TW200800774A

TW200800774A - Substrate buffer device, method of buffering substrate, substrate processing apparatus and computer readable storage medium

Info

Publication number: TW200800774A
Application number: TW096105543A
Authority: TW
Inventors: Hironobu Kajiwara; Mitsuhiro Sakai; Akira Kakino
Original assignee: Tokyo Electron Ltd
Priority date: 2006-03-14
Filing date: 2007-02-14
Publication date: 2008-01-01
Also published as: CN100541711C; CN101038858A; JP2007250671A; KR20070093845A; KR101268261B1; JP4884039B2; TWI334846B

Abstract

Substrate buffer device 36 can advance to transportation line A. It has a shelf 5 which has putting stand 5a-5f that can put substrate G to which transportation line A is transported at the top and bottom by two or more steps and going up and down mechanism 6 which makes the shelf 5 gone up and down and makes either of the putting stand 5a-5f advance to the transportation line A. Each putting stand 5a-5f has conveyer mechanism 50a-50f that transports the substrate G along the direction of transportation. When each putting stand 5a-5f advances to the transportation line A, each putting stand 5a-5f functions partially of the transportation line A and it puts the substrate G to which transportation line A has been transported by the putting stand 5a that advances to the transportation line A and it goes up and down the shelf 5 with the going up and down mechanism 6 and saves the substrate G of the putting stand 5a from transportation line A.

Description

200800774 九、發明說明：【發明所屬之技術領域】顯示明係關於：用以使由輸送線單方向輸送，用印（FPD)之玻璃基板等之基板暫時自輪送線迴避之，用記憶媒體 "Si™ 检说J★此之基板衝方法而存在之控制程式及電腦可讀取之【先前技術】、之製造中’為於FPD狀玻雜板上形錢路圖宰，-=广光蝕刻技術。以光蝕刻進行之電路圖案之形成，係捃 =^彳=於_基板上塗布抗侧液以形成抗糊膜，^其米i雷跋=而進^鋪狀曝光’而後再進行顯影處理。為 Ι，使祕進行抗_彳液之塗布或顯影處理等處理i200800774 IX. Description of the Invention: [Technical Fields of the Invention] The display system is for the purpose of transporting the substrate in a single direction, and the substrate such as a glass substrate (FPD) is temporarily evaded from the transfer line by the memory medium. ;SiTM test J ★ this substrate punching method exists in the control program and computer readable [prior art], in the manufacture of 'for FPD-shaped glass miscellaneous board shaped money road map, -= Guangguang Etching technology. The formation of the circuit pattern by photolithography is performed by coating the anti-side liquid on the substrate to form an anti-paste film, and then performing a development process. For the purpose of Ι, the secret treatment of anti- 彳 liquid coating or development treatment i

