TW200728910A - Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them - Google Patents
Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming themInfo
- Publication number
- TW200728910A TW200728910A TW095147776A TW95147776A TW200728910A TW 200728910 A TW200728910 A TW 200728910A TW 095147776 A TW095147776 A TW 095147776A TW 95147776 A TW95147776 A TW 95147776A TW 200728910 A TW200728910 A TW 200728910A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- sensitive resin
- radiation sensitive
- microlens
- interlayer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
- C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
- C08K5/28—Azides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/08—Copolymers of styrene
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/02—Flame or fire retardant/resistant
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Formation Of Insulating Films (AREA)
- Epoxy Resins (AREA)
Abstract
This invention provides a radiation sensitive resin composition, interlayer-insulated layer made from it and microlens. The said composition is high radiation-sensitive, which has development margin capable of forming good pattern shape, even exceeding the best development time in development step, and is capable of easily forming patterned film with excellent adherence. This invention provides a radiation sensitive resin composition, which comprises unsaturated carboxylic acid and /or unsaturated carboxylic acid anhydride, epoxy-containing unsaturated compound, phenol skeleton-containing unsaturated compounds, copolymer containing unsaturated compounds other than the above mentioned compounds, and 1,2-quinodiazide compound.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005369301A JP4656316B2 (en) | 2005-12-22 | 2005-12-22 | Interlayer insulating film, microlens, and manufacturing method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200728910A true TW200728910A (en) | 2007-08-01 |
Family
ID=38298216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095147776A TW200728910A (en) | 2005-12-22 | 2006-12-20 | Radiation sensitive resin composition, interlayer-insulated film, microlens, and the method for forming them |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4656316B2 (en) |
KR (1) | KR100858446B1 (en) |
CN (1) | CN101206401A (en) |
TW (1) | TW200728910A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI848898B (en) | 2016-05-12 | 2024-07-21 | 南韓商三星顯示器有限公司 | Photosensitive resin composition, method for forming organic film with pattern, and display device |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5045064B2 (en) | 2006-11-02 | 2012-10-10 | Jnc株式会社 | Alkali-soluble polymer and positive photosensitive resin composition using the same |
JP4637209B2 (en) * | 2007-06-05 | 2011-02-23 | 富士フイルム株式会社 | Positive photosensitive resin composition and cured film forming method using the same |
US8409783B2 (en) | 2007-09-28 | 2013-04-02 | Tokyo Ohka Kogyo Co., Ltd. | Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
JP5240459B2 (en) * | 2008-02-19 | 2013-07-17 | Jsr株式会社 | Radiation-sensitive resin composition, interlayer insulating film, microlens and method for forming them |
TWI452444B (en) * | 2008-07-14 | 2014-09-11 | Jsr Corp | Formed resist patterns-insolubilization resin composition and method for forming resist pattern using the same |
JP5343664B2 (en) * | 2009-03-30 | 2013-11-13 | Jsr株式会社 | Radiation-sensitive resin composition, organic EL display element partition and insulating film, and method for forming the same |
US9823391B2 (en) | 2012-10-23 | 2017-11-21 | Nissan Chemical Industries, Ltd. | Non-photosensitive resin composition |
KR102239543B1 (en) * | 2013-08-28 | 2021-04-13 | 롬엔드하스전자재료코리아유한회사 | Positive-type photosensitive resin composition and cured film prepared therefrom |
JP6700020B2 (en) * | 2015-10-21 | 2020-05-27 | 昭和電工株式会社 | Positive photosensitive resin composition |
KR102414942B1 (en) | 2015-12-21 | 2022-06-30 | 닛산 가가쿠 가부시키가이샤 | resin composition |
KR102411927B1 (en) | 2016-07-28 | 2022-06-22 | 닛산 가가쿠 가부시키가이샤 | resin composition |
TW202124470A (en) | 2019-11-06 | 2021-07-01 | 日商日產化學股份有限公司 | Non-photosensitive resin composition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08292574A (en) * | 1995-04-20 | 1996-11-05 | Japan Synthetic Rubber Co Ltd | Radiation sensitive resin composition |
JP4269115B2 (en) * | 1999-05-10 | 2009-05-27 | Jsr株式会社 | Radiation sensitive resin composition, interlayer insulating film and spacer |
JP2000327877A (en) | 1999-05-17 | 2000-11-28 | Jsr Corp | Radiation-sensitive resin composition, use thereof for interlayer insulation film and microlens, and interlayer insulation film and microlens |
JP2000327875A (en) | 1999-05-21 | 2000-11-28 | Jsr Corp | Radiation-sensitive resin composition for spacer united with color filter protection film or tft interlayer insulation film |
JP2002182380A (en) * | 2000-12-14 | 2002-06-26 | Jsr Corp | Radiation sensitive resin composition for forming insulation film of organic el display element, insulation film formed from the same and organic el display element |
JP4650639B2 (en) * | 2004-04-08 | 2011-03-16 | Jsr株式会社 | Radiation-sensitive resin composition, interlayer insulating film and microlens, and production method thereof |
JP4742662B2 (en) * | 2005-04-26 | 2011-08-10 | Jsr株式会社 | Radiation-sensitive resin composition, protrusions and spacers formed therefrom, and liquid crystal display device comprising the same |
JP4644857B2 (en) * | 2005-07-22 | 2011-03-09 | 昭和電工株式会社 | Photosensitive resin composition |
-
2005
- 2005-12-22 JP JP2005369301A patent/JP4656316B2/en active Active
-
2006
- 2006-10-26 KR KR1020060104391A patent/KR100858446B1/en active IP Right Grant
- 2006-12-19 CN CNA2006101617381A patent/CN101206401A/en active Pending
- 2006-12-20 TW TW095147776A patent/TW200728910A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI848898B (en) | 2016-05-12 | 2024-07-21 | 南韓商三星顯示器有限公司 | Photosensitive resin composition, method for forming organic film with pattern, and display device |
Also Published As
Publication number | Publication date |
---|---|
JP4656316B2 (en) | 2011-03-23 |
KR20070066852A (en) | 2007-06-27 |
KR100858446B1 (en) | 2008-09-12 |
CN101206401A (en) | 2008-06-25 |
JP2007171572A (en) | 2007-07-05 |
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