200809432 九、發明說明·· 【發明所屬之技術領域】 本發明係有關於一種清洗光罩的方法及治具，且特別有關於 一種可有效保護光罩圖形區之清洗光罩的方法及洽具。 【先前技術】 在半導體裝置和液晶顯示裝置的積體電路(integrated circuits ; ICs)製作過程中，常需藉由一微影製程，將一光罩上的 圖形經由曝光而轉移至一感光材料層上，接著再利用此感光材料 層作為蝕刻或離子摻雜的遮罩，以於基板之各個層別上形成積體 電路各部分的圖案或進行其電性的調整。而隨著消費者對於電子 產品的要求不斷地提高，積體電路設計乃愈漸精密，因此用以製 作積體電路圖案的光罩之線幅尺寸(critical dimension ; CD)亦愈加 細微。然而，當光罩的線幅尺寸愈形細微，一方面意味著光罩的 製作成本愈加昂貴，而另一方面表示其對於污染物例如微塵或顆 粒等缺陷的容忍度(tolerance)減低，因此在進行光罩的保存及應用 曰守則需要更加地小心。 有鑑於此，第一圖係顯示一習知具有光罩護膜(pelliele)的 光罩之側面剖視圖。參照第一圖，一般光罩1〇可簡單劃分為一 圖形區12、以及一非圖形區14，其中上述光罩1〇之圖形區12 乃具有用以形成積體電路圖案之圖形，而非圖形區14則通常圍 繞於光罩10的圖形區12之週邊。為了避免在微影製程中，位於 光罩10圖形區12之表面的微塵或顆粒等污染物會一併轉印至積 體電路圖案上，造成其生產良率的降低，因此目前乃通常利用一 200809432 f膠16而將—框架18 11著於光罩1G的表面上’且框架18係产 ^^_輕12之外圍，而—呈現透_狀的光膜^ 則可猎由一貼合膠而黏附於框架18的上緣，如此-來，則光I 護膜20及框架18可有效將光罩1〇的圖形區u與進 避免光罩1G練_成贿。料，當進行郷製 於光罩1G的圖形區12 ’而由於光罩護膜2g乃藉由框架、^ 與光=之表面相隔—間距，因此位於光罩護膜2G上的塵埃或 =2祕顧為失焦，而無法於基板上形献有缺陷的積體 儘管使用光罩制20可有效增加積體電路產品的良率， 並且減少光罩1G所魏行的清潔和檢驗功，細光罩護膜2〇 ^身為薄片狀’有時容易因使用不慎或機台故障等原由而造成損 告’又或^有時為了進行光罩1〇的清洗，或因其他考量及目的， 而必需將舊的光罩護膜20及框架μ先行卸除。 -般卸除光罩義2G及框架18的方式，可例如於框架Μ #的侧邊設置數個孔洞’將-***構件插人至上述孔洞中，以利用 -習知的光罩保護鮮卸縣置，藉由槓桿原理將上述框架Μ 連同光罩護膜20而-併拆除’之後再姻—些清洗液將框架18 與光罩10間所殘餘的底膠16去除，並且對光罩1〇進行一全面 式的洗淨。然而，由於上述核液有時係包含例如一酸性或驗性 的腐錄溶液’且上錢膠乃容易結合於光罩1G之騎區12表 面’因此容易造成光罩10之圖形區12的損害或污染，更進而引 發其所製作之積體電路圖案的缺陷，以及良率不佳等問題。 【發明内容】 200809432 、，有鑑於上述問題，本發明之一目的乃為提供一種可有效保護 光罩之圖形區的光罩清洗方法及治具。 本發明之再-目的為提供—種可針對光罩之非圖形區以及圖 祕進行分段隔離洗淨的方法及治具，其不僅可用以避免造成光 罩之圖形區的損害，並可肋維持光罩之圖祕表面的高度潔 本發明之又-目的為提供—射有效由光罩崎之圖形區往 _光罩外圍之非圖形區進行洗淨的方法及治具，以避免污染物停留 於光罩的圖形區之表面。 本發明之另-目的冑提供一種將光罩護膜自光罩上移除的方 法，以利於後續進行光罩的清洗步驟。 ’ 為達上述與其他目的，本發明一實施例主要提供一種清洗光 罩^方法，其包括提供—光罩，絲罩包含―圖形區與一非圖形 區裱繞於上述圖形區之外圍，利用一阻絕盒對上述光罩的圖形區 •進行隔離，接著先行針對上述光罩未受到阻絕盒隔離的部分進行 清洗，而之後則係將一流體注入至上述阻絕盒中，以由阻絕盒内 往阻絕盒外進行光罩的清洗。 本發明另一實施例則提供了一種清洗光罩的治具，其包含一 =盒蓋，此内盒蓋係構成一凹陷部空間；一外盒蓋圍繞於上述内 益盍之外，並與内盒蓋構成一通道；以及一位於上述外盒蓋中之 孔洞，而此孔洞係與上述通道相通。 為讓本發明之上述和其他目的、特徵、和優點能更明顯易懂， 下文特舉出較佳實施例，並配合所附圖式，作詳細說明如下·· 200809432 【實施方式】 ，發明係舉列了些實施例詳述如下，其内文中相關之圖示並 依據實際比例繪製’其作用僅在於表牡發a月之結構特徵。另， ^了所提出之實施例外’本發明亦可廣泛地施行於其他的實施例 ’亦即’本發明的範圍乃不受實施娜定，_本發明所提出 之申請專利範圍為準。 由於習知技術是採用全面洗淨的方式清洗光罩 ==爾-·目此蝴了縣嗽考量而= 用較具有雜㈣清洗液，例如為去除光罩護膜之絲所殘留於 光面之謂，财易造成光罩_雜之㈣，又或者容易 使Θ染物有機會殘留於光罩之目形區表面而造成缺陷。 : 、有於上述驾知清洗光罩技術所存在之問題，本發明之目的 1為^供—種可有效保護鮮之_區的光罩清洗方法及其治 f，其係針對鮮之非_區以及_區進行分段隔離洗淨，並 可由光罩内部之圖職往光罩外圍之非圖形區進行洗淨，以防止 =光罩之ϋ形區造成損害，並避免污染物停留於光罩的圖形區之 、面’而維持鮮之®職表面的高度潔淨。 一第一圖為根據本發明一實施例之清洗光罩的流程圖。參照第 j ’步驟S2G1乃提供—光罩，其包含—圖形區與—非圖形區 於上顧職之外圍，而轉S2G3卿用-阻絕盒對上述 2心的圖形區進行隔離，並於步驟S205中，先行針對上述光罩 細料部分進行清洗，醉驟謂職將一流體 ' 述阻絕盒中，以由阻絕盒内往阻絕盒外進行光罩的清 200809432 為了有助於完成上述之實施例，本發明之另一實施例乃提供 一清洗光罩的治具，亦即一用以隔離光罩之圖形區的阻絕盒。第 三圖為顯示本發明另一實施例之清洗光罩的治具之侧面剖視概略 圖。 參照第三圖，本發明另一實施例所提供之清洗光罩的治具 300乃包含一内盒蓋302以及一外盒蓋3〇4，其中内盒蓋3〇2係 構成一凹陷部空間306以用於隔離一光罩之圖形區，而外盒蓋3〇4 則圍繞於内盒蓋302之外，並與内盒蓋302構成一通道3〇8。另， 外盒蓋304 0具有一孔洞310與通道308相通。儘管在此實施例 中、，内盒蓋302與外盒蓋304力皇現一门字型，然本發明並非以 此為限此技藝一般人士均可根據其不同考量，而將内盒蓋302 與外盒蓋304設計成弧形、倒v型、亦或其他之幾何步狀。 本實施例所提供之清洗光罩的治具可更包含—通孔312 與凹陷部« 3G6相通，而—遮板314則可位於内盒蓋搬所構 成之凹陷部空間306内，其主要作用乃於後詳述。 為了有效於清洗光罩的過程中，針對光罩之圖形區作一有效 於接耻科造觀罩的顺。因此，為了戦盘光罩直 盒盍3G2的底部3G2,到傷光罩之表面，内盒蓋302的 200809432 底部302,更可包含或包覆有一彈性物316，例如一橡谬。此外， 上述彈性物316乃較佳為—可舰鹼之抗腐蹄f，以避免因清 洗劑造成彈性物316的腐兹，而產生不必要的污染源。另，上述 彈性物316乃較佳可自内盒蓋3〇2之底部3〇2,分離，以便進行彈 性物316的更換。 而為了針對光罩之非圖形區以及圖形區進行分段隔離洗淨， 並且由光罩内部之圖形區往光罩外圍之非圖形區進行洗淨，以避 _免污雜停留於光罩_舰之表面，轉持光罩之_區表面 的高度潔净，本實施例所提供之清洗光罩的治具3〇〇，其外盒蓋 304之底部304’更可包含有-阻隔物318，而阻隔物318乃包含 用以連接外盒蓋304之底部304，的接合部3¾)、以及一位於接 备部320之底部的阻擔部322，而其中阻擒部322乃較佳包含一 具有彈性之片狀結構。此外，阻隔物318乃較佳包含一抗腐蝕材 質，並可自外盒蓋304之底部304,分離。 在本實施例所提供之清洗光罩的治具3〇〇中，其内盒蓋3〇2 •結合彈性物316乃具有一突出於外盒蓋304結合阻隔物318之接 合部320的高度，而外盒蓋304結合阻隔物318之阻擋部322則 較佳具有一大抵等於或稍微突出於内盒蓋3〇2結合彈性物之 高度，而其中之主要考量乃於後所詳述。 本發明之又一實施例乃提供一種清洗光罩的方法，其係採用 上述實施例所提供之清洗光罩的治具300作為一阻絕盒，以達本 發明所述之目的。 第四A圖至第四G圖為根據本發明又一實施例所提供之一 π 200809432 種清洗光罩的方法之侧面剖視圖流程圖示。首先，參照第四A圖， -習知光罩4GG可簡單劃分為-圖形H 412、以及-圍繞於圖形 區412週邊之非圖开>區414，其中上述光罩4〇〇之圖形區412乃 具有用以形成積體電路圖案之圖形。為了避免光罩4⑻的圖形區 412之表面形成髒污，習知技術乃通常於光罩4〇〇之表面上設置 一框架418、以及一黏附於框架418上緣之光罩護膜42〇，並利 用一底膠416而將框架418固著於光罩400之表面上，而其中主 要作用已於先前技術中提及，故此處乃不再贅述。 為了容易卸除框架418，習知技術乃通常利用一溶劑對上 述框架418與光罩400間的底膠416事先進行軟化，然而溶劑本 “身或經軟化的殘膠可能會對光罩400上的圖形藍賴造成挵害或 污染等問題，因此，本發明之又一實施例)亦提供了一種移除光罩 農膜420的方法，以利於後續清洗光罩4〇〇的製程之進行。