輸送線設置之生產線。玻璃反由輸送線輸送，並面由各處理單元施以既定之處理。询、JL 有使者J生f線’通常在處理單元發生故障時’由於 π ί兀停解除故障之必要，而設置有於此處理單元 i呆游舰纽狀綱基板自魏線暫時迴避元賊置，—般所知，储有：緩衝鍾（或緩衝單 = 可;^數多段之方式收納玻璃基板；及專利輪璃基板，送入緩衝框體内（參照例如 ,之3 )。此、w練置，因輸送臂之昇降而可存取於緩衝框 ^域if，度之位置’藉此方式可將收納於緩衝框體内之複數之玻撼板以·待之順序再送出至輸送線而構成。上,=年來FPD向大型化發展’以至於其一邊長達2m以置ί2 基板出現於世’由於伴隨著玻璃基板之大型化，處心化’崎送臂進行輸送之上述之習知之缓衝裝置，考慮到 200800774 安全面已不適於大型玻璃基板之處理。並且，由於此缓衝裝置，如以扇子掮動一般，以輸送臂使玻璃基板昇降，玻璃基板二旦大型化，即易於使微粒揚起，亦有揚起之微粒附著於玻璃基板表面之虞。並且厂，言，—旦制導作如進行複雜動作之輸 it可歧我數增加，亦有結果使生產線全體之生產進度平衡朋解，生產率低下之可能性。又卞 [專利文獻1]特開2003-168713號公報 [專利文獻2]特開2004-304003號公報【發明内容】 f目關之事由，以提供下列者為目的·· 並可圖生iiU者、全性亦優異，且可避免微粒之飛散，之數之基板以所期待 =如狀额.；；=ϊ=ίί=ϊ‘=方法；憶媒體。進订々此之基板緩衝方法之控制程式及電腦可讀取之記手段輸送線迴避⑻以使朝具備有：送線者進逆線使，部昇降，而令“數之载置台中之任一用之輪送帶機構，沿輪送方向輸it基板作為_讀之—縣，峡基板自該輸 6 200800774 ΐί C送線輸送來之基板_於該複數载置台於錄態藉由該昇降機構使該、，牛7以基板與其載置台一背自該輸送線迴避。南於本發明提供—絲紐賊£，肋使输送線單方向輸L之基板暫時自輸送線迴避，其特徵在於：、、、. 具備有： ' 設置射料，具有上下複數段且可載置_輸送線所輪送之基板4魏鲁者進線部昇降’而令該;數之載置台中之任一降；^機構，用以控制由該昇降機構所施行之該棚架部之昇該各載置台具有於進出該輸送線之際用^輸送帶機構，可用作為該輸送線之」部&輸於达線迴避之際’將由該輸送線輸送來之基中之進出於該輸送線的該載置台，於此複數載置台棚架:卩料，料綠鮮餘卜機構使該在進出於该輸送線之載置台上載置有基機，控制以在載置台與由該輸送線輸送來之下_基=之’=空，距離時，藉由該昇降機構使該棚架部昇降。土 4成既疋本發明中，宜具有偵測部，設於自進出輪送方向上游侧既定距離之位置，用叫貞測之載^台朝板’該控制機構，根據該偵测部之偵測，卢二=所輸送之基進行之該棚架部之昇降。 1貝^虎’控制由該昇降機構 =時難制機構，宜控制由該昇降機構進行 ί避之基板再錢岭輸躲後之開:===口進=棚架部之昇降幵牛口朿，由該輸送線輸送來之 7 200800774 基板被载置於進出該輪 — 再次昇降，載置於進出該於，猎由該昇降機構該棚架部帶機構送出之時點為止之另載置台之基板由該輸送 time)為短。、0〜又疋成較該輸送線之作業時間(tact 此宜更包含：靖接於進該輪ίί之ίί輪送速^為快乂基==側而設置’具有較由相同之驅動源驅動，且载置口之該輪送帶機構，宜係源連接而構成。^载口進出該輸送線之際係與該驅動再者，以上之本發明中，子輸送方式及帶輪送方式中之置台之該輪送帶機構宜為滾再者，以上之本發明中， ° 該輸送線而作為該輪送線之—二。台，宜於平時進出輸送帶機構宜為滾子輸送方式，“ 上段之載置台之該送帶機構宜為帶輸送方式。^取上&以外之各載置台之該輸並且，本發明提供一種其該基板緩衝裝置具備有·· 土扳戍衝方法，使用一基板緩衝裝置，棚架部’設置成可昇降，輪送基板之輸送線且可載置“ 數段之可進出於單方向及戰置_輪送線所輸送之基板的載置台； —者送吏該棚架部昇降，令該複數之載置台中之任之輪送帶:。^ f輸送方向輸送基板線迴避，其特徵為： “輪达線輸送之基板暫時自輪送使由該輸送線輸送來之基板载置於該複數之載置台中之進出 200800774 置纟’於絲1111由該昇降麟使該棚架部昇 4昇《=與其載置台—齊自該輸送線迴避，基板迴避時之由 ΐϊ3?ί行f該棚架部之昇降，係於基板被載置於進出該輸再者，本發明提供一種基板處理裝置，包含：輸送線，單方向輸送基板； $理部’對該輸送線所輸送之基板施以既定之處理；及 #丨夕=彳ί衣置’ δχ置於杈销理部靠近該輸送線之輸送方向上游側之位置，於該處理部發生故障之際，使該耠详蜱所鈐、、暫時自輸送線迴避； ^τ、t纖讀所輸达之基板其特徵在於：該緩衝裝置，具備有：棚架部’係設置成可昇降，具有上線且可載輸猶所輸送之基板之載p . 進以輸达者進線t棚架部昇降’以令該複數之載置台中之任- ，制機構，藉由該昇降機構控繼棚架部之昇降；且々认°亥各載置台具有於進出該輸送線之際，沿輪送方向耠逆其杯之輪送帶機構，可⑽_輸送線之-部分；⑽达基板處ΐ部發生故障之際，使該輸送線所輸送來之基板載置於 Ϊ:以中送線者’於此狀態藉由該昇降機構制降，令其基板與其載置台—齊自該輸送線迴避； “控制機構，於基板被載置於進出該輸么 :之;所輸送來糾雕之^，控制以猎由该昇降機構使該棚架部昇降。再者，本發明提供-種控制程式，其特徵在於：俾施ϊΐίϋί ^執㈣㈣减時，使電驗爾理裝置， 200800774 腦上動作之讀取之記憶媒體，記憶有於電 *缓衝=行該控制程式時，使電腦控做理裝置，俾施行該基板之= .意之=台板===而構成，因此可以隨所期待之順序再次進出輸送線。曰方式可使迴避之複數之基板以【實施方式】以下夢照關具體説明關於本伽之實施形能。 i=s.=:r测膜之顯影處理‘劑 =劑塗布顯影處理裝置（基板處理裝置）⑽備有：匣益站1，載置有收納複數之基板G之匣盒c; 處理處^站2，對基板G施以包含絲劑塗布及顯影之—連串之基板^m’·於對基板G施以曝光處理之曝光裝置9之間進行 10 200800774 中，L盒二ίί，4分別配置於處理站2之兩側。又，圖1 ί 顯影處理系、统100之縱長方向為χ方向，以於十面上人X方向直交之方向為Υ方向。匣盒站1備有：， ^置台12 ’沿γ方向並列，可載置匿盒。；及 ίίί ί 'V與處理站2之間進行基板G之送出送入； n / 與外部之間進行匣盒c之輪送。設於輪送桊置下沿向γ方向延伸之引導件1〇移動，並且可上板G i送水平旋轉，於匡盒c與處理站2之間進行基平行介面站4之間向χ方向延伸之 1側=:子送==職平移動輸送自_ 4側鄉胃水平嶋送自介面站準分身^ f f盒站1侧向介面站4侧，依序排列有：熱單元（Ptn、23、= e:UV) 21、揉擦洗淨單元（SCR) 22、預衝單元（BUF)K、f附皁兀（AD) 24、冷卻單元（C0L) 25、缓 37。（HU28冷郃早兀（C〇L)29、緩衝單元（BUF) 顯少二輸，線B上’自介面站4侧向E盒站1側，依序拼列右. ί 單元⑽）3丨、冷辨^^ 1之η <亡仏太）38。又’於冷卻單元（COL) 32 *匣各站板GklG ^^含_财及顯影之,i理ΐ基物之ί ::】V 進行基板G所包灿揉擦洗甲早兀（SCR) 22進行基板〇之揉擦洗淨 200800774 ，及I，，處理。預熱早元(PH) 23進行基板G之加熱處理，黏 2&兀L ) 24進订基板G之疏水化處理，冷卻單元（COL) ㈣基板G。抗蝕劑塗布單元（CT) 2 峨單⑽p) 27於‘下 ί ΐ含=?成綠魏触舰錢。加熱處理單 J ϋ 了基加熱處理，冷卻單元（CQI〇 29與冷口P早兀（COL) 25相同冷卻基板G。板G顯逐次進行基板G上之顯影液之塗布、基盥示洗。處基板之乾燥處理。加熱處理單元（HT) 31The production line for the conveyor line setting. The glass is conveyed by the conveying line and is subjected to a predetermined treatment by each processing unit. Inquiries, JL has a messenger J raw f line 'usually in the event of a failure of the processing unit' due to π 兀兀解除解除解除解除解除解除解除解除解除解除解除解除解除于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此于此It is known that there is a buffer clock (or buffer sheet = can be; a plurality of sections to accommodate the glass substrate; and a patented glass substrate, which is fed into the buffer frame (see, for example, 3). w practice, due to the lifting and lowering of the transport arm, the buffer frame can be accessed, and the position of the degree can be 'received' by the plurality of glass plates stored in the buffer frame in the order of In the past, the FPD has grown to a large size, so that one side of the FPD is 2m long, and the substrate appears in the world. With the increase in the size of the glass substrate, the above-mentioned "salt arm" is transported. The buffer device of the prior art considers that the safety surface of 200800774 is not suitable for the processing of large glass substrates. Moreover, due to the buffer device, the glass substrate is lifted and lowered by the transport arm, and the glass substrate is enlarged, That is, it is easy to raise the particles, There are also raised particles attached to the surface of the glass substrate. And the factory, say, the guidance for the operation of complex operations can increase the number of discrepancies, but also results in a balance of the production line of the entire production line, productivity 。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。 It can be used to produce iiU, and it is excellent in all-roundness, and can avoid the scattering of particles. The number of substrates is expected to be = such as the amount of;;; =============================================================== The control program of the substrate buffering method and the computer readable means transport line avoidance (8) are provided so that: the feeder is brought into the reverse line, and the part is lifted and lowered, and the "number of mounts are used for any of the wheels. With the mechanism, the input substrate is transported in the direction of the wheel as the _reading-county, the gorge substrate is transported from the transmission line of the 200800774 ΐί C. The plurality of mounting platforms are in the recording state by the lifting mechanism, Cow 7 avoids the substrate and its mounting table from the conveyor line According to the invention, the wire mesh thief is provided, and the rib is used to avoid the substrate of the conveying line unidirectionally from the conveying line temporarily, and the characteristics thereof are as follows: ', set, and have: ' set the shooting material, which has upper and lower multiple segments and can be loaded The substrate 4 is transferred by the Weiluer in the line of the transfer line, and the lower part of the number is placed; the mechanism is used to control the scaffolding portion of the lifting mechanism. Each of the mounting stages has a conveyor belt mechanism for entering and leaving the conveyor line, and can be used as a part of the conveyor line when the transmission line is escaping. The mounting table of the conveying line, the plurality of mounting table scaffoldings: the material, the greening mechanism, the base unit is placed on the mounting table for the conveying line, and the base is controlled to be transported on the mounting table. When the line is transported, the base unit is lifted by the lifting mechanism. In the present invention, it is preferable to have a detecting portion disposed at a predetermined distance from the upstream side in the direction of the inbound and outbound direction, and the control unit is called the control unit according to the detection unit. Detection, Lu II = the lifting of the scaffolding section carried out by the base. 1 ^ ^虎' control by the lifting mechanism = time difficult to make the mechanism, should be controlled by the lifting mechanism to avoid the substrate re-Qian Ling lost after the opening: === mouth into the shed section of the lifting yak mouth朿, 7 delivered by the conveyor line 200800774 The substrate is placed in and out of the wheel - lifted again and again, placed in and out of the station, and the other station placed at the time when the scaffolding mechanism is sent by the lifting mechanism The substrate is short by the transport time). 0, and then become the operating time of the conveyor line (tact should include: Jing connected to the wheel ίίίίί 轮 speed ^ for the fast 乂 base == side and set 'has the same drive source The driving belt and the belt feeding mechanism of the loading port are preferably connected by a source. When the loading port enters and exits the conveying line, the driving and the driving are further. In the above invention, the sub conveying method and the belt conveying method are In the above invention, the conveying line is used as the two-way line of the wheel-feeding line, and it is preferable that the feeding mechanism should be a roller conveying mode. , "The feeding mechanism of the loading table of the upper stage is preferably a belt conveying method. ^ The upper and the other loading stations are mounted, and the present invention provides a substrate buffering device having the method of ... Using a substrate buffering device, the scaffolding portion is arranged to be movable up and down, and the conveying line of the substrate is transported and a plurality of stages of the substrate that can be transported into the single direction and the warfare _rounding line can be placed; - the person is sent to the scaffolding department to lift and lower, so that the plurality of mounting platforms Any of the wheel belts: .m f conveying direction conveying substrate line avoidance, characterized in that: "the substrate conveyed by the traverse line is temporarily transferred from the wheel, so that the substrate conveyed by the conveying line is placed in the plurality of mounting stages. In and out of 200800774 纟于 '于丝1111 by the lifting lining to make the scaffolding part rise 4 liters "= with its mounting platform - escaping from the conveyor line, the substrate is evaded by the ? 3? The present invention provides a substrate processing apparatus comprising: a transport line for transporting the substrate in one direction; and a management unit for applying a predetermined process to the substrate transported by the transport line; #丨夕=彳ί衣置' δχ is placed at the position on the upstream side of the conveying line in the conveying direction of the conveying line, and when the processing unit fails, the 耠耠、、、、、、、、、、 The substrate that is conveyed by ^τ and t fiber reading is characterized in that: the buffer device is provided with: the scaffolding portion is configured to be movable up and down, and has an upper line and can carry a substrate loaded by the substrate. Take the intruder into the t-shelf section to lift the 'to make the complex In the mounting platform, the mechanism is controlled by the lifting mechanism to control the lifting and lowering of the scaffolding portion; and the mounting stations of the hoisting chamber have the purpose of reversing the cup in the direction of the wheel when entering and leaving the conveying line. The belt mechanism can be (10)_the part of the conveyor line; (10) when the head of the substrate fails, the substrate conveyed by the conveyor line is placed on the Ϊ: the center feeder is in this state by The lifting mechanism is lowered, so that the substrate and the mounting table thereof are avoided from the conveying line; "the control mechanism is placed on the substrate in and out of the input: the conveying is to be entangled, and the control is performed by the hunting The lifting mechanism lifts the scaffolding portion. Further, the present invention provides a control program, which is characterized in that: 俾 ϊΐ ϋ ϋ ϋ ( 四四四四四四四四四四四四 , , 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 The memory is stored in the electricity buffer. When the control program is executed, the computer control device is configured to execute the substrate = meaning = platen ===, so that it can be re-in and out in the expected order. line. The 曰 method can be used to circumvent the plurality of substrates. [Embodiment] The following Visions will specifically describe the performance of the gamma. i=s.=:r development film processing of the film>agent=agent coating and developing device (substrate processing device) (10) is provided with: 匣益站1, which is placed with a cassette C for accommodating a plurality of substrates G; Station 2, the substrate G is coated with a linear coating and developed - a series of substrates ^m'· is performed between the exposure devices 9 that expose the substrate G to the exposure device 9 200800774, L box two ίί, 4 respectively It is arranged on both sides of the processing station 2. Moreover, the longitudinal direction of the development processing system 100 is the χ direction, and the direction orthogonal to the X direction of the ten faces is the Υ direction. The box station 1 is equipped with:, ^The table 12' is juxtaposed in the γ direction, and the box can be placed. ; and ίίίί 'V and the processing station 2 to send and receive the substrate G; n / between the outside and the outside of the box c. The guide member 1 延伸 extending in the γ direction is disposed under the wheel arranging device, and the upper plate G i is horizontally rotated, and the base parallel interface station 4 is oriented between the c box c and the processing station 2 1 side of extension =: child delivery == job level mobile transmission from _ 4 side township level 嶋 sent from the interface station quasi-body ^ ff box station 1 side interface station 4 side, in order: hot unit (Ptn, 23, = e: UV) 21, scrub cleaning unit (SCR) 22, pre-flushing unit (BUF) K, f saponin (AD) 24, cooling unit (C0L) 25, slow 37. (HU28 cold heading early (C〇L) 29, buffer unit (BUF) significantly less two, line B on the 'self-interface station 4 side to the E box station 1 side, in the order of the right. ί unit (10)) 3丨, cold discernment ^^ 1 η < 仏仏 too) 38. Also in the cooling unit (COL) 32 * 匣 each station board GklG ^ ^ containing _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The substrate is rubbed and cleaned with 200800774, and I, and processed. The preheating element (PH) 23 performs heat treatment of the substrate G, and the adhesion of the substrate 2 to the substrate G is performed, and the cooling unit (COL) (4) is the substrate G. Resin coating unit (CT) 2 峨 ( (10) p) 27 in the ‘low ΐ === into the green Wei contact ship money. The heat treatment is performed by a heat treatment, and the cooling unit (CQI 29 and the cold port P (COL) 25 are used to cool the substrate G. The plate G is successively applied to the developer on the substrate G and the substrate is washed. Drying treatment of the substrate. Heat treatment unit (HT) 31

