TW200745751A - Radiation sensitive composition, color filter and liquid crystal display device - Google Patents

Radiation sensitive composition, color filter and liquid crystal display device

Info

Publication number
TW200745751A
TW200745751A TW096103175A TW96103175A TW200745751A TW 200745751 A TW200745751 A TW 200745751A TW 096103175 A TW096103175 A TW 096103175A TW 96103175 A TW96103175 A TW 96103175A TW 200745751 A TW200745751 A TW 200745751A
Authority
TW
Taiwan
Prior art keywords
compound
radiation sensitive
sensitive composition
liquid crystal
display device
Prior art date
Application number
TW096103175A
Other languages
Chinese (zh)
Other versions
TWI418937B (en
Inventor
Kyoichiro Ryu
Tomio Nagatsuka
Isamu Makihira
Hiroki Ohara
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200745751A publication Critical patent/TW200745751A/en
Application granted granted Critical
Publication of TWI418937B publication Critical patent/TWI418937B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

A radiation sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) an optical radical generator containing an oxime such as 1- [9-ethyl-6- (2-methylbenzoyl) -9.H. -carbazol-3-yl] -ethan -1-oneoxime-O-acetate and at least one component selected from the group consisting of a biimidazole compound, benzophenone compound, thioxanthone compound and ketocoumarin compound and which is used to form a colored layer. This composition does not produce an undissolved product or scum on the pattern edge at the time of development and can provide pixels and a black matrix without a missing part of the pattern edge or an undercut even when the amount of exposure is small and the development conditions are severe.
TW096103175A 2006-01-31 2007-01-29 Radiation sensitive composition, color filter and liquid crystal display device TWI418937B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006023505A JP4882396B2 (en) 2006-01-31 2006-01-31 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device

Publications (2)

Publication Number Publication Date
TW200745751A true TW200745751A (en) 2007-12-16
TWI418937B TWI418937B (en) 2013-12-11

Family

ID=38485809

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096103175A TWI418937B (en) 2006-01-31 2007-01-29 Radiation sensitive composition, color filter and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP4882396B2 (en)
KR (1) KR101407774B1 (en)
CN (1) CN101013264A (en)
SG (1) SG134295A1 (en)
TW (1) TWI418937B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5546801B2 (en) * 2008-06-10 2014-07-09 富士フイルム株式会社 Photosensitive resin composition for ultraviolet light laser exposure, pattern forming method, color filter produced using the method, method for producing color filter, and liquid crystal display device
JP2010175878A (en) * 2009-01-30 2010-08-12 Fujifilm Corp Color photosensitive composition, color filter, and liquid crystal display device
JP5317809B2 (en) * 2009-04-20 2013-10-16 富士フイルム株式会社 Colored curable composition, colored pattern forming method, color filter, and liquid crystal display device
JP5554223B2 (en) * 2009-12-14 2014-07-23 富士フイルム株式会社 Colored photosensitive composition, method for producing color filter, color filter, and liquid crystal display device
JP6252001B2 (en) * 2012-07-25 2017-12-27 東レ株式会社 Colorant composition, color filter substrate, and liquid crystal display device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3860170B2 (en) 2001-06-11 2006-12-20 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Photoinitiators of oxime esters with combined structures
JP4484482B2 (en) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 Photosensitive coloring composition and color filter
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
JP4428151B2 (en) * 2004-06-23 2010-03-10 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer and color filter
JP5140903B2 (en) * 2004-07-02 2013-02-13 三菱化学株式会社 Colored resin composition, color filter, and liquid crystal display device
JP2007041493A (en) * 2004-10-20 2007-02-15 Mitsubishi Chemicals Corp Photosensitive composition, photosensitive composition for blue-violet laser, image-forming base material using the same, image-forming material and image-forming method

Also Published As

Publication number Publication date
KR20070079007A (en) 2007-08-03
TWI418937B (en) 2013-12-11
JP4882396B2 (en) 2012-02-22
KR101407774B1 (en) 2014-06-17
JP2007206268A (en) 2007-08-16
CN101013264A (en) 2007-08-08
SG134295A1 (en) 2007-08-29

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