在此 實施例中，利用一沾布422黏附於光罩護膜42〇之表面，以將光 罩護膜420自框架418上撕除，而為了避免所使用的沾布422於 使用過程中產生塵埃，其較佳為一無塵沾布。在此實施例中，上 述沾布422係以一滾轴式沾布為例，於光罩護膜42〇表面上滾動 並進行黏附，之後再將光罩護膜420自框架418上撕除，然而本 發明並非以此為限，上述沾布422亦可片面黏附於光罩護膜42q 之表面上，而之後再將光罩護膜420自框架418上撕除。 參照弟四B圖’將上述實施例所提供之用以清洗光罩的户 具300作為一阻絕盒，以於後續清洗光罩4〇〇的過程中，針對^ 罩400的圖形區412進行隔離及保護，而其中相同的圖示標號表 示相同的構件，故此處乃不再贅述。在此實施例中，為了有效針 12 200809432 對光罩400的圖形區412進行隔離及保護，阻絕盒3〇〇之内盒蓋 3〇^需與光罩彻之表面進行緊密的貼合，因此阻絕盒3〇Π 内盒盍302的底部302,乃較佳包含一彈性物316，以避免刮傷光 罩 之表面並與光罩4〇〇之表面進行更為緊密的貼合。另， 將阻、必1 300置放於光罩4〇〇之表面後，可經由阻絕盒3〇〇之通 孔312進行抽氣，使得凹陷部空間3〇6内呈現一負壓離， 因而阻較300之内盒蓋3G2與光罩彻之表面則可更佳^地 貼合，如弟四〇圖所示，然而本發明並非受限於此，此技藝-般 人士亦可利用其他方式而外施壓力於阻絕盒3⑻及/或光罩權 上’使得阻絕盒300和光罩4〇〇緊密貼合。此外，阻絕盒之 3丨2中·用—橡皮作為阻塞，以維持凹陷部空間％ 密性。 v . : : C : 另’當利用阻絕盒3〇〇對光罩400的圖形區412進行隔離時， 内盒蓋302之底部302，的彈性物316係緊貼於光罩彻之表面， 而此時外盒蓋304之底部3〇4,雌光罩4⑻之表面維持一間隙。 為了避免後續針對未受到阻絕盒3⑻所隔離之光罩彻的部分進 打清洗時’其清洗液或污染物進入至阻絕盒3〇〇 N，因此外盒蓋 304之底部304’乃較佳具有一阻隔物318甩以彌補上述外盒蓋; 之底=04與光罩4〇〇間的間隙，而阻隔物318乃包含一用以連 接外盒蓋3G4之底部304,的接合部32()與—連接於接合部挪之 f部的阻擋部322，且其中上述之阻擋部奶係較佳為-具有彈 性之片狀結構。 ’ 參照細D圖，在此實施财，接著可進行框架的 除乂驟。為了容易將框架418自光罩4〇〇表面卸除，可利用一 13 200809432 劑對底膠416進行軟化後，再將框架418卸除。當卸除框架4i8 後，可利用一请洗液342將框架418與光罩4〇〇間所殘留的底膠 416去除，並且針對未受到阻絕盒300所隔離之光罩40〇的部分 ，行清洗。由於阻絕盒300的外盒蓋3〇4結合阻隔物318之阻擔 邓322乃具有一大抵等於或稍微突出於内盒蓋3⑽結合彈性物we 之回度，且阻隔物318之阻擋部322乃為一具有彈性之片狀結構， 因此當利用上述溶劑或清洗液處理光罩4⑽之表面時，阻隔物318 之阻擋部322可緊貼於光罩4〇〇之表面，而提供一有效阻絕的功 • 能。 在此實施例中，將光罩400置放於一洗淨工作台上，並且利 用清洗液342而針對未受到阻絕盒3〇〇所隔離之光罩400的部分 進行一沖洗式的清洗。在此實施例中，洗淨工作台主要可包含一 支紗45G作為光罩伽之支撐、—清洗頭3則於提供清1液 342以進行光罩400表面的清洗、以及一排液體通道3私用以將 清洗光罩4GG後的㈣給排n,上述洗紅作台更可包人一 •外圍部460，以避免進行光罩的洗淨時，清洗液四處飛‘的 情形。 由於上述排液體通道344係可於清洗光罩4〇〇的同時，用以 將清洗光罩400後的液體給排出，如此一來，洗淨後的污染物 可隨著清洗液而-同排出，有效避免f知技術_—浸泡為法、 淨法，其·物容易隨著清洗液來回光罩之表面，而^ :生 成光罩400的污染等問題。然而，此技藝一般人士亦可根據^ 根據其麵时量，而_ 一浸泡式之洗淨方法，或者先採用一 沖洗式洗淨，而之後再採用浸泡式之洗淨方法，本發明乃並非: 200809432 此為限。 邛分的管利用上述何種方法進行阻絕盒300外之光罩400 #刀的洗乎步驟’由於進行洗淨步驟 處乃容易形成死角，使得污染物 =阻缝300的底部和光罩400表面之接觸處所形成 朵星lott9 D ®所示，_容錄__鮮洗淨機進行 光罩的=時，將污染物帶人光罩洗淨機之中，造成機台和200809432 IX. INSTRUCTION DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method and a fixture for cleaning a reticle, and more particularly to a method and a method for effectively cleaning a reticle of a reticle pattern area . [Prior Art] In the fabrication process of integrated circuits (ICs) of a semiconductor device and a liquid crystal display device, it is often necessary to transfer a pattern on a photomask to a photosensitive material layer by exposure through a lithography process. Then, the photosensitive material layer is used as an etched or ion doped mask to form a pattern of each part of the integrated circuit on each layer of the substrate or to adjust its electrical properties. As the demand for electronic products continues to increase and the integrated circuit design becomes more sophisticated, the line size (CD) of the mask used to make the integrated circuit pattern is more and more subtle. However, when the size of the reticle of the reticle is more and more subtle, on the one hand, it means that the reticle is made more expensive, and on the other hand, it shows that the tolerance for defects such as dust or particles is reduced, so For the preservation and application of the mask, the code needs to be more careful. In view of this, the first figure shows a side cross-sectional view of a conventional photomask having a pelliele. Referring to the first figure, a general mask 1 can be simply divided into a pattern area 12 and a non-pattern area 14, wherein the pattern area 12 of the mask 1 has a pattern for forming an integrated circuit pattern, instead of The graphics area 14 then generally surrounds the perimeter of the graphics area 12 of the reticle 10. In order to avoid the transfer of dust or particles such as dust or particles on the surface of the pattern area 12 of the reticle 10 to the integrated circuit pattern in the lithography process, the production yield is reduced. 