Ϊ(?=^(ΗΤ) 28相同進行基板G之加熱處理，冷卻單元 (^) I2與冷卻單元（C〇L) 25、29相同冷卻基板G 塗布於x方向下游側之單元，例如抗钱劑 27、加熱處理單元⑽ 送線A迴避而^在者)，$叫之際，用以使基板G暫時自輸 4、顯方向下游側之單元，例如介面站早兀（DEV)30、加熱處理單元（HT)31或 ίίΜπ用基板〇暫時自輸送線A迴避而存在者’ 置} 之單元’例如檢查裝線β迴避而^在^站生故1^之際，用以使基板G暫時自輸送 ^於緩衝單元（腳）36、37、38於後詳細説明。介面站4備有：。 G之;(RS) 44，配置有可收納基板G之緩衝【盒，係基板 ⑽43 ’接受經輸送線A輪送之基板G，而輸送至旋轉台下歹A可上機、前咖W_，可存取基板於 200800774 曝光裝置9，與輸送臂43鄰接而設置；及拉外部裝置區塊9〇，包含有與輸送臂43及顯影單元（邊ί光裝ΐ (EE)及印字曝光機（tiU 連接’由㊁J J CPU之步驟控制器101 裝置100之各部分或各單元而進行====布顯影處理使實方叫出^ _制nr m 便步％4工制态101執行，於步驟控制哭1〇1夕 ί ί爾影處理裝置⑽進行所期i 且&齡式或處理條件資料等之配方 =立取之記憶媒體，例如CD-ROM、硬碑、軟』用^放:!腦可讀 .之輸送臂lla輪送至處理站2之^ ^基板冗，由輸送裝置11 輸送線A上被輸送，以準分v射⑽之十游側端部，接著於於揉擦洗淨單元（SCR) G於輸魏A上被輸送，結束於揉擦洗淨單i (SiR)m^處理及乾燥處理。之基板G於輪送線A上被輸送;)由預^擦1處理及乾燥處理處理使其脱水。結束於解單元（PH^早70 (PH) 23施以加熱輸送線A上被輪送，_附單元（AD) = 13 200800774Ϊ(?=^(ΗΤ) 28 is the same as the heat treatment of the substrate G, and the cooling unit (^) I2 is cooled by the same cooling unit (C〇L) 25 and 29 as the unit on the downstream side in the x direction, for example, anti-money The agent 27, the heat treatment unit (10), the wire A is evaded and the other is used, and the substrate G is temporarily self-transferred 4, the unit on the downstream side of the display direction, for example, the interface station early (DEV) 30, heating The processing unit (HT) 31 or the substrate 〇回〇〇〇〇〇〇〇 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' The self-feeding of the buffer unit (foot) 36, 37, 38 will be described in detail later. Interface station 4 is available with: . G; (RS) 44, a buffer that can accommodate the substrate G is arranged [box, the substrate (10) 43 ' receives the substrate G that is transported by the transport line A, and is transported to the lower stage of the rotary table A, the front coffee W_, The accessible substrate is disposed at the exposure device 9 of 200800774, adjacent to the transfer arm 43; and the external device block 9A includes the transfer arm 43 and the developing unit (the edge mounting device (EE) and the printing exposure machine ( The tiU connection 'is performed by each part or each unit of the step controller 101 device 100 of the two J J CPUs ==== cloth development processing causes the real party to call out ^ _ system nr m 便 step %4 work state 101 execution, Step control crying 1〇1 ί ί ί Er Ying processing device (10) to perform the period i and & age or processing conditions data, etc. = memory media, such as CD-ROM, hard monument, soft :! The brain readable. The transport arm 11a is sent to the processing station 2 ^^ The substrate is redundant, and is transported by the transport device 11 on the transport line A to accurately divide the end of the 10 side of the (10), followed by The scrubbing unit (SCR) G is transported on the weft A, and ends in the scrubbing i (SiR) m^ treatment and drying process. The substrate G is on the transfer line A. Delivery;) by a pre-treatment and drying ^ 1 rub dehydrated processing ends hydrolysis unit (the PH early ^ 70 (PH) 23 is applied on the feed rolls heated transfer line A, _ attachment unit (AD) = 13 200800774.

