EP4007468A4
(en )
2022-12-14
MOBILE TERMINAL, STEAM CHAMBER AND METHOD FOR PREPARING IT, AND ELECTRONIC DEVICE
TW200705551A
(en )
2007-02-01
Method for forming a high density dielectric film by chemical vapor deposition
WO2009137272A3
(en )
2010-03-04
Flowable dielectric equipment and processes
WO2008120459A1
(ja )
2008-10-09
プラズマ処理装置及びプラズマ処理方法
TW200744145A
(en )
2007-12-01
Cluster processing apparatus
TW200703514A
(en )
2007-01-16
Improved manufacturing method for two-step post nitridation annealing of plasma nitrided gate dielectric
WO2006083380A3
(en )
2007-06-21
Method for fabricating a semiconductor device
TW200802608A
(en )
2008-01-01
Silicon oxynitride gate dielectric formation using multiple annealing steps
TW200636855A
(en )
2006-10-16
Vertical batch processing apparatus
SG136030A1
(en )
2007-10-29
Method for manufacturing compound material wafers and method for recycling a used donor substrate
WO2007038050A8
(en )
2008-04-17
Treatment processes for a batch ald reactor
TW200739730A
(en )
2007-10-16
Plasma oxidation method and method for manufacturing semiconductor device
TW200713427A
(en )
2007-04-01
Silicon nitride from aminosilane using PECVD
TW201130055A
(en )
2011-09-01
Method for manufacturing oxide semiconductor film and method for manufacturing semiconductor device
TW200616084A
(en )
2006-05-16
Method for manufacturing semiconductor
TW200727346A
(en )
2007-07-16
Method for manufacturing semiconductor device and plasma oxidation method
WO2009120552A3
(en )
2009-11-19
Integrated process system and process sequence for production of thin film transistor arrays using doped or compounded metal oxide semiconductor
WO2011116984A3
(de )
2013-03-21
Verfahren und vorrichtung zur verringerung der keimanzahl in einem abgeschlossenen volumen
WO2009041499A1
(ja )
2009-04-02
プラズマ処理装置及びそのガス排気方法
TW200733242A
(en )
2007-09-01
Methods and apparatuses for high pressure gas annealing
TW200627524A
(en )
2006-08-01
A deposition method of PE-TEOS oxide layer, a method for depositing an inter metal dielectric layer, and an interconnect structure
WO2012173824A3
(en )
2013-03-14
Enhanced magnesium incorporation into gallium nitride films through high pressure or ald-type processing
WO2008067870A3
(de )
2008-10-02
Isolationsvorrichtung mit einer evakuierbaren wärmeisolationsschichtanordnung
WO2010007356A3
(en )
2011-02-24
Ald gas delivery device
WO2011031672A3
(en )
2011-06-16
Parallel system for epitaxial chemical vapor deposition