tin oxide containing antimony, indium oxide containing tin, and oxidation containing fluorine. A group of tin and zinc oxide containing aluminum. A sclerosing composition according to item 4 of the patent application, wherein the oxide particles of the above component (A) are tin oxide containing cerium. The curable composition according to any one of claims 1 to 5, wherein the polymerizable unsaturated group contained in the component (A) contains a group of a τκ structure of the following formula (4): 3] —U—C—N—(4) II V [In the formula (4), U represents NH, 0 (oxygen atom) or S (sulfur atom) 'V represents 0 or S]. The sclerosing composition according to any one of claims 1 to 6, which further comprises (D) a compound which produces an active species by irradiation with an active energy ray. The curable composition according to any one of claims 1 to 7, which further contains (E) an organic solvent. 9. The curable composition according to any one of claims 1 to 8, wherein the polymerizable unsaturated group contained in the component (C) is a (meth) acrylonitrile group. A cured film obtained by hardening a curable composition according to any one of claims 1 to 9. 1 1 · A laminate which has a cured film as claimed in claim 10 on a substrate. -43-
TW097109883A 2007-03-30 2008-03-20 Curable composition, its cured film and laminate TW200902622A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007091340 2007-03-30
JP2008036761A JP5088163B2 (en) 2007-03-30 2008-02-19 Curable composition, cured film thereof and laminate

Publications (2)

Publication Number Publication Date
TW200902622A true TW200902622A (en) 2009-01-16
TWI364439B TWI364439B (en) 2012-05-21

Family

ID=40052609

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097109883A TW200902622A (en) 2007-03-30 2008-03-20 Curable composition, its cured film and laminate

Country Status (3)

Country Link
JP (1) JP5088163B2 (en)
KR (1) KR100989512B1 (en)
TW (1) TW200902622A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6007669B2 (en) * 2012-08-20 2016-10-12 東ソー株式会社 Metal oxide fine particle dispersion and transparent conductive film using the same
JP6217353B2 (en) * 2013-11-29 2017-10-25 住友大阪セメント株式会社 Transparent resin composition, coating film and heat ray shielding film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10204324A (en) * 1997-01-23 1998-08-04 Toyo Ink Mfg Co Ltd Active radiation-curing coating agent
JP4690510B2 (en) * 1999-02-15 2011-06-01 Ｊｓｒ株式会社 Resin composition and cured product thereof
JP2001348513A (en) * 2000-06-08 2001-12-18 Jsr Corp Curable resin composition, cured film and composite material
KR100761184B1 (en) * 2000-04-20 2007-10-04 디에스엠 아이피 어셋츠 비.브이. Curable resin composition, cured film, and composite product
JP4872142B2 (en) * 2000-04-28 2012-02-08 Ｊｓｒ株式会社 Antistatic curable composition, cured film and antistatic antireflection laminate
JP4742825B2 (en) * 2004-11-15 2011-08-10 Ｊｓｒ株式会社 Manufacturing method of laminate
JP2006231317A (en) * 2004-11-16 2006-09-07 Jsr Corp Manufacturing method of laminate
TW200714658A (en) * 2005-07-14 2007-04-16 Jsr Corp The curable resin composition and the anti-reflection film

Also Published As

Publication number Publication date
TWI364439B (en) 2012-05-21
KR20080089264A (en) 2008-10-06
KR100989512B1 (en) 2010-10-22
JP5088163B2 (en) 2012-12-05
JP2008274226A (en) 2008-11-13

Similar Documents

Publication Publication Date Title
JP5125507B2 (en) Resin composition, cured film and laminate
TWI402281B (en) Radiation hardening resin composition and anti-reflection film
JP4273362B1 (en) Hard coat film
KR101462683B1 (en) Curable resin composition and antireflection film
JP2009286924A (en) Curable composition
JP2012058307A (en) Curable composition and antireflective laminate
JP4929625B2 (en) Curable composition, cured layer and laminate thereof
JP2003105034A (en) Liquid curable resin composition
JP2005068369A (en) Liquid state curable composition, cured film and laminated material for static prevention
JP2007262124A (en) Curable resin composition and antireflection film
KR100959231B1 (en) A curable composition, a cured film, an antireflective film, and a method for producing the cured film
TW200844127A (en) Curable composition, cured film and laminate thereof
WO2020129902A1 (en) Photocurable composition for imprinting
TWI364439B (en)
KR20080031792A (en) Laminate
WO2006051833A1 (en) Curable resin composition and cured film comprising the same and laminate
JP2009274324A (en) Laminate
JP5050435B2 (en) Laminated body
JP5605111B2 (en) Antistatic laminate
JP2008137190A (en) Antireflection laminate
JP4900144B2 (en) Laminated body
JP2010276870A (en) Anti-glare film, polarizing plate, and liquid crystal display element
JP2008001872A (en) Curable resin composition and antireflective coating
JP2008239671A (en) Curable composition and cured product thereof
JP2007262127A (en) Curable resin composition and antireflection film