束^附私（AD) 24進行之疏水化處理之基板G於輸送線A 上被輸运，由冷卻單元（C0L) 25冷卻。由，部單，fC〇L) 25冷卻之基板〇於輸送線A上被輸送，几細]塗布單元( CT)26形成抗蝕劑膜。由抗蝕劑塗布單元(CT) 26，行之錄繼之軸雜餘G讀麟A上被輸送，一面於基板G上供給抗蝕劑液而進行。由抗= 劑塗布單元（CT) 26形成抗侧膜之基板〇，於輸送 =上被輸送，於減壓乾燥單元（DP) 27暴露於減壓蒙氣，使其被施以抗餘劑膜之乾燥處理。 Γ於單元（DP) 27被施以抗餘劑膜之乾燥處理之基板理，;皮輸f，於，處理單元（町）28被施以加熱處夕ΛΓ t馭所3有之溶劑。結束於加熱處理單元（HT)28 29 ；^^。之土板〇於輸送線A上被輸送，於冷卻單元（C0L) 至下Γ輸魏A上被輸送盆今，其^ Lf 輸运臂43輸送至旋轉台（RS)44。裝；(EE，GATS34輸^植臟9。之周邊曝光周部（不要部分(=施/用以去除抗侧膜之外至曝光梦晋Q 轉口）上之緩衝11倉後，被輸送裝置區塊％ f 43讀送至外部填寫既定之資％。*祕（TITLER) ’的字曝光機（TITLER) B上曝ΐ機（皿ER)填寫既定之資訊之基板G於輸送線以例如下列布處理、漂洗處理及乾燥處理基板G於輪送線B上被輸送朗時於基板g上盛裝顯影液， 14 200800774 其次，輸送暫時停止，基板以既定之角度傾斜以使顯影液流下， f此狀，於基板G上供給漂洗液，洗落顯影液，其後，基板G恢復水平姿勢，再一面被輸送，並同時對基板（}吹送乾燥氣體。由顯影單元（DEV) 30進行之顯影液之塗布處理 (ΗΤ) 31被減加熱處理，去除滅綱所含有之溶 :°又’於顯影單元（DEV) 30與加熱處理單元（ΗΤ) f可設有進行顯影液之脫色處理之i線υν照射單元理，兀（ΗΤ) 31進行之加熱處理結束之基 ❹工= 运’由冷卻單元（C0L) 32冷卻。 ΜΜΒ上被輪由檢冷其於輸送線B上被輪送，之輸送單元u之於逆=双—之土板G ’由設於ϋ盒站1 MC。之輸运#山，收納於被載置於載置台12之既定之其次，詳細說明關於緩衝單元（BUF)36。又，圖單元（卿）36完全相同之構造砰） =方向之咖裝置）之另— 2 =邛5 ’具有上下段複數之可輪运線A所輪送之基板G之載置台線A ’且可載置經該昇降機構6，使此棚架’ 分中之任—者進出於輸送段之戴置台5a〜 Ϊ2,俾收納棚架部5及昇降機構6而-署少 sJTttTT 8a ' 8b ? 丁、丁起動此輪送帶機構50a〜 15 200800774 5〇f以使其用作為輪送線A之一部線A之一般輪送時，使上 ^，平吟或作為輸送段之載置台5ai%峻送線A。土反㈣接觸氣流之最上 ^圖5係設於緩衝單元（BUF) % 載置台乂之輸送帶機構50a，如圖口5戶二平=。設於方向工出間隔之複數之略成圓柱狀之滾_構# 51匕3有於X 件％、5ib包含有向γ方向件=、5lb，滾輪構，以超高分子聚乙稀材料形 ^H=51a、51b 之軸承52以可旋轉之 ^^ 5 = γ方向相別由後述之作為驅動源之馬達5 ^ |輪= =、5lb分機構術朝X方向對基板G進行滾轉在^ =式，輪送帶 :二=如Υ方向之-端= 設ίΐ動馬達53可連接此等滾輪構件他、5 刀傳達γ 54，中央部之滾輪構件51a，使此滾輪構件51a f =如X方向 Ϊ構為滾預送m使额城叙輸送帶 ▼輸送方式相較耐久性較高。構5〇b〜5〇f之他、包=滚輪構件51b向x方向交互配置。滾輪構件小口役之旋轉軸51c，向Y方向延伸；及數設^之_心於此職51心方向空出間隔複俾使抵接部5ld抵接基板G，支持基基板G之支持力沿γ方向大略均勻分散，而為使對構件51卜抵接部训之γ方向位置相異而構成la與滾輪圖6係設於緩衝單元（BUp) 36之載 ^於載置台5b〜兄之輸送帶機構獅〜^別如^之 = 圖含主動皮帶輪55a，設於例如X方向之中央部； 16 200800774 ，動皮帶輪55b ’分別設於例如又方向之兩端部；及The substrate G subjected to the hydrophobization treatment by the bundle (AD) 24 is transported on the transport line A, and is cooled by the cooling unit (C0L) 25. The substrate cooled by the portion, fC〇L) 25 is transported on the transport line A, and a thin coating unit (CT) 26 forms a resist film. The resist coating unit (CT) 26 is transported on the substrate G, and the resist liquid is supplied onto the substrate G. The substrate 抗 of the anti-side film is formed by the anti-drug coating unit (CT) 26, is transported on the transport =, and is exposed to the decompression atmosphere at the reduced-pressure drying unit (DP) 27 to be subjected to the anti-surge film. Drying treatment. The unit (DP) 27 is subjected to a substrate for drying the anti-residue film, and the processing unit (machi) 28 is applied with a solvent for heating. End with heat treatment unit (HT) 28 29 ; ^^. The earth slab is conveyed on the conveying line A, and is transported on the cooling unit (C0L) to the lower slab Wei A, and the Lf transport arm 43 is sent to the rotating table (RS) 44. (EE, GATS34 transmission and planting dirty 9. Peripheral exposure of the periphery (not part of (= application / to remove the anti-side film to the exposure of Mengjin Q re-export) on the buffer 11 warehouse, the conveyor area Block % f 43 reads to the outside to fill in the established capital %. *TITLER's word exposure machine (TITLER) B on the exposure machine (Dish ER) fills in the established information of the substrate G on the conveyor line to, for example, the following cloth The processing, the rinsing treatment, and the drying treatment of the substrate G on the transfer line B are carried out on the substrate g to hold the developer, 14 200800774 Next, the conveyance is temporarily stopped, and the substrate is inclined at a predetermined angle to cause the developer to flow down, f The rinsing liquid is supplied onto the substrate G to wash off the developing solution, and thereafter, the substrate G is returned to the horizontal posture, and is transported while being simultaneously blown to the substrate (}. The developing solution by the developing unit (DEV) 30 The coating treatment (ΗΤ) 31 is subjected to heat treatment to remove the solution contained in the extinction: ° and the developing unit (DEV) 30 and the heat treatment unit (ΗΤ) f may be provided with an i line 进行 ν for decolorizing the developing solution. Irradiation unit, heating by 兀(ΗΤ) 31 The completion of the completion of the work = transport 'cooled by the cooling unit (C0L) 32. The upper part of the wheel is cooled by the cold on the conveyor line B, the transport unit u is in the reverse = double - earth plate G ' The transport #山, which is located at the box station 1 MC, is stored in the predetermined position placed on the mounting table 12, and the buffer unit (BUF) 36 is explained in detail. Further, the map unit (clear) 36 is identical. Structure 砰) = direction of the coffee device) - 2 = 邛 5 'The upper and lower sections of the carrier line A of the substrate G that can be transported by the wheel A can be placed through the lifting mechanism 6 The scaffolding is divided into the wearing sections 5a to Ϊ2 of the conveying section, the storage scaffolding section 5 and the lifting mechanism 6, and the sJTttTT 8a ' 8b □ □, Ding, and the starting belt feeding mechanism 50a ~ 15 200800774 5〇f When used as a general line of one of the line A of the transfer line A, the upper, flat or 5i% of the stage of the transport section is sent to the line A. Earth (4) contact The top of the air flow ^ Figure 5 is set in the buffer unit (BUF) % of the conveyor belt mechanism 50a placed on the table, as shown in Figure 5, the household is flat =. Set in the direction of the work interval The cylindrical shape of the roll _ _ # 51 匕 3 has the X piece%, 5ib contains the γ direction member =, 5 lb, the roller structure, the ultra-high polymer polyethylene material shape ^ H = 51a, 51b bearing 52 is rotatable in the ^^ 5 = γ direction by a motor as a driving source to be described later 5 ^ | wheel = =, 5 lb sub-mechanism to roll the substrate G in the X direction in the ^ = type, the belt: 2 = Υ direction - end = ΐ ΐ 马达 motor 53 can be connected to these roller members, 5 knives convey γ 54, the central portion of the roller member 51a, so that the roller member 51a f = X X X Sending m makes the delivery mode of the frontal city conveyor belt higher than durability. The other members of the frame 5b to 5〇f and the package=wheel member 51b are alternately arranged in the x direction. The rotating shaft 51c of the roller member is slightly vented, and extends in the Y direction; and the number of the yokes is 俾于此于此 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 The γ direction is roughly evenly dispersed, and the γ direction position of the member 51 is abbreviated to form a la and the roller. FIG. 6 is disposed on the buffer unit (BUp) 36. With the mechanism lion~^别如^= The figure includes the driving pulley 55a, which is disposed, for example, in the central portion of the X direction; 16 200800774, the movable pulley 55b' is respectively disposed at, for example, both ends of the direction;

設於主動皮帶輪故及各從動皮帶輪说之間；架部5 it t成為向γ方向延伸之略圓柱狀，由設於L 輸;分隔板57上以可旋轉之方式被支持。 γ方為使其對應從動皮帶輪55b，形成為細帶狀，、”l 皮帶置。輸繼構5〇b〜谢分_ 從動皮之驅動而旋轉’伴隨此，各輪送帶55c及夂轉，以使其向X方向帶輸送基板G而構成輸送:因此與如輸送帶機構伽之滾子皮帶ί 送Ϊ fe之顫動，宜於主動皮帶輪故及從動 (未經ΐ If輸送帶55c之挽曲，亦可設置撓曲防止構件相接。Θ不，使其貫穿輸送帶55c内，與輸送帶说之輸送面 17 200800774 滑動機構73而可沿γ方而#知突出狀之卡合部53a。另一^而而设置’於旋轉轴之尖端部有例如央部之滾輪構件沿^軸方== 輸送帶機構他之X方向中 •之主動皮帶輪55a之軸方向I沪知部，及輪送帶機構50b〜50f . 輪送線A之際，與馬達53 =，分別设有載置台5a〜5f進出部53禮人之孔狀之:f於周向可卡合之例如卡合近棚架部5而移動，使卡人馬達53因滑動機構73接線A之載置台5a〜5f之^ | =止部53b卡合，進出輸送 53連接（參照、圖7之假想冓50a〜5〇f中之任-者與馬達離開而移動，使卡合部53a _^、、、53因滑動機構73自棚架部5 線A之載置台5a〜5f輪逆、= 53b之卡合解除，進出輸送 53之連接解除而構成。之輸~機構50a〜***任—者與馬達以如此之構成，可以_ 〜50f ’以實現裝置之低=5^__复數之輸送帶機構5〇a 53a與分別設於滾輪構# 主33 53之y專轴之卡合部離合機構。又，馬達53之旋轉輪55a之卡止部53b構成之連接，亦可由利用磁力:輪構件51a或主動皮帶輪55a . 由馬達53進行之輪逆^生傳動機構等進行而構成。 (正常時或平時之輸送速^^冓5^〜谢之基板G之輸送速度線A所輸送之基板G到達f 線^之作業時間（自輸送 G到達既定之位置之時線Α所輸送之下—基板構6進行之棚架部5之昇’而於此，考慮到由昇降機不崩解，可設定為較輸送線整體之生產進度平衡辅助輪送帶_ 8a、8b = = 逮度快。及由馬達53進行之輸送帶機輸送線A之作業時間、由昇降機構6進行之棚架之基^之輸送時間和帶輸送之㈣針式^子子輪送方式或進行运帶機構8a、8b係用作為輪^線輸=方式），此兩辅助輪 w I xv 18 200800774 辅助輪送帶機構8a、8b之基It is disposed between the driving pulley and each of the driven pulleys; the frame portion 5 is formed in a slightly cylindrical shape extending in the γ direction, and is provided on the L-transmission plate 57 so as to be rotatably supported. The γ-side is formed so as to correspond to the driven pulley 55b, and is formed in a thin strip shape. "1 belt is placed. The transmission is 5〇b~Xie _ driven by the driving of the driven skin", and the respective belts 55c and Twisting, so that it transports the substrate G to the X-direction belt to form the transport: therefore, it is suitable for the vibration of the roller belt 如, such as the conveyor belt mechanism, suitable for the active pulley and the driven (not ΐ If conveyor belt) The bending of 55c may also be provided with the deflection preventing member being connected. Otherwise, it is penetrated into the conveyor belt 55c, and the conveying surface of the conveyor belt 17 200800774 sliding mechanism 73 can be along the gamma square The merging portion 53a is provided with a 'roller member at the tip end of the rotating shaft, for example, a central portion of the roller member along the axis side == the belt mechanism is in the X direction of the driving pulley 55a. And the belt conveyor mechanism 50b to 50f. When the wheel line A is connected to the motor 53 =, the mounting table 5a to 5f is provided with a hole shape for the entrance and exit portion 53: f is a card that can be engaged in the circumferential direction, for example, Moving closer to the scaffolding portion 5, the card motor 53 is engaged by the mounting bases 5a to 5f of the wire A of the sliding mechanism 73. The 53 connection (refer to any of the imaginary 冓50a to 5〇f of FIG. 7) is moved away from the motor, and the engaging portions 53a_, , and 53 are caused by the sliding mechanism 73 from the shed portion 5 line A. The mounting tables 5a to 5f are reversed, the engagement of the 53b is released, and the connection of the ingress and egress 53 is released. The transmission mechanism 50a to Xiezhong and the motor are configured in such a manner that the device can be implemented as _~50f' The belt mechanism 5〇a 53a of the lower = 5^__ is engaged with the engaging portion of the y-axis of the roller structure # main 33 53. Further, the locking portion 53b of the rotating wheel 55a of the motor 53 constitutes The connection may be made by using a magnetic force: the wheel member 51a or the driving pulley 55a. The wheel reverse reaction mechanism is performed by the motor 53. (Normal or normal conveying speed ^^冓5^~谢的基板G The working time of the substrate G conveyed by the conveying speed line A reaches the f-line ^ (the lowering of the scaffolding portion 5 by the substrate structure 6 when the conveying G reaches the predetermined position) Considering that the elevator does not disintegrate, it can be set to the production schedule balance auxiliary belt with the whole conveyor line _ 8a, 8b == The catching speed is fast. The working time of the conveyor line A of the conveyor belt by the motor 53, the conveying time of the scaffolding by the lifting mechanism 6, and the (four) pin type sub-wheeling mode of the belt conveyor or The belt transport mechanisms 8a, 8b are used as the wheel drive mode, and the two auxiliary wheels w I xv 18 200800774 are used as the bases of the auxiliary wheel feed mechanisms 8a, 8b.

