TW200741375A - Spectral filter repair - Google Patents

Spectral filter repair

Info

Publication number
TW200741375A
TW200741375A TW096109535A TW96109535A TW200741375A TW 200741375 A TW200741375 A TW 200741375A TW 096109535 A TW096109535 A TW 096109535A TW 96109535 A TW96109535 A TW 96109535A TW 200741375 A TW200741375 A TW 200741375A
Authority
TW
Taiwan
Prior art keywords
chamber
filter
spectral filter
source
holes
Prior art date
Application number
TW096109535A
Other languages
Chinese (zh)
Inventor
Robert Bruce Grant
Original Assignee
Boc Group Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Plc filed Critical Boc Group Plc
Publication of TW200741375A publication Critical patent/TW200741375A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

A method is described for repairing a spectral filter through which electromagnetic radiation passes from a chamber housing a radiation source to a lithography tool, in which a source of carbon for forming carbonaceous material on the filter is periodically supplied to the chamber to at least reduce the size of holes grown in the filter during use of the tool. In a preferred embodiment, the method comprises the steps of detecting the leakage of gas from the chamber through the holes, and, depending on the amount of gas passing through the filter, supplying the carbon source to the chamber.
TW096109535A 2006-03-23 2007-03-20 Spectral filter repair TW200741375A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0605725A GB0605725D0 (en) 2006-03-23 2006-03-23 Spectral filter repair

Publications (1)

Publication Number Publication Date
TW200741375A true TW200741375A (en) 2007-11-01

Family

ID=36383944

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109535A TW200741375A (en) 2006-03-23 2007-03-20 Spectral filter repair

Country Status (3)

Country Link
GB (1) GB0605725D0 (en)
TW (1) TW200741375A (en)
WO (1) WO2007107783A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102652286A (en) * 2010-02-09 2012-08-29 Asml荷兰有限公司 Radiation source, lithographic apparatus and device manufacturing method
CN111082874A (en) * 2019-12-24 2020-04-28 哈尔滨工业大学 Microwave photon filter based on gas absorption and phase modulation

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0614028D0 (en) * 2006-07-14 2006-08-23 Boc Group Plc Method of controlling contamination of a surface
DE102011084152A1 (en) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Method for adjusting the intensity distribution in an optical system of a microlithographic projection exposure apparatus, and optical system
DE102012212394A1 (en) 2012-07-16 2013-05-29 Carl Zeiss Smt Gmbh Device for separating regions and/or optical elements in projection exposure system, has feed line and return line for conducting fluid, which are arranged to fluid in separating area for forming fluid curtain
DE102012215698A1 (en) 2012-09-05 2013-08-29 Carl Zeiss Smt Gmbh Control device for spectral filter of extreme UV projection exposure system, has condenser lenses forming light of light source into monitoring light beam to condition filter transmitted light and/or reflected light for detector
DE102012215697A1 (en) 2012-09-05 2014-03-06 Carl Zeiss Smt Gmbh Blocking element for the protection of optical elements in projection exposure systems

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001108799A (en) * 1999-10-08 2001-04-20 Nikon Corp Method of manufacturing x-ray generator, x-ray exposure device, and semiconductor device
TW548524B (en) * 2000-09-04 2003-08-21 Asm Lithography Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US7154666B2 (en) * 2001-01-26 2006-12-26 Carl Zeiss Smt Ag Narrow-band spectral filter and the use thereof
GB0408543D0 (en) * 2004-04-16 2004-05-19 Boc Group Plc Cleaning of multi-layer mirrors
GB0426036D0 (en) * 2004-11-26 2004-12-29 Boc Group Plc Protection of surfaces exposed to charged particles

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102652286A (en) * 2010-02-09 2012-08-29 Asml荷兰有限公司 Radiation source, lithographic apparatus and device manufacturing method
CN102652286B (en) * 2010-02-09 2015-06-17 Asml荷兰有限公司 Radiation source, lithographic apparatus and device manufacturing method
CN111082874A (en) * 2019-12-24 2020-04-28 哈尔滨工业大学 Microwave photon filter based on gas absorption and phase modulation
CN111082874B (en) * 2019-12-24 2022-09-30 哈尔滨工业大学 Microwave photon filter based on gas absorption and phase modulation

Also Published As

Publication number Publication date
GB0605725D0 (en) 2006-05-03
WO2007107783A1 (en) 2007-09-27

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