200809432 f glue 16 will be - frame 18 11 on the surface of the reticle 1G 'and the frame 18 is produced on the periphery of the light ^ 12, and - the light film _ _ _ can be hunted by a glue And adhering to the upper edge of the frame 18, in this way, the optical film 20 and the frame 18 can effectively sculpt the pattern area u of the mask 1 into the mask 1G. Therefore, when the pattern area 12' of the mask 1G is clamped, since the mask film 2g is separated from the surface of the light by the frame, the dust or the shadow on the mask film 2G is 2 or 2 The secret is out of focus, and it is impossible to form a defective integrated body on the substrate. Although the use of the photomask 20 can effectively increase the yield of the integrated circuit product, and reduce the cleaning and inspection work of the mask 1G, fine The mask film 2 is a thin sheet. Sometimes it is easy to cause damage due to inadvertent use or machine failure, etc. or sometimes for cleaning the mask 1 or for other considerations and purposes. , the old mask film 20 and the frame μ must be removed first. In the manner of removing the mask 2G and the frame 18, for example, a plurality of holes may be provided on the side of the frame Μ # inserting the insertion member into the hole to protect the fresh unloading by using a conventional mask. In the county, the above frame Μ is combined with the reticle film 20 by the principle of leverage - and then removed, and then the cleaning liquid removes the residual primer 16 between the frame 18 and the reticle 10, and the reticle 1 is removed. 〇 Carry out a comprehensive wash. However, since the above-mentioned nuclear liquid sometimes contains, for example, an acidic or an experimental rot recording solution 'and the upper gel is easily bonded to the surface of the riding zone 12 of the reticle 1G', it is liable to cause damage to the pattern area 12 of the reticle 10. Or pollution, and even the defects of the integrated circuit pattern produced by it, and the problem of poor yield. SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to provide a reticle cleaning method and a jig that can effectively protect a pattern area of a reticle. A further object of the present invention is to provide a method and a fixture for segmentally cleaning and cleaning the non-graphic area of the reticle and the image, which can be used not only to avoid damage to the pattern area of the reticle, but also to rib Maintaining the height of the surface of the reticle of the reticle. The purpose of the present invention is to provide a method and a fixture for effectively cleaning the non-graphic area from the periphery of the reticle to the non-graphic area of the reticle to avoid contaminants Stay on the surface of the mask area of the reticle. Another object of the present invention is to provide a method of removing the reticle shield from the reticle to facilitate subsequent cleaning of the reticle. In order to achieve the above and other objects, an embodiment of the present invention mainly provides a method for cleaning a photomask, comprising: providing a photomask, wherein the silk mask comprises a “graphic area” and a non-graphic area surrounding the periphery of the graphic area, a blocking box is used to isolate the pattern area of the reticle, and then the portion of the reticle that is not blocked by the blocking box is cleaned first, and then a fluid is injected into the blocking box to block the inside of the box. Block the cleaning of the mask outside the box. Another embodiment of the present invention provides a jig for cleaning a reticle, comprising: a cover, the inner cover forming a recessed space; an outer cover surrounding the inner yoke and The inner cover constitutes a passage; and a hole in the outer cover, and the hole communicates with the