之基板G之輪送速度快，例如設定度分聰輸送線A 之輸送速度（正常時或平時之構5Ga〜50f之基式，由於自輸送線A往進出輪送線度)大略相等。藉此方之傳遞’及自進出輸送線A之載置，置口 5a〜5f之基板G 之傳遞可迅速進行，而可以實° 鹄送線A之基板G 由昇降機構6進行夺間之縮短。馬達53之軸、由馬達53進行之滑動機構73進行之送帶機構㈣之伽，分The transfer speed of the substrate G is fast, for example, the transfer speed of the set-point distribution line A (the base of 5Ga to 50f in normal or normal time, and the straightness to and from the conveyance line A) is substantially equal. By the transfer of the side and the placement of the feed line A, the transfer of the substrate G of the ports 5a to 5f can be quickly performed, and the substrate G of the transfer line A can be shortened by the lift mechanism 6 . The shaft of the motor 53 and the sliding mechanism 73 by the motor 53 perform the belt feeding mechanism (four)

所輸送之基板G之第2减測哭i〇6S笛i a，^又有偵測輸达線A 傳送偵測信號。第1感測器105、第2土感測器 _。 7,可以例如侦測基板0之存貨之存貨感測器側之i紐制器1G4，—旦祕衝單元（buf) 36之X方向下游貝之早=例如抗侧塗布單元(CT) 26、減壓乾燥單& =_力:熱處^元（HT) 28或冷卻單元（①L) 29發生故障，較於、;(OT) 36之輸达線八之乂方向為下游側者停止，即使機構5〇a停止’俾使輸送線A所輸送來之基板G被載置： =輸送線A之載置台5a上。在此，單元控制器1〇4 一旦到 ίΐΪ L感測器廳之制信號，即使馬達53之驅動，亦即輸送 :¾構50a之作動減速，若接收到來自第3感測器1〇7之偵測信 ^ ’即使馬達53之驅動，亦即輸送帶機構5〇a之作動停止。、以士: 此之控制，基板G被載置於載置台5a上。並且，單元控制哭川4 19 200800774 若於此基板G被載置於載置台％上之狀測出輸送線A所輪送來之下一基板G、详，測器105债下-基板G接近載置台5a至既定之距離，送來之，侧之單元之故障解除，輸送線A修復為^自㈡=方J下來之下-基板G後續之基板G逐:續載置 ^^ A所輸达單元控制器104與基板G被載置於載置A 口±5b〜5f。在此來自第2感測器106及第3感測口_々二才目同，亦根據 ;動G物嫩於紐、、泉之載置口 5a至第1感測器1〇5之距離出輸k 輸送帶機構8a等之輸送速度或由昇 _二輸，^或輔助降速度等設定。幵|牛钱構6進仃之棚架部5之昇其次說明關於按上述所構成之緩衝單元圖8係用以説明關於緩衝單元（B )之動作。 1圖9錄説_於緩衝單元⑽f)36=== 或一機=處理裝置⑽正常 i S ?；Γ«53 ；接受ί ΐΐίί 侧之單元一旦發生故障，下游側之辅助_機構X方向之X方向上游側輸送線A所輪為使自载置台5a 之送入口 71 置台通過框體7 圖8 U))。又，在此，亦可使單構5〇a停止（參照 A所輸送來之最初之其把r 制益104控制，俾使輪送線於=置於基載板置=上=^^ 口 a上之狀恶下，第1感測器105 — 20 200800774 旦偵測出輪送線A所輸送來之下一基板&，單元抑除輸送帶機構50a與馬達53之連接，為使載置台104即解 f ’例如載置台5b進出輸送線A而由昇降機構^使f中之任— ^口 5b上而使由馬達53進行之輪送帶機構5%之 3於，照圖8 ( b ))。藉此方式，基板G!與載置台5 & 一齊J (茶避而被保管。又，自因昇降機構6棚架部5昇降dt迴之基板被載置於進出輪送線A之載置台任一者之時間，被設定為較輸送線人之作業時間短。Μ中之以如此之製程，直至緩衝單元（BUF/3 a二單兀之故障解除，輸送線A所輸送來後 °之 λ (buf;3^ ： J；輸达之基板G之數量相同數量之載置台5 糊之了 (BUP)The second subtraction measurement of the substrate G to be delivered is a detection of the transmission line A transmission detection signal. The first sensor 105 and the second soil sensor _. 7. For example, it is possible to detect the i-new device 1G4 on the stock sensor side of the stock of the substrate 0, and the early direction of the X-direction downstream of the buf 36 (for example, the anti-side coating unit (CT) 26 Decompression drying single & = _ force: heat ^ yuan (HT) 28 or cooling unit (1L) 29 failure, compared to; (OT) 36 of the transmission line eight of the direction of the downstream side of the stop, Even if the mechanism 5〇a stops '俾, the substrate G conveyed by the transport line A is placed: = the mounting table 5a of the transport line A. Here, the unit controller 1〇4 once the signal to the 感感 sensor hall, even if the motor 53 is driven, that is, the transmission: 3⁄4 structure 50a is decelerated, if it receives the third sensor 1〇7 Detection signal ^ 'Even if the motor 53 is driven, that is, the operation of the belt mechanism 5〇a is stopped.士士: In this control, the substrate G is placed on the mounting table 5a. In addition, the unit control Crychuan 4 19 200800774 If the substrate G is placed on the mounting table %, the substrate G is transported by the transport line A, and the detector 105 is under the debt - the substrate G is close. The mounting table 5a is set to a predetermined distance, and the failure of the unit on the side is released, and the conveying line A is repaired as ^2 (=)============================================== The unit controller 104 and the substrate G are placed on the mounting A port ±5b to 5f. Here, the distance from the second sensor 106 and the third sensing port _ 々才 is also the same, and the distance from the load port 5a of the spring and the spring to the first sensor 1 〇 5 The conveying speed of the conveyor belt mechanism 8a or the like is set by the liters/seconds, the auxiliary speed, and the like.幵牛牛牛构仃棚棚棚其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次其次1 Figure 9 Record _ in the buffer unit (10) f) 36 === or one machine = processing device (10) normal i S ?; Γ «53 ; accept the unit on the side of ί ΐΐίί, in the event of a failure, the downstream side of the auxiliary _ mechanism X direction The wheel of the upstream side transport line A in the X direction is such that the feed port 71 of the self-mounting table 5a is placed through the frame 7 (Fig. 8 U)). In addition, here, the single structure 5〇a can also be stopped (refer to the first transmission of the reference A to control the r-making benefit 104, so that the rounding line is placed on the base carrier plate = upper = ^ ^ port In the case of a, the first sensor 105-20 200800774 detects the bottom substrate & and the unit rejects the connection between the conveyor belt mechanism 50a and the motor 53 for the purpose of loading The setting 104 is the solution f', for example, the mounting table 5b enters and exits the conveying line A, and the lifting mechanism is used to make any of the f-ports 5b, and the circling belt mechanism by the motor 53 is 5% of 3, as shown in Fig. 8 ( b)). In this way, the substrate G! is placed in alignment with the mounting table 5 & and the substrate is placed on the loading and unloading line A from the substrate which is lifted and lowered by the lifting frame 6 The time of either one is set to be shorter than the working time of the transporter. In the middle of the process, until the buffer unit (the fault of the BUF/3 a two-single is released, the transport line A is sent back) λ (buf; 3^ : J; The number of substrates G that are transported is the same number of stages 5 paste (BUP)

