TW200720845A - Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern - Google Patents

Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern

Info

Publication number
TW200720845A
TW200720845A TW095125502A TW95125502A TW200720845A TW 200720845 A TW200720845 A TW 200720845A TW 095125502 A TW095125502 A TW 095125502A TW 95125502 A TW95125502 A TW 95125502A TW 200720845 A TW200720845 A TW 200720845A
Authority
TW
Taiwan
Prior art keywords
matrix pattern
black matrix
black
paste composition
formation
Prior art date
Application number
TW095125502A
Other languages
English (en)
Inventor
Masaki Sasaki
Kenji Kato
Masao Arima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW200720845A publication Critical patent/TW200720845A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
TW095125502A 2005-07-13 2006-07-12 Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern TW200720845A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005204089 2005-07-13

Publications (1)

Publication Number Publication Date
TW200720845A true TW200720845A (en) 2007-06-01

Family

ID=37637190

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125502A TW200720845A (en) 2005-07-13 2006-07-12 Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern

Country Status (6)

Country Link
US (1) US7648814B2 (zh)
JP (1) JP4834664B2 (zh)
KR (1) KR100939416B1 (zh)
CN (1) CN101223478B (zh)
TW (1) TW200720845A (zh)
WO (1) WO2007007800A1 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200710572A (en) * 2005-05-31 2007-03-16 Taiyo Ink Mfg Co Ltd Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same
WO2007007802A1 (ja) * 2005-07-13 2007-01-18 Taiyo Ink Mfg. Co., Ltd. 銀ペースト組成物、及びそれを用いた導電性パターンの形成方法、並びにその導電性パターン
KR100706127B1 (ko) * 2006-02-01 2007-04-12 엘지전자 주식회사 플라즈마 디스플레이 패널의 격벽 및 블랙탑 제조방법
KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스
JP5210657B2 (ja) * 2007-07-18 2013-06-12 太陽ホールディングス株式会社 感光性組成物、及びその焼成物からなるパターン
KR20090100262A (ko) * 2008-03-18 2009-09-23 후지필름 가부시키가이샤 감광성 수지 조성물, 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자
US8872099B2 (en) * 2008-03-18 2014-10-28 Fujifilm Corporation Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter
JP5236557B2 (ja) * 2009-03-31 2013-07-17 太陽ホールディングス株式会社 レーザーを用いたパターン形成方法
KR20130016192A (ko) * 2010-03-18 2013-02-14 도레이 카부시키가이샤 감광성 도전 페이스트 및 도전 패턴의 제조방법
KR101355152B1 (ko) * 2010-07-21 2014-01-27 주식회사 엘지화학 광중합 개시제 및 이를 이용한 감광성 수지 조성물
JP5898502B2 (ja) * 2012-01-17 2016-04-06 株式会社日本触媒 感光性樹脂組成物
KR101979012B1 (ko) * 2012-12-04 2019-05-16 엘지디스플레이 주식회사 블랙매트릭스 패턴 형성용 감광성 조성물, 블랙 매트릭스의 패턴 형성 방법
US11565973B2 (en) 2016-04-06 2023-01-31 Ceramicoat International Limited Sprayable silicate-based coatings and methods for making and applying same
US20190135681A1 (en) * 2016-04-06 2019-05-09 Ceramicoat International Limited Sprayable alumino-silicate coatings, resins, their compositions and products
WO2018223110A1 (en) * 2017-06-02 2018-12-06 Guardian Glass, LLC Glass article containing a coating with an interpenetrating polymer network