passage. The above and other objects, features and advantages of the present invention will become more <RTIgt; The following is a detailed description of the embodiments, in which the relevant illustrations in the text are drawn according to the actual scales, and their function is only the structural features of the moon. In addition, the present invention is not limited to the embodiments described herein, and the scope of the present invention is not limited to the implementation of the invention, which is based on the scope of the patent application. Because the conventional technology is to clean the reticle by means of comprehensive cleaning == er - · This is the case of the county 而 而 = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = It is said that the money is easy to cause the mask to be miscellaneous (four), or it is easy to cause the dye to have a chance to remain on the surface of the mask area to cause defects. There is a problem in the above-mentioned driving cleaning reticle technology, and the object 1 of the present invention is to provide a mask cleaning method and a treatment thereof which can effectively protect the fresh _ area, which is aimed at fresh _ The zone and the _ zone are cleaned in stages and can be cleaned by the inside of the reticle to the non-graphic area outside the reticle to prevent damage to the ϋ-shaped area of the reticle and to prevent the pollutant from staying in the light. The mask area of the mask is 'surface' and maintains a high degree of cleanness of the surface of the Fresh®. A first diagram is a flow diagram of a cleaning reticle in accordance with an embodiment of the present invention. Referring to the step j 'Step S2G1, the photomask is provided, and the image area and the non-graphic area are included in the periphery of the upper part of the job, and the S2G3 is blocked by the blocking box to isolate the pattern area of the above two hearts, and in steps In S205, the cleaning of the reticle portion of the reticle is carried out first, and the drunking step is said to be a fluid in the blocking box to clear the reticle from the inside of the blocking box to prevent the completion of the above-mentioned implementation. For example, another embodiment of the present invention provides a jig for cleaning a reticle, that is, a damper box for isolating a pattern area of the reticle. Fig. 3 is a side cross-sectional schematic view showing a jig for cleaning a reticle according to another embodiment of the present invention. Referring to the third figure, a fixture 300 for cleaning a reticle according to another embodiment of the present invention includes an inner cover 302 and an outer cover 3〇4, wherein the inner cover 3〇2 constitutes a recessed space. 306 is used to isolate the pattern area of a reticle, and the outer cover 3 〇 4 surrounds the inner cover 302 and forms a channel 3 〇 8 with the inner cover 302. In addition, the outer cover 304 0 has a hole 310 communicating with the passage 308. Although in this embodiment, the inner cover 302 and the outer cover 304 are in a font, the present invention is not limited thereto, and the inner cover 302 may be used according to different considerations. The outer cover 304 is designed to be curved, inverted v-shaped, or other geometric steps. The jig for cleaning the reticle provided in this embodiment may further include: the through hole 312 is in communication with the recessed portion «3G6, and the shutter 314 is located in the recessed space 306 formed by the inner cover moving, and its main function It is detailed later. In order to effectively clean the reticle, a pattern for the reticle is made effective for the mask of the reticle. Therefore, in order to cover the bottom 3G2 of the reticle cassette 3G2 to the surface of the blister, the bottom portion 302 of the 