^ 1 A ^ G 則^彳^輪送來之基板G全部被載置於载置台。曰輪„^(_)36之X方向下游側之單元之故障-曰解除，在===岐其迴避之基板、G2·. ί輪ii t 使其上之單元控制請例如為制各由昇降機構6進行棚H f f至輸送線A，而控馬達53之㈣^ ^棚卩5之構、由滑動麟73進行之辅助輪馬達53進行之輸送帶機構5〇a〜5〇f之驅動及 =構^b之驅動。又，宜於緩衝單元（buf) 36之機構=構㈣_，並以昇降輸送帶機構5〇a驅動，5aa=Jf線A’以馬達53^ κ執置口加上之基板Gi自框體7之送出 21 200800774 下游_，圖9⑷）。料控制器UH 馬達53使朋架部5上什使载置台5b進出輸送線A，以線A之,通驅動，使台％上之基板仏向輪送之控制3 圖9 V。同樣地，以單元控制器取抗則i方式，進板g之所謂先人先出，而可抑制理裝置⑽中之基之處理之不均— 送線l i出i载置-t，:5b..·上，基板Gi、G-—旦全部向輸使載置A 5a、隹屮控制為104以昇降機構6使棚架部5下降，口 5a進出輸送線a，徒輪送帶機、播牛再次用作為輸送線A之—部；驅動，使載置台h 送出= 之ΐ係用以説明關於緩衝單元(雜之基_ 緩衝單元（BUF) 36 #—π —炎占部5之昇降開始之時點：疋棚降，冓6進行之棚架任—者’因昇降機構6棚架部5再、、^A j置口 5a〜5f中之运線A之糾之载置台5a〜5 + ’ —被魅於進出輪間，較輪送線A之作業時間為之基板G之時點之時 Α輸送來之基板〇加以保管^ 式’而可-面將輸送線送線A送出。例如，緩衝單元保管之其他基板〇朝輪之故障之發生及解除相歇性^ 之X方向下游側之單元 5c、5d…上分別載置有基板α、 .〇圖10 (a)所示，於载置台前，第1感測器105偵挪出輪^ 向輪送線A送出基板& 單元控制器104使基板G3之於所輪延來之下-基板(V時，昇降機構6使棚架部5下降 =、、l A之送出動作暫時停止，以使基板G，载置於载置台5a f載置台5a進出輪送線A， 104以昇降機構6使棚架邹$ =回0 (b))。其次，單元控制器迴避，並使載置台5c㈣輪送二使载置台5a _齊° 向輪达線入送出裁置台5c 200800774 出輸i線A所輪送(_!)ϋ後^由於第1感測器105偵測器104可以昇降機構參照圖11⑷），單元控制 . 輪i关的A，栋其广/吏Μ P5下降，使空出之載置台5b進出^ 1 A ^ G Then the substrate G sent by the wheel is placed on the mounting table. The failure of the unit on the downstream side in the X direction of the „^(_)36 is released, and the unit is controlled by === 回回 , , , , , , , , , , , , , , , , , , , , , , , , , , , , The lifting mechanism 6 carries the shed H ff to the conveying line A, and controls the structure of the motor 4, the structure of the shed 5, and the driving mechanism 5〇a5〇f of the auxiliary wheel motor 53 by the sliding lining 73. And = drive ^ b drive. Also, it is suitable for the buffer unit (buf) 36 mechanism = structure (four) _, and driven by the lifting conveyor belt 5〇a, 5aa = Jf line A' with the motor 53 ^ κ mouth The upper substrate Gi is sent out from the frame body 21 200800774 downstream _, Fig. 9 (4)). The material controller UH motor 53 causes the mounting table 5b to move in and out of the conveying line A, and drives the wire A through the line A. The control of the substrate on the stage is shown in Fig. 9 V. Similarly, the unit controller takes the resistance i, and the so-called first-in first-out of the board g can suppress the processing of the base in the device (10). Unevenness - the feeding line li out i is placed on -t, :5b..·, the substrates Gi, G--all are placed on the transport A 5a, the 隹屮 is controlled to 104, and the elevating mechanism 6 causes the scaffolding portion 5 Drop, mouth 5a into The conveying line a, the pulley feeding machine, the broadcasting cow are used again as the part of the conveying line A; the driving, so that the mounting table h is sent out = the system is used to explain the buffer unit (heterogeneous base_buffer unit (BUF) 36 #—π—The point at which the rise and fall of the Yanzhan Department 5 begins: the shed is lowered, and the scaffolding carried out by 冓6 is the one--by the lifting mechanism 6 scaffolding part 5, and ^A j setting 5a~5f The mounting table 5a~5 + ' of the line A is enchanted between the in and out wheels, and the substrate transported by the time when the working time of the wheel A is the time of the substrate G is stored. The conveyance line feed line A is sent out. For example, the other substrate is stored in the buffer unit, and the substrate α is placed on the units 5c and 5d on the downstream side in the X direction of the occurrence of the failure of the wheel. As shown in Fig. 10 (a), before the mounting table, the first sensor 105 detects the wheel and sends the substrate to the wheel A. The unit controller 104 causes the substrate G3 to rotate. - in the case of the substrate (in the case of V, the elevating mechanism 6 lowers the scaffolding portion 5 =, and the sending operation of l A is temporarily stopped, so that the substrate G is placed on the mounting table 5a f mounting table 5a. The feeding lines A, 104 are caused by the lifting mechanism 6 to make the scaffolding $0 back to 0 (b)). Secondly, the unit controller avoids and causes the mounting table 5c (four) to rotate two to make the mounting table 5a _°° to the round line. The cutting table 5c 200800774 is sent by the i line A (_!) ^ after the first sensor 105 detector 104 can be raised and lowered according to Figure 11 (4)), unit control. /吏Μ P5 drops, making the vacant placement table 5b in and out

單元^制哭置於載置台5b(參照圖u(b))。同樣地， β 早兀&制口" 1〇4可向輸送線Α送出Grr 廿AThe unit is placed on the mounting table 5b (see Fig. u(b)). Similarly, β 兀 & mouth " 1〇4 can send Grr 廿A to the conveyor line

所輸送权制之基板G/、^ ，亚―面使輸廷線AThe substrate G/, ^, sub-surface of the transport system made the line A

