TW200733242A - Methods and apparatuses for high pressure gas annealing - Google Patents
Methods and apparatuses for high pressure gas annealingInfo
- Publication number
- TW200733242A TW200733242A TW096101409A TW96101409A TW200733242A TW 200733242 A TW200733242 A TW 200733242A TW 096101409 A TW096101409 A TW 096101409A TW 96101409 A TW96101409 A TW 96101409A TW 200733242 A TW200733242 A TW 200733242A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- anneal
- apparatuses
- high pressure
- methods
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2006351816 | 2006-02-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200733242A true TW200733242A (en) | 2007-09-01 |
Family
ID=57913268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096101409A TW200733242A (en) | 2006-02-10 | 2007-01-15 | Methods and apparatuses for high pressure gas annealing |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200733242A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109950177A (en) * | 2017-12-20 | 2019-06-28 | 东京毅力科创株式会社 | Vertical heat processing apparatus |
US11462417B2 (en) | 2017-08-18 | 2022-10-04 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
-
2007
- 2007-01-15 TW TW096101409A patent/TW200733242A/en unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11462417B2 (en) | 2017-08-18 | 2022-10-04 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
US11469113B2 (en) | 2017-08-18 | 2022-10-11 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
TWI835739B (en) * | 2017-08-18 | 2024-03-21 | 美商應用材料股份有限公司 | High pressure and high temperature anneal chamber |
CN109950177A (en) * | 2017-12-20 | 2019-06-28 | 东京毅力科创株式会社 | Vertical heat processing apparatus |
CN109950177B (en) * | 2017-12-20 | 2023-05-23 | 东京毅力科创株式会社 | Vertical heat treatment device |
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