200809432 of the inner cover 302 may further comprise or be covered with an elastic 316, such as a rubber. Further, the above-mentioned elastic material 316 is preferably a shovel-resistant hoof f to avoid unnecessary contamination of the elastic material 316 due to the detergent. Further, the above elastic member 316 is preferably separated from the bottom 3〇2 of the inner lid 3〇2 for the replacement of the elastic material 316. In order to clean the non-graphic area and the graphic area of the reticle, the image area inside the reticle is cleaned to the non-graphic area outside the reticle to avoid _ smudges staying in the reticle _ On the surface of the ship, the height of the surface of the reticle is clean, and the fixture for cleaning the reticle provided in this embodiment is 3, and the bottom 304' of the outer cover 304 may further include a barrier 318. The barrier 318 includes a receiving portion 326 for connecting the bottom portion 304 of the outer cover 304, and a blocking portion 322 at the bottom of the receiving portion 320, wherein the blocking portion 322 preferably includes a It has a flexible sheet structure. Additionally, the barrier 318 preferably includes a corrosion resistant material and is separable from the bottom 304 of the outer cover 304. In the jig 3 of the cleaning reticle provided in the embodiment, the inner cover 3 〇 2 • the combined elastic 316 has a height protruding from the joint 320 of the outer cover 304 and the barrier 318. The barrier portion 322 of the outer cover 304 in combination with the barrier 318 preferably has a height equal to or slightly protruding from the height of the inner cover 3〇2 in combination with the elastic, and the main considerations thereof are described in detail later. Still another embodiment of the present invention provides a method of cleaning a reticle using the jig 300 for cleaning a reticle provided by the above embodiment as a blocking case for the purpose of the present invention. 4A through 4G are side cross-sectional views showing a method of cleaning a reticle according to still another embodiment of the present invention. First, referring to FIG. 4A, the conventional mask 4GG can be simply divided into a pattern H 412, and a non-image area 414 surrounding the periphery of the pattern area 412, wherein the mask area 412 of the mask 4 is There is a pattern for forming an integrated circuit pattern. In order to prevent the surface of the pattern area 412 of the mask 4 (8) from being dirty, a conventional technique is generally provided with a frame 418 on the surface of the mask 4 and a mask film 42 adhered to the upper edge of the frame 418. The frame 418 is fixed to the surface of the reticle 400 by a primer 416, and the main function thereof has been mentioned in the prior art, and therefore will not be described herein. In order to easily remove the frame 418, the prior art generally uses a solvent to soften the primer 416 between the frame 418 and the reticle 400 in advance, but the solvent or the softened residue may be on the reticle 400. The graphic blue ray causes problems such as damage or pollution. Therefore, another embodiment of the present invention also provides a method for removing the reticle agricultural film 420 to facilitate the subsequent process of cleaning the reticle 4 . In this embodiment, a dip cloth 422 is adhered to the surface of the photomask 42 to remove the mask film 420 from the frame 418, and in order to avoid the use of the dip 422 during use. The dust is preferably a dust-free cloth. In this embodiment, the cloth 422 is rolled and adhered to the surface of the mask 42 by a roller type coating, and then The mask film 420 is peeled off from the frame 418. However, the present invention is not limited thereto. The cloth 422 may also be adhered to the surface of the mask