TW200712784A - Apparatus and methods for immersion - Google Patents

Apparatus and methods for immersion

Info

Publication number
TW200712784A
TW200712784A TW095105990A TW95105990A TW200712784A TW 200712784 A TW200712784 A TW 200712784A TW 095105990 A TW095105990 A TW 095105990A TW 95105990 A TW95105990 A TW 95105990A TW 200712784 A TW200712784 A TW 200712784A
Authority
TW
Taiwan
Prior art keywords
front surface
imaging lens
substrate
fluid
immersion
Prior art date
Application number
TW095105990A
Other languages
English (en)
Inventor
Ching-Yu Chang
Chin-Hsiang Lin
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200712784A publication Critical patent/TW200712784A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095105990A 2005-09-13 2006-02-22 Apparatus and methods for immersion TW200712784A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/225,268 US20070058263A1 (en) 2005-09-13 2005-09-13 Apparatus and methods for immersion lithography

Publications (1)

Publication Number Publication Date
TW200712784A true TW200712784A (en) 2007-04-01

Family

ID=37775955

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095105990A TW200712784A (en) 2005-09-13 2006-02-22 Apparatus and methods for immersion

Country Status (9)

Country Link
US (1) US20070058263A1 (zh)
JP (1) JP4486945B2 (zh)
CN (1) CN1932648A (zh)
DE (2) DE102006062988B8 (zh)
FR (1) FR2891067B1 (zh)
IL (1) IL176590A0 (zh)
NL (1) NL1032126C2 (zh)
SG (1) SG130991A1 (zh)
TW (1) TW200712784A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399620B (zh) * 2009-05-05 2013-06-21 Nat Synchrotron Radiation Res Ct 立體光阻微結構的製作方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7367345B1 (en) * 2002-09-30 2008-05-06 Lam Research Corporation Apparatus and method for providing a confined liquid for immersion lithography
JP5114021B2 (ja) * 2006-01-23 2013-01-09 富士フイルム株式会社 パターン形成方法
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法
JP4490459B2 (ja) * 2007-06-29 2010-06-23 キヤノン株式会社 露光装置及びデバイス製造方法
CN102207685B (zh) * 2011-01-22 2012-11-21 浙江大学 用于浸没式光刻机的磁流体注入和回收控制装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7367345B1 (en) * 2002-09-30 2008-05-06 Lam Research Corporation Apparatus and method for providing a confined liquid for immersion lithography
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
US7010958B2 (en) * 2002-12-19 2006-03-14 Asml Holding N.V. High-resolution gas gauge proximity sensor
KR101745223B1 (ko) * 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1486827B1 (en) * 2003-06-11 2011-11-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6809794B1 (en) * 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
JP2006528835A (ja) * 2003-07-24 2006-12-21 カール・ツアイス・エスエムテイ・アーゲー マイクロリソグラフィ投影露光装置および浸漬液体を浸漬空間へ導入する方法
TWI245163B (en) * 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
JP3993549B2 (ja) * 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
EP1531362A3 (en) * 2003-11-13 2007-07-25 Matsushita Electric Industrial Co., Ltd. Semiconductor manufacturing apparatus and pattern formation method
JP2005183438A (ja) * 2003-12-16 2005-07-07 Matsushita Electric Ind Co Ltd パターン形成方法
TWI259319B (en) * 2004-01-23 2006-08-01 Air Prod & Chem Immersion lithography fluids
JP4535489B2 (ja) * 2004-03-31 2010-09-01 東京エレクトロン株式会社 塗布・現像装置
JP2006108564A (ja) * 2004-10-08 2006-04-20 Renesas Technology Corp 電子デバイスの製造方法および露光システム
US7119035B2 (en) * 2004-11-22 2006-10-10 Taiwan Semiconductor Manufacturing Company, Ltd. Method using specific contact angle for immersion lithography
JP4262252B2 (ja) * 2005-03-02 2009-05-13 キヤノン株式会社 露光装置
US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399620B (zh) * 2009-05-05 2013-06-21 Nat Synchrotron Radiation Res Ct 立體光阻微結構的製作方法

Also Published As

Publication number Publication date
DE102006062988B3 (de) 2017-01-05
CN1932648A (zh) 2007-03-21
NL1032126A1 (nl) 2007-03-15
DE102006062988B8 (de) 2017-03-23
FR2891067A1 (fr) 2007-03-23
NL1032126C2 (nl) 2008-02-28
IL176590A0 (en) 2006-10-31
FR2891067B1 (fr) 2012-08-31
JP2007081373A (ja) 2007-03-29
JP4486945B2 (ja) 2010-06-23
DE102006027846B4 (de) 2014-11-20
DE102006027846A1 (de) 2007-03-22
SG130991A1 (en) 2007-04-26
US20070058263A1 (en) 2007-03-15

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