(〇)。又，亦扳，G4…自輪送線A迴避（參照圖U 板之截詈厶不曰早兀抆制态104控制，以使向輸送線A送出基 =置一降，而使輸送線A所輪送來之下-基板載置St 其次説明關於構成緩衝單元（ • ® 12係顯示輸送帶機構之變形例i平面° 省ΐίΓ 關於與變形前相同之部位附以相同符號 =各載置台5a〜5f’為替代輸送帶 6)血，可設置輸送帶機構吨。輸送帶 f二圖5、 •中央部之驅動滾子部11()，於此g /、百位於X方向方向兩端部分別依序具有於之x方向兩側向x 無動力滚子部⑴,"；好==== 子部心於驅動滾子部110、112、113，右、梦於捃* • _袞子部112，滾輪構件5lb向X°方向有件個51b。又，於子部110之滾輪構件51b之γ方向一:部，=有2個。於驅動滾 ^部53a可卡合之卡止部53b，並且於所有滾^ ^達53之卡有驅動力傳達帶54，以馬達53使驅動 :lb之間掛設 *旋轉，可使其透過驅動力傳達帶54使所'有‘㈣構件51b _而構成。 1史所有滾輪構件51b -齊旋轉無動力滾子部111、114分別包含有：轉旋車^滾子115 ’抵接基板G ’輸送時伴隨滾輪構件51b之旋支持部116，以可旋轉之方式支持無動力滚子ιΐ5。 23 200800774 成，：之超高分子聚乙烯材料向γ方向形於與滚輪構件5lb之抵接部51d相等之^皮义錯狀配置， …於滚輪構件训之抵接部51d間之γ方向位個個配置，組排列。支持部116，包含有·· ，向X方向2個一基材117，固定於棚架部5之沿軸承構件119a、119b，透過軸環3固向壁；及轉之方式絲有無動力滾子115。於基材1Π，以可旋基材117，形成為向γ方向其於X方向兩端部相向。軸承構件 t j L形，設置2個使接部51d相等之γ方向位置，轴承9a 構，，之抵之間。軸承構件119a、119b分別开故置於軸承構件119a 狀，其底面部由非圖示之螺延伸之薄壁之凸並且，軸承構件119a、119b 疋於各基材1Π之底面部。有1，於轴承構件咖由承 120犬出於上方而以可旋轉之^ :動=袞子115自開口 .又，考慮到輸送方便性，輪送帶ς^σΧ方向相向之側面部。以可拆卸之方式構成（參照圖之無動力滾子部114 力滾子部114由於設置於χ方 ^虎C位置、假想線）。無動拆卸或調整等即可卸芽。陶而邛，不需驅動力傳達帶54之 (滾機構50a相較，滾輪構件5ib 115，支持無動力滾子nli支^^置有數量眾多之無動力滾子之軸承構件l19a、119b構成，因路6由L型之基材117及凸狀因此由於於载置台5a〜5f使用薄但可確保優異之強度。構50a B寺相較，可不使基板g 幾構50g，與使用輸送帶機輕量化及低成本化。並且，即m金度低下而實現裝置整體之上述之輸送帶機構50b〜50f 载置台化〜分使用帶輪送之亦可實現裝置整體之輕量 200800774 化，且塵埃等不易附著。圖14係顯示輪送帶機構與圖。於馬達53之卡合部53a，亦可於尖端變形例之缓衝滾子121具有通渦黾、圭„ 二而口N又置、、友衝滾子121。置。藉此方式，於馬達53 ^中心部之旋轉軸而設際，卡合部53a與卡止部53b之位動之抵接於滾輪構件51a或主動皮於、戍衝滾子121 衝擊’因此抑制了抵接時塵埃^發生# 而緩和了抵接於滾輪構件51a、51b或 5者衝滚子121 •態下”達53«，則因緩衝軸方軸可旋轉’卡合部53a與卡止部53b 3馬^之旋轉本發明不限定於前述實施 A或B送出之順序亦可為隨意錢ΐί之魏之基板G向輸送線產業上利用性型者時I二=^ =^玻^紐’ _係基板為大其他基板之緩衝。、▲ ’，、亦可廣泛適用於半導體晶片等【圖式簡單說明】布顯：面圖’該陶塗處理後之基板之抗__之形成及曝光依本發日狀基板輯；：^1實m緩解元，魏衝單元係 2係、，衝單元之側面方向之剖關。緩;;剖面圖。圖5係設於緩衝單元之載置台之平面圖。 25 200800774 圖6係設於緩衝單元圖7係顯示設於緩衝^圖。圖。之翰适f機構與馬達之連接部分之圖8係用以説明關於圖9係用以説明關於、=== 反迴避動作之圖。圖14係顯示輪送帶機構與馬達之_|4之以=圖【主要元件符號說明】 1〜匣盒站（處理部） 2〜處理站 4〜介面站（處理部） 5〜棚架部 5a、5b、5c、5d、ς 6〜昇降機構L載置台 7〜框體 :、c帶機構 10〜引導件(〇). Also, it is also pulled, G4... is evaded from the wheeling line A (refer to the figure of the U-plate of the figure, it is not controlled by the early state 104, so that the base line is sent to the conveyor line A = set a drop, and the line A is made. In the case of the round-feeding - the substrate is placed on the St. Next, the description will be given on the configuration of the buffer unit (the ® 12-based display belt mechanism is modified. The plane i is omitted. The same parts as before the deformation are given the same symbols = each stage 5a ~5f' is the alternative conveyor belt 6) blood, can set the conveyor belt mechanism tons. Conveyor belt f Figure 5, • the central part of the drive roller 11 (), where g /, hundred are located in the X direction Do not have x-powered roller parts (1) on both sides in the x direction, "; good ==== sub-center to drive roller parts 110, 112, 113, right, dream 捃* • _衮In the sub-portion 112, the roller member 51b has a piece 51b in the X° direction. Further, in the γ direction of the roller member 51b of the sub-portion 110, there are two parts, and there are two. The locking of the driving roller portion 53a can be engaged. The portion 53b has a driving force transmission belt 54 on all of the cards 53, and the motor 53 causes the driving: lb to hang * between the rotations, so that it can be transmitted through the driving force transmission belt 54. The structure of the "fourth" member 51b_ is included. 1 history of all the roller members 51b - the homogeneous rotating non-powered roller portions 111, 114 respectively include: the rotating car ^ roller 115 'abutting the substrate G' when transporting with the roller member The screw support portion 116 of the 51b rotatably supports the unpowered roller ΐ5. 23 200800774 The ultra-high molecular polyethylene material is formed in the γ direction to be equal to the abutting portion 51d of the roller member 51b. The erroneous arrangement is arranged in the γ direction between the abutting portions 51d of the roller member, and is arranged in groups. The support portion 116 includes two base materials 117 in the X direction and is fixed to the scaffolding portion. 5 along the bearing members 119a, 119b, through the collar 3 solid wall; and the way the wire has the power roller 115. On the substrate 1 Π, the rotatable substrate 117 is formed in the γ direction in the X direction The bearing members tj are L-shaped, and two γ-direction positions are formed in which the joint portions 51d are equal, and the bearing 9a is configured to be in contact with each other. The bearing members 119a and 119b are respectively placed in the bearing member 119a, and the bottom surface thereof is provided. a thin wall extending from a non-illustrated screw and bearing member 119a 119b 疋底面底面各各各各各各 119 119 119 各各各 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 119 The side surface of the ς^σΧ direction is detachably formed (refer to the unpowered roller portion 114 of the drawing, the force roller portion 114 is disposed at the position of the ^方^虎C, imaginary line). No disassembly or adjustment The bud can be unloaded. The terrarium does not require the driving force to convey the belt 54. (The roller mechanism 50a is compared with the roller member 5ib 115, and the non-powered roller is supported.) The bearing with a large number of unpowered rollers is provided. The members l19a and 119b are configured such that the path 6 is made of an L-shaped base material 117 and a convex shape. Therefore, since the mounting stages 5a to 5f are thin, excellent strength can be secured. In comparison with the structure 50a B, it is possible to reduce the weight and cost of the substrate by using 50 g of the substrate g. Further, even if the m-thickness is lowered, the above-described conveyor belt mechanisms 50b to 50f of the entire apparatus are placed on the board, and the belt is transported by the belt. The weight of the entire apparatus can be increased, and the dust is hard to adhere. Figure 14 is a view showing the belt mechanism and the figure. In the engaging portion 53a of the motor 53, the buffer roller 121 of the tip modification may have a vortex, a second, a N, and a roller 121. In this way, the motor is provided. 53 ^ The rotation axis of the center portion is provided, and the engagement portion 53a and the locking portion 53b are in contact with the roller member 51a or the active skin and the impact roller 121. Therefore, the dust at the abutment is suppressed. Occurs # and easing the contact of the roller member 51a, 51b or 5 with the roller member 121 in the state of "up to 53", since the buffer shaft square shaft can be rotated 'the engaging portion 53a and the locking portion 53b 3 Rotation The present invention is not limited to the above-mentioned embodiment A or B. The order of sending is also free. The substrate G of the Wei Qiang is used in the transportation line industry. When I use the type II = ^ = ^ glass ^ button _ system substrate is large Buffering of other substrates. , ▲ ', can also be widely used in semiconductor wafers, etc. [Simple description of the diagram] Display: surface diagram 'The formation and exposure of the substrate after the ceramic coating treatment __ according to the hair of the substrate series;: ^ 1 real m mitigation element, Wei Chong unit system 2 series, the side direction of the rushing unit. Slow;; section view. Figure 5 is a plan view of the mounting table of the buffer unit. 25 200800774 Figure 6 is set in the buffer unit. Figure 7 shows the display in the buffer. Figure. Fig. 8 is a view for explaining the relationship between Fig. 9 and the === anti-avoidance action. Fig. 14 shows the _|4 of the belt conveyor mechanism and the motor = Fig. [Description of the main components] 1 to the cassette station (processing unit) 2 to the processing station 4 to the interface station (processing unit) 5 to the scaffolding unit 5a, 5b, 5c, 5d, ς 6~ lifting mechanism L mounting table 7 to frame: c-belt mechanism 10 to guide

η送裴置(輪送單元） lla〜輪送臂早兀J 12〜載置台 21〜準分子UV昭射印一〜揉擦洗淨單=广間 23〜預熱單元（p R) 24〜黏附單元(AD) 26 200800774 25〜冷卻單元（COL) 26〜抗蝕劑塗布單元（CT)(處理部） 27〜減壓乾燥單元（DP)(處理部） 28、 31〜加熱處理單元（HT)(處理部） 29、 32〜冷卻單元（COL)(處理部） 30〜顯影單元（DEV)(處理部） 35〜檢查裝置（IP)(檢查單元）（處理部） 36、37、38〜緩衝單元（BUF)(基板緩衝裝置） 43〜輸送臂 44〜旋轉台（RS) 50a、50b、50c、50d、50e、50f、50g〜輸送帶機構 51a、5 lb〜滾輪構件 51c〜小口控之旋轉轴 5 Id〜大口徑之抵接部 52〜軸承 53〜馬達（驅動源） 53a〜卡合部 53b〜-^止部 54〜驅動力傳達帶 55a〜主動皮帶輪 55b〜從動皮帶輪 55c〜輸送帶 56〜軸承 57〜分隔板 61〜汽缸機構 62〜滾珠螺桿機構 71〜送入口 72〜送出口 73〜滑動機構 27 200800774 90〜外部裝置區塊 100〜抗蝕劑塗布顯影處理裝置（基板處理裝置） 101〜步驟控制器 ‘ 102〜使用者介面 . 103〜記憶部 104〜單元控制器（控制機構） 105〜第1感測器（偵測部）. 106〜第2感測器 107〜第3感測器 110、112、113〜驅動滾子部 • 111、114〜無動力滾子部 115〜無動力滾子 116〜支持部 117〜基材 118〜轴環 119a、11%〜轴承構件 120〜開口 121〜缓衝滾子 A、B〜輸送線 ⑩ G ( G!、G2〜G/、G2…）〜基板 C〜匣盒 EE〜周邊曝光裝置 TITLER〜印字曝光機 28η sending device (wheeling unit) lla ~ wheel sending arm early 兀 J 12 ~ mounting table 21 ~ excimer UV photographic printing ~ ~ 揉 scrubbing single = wide 23 ~ preheating unit (p R) 24~ Adhesion unit (AD) 26 200800774 25~Cooling unit (COL) 26~Resist coating unit (CT) (processing unit) 27~Depressurization drying unit (DP) (processing unit) 28, 31~heat processing unit (HT (Processing Unit) 29, 32 to Cooling Unit (COL) (Processing Unit) 30 to Developing Unit (DEV) (Processing Unit) 35 to Inspection Apparatus (IP) (Inspection Unit) (Processing Unit) 36, 37, 38~ Buffer unit (BUF) (substrate buffer device) 43 to transport arm 44 to rotary table (RS) 50a, 50b, 50c, 50d, 50e, 50f, 50g - conveyor belt mechanism 51a, 5 lb ~ roller member 51c ~ small mouth control Rotating shaft 5 Id to large diameter abutting portion 52 to bearing 53 to motor (driving source) 53a to engaging portion 53b to - stopping portion 54 to driving force transmitting belt 55a to driving pulley 55b to driven pulley 55c to Belt 56 to bearing 57 to partition plate 61 to cylinder mechanism 62 to ball screw mechanism 71 to feed port 72 to outlet port 73 to slide mechanism 27 200800774 90 to external device block 100 to resist coating development processing device (substrate processing device) 101 to step controller '102 to user interface. 103 to memory portion 104 to unit controller (control mechanism) 105 to first sense Detector (detection unit) 106 - 2nd sensor 107 - 3rd sensor 110, 112, 113 - drive roller part - 111, 114 - non-powered roller part 115 - non-powered roller 116~ Supporting portion 117 to base material 118 to collar 119a, 11% to bearing member 120 to opening 121 to buffer roller A, B to conveying line 10 G (G!, G2 to G/, G2, ...) to substrate C~ EE box EE ~ peripheral exposure device TITLER ~ printing exposure machine 28