film 42q, and then the mask film 420 is self-framed. Peel off at 418. Refer to the fourth embodiment of Figure B to provide the above embodiments. The household appliance 300 for cleaning the reticle serves as a blocking box for isolating and protecting the graphic area 412 of the mask 400 during the subsequent cleaning of the reticle 4, wherein the same reference numerals indicate the same The components are not described here. In this embodiment, in order to isolate and protect the pattern area 412 of the mask 400 for the effective needle 12 200809432, the inner lid of the box 3 is blocked and the mask is required. The surface is tightly bonded so as to block the bottom 302 of the cassette 302, preferably including an elastic 316, to avoid scratching the surface of the mask and making it more visible on the surface of the mask 4 For the close fitting, after placing the barrier 1 300 on the surface of the photomask 4, the air can be evacuated through the through hole 312 of the blocking box 3, so that the recessed space 3〇6 is presented. A negative pressure, so that the inner cover of the cover 3G2 and the mask of the 300 can be better fit, as shown in the fourth figure, but the invention is not limited thereto, and the technique is generally Persons can also use other methods to apply pressure to block box 3 (8) and/or reticle right 300 and the reticle 4 〇〇 are closely attached. In addition, the 3 丨 2 of the blocking box is blocked by the rubber to maintain the tightness of the recessed space. v . : : C : Another 'When using the blocking box 3 〇〇 When the pattern area 412 of the reticle 400 is isolated, the elastic 316 of the bottom 302 of the inner cover 302 is closely attached to the surface of the reticle, and at the time the bottom of the outer cover 304 is 3 〇 4, the female hood The surface of 4(8) maintains a gap. In order to avoid subsequent cleaning of the portion of the photomask that is not isolated by the blocking box 3 (8), the cleaning liquid or contaminant enters the blocking box 3〇〇N, so the outer cover 304 The bottom portion 304' preferably has a barrier 318 甩 to compensate for the outer cover; the bottom =04 and the reticle 4 ,, and the barrier 318 includes a bottom 304 for connecting the outer cover 3G4. The joint portion 32 () and the blocking portion 322 connected to the f portion of the joint portion, and wherein the above-mentioned barrier portion milk system is preferably - has an elastic sheet-like structure. Referring to the detailed D picture, the money is implemented here, and then the frame removal step can be performed. In order to easily remove the frame 418 from the surface of the mask 4, the primer 416 can be softened with a 13 200809432 agent, and the frame 418 can be removed. After the frame 4i8 is removed, the primer 416 remaining between the frame 418 and the mask 4 can be removed by a cleaning solution 342, and the portion of the mask 40 that is not blocked by the blocking box 300 is removed. Cleaning. Since the outer cover 3 〇 4 of the blocking box 300 is combined with the barrier 318, the dam 322 has a large offset equal to or slightly protruding from the inner cover 3 (10) in combination with the elastic we, and the blocking portion 322 of the barrier 318 is It is an elastic sheet-like structure, so when the surface of the reticle 4 (10) is treated with the above solvent or cleaning solution, the blocking portion 322 of the barrier 318 can be in close contact with the surface of the reticle 4 to provide an effective resistance. Features. In this embodiment, the reticle 400 is placed on a cleaning station, and the cleaning liquid 342 is used to perform a flush cleaning of the portion of the reticle 400 that is not isolated by the blocking box 3''. In this embodiment, the cleaning workbench may mainly comprise a yarn 45G as a support for