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3510761B2 (ja) 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3541125B2 (ja) * 1998-05-01 2004-07-07 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
JP2002105112A (ja) * 2000-09-29 2002-04-10 Taiyo Ink Mfg Ltd 感光性ペースト組成物及びそれを用いて焼成物パターンを形成したパネル
JP2002351072A (ja) 2001-05-28 2002-12-04 Fuji Photo Film Co Ltd 感光性組成物
JP2002351071A (ja) 2001-05-28 2002-12-04 Fuji Photo Film Co Ltd 感光性組成物
JP3860170B2 (ja) * 2001-06-11 2006-12-20 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
WO2003040246A1 (fr) * 2001-11-08 2003-05-15 Toray Industries, Inc. Pate noire, ecran a plasma et procede pour le produire
JP3986312B2 (ja) 2001-12-20 2007-10-03 太陽インキ製造株式会社 黒色ペースト組成物及びそれを用いて黒色パターンを形成したプラズマディスプレイパネル
JP4008273B2 (ja) * 2002-03-26 2007-11-14 太陽インキ製造株式会社 アルカリ現像型感光性樹脂組成物及びそれを用いたプリント配線基板
JP4043870B2 (ja) 2002-07-10 2008-02-06 関西ペイント株式会社 半導体レーザー用硬化型樹脂組成物及びその組成を使用したレジストパターン形成方法
JP2004198444A (ja) 2002-10-25 2004-07-15 Sumitomo Bakelite Co Ltd 感光性銀フィルム及びそれを用いた画像表示装置
TW200417294A (en) * 2002-11-28 2004-09-01 Taiyo Ink Mfg Co Ltd Photo- and thermo-setting resin composition and printed wiring boards made by using the same
TWI337689B (en) * 2003-04-24 2011-02-21 Sumitomo Chemical Co Black photosensitive resin composition
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
KR20060091669A (ko) * 2005-02-16 2006-08-21 엘지전자 주식회사 플라즈마 디스플레이 패널 전면기판용 블랙매트릭스 조성물
WO2007063816A1 (ja) 2005-11-30 2007-06-07 Toray Industries, Inc. ガラスペーストおよびそれを用いたディスプレイの製造方法、ならびにディスプレイ

Also Published As

Publication number Publication date
CN101223478B (zh) 2011-10-12
WO2007007800A1 (ja) 2007-01-18
KR100939416B1 (ko) 2010-01-28
JPWO2007007800A1 (ja) 2009-01-29
CN101223478A (zh) 2008-07-16
US7648814B2 (en) 2010-01-19
JP4834664B2 (ja) 2011-12-14
KR20080019289A (ko) 2008-03-03
US20080118864A1 (en) 2008-05-22

Similar Documents

Publication Publication Date Title
TW200720845A (en) Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern
TW200720846A (en) Silver paste composition, method for electrically conductive pattern formation using the same, and its electrically conductive pattern
TWI613186B (zh) 著色樹脂組成物，彩色濾光片，液晶顯示裝置及有機ｅｌ顯示裝置
CN104204105B (zh) 三芳基甲烷类化合物、着色树脂组合物、滤色片、液晶显示装置及有机el显示装置
TW200728379A (en) Resin composition, cured product of the same, and printed circuit board made of the same
TW200730587A (en) Phthalocyanine based pigment fine particle, pigment dispersing photoresist, colour transcription material, color filter, and liquid crystal display device
TW200711469A (en) Display system and method using a solid state laser
JP5732924B2 (ja) 顔料分散液、着色樹脂組成物、カラーフィルタ、並びに液晶表示装置及び有機ｅｌディスプレイ
TW201443164A (zh) 著色組成物、著色硬化膜及顯示元件
CN105992801B (zh) 着色树脂组合物、滤色片、液晶显示装置及有机el显示装置
JP2014505115A (ja) 染料を含む高分子化合物およびそれを含む硬化性樹脂組成物
TW200633975A (en) High refractive polymerizable composition and use thereof
JP2016224447A5 (zh)
CN102190931B (zh) 油墨组合物和记录方法
WO2009060875A1 (ja) ガラス板の製造方法
TW200834232A (en) Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern
ATE465022T1 (de) Tintenzusammensetzung und tintenstrahlaufzeichnungsverfahren damit
JP6432313B2 (ja) 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP2018058976A (ja) 着色樹脂組成物、カラーフィルタ及び画像表示装置
KR101028589B1 (ko) 착색용 감광성 수지 조성물
JP2008183820A (ja) インクジェット記録方法
US11414557B2 (en) Active-energy-ray-polymerizable initiator, active-energy-ray-polymerizable composition, active-energy-ray-polymerizable ink, ink storage container, image forming method, and image forming apparatus
JP6972540B2 (ja) 着色樹脂組成物、カラーフィルタ基板および表示装置
JP7506013B2 (ja) ハロゲン化フタロシアニン色材、色材液、着色硬化性組成物、カラーフィルタ、及び表示装置
JP6318920B2 (ja) 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置