Claims

200800774 十、申請專利範圍： 1· 一種基板缓衝裝置，用以使朝輪送線罩古自輸送線迴避，其特徵在於：方向輪送之基板暫時具備有· . 棚架部，設置成可昇降’具有上下趨齡、且可載置經該輸送線所輸送之基板的載置a又可進出該輸送線昇降機構，使該棚架部昇降，而人兮:垂及者進出該輸送線；且汁+ ^5亥讀之载置台中之任- 该各載置台具有於進出該輪送綠 •用之輸砂機構，可用作為該輸送線之::部^;輸送方向輸送基板於使基板自該輸送線迴避之際，魃二、，载置於該複數載置台中之 ^===線輪送來之基板具備有·· 、且可載置^^ 降’具有上下複數段之可進出該輸送線 _ 騎輪送之基㈣毅纟；者進出該輪送線使=棚架部昇降’而令該複數之載置台中之任- 降；、、: ___昇降機構職行之該嫉部之昇 .用之“送:具有於進出該輪送線之際’沿輸送方向輸送基板於可用作為該輪送線之-部分，载置於該^數截运線迴避之際，將由該輸送線輸送來之基板藉由該昇降，置，中之進出於該輸送線的該載置台，於此狀態輪送線迴避；冓使該棚架部昇降，令該基板與其載置台一齊自該 29 200800774 在進出於該輸送線之载置台上機構控制以在载置台與由該輪 J置f基板之狀態下，該控制 .距離時，藉由該昇降機構_棚^$之下—基板之間成既定 3.如申請專利範圍第2項之基板緩&; . 具有偵測部，設於自進出該於详姑又’八中. 側既定距離之位置，用以伯之載置台朝輸送方向上游進行之該棚架部之昇降。旎，控制由該昇降機構 4 ·如申請專利範圍第2或3頊^ A 4 該控制機構，控制由該昇機衝裝置，其中： •於自該輪送線迴避之基板再次=^仃之該棚架部之昇降，俾基板開始依序進出。進出忒輪送線之際’由先行迴避之 5.如申請專利範圍第！至3 將由該昇降機構進行之該棚芊基板緩衝裝置，其中： ί送線之自，峨於進出該 6止之時間’奴成較該輪送線之作送出之時點為 6·如申請專利範園第5馆夕n • a輔助輪送帶機構，用作為裝^ ’其中更包含·· 出該輪送線之载置台之輪送;心二一部分，分別鄰接於進輪送速側而設置，具有較 ▼ ^申明專利範圍第】至3項^任一，各载置台之該輸送_構，係由相衝裝置，其中： ^ 載置口進出該輪送線之際係盥琴、:3動源驅動，且該 "亥各载置台之該輸送帶、、羡衝ι置，其中·· 之任—者。袞子輪妨歧帶輪送方式中 9·如中請專利範園第1至3項中任員之基板緩衝裝置，其中： 30 200800774 -部Ιί最上段之毅台，於辦如雜魏__輪送線之 10.如申請專利範圍第9項之美上』夕台之該輸送帶機構=滾=送方气 ί ，為帶輸該最具備有：使用—基板緩衝裝置，該基板緩衝裝置棚架部，設置成可昇降，呈及、、：'、: 、、、輸線一者她部轉，切之敍Μ之任線迴法’用《使由雜魏^之基姉時自觀於該==^=:=複數之载置台中之進出降^吏其基板與其載置台，====構使該棚架部昇 1線所輸送來之下-基板之間成既定之^離之置台與該輸 12· —種基板處理裝置，包含·· 不進订輸送線，單方向輪送基板；既定之處理;及侧之位置，於該處理部ί生ί =近線之輸送方向上游暫時自輸送線_; 恤级’使_送線所輸送之基板其特徵在於·· 200800774 該緩衝裝置，具備有·· 線且成可昇降，具有上下複數段之可進出該輸送者進出該，岭織數之健纟中之任一該各载置台具有於進出兮於::::吻二不—or<幵,τ，且之輸糊轉，4作:之際，赌送方向輪送基板 :亥處理4發生轉之際，使雜送騎輸送來之基板载置於 mm降機構控制該棚架部之昇降; 該複數之載詈Α中推分认Γ 心球⑺铷达术之丞扳戟置於使該棚架部昇^，令’於此狀__昇降機構熊，ίί:ΐϊ:f皮載置於進出該輸送線之載置台i狀口與5亥輸送線所輸送來之下一 A；fe之門# P5：〜，控制以藉由該昇降機構使該棚架部；：之間成既疋之距式，其特徵在於： 4、糾上動作之控制程於執行該控制程式時，使電腦控制處理萝申請專利範圍第11項之基板緩衝方法。衣置，俾施行記載於十一、圖式 32200800774 X. Patent application scope: 1. A substrate buffering device for avoiding the ancient self-conveying line of the wheel-feeding wire cover, which is characterized in that: the substrate of the directional wheel is temporarily provided with a shed frame, which is set to be The lifting and lowering of the substrate a, which can be placed up and down, can be placed on the substrate conveyed by the conveying line, and the lifting and lowering mechanism can be moved in and out, so that the scaffolding portion can be lifted and lowered, and the person is allowed to enter and exit the conveying line. And the juice + ^5 Hai reading in the mounting platform - the mounting platforms have a sand transporting mechanism for feeding in and out of the wheel, which can be used as the conveying line:: part ^; conveying the substrate in the conveying direction When the substrate is evaded from the transport line, the substrate that is placed on the plurality of mounts by the ^=== reel has a ···, and can be placed on the upper and lower stages. Can enter and exit the conveyor line _ riding the base of the wheel (four) Yi 纟; the entry and exit of the round line to make = the scaffolding department to lift 'and make the plural of the station in the station - drop;,,: ___ lift agency The rise of the crotch. Use "send: have the opportunity to enter and exit the line" The direction conveying substrate is used as a part of the routing line, and when the plurality of intercepting lines are evaded, the substrate conveyed by the conveying line is lifted, placed, and moved into the conveying line. The mounting table is circumvented in this state; the gantry is moved up and down, and the substrate is aligned with the mounting table from the 29 200800774. The mechanism is controlled on the mounting table of the conveying line to be mounted on the mounting table. In the state where the wheel J is placed on the substrate, the distance between the control and the distance is determined by the lifting mechanism _ shed ^ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The measuring unit is arranged to be lifted and lowered from the position of the side set at a distance of a predetermined distance from the front of the section, and is used for lifting and lowering the scaffolding portion of the loading platform upstream of the conveying direction. For example, the control unit is controlled by the control device, and the control device is controlled by the lift device, wherein: • the substrate that is evaded from the wheel feed line again = ^ 仃 the lifting and lowering of the scaffolding portion, the substrate Start to enter and exit in order. 5. Avoiding 5. If the scope of application is stipulated! to 3, the slab substrate buffering device to be carried out by the lifting mechanism, wherein: ί is sent from the line, and the time is in and out of the 6th time. The time of delivery is 6. If the application for the Fan Park 5th Hall ‧ n • a auxiliary wheel conveyor mechanism, it is used as a loading device that contains the wheel of the wheel. One part is respectively disposed adjacent to the speed-increasing side of the wheel, and has any one of the above-mentioned patent ranges 】】, and the conveying structure of each mounting table is a phase punching device, wherein: ^ loading port At the time of entering and leaving the round line, the cymbal is: 3, the source is driven, and the conveyor belt, the 各 ι 置。。。。。。。。。。。。。。。。。.衮轮轮带带 · · · · · · · · 专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利专利_Rolling line 10. If the patent application scope is the ninth item of the patent, the belt mechanism of the shed is = roll = send square ί, which is the most suitable for the belt: use - substrate buffer device, the substrate buffer device The scaffolding department is set up to be able to ascend and descend, present, and: ',:,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Viewing the ==^=:= multiple of the loading and unloading in the mounting table, the substrate and its mounting table, ==== the structure of the scaffolding portion is lifted by 1 line - the substrate is established ^The substrate and the substrate processing device, including: · not feeding the transport line, unidirectionally transferring the substrate; the predetermined processing; and the position of the side, in the processing portion ί 近 = near line Temporary self-conveying line in the direction of transport _; the board of the shirt-type 'send-to-feed line is characterized by ··· 200800774 ·· The line can be raised and lowered, and there are multiple upper and lower sections that can enter and exit the transporter. Any one of the mounts of the ridge number has the entry and exit:::: kiss two no-or<幵, τ, and the transfer of the paste, 4: When the gambling direction is sent to the substrate: when the processing of the 4th turn occurs, the substrate sent by the miscellaneous ride is placed in the mm lower mechanism to control the scaffolding The lifting and lowering; the plural of the 詈Α 推 Γ Γ Γ ( ( ( ( ( ( ( ( ( ( Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ The skin is placed in the i-shaped port of the loading and unloading line of the conveying line and the conveying line of the 5 hai conveying line; the door of the door #P5:~ is controlled to make the scaffolding portion by the lifting mechanism; The method of controlling the distance between the two is characterized in that: 4. The control step of the corrective action causes the computer to control the substrate buffering method of the eleventh patent application scope when the control program is executed. Clothing, 俾 implementation is recorded in XI, schema 32