the mask, the cleaning head 3 provides the clear liquid 342 for cleaning the surface of the mask 400, and a row of liquid passages 3. Privately used to clean the mask 4GG (4) to the row n, the above-mentioned redwashing table can also include a peripheral portion 460 to avoid the situation where the cleaning liquid flies around when the mask is cleaned. The liquid discharge channel 344 can be used to discharge the liquid after cleaning the mask 400 while cleaning the mask 4, so that the washed contaminants can be discharged along with the cleaning liquid. Effectively avoiding the knowledge of the technology _-soaking method, the net method, the material is easy to go back and forth with the cleaning liquid to the surface of the reticle, and ^: the problem of contamination of the reticle 400 is generated. However, the person skilled in the art may also use the immersion cleaning method according to the amount of time, or the rinsing method, and then the immersion cleaning method, the present invention is not : 200809432 This is a limit. Which method is used to perform the reticle 400 outside the box 300? The washing step of the knife is easy to form a dead angle due to the cleaning step, so that the contaminant = the bottom of the slit 300 and the surface of the reticle 400 The contact area formed by the star lott9 D ®, _ 容 __ fresh washing machine for the mask = when the pollutants are brought into the reticle cleaning machine, causing the machine and
白本弟四E圖’隨著清洗過程的進行，為避免當阻絕盒 先罩〇表面移開後’累積於阻絕盒3⑻的底部和光罩彻表 面之翻處死角的污染物330與走罩40〇的断區412接觸而造 成污染，因此在此實施例中’可將—流體36〇經由阻絕盒㈣之 孔洞310而注入至通道3〇8中，而由於阻隔物318之底^的阻擒 部322係為一具有彈性之片狀結構，因此流體36〇可推擠阻擔^ 322，而經由間隙流出於阻絕盒3⑻之外盒蓋3〇4外，由阻絕盒 内往阻絕盒300外進行光罩400的清洗，同時亦一併:於 絕盒300的底部和光罩400表面之接觸處死角的污染物帶^。'在 此實施例中，上述流體係可包含液體或氣體，而上述阻擋部322 可例如包含一薄片型或上寬下窄等幾何圖形之彈性橡膠=然此技 藝一般人士亦可根據實際需求及不同考量，而採用其他材質或幾 何形狀，本發明乃並非以此為限。 參照第四F圖，接著在此實施例中，可經由阻絕盒3〇〇之 通孔312而將一清洗流體370注入至凹陷部空間中，以對光 罩400的圖形區412進行清洗，而為了避免清洗流體37〇直接對 15 200809432 光罩400的圖形區412造成衝擊，因此可利用一位於凹陷部空間 306内的遮板314,將清洗流體370引入旁侧，以降低清洗流體370 直接對光罩400的圖形區412之表面衝擊的力道。另，上述清洗 流體370係可包含液體或氣體，而在此實施例中，當清洗流體37〇 注入至阻絕盒300之凹陷部空間306時，其之前的負壓或真空狀 態亦逐漸解除，使得阻絕盒300與光罩400分離。而當阻絕盒300 與光罩400分離的同時，清洗流體37〇乃由光罩4⑻内的圖形區 412在光罩400外圍的非圖形區414流溢，如此一來，亦可將污 _ 染物往外沖離’而再次避免污染物對光罩400的圖形區412造成 缺陷之影響。接著將阻絕盒300與光罩400分離，如第四G圖所 示，而之後可利用一光罩洗淨機針對光罩4〇〇做一全面式的洗淨。 、 . . -^ , * '一 _ 、’二由本發明上述所提供之清洗光罩的方法及治具，其係可 有效防jjl對光罩之圖形區造成損害，並避免污染物停留於光罩的 圖形區之表面，轉持林之®形區高度潔淨。 〜雖然本發明已以數個較佳實施例揭露如上，然其並非用以 ⑩限發明’任何熟習此技藝者，在未脫離本發明所揭示之精神 下所完成之等效㈣或修飾，例如將光罩護膜與框架_同或分開 *或者於阻絕盒及光罩進行緊密貼合的步驟前或後進行框架 的去除，均應包含在下述之申請專利範圍内。、 200809432 【圖式簡單說明】 第一圖係顯示一習知具有光罩護膜的光罩之側面剖視圖。 第二圖為根據本發明一實施例之清洗光罩的流程圖。 實施例之清洗光罩的治具之側面剖 第三圖為顯示本發明另_ 視概略圖。白本弟四E图' With the progress of the cleaning process, in order to avoid the blockage of the front cover 〇 surface after the block is removed, the accumulation of the contaminant 330 on the bottom of the block 3 (8) and the blunt surface of the reticle The broken zone 412 is in contact to cause contamination, so in this embodiment, the fluid 36 can be injected into the channel 3〇8 through the hole 310 of the blocking box (4), and the blocking portion 322 due to the bottom of the barrier 318. The structure is a flexible sheet-like structure, so that the fluid 36 推 can push the resist 322 and flow out of the box cover 3〇4 outside the blocking box 3 (8) via the gap, and the light is blocked from the inside of the blocking box 300. The cleaning of the cover 400 is also performed: a contaminant strip at a dead angle at the bottom of the blank 300 and the surface of the reticle 400. In this embodiment, the flow system may include a liquid or a gas, and the blocking portion 322 may include, for example, a sheet of rubber or an elastic rubber having a geometric shape such as an upper width and a lower width. The present invention is not limited thereto, with different considerations and other materials or geometric