TW200722930A - Protective film-forming material and method of photoresist patterning with it - Google Patents

Protective film-forming material and method of photoresist patterning with it

Info

Publication number
TW200722930A
TW200722930A TW095133325A TW95133325A TW200722930A TW 200722930 A TW200722930 A TW 200722930A TW 095133325 A TW095133325 A TW 095133325A TW 95133325 A TW95133325 A TW 95133325A TW 200722930 A TW200722930 A TW 200722930A
Authority
TW
Taiwan
Prior art keywords
protective film
forming material
photoresist patterning
photoresist
formation
Prior art date
Application number
TW095133325A
Other languages
English (en)
Inventor
Keita Ishiduka
Tomoyuki Hirano
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200722930A publication Critical patent/TW200722930A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
TW095133325A 2005-09-09 2006-09-08 Protective film-forming material and method of photoresist patterning with it TW200722930A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005261629A JP2007072336A (ja) 2005-09-09 2005-09-09 保護膜形成用材料およびこれを用いたホトレジストパターン形成方法

Publications (1)

Publication Number Publication Date
TW200722930A true TW200722930A (en) 2007-06-16

Family

ID=37835880

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133325A TW200722930A (en) 2005-09-09 2006-09-08 Protective film-forming material and method of photoresist patterning with it

Country Status (3)

Country Link
JP (1) JP2007072336A (zh)
TW (1) TW200722930A (zh)
WO (1) WO2007029765A1 (zh)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4265766B2 (ja) * 2003-08-25 2009-05-20 東京応化工業株式会社 液浸露光プロセス用レジスト保護膜形成用材料、該保護膜形成材料からなるレジスト保護膜、および該レジスト保護膜を用いたレジストパターン形成方法
JP4609878B2 (ja) * 2003-10-28 2011-01-12 東京応化工業株式会社 レジスト上層膜形成材料、およびこれを用いたレジストパターン形成方法
WO2005042453A1 (ja) * 2003-10-31 2005-05-12 Asahi Glass Company, Limited 含フッ素化合物、含フッ素ポリマーとその製造方法
JP4407358B2 (ja) * 2004-04-14 2010-02-03 旭硝子株式会社 含フッ素ポリマーおよびレジスト組成物
WO2006011427A1 (ja) * 2004-07-30 2006-02-02 Asahi Glass Company, Limited 含フッ素化合物、含フッ素ポリマー、レジスト組成物、およびレジスト保護膜組成物

Also Published As

Publication number Publication date
WO2007029765A1 (ja) 2007-03-15
JP2007072336A (ja) 2007-03-22

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