shapes. Referring to the fourth F diagram, then in this embodiment, a cleaning fluid 370 can be injected into the recessed space via the through hole 312 of the blocking box 3 to clean the pattern area 412 of the mask 400. In order to prevent the cleaning fluid 37 from directly impacting the pattern area 412 of the 15 200809432 reticle 400, a cleaning plate 314 can be introduced into the side by a shutter 314 located in the recessed space 306 to reduce the cleaning fluid 370 directly. The force of the surface impact of the pattern area 412 of the reticle 400. In addition, the cleaning fluid 370 may include a liquid or a gas, and in this embodiment, when the cleaning fluid 37 is injected into the recessed space 306 of the blocking box 300, the previous negative pressure or vacuum state is gradually released, so that The blocking box 300 is separated from the mask 400. When the blocking box 300 is separated from the mask 400, the cleaning fluid 37 is overflowed by the pattern area 412 in the mask 4 (8) in the non-pattern area 414 on the periphery of the mask 400, so that the stain can be discharged outside. The rush away from 'and again avoids the effect of contaminants on the pattern area 412 of the reticle 400. The barrier box 300 is then separated from the reticle 400, as shown in Figure 4G, and then a reticle cleaner can be used to perform a comprehensive cleaning of the reticle. , . . . , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The surface of the graphic area of the cover is highly cleaned by the forested area of the forest. The present invention has been described above in terms of several preferred embodiments, and is not intended to be limited to the invention, and equivalents (s) or modifications may be made without departing from the spirit of the invention. The removal of the reticle film from the frame _ or the same or the removal of the frame before or after the step of adhering the tamper and the reticle is included in the following patent application. , 200809432 [Simple description of the drawings] The first figure shows a side cross-sectional view of a conventional photomask having a mask film. The second figure is a flow chart of a cleaning reticle in accordance with an embodiment of the present invention. Side section of the jig for cleaning the reticle of the embodiment The third drawing is a schematic view showing the present invention.
種清洗所提供之一 【主要元件符號說明】 10〜光罩； 12〜光罩之圖形區； 14〜光罩之非圖形區； 16〜底膠； 18〜框架； 20〜光罩護膜； 300〜清洗光罩的治具、阻絕盒 302〜内盒蓋； 302’〜内盒蓋之底部； 304〜外盒蓋； 304’〜外盒蓋之底部； 306〜凹陷部空間； 17 200809432 308〜通道； 310〜孔洞； 312〜通孔； 314〜遮板； 316〜彈性物； 318〜阻隔物； 3 20〜接合部； 322〜阻擋部； 330〜污染物； 340〜清洗頭‘； 342〜清洗液； 344〜排液體通道； 360〜流體； 370〜清洗流體； 400〜光罩； ί 412〜光罩之圖形區； 414〜光罩之非圖形區； 416〜底膠； 418〜框架； 420〜光罩護膜; 200809432 422〜沾布； 450〜支托架； 460〜外圍部； 述圖光罩，其包含—圖賴與—_職環繞於上 S203〜利用一阻絕盒對上述光罩的圖形區進;f亍隔離；One kind of cleaning provided [main component symbol description] 10~ reticle; 12~ reticle pattern area; 14~ reticle non-graphic area; 16~ primer; 18~ frame; 20~ reticle protective film; 300~ cleaning reticle fixture, blocking box 302~ inner lid; 302'~ bottom of inner lid; 304~ outer lid; 304'~ bottom of outer lid; 306~ recessed space; 17 200809432 308 ~ channel; 310~ hole; 312~ through hole; 314~ visor; 316~elastic; 318~barrier; 3 20~ joint; 322~block; 330~contaminant; 340~cleaning head'; ~ cleaning solution; 344 ~ discharge liquid channel; 360 ~ fluid; 370 ~ cleaning fluid; 400 ~ reticle; ί 412 ~ reticle graphic area; 414 ~ reticle non-graphic area; 416 ~ primer; 418 ~ frame 420~ reticle film; 200809432 422~ smear; 450~ bracket; 460~ peripheral; reticle, including - 赖 _ _ _ around the upper S203 ~ using a blocking box to the above The graphic area of the reticle is inserted;
S205〜清洗上述光罩未受到阻絕盒隔離的部分； 盒外至上雜_，时_妙往阻絕S205~ cleaning the portion of the photomask